US10808730B2 - Pumping system for generating a vacuum and method for pumping by means of this pumping system - Google Patents

Pumping system for generating a vacuum and method for pumping by means of this pumping system Download PDF

Info

Publication number
US10808730B2
US10808730B2 US15/513,574 US201415513574A US10808730B2 US 10808730 B2 US10808730 B2 US 10808730B2 US 201415513574 A US201415513574 A US 201415513574A US 10808730 B2 US10808730 B2 US 10808730B2
Authority
US
United States
Prior art keywords
vacuum pump
pump
gas
pumping system
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active, expires
Application number
US15/513,574
Other languages
English (en)
Other versions
US20170284394A1 (en
Inventor
Didier Müller
Jean-Eric Larcher
Théodore Iltchev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ateliers Busch SA
Original Assignee
Ateliers Busch SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51662095&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=US10808730(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ateliers Busch SA filed Critical Ateliers Busch SA
Assigned to ATELIERS BUSCH SA reassignment ATELIERS BUSCH SA ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ILTCHEV, Théodore, LARCHER, JEAN-ERIC, MÜLLER, Didier
Publication of US20170284394A1 publication Critical patent/US20170284394A1/en
Application granted granted Critical
Publication of US10808730B2 publication Critical patent/US10808730B2/en
Active legal-status Critical Current
Adjusted expiration legal-status Critical

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
    • F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B41/00—Pumping installations or systems specially adapted for elastic fluids
    • F04B41/06—Combinations of two or more pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B45/00—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/123—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially or approximately radially from the rotor body extending tooth-like elements, co-operating with recesses in the other rotor, e.g. one tooth
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/046—Combinations of two or more different types of pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04F—PUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
    • F04F5/00—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow
    • F04F5/14—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid
    • F04F5/16—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids
    • F04F5/20—Jet pumps, i.e. devices in which flow is induced by pressure drop caused by velocity of another fluid flow the inducing fluid being elastic fluid displacing elastic fluids for evacuating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B45/00—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids
    • F04B45/04—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids having plate-like flexible members, e.g. diaphragms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation

Definitions

  • the present invention relates to the field of vacuum technology. More precisely, it concerns a pumping system comprising at least one claw pump as well as a pumping method by means of this pumping system.
  • the speed of rotation of the pump plays a very important role by defining the operation of the pump during the different successive phases in the course of evacuation of the vacuum chamber.
  • the necessary electrical power in the first pumping phases when the pressure at the suction end is between atmospheric pressure and about 100 mbar, that is to say during strong mass flow rate operation, will be very high if the speed of rotation of the pump cannot be reduced.
  • variable speed drive which makes possible reduction or increase of the speed and consequently of the power as a function of different criteria of the type pressure, maximal current, limit torque, temperature, etc. But during the periods of operation at reduced rotation speed there are decreases in flow rate at high pressure, the flow rate being proportional to the rotation speed. Also speed variation by variable speed drive entails additional costs and more bulkiness.
  • valves of by-pass type at certain stages, in the multi-stage vacuum pumps of Roots or claw type, or at certain well defined places along the screw in the dry vacuum pumps of screw type.
  • the state of the art concerning the pumping systems which aim to improve the final vacuum and to increase the flow rate also comprise booster pumps of Roots type arranged upstream from main dry pumps.
  • This type of systems is bulky, operates either with by-pass valves presenting problems of reliability or by employing means of measurement, control, adjustment or servo-control.
  • these means of control, adjustment or servo-control must be controlled in an active way, which necessarily results in an increase in the number of components of the system, its complexity and its cost.
  • the present invention has as object to permit a better vacuum to be obtained (on the order of 0.0001 mbar) than that which a single claw pump is capable of generating in a vacuum chamber.
  • the present invention also has as object obtaining a draining or evacuation rate which is greater at low pressure than that which can be obtained with the aid of a single claw pump during a pumping to achieve a vacuum in a vacuum chamber.
  • the present invention likewise has as object to permit a reduction of the electrical energy necessary for the evacuation of a vacuum chamber and for maintaining the vacuum as well as to achieve a decrease in the temperature of the exit gas.
  • a pumping system for generating a vacuum comprising a main vacuum pump which is a claw pump having a gas suction inlet connected to a vacuum chamber and gas discharge outlet leading into a gas evacuation conduit in the direction of a gas exhaust outlet outside the pumping system.
  • the pumping system further comprises
  • the auxiliary vacuum pump can be of different types, in particular another claw pump, a dry pump of screw type, a pump of multi-stage Roots type, a diaphragm pump, a dry rotary vane pump, a lubricated rotary vane pump or also a gas ejector.
  • the invention likewise has as subject matter a pumping method by means of a pumping system such as previously defined. This method comprises steps in which:
  • the auxiliary pump is operated continuously all the while that the main claw vacuum pump evacuates the vacuum chamber, but also all the while that the main claw vacuum pump maintains a defined pressure (for example the final vacuum) in the chamber by evacuating the gases through its discharge end.
  • the coupling of the main claw vacuum pump and of the auxiliary pump can be carried out without requiring specific measures or apparatuses (for example sensors for pressure, temperature, current, etc.), nor servo-controls, nor data management and without calculation. Consequently the pumping system suitable for implementing the pumping method according to the present invention can comprise only a minimal number of components, can have great simplicity and can cost considerably less compared with existing systems.
  • the main claw vacuum pump can operate at a single constant speed, that of the power grid, or turn at variable speeds in accordance with its own mode of operation. Consequently, the complexity and the cost of the pumping system suitable for implementing the pumping method according to the present invention can be reduced even more.
  • the auxiliary pump integrated in the pumping system can always operate according to the pumping method of the invention without being subject to mechanical damage. Its dimensioning is conditioned by a minimal energy consumption for the operation of the device. Its nominal flow rate is selected as a function of the volume of the evacuation conduit between the main claw vacuum pump and the non-return valve. This flow rate can be advantageously from 1/500 to 1/20 of the nominal flow rate of the main claw vacuum pump, but can also be less than or greater than these values, in particular from 1/500 to 1/10 or even from 1/500 to 1/5 of the nominal flow rate of the main vacuum pump.
  • the non-return valve placed in the conduit downstream from the main claw vacuum pump, can be, for example, a standard commercially available element, but it is likewise imaginable to design an element dedicated to the specific application. It is dimensioned according to the nominal flow rate of the main claw vacuum pump. In particular, it is foreseen that the non-return valve closes when the pressure at the suction end of the main claw vacuum pump is between 500 mbar absolute and the final vacuum (for example 100 mbar).
  • the auxiliary pump can be made of materials and/or with coatings having high chemical resistance to substances and gases commonly used in the semi-conductor industry.
  • the auxiliary pump is preferably of small size.
  • the auxiliary vacuum pump always pumps in the volume between the gas discharge outlet of the main claw vacuum pump and the non-return valve.
  • the actuation of the auxiliary vacuum pump is controlled in an “all or nothing” way.
  • the control consists in measuring one or more parameters and following certain rules to actuate the auxiliary vacuum pump or to stop it.
  • the parameters provided by suitable sensors, are, for example, the current of the motor of the main claw vacuum pump, the temperature or the pressure of the gases at its exhaust end, i.e. in the space upstream from the non-return valve in the evacuation conduit, or a combination of these parameters.
