US11307352B2 - Optical waveguide article with laminate structure and method for forming the same - Google Patents

Optical waveguide article with laminate structure and method for forming the same Download PDF

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US11307352B2
US11307352B2 US16/317,933 US201716317933A US11307352B2 US 11307352 B2 US11307352 B2 US 11307352B2 US 201716317933 A US201716317933 A US 201716317933A US 11307352 B2 US11307352 B2 US 11307352B2
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refractive index
surface layer
base
layer
ion
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US20210302649A1 (en
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Venkata Adiseshaiah Bhagavatula
Natesan Venkataraman
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Corning Inc
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Corning Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/134—Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms
    • G02B6/1345—Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms using ion exchange
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths

Definitions

  • This disclosure relates to optical waveguides, and more particularly to surface optical waveguides having a laminate structure.
  • An optical waveguide can be configured as a high refractive index material surrounded by a low refractive index material. Light introduced into the waveguide will propagate within the high refractive index material.
  • An optical waveguide can be produced by starting with an ion-exchangeable glass substrate, masking the surface of the substrate so that the intended path of the waveguide is exposed, and subjecting the masked substrate to an ion-exchange treatment to increase the refractive index of the exposed region, thereby forming the high refractive index material along the intended path.
  • optical waveguide articles with laminate structures Disclosed herein are optical waveguide articles with laminate structures and methods for forming the same.
  • an optical waveguide article comprising a base layer formed from a first glass composition with a refractive index n base and a surface layer fused to the base layer and formed from a second glass composition with a refractive index n surface .
  • a waveguide is disposed within the surface layer.
  • n base and n surface satisfy the equation n surface ⁇ n base ⁇ 0.001.
  • an optical waveguide article comprising a laminated glass sheet comprising a base layer and a surface layer fused to the base layer.
  • the base layer is formed from a first glass composition with a refractive index n base .
  • the surface layer is formed from a second glass composition with a refractive index n surface .
  • n base and n surface satisfy the equation
  • a waveguide is disposed within the surface layer.
  • the method comprises forming a waveguide in a surface layer of a glass laminate structure comprising a base layer fused to the surface layer.
  • the base layer is formed from a first glass composition with a refractive index n base .
  • the surface layer is formed from a second glass composition with a refractive index n surface .
  • n base and n surface satisfy the equation
  • FIG. 1 is a cross-sectional schematic view of one exemplary embodiment of an optical waveguide article comprising a glass laminate structure.
  • FIG. 2 is a cross-sectional schematic view of the glass laminate structure of FIG. 1 prior to forming a waveguide in a surface layer thereof.
  • FIG. 3 is a cross-sectional schematic view of one exemplary embodiment of an overflow distributor that can be used to form a glass laminate structure.
  • FIG. 4 is a cross-sectional schematic view of the glass laminate structure of FIG. 2 with a mask applied to an outer surface of the surface layer.
  • FIG. 5 is a cross-sectional schematic view of the glass laminate structure of FIG. 4 after selectively subjecting an uncovered portion of the outer surface of the surface layer to an ion-exchange treatment to form a low refractive index region of the surface layer.
  • FIG. 6 is a cross-sectional schematic view of the glass laminate structure of FIG. 5 after removing the mask from the outer surface of the surface layer and subjecting the outer surface of the surface layer to a second ion-exchange treatment.
  • FIG. 7 is a cross-sectional schematic view of the glass laminate structure of FIG. 5 after removing the mask from the outer surface of the surface layer and applying a low refractive index coating layer to the outer surface of the surface layer.
  • FIG. 8 is a cross-sectional schematic view of the glass laminate structure of FIG. 2 with a mask applied to an outer surface of the surface layer and after selectively subjecting an uncovered portion of the outer surface of the surface layer to an ion-exchange treatment to form a low refractive index region of the surface layer.
  • FIG. 9 is a cross-sectional schematic view of the glass laminate structure of FIG. 5 after removing the mask from the outer surface of the surface layer and forming a cavity in the low refractive index region of the surface layer.
  • FIG. 10 is a cross-sectional schematic view of a glass laminate structure prior to forming a waveguide in a surface layer thereof with a mask applied to an outer surface of the surface layer.
  • FIG. 11 is a cross-sectional schematic view of the glass laminate structure of FIG. 10 after selectively subjecting an uncovered portion of the outer surface of the surface layer to an ion-exchange treatment to form a high refractive index region of the surface layer.
  • ion-exchange diffusivity refers to the interdiffusion or mutual diffusion coefficient for ions involved in an ion exchange process.
  • Mutual diffusion or interdiffusion of ions can be described by Fick's 2 nd law which, in one dimension, is defined by the following equation:
  • x is the coordinate in glass thickness direction
  • c is the concentration of ions, such as, for example, Na +
  • J is the concentration flux
  • D is the effective mutual diffusivity as defined in J. Crank, T HE M ATHEMATICS OF D IFFUSION , 2nd ed., Oxford Science Publications (2001).
  • photosensitive glass refers to a glass that can undergo a transformation in response to exposure to radiation, such as at least a portion of the glass being transformed into glass-ceramic.
  • photosensitive glass include, but are not limited to, photoreactive glass and photorefractive glass.
  • the transformation can be manifest, for example, by opalization, by a change in refractive index, or by a change in absorption spectrum of electromagnetic radiation (e.g., a change in color).
  • the radiation comprises ultraviolet (UV) radiation.
  • the exposure to radiation is followed by a development treatment (e.g., a heat treatment) to aid in bringing about the transformation of the glass.
  • photosensitive glass can be used to refer to the material in either the untransformed state (i.e., prior to exposure to radiation and/or development treatment) or the transformed state (i.e., after exposure to radiation and/or development treatment).
  • the term “average coefficient of thermal expansion,” or “average CTE,” refers to the average coefficient of linear thermal expansion of a given material or layer between 0° C. and 300° C.
  • the term “coefficient of thermal expansion,” or “CTE,” refers to the average coefficient of thermal expansion unless otherwise indicated.
  • the CTE can be determined, for example, using the procedure described in ASTM E228 “Standard Test Method for Linear Thermal Expansion of Solid Materials With a Push-Rod Dilatometer” or ISO 7991:1987 “Glass—Determination of coefficient of mean linear thermal expansion.”
  • a glass laminate structure comprises a compressive stress or a tensile stress at a given depth within the glass laminate structure.
  • Compressive stress and/or tensile stress values can be determined using, any suitable technique including, for example, a birefringence based measurement technique, a refracted near-field (RNF) technique, or a photoelastic measurement technique (e.g., using a polarimeter).
  • exemplary standards for stress measurement include, for example, ASTM C1422/C1422M-10 “Standard Specification for Chemically Strengthened Flat Glass” and ASTM F218 “Standard Method for Analyzing Stress in Glass.”
  • an optical waveguide article comprises a glass laminate structure comprising a base layer and at least one surface layer adjacent to the base layer.
  • Each of the base layer and the surface layer is a glass layer comprising, independently, a glass material, a ceramic material, a glass-ceramic material, or a combination thereof.
  • the base layer has a base refractive index n base
  • the surface layer has a surface refractive index n surface .
  • Base refractive index n base and surface refractive index n surface refer to the refractive index of the respective layers prior to any ion-exchange treatment as described herein.
  • the base layer is formed from a first glass composition with base refractive index n base
  • the surface layer is formed from a second glass composition with surface refractive index n surface that is different than n base .
  • n base and n surface differ by at least about 0.001.
  • n base is less than n surface .
  • n base is greater than n surface .
  • the optical waveguide article comprises at least one waveguide disposed within the surface layer of the glass laminate structure.
  • the waveguide comprises a region of relatively high refractive index at least partially surrounded by one or more regions of relatively low refractive index.
  • the waveguide comprises a relatively high refractive index channel extending within a relatively low refractive index matrix of the surface layer.
  • the refractive index of a portion of the surface layer is reduced to form the waveguide (e.g., to form the relatively low refractive index matrix).
