US3461058A - Method of producing a composite electrode - Google Patents
Method of producing a composite electrode Download PDFInfo
- Publication number
- US3461058A US3461058A US555670A US3461058DA US3461058A US 3461058 A US3461058 A US 3461058A US 555670 A US555670 A US 555670A US 3461058D A US3461058D A US 3461058DA US 3461058 A US3461058 A US 3461058A
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- United States
- Prior art keywords
- platinum
- coating
- sample
- metal
- titanium
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 title description 21
- 239000002131 composite material Substances 0.000 title description 19
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 138
- 238000000576 coating method Methods 0.000 description 61
- 229910052697 platinum Inorganic materials 0.000 description 51
- 239000011248 coating agent Substances 0.000 description 48
- 239000000460 chlorine Substances 0.000 description 23
- 229910052751 metal Inorganic materials 0.000 description 23
- 239000002184 metal Substances 0.000 description 23
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 21
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 20
- 229910052801 chlorine Inorganic materials 0.000 description 20
- 229910052719 titanium Inorganic materials 0.000 description 20
- 239000010936 titanium Substances 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 14
- 230000003746 surface roughness Effects 0.000 description 13
- 239000000758 substrate Substances 0.000 description 12
- 238000005868 electrolysis reaction Methods 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 239000010953 base metal Substances 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 239000011162 core material Substances 0.000 description 8
- 239000012267 brine Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 7
- 239000012298 atmosphere Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000004070 electrodeposition Methods 0.000 description 6
- 239000010970 precious metal Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 230000001464 adherent effect Effects 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 235000011167 hydrochloric acid Nutrition 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000003870 refractory metal Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 4
- 229910001069 Ti alloy Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 239000005696 Diammonium phosphate Substances 0.000 description 1
- 229910000575 Ir alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- IXSUHTFXKKBBJP-UHFFFAOYSA-L azanide;platinum(2+);dinitrite Chemical compound [NH2-].[NH2-].[Pt+2].[O-]N=O.[O-]N=O IXSUHTFXKKBBJP-UHFFFAOYSA-L 0.000 description 1
- 230000005250 beta ray Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
- 235000019838 diammonium phosphate Nutrition 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- ILNKLXHFYKXPKY-UHFFFAOYSA-N iridium osmium Chemical compound [Os].[Ir] ILNKLXHFYKXPKY-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- -1 platinum group metals Chemical class 0.000 description 1
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
- UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 1
- HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical class [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- PMTRSEDNJGMXLN-UHFFFAOYSA-N titanium zirconium Chemical compound [Ti].[Zr] PMTRSEDNJGMXLN-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
- Y10S205/917—Treatment of workpiece between coating steps
Definitions
- a composite electrode comprising a refractory metal support to which is bonded a non-porous ductile platinum group metal coating, the coating being from 0.02 to 1 mil in thickness and having a surface roughness of less than microinches (RMS), and a method for producing the same are disclosed.
- Such anodes exhibit chlorine overvoltages at 500 amps/ft. of between 0.5 and 1.0 volt and are particularly useful for electrochemical processes.
- the electrode is made by electrodeposition of the platinum coating on the support followed by heat-treating and mechanical working.
- This invention relates to metallic electrodes for use in electrolysis processes and, in particular, to improved anodes having a refractory metal core coated with a platinum group metal coating, and to a method of producing such electrodes.
- Graphite has a number of disadvantages, in that it under goes continual disintegration and must be replaced frequently, thereby causing interruption of the electrochemical process. Further, disintegration of the graphite causes deposition of fine grain of graphite in the diaphragms which surround the electrode necessitating frequently cleaning or replacement of the diaphragms along with the electrodes.
- platinum metal anodes can be of pure platinum or, as more recently taught in the literature, can comprise a corrosion-resistant core metal such as titanium or titanium alloys partially or completely clad with a platinum metal sheath or covering.
- anodes which are employed in electrolytic processes are required to have certain favorable currentcarrying characteristics for economic operation.
- the anode should be highly conductive and capable of carrying a high current load, i.e. operable at the highest possible current density, without undue polarization.
- Electrodes having a refractory metal core, especially a titanium or titanium alloy core partially or completely coated with a platinum group metal have uniquely provided many of the physical characteristics necessary for optimum utilization in electrolytic reactions, especially brine electrolysis.
- the chemical resistance of titanium oxide which forms on the unplated surface, or Within pores of the platinum plated area prevents corrosive attack by the electrolyte, while the platinum metal surface acts as the effective conductor. It has been found, however, that while oxidation of the core material prevents corrosion thereof, the formation of oxides, when the platinum coating is not sufficiently adherent, results in erosion of the platinum metal plating normally used to provide the conducting surface. Since only the platinum plated area is an effective conductor in such anodes, the voltage requirements increase as the platinum plated area diminishes due to erosion. These anodes must be replated therefore, with the loss not only of precious metal values but of operating time and materials.
