TWM543995U - Chip burning test equipment - Google Patents

Chip burning test equipment Download PDF

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Publication number
TWM543995U
TWM543995U TW106200679U TW106200679U TWM543995U TW M543995 U TWM543995 U TW M543995U TW 106200679 U TW106200679 U TW 106200679U TW 106200679 U TW106200679 U TW 106200679U TW M543995 U TWM543995 U TW M543995U
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Taiwan
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carrier
wafer
wafers
probe card
test apparatus
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TW106200679U
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Chinese (zh)
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Chung-Yi Lin
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Flatek Inc
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Priority to TW106200679U priority Critical patent/TWM543995U/en
Publication of TWM543995U publication Critical patent/TWM543995U/en

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Description

晶片燒錄測試設備Wafer burning test equipment

本新型係關於一種晶片燒錄測試設備及方法,特別是一種可同步測試、燒錄或預燒測試多顆晶片之晶片燒錄測試設備及方法。 The present invention relates to a wafer burning test apparatus and method, and more particularly to a wafer burning test apparatus and method for simultaneously testing, burning or pre-burning a plurality of wafers.

拜積體電路(Integrated Circuit,IC)技術發展所賜,使得電子產品體積越來越小型化,不僅便利人們攜帶,也提供強大的運算處理功能。晶片在製程上,需要經過多道繁雜的手續,成品製作完成後,進一步地需將特定功能的程式資料燒錄到晶片中,以使晶片可以實現特定功能。 Thanks to the development of integrated circuit (IC) technology, the volume of electronic products is becoming smaller and smaller, which not only facilitates people to carry, but also provides powerful arithmetic processing functions. In the process of the wafer, a lot of complicated procedures are required. After the finished product is finished, the program data of the specific function needs to be further burned into the wafer, so that the wafer can achieve a specific function.

目前晶片在程式燒錄上,燒錄的載具一次僅能放置單顆晶片。雖然將多個載具集合併用,可實現同步多顆燒錄,但由於燒錄時,需將各顆晶片個別放置到載具上,需費不少時間,尤其遇有大量晶片待燒錄時,將造成大量時間成本的浪費。 At present, the wafer is programmed, and the burned carrier can only place a single wafer at a time. Although multiple vehicles are used in combination to achieve simultaneous multi-programming, it takes a lot of time to place individual wafers on the carrier during burning, especially when a large number of wafers are to be burned. Will cause a lot of time and cost.

本新型之主要目的係在提供一種可同步燒錄或測試多顆晶片之燒錄測試設備及方法。 The main purpose of the present invention is to provide a burning test apparatus and method for simultaneously burning or testing a plurality of wafers.

為達成上述之目的,本新型之晶片燒錄測試設備用以燒錄或測試複數晶片,其中複數晶片可被放置於一托盤,且各具有複數接腳。本新型之晶片燒錄測試設備包括有基座、載盤、探針板、放置架、驅動機構以及主機裝置。載盤可疊置在托盤上,並能在疊置後藉由同時翻轉托盤與載盤而使複數晶片倒置在載盤之上,使得各晶片之複數接腳背向載盤。探針板係安設於基座上,探針板包括複數探針。放置架係設置於基座上,放置架用以提供載盤放置後對應探針板,以使複數接腳可對準複數探針。驅動機構係設置於基座上,驅動機構用以移動探針板或載盤,以使倒置在載盤上的複數晶片之複數接腳其中之一接腳接觸各探針。主機裝置係與探針板電性連接,主機裝置用以在接腳接觸各探針時,對複數晶片進行測試或資料燒錄。 To achieve the above objects, the wafer burning test apparatus of the present invention is used to burn or test a plurality of wafers, wherein the plurality of wafers can be placed in a tray and each has a plurality of pins. The novel wafer burning test apparatus includes a base, a carrier, a probe card, a mounting frame, a driving mechanism, and a host device. The carrier can be stacked on the tray and can be flipped over the carrier by flipping the tray and the carrier simultaneously after stacking such that the plurality of pins of each wafer are facing away from the carrier. The probe plate is mounted on the base, and the probe plate includes a plurality of probes. The placement frame is disposed on the base, and the placement frame is configured to provide a corresponding probe plate after the carrier is placed, so that the plurality of pins can be aligned with the plurality of probes. The driving mechanism is disposed on the base, and the driving mechanism is configured to move the probe card or the carrier such that one of the plurality of pins of the plurality of wafers inverted on the carrier contacts the probes. The host device is electrically connected to the probe card, and the host device is configured to test or data the plurality of wafers when the pins contact the probes.

根據本新型之一實施例,所述放置架包括有滑軌機構,載盤係可拆卸地與滑軌機構結合,並透過滑軌機構而於放置架上位移。 According to an embodiment of the present invention, the placement rack includes a slide rail mechanism that is detachably coupled to the slide rail mechanism and displaced on the placement rack by the slide rail mechanism.

根據本新型之一實施例,所述驅動機構為一氣壓缸。 According to an embodiment of the invention, the drive mechanism is a pneumatic cylinder.

根據本新型之一實施例,所述探針板及載盤之數量皆為複數,且各載盤置於放置架後,各自對應不同的探針板。 According to an embodiment of the present invention, the number of the probe card and the carrier are all plural, and each carrier is placed on the placement frame, and each corresponds to a different probe card.

根據本新型之一實施例,所述各載盤置於放置架後,複數載盤與複數探針板係相互交錯排列成一直線。 According to an embodiment of the present invention, after the respective carriers are placed on the placement rack, the plurality of carriers and the plurality of probe boards are staggered in a line.

