US2794322A - Variable temperature refrigeration - Google Patents

Variable temperature refrigeration Download PDF

Info

Publication number
US2794322A
US2794322A US440022A US44002254A US2794322A US 2794322 A US2794322 A US 2794322A US 440022 A US440022 A US 440022A US 44002254 A US44002254 A US 44002254A US 2794322 A US2794322 A US 2794322A
Authority
US
United States
Prior art keywords
receiver
refrigerants
refrigerant
mixture
evaporator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US440022A
Other languages
English (en)
Inventor
Theodore L Etherington
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Priority to US440022A priority Critical patent/US2794322A/en
Priority to ES0222633A priority patent/ES222633A1/es
Application granted granted Critical
Publication of US2794322A publication Critical patent/US2794322A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25BREFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B9/00Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point
    • F25B9/002Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point characterised by the refrigerant
    • F25B9/006Compression machines, plants or systems, in which the refrigerant is air or other gas of low boiling point characterised by the refrigerant the refrigerant containing more than one component
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
    • H01L21/12Application of an electrode to the exposed surface of the selenium or tellurium after the selenium or tellurium has been applied to the foundation plate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251Diffusion into or out of group IV semiconductors
    • H01L21/2254Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H01L21/2255Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S252/00Compositions
    • Y10S252/95Doping agent source material

