US20140144375A1 - Equipment for manufacturing semiconductor - Google Patents

Equipment for manufacturing semiconductor Download PDF

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Publication number
US20140144375A1
US20140144375A1 US14/235,322 US201214235322A US2014144375A1 US 20140144375 A1 US20140144375 A1 US 20140144375A1 US 201214235322 A US201214235322 A US 201214235322A US 2014144375 A1 US2014144375 A1 US 2014144375A1
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Prior art keywords
chamber
substrates
reaction
epitaxial
substrate
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US14/235,322
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English (en)
Inventor
Young Dae Kim
Jun Jin Hyon
Sang Ho Woo
Seung Woo Shin
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Eugene Technology Co Ltd
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Eugene Technology Co Ltd
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Assigned to EUGENE TECHNOLOGY CO., LTD. reassignment EUGENE TECHNOLOGY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SHIN, SEUNG WOO, HYON, JUN JIN, KIM, HAI WON, KIM, YOUNG DAE, WOO, SANG HO
Publication of US20140144375A1 publication Critical patent/US20140144375A1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046—Dry cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H01L21/02576—N-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H01L21/02579—P-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Definitions

  • the present invention disclosed herein relates to an equipment for manufacturing a semiconductor, and more particularly, to an equipment for manufacturing a semiconductor which performs an epitaxial process for forming an epitaxial layer on a substrate.
  • Typical selective epitaxy processes involve deposition and etching reactions.
  • the deposition and etching reactions may occur simultaneously at slightly different reaction rates with respect to a polycrystalline layer and an epitaxial layer. While an existing polycrystalline layer and/or an amorphous layer are/is deposited on at least one second layer during the deposition process, the epitaxial layer is formed on a single crystal surface. However, the deposited polycrystalline layer is etched faster than the epitaxial layer.
  • corrosive gas may be changed in concentration to perform a net selective process, thereby realizing the deposition of an epitaxial material and the deposition of a limited or unlimited polycrystalline material.
  • a selective epitaxy process may be performed to form an epitaxial layer formed of a material containing silicon on a surface of single crystal silicon without leaving the deposits on a spacer.
  • the selective epitaxy process has several limitations. To maintain selectivity during the selective epitaxy process, a chemical concentration and reaction temperature of a precursor should be adjusted and controlled over the deposition process. If an insufficient silicon precursor is supplied, the etching reaction is activated to decrease the whole process rate. Also, features of the substrate may be deteriorated with respect to the etching. If an insufficient corrosive solution precursor is supplied, selectivity for forming the single crystalline and polycrystalline materials over the surface of the substrate may be reduced in the deposition reaction. Also, typical selective epitaxy processes are performed at a high reaction temperature of about 80° C., about 1,000° C., or more. Here, the high temperature is unsuited for the manufacturing process due to uncontrolled nitridation reaction and thermal budge on the surface of the substrate.
  • the present invention provides an equipment for manufacturing a semiconductor which can form an epitaxial layer on a substrate.
  • the present invention also provides an equipment for manufacturing a semiconductor which can remove a native oxide formed on a substrate and prevent the native oxide from being formed on the substrate.
  • Embodiments of the present invention provide equipments for manufacturing a semiconductor including: a cleaning chamber in which a cleaning process is performed on substrates; an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed; and a transfer chamber to which the cleaning chamber and the epitaxial chamber are connected to sides surfaces thereof, the transfer chamber including a substrate handler for transferring the substrates, on which the cleaning process is completed, into the epitaxial chamber, wherein the cleaning chamber may include: a reaction chamber connected to a side surface of the transfer chamber to perform a reaction process on the substrates; and a heating chamber connected to a side surface of the transfer chamber to perform a heating process on the substrates, wherein the reaction chamber and the heating chamber are vertically stacked on each other.
  • the transfer chamber may include first and second transfer passages through which the substrates are entered into the cleaning chamber
  • the reaction chamber may include a reaction passage through which the substrates are entered
  • the heating chamber may include a heating passage through which the substrates are entered
  • the equipments may further include a reaction-side gate valve for separating the reaction chamber from the transfer chamber and a heating-side gate valve for separating the heating chamber from the transfer chamber.
  • the reaction chamber may include: a radical supply line connected to the reaction chamber to supply radicals; and a gas supply line connected to the reaction chamber to supply a reaction gas.
  • the reaction chamber may further include a susceptor on which the substrates are placed, the susceptor rotating the substrates during the reaction process.
  • the reaction gas may include a fluoride gas including nitrogen fluoride (NF3).
  • NF3 nitrogen fluoride
  • the heating chamber may include: a susceptor on which the substrates are placed; and a heater heating the substrates placed on the susceptor.