根據本新型之一實施例,本新型之晶片燒錄測試設備更包括有可用以提供一測試溫度之溫度調節箱體,以使主機裝置在接腳接觸各探針時,更能用以對複數晶片進行預燒測試。 According to an embodiment of the present invention, the wafer burning test apparatus of the present invention further includes a temperature adjustment box that can be used to provide a test temperature, so that the host device can be used for the plural when the pins contact the probes. The wafer was subjected to a burn-in test.

本新型另外揭示一種晶片燒錄測試方法,被應用於用以燒錄或測試複數晶片之晶片燒錄測試設備,其中複數晶片可被放置於一托盤上,且各具有複數接腳。所述晶片燒錄測試設備包括有載盤及探針板,其中探針板包括複數探針。本新型之晶片燒錄測試方法包括下列步驟:將載盤疊置在托盤上,並在疊置後同時翻轉該托盤與載盤,以使複數晶片倒置在載盤上,使得各晶片之複數接腳背向載盤;使載盤對應探針板,以使複數接腳之其中一接腳可對準各探針;移動探針板或載盤,以使複數接腳之其中一接腳接觸各探針;以及,當晶片之接腳接觸探針時,對複數晶片進行測試或資料燒錄。 The present invention further discloses a wafer burn test method for use in a wafer burn test apparatus for burning or testing a plurality of wafers, wherein the plurality of wafers can be placed on a tray and each has a plurality of pins. The wafer burning test apparatus includes a carrier disk and a probe card, wherein the probe card includes a plurality of probes. The wafer burning test method of the present invention comprises the steps of: stacking the carrier on the tray, and flipping the tray and the carrier simultaneously after stacking, so that the plurality of wafers are inverted on the carrier, so that the plurality of wafers are connected The back of the foot is facing the carrier; the carrier is corresponding to the probe card so that one of the plurality of pins can be aligned with each probe; the probe card or the carrier is moved so that one of the plurality of pins contacts each of the pins a probe; and, when the pins of the wafer contact the probe, test or data burn the plurality of wafers.

根據本新型之一實施例,所述探針板及載盤之數量皆為複數,且使載盤對應探針板之步驟係使各載盤分別對應不同的探針板。 According to an embodiment of the present invention, the number of the probe card and the carrier are plural, and the step of the carrier corresponding to the probe card is such that each carrier corresponds to a different probe card.

根據本新型之一實施例,所述各載盤分別對應不同的探針板之步驟係使複數載盤與複數探針板相互交錯排列成一直線。 According to an embodiment of the present invention, the steps of the respective carriers corresponding to different probe cards are such that the plurality of carriers and the plurality of probe cards are staggered in a line.

根據本新型之一實施例,本新型之晶片燒錄測試方法更包括有下列步驟:提供測試溫度,並在該測試溫度下對複數晶片進行預燒測試。 According to an embodiment of the present invention, the wafer burning test method of the present invention further comprises the steps of: providing a test temperature, and performing a burn-in test on the plurality of wafers at the test temperature.

1‧‧‧晶片燒錄測試設備 1‧‧‧ wafer burning test equipment

10‧‧‧基座 10‧‧‧ Pedestal

20‧‧‧載盤 20‧‧‧Package

30‧‧‧探針板 30‧‧‧Probe board

31‧‧‧探針 31‧‧‧ probe

40‧‧‧放置架 40‧‧‧Place rack

41‧‧‧滑軌機構 41‧‧‧Slide rail mechanism

50‧‧‧驅動機構 50‧‧‧ drive mechanism

51‧‧‧把手桿 51‧‧‧Handlebar

511‧‧‧第一端 511‧‧‧ first end

513‧‧‧第二端 513‧‧‧ second end

53‧‧‧連動桿 53‧‧‧ linkage rod

55‧‧‧驅動件 55‧‧‧ drive parts

R‧‧‧導軌 R‧‧‧rail

60‧‧‧主機裝置 60‧‧‧ host device

61‧‧‧控制器 61‧‧‧ Controller

62‧‧‧記憶體 62‧‧‧ memory

70‧‧‧控制裝置 70‧‧‧Control device

90‧‧‧晶片 90‧‧‧ wafer

91‧‧‧接腳 91‧‧‧ pins

T‧‧‧托盤 T‧‧‧Tray

F‧‧‧治具 F‧‧‧ fixture

A‧‧‧對位結構 A‧‧‧ alignment structure

L‧‧‧傳輸線 L‧‧‧ transmission line

圖1係本新型第一實施例之晶片燒錄測試設備之俯視圖。 1 is a plan view of a wafer burning test apparatus of a first embodiment of the present invention.

圖2係本新型第一實施例之晶片燒錄測試設備之後視圖。 Figure 2 is a rear elevational view of the wafer burning test apparatus of the first embodiment of the present invention.

圖3A係表示裝載晶片之托盤放置在治具之示意圖。 Fig. 3A is a schematic view showing that a tray on which a wafer is loaded is placed on a jig.

圖3B係表示將載盤疊置到托盤上之示意圖。 Fig. 3B is a schematic view showing the stacking of the carrier on the tray.

圖3C係表示同時翻轉載盤與托盤之示意圖。 Figure 3C is a schematic view showing the simultaneous flipping of the carrier and the tray.

圖3D係表示晶片倒置於載盤上之示意圖。 Figure 3D is a schematic illustration of the wafer being placed on a carrier.

圖4係本新型第一實施例之晶片燒錄測試設備之前視圖。 Figure 4 is a front elevational view of the wafer burning test apparatus of the first embodiment of the present invention.

