US3342606A - Photographic resin compositions - Google Patents
Photographic resin compositions Download PDFInfo
- Publication number
- US3342606A US3342606A US574293A US57429366A US3342606A US 3342606 A US3342606 A US 3342606A US 574293 A US574293 A US 574293A US 57429366 A US57429366 A US 57429366A US 3342606 A US3342606 A US 3342606A
- Authority
- US
- United States
- Prior art keywords
- silver
- compositions
- composition
- phenolic resin
- photographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011342 resin composition Substances 0.000 title description 4
- 239000000203 mixture Substances 0.000 claims description 90
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 80
- 229920001568 phenolic resin Polymers 0.000 claims description 58
- 239000005011 phenolic resin Substances 0.000 claims description 56
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 46
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 40
- 238000000576 coating method Methods 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 19
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 36
- 229920005989 resin Polymers 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 28
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 24
- 229910052709 silver Inorganic materials 0.000 description 22
- 239000004332 silver Substances 0.000 description 22
- 229920003986 novolac Polymers 0.000 description 21
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 19
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 19
- 239000002253 acid Substances 0.000 description 19
- 239000002904 solvent Substances 0.000 description 19
- -1 silver halides Chemical class 0.000 description 18
- 229920000642 polymer Polymers 0.000 description 16
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 14
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 14
- 229920003987 resole Polymers 0.000 description 13
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- OKJPEAGHQZHRQV-UHFFFAOYSA-N iodoform Chemical compound IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 9
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 7
- 239000000654 additive Substances 0.000 description 7
- 238000001035 drying Methods 0.000 description 7
- 229920001519 homopolymer Polymers 0.000 description 7
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000000839 emulsion Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 5
- 206010034972 Photosensitivity reaction Diseases 0.000 description 5
- 229910021612 Silver iodide Inorganic materials 0.000 description 5
- 238000009472 formulation Methods 0.000 description 5
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 5
- 229940006461 iodide ion Drugs 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- 230000036211 photosensitivity Effects 0.000 description 5
- 235000013824 polyphenols Nutrition 0.000 description 5
- 229940045105 silver iodide Drugs 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- 150000001299 aldehydes Chemical class 0.000 description 4
- 229920000159 gelatin Polymers 0.000 description 4
- 239000008273 gelatin Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 4
- 108010010803 Gelatin Proteins 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 235000019322 gelatine Nutrition 0.000 description 3
- 235000011852 gelatine desserts Nutrition 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003678 scratch resistant effect Effects 0.000 description 3
- JUGRTVJQTFZHOM-UHFFFAOYSA-N 1,1,1-tribromo-2-methylpropan-2-ol Chemical compound CC(C)(O)C(Br)(Br)Br JUGRTVJQTFZHOM-UHFFFAOYSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical class [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical class [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical class [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- LVIYYTJTOKJJOC-UHFFFAOYSA-N nickel phthalocyanine Chemical class [Ni+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 LVIYYTJTOKJJOC-UHFFFAOYSA-N 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229910001923 silver oxide Inorganic materials 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 229950004616 tribromoethanol Drugs 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- VRPLZTMSEURZKM-UHFFFAOYSA-N 1,1-dibromoethanol Chemical compound CC(O)(Br)Br VRPLZTMSEURZKM-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- LDLCZOVUSADOIV-UHFFFAOYSA-N 2-bromoethanol Chemical compound OCCBr LDLCZOVUSADOIV-UHFFFAOYSA-N 0.000 description 1
- DBTWOTKWIVISQR-UHFFFAOYSA-N 2-bromopropan-1-ol Chemical compound CC(Br)CO DBTWOTKWIVISQR-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical compound C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- HQWKMYFWGMCJSW-UHFFFAOYSA-N 3,3,3-tribromo-2,2-dimethylpropan-1-ol Chemical compound OCC(C)(C)C(Br)(Br)Br HQWKMYFWGMCJSW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QNGVNLMMEQUVQK-UHFFFAOYSA-N 4-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1 QNGVNLMMEQUVQK-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910001516 alkali metal iodide Inorganic materials 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- MIAUJDCQDVWHEV-UHFFFAOYSA-N benzene-1,2-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1S(O)(=O)=O MIAUJDCQDVWHEV-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- OEDMOCYNWLHUDP-UHFFFAOYSA-N bromomethanol Chemical compound OCBr OEDMOCYNWLHUDP-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000013742 energy transducer activity Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000004312 hexamethylene tetramine Substances 0.000 description 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- CBOIHMRHGLHBPB-UHFFFAOYSA-N hydroxymethyl Chemical compound O[CH2] CBOIHMRHGLHBPB-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910001505 inorganic iodide Inorganic materials 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920006112 polar polymer Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000026954 response to X-ray Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 description 1
- 229910000367 silver sulfate Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- YFDSDPIBEUFTMI-UHFFFAOYSA-N tribromoethanol Chemical compound OCC(Br)(Br)Br YFDSDPIBEUFTMI-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/496—Binder-free compositions, e.g. evaporated
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/725—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing inorganic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0381—Macromolecular compounds which are rendered insoluble or differentially wettable using a combination of a phenolic resin and a polyoxyethylene resin
Definitions
- the present invention relates to novel photographic compositions and more particularly to photographic compositions which are based on a silver nitrate/ polymeric resin system.