  • the equipments may further include a buffer chamber connected to a side surface of the transfer chamber, the buffer chamber including a storage space for stacking the substrates; wherein the substrate handler may successively stack the substrates, on which the cleaning process is completed, into the storage space, transfer the stacked substrates into the epitaxial chamber, and successively stack the substrates, on which the epitaxial layers are respectively formed, into the storage space.
  • the loading space may include a first loading space in which the substrates, on which the cleaning process is completed, are loaded and a second loading space in which the substrates, on which the epitaxial layers are respectively formed, are loaded.
  • FIG. 1 is a schematic view of an equipment for manufacturing a semiconductor according to an embodiment of the present invention
  • FIG. 2 is a view illustrating a substrate treated according to an embodiment of the present invention
  • FIG. 3 is a flowchart illustrating a process for forming an epitaxial layer according to an embodiment of the present invention
  • FIG. 4 is a view of a buffer chamber of FIG. 1 ;
  • FIG. 5 is a view of a substrate holder of FIG. 4 ;
  • FIG. 6 is a view of a cleaning chamber of FIG. 1 ;
  • FIG. 7 is a view illustrating a modified example of the cleaning chamber of FIG. 1 ;
  • FIG. 8 is a view of an epitaxial chamber of FIG. 1 ;
  • FIG. 9 is a view of a supply tube of FIG. 1 .
  • FIGS. 1 to 9 exemplary embodiments of the present invention will be described in detail with reference to FIGS. 1 to 9 .
  • the present invention may, however, be embodied in different forms and should not be constructed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present invention to those skilled in the art.
  • the shapes of components are exaggerated for clarity of illustration.
  • FIG. 1 is a schematic view of an equipment 1 for manufacturing a semiconductor according to an embodiment of the present invention.
  • the equipment 1 for manufacturing the semiconductor includes a process equipment 2 , an equipment front end module (EFEM) 3 , and an interface wall 4 .
  • the EFEM 3 is mounted on a front side of the process equipment 2 to transfer a wafer W between a container (not shown) in which substrates S are received and the process equipment 2 .
  • the EFEM 3 includes a plurality of loadports 60 and a frame 50 .
  • the frame 50 is disposed between the loadports 60 and the process equipment 2 .
  • the container in which the substrates S are received is placed on each of the loadports 60 by a transfer unit (not shown) such as an overhead transfer, an overhead conveyor, or an automatic guided vehicle.
  • An airtight container such as a front open unified pod (FOUP) may be used as the container.
  • a frame robot 70 for transferring the substrates S between the container placed on each of the loadports 60 and the process equipment 2 is disposed within the frame 50 .
  • a door opener (not shown) for automatically opening or closing a door of the container may be disposed within the frame 50 .
  • a fan filter unit (not shown) for supplying clean air into the frame 50 may be provided within the frame 50 so that the clean air flows downward from an upper side within the frame 50 .
  • the process equipment 2 includes a transfer chamber 102 , a loadlock chamber 106 , cleaning chambers 108 a and 108 b , a buffer chamber 110 , and epitaxial chambers 112 a , 112 b , and 112 c .
  • the transfer chamber 102 may have a substantially polygonal shape when viewed from an upper side.
  • the loadlock chamber 106 , the cleaning chambers 108 a and 108 b , the buffer chamber 110 , and the epitaxial chambers 112 a , 112 b , and 112 c are disposed on side surfaces of the transfer chamber 102 , respectively.
  • the loadlock chamber 106 is disposed on a side surface adjacent to the EFEM 3 among the side surfaces of the transfer chamber 102 .
  • the substrate S is loaded to the process equipment 2 after the substrate S is temporarily stayed within the loadlock chamber 106 so as to perform the processes. After the processes are completed, the substrate S is unloaded from the process equipment 2 and then is temporarily stayed within the loadlock chamber 106 .
  • the transfer chamber 102 , the cleaning chambers 108 a and 108 b , the buffer chamber 110 , and the epitaxial chambers 112 a , 112 b , and 112 c are maintained in a vacuum state.
  • the loadlock chamber 106 is converted from the vacuum state to an atmospheric state.
  • the loadlock chamber 106 prevents external contaminants from being introduced into the transfer chamber 102 , the cleaning chambers 108 a and 108 b , the buffer chamber 110 , and the epitaxial chambers 112 a , 112 b , and 112 c . Also, since the substrate S is not exposed to the atmosphere during the transfer of the substrate S, it may prevent an oxide from being grown on the substrate S.
  • Gate valves are disposed between the loadlock chamber 106 and the transfer chamber 102 and between the loadlock chamber 106 and the EFEM 3 , respectively.
  • the gate valve disposed between the loadlock chamber 106 and the transfer chamber 102 is closed.