圖5係本新型第一實施例之晶片燒錄測試設備之側視圖。 Figure 5 is a side elevational view of the wafer burning test apparatus of the first embodiment of the present invention.

圖6係表示圖5所示A部分之放大示意圖。 Fig. 6 is an enlarged schematic view showing a portion A shown in Fig. 5.

圖7係本新型之晶片燒錄測試設備之驅動機構另一實施方式之示意圖,表示驅動機構移動載盤前之示意。 Fig. 7 is a schematic view showing another embodiment of the driving mechanism of the wafer burning test apparatus of the present invention, showing an outline of the driving mechanism before moving the carrier.

圖8係本新型之晶片燒錄測試設備之驅動機構另一實施方式之示意圖,表示驅動機構移動載盤後之示意。 Fig. 8 is a schematic view showing another embodiment of the driving mechanism of the wafer burning test apparatus of the present invention, showing the driving mechanism after moving the carrier.

圖9係本新型第二實施例之晶片燒錄測試設備之前視圖。 Figure 9 is a front elevational view of the wafer burning test apparatus of the second embodiment of the present invention.

圖10係本新型第三實施例之晶片燒錄測試設備之前視圖。 Figure 10 is a front elevational view of the wafer burning test apparatus of the third embodiment of the present invention.

圖11係本新型之晶片燒錄測試方法之步驟流程圖。 Figure 11 is a flow chart showing the steps of the wafer burning test method of the present invention.

為能讓 貴審查委員能更瞭解本新型之技術內容,特舉較佳具體實施例說明如下。 In order to enable the reviewing committee to better understand the technical content of the present invention, the preferred embodiments are described below.

以下請一併參考圖1至圖9。其中圖1係本新型第一實施例之晶片燒錄測試設備之俯視圖;圖2係本新型第一實施例之晶片燒錄測試設備之後視圖;圖3A係表示裝載晶片之托盤放置在治具之示意圖;圖3B係表示將載盤疊置到托盤上之示意圖;圖3C係表示同時翻轉載盤與托盤之示意圖;圖3D係表示晶片倒置於載盤上之示意圖;圖4係本新型第一實施例之晶片燒錄測試設備之前視圖;圖5係本新型第一實施例之晶片燒錄測試設備之側視圖;圖6係表示圖5所示A部分之放大示意圖;圖7係本新型之晶片燒錄測試設備之驅動機構另一實施方式之示意圖,表示驅動機構移動載盤前之示意;圖8係本新型之晶片燒錄測試設備之 驅動機構另一實施方式之示意圖,表示驅動機構移動載盤後之示意。 Please refer to Figure 1 to Figure 9 below. 1 is a plan view of a wafer burning test apparatus according to a first embodiment of the present invention; FIG. 2 is a rear view of the wafer burning test apparatus of the first embodiment of the present invention; and FIG. 3A is a tray for loading a wafer placed in a jig. 3B is a schematic view showing the stacking of the carrier on the tray; FIG. 3C is a schematic view showing the tray and the tray being flipped simultaneously; FIG. 3D is a schematic view showing the wafer being placed on the carrier; FIG. The front view of the wafer burning test apparatus of the embodiment; FIG. 5 is a side view of the wafer burning test apparatus of the first embodiment of the present invention; FIG. 6 is an enlarged schematic view of the portion A shown in FIG. 5; A schematic diagram of another embodiment of a driving mechanism of a wafer burning test device, which is a schematic diagram of a driving mechanism before moving a carrier; FIG. 8 is a chip burning test device of the present invention. A schematic view of another embodiment of the drive mechanism, showing the drive mechanism after moving the carrier.

如圖1及圖2所示,在本新型之第一實施例中,本新型之晶片燒錄測試設備1可用以同時對複數晶片90進行測試(testing)或資料燒錄(programming),其中各晶片90具有複數接腳91。在本新型之第一實施例中,晶片燒錄測試設備1包括有基座10、載盤20、探針板30、放置架40、驅動機構50、主機裝置60及控制裝置70。 As shown in FIG. 1 and FIG. 2, in the first embodiment of the present invention, the wafer burning test apparatus 1 of the present invention can be used for simultaneously testing or programming a plurality of wafers 90, wherein each Wafer 90 has a plurality of pins 91. In the first embodiment of the present invention, the wafer burning test apparatus 1 includes a base 10, a carrier 20, a probe card 30, a placement frame 40, a drive mechanism 50, a host device 60, and a control device 70.

