US20020096750A1 - Package for semiconductor chip having thin recess portion and thick plane portion - Google Patents
Package for semiconductor chip having thin recess portion and thick plane portion Download PDFInfo
- Publication number
- US20020096750A1 US20020096750A1 US10/102,901 US10290102A US2002096750A1 US 20020096750 A1 US20020096750 A1 US 20020096750A1 US 10290102 A US10290102 A US 10290102A US 2002096750 A1 US2002096750 A1 US 2002096750A1
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- Prior art keywords
- layer
- metal
- pattern layer
- metal plate
- package
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- H01L2924/01—Chemical elements
- H01L2924/01073—Tantalum [Ta]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Dispersion Chemistry (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Wire Bonding (AREA)
Abstract
In a package for mounting including a metal plate having a recess portion for mounting a semiconductor chip and a plane portion for mounting a metal pattern layer, the recess portion is thinner than the plane portion.
Description
- 1. Field of the Invention
- The present invention relates to a package for a semiconductor chip, and more particularly, to a package having a recess portion for mounting a semiconductor chip and a plane portion for mounting a metal pattern layer.
- 2. Description of the Related Art
- A prior art package includes a heat spreader (metal plate) having a recess portion for mounting a semiconductor chip and a plane portion for mounting a metal pattern layer. The metal plate has a uniform thickness, and a recess having a predetermined depth is formed in the metal plate by a pressing process using metal molds (see Ashtok Domadia et al., TBGA Bond Process for Ground and Power Plane Connections”, IEEE 1996 Electronic Components and Technology Conference, pp. 707-712). This will be explained later in detail.
- In the above-described prior art package, since the recess is formed in the metal plate by a pressing process, it is impossible to remarkably increase the thickness of the metal plate. Even in this case, the thickness of the metal plate is increased by a moderate value to increase the rigidity of the plane portion thereof. This is advantageous in terms of the handling of the package and forming solder balls. Simultaneously, the rigidity of the metal plate around the recess is increased. Therefore, strain generated in the metal plate around the semiconductor chip due to the heating thereof is hardly leaked through the metal plate around the recess thereof, so that large stress is applied to the back surface of the semiconductor chip. Thus, the semiconductor chip is easily peeled from the metal plate, which deteriorates the reliability of the package.
- It is an object of the present invention to provide a package for a semiconductor chip capable of decreasing the manufacturing cost.
- Another object is to improve the reliability of a package for a semiconductor chip.
- According to the present invention, in a package for mounting including a metal plate having a recess portion for mounting a semiconductor chip and a plane portion for mounting a metal pattern layer, the recess portion is thinner than the plane portion.
- Also, in a method for manufacturing a package including a metal plate including a recess portion for mounting a semiconductor chip and a plane portion for mounting a metal pattern layer, a photoresist pattern layer is formed to cover the plane portion of the metal plate, and the metal plate is etched by using the photoresist pattern layer as a mask.
- The present invention will be more clearly understood from the description set forth below, as compared with the prior art, with reference to the accompanying drawings, wherein:
- FIG. 1 is a cross-sectional view illustrating a prior art package;
- FIG. 2 is a cross-sectional view illustrating a first embodiment of the package according to the present invention;
- FIG. 3 is a partial perspective view of the package of FIG. 2;
- FIGS. 4A through 4H are cross-sectional views for explaining the method for manufacturing the package of FIGS. 2 and 3.
- FIG. 5 is a cross-sectional view illustrating a second embodiment of the package according to the present invention; and
- FIGS. 6A through 6H are cross-sectional views for explaining the method for manufacturing the package of FIG. 5.
- Before the description of the preferred embodiments, a prior art package with be explained with reference to FIG. 1 (see: Ashtok Domadia et al., “TBGA Bond Process for Ground and Power Plane Connections”, IEEE1996 Electronic Components and Technology Conference, pp.707-712).
