TWM594168U - Hologram pattern transfer device - Google Patents

Abstract

A hologram pattern transfer device includes a working stage, a cylindrical metal roller, a photoresist spray module, a lithography process module, and an electrochemical machining etching module. The work stage has an actuating member. The cylindrical metal roller is horizontally arranged above the work stage and the actuating member is used to rotate the cylindrical metal roller. The photoresist spray module is used to form a photoresist layer on the cylindrical metal roller. The lithography process module is used to convert the photoresist layer into a patterned photoresist layer. The electrochemical machining etching module is used to transfer the pattern of the patterned photoresist layer to the cylindrical metal roller. This holographic image pattern transfer device can improve uniformity and shorten process time.

Description

Holographic image pattern transfer device

This creation is about a pattern transfer device, especially a holographic image pattern transfer device.

In the past, when making a hologram pattern transfer, please refer to FIG. 1, first assemble the sheet-like hologram plate 11 on the roller 10, and then transfer the hologram pattern on the hologram plate 11 to the material 20 to make the material 20 With corresponding holographic pattern 21. In the above holographic pattern transfer method, the gap 22 corresponding to the seam 12 of the holographic plate 11 is left between two adjacent holographic pattern 21 on the transferred material 20. Therefore, when the transferred material 20 is used later, the material 20 is greatly wasted due to the existence of the gap 22. An improved technique is shown in FIG. 3, which uses photoresist and development to transfer the pattern. When the photoresist layer is formed, the roller 10 is tilted and the photoresist material is slowly applied by drip coating It is laid on the roller 10, and this process requires more than ten working days, and the uniformity of the coating is not very good.

In view of the lack of the above-mentioned conventional structure, manufacturing a good quality, cost-effective, and suitable for a hologram pattern transfer device is currently a goal that requires much effort.

This creation provides a hologram pattern transfer device for transferring a hologram pattern directly to the metal roller, which not only makes the pattern more uniform and shortens the process time, thereby improving the quality of the final product.

A hologram pattern transfer device according to an embodiment of the present invention includes a work stage, a cylindrical metal roller, a photoresist spray module, a lithography process module, and an electrochemical machining etching mold group. The work stage has a first actuating member. The cylindrical metal roller is arranged on the working stage, and the first actuating member is used to rotate the cylindrical metal roller. The photoresist spray module is configured to spray a photoresist material on the cylindrical metal roller to form a photoresist layer. The lithography process module is used to convert the photoresist layer provided on the cylindrical metal roller into a patterned photoresist layer. The electrochemical machining etching module is used to transfer a pattern of the patterned photoresist layer to the cylindrical metal roller.

The following is a detailed description with specific examples and accompanying drawings, so that it is easier to understand the purpose, technical content, characteristics and effects of the creation.

10: Roller

11: Holographic version

12: Seam

20: Material

21: Holographic pattern

22: clearance

100: Holographic image pattern transfer device

110: Work stage

112: The first actuating member

114: Second actuation member

120: cylindrical metal roller

130: Photoresist spray module

132: sprinkler head

140: lithography process module

142: Laser exposure component

144: developing member

150: Electrochemical machining etching module

152: electrolytic cell

154: anode

156: cathode

PR1: photoresist layer

PR2: patterned photoresist layer

Figures 1 to 3 are schematic diagrams showing the prior art of this creation.

FIG. 4 is a block diagram showing a hologram pattern transfer device according to an embodiment of the invention.

5A and 5B are schematic diagrams showing a hologram pattern transfer device according to an embodiment of the present creation.

6A and 6B are schematic diagrams showing a hologram pattern transfer device according to another embodiment of the present creation.

6C is a schematic diagram showing a schematic diagram of a patterned photoresist layer in an embodiment of the present invention.

7A, 7B and 7D are schematic diagrams showing a hologram pattern transfer device in another embodiment of the present creation.

FIG. 7C is a schematic diagram showing the formation of a hologram pattern on a cylindrical metal roller after etching in an embodiment of the present invention.

In the following, each embodiment of the creation will be described in detail, and the drawings will be used as examples. In addition to these detailed descriptions, this creation can also be widely implemented in other embodiments. The easy replacement, modification, and equivalent changes of any of the described embodiments are included in the scope of this creation, and the scope of patent application is quasi. In the description of the specification, in order to allow the reader to have a more complete understanding of this creation, many specific details are provided; however, this creation may still be implemented on the premise that some or all of the specific details are omitted. In addition, well-known steps or elements are not described in detail to avoid unnecessary restrictions on the creation. The same or similar elements in the drawings will be represented by the same or similar symbols. It is important to note that the drawings are for illustrative purposes only, and do not represent the actual size or number of components. Some details may not be fully drawn for simplicity.

Please refer to FIGS. 4, 5A and 5B, a hologram pattern transfer device 100 according to an embodiment of the present creation includes: a working stage 110, a cylindrical metal roller 120, a photoresist spray module 130, A lithography process module 140 and an electrochemical machining etching module 150. The working stage 110 has a first actuating member 112. In one embodiment, the cylindrical metal roller 120 is made of metal. In one embodiment, the material includes, but is not limited to, tin, lead, zinc, aluminum, copper, brass, iron, nickel, stainless steel, cobalt, tungsten, chromium, and metals whose hardness is greater than chromium.

