CN211506165U - Photoresist coating device - Google Patents
Photoresist coating device Download PDFInfo
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- CN211506165U CN211506165U CN202020453191.8U CN202020453191U CN211506165U CN 211506165 U CN211506165 U CN 211506165U CN 202020453191 U CN202020453191 U CN 202020453191U CN 211506165 U CN211506165 U CN 211506165U
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Abstract
The utility model relates to a photoresist coating device, which is used for forming a photoresist layer on a substrate and comprises a substrate fixing component used for fixing a substrate; a rotating member horizontally disposed at least one of the engaging portions of the substrate holding member, wherein the rotating member is used to rotate or linearly move the substrate holding member; and a spraying member disposed above the substrate holding member and moving along a slide rail for spraying a photoresist material on the substrate to form a photoresist layer on the substrate, wherein the moving direction of the spraying member is perpendicular to the rotating direction of the substrate holding member or perpendicular to the linear moving direction of the substrate holding member. The device of the utility model can form a light resistance layer on various base materials, the formed light resistance layer also has better uniformity, and the film forming time can be shortened.
Description
Technical Field
The present invention relates to a photoresist coating apparatus, and more particularly to a photoresist coating apparatus capable of forming a photoresist layer on different substrates on different loading stages.
Background
In the prior art, referring to fig. 1 to 2, when a hologram pattern is to be transferred, a sheet-like hologram 11 is assembled on a roller 10, and a hologram grain pattern 21 on the hologram 11 is transferred onto a material 20, so that the material 20 has a corresponding hologram grain pattern 21. The transfer of the hologram grain 21 is performed in such a way that a gap 22 corresponding to the seam 12 of the hologram plate 11 is left between two adjacent hologram grains 21 on the transferred material 20. Therefore, the transferred material 20 is wasted greatly due to the existence of the gap 22 when the material 20 is used later. An improved technique is shown in fig. 3, which uses photoresist fabrication and development to transfer the pattern, wherein when forming the photoresist layer, the roller 10 is tilted, and the photoresist material is slowly coated on the roller 10 by means of drop coating (dispensing), such fabrication process takes ten days, and the coating uniformity is not very good.
In view of the above-mentioned shortcomings of the prior art structure, it is a very important objective to make a photoresist coating apparatus that is good in quality, cost-effective and suitable for hologram pattern transfer.
SUMMERY OF THE UTILITY MODEL
The utility model provides a photoresistance coating device for form a photoresistance layer to a substrate, in addition, this device is applicable to different substrate fixing component, and its structural integrity design can make the photoresistance more even and shorten the preparation time with coating, and then improves the product quality.
The utility model discloses a photoresistance coating device of an embodiment, which is used for forming a photoresistance layer on a substrate and comprises a substrate fixing component used for fixing the substrate; a rotating member horizontally disposed at least one engaging portion of the substrate holding member, wherein the rotating member is configured to rotate or linearly move the substrate holding member; and a spraying member disposed above the substrate holding member and moving along a slide rail for spraying a photoresist material on the substrate to form the photoresist layer on the substrate, wherein the moving direction of the spraying member is perpendicular to the rotating direction of the substrate holding member or perpendicular to the linear moving direction of the substrate holding member.
Preferably, the substrate holding member is a cylindrical roller, and the substrate is made of a metal material; and the engagement portion of the substrate holding member is locked and fixed to the rotating member.
Preferably, wherein the rotating member rotates the cylindrical roller at a first speed in a state where the spraying member sprays the photoresist material onto the substrate; after the photoresist material is coated and sprayed on the substrate, the rotating member rotates the cylindrical roller at a second speed to uniformly coat the photoresist material on the substrate, wherein the second speed is higher than the first speed.
Preferably, wherein the first speed is from 1 to 500 revolutions per minute; the second speed is from 100rpm to 3000 rpm.
Preferably, the substrate holding member is a cylindrical roller made of a metal material, and the substrate holding member is the substrate; and the engagement portion of the substrate holding member is locked and fixed to the rotating member.