  • the refractive index of a portion of the surface layer is increased to form the waveguide (e.g., to form the relatively high refractive index channel).
  • the refractive index of the surface layer can be modified by subjecting the laminated structure to an ion-exchange treatment to form the waveguide as described herein.
  • FIG. 1 is a cross-sectional schematic view of one exemplary embodiment of an optical waveguide article 10 comprising a glass laminate structure 100 .
  • glass laminate structure 100 comprises a laminated glass sheet comprising a plurality of glass layers. The laminated glass sheet can be substantially planar as shown in FIG. 1 or non-planar (e.g., curved or bent).
  • Glass laminate structure 100 comprises a base layer 102 and a surface layer 104 adjacent to the base layer.
  • glass laminate structure 100 comprises a second surface layer 106 adjacent to base layer 102 , and the base layer is disposed between surface layer 104 and the second surface layer as shown in FIG. 1 . In other embodiments, the second surface layer is omitted.
  • surface layer 104 and/or second surface layer 106 are exterior layers as shown in FIG. 1 .
  • an outer surface 108 of surface layer 104 serves as an outer surface of glass laminate structure 100 and/or an outer surface 110 of second surface layer 106 serves as an outer surface of the glass laminate structure.
  • the surface layer and/or the second surface layer are intermediate layers disposed between the base layer and an exterior layer.
  • the exterior layer can be an exterior glass layer, a coating layer (e.g., a polymeric, metallic, or ceramic coating layer), or another suitable layer.
  • the exterior layer comprises a transparent conductor, a semiconductor, an electro-optic, or a liquid crystal.
  • Base layer 102 comprises a first major surface 112 and a second major surface 114 opposite the first major surface.
  • surface layer 104 is fused to first major surface 112 of base layer 102 .
  • second surface layer 106 is fused to second major surface 114 of base layer 102 .
  • an interface between surface layer 104 and base layer 102 and/or an interface between second surface layer 106 and the base layer are free of any bonding material such as, for example, an adhesive, a coating layer, or any non-glass material added or configured to adhere the respective surface layer to the base layer.
  • surface layer 104 and/or second surface layer 106 are fused directly to base layer 102 or are directly adjacent to the base layer.
  • the glass laminate structure comprises one or more intermediate layers disposed between the base layer and the surface layer and/or between the base layer and the second surface layer.
  • the intermediate layers comprise intermediate glass layers and/or diffusion layers formed at the interface of the base layer and the surface layer.
  • the diffusion layer can comprise a blended region comprising components of each layer adjacent to the diffusion layer (e.g., a blended region between two directly adjacent glass layers).
  • glass laminate structure 100 comprises a glass-glass laminate (e.g., an in situ fused multilayer glass-glass laminate) in which the interfaces between directly adjacent glass layers are glass-glass interfaces.
  • base layer 102 is formed from or comprises a first glass composition
  • surface layer 104 and/or second surface layer 106 are formed from or comprise a second glass composition that is different than the first glass composition.
  • the first glass composition and the second glass composition are different from each other prior to subjecting the glass laminate structure to any type of ion-exchange treatment as described herein.
  • base layer 102 comprises the first glass composition
  • each of surface layer 104 and second surface layer 106 comprises the second glass composition.
  • the surface layer comprises the second glass composition
  • the second surface layer comprises a third glass composition that is different than the first glass composition and/or the second glass composition.
  • Optical waveguide article 10 comprises a waveguide 130 disposed within surface layer 104 of glass laminate structure 100 .
  • Waveguide 130 comprises a high refractive index region 132 that is at least partially surrounded or enveloped by a low refractive index region 134 .
  • the terms “high refractive index” and “low refractive index” are relative terms, meaning that a refractive index n high of high refractive index region 132 is greater than a refractive index n low of low refractive index region 134 .
  • n high and n low differ by at least about 0.001 and/or satisfy the equation n high ⁇ n low ⁇ 0.001.
  • waveguide 130 comprises a transition region between high refractive index region 132 and low refractive index region 134 .
  • the refractive index of the transition region varies between n high and n low .
  • the transition region can be a result of, for example, the composition gradient created by the ion-exchange treatment used to form waveguide 130 as described herein.
  • n high is substantially equal or equal to n surface .
  • the refractive index of a portion of surface layer 104 can be reduced to form low refractive index region 134 without substantially reducing the refractive index of high refractive index region 132 as described herein.
  • n low is substantially equal or equal to n surface .
  • the refractive index of a portion of surface layer 104 can be increased to form high refractive index region 132 without substantially increasing the refractive index of low refractive index region 134 as described herein.
  • high refractive index region 132 comprises a high refractive index channel
  • low refractive index region 134 comprises a low refractive index matrix at least partially surrounding the channel.
  • the high refractive index channel extends within the low refractive index matrix (e.g., in a length direction or an X direction).
  • the high refractive index channel is bounded on opposing lateral sides by the low refractive index matrix. Additionally, or alternatively, the high refractive index channel is bounded on a base side facing toward base layer 102 by the base layer or by the low refractive index matrix.
  • the high refractive index channel is bounded on a surface side opposite the base side and facing away from base layer 102 by the low refractive index matrix or a low refractive index medium.
  • the low refractive index medium comprises, for example, air, a coating layer (e.g., a glass, metallic, or ceramic coating layer), or another suitable medium with a low refractive index compared to n high .
  • Surrounding high refractive index region 132 with materials having lower refractive indices enables waveguide 130 to function as an optical waveguide. For example, light injected into high refractive index region 132 propagates through the high refractive index region in a propagation direction (e.g., in the length direction or the X direction).
  • the one or more waveguides comprises a plurality of waveguides disposed within surface layer 104 .
  • the one or more waveguides comprises waveguide 130 and a second waveguide 130 a adjacent to waveguide 130 .
  • Second waveguide 130 a comprises a second high refractive index region 132 a at least partially surrounded by low refractive index region 134 .
  • second high refractive index region 132 a comprises a second high refractive index channel
  • low refractive index region 134 comprises a low refractive index matrix disposed between adjacent channels.
  • the high refractive index channels extend within the low refractive index matrix (e.g., in the length direction or the X direction).
  • the one or more waveguides comprises a determined number of waveguides (e.g., three, four, or more) disposed within the surface layer.
  • the waveguides may have the same configuration (e.g., shape and/or size) or different configurations.
  • optical waveguide article 10 comprises a length (e.g., in the X direction), a width (e.g., in a Y direction), and a thickness (e.g., in a Z direction).
  • the length is the largest dimension of optical waveguide article 10
  • the thickness is the smallest dimension of the optical waveguide article.
  • the length and/or the width of the optical waveguide article 10 are at least 10, at least 100, or at least 1000 times greater than the thickness of the optical waveguide article.
  • optical waveguide article 10 can be described as a planar optical waveguide, a slab optical waveguide, or a strip optical waveguide, as distinguished from an optical fiber waveguide.
  • optical waveguide article 10 may be non-planar.
  • one or more of the length, the width, or the thickness of optical waveguide article 10 can be nonlinear or curved.
  • high refractive index region 132 is described herein as comprising a plurality of high refractive index channels, and low refractive index region 134 is described as comprising a low refractive index matrix disposed between adjacent channels, other embodiments are included in this disclosure.
  • the high refractive index region comprises one or more dots, curves, branching channels, another suitable shape, or combinations thereof.
  • the high refractive index region comprises a shape that enables light to propagate therethrough along a desired path.
  • optical waveguide article 10 and/or glass laminate structure 100 can be measured as the distance between opposing outer surfaces (e.g., outer surfaces 108 and 110 ) thereof.
  • optical waveguide article 10 and/or glass laminate structure 100 comprises a thickness of at least about 0.05 mm, at least about 0.1 mm, at least about 0.2 mm, or at least about 0.3 mm.
  • optical waveguide article 10 and/or glass laminate structure 100 comprises a thickness of at most about 2 mm, at most about 1.5 mm, at most about 1 mm, at most about 0.7 mm, or at most about 0.5 mm.