Following the above, as shown in FIG. 5A, the cylindrical metal roller 120 is disposed on the working stage 110. In one embodiment, the photoresist spray module 130 is disposed above the cylindrical metal roller 120, wherein when the photoresist sprays When the module 130 sprays the photoresist material on the cylindrical metal roller 120, the first actuating member 112 rotates the cylindrical metal roller 120 to uniformly coat the photoresist material on the cylindrical metal roller 120 to form a photoresist layer PR1. The photoresist spray module 130 of this invention can make the photoresist coating more uniform and shorten the process time, and can also make a thinner photoresist film.

As mentioned above, in one embodiment, the photoresist spray module 130 has a spray head 132. The hologram pattern transfer device 100 further includes a second actuating member 114 for horizontally moving the photoresist spray module 130 above the cylindrical metal roller 120, so as to spray the photoresist material more evenly on the cylinder Shaped metal roller 120. It can be understood that in another embodiment, please refer to FIG. 5B, the photoresist spray module 130 has a plurality of spray heads 132, wherein the spray heads 132 may be evenly distributed above the cylindrical metal roller 120.

6A and 6B, the lithography process module 140 includes a laser exposure member 142 and a developing member 144, which are arranged on the cylindrical metal roller 120 in an appropriate manner, such as lithography process technology The photoresist layer PR1 is patterned (as in the patterned photoresist layer PR2 of FIG. 6C). Furthermore, the cylindrical metal roller 120 with the patterned photoresist layer PR2 is subjected to the subsequent manufacturing process by the electrochemical machining etching module 150. Referring to FIG. 7A, the electrochemical machining etching module 150 includes an electrolytic cell 152. In this embodiment, the electrolytic cell 152 is a horizontal type, which is loaded with an electrolyte for the cylindrical metal roller 120 to be placed in. An electrolytic etching process is performed. In one embodiment, as shown in FIG. 7B, the anode 154 is provided in the cylindrical metal roller 120, and the cathode 156 is provided in the electrolytic cell 152 to directly transfer the pattern of the patterned photoresist layer PR2 Up to the cylindrical metal roller 120, that is, the pattern of the patterned photoresist layer PR2 is etched on the outer surface of the cylindrical metal roller 120, as shown in FIG. 7C. In yet another embodiment, as shown in FIG. 7D, it can be understood that the electrolytic cell 142 can also be arranged in an upright manner.

According to the above, the holographic image pattern transfer device of this creation uses the spray head to form the photoresist material on the substrate (cylindrical metal roller) by spraying. Not only is the photoresist film more uniform, but the overall process is also Faster, the overall process time for holographic pattern transfer can be greatly reduced from 30 days to 5 days. In addition, the photoresist film formed by the spray head is less likely to cause streaks and is less likely to peel off. Moreover, the cross-sectional size and length of the cylindrical metal rollers are more flexible, and different designs can be made according to requirements. Due to the The quality is improved, and the overall process yield of the whole image pattern transfer is also improved, and the process cost can also be greatly reduced.

In summary, the holographic image pattern transfer device of the present invention is used to directly transfer a holographic image pattern to a metal roller, which not only makes the pattern more uniform and shortens the process time, thereby improving the quality of the final product.

The above-mentioned embodiments are only to illustrate the technical ideas and characteristics of this creation, and its purpose is to enable those who are familiar with this skill to understand and implement the content of this creation, but should not limit the patent scope of this creation, That is to say, the equal changes or modifications made by Dafan in accordance with the spirit of this creation should still be covered by the patent scope of this creation.

100: Holographic image pattern transfer device

130: Photoresist spray module

140: lithography process module

150: Electrochemical machining etching module

Claims (10)

A hologram pattern transfer device, comprising: a working stage with a first actuating member; a cylindrical metal roller arranged on the working stage, wherein the first actuating member is used to rotate the cylinder Metal roller; a photoresist spray module for spraying a photoresist material on the cylindrical metal roller to form a photoresist layer; a lithography process module for placing on the cylindrical metal The photoresist layer on the roller is converted into a patterned photoresist layer; and an electrochemical processing etching module is used to transfer a pattern of the patterned photoresist layer to the cylindrical metal roller. The hologram pattern transfer device as described in claim 1, wherein the material of the cylindrical metal roller includes tin, lead, zinc, aluminum, copper, brass, iron, nickel, stainless steel, cobalt, tungsten, chromium and its hardness Metals larger than chromium. The hologram pattern transfer device according to claim 1, wherein the photoresist spray module has a spray head. The hologram pattern transfer device according to claim 3, further includes a second actuating member for horizontally moving the photoresist spray module above the cylindrical metal roller. The hologram pattern transfer device according to claim 1, wherein the photoresist spray module has a plurality of spray heads. The hologram pattern transfer device according to claim 5, wherein the plurality of spray heads are evenly distributed above the cylindrical metal roller. The hologram pattern transfer device according to claim 1, wherein the lithography process module includes a laser exposure member and a developing member to form the patterned photoresist layer. The hologram pattern transfer device as described in claim 1, wherein the electrochemical machining etching module includes an electrolytic cell loaded with an electrolyte for the electrolytic metal etching process after the cylindrical metal roller is inserted To transfer the pattern of the patterned photoresist layer to the cylindrical metal roller. The hologram pattern transfer device as described in claim 8, wherein the electrolytic cell is an upright type. The hologram pattern transfer device according to claim 8, wherein the electrolytic cell is a horizontal type.

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