TWM629742U - Pre-alignment device for thin substrate - Google Patents

Pre-alignment device for thin substrate Download PDF

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TWM629742U
TWM629742U TW111200650U TW111200650U TWM629742U TW M629742 U TWM629742 U TW M629742U TW 111200650 U TW111200650 U TW 111200650U TW 111200650 U TW111200650 U TW 111200650U TW M629742 U TWM629742 U TW M629742U
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substrate
thinned
platform
thinned substrate
alignment device
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TW111200650U
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Chinese (zh)
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陳明生
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特銓股份有限公司
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Abstract

本創作係指一種用於薄化基板之預對準裝置,其中該預對準裝置具有一機座,且該機座上設有被允許選擇性相對位移之一驅動單元及一感測器單元,其該驅動單元具有延伸通過該機座、且被旋轉之一輸出軸,而該輸出軸上設有一被用於放置該薄化基板之基板平台,該基板平台可以被選擇性生成一吸附該薄化基板之靜電場,又該感測器單元可在檢測範圍內檢知該放置於基板平台之薄化基板的定向刻痕,以執行該薄化基板預對準之定向,藉此,使得該基板平台能相對該薄化基板生成靜電場,令該薄化基板可以被完全平貼吸附於該基板平台上,能提高該薄化基板在執行預對準時的準確度,減少因無法預對針而發生重新檢測的次數,進而提高製程良率。 The present invention refers to a pre-alignment device for thinning a substrate, wherein the pre-alignment device has a base, and the base is provided with a drive unit and a sensor unit that are allowed to selectively relative displacement , the drive unit has an output shaft that extends through the base and is rotated, and the output shaft is provided with a substrate platform for placing the thinned substrate, and the substrate platform can be selectively generated to attract the The electrostatic field of the thinned substrate, and the sensor unit can detect the orientation notch of the thinned substrate placed on the substrate platform within the detection range, so as to perform the orientation of the thinned substrate pre-alignment, thereby making The substrate platform can generate an electrostatic field relative to the thinned substrate, so that the thinned substrate can be completely flatly attached to the substrate platform, which can improve the accuracy of the thinned substrate when performing pre-alignment, and reduce the failure of pre-alignment. The number of times of re-inspection occurs due to the needle, thereby improving the process yield.

Description

用於薄化基板之預對準裝置 Pre-alignment device for thinning substrates

本創作隸屬一種薄化基板之定位技術領域,具體而言係一種用於薄化基板之預對準裝置,藉以能減少預對準裝置因薄化基板受翹曲影響,以提升其檢測定向之準確度及檢測效率。 The present invention belongs to the technical field of positioning of thinned substrates, in particular, a pre-alignment device for thinned substrates, so as to reduce the influence of warpage of the pre-aligned device due to thinned substrates, so as to improve the detection orientation of the pre-alignment device. Accuracy and detection efficiency.

按,於基板〔如半導體晶圓或玻璃濾光片等〕上執行各種不同的處理操作〔如檢查、成像、印刷、雷射或切割等〕時,由於在處理流程期間發生任何錯位,都會導致嚴重且無可挽救的缺陷,而必須將基板如晶圓報廢,因此在進入處理流程之前必需預先進行該基板的定向,而被使用來識別基板定向的方式包括在基板的周圍上設置定向刻痕如缺口〔Notch〕或平邊〔Flat〕,並利用預對準裝置來旋轉該基板,使得其能夠藉由感測器檢出該等定向刻痕,以確定基板於處理流程之機械設備內的正確位置,否則將導致後續處理流程的失敗,該預對準裝置可以是獨立裝置或製程設備中的一部; Press, when performing various processing operations (such as inspection, imaging, printing, laser or dicing, etc.) on substrates (such as semiconductor wafers or glass filters, etc.), due to any misalignment during the processing flow, it will lead to Serious and irreparable defects that must scrap the substrate such as a wafer, so the substrate must be oriented before entering the process flow, and the methods used to identify the substrate orientation include placing orientation scores on the perimeter of the substrate Such as Notch or Flat, and use a pre-alignment device to rotate the substrate, so that the sensor can detect these directional nicks to determine the substrate in the mechanical equipment of the processing process. The correct position, otherwise it will lead to the failure of the subsequent processing flow, the pre-alignment device can be an independent device or a part of the process equipment;

而近年來受到半導體製程的微細化發展,如存儲器和功率器件,它們的微型化朝著更小的尺寸、更高的性能以及更低的成本方向發展,為了讓晶片面積變的更小,半導體業界採行的設計方案是將原本晶片水平部署的晶片設計,改換成垂直向的堆疊方式進行,亦即所謂的3D IC堆疊封裝。由於3D IC 堆疊封裝係以垂直向進行堆疊,需利用矽穿孔〔Through-Silicon Via;TSV〕技術將IC封裝內的各功能晶片進行物理電氣連結,因此晶圓之厚度會被壓縮在100微米以下。另外近年來智慧型手機的照相品質足以媲美專業單眼相機,而智慧型手機相機鏡頭的成像品質大幅提升的關鍵之一,在於手機相機鏡頭導入超薄的藍玻璃濾光片,可吸收多餘的紅外光,還原物體的真實顏色。 In recent years, due to the miniaturization of semiconductor processes, such as memory and power devices, their miniaturization is developing towards smaller size, higher performance and lower cost. In order to make the wafer area smaller, semiconductor The design scheme adopted by the industry is to replace the original horizontal chip design with a vertical stacking method, which is the so-called 3D IC stacking package. Due to 3D IC Stacked packages are stacked vertically. Through-Silicon Via (TSV) technology is used to physically and electrically connect various functional chips in the IC package. Therefore, the thickness of the wafer will be compressed to less than 100 microns. In addition, in recent years, the photographic quality of smartphones is comparable to that of professional SLR cameras, and one of the keys to the substantial improvement in the image quality of smartphone camera lenses is the introduction of ultra-thin blue glass filters into the camera lenses of mobile phones, which can absorb excess infrared light. Light, restore the true color of the object.

