TWM629199U - Suck-to-attach rotatable platform - Google Patents

Suck-to-attach rotatable platform Download PDF

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TWM629199U
TWM629199U TW111202904U TW111202904U TWM629199U TW M629199 U TWM629199 U TW M629199U TW 111202904 U TW111202904 U TW 111202904U TW 111202904 U TW111202904 U TW 111202904U TW M629199 U TWM629199 U TW M629199U
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Taiwan
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suction
type rotary
rotary stage
processing surface
groove
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TW111202904U
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Chinese (zh)
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成都 洪
曾麒文
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大陸商蘇州桔雲科技有限公司
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Priority to TW111202904U priority Critical patent/TWM629199U/en
Publication of TWM629199U publication Critical patent/TWM629199U/en

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Abstract

一種吸附式旋轉載台,用以供一基板平置於其上,包括一加工台、以及一支撐加工台的旋轉組件,加工台具有一供基板平置的加工面,並於加工面上凹設有氣密溝槽,而旋轉組件內設有一提供負壓之氣道,氣道連通於氣密溝槽;其中,加工台上係設有一用以吸附基板的吸附件,且於加工面上形成有一環形凹槽,以供吸附件套入環形凹槽而局部表露於加工面上;藉此,可供吸附件有較佳的結構強度而套置於旋轉載台上。An adsorption-type rotary stage is used for a substrate to be placed flat on it, comprising a processing table and a rotary assembly supporting the processing table. An air-tight groove is provided, and an air channel for providing negative pressure is arranged in the rotating assembly, and the air channel is communicated with the air-tight groove; wherein, an adsorption member for adsorbing the substrate is arranged on the processing table, and a processing surface is formed with a The annular groove is used for the suction part to be inserted into the annular groove and partially exposed on the processing surface; thereby, the suction part can be sleeved on the rotating stage with better structural strength.

Description

吸附式旋轉載台Adsorption type rotary stage

本創作係與一種半導體設備有關,尤指一種吸附式旋轉載台。This creation is related to a semiconductor device, especially a suction-type rotating stage.

按,現在應用於半導體製程中,如針對晶圓等基板所進行的加工設備,主要係藉由該設備之載台吸附基板底面,再透過帶動載台作旋轉的方式,使得被吸附於載台上的基板可一併旋,藉以進行如濕製程等半導體加工製程。Press, currently used in the semiconductor manufacturing process, such as processing equipment for substrates such as wafers, mainly through the equipment's carrier to adsorb the bottom surface of the substrate, and then drive the carrier to rotate, so that the carrier is adsorbed on the carrier. The upper substrates can be spun together to perform semiconductor processing processes such as wet processes.

然而,上述設備在吸附基板時,為了避免基板直接與硬質的載台作接觸,通常會採用如吸盤等由緩衝材作間接接觸;惟,雖然吸盤等緩衝材料提供了與基板間較佳的接觸方式,但若沒有足夠的強度支撐,在承受旋轉時即容易因離心力等因素而無法維持應該有吸附力、甚至造成與基材間的脫落。However, in order to avoid the direct contact between the substrate and the hard stage when the above-mentioned equipment adsorbs the substrate, a buffer material such as a suction cup is usually used for indirect contact; however, although the buffer material such as the suction cup provides better contact with the substrate However, if there is not enough strength support, it is easy to be unable to maintain the adsorption force due to factors such as centrifugal force when it is subjected to rotation, and even cause it to fall off from the substrate.

有鑑於此,本創作人係為改善並解決上述之缺失,乃特潛心研究並配合學理之運用,終於提出一種設計合理且有效改善上述缺失之本創作。In view of this, in order to improve and solve the above-mentioned deficiencies, the author of this book has devoted himself to research and the application of academic principles, and finally proposed a book with a reasonable design and effective improvement of the above deficiencies.

本創作之主要目的,在於可提供一種吸附式旋轉載台,其係可供如吸盤等吸附件有較佳的結構強度而套置於旋轉載台上。The main purpose of the present invention is to provide an adsorption-type rotary stage, which can be sleeved on the rotary stage with better structural strength for adsorption members such as suction cups.

