TW202347581A - Semiconductor component or electronic component batch transfer device for achieving the effect of batch transfer and accurately adjusting and pressing the transfer plate on the substrate to be transferred - Google Patents
Semiconductor component or electronic component batch transfer device for achieving the effect of batch transfer and accurately adjusting and pressing the transfer plate on the substrate to be transferred Download PDFInfo
- Publication number
- TW202347581A TW202347581A TW112114844A TW112114844A TW202347581A TW 202347581 A TW202347581 A TW 202347581A TW 112114844 A TW112114844 A TW 112114844A TW 112114844 A TW112114844 A TW 112114844A TW 202347581 A TW202347581 A TW 202347581A
- Authority
- TW
- Taiwan
- Prior art keywords
- platform
- transfer
- transferred
- substrate
- pressing plate
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 27
- 238000003825 pressing Methods 0.000 title claims description 74
- 239000000758 substrate Substances 0.000 title claims description 62
- 230000000694 effects Effects 0.000 title description 5
- 239000000463 material Substances 0.000 claims description 57
- 238000001179 sorption measurement Methods 0.000 claims description 54
- 238000003466 welding Methods 0.000 claims description 40
- 238000000605 extraction Methods 0.000 claims description 27
- 230000003287 optical effect Effects 0.000 claims description 24
- 239000011159 matrix material Substances 0.000 claims description 9
- 230000006835 compression Effects 0.000 abstract 4
- 238000007906 compression Methods 0.000 abstract 4
- 238000010586 diagram Methods 0.000 description 12
- 238000005516 engineering process Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 238000009434 installation Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000003463 adsorbent Substances 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 230000003044 adaptive effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F16/00—Transfer printing apparatus
- B41F16/0006—Transfer printing apparatus for printing from an inked or preprinted foil or band
- B41F16/0073—Transfer printing apparatus for printing from an inked or preprinted foil or band with means for printing on specific materials or products
- B41F16/008—Transfer printing apparatus for printing from an inked or preprinted foil or band with means for printing on specific materials or products for printing on three-dimensional articles
- B41F16/0086—Transfer printing apparatus for printing from an inked or preprinted foil or band with means for printing on specific materials or products for printing on three-dimensional articles for printing on articles with cylindrical surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
- B41P2217/00—Printing machines of special types or for particular purposes
- B41P2217/50—Printing presses for particular purposes
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Led Device Packages (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
本發明係與微發光二極體的移轉技術有關,特別是指在移轉過程中將移轉料板平整壓制於待移轉基板並加以焊接的一種半導體元件或電子元件批量移轉裝置。The present invention relates to the transfer technology of micro-light emitting diodes, and particularly refers to a batch transfer device of semiconductor components or electronic components that flatly presses the transfer material plate onto the substrate to be transferred and welds it during the transfer process.
微發光二極體顯示器(Micro LED Display),是繼液晶顯示器以及有機發光二極體顯示器之後,在顯示器產業所積極發展的下一代顯示器,其主要是將一微米(μm) 至100微米大小的LED晶片直接做為顯示發光點的一種顯示器。Micro LED Display (Micro LED Display) is the next generation display actively developed in the display industry after liquid crystal display and organic light emitting diode display. It mainly combines 1 micron (μm) to 100 micron in size. The LED chip is directly used as a display to display the luminous point.
我國公告第201929265號專利,揭露了一種具有氣孔的多孔性部件的轉移頭,而藉由負壓吸引的方式來轉移微發光二極體。此案的專利說明書在先前技術中揭露了多種將微發光二極體置移轉至面板的技術,然而,先前技術大多是在移轉過程可能對微發光二極體造成損壞,或是使用膠來黏合,在移轉的造技術上仍不夠成熟。my country's patent announcement No. 201929265 discloses a transfer head of a porous component with pores, which transfers micro-light emitting diodes through negative pressure suction. The patent specification in this case disclosed a variety of techniques for transferring micro-light-emitting diodes to panels in the prior art. However, most of the prior art technologies may cause damage to the micro-light-emitting diodes during the transfer process, or use glue. For bonding, the transfer manufacturing technology is still not mature enough.
本發明之主要目的即在於提出一種半導體元件或電子元件批量移轉裝置,其將具有複數微發光二極體的一移轉料板壓抵在待移轉基板上,藉以在壓抵的過程進行光學焊接,進而可藉由壓抵並焊接的技術來達到批量移轉的效果。The main purpose of the present invention is to provide a batch transfer device for semiconductor components or electronic components, which presses a transfer material plate with a plurality of micro-light emitting diodes against the substrate to be transferred, thereby performing the pressing process. Optical welding can achieve batch transfer effects through pressing and welding technology.
本發明之再一目的即在於提出一種半導體元件或電子元件批量移轉裝置,其可準確調整移轉料板來使其完整壓制於待移轉基板。Another object of the present invention is to provide a batch transfer device for semiconductor components or electronic components, which can accurately adjust the transfer material plate to completely press it on the substrate to be transferred.