如圖1及圖3A-D所示,在本新型之第一實施例中,複數晶片90可先被各自固定地放置於托盤T之凹槽(圖未標號)中,更進一步而言,此處的托盤T為習知常見用於承載晶片90之托盤(tray),係為保護晶片90在運送過程不會被損壞。在本新型之實施例中,承載多顆晶片90的托盤T可被固定放置於一特製治具F上(如圖3A所示),接著,載盤20可疊置於托盤T上(如圖3B所示),並藉由特製治具F上的對位結構A,使得載盤20疊置時朝向托盤T的複數容置槽(圖未示)可一一正對托盤T之凹槽,而使各晶片90容置在容置槽與凹槽共同形成的空間中。最後,在將載盤20疊置於後托盤T上後,藉由同時翻轉托盤T與載盤20約一百八十 度(如圖3C所示),複數晶片90便可倒置在載盤20的各容置槽中,使得各晶片90之複數接腳91背向載盤20。翻轉後,將托盤T自載盤20上移開,便可見到各晶片90之接腳91朝上外露(如圖3D)。 As shown in FIG. 1 and FIG. 3A-D, in the first embodiment of the present invention, the plurality of wafers 90 can be first fixedly placed in the grooves (not shown) of the tray T, and further, this The tray T at the point is a conventional tray for carrying the wafer 90, so that the wafer 90 is protected from damage during transportation. In the embodiment of the present invention, the tray T carrying the plurality of wafers 90 can be fixedly placed on a special fixture F (as shown in FIG. 3A), and then the carrier tray 20 can be stacked on the tray T (as shown in the figure). 3B), and by the alignment structure A on the special fixture F, the plurality of accommodating grooves (not shown) facing the tray T when the carrier 20 is stacked can face the grooves of the tray T one by one. The wafers 90 are accommodated in a space formed by the accommodating grooves and the grooves. Finally, after stacking the carrier 20 on the rear tray T, by flipping the tray T and the carrier 20 simultaneously, about one hundred and eighty The plurality of wafers 90 can be inverted in the respective receiving grooves of the carrier 20 such that the plurality of pins 91 of the respective wafers 90 face away from the carrier 20 by a degree (as shown in FIG. 3C). After the flipping, the tray T is removed from the loading tray 20, and it can be seen that the pins 91 of the respective wafers 90 are exposed upward (Fig. 3D).

如圖1、圖4及圖5所示,在本新型之第一實施例中,探針板30被設置於基座10上,此處的基座10可為桌面或其他可供固定之物件,包含地面。探針板30包括有複數探針31,探針31係由金屬導體所製成。 As shown in FIG. 1, FIG. 4 and FIG. 5, in the first embodiment of the present invention, the probe card 30 is disposed on the base 10, where the base 10 can be a table top or other objects that can be fixed. , including the ground. The probe card 30 includes a plurality of probes 31 made of a metal conductor.

如圖1及圖2所示,在本新型之第一實施例中,放置架40係設置於基座10上,放置架40用以供載盤20放置於其上。放置架40設有一滑軌機構41,載盤20之兩側邊係可拆卸地與滑軌機構41結合,使得載盤20在放置於放置架40上後,可透過滑軌機構41移動。當晶片90已自托盤T中移置並倒放在載盤20後,使用者接著便可將載盤20置於放置架40上,並藉由滑軌機構41來使載盤20移動至正對探針板30之位置(如圖4所示箭頭F1所指方向),即使載盤20對應探針板30。 As shown in FIG. 1 and FIG. 2, in the first embodiment of the present invention, the placement frame 40 is disposed on the base 10, and the placement frame 40 is used to place the carrier 20 thereon. The placement frame 40 is provided with a slide rail mechanism 41. The two sides of the carrier tray 20 are detachably coupled with the slide rail mechanism 41, so that the carrier tray 20 can be moved through the slide rail mechanism 41 after being placed on the placement frame 40. After the wafer 90 has been displaced from the tray T and placed upside down on the carrier 20, the user can then place the carrier 20 on the placement frame 40 and move the carrier 20 to the positive position by the slide mechanism 41. The position of the probe card 30 (in the direction indicated by the arrow F1 in Fig. 4), even if the carrier 20 corresponds to the probe card 30.

在本新型之第一實施例中,驅動機構50設於基座10上。如圖4及圖5所示。當載盤20被移動至一作業位置而正對探針板30時,其亦同時會和驅動機構50正對,亦即此時載盤20係位於 探針板30與驅動機構50之間。接著,使用者可控制驅動機構50朝探針板30移動,以使載盤20在驅動機構50的推移下朝探針板30移動(如圖5所示箭頭F2所指方向),以使置於載盤20上的晶片90之接腳91接觸探針31。在本新型之具體實施例中,驅動機構50為氣壓缸,但本新型不以此為限,其他具有使物件升降或平面位移之裝置或設備亦可作為本新型之驅動機構50,例如液壓升降機或者連桿裝置。如圖7所示,其係表示以連桿裝置作為驅動機構50之實施方式示意圖。具體實施上,驅動機構50可包含有把手桿51、連動桿53及驅動件55。把手桿51具有第一端511及第二端513,其中第二端513設有兩個穿孔;把手桿51藉由鎖固件(例如螺絲)穿設其中一穿孔而可旋轉地固定設於基座10上。連動桿53的一端連接驅動件55,連動桿53的另一端則藉由鎖固件穿設另一穿孔而連接把手桿521的第二端513。驅動件55除和連動桿53連接外,並結合設置在導軌R中。如圖7及圖8所示,當作業員人將把手桿51的第一端511朝驅動件55位置方向旋轉(如圖8所示箭頭F3所指方向),連動桿53便會在把手桿51的帶動及導軌R的限位下,驅動驅動件55以直線方式朝探針板30移動(如 圖8所示箭頭F4所指方向),以將位在驅動件55與探針板30之間的載盤20朝著探針板30推移。 In the first embodiment of the present invention, the drive mechanism 50 is disposed on the base 10. As shown in Figure 4 and Figure 5. When the carrier 20 is moved to a working position and faces the probe card 30, it will also face the driving mechanism 50 at the same time, that is, the carrier 20 is located at this time. The probe card 30 is coupled to the drive mechanism 50. Next, the user can control the driving mechanism 50 to move toward the probe card 30 to move the carrier 20 toward the probe card 30 under the displacement of the driving mechanism 50 (as indicated by the arrow F2 in FIG. 5). The pin 91 of the wafer 90 on the carrier 20 contacts the probe 31. In the specific embodiment of the present invention, the driving mechanism 50 is a pneumatic cylinder, but the present invention is not limited thereto, and other devices or devices having lifting or plane displacement of the object can also be used as the driving mechanism 50 of the present invention, such as a hydraulic elevator. Or a connecting rod device. As shown in FIG. 7, it is a schematic view showing an embodiment in which a link device is used as the drive mechanism 50. In a specific implementation, the driving mechanism 50 can include a handle bar 51, a linkage bar 53 and a driving member 55. The handle bar 51 has a first end 511 and a second end 513, wherein the second end 513 is provided with two through holes; the handle bar 51 is rotatably fixed to the base by a through hole (for example, a screw) 10 on. One end of the linkage rod 53 is connected to the driving member 55, and the other end of the linkage rod 53 is connected to the second end 513 of the handlebar 521 by the other through hole of the fastener. The driving member 55 is disposed in the guide rail R in addition to being coupled to the interlocking lever 53. As shown in FIGS. 7 and 8, when the operator rotates the first end 511 of the handlebar 51 toward the position of the driving member 55 (in the direction indicated by the arrow F3 in FIG. 8), the linkage lever 53 is placed on the handlebar. Under the driving of 51 and the limit of the guide rail R, the driving drive member 55 moves in a linear manner toward the probe card 30 (eg The direction indicated by the arrow F4 in Fig. 8 is to move the carrier 20 positioned between the driving member 55 and the probe card 30 toward the probe card 30.