本創作之另一目的,在於可提供一種吸附式旋轉載台,其係在前述具有較佳的結構強度下,進一步確保基板能更穩定地被吸附於旋轉載台上。Another object of the present invention is to provide an adsorption-type rotary stage, which further ensures that the substrate can be adsorbed on the rotary stage more stably under the aforementioned better structural strength.

為了達成上述之主要目的,本創作係提供一種吸附式旋轉載台,用以供一基板平置於其上,包括一加工台、以及一支撐加工台的旋轉組件,加工台具有一供基板平置的加工面,並於加工面上凹設有氣密溝槽,而旋轉組件內設有一提供負壓之氣道,氣道連通於氣密溝槽;其中,加工台上係設有一用以吸附基板的吸附件,且於加工面上形成有一環形凹槽,以供吸附件套入環形凹槽而局部表露於加工面上。In order to achieve the above-mentioned main purpose, the present invention provides an adsorption-type rotary stage for a substrate to be flatly placed thereon, including a processing table and a rotating component supporting the processing table, the processing table has a flat plate for the substrate The processing surface is placed on the processing surface, and an air-tight groove is recessed on the processing surface, and an air channel for providing negative pressure is arranged in the rotating component, and the air channel is connected with the air-tight groove; wherein, the processing table is provided with an air-tight groove for adsorbing the substrate. and an annular groove is formed on the processing surface, so that the suction member can be inserted into the annular groove and partially exposed on the processing surface.

為了達成上述之另一目的,本創作係提供一種吸附式旋轉載台,上述吸附件係具有一套置於環形凹槽內的套環部、以及一由套環部向外延伸並表露於加工面上的吸盤部,且環形凹槽於其徑向外圍處形成有一由內向外呈漸擴狀的容置部,所述容置部相對於吸盤部的下方處;藉以能透過吸力而使吸附件之吸盤部變形,並與基板緊密貼合,以達到前述之目的與功效。In order to achieve the above-mentioned other object, the present invention provides an adsorption-type rotary stage. The adsorption member has a set of collar portions disposed in the annular grooves, and a collar portion extending outwardly and exposed to processing. The suction cup part on the surface, and the annular groove is formed with a accommodating part that is gradually expanding from the inside to the outside at its radial periphery, and the accommodating part is relative to the lower part of the suction cup part; The suction cup part of the part is deformed and closely attached to the base plate, so as to achieve the aforementioned purpose and effect.

為了能更進一步揭露本創作之特徵及技術內容,請參閱以下有關本創作之詳細說明與附圖,然而所附圖式僅提供參考與說明用,並非用來對本創作加以限制者。In order to further disclose the features and technical content of this creation, please refer to the following detailed description and accompanying drawings of this creation. However, the accompanying drawings are only for reference and description, and are not intended to limit this creation.

請參閱圖1,係為本創作之立體分解示意圖。本創作係提供一種吸附式旋轉載台,其係適用於一半導體設備內並供一基板3平置於其上,所述基板3可為一晶圓;而該旋轉載台則包括一加工台1、以及一支撐該加工台1的旋轉組件2;其中:Please refer to Figure 1, which is a three-dimensional exploded schematic diagram of this creation. The present invention provides an adsorption-type rotary stage, which is suitable for use in a semiconductor device and on which a substrate 3 is placed. The substrate 3 can be a wafer; and the rotary stage includes a processing table 1. and a rotating assembly 2 supporting the processing table 1; wherein:

該加工台1係具有一用以供上述基板3形成的加工面10,並於該加工面10上凹設有氣密溝槽11;而在本創作所舉之實施例中,所述氣密溝槽11係具有一位於該加工面10上的槽口110、至少一以該槽口110為圓心而作同心圓圍繞的第一槽道111、以及至少一連通該槽口110與第一槽道111的第二槽道112。所述第一槽道111亦可為複數並作同心圓排列於加工面10上,而所述第二槽道112則可由槽口110作徑向延伸以連接第一槽道111、或是連接於任二同心圓的第一槽道111之間,進而使凹設於該加工面10上的所述氣密溝槽11能構成連通狀態。The processing table 1 has a processing surface 10 for forming the substrate 3, and an airtight groove 11 is recessed on the processing surface 10; The groove 11 has a notch 110 on the processing surface 10, at least one first channel 111 concentrically surrounding the notch 110, and at least one connecting the notch 110 and the first groove The second channel 112 of the channel 111 . The first channels 111 can also be plural and arranged in concentric circles on the processing surface 10 , while the second channels 112 can be radially extended from the notch 110 to connect the first channels 111 , or to connect Between any two concentric first grooves 111 , the airtight grooves 11 recessed on the processing surface 10 can form a communication state.