為了達成上述目的,本發明提出一種半導體元件或電子元件批量移轉裝置,包含有:一基座;一下移載平台,具有X方向、Y方向的移動能力以及θ方向的旋轉能力,而設於該基座,該下移載平台具有一鏤空部位;一承台,設於該下移載平台且位於該鏤空部位上方,且該承台的上表面具有向下凹設的一承台抽氣構造,該承台係用以承載一待移轉基板,該承台抽氣構造係在連接一抽氣源後,在抽氣時將該待移轉基板吸附於該承台;一料盤暫置台,直接或間接設於該基座,該料盤暫置台表面具有複數容置槽,用以置放複數移轉料板,各該移轉料板均呈矩形且於底部設有複數待移轉元件而呈矩陣排列;一上移載平台,具有X方向、Y方向的移動能力以及θ方向的旋轉能力,而設於該基座,且位置高於該下移載平台;一壓制單元,具有至少一升降驅動裝置以及設於該至少一升降驅動裝置的一壓制板,該至少一升降驅動裝置設於該上移載平台,該壓制板係位於該至少一升降驅動裝置的下方受驅動而升降;一吸附件,設於該壓制板底部,該吸附件具有朝下的一壓制面,該吸附件用以藉由負壓吸引的方式吸附/釋放一該移轉料板;以及至少一料板攝影機,直接或間接設於該基座,用以對吸附於該吸附件的一該移轉料板取像;其中,該承台或該壓制板與該吸附件的組合這二者其中至少有一者呈透明或局部鏤空而可供預定光線穿透。In order to achieve the above object, the present invention proposes a semiconductor component or electronic component batch transfer device, which includes: a base; a lower transfer platform with movement capabilities in the X direction, Y direction and rotation capability in the θ direction, and is located on The base, the lower transfer platform has a hollow part; a support platform is provided on the lower transfer platform and is located above the hollow part, and the upper surface of the support platform has a support platform that is recessed downward for air extraction. Structure, the platform is used to carry a substrate to be transferred, and the platform air extraction structure is connected to an air extraction source to adsorb the substrate to be transferred to the platform during air extraction; a material tray temporarily The temporary storage platform is provided directly or indirectly on the base. The surface of the temporary storage platform has a plurality of receiving slots for placing a plurality of transfer plates. Each of the transfer plates is rectangular and has a plurality of waiting plates at the bottom. The components are rotated and arranged in a matrix; an upper transfer platform has the ability to move in the X direction and the Y direction and the rotation ability in the θ direction, and is located on the base and is positioned higher than the lower transfer platform; a pressing unit, It has at least one lifting drive device and a pressing plate provided on the at least one lifting driving device. The at least one lifting driving device is provided on the upper transfer platform. The pressing plate is driven below the at least one lifting driving device. Lifting; an adsorption member located at the bottom of the pressing plate. The adsorption member has a downward pressing surface. The adsorption member is used to adsorb/release a transfer material plate through negative pressure suction; and at least one material A plate camera is provided directly or indirectly on the base for taking images of a transfer plate adsorbed on the adsorbent part; wherein at least one of the platform or the combination of the pressing plate and the adsorbent part is It is transparent or partially hollow to allow predetermined light to penetrate.
由上可知,本發明藉由壓抵並焊接的方式,將具有複數微發光二極體的一移轉料板壓抵在待移轉基板上,並在壓抵的過程進行光學焊接,進而可藉由移轉的技術來達到批量移轉的效果。此外,本發明在壓抵時,可準確調整移轉料板來使其完整壓制於待移轉基板。It can be seen from the above that the present invention presses a transfer material plate with a plurality of micro-light emitting diodes against the substrate to be transferred by pressing and welding, and performs optical welding during the pressing process, thereby enabling The effect of batch transfer is achieved through transfer technology. In addition, when pressing, the present invention can accurately adjust the transfer plate to completely press it on the substrate to be transferred.