Definitions

  • This invention relates to refrigeration systems and specifically to a method and apparatus to secure variable temperature levels in such systems.
  • a pair of low temperature immiscible refrigerants are selectively mixed and circulated in a refrigeration system to provide variable temperature levels of refrigeration.
  • Fig. 1 is a schematic view of one form of a refrigeration system which embodies my invention.
  • Fig. 2 is a solubility graph determined at the system pressure of aperfluoropropane (C3Fs)and Freon 31 (CHzClF) mixture in which composition in percentage degrees Fahrenheit.
  • C3Fs aperfluoropropane
  • CHzClF Freon 31
  • a refrigeration system which may be used in heat pump construction or in commercial or domestic refrigerators and which is indicated generally at 10, comprises a compressor 11 which communicates on its high pressure side with a condenser 12.
  • Condenser 12 is connected to an operating liquid receiver 13 in which a pair of low temperature immiscible refrigerants 14 and 15 coexist in a mixture 16 to form one liquid phase of desired composition.
  • Tube 18 conveys refrigerant solution 16 from opened to tube 21,
  • a float 20 may be positioned in receiver 17 to actuate valve 19 through a suitable electrical or mechanical connection.
  • the refrigerant mixture 16 is circulated from the operating receiver 13 to a common tube 21 at the inlet side of an evaporator 22 through an outlet 23, an expansion valve 24, a heat exchanger coil 25 in storage receiver 17, and an outlet 26.
  • Coil 25 carries the low temperature refrigerant mixtures 16 of liquid and vapor,
  • Expansion valve 24 is shown to be of a conventionaltype which is operated by a valve control 27 which comprises a pressure tube'28 anddiaphragm 29.
  • a temperature-operated or thermostatic valve or sections of capillary tubing may be employed as the expansion device.
  • a three-way, three-position valve 30 controls'a pair of outlets 31 and 32 which are in communcation with refrigerants 14 and 15 in receiver 17.
  • -A load sensing and sequence control device 33 of any conventional construction may be provided to selectively operate valve 30 in response to the system load.
  • Tube 21 connects valve 30 to evaporator 22 which communicates with the low pressure side of compressor 11 to complete the refrigeration system.
  • the pair of low temperature immiscible refrigerants 14 and 15, which have difierent volatility and density characteristics are selectively mixed and circulated through the refrigeration system in response to the load thereon.
  • each'of the refrigerants which is selected for circulation in the system has a difierentdensity from the other refrigerant and exhibits insolubility in the other refrigerant of the pair at or below customary evaporator temperatures to provide a separation of the refrigerants into two layers in the storage receiver 17.
  • Compressor 11 pumps refrigerant m xture 16 through condenser 12 to operating liquid receiver 13.
  • the refrigerant solution is then circulated through outlet 23, expan sion valve 24, coil 25, outlet 26, tube 21, and evaporator 22 to the inlet side of compressor 11.
  • outlet 31 is refrigerant 14 is added to refrigerant mixture 16 which is circulating in the system.
  • An equal volume of refrigerant mixture 16 is simultaneously conveyed from receiver 13 to receiver 17 through tube 18 and control valve 19.
  • Valve 19 may be actuated by any suitable controls, such as, for example, a float 29, which is positioned in the receiver 17 and connected mechanically or electrically to valve 19.
  • the withdrawal of refrigerant DCver 17 maintains the temperature therein at evaporator temperature to separate refrigerant mixture 16 into refrigerants 14 and 15 in two immiscible layers.
  • the refrigeration system may circulate either essentially pure refrigerant 14 or 15 or a refrigerant mixture 16 of any desired composition.
  • a solubility graph is shown in which composition in mole percentage of a perfluoropropane (CsFs) and Freon 31 (CHsClF) mixture is plotted against the temperature in degrees Fahrenheit.
  • CsFs perfluoropropane
  • CHsClF Freon 31
  • Such a refrigerant solution is generally miscible above 44 F. and immiscible below this temperature.
  • the temperature of storage receiver 17 in Fig. 1 is maintained at or below the evaporator temperature to maintain the refrigerants 14 and,
  • one immiscible refrigerant layer is composed of 85.5% by weight of perfluoropropane (CsFa) and 14.5% by weight of Freon 31 (CI-IzClF).
  • the other refrigerant layer is 84% Freon 31 and 16% perfiuoropropane.
  • a, compressor, .a condenser, an operating liquid receiver and a storage liquid separate the refrigerants in the storage receiver, means to conduct said refrigerants from the separating means to the inlet of the evaporator, and means to selectively control the relative amounts of said refrigerants to circulate through said evaporator.
  • a method of refrigeration which comprises circulating a refrigerant mixture of a pair of low temperature essentially immiscible refrigerants with different volatility and density characteristics in a refrigeration system, storing a supply of said refrigerants in their immiscible phase in addition to said refrigeration system, increasing the relative amount of one of the refrigerants in said mixture, withdrawing an equal amount of said circulating mixture for return to said storage supply, and cooling said with drawn amount to separate said mixture into two essentially immiscible refrigerants.
  • a refrigeration system including a compressor, a condenser, and an evaporator, a liquid receiver connected to said condenser and said evaporator, a storage receiver connected to said liquid receiver and said evaporator, a pair of low temperature essentially immiscible refriger ants with different volatility and density characteristics in said storage receiver, means to selectively control the relative amounts of the refrigerants to pass from said storage receiver to said evaporator, and cooling means positioned within said storage receiver to separate the refrigerants.
  • a refrigerant system including an evaporator, a compressor, an operating liquid receiver, and a storage liquid receiver, a pair of low temperature essentially immiscible refrigerants in said storage receiver, a mixture of said refrigerants in said operating receiver, means for circulating said mixture from the said operating receiver through said system, means for maintaining the temperature of the storage receiver as a function of the evaporator temperature, means dependent upon the system load for introducing a quantity of one'of said refrigerants in said storage receiver into the said system, and means for withdrawing an equal quantity of the refrigerant mixture from the said system for return to the said storage receiver.
  • a pair of low temperature essentially immiscible refrigerants in said storage receiver means to maintain the temperature of the storage receiver within the immiscible range of the refrigerants therein, a mixture of refrigerants in said operating receiver, means for continuously circulating only a mixture of refrigerants through said system, and means for varying the mixture circulating in said system, said means including introducreceiver, an evaporator, means connecting the outlet of the compressor and the inlet of the condenser, means conecting the outlet of the condenser and the inlet of the said operating liquid receiver, means connecting the outlets of the receivers and the inlet of the evaporator, cooling means connected to the operating liq 'd receiver to ing a quantity of one of the refrigerants in said storage receiver into the system, and simultaneously Withdrawing an equal quantity of the refrigerant mixture from

