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Application filed by Інститут Монокристалів Ан України, Институт монокристаллов АН УкраиныfiledCriticalІнститут Монокристалів Ан України
Priority to UA4670442ApriorityCriticalpatent/UA16738A1/en
Publication of UA16738A1publicationCriticalpatent/UA16738A1/en
The invention relates to ion-vacuum treatment of materials. The device contains a vacuum jig electrode with treated substrate and an arcing-plasmatron ion-type source with thermionic emitting cathode, an anode, an intermediate anode with cavity where a blacklead crucible is placed, an electrode-expander and an extracting electrode. Behind the extracting electrode with central displacement along the axis of symmetry of the ion source equal (0,6-0,7) distance from the last to the substrate surface an additional electrode electrically connected with the anode is installed.
UA4670442A1989-03-311989-03-31Device for treatment of substrates with carbon ions
UA16738A1
(en)