為了詳細說明本發明之技術特點所在,茲舉以下之較佳實施例並配合圖式說明如後,其中:In order to explain in detail the technical characteristics of the present invention, the following preferred embodiments are cited and described with reference to the drawings, wherein:
如圖1至圖10所示,本發明第一較佳實施例提出一種半導體元件或電子元件批量移轉裝置10,主要由一基座11、一下移載平台21、一承台28、一料盤暫置台29,一上移載平台31、一壓制單元41、一吸附件51、複數測距裝置61以及二料板攝影機71所組成,其中:As shown in Figures 1 to 10, the first preferred embodiment of the present invention proposes a
該下移載平台21,具有一台座211、一X軸驅動滑軌212、一Y軸驅動滑軌213、一旋轉馬達214以及一旋轉平台215,而具有X方向、Y方向的移動能力,以及具有θ方向的旋轉能力。該下移載平台21設於該基座11,且該下移載平台21具有一鏤空部位22。由於X方向、Y方向及θ方向的移動旋轉機構(例如直驅馬達)已是公知技術,而可以為本領域技術人員直接理解,因此其詳細結構及組裝方式容不贅述。The
該承台28,設於該下移載平台21且位於該鏤空部位22上方,該承台28的上表面具有一承台抽氣構造281,用以與一抽氣源(圖中未示)連接,該承台28係用以承載一待移轉基板99,該待移轉基板99於本實施例中係以一微發光二極體(Micro LED)面板為例。於本第一實施例中,該承台抽氣構造281乃設置為溝狀,但在其他實施狀態中,亦可改設置為多孔的形態,該承台抽氣構造281在連接一抽氣源(圖中未示)後,在抽氣時將該待移轉基板99吸附於該承台281。於本第一實施例中,該承台281係為透明而可供預定光線穿透,例如雷射光或其他光線。The
該料盤暫置台29,設於該下移載平台21,而呈間接設置於該基座11的狀態,且該料盤暫置台29表面具有複數容置槽291,用以置放複數移轉料板91,各該移轉料板91均呈矩形且於底部設有複數待移轉元件(圖中未示)而呈矩陣排列,於本第一實施例中係以微發光二極體為例,其中,因為微發光二極體極為微小,難以用圖式表示出來,且這樣的結構為本領域技術人員所熟知,因此容不以圖式表示之。在其他種實施狀態中,該料盤暫置台29亦可以直接設置於該基座11,亦即,並不以設置於該下移載平台21為限制,由於這種設置方式可直接為本領域技術人員直接理解,因此容不以圖式表示之。The material tray
該上移載平台31,具有一台座311、一X軸驅動滑軌312、一Y軸驅動滑軌313、一旋轉馬達314以及一旋轉平台315,而具有X方向、Y方向的移動能力以及θ方向的旋轉能力。該上移載平台31設於該基座11,且位置高於該下移載平台21。The
該壓制單元41,具有三升降驅動裝置42以及設於該三升降驅動裝置42的一壓制板44,該三升降驅動裝置42設於該上移載平台31,該三升降驅動裝置42實務上以等角分佈較佳,因為這樣可以方便後續計算及調整壓力及角度。該三升降驅動裝置42隨著該上移載平台31移動及旋轉,該壓制板44係位於該三升降驅動裝置42的下方受驅動而升降。在實際實施時,該三升降驅動裝置42可以選用伺服馬達,並且各具有一驅動桿421,該壓制板44可以選擇為等角三角形板,而以三個角分別設置於該三升降驅動裝置42的驅動桿421底端。此外,在各該驅動桿421上均設有一力量感測器422,各該力量感測器422用以分別感測該壓制板44回饋至各該驅動桿421的力量。The
該吸附件51,設於該壓制板44底部,該吸附件51具有朝下的一壓制面52,該吸附件51用以藉由負壓吸引的方式吸附/釋放一該移轉料板91。在本第一實施例中,該吸附件51係呈四方形板狀,而於底面形成一吸附件抽氣構造521,於本第一實施例中係以溝槽為例,但亦可設設置為多孔的形態,該吸附件抽氣構造521係用以連接於該抽氣源(圖中未示),用以利用負壓吸引的方式對一該移轉料板91吸附。該吸附件51係貼接於該壓制板44底面,且該吸附件51的邊緣不超出該壓制板44的邊緣,此外,該吸附件51與該壓制板44設有貫穿二者且位於對角的二觀察孔54。由於該吸附件51可以由金屬製造而呈不透明狀,也可以由玻璃製造而呈透明狀,因此,當該吸附件51為不透明時,則該二觀察孔54即可貫穿該壓制板44及該吸附件51,當該吸附件51為透明時,則該二觀察孔54僅需貫穿該壓制板44即可。The
該複數測距裝置61,設於該壓制板44而朝下,而呈間接設置於該基座11的狀態,該複數測距裝置61有部分位於該壓制板44底部但不低於該吸附件51底端。於本第一實施例中,該三升降驅動裝置42的驅動桿421所圍合的中心即為該壓制板44的中心,而由這個中心至各該驅動桿421的路徑上則沿著該壓制板44來分別定義一虛擬連線VL,為了表示上的方便,在圖15中僅以一條虛擬連線VL表示之。該複數測距裝置61之數量係為三個且分別位於該三虛擬連線VL上,且該複數測距裝置61係穿過該壓制板44但不穿過該吸附件51,而位於該吸附件51旁邊。在其他實施狀態中,該複數測距裝置61也可以直接設置在該基座11,而並不以設置於該壓制板44為限制,由於這種設置方式可直接為本領域技術人員直接理解,因此容不以圖式表示之。再者,在該吸附件51為透明的情況下,該複數測距裝置61也可以設置為穿過該壓制板44但不穿過該吸附件51,而位於該吸附件51上方。又或者,也可以在該吸附件51為不透明的情況下,於該吸附件51設置穿孔,藉以供該複數測距裝置61的測距信號通過來進行測距。此外,即使不設置該複數測距裝置61,在沒有量測距離的功能下,只要先將整體機台調校好,就可以藉由預先設定好的距離參數來直接操作,只是這樣就較不能即時測距來即時調整了,因此,設置該複數測距裝置61可增加整體機台操作的方便性及效率。The plurality of
該二料板攝影機71,設於該基座11且向下取像,該二料板攝影機71係對吸附於該吸附件51上的一該移轉料板91取像,該移轉料板91具有二定位特徵,該二定位特徵可以是額外設置的定位標記,也可以是該移轉料板91本身的兩對角輪廓,也可以是該移轉料板91底部的該複數待移轉元件的矩陣角落。於本第一實施例中,該二料板攝影機71由上往下係經由該二觀察孔54來對被吸附於該吸附件51的該移轉料板91底部的該複數待移轉元件的矩陣角落進行取像。該二料板攝影機71在數量上也可以只使用一個,而另外再配合一個XY平台(圖中未示)來移動,而可以分別對準該移轉料板91底部的該複數待移轉元件的矩陣角落取像,這種利用XY平台來移動的技術已是公知技術,因此容不再以圖式表示之。The two-