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • General Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Ceramic Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Glass Compositions (AREA)
  • Resistance Heating (AREA)
  • Devices That Are Associated With Refrigeration Equipment (AREA)
US440022A 1954-06-29 1954-06-29 Variable temperature refrigeration Expired - Lifetime US2794322A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US440022A US2794322A (en) 1954-06-29 1954-06-29 Variable temperature refrigeration
ES0222633A ES222633A1 (es) 1954-06-29 1955-06-25 UN SISTEMA DE REFRIGERACIoN DE TEMPERATURA VARIABLE, Y APARATO PARA SU APLICACIoN

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US440022A US2794322A (en) 1954-06-29 1954-06-29 Variable temperature refrigeration
US518556A US2794846A (en) 1955-06-28 1955-06-28 Fabrication of semiconductor devices

Publications (1)

Publication Number Publication Date
US2794322A true US2794322A (en) 1957-06-04

Family

ID=24064454

Family Applications (2)

Application Number Title Priority Date Filing Date
US440022A Expired - Lifetime US2794322A (en) 1954-06-29 1954-06-29 Variable temperature refrigeration
US518556A Expired - Lifetime US2794846A (en) 1954-06-29 1955-06-28 Fabrication of semiconductor devices

Family Applications After (1)

Application Number Title Priority Date Filing Date
US518556A Expired - Lifetime US2794846A (en) 1954-06-29 1955-06-28 Fabrication of semiconductor devices

Country Status (8)

Country Link
US (2) US2794322A (US20020095090A1-20020718-M00002.png)
JP (1) JPS321180B1 (US20020095090A1-20020718-M00002.png)
BE (1) BE548647A (US20020095090A1-20020718-M00002.png)
CH (1) CH361340A (US20020095090A1-20020718-M00002.png)
DE (1) DE1046785B (US20020095090A1-20020718-M00002.png)
FR (1) FR1154322A (US20020095090A1-20020718-M00002.png)
GB (1) GB816799A (US20020095090A1-20020718-M00002.png)
NL (2) NL207969A (US20020095090A1-20020718-M00002.png)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019614A (en) * 1958-09-04 1962-02-06 Gen Electric Dual temperature refrigeration
US3035423A (en) * 1960-07-15 1962-05-22 Mendez Alfredo Booster for refrigerating systems
US3203194A (en) * 1962-12-01 1965-08-31 Hoechst Ag Compression process for refrigeration
US3585814A (en) * 1967-09-29 1971-06-22 Int Standard Electric Corp Refrigerated unit
US3872682A (en) * 1974-03-18 1975-03-25 Northfield Freezing Systems In Closed system refrigeration or heat exchange
US4151724A (en) * 1977-06-13 1979-05-01 Frick Company Pressurized refrigerant feed with recirculation for compound compression refrigeration systems
US4179898A (en) * 1978-07-31 1979-12-25 General Electric Company Vapor compression cycle device with multi-component working fluid mixture and method of modulating its capacity
US4217760A (en) * 1978-07-20 1980-08-19 General Electric Company Vapor compression cycle device with multi-component working fluid mixture and method of modulating its capacity
US4218890A (en) * 1978-07-24 1980-08-26 General Electric Company Vapor compression cycle device with multi-component working fluid mixture and improved condensing heat exchanger
US4416119A (en) * 1982-01-08 1983-11-22 Whirlpool Corporation Variable capacity binary refrigerant refrigeration apparatus
US4439996A (en) * 1982-01-08 1984-04-03 Whirlpool Corporation Binary refrigerant system with expansion valve control
EP0126237A2 (en) * 1983-04-22 1984-11-28 Mitsubishi Denki Kabushiki Kaisha Refrigeration cycle systems and refrigerators
US4913714A (en) * 1987-08-03 1990-04-03 Nippondenso Co., Ltd. Automotive air conditioner
US5237828A (en) * 1989-11-22 1993-08-24 Nippondenso Co., Ltd. Air-conditioner for an automobile with non-azeotropic refrigerant mixture used to generate "cool head" and "warm feet" profile
US20150107294A1 (en) * 2013-10-22 2015-04-23 Panasonic Intellectual Property Management Co., Ltd. Refrigeration-cycle equipment
US20200208899A1 (en) * 2017-05-11 2020-07-02 General Electric Company Cooling systems and related method