- In FIG. 1, which illustrates a prior art one-connection-layer type ball grid array (BGA) type package, a
heat spreader 101 made of metal has a uniform thickness, and a recess 101 a having a predetermined depth is formed in theheat spreader 101 by a pressing process using metal molds. Note that theheat spreader 101 also serves as a ground plane layer. - A power
supply plane layer 102 is adhered by anadhesive layer 103 on aplane portion 101 b of theheat spreader 101. Also, an organicinsulating pattern layer 103 is adhered by anadhesive layer 105 on the powersupply plane layer 102. - On the other hand, a
semiconductor chip 106 is mounted in the recess 101 a of theheat spreader 101 by amount material layer 108 made of Ag paste. -
Electrodes 106 a of thesemiconductor chip 106, theheat spreader 101, the powersupply plane layer 102 and the like are electrically connected by copperfoil connection lines 108 using a tape automated bonding (TAB) process. - The
semiconductor chip 106 is sealed by athermosetting resin layer 109. -
Solder balls 110 as external electrodes are formed on the copperfoil connection lines 108. - In the package of FIG. 1, since the recess101 a is formed in the
heat spreader 101 by a pressing process, it is impossible to remarkably increase the thickness of theheat spreader 101. Even in this case, the thickness of theheat spreader 101 is increased by a moderate value to increase the rigidity of theplane portion 101 b of theheat spreader 101. This is advantageous in terms of the handling of the package and forming thesolder balls 110. Simultaneously, the rigidity of the heat spreader 101 around the recess 101 a thereof as indicated by X in FIG. 1 is increased. Therefore, strain generated in theheat spreader 101 around thesemiconductor chip 106 due to the heating thereof is hardly leaked through theheat spreader 101 around the recess 101 a thereof, so that large stress is applied to the back surface of thesemiconductor chip 106 and themount material layer 107. Thus, thesemiconductor chip 106 is easily peeled from theheat spreader 101, which deteriorates the reliability of the package. - Note that, if the
heat spreader 101 is constructed in advance so that the center portion is thin to decrease the rigidity thereof and the peripheral portion is thick, to increase the rigidity thereof, the above-mentioned disadvantages are dissolved. However, in this case, the manufacturing steps become complex, which increases the manufacturing cost. - In FIG. 2, which illustrates a first embodiment of the package according to the present invention, a heat spreader I made of copper or aluminum has a thin recess portion la and a
thick plane portion 1 b. Note that theheat spreader 1 also serves as a ground plane layer. - An organic
insulating pattern layer 2 made of polyimide is formed on theplane portion 1 b of theheat spreader 1, and ametal pattern layer 3 made of copper foil is formed on the organicinsulating pattern layer 2. - On the other hand, a
semiconductor chip 4 is mounted on therecess portion 1 a of theheat spreader 1 by amount material layer 6 made of Ag paste. -
Electrodes 4 a of thesemiconductor chip 4, theheat spreader 1 and themetal pattern layer 3 are electrically connected by bondingwire 6 made of Au. - The
semiconductor chip 4 is sealed by athermosetting resin layer 7. In this case, adam 8 is provided to prevent thethermosetting resin layer 7 from being leaked into theplane portion 1 b of theheat spreader 1. -
Solder balls 9 as external electrodes are formed on themetal pattern layer 3. In this case, each of thesolder balls 9 is connected via themetal pattern layer 3 atthroughholes 2 a of the organicinsulating pattern layer 2 toland patterns 10. Note that theland patterns 10 are formed by etching theheat spreader 1. - In FIG. 3, which is a partial perspective view of the package of FIG. 2, the
recess portion 1 a of theheat spreader 1 has a thickness Ta and theplane portion 1 b of theheat spreader 1 has a thickness Tb (>Ta). For example, - T b=0.20˜0.50 mm (preferably, about 0.20 mm)
- T a =T b−about 20 to 50 μm
- Also, the organic
insulating pattern layer 2 has a thickness T2 of about 25 to 60 μm, preferably about 50 μm. - Further, the
metal pattern layer 3 has a thickness T3of about 18 to 35 μm, preferably about 20 μm. - In the package of FIGS. 2 and 3, since the
recess portion 1 a is formed in theheat spreader 1 by an etching process as will be explained later, it is possible to remarkably increase the thickness of theheat spreader 1. As a result, the rigidity of theplane portion 1 b of theheat spreader 1 can be sufficiently increased. This is advantageous in terms of the handling of the package and forming thesolder balls 9. Simultaneously, the rigidity of theheat spreader 1 around the recess portion la thereof as indicated by Y in FIGS. 2 and 3 can be decreased. Therefore, strain generated in theheat spreader 1 around thesemiconductor chip 4 due to the heating thereof is easily leaked through theheat spreader 1 around therecess portion 1 a thereof, so that large stress is hardly applied to the back surface of thesemiconductor chip 4 and themount material layer 5. Thus, thesemiconductor chip 4 is hardly peeled from theheat spreader 1, which improves the reliability of the package. - The method for manufacturing the package of FIGS. 2 and 3 will be explained with reference to FIGS. 4A through 4H.