如圖2所示,該旋轉組件2係設於上述加工台1下方,以將該加工台1支撐於半導體設備內作旋轉,且該旋轉組件2內設有一連通上述氣密溝槽11的氣道20,所述氣道20可沿著旋轉組件2的軸向向下延伸,並用以連接一吸氣裝置(圖略)來提供負壓;而在本創作所舉之實施例中,該旋轉組件2係以一聯結元件21穿設該加工台1並固定於該旋轉組件2上,該聯結元件21可為一螺栓,並具有一貫通其螺頭與螺桿部位的貫孔210,該貫孔210由其螺桿部位連通至所述氣道20,且該貫孔210於其螺頭部位形成一開口211,以對應至氣密溝槽11的槽口110作連通。As shown in FIG. 2 , the rotating assembly 2 is arranged below the processing table 1 to support the processing table 1 in the semiconductor equipment for rotation, and the rotating assembly 2 is provided with an air-tight groove 11 connected to the inside of the rotating assembly 2 . Airway 20, the airway 20 can extend downward along the axial direction of the rotating component 2, and is used to connect a suction device (not shown in the figure) to provide negative pressure; and in the embodiment of the present invention, the rotating component 2. A connecting element 21 penetrates through the processing table 1 and is fixed on the rotating assembly 2. The connecting element 21 can be a bolt and has a through hole 210 passing through the screw head and the screw part. The through hole 210 The screw portion is connected to the air passage 20 , and the through hole 210 forms an opening 211 at the screw head portion to communicate with the slot 110 corresponding to the airtight groove 11 .

請一併參閱圖1及圖2所示,本創作主要係於上述加工面10上裝設有一用以吸附基板3的吸附件12,且於該加工面10上形成有一凹入的環形凹槽100,以供該吸附件12套入該環形凹槽100而局部表露於該加工面10上。如圖3所示,該吸附件12可為如矽膠或橡膠等軟性材質所構成,並具有一套環部120、以及一由套環部120向外延伸並表露於該加工面10上的吸盤部121,該套環部120即用以套置於環形凹槽100內,並可於環形凹槽100內進一步凹設一凹緣100a,而套環部120則突設有嵌入該凹緣100a內的凸緣120a,藉以供吸附件12之套環部120可更加緊密地固結於該環形凹槽100內。Please refer to FIG. 1 and FIG. 2 together. In the present invention, a suction member 12 for sucking the substrate 3 is installed on the processing surface 10 , and a concave annular groove is formed on the processing surface 10 . 100 , so that the adsorption member 12 is inserted into the annular groove 100 and partially exposed on the processing surface 10 . As shown in FIG. 3 , the suction member 12 can be made of a soft material such as silicone or rubber, and has a collar portion 120 and a suction cup extending outward from the collar portion 120 and exposed on the processing surface 10 The collar part 120 is used to be sleeved in the annular groove 100, and a concave edge 100a can be further recessed in the annular groove 100, and the collar part 120 is protrudingly provided with embedded in the concave edge 100a The inner flange 120a is used for the collar portion 120 of the adsorption member 12 to be more tightly fixed in the annular groove 100 .