  • a ratio of a thickness of base layer 102 to a thickness of glass laminate structure 100 is at least about 0.1, at least about 0.2, at least about 0.3, at least about 0.4, at least about 0.5, at least about 0.6, at least about 0.7, at least about 0.8, at least about 0.85, at least about 0.9, or at least about 0.95. Additionally, or alternatively, the ratio of the thickness of base layer 102 to the thickness of glass laminate structure 100 is at most about 0.95, at most about 0.93, at most about 0.9, at most about 0.87, at most about 0.85, at most about 0.8, at most about 0.7, at most about 0.6, at most about 0.5, at most about 0.4, at most about 0.3, or at most about 0.2. In some embodiments, a thickness of each of surface layer 104 and/or second surface layer 106 is from about 0.01 mm to about 0.3 mm.
  • Waveguide 130 (e.g., high refractive index region 132 of the waveguide) comprises a minor dimension.
  • the minor dimension is the smallest dimension of waveguide 130 .
  • the minor dimension of waveguide 130 shown in FIG. 1 is a width W waveguide of the waveguide in the Y direction
  • the minor dimension of buried waveguide 130 shown in FIG. 6 is a height H waveguide of the waveguide in the Z direction.
  • the minor dimension of waveguide 130 is about 1 ⁇ m to about 10 ⁇ m.
  • Such a minor dimension may be beneficial for using the waveguide as a single mode waveguide (e.g., for operating wavelengths of about 0.3 ⁇ m to about 1.7 ⁇ m).
  • the minor dimension of waveguide 130 is about 20 ⁇ m to about 200 ⁇ m. Such a minor dimension may be beneficial for using the waveguide as a multimode waveguide (e.g., for operating wavelengths of about 0.3 ⁇ m to about 1.7 ⁇ m).
  • an optical waveguide article comprises one or more waveguides disposed in the second surface layer.
  • the waveguide can be formed in the second surface layer as described herein for forming the waveguide in the surface layer.
  • additional layers and/or coatings can be applied to an outer surface of the second surface layer as described herein with respect to the surface layer.
  • the waveguide disposed in the second layer can have the same or different configuration (e.g., size and pattern) as the waveguide disposed in the surface layer.
  • An optical waveguide article comprising a waveguide disposed in each of the surface layer and the second surface layer can be beneficial for stacking multiple waveguide layers in a relatively small space (e.g., in integrated optics applications).
  • a method for forming an optical waveguide article includes forming a waveguide in a surface layer of a glass laminate structure.
  • FIG. 2 is a cross-sectional schematic view of glass laminate structure 100 prior to forming waveguide 130 in surface layer 104 .
  • the first glass composition of base layer 102 comprises a base refractive index n base .
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises a surface refractive index n surface that is different than n base .
  • n base and n surface differ by at least about 0.001 and/or satisfy the equation
  • n base is less than n surface .
  • n base is greater than n surface .
  • the first glass composition of base layer 102 comprises a base ion-exchange diffusivity D base .
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises a surface ion-exchange diffusivity D surface that is greater than D base .
  • surface layer 104 and/or second surface layer 106 are ion-exchangeable.
  • D base is substantially zero.
  • base layer 102 is substantially non-ion-exchangeable or non-ion-exchangeable.
  • D base is greater than zero.
  • base layer 102 is ion-exchangeable, but to a lesser degree than surface layer 104 and/or second surface layer 106 .
  • the ion-exchange diffusivities D base and D surface comprise ion-exchange diffusivities with respect to a refractive index increasing ion and a refractive index decreasing ion as described herein.
  • the first glass composition of base layer 102 is free or substantially free of alkali metals or compounds comprising alkali metals.
  • the first glass composition is free or substantially free of one or more of Li 2 O, Na 2 O, K 2 O, Rb 2 O, and Cs 2 O.
  • the first glass composition of base layer 102 is free or substantially free of Ag or compounds comprising Ag.
  • the first glass composition of base layer 102 is free or substantially free of alkaline earth metals or compounds comprising alkaline earth metals.
  • the first glass composition is free or substantially free of one or more of BeO, MgO, CaO, SrO, and BaO.
  • the difference between D base and D surface can enable formation of the waveguide structure in the surface layer using an ion-exchange process as described herein.
  • the relatively low ion-exchange diffusivity of base layer 102 compared to surface layer 104 can enable the base layer to act as an ion-exchange barrier that limits the depth within glass laminate structure 100 that ions penetrate during an ion-exchange treatment as described herein.
  • glass laminate structure 100 comprises a photosensitive component.
  • the first glass composition of base layer 102 and/or the second glass composition of surface layer 104 and/or second surface layer 106 comprises the photosensitive component.
  • the second glass composition of surface layer 104 comprises the photosensitive component such that, after formation of waveguide 130 in the second layer, high refractive index region 132 comprises the photosensitive component.
  • High refractive index region 132 can be exposed to radiation (e.g., ultraviolet light) to form a pattern therein.
  • the pattern comprises a Bragg grating, a diffraction grating, or another suitable optical pattern.
  • the photosensitive component comprises Ce, a photosensitive metal, or a combination thereof.
  • the photosensitive metal comprises, for example, Ag, Au, Cu, or combinations thereof.
  • the Ce and/or the photosensitive metal can be in a +1 oxidation state (e.g., Ce 2 O 3 or AgNO 3 ).
  • the Ce can serve as a sensitizer ion capable of being oxidized and releasing electrons in response to exposure of the glass laminate structure to radiation.
  • the photosensitive metal can be reduced to form colloidal metal particles in response to exposure of the glass laminate structure to radiation and/or subjecting the glass laminate structure to a development treatment.
  • high refractive index region 132 with the photosensitive component comprises a photosensitive glass.
  • photosensitive glass include, for example, FOTALITETM or FOTAFORMTM, each from Corning Incorporated, Corning, N.Y.
  • FIG. 3 is a cross-sectional schematic view of one exemplary embodiment of an overflow distributor 200 that can be used to form a glass laminate structure such as, for example, glass laminate structure 100 .
  • Overflow distributor 200 can be configured as described in U.S. Pat. No. 4,214,886, which is incorporated herein by reference in its entirety.
  • overflow distributor 200 comprises a lower overflow distributor 220 and an upper overflow distributor 240 positioned above the lower overflow distributor.
  • Lower overflow distributor 220 comprises a trough 222 .
  • a first glass composition 224 is melted and fed into trough 222 in a viscous state.
  • First glass composition 224 forms base layer 102 of glass laminate structure 100 as further described below.
  • Upper overflow distributor 240 comprises a trough 242 .
  • a second glass composition 244 is melted and fed into trough 242 in a viscous state.
  • Second glass composition 244 forms surface layer 104 and second surface layer 106 of glass laminate structure 100 as further described below.
  • First glass composition 224 overflows trough 222 and flows down opposing outer forming surfaces 226 and 228 of lower overflow distributor 220 . Outer forming surfaces 226 and 228 converge at a draw line 230 .
  • the separate streams of first glass composition 224 flowing down respective outer forming surfaces 226 and 228 of lower overflow distributor 220 converge at draw line 230 where they are fused together to form base layer 102 of glass laminate structure 100 .
  • Second glass composition 244 overflows trough 242 and flows down opposing outer forming surfaces 246 and 248 of upper overflow distributor 240 .
  • Second glass composition 244 is deflected outward by upper overflow distributor 240 such that the second glass composition flows around lower overflow distributor 220 and contacts first glass composition 224 flowing over outer forming surfaces 226 and 228 of the lower overflow distributor.
  • the separate streams of second glass composition 244 are fused to the respective separate streams of first glass composition 224 flowing down respective outer forming surfaces 226 and 228 of lower overflow distributor 220 .
  • second glass composition 244 forms surface layer 104 and second surface layer 106 of glass laminate structure 100 .
  • first glass composition 224 of base layer 102 in the viscous state is contacted with second glass composition 244 of surface layer 104 and/or second surface layer 106 in the viscous state to form the laminated sheet.
