US2955030A - Polishing compositions - Google Patents

Polishing compositions Download PDF

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Publication number
US2955030A
US2955030A US795448A US79544859A US2955030A US 2955030 A US2955030 A US 2955030A US 795448 A US795448 A US 795448A US 79544859 A US79544859 A US 79544859A US 2955030 A US2955030 A US 2955030A
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US
United States
Prior art keywords
polishing
zircon
composition
minutes
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US795448A
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English (en)
Inventor
William J Baldwin
Jerald L Bliton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NL Industries Inc
Original Assignee
Nat Lead Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nat Lead Co filed Critical Nat Lead Co
Priority to US795448A priority Critical patent/US2955030A/en
Priority to GB5104/60A priority patent/GB869185A/en
Priority to BE587834A priority patent/BE587834A/fr
Priority to DEN17936A priority patent/DE1152776B/de
Priority to FR819287A priority patent/FR1249046A/fr
Priority to CH206560A priority patent/CH388506A/de
Priority to DK70360AA priority patent/DK94076C/da
Priority to AT142660A priority patent/AT228672B/de
Application granted granted Critical
Publication of US2955030A publication Critical patent/US2955030A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing

Definitions

  • This invention relates to polishing compositions. It is particularly concerned with polishing compositions, useful for the polishing of glass, stone, and the like, that contain zircon.
  • Another object of the invention is to provide polishing compositions of the character described which are inexpensive and easily prepared.
  • Zircon is a common and widely distributed mineral which chemically is zirconium orthosilicate (ZrSiO). Although zircon has been previously suggested as a polishing agent for glass it has not been used for this purpose in any substantial amounts because of the relatively long time required to obtain the desired degree of polish.
  • mixtures consisting essentially of zircon together with certain metal oxides as additives may be used in polishing glass, stone, and the like with unexpectedly favorable results.
  • metal oxide additives are zinc oxide, ferric oxide, and cadmium oxide.
  • the following example sets forth the preparation and manner of use in polishing glass of a preferred polishing composition comprising a zircon-zinc oxide mixture.
  • Example 1 finely divided form.
  • the mixture obtained was then employed in the polishing of optical crown glass lens blanks aqueous slurry of the above-mentioned mixture containing 10% solids being fed continuously onto the pad.
  • Example 2 Example 3 Powdered zircon and zinc oxide were thoroughly mixed in a 60:40 ratio and lens polishing tests like those described in Example 1 were carried out with the resultant composition. The predetermined degree of polish was obtained after only 8 minutes.
  • the accompanying drawing is a graphical chart on which the curve A represents the times required for polishing lenses in the manner described in Example 1 with zircon-zinc oxide mixtures in the ratios described in the foregoing examples and also in other ratios. It will be noted in the chart that 25 minutes has been arbitrarily chosen as the polishing time for zinc oxide alone. Actually a much longer period of time is required. It will also be observed that all points on curve A except the extremities thereof lie below the line B which represents the polishing time parameter established by drawing a straight line between the points representing the times (real and arbitrarily selected maximum) required for attaining the same degree of polish separately with zircon and zinc oxides, respectively.
  • Example 4 A mixture of powdered zircon and 25% finely divided cadmium oxide (CdO) was prepared and tested for lens polishing according to the procedure set out in Example 1. Only 6 minutes was required to obtain the same degree of polish with the mixture that required 15 minutes with zirconium silicate alone. Cadmium oxide by itself required more than 25 minutes to produce the same degree of polish.
  • CdO cadmium oxide
  • Example 5 A 50-50 mixture of zircon and rouge (Fe O both in finely divided form, was prepared. The resulting composition was used in lens polishing according to the procedure described in Example 1 and it was determined that the mixture in 10 minutes was as effective in polishing as zircon by itself in 15 minutes or the rouge alone in 16 minutes. With respect to polishing compositions consisting essentially of mixtures of zircon with cadmium oxide and zircon with ferric oxide (rouge), it is also found that the polishing times of such mixtures when graphically represented fall below the respective polishing time parameters established by constructing straight lines joining the polishing times of the zircon and the cadmium oxide and the zircon and the rouge.
  • Polishing compositions according to the present invention are useful not only for polishing lenses, but also for polishing television tube face plates and other glass articles as well as plate glass. Not only is the polishing efficiency of such compositions high with resultant savings in time, but there is also less tendency for the development of the Well-known orange-peel elfect which is sometimes encountered when using zircon by itself. It has also been found that compositions according to the present invention give excellent results in polishing dense stone such as granite and marble.
  • liquid suspending medium In using the present novel compositions they may be dispersed in any desired and suitable liquid suspending medium. In the tests described above, water alone produced good results as a suspending medium. However, liquid media containing deflocculants, thickeners, and the like may also be used.
  • the procedure employed in polishing with the novel compositions herein disclosed is subject to wide variation. Although the tests described hereinabove were, for purposes of comparison, carried out with a soft polishing pad and a moderate pressure, polishing compositions according to the invention may be advantageously used under other conditions. Thus, the time required when using a hard pad to obtain a predetermined degree of polish with zircon by itself is much greater than the time required with polishing compositions in accordance with the present invention. For example, in the case of a comparison of zircon with zircon-zinc oxide mixtures the time ratio may be as great as 2:1, i.e. 100% greater time for zircon when used alone.
  • the zircon and the metal oxide additives with which the present invention is concerned are, of course, very finely divided since the presence in a polishing composition of a substantial number of particles having an average diameter greater than about 5 microns is likely to result in the production of scratches on the surface being polished.
  • a particle size below about 3 microns average diameter is desired and it is preferred that most of the particles have average diameters not greater than about 2 microns.
  • Zircon can be easily milled to the desired particle size and the impurities present in minor amounts do not materially affect the polishing action.
  • the metal oxide additives employed may also be commercially available materials, extreme purity not being essential.
  • polishing compositions consisting essentially of zircon and a plurality of the metal oxide additives of the group described above For example, a composition consisting essentially of 40% zircon, Fe O and 50% ZnO when tested in the manner described in Example 1 polished a lens blank acceptably in only 8 minutes.
  • the addition of small amounts of other glass polishing agents such, for example, as zirconia, do not materially interfere with the action of polishing compositions according to the invention. .Thus, a polishing time of only 8 minutes was required when using the procedure of Example 1 and a polishing composition consisting essentially of 40% zircon, 10% ZrO and 50% ZnO.
  • polishing 4 compositions consisting essentially of zircon and at least one metallic oxide additive selected from the group consisting of ZnO, Fe O and CdO are extremely useful in the polishing of glass, stone and the like throughout the range from about 10% to about zircon. All percentages and, ratios referred to herein are percentages and ratios by weight.
  • a composition adapted for use in liquid suspension in polishing glass; stone, and the like whichconsists essentially of a mixture of finely divided zircon and at least one finely divided, metallic oxide additive selected from the group consisting of ZnO, Fe O and CdO.
  • a process for polishing glass, stone and the like which comprises rubbing the surface thereof with a liquid suspension of a polishing composition which consists essentially of a mixture of finely divided zircon and at least one finely divided, metallic oxide additive selected from the group consisting of ZnO, Fe O and CdO.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
US795448A 1959-02-25 1959-02-25 Polishing compositions Expired - Lifetime US2955030A (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
US795448A US2955030A (en) 1959-02-25 1959-02-25 Polishing compositions
GB5104/60A GB869185A (en) 1959-02-25 1960-02-12 Polishing compositions
BE587834A BE587834A (fr) 1959-02-25 1960-02-19 Compositions de polissage.
FR819287A FR1249046A (fr) 1959-02-25 1960-02-23 Compositions de polissage
DEN17936A DE1152776B (de) 1959-02-25 1960-02-23 Poliermittelmischung
CH206560A CH388506A (de) 1959-02-25 1960-02-24 Poliermittel
DK70360AA DK94076C (da) 1959-02-25 1960-02-24 Polermiddel.
AT142660A AT228672B (de) 1959-02-25 1960-02-24 Poliermittel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US795448A US2955030A (en) 1959-02-25 1959-02-25 Polishing compositions