- the silver halides are inherently limited by the relationship between speed and resolution. That is to say increased speed, or photoresponse, is generally accompanied by a loss of resolution.
- the image is composed of discrete crystals or grains. When a grain absorbs sufficient light, the entire grain is developable, that is, all the silver in the grain can be reduced.
- the tones of the images are composed of developed grains differing somewhat in size but with tone distinction due to the concentration of developed grains and not to size. Each grain is totally developed or is completely removed by the fiXing solution.
- the size of the grain governs the speed of the emulsion.
- the larger the grain the greater the efiiciency of photon capture.
- the speed increases with grain size but the concomitant result is that resolu- 1 tion declines as speed increases with larger grains.
- the gelatin emulsion media is limited in that it is a relatively soft material requiring hardening procedures.
- the preparation of the silver halide gelatin emulsion is highly critical and must be conducted under highly controlled conditions.
- the emulsions themselves are light sensitive and must "be handled and stored under relatively light free conditions.
- compositions of the present invention derive their photosensitivity from silver nitrate which is not normally photoresponsive by itself in the sense that silver halides are, but which is chemically reducea'ble to metallic silver in the presence of any conventional developing agent.
- the compositions of this invention are photosensitive. That is, when the compositions are exposed to a light image, a latent image forms which is reduceable at a much faster rate than the composition which has not been exposed to light. Accordingly, the latent image can be reduced by a suitable developing agent to form a visible image.
- the present compositions are believed to produce an image through dye formation upon development as well as reduced silver formation and is not subject to the inherent deficiencies of the silver halide systems. Additionally, the present compositions are much more easily prepared.
- the coating compositions exhibit little 'or no photoresponse until after drying, and light free conditions are therefore not required for their preparation. When these compositions have been applied to a suitable substrate and dried, they provide a hard, scratch resistant, permeable surface.
- compositions which provide latent images within a resin composition.
- the images can be developed and the plates can be desensitized or fixed with use of proper materials.
- These compositions basically comprise:
- condensation products (1) phenolic resin, and (2) silver nitrate condensation products of a phenol with an aldehyde.
- condensation products are divided into two classes, resoles and novolaks, either of which can be used in this invention.
- the fusible resole phenolic resins can advance upon heating to a degree of cure and polymerization to attain a completely infusible and insoluble state.
- those heat fusible phenolic resins which are soluble in water or organic solvents such as acetone, ethanol and the like and which are sufliciently fusible to permit admixture and association with the ethylene oxide polymers can be used.
- These resins include those resole phenolic resins which have not cured to a degree of insolubility as well as the novolak phenolic resins discussed below.
- Resole resins are produced by the condensation of phenols and aldehydes under alkaline conditions such as in the presence of sodium carbonate, sodium acetate, sodium hydroxide, ammonium hydroxide or the like, When the condensation reaction is complete, if desired, the water and other volatile materials can 'be removed by distillation, and the catalyst neutralized.
- N ovolak resins The novolak resins are prepared in a manner similar to that used to prepare the resole resins.
- the distinguish- OH HO- Resoles differ from novolaks in that polynuclear methylol-substituted phenols are formed as intermediates in resoles. These intermediates most likely have the structure illustrated.