  • the laminated sheet is part of a glass ribbon traveling away from draw line 230 of lower overflow distributor 220 as shown in FIG. 3 .
  • the glass ribbon can be drawn away from lower overflow distributor 220 by a suitable means including, for example, gravity and/or pulling rollers.
  • the glass ribbon cools as it travels away from lower overflow distributor 220 .
  • the glass ribbon is severed to separate the laminated sheet therefrom. Thus, the laminated sheet is cut from the glass ribbon.
  • glass ribbon can be severed using a suitable technique such as, for example, scoring, bending, thermally shocking, and/or laser cutting.
  • glass laminate structure 100 comprises the laminated sheet as shown in FIGS. 1-2 .
  • the laminated sheet can be processed further (e.g., by cutting or molding) to form glass laminate structure 100 .
  • a glass laminate structure can have a determined number of layers, such as two, four, or more layers.
  • a glass laminate structure comprising two layers e.g., a base layer and a surface layer
  • two overflow distributors positioned so that the two layers are joined while traveling away from the respective draw lines of the overflow distributors, or using a single overflow distributor with a divided trough so that two glass compositions flow over opposing outer forming surfaces of the overflow distributor and converge at the draw line of the overflow distributor.
  • a glass laminate structure comprising four or more layers can be formed using additional overflow distributors and/or using overflow distributors with divided troughs.
  • a glass laminate structure having a determined number of layers can be formed by modifying the overflow distributor accordingly.
  • a glass laminate structure 100 shown in FIGS. 1-2 comprises a laminated sheet
  • a glass laminate structure comprises a laminated tube comprising multiple tubular layers (e.g., formed by one or more annular orifices or by bending or rolling a laminated glass sheet into a tubular configuration) or a laminated rod comprising a substantially solid core layer surrounded by one or more tubular cladding layers.
  • a partial cross-section of the laminated tube comprises a glass laminate structure similar to that shown in FIGS. 1-2 .
  • a glass laminate structure comprises a shaped glass laminate structure (e.g., formed by shaping or molding a laminated sheet).
  • the first glass composition of base layer 102 and/or the second glass composition of surface layer 104 and/or second surface layer 106 comprise a liquidus viscosity of at least about 30 kiloPoise (kP), at least about 50 kP, at least about 100 kP, at least about 200 kP, or at least about 300 kP.
  • the first glass composition and/or the second glass composition comprise a liquidus viscosity suitable for forming glass laminate structure 100 using a fusion draw process as described herein.
  • the first glass composition of base layer 102 comprises a liquidus viscosity of at least about 100 kP, at least about 200 kP, or at least about 300 kP.
  • the first glass composition comprises a liquidus viscosity of at most about 3000 kP, at most about 2500 kP, at most about 1000 kP, or at most about 800 kP.
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises a liquidus viscosity of at least about 50 kP, at least about 100 kP, or at least about 200 kP.
  • the second glass composition comprises a liquidus viscosity of at most about 3000 kP, at most about 2500 kP, at most about 1000 kP, or at most about 800 kP.
  • the first glass composition can aid in carrying the second glass composition over the overflow distributor to form the surface layer(s).
  • the second glass composition can comprise a liquidus viscosity that is lower than generally considered suitable for forming a single layer sheet using a fusion draw process.
  • glass laminate structure 100 is mechanically strengthened.
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises a different CTE than the first glass composition of base layer 102 .
  • Such a CTE contrast between directly adjacent layers of glass laminate structure 100 can result in mechanical strengthening of the glass laminate structure.
  • surface layer 104 and second surface layer 106 are formed from a glass composition (e.g., the second glass composition) having a lower CTE than a glass composition (e.g., the first glass composition) of base layer 102 .
  • the relatively lower CTE of surface layer 104 and second surface layer 106 compared to base layer 102 results in formation of compressive stress in the surface layers and tensile stress in the base layer upon cooling of glass laminate structure 100 .
  • each of the first and second surface layers independently, can have a higher CTE, a lower CTE, or substantially the same CTE as the base layer. Including both surface layer 104 and second surface layer 106 can help to protect base layer 102 , which may be under tensile stress, and/or to prevent warpage of glass laminate structure 100 .
  • the CTE of base layer 102 and the CTE of surface layer 104 and/or second surface layer 106 differ by at least about 1 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 2 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 3 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 4 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 5 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 10 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 15 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 20 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 25 ⁇ 10 ⁇ 7 ° C.
  • the CTE of base layer 102 and the CTE of surface layer 104 and/or second surface layer 106 differ by at most about 100 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 75 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 50 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 40 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 30 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 20 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 10 ⁇ 10 ⁇ 7 ° C.
  • the CTE of base layer 102 and the CTE of surface layer 104 and/or second surface layer 106 differ by about 1 ⁇ 10 ⁇ 7 ° C. ⁇ 1 to about 10 ⁇ 10 ⁇ 7 ° C. ⁇ 1 or about 1 ⁇ 10 ⁇ 7 ° C. ⁇ 1 to about 5 ⁇ 10 7 ° C. ⁇ 1 .
  • the second glass composition of surface layer and/or second surface layer comprises a CTE of at most about 90 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 89 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 88 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 80 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 70 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 60 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 50 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 40 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , or at most about 35 ⁇ 10 ⁇ 7 ° C. ⁇ 1 .
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises a CTE of at least about 10 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 15 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 25 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 30 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 40 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 50 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 60 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 70 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 80 ⁇ 10 ⁇ 7 ° C.
  • the first glass composition of base layer 102 comprises a CTE of at least about 40 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 50 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 55 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 65 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 70 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at least about 80 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , or at least about 90 ⁇ 10 ⁇ 7 ° C. ⁇ 1 .
  • the first glass composition of base layer 102 comprises a CTE of at most about 120 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 110 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 100 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 90 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , at most about 75 ⁇ 10 ⁇ 7 ° C. ⁇ 1 , or at most about 70 ⁇ 10 ⁇ 7 ° C. ⁇ 1 .
  • FIG. 4 is a cross-sectional schematic view of glass laminate structure 100 with mask 140 applied to outer surface 108 of surface layer 104 .
  • Mask 140 covers a portion of outer surface 108 of surface layer 104 .
  • the covered portion of outer surface 108 of surface layer 104 corresponds to an intended waveguide pattern of waveguide 130 .
  • mask 140 comprises a shape that corresponds to an intended pattern of high refractive index region 132 of waveguide 130 .
  • mask 140 comprises a plurality of lines corresponding to the plurality of high refractive index channels of waveguide 130 and second waveguide 130 a ( FIG.
  • the mask comprises one or more dots, curves, branching channels, other suitable shapes, or combinations thereof.
  • a remaining portion of outer surface 108 of surface layer 104 that is uncovered by mask 140 corresponds to an intended pattern of low refractive index region 134 .
  • Mask 140 serves as an ion-exchange barrier while subjecting the glass laminate structure to an ion-exchange treatment to form the waveguide in the surface layer as described herein.
  • mask 140 comprises a material that inhibits ion-exchange at the covered portion of outer surface 108 of surface layer 104 .
  • mask comprises a metallic material (e.g., titanium or aluminum), a polymeric material, or another suitable ion-exchange barrier material.
  • Mask 140 can be applied to outer surface 108 of surface layer 104 using, for example, sputtering (e.g., ion-assisted sputtering), evaporation (e.g., e-beam evaporation or thermal evaporation), vapor deposition (e.g., chemical or physical vapor deposition, including plasma chemical vapor deposition), printing (e.g., gravure or screen printing), lithography, or another suitable deposition process.
  • sputtering e.g., ion-assisted sputtering
  • evaporation e.g., e-beam evaporation or thermal evaporation
  • vapor deposition e.g., chemical or physical vapor deposition, including plasma chemical vapor deposition
  • printing e.g., gravure or screen printing
  • lithography lithography
  • forming the waveguide in the surface layer of the glass laminate structure comprises subjecting the glass laminate structure to a selective ion-exchange treatment to form the low refractive index region within the surface layer.