Preferably, the rotating member rotates the cylindrical roller at a first speed in a state where the spraying member sprays the photoresist material onto the cylindrical roller; after the photoresist material is coated and sprayed on the cylindrical roller, the rotating member rotates the cylindrical roller at a second speed to uniformly coat the photoresist material on the cylindrical roller, wherein the second speed is higher than the first speed.
Preferably, wherein the first speed is from 1 to 500 revolutions per minute; the second speed is from 100rpm to 3000 rpm.
Preferably, the substrate holding member is a flat stage, and the rotating member is driven by power to rotate, so that the engaging portion contacting with the rotating member drives the substrate holding member to move linearly.
Preferably, the substrate is a wafer or a glass substrate.
Preferably, the plane carrying platform is arranged on a ground of the photoresist coating device in parallel, and the rotating member can drive the substrate holding member to move in parallel with the ground.
The utility model discloses an advantage and effect:
the utility model discloses a photoresistance coating unit for form a photoresistance layer to a substrate on, in addition, this device is applicable to different substrate fixing component, and its structural integrity design can make the photoresistance more even and shorten the preparation time with coating, and then improves the product quality.
Drawings
Fig. 1 to 3 are schematic views of the prior art of the present invention.
Fig. 4-1 is a schematic view of a photoresist coating apparatus according to an embodiment of the present invention.
Fig. 4-2 is a partial top view of fig. 4-1.
Fig. 5 is a schematic view of a photoresist coating apparatus according to another embodiment of the present invention.
Fig. 6-1 is a schematic view of a photoresist coating apparatus according to an embodiment of the present invention.
Fig. 6-2 is a partial top view of fig. 6-1.
Notation and description:
10. a roller;
11. a holographic plate;
12. seaming;
20. a material;
21. hologram grain pattern;
22. a gap;
100. a photoresist coating device;
110. a substrate holding member;
112. a joint portion;
120. a rotating member;
130. a spray member;
132. a sprinkler head;
140. a slide rail;
s, base material;
A. direction;
B. direction;
C. direction;
F. and (4) the ground.
Detailed Description
The purpose, technical content, features and technical effects of the present invention will be more readily understood from the following detailed description of the preferred embodiments taken in conjunction with the accompanying drawings. Various embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Aside from the details given herein, the invention is capable of broad application to other embodiments and other variations and modifications which are obvious to those skilled in the art are intended to be included within the scope of the invention as defined by the appended claims. In the description herein, numerous specific details are provided to provide a thorough understanding of the present invention to those skilled in the art; however, the present invention may be practiced without some or all of these specific details. In other instances, well-known steps or elements have not been described in detail so as not to unnecessarily obscure the present invention. The same or similar elements in the drawings will be denoted by the same or similar symbols. It is specifically noted that the drawings are merely schematic and do not represent actual sizes or numbers of elements, so that the drawings are concise and some of the details may not be fully described.
The utility model discloses a photoresistance coating unit 100 of an embodiment for form a photoresistance layer on a substrate S, photoresistance coating unit 100 includes: a substrate holding means 110, a rotating means 120 and a spraying means 130. The substrate holding means 110 is used to hold the substrate S, and in one embodiment, the substrate holding means 110 is a cylindrical roller or a flat table. The rotation member 120 is horizontally disposed at least one of the engaging portions 112 of the substrate holding member 110, wherein the rotation member 120 is configured to rotate or linearly move the substrate holding member 110. The spraying member 130 is disposed above the substrate holding member 110 and moves along a slide rail 140 to spray a photoresist material on the substrate S to form a photoresist layer on the substrate S, wherein the moving direction of the spraying member 130 is perpendicular to the rotating direction of the substrate holding member 110 or perpendicular to the linear moving direction of the substrate holding member 110. The details are described below with reference to the accompanying drawings.