- the dehydrated resole may contain a preponderance of methylene ether linkages as well as some methylol groups as illustrated
- Phenolic resins are prepared by the condensation of phenol with formaldehyde or, more generally, by the reaction of a phenolic compound, having two or three reactive aromatic ring hydrogen positions, with an aldehyde or aldehyde-liberating compound capable of undergoing phenol-formaldehyde condensation.
- phenolic compounds which can be used in the preparation of the phenolic resins useful in the present compositions are cresol, xylenol, ethylphenol, butylphenol, isopropyleneethoxyphenol, chlorophenol, resorcinol, hydroquinone, naphthol, 2,2-bis(p-hydroxyphenyl)propane, and the like.
- aldehydes which can be used in the preparation or the phenolic resins useful in the present compositions are formaldehyde, acetaldehyde, acrolein, crotonaldehyde, furfural, and the like.
- Suitable aldehyde-liberating compounds which can be used to prepare phenolic resins are for example, paraformaldehyde, formalin, and 1,3,5-trioxane.
- Ketones such as acetone are also capable of condensing with the phenolic compounds, as are methylene engendering agents such as hexamethylenetetramine.
- novolaks are prepared by heating one mole of phenol with 0.5 mole of formaldehyde under acidic conditions.
- the temperature at which the reaction is conducted is generally from about 25 C. to about C.
- the reactants are the same as those used in the preparation of the resoles which are described and listed above.
- a typical syntheses of resoles involves heating one mole of phenol with 1.5 mole of formaldehyde under alkaline conditions.
- the novolak resins While as previously stated both the resole resins and the novolak resins can be employed in the composition of the present invention, it is preferred to use the novolak resins since these produce materials of greater photo-- sensitivity and particularly novolak resins prepared from phenols which are unoccupied in the ortho or para position to the phenolic hydroxyl. Especially preferred are the so-called high 2,2 novolak resins. These resins contains a high percentage of compounds of the structure:
- the silver nitrate component of the compositions of this invention is used in an optimum amount of one part to 15 parts phenolic resin. There is no clear cut lower limit of silver nitrate to phenolic resin except the amount desired to produce an image density which is desired, i.e., the less an amount of silver nitrate present the weaker will be the developed image. A ratio of one part silver nitrate to 30 parts of phenolic resin can be established as an effective lower limit.
- the upper limit for the amount of silver nitrate is determined by the amount of fog or haze which is acceptable. When silver nitrate is present in an amount of about one part per seven parts of phenolic resin an objectionable fog begins to develop. While as indicated in the foregoing, there is no clear cut limitations as to the amount of silver nitrate, a desired range is from one part silver nitrate to about 10 parts phenolic to one part silver nitrate to about 20 parts of phenolic,
- the resin is not adjusted to a pH of less than 7 the resin will gradually reduce the silver in the non-image areas of the developed plate. It is therefore desirable to so adjust the composition if the plate is to be stored for any long period of time. This is conveniently accomplished through the addition of acidic additives which is discussed hereinafter.
- Photographic resin systems containing only phenolic resin as the resinous component exhibit hard highly scratch-resistant surfaces but which are relatively impermeable to aqueous developing systems and accordingly, organic solvent containing development systems must be used.
- ethylene oxide polymer as used herein is intended to include ethylene oxide homopolymers as well as copolymers of ethylene oxide with other alkylene oxides such as propylene oxide, butylene oxide, styrene oxide and the like in minor amounts copolymerized with ethylene oxide.
- Ethylene oxide polymers which can be used in the present invention are those which have molecular weights in excess of 30,000 and preferably from 50,000 to ten million.
- hydrophilic linear polar polymer addition When used, it is generally used in an amount of from 0.1 to 2 parts per part phenolic resin and preferably from 0.5 to 1 part per part phenolic resin.
- the presence of these optional resins present in the preferred amounts is usually sufficient to impart water permeability to the photosensitive resin and enable development with aqueous developer.
- photoresponse or speed of the composition of the present invention can be increased by incorporating various additives in the compositions.
- additives which can be used singly or in combination are as follows:
- Any acid may be used which will neither reduce nor precipitate the silver ion.
- Such as acid is herein defined as a compatible acid.
- formic acid is not a compatible acid since it will reduce silver ion to silver metal.
- Sulfuric acid is not suitable since it will precipitate silver sulfate.
- a compatible acid will neither reduce silver ions to metallic silver or precipitate silver as an insoluble salt.
- acids of the organic type in general are suitable and compatible
- the organic sulfonic acids have been found to appreciably increase the photosensitivity of the coatings in addition to this function of preventing darkening of the solutions.