此外,需注意的是,在本實施例中,雖是以移動載盤20來使晶片90之接腳91與探針板30之探針31接觸,惟所屬領域人員應可理解的是,具體實施上,晶片90之接腳91與探針31之接觸也可透過移動探針板30來實現,或者同時或先後移動載盤20及探針板30,本新型並不限於特定方式。 In addition, it should be noted that in the present embodiment, although the carrier pad 20 is used to bring the pin 91 of the wafer 90 into contact with the probe 31 of the probe card 30, it should be understood by those skilled in the art that In practice, the contact of the pin 91 of the wafer 90 with the probe 31 can also be achieved by moving the probe card 30, or moving the carrier 20 and the probe card 30 simultaneously or sequentially. The present invention is not limited to a specific manner.

如圖2所示,在本新型之第一實施例中,主機裝置60係藉由傳輸線L而與探針板30電性連接。主機裝置60中包含控制器61及記憶體62,其中記憶體62儲存有一燒錄資料。控制器61用以在晶片90之接腳91接觸探針31時,對複數晶片90進行測試(testing),並可將燒錄資料燒錄(programming)到複數晶片90當中,即進行資料燒錄動作。由於晶片的測試及資料燒錄為所屬領域具有通常知識者所熟悉,其具體原理及內容亦已散見在許多技術或專利文獻當中,故在此即不再多做贅述。 As shown in FIG. 2, in the first embodiment of the present invention, the host device 60 is electrically connected to the probe card 30 by the transmission line L. The host device 60 includes a controller 61 and a memory 62, wherein the memory 62 stores a burn-in data. The controller 61 is configured to test the plurality of wafers 90 when the pins 91 of the wafer 90 are in contact with the probes 31, and can program the burned materials into the plurality of wafers 90, that is, to perform data burning. action. Since the testing and data burning of the wafer is familiar to those of ordinary skill in the art, the specific principles and contents thereof have been scattered in many technical or patent documents, and thus will not be further described herein.

如圖1所示,在本新型之第一實施例中,控制裝置70係與驅動機構50電性連接,控制裝置70用以提供使用者操作控制驅動機構50。使用者在將載盤20移動至正對探針板30之位置 後,該載盤20會位於探針板30與驅動機構50之間。此時,藉由操作控制裝置70,例如按下控制裝置70上設置的一啟動鈕,可控制驅動機構50將載盤20朝探針板30移動,以使晶片90之接腳91接觸探針31。當載盤20移動而使晶片90之接腳91接觸探針31時,主機裝置60便能如前揭述,對複數晶片90進行測試或/及資料燒錄。 As shown in FIG. 1, in the first embodiment of the present invention, the control device 70 is electrically connected to the driving mechanism 50, and the control device 70 is used to provide a user to operate the control driving mechanism 50. The user moves the carrier 20 to the position facing the probe card 30 Thereafter, the carrier 20 will be positioned between the probe card 30 and the drive mechanism 50. At this time, by operating the control device 70, for example, pressing a start button provided on the control device 70, the drive mechanism 50 can be controlled to move the carrier 20 toward the probe card 30 so that the pin 91 of the wafer 90 contacts the probe. 31. When the carrier 20 is moved such that the pin 91 of the wafer 90 contacts the probe 31, the host device 60 can test the plurality of wafers 90 and/or data burn as previously described.

接著,請參考圖9關於本新型之第二實施例之構造示意圖。 Next, please refer to FIG. 9 for a schematic configuration of the second embodiment of the present invention.