  • surface layer 104 of glass laminate structure 110 with mask 140 applied thereto is subjected to an ion-exchange treatment to selectively reduce the refractive index in a portion of the surface layer and form low refractive index region 134 without substantially reducing the refractive index of a remaining portion of the surface layer corresponding to high refractive index region 132 .
  • Selectively subjecting an uncovered portion of outer surface 108 of surface layer 104 to the ion-exchange treatment enables formation of high refractive index region 134 comprising a desired pattern.
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises a sufficiently high concentration of refractive index increasing ions (e.g., K + or Ag + ions) that an ion-exchange treatment with an ion-exchange medium comprising refractive index decreasing ions (e.g., Na + ) reduces the refractive index of the surface layer and/or the second surface layer within the ion-exchanged region.
  • refractive index increasing ions e.g., K + or Ag + ions
  • refractive index decreasing ions e.g., Na +
  • the ion-exchange treatment comprises applying an ion-exchange medium to outer surface 108 of glass laminate structure 100 .
  • the ion-exchange medium comprises a solution, a paste, a gel, a liquid, a vapor, a plasma, or another suitable medium comprising refractive index decreasing ions to be exchanged with refractive index increasing ions in the glass matrix (e.g., the glass matrix of surface layer 104 ).
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises an alkali aluminosilicate glass.
  • the refractive index increasing ions in surface layer 104 and the refractive index decreasing ions in the ion exchange medium may be monovalent alkali metal cations (e.g., Li + , Na + , K + , Rb + , and/or Cs + ).
  • monovalent cations in surface layer 104 may be replaced with monovalent cations other than alkali metal cations (e.g., Ag + or the like).
  • the second glass composition of surface layer 104 and/or second surface layer 106 comprises an alkaline earth aluminosilicate glass.
  • the refractive index increasing ions in surface layer 104 and the refractive index decreasing ions in the ion exchange medium may be divalent alkaline earth cations (e.g., Be 2+ , Mg 2+ , Ca 2+ , Sr 2+ , and/or Ba 2+ ).
  • the ion-exchange medium comprises a molten salt solution
  • the ion-exchange treatment comprises immersing the glass laminate structure in a molten salt bath comprising refractive index decreasing ions (e.g., Na + ) to be exchanged with refractive index increasing ions (e.g., K + ) in the glass matrix of surface layer 104 .
  • the molten salt bath comprises a salt (e.g., a nitrate, a sulfate, and/or a chloride) of the refractive index decreasing ions.
  • the molten salt bath comprises molten NaNO 3 .
  • the temperature of the molten salt bath is from about 380° C. to about 450° C., and an immersion time is from about 2 hours to about 16 hours.
  • the ion-exchange treatment may affect the strength of optical waveguide article 10 .
  • exchanging K + ions in the glass matrix with Na + ions in the ion-exchange medium can decrease the compressive stress in at least a portion of surface layer 104 .
  • glass laminate structure 100 is mechanically strengthened as described herein (e.g., by CTE mismatch). Such mechanical strengthening can be sufficient to maintain surface layer 104 in compression even after the ion-exchange treatment.
  • the refractive index of a portion of the surface layer is reduced to form low refractive index region 134 .
  • the refractive index decreasing ions from the ion-exchange medium diffuse into the uncovered portion of outer surface 108 of surface layer 104 and the refractive index increasing ions from the glass matrix diffuse out of the uncovered portion of the outer surface of the surface layer.
  • the uncovered portion of surface layer 104 (and the corresponding portion beneath the uncovered portion in which ion-exchange takes place) comprises an ion-exchanged region of the surface layer, and a remainder of the surface layer comprises a non-ion-exchanged region of the surface layer.
  • the increased concentration of the refractive index decreasing ions in the ion-exchanged region decreases the refractive index of surface layer 104 in the ion-exchanged region without substantially decreasing the refractive index of the surface layer in the non-ion-exchanged region.
  • low refractive index region 134 has a curved or nonlinear shape resulting from ion-exchange from outer surface 108 of surface layer 104 .
  • a nonlinear shape is a result of ion-exchange being a diffusion process that takes place in multiple dimensions, resulting in ion-exchange taking place to some extent beneath the edges of mask 140 .
  • increasing the time and/or temperature of the ion-exchange treatment can increase the distance beneath mask 140 to which low refractive index region 134 extends.
  • the minor dimension of high refractive index region 132 (e.g., the width in the Y direction) is at most about 10 ⁇ m, at most about 5 ⁇ m, or at most about 2 ⁇ m. Such a small minor dimension can be useful, for example, for single mode optical waveguide applications.
  • mask 140 By starting with a high refractive index glass in surface layer 104 and using ion-exchange to decrease the refractive index in selected regions of the surface layer, it is unnecessary for mask 140 to have a minor dimension (e.g., a width in the Y direction) as small as the minor dimension of high refractive index region 134 .
  • mask 140 can have a larger minor dimension, and the ion-exchange treatment can be conducted in such a manner to control the extent to which low refractive index region 134 extends beneath the mask to achieve high refractive index region 132 having a desired minor dimension.
  • the ability to use a wider mask to achieve a narrower high refractive index region can reduce the complexity of depositing the mask on the outer surface of the surface layer, while achieving a waveguide with desired dimensions.
  • Base layer 102 is substantially non-ion-exchangeable or non-ion-exchangeable as described herein.
  • base layer 102 serves as an ion-exchange barrier that prevents ion-exchange deep into glass laminate structure 100 beyond surface layer 104 .
  • Such an ion-exchange barrier can enable a thickness of high refractive index region 132 (e.g., in the Z direction) to be controlled independent of the width of the high refractive index region (e.g., in the Y direction).
  • the ion-exchange treatment can be adjusted to achieve the desired width of the high refractive index region as described herein without increasing the height of the high refractive index region.
  • the low ion-exchange diffusivity of base layer 102 can prevent refractive index increasing ions present in high refractive index region 132 from diffusing deeper into glass laminate structure 100 beyond the interface between surface layer 104 and the base layer.
  • Such an ion-exchange barrier can help to maintain the shape of the high refractive index region during the ion-exchange treatment, additional ion-exchange treatments (e.g., the second ion-exchange treatment described herein), and/or other processing treatments.
  • the second surface layer can comprise or be formed from the same or a different glass composition as the surface layer.
  • second surface layer 106 can be formed from the second glass composition of surface layer 104 or a third glass composition as described herein.
  • the second surface layer can have a refractive index that is higher or lower than the base layer prior to any ion-exchange treatment.
  • the refractive index of the glass composition of the second surface layer is less than n base , no additional processing (e.g., ion-exchange) of the second surface layer may be performed, as light propagating through the base layer will not tend to leak from the relatively high refractive index base layer into the relatively low refractive index second surface layer.
  • the second surface layer is subjected to an ion-exchange treatment to decrease the refractive index of at least a portion of the second surface layer.
  • the second surface layer is subjected to an ion-exchange treatment as described herein with reference to the surface layer 106 , except without the mask.
  • the entire or substantially the entire outer surface of the second surface layer is exposed during the ion-exchange treatment so that the refractive index of at least a portion of the second surface layer is decreased to be less than n base .
  • all or substantially all of the second surface layer comprises a low refractive index region.
  • the second surface layer comprises an ion-exchanged region comprising a refractive index gradient.
  • the refractive index of the ion-exchanged region is highest near the outer surface and decreases in an inward direction toward the base layer (e.g., as a result of the diffusion of refractive index decreasing ions into the second surface layer from the outer surface).
  • forming the waveguide in the surface layer of the glass laminate structure comprises burying the waveguide or burying the high refractive index region.
  • burying the waveguide or burying the high refractive index region comprises extending the low refractive index region to occupy a surface region of the surface layer.
  • surface layer 104 of glass laminate structure 110 with low refractive index region 134 formed therein and mask 140 removed therefrom is subjected to a second ion-exchange treatment to extend the low refractive index region to occupy a surface region of the surface layer disposed between high refractive index region 132 and outer surface 108 of the surface layer.
