UA111705C2 - Контроль температури підкладки при осадженні покриття - Google Patents
Контроль температури підкладки при осадженні покриттяInfo
- Publication number
- UA111705C2 UA111705C2 UAA201203043A UAA201203043A UA111705C2 UA 111705 C2 UA111705 C2 UA 111705C2 UA A201203043 A UAA201203043 A UA A201203043A UA A201203043 A UAA201203043 A UA A201203043A UA 111705 C2 UA111705 C2 UA 111705C2
- Authority
- UA
- Ukraine
- Prior art keywords
- covering
- bias voltage
- data processor
- temperature
- temperature control
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/02—Means for indicating or recording specially adapted for thermometers
- G01K1/026—Means for indicating or recording specially adapted for thermometers arrangements for monitoring a plurality of temperatures, e.g. by multiplexing
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
Abstract
Винахід забезпечує пристрій для осадження покриття на одну або більше деталей (21). Пристрій має: камеру (22), тримач деталей (64) для утримування деталі (деталей), джерело напруги зміщення (94), сполучене з деталлю (деталями) для прикладання напруги зміщення на деталь (деталі), джерело (34) матеріалу покриття, множину датчиків температури (76), та множину дротів (90), що передають вивід температурних датчиків назовні камери. Система контролю температури (150) має процесор температурних даних (300). Щонайменше одна оптоволоконна лінія (223) з'єднує процесор температурних даних з датчиками температури, так щоб електрично ізолювати процесор температурних даних від напруги зміщення.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/070,846 US20120244290A1 (en) | 2011-03-24 | 2011-03-24 | Deposition Substrate Temperature and Monitoring |
Publications (1)
Publication Number | Publication Date |
---|---|
UA111705C2 true UA111705C2 (uk) | 2016-06-10 |
Family
ID=46026616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAA201203043A UA111705C2 (uk) | 2011-03-24 | 2012-03-15 | Контроль температури підкладки при осадженні покриття |
Country Status (3)
Country | Link |
---|---|
US (2) | US20120244290A1 (uk) |
EP (1) | EP2503021B1 (uk) |
UA (1) | UA111705C2 (uk) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012106955B4 (de) * | 2012-07-31 | 2014-04-03 | Netzsch-Gerätebau GmbH | Vorrichtung und Verfahren zur photothermischen Untersuchung einer Probe |
DE102013109887A1 (de) | 2013-09-10 | 2015-03-12 | Reinhausen Plasma Gmbh | Handgerät und Verfahren zur Plasmabehandlung |
US10602082B2 (en) | 2014-09-17 | 2020-03-24 | Fluke Corporation | Triggered operation and/or recording of test and measurement or imaging tools |
WO2016065261A1 (en) | 2014-10-24 | 2016-04-28 | Fluke Corporation | Imaging system employing fixed, modular mobile, and portable infrared cameras with ability to receive, communicate, and display data and images with proximity detection |
US20170078544A1 (en) * | 2015-09-16 | 2017-03-16 | Fluke Corporation | Electrical isolation for a camera in a test and measurement tool |
WO2017070629A1 (en) | 2015-10-23 | 2017-04-27 | Fluke Corporation | Imaging tool for vibration and/or misalignment analysis |
US10927449B2 (en) * | 2017-01-25 | 2021-02-23 | Applied Materials, Inc. | Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment |
US10643821B2 (en) | 2017-02-07 | 2020-05-05 | United Technologies Corporation | Part temperature measurement device |
DE102017105430A1 (de) * | 2017-03-14 | 2018-09-20 | Epcos Ag | Vorrichtung zur Erzeugung eines nichtthermischen Atmosphärendruck-Plasmas und Wirkraum |
US10708529B2 (en) | 2017-12-20 | 2020-07-07 | Semiconductor Components Industries, Llc | Image sensors with low-voltage transistors |