Publications (1)

Publication Number Publication Date
US2955030A true US2955030A (en) 1960-10-04

Family

ID=25165535

Family Applications (1)

Application Number Title Priority Date Filing Date
US795448A Expired - Lifetime US2955030A (en) 1959-02-25 1959-02-25 Polishing compositions

Country Status (8)

Country Link
US (1) US2955030A (da)
AT (1) AT228672B (da)
BE (1) BE587834A (da)
CH (1) CH388506A (da)
DE (1) DE1152776B (da)
DK (1) DK94076C (da)
FR (1) FR1249046A (da)
GB (1) GB869185A (da)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3071455A (en) * 1959-04-22 1963-01-01 Univis Lens Co Polishing material
US3077707A (en) * 1960-06-20 1963-02-19 Titmus Optical Company Inc Polishing synthetic resin lenses
US3105331A (en) * 1960-06-27 1963-10-01 Gen Electric Brush seating technique
US3429080A (en) * 1966-05-02 1969-02-25 Tizon Chem Corp Composition for polishing crystalline silicon and germanium and process
US3877183A (en) * 1968-04-11 1975-04-15 Wacker Chemie Gmbh Method of polishing semiconductor surfaces
US4035962A (en) * 1973-11-08 1977-07-19 Ayers Joseph W Zircon sand impacting material

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1412916A (en) * 1919-10-09 1922-04-18 Buckman & Pritchard Inc Highly-refractory article
DE365273C (de) * 1922-12-11 Hermann Stegmeyer Schleif- oder Poliermittel aus Zirkonoxyd
US2694004A (en) * 1951-07-20 1954-11-09 Metal & Thermit Corp Polishing material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE365273C (de) * 1922-12-11 Hermann Stegmeyer Schleif- oder Poliermittel aus Zirkonoxyd
US1412916A (en) * 1919-10-09 1922-04-18 Buckman & Pritchard Inc Highly-refractory article
US2694004A (en) * 1951-07-20 1954-11-09 Metal & Thermit Corp Polishing material

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3071455A (en) * 1959-04-22 1963-01-01 Univis Lens Co Polishing material
US3077707A (en) * 1960-06-20 1963-02-19 Titmus Optical Company Inc Polishing synthetic resin lenses
US3105331A (en) * 1960-06-27 1963-10-01 Gen Electric Brush seating technique
US3429080A (en) * 1966-05-02 1969-02-25 Tizon Chem Corp Composition for polishing crystalline silicon and germanium and process
US3877183A (en) * 1968-04-11 1975-04-15 Wacker Chemie Gmbh Method of polishing semiconductor surfaces
US4035962A (en) * 1973-11-08 1977-07-19 Ayers Joseph W Zircon sand impacting material

Also Published As

Publication number Publication date
CH388506A (de) 1965-02-28
DK94076C (da) 1962-08-06
AT228672B (de) 1963-07-25
FR1249046A (fr) 1960-12-23
BE587834A (fr) 1960-06-16
GB869185A (en) 1961-05-31
DE1152776B (de) 1963-08-14

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