TWM591253U - Photoresist coating device - Google Patents

Abstract

A photoresist coating device is disclosed herein. The photoresist coating device is provided with a base holder having a first actuating element, a cylinder, and a spray element. The cylinder is horizontally arranged on the base holder and the spray element is arranged above the cylinder, wherein when the coating material is coating on the cylinder by the spray element, the cylinder is rotated by the first actuating element at a first velocity; and after the coating material is sprayed on the cylinder, the cylinder is rotated by the first actuating element at a second velocity so as to making the coating material been coated on the cylinder uniformly, wherein the second velocity is bigger than the first velocity. The photoresist film can be coated uniformly and the process time can be reduced by utilizing the present invention.

Description

Photoresist coating device

This creation relates to a photoresist coating device, especially a photoresist coating device for transferring a hologram pattern to a decorative material.

In the past, when making a hologram pattern transfer, please refer to FIG. 1, first assemble the sheet-like hologram plate 11 on the roller 10, and then transfer the hologram pattern on the hologram plate 11 to the material 20 to make the material 20 With corresponding holographic pattern 21. In the above holographic pattern transfer method, the gap 22 corresponding to the seam 12 of the holographic plate 11 is left between two adjacent holographic pattern 21 on the transferred material 20. Therefore, when the transferred material 20 is used later, the material 20 is greatly wasted due to the existence of the gap 22. An improved technique is shown in FIG. 3, which uses photoresist and development to transfer the pattern. When the photoresist layer is formed, the roller 10 is tilted and the photoresist material is slowly applied by drip coating It is laid on the roller 10, and this process requires more than ten working days, and the uniformity of the coating is not very good.

In view of the lack of the above-mentioned conventional structure, manufacturing a photoresist coating device with good quality, cost-effectiveness, and suitable for the transfer of hologram patterns is currently a goal that requires much effort.

This creation provides a photoresist coating device for transferring a hologram pattern to a decorative material. The overall design of the structure can make the photoresist coating more uniform and shorten the process time, thereby improving product quality.

A photoresist coating device according to an embodiment of the present invention is used to transfer a hologram pattern to a decorative material. The photoresist coating device includes: a base, a cylindrical roller, and a spray member. The base has a first actuation member. The cylindrical roller is horizontally arranged on the base by using a wheel shaft. The spray member is arranged above the cylindrical roller to spray a photoresist material on the cylindrical roller, wherein when the spray member sprays the photoresist material on the cylindrical roller, the first actuating member is at a first speed Rotating the cylindrical roller; and after the photoresist material is coated and sprayed on the cylindrical roller, the first actuating member rotates the cylindrical roller at a second speed to uniformly coat the photoresist material on the cylindrical roller, wherein the first The second speed is higher than the first speed.

The following is a detailed description with specific examples and accompanying drawings, so that it is easier to understand the purpose, technical content, characteristics and effects of the creation.

In the following, each embodiment of the creation will be described in detail, and the drawings will be used as examples. In addition to these detailed descriptions, this creation can also be widely implemented in other embodiments. The easy replacement, modification, and equivalent changes of any of the described embodiments are included in the scope of this creation, and the scope of patent application is quasi. In the description of the specification, in order to allow the reader to have a more complete understanding of this creation, many specific details are provided; however, this creation may still be implemented on the premise that some or all of the specific details are omitted. In addition, well-known steps or elements are not described in detail to avoid unnecessary restrictions on the creation. The same or similar elements in the drawings will be represented by the same or similar symbols. It is important to note that the drawings are for illustrative purposes only, and do not represent the actual size or number of components. Some details may not be fully drawn for simplicity.

4, a photoresist coating device 100 according to an embodiment of the present invention is used to transfer a hologram pattern to a decorative material. The photoresist coating device 100 includes: a base 110 and a cylindrical roller 120和一个喷洒机构130。 120 and a spray member 130. The base 110 has a first actuating member 112. In one embodiment, the cylindrical roller 120 is made of metal.

