UA111705C2 - Контроль температури підкладки при осадженні покриття - Google Patents

Контроль температури підкладки при осадженні покриття

Info

Publication number
UA111705C2
UA111705C2 UAA201203043A UAA201203043A UA111705C2 UA 111705 C2 UA111705 C2 UA 111705C2 UA A201203043 A UAA201203043 A UA A201203043A UA A201203043 A UAA201203043 A UA A201203043A UA 111705 C2 UA111705 C2 UA 111705C2
Authority
UA
Ukraine
Prior art keywords
covering
bias voltage
data processor
temperature
temperature control
Prior art date
Application number
UAA201203043A
Other languages
English (en)
Inventor
Річард С. Маллін
Анатолій Іванович Кузмічов
Ігор Володимирович Білоусов
Юрій Григорович Кононенко
Олег Георгійович Панков
Дмитро Дмитрович Рижиков
Original Assignee
Юнайтед Текнолоджіз Корпорейшн
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Юнайтед Текнолоджіз Корпорейшн filed Critical Юнайтед Текнолоджіз Корпорейшн
Publication of UA111705C2 publication Critical patent/UA111705C2/uk

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01KMEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K1/00Details of thermometers not specially adapted for particular types of thermometer
    • G01K1/02Means for indicating or recording specially adapted for thermometers
    • G01K1/026Means for indicating or recording specially adapted for thermometers arrangements for monitoring a plurality of temperatures, e.g. by multiplexing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)

Abstract

Винахід забезпечує пристрій для осадження покриття на одну або більше деталей (21). Пристрій має: камеру (22), тримач деталей (64) для утримування деталі (деталей), джерело напруги зміщення (94), сполучене з деталлю (деталями) для прикладання напруги зміщення на деталь (деталі), джерело (34) матеріалу покриття, множину датчиків температури (76), та множину дротів (90), що передають вивід температурних датчиків назовні камери. Система контролю температури (150) має процесор температурних даних (300). Щонайменше одна оптоволоконна лінія (223) з'єднує процесор температурних даних з датчиками температури, так щоб електрично ізолювати процесор температурних даних від напруги зміщення.
UAA201203043A 2011-03-24 2012-03-15 Контроль температури підкладки при осадженні покриття UA111705C2 (uk)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/070,846 US20120244290A1 (en) 2011-03-24 2011-03-24 Deposition Substrate Temperature and Monitoring

Publications (1)

Publication Number Publication Date
UA111705C2 true UA111705C2 (uk) 2016-06-10

Family

ID=46026616

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA201203043A UA111705C2 (uk) 2011-03-24 2012-03-15 Контроль температури підкладки при осадженні покриття

Country Status (3)

Country Link
US (2) US20120244290A1 (uk)
EP (1) EP2503021B1 (uk)
UA (1) UA111705C2 (uk)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012106955B4 (de) * 2012-07-31 2014-04-03 Netzsch-Gerätebau GmbH Vorrichtung und Verfahren zur photothermischen Untersuchung einer Probe
DE102013109887A1 (de) 2013-09-10 2015-03-12 Reinhausen Plasma Gmbh Handgerät und Verfahren zur Plasmabehandlung
US10602082B2 (en) 2014-09-17 2020-03-24 Fluke Corporation Triggered operation and/or recording of test and measurement or imaging tools
WO2016065261A1 (en) 2014-10-24 2016-04-28 Fluke Corporation Imaging system employing fixed, modular mobile, and portable infrared cameras with ability to receive, communicate, and display data and images with proximity detection
US20170078544A1 (en) * 2015-09-16 2017-03-16 Fluke Corporation Electrical isolation for a camera in a test and measurement tool
WO2017070629A1 (en) 2015-10-23 2017-04-27 Fluke Corporation Imaging tool for vibration and/or misalignment analysis
US10927449B2 (en) * 2017-01-25 2021-02-23 Applied Materials, Inc. Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment
US10643821B2 (en) 2017-02-07 2020-05-05 United Technologies Corporation Part temperature measurement device
DE102017105430A1 (de) * 2017-03-14 2018-09-20 Epcos Ag Vorrichtung zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas und Wirkraum
US10708529B2 (en) 2017-12-20 2020-07-07 Semiconductor Components Industries, Llc Image sensors with low-voltage transistors
DE112019002575T5 (de) * 2018-05-22 2021-03-11 Watlow Electric Manufacturing Company Faseroptische Sonde mit dualem Dichtungs- und Kompressionselement
EP3664121A1 (en) 2018-12-05 2020-06-10 ASML Netherlands B.V. High voltage vacuum feedthrough
US12013291B2 (en) * 2020-10-14 2024-06-18 Applied Materials, Inc. Advanced temperature monitoring system with expandable modular layout design