而前述之薄化基板不論是薄化晶圓或超薄濾光片,當其厚度小於200μm、100μm或甚至小於50μm、且表面積越大〔如8吋、12吋或以上之半導體晶圓〕時,因為多複合性晶背材質上,對於每種金屬的延展性皆不一同,尤其在經過研磨、拋光、退火後的變化更多,進而產生翹曲〔Warpage〕的現象。而現有在進行預對準步驟時,係以一具真空吸盤〔Fork〕之抓取設備如機械手臂〔Robot〕將基板載入至該獨立或製程機台一部之預對準裝置的基板平台,而利用形成於基板平台表面的吸孔相對基板產生真空吸力予以固定,供後續透過基板平台旋轉來檢測基板上的缺口〔Notch〕或平邊〔Flat〕進行定向。如第1圖所示,當前述薄化之基板(100)的翹曲度較大時,會發生基板平台(200)對應之吸口(201)沒有被遮蓋而暴露在空氣中,這時氣流會流向這些未被遮蓋的吸口(201),使得那些被遮蓋的吸口(201)沒有足夠的真空吸力來抓取基板(100),如此將無法使薄化基板(100)完全平貼於基板平台(200)表面,除了可能因平整度問題造成預對準不準確外,更可能在基板平台(200)旋轉中發生掉片。再者,前述薄化基板其內部能承受之應力變化也會變小,當真空吸力過大時,可能會造成薄化基板(100)發生內裂,且容易在薄化基板(100) 表面留在吸口(201)的吸附痕跡,可能影響到薄化基板(100)後續的品質及良率。 Whether the aforementioned thinned substrate is a thinned wafer or an ultra-thin filter, when the thickness is less than 200 μm, 100 μm or even less than 50 μm, and the surface area is larger (such as 8 inches, 12 inches or more semiconductor wafers) , Because the multi-composite crystal back material has different ductility for each metal, especially after grinding, polishing, and annealing, there are more changes, resulting in the phenomenon of warpage. In the prior art, during the pre-alignment step, a gripping device with a vacuum chuck (Fork), such as a robotic arm (Robot), is used to load the substrate to the substrate platform of the pre-alignment device that is independent or part of the process machine , and the suction holes formed on the surface of the substrate platform are used to generate a vacuum suction force relative to the substrate to fix it for subsequent rotation of the substrate platform to detect the notch (Notch) or flat edge (Flat) on the substrate for orientation. As shown in FIG. 1, when the warpage of the thinned substrate (100) is large, the suction port (201) corresponding to the substrate platform (200) will not be covered and exposed to the air, and the airflow will flow to the These uncovered suction ports (201) make those covered suction ports (201) not have enough vacuum suction to grab the substrate (100), so that the thinned substrate (100) cannot be completely flat on the substrate platform (200). ) surface, in addition to possibly inaccurate pre-alignment due to flatness issues, chipping is more likely to occur during the rotation of the substrate platform (200). Furthermore, the change of the stress that can be endured inside the thinned substrate will also become smaller. When the vacuum suction force is too large, internal cracks may occur in the thinned substrate (100), and the thinned substrate (100) may be easily damaged. The adsorption traces left on the surface of the suction port (201) may affect the subsequent quality and yield of the thinned substrate (100).

換言之,由於現有預對準步驟在應對薄化基板時,會因薄化基板之翹曲形成真空吸力不足、吸力不均勻的現象,造成真空吸力不足以抓緊薄化基板,會使薄化基板在預對準時發生檢測不準確及對準效率不佳,甚至發生掉片或破片的現象,又或因吸力過大產生內裂或吸痕,不論何者均會影響後續製程良率及效率,因此如何克服前述薄化基板之預對準問題,係業者及使用者所期待,亦係本創作所欲探討解決者。 In other words, when the existing pre-alignment process is used to deal with the thinned substrate, the phenomenon of insufficient vacuum suction and uneven suction due to the warpage of the thinned substrate will result in insufficient vacuum suction to grasp the thinned substrate, which will cause the thinned substrate to be Inaccurate detection and poor alignment efficiency occur during pre-alignment, or even chipping or fragmentation, or internal cracks or suction marks due to excessive suction, both of which will affect the yield and efficiency of subsequent processes. Therefore, how to overcome The above-mentioned pre-alignment problem of thinned substrates is expected by the industry and users, and it is also the solution that this creation intends to explore.

有鑑於上述缺失弊端,本創作人認為具有改正之必要,遂以從事相關技術以及產品設計製造之多年經驗,秉持優良設計理念,針對以上不良處加以研究改良,經不斷努力的試作,終於成功開發一種用於薄化基板之預對準裝置,藉以克服現有薄化基板在預對準時所面臨的困擾與不便。 In view of the above-mentioned shortcomings, the creator believes that it is necessary to correct it, so with years of experience in related technologies and product design and manufacturing, adhering to the good design concept, research and improvement for the above shortcomings, after continuous efforts, the trial work was finally successfully developed. A pre-alignment device for thinned substrates, so as to overcome the troubles and inconveniences faced by the existing thinned substrates during pre-alignment.

因此,本創作之主要目的係在提供一種用於薄化基板之預對準裝置,能使預對準裝置對薄化基板提供一個穩定、且均勻的吸附力,可以有效逐步拉平翹曲的薄化基板,進一步大幅提升預對準裝置對薄化基板之吸附效果。 Therefore, the main purpose of the present invention is to provide a pre-alignment device for thinning substrates, which can provide a stable and uniform adsorption force on the thinned substrates by the pre-alignment device, and can effectively flatten warped thin substrates step by step. The thinned substrate can be further greatly enhanced by the pre-alignment device's adsorption effect on the thinned substrate.

又,本創作之另一主要目的係在提供一種用於薄化基板之預對準裝置,藉以能提供薄化基板穩定的抓取力,以提高薄化基板預對準時的準確度,可縮短後續製程的對準時間及減少重新對準的現象,進而提高製程效率與良率。 In addition, another main purpose of the present invention is to provide a pre-alignment device for thinned substrates, so as to provide a stable grasping force for thinned substrates, so as to improve the accuracy of pre-alignment of thinned substrates, and to shorten the The alignment time of the subsequent process and the phenomenon of re-alignment are reduced, thereby improving the process efficiency and yield.

再者,本創作之次一主要目的係在提供一種用於薄化基板之預對準裝置,其能讓薄化基板在預對準時被有效定 位,可避免薄化基板於高速旋轉預對準時發生掉片現象,以減少不必要的損失。 Furthermore, the second main purpose of the present invention is to provide a pre-alignment device for thinned substrates, which enables the thinned substrates to be effectively aligned during pre-alignment. position, which can avoid the chipping phenomenon of the thinned substrate during high-speed rotation and pre-alignment, so as to reduce unnecessary losses.

基於此,本創作主要係透過下列的技術手段來具體實現前述的目的與效能;其至少包含有: Based on this, this creation mainly realizes the aforementioned purpose and effectiveness through the following technical means; it includes at least:

一機座; a machine base;

一基板平台,其係設於後述之驅動單元上,該基板平台頂面具有一供置放該薄化基板之第一接合板面,該第一接合板面內部具有可以被選擇性生成一靜電場之複數電極,且該基板平台外徑小於該薄化基板定向刻痕之範圍、且大於該薄化基板之半徑,使該薄化基板被吸附時具定向刻痕之邊緣能被支撐呈平整狀; A substrate stage, which is mounted on the drive unit described later, the top surface of the substrate stage has a first bonding plate surface for placing the thinned substrate, and a static electricity can be selectively generated inside the first bonding plate surface A plurality of electrodes of the field, and the outer diameter of the substrate platform is smaller than the range of the directional notch of the thinned substrate, and larger than the radius of the thinned substrate, so that the edge with the directional notch can be supported to be flat when the thinned substrate is adsorbed shape;

一驅動單元,其係設置於該機座內,且該驅動單元具有一旋轉驅動組,該旋轉驅動組具有一延伸通過該機座之輸出軸,而前述基板平台可被固定到該輸出軸端部,使得基板平台可被旋轉驅動組作動輸出軸旋轉同步帶動; A drive unit is disposed in the base, and the drive unit has a rotary drive group with an output shaft extending through the base, and the substrate platform can be fixed to the end of the output shaft part, so that the substrate platform can be driven synchronously by the rotation of the output shaft of the rotary drive group;

一感測器單元,其係設置於該機座上,該感測器單元具有一讀取頭,而該讀取頭具有面向基板平台上表面之光學感測器,且該光學感測器可在檢測範圍內感測該放置於基板平台之薄化基板的定向刻痕。 A sensor unit is disposed on the base, the sensor unit has a read head, and the read head has an optical sensor facing the upper surface of the substrate platform, and the optical sensor can Directional scribes of the thinned substrate placed on the substrate platform are sensed within the detection range.