  • the gate valve disposed between the loadlock chamber 106 and the EFEM 3 is closed.
  • a substrate handler 104 is provided in the transfer chamber 102 .
  • the substrate handler 104 transfers the substrate S between the loadlock chamber 106 , the cleaning chamber 108 a and 108 b , the buffer chamber 110 , and the epitaxial chambers 112 a , 112 b , and 112 c .
  • the transfer chamber 102 is sealed so that the transfer chamber 102 is maintained in the vacuum state when the substrate S is transferred.
  • the maintenance of the vacuum state is for preventing the substrate S from being exposed to contaminants (e.g., O 2 , particle materials, and the like).
  • the epitaxial chambers 112 a , 112 b , and 112 c are provided to form an epitaxial layer on the substrate S.
  • three epitaxial chambers 112 a , 112 b , and 112 c are provided. Since it takes a relatively long time to perform an epitaxial process when compared to that of a cleaning process, the plurality of epitaxial chambers may be provided to improve manufacturing yield. Unlike the current embodiment, four or more epitaxial chambers or two or less epitaxial chambers may be provided.
  • the cleaning chambers 108 a and 108 b is configured to clean the substrate S before the epitaxial process is performed on the substrate S within the epitaxial chambers 112 a , 112 b , and 112 c .
  • an amount of oxide remaining on the crystalline substrate should be minimized. If an oxygen content on a surface of the substrate S is too high, oxygen atoms interrupts crystallographic disposition of materials to be deposited on a seed substrate. Thus, it may have a bad influence on the epitaxial process. For example, when a silicon epitaxial deposition is performed, excessive oxygen on the crystalline substrate may displace silicon atoms from its epitaxial position by oxygen atom clusters in atom units.
  • the local atom displacement may cause errors in follow-up atom arrangement when a layer is more thickly grown. This phenomenon may be so-called stacking faults or hillock defects.
  • the oxygenation on the surface of the substrate S may, for example, occur when the substrate is exposed to the atmosphere while the substrate is transferred.
  • the cleaning process for removing a native oxide (or surface oxide) formed on the substrate S may be performed within the cleaning chambers 108 a and 108 b.
  • the cleaning process may be a dry etching process using hydrogen (H*) and NF 3 gases having a radical state.
  • H* hydrogen
  • NF 3 gases having a radical state.
  • reaction gases when radicals (H*) of a hydrogen gas and a reaction gas such as a fluoride gas (for example, nitrogen fluoride (NF 3 ) are supplied into the chamber, the reaction gases are reduced as expressed in following reaction formula (1) to generate an intermediate product such as NH x F y (where x and y are certain integers).
  • a fluoride gas for example, nitrogen fluoride (NF 3 )
  • the intermediate product Since the intermediate product has high reactivity with silicon oxide (SiO 2 ), when the intermediate product reaches a surface of the silicon substrate, the intermediate product selectively reacts with the silicon oxide to generate a reaction product ((NH 4 ) 2 SiF 6 ) as expressed in following reaction formula (2).
  • the reaction product is pyrolyzed as expressed in following reaction formula (3) to form a pyrolysis gas, and then the pyrolysis gas is evaporated.
  • the silicon oxide may be removed from the surface of the substrate.
  • the pyrolysis gas includes a gas containing fluorine such as an HF gas or a SiF 4 gas.
  • the cleaning process may include a reaction process for generating the reaction product and a heating process for pyrolyzing the reaction product.
  • the reaction process and the heating process may be performed at the same time within the cleaning chambers 108 a and 108 b .
  • the reaction process may be performed within one of the cleaning chambers 108 a and 108 b
  • the heating process may be performed within the other one of the cleaning chambers 108 a and 108 b.
  • the buffer chamber 110 provides a space in which the substrate S, on which the cleaning process is completed, is loaded and a space in which the substrate S, on which the epitaxial process is performed, is loaded.
  • the substrate S is transferred into the buffer chamber 110 and then loaded within the buffer chamber 110 before the substrate is transferred into the epitaxial chambers 112 a , 112 b , and 112 c .
  • the epitaxial chambers 112 a , 112 b , and 112 c may be batch type chambers in which a single process is performed on a plurality of substrates.
  • substrates S on which the epitaxial process is performed are successively loaded within the buffer chamber 110 .
  • substrates S on which the cleaning process is completed are successively loaded within the epitaxial chambers 112 a , 112 b , and 112 c .
  • the substrates S may be vertically loaded within the buffer chamber 110 .
  • FIG. 2 is a view illustrating a substrate treated according to the embodiment of the present invention.
  • the cleaning process is performed on the substrate S within the cleaning chambers 108 a and 108 b before the epitaxial process is performed on the substrate S.