如圖9所示,在本新型之第二實施例中,前揭所述載盤10、探針板30及滑軌機構41之數量皆為複數,且承載複數晶片90之各載盤10置於放置架40後,可藉由各滑軌機構41以移動對應不同的探針板30,且複數載盤10與複數探針板30係相互交錯排列成一直線,即複數載盤10之間兩兩不會連續排列。使用者在將各載盤10移動到正對各探針板30之位置後,藉由操作控制裝置70,即可控制驅動機構50一次將所有載盤20朝著所正對的探針板30移動(以圖7為例,即是朝Z軸方向位移),以使全部晶片90之接腳91接觸探針31。由於本實施例中,一次可控制複數載盤20位移,而使相較第一實施例更多的晶片90之接腳91同時接 觸探針31,因此相較於第一實施例,可同步對更大量的晶片90作測試、預燒或資料燒錄之動作。 As shown in FIG. 9, in the second embodiment of the present invention, the number of the carrier 10, the probe card 30, and the slide mechanism 41 is plural, and each of the carriers 10 carrying the plurality of wafers 90 is disposed. After the shelf 40 is placed, the different probe cards 30 can be moved by the slide rail mechanisms 41, and the plurality of carriers 10 and the plurality of probe cards 30 are alternately arranged in a line, that is, between the plurality of carriers 10 The two will not be arranged in series. After the respective carriers 10 are moved to the positions facing the respective probe cards 30, the operation mechanism 70 can be controlled to control the drive mechanism 50 to face all the carriers 20 toward the facing probe card 30 at a time. The movement (in the case of FIG. 7, for example, displacement in the Z-axis direction) is such that the pins 91 of all the wafers 90 are in contact with the probe 31. In this embodiment, the plurality of carriers 20 can be controlled to be displaced at one time, so that the pins 91 of the wafer 90 are more simultaneously connected than the first embodiment. The probe 31 is touched, so that a larger number of wafers 90 can be simultaneously tested for testing, burn-in or data burning than the first embodiment.

接著,請參考圖10關於本新型之第三實施例之構造示意圖。 Next, please refer to FIG. 10 for a schematic structural view of a third embodiment of the present invention.

如圖10所示,在本新型之第三實施例中,和前揭實施例不同的是,本新型之晶片燒錄測試設備1更包括有溫度調節箱體80,而前揭所述晶片燒錄測試設備1之各元件,除主機裝置60及控制裝置70外,測試時皆在溫度調節箱體80內。溫度調節箱體80用以提供有別於常溫之測試溫度,具體而言,為進行預燒測試(burn in test)所需的高、低溫度,以使主機裝置60之控制器61更能在晶片90之接腳91接觸探針31時,對晶片90進行預燒測試。因此,在本新型之第三實施例中,晶片燒錄測試設備1除可如前揭實施例所述,對晶片90進行測試或/及資料燒錄外,更可透過溫度調節箱體80調節測試環境溫度,而對晶片90進一步地進行預燒測試。在本新型之具體實施例中,溫度調節箱體80為工業烤箱(burn-in chamber),但本新型不以此為限,溫度調節箱體80也可為可靠度環境試驗設備。由於晶片的預燒測試為所屬領域具有通常知識者所熟悉,其具體原理及內容亦已散見在許多技術或 專利文獻當中,故在此即不再多做贅述。此外,在本新型第三實施例中,晶片燒錄測試設備1其他元件之功用及實施皆同於第一實施例及第二實施例所述,故在此即不再重複贅述。 As shown in FIG. 10, in the third embodiment of the present invention, unlike the foregoing embodiment, the wafer burning test apparatus 1 of the present invention further includes a temperature adjustment box 80, and the wafer is burned before. The components of the test equipment 1 are tested in the temperature adjustment cabinet 80 except for the host device 60 and the control device 70. The temperature adjustment cabinet 80 is used to provide a test temperature different from the normal temperature, specifically, the high and low temperatures required for the burn in test, so that the controller 61 of the host device 60 can be more When the pin 91 of the wafer 90 contacts the probe 31, the wafer 90 is subjected to a burn-in test. Therefore, in the third embodiment of the present invention, the wafer burning test apparatus 1 can be adjusted by the temperature adjustment box 80 in addition to the test or/and data burning of the wafer 90 as described in the foregoing embodiments. The ambient temperature is tested and the wafer 90 is further subjected to a burn-in test. In the specific embodiment of the present invention, the temperature adjustment box 80 is a burn-in chamber, but the present invention is not limited thereto, and the temperature adjustment box 80 can also be a reliability environment test equipment. Since the burn-in test of the wafer is familiar to those of ordinary skill in the art, the specific principles and contents have been scattered in many technologies or In the patent literature, there is no longer any detail here. In addition, in the third embodiment of the present invention, the functions and implementations of other components of the wafer burning test apparatus 1 are the same as those in the first embodiment and the second embodiment, and thus the detailed description thereof will not be repeated here.

最後,請參考圖11關於本新型之晶片之燒錄方法之步驟流程圖,並請一併參考圖1至圖10。 Finally, please refer to FIG. 11 for a flow chart of the steps of the method for programming the wafer of the present invention, and please refer to FIG. 1 to FIG. 10 together.

本新型之晶片燒錄測試方法可應用在前揭所示之晶片燒錄測試設備1,用以同步燒錄或測試複數晶片90,或者對晶片90進行預燒測試。如圖2及圖3A-E所示,複數晶片90可先放置於托盤T上,且複數晶片90各具有複數接腳。晶片燒錄測試設備1包括有載盤20及探針板30,其中探針板30包括複數探針31;在此,載盤20及探針板30之數量可各為單數(如圖1所示),或可皆為複數(如圖9或圖10所示)。本新型之晶片之燒錄方法包括下述各步驟。 The wafer burning test method of the present invention can be applied to the wafer burning test apparatus 1 shown in the foregoing for synchronously burning or testing a plurality of wafers 90 or performing a burn-in test on the wafers 90. As shown in FIGS. 2 and 3A-E, a plurality of wafers 90 can be placed on the tray T first, and the plurality of wafers 90 each have a plurality of pins. The wafer burning test apparatus 1 includes a carrier 20 and a probe card 30, wherein the probe card 30 includes a plurality of probes 31; here, the number of the carrier 20 and the probe card 30 can each be singular (as shown in FIG. 1). Show), or both can be plural (as shown in Figure 9 or Figure 10). The method of burning a wafer of the present invention includes the following steps.