藉此,本創作用於薄化基板之預對準裝置可以透過其基板平台之第一接合板面對薄化基板生成一靜電場,使該靜電場可將該薄化基板翹起部份逐步向下拉平,進而使該薄化基板可以完全平貼於該第一接合板面上表面、且被穩固吸附,以避免該薄化基板於旋轉預對準時發生掉片的現象,進一步能提高該薄化基板在執行預對準時的準確度,減少因無法預對針而發生重新檢測的次數,進而提高製程效率與良率。 Thereby, the pre-alignment device used for the thinned substrate of the present invention can generate an electrostatic field facing the thinned substrate through the first bonding plate of the substrate platform, so that the electrostatic field can gradually lift up the thinned substrate Pull down and flatten, so that the thinned substrate can be completely flat on the upper surface of the first bonding plate, and be firmly adsorbed, so as to avoid the phenomenon of the thinned substrate falling off during the pre-rotation alignment, and further improve the Thinning the accuracy of the pre-alignment of the substrate reduces the number of re-inspections due to inability to pre-align the needle, thereby improving process efficiency and yield.

為使 貴審查委員能進一步了解本創作的構成、特徵及其他目的,以下乃舉若干較佳之實施例,並配合圖式詳細說明如后,同時讓熟悉該項技術領域者能夠具體實施。 In order to enable your reviewers to further understand the composition, features and other purposes of this creation, some preferred embodiments are listed below, and are described in detail with the drawings, and at the same time, those who are familiar with the technical field can implement it.

S11:提供一邊緣具定向刻痕之薄化基板 S11: Provide a thinned substrate with directional notch on the edge

S12:利用一抓取設備將上述薄化基板移入一預對準裝置中 S12: Use a grabbing device to move the thinned substrate into a pre-alignment device

S13:由上述預對準裝置對上述薄化基板生成一靜電場 S13: Generate an electrostatic field on the thinned substrate by the pre-alignment device

S14:利用旋轉上述薄化基板來檢測上述定向刻痕執行定向 S14: Perform orientation by rotating the thinned substrate to detect the orientation nicks

S15:透過上述抓取設備預先吸附上述薄化基板後釋放上述靜電場移出該薄化基板 S15: Pre-adsorb the thinned substrate through the grabbing device and then release the electrostatic field to remove the thinned substrate

100:薄化基板 100: Thinning the substrate

105:定向刻痕 105: Orientation Score

106:缺口 106: Notch

107:平邊 107: Flat edge

10:機座 10: base

11:開口 11: Opening

20:基板平台 20: Substrate Platform

21:第一接合板面 21: The first joint board surface

22:電極 22: Electrodes

23:穿孔 23: Perforation

24:頂料組 24: Top material group

25:第二接合板面 25: Second joint board surface

28:牙叉開槽 28: Fork Slotting

30:驅動單元 30: Drive unit

31:旋轉驅動組 31: Rotary drive group

32:輸出軸 32: Output shaft

33:升降驅動組 33: Lifting drive group

34:伸桿 34: Extension rod

35:移動機構 35: Moving Mechanisms

40:感測器單元 40: Sensor unit

41:讀取頭 41: read head

42:光學感測器 42: Optical sensor

45:移動機構 45: Moving Mechanisms

60:基板牙叉 60: Base plate teeth

第1圖:為現有預對準裝置使用真空吸附方式固定薄化之基板的局部剖面示意圖。 Fig. 1 is a partial cross-sectional schematic diagram of a conventional pre-alignment device using vacuum adsorption to fix a thinned substrate.

第2A圖:為具定向刻痕之薄化基板的外觀示意圖,說明其為缺口型定向刻痕之態樣。 Figure 2A: is a schematic view of the appearance of a thinned substrate with directional nicks, illustrating that it is a state of notch-type directional nicks.

第2B圖:為具定向刻痕之薄化基板的外觀示意圖,說明其為平邊型定向刻痕之態樣。 FIG. 2B is a schematic view of the appearance of a thinned substrate with directional nicks, illustrating that it is a state of flat-edge directional nicks.

第3圖:為本創作之預對準裝置的外觀示意圖,供說明該預對準裝置之態樣及其相對關係。 Figure 3: A schematic diagram of the appearance of the pre-alignment device of this creation, for illustrating the state of the pre-alignment device and its relative relationship.

第4圖:為本創作之預對準裝置的局部剖面示意圖,供說明其組件態樣及其相對關係。 Figure 4: A partial cross-sectional schematic diagram of the pre-alignment device of the present creation, for illustrating its components and their relative relationship.

第5圖:為本創作之預對準裝置中基板平台另一實施例的俯視平面示意圖。 FIG. 5 is a schematic top plan view of another embodiment of the substrate platform in the pre-alignment device of the present invention.

第6圖:為本創作用於薄化基板之預對準方法的流程架構。 Fig. 6: The flow structure of the pre-alignment method for thinning the substrate of the present invention.

第7圖:為本創作之預對準裝置於實際使用時的第一動作參考示意圖,供說明其移入薄化基板之態樣。 Figure 7: The first action reference schematic diagram of the pre-alignment device of the present creation in actual use, for explaining the state of its moving into the thinned substrate.

第8A圖:為本創作之預對準裝置於實際使用時的第二動作參考示意圖,為說明其生成靜電場之態樣。 Figure 8A: The second action reference schematic diagram of the pre-alignment device of the present creation in actual use, in order to illustrate the state of the electrostatic field generated by the pre-alignment device.

第8B圖:為本創作之預對準裝置於實際使用時的第二動作另一參考示意圖,為說明其整平薄化基板之態樣。 FIG. 8B : another reference schematic diagram of the second action of the pre-alignment device of the present invention in actual use, for illustrating the state of the flattening and thinning of the substrate.

第9圖:為本創作之預對準裝置於實際使用時的第 四動作參考示意圖,供說明其旋轉檢測定向之態樣。 Figure 9: The first stage of the actual use of the pre-alignment device for this creation The four-action reference diagram is used to illustrate the state of its rotation detection orientation.

第10圖:為本創作之預對準裝置於實際使用時的第四動作參考示意圖,供說明其移出薄化基板之態樣。 Fig. 10 is a reference schematic diagram of the fourth action of the pre-alignment device of the present invention when it is actually used, to illustrate the state in which the pre-alignment device is removed from the thinned substrate.