DE112019002575T5 (de) * | 2018-05-22 | 2021-03-11 | Watlow Electric Manufacturing Company | Faseroptische Sonde mit dualem Dichtungs- und Kompressionselement |
EP3664121A1 (en) | 2018-12-05 | 2020-06-10 | ASML Netherlands B.V. | High voltage vacuum feedthrough |
US12013291B2 (en) * | 2020-10-14 | 2024-06-18 | Applied Materials, Inc. | Advanced temperature monitoring system with expandable modular layout design |
Family Cites Families (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2615070A (en) * | 1948-08-25 | 1952-10-21 | Librascope Inc | Rotatable electrical potentiometer connection |
SU368349A1 (ru) | 1970-01-04 | 1973-01-26 | Установка для нанесения покрытий в вакууме | |
US3940987A (en) * | 1974-06-24 | 1976-03-02 | Champion Spark Plug Company | Apparatus for measuring the temperature of an operating spark plug |
US3978729A (en) * | 1975-12-09 | 1976-09-07 | The United States Of America As Represented By The United States Energy Research And Development Administration | Circuit for monitoring temperature of high-voltage equipment |
US4215275A (en) | 1977-12-07 | 1980-07-29 | Luxtron Corporation | Optical temperature measurement technique utilizing phosphors |
US4204547A (en) * | 1978-11-13 | 1980-05-27 | Allocca John A | Method and apparatus for noninvasive monitoring of intracranial pressure |
JPS60245776A (ja) | 1984-05-21 | 1985-12-05 | Hitachi Ltd | 薄膜形成装置 |
US4669040A (en) * | 1984-09-19 | 1987-05-26 | Eurotherm Corporation | Self-tuning controller |
US4632056A (en) | 1985-08-05 | 1986-12-30 | Stitz Robert W | CVD temperature control |
US4922194A (en) * | 1989-03-30 | 1990-05-01 | Westinghouse Electric Corp. | Process sensor simulators |
US5029117A (en) | 1989-04-24 | 1991-07-02 | Tektronix, Inc. | Method and apparatus for active pyrometry |
JPH0418104A (ja) | 1990-05-08 | 1992-01-22 | F K Sangyo Kk | 人工樹木の製造方法 |
JPH04207026A (ja) * | 1990-11-30 | 1992-07-29 | Toshiba Corp | プラズマ処理装置 |
JPH04315935A (ja) | 1991-04-16 | 1992-11-06 | Fujitsu Ltd | 表面温度測定装置とその測定方法 |
US5564830A (en) | 1993-06-03 | 1996-10-15 | Fraunhofer Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Method and arrangement for determining the layer-thickness and the substrate temperature during coating |
WO1994029681A1 (de) | 1993-06-03 | 1994-12-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gleichzeitiges bestimmen von schichtdicke und substrattemperatur während des beschichtens |
US5388909A (en) | 1993-09-16 | 1995-02-14 | Johnson; Shane R. | Optical apparatus and method for measuring temperature of a substrate material with a temperature dependent band gap |
US5876119A (en) | 1995-12-19 | 1999-03-02 | Applied Materials, Inc. | In-situ substrate temperature measurement scheme in plasma reactor |
JPH09218104A (ja) | 1996-02-14 | 1997-08-19 | Sony Corp | 基板の温度測定装置 |
US5806980A (en) * | 1996-09-11 | 1998-09-15 | Novellus Systems, Inc. | Methods and apparatus for measuring temperatures at high potential |
AU3547400A (en) * | 1999-03-30 | 2000-11-02 | Chessen Group Inc. | Temperature controller for plasma processing |
JP4808889B2 (ja) | 2000-01-05 | 2011-11-02 | 東京エレクトロン株式会社 | 透過分光を用いるウェハ帯域エッジの測定方法、及びウェハの温度均一性を制御するためのプロセス |
WO2002033369A1 (en) | 2000-10-13 | 2002-04-25 | Tokyo Electron Limited | Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy |
US6468384B1 (en) * | 2000-11-09 | 2002-10-22 | Novellus Systems, Inc. | Predictive wafer temperature control system and method |
US6518834B2 (en) * | 2001-05-14 | 2003-02-11 | Semiconductor Components Industries Llc | Circuit and method for reducing leakage current within an electronic system |