  • FIG. 6 is a cross-sectional schematic view of glass laminate structure 100 after forming low refractive index region 134 therein, removing mask 140 from outer surface 108 of surface layer 104 , and subjecting the outer surface of the surface layer to a second ion-exchange treatment.
  • the second ion-exchange treatment can be performed as described above with respect to the ion-exchange treatment. However, the conditions (e.g., the time and/or temperature) of the second ion-exchange treatment are adjusted such that the depth (e.g., in the Z direction) to which the refractive index decreasing ions diffuse during the second ion-exchange treatment is shallower than the depth to which the refractive index decreasing ions diffuse during the ion-exchange treatment.
  • low refractive index region 134 is extended such that high refractive index region 132 is separated from outer surface 108 of second layer 104 by the low refractive index region as shown in FIG. 6 .
  • burying the waveguide or burying the high refractive index region comprises coating the outer surface of the surface layer with a low refractive index material.
  • FIG. 7 is a cross-sectional schematic view of glass laminate structure 100 after forming low refractive index region 134 therein, removing mask 140 from outer surface 108 of surface layer 104 , and applying a low refractive index coating layer 150 to the outer surface of the surface layer.
  • Low refractive index coating layer comprises a low refractive index material with a refractive index that is less than n high (e.g., at least 0.001 less than n high ).
  • the low refractive index material comprises, for example, a glass material, a polymeric material, a metallic material, another suitable low refractive index material, or combinations thereof.
  • the low refractive index coating layer comprises a transparent conductor, a semiconductor, an electro-optic, or a liquid crystal.
  • Low refractive index coating layer 150 can be applied to outer surface 108 of surface layer 104 using, for example, sputtering (e.g., ion-assisted sputtering), evaporation (e.g., e-beam evaporation or thermal evaporation), vapor deposition (e.g., chemical or physical vapor deposition, including plasma chemical vapor deposition), printing (e.g., gravure or screen printing), lithography, or another suitable deposition process.
  • sputtering e.g., ion-assisted sputtering
  • evaporation e.g., e-beam evaporation or thermal evaporation
  • vapor deposition e.g., chemical or physical vapor deposition, including plasma chemical vapor deposition
  • printing e.g., gravure or screen printing
  • lithography lithography
  • such dopants comprise fluorescent dye dopants, organic nonlinear optical polymers, or electro-optical materials such as liquid crystals.
  • the low refractive index coating layer 150 comprises a glass material
  • the low refractive index coating layer comprises one or more rare-earth dopants.
  • the low refractive index coating layer can be applied to the entire or substantially the entire outer surface of the glass laminate structure as shown in FIG. 7 or applied selectively to only a portion of the outer surface of the glass laminate structure.
  • the low refractive index coating layer can be applied selectively to the high refractive index region of the outer surface (e.g., the waveguide), leaving the low refractive index region of the outer surface uncovered by the coating layer.
  • burying the waveguide or burying the high refractive index region is performed as part of forming the waveguide in the surface layer of the glass laminate structure.
  • the size of the mask and the ion-exchange conditions can be selected such that, during subjecting the glass laminate structure to the selective ion-exchange treatment to form the low refractive index region within the surface layer, the high refractive index region is buried within the surface layer.
  • FIG. 8 is a cross-sectional schematic view of glass laminate structure 100 after forming low refractive index region 134 therein.
  • Mask 140 shown in FIG. 8 is smaller (e.g., narrower) than the mask shown in FIGS. 4-5 .
  • the ion-exchange treatment is performed at a temperature and for a time such that low refractive index regions 134 formed on opposing sides of mask 140 during the ion-exchange treatment are joined under mask 140 to form a unitary low refractive index region.
  • the unitary low refractive index region is disposed between high refractive index region 132 and outer surface 108 of surface layer 104 such that the waveguide is buried within the surface layer.
  • Burying the waveguide or burying the high refractive index region can help to ensure that the high refractive index region is completely surrounded by materials having lower indices of refraction, which can improve the performance of the optical waveguide article.
  • one or more layers of glass laminate structure 100 comprise one or more dopants.
  • dopants can provide functionality.
  • such dopants comprise rare-earth elements (e.g., Nd or Er), which can be beneficial for waveguide laser applications.
  • an outer surface of the glass laminate structure comprises a textured surface.
  • the outer surface of the surface layer is doped with a fast etching material (e.g., a glass composition with a higher etch rate in a selected solvent than the second glass composition of the surface layer).
  • the outer surface can be etched to form surface features (e.g., cavities or trenches) near or on the waveguide.
  • the surface features are filled with one or more functional materials.
  • the functional material comprises, for example scattering particles, a dye (e.g., a fluorescent dye or a laser dye), an epoxy (e.g., a UV epoxy), an electro-optic liquid (e.g., a liquid crystal material), or combinations thereof).
  • light propagating through the waveguide can interact with the functional material, for example, to perform a device function (e.g., to activate the functional material disposed in the surface features).
  • FIG. 9 is a cross-sectional schematic view of one embodiment of optical waveguide article 10 comprising a cavity 12 formed therein.
  • cavity 12 comprises a void or recess extending inward from outer surface 108 of surface layer 104 toward base layer 102 .
  • cavity 12 is disposed within low refractive index region 134 .
  • cavity 12 is formed by etching outer surface 108 of surface layer 104 .
  • low refractive index region 134 is more soluble in a selected etchant than high refractive index region 132 such that applying the selected etchant to outer surface 108 removes a portion of the high refractive index region to form cavity 12 .
  • cavity 12 can be formed by laser ablation or another suitable material removal process.
  • optical waveguide article 10 comprises one or more functional materials disposed within cavity 12 .
  • the optical waveguide article comprises one or more coating layers (e.g., glass or polymeric coating layers) as described herein.
  • a coating layer comprises a photosensitive component.
  • the coating layer can be exposed to radiation (e.g., ultraviolet light) to form a pattern therein.
  • the pattern comprises a Bragg grating, a diffraction grating, or another suitable optical pattern.
  • a coating layer comprises a hybrid mixture of a glass material and a polymeric material.
  • a coating layer comprises a hybrid mixture of a UV curable polymer and glass nano particles with index matching the polymer.
  • the nano particles can comprise a base glass with or without a dopant material.
  • forming the waveguide in the surface layer of the glass laminate structure comprises subjecting the glass laminate structure to a selective ion-exchange treatment to form the high refractive index region, as opposed to the low refractive index region, within the surface layer.
  • FIG. 10 is a cross-sectional schematic view of a glass laminate structure 100 a with mask 140 a applied to outer surface 108 of surface layer 104 .
  • Glass laminate structure 100 a is similar to glass laminate structure 100 , except that the second glass composition of surface layer 104 and/or second surface layer 106 of glass laminate structure 100 a comprises a sufficiently high concentration of refractive index decreasing ions (e.g., Na + ) that an ion-exchange treatment with an ion-exchange medium comprising refractive index increasing ions (e.g., K + or Ag + ) increases the refractive index of the surface layer and/or the second surface layer within the ion-exchanged region.
  • refractive index decreasing ions e.g., Na +
  • an ion-exchange treatment with an ion-exchange medium comprising refractive index increasing ions e.g., K + or Ag +
  • openings 142 in mask 140 a comprise a shape that corresponds to an intended pattern of high refractive index region 132 of waveguide 130 .
  • openings 142 in mask 140 a comprise a plurality of lines corresponding to the plurality of high refractive index channels of waveguide 130 and second waveguide 130 a .
  • the openings in the mask comprise one or more dots, curves, branching channels, other suitable shapes, or combinations thereof.
  • Mask 140 a can be formed from the materials and/or using the processes described herein with respect to mask 140 .
  • FIG. 11 is a cross-sectional schematic view of glass laminate structure 100 a after applying mask 140 a to outer surface 108 of surface layer 104 and selectively subjecting the uncovered or exposed portion of the outer surface of the surface layer to the ion-exchange treatment.
  • the ion-exchange medium comprises refractive index increasing ions to be exchanged with refractive index decreasing ions in the glass matrix (e.g., the glass matrix of surface layer 104 ).