本創作係一種用於薄化基板之預對準裝置,隨附圖例示之本創作光罩保持容器的具體實施例及其構件中,所有關於前與後、左與右、頂部與底部、上部與下部、以及水平與垂直的參考,僅用於方便進行描述,並非限制本創作,亦非將其構件限制於任何位置或空間方向。圖式與說明書中所指定的尺寸,當可在不離開本創作之申請專利範圍內,根據本創作之具體實施例的設計與需求而進行變化,故在專利申請上並不受此種結構之限制。 The present invention is a pre-alignment device for thinning a substrate. The accompanying drawings illustrate the specific embodiment of the photomask holding container and its components, all about front and back, left and right, top and bottom, upper References to the lower part, and the horizontal and vertical, are for the convenience of description only, and do not limit the creation, nor restrict its components to any position or spatial orientation. The dimensions specified in the drawings and the description can be changed according to the design and requirements of the specific embodiments of the present creation without departing from the scope of the patent application of the present creation, so it is not affected by this structure in the patent application. limit.

本創作應用於薄化基板之預對準,請參照第2圖所示,該等薄化基板(100)可以是半導體晶圓、超薄濾光片等,且該等薄化基板(100)周緣具有一或一個以上之定向刻痕(105),該等定向刻痕(105)可以選自缺口(106)〔Notch〕、平邊(107)〔F1at〕或其組合,用來提高薄化基板(100)在預對準流程的準確度; The present invention is applied to the pre-alignment of thinned substrates. Please refer to FIG. 2. The thinned substrates (100) can be semiconductor wafers, ultra-thin optical filters, etc., and the thinned substrates (100) The perimeter has one or more directional notches (105), which can be selected from notches (106) [Notch], flat edges (107) [F1at], or combinations thereof, to improve thinning The accuracy of the substrate (100) in the pre-alignment process;

而本創作用於該薄化基板(100)之預對準裝置可以是獨立裝置或一製程處理設備的一部,供使該薄化基板(100)被定向對準後用於檢查及/或用於製程處理如印刷、雷射或切割等,至於該預對準裝置之結構組成係如第2、3圖所示,其至少包括有一機座(10)、一基板平台(20)、一驅動單元(30)及一感測器單元(40),該機座(10)可以是一支撐機構,其可供設置該驅動單元(30)及該感測器單元(40), 且該機座(10)頂面具有一開口(11),用於供該驅動單元(30)的一部分延伸通過,以組裝前述之基板平台(20),且允許該驅動單元(30)與該感測器單元(40)間的相對移動,再者該機座(10)可以是能被獨立固定於地面或桌面之型態、又或被安裝到一製程處理設備的機體之型態; The pre-alignment device used in the present invention for the thinned substrate (100) may be a stand-alone device or a part of a process equipment, for the thinned substrate (100) to be oriented and aligned for inspection and/or It is used for process processing such as printing, laser or cutting, etc. As for the structural composition of the pre-alignment device, as shown in Figures 2 and 3, it at least includes a machine base (10), a substrate platform (20), a a drive unit (30) and a sensor unit (40), the base (10) may be a support mechanism, which can be used to set the drive unit (30) and the sensor unit (40), And the top surface of the base (10) has an opening (11) for a part of the driving unit (30) to extend therethrough, so as to assemble the aforementioned substrate platform (20), and allow the driving unit (30) to be connected with the The relative movement between the sensor units (40), and the base (10) can be of a type that can be independently fixed on the ground or a desktop, or a type that can be installed on the body of a process processing equipment;

而該基板平台(20)被安裝在該驅動單元(30)穿出該機座(10)的部份頂面,且該基板平台(20)頂面具有一供置放該薄化基板(100)之第一接合板面(21),該第一接合板面(21)內部具有可以被選擇性生成一靜電場之複數電極(22)〔如第4圖所示〕,供連通一靜電生成控制單元〔圖中未示〕選擇性提供生成靜電場之電源,以利用該等電極(22)生成之靜電場提供該第一接合板面(21)相對該薄化基板(100)的吸附力,可防止薄化基板(100)相對於該第一接合板面(21)移動,且該基板平台(20)外徑小於該薄化基板(100)定向刻痕(105)之範圍、且大於該薄化基板(100)直徑的三分之一,使該薄化基板(100)被該基板平台(20)之第一接合板面(21)靜電場吸附時,該薄化基板(100)具定向刻痕(105)之邊緣能被支撐呈平整狀。又根據某些實施例,該基板平台(20)具有一被選擇性升降承接該薄化基板(100)之頂料組(24),其中該頂料組(24)可以是位於基板平台(20)軸心之單柱型態或分別於該基板平台(20)之等角等距多柱型態如三柱結構。而單柱型態之頂料組(24)係於該基板平台(20)軸心形成有一貫穿該第一接合板面(21)之穿孔(23),且該可被選擇性升降之頂料組(24)設於該穿孔(23)內,以供上升承接該薄化基板(100)〔如第7圖所示〕,且該頂料組(24)之頂面具有一第二接合板面(25),又該第二接合板面(25) 內部具有可以被選擇性生成一靜電場之複數電極(22)〔如第4圖所示〕,以利用該等電極(22)生成之靜電場提供該第二接合板面(25)相對該薄化基板(100)的吸附力,可防止薄化基板(100)相對於該第二接合板面(25)移動,且該第二接合板面(25)頂面之高度低於或等於該第一接合板面(21)之頂面,當該第二接合板面(25)頂面高度與該第一接合板面(21)頂面高度相等時,前述之第一、二接合板面(21、25)可以被同步旋轉。再者如第5圖所示,根據某些實施例,該基板平台(20)於相對軸心兩側分別形成有一相對邊緣開口之牙叉開槽(28),可供基板抓取設備如機械手臂〔Robot〕之一基板牙叉(60)〔Fork或End-effector〕伸入; The substrate platform (20) is mounted on a part of the top surface of the drive unit (30) passing out of the base (10), and the top surface of the substrate platform (20) has a surface for placing the thinned substrate (100). ) of the first joint plate surface (21), the first joint plate surface (21) has a plurality of electrodes (22) (as shown in Figure 4) that can selectively generate an electrostatic field inside, for connecting an electrostatic generation The control unit (not shown in the figure) selectively provides a power source for generating an electrostatic field, so as to utilize the electrostatic field generated by the electrodes (22) to provide the adsorption force of the first bonding plate surface (21) relative to the thinned substrate (100) , which can prevent the thinned substrate (100) from moving relative to the first bonding plate surface (21), and the outer diameter of the substrate platform (20) is smaller than the range of the thinned substrate (100) directional notch (105) and greater than One third of the diameter of the thinned substrate (100), when the thinned substrate (100) is attracted by the electrostatic field of the first bonding plate surface (21) of the substrate platform (20), the thinned substrate (100) The edge with the directional score (105) can be supported flat. Also according to some embodiments, the substrate platform (20) has a lifter group (24) that is selectively lifted and lifted to receive the thinned substrate (100), wherein the lifter group (24) may be located on the substrate platform (20). ) the single-column type of the axis or the equiangular equidistant multi-column type such as the three-column structure respectively on the substrate platform (20). The single-column type ejector group (24) is formed with a through hole (23) through the first joint surface (21) on the axis of the substrate platform (20), and the ejector can be selectively lifted and lowered A group (24) is arranged in the through hole (23) for ascending to receive the thinned substrate (100) (as shown in Figure 7), and the top surface of the top material group (24) has a second bonding plate surface (25), and the second joint plate surface (25) There are a plurality of electrodes (22) (as shown in Fig. 4) which can be selectively generated an electrostatic field inside, so as to use the electrostatic field generated by the electrodes (22) to provide the second bonding plate surface (25) relative to the thin plate The adsorption force of the thinned substrate (100) can prevent the thinned substrate (100) from moving relative to the second bonding board surface (25), and the height of the top surface of the second bonding board surface (25) is lower than or equal to the second bonding board surface (25) A top surface of a joint board surface (21), when the height of the top surface of the second joint board surface (25) is equal to the height of the top surface of the first joint board surface (21), the aforementioned first and second joint board surfaces ( 21, 25) can be rotated synchronously. Furthermore, as shown in FIG. 5, according to some embodiments, the substrate platform (20) is respectively formed with a fork slot (28) with opposite edge openings on both sides of the opposite axis, which can be used for substrate grabbing equipment such as machinery. One of the arm (Robot) fork (60) [Fork or End-effector] extends into;