Following the above, as shown in FIG. 4, the cylindrical roller 120 is horizontally disposed on the base 110 and the spray member 130 is disposed above the cylindrical roller 120, wherein when the spray member 130 sprays the photoresist material on the cylindrical roller 120 , The first actuating member 112 rotates the cylindrical roller 120 at a first speed; and after the photoresist material is coated and sprayed on the cylindrical roller 120, the first actuating member 112 rotates the cylindrical roller 120 at a second speed, In order to uniformly coat the photoresist material onto the cylindrical roller 120, the second speed is higher than the first speed. In one embodiment, the first speed is 1 rpm to 500 rpm (ie, 1 RPM to 500 RPM), and the second speed is 100 rpm to 3000 rpm (ie, 100 RPM to 3000 RPM), where RPM is Revolution (s) Per Minute. The original photoresist coating device can make the photoresist coating more uniform and shorten the process time, and can also make a thinner photoresist film.

As mentioned above, in one embodiment, the spray member 130 has a spray head 132. The photoresist coating device 100 further includes a second actuating member 114 for horizontally moving the spray member 130 above the cylindrical roller 120 to facilitate spraying the photoresist material on the cylindrical roller 120 more evenly.

It can be understood that in another embodiment, please refer to FIG. 5, the spray member 130 has a plurality of spray heads 132, wherein the spray heads 132 may be evenly distributed above the cylindrical roller 120.

According to the above, the photoresist coating device of the present invention uses a spray head to form the photoresist material on the substrate (cylindrical roller) by spraying. Not only is the photoresist film more uniform and the process is faster, The process time can be greatly reduced from 16 days to 2 days. In addition, the photoresist film formed by the spray head is less likely to cause streaks and is less likely to peel off. Moreover, the cross-sectional size and length of the cylindrical roller are more flexible, and different designs can be made according to requirements. As the quality of the photoresist film is improved, the overall process yield of the hologram pattern transfer is also improved, and the process cost can also be greatly reduced.

In summary, the photoresist coating device of the present invention is used to transfer a hologram pattern to a decorative material. The overall design of the structure can make the photoresist coating more uniform and shorten the process time, thereby improving product quality.

The above-mentioned embodiments are only to illustrate the technical ideas and characteristics of this creation, and its purpose is to enable those who are familiar with this skill to understand and implement the content of this creation, but should not limit the patent scope of this creation, That is to say, the equal changes or modifications made by Dafan in accordance with the spirit of this creation should still be covered by the patent scope of this creation.

10‧‧‧wheel 11‧‧‧ Holographic 12‧‧‧Seam 20‧‧‧Material 21‧‧‧ Holographic pattern 22‧‧‧Gap 100‧‧‧Photoresist coating device 110‧‧‧Dock 112‧‧‧First actuating member 114‧‧‧Second actuating member 120‧‧‧cylindrical roller 130‧‧‧Spray component 132‧‧‧Sprinkler

Figures 1 to 3 are schematic diagrams showing the prior art of this creation. FIG. 4 is a schematic diagram showing a photoresist coating device according to an embodiment of the invention. FIG. 5 is a schematic diagram showing a photoresist coating device according to another embodiment of the invention.

100‧‧‧Photoresist coating device

110‧‧‧Dock

112‧‧‧First actuating member

114‧‧‧Second actuating member

120‧‧‧cylindrical roller

130‧‧‧Spray component

132‧‧‧Sprinkler

Claims (8)

A photoresist coating device for transferring a hologram pattern to a decorative material, the photoresist coating device includes: A base with a first actuating member; A cylindrical roller arranged horizontally on the base using a wheel shaft; and A spraying member is arranged above the cylindrical roller to spray a photoresist material on the cylindrical roller, wherein When the spray member sprays the photoresist material on the cylindrical roller, the first actuating member rotates the cylindrical roller at a first speed; and After the photoresist material is coated and sprayed on the cylindrical roller, the first actuating member rotates the cylindrical roller at a second speed to uniformly coat the photoresist material on the cylindrical roller, wherein the The second speed is higher than the first speed. The photoresist coating device according to claim 1, wherein the cylindrical roller is a cylindrical roller made of metal. The photoresist coating device according to claim 1, wherein the spray member has a spray head. The photoresist coating device according to claim 3, further comprising a second actuating member for horizontally moving the spray member above the cylindrical roller. The photoresist coating device according to claim 1, wherein the spray member has a plurality of spray heads. The photoresist coating device according to claim 5, wherein the plurality of spray heads are evenly distributed above the cylindrical roller. The photoresist coating device according to claim 1, wherein the first speed is 1 revolution/minute (RPM) to 500 revolutions/minute (RPM). The photoresist coating device according to claim 1, wherein the second speed is 100 revolutions per minute (RPM) to 3000 revolutions per minute (RPM).

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