- First, referring to FIG. 4A, an about 50 μm thick organic insulating
layer 20 made of polyimide is coated on an about 0.2 mm thick metal plate (heat spreader) 1 of copper or aluminum. Then, a metal layer 30-a made of copper is deposited on the organic insulatinglayer 20. Then, aphotoresist pattern layer 401 is formed by a photolithography process. - Next, referring to FIG. 4B, the metal layer30-a is etched by using the photoresist pattern layer 31 as a mask, to form a metal pattern layer 3-a. In this case, a
throughhole 2 a having a diameter of about 0.1 mm is perforated in the metal pattern layer 3-a. Then, thephotoresist pattern layer 401 is removed. - Next, referring to FIG. 4C, the organic insulated
layer 20 is etched by using the metal pattern layer 3-a as a mask, to form an organicinsulating pattern layer 2. Note that the throughhole 2 a is further deepened. - Next, referring to FIG. 4D, an about 25 μm thick metal layer30-b made of copper is plated on the entire surface.
- Next, referring to FIG. 4E, a
photoresist pattern layer 402 for covering a plane portion of themetal plate 1 is formed by a photolithography process. - Next, referring to FIG. 4F, the metal layer30-b is etched by using the
photoresist pattern layer 402 as a mask, to form a metal pattern layer 3-b. The metal pattern layers 3-a and 3-b form ametal pattern layer 3. In this case, themetal plate 1 is also etched, so that themetal plate 1 is divided into a thin portion, i.e., arecess portion 1 a and a thick portion, i.e., aplane portion 1 b. Then, thephotoresist pattern layer 402 is removed. - Next, referring to FIG. 4G, the
plane portion 1 b of themetal plate 1 is etched to form alandpattern 10. - Next, referring to FIG. 4H, a pressing process using metal molds is performed upon the
recess portion 1 a of themetal plate 1, to form a recess therein. - Finally, a semiconductor chip (not shown) is mounted on the
recess portion 1 a of theheat spreader 1 by a mount material layer (not shown) made of Ag paste. Then, electrodes of the semiconductor chip, themetal plate 1 and themetal pattern layer 3 are electrically connected by bonding wire not shown) made of Au. Then the semiconductor chip is sealed by a thermosetting resin layer (not shown). Also, solder balls (not shown) as external electrodes are formed on themetal pattern layer 3. In this case, each of thesolder balls 9 is connected via themetal pattern layer 3 at throughholes 2 a of the organic insulatingpattern layer 2 to theland patterns 10. Thus, the package of FIGS. 2 and 3 is completed. - In the method as illustrated in FIGS. 4A through 4H, since the process of etching the
metal plate 1 for therecess portion 1 a thereof is carried out simultaneously with the process of etching the metal layer 30-b for themetal pattern layer 3, the manufacturing steps can be simplified, which decreases the manufacturing cost. In addition, since the TAB process and the process using theadhesive layers - In FIG. 5, which illustrates a second embodiment of the package according to the present invention, a plurality of pedestal type protrusions It having a height of about 5 to 10 μm are provided on the recess portion la of the
metal plate 1. As a result, the contact surface of themount material layer 5 in contact with themetal plate 1 is increased, so that the tight contact characteristics of thesemiconductor chip 1 to themetal plate 1 are improved, which improves the reliability of the package. - The method for manufacturing the package of FIG. 5 will be explained next with reference to FIGS. 6A through 6H.