- these acids are benzenesulfonic acid, naphthalenesulfonic acid, benzene disulfonic acid and so forth.
- a preferred acid is toluenesulfonic acid since it imparts very marked increase in photoresponse.
- the acid additives are generally used in a neutralization amount which is usually from 0 to 0.5 part per part phenolic resin.
- the amount of acid necessary varies with the alkalinity of the resin components and the solvent.
- desirable compositions of this invention can be obtained by using pre-neutralized or pre-acidified resins.
- p-toluene sulfonic acid as the neutralizing acid.
- the pH of the composition should be less than 7.
- Nickelous salts preferably nickelous nitrate
- added to the coating solution will result in developed images of greater density.
- other metallic salts which neither precipitate nor reduce the silver ion can be incorporated into the coating solution to improve the image density although their effect is less pronounced than that of the nickelous salts.
- the increase in image density is for practical purposes an increase in photoresponse since shorter exposures will allow development of highlight tones which otherwise are too weak to be visible.
- Salts of zinc, cadmium and mercury produce only marginal increases in density while cobalt and chromium salts are more effective but not as effective as nickelous salts.
- the salts are used in the composition of the present invention in an amount of from 0.001 to 0.5 part per part of silver nitrate.
- Halogenated lower alkanols such as bromomethanol, dibromoethanol, tribromoethanol, 2-brornoethanol, 2,2- bromoethanol, 1,1,l-tribromoethanol, 2-bromopropanol, 2 chloro 3,3-dibromopropanol, 3,3,3-tribromo-2,2-dimethylpropanol, 1,l,1-tribromo-2-methyl-2-propanol and the like are suitable.
- the amounts of brominated alkanols used are not critical. Amounts of from 0 to 5 parts per part of silver nitrate produce satisfactory results.
- 1,l,l-tribromo-2-methyl-2-propanol is a particularly effective additive.
- Iodide ion As indicated above the halogenated alkanols increase the speed of the composition, but the presence of iodide ion is also very effective in increasing speed and also increasing photoresponse to visible light. While the presence of silver iodide in conventional systems serves to increase speed, in the present compositions it is believed that the speed increase is caused by a different mechanism than through the formation of silver iodide.
- the iodide ion can be used as soluble inorganic iodide such as alkali metal iodides or in the form of iodoform, ethyl iodide or other suitable material.
- the iodide ion donor material can be added in an amount of about one equivalent per 40 equivalents of silver ion present or in the case of iodo form about 0.05 gram per 0.5 gram of silver nitrate.
- compositions of this invention are to be used for the preparation of X-ray plates
- finely divided fluorescent screen materials can be incorporated directly into the composition to enhance the response to X-ray. This technique when utilized obviates the use of auxiliary screen as is used today conventionally. Any of the materials which are fluorescent under the effect of X-ray can be used as filler materials provided they are sufficiently finely divided to be easily dispersed in the composition.
- compositions of the present invention are conveniently prepared by dissolving the ingredients in a suitable solvent.
- a suitable solvent is one which will dissolve the resinous components of the composition, i.e., ethylene oxide polymer when present, and phenolic resin, and the silver nitrate component.
- Suitable solvents include dimethylformamide, methylene dichloride and methanol in a ratio of three to one, Cellosolve and methanol or ethanol in a ratio of six to one.
- a solvent is dimethyl formamide, as this solvent dries quickly and produces excellent quality plates. It is desirable however to neutralize the dimethyl formamide with an acid, preferably with an organic acid, as discussed above relative to the resin components, since silver nitrate solution of unacidified dimethyl formamide will darken, presumably due to silver formation or silver oxide formation.
- compositions While the present compositions are in solution, they exhibit no photoresponse to either light or X-rays and as a result can be stored indefinitely withouttaking any of the precautions normally required by the conventional light sensitive silver halide compositions. If, however, halogenated alkanols are present in these compositions and it is desired to store these solutions for periods in excess of 24 hours, then it has been found desirable to store them at temperatures of about C. At this reduced temperature these solutions can be stored indefinitely.
- the solutions can be utilized for general photographic use by coating the solutions onto a suitable substrate.
- the coating is applied directly from the solution by any of the conventional coating techniques known to the art. Such techniques include dipping, roller coating, knife coating, spray coating and the like.