US6596339B1 (en) | 2001-08-21 | 2003-07-22 | National Semiconductor Corporation | Method and apparatus for non-contact, in-situ temperature measurement of a substrate film during chemical vapor deposition of the substrate film |
US7509734B2 (en) | 2003-03-03 | 2009-03-31 | United Technologies Corporation | Repairing turbine element |
JP4454243B2 (ja) | 2003-03-31 | 2010-04-21 | キヤノンアネルバ株式会社 | 基板温度調整装置および基板温度調整方法 |
US7339139B2 (en) * | 2003-10-03 | 2008-03-04 | Darly Custom Technology, Inc. | Multi-layered radiant thermal evaporator and method of use |
US20050106876A1 (en) | 2003-10-09 | 2005-05-19 | Taylor Charles A.Ii | Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing |
US6976782B1 (en) | 2003-11-24 | 2005-12-20 | Lam Research Corporation | Methods and apparatus for in situ substrate temperature monitoring |
US7404986B2 (en) * | 2004-05-07 | 2008-07-29 | United Technologies Corporation | Multi-component deposition |
CN2795232Y (zh) * | 2005-04-22 | 2006-07-12 | 北京中科信电子装备有限公司 | 一种用于坩埚蒸发器的坩埚电源 |
JP4315935B2 (ja) | 2005-07-22 | 2009-08-19 | Necエレクトロニクス株式会社 | 非同期型通信確立方法、通信装置及び通信システム |
GB2452190B (en) | 2006-05-17 | 2011-12-28 | G & H Technologies Llc | Wear resistant depositied coating, method of coating deposition and applications therefor |
CN101413116A (zh) * | 2008-10-09 | 2009-04-22 | 成都理工大学 | 一种直流弧光放电pcvd金刚石薄膜制备的基底恒温技术 |
JP2010171388A (ja) * | 2008-12-25 | 2010-08-05 | Hitachi Kokusai Electric Inc | 基板処理装置及び半導体装置の製造方法及び基板処理用反応管 |
US20120138452A1 (en) * | 2009-04-17 | 2012-06-07 | The Regents Of The University Of California | Method and Apparatus for Super-High Rate Deposition |
-
2011
- 2011-03-24 US US13/070,846 patent/US20120244290A1/en not_active Abandoned
-
2012
- 2012-03-15 UA UAA201203043A patent/UA111705C2/uk unknown
- 2012-03-22 EP EP12160874.9A patent/EP2503021B1/en active Active
-
2014
- 2014-03-17 US US14/215,986 patent/US9464350B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20140199490A1 (en) | 2014-07-17 |
EP2503021A1 (en) | 2012-09-26 |
EP2503021B1 (en) | 2016-03-16 |
US9464350B2 (en) | 2016-10-11 |
US20120244290A1 (en) | 2012-09-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
UA111705C2 (uk) | Контроль температури підкладки при осадженні покриття | |
EP3791199A4 (en) | OPTICAL SENSOR CHIP | |
EP3742960A4 (en) | SYSTEMS, DEVICES AND METHODS FOR COMPENSATING TEMPERATURE EFFECTS ON SENSORS | |
GB201800532D0 (en) | High rate fibre optical distributed acoustic sensing | |
EP3374813A4 (en) | FASEROPTIC CASSETTE SYSTEM WITH MULTIPLE GEARS | |
EP3353579A4 (en) | FIBER OPTIC FLEXIBLE NETWORK | |
MX2014002578A (es) | Biosensor optico con una pluralidad de regiones sensoras. | |
GB201812744D0 (en) | Iterferometric optical fibre sensors | |
JP1681468S (ja) | センサーハウジング | |
GB201808366D0 (en) | Distributed optical fibre vibration sensor | |
EP3847493A4 (en) | FIBER OPTIC DISTRIBUTION SYSTEM | |
EP3628074A4 (en) | MULTIPLEXING A DETECTOR WITH ACTIVE SENSOR AND WITH STRUCTURED LIGHTING | |
GB201811640D0 (en) | Distributed fibre optic sensing | |
EP3584542A4 (en) | FIBER OPTIC SENSOR | |
FR3003062B1 (fr) | Organe a neurone artificiel et memristor | |
EP3874306A4 (en) | NON-PREFERENTIAL BENDING FLEXIBLE SHEATHING FOR FIBER OPTIC CABLES | |
IL276747A (en) | Optical response well for test device | |
EP3832252A4 (en) | LIGHT SOURCE DEVICE, IMAGING DEVICE AND SENSOR MODULE | |
DK3806495T3 (da) | Høreanordning inklusive en optisk sensor | |
EP3746800A4 (en) | CHEMICAL SCANNING SYSTEM | |
EP3926788A4 (en) | FIBER OPTIC POWER SUPPLY SYSTEM | |
EP3952808A4 (en) | HOUSING OF A BODY WEARABLE SENSOR | |
MX2019007980A (es) | Cable optico anti-roedor. | |
EP3831172A4 (en) | MOUNTED POWER SUPPLY SYSTEM | |
TW201613333A (en) | Optical device and optical scanning method thereof |