- platinum surface must be of such nature as to provide low overvoltage characteristics in brine electrolysis.
- solid platinum has high chlorine overvoltage characteristics, and it has been proposed to provide a smooth electroplated coating of platinum on a titanium core with a platinum surface layer such as platinum black which provides the desired anode overvoltage characteristics.
- Electrodes having a titanium or titanium alloy core partially or completely coated with a platinum group metal have also been suggested for use in electrolytic cells for the production of percompounds such as perchlorates. It is known that the electrical characteristics of anodes used in such cells should be as close to bulk platinum as possible. That is, the percompounds are produced at a high anode over-voltage. Therefore, the electrode material, in this case the platinum group metal coating, should have a high overvoltage.
- a composite electrode is comprised of a refractory metal base having a smooth
- substantially nonporous ductile coating of platinum group metal of from about 0.02 to about 1 mil thickness having a surface roughness of less than about 10 microinches and having a chlorine overvoltage of between 0.5 to 1.2 volts at a current density of 500 amps/ sq. ft.
- Such composites are especially useful as anodes in electrolytic cells for the production of percompounds and are also particularly useful as base structures for low overvoltage platinum group metal coatings.
- such composites when overcoated with a low overvoltage coating are used in electrolytic cells in which gases are produced at low overvoltages such as in the production of chlorine in the electrolysis of brine.
- Anodes of this structure are particularly suited for chlorine electrolysis because, in use, the extent or degree of erosion of the low overvoltage layer can readily be determined by cell overvoltage measurements, and the utilization of the anode terminated when the overvoltage indicates that the anode has lost all or substantially all of the low overvoltage surface coating. At such time, the smooth, impervious protective layer of platinum group metal will still be intact, and is readily recoated with low overvoltage surface coating for reuse. By insuring that a substantially impervious platinum metal layer is present at all times, formation of oxidic coatings on the base metal which would result in peeling or erosion of the platinum group metal surface layer is avoided.
- the base metal substrate is first provided with an adherent, ductile, and smooth precious metal coating of high purity and a thickness of from about 0.03 to about 1 mil.
- the base metal substrate comprises a refractory metal selected from the group consisting of titanium, tantalum, niobium, zirconium, tungsten, molybdenum and alloys thereof. Titanium and tantalum, and alloys thereof having anodic polarization properties comparable to those of the pure metals are preferred.
- the ductile precious metal coating is a metal or alloy of the platinum group metals.
- a platinum group metal is meant one of the following: ruthenium, rhodium, palladium, osmium, iridium and platinum.
- the base metal substrate commercially pure titanium or tantalum and a titanium-zirconium alloy containing 5% by weight zirconium may be mentioned.
- the platinum group metal may be, for example, pure platinum, alloys of platinum and palladium containing or 20% of the latter, pure rhodium, platinum-rhodium and platinum-iridium alloys or osmium-iridium alloys.
- the platinum metal coating must be formed on the base metal in accordance with certain specific procedures.
- the base preferably in cleaned and roughened condition, is first coated with a ductile precious metal coating of high purity and thickness of about 0.03 to 1 mil.
- the coated substrate is then heat treated at a temperature between about 700 and 1400 C., preferably 800 to 1100 C., in a non-oxidizing atmosphere to interdifiuse the precious metal and base metal at the interface.
- the composite material is mechanically treated, as by passing through a rolling mill, to provide a thin substantially nonporous lustrous precious metal surface having a thickness of 0.02 to 1 mil and a surface finish of less than ten microinches.
- the initial platinum metal coating is desirably from about 0.03 to 1 mil in thickness.
- the initial coating should be at least about .03 mil in thickness. Below such thickness, the coating does not retain its integrity on being subjected to the heat treatment.
- the platinum group metal coating can, of course, be thicker than 1 mil, but, for economic considerations, such thicker coatings are not desirable.
- the platinum group metal coating In addition to the required thickness for good adherence and integrity of the surface, the platinum group metal coating must be ductile. A very ductile coating lends itself readily to the mechanical treatment step because this step compresses and spreads the platinum coating so that the pores therein are sealed.
- Such coatings can, for example, be compared with platinum deposits electroplated from electrolytes containing platinum as the commercial alkali metal hexahydroxy platinate baths, which do not provide platinum coatings of suitable ductility and which, accordingly, cannot be mechanically treated to provide a platinum surface of the desired smoothness and imperviousness.