又該驅動單元(30)係設置於該機座(10)內,且該驅動單元(30)具有一旋轉驅動組(31),該旋轉驅動組(31)具有一延伸通過該機座(10)開口(11)之輸出軸(32),而前述基板平台(20)可被固定到該輸出軸(32)端部,使得基板平台(20)可被旋轉驅動組(31)作動輸出軸(32)旋轉同步帶動,且該基板平台(20)與作動該第一接合板面(21)電極(22)生成靜電場之靜電生成控制單元間可透過如集電滑環〔Slip Ring,又稱為電氣旋轉接頭〕保持旋轉狀導通。另根據某些實施例,當該基板平台(20)內具有頂料組(24)時,該驅動單元(30)進一步包含有一升降驅動組(33),該升降驅動組(33)具有一延伸通過該基板平台(20)穿孔(23)之伸桿(34),而該頂料組(24)可被固定到該伸桿(34)端部,使得該頂料組(24)可被升降驅動組(33)作動上、下升降位移。再者該驅動單元(30)可以透過一移動機構(35)設置於該機座(10)上,如使用馬達與導螺桿來移動與定位的滑軌組, 使得該驅動單元(30)可帶動該基板平台(20)相對該感測器單元(40)選擇性位移,且該移動機構(35)進一步可以令該驅動單元(30)相對該機座(10)呈X軸、Y軸、Z軸或其組合之選擇性移動; And the drive unit (30) is arranged in the base (10), and the drive unit (30) has a rotary drive group (31), the rotary drive group (31) has a drive extending through the base (10) ) the output shaft (32) of the opening (11), and the aforementioned substrate platform (20) can be fixed to the end of the output shaft (32), so that the substrate platform (20) can be rotated by the drive group (31) to actuate the output shaft ( 32) The rotation is synchronously driven, and between the substrate platform (20) and the electrostatic generation control unit that actuates the first joint surface (21) electrode (22) to generate an electrostatic field, such as a collector slip ring (Slip Ring, also known as It is an electrical rotary joint] to maintain a rotary conduction. According to some embodiments, when the substrate platform (20) has an ejector group (24), the drive unit (30) further includes a lift drive group (33), and the lift drive group (33) has an extension The extension rod (34) of the perforation (23) is passed through the base plate platform (20), and the ejector group (24) can be fixed to the end of the extension rod (34), so that the ejector group (24) can be lifted and lowered The driving group (33) moves up and down to move up and down. Furthermore, the drive unit (30) can be disposed on the machine base (10) through a moving mechanism (35), such as a slide rail set that uses a motor and a lead screw to move and position, The drive unit (30) can drive the substrate platform (20) to selectively displace relative to the sensor unit (40), and the moving mechanism (35) can further enable the drive unit (30) to move relative to the base (10). ) is a selective movement of the X-axis, the Y-axis, the Z-axis or a combination thereof;

再者,該感測器單元(40)係設置於該機座(10)上對應基板平台(20)邊緣的一側,使其被用來檢測被置放在基板平台(20)上的薄化基板(100),該感測器單元(40)可以是光學式、影像式或機械式之檢測技術,本創作之該感測器單元(40)包括有一讀取頭(41),而該讀取頭(41)具有面向基板平台(20)上表面之光學感測器(42),且該光學感測器(42)可在檢測範圍內感測該薄化基板(100)之邊緣定向刻痕(105),使得該感測器單元(40)可以檢出該基板平台(20)上薄化基板(100)之定向刻痕(105)如缺口或平邊,供該薄化基板(100)用於檢查及/或用於製程處理之預對準,又該光學感測器(42)可以透過一移動機構(45)設置於該讀取頭(41)內,如使用馬達與導螺桿來移動與定位的滑軌組,使得該光學感測器(42)可相對該薄化基板(100)選擇性上、下位移,以調整其檢測薄化基板(100)之定向刻痕(105)的焦距; Furthermore, the sensor unit (40) is arranged on a side of the base (10) corresponding to the edge of the substrate platform (20), so that it is used to detect the thin film placed on the substrate platform (20). A chemical substrate (100), the sensor unit (40) can be an optical, image or mechanical detection technology, the sensor unit (40) of the present invention includes a read head (41), and the The read head (41) has an optical sensor (42) facing the upper surface of the substrate platform (20), and the optical sensor (42) can sense the edge orientation of the thinned substrate (100) within the detection range scoring (105) so that the sensor unit (40) can detect directional scoring (105) such as notches or flat edges of the thinned substrate (100) on the substrate platform (20) for the thinned substrate (105) 100) For inspection and/or for pre-alignment of process processing, and the optical sensor (42) can be arranged in the read head (41) through a moving mechanism (45), such as using a motor and a guide A set of slide rails for moving and positioning a screw, so that the optical sensor (42) can selectively move up and down relative to the thinned substrate (100), so as to adjust it to detect the directional notch ( 105) focal length;

藉此,使得薄化基板(100)能被基板平台(20)之第一接合板面(21)所生成的靜電場作用,而能讓該薄化基板(100)被有效平貼吸附於該基板平台(20)上,而組構成一可使薄化基板(100)被有效平整、且穩固定位之預對準裝置者,以提高薄化基板(100)於預對準時定向之檢測準確性及檢測效率。 Thereby, the thinned substrate (100) can be acted on by the electrostatic field generated by the first bonding plate surface (21) of the substrate platform (20), so that the thinned substrate (100) can be effectively flatly attached to the On the substrate platform (20), a pre-alignment device capable of effectively flattening and stably positioning the thinned substrate (100) is formed, so as to improve the detection accuracy of the orientation of the thinned substrate (100) during pre-alignment and detection efficiency.