- First, referring to FIG. 6A, in the same way as in FIG. 4A, an about 50 μm thick organic insulating
layer 20 made of polyimide is coated on an about 0.2 mm thick metal plate (heat spreader) 1 of copper or aluminum. Then, a metal layer 30-a made of copper is deposited on the organic insulatinglayer 20. Then, aphotoresist pattern layer 401 is formed by a photolithography process. - Next, referring to FIG. 6B, in the same way as in FIG. 4B, the metal layer30-a is etched by using the
photoresist pattern layer 401 as a mask, to form a metal pattern layer 3-a. In this case, athroughhole 2 a having a diameter of about 0.1 mm is perforated in the metal pattern layer 3-a. Then, thephotoresist pattern layer 401 is removed. - Next, referring to FIG. 6C, in the same way as in FIG. 4C, the organic insulated
layer 20 is etched by using the metal pattern layer 3-a as a mask, to form an organicinsulating pattern layer 2. Note that thethroughhole 2 a is further deepened. - Next, referring to FIG. 6D, in the same way as in FIG. 4D, an about 25 μm thick metal layer30-b made of copper is plated on the entire surface.
- Next, referring to FIG. 6E, in a similar way to FIG. 4E, a
photoresist pattern layer 402′ for covering a plane portion of themetal plate 1 is formed by a photolithography process. In this case, thephotoresist pattern layer 402′ has a grid shape pattern including rectangles of about 50 to 100 μm in a recess portion of themetal plate 1. - Next, referring to FIG. 6F, in the same way as in FIG. 4F, the metal layer30-b is etched by using the
photoresist pattern layer 402 as a mask, to form a metal pattern layer 3-b. The metal pattern layers 3-a and 3-b form ametal pattern layer 3. In this case, themetal plate 1 is also etched, so that themetal plate 1 is divided into a thin portion, i.e., a recess portion la and a thick portion, i.e., aplane portion 1 b. Also, a plurality ofpedestal type protrusions 11 having a height of about 5 to 10 μm are formed in therecess portion 1 a. Then, thephotoresist pattern layer 402′ is removed. - Next, referring to FIG. 6G, in the same way as in FIG. 4G, the
plane portion 1 b of themetal plate 1 is etched to form alandpattern 10. - Next, referring to FIG. 6H, in the same way in FIG. 4H, a pressing process using metal molds is performed upon the
recess portion 1 a of themetal plate 1, to form a recess therein. In this case, one of the metal molds abutting the protrusions It is adjusted so that the clearance theretween is about several μm. - Finally, in the same way as in the method for the first embodiment, a semiconductor chip (not shown) is mounted on the
recess portion 1 a of theheat spreader 1 by a mount material layer (not shown) made of Ag paste. Then, electrodes of the semiconductor chip, themetal plate 1 and themetal pattern layer 3 are electrically connected by bonding wire (not shown) made of Au. Then the semiconductor chip is sealed by a thermosetting resin layer (not shown). Also, solder balls (not shown) as external electrodes are formed on themetal pattern layer 3. In this case, each of thesolder balls 9 is connected via themetal pattern layer 3 at throughholes 2 a of the organic insulatingpattern layer 2 to theland patterns 10. Thus, the package of FIG. 5 is completed. - Note that when the package of FIGS. 2 and 5 is mounted on a printed circuit board, the package is faced down, so that the
solder balls 9 are in contact with the printed circuit board. Also, theland patterns 10 are used for testing the electrical contact ofsolder balls 9 to themetal pattern layer 3. - Although the above-described embodiments relate to a BGA type package, the present invention can be applied to other types of packages.
- As explained hereinabove, according to the present invention, the manufacturing steps can be simplified to decrease the manufacturing cost. In addition, the reliability can be improved.
Claims (8)
1. A package comprising a metal plate including a recess portion for mounting a semiconductor chip and a plane potion for mounting a metal pattern layer,
said recess portion being thinner than said plane portion.