  • the dimensioning of the auxiliary vacuum pump aims to achieve a minimal energy consumption of its motor. Its nominal flow rate is selected as a function of the flow rate of the main claw vacuum pump, but also taking into account the volume which the gas evacuation conduit delimits between the main vacuum pump and the non-return valve. This flow rate can be from 1/500 to 1/20 of the nominal flow rate of the main claw vacuum pump, but can also be less than or greater than these values.
  • the pressure there is high for example equal to the atmospheric pressure.
  • the pressure of the gases discharged at its exit is higher than the atmospheric pressure (if the gases at the exit of the main pump are discharged directly into the atmosphere) or higher than the pressure at the inlet of another apparatus connected downstream. This causes the opening of the non-return valve.
  • the pressure at the exit of the main claw vacuum pump becomes that at the inlet of the auxiliary vacuum pump, that of its exit always being the pressure in the conduit after the non-return valve.
  • main claw vacuum pump consumes less and less energy for the compression and produces less and less compression heat.
  • FIG. 1 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a first embodiment of the present disclosure
  • FIG. 2 represents a pumping system SPP suitable for implementation of a pumping method according to a second embodiment of the present invention
  • FIG. 3 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to another embodiment of the present disclosure including a compressor feeding air to an ejector; and
  • FIG. 4 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to another embodiment of the present disclosure including a compressor powered by the main pump which feeds air to an ejector.
  • FIG. 1 represents a pumping system SP for generating a vacuum, which is suitable for implementing a pumping method according to a first embodiment of the present invention.
  • This pumping system SP comprises a chamber 1 , which is connected to the suction end 2 of a main vacuum pump constituted by a claw pump 3 .
  • the gas discharge outlet of the main claw vacuum pump 3 is connected to an evacuation conduit 5 .
  • a non-return discharge valve 6 is placed in the evacuation conduit 5 , which, after this non-return valve, continues into the gas exit conduit 8 .
  • the non-return valve 6 when it is closed, permits the formation of a volume 4 , contained between the gas discharge outlet of the main vacuum pump 3 and itself.
  • the pumping system SP also comprises the auxiliary vacuum pump 7 , connected in parallel to the non-return valve 6 .
  • the suction end of the auxiliary vacuum pump is connected to the space 4 of the evacuation conduit 5 and its discharge end is connected to the conduit 8 .
  • the auxiliary vacuum pump 7 is itself actuated.
  • the main claw vacuum pump 3 suctions the gases in the chamber 1 through the conduit 2 connected at its inlet and compresses them in order to discharge them subsequently at its exit in the evacuation conduit 5 through the non-return valve 6 .
  • the closure pressure for the non-return valve 6 When the closure pressure for the non-return valve 6 is reached, it closes.
  • the pumping of the auxiliary vacuum pump 7 makes the pressure in the space 4 drop progressively to the value of its pressure limit.
  • the power consumed by the main claw vacuum pump 3 decreases progressively. This takes place in a short time period, for example for a certain cycle in 5 to 10 seconds as a function of the relationship between the volume 4 and the nominal flow rate of the auxiliary vacuum pump 7 , but can also last longer.
  • the auxiliary vacuum pump 7 can be another claw pump, a dry pump of screw type, a multi-stage Roots pump, a diaphragm pump, a dry rotary vane pump, a lubricated rotary vane pump or even an ejector.
  • the ejector can be a “simple” ejector in the sense that the flow rate of its propellant gas comes from a distribution network on the industrial site, or can be equipped with a compressor 10 which provides to the ejector the flow of propellant gas at the pressure necessary for its operation ( FIGS. 3 and 4 ). More specifically, this compressor 10 can be driven by the main pump ( FIG.
  • This compressor can suction the atmospheric air or gases in the gas exit conduit after the non-return valve.
  • This compressor renders the system of pumps independent of a source of compressed gas, which can meet requirements of certain industrial environments.
  • FIG. 2 represents a pumping system SPP suitable for implementation of a pumping method according to a second embodiment of the present invention.
  • the system shown in FIG. 2 represents the controlled pumping system SPP, may further comprise suitable sensors 11 , 12 , 13 which check either the current of the motor (sensor 11 ) of the main claw vacuum pump 3 , or the pressure (sensor 13 ) of the gases in the space of the exit conduit of the main claw vacuum pump, limited by the non-return valve 6 , or the temperature (sensor 12 of the gases in the space of the exit conduit at the exit of the main claw vacuum pump, limited by the non-return valve 6 , or a combination of these parameters.
  • suitable sensors 11 , 12 , 13 which check either the current of the motor (sensor 11 ) of the main claw vacuum pump 3 , or the pressure (sensor 13 ) of the gases in the space of the exit conduit of the main claw vacuum pump, limited by the non-return valve 6 , or the temperature (sensor 12 of the gases in the space of the exit conduit at the exit of the main claw vacuum pump, limited by the non-return valve 6 , or a combination of these parameters.
  • the main claw vacuum pump 3 begins to pump the gases of the vacuum chamber 1 , the parameters such as the current of its motor, the temperature and the pressure of the gases in the space of the exit conduit 4 begin to change and reach threshold values detected by the sensors. After a time lag, this causes the startup of the auxiliary vacuum pump 7 . When these parameters return to the initial ranges (outside the set values), with a time lag the auxiliary vacuum pump is stopped.
  • the auxiliary vacuum pump can also be of claw type, of dry screw type, multi-stage Roots type, diaphragm type, dry rotary vane type, lubricated rotary vane type, or an ejector (with or without compressor providing its propellant gas), as in the first embodiment of FIG. 1 .