- the coating is applied to the substrate to a dried coating thickness of from about 0.05 to about 0.5 mil.
- Substrates which can be used to support the composition coatings include any surface which is wettable, and which is not attacked or dissolved by the solvent used. Suitable substrates include: paper; metal foil or sheet made from copper, aluminum, steel and the like; glass sheets; and plastic film and sheet made from materials such as polyethylene terephthalate polyvinyl fluoride, polytetrafluoroethylene and the like.
- substrate is of course dependent upon the use to which the plate is to be used. For example if the plate is to be used as a negative or transparency then a clear substrate such as glass would be used. If the plate is desired for a use such as printing paper then a paper or metal substrate might be selected.
- the coating After the coating has been applied to the substrate, it can be dried at room temperature, i.e. 25 C. However, it has been found that the photosensitivity of the plate is greatly increased if the plates are thermally modified by drying at a temperature of from about 40 C. to about 80 C. and conveniently at about 50 C.
- the drying temperature is not critical the temperature should not exceed 100 C. as the coating can become damaged. It is important to note that while the solution of the compositions of this invention exhibit no photoresponse, the dried coating is highly photosensitive as discussed below. For this reason the drying step is conveniently effected in a light-tight oven or oven located in a dark room.
- the coated substrate hereinafter referred to as the photographic plate
- the photographic plate When the coated substrate hereinafter referred to as the photographic plate, has been dried it is sensitive to radiation in the range of from X-ray to ultra violet and sensitive to visible light except red and higher. For this reason red or ruby safe light can be used when handling the photographic plates.
- photographic plates can be used to great advantage in X-ray photography as well as in normal photographic uses.
- the plate When the photographic plate is used in regular photography the plate (or film roll) is mounted in a camera and exposed.
- the light source in such case can be sunlight, flash, photoflood or any other suitable light source.
- the exposure values are dependent upon the photoresponse of the plates as well as the light source, distance and so forth.
- aromatic diamine developers are, p-phenylene diamine, o-phenylenediamine, o-tolidine, 4 amino N,N-diethylaniline, 4-amino-N-ethyl-N(B-hy droxyethyl) aniline.
- Suitable developing solvents are those which dissolve the developing agent, dissolve silver salts, and do not attack the substrate.
- Illustrative of suitable developing solvents are methanol, ethanol, and a water and acetone mixture in equal parts.
- the developing solution should contain from 0.1 percent to 10.0 percent of the aromatic diamine developer. A 1.0 percent solution of p-phenylene diamine has been found to give outstanding results.
- the temperature of the developer solution directly affects the speed of development. The higher the temperature of the solution the more rapid the development of the plate. Reasonable development speeds can be obtained at room temperatures, i.e. about 25 C. At this temperature plates are generally developed in from 1 to 10 seconds.
- the color of the image developed is determined by the developer used. For example, 0- tolidine and p-phenylene diamine, produce a blue image; 4-amine-N,N-diethyl aniline produces a green image; and 4 amino-N-ethyl-N-(fi-hydroxyethyl) aniline produces a red-brown image.
- the plates After the plates have been developed they are desensitized or fixed by immersing the plates in a solution of a silver camplexing agent in a suitable solvent.
- a silver camplexing agent in a suitable solvent.
- the silver complexing agents are ammonium thiocyanate, tartaric acid, thiourea and the like.
- Suitable solvents for the fixing solutions are the same as those used in the developing solutions, such as ethanol, methanol and the like.
- compositions of the present invention exhibit advantages hitherto unavailable in the art. These compositions are easily prepared and stored under normal lighting conditions without the necessity for elaborate precaustion. The compositions are easily applied to a variety of substrates. The compositions can be easily modified to vary exposure rating speeds by the addition of various modifiers and additionally plates prepared from these compositions can be developed in from 1 to 10 seconds to give a permanent, apparently grainless image in a hard, scratch resistant matrix. These coating compositions can also be used to form printing paper normally used for positive prints. The image colors can be varied by the choice of developer.
- EXAMPLE I A 5 percent solution of ethylene oxide homopolymer having a molecular weight of from 100,000 to 500,000 and a reduced viscosity of from 1.2 to 4.2 (0.2 gram in milliliters of acetonitrile) was prepared in dimethyl formamide. To one-hundred milliliters of this solution was added and dissolved ten grams of a high 2,2'-novolak, phenolformaldehyde resin, one-half milliliter of concentrated nitric acid and one gram of silver nitrate. The final solution was clear and colorless.