Families Citing this family (101)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3125532A (en) * 1964-03-17 Method of doping semiconductor
US2862160A (en) * 1955-10-18 1958-11-25 Hoffmann Electronics Corp Light sensitive device and method of making the same
CA605440A (en) * 1955-11-03 1960-09-20 E. Pardue Turner Semiconductor devices and methods of making the same
NL215949A (US20020095090A1-20020718-M00002.png) * 1956-04-03
US2828232A (en) * 1956-05-01 1958-03-25 Hughes Aircraft Co Method for producing junctions in semi-conductor device
US2989670A (en) * 1956-06-19 1961-06-20 Texas Instruments Inc Transistor
US2938938A (en) * 1956-07-03 1960-05-31 Hoffman Electronics Corp Photo-voltaic semiconductor apparatus or the like
US3129338A (en) * 1957-01-30 1964-04-14 Rauland Corp Uni-junction coaxial transistor and circuitry therefor
BE565907A (US20020095090A1-20020718-M00002.png) * 1957-03-22
US3145328A (en) * 1957-04-29 1964-08-18 Raytheon Co Methods of preventing channel formation on semiconductive bodies
US2962394A (en) * 1957-06-20 1960-11-29 Motorola Inc Process for plating a silicon base semiconductive unit with nickel
US2998555A (en) * 1957-07-23 1961-08-29 Telefunken Gmbh Conductor connected to the alloying area of a crystalode, e. g., a transistor of the lloy type
US2983591A (en) * 1957-11-15 1961-05-09 Texas Instruments Inc Process and composition for etching semiconductor materials
US2882465A (en) * 1957-12-17 1959-04-14 Texas Instruments Inc Transistor
NL121250C (US20020095090A1-20020718-M00002.png) * 1958-01-16
NL235479A (US20020095090A1-20020718-M00002.png) * 1958-02-04 1900-01-01
US3065392A (en) * 1958-02-07 1962-11-20 Rca Corp Semiconductor devices
US2989424A (en) * 1958-03-31 1961-06-20 Westinghouse Electric Corp Method of providing an oxide protective coating for semiconductors
US3016313A (en) * 1958-05-15 1962-01-09 Gen Electric Semiconductor devices and methods of making the same
NL261580A (US20020095090A1-20020718-M00002.png) * 1958-06-14 1900-01-01
NL229074A (US20020095090A1-20020718-M00002.png) * 1958-06-26
US3019142A (en) * 1958-07-25 1962-01-30 Bendix Corp Semiconductor device
LU37521A1 (US20020095090A1-20020718-M00002.png) * 1958-08-11
DE1719025A1 (US20020095090A1-20020718-M00002.png) * 1958-09-20 1900-01-01
US3104991A (en) * 1958-09-23 1963-09-24 Raytheon Co Method of preparing semiconductor material
US3042565A (en) * 1959-01-02 1962-07-03 Sprague Electric Co Preparation of a moated mesa and related semiconducting devices
DE1071846B (US20020095090A1-20020718-M00002.png) * 1959-01-03 1959-12-24
GB921367A (en) * 1959-04-06 1963-03-20 Standard Telephones Cables Ltd Semiconductor device and method of manufacture
US3070466A (en) * 1959-04-30 1962-12-25 Ibm Diffusion in semiconductor material
US3210622A (en) * 1959-09-11 1965-10-05 Philips Corp Photo-transistor
US3041214A (en) * 1959-09-25 1962-06-26 Clevite Corp Method of forming junction semiconductive devices having thin layers
US3053926A (en) * 1959-12-14 1962-09-11 Int Rectifier Corp Silicon photoelectric cell
DE1232265B (de) * 1960-03-11 1967-01-12 Philips Patentverwaltung Verfahren zur Herstellung eines Legierungsdiffusionstransistors
NL263037A (US20020095090A1-20020718-M00002.png) * 1960-03-31
DE1133038B (de) * 1960-05-10 1962-07-12 Siemens Ag Halbleiterbauelement mit einem im wesentlichen einkristallinen Halbleiterkoerper undvier Zonen abwechselnden Leitfaehigkeitstyps
US3175929A (en) * 1960-05-24 1965-03-30 Bell Telephone Labor Inc Solar energy converting apparatus
US3141849A (en) * 1960-07-04 1964-07-21 Wacker Chemie Gmbh Process for doping materials
FR1276723A (fr) * 1960-10-11 1961-11-24 D Electroniques Et De Physique Perfectionnements aux procédés de fabrication de dispositifs photo-électriques semi-conducteurs et à de tels dispositifs
US3084079A (en) * 1960-10-13 1963-04-02 Pacific Semiconductors Inc Manufacture of semiconductor devices