上述結構可配合一光學焊接裝置81來設置,該光學焊接裝置81可以發射雷射光或紫外線或其他已知可用來焊接的高能量光,在本第一實施例中以發射雷射光為例,在實務上可將該光學焊接裝置81設於該基座11,且位於該下移載平台21下方,在焊接時係由下往上發射雷射光,雷射光穿過該鏤空部位22以及穿透該承台28,藉以對該待移轉基板99底部的該複數待移轉元件進行焊接。The above structure can be configured with an
此外,在本第一實施例中,為了該待移轉基板99的定位,可以在該待移轉基板99上設置位於二對角位置的二定位標記(圖中未示),其中,由於定位標記在面板或電路板的相關領域為公知技術,且非本案之申請重點,因此容不以圖式表示之。此外,本第一實施例中,還在該基座11上設置二基板攝影機88,該二基板攝影機88係位於該上移載平台31的一側,而該下移載平台21可以自該上移載平台31下方移動至該二基板攝影機88下方之可取像位置,藉以供該二基板攝影機88向下對該二定位標記進行取像,藉以進行後續定位。類同前述,該二基板攝影機88也可以位於下方而向上取像,其安裝位置並不限制。In addition, in the first embodiment, in order to position the
又,如圖11所示,在其他種實施狀況中,該二料板攝影機71’也可設置於該光學焊接裝置81’而向上取像,而呈間接設置於該基座11’的狀態,此時,該二料板攝影機71’即位於該承台28’的下方,而仍可藉由該上移載平台31’移動來使該吸附件51’位於該二料板攝影機71’上方。Furthermore, as shown in Figure 11, in other implementation situations, the two-material board camera 71' can also be disposed on the optical welding device 81' to capture images upward, and be in a state of being indirectly disposed on the base 11'. At this time, the two-material board camera 71' is located below the
以上說明了本第一實施例的結構,接下來說明本第一實施例的操作狀態。The structure of the first embodiment has been described above. Next, the operation state of the first embodiment will be described.
如圖12所示,在操作前,係先將一待移轉基板99置於該承台28上,並將該承台抽氣構造281連接該抽氣源(圖中未示),藉此將該待移轉基板99吸附於該承台28而固定住。此外,再於該料盤暫置台29上置入複數移轉料板91,而各該移轉料板91底面都設有複數微發光二極體(圖中未示)。As shown in Figure 12, before operation, a
如圖13及圖15所示,在操作時,可以電腦或控制器(圖中未示)來執行下述操作。首先使該下移載平台21移動,而使該料盤暫置台29位於該吸附件51下方,並操作該壓制單元41來使該吸附件51升降而吸起一該移轉料板91,此時,該移轉料板91底部的該複數待移轉元件的矩陣角落剛好位於該二觀察孔54所涵蓋的範圍內。而若該料盤暫置台29設於該基座11時,則就使該上移載平台31移動至該料盤暫置台29上方即可。As shown in Figures 13 and 15, during operation, a computer or controller (not shown) can perform the following operations. First, the
如圖15及圖16所示,接著,移動該下移載平台21使該承台28位於該二基板攝影機88下方藉以進行取像,並依據所取得的影像來調整該下移載平台21的X方向以及Y方向的位置,並調整旋轉角度來使該待移轉基板99定位準確。在前述定位該待移轉基板99的過程的同時,也藉由該二基板攝影機88經由該二觀察孔54來對吸附於該吸附件51的該移轉料板91底部的該複數待移轉元件的矩陣角落取像,藉以判斷該移轉料板91的位置及角度是否有誤差,並根據這個判斷結果來調整該上移載平台31的X方向以及Y方向的位置,並調整旋轉角度來使該移轉料板91旋轉至正確位置。旋轉時,係藉由該上移載平台31將整個壓制單元41連同該壓制板44以及該吸附件51一起旋轉。As shown in Figures 15 and 16, the
接下來,如圖17及圖18所示,在保持前述定位結果的前提下,移動該下移載平台21至該上移載平台31的下方,再使該吸附件51下降來使該移轉料板91壓抵於該待移轉基板99的預定位置上,此時該吸附件的壓制面52即壓抵於該移轉料板91。在下降的過程中,同時以該三測距裝置61來測量該壓制板44與該待移轉基板99之間的距離,而在該移轉料板91壓抵於該待移轉基板99後,即依據該三測距裝置61所測得的結果來分別調整各該升降驅動裝置42,進而調整該壓制板44的水平狀態,該三驅動桿421等角分佈的架構可以方便計算壓制力量及該壓制板44的角度以便於調整,藉此可以調整該移轉料板91完整貼抵於該待移轉基板99。而由於該移轉料板91的底面設置了複數微發光二極體,因此實際上即是該移轉料板91的複數微發光二極體抵接於該待移轉基板99。此外,在前述的壓抵狀態下,該三驅動桿421上的該三力量感測器422也會感測到該移轉料板91經由該吸附件51回饋至該壓制板44的力量,這個回饋的力量數值也可以用來調整該三升降驅動裝置42來調整該壓制板44的下壓行程,進而調整下壓力量。Next, as shown in FIGS. 17 and 18 , on the premise of maintaining the aforementioned positioning results, move the