承上所述,如圖4及圖5所示,本創作進一步地使上述環形凹槽100於其徑向外圍處形成有一由內向外呈漸擴狀的容置部100b,所述容置部100b相對於上述吸附件12之吸盤部121的下方處;據此,當基板3置於加工面10上時,旋轉組件2之氣道20以負壓而對加工面10上的氣密溝槽11產生吸力,即可使基板3被緊貼於加工面10上;同時,由於該吸附件12為一軟性材質構成,因此能透過前述吸力而變形,以與基板3緊密貼合,並因變形而擠入於該容置部100b內,以在前述緊密地固結於該環形凹槽100內前題下,進一步透過該容置部100b而維持其變形型態,以確保基板3能更穩定地被吸附於該加工面10上。Continuing the above, as shown in FIG. 4 and FIG. 5 , in the present invention, the annular groove 100 is further formed with a accommodating portion 100b at its radial periphery that is gradually expanding from the inside to the outside. The accommodating portion 100b 100b is opposite to the lower part of the suction cup portion 121 of the above-mentioned suction member 12; accordingly, when the substrate 3 is placed on the processing surface 10, the air passage 20 of the rotating assembly 2 is negatively pressured to the airtight groove 11 on the processing surface 10 The suction force is generated, so that the substrate 3 can be closely attached to the processing surface 10; at the same time, since the suction member 12 is made of a soft material, it can be deformed by the aforementioned suction force, so as to be closely attached to the substrate 3, and due to the deformation Squeeze into the accommodating portion 100b, so as to further maintain its deformed shape through the accommodating portion 100b under the aforementioned premise of being tightly fixed in the annular groove 100, so as to ensure that the substrate 3 can be more stably is adsorbed on the processing surface 10 .

是以,藉由上述之構造組成,即可得到本創作吸附式旋轉載台。Therefore, with the above-mentioned structure, the adsorption-type rotary stage of the present invention can be obtained.

綜上所述,本創作實為不可多得之新型創作產品,其確可達到預期之使用目的,而解決習知之缺失,又因極具新穎性及進步性,完全符合新型專利申請要件,爰依專利法提出申請,敬請詳查並賜准本案專利,以保障創作人之權利。To sum up, this creation is a rare new creation product, it can indeed achieve the intended purpose of use, and solve the lack of conventional knowledge, and because it is very novel and progressive, it fully meets the requirements for a new type of patent application. If you file an application in accordance with the Patent Law, please check carefully and grant the patent in this case to protect the rights of the creator.

惟以上所述僅為本創作之較佳可行實施例,非因此即拘限本創作之專利範圍,故舉凡運用本創作說明書及圖式內容所為之等效結構變化,均同理皆包含於本創作之範圍內,合予陳明。However, the above descriptions are only the preferred feasible embodiments of this creation, and therefore the scope of the patent of this creation is limited. Therefore, any equivalent structural changes made by using the contents of the description and drawings of this creation are similarly included in this publication. Within the scope of creation, I agree to Chen Ming.

<本創作> 1:加工台 10:加工面 100:環形凹槽 100a:凹緣 100b:容置部 11:氣密溝槽 110:槽口 111:第一槽道 112:第二槽道 12:吸附件 120:套環部 120a:凸緣 121:吸盤部 2:旋轉組件 20:氣道 21:聯結元件 210:貫孔 211:開口 3:基板 <This creation> 1: Processing table 10: Machined surface 100: Annular groove 100a: concave edge 100b: accommodating part 11: Airtight groove 110: Notch 111: The first channel 112: Second channel 12: Adsorber 120: Collar Department 120a: Flange 121: Suction cup part 2: Rotary components 20: Airway 21: Coupling elements 210: Through hole 211: Opening 3: Substrate

圖1係本創作之立體分解示意圖。Figure 1 is a three-dimensional exploded schematic diagram of this creation.

圖2係本創作未吸附基板之局部剖面示意圖。FIG. 2 is a partial cross-sectional schematic diagram of the non-adsorbed substrate of the present invention.

圖3係圖2之A部分放大詳圖。FIG. 3 is an enlarged detailed view of part A of FIG. 2 .

圖4係本創作吸附基板之局部剖面示意圖。FIG. 4 is a partial cross-sectional schematic diagram of the adsorption substrate of the present invention.

圖5係圖4之A部分放大詳圖。FIG. 5 is an enlarged detailed view of part A of FIG. 4 .