DE1156384B (de) * 1960-12-23 1963-10-31 Wacker Chemie Gmbh Verfahren zum Dotieren von hochreinen Stoffen
US3046324A (en) * 1961-01-16 1962-07-24 Hoffman Electronics Corp Alloyed photovoltaic cell and method of making the same
NL99556C (US20020095090A1-20020718-M00002.png) * 1961-03-30
US3081370A (en) * 1961-07-17 1963-03-12 Raytheon Co Solar cells
DE1444521B2 (de) * 1962-02-01 1971-02-25 Siemens AG, 1000 Berlin u 8000 München Verfahren zur herstellung einer halbleiteranordnung
US3411952A (en) * 1962-04-02 1968-11-19 Globe Union Inc Photovoltaic cell and solar cell panel
DE1211335B (de) * 1962-07-16 1966-02-24 Elektronik M B H Halbleiterbauelement mit mindestens einem pn-UEbergang und mit einer Oberflaechenschicht aus Siliziumoxyd und Verfahren zum Herstellen
JPS4018266Y1 (US20020095090A1-20020718-M00002.png) * 1962-08-31 1965-06-28
US3204321A (en) * 1962-09-24 1965-09-07 Philco Corp Method of fabricating passivated mesa transistor without contamination of junctions
US3270255A (en) * 1962-10-17 1966-08-30 Hitachi Ltd Silicon rectifying junction structures for electric power and process of production thereof
BE639315A (US20020095090A1-20020718-M00002.png) * 1962-10-31
GB991263A (en) * 1963-02-15 1965-05-05 Standard Telephones Cables Ltd Improvements in or relating to semiconductor devices
US3255055A (en) * 1963-03-20 1966-06-07 Hoffman Electronics Corp Semiconductor device
US3421943A (en) * 1964-02-14 1969-01-14 Westinghouse Electric Corp Solar cell panel having cell edge and base metal electrical connections
US3359137A (en) * 1964-03-19 1967-12-19 Electro Optical Systems Inc Solar cell configuration
US3343049A (en) * 1964-06-18 1967-09-19 Ibm Semiconductor devices and passivation thereof
US3401448A (en) * 1964-06-22 1968-09-17 Globe Union Inc Process for making photosensitive semiconductor devices
US3371213A (en) * 1964-06-26 1968-02-27 Texas Instruments Inc Epitaxially immersed lens and photodetectors and methods of making same
US3436549A (en) * 1964-11-06 1969-04-01 Texas Instruments Inc P-n photocell epitaxially deposited on transparent substrate and method for making same
US3492174A (en) * 1966-03-19 1970-01-27 Sony Corp Method of making a semiconductor device
US3472698A (en) * 1967-05-18 1969-10-14 Nasa Silicon solar cell with cover glass bonded to cell by metal pattern
BE789331A (fr) * 1971-09-28 1973-01-15 Communications Satellite Corp Cellule solaire a geometrie fine
US3931056A (en) * 1974-08-26 1976-01-06 The Carborundum Company Solid diffusion sources for phosphorus doping containing silicon and zirconium pyrophosphates
FR2412164A1 (fr) * 1977-12-13 1979-07-13 Radiotechnique Compelec Procede de creation, par serigraphie, d'un contact a la surface d'un dispositif semi-conducteur et dispositif obtenu par ce procede
US4416052A (en) * 1982-03-29 1983-11-22 General Dynamics, Convair Division Method of making a thin-film solar cell
GB2130793B (en) * 1982-11-22 1986-09-03 Gen Electric Co Plc Forming a doped region in a semiconductor body
US4490192A (en) * 1983-06-08 1984-12-25 Allied Corporation Stable suspensions of boron, phosphorus, antimony and arsenic dopants
DK170189B1 (da) * 1990-05-30 1995-06-06 Yakov Safir Fremgangsmåde til fremstilling af halvlederkomponenter, samt solcelle fremstillet deraf
DE19910816A1 (de) * 1999-03-11 2000-10-05 Merck Patent Gmbh Dotierpasten zur Erzeugung von p,p+ und n,n+ Bereichen in Halbleitern
US7790574B2 (en) * 2004-12-20 2010-09-07 Georgia Tech Research Corporation Boron diffusion in silicon devices
JP5447397B2 (ja) * 2010-02-03 2014-03-19 日立化成株式会社 p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池セルの製造方法
US20110195540A1 (en) * 2010-02-05 2011-08-11 Hitachi Chemical Company, Ltd. Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell
US20110195541A1 (en) * 2010-02-05 2011-08-11 Hitachi Chemical Company, Ltd. Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell
