CN211264067U - Hologram pattern transfer device - Google Patents
Hologram pattern transfer device Download PDFInfo
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- CN211264067U CN211264067U CN201922361783.7U CN201922361783U CN211264067U CN 211264067 U CN211264067 U CN 211264067U CN 201922361783 U CN201922361783 U CN 201922361783U CN 211264067 U CN211264067 U CN 211264067U
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- cylindrical metal
- metal roller
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Abstract
The utility model relates to a hologram pattern transfer device, which comprises a working carrier, a cylindrical metal roller, a photoresist spraying module, a micro-image making module and an electrochemical processing etching module. The work stage has a first actuating member. The cylindrical metal roller is horizontally arranged above the working carrier, and the first actuating component is used for rotating the cylindrical metal roller. The photoresist spraying module is used for spraying a photoresist material on the cylindrical metal roller and forming a photoresist layer on the cylindrical metal roller. The micro-image making module is used for converting the photoresist layer arranged on the cylindrical metal roller into a patterned photoresist layer. And the electrochemical processing etching module is used for transferring the pattern of the patterned photoresist layer to the cylindrical metal roller. The utility model discloses full image pattern transfer device can improve the homogeneity of coating and shorten the preparation time.
Description
Technical Field
The present invention relates to a pattern transfer device, and more particularly to a hologram pattern transfer device.
Background
In the prior art, referring to fig. 1 to 2, when a hologram pattern is to be transferred, a sheet-like hologram 11 is assembled on a roller 10, and a hologram grain pattern 21 on the hologram 11 is transferred onto a material 20, so that the material 20 has a corresponding hologram grain pattern 21. The transfer of the hologram grain 21 is performed in such a way that a gap 22 corresponding to the seam 12 of the hologram plate 11 is left between two adjacent hologram grains 21 on the transferred material 20. Therefore, the transferred material 20 is wasted greatly due to the existence of the gap 22 when the material 20 is used later. An improved technique is shown in fig. 3, which uses photoresist fabrication and development to transfer the pattern, wherein when forming the photoresist layer, the roller 10 is tilted, and the photoresist material is slowly coated on the roller 10 by means of drop coating (dispensing), such fabrication process takes ten days, and the coating uniformity is not very good.
In view of the above-mentioned shortcomings of the prior art, it is a very important objective to make a hologram pattern transfer device with good quality, cost-effective and suitable for hologram.
SUMMERY OF THE UTILITY MODEL
The utility model provides a hologram pattern transfer device for on directly shifting a hologram pattern to the metal gyro wheel, not only make the pattern more even and shorten the preparation time, and then improve the final product quality.
The utility model discloses a hologram pattern transfer device of an embodiment, which comprises a working carrier with a first actuating component; the first actuating component is used for rotating the cylindrical metal roller; a photoresist spraying module for spraying a photoresist material on the cylindrical metal roller and forming a photoresist layer on the cylindrical metal roller; a micro-image making module for converting the photoresist layer arranged on the cylindrical metal roller into a patterned photoresist layer; and an electrochemical processing etching module for transferring a pattern of the patterned photoresist layer onto the cylindrical metal roller.
Preferably, wherein the cylindrical metal roller is a cylindrical metal roller made of tin, lead, zinc, aluminum, copper, brass, iron, nickel, stainless steel, cobalt, tungsten, chromium, or a metal having a hardness greater than that of chromium.
Preferably, wherein the photoresist spray module has a shower head.
Preferably, the photoresist spraying device further comprises a second actuating member for horizontally moving the photoresist spraying module above the cylindrical metal roller.
Preferably, wherein the photoresist shower module has a plurality of shower heads.
Preferably, the plurality of spray heads are uniformly arranged above the cylindrical metal roller.
Preferably, the lithography module comprises a laser exposure device and a developing device to form the patterned photoresist layer.
Preferably, the electrochemical etching module comprises an electrolytic bath loaded with an electrolyte, and the electrochemical etching module can perform an electrolytic etching step to transfer the pattern of the patterned photoresist layer onto the cylindrical metal roller in a state where the cylindrical metal roller is placed in the electrolytic bath.
Preferably, wherein the electrolytic cell is a vertical electrolytic cell.
Preferably, the electrolytic cell is a horizontal electrolytic cell.
The utility model discloses a hologram pattern transfer device's advantage and effect are: not only the pattern is more uniform and the manufacturing time is shortened, but also the quality of the final product is improved.