如圖17參考圖3及圖6所示,操作該光學焊接裝置81來對該複數微發光二極體(即該複數待移轉元件)照射雷射光來進行焊接,雷射光係穿過該鏤空部位22以及穿透該承台28,並穿透該待移轉基板99來進行焊接,在焊接完成後升起該吸附件51而使得該移轉料板91隨之升起,該移轉料板91上的複數微發光二極體即因前述焊接動作而留在該待移轉基板99上。在本第一實施例中,該移轉料板91上的複數微發光二極體均為發出相同色光者,例如,均為發紅光之複數微發光二極體,或均為綠光或均為藍光者,因此,基於該待移轉基板99上的一個像素至少是由三個色光(即紅、綠及藍)所組成,在實際焊接時,是不會一次性將該移轉料板91上的所有微發光二極體都焊接在該待移轉基板99上的,而是僅焊接部分數量的複數微發光二極體至該待移轉基板99,例如,在每一個像素位置僅焊接一個微發光二極體,因此在該移轉料板91上還留存有部分的複數微發光二極體。As shown in Figure 17 with reference to Figures 3 and 6, the
接著,移動該下移載平台21來移動該待移轉基板99至新的待焊接位置,再下降該吸附件51,藉以使前述還存留有剩餘的複數微發光二極體的該移轉料板91壓抵於該待移轉基板99上需要焊接的位置,再依前述動作以該光學焊接裝置81來進行焊接。如此不斷重覆前述的該吸附件51升降及焊接動作直到該移轉料板91上的所有應該被焊接的複數微發光二極體都焊接至該待移轉基板99。Then, the
如圖13及圖14所示,移動該下移載平台21來使該料盤暫置台29位於該吸附件51下方,該吸附件51即下降來將剛才焊接完的該移轉料板91置回該料盤暫置台29,並再移動來吸起另一未使用過的移轉料板91,再重覆進行前述焊接動作。As shown in Figures 13 and 14, the
由於一個移轉料板91的面積是小於該待移轉基板99的面積的,因此前述的步驟可以重覆多次,藉以將多個移轉料板91上的不同色光的複數微發光二極體藉由光學焊接的方式移轉並焊接至該待移轉基板99上的各個位置,進而完成一個完整的微發光二極體面板。Since the area of a
由上可知,本發明是以壓抵的方式來將具有複數微發光二極體的一移轉料板91壓抵在待移轉基板99上,藉以在壓抵的過程進行光學焊接,進而可完成移轉。而由於一個移轉料板91上的複數微發光二極體的數量可能就高達一百萬個,而實務上的光學焊接技術對於這一百萬個微發光二極體的焊接而言,可能在一次焊接動作中僅需要焊接其上的數萬個微發光二極體而已,而實際上以該光學焊接裝置81對這數萬個微發光二極體進行焊接時僅耗時不到一秒鐘,因此,本發明確定可以達到批量移轉的功效。It can be seen from the above that the present invention presses a
此外,藉由該複數測距裝置61來配合調整該三升降驅動裝置42,可使得該壓制板44的水平傾斜角度得以調整,進而使該移轉料板91準確的貼合該待移轉基板99的表面。In addition, by adjusting the three-
由前述可知,本發明之技術重點在於該壓制板44的準確而完整的壓制效果。至於該光學焊接裝置81,則可以視需要而整合於同一個機台或設置於生產線的下一個工作站來進行焊接。此外,關於該待移轉基板99的定位機制,也可以視需要而整合於同一個機台或以另外的已知定位手段處理。As can be seen from the foregoing, the technical focus of the present invention lies in the accurate and complete pressing effect of the
而再由前述內容中,該料盤暫置台29的設置位置、該二料板攝影機71的設置位置、該二基板攝影機88的設置位置、以及該複數測距裝置61的設置位置的說明可知,這四個元件的設置位置均可以視需要來調整,而並不以其中某一個設置位置為限制,亦即其中一種設置位置不能用來限縮本案之專利範圍。From the foregoing description, it can be seen that the installation positions of the material tray
如圖19至圖22所示,本發明第二較佳實施例提出一種半導體元件或電子元件批量移轉裝置10’’,主要概同於前揭第一實施例,不同之處在於:As shown in Figures 19 to 22, the second preferred embodiment of the present invention provides a semiconductor component or electronic component batch transfer device 10'', which is mainly similar to the first embodiment mentioned above, except that:
該光學焊接裝置81’’不是如同第一實施例的位於下移載平台下方,而是設於該基座11’’而位於該下移載平台21’’上方,該吸附件51’’係為透明,而該壓制板44’’則可視情況設置為透明或鏤空穿孔來讓雷射光通過,該光學焊接裝置81’’係發射雷射光向下通過過該壓制板44’’並穿透該吸附件51’’而照射於該待移轉基板(圖中未示),藉以對該待移轉基板(圖中未示)進行焊接。The optical welding device 81'' is not located below the lower transfer platform like the first embodiment, but is located on the base 11'' and above the lower transfer platform 21''. The adsorption member 51'' is is transparent, and the pressing plate 44'' can be set to be transparent or hollowed out to allow laser light to pass through. The optical welding device 81'' emits laser light downward through the pressing plate 44'' and penetrates the The adsorbing member 51'' irradiates the substrate to be transferred (not shown in the figure), thereby welding the substrate to be transferred (not shown in the figure).