  • an oxide 72 formed on a surface of a substrate 70 may be removed through the cleaning process.
  • the oxide 72 may be removed through the cleaning process within the cleaning chamber 108 a and 108 b .
  • an epitaxy surface 74 formed on the surface of the substrate 70 may be exposed through the cleaning process to assist the growth of an epitaxial layer.
  • an epitaxial process is performed on the substrate 70 within the epitaxial chambers 112 a , 112 b , and 112 c .
  • the epitaxial process may be performed by chemical vapor deposition.
  • the epitaxial process may be performed to form an epitaxial layer 76 on the epitaxy surface 74 .
  • the epitaxy surface 74 formed on the substrate 70 may be exposed by reaction gases including a silicon gas (e.g., SiCl 4 , SiHCl 3 , SiH 2 Cl 2 , SiH 3 Cl, Si 2 H 6 , or SiH 4 ) and a carrier gas (e.g., N 2 and/or H 2 ).
  • a silicon-containing gas may include a dopant-containing gas (e.g., AsH 3 , PH3, and/or B 2 H 6 ),
  • FIG. 3 is a flowchart illustrating a process for forming an epitaxial layer according to an embodiment of the present invention.
  • a process for forming an epitaxial layer starts.
  • a substrate S is transferred into cleaning chambers 108 a and 108 b before an epitaxial process is performed on the substrate S.
  • a substrate handler 104 transfers the substrate S into the cleaning chambers 108 a and 108 b .
  • the transfer of the substrate S is performed through a transfer chamber 102 in which a vacuum state is maintained.
  • a cleaning process is performed on the substrate S.
  • the cleaning process includes a reaction process for generating a reaction product and a heating process for pyrolyzing the reaction product.
  • the reaction process and the heating process may be performed at the same time within the cleaning chambers 108 a and 108 b .
  • the reaction process may be performed within one of the cleaning chambers 108 a and 108 b
  • the heating process may be performed within the other one of the cleaning chambers 108 a and 108 b.
  • the substrate S on which the cleaning process is completed is transferred into a buffer chamber 110 and is stacked within the buffer chamber 110 . Then, the substrate S is on standby within the buffer chamber 110 so as to perform the epitaxial process.
  • the substrate S is transferred into epitaxial chambers 112 a , 112 b , and 112 c . The transfer of the substrate S is performed through the transfer chamber 102 in which the vacuum state is maintained.
  • an epitaxial layer may be formed on the substrate S.
  • the substrate S 70 is transferred again into the buffer chamber 110 and is stacked within the buffer chamber 110 . Thereafter, in operation S 80 , the process for forming the epitaxial layer is ended.
  • FIG. 4 is a view of the buffer chamber of FIG. 1 .
  • FIG. 5 is a view of a substrate holder of FIG. 4 .
  • the buffer chamber 110 includes an upper chamber 110 a and a lower chamber 110 b .
  • the lower chamber 110 b has a passage 110 c defined in a side corresponding to the transfer chamber 102 .
  • a substrate S is loaded from the transfer chamber 102 to the buffer chamber 110 through the passage 110 c .
  • the transfer chamber 102 has a buffer passage 102 a defined in a side corresponding to the buffer chamber 110 .
  • a gate valve 103 is disposed between the buffer passage 102 a and the passage 110 c .
  • the gate valve 103 may separate the transfer chamber 102 and the buffer chamber 110 from each other.
  • the buffer passage 102 a and the passage 110 c may be opened or closed by the gate valve 103 .
  • the buffer chamber 110 includes a substrate holder 120 on which substrates S are stacked.
  • the substrates S are vertically stacked on the substrate holder 120 .
  • the substrate holder 120 is connected to an ascending/descending shaft 122 .
  • the ascending/descending shaft 122 passes through the lower chamber 110 b and is connected to a support plate 124 and a driving shaft 128 .
  • the driving shaft 128 ascends or descends by an elevator 129 .
  • the ascending/descending shaft 122 and the substrate holder 120 may ascend or descend by the driving shaft 128 .
  • the substrate handler 104 successively transfers the substrates S, on which the cleaning process is completed, into the buffer chamber 110 .
  • the substrate holder 120 ascends or descends by the elevator 129 .
  • an empty slot of the substrate holder 120 is moved at a position corresponding to the passage 110 c .
  • the substrates S transferred into the buffer chamber 110 are stacked on the substrate holder 120 .
  • the substrate holder 120 may ascend or descend to vertically stack the substrates S.
  • the substrate holder 120 has an upper storage space 120 a and a lower storage space 120 b .
  • the substrates S on which the cleaning process is completed and the substrates S on which the epitaxial process is completed are stacked on the substrate holder 120 .
