US20020070127A1 - Catalyst reactor for processing hazardous gas using non-thermal plasma and dielectric heat and method threreof - Google Patents
Catalyst reactor for processing hazardous gas using non-thermal plasma and dielectric heat and method threreof Download PDFInfo
- Publication number
- US20020070127A1 US20020070127A1 US09/965,696 US96569601A US2002070127A1 US 20020070127 A1 US20020070127 A1 US 20020070127A1 US 96569601 A US96569601 A US 96569601A US 2002070127 A1 US2002070127 A1 US 2002070127A1
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- United States
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- reactor
- catalyst
- dielectric
- hazardous gas
- planar electrodes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/24—Stationary reactors without moving elements inside
- B01J19/248—Reactors comprising multiple separated flow channels
- B01J19/249—Plate-type reactors
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0835—Details relating to the shape of the electrodes substantially flat
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0875—Gas
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0892—Materials to be treated involving catalytically active material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
- B01J2219/0896—Cold plasma
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/24—Stationary reactors without moving elements inside
- B01J2219/2401—Reactors comprising multiple separate flow channels
- B01J2219/245—Plate-type reactors
- B01J2219/2451—Geometry of the reactor
- B01J2219/2453—Plates arranged in parallel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/24—Stationary reactors without moving elements inside
- B01J2219/2401—Reactors comprising multiple separate flow channels
- B01J2219/245—Plate-type reactors
- B01J2219/2461—Heat exchange aspects
- B01J2219/2467—Additional heat exchange means, e.g. electric resistance heaters, coils
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/24—Stationary reactors without moving elements inside
- B01J2219/2401—Reactors comprising multiple separate flow channels
- B01J2219/245—Plate-type reactors
- B01J2219/2476—Construction materials
- B01J2219/2477—Construction materials of the catalysts
- B01J2219/2479—Catalysts coated on the surface of plates or inserts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/24—Stationary reactors without moving elements inside
- B01J2219/2401—Reactors comprising multiple separate flow channels
- B01J2219/245—Plate-type reactors
- B01J2219/2476—Construction materials
- B01J2219/2483—Construction materials of the plates
- B01J2219/2487—Ceramics
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/24—Stationary reactors without moving elements inside
- B01J2219/2401—Reactors comprising multiple separate flow channels
- B01J2219/245—Plate-type reactors
- B01J2219/2476—Construction materials
- B01J2219/2483—Construction materials of the plates
- B01J2219/2488—Glass
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/24—Stationary reactors without moving elements inside
- B01J2219/2401—Reactors comprising multiple separate flow channels
- B01J2219/245—Plate-type reactors
- B01J2219/2491—Other constructional details
- B01J2219/2497—Size aspects, i.e. concrete sizes are being mentioned in the classified document
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Definitions
- the present invention relates to a reactor and a method for processing a hazardous gas using a non-thermal plasma technology and a dielectric heat, and more particularly to a reactor and method for processing hazardous gas, capable of improving a removing rate of the hazardous gas and the selectivity of a reacting process using a dielectric heat produced by a non-thermal plasma and catalyst at a process of decomposing the hazardous gas.
- the reactor for processing hazardous gas using non-thermal plasma includes a tubular body, in which dielectric pellets or beads are filled.
- the dielectric pellets or beads are coated with a catalyst.
- the pressure loss is happened due to the packed dielectric material in the reactor.
- particulate materials contained in the discharged gas would lead the reactor to be clogged.
- interfaces of pellets or beads may be clacked.
- a number of tubular reactors must be provided in a bundle in order to process a large volume of discharged gas, there is a problem that the size of the entire system is huge.
- the present invention relates to a reactor and a method for processing a hazardous gas using a non-thermal plasma and a catalyst at same time, the hazardous gas comprising volatile organic compounds, perfluoro-compounds, chlorofluorocarbons, trichloroethylene, dioxin, and nitrogen oxide, wherein the catalyst and the electric heat which is not used in the prior art non-thermal plasma reactor are effectively employed, thereby decreasing the power needed for the operator, and suppressing the production of the by-product of particles or liquid.