首先,步驟S1:將載盤疊置在托盤上,並同時翻轉托盤與載盤,以使複數晶片倒置在載盤上,使得各晶片之接腳背向載盤。 First, step S1: stacking the carrier on the tray and simultaneously flipping the tray and the carrier so that the plurality of wafers are inverted on the carrier such that the pins of each wafer face away from the carrier.

由於晶片90在燒錄、測試或/及預燒測試前會放置在例如圖3A所示之托盤T上,且放置時晶片90之接腳91會朝下。為 要能一次將多顆晶片90移置燒錄或測試承載用的載盤20上,並使其倒放,燒錄方法的第一步,即是將載盤20疊置在托盤T上,並在疊置後同時翻轉托盤T與載盤20,以使複數晶片90倒置在載盤20上,使得各晶片90之接腳91背向載盤20。所述步驟具體實施可參圖3A至圖3D以及前揭說明,惟需注意的是,此步驟之實施除可以人工方式進行外,亦可藉由自動化設備協助完成。 Since the wafer 90 is placed on the tray T, such as that shown in FIG. 3A, prior to the burn-in, test, and/or burn-in test, the pins 91 of the wafer 90 will face downward when placed. for In order to be able to displace and test a plurality of wafers 90 at a time on the carrier 20 for loading or testing, the first step of the burning method is to stack the carrier 20 on the tray T, and The tray T and the carrier 20 are simultaneously inverted after stacking so that the plurality of wafers 90 are inverted on the carrier 20 such that the pins 91 of the wafers 90 face away from the carrier 20. For the specific implementation of the steps, reference may be made to FIG. 3A to FIG. 3D and the foregoing description. However, it should be noted that the implementation of this step may be performed manually, or assisted by an automated device.

步驟S2:使載盤正對探針板,以使晶片之接腳可對準探針。 Step S2: The carrier is placed facing the probe card so that the pins of the wafer can be aligned with the probe.

步驟S1完成後,接著,使承載有複數晶片90之載盤20正對探針板30,以使晶片90之接腳91可對準探針板30之探針31。如圖4所示,具體實現上,可透過一滑軌機構41協助載盤20移動並準確地移至可正對晶片90之位置,但本新型不以此為限。此外,本新型之晶片燒錄測試方法如係應用在例如圖9或圖10所示之晶片燒錄測試設備1中時,所述步驟S2即是使各載盤20分別正對不同的探針板30,並使複數載盤20與複數探針板30相互交錯排列成一直線。 After the step S1 is completed, the carrier 20 carrying the plurality of wafers 90 is then faced to the probe card 30 so that the pins 91 of the wafer 90 can be aligned with the probes 31 of the probe card 30. As shown in FIG. 4, in a specific implementation, the carrier 20 can be moved by a slide rail mechanism 41 and accurately moved to a position facing the wafer 90, but the present invention is not limited thereto. In addition, when the wafer burning test method of the present invention is applied to, for example, the wafer burning test apparatus 1 shown in FIG. 9 or FIG. 10, the step S2 is to make each of the loading trays 20 face different probes respectively. The plate 30 is arranged such that the plurality of carriers 20 and the plurality of probe cards 30 are staggered in line.

步驟S3:移動探針板或載盤,以使晶片之接腳接觸探針板之探針。 Step S3: Move the probe card or the carrier so that the pins of the wafer contact the probe of the probe card.

在使承載有複數晶片90之載盤20對應探針板30後,控制探針板30或載盤20移動,以使晶片90之接腳91接觸探針板30之探針31。此處可僅擇一控制探針板30或載盤20移動,抑或同時或先後控制兩者移動,本新型不限於特定移動方式。此步驟具體實施方之一但不以此為限的是,可藉由一驅動機構50來推升載盤20移動(如圖5所示),且如係應用在例如圖7所示之晶片燒錄測試設備1中時,所述步驟S3即可利用驅動機構50來同時推升各載盤20移動,以使各載盤20中之晶片90之接腳91接觸各自對應的探針板30之探針31。 After the carrier 20 carrying the plurality of wafers 90 is associated with the probe card 30, the probe card 30 or the carrier 20 is moved so that the pins 91 of the wafer 90 contact the probes 31 of the probe card 30. Here, only one of the control probe plates 30 or the carrier 20 can be moved, or both can be controlled simultaneously or sequentially. The present invention is not limited to a specific movement mode. One of the specific implementations of this step is not limited thereto, and the driving of the carrier 20 can be pushed up by a driving mechanism 50 (as shown in FIG. 5), and is applied to, for example, the wafer shown in FIG. When the test device 1 is burned, the step S3 can use the drive mechanism 50 to simultaneously push the respective trays 20 to move, so that the pins 91 of the wafer 90 in each of the carriers 20 are in contact with the corresponding probe cards 30. Probe 31.

步驟S4:對複數晶片進行測試或/及資料燒錄。 Step S4: testing or/and data burning of the plurality of wafers.

在使晶片90之接腳91接觸探針板30之探針31後,晶片燒錄測試設備1之主機裝置60即可開始對複數晶片90進行測試(testing)或/及資料燒錄(programming)的作業。 After the pin 91 of the wafer 90 is brought into contact with the probe 31 of the probe card 30, the host device 60 of the wafer burning test device 1 can start testing or/and programming the plurality of wafers 90. Homework.