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
US15/513,574 2014-10-02 2014-10-02 Pumping system for generating a vacuum and method for pumping by means of this pumping system Active 2036-02-22 US10808730B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/071197 WO2016050313A1 (fr) 2014-10-02 2014-10-02 Systeme de pompage pour generer un vide et procede de pompage au moyen de ce systeme de pompage

Publications (2)

Publication Number Publication Date
US20170284394A1 US20170284394A1 (en) 2017-10-05
US10808730B2 true US10808730B2 (en) 2020-10-20

Family

ID=51662095

Family Applications (1)

Application Number Title Priority Date Filing Date
US15/513,574 Active 2036-02-22 US10808730B2 (en) 2014-10-02 2014-10-02 Pumping system for generating a vacuum and method for pumping by means of this pumping system

Country Status (15)

Country Link
US (1) US10808730B2 (ja)
EP (1) EP3201469B1 (ja)
JP (1) JP6512674B2 (ja)
KR (1) KR102330815B1 (ja)
CN (1) CN107002681A (ja)
AU (1) AU2014407987B2 (ja)
BR (1) BR112017006572B1 (ja)
CA (1) CA2961979A1 (ja)
DK (1) DK3201469T3 (ja)
ES (1) ES2785202T3 (ja)
PL (1) PL3201469T3 (ja)
PT (1) PT3201469T (ja)
RU (1) RU2674297C2 (ja)
TW (1) TWI696760B (ja)
WO (1) WO2016050313A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220372979A1 (en) * 2019-06-18 2022-11-24 Pfeiffer Vacuum Dry-type primary vacuum pump and method for controlling the injection of a purging gas

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL3123030T3 (pl) * 2014-03-24 2020-03-31 Ateliers Busch S.A. Sposób pompowania w układzie pomp próżniowych i układ pomp próżniowych
US10041495B2 (en) * 2015-12-04 2018-08-07 Clay Valley Holdings Inc. High volume vacuum pump for continuous operation
CN108533494B (zh) * 2018-06-19 2024-02-20 浙江维朋制冷设备有限公司 一种真空泵
CN112901450A (zh) * 2019-11-19 2021-06-04 核工业西南物理研究院 可移动式快速高真空抽气系统
US20230003208A1 (en) * 2019-12-04 2023-01-05 Ateliers Busch Sa Redundant pumping system and pumping method by means of this pumping system
JP2021110315A (ja) * 2020-01-15 2021-08-02 株式会社アルバック 補助ポンプ制御装置、および、真空ポンプシステム

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3842886A1 (de) 1987-12-21 1989-07-06 Rietschle Masch App Vakuumpumpstand
DE8816875U1 (de) 1987-12-21 1991-04-11 Werner Rietschle Maschinen- Und Apparatebau Gmbh, 7860 Schopfheim Vakuumpumpstand
US20020131870A1 (en) * 2001-03-19 2002-09-19 Alcatel System for pumping low thermal conductivity gases
US20030068233A1 (en) * 2001-10-09 2003-04-10 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
US20060182638A1 (en) * 2003-03-03 2006-08-17 Tadahiro Ohmi Vacuum device and vacuum pump
JP2007100562A (ja) 2005-10-03 2007-04-19 Shinko Seiki Co Ltd 真空装置
US20080145238A1 (en) * 2001-09-06 2008-06-19 Kouji Shibayama Vacuum exhaust apparatus and drive method of vacuum exhaust apparatus
US20090112370A1 (en) * 2005-07-21 2009-04-30 Asm Japan K.K. Vacuum system and method for operating the same
US20110164992A1 (en) * 2008-09-10 2011-07-07 Ulvac, Inc. Vacuum evacuation device
US20120219443A1 (en) * 2009-11-18 2012-08-30 Adixen Vacuum Products Method And Device For Pumping With Reduced Power Use
WO2014012896A2 (fr) 2012-07-19 2014-01-23 Adixen Vacuum Products Procede et dispositif de pompage d'une chambre de procedes
DE102012220442A1 (de) * 2012-11-09 2014-05-15 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem zur Evakuierung einer Kammer sowie Verfahren zur Steuerung eines Vakuumpumpensystems

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2647853A1 (fr) * 1989-06-05 1990-12-07 Cit Alcatel Pompe primaire seche a deux etages
SU1756637A1 (ru) * 1990-12-14 1992-08-23 Сморгонский завод оптического станкостроения Вакуумна откачна система
JP4365059B2 (ja) * 2001-10-31 2009-11-18 株式会社アルバック 真空排気装置の運転方法
SE0201335L (sv) * 2002-05-03 2003-03-25 Piab Ab Vakuumpump och sätt att tillhandahålla undertryck