  • thirteen substrates S may be stacked within the upper storage space 120 a . That is, the thirteen substrates S may be treated within one epitaxial chamber 112 a , 112 b , or 112 c .
  • thirteen substrates S may be stacked within the lower storage space 120 b.
  • the lower chamber 110 b is connected to an exhaust line 132 .
  • the inside of the buffer chamber 110 may be maintained in a vacuum state through an exhaust pump 132 b .
  • a valve 132 a opens or closes the exhaust line 132 .
  • a bellows 126 connects a lower portion of the lower chamber 110 b to the support plate 124 .
  • the inside of the buffer chamber 110 may be sealed by the bellows 126 . That is, the bellows 126 prevents the vacuum state from being released through a circumference of the ascending/descending shaft 122 .
  • FIG. 6 is a view of the cleaning chamber of FIG. 1 .
  • the cleaning chambers 108 a and 108 b may be chambers in which the same process is performed. Thus, only the cleaning chamber 108 a will be exemplified below.
  • the cleaning chamber 108 a includes an upper chamber 118 a and a lower chamber 118 b .
  • the upper chamber 118 a and the lower chamber 118 b may be vertically stacked on each other.
  • the upper chamber 118 a and the lower chamber 118 b have an upper passage 128 a and a lower passage 138 a which are defined in a side corresponding to the transfer chamber 102 , respectively.
  • the substrates S may be loaded to the upper chamber 118 a and the lower chamber 118 b through the upper passage 128 a and the lower passage 138 a , respectively.
  • the transfer chamber 102 has an upper passage 102 b and a lower passage 102 a defined in sides respectively corresponding to the upper chamber 118 a and the lower chamber 118 b .
  • An upper gate valve 105 a is disposed between the upper passage 102 b and the upper passage 128 a
  • a lower gate valve 105 b is disposed between the lower passage 102 a and the lower passage 138 a .
  • the gate valves 105 a and 105 b separates the upper chamber 118 a and the transfer chamber 102 , and the lower chamber 118 b and the transfer chamber 102 from each other, respectively.
  • the upper passage 102 b and the upper passage 128 a may be opened and closed through the upper gate valve 105 a .
  • the lower passage 102 a and the lower passage 138 a may be opened and closed through the lower gate valve 105 b.
  • a reaction process using radicals may be performed on the substrates S in the upper chamber 118 a .
  • the upper chamber 118 a is connected to a radical supply line 116 a and a gas supply line 116 b .
  • the radical supply line 116 a is connected to a gas container (not shown) in which a radical generation gas (e.g., H 2 or NH 3 ) is filled and a gas container (now shown) in which a carrier gas (N 2 ) is filled.
  • a valve of each of the gas containers is opened, the radical generation gas and the carrier gas are supplied into the upper chamber 118 a .
  • the radical supply line 116 a is connected to a microwave source (not shown) through a wave guide.
  • the microwaves proceed into the wave guide and then are introduced into the radical supply line 116 a .
  • the radical generation gas is plasmarized by the microwaves to generate radicals.
  • the generated radicals together with the non-treated radical generation gas, the carrier gas, and byproducts due to the plasmarization may flow along the radical supply line 116 a and be introduced into the upper chamber 118 a .
  • the radicals may be generated by ICP type remote plasma. That is, when the radical generation gas is supplied into the ICP type remote plasma source, the radical generation gas is plasmarized to generate radicals.
  • the generated radicals may flow along the radial supply line 116 a and be introduced into the upper chamber 118 a.
  • the radicals e.g., hydrogen radicals
  • the reaction gas e.g., a fluoride gas such as nitrogen fluoride (NF 3 )
  • NF 3 nitrogen fluoride
  • the reaction gas previously absorbed onto a surface of the substrate S and the radicals react with each other to generate an intermediate product (NH x F y ). Then, the intermediate product (NH x F y ) and native oxide (SiO 2 ) formed on the surface of the substrate S react with each other to generate a reaction product ((NH 4 F)SiF 6 ).
  • the substrate S is placed on a susceptor 128 disposed within the upper chamber 118 a . The susceptor 128 rotates the substrate S during the reaction process to assist the reaction so that the reaction uniformly occurs.
  • the upper chamber 118 a is connected to an exhaust line 119 a .
  • the inside of the upper chamber 118 a may be vacuum-exhausted by an exhaust pump 119 c , and also, the radicals, the reaction gas, the non-reaction radical generation gas, the byproducts due to the plasmarization, and the carrier gas within the upper chamber 118 a may be exhausted to the outside.
  • a valve 119 b opens or closes the exhaust line 119 a.
  • a heating process is performed on the substrate S within the lower chamber 118 b .
  • a heater 148 is disposed in an inner upper portion of the lower chamber 118 b .
  • the substrate S is transferred into the lower chamber 118 b through the substrate handler 104 .