2. The package as set forth in claim 1 , wherein said recess portion has a plurality of protrusions for facing said semiconductor chip.
3. A method for manufacturing package including a metal plate including a recess portion for mounting a semiconductor chip and a plane portion for mounting a metal pattern layer, comprising the steps of:
forming a photoresist pattern layer for covering said plane portion of said metal plate; and
etching said metal plate by using said photoresist pattern layer as a mask.
4. The method as set forth in claim 3 , wherein said photoresist pattern layer has a plurality of patterns on said recess portion of said metal plate, so that a plurality of protrusions are formed on said recess portion of said metal plate.
5. A method for manufacturing a package for mounting including a metal plate including a recess portion for mounting a semiconductor chip and a plane portion for mounting a metal pattern layer, comprising the steps of:
forming an insulating layer on a metal plate;
forming a first metal layer on said insulating layer;
forming a first photoresist pattern layer on said first metal layer above said plane portion of said metal plate;
etching said first metal layer by using said first photoresist pattern layer as a mask;
removing said first photoresist pattern layer after said first metal layer is etched;
etching said insulating layer by using said first metal layer as a mask after said first photoresist pattern layer is removed;
forming a second metal layer on said metal plate and said first metal layer after said insulating layer is etched; and
forming a second photoresist pattern layer on said second metal layer above said plane portion of said metal plate;
etching said second metal layer and said recess portion of said metal plate by using said second photoresist pattern.
6. The method as set forth in claim 5 , wherein said second photoresist pattern layer has a plurality of patterns on said recess portion of said metal layer.
7. The method as set forth in claim 5 , wherein said first photoresist pattern layer has a throughhole on said plane portion of said metal plate.
8. The method as set forth in claim 5 , wherein said second metal layer forming step forms said second metal layer by using a plating process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/102,901 US20020096750A1 (en) | 1998-04-17 | 2002-03-22 | Package for semiconductor chip having thin recess portion and thick plane portion |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP107643/1998 | 1998-04-17 | ||
JP10107643A JP3097653B2 (en) | 1998-04-17 | 1998-04-17 | Semiconductor device package and method of manufacturing the same |
US09/291,322 US6379996B1 (en) | 1998-04-17 | 1999-04-15 | Package for semiconductor chip having thin recess portion and thick plane portion |
US10/102,901 US20020096750A1 (en) | 1998-04-17 | 2002-03-22 | Package for semiconductor chip having thin recess portion and thick plane portion |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/291,322 Division US6379996B1 (en) | 1998-04-17 | 1999-04-15 | Package for semiconductor chip having thin recess portion and thick plane portion |
Publications (1)
Publication Number | Publication Date |
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US20020096750A1 true US20020096750A1 (en) | 2002-07-25 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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US09/291,322 Expired - Fee Related US6379996B1 (en) | 1998-04-17 | 1999-04-15 | Package for semiconductor chip having thin recess portion and thick plane portion |
US10/102,901 Abandoned US20020096750A1 (en) | 1998-04-17 | 2002-03-22 | Package for semiconductor chip having thin recess portion and thick plane portion |
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Application Number | Title | Priority Date | Filing Date |
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US09/291,322 Expired - Fee Related US6379996B1 (en) | 1998-04-17 | 1999-04-15 | Package for semiconductor chip having thin recess portion and thick plane portion |
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US (2) | US6379996B1 (en) |
JP (1) | JP3097653B2 (en) |
KR (1) | KR19990083251A (en) |