  • the ion-exchange medium comprises a molten salt solution
  • the ion-exchange treatment comprises immersing the glass laminate structure in a molten salt bath comprising refractive index increasing ions (e.g., K + ) to be exchanged with refractive index decreasing ions (e.g., Na + ) in the glass matrix of surface layer 104 .
  • the molten salt bath comprises a salt (e.g., a nitrate, a sulfate, and/or a chloride) of the refractive index increasing ions.
  • the molten salt bath comprises molten KNO 3 .
  • the temperature of the molten salt bath is from about 380° C. to about 450° C., and an immersion time is from about 2 hours to about 16 hours.
  • the refractive index increasing ions from the ion-exchange medium diffuse into the uncovered portion of outer surface 108 of surface layer 104 and the refractive index decreasing ions from the glass matrix diffuse out of the uncovered portion of the outer surface of the surface layer.
  • the increased concentration of the refractive index increasing ions in the ion-exchanged region increases the refractive index of surface layer 104 in the ion-exchanged region without substantially increasing the refractive index of the surface layer in the non-ion-exchanged region.
  • openings 142 in mask 140 a comprise a minor dimension (e.g., a width in the Y direction) less than or equal to the minor dimension of high refractive index region 134 .
  • Base layer 102 can serve as an ion-exchange barrier that prevents ion-exchange deep into glass laminate structure 100 a beyond surface layer 104 as described herein with regard to glass laminate structure 100 .
  • optical waveguide articles described herein can be used for a variety of applications including, for example, integrated optical or opto-electronic applications, waveguide laser sources, waveguide switches, couplers, and sensors.

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Citations (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3737294A (en) 1970-08-28 1973-06-05 Corning Glass Works Method for making multi-layer laminated bodies
US3746526A (en) 1971-03-10 1973-07-17 Corning Glass Works Method for forming subsurface fortified laminates
US3849097A (en) 1970-10-07 1974-11-19 Corning Glass Works Method for continuously hot forming strong laminated bodies
US3922062A (en) 1969-12-29 1975-11-25 Nippon Electric Co Integrally formed optical circuit with gradient refractive index
US3931438A (en) 1971-11-08 1976-01-06 Corning Glass Works Differential densification strengthening of glass-ceramics
US4102664A (en) 1977-05-18 1978-07-25 Corning Glass Works Method for making glass articles with defect-free surfaces
US4214886A (en) 1979-04-05 1980-07-29 Corning Glass Works Forming laminated sheet glass
FR2486250A1 (fr) 1979-12-17 1982-01-08 Nippon Telegraph & Telephone Guide d'ondes en verre pour circuit optique et procede de fabrication
US4913717A (en) 1989-01-23 1990-04-03 Polaroid Corporation Method for fabricating buried waveguides
EP0467579A2 (en) 1990-07-10 1992-01-22 Oy Nokia Ab Method of producing optical waveguides by an ion exchange technique on a glass substrate
US5160360A (en) 1989-11-06 1992-11-03 Nippon Sheet Glass Co., Ltd. Process for producing low-loss embedded waveguide
EP0575157A1 (en) 1992-06-16 1993-12-22 The Furukawa Electric Co., Ltd. Method of manufacturing silica waveguide optical components
US5342426A (en) 1993-07-16 1994-08-30 Corning Incorporated Making glass sheet with defect-free surfaces and alkali metal-free soluble glasses therefor
US5559060A (en) 1992-05-22 1996-09-24 Corning Incorporated Glass for laminated glass articles
EP0794443A2 (de) 1996-03-09 1997-09-10 IOT Integrierte Optik GmbH Verfahren zur Herstellung integriert optischer Bauteile durch Ionenaustausch mit Gittermaske für Schichtwellenleiter
DE19936050A1 (de) 1998-07-31 2000-02-24 Litton Systems Inc Verfahren zur Herstellung von Protonen-ausgetauschten Wellenleitern
WO2003046657A2 (en) 2001-11-23 2003-06-05 Btg International Limited Optical devices based on nanocrystals and manufacturing method thereof
US6769274B2 (en) 2001-08-06 2004-08-03 Electronics And Telecommunications Research Institute Method of manufacturing a planar waveguide using ion exchange method
US20040190848A1 (en) * 2003-03-28 2004-09-30 Fujitsu Limited Optical waveguide, fabrication method therefor and optical waveguide device
DE10322350A1 (de) 2003-05-17 2004-12-09 Schott Ag Optische Einrichtung, sowie Verfahren zu deren Herstellung
US6847772B2 (en) * 2002-02-14 2005-01-25 Fujitsu Limited Planar optical waveguide device
US20060204197A1 (en) * 2003-11-05 2006-09-14 Nobuo Miyadera Optical waveguide and method for preparing the same
EP1717613A1 (en) 2005-04-29 2006-11-02 Corning Incorporated Optical waveguides containing quantum dot guiding layers and methods of manufacture
US7201965B2 (en) 2004-12-13 2007-04-10 Corning Incorporated Glass laminate substrate having enhanced impact and static loading resistance
US7263247B1 (en) 2002-02-11 2007-08-28 Gemfire Corporation Integrated optical isolator array
CN101218659A (zh) 2005-02-22 2008-07-09 康宁股份有限公司 提取光的耦合波导
DE102008007871A1 (de) 2007-02-06 2008-08-07 Schott Ag Glas für optische Bauelemente
US7514149B2 (en) 2003-04-04 2009-04-07 Corning Incorporated High-strength laminated sheet for optical applications
US8007913B2 (en) 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
DE202011102663U1 (de) 2010-07-01 2011-12-05 Eurokera S.N.C. Kochplatte umfassend einen Wellenleiter
US8128271B2 (en) 2007-10-09 2012-03-06 Flex Lighting Ii, Llc Light coupling into films
WO2013129400A1 (ja) 2012-02-28 2013-09-06 旭硝子株式会社 積層強化ガラス
AU2012225244A1 (en) 2011-03-09 2013-10-03 Flex Lighting Ii, Llc Light emitting device with adjustable light output profile
CN103492919A (zh) 2011-04-28 2014-01-01 住友大阪水泥股份有限公司 光波导器件
US20150044445A1 (en) * 2013-08-07 2015-02-12 Corning Incorporated Laser controlled ion exchange process and glass articles formed therefrom
WO2015126994A1 (en) 2014-02-21 2015-08-27 Corning Incorporated Layered glassy photosensitive article and method of making
US20170282503A1 (en) 2014-08-28 2017-10-05 Corning Incorporated Laminated glass article with ion exchangeable core and clads layers having diffusivity contrast and methods of making the same
WO2018013505A1 (en) 2016-07-15 2018-01-18 Corning Incorporated Optical waveguide article with laminate structure and method for forming the same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0308602A3 (de) * 1987-09-25 1990-01-10 Siemens Aktiengesellschaft Vergrabener doppelbrechender optischer Wellenleiter oder Struktur aus solchen Wellenleitern sowie Verfahren zur Herstellung eines solchen Wellenleiters oder einer solchen Struktur
CA2041133C (en) * 1990-04-27 1995-01-03 Toru Matsuura Polymide optical waveguide
CA2127861C (en) * 1993-07-14 2004-09-21 Shinji Ishikawa Coupling structure of optical fibers and optical waveguides
US6389209B1 (en) * 1999-09-07 2002-05-14 Agere Systems Optoelectronics Guardian Corp. Strain free planar optical waveguides
JP3551895B2 (ja) * 2000-01-12 2004-08-11 住友電気工業株式会社 石英系光導波路及びその製造方法
US20040037531A1 (en) * 2002-08-20 2004-02-26 Andrews Mark P. Waveguide device with a tailored thermal response