在圖中可見,由於該光學焊接裝置81’’位於上方而向下照射,且雷射光必須穿過該壓制板44’’及該吸附件51’’,因此該吸附件51’’的底面所設置的吸附件抽氣構造521’’就必須設置在該吸附件51’’的邊緣,以避開雷射光的照射區域,進而避免對雷射光造成干擾。As can be seen in the figure, since the optical welding device 81'' is located above and illuminates downward, and the laser light must pass through the pressing plate 44'' and the adsorption part 51'', the bottom surface of the adsorption part 51'' is The air extraction structure 521'' of the adsorbing part must be arranged at the edge of the adsorbing part 51'' to avoid the irradiation area of the laser light and thereby avoid interference with the laser light.
本第二實施例的其餘結構及所能達成的功效均概同於前揭第一實施例,容不再予贅述。The remaining structures and achievable functions of the second embodiment are the same as those of the first embodiment and will not be described again.
如圖23所示,本發明第三較佳實施例提出一種半導體元件或電子元件批量移轉裝置10’’’,主要概同於前揭第一實施例,不同之處在於:As shown in Figure 23, the third preferred embodiment of the present invention provides a semiconductor component or electronic component batch transfer device 10''', which is mainly similar to the first embodiment mentioned above, except that:
在本第三實施例中不使用三個升降驅動裝置,而僅使用一個升降驅動裝置42’’’,該壓制板44’’係藉由一萬向球頭45’’’以可擺頭的方式設置於該升降驅動裝置42’’’的驅動桿421’’’。In this third embodiment, instead of using three lifting driving devices, only one lifting driving device 42''' is used. The pressing plate 44'' is swingable through a universal ball head 45'''. The driving rod 421'''' is provided on the lifting driving device 42''''.
本第三實施例在使用時,可在該壓制板44’’’將該移轉料板(圖中未示)壓抵於該待移轉基板(圖中未示)時,藉由該萬向球頭45’’’的自適應角度特性來使該移轉料板(圖中未示)完整的壓抵於該待移轉基板(圖中未示)。When the third embodiment is in use, when the pressing plate 44'''' presses the transfer plate (not shown in the figure) against the substrate to be transferred (not shown in the figure), through the The adaptive angle characteristics of the ball head 45'''' are used to completely press the transfer plate (not shown in the figure) against the substrate to be transferred (not shown in the figure).
本第三實施例的其餘結構及所能達成的功效均概同於前揭第一實施例,容不再予贅述。The remaining structures and achievable functions of the third embodiment are the same as those of the first embodiment, and will not be described again.
須補充說明的是,本發明雖以微發光二極體(Micro LED)的批量移轉為例來說明,但本發明之技術並不僅限於此,其他小型電子或光學元件的批量移轉需求,例如電晶體或光學偵測元件的批量移轉,本發明之技術亦可適用之。It should be added that although the present invention takes the batch transfer of micro light-emitting diodes (Micro LEDs) as an example, the technology of the present invention is not limited to this. The need for batch transfer of other small electronic or optical components can be met. For example, the technology of the present invention can also be applied to the batch transfer of transistors or optical detection components.