Drawings
FIGS. 1 to 3 are schematic views of the prior art;
fig. 4 is a block diagram of a hologram pattern transferring apparatus according to an embodiment of the present invention;
fig. 5A and 5B are schematic views of a hologram pattern transferring apparatus according to an embodiment of the present invention;
fig. 6A and 6B are schematic views of a hologram pattern transferring apparatus according to another embodiment of the present invention;
fig. 6C is a schematic diagram of a patterned photoresist layer according to an embodiment of the present invention;
fig. 7A, 7B and 7D are schematic views of a hologram pattern transferring apparatus according to another embodiment of the present invention;
fig. 7C is a schematic diagram of forming a hologram pattern on the cylindrical metal roller after etching according to an embodiment of the present invention.
Reference numerals and description:
10. a roller;
11. a holographic plate;
12. seaming;
20. a material;
21. hologram grain pattern;
22. a gap;
100. a hologram pattern transfer device;
110. a working platform deck;
112. a first actuating member;
114. a second actuating member;
120. a cylindrical metal roller;
130. a photoresist spraying module;
132. a sprinkler head;
140. a lithography manufacturing module;
142. a laser exposure means;
144. a developing member;
150. an electrochemical machining etching module;
152. an electrolytic cell;
154. an anode;
156. a cathode;
PR1, photoresist layer;
PR2, patterning photoresist layer;
Detailed Description
The purpose, technical content, features and technical effects of the present invention will be more readily understood from the following detailed description of the preferred embodiments taken in conjunction with the accompanying drawings.
Various embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Aside from the details given herein, the invention is capable of broad application to other embodiments and other variations and modifications which are obvious to those skilled in the art are intended to be included within the scope of the invention as defined by the appended claims. In the description herein, numerous specific details are provided to provide a thorough understanding of the present invention to those skilled in the art; however, the present invention may be practiced without some or all of these specific details. In other instances, well-known steps or elements have not been described in detail so as not to unnecessarily obscure the present invention. The same or similar elements in the drawings will be denoted by the same or similar symbols. It is specifically noted that the drawings are merely schematic and do not represent actual sizes or numbers of elements, so that the drawings are concise and some of the details may not be fully described.
Referring to fig. 4, fig. 5A and fig. 5B, a hologram pattern transferring apparatus 100 according to an embodiment of the present invention includes: a work stage 110, a cylindrical metal roller 120, a photoresist spray module 130, a lithography module 140, and an electrochemical machining etch module 150. The work stage 110 has a first actuating member 112. In one embodiment, the cylindrical metal roller 120 is made of metal. In one embodiment, the cylindrical metal roller 120 is made of a material including, but not limited to, tin, lead, zinc, aluminum, copper, brass, iron, nickel, stainless steel, cobalt, tungsten, chromium, and metals having a hardness greater than that of chromium.
As shown in fig. 5A, the cylindrical metal roller 120 is disposed on the work stage 110, and in one embodiment, the photoresist spraying module 130 is disposed above the cylindrical metal roller 120, wherein when the photoresist spraying module 130 sprays the photoresist material onto the cylindrical metal roller 120, the first actuating member 112 rotates the cylindrical metal roller 120 to uniformly coat the photoresist material onto the cylindrical metal roller 120, so as to form a photoresist layer PR 1. The utility model discloses a photoresistance sprays module 130, can make the photoresistance more even and shorten the preparation time with coating, also can produce thinner photoresist film.
In one embodiment, the photoresist shower module 130 has a shower head 132. The hologram pattern transferring apparatus 100 further includes a second actuating member 114 for horizontally moving the photoresist spray module 130 above the cylindrical metal roller 120 to facilitate more uniform spraying of the photoresist material on the cylindrical metal roller 120. It is understood that, in another embodiment, referring to fig. 5B, the photoresist shower module 130 has a plurality of showerheads 132, wherein the showerheads 132 may be uniformly disposed over the cylindrical metal roller 120.
Referring to fig. 6A and 6B, the photolithography module 140 includes a laser exposure device 142 and a developing device 144, which are used to pattern the photoresist layer PR1 disposed on the cylindrical metal roller 120 in a suitable manner, such as photolithography (e.g., to form the patterned photoresist layer PR2 shown in fig. 6C). In addition, the cylindrical metal roller 120 having the patterned photoresist layer PR2 is processed by the electrochemical machining etching module 150. Referring to fig. 7A, the electrochemical machining etching module 150 includes an electrolytic bath 152, in this embodiment, the electrolytic bath 152 is a horizontal type electrolytic bath, the electrolytic bath 152 is loaded with an electrolyte for performing an electrolytic etching step in a state that the cylindrical metal roller 120 is placed in the electrolytic bath 152, and in one embodiment, as shown in fig. 7B, an anode 154 is disposed on the outer circumferential surface of the cylindrical metal roller 120, and a cathode 156 is disposed in the electrolytic bath 152, so as to directly transfer the pattern of the patterned photoresist layer PR2 to the cylindrical metal roller 120, i.e., to etch the pattern of the patterned photoresist layer PR2 on the outer surface of the cylindrical metal roller 120, as shown in fig. 7C. In another embodiment, as shown in fig. 7D, it is understood that the electrolytic cell 152 may be disposed vertically, i.e. the electrolytic cell 152 is a vertical electrolytic cell.