EP2930740A1 (en) 2010-04-23 2015-10-14 Hitachi Chemical Co., Ltd. Composition for forming p-type diffusion layer, method of forming p-type diffusion layer, and method of producing photovoltaic cell
KR20130066613A (ko) * 2010-04-23 2013-06-20 히타치가세이가부시끼가이샤 n 형 확산층 형성 조성물, n 형 확산층의 제조 방법, 및 태양 전지 소자의 제조 방법
TWI541869B (zh) * 2010-04-23 2016-07-11 日立化成股份有限公司 形成p型擴散層的組成物、p型擴散層的製造方法及太陽電池元件的製造方法
TWI556289B (zh) * 2010-04-23 2016-11-01 日立化成股份有限公司 形成p型擴散層的組成物、p型擴散層的製造方法及太陽電池元件的製造方法
TWI483294B (zh) * 2010-04-23 2015-05-01 Hitachi Chemical Co Ltd 形成n型擴散層的組成物、n型擴散層的製造方法及太陽電池元件的製造方法
TW201508821A (zh) * 2010-04-23 2015-03-01 Hitachi Chemical Co Ltd 形成n型擴散層的組成物、n型擴散層的製造方法及太陽電池元件的製造方法
JP5803080B2 (ja) * 2010-09-24 2015-11-04 日立化成株式会社 p型拡散層形成組成物、p型拡散層形成組成物の製造方法、p型拡散層の製造方法、及び太陽電池セルの製造方法
CN103299399A (zh) * 2011-01-13 2013-09-11 日立化成株式会社 p型扩散层形成用组合物、p型扩散层的制造方法和太阳能电池元件的制造方法
CN103348449A (zh) * 2011-02-17 2013-10-09 日立化成株式会社 n型扩散层形成用组合物、n型扩散层的制造方法和太阳能电池单元的制造方法
JP2012231012A (ja) * 2011-04-26 2012-11-22 Hitachi Chem Co Ltd p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
JP2012234990A (ja) * 2011-05-02 2012-11-29 Hitachi Chem Co Ltd p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
JP2012234989A (ja) * 2011-05-02 2012-11-29 Hitachi Chem Co Ltd n型拡散層形成組成物、n型拡散層の製造方法、及び太陽電池素子の製造方法
CN105489662A (zh) * 2011-07-19 2016-04-13 日立化成株式会社 n型扩散层形成用组合物、n型扩散层的制造方法以及太阳能电池元件的制造方法
JP2013026343A (ja) * 2011-07-19 2013-02-04 Hitachi Chem Co Ltd p型拡散層の製造方法、太陽電池素子の製造方法、および太陽電池素子
JP2013026344A (ja) * 2011-07-19 2013-02-04 Hitachi Chem Co Ltd n型拡散層の製造方法、太陽電池素子の製造方法、および太陽電池素子
JP5935254B2 (ja) * 2011-07-21 2016-06-15 日立化成株式会社 不純物拡散層形成組成物、不純物拡散層の製造方法、太陽電池素子の製造方法および太陽電池の製造方法
JP5842432B2 (ja) * 2011-07-22 2016-01-13 日立化成株式会社 p型拡散層の製造方法、及び太陽電池素子の製造方法
JP5935255B2 (ja) * 2011-07-22 2016-06-15 日立化成株式会社 インクジェット用不純物拡散層形成組成物、不純物拡散層の製造方法、太陽電池素子の製造方法及び太陽電池の製造方法
JP5842431B2 (ja) * 2011-07-22 2016-01-13 日立化成株式会社 n型拡散層の製造方法、及び太陽電池素子の製造方法
US20130025670A1 (en) * 2011-07-25 2013-01-31 Hitachi Chemical Company, Ltd. Semiconductor substrate and method for producing the same, photovoltaic cell element, and photovoltaic cell
WO2013105602A1 (ja) * 2012-01-10 2013-07-18 日立化成株式会社 n型拡散層形成組成物、n型拡散層形成組成物セット、n型拡散層付き半導体基板の製造方法、及び太陽電池素子の製造方法
FR3035740B1 (fr) * 2015-04-28 2017-05-12 Commissariat Energie Atomique Procede de fabrication d'une cellule photovoltaique.
JP2015179866A (ja) * 2015-05-25 2015-10-08 日立化成株式会社 p型拡散層形成組成物、並びに、太陽電池セルおよびその製造方法
JP2016006893A (ja) * 2015-08-03 2016-01-14 日立化成株式会社 n型拡散層形成組成物、n型拡散層の製造方法、及び太陽電池素子の製造方法
JP2016021589A (ja) * 2015-09-14 2016-02-04 日立化成株式会社 p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
JP2016036034A (ja) * 2015-09-28 2016-03-17 日立化成株式会社 n型拡散層の製造方法、及び太陽電池素子の製造方法
JP2016027665A (ja) * 2015-09-28 2016-02-18 日立化成株式会社 p型拡散層の製造方法、及び太陽電池素子の製造方法
CN106784137B (zh) * 2016-11-30 2019-07-09 浙江晶科能源有限公司 一种电池片pn结边缘隔离的装置和方法
WO2023079957A1 (ja) * 2021-11-05 2023-05-11 東レ株式会社 p型不純物拡散組成物、それを用いた太陽電池の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2277138A (en) * 1938-08-31 1942-03-24 Honeywell Regulator Co Air conditioning system
US2352581A (en) * 1941-07-11 1944-06-27 Joseph F Winkler Method of refrigeration
US2682756A (en) * 1952-02-07 1954-07-06 Int Harvester Co Two temperature refrigerator system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE882445C (de) * 1942-12-28 1953-07-09 Siemens Ag Verfahren zur Herstellung leitender oder halbleitender Schichten
US2530217A (en) * 1946-04-04 1950-11-14 Western Electric Co Conductive coating compositions
BE500302A (US20020095090A1-20020718-M00002.png) * 1949-11-30
US2692212A (en) * 1950-02-09 1954-10-19 Westinghouse Brake & Signal Manufacture of dry surface contact rectifiers
US2629800A (en) * 1950-04-15 1953-02-24 Bell Telephone Labor Inc Semiconductor signal translating device
US2697269A (en) * 1950-07-24 1954-12-21 Bell Telephone Labor Inc Method of making semiconductor translating devices
NL93573C (US20020095090A1-20020718-M00002.png) * 1952-11-18
BE525387A (US20020095090A1-20020718-M00002.png) * 1952-12-29 1900-01-01