JP3911271B2 (ja) * 2004-01-27 2007-05-09 Ｔｄｋ株式会社 光導波路及びその製造方法
CN1719291A (zh) * 2005-05-25 2006-01-11 中国科学院上海微系统与信息技术研究所 一种玻璃光波导的制作方法
TWI572480B (zh) * 2011-07-25 2017-03-01 康寧公司 經層壓及離子交換之強化玻璃疊層
TWI606986B (zh) * 2012-10-03 2017-12-01 康寧公司 用於保護玻璃表面的物理氣相沉積層
TWI656022B (zh) * 2013-11-13 2019-04-11 美商康寧公司 疊層玻璃物件及其製造方法

Patent Citations (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3922062A (en) 1969-12-29 1975-11-25 Nippon Electric Co Integrally formed optical circuit with gradient refractive index
US3737294A (en) 1970-08-28 1973-06-05 Corning Glass Works Method for making multi-layer laminated bodies
US3849097A (en) 1970-10-07 1974-11-19 Corning Glass Works Method for continuously hot forming strong laminated bodies
US3746526A (en) 1971-03-10 1973-07-17 Corning Glass Works Method for forming subsurface fortified laminates
US3931438A (en) 1971-11-08 1976-01-06 Corning Glass Works Differential densification strengthening of glass-ceramics
US4102664A (en) 1977-05-18 1978-07-25 Corning Glass Works Method for making glass articles with defect-free surfaces
US4214886A (en) 1979-04-05 1980-07-29 Corning Glass Works Forming laminated sheet glass
FR2486250A1 (fr) 1979-12-17 1982-01-08 Nippon Telegraph & Telephone Guide d'ondes en verre pour circuit optique et procede de fabrication
US4425146A (en) 1979-12-17 1984-01-10 Nippon Telegraph & Telephone Public Corporation Method of making glass waveguide for optical circuit
US4913717A (en) 1989-01-23 1990-04-03 Polaroid Corporation Method for fabricating buried waveguides
EP0380468A2 (en) 1989-01-23 1990-08-01 Polaroid Corporation Method for fabricating buried waveguides
US5160360A (en) 1989-11-06 1992-11-03 Nippon Sheet Glass Co., Ltd. Process for producing low-loss embedded waveguide
US5160523A (en) 1990-07-10 1992-11-03 Oy Nokia Ab Method of producing optical waveguides by an ion exchange technique on a glass substrate
EP0467579A2 (en) 1990-07-10 1992-01-22 Oy Nokia Ab Method of producing optical waveguides by an ion exchange technique on a glass substrate
US5559060A (en) 1992-05-22 1996-09-24 Corning Incorporated Glass for laminated glass articles
EP0575157A1 (en) 1992-06-16 1993-12-22 The Furukawa Electric Co., Ltd. Method of manufacturing silica waveguide optical components
US5378256A (en) 1992-06-16 1995-01-03 The Furukawa Electric Co., Ltd. Method of manufacturing silica waveguide optical components
US5342426A (en) 1993-07-16 1994-08-30 Corning Incorporated Making glass sheet with defect-free surfaces and alkali metal-free soluble glasses therefor
US6067388A (en) 1996-03-09 2000-05-23 Iot Integrierte Optik Gmbh Method of making an integrated optical component and an integrated optical star coupler made in accordance with said method
EP0794443A2 (de) 1996-03-09 1997-09-10 IOT Integrierte Optik GmbH Verfahren zur Herstellung integriert optischer Bauteile durch Ionenaustausch mit Gittermaske für Schichtwellenleiter
DE19936050A1 (de) 1998-07-31 2000-02-24 Litton Systems Inc Verfahren zur Herstellung von Protonen-ausgetauschten Wellenleitern
JP2000081527A (ja) 1998-07-31 2000-03-21 Litton Syst Inc プロトン交換された導波路の製造方法
US6769274B2 (en) 2001-08-06 2004-08-03 Electronics And Telecommunications Research Institute Method of manufacturing a planar waveguide using ion exchange method
WO2003046657A2 (en) 2001-11-23 2003-06-05 Btg International Limited Optical devices based on nanocrystals and manufacturing method thereof
US7263247B1 (en) 2002-02-11 2007-08-28 Gemfire Corporation Integrated optical isolator array
US6847772B2 (en) * 2002-02-14 2005-01-25 Fujitsu Limited Planar optical waveguide device
US20040190848A1 (en) * 2003-03-28 2004-09-30 Fujitsu Limited Optical waveguide, fabrication method therefor and optical waveguide device
US7514149B2 (en) 2003-04-04 2009-04-07 Corning Incorporated High-strength laminated sheet for optical applications
DE10322350A1 (de) 2003-05-17 2004-12-09 Schott Ag Optische Einrichtung, sowie Verfahren zu deren Herstellung
US20050058423A1 (en) 2003-05-17 2005-03-17 Schott Glas Optical device, and process for producing it
US20060204197A1 (en) * 2003-11-05 2006-09-14 Nobuo Miyadera Optical waveguide and method for preparing the same
US7201965B2 (en) 2004-12-13 2007-04-10 Corning Incorporated Glass laminate substrate having enhanced impact and static loading resistance
CN101218659A (zh) 2005-02-22 2008-07-09 康宁股份有限公司 提取光的耦合波导
US7432649B2 (en) 2005-02-22 2008-10-07 Corning, Incorporated Coupled waveguides for light extraction
US7817896B2 (en) 2005-04-29 2010-10-19 Corning Incorporated Optical waveguides containing quantum dot guiding layers and methods of manufacture
EP1717613A1 (en) 2005-04-29 2006-11-02 Corning Incorporated Optical waveguides containing quantum dot guiding layers and methods of manufacture
US8007913B2 (en) 2006-02-10 2011-08-30 Corning Incorporated Laminated glass articles and methods of making thereof
DE102008007871A1 (de) 2007-02-06 2008-08-07 Schott Ag Glas für optische Bauelemente
US8128271B2 (en) 2007-10-09 2012-03-06 Flex Lighting Ii, Llc Light coupling into films
DE202011102663U1 (de) 2010-07-01 2011-12-05 Eurokera S.N.C. Kochplatte umfassend einen Wellenleiter
CN202465514U (zh) 2010-07-01 2012-10-03 尤罗科拉公司 玻璃陶瓷板以及包括该玻璃陶瓷板的显示装置和烹饪装置
AU2012225244A1 (en) 2011-03-09 2013-10-03 Flex Lighting Ii, Llc Light emitting device with adjustable light output profile
CN103492919A (zh) 2011-04-28 2014-01-01 住友大阪水泥股份有限公司 光波导器件
US9002165B2 (en) 2011-04-28 2015-04-07 Sumitomo Osaka Cement Co., Ltd. Optical waveguide device
WO2013129400A1 (ja) 2012-02-28 2013-09-06 旭硝子株式会社 積層強化ガラス
US20150044445A1 (en) * 2013-08-07 2015-02-12 Corning Incorporated Laser controlled ion exchange process and glass articles formed therefrom
WO2015126994A1 (en) 2014-02-21 2015-08-27 Corning Incorporated Layered glassy photosensitive article and method of making
US20170080688A1 (en) 2014-02-21 2017-03-23 Corning Incorporated Layered glassy photosensitive article and method of making
US20170282503A1 (en) 2014-08-28 2017-10-05 Corning Incorporated Laminated glass article with ion exchangeable core and clads layers having diffusivity contrast and methods of making the same
WO2018013505A1 (en) 2016-07-15 2018-01-18 Corning Incorporated Optical waveguide article with laminate structure and method for forming the same

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
Chinese Patent Application No. 201780055575.5, Office Action dated Feb. 1, 2021; 14 pages (8 pages English Translation and 6 pages of Original Document); Chinese Patent Office.
English Translation of CN201780055575.5 Office Action dated Apr. 7, 2020; 13 Pages; Chinese Patent Office.
International Search Report and Written Opinion of the International Searching Authority; PCT/US2017/041439; dated Oct. 11, 2017; 11 Pages; European Patent Office.
Tervonen et al.; "Ion-Exchanged Glass Waveguide Technology: A Review"; Optical Engineering, 50 (7), 071107; Jul. 2011; 16 Pages.

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CN109690373B (zh) 2022-06-10
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US20210302649A1 (en) 2021-09-30
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