- the solution was then coated onto a 5 mil thick Mylar substrate, allowed to drain, and then baked in a vacuum oven at a temperature of about 70 C. After a drying period of thirty minutes the film was removed and exposed.
- Development of the exposed plate was effected by im mersion in a one percent solution of p-phenylene diamine in methanol.
- the film was fixed in a ten percent solution of ammonium thiocyanate in methanol.
- the film was then rinsed in methanol and air-dried.
- the image was dense and blue-black in color.
- EXAMPLE II 5 percent solutions of ethylene oxide homopolymer in dimethylformamide was prepared.
- the ethylene oxide homopolymer had a molecular weight of from 100,000 to 500,000 and a reduced viscosity of 1.2 to 4.2 measured at a concentration of 0.2 gram in 100 milliliters of acetonitrile. This solution was divided into three 100 milliliter aliquots.
- three different photographic compositions were prepared from these solutions; they were then coated onto a film substrate exposed and developed. The formulations of the compositions and the relative speed obtained is shown in Table I below.
- compositions A, B, and C were equivalent in all respects in spite of the fact that they were given different exposures. This clearly indicates that the nickelous nitrate and the 1,1,1- tribromo-Z-propanol markedly increase the speed of these compositions.
- Example III Example I was repeated except that the ethylene oxide homopolymer was replaced by :an ethylene oxide/propylene oxide copolymer. This copolymer contained 3 percent propylene oxide copolymerized therein. It exhibited a reumbled viscosity of 7.4 measured at a concentration of 0.2 gram in 100 milliliters of acetonitrile. Plates prepared from this composition produced images equivalent to those produced by the plates of Example I.
- EXAMPLE IV A percent solution of ethylene oxide homopolymer in dimethyl formamide was prepared.
- the ethylene oxide homopolymer had a molecular weight of from 100,000 to 500,000 and a reduced viscosity of 1.2 to 4.2 measured at a concentration of 0.2 gram in 100 milliliters of acetonitrile. This solution was divided into three 100 milliliter aliquots.
- three dilferent photographic compositions were prepared from these solutions; they were then coated onto a film substrate, exposed and developed. The formulations of these compositions is shown in Table II below.
- compositions of D, E and F were developed on each of the plates made from the compositions of D, E and F. It was estimated however that composition F containing the high 2,2 novolak resin exhibited a photoresponse about 3 times greater than composition E containing novalak resin (non-high 2,2) and that composition E exhibited a photoresponse about 10 times greater than composition EXAMPLE V
- a solution of milliliters of N,N-dimethylformamide, 35 grams of a grindable, high 2,2- novolak resin prepared from phenol and formaldehyde, 4 grams of p-toluene sulfonic acid, 2.5 grams of silver nitrate and 1.5 grams of nickelous nitrate monohydrate is prepared by dissolving the solid ingredients in the N,N-dimethylformamide solvent with stirring.
- This solution is coated onto a glass plate by whirl coating and is then dried in a vacuum oven at a temperature of about 50 C.
- the plate When the plate is dry it is exposed through a negative to carbon are light source. The exposed plate is then developed by immersing in a 0.5 percent solution of p-phenylene diamine in methanol. The plate is developed immediately. After development the plate is fixed by immersion in a methanol solution of ammonium thiocyanate. A clear sharp image results.
- Example VI To the coating solution described in Example V above is added 0.05 gram of iodoform. The composition was coated onto a polyester resin substrate and dried in the same manner as described in Example V above.
- the plate was exposed in a camera to visible light and developed as described above.
- the image was sharp and apparently grainless.
- compositions were prepared identical to the above two functioning compositions wherein one part of water soluble (ethylene oxide) polymer L Polyox WSR- 305 was added per six parts of phenolic resin.
- the compositions were coated on substrate, dried and exposed as above. The plates were developed in an aqueous 0.5 percent solution of ethylene diamine. Good sharp images resulted immediately.
- a photographic composition comprising a phenolic resin and silver nitrate wherein the silver nitrate is present in a ratio of from about 1 part per 30 parts phenolic resin to 1 part to about 7 parts phenolic resin.
- iodide ion is present in an amount of from about one equivalent per 40 equivalents of silver ion.