Referring to the embodiment of fig. 4-1, the photoresist coating apparatus 100 includes: a substrate holding means 110, a rotating means 120 and a spraying means 130. The substrate holding member 110 is used for holding the substrate S, and in this embodiment, the substrate holding member 110 is a cylindrical roller, and the substrate S is made of metal material, and the substrate S is disposed on the cylindrical roller. The rotating member 120 is horizontally disposed on at least one engaging portion 112 of the substrate holding member 110. in this embodiment, the substrate holding member 110 has two engaging portions 112, the two engaging portions 112 are disposed on the left and right sides of the substrate holding member 110, respectively, and the engaging portions 112 of the substrate holding member 110 are locked and fixed on the rotating member 120 in a proper manner. In this embodiment, the rotating member 120 is powered to rotate the substrate holding member 110. The spray member 130 is disposed above the substrate holder 110 and moves along a slide rail 140, in this embodiment, the slide rail 140 is a linear slide rail, and the moving direction a of the spray member 130 is perpendicular to the rotating direction B of the substrate holder 110 (see also fig. 4-2).
As mentioned above, when the spraying member 130 sprays the photoresist material onto the substrate S, the rotating member 120 rotates the substrate holding member 110 (i.e., the cylindrical roller) at a first speed. After the photoresist material is coated and sprayed on the substrate S, the rotating member 120 rotates the substrate holding member 110 (i.e., the cylindrical roller) at a second speed to uniformly coat the photoresist material on the substrate S, wherein the second speed is higher than the first speed. In one embodiment, the first speed is 1RPM to 500RPM (i.e., 1RPM to 500RPM), and the second speed is 100RPM to 3000RPM (i.e., 100RPM to 3000RPM), where RPM is revolutions Per Minute (i.e., Round Per Minute). The embodiments shown in fig. 4-1 and 4-2 include, but are not limited to, use of hologram pattern transfer in seamless plate making. The utility model discloses multi-functional photoresistance coating unit 100 of utensil can make the photoresist coating ground more even and shorten the preparation time, also can make thinner photoresist film.
In one embodiment, the spray member 130 has a spray head 132, and the spray member 130 moves horizontally above the substrate holder 110 (i.e., the cylindrical roller) to facilitate more uniform spraying of the photoresist material on the substrate S.
It is understood that, in another embodiment, referring to FIG. 5, the shower member 130 has a plurality of shower heads 132, the plurality of shower heads 132 being disposed above the substrate holding member 110 (i.e., cylindrical roller).
In the above example, the substrate holding member 110 may also be a cylindrical roller made of metal, that is, the substrate holding member 110 is the substrate S, and the photoresist is directly sprayed on the substrate holding member 110 (i.e., the cylindrical roller).
In yet another embodiment, as shown in FIG. 6-1, wherein the substrate holding means 110 is a flat-surface stage, the substrate S held on the flat-surface stage includes, but is not limited to, a wafer or a glass substrate. The rotating member 120 is driven by power to rotate, so that the engaging portion 112 contacting the rotating member 120 drives the substrate holding member 110 to move linearly. In this embodiment, referring to fig. 6-2, the slide rail 140 is a linear slide rail, and the moving direction a of the spray member 130 is perpendicular to the moving direction C of the substrate holder 110. In one embodiment, the flat-surface stage is mounted in parallel on a floor surface F of the photoresist coating apparatus 100, and the rotating member 120 can drive the substrate holding member 110 to move parallel to the floor surface F. By using the relative movement between the spraying member 130 and the substrate holding member 110, the photoresist material can be more uniformly sprayed on the substrate S.
In view of the above, the multifunctional photoresist coating apparatus 100 of the present invention utilizes the spraying head 132 to spray the photoresist material onto the substrate S, so as to make the photoresist film more uniform and faster, and greatly reduce the manufacturing time. In addition, the shower head 132 forms the photoresist film by spraying, and thus, the photoresist film is less likely to be striped and peeled off. In addition, the section size and the length of the cylindrical roller are more flexible, and different designs can be made according to requirements. Because the quality of the photoresist film is improved, the overall manufacturing yield of the hologram pattern transfer is improved, and the manufacturing cost is greatly reduced. In addition, the form of the substrate holding member 110 can be changed based on different substrates S, making the apparatus more flexible in use.