- a reactor for processing hazardous gas using non-thermal plasma and dielectric heat produced when the non-thermal plasma is produced comprising: a body having an inlet and an outlet; a plurality of planar electrodes arranged parallel in the body and spaced apart from each other at a certain interval, in which the plurality of planar electrodes are alternately connected to an alternating current power, and a ground such that every other planar electrode is connected to the alternating current power and the remaining planar electrodes are connected to the ground; and a power supply unit for applying a voltage of an alternating current frequency to the planar electrodes.
- Each planar electrode includes two dielectric plates, one side of the dielectric plate is coated with a metallic thin film and the other side is coated with a catalyst.
- the two dielectric plates are adhered in such a manner that the metallic thin film of one dielectric plate faces to the metallic thin film of the other dielectric plate.
- the dielectric plate has a thickness of 0.1 to 2 mm, and is made of one among ceramic, glass, and quartz.
- the catalyst is any one selected from a metallic catalyst group containing Pt, Pd, V, and Rh, a zeolite catalyst group containing MS 5A and MS 3A, and a photo catalyst group containing TiO 2 .
- the power supplied to the planar electrode by the power supply unit is an alternating current voltage of 1 kV to 30 kV at a frequency of 50 Hz to 100 kHz.
- a method for processing hazardous gas using the reactor comprising: installing a plurality of planar electrodes parallel in a reactor, each of planar electrode comprising two dielectric plates, each of the dielectric plates including a catalyst layer coated on an outer surface thereof, and the plurality of planar electrodes being alternately connected to an alternating current power and a ground; applying an alternating current voltage of an alternating current frequency to the planar electrodes to produce a non-thermal plasma and a dielectric heat; supplying the hazardous gas into the reactor; and carrying out a plasma reaction and a catalysis reaction on the hazardous gas to cause a decomposition of the hazardous gas.
- FIG. 1 is a perspective view illustrating the construction of a reactor for processing hazardous gas using non-thermal plasma according to a preferred embodiment of the present invention
- FIG. 2 is a perspective view illustrating the arranging state of a planar electrode of a reactor shown in FIG. 1;
- FIG. 3 is a view illustrating the construction of a planar electrode in FIG. 2.
- FIG. 4 is a graph showing the efficiency of non-thermal plasma and a catalyst used for a reactor according to one embodiment of the present invention.
- the reactor for processing hazardous gas using non-thermal plasma and dielectric heat comprises a cubic body 10 with a desired space therein.
- the body is provided on its front with a flow distributor 14 having an inlet 12 for injecting the hazardous gas into the body.
- the body also includes an outlet (not shown).
- the body 10 includes two or more planar electrodes 16 .
- each electrode 16 has a cubic shape.
- the planar electrode 16 includes two dielectric plates 18 made of a material such as ceramic, glass, or quartz, these materials having both electrically insulating property and dielectric property.
- Each dielectric plate 18 may have a thickness of 0.1 to 2 mm.
- a dimension of each dielectric plate 18 may be determined depending upon the whole capacity of the reactor, so its length and width may be selected from a few mm to several hundreds mm.
- each dielectric plate 18 has one side applied with a metallic coating or metallic thin film 20 to conduct electricity, and the other side applied with catalyst or an adsorbent 22 .
- Each planar electrode 16 is made by closely contacting two dielectric plates 18 . Specifically, one side of one dielectric plate 18 , on which the metallic thin film 20 is applied, is adhered to one side of the other dielectric plate 18 , on which the metallic thin film 20 is applied, so that one planar electrode 16 is formed.
- the planar electrode may be formed by interposing a metallic thin film between two dielectric plates. At that time, it is unnecessary to apply the metallic thin film on the adhered surface of each dielectric plate.
- planar electrodes 16 formed by the above process are arranged in parallel in the body of the reactor, as shown in FIG. 2.
- the number of the planar electrodes may be optionally set depending upon the performance or volume of the reactor.
- One is connected to an AC supply 24 , while the other is connected a ground 26 .
- a distance between two adjacent planar electrodes is about 1 to 6 mm.
- the planar electrode 16 may be arranged in parallel in several tens or hundreds pairs depending upon the performance of the reactor or a flow rate of the gas to be processed.
- the body forming an outside part of the reactor may be made of ceramic, so that the body can stand the high temperature, as well as having an electrically insulating property.