- a photographic composition comprising (1) an ethylene oxide polymer having a molecular weight greater than 30,000, (2) a phenolic resin and (3) silver nitrate present in a ratio of from about 1 part to 30 to 1 part to 7 parts phenolic resin.
- a photographic plate comprising a thermally modified coating of the composition of claim 7 on a suitable substrate.
- composition of claim 7 wherein the ethylene oxide polymer is poly (ethylene oxide).
- a photographic composition comprising (1) an ethylene oxide polymer having a molecular weight greater than 30,000, (2) a novolak phenolic resin, (3) from to about part silver nitrate per part of phenolic resin, (4) a neutralizing amount of a compatible acid, (5) from to 0.5 part of nickelous nitrate per part of silver nitrate, and (6) from 0 to parts of a halogenated lower alkanol per part silver nitrate.
- a photographic plate comprising a thermally modified coating of the composition of claim 11 on a suitable substrate.
- composition of claim 11 wherein the halogenated lower alkanol is 1,1,1-tribromo-2-methyl-2-propanol.
- a photographic composition comprising (1) an ethylene oxide polymer having a molecular weight of from 50,000 to ten million, (2) from 0.5 to 3.0 parts of novolak phenolic resin per part of ethylene oxide polymer, (3) from about to about part of silver nitrate per part phenolic resin, (4) from 0 to 0.5 part of an organic sulfonic acid per part phenolic resin, (5) from 0 to 0.5 part of nickelous nitrate per part of silver nitrate, and (6) from 0 to 5 parts of 1,1,1-tribromo-2-methyl-2-propanol per part of silver nitrate.
- a photographic plate comprising a thermally modified coating of the composition of claim 14 on a suitable substrate.
- composition of claim 14 wherein the novolak phenolic resin is a high 2,2 novolak resin.
- composition of claim 14 wherein the ethylene oxide polymer is poly(ethylene oxide) and the organic sulfonic acid is p-toluenesulfonic acid.
- a light stable photographic coating solution comprising (1) an ethylene oxide polymer having a molecular weight greater than 30,000, (2) a phenolic resin, (3) from about ,5, to about part silver nitrate per part phenolic resin and (4) a suitable solvent.
- the method of preparing a photographic plate which comprises (1) preparing a solution of (a) a phenolic resin (b) from 0 to 2 parts of an ethylene oxide polymer per part of phenolic resin said polymer having a molec ular weight greater than 30,000, (0) from about to about part silver nitrate per part phenolic resin, (d) from 0 to 0.5 part of a silver ion compatible acid per part phenolic resin, (e) from 0 to 0.5 part of nickelous nitrate per part of silver nitrate, (f) from 0 to 5 parts of a halogenated lower alkanol, per part of silver nitrate, and (g) a suitable solvent; (2) coating a suitable substrate with said solution and (3) drying said coatings at a tem perature of from about C. to about C.
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Priority Applications (1)
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US574293A US3342606A (en) | 1964-01-13 | 1966-08-23 | Photographic resin compositions |
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US33717064A | 1964-01-13 | 1964-01-13 | |
US574293A US3342606A (en) | 1964-01-13 | 1966-08-23 | Photographic resin compositions |
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BE (1) | BE658122A (en)) |
FR (1) | FR1420288A (en)) |
GB (1) | GB1090641A (en)) |
NL (1) | NL6500327A (en)) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5965671A (en) * | 1998-03-05 | 1999-10-12 | National Science Council | Modified phenolic resin toughened by poly (alkylene oxide) and preparation thereof |
-
1965
- 1965-01-11 BE BE658122D patent/BE658122A/xx unknown
- 1965-01-12 NL NL6500327A patent/NL6500327A/xx unknown
- 1965-01-12 GB GB1405/65A patent/GB1090641A/en not_active Expired
- 1965-01-12 FR FR1660A patent/FR1420288A/fr not_active Expired
-
1966
- 1966-08-23 US US574293A patent/US3342606A/en not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
---|
None * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5965671A (en) * | 1998-03-05 | 1999-10-12 | National Science Council | Modified phenolic resin toughened by poly (alkylene oxide) and preparation thereof |
Also Published As
Publication number | Publication date |
---|---|
BE658122A (en)) | 1965-04-30 |
NL6500327A (en)) | 1965-07-14 |
FR1420288A (fr) | 1965-12-03 |
GB1090641A (en) | 1967-11-15 |
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