  • the substrate S since the substrate S is transferred through the transfer chamber 102 in which the vacuum state is maintained, it may prevent the substrate S from being exposed to contaminants (e.g., O 2 , particle materials, and the like).
  • the heater 148 heats the substrate S at a predetermined temperature (i.e., a temperature of about 100° C. or more, for example, a temperature of about 130° C.).
  • a predetermined temperature i.e., a temperature of about 100° C. or more, for example, a temperature of about 130° C.
  • the reaction product may be pyrolyzed to generate a pyrolysis gas such as HF or SiF 4 which gets out of the surface of the substrate S.
  • the reaction product may be vacuum-exhausted to remove a thin film formed of silicon oxide from the surface of the substrate S.
  • the substrate S is placed on a susceptor 138 disposed under the heater 148 .
  • the heater 148 heats the substrate S placed on the susceptor 138 .
  • the lower chamber 118 b is connected to an exhaust line 117 a .
  • Reaction byproducts e.g., NH 3 , HF, SiF 4 , and the like
  • a valve 117 b opens or closes the exhaust line 117 a.
  • FIG. 7 is a view illustrating a modified example of the cleaning chamber of FIG. 1 .
  • a cleaning chamber 108 a includes an upper chamber 218 a and a lower chamber 218 b .
  • the upper chamber 218 a and the lower chamber 218 b communicate with each other.
  • the lower chamber 218 b has a passage 219 defined in a side corresponding to the transfer chamber 102 .
  • a substrate S may be loaded from the transfer chamber 102 to the cleaning chamber 108 a through the passage 219 .
  • the transfer chamber 102 has a transfer passage 102 d defined in a side corresponding to the cleaning chamber 108 a .
  • a gate valve 107 is disposed between the transfer passage 102 d and the passage 219 .
  • the gate valve 107 may separate the transfer chamber 102 and the cleaning chamber 108 a from each other.
  • the transfer passage 102 d and the passage 219 may be opened or closed by the gate valve 107 .
  • the cleaning chamber 108 a includes a substrate holder 228 on which substrates S are stacked.
  • the substrates S are vertically stacked on the substrate holder 228 .
  • the substrate holder 228 is connected to a rotation shaft 226 .
  • the rotation shaft 226 passes through the lower chamber 218 b and is connected to an elevator 232 and a driving motor 234 .
  • the rotation shaft 226 ascends or descends by the elevator 232 .
  • the substrate holder 228 may ascend or descend together with the rotation shaft 226 .
  • the rotation shaft 226 is rotated by the driving motor 234 . While an etching process is performed, the substrate holder 228 may be rotated together with the rotation shaft 226 .
  • the substrate handler 104 successively transfers the substrates S into the cleaning chamber 108 a .
  • the substrate holder 228 ascends or descends by the elevator 232 .
  • an empty slot of the substrate holder 228 is moved at a position corresponding to the passage 219 .
  • the substrates S transferred into the cleaning chamber 108 a are stacked on the substrate holder 228 .
  • the substrate holder 228 may ascend or descend to vertically stack the substrates S. For example, thirteen substrates S may be stacked on the substrate holder 228 .
  • the substrates S are stacked within the substrate holder 228 .
  • the cleaning process is performed on the substrates S.
  • the upper chamber 218 a provides a process space in which the cleaning process is performed.
  • a support plate 224 is disposed on the rotation shaft 226 . The support plate 224 ascends together with the substrate holder 228 to block the process space within the upper chamber 218 a from the outside.
  • the support plate 224 is disposed adjacent to an upper end of the lower chamber 218 b .
  • a sealing member 224 a (e.g., an O-ring, and the like) is disposed between the support plate 224 and the upper end of the lower chamber 218 b to seal the process space.
  • a bearing member 224 b is disposed between the support plate 224 and the rotation shaft 226 . The rotation shaft 226 may be rotated in a state where the rotation shaft 226 is supported by the bearing member 224 b.
  • a reaction process and heating process are performed on the substrates within the process space defined in the upper chamber 218 a .
  • the substrate holder 228 ascends by the elevator 232 and then is moved into the process space within the upper chamber 218 a .
  • An injector 216 is disposed on a side of the inside of the upper chamber 218 a .
  • the injector 216 has a plurality of injection holes 216 a.
  • the injector 216 is connected to a radical supply line 215 a .
  • the upper chamber 218 a is connected to a gas supply line 215 b .
  • the radical supply line 215 a is connected to a gas container (not shown) in which a radical generation gas (e.g., H 2 or NH 3 ) is filled and a gas container (now shown) in which a carrier gas (N 2 ) is filled.
  • a valve of each of the gas containers is opened, the radical generation gas and the carrier gas are supplied into the process space through the injector 216 .