- the desired surface roughness of the titanium will vary with the thickness of the initial platinum group metal deposit. For thinner deposits, a smoother surface is required, but the surface must be rough enough for good keying. For example, with an initial coating of about .microinches thickness, a surface roughness of 30 to 60 microinches is preferred; for a coating of about 250 microinches thickness, the surface roughness may be about microinches; for a very thin coating of 20 to 30' microinches, the roughness may be about 15 microinches.
- the platinum metal layer will follow the contour of the substrate, and the plated product will have a corresponding, or slightly reduced, surface roughness.
- anodes of the present invention are prepared by heating the coated substrate at a temperature of about 700 to 1400 C., preferably 800 to 1100 C. in a non-oxidizing atmosphere to interdiffuse the platinum group metal and base metal at the interface prior to mechanical treatment.
- An inert atmosphere is essential in the heating step, since at this stage the platinum metal layer is ordinarily quite porous.
- the time of heating is not critical, but should be sufficient to provide the desired degree of interdiffusion, for example about A to 4 hours, generally one hour sufiices.
- U.S. Patent 2,719,797 which teaches similar diffusion treatment of platinum-coated tantalum.
- the anode is cooled in an inert atmosphere, and thereafter mechanically treated to obtain the desired smooth surface having high chlorine overvoltage characteristics.
- the smooth, lustrous, nonporous surface may be obtained by such techniques as burnishing, rolling, drawing or swaging.
- Suitable composite anodes have a surface finish of less than microinches (root mean square) as determined by Profilo meter or other comparable surface roughness measuring instruments. In order to obtain the necessary smooth surface, rolls or dies smoother than 10 microinch surface roughness are employed for the mechanical treatment step.
- the composite material prepared in accordance with the foregoing detailed procedure, and having a smooth, lustrous surface of platinum metal displays a chlorine overvoltage of between 0.5 and 1.2 volts at anode current densities of about 500 amps/ft. similar to smooth platinum sheet, and is itself suitable as an anode in electrolytic cells for the production of percompounds.
- the platinized titanium composite is further coated with a layer of fine-divided or porous platinum which exhibits chlorine overvoltage of 0.025 to 0.2 volt at comparable anode current densitities.
- Such finely-divided platinum surface layer can be in the form of platinum black, or a porous metallic platinum layer which is deposited by electroplating, decomposition of platinum-containing paints, etc., in a manner known to the art.
- the resultant anode is particularly suited for chlorine electrolysis since the low overvoltage surface coating is worn off through use, and the condition of the anode is readily determined by simple observation of the voltage increase necessary for the continued operation of the chlorine electrolysis cell.
- the overvoltage rises to about 50% of the difference between the theoretical reversible voltage and the voltage of bulk platinum, the anode is removed for recoating. At such time, the smooth, lustrous platinum coating is undamaged, and readily re coated with the desired low overvoltage surface coating.
- EXAMPLE 1 A sample of 0.040 in. thick titanium, approximately 6 x 12 in. in size was etched and cleaned by soaking in 30% muriatic acid for a period of 18 hours. The surface was etched to about 50 microinch (RMS) surface roughness.
- Platinum (as Pt(NH (NO g./l 6.5 Disodium phosphate g./l 100 Diammonium phosphate g./l 20 Ammonium hydroxide ml./l 10 Plating was effected at 80 C. with a current density of 45 ampere/ft. for 90 minutes, with moderate agitation, using a platinum anode. After 90 minutes, the titanium sample was coated with a platinum layer 0.120 mil thick as determined by beta ray black-scattering.
- the electroplated sample was then heat treated in flowing, pure argon for one hour at 800 C. and finally cooled in argon atmosphere before removal from the furnace.
- the sample was then roll-milled using 12 inch wide rolls, 10 inch in diameter with a surface roughness of less than 2 microinches.
- the sample was passed through the mill about six times which resulted in a thickness reduction from 0.040 to 0.033 inch.
- the platinum finish was bright and mirror-like, and exhibited surface roughness less than five microinches (RMS)
- the chlorine overvoltage characteristics of the coated sample were determined in a brine solution using a conventional Luggin capillary and saturated calomel reference electrode system. At 500 amps/ftfl, the chlorine overvoltage of this sample was 0.69, substantially identical with that of a polished sheet of platinum, which has an overvoltage of 0.68 at the same current density.
- Example 2 The coated titanium sheet prepared in Example 1 was painted with a coating of a thermally reducible platinumbearing compound in an organic vehicle, and fired in air at 500 C. for 30 minutes. The surface roughness before application of the paint was about two microinches, and after firing about 50 microinches. Chlorine overvoltage measurements showed a decrease from about 0.6 volt for the smooth surface to about 0.1 volt for the rough surface.