In summary, the present invention discloses a multifunctional photoresist coating device 100 for forming a photoresist layer on a substrate S, and in addition, the device is suitable for different substrate fixing members 110, and the overall structure design thereof can make the photoresist coating more uniform and shorten the manufacturing time, thereby improving the product quality.
The above-mentioned embodiments are only for illustrating the technical ideas and features of the present invention, and the purpose thereof is to enable those skilled in the art to understand the contents of the present invention and to implement the present invention, so as not to limit the protection scope of the present invention, i.e. the scope of the present invention should be covered by the claims of the present invention as long as the same changes or modifications are made according to the spirit of the present invention.
Claims (10)
1. A photoresist coating apparatus for forming a photoresist layer on a substrate, comprising:
a substrate holding member for holding the substrate;
a rotating member horizontally disposed at least one engaging portion of the substrate holding member, wherein the rotating member is used to rotate or linearly move the substrate holding member; and
and the spraying component is arranged above the substrate holding component and moves along a slide rail to spray a photoresist material on the substrate so as to form the photoresist layer on the substrate, wherein the moving direction of the spraying component is vertical to the rotating direction of the substrate holding component or the linear moving direction of the substrate holding component.
2. The photoresist coating apparatus of claim 1, wherein the substrate holding member is a cylindrical roller, and the substrate is a substrate made of metal; and the engagement portion of the substrate holding member is locked and fixed to the rotating member.
3. The resist coating apparatus according to claim 2, wherein the rotating member rotates the cylindrical roller at a first speed in a state where the spraying member sprays the resist material onto the substrate; after the photoresist material is coated and sprayed on the substrate, the rotating member rotates the cylindrical roller at a second speed to uniformly coat the photoresist material on the substrate, wherein the second speed is higher than the first speed.
4. The photoresist coating apparatus of claim 3, wherein the first speed is 1 to 500 revolutions per minute; and the second speed is from 100rpm to 3000 rpm.
5. The photoresist coating apparatus of claim 1, wherein the substrate holding member is a cylindrical roller made of a metal material, and the substrate holding member is the substrate; and the engagement portion of the substrate holding member is locked and fixed to the rotating member.
6. The resist coating apparatus according to claim 5, wherein the rotating member rotates the cylindrical roller at a first speed in a state where the spraying member sprays the resist material onto the cylindrical roller; after the photoresist material is coated and sprayed on the cylindrical roller, the rotating member rotates the cylindrical roller at a second speed to uniformly coat the photoresist material on the cylindrical roller, wherein the second speed is higher than the first speed.
7. The photoresist coating apparatus of claim 6, wherein the first speed is 1 to 500 revolutions per minute; and the second speed is from 100rpm to 3000 rpm.
8. The photoresist coating apparatus of claim 1, wherein the substrate holding member is a flat stage, and the rotating member is driven to rotate by power so that the engaging portion contacting the rotating member moves the substrate holding member linearly.
9. The photoresist coating apparatus of claim 8, wherein the substrate is a wafer or a glass substrate.
10. The photoresist coating apparatus of claim 8, wherein the planar stage is mounted parallel to a floor of the photoresist coating apparatus, and the rotating member is capable of moving the substrate holding member parallel to the floor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020453191.8U CN211506165U (en) | 2020-04-01 | 2020-04-01 | Photoresist coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020453191.8U CN211506165U (en) | 2020-04-01 | 2020-04-01 | Photoresist coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211506165U true CN211506165U (en) | 2020-09-15 |
Family
ID=72403563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020453191.8U Active CN211506165U (en) | 2020-04-01 | 2020-04-01 | Photoresist coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211506165U (en) |
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2020
- 2020-04-01 CN CN202020453191.8U patent/CN211506165U/en active Active
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