而本創作之預對準裝置在執行一薄化基板(100) 的預對準程序時,則係如第6圖之流程架構所揭示,其執行步驟包含有提供一邊緣具定向刻痕之薄化基板(S11)、利用一抓取設備將上述薄化基板移入一預對準裝置中(S12)、由上述預對準裝置對上述薄化基板生成一靜電場(S13)、利用旋轉上述薄化基板來檢測上述定向刻痕執行定向(S14);以及透過上述抓取設備預先吸附上述薄化基板後釋放上述靜電場移出該薄化基板(S15),供利用檢測該薄化基板(100)邊緣之定向刻痕(105)進行該薄化基板(100)的定向; And the pre-alignment device of the present invention is performing a thinning of the substrate (100) During the pre-alignment process, as shown in the flow structure of FIG. 6, the execution steps include providing a thinned substrate with directional notches on the edge (S11), and using a grasping device to move the thinned substrate into the In a pre-alignment device (S12), an electrostatic field is generated on the thinned substrate by the pre-alignment device (S13), the alignment is performed by rotating the thinned substrate to detect the alignment marks (S14); The grasping device pre-adsorbs the thinned substrate and releases the electrostatic field to move out the thinned substrate (S15), so that the thinned substrate (100) can be cleaned by using the directional notch (105) detected on the edge of the thinned substrate (100). orientation;

至於本創作預對準方法之步驟詳細說明,則係如第6~10圖所揭示者,其中: As for the detailed description of the steps of this creative pre-alignment method, it is as disclosed in Figures 6 to 10, wherein:

步驟(S11)、提供一邊緣具定向刻痕之薄化基板:提供一欲進行檢查及/或製程處理之薄化基板(100),該薄化基板(100)邊緣具有至少一定向刻痕(105),以執行該薄化基板(100)預對準之定向程序; Step (S11), providing a thinned substrate with directional nicks on the edge: providing a thinned substrate (100) to be inspected and/or processed, the thinned substrate (100) with at least directional nicks ( 105) to perform an orientation procedure for pre-aligning the thinned substrate (100);

步驟(S12)、利用一抓取設備將上述薄化基板移入一預對準裝置中:使用一抓取設備如機械手臂〔Robot〕之一基板牙叉(60)吸附上述之薄化基板(100),且將該薄化基板(100)置放於該預對準裝置之基板平台(20)頂面上。根據某些實施例,如第7圖所示,該抓取設備在移入該薄化基板(100)放置於該基板平台(20)時,係利用該驅動單元(30)之升降驅動組(33)作動該基板平台(20)之頂料組(24)上升,且該抓取設備操控基板牙叉(60)將該薄化基板(100)置於該頂料組(24)之第二接合板面(25)上,並由該第二接合板面(25)生成靜電場吸附該薄化基板(100),且令該基板牙叉(60)釋放該薄化基板(100)後由其下方移出,使得該頂料組(24)可以下降將該薄化基板(100)放置於該基板 平台(20)之第一接合板面(21)表面。又根據某些實施例,該抓取設備在移入該薄化基板(100)放置於該基板平台(20)時,如該基板平台(20)具有牙叉開槽(28)時〔如第五圖所示〕,則該抓取設備操控基板牙叉(60)透過伸入該基板平台(20)之牙叉開槽(28)將該薄化基板(100)置於該基板平台(20)之第一接合板面(21)上,且令該基板牙叉(60)釋放該薄化基板(100)後由其下方之牙叉開槽(28)移出; Step (S12), using a grabbing device to move the above-mentioned thinned substrate into a pre-alignment device: using a grabbing device such as a substrate fork (60) of a robotic arm (Robot) to absorb the above-mentioned thinned substrate (100) ), and the thinned substrate (100) is placed on the top surface of the substrate platform (20) of the pre-alignment device. According to some embodiments, as shown in FIG. 7 , when moving the thinned substrate (100) into the substrate platform (20), the gripping device utilizes the lift drive group (33) of the drive unit (30). ) actuate the ejector group (24) of the substrate platform (20) to rise, and the gripping device operates the substrate fork (60) to place the thinned substrate (100) on the second joint of the ejector group (24) on the plate surface (25), and an electrostatic field is generated by the second bonding plate surface (25) to adsorb the thinned substrate (100), and the substrate fork (60) is released from the thinned substrate (100) Move out below, so that the top material group (24) can be lowered to place the thinned substrate (100) on the substrate The surface of the first joint plate surface (21) of the platform (20). Also according to some embodiments, when the gripping device is moved into the thinned substrate (100) and placed on the substrate platform (20), such as when the substrate platform (20) has a fork slot (28) (eg, fifth ], the grasping device controls the substrate fork (60) to place the thinned substrate (100) on the substrate platform (20) through the fork slot (28) extending into the substrate platform (20). on the first joint plate surface (21), and make the substrate fork (60) release the thinned substrate (100) and then move out from the fork slot (28) below it;

步驟(S13)、由上述預對準裝置對上述薄化基板生成一靜電場:當該薄化基板(100)置於該基板平台(20)之第一接合板面(21)頂面時,可以透過該靜電生成控制器作動該第一接合板面(21)內之電極(22)生成靜電場,如第8A圖所示,該靜電場可將該薄化基板(100)翹起之部份逐步下拉,使原本翹曲高度超過靜電場範圍之部份也會逐步進入靜電場範圍內,最終如第8B圖所示,該薄化基板(100)可以完全平貼於該第一接合板面(21)上表面,使該薄化基板(100)被穩固吸附於該基板平台(20)上,且該薄化基板(100)超出該基板平台(20)範圍之邊緣部份因受到內緣部份支撐亦能保持平整; Step (S13), generating an electrostatic field on the thinned substrate by the pre-alignment device: when the thinned substrate (100) is placed on the top surface of the first bonding plate surface (21) of the substrate platform (20), The electrode (22) in the first bonding plate surface (21) can be actuated by the electrostatic generation controller to generate an electrostatic field, as shown in Fig. 8A, the electrostatic field can lift the portion of the thinned substrate (100) The part is gradually pulled down, so that the part whose warped height exceeds the range of the electrostatic field will gradually enter the range of the electrostatic field. Finally, as shown in Fig. 8B, the thinned substrate (100) can be completely flat on the first bonding plate The upper surface of the surface (21) enables the thinned substrate (100) to be firmly adsorbed on the substrate platform (20), and the edge portion of the thinned substrate (100) beyond the range of the substrate platform (20) is subject to internal The edge part of the support can also be kept flat;