Patent Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE8816875U1 (de) 1987-12-21 1991-04-11 Werner Rietschle Maschinen- Und Apparatebau Gmbh, 7860 Schopfheim Vakuumpumpstand
DE3842886A1 (de) 1987-12-21 1989-07-06 Rietschle Masch App Vakuumpumpstand
US20020131870A1 (en) * 2001-03-19 2002-09-19 Alcatel System for pumping low thermal conductivity gases
EP1243795A1 (fr) 2001-03-19 2002-09-25 Alcatel Pompe à vide à deux étages
US6644931B2 (en) * 2001-03-19 2003-11-11 Alcatel System for pumping low thermal conductivity gases
US20080145238A1 (en) * 2001-09-06 2008-06-19 Kouji Shibayama Vacuum exhaust apparatus and drive method of vacuum exhaust apparatus
US20030068233A1 (en) * 2001-10-09 2003-04-10 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
US6589023B2 (en) * 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
US20060182638A1 (en) * 2003-03-03 2006-08-17 Tadahiro Ohmi Vacuum device and vacuum pump
US20090112370A1 (en) * 2005-07-21 2009-04-30 Asm Japan K.K. Vacuum system and method for operating the same
JP2007100562A (ja) 2005-10-03 2007-04-19 Shinko Seiki Co Ltd 真空装置
US20110164992A1 (en) * 2008-09-10 2011-07-07 Ulvac, Inc. Vacuum evacuation device
US20120219443A1 (en) * 2009-11-18 2012-08-30 Adixen Vacuum Products Method And Device For Pumping With Reduced Power Use
US9175688B2 (en) * 2009-11-18 2015-11-03 Adixen Vacuum Products Vacuum pumping system having an ejector and check valve
WO2014012896A2 (fr) 2012-07-19 2014-01-23 Adixen Vacuum Products Procede et dispositif de pompage d'une chambre de procedes
US20150170938A1 (en) * 2012-07-19 2015-06-18 Adixen Vacuum Products Method and device for pumping of a process chamber
US9558969B2 (en) * 2012-07-19 2017-01-31 Adixen Vacuum Products Method and device for pumping of a process chamber
DE102012220442A1 (de) * 2012-11-09 2014-05-15 Oerlikon Leybold Vacuum Gmbh Vakuumpumpensystem zur Evakuierung einer Kammer sowie Verfahren zur Steuerung eines Vakuumpumpensystems

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
International Search Report for PCT/EP2017/071197, dated Mar. 9, 2015, 12 pages.
Machine Translation of DE 102012220442. *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220372979A1 (en) * 2019-06-18 2022-11-24 Pfeiffer Vacuum Dry-type primary vacuum pump and method for controlling the injection of a purging gas
US11725659B2 (en) * 2019-06-18 2023-08-15 Pfeiffer Vacuum Dry-type primary vacuum pump and method for controlling the injection of a purging gas

Also Published As

Publication number Publication date
ES2785202T3 (es) 2020-10-06
AU2014407987B2 (en) 2019-10-31
JP6512674B2 (ja) 2019-05-15
US20170284394A1 (en) 2017-10-05
EP3201469B1 (fr) 2020-03-25
DK3201469T3 (da) 2020-04-27
PL3201469T3 (pl) 2020-07-27
KR20170062513A (ko) 2017-06-07
KR102330815B1 (ko) 2021-11-24
BR112017006572A2 (pt) 2017-12-19
EP3201469A1 (fr) 2017-08-09
WO2016050313A1 (fr) 2016-04-07
CN107002681A (zh) 2017-08-01
BR112017006572B1 (pt) 2022-08-23
CA2961979A1 (fr) 2016-04-07
TWI696760B (zh) 2020-06-21
RU2017114342A3 (ja) 2018-11-07
JP2017531754A (ja) 2017-10-26
PT3201469T (pt) 2020-04-23
RU2017114342A (ru) 2018-11-07
TW201623798A (zh) 2016-07-01
AU2014407987A1 (en) 2017-04-13
RU2674297C2 (ru) 2018-12-06

Similar Documents

Publication Publication Date Title
US10808730B2 (en) Pumping system for generating a vacuum and method for pumping by means of this pumping system
US11725662B2 (en) Method of pumping in a system of vacuum pumps and system of vacuum pumps
AU2014406724B2 (en) Vacuum-generating pumping system and pumping method using this pumping system
AU2014392229B2 (en) Method of pumping in a pumping system and vacuum pump system
US10260502B2 (en) Pumping method in a system of vacuum pumps and system of vacuum pumps

Legal Events

Date Code Title Description
AS Assignment

Owner name: ATELIERS BUSCH SA, SWITZERLAND

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MUELLER, DIDIER;LARCHER, JEAN-ERIC;ILTCHEV, THEODORE;SIGNING DATES FROM 20170426 TO 20170502;REEL/FRAME:042743/0108

STPP Information on status: patent application and granting procedure in general

Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION

STPP Information on status: patent application and granting procedure in general

Free format text: NON FINAL ACTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: FINAL REJECTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: ADVISORY ACTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: NON FINAL ACTION MAILED

STCF Information on status: patent grant

Free format text: PATENTED CASE

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 4