- a power supply unit 28 connected to each planar electrode 16 of the reactor supplies an alternating current of 5 to 20 kV at a specific frequency of several tens Hz or several hundred thousands Hz.
- an inductance and a charging circuit may be provided between the power supply unit and the reactor, in order to achieve the impedance matching between the power supply unit and the reactor.
- the catalyst coated on the dielectric plate may be one or more selected from metal catalysts containing Ni, Cu, Co or the like, as well as noble catalysts containing Pt, Rd, Pd or the like, which are known to cause the catalyst to be activated due to the heat.
- metal catalysts containing Ni, Cu, Co or the like as well as noble catalysts containing Pt, Rd, Pd or the like, which are known to cause the catalyst to be activated due to the heat.
- the metallic catalyst may be coated thereon.
- the adsorbent may be ⁇ -alumina or zeolite.
- the zeolite is molecular sieve 3A or 5A.
- the superior performance may be achieved by using a catalyst substituted with alkali earth metal on such molecular sieve.
- the power supply unit 28 supplies a power to the reactor, an electric discharge is happened between the planar electrodes 16 , thereby producing electrons and ions.
- the produced electrons decompose directly a gas molecule to be processed, or are oxidized or deoxidized by O, OH, HO 2 , N radical or ion produced due to the collision between electrons and air or added gas molecules which are supplied together with hazardous gas to be processed.
- the above reacting process is the principle of the typical non-thermal plasma.
- the reactor according to the present invention raises the temperature therein using the dielectric heat to easily achieve the desired reaction, and may achieve a combined effect of the non-thermal plasma reaction and the catalysis reaction by activating the catalyst using the heat generated by the dielectric heat in the reactor.
- the combined effect of the non-thermal plasma reaction and the catalysis reaction has an advantage as follows, in relative to the prior non-thermal plasma reaction or catalysis reaction.
- the present invention using both non-thermal plasma reaction and catalysis reaction lowers the temperature, at which the catalyst is activated, so that the process can be performed at a lower temperature.
- the hazardous gas or an oxidizing agent for example, oxygen, moisture or additive
- the selectivity of reaction may be increased by using the catalyst together with the non-thermal plasma.
- the catalyst activated by the dielectric heat, the reaction product is easily oxidized, finally converted into carbon dioxide and water.
- a dimension of the planar electrode 16 is 76 mm ⁇ 76 mm ⁇ 1 mm, a dimension of the inner metallic thin film 20 is 60 mm ⁇ 60 mm ⁇ 0.1 mm, the number of the planar electrodes 16 is 15 and a distance between two adjacent planar electrodes 16 is 2 mm. Between two adjacent planar electrodes 16 , a reacting space is formed. The reactor is applied with an alternating current of voltage 11 kV and frequency 60 Hz, to produce the non-thermal plasma. At that time, although the power supply was continued during 5 to 6 hours, and the above process was repeated by 10 times, there was no found serious damage due to the insulating destruction in the reactor.
- the dielectric plate 18 of the planar electrode 16 may be one selected from a ⁇ -alumina plate, a ⁇ -alumina plate with ⁇ -alumina and platinum coated, a ⁇ -alumina plate with zeolite coated, a quartz plate or the like.
- the reactor according to the present invention may be used in a process of high flow rate, and if particles are generated at the reacting process, there is no clogging phenomenon in the reactor.
- the air containing toluene of several tens ppm to several hundreds ppm is supplied into the reactor and is processed for a long time, a portion of toluene is not oxidized, but is transformed into carbon compounds of particles, thereby adhering to the electrode.
- the adhered by-product causes the electric property of the electrode to be changed and provides a problem of power supply.
- the platinum catalyst inducing the oxidation reaction is coated on the electrode plate, the production of the by-product of particles or liquid is significantly reduced, and after a certain period, the adhered carbon compounds can be removed by injecting the air only.
- toluene of 300 ppm as the hazardous gas is supplied to the reactor together with the air, and immediately, the alternating current of 11 kV is applied to the reactor at a frequency of 60 Hz. At that time, the concentration of the toluene discharged from the rear end of the reactor is measured.