1:加工台 1: Processing table

100:環形凹槽 100: Annular groove

110:槽口 110: Notch

12:吸附件 12: Adsorber

2:旋轉組件 2: Rotary components

20:氣道 20: Airway

21:聯結元件 21: Coupling elements

210:貫孔 210: Through hole

211:開口 211: Opening

3:基板 3: Substrate

Claims (10)

一種吸附式旋轉載台,用以供一基板平置於其上,包括: 一加工台,具有一供所述基板平置的加工面,並於該加工面上凹設有氣密溝槽;以及 一旋轉組件,支撐該加工台作旋轉,且該旋轉組件內設有一提供負壓之氣道,該氣道即連通於該氣密溝槽; 其中,該加工台上係設有一用以吸附所述基板的吸附件,且於該加工面上形成有一環形凹槽,以供該吸附件套入該環形凹槽而局部表露於該加工面上。 An adsorption-type rotating stage for placing a substrate on it, comprising: a processing table, which has a processing surface on which the substrate is placed flat, and an air-tight groove is recessed on the processing surface; and a rotating component supporting the processing table for rotation, and an air channel for providing negative pressure is arranged in the rotating component, and the air channel is communicated with the airtight groove; Wherein, the processing table is provided with a suction member for suctioning the substrate, and an annular groove is formed on the processing surface, so that the suction member can be inserted into the annular groove and partially exposed on the processing surface . 如請求項1所述之吸附式旋轉載台,其中該氣密溝槽係具有一位於該加工面上的槽口、至少一以該槽口為圓心而作圍繞的第一槽道、以及至少一連通該槽口與該第一槽道的第二槽道。The suction-type rotary stage according to claim 1, wherein the airtight groove has a notch on the processing surface, at least one first groove surrounding the notch as a center, and at least a second channel connecting the slot and the first channel. 如請求項2所述之吸附式旋轉載台,其中所述第二槽道係由該槽口作徑向延伸以連接所述第一槽道。The suction-type rotary stage of claim 2, wherein the second channel extends radially from the slot to connect with the first channel. 如請求項2或3所述之吸附式旋轉載台,其中所述第一槽道係為複數並作同心圓排列於該加工面上。The suction-type rotary stage according to claim 2 or 3, wherein the first grooves are plural and arranged in concentric circles on the processing surface. 如請求項4所述之吸附式旋轉載台,其中所述第二槽道係連接於任二所述第一槽道之間。The suction-type rotary stage according to claim 4, wherein the second channel is connected between any two of the first channels. 如請求項1所述之吸附式旋轉載台,其中該旋轉組件係以一聯結元件穿設該加工台並固定於該旋轉組件上。The suction-type rotary stage as claimed in claim 1, wherein the rotary assembly penetrates the processing table with a coupling element and is fixed on the rotary assembly. 如請求項6所述之吸附式旋轉載台,其中該聯結元件係為一螺栓,並具有一貫通其螺頭與螺桿部位的貫孔,該貫孔由其螺桿部位連通至所述氣道,且該貫孔於其螺頭部位形成一開口,以對應至該氣密溝槽作連通。The adsorption-type rotary stage according to claim 6, wherein the coupling element is a bolt, and has a through hole through the screw head and the screw part, the through hole communicates with the air passage from the screw part, and The through hole forms an opening at the screw head portion to communicate with the airtight groove. 如請求項1所述之吸附式旋轉載台,其中該吸附件係具有一套置於該環形凹槽內的套環部、以及一由該套環部向外延伸並表露於該加工面上的吸盤部。The suction-type rotary stage as claimed in claim 1, wherein the suction member has a set of collar parts disposed in the annular groove, and a collar part extending outward from the collar part and exposed on the processing surface the suction cup part. 如請求項8所述之吸附式旋轉載台,其中該環形凹槽於其徑向外圍處係形成有一由內向外呈漸擴狀的容置部,所述容置部相對於該吸盤部的下方處。The suction-type rotary stage as claimed in claim 8, wherein a accommodating portion that is gradually expanded from the inside to the outside is formed at the radial periphery of the annular groove, and the accommodating portion is opposite to the suction cup portion. below. 如請求項8或9所述之吸附式旋轉載台,其中該環形凹槽內係凹設一凹緣,而該套環部則突設有嵌入該凹緣內的凸緣。The suction-type rotary stage according to claim 8 or 9, wherein a concave edge is recessed in the annular groove, and a flange embedded in the concave edge is protruded on the collar portion.
TW111202904U 2022-03-23 2022-03-23 Suck-to-attach rotatable platform TWM629199U (en)

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TW111202904U TWM629199U (en) 2022-03-23 2022-03-23 Suck-to-attach rotatable platform

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