In view of the above, the hologram pattern transferring apparatus 100 according to the present invention, which utilizes the spraying head 132 to spray the photoresist material onto the substrate (i.e. the cylindrical metal roller 120), not only the photoresist film is more uniform and the whole manufacturing process is faster, but also the whole manufacturing time of the hologram pattern transfer can be greatly reduced from 30 days to 5 days. In addition, the shower head 132 forms a photoresist film that is less likely to be striped and less likely to be peeled. In addition, the sectional dimension and length of the cylindrical metal roller 120 are more flexible, and can be designed differently according to the requirements. Because the quality of the photoresist film is improved, the overall manufacturing yield of the hologram pattern transfer is improved, and the manufacturing cost is greatly reduced.
In summary, the utility model discloses a hologram pattern transfer device 100 for on directly shifting a hologram pattern to cylindrical metal gyro wheel 120, not only make the pattern more even and shorten the preparation time, and then improve the final product quality.
The above-mentioned embodiments are only for illustrating the technical ideas and features of the present invention, and the purpose thereof is to enable those skilled in the art to understand the contents of the present invention and to implement the present invention, so as not to limit the protection scope of the present invention, i.e. the scope of the present invention should be covered by the claims of the present invention as long as the same changes or modifications are made according to the spirit of the present invention.
Claims (10)
1. A hologram pattern transfer device, comprising:
a working carrier having a first actuating member;
the first actuating component is used for rotating the cylindrical metal roller;
a photoresist spraying module for spraying a photoresist material on the cylindrical metal roller and forming a photoresist layer on the cylindrical metal roller;
a micro-image making module for converting the photoresist layer arranged on the cylindrical metal roller into a patterned photoresist layer; and
and the electrochemical processing etching module is used for transferring a pattern of the patterned photoresist layer to the cylindrical metal roller.
2. The hologram pattern transfer device according to claim 1, wherein the cylindrical metal roller is a cylindrical metal roller made of tin, lead, zinc, aluminum, copper, brass, iron, nickel, stainless steel, cobalt, tungsten, chromium, or a metal having a hardness greater than that of chromium.
3. The hologram pattern transfer device according to claim 1, wherein said photoresist shower module has a shower head.
4. The hologram pattern transfer device according to claim 3, further comprising a second actuating member for moving said photoresist shower module horizontally above said cylindrical metal roller.
5. The hologram pattern transfer device according to claim 1, wherein said photoresist shower module has a plurality of shower heads.
6. The hologram pattern transfer device according to claim 5, wherein said plurality of showerheads are uniformly disposed above said cylindrical metal roller.
7. The apparatus according to claim 1, wherein the lithography module comprises a laser exposure means and a developing means to form the patterned photoresist layer.
8. The hologram pattern transfer device according to claim 1, wherein said electrochemical machining etching module comprises an electrolytic bath loaded with an electrolyte, said electrochemical machining etching module being capable of performing an electrolytic etching step to transfer said pattern of said patterned photoresist layer to said cylindrical metal roller in a state where said cylindrical metal roller is placed in said electrolytic bath.
9. The hologram pattern transfer device according to claim 8, wherein said electrolytic bath is a vertical electrolytic bath.
10. The hologram pattern transfer device according to claim 8, wherein said electrolytic bath is a horizontal type electrolytic bath.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922361783.7U CN211264067U (en) | 2019-12-25 | 2019-12-25 | Hologram pattern transfer device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922361783.7U CN211264067U (en) | 2019-12-25 | 2019-12-25 | Hologram pattern transfer device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211264067U true CN211264067U (en) | 2020-08-14 |
Family
ID=71956486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922361783.7U Active CN211264067U (en) | 2019-12-25 | 2019-12-25 | Hologram pattern transfer device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211264067U (en) |
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2019
- 2019-12-25 CN CN201922361783.7U patent/CN211264067U/en active Active
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