- the planar electrodes are used as following; 1) the planar electrode of a ⁇ -alumina plate, 2) the planar electrode of a ⁇ -alumina plate with ⁇ -alumina coated, and 3) the planar electrode of a ⁇ -alumina plate with ⁇ -alumina and platinum coated.
- an operating temperature (a temperature of the air supplied to the reactor and the environment) of each electrode is set to a room temperature, 60° C. and 100° C.
- the decomposing rate is also increased in proportion to the increased temperature in the reactor, as the above case of toluene.
- NF 3 is merely decomposed by the heat if the temperature in the reactor is above 400° C., the increase of the decomposing rate by the reactor is observed, without using the catalysis.
- CF 4 can be decomposed at a temperature of above 1200° C. to 1800° C., there needs an electrode with platinum catalyst coated.
- platinum catalyst when the non-thermal plasma is produced while the temperature in the reactor is maintained in a level of 300° C. to 400° C., CF 4 begins to be decomposed.
- the technology of increasing the reacting temperature according to the present invention may be employed to decompose the inorganic compound such as dioxin, PFC, CFC and nitric oxide, as well as VOC such as toluene.
- the dielectric heat produced when the non-thermal plasma is produced by the AC power supply and the dielectric electrode may be used together with the catalyst in the reacting process, thereby improving the reacting efficiency.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Fire-Extinguishing Compositions (AREA)
- Treating Waste Gases (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR10-2000-0075601A KR100434940B1 (ko) | 2000-12-12 | 2000-12-12 | 저온 플라즈마 및 유전열을 이용하여 유해가스를 처리하기위한 촉매 반응기 및 그 처리방법 |
KR2000-75601 | 2000-12-12 |
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US20020070127A1 true US20020070127A1 (en) | 2002-06-13 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US09/965,696 Abandoned US20020070127A1 (en) | 2000-12-12 | 2001-09-27 | Catalyst reactor for processing hazardous gas using non-thermal plasma and dielectric heat and method threreof |
Country Status (3)
Country | Link |
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US (1) | US20020070127A1 (ja) |
JP (1) | JP3711052B2 (ja) |
KR (1) | KR100434940B1 (ja) |
Cited By (20)
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US20060257299A1 (en) * | 2005-05-14 | 2006-11-16 | Lanz Douglas P | Apparatus and method for destroying volatile organic compounds and/or halogenic volatile organic compounds that may be odorous and/or organic particulate contaminants in commercial and industrial air and/or gas emissions |
US20090016941A1 (en) * | 2006-01-11 | 2009-01-15 | Ngk Insulators Ltd. | Electrode Device For Plasma Discharge |
FR2918584A1 (fr) * | 2007-07-10 | 2009-01-16 | Centre Nat Rech Scient | Microreacteur catalytique integre. |
US20090184953A1 (en) * | 2007-01-15 | 2009-07-23 | Takeru Yamashita | Plasma display device |
EP2083934A1 (en) * | 2006-11-08 | 2009-08-05 | Air Phaser Environmental Ltd. | Apparatus and method for destroying organic compounds in commercial and industrial large volume air emissions |
US20100068104A1 (en) * | 2006-05-04 | 2010-03-18 | Seock Joon Kim | Flat-Type Non-Thermal Plasma Reactor |
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US8974741B2 (en) | 2011-05-10 | 2015-03-10 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Device for treating gases using surface plasma |
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KR20020023779A (ko) * | 2001-12-17 | 2002-03-29 | 김기호 | 프라즈마(Plasma) 발생장치의 제조방법 |
KR100477060B1 (ko) * | 2001-12-24 | 2005-03-17 | 환경플라즈마(주) | 평판형 다층 저온 플라즈마 반응기를 이용한 유해가스처리시스템 |
KR100462505B1 (ko) * | 2002-06-17 | 2004-12-17 | 주식회사 블루플래닛 | 세라믹 박판을 사용한 판대판형 플라즈마 반응기 및 그제조 방법 |
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Also Published As
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KR100434940B1 (ko) | 2004-06-10 |
JP3711052B2 (ja) | 2005-10-26 |
KR20020046093A (ko) | 2002-06-20 |
JP2002191964A (ja) | 2002-07-10 |
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