  • the radical supply line 215 a is connected to a microwave source (not shown) through a wave guide.
  • the microwaves proceed into the wave guide and then are introduced into the radical supply line 215 a .
  • the radical generation gas is plasmarized by the microwaves to generate radicals.
  • the generated radicals together with the non-treated radical generation gas, the carrier gas, and byproducts due to the plasmarization may flow into the radical supply line 215 a and be supplied into the injector 216 , and then be introduced into the process space through the injector 216 .
  • the radicals may be generated by ICP type remote plasma. That is, when the radical generation gas is supplied into the ICP type remote plasma source, the radical generation gas is plasmarized to generate radicals.
  • the generated radicals may flow along the radial supply line 215 a and be introduced into the upper chamber 218 a.
  • the radicals e.g., hydrogen radicals
  • the reaction gas e.g., a fluoride gas such as nitrogen fluoride (NF 3 )
  • NF 3 nitrogen fluoride
  • reaction gas previously absorbed onto the surface of a substrate S and the radicals react with each other to generate an intermediate product (NH x F y ).
  • intermediate product (NH x F y ) and native oxide (SiO 2 ) formed on the surface of the substrate S react with each other to generate a reaction product ((NH 4 F)SiF 6 ).
  • the substrate holder 228 rotates the substrate S during the etching process to assist the etching process so that the etching process is uniformly performed.
  • the upper chamber 218 a is connected to an exhaust line 217 .
  • the inside of the upper chamber 218 a may be vacuum-exhausted by an exhaust pump 217 b , and also, the radicals, the reaction gas, the non-reaction radical generation gas, the byproducts due to the plasmarization, and the carrier gas within the upper chamber 218 a may be exhausted to the outside.
  • a valve 217 a opens or closes the exhaust line 217 .
  • a heater 248 is disposed on the other side of the upper chamber 218 a .
  • the heater 248 heats the substrate S at a predetermined temperature (i.e., a temperature of about 100° C. or more, for example, a temperature of about 130° C.) after the reaction process is completed.
  • a predetermined temperature i.e., a temperature of about 100° C. or more, for example, a temperature of about 130° C.
  • the reaction product may be pyrolyzed to generate a pyrolysis gas such as HF or SiF4 which gets out of the surface of the substrate S.
  • the reaction product may be vacuum-exhausted to remove a thin film formed of silicon oxide from the surface of the substrate S.
  • the reaction product (e.g., NH 3 , HF, and SiF 4 ) may be exhausted through the exhaust line 217 .
  • FIG. 8 is a view of the epitaxial chambers of FIG. 1
  • FIG. 9 is a view of a supply tube of FIG. 1 .
  • the epitaxial chambers 112 a , 112 b , and 112 c may be chambers in which the same process is performed. Thus, only the cleaning chamber 112 a will be exemplified below.
  • the epitaxial chamber 112 a includes an upper chamber 312 a and a lower chamber 312 b .
  • the upper chamber 312 a and the lower chamber 312 b communicate with each other.
  • the lower chamber 312 b has a passage 319 defined in a side corresponding to the transfer chamber 102 .
  • a substrate S may be loaded from the transfer chamber 102 to the epitaxial chamber 112 a through the passage 319 .
  • the transfer chamber 102 has a transfer passage 102 e defined in a side corresponding to the epitaxial chamber 112 a .
  • a gate valve 109 is disposed between the transfer passage 102 e and the passage 319 .
  • the gate valve 109 may separate the transfer chamber 102 and the epitaxial chamber 112 a from each other.
  • the transfer passage 102 e and the passage 319 may be opened or closed by the gate valve 109 .
  • the epitaxial chamber 112 a includes a substrate holder 328 on which substrates S are stacked.
  • the substrates S are vertically stacked on the substrate holder 328 .
  • the substrate holder 328 is connected to a rotation shaft 318 .
  • the rotation shaft 318 passes through the lower chamber 312 b and is connected to an elevator 319 a and a driving motor 319 b .
  • the rotation shaft 318 ascends or descends by the elevator 319 a .
  • the substrate holder 328 may ascend or descend together with the rotation shaft 318 .
  • the rotation shaft 318 is rotated by the driving motor 319 b . While an epitaxial process is performed, the substrate holder 328 may be rotated together with the rotation shaft 318 .
  • the substrate handler 104 successively transfers the substrates S into epitaxial chamber 112 a .
  • the substrate holder 328 ascends or descends by the elevator 319 a .
  • an empty slot of the substrate holder 328 is moved at a position corresponding to the passage 319 .
  • the substrates S transferred into the epitaxial chamber 112 a are stacked on the substrate holder 328 .