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2615070A (en) * 1948-08-25 1952-10-21 Librascope Inc Rotatable electrical potentiometer connection
SU368349A1 (ru) 1970-01-04 1973-01-26 Установка для нанесения покрытий в вакууме
US3940987A (en) * 1974-06-24 1976-03-02 Champion Spark Plug Company Apparatus for measuring the temperature of an operating spark plug
US3978729A (en) * 1975-12-09 1976-09-07 The United States Of America As Represented By The United States Energy Research And Development Administration Circuit for monitoring temperature of high-voltage equipment
US4215275A (en) 1977-12-07 1980-07-29 Luxtron Corporation Optical temperature measurement technique utilizing phosphors
US4204547A (en) * 1978-11-13 1980-05-27 Allocca John A Method and apparatus for noninvasive monitoring of intracranial pressure
JPS60245776A (ja) 1984-05-21 1985-12-05 Hitachi Ltd 薄膜形成装置
US4669040A (en) * 1984-09-19 1987-05-26 Eurotherm Corporation Self-tuning controller
US4632056A (en) 1985-08-05 1986-12-30 Stitz Robert W CVD temperature control
US4922194A (en) * 1989-03-30 1990-05-01 Westinghouse Electric Corp. Process sensor simulators
US5029117A (en) 1989-04-24 1991-07-02 Tektronix, Inc. Method and apparatus for active pyrometry
JPH0418104A (ja) 1990-05-08 1992-01-22 F K Sangyo Kk 人工樹木の製造方法
JPH04207026A (ja) * 1990-11-30 1992-07-29 Toshiba Corp プラズマ処理装置
JPH04315935A (ja) 1991-04-16 1992-11-06 Fujitsu Ltd 表面温度測定装置とその測定方法
US5564830A (en) 1993-06-03 1996-10-15 Fraunhofer Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Method and arrangement for determining the layer-thickness and the substrate temperature during coating
WO1994029681A1 (de) 1993-06-03 1994-12-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gleichzeitiges bestimmen von schichtdicke und substrattemperatur während des beschichtens
US5388909A (en) 1993-09-16 1995-02-14 Johnson; Shane R. Optical apparatus and method for measuring temperature of a substrate material with a temperature dependent band gap
US5876119A (en) 1995-12-19 1999-03-02 Applied Materials, Inc. In-situ substrate temperature measurement scheme in plasma reactor
JPH09218104A (ja) 1996-02-14 1997-08-19 Sony Corp 基板の温度測定装置
US5806980A (en) * 1996-09-11 1998-09-15 Novellus Systems, Inc. Methods and apparatus for measuring temperatures at high potential
AU3547400A (en) * 1999-03-30 2000-11-02 Chessen Group Inc. Temperature controller for plasma processing
JP4808889B2 (ja) 2000-01-05 2011-11-02 東京エレクトロン株式会社 透過分光を用いるウェハ帯域エッジの測定方法、及びウェハの温度均一性を制御するためのプロセス
WO2002033369A1 (en) 2000-10-13 2002-04-25 Tokyo Electron Limited Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy
US6468384B1 (en) * 2000-11-09 2002-10-22 Novellus Systems, Inc. Predictive wafer temperature control system and method
US6518834B2 (en) * 2001-05-14 2003-02-11 Semiconductor Components Industries Llc Circuit and method for reducing leakage current within an electronic system
US6596339B1 (en) 2001-08-21 2003-07-22 National Semiconductor Corporation Method and apparatus for non-contact, in-situ temperature measurement of a substrate film during chemical vapor deposition of the substrate film
US7509734B2 (en) 2003-03-03 2009-03-31 United Technologies Corporation Repairing turbine element
JP4454243B2 (ja) 2003-03-31 2010-04-21 キヤノンアネルバ株式会社 基板温度調整装置および基板温度調整方法
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
US20050106876A1 (en) 2003-10-09 2005-05-19 Taylor Charles A.Ii Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing
US6976782B1 (en) 2003-11-24 2005-12-20 Lam Research Corporation Methods and apparatus for in situ substrate temperature monitoring
US7404986B2 (en) * 2004-05-07 2008-07-29 United Technologies Corporation Multi-component deposition
CN2795232Y (zh) * 2005-04-22 2006-07-12 北京中科信电子装备有限公司 一种用于坩埚蒸发器的坩埚电源
JP4315935B2 (ja) 2005-07-22 2009-08-19 Necエレクトロニクス株式会社 非同期型通信確立方法、通信装置及び通信システム
GB2452190B (en) 2006-05-17 2011-12-28 G & H Technologies Llc Wear resistant depositied coating, method of coating deposition and applications therefor
CN101413116A (zh) * 2008-10-09 2009-04-22 成都理工大学 一种直流弧光放电pcvd金刚石薄膜制备的基底恒温技术
JP2010171388A (ja) * 2008-12-25 2010-08-05 Hitachi Kokusai Electric Inc 基板処理装置及び半導体装置の製造方法及び基板処理用反応管
US20120138452A1 (en) * 2009-04-17 2012-06-07 The Regents Of The University Of California Method and Apparatus for Super-High Rate Deposition

Also Published As

Publication number Publication date
US20140199490A1 (en) 2014-07-17
EP2503021A1 (en) 2012-09-26
EP2503021B1 (en) 2016-03-16
US9464350B2 (en) 2016-10-11
US20120244290A1 (en) 2012-09-27

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