- EXAMPLE 3 A piece of titanium 2" x 6" x 0.040" was etched in concentrated hydrochloric acid for a period of 18 hours and then rinsed with water and scrubbed to remove surface film and fine particles lodged in pores. After rinsing in distilled water, the piece was coated with 0.15 mil of platinum by electrodeposition in a P salt bath of the composition described in Example 1.
- the coated sheet was cut in half to make two 1" x 6" x 0.040" samples and the samples were numbered 1 and 2 respectively.
- Sample No. 1 was heated in argon at 800 C. for 1 hour and after cooling was rolled to approximately 1" x 7" in size.
- Sample No. 2 was first rolled to approximately 1" x 7" in size, and then heated in argon at 800 C. for 1 hour and cooled.
- EXAMPLE 4 A piece of titanium 2" x 6" x 0.040" was etched in concentrated hydrochloric acid and coated with 0.15 mils platinum as described in Example 1.
- the coated sheet was cut in half making two 1 x 6" x 0.040" sample and these samples were numbered 3 and 4.
- Sample No. 3 was heated in argon to 800 C. for 1 hour and after cooling rolled to approximately 1" x 7" in size.
- the rolled sample had a surface finish roughness of less than 5 microinches.
- Chlorine overvoltage measurements were made on both Samples 3 and 4 as described in Example 1.
- Sample No. 3 showed a chlorine overvoltage of 0.68 volt at 500 amps/sq. ft.
- Sample No. 4 showed a chlorine overvoltage of 0.45 volt at the same current density.
- the chlorine overvoltage for Sample No. 3 was 200 to 250 millivolts greater than that for Sample No. 4 at 500 amps/sq. ft.
- Sample No. 4 showed an overvoltage considerably below that for bulk platinum.
- EXAMPLE 5 A piece of titanium was etched, coated with platinum halved, and one half treated in argon and rolled as described in Examples 3 and 4. The treated half is referred to as Sample No. 5 and the untreated half as Sample No. 6.
- Sample No. 5 (treated) and Sample No. 6 (untreated) were soaked in concentrated hydrochloric acid for 24 hours, and then boiled in concentrated sulfuric acid for 6 hours, and afterwards inspected for platinum adherence.
- a method of producing a composite electrode which comprises the steps of:
- a method of producing a composite electrode which comprises the steps of:
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US55567066A | 1966-06-07 | 1966-06-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3461058A true US3461058A (en) | 1969-08-12 |
Family
ID=24218176
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US555670A Expired - Lifetime US3461058A (en) | 1966-06-07 | 1966-06-07 | Method of producing a composite electrode |
Country Status (6)
Country | Link |
---|---|
US (1) | US3461058A (enrdf_load_stackoverflow) |
CH (1) | CH486915A (enrdf_load_stackoverflow) |
DE (1) | DE1671426A1 (enrdf_load_stackoverflow) |
GB (1) | GB1171407A (enrdf_load_stackoverflow) |
NL (1) | NL6707846A (enrdf_load_stackoverflow) |
NO (1) | NO120227B (enrdf_load_stackoverflow) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4214017A (en) * | 1979-03-29 | 1980-07-22 | Board of Regents, State of Florida, for the use and benefit of the University of Florida | Preparation of platinum-coated substrates |
US4240878A (en) * | 1979-11-02 | 1980-12-23 | Sybron Corporation | Method of forming a platinum layer on tantalum |
US4330376A (en) * | 1979-03-05 | 1982-05-18 | Atlantic Richfield Company | Process for inhibiting titanium corrosion |
US4342577A (en) * | 1980-10-27 | 1982-08-03 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4348216A (en) * | 1980-10-27 | 1982-09-07 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4402719A (en) * | 1980-10-27 | 1983-09-06 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4402718A (en) * | 1980-10-27 | 1983-09-06 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4404009A (en) * | 1982-12-22 | 1983-09-13 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4427428A (en) | 1980-10-27 | 1984-01-24 | Owens-Corning Fiberglas Corporation | Feeder for forming glass fibers and method for making feeder |
US4430105A (en) | 1980-10-27 | 1984-02-07 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US5925045A (en) * | 1993-11-10 | 1999-07-20 | Mentor Corporation | Bipolar electrosurgical instrument |