步驟(S14)、利用旋轉上述薄化基板來檢測上述定向刻痕執行定向:如第9圖所示,當該薄化基板(100)被平整吸附於該基板平台(20)之第一接合板面(21)後,可以選擇性利用移動該驅動單元(30)來依需求調整該基板平台(20)上的薄化基板(100),使該薄化基板(100)具定向刻痕(105)之邊緣進入該感測器單元(40)之讀取頭(41)光學感測器(42)範圍內,且進一步依需求調整該讀取頭(41)之光學感測器(42)高度,進而透過該驅動單元(30)之旋轉驅動組(31)轉動該 基板平台(20)帶動該薄化基板(100)同步旋轉,以利用該感測器單元(40)之光學感測器(42)檢測該薄化基板(100)之定向刻痕(105),而進行該薄化基板(100)之預對準定向;以及 In step (S14), the above-mentioned thinned substrate is rotated to detect the above-mentioned orientation nicks to perform orientation: as shown in FIG. After the surface (21) is removed, the drive unit (30) can be selectively moved to adjust the thinned substrate (100) on the substrate platform (20) as required, so that the thinned substrate (100) has directional nicks (105). ) into the range of the optical sensor (42) of the read head (41) of the sensor unit (40), and further adjust the height of the optical sensor (42) of the read head (41) as required , and then through the rotary drive group (31) of the drive unit (30) to rotate the The substrate platform (20) drives the thinned substrate (100) to rotate synchronously, so as to use the optical sensor (42) of the sensor unit (40) to detect the directional notch (105) of the thinned substrate (100), performing pre-alignment orientation of the thinned substrate (100); and

步驟(S15)、透過上述抓取設備預先吸附上述薄化基板後釋放上述靜電場移出該薄化基板:利用一抓取設備將上述薄化基板移入一預對準裝置中:於完成該薄化基板(100)預對準之定向後,可以使用前述抓取設備之基板牙叉(60)吸附該薄化基板(100),且將該薄化基板(100)移出用於檢查及/或用於製程處理。另根據某些實施例,如第10圖所示,該抓取設備在移出該薄化基板(100)時,係作動該基板平台(20)頂料組(24)之第二接合板面(25)生成靜電場吸附該薄化基板(100)〔如頂料組(24)第二接合板面(25)係低於該第一接合板面(21)時,則可令該頂料組(24)局部上升,使第一、二接合板面(21、25)呈同一平面〕,令該基板平台(20)之第一接合板面(21)消除靜電場,並由該驅動單元(30)之升降驅動組(33)作動伸桿(34)帶動該頂料組(24)將該薄化基板(100)上移,使該抓取設備之基板牙叉(60)可由該薄化基板(100)下方伸入吸附該薄化基板(100),令該基板牙叉(60)將該薄化基板(100)移出用於檢查及/或用於製程處理。再者根據某些實施例,當該基板平台(20)具有牙叉開槽(28)時,則該抓取設備操控基板牙叉(60)透過伸入該基板平台(20)之牙叉開槽(28)內吸附該薄化基板(100),之後令該基板平台(20)之第一接合板面(21)消除靜電場,使得該基板牙叉(60)可以移出該薄化基板(100)用於檢查及/或用於製程處理。 Step ( S15 ), pre-adsorbing the thinned substrate through the grabbing device, releasing the electrostatic field and removing the thinned substrate: using a grabbing device to move the thinned substrate into a pre-alignment device: after completing the thinning After the pre-aligned orientation of the substrate (100), the thinned substrate (100) can be adsorbed using the substrate fork (60) of the aforementioned gripping device, and the thinned substrate (100) can be removed for inspection and/or use. in the process. According to some embodiments, as shown in FIG. 10, when the gripping device removes the thinned substrate (100), the second bonding plate surface ( 25) Generate an electrostatic field to adsorb the thinned substrate (100) (for example, when the second bonding plate surface (25) of the top material group (24) is lower than the first bonding plate surface (21), the top material group can be made to (24) Partially rising, so that the first and second bonding plate surfaces (21, 25) are on the same plane], so that the first bonding plate surface (21) of the substrate platform (20) eliminates the electrostatic field, and the driving unit ( 30) The lift drive group (33) actuates the extension rod (34) to drive the top material group (24) to move the thinned substrate (100) upward, so that the substrate fork (60) of the grabbing device can be used by the thinned substrate (100). The substrate (100) extends into and absorbs the thinned substrate (100), so that the substrate fork (60) removes the thinned substrate (100) for inspection and/or for process processing. Furthermore, according to some embodiments, when the substrate platform (20) has fork slots (28), the grasping device manipulates the substrate forks (60) to open through the forks extending into the substrate platform (20). The thinned substrate (100) is adsorbed in the groove (28), and the electrostatic field is eliminated by the first bonding plate surface (21) of the substrate platform (20), so that the substrate fork (60) can be removed from the thinned substrate (21). 100) For inspection and/or for in-process processing.

經由上述之說明,本創作用於薄化基板之預對準裝置微影方法利用其基板平台(20)之第一接合板面(21)能依需求對應放置於其上之薄化基板(100)生成一靜電場,使該靜電場可將該薄化基板(100)翹起部份逐步向下拉平,令原本翹曲高度超過靜電場範圍之部份也會逐步進入靜電場範圍內,進而使該薄化基板(100)可以完全平貼於該第一接合板面(21)上表面、且被穩固吸附,以避免該薄化基板(100)於旋轉預對準時發生掉片的現象,進一步能提高該薄化基板(100)在執行預對準時的準確度,減少因無法預對針而發生重新檢測的次數,進而提高製程效率與良率。 Through the above description, the pre-alignment device lithography method used in the present invention for thinning the substrate utilizes the first bonding plate surface (21) of the substrate platform (20) to correspond to the thinned substrate (100) placed thereon as required. ) generates an electrostatic field, so that the electrostatic field can gradually pull down the warped part of the thinned substrate (100), so that the part whose warped height exceeds the range of the electrostatic field will gradually enter the range of the electrostatic field, and then so that the thinned substrate (100) can be completely flatly attached to the upper surface of the first bonding plate surface (21) and be firmly adsorbed, so as to prevent the thinned substrate (100) from falling off during pre-rotational alignment, The accuracy of the thinned substrate (100) when performing pre-alignment can be further improved, the number of re-inspections due to inability to pre-align the needles can be reduced, and the process efficiency and yield can be improved.

綜上所述,可以理解到本創作為一創意極佳之新型創作,除了有效解決習式者所面臨的問題,更大幅增進功效,且在相同的技術領域中未見相同或近似的產品創作或公開使用,同時具有功效的增進,故本創作已符合新型專利有關「新穎性」與「進步性」的要件,乃依法提出申請新型專利。 To sum up, it can be understood that this creation is a new type of creation with excellent creativity. In addition to effectively solving the problems faced by habitual practitioners, it also greatly improves the effect, and there is no identical or similar product creation in the same technical field. Or public use, and at the same time, it has the effect of improving, so this creation has met the requirements of "novelty" and "progressiveness" of the new patent, and it is proposed to apply for a new patent in accordance with the law.