10:半導體元件或電子元件批量移轉裝置 11:基座 21:下移載平台 211:台座 212:X軸驅動滑軌 213:Y軸驅動滑軌 214:旋轉馬達 215:旋轉平台 22:鏤空部位 28:承台 281:承台抽氣構造 29:料盤暫置台 291:容置槽 31:上移載平台 311:台座 312:X軸驅動滑軌 313:Y軸驅動滑軌 314:旋轉馬達 315:旋轉平台 41:壓制單元 42:升降驅動裝置 421:驅動桿 422:力量感測器 44:壓制板 51:吸附件 52:壓制面 521:吸附件抽氣構造 54:觀察孔 61:測距裝置 71:料板攝影機 81:光學焊接裝置 88:基板攝影機 91:移轉料板 99:待移轉基板 VL:虛擬連線 11’:基座 28’:承台 31’:上移載平台 51’:吸附件 71’:料板攝影機 81’:光學焊接裝置 10’’:半導體元件或電子元件批量移轉裝置 11’’:基座 21’’:下移載平台 44’’:壓制板 51’’:吸附件 521’’:吸附件抽氣構造 81’’:光學焊接裝置 10’’’:半導體元件或電子元件批量移轉裝置 42’’’:升降驅動裝置 421’’’:驅動桿 44’’’:壓制板 45’’’:萬向球頭 10: Semiconductor component or electronic component batch transfer device 11: base 21: Download platform 211:pedestal 212:X-axis drive slide rail 213:Y-axis drive slide rail 214: Rotary motor 215: Rotating platform 22: Hollow parts 28: Platform 281: Platform air extraction structure 29: Temporary setting table for material tray 291: Accommodation tank 31: Uploading platform 311:pedestal 312:X-axis drive slide rail 313: Y-axis drive slide rail 314: Rotary motor 315: Rotating platform 41: Suppression unit 42:Lifting drive device 421:Driving rod 422: Force sensor 44: Pressed board 51: Adsorption parts 52: Pressed surface 521: Air extraction structure of adsorption parts 54: Observation hole 61: Distance measuring device 71: Sheet camera 81: Optical welding device 88:Substrate camera 91:Transfer board 99:Substrate to be transferred VL: virtual link 11’: base 28’: platform 31’: Upper transfer platform 51’: Adsorption piece 71’: Sheet camera 81’: Optical welding device 10’’: Semiconductor component or electronic component batch transfer device 11’’: base 21’’: Download platform 44’’: pressed board 51’’: Adsorption piece 521’’: Air extraction structure of adsorption parts 81’’: Optical welding device 10’’’: Semiconductor component or electronic component batch transfer device 42’’’:Lifting drive device 421''': drive rod 44’’’: Pressed board 45’’’:Universal ball head
圖1係本發明第一較佳實施例之立體圖。 圖2係本發明第一較佳實施例之側視圖。 圖3係本發明第一較佳實施例之部分元件側視圖,顯示移除部分的基座後的狀態。 圖4係本發明第一較佳實施例之部分元件立體圖,顯示下移載平台與基座的結構。 圖5係本發明第一較佳實施例之部分元件示意圖,顯示承台。 圖6係本發明第一較佳實施例之部分元件俯視圖,顯示下移載平台。 圖7係本發明第一較佳實施例之部分元件立體圖,顯示上移載平台的底視視角。 圖8係本發明第一較佳實施例之部分元件立體圖,顯示上移載平台與下移載平台的相互空間關係。 圖9係本發明第一較佳實施例之部分元件放大圖,顯示壓制板及上方的部分元件。 圖10係本發明第一較佳實施例之另一部分元件放大圖,顯示壓制板及上方的部分元件。 圖11係本發明第一較佳實施例之另一種實施態樣示意圖,顯示料板設影機設置於承台下方的狀態。 圖12係本發明第一較佳實施例之動作圖,顯示承台置放待移轉基板的狀態。 圖13係本發明第一較佳實施例之再一動作圖,顯示料盤暫置台位於吸附件下方。 圖14係本發明第一較佳實施例之又一動作圖,顯示吸附件下降取料的狀態。 圖15係本發明第一較佳實施例之局部元件放大圖,顯示吸附件吸取一移轉料板的狀態。 圖16係本發明第一較佳實施例之另一動作圖,顯示承台移動至料板攝影機下方的狀態。 圖17係本發明第一較佳實施例之再一動作圖,顯示承台移動至吸附件下方,且吸附件下壓的狀態。 圖18係圖17之局部放大圖。 圖19係本發明第二較佳實施例之立體圖。 圖20係沿圖19中20-20剖線之局部剖視示意圖。 圖21係圖20的局部放大圖。 圖22係本發明第二較佳實施例之部分元件立體圖。 圖23係本發明第三較佳實施例之剖視示意圖。 Figure 1 is a perspective view of the first preferred embodiment of the present invention. Figure 2 is a side view of the first preferred embodiment of the present invention. FIG. 3 is a side view of some components of the first preferred embodiment of the present invention, showing the state after removing part of the base. Figure 4 is a perspective view of some components of the first preferred embodiment of the present invention, showing the structure of the lower transfer platform and the base. Figure 5 is a schematic diagram of some components of the first preferred embodiment of the present invention, showing the platform. Figure 6 is a top view of some components of the first preferred embodiment of the present invention, showing the lower transfer platform. Figure 7 is a perspective view of some components of the first preferred embodiment of the present invention, showing a bottom view of the upper transfer platform. Figure 8 is a perspective view of some components of the first preferred embodiment of the present invention, showing the mutual spatial relationship between the upper transfer platform and the lower transfer platform. Figure 9 is an enlarged view of some components of the first preferred embodiment of the present invention, showing the pressed plate and some components above it. Figure 10 is an enlarged view of another part of the components of the first preferred embodiment of the present invention, showing the pressing plate and some components above. Figure 11 is a schematic diagram of another implementation aspect of the first preferred embodiment of the present invention, showing the state where the material plate setting machine is installed below the platform. Figure 12 is an action diagram of the first preferred embodiment of the present invention, showing the state of the platform placing the substrate to be transferred. Figure 13 is another action diagram of the first preferred embodiment of the present invention, showing that the material tray temporary setting platform is located below the adsorption member. Figure 14 is another action diagram of the first preferred embodiment of the present invention, showing the state of the adsorption member being lowered to pick up materials. Figure 15 is an enlarged view of a partial component of the first preferred embodiment of the present invention, showing the state in which the adsorption member absorbs a transfer plate. Figure 16 is another action diagram of the first preferred embodiment of the present invention, showing the state when the platform moves below the material plate camera. Figure 17 is another action diagram of the first preferred embodiment of the present invention, showing the state in which the platform moves below the adsorption part and the adsorption part is pressed down. Figure 18 is a partial enlarged view of Figure 17. Figure 19 is a perspective view of the second preferred embodiment of the present invention. Figure 20 is a partial cross-sectional schematic view along line 20-20 in Figure 19. Figure 21 is a partial enlarged view of Figure 20. Figure 22 is a perspective view of some components of the second preferred embodiment of the present invention. Figure 23 is a schematic cross-sectional view of the third preferred embodiment of the present invention.