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US20030146509A1 (en) * | 2002-02-01 | 2003-08-07 | Broadcom Corporation | Ball grid array package with separated stiffener layer |
US20050133905A1 (en) * | 2000-12-22 | 2005-06-23 | Broadcom Corporation | Method of assembling a ball grid array package with patterned stiffener layer |
US20070007644A1 (en) * | 2000-12-22 | 2007-01-11 | Broadcom Corporation | Ball grid array package enhanced with a thermal and electrical connector |
US20070045824A1 (en) * | 2000-12-22 | 2007-03-01 | Broadcom Corporation | Methods of making a die-up ball grid array package with printed circuit board attachable heat spreader |
US8829557B2 (en) * | 2011-04-08 | 2014-09-09 | Lg Innotek Co., Ltd. | Light emitting device module and lighting system including the same |
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US7259448B2 (en) * | 2001-05-07 | 2007-08-21 | Broadcom Corporation | Die-up ball grid array package with a heat spreader and method for making the same |
KR100378285B1 (en) * | 2001-06-15 | 2003-03-29 | Dongbu Electronics Co Ltd | Semiconductor package and fabricating method thereof |
US6897562B2 (en) * | 2003-04-11 | 2005-05-24 | Motorola Corporation | Electronic component and method of manufacturing same |
US7247493B2 (en) * | 2004-05-18 | 2007-07-24 | Virbac Corporation | Reusable pH sensor device and related methods |
US8120152B2 (en) | 2008-03-14 | 2012-02-21 | Advanced Semiconductor Engineering, Inc. | Advanced quad flat no lead chip package having marking and corner lead features and manufacturing methods thereof |
US8124447B2 (en) | 2009-04-10 | 2012-02-28 | Advanced Semiconductor Engineering, Inc. | Manufacturing method of advanced quad flat non-leaded package |
US20110163430A1 (en) * | 2010-01-06 | 2011-07-07 | Advanced Semiconductor Engineering, Inc. | Leadframe Structure, Advanced Quad Flat No Lead Package Structure Using the Same, and Manufacturing Methods Thereof |
JP6041440B2 (en) * | 2013-11-18 | 2016-12-07 | ジャパンマリンユナイテッド株式会社 | Fin device and ship |
JP6351700B2 (en) | 2016-12-27 | 2018-07-04 | ジャパンマリンユナイテッド株式会社 | Fin device and ship |
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- 1999-04-16 KR KR1019990013540A patent/KR19990083251A/en not_active Application Discontinuation
-
2002
- 2002-03-22 US US10/102,901 patent/US20020096750A1/en not_active Abandoned
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Cited By (9)
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US20050133905A1 (en) * | 2000-12-22 | 2005-06-23 | Broadcom Corporation | Method of assembling a ball grid array package with patterned stiffener layer |
US20070007644A1 (en) * | 2000-12-22 | 2007-01-11 | Broadcom Corporation | Ball grid array package enhanced with a thermal and electrical connector |
US20070045824A1 (en) * | 2000-12-22 | 2007-03-01 | Broadcom Corporation | Methods of making a die-up ball grid array package with printed circuit board attachable heat spreader |
US7893546B2 (en) | 2000-12-22 | 2011-02-22 | Broadcom Corporation | Ball grid array package enhanced with a thermal and electrical connector |
US20110140272A1 (en) * | 2000-12-22 | 2011-06-16 | Broadcom Corporation | Ball Grid Array Package Enhanced With a Thermal and Electrical Connector |
US8310067B2 (en) | 2000-12-22 | 2012-11-13 | Broadcom Corporation | Ball grid array package enhanced with a thermal and electrical connector |
US20030146509A1 (en) * | 2002-02-01 | 2003-08-07 | Broadcom Corporation | Ball grid array package with separated stiffener layer |
EP1333490A3 (en) * | 2002-02-01 | 2006-04-19 | Broadcom Corporation | Ball grid array package with patterned stiffener layer |
US8829557B2 (en) * | 2011-04-08 | 2014-09-09 | Lg Innotek Co., Ltd. | Light emitting device module and lighting system including the same |
Also Published As
Publication number | Publication date |
---|---|
US6379996B1 (en) | 2002-04-30 |
JP3097653B2 (en) | 2000-10-10 |
JPH11307674A (en) | 1999-11-05 |
KR19990083251A (en) | 1999-11-25 |
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Owner name: NEC ELECTRONICS CORPORATION, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:NEC CORPORATION;REEL/FRAME:013793/0477 Effective date: 20021101 |
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STCB | Information on status: application discontinuation |
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