FR2992661A1 (fr) * | 2012-06-27 | 2014-01-03 | Amc Etec | Electrode, son procede de fabrication et son application a l'electrolyse. |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1457511A (en) * | 1973-02-08 | 1976-12-01 | Imp Metal Ind Kynoch Ltd | Composite body electrodes for electrolytic processes |
DE2645414C2 (de) * | 1976-10-08 | 1986-08-28 | Hoechst Ag, 6230 Frankfurt | Titananoden für die elektrolytische Gewinnung von Mangandioxid, sowie ein Verfahren zur Herstellung dieser Anoden |
JPS5647597A (en) * | 1979-09-25 | 1981-04-30 | Nippon Steel Corp | Insoluble electrode for electroplating and preparation thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2719797A (en) * | 1950-05-23 | 1955-10-04 | Baker & Co Inc | Platinizing tantalum |
US3102086A (en) * | 1957-07-26 | 1963-08-27 | Ici Ltd | Method of improving the corrosion resistance of titanium metals |
US3115702A (en) * | 1959-11-12 | 1963-12-31 | Johnson Matthey Co Ltd | Production of composite metal sheet or strip |
US3177131A (en) * | 1959-04-27 | 1965-04-06 | Ici Ltd | Method for the production of platinum coated titanium anodes |
US3287250A (en) * | 1962-05-28 | 1966-11-22 | Pittsburgh Plate Glass Co | Alkali-chlorine cell containing improved anode |
-
1966
- 1966-06-07 US US555670A patent/US3461058A/en not_active Expired - Lifetime
-
1967
- 1967-06-05 GB GB25936/67A patent/GB1171407A/en not_active Expired
- 1967-06-06 NL NL6707846A patent/NL6707846A/xx unknown
- 1967-06-06 NO NO168481A patent/NO120227B/no unknown
- 1967-06-06 CH CH800367A patent/CH486915A/de not_active IP Right Cessation
- 1967-06-07 DE DE19671671426 patent/DE1671426A1/de active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2719797A (en) * | 1950-05-23 | 1955-10-04 | Baker & Co Inc | Platinizing tantalum |
US3102086A (en) * | 1957-07-26 | 1963-08-27 | Ici Ltd | Method of improving the corrosion resistance of titanium metals |
US3177131A (en) * | 1959-04-27 | 1965-04-06 | Ici Ltd | Method for the production of platinum coated titanium anodes |
US3115702A (en) * | 1959-11-12 | 1963-12-31 | Johnson Matthey Co Ltd | Production of composite metal sheet or strip |
US3287250A (en) * | 1962-05-28 | 1966-11-22 | Pittsburgh Plate Glass Co | Alkali-chlorine cell containing improved anode |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4330376A (en) * | 1979-03-05 | 1982-05-18 | Atlantic Richfield Company | Process for inhibiting titanium corrosion |
US4214017A (en) * | 1979-03-29 | 1980-07-22 | Board of Regents, State of Florida, for the use and benefit of the University of Florida | Preparation of platinum-coated substrates |
US4240878A (en) * | 1979-11-02 | 1980-12-23 | Sybron Corporation | Method of forming a platinum layer on tantalum |
US4402718A (en) * | 1980-10-27 | 1983-09-06 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4348216A (en) * | 1980-10-27 | 1982-09-07 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4402719A (en) * | 1980-10-27 | 1983-09-06 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4342577A (en) * | 1980-10-27 | 1982-08-03 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4427428A (en) | 1980-10-27 | 1984-01-24 | Owens-Corning Fiberglas Corporation | Feeder for forming glass fibers and method for making feeder |
US4430105A (en) | 1980-10-27 | 1984-02-07 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US4404009A (en) * | 1982-12-22 | 1983-09-13 | Owens-Corning Fiberglas Corporation | Method and apparatus for forming glass fibers |
US5925045A (en) * | 1993-11-10 | 1999-07-20 | Mentor Corporation | Bipolar electrosurgical instrument |
US5972416A (en) * | 1993-11-10 | 1999-10-26 | Mentor Corporation | Bipolar electrosurgical instrument and method for making the instrument |
FR2992661A1 (fr) * | 2012-06-27 | 2014-01-03 | Amc Etec | Electrode, son procede de fabrication et son application a l'electrolyse. |
Also Published As
Publication number | Publication date |
---|---|
NO120227B (enrdf_load_stackoverflow) | 1970-09-21 |
NL6707846A (enrdf_load_stackoverflow) | 1967-12-08 |
GB1171407A (en) | 1969-11-19 |
CH486915A (de) | 1970-03-15 |
DE1671426A1 (de) | 1971-09-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: ENGELHARD CORPORATION 70 WOOD AVENUE SOUTH, METRO Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:PHIBRO CORPORATION, A CORP. OF DE;REEL/FRAME:003968/0801 Effective date: 19810518 |