31:上移載平台 31: Uploading platform
311:台座 311:pedestal
312:X軸驅動滑軌 312:X-axis drive slide rail
313:Y軸驅動滑軌 313: Y-axis drive slide rail
314:旋轉馬達 314: Rotary motor
315:旋轉平台 315: Rotating platform
41:壓制單元 41: Suppression unit
421:驅動桿 421:Driving rod
422:力量感測器 422: Force sensor
44:壓制板 44: Pressed board
51:吸附件 51: Adsorption parts
52:壓制面 52: Pressed surface
521:吸附件抽氣構造 521: Air extraction structure of adsorption parts
54:觀察孔 54: Observation hole
61:測距裝置 61: Distance measuring device
Claims (15)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202310513981.9A CN117080316A (en) | 2022-05-17 | 2023-05-09 | Semiconductor element or electronic element batch transfer device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111118317 | 2022-05-17 | ||
TW111118317 | 2022-05-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202347581A true TW202347581A (en) | 2023-12-01 |
Family
ID=88809841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112114844A TW202347581A (en) | 2022-05-17 | 2023-04-20 | Semiconductor component or electronic component batch transfer device for achieving the effect of batch transfer and accurately adjusting and pressing the transfer plate on the substrate to be transferred |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN117103836A (en) |
TW (1) | TW202347581A (en) |
-
2022
- 2022-05-27 CN CN202210593685.XA patent/CN117103836A/en active Pending
-
2023
- 2023-04-20 TW TW112114844A patent/TW202347581A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN117103836A (en) | 2023-11-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2011086698A (en) | Bonding device | |
TW201828343A (en) | Semiconductor manufacturing apparatus and manufacturing method of semiconductor device capable of reducing pressure applied to die | |
US20040001140A1 (en) | Semiconductor chip mounting apparatus and mounting method | |
JP2000150970A (en) | Light emitting device bonding method and equipment | |
TW202347581A (en) | Semiconductor component or electronic component batch transfer device for achieving the effect of batch transfer and accurately adjusting and pressing the transfer plate on the substrate to be transferred | |
CN116779732A (en) | Micro-LED chip batch transfer device and batch transfer welding method | |
CN217553430U (en) | micro-LED batch transfer printing device | |
KR102565265B1 (en) | Micro led manufacturing system and micro led manufacturing method | |
TWI654913B (en) | Vacuum adsorption wafer bonding method | |
CN117080316A (en) | Semiconductor element or electronic element batch transfer device | |
TWI496520B (en) | Substrate manufacturing device | |
KR20230081535A (en) | Apparatus for Transferring Micro LED Chips | |
TWI624905B (en) | Multi-die press | |
CN114571725A (en) | Printing equipment of LED encapsulation barricade | |
WO2020261892A1 (en) | Electronic component mounting structure, mounting method therefor, led display panel, and led chip mounting method | |
JP3744451B2 (en) | Electronic component mounting apparatus and electronic component mounting method | |
TWI473180B (en) | Wafer bonding device | |
TWM543457U (en) | Multi-grain Pressing machine | |
WO2020000662A1 (en) | Marker identification device, marker identification method, and pre-press aligning apparatus | |
JP3763283B2 (en) | Electronic component mounting apparatus and electronic component mounting method | |
TWI743529B (en) | Pick and place alignment apparatus and method thereof | |
TWI747585B (en) | Manufacturing method of a display apparatus | |
TWM629742U (en) | Pre-alignment device for thin substrate | |
JP2578936B2 (en) | Electronic component mounting equipment | |
JPS6339118B2 (en) |