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2277138A (en) * 1938-08-31 1942-03-24 Honeywell Regulator Co Air conditioning system
US2352581A (en) * 1941-07-11 1944-06-27 Joseph F Winkler Method of refrigeration
US2682756A (en) * 1952-02-07 1954-07-06 Int Harvester Co Two temperature refrigerator system

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019614A (en) * 1958-09-04 1962-02-06 Gen Electric Dual temperature refrigeration
US3035423A (en) * 1960-07-15 1962-05-22 Mendez Alfredo Booster for refrigerating systems
US3203194A (en) * 1962-12-01 1965-08-31 Hoechst Ag Compression process for refrigeration
US3585814A (en) * 1967-09-29 1971-06-22 Int Standard Electric Corp Refrigerated unit
US3872682A (en) * 1974-03-18 1975-03-25 Northfield Freezing Systems In Closed system refrigeration or heat exchange
US4151724A (en) * 1977-06-13 1979-05-01 Frick Company Pressurized refrigerant feed with recirculation for compound compression refrigeration systems
US4217760A (en) * 1978-07-20 1980-08-19 General Electric Company Vapor compression cycle device with multi-component working fluid mixture and method of modulating its capacity
US4218890A (en) * 1978-07-24 1980-08-26 General Electric Company Vapor compression cycle device with multi-component working fluid mixture and improved condensing heat exchanger
US4179898A (en) * 1978-07-31 1979-12-25 General Electric Company Vapor compression cycle device with multi-component working fluid mixture and method of modulating its capacity
US4439996A (en) * 1982-01-08 1984-04-03 Whirlpool Corporation Binary refrigerant system with expansion valve control
US4416119A (en) * 1982-01-08 1983-11-22 Whirlpool Corporation Variable capacity binary refrigerant refrigeration apparatus
EP0126237A2 (en) * 1983-04-22 1984-11-28 Mitsubishi Denki Kabushiki Kaisha Refrigeration cycle systems and refrigerators
EP0126237A3 (en) * 1983-04-22 1985-05-15 Mitsubishi Denki Kabushiki Kaisha Refrigeration cycle systems and refrigerators
US4580415A (en) * 1983-04-22 1986-04-08 Mitsubishi Denki Kabushiki Kaisha Dual refrigerant cooling system
US4624114A (en) * 1983-04-22 1986-11-25 Mitsubishi Denki Kabushiki Kaisha Dual refrigerant cooling system
US4913714A (en) * 1987-08-03 1990-04-03 Nippondenso Co., Ltd. Automotive air conditioner
US5237828A (en) * 1989-11-22 1993-08-24 Nippondenso Co., Ltd. Air-conditioner for an automobile with non-azeotropic refrigerant mixture used to generate "cool head" and "warm feet" profile
US20150107294A1 (en) * 2013-10-22 2015-04-23 Panasonic Intellectual Property Management Co., Ltd. Refrigeration-cycle equipment
US20200208899A1 (en) * 2017-05-11 2020-07-02 General Electric Company Cooling systems and related method
US11703266B2 (en) * 2017-05-11 2023-07-18 General Electric Company Cooling systems and related method