  • the substrate holder 328 may ascend or descend to vertically stack the substrates S. For example, thirteen substrates S may be stacked on the substrate holder 328 .
  • the substrates S are stacked within the substrate holder 328 .
  • the substrate holder 328 is disposed within a reaction tube 314 , the epitaxial process is performed on the substrates S.
  • the reaction tube 314 provides a process space in which the epitaxial process is performed.
  • a support plate 316 is disposed on the rotation shaft 318 . The support plate 316 ascends together with the substrate holder 328 to block the process space within the reaction tube 314 from the outside.
  • the support plate 316 is disposed adjacent to a lower end of the reaction tube 314 .
  • a sealing member 316 a (e.g., an O-ring, and the like) is disposed between the support plate 316 and the lower end of the reaction tube 314 to seal the process space.
  • a bearing member 316 b is disposed between the support plate 316 and the rotation shaft 318 . The rotation shaft 318 may be rotated in a state where the rotation shaft 318 is supported by the bearing member 316 b.
  • the epitaxial process is performed on the substrates S within the process space defined in the reaction tube 314 .
  • a supply tube 332 is disposed on one side of the inside of the reaction tube 314 .
  • An exhaust tube 334 is disposed on the other side of the inside of the reaction tube 314 .
  • the supply tube 332 and the exhaust tube 334 may be disposed to face each other with respect to a center of the substrates S. Also, the supply tube 332 and the exhaust tube 334 may be vertically disposed according to the stacked direction of the substrates S.
  • a lateral heater 324 and an upper heater 326 are disposed outside the reaction tube 314 to heat the process space within the reaction tube 314 .
  • the supply tube 332 is connected to a supply line 332 a , and the supply line 332 a is connected to a reaction gas source 332 c .
  • the reaction gas is stored in the reaction gas source 332 c and supplied into the supply tube 332 through the supply line 332 a .
  • the supply tube 332 may include first and second supply tubes 332 a and 332 b .
  • the first and second supply tubes 332 a and 332 b have a plurality of supply holes 333 a and 333 b spaced from each other in a length direction.
  • the supply holes 333 a and 333 b may have the substantially same number as that of substrates S loaded to the reaction tube 314 .
  • the supply holes 333 a and 333 b may be defined to corresponding between the substrates S or defined regardless of positions of the substrates S.
  • a reaction gas supplied through the supply holes 333 a and 333 b may smoothly flow along a surface of a substrate S to form an epitaxial layer on the substrate S in a state where the substrate S is heated.
  • the supply line 332 a may be opened or closed by a valve 332 b.
  • the first supply tube 332 a may supply a deposition gas (a silicon gas (e.g., SiCl 4 , SiHCl 3 , SiH 2 Cl 2 , SiH 3 Cl, Si 2 H 6 , or SiH 4 )) and a carrier gas (e.g., N 2 and/or H 2 ).
  • the second supply tube 332 b may supply an etching gas.
  • a selective epitaxy process involves deposition reaction and etching reaction.
  • a third supply tube may be added.
  • the third supply tube may supply a dopant-containing gas (e.g., arsine (AsH 3 ), phosphine (PH 3 ), and/or diborane (B 2 H 6 )).
  • a dopant-containing gas e.g., arsine (AsH 3 ), phosphine (PH 3 ), and/or diborane (B 2 H 6 )
  • the exhaust tube 334 may be connected to an exhaust line 335 a to exhaust reaction byproducts within the reaction tube 314 to the outside through an exhaust pump 335 .
  • the exhaust tube 334 has a plurality of exhaust holes. Like the supply holes 333 a and 333 b , the plurality of exhaust holes may be defined to corresponding between the substrates S or defined regardless of positions of the substrates S.
  • a valve 334 b opens or closes the exhaust line 334 a.
  • the native oxide formed on the substrate may be removed, and also, it may prevent the native oxide from being formed on the substrate.
  • the epitaxial layer may be effectively formed on the substrate.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
US14/235,322 2011-08-02 2012-07-31 Equipment for manufacturing semiconductor Abandoned US20140144375A1 (en)

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KR10-2011-0077101 2011-08-02
PCT/KR2012/006106 WO2013019063A2 (ko) 2011-08-02 2012-07-31 에피택셜 공정을 위한 반도체 제조설비

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JP2014529184A (ja) 2014-10-30
CN103718273B (zh) 2016-06-22
JP5899318B2 (ja) 2016-04-06
WO2013019063A2 (ko) 2013-02-07
TWI525735B (zh) 2016-03-11
CN103718273A (zh) 2014-04-09
KR101252742B1 (ko) 2013-04-09
TW201316431A (zh) 2013-04-16
KR20130015223A (ko) 2013-02-13
WO2013019063A3 (ko) 2013-04-04

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