100:薄化基板 100: Thinning the substrate

10:機座 10: base

20:基板平台 20: Substrate Platform

21:第一接合板面 21: The first joint board surface

22:電極 22: Electrodes

23:穿孔 23: Perforation

24:頂料組 24: Top material group

25:第二接合板面 25: Second joint board surface

30:驅動單元 30: Drive unit

31:旋轉驅動組 31: Rotary drive group

32:輸出軸 32: Output shaft

33:升降驅動組 33: Lifting drive group

34:伸桿 34: Extension rod

35:移動機構 35: Moving Mechanisms

40:感測器單元 40: Sensor unit

41:讀取頭 41: read head

42:光學感測器 42: Optical sensor

45:移動機構 45: Moving Mechanisms

Claims (9)

一種用於薄化基板之預對準裝置,供檢測一具定向刻痕之薄化基板執行定向,其至少包含有: A pre-alignment device for a thinned substrate for detecting a thinned substrate with an alignment notch to perform alignment, which at least comprises: 一機座; a machine base; 一基板平台,其係設於後述之驅動單元上,該基板平台頂面具有一供置放該薄化基板之第一接合板面,該第一接合板面內部具有可以被選擇性生成一靜電場之複數電極; A substrate stage, which is mounted on the drive unit described later, the top surface of the substrate stage has a first bonding plate surface for placing the thinned substrate, and a static electricity can be selectively generated inside the first bonding plate surface the plurality of electrodes of the field; 一驅動單元,其係設置於該機座內,且該驅動單元具有一旋轉驅動組,該旋轉驅動組具有一延伸通過該機座之輸出軸,而前述基板平台可被固定到該輸出軸端部,使得基板平台可被旋轉驅動組作動輸出軸旋轉同步帶動; A drive unit is disposed in the base, and the drive unit has a rotary drive group with an output shaft extending through the base, and the substrate platform can be fixed to the end of the output shaft part, so that the substrate platform can be driven synchronously by the rotation of the output shaft of the rotary drive group; 一感測器單元,其係設置於該機座上,該感測器單元具有一讀取頭,而該讀取頭具有面向基板平台上表面之光學感測器,且該光學感測器可在檢測範圍內感測該放置於基板平台之薄化基板的定向刻痕; A sensor unit is disposed on the base, the sensor unit has a read head, and the read head has an optical sensor facing the upper surface of the substrate platform, and the optical sensor can Sensing directional nicks of the thinned substrate placed on the substrate platform within the detection range; 藉此,使得薄化基板能被基板平台之第一接合板面所生成的靜電場作用,而能讓該薄化基板被有效平貼吸附於該基板平台上,以執行該薄化基板之定向。 In this way, the thinned substrate can be acted on by the electrostatic field generated by the first bonding surface of the substrate platform, so that the thinned substrate can be effectively flatly attached to the substrate platform, and the orientation of the thinned substrate can be performed. . 依請求項1所述之用於薄化基板之預對準裝置,其中該預對準裝置可以是一製程處理設備的一部。 The pre-alignment device for thinning a substrate according to claim 1, wherein the pre-alignment device can be part of a process equipment. 依請求項1所述之用於薄化基板之預對準裝置,其中該基板平台外徑小於該薄化基板定向刻痕之範圍、且大於該薄化基板直徑的三分之一,使該薄化基板被吸附時具定向刻痕之邊緣能被支撐呈平整狀。 The pre-alignment device for a thinned substrate according to claim 1, wherein the outer diameter of the substrate platform is smaller than the range of the orientation notch of the thinned substrate, and greater than one third of the diameter of the thinned substrate, so that the When the thinned substrate is adsorbed, the edge with the directional notch can be supported to be flat. 依請求項1所述之用於薄化基板之預對準裝置,其中該基板平台具有一被選擇性升降承接該薄化基板之頂料組。 The pre-alignment device for thinned substrates according to claim 1, wherein the substrate platform has a top material group that is selectively lifted and lifted to receive the thinned substrates. 依請求項4所述之用於薄化基板之預對準裝置,其中該頂料組可以是位於基板平台軸心形成有一貫穿該第一接合板面之穿孔,且該可被選擇性升降之頂料組設於該穿孔內,而該驅動單元進一步包含有一升降驅動組,該升降驅動組具有一延伸通過該基板平台穿孔之伸桿,而該頂料組可被固定到該伸桿端部,使得該頂料組可被升降驅動組作動上、下升降位移供接收該薄化基板放置於該第一接合板面上。 The pre-alignment device for thinning a substrate according to claim 4, wherein the top material group can be located at the axis of the substrate platform to form a through hole through the first joint surface, and the top material can be selectively lifted and lowered. The ejector group is arranged in the through hole, and the driving unit further includes a lift drive group, the lift drive group has an extension rod extending through the through hole of the base plate platform, and the ejector group can be fixed to the end of the extension rod , so that the top material group can be moved up and down by the lift drive group to move up and down to receive the thinned substrate and place it on the first bonding plate. 依請求項5所述之用於薄化基板之預對準裝置,其中該頂料組之頂面具有一可被選擇性生成一靜電場之第二接合板面。 The pre-alignment device for thinning a substrate according to claim 5, wherein the top surface of the top material group has a second bonding plate surface capable of selectively generating an electrostatic field. 依請求項1所述之用於薄化基板之預對準裝置,其中該基板平台於相對軸心兩側分別形成有一相對邊緣開口之牙叉開槽,可供一基板抓取設備之一基板牙叉伸入。 The pre-alignment device for thinning a substrate according to claim 1, wherein the substrate platform is respectively formed with a fork slot with opposite edge openings on both sides of the opposite axis, which can be used for a substrate of a substrate grasping device Forks stick in. 依請求項1所述之用於薄化基板之預對準裝置,其中該驅動單元可以透過一移動機構設置於該機座上,使得該驅動單元被允許相對該感測器單元呈X軸、Y軸、Z軸或其組合之選擇性位移。 The pre-alignment device for thinning a substrate according to claim 1, wherein the driving unit can be set on the base through a moving mechanism, so that the driving unit is allowed to be X-axis relative to the sensor unit, Selective displacement of Y-axis, Z-axis, or a combination thereof. 一種用於薄化基板之預對準裝置,供檢測一具定向刻痕之薄化基板執行定向,其具有一機座,且該機座上設有被允許選擇性相對位移之一驅動單元及一感測器單元,其該驅動單元具有延伸通過該機座、且被旋轉之一輸出軸,而該輸出軸上設有一被用於放置該薄化基板之基板 平台,該基板平台可以被選擇性生成一吸附該薄化基板之靜電場,又該感測器單元可在檢測範圍內檢知該放置於基板平台之薄化基板的定向刻痕,以執行該薄化基板預對準之定向。 A pre-alignment device for a thinned substrate, for detecting a thinned substrate with an orientation notch to perform orientation, has a base, and the base is provided with a drive unit that is allowed to selectively relative displacement and a sensor unit, the drive unit has an output shaft extending through the base and rotated, and the output shaft is provided with a substrate for placing the thinned substrate A platform, the substrate platform can be selectively generated an electrostatic field that attracts the thinned substrate, and the sensor unit can detect the directional notch of the thinned substrate placed on the substrate platform within the detection range, so as to execute the Orientation for thinning substrate pre-alignment.
TW111200650U 2022-01-18 2022-01-18 Pre-alignment device for thin substrate TWM629742U (en)

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