Also Published As

Publication number Publication date
NL207969A (US20020095090A1-20020718-M00002.png)
CH361340A (fr) 1962-04-15
GB816799A (en) 1959-07-22
FR1154322A (fr) 1958-04-04
JPS321180B1 (US20020095090A1-20020718-M00002.png) 1957-02-19
BE548647A (US20020095090A1-20020718-M00002.png)
NL99619C (US20020095090A1-20020718-M00002.png)
DE1046785B (de) 1958-12-18
US2794846A (en) 1957-06-04

Similar Documents

Publication Publication Date Title
US2794322A (en) Variable temperature refrigeration
US2794328A (en) Variable temperature refrigeration
US2359595A (en) Refrigerating system
US3019614A (en) Dual temperature refrigeration
US5709090A (en) Refrigerating system and operating method thereof
US2841965A (en) Dual capacity refrigeration
US2867094A (en) Variable temperature refrigeration
US2938362A (en) Multiple fluid refrigerating system
US2462240A (en) Two-temperature refrigerator system
US2146796A (en) Refrigerating apparatus
US2794329A (en) Variable temperature refrigeration
JPH09196480A (ja) 冷凍装置用液冷却器
US2146797A (en) Refrigerating apparatus
CA1322859C (en) Refrigerator
US3487653A (en) Low temperature environmental test system
US2640327A (en) Dual evaporator refrigeration apparatus
US3300996A (en) Variable capacity refrigeration system
US2479848A (en) Multitemperature refrigeration apparatus and method
US2432546A (en) Fluid cooling apparatus with controls therefor
US2219789A (en) Refrigerator
US2022764A (en) Refrigerating apparatus
US2733574A (en) Refrigerating system
US2301938A (en) Refrigerator
US2040744A (en) Refrigerating apparatus
US2060728A (en) Refrigeration