最後,進行步驟S5:提供測試溫度,並在該測試溫度下對該複數晶片進行預燒測試。 Finally, step S5 is performed: providing a test temperature, and performing a burn-in test on the plurality of wafers at the test temperature.

完成資料燒錄後,進一步地透過晶片燒錄測試設備1之溫度調節箱體80提供測試溫度,此處所謂測試溫度包含進行預燒測試所需的高溫及低溫,其溫度範圍為所屬領域技術人員所熟知。 在提供測試溫度的同時,主機裝置60便可在晶片90之接腳91與探針板30之探針31相接觸下,對於複數晶片90進行預燒測試(burn in test)的作業。 After the data burning is completed, the temperature is further provided through the temperature adjusting box 80 of the wafer burning test apparatus 1. The so-called test temperature includes the high temperature and low temperature required for performing the burn-in test, and the temperature range thereof is a person skilled in the art. Well known. While the test temperature is being supplied, the host device 60 can perform a burn in test operation on the plurality of wafers 90 while the pins 91 of the wafer 90 are in contact with the probes 31 of the probe card 30.

綜上所陳,本新型無論就目的、手段及功效,在在均顯示其迥異於習知技術之特徵。惟應注意的是,上述諸多實施例僅係為了便於說明而舉例而已,本新型所主張之權利範圍自應以申請專利範圍所述為準,而非僅限於上述實施例。 In summary, the present invention shows its characteristics different from conventional techniques in terms of purpose, means and efficacy. It should be noted that the various embodiments described above are merely illustrative for ease of explanation, and the scope of the claims is intended to be limited by the scope of the claims.

1‧‧‧晶片燒錄測試設備 1‧‧‧ wafer burning test equipment

10‧‧‧基座 10‧‧‧ Pedestal

20‧‧‧載盤 20‧‧‧Package

30‧‧‧探針板 30‧‧‧Probe board

40‧‧‧放置架 40‧‧‧Place rack

60‧‧‧主機裝置 60‧‧‧ host device

70‧‧‧控制裝置 70‧‧‧Control device

Claims (6)

一種晶片燒錄測試設備,用以燒錄或測試複數晶片,該複數晶片可被放置於一托盤,並各具有複數接腳,該晶片燒錄測試設備包括:一基座;一載盤,可疊置在該托盤上,並能在疊置後藉由同時翻轉該托盤與該載盤而使該複數晶片倒置在該載盤上,使得各該晶片之該複數接腳背向該載盤;一探針板,係設置於該基座上,該探針板包括複數探針;一放置架,係設置於該基座上,用以提供該載盤放置後對應該探針板,以使該複數接腳可對準該複數探針;一驅動機構,係設置於該基座上,用以移動該探針板或該載盤,以使倒置在該載盤上的該複數晶片之該複數接腳其中之一接腳接觸各該探針;以及一主機裝置,係與該探針板電性連接,該主機裝置用以在該接腳接觸各該探針時,對該複數晶片進行測試(testing)或資料燒錄(programming)。 A wafer burning test apparatus for burning or testing a plurality of wafers, the plurality of wafers being placed on a tray and each having a plurality of pins, the wafer burning test apparatus comprising: a base; a carrier tray; Stacked on the tray and capable of inverting the plurality of wafers on the carrier by flipping the tray and the carrier simultaneously after stacking, such that the plurality of pins of each of the wafers face away from the carrier; a probe card is disposed on the base, the probe card includes a plurality of probes; a placement frame is disposed on the base to provide a corresponding probe card after the carrier is placed, so that the a plurality of pins can be aligned with the plurality of probes; a driving mechanism is disposed on the base for moving the probe card or the carrier to cause the plurality of the plurality of wafers inverted on the carrier One of the pins contacts each of the probes; and a host device is electrically connected to the probe card, and the host device is configured to test the plurality of wafers when the pins contact the probes (testing) or data programming (programming). 如申請專利範圍第1項所述之晶片燒錄測試設備,其中該放置架包括一滑軌機構,該載盤係可拆卸地與該滑軌機構結合,並透過該滑軌機構而於該放置架上位移。 The wafer burning test apparatus of claim 1, wherein the placement frame comprises a slide rail mechanism detachably coupled to the slide rail mechanism and disposed through the slide rail mechanism Displacement on the shelf. 如申請專利範圍第1項所述之晶片燒錄測試設備,其中該驅動機構為一氣壓缸。 The wafer burning test apparatus of claim 1, wherein the driving mechanism is a pneumatic cylinder. 如申請專利範圍第1項所述之晶片燒錄測試設備,其中該探針板及該載盤之數量皆為複數,且各該載盤置於該放置架後,各自對應不同的探針板。 The wafer burning test apparatus of claim 1, wherein the number of the probe card and the carrier are plural, and each of the carriers is placed on the placement frame, and each of the corresponding probe plates is different. . 如申請專利範圍第4項所述之晶片燒錄測試設備,其中各該載盤置於該放置架後,該複數載盤與該複數探針板係相互交錯排列成一直線。 The wafer burning test apparatus of claim 4, wherein after the carrier is placed in the placement rack, the plurality of carriers and the plurality of probe boards are staggered in a line. 如申請專利範圍第1至5項任一項所述之晶片燒錄測試設備,更包括一溫度調節箱體,該探針板位於該溫度調節箱體內,該溫度調節箱體用以提供一測試溫度,以使該主機裝置更能在該接腳接觸各該探針時,對該複數晶片進行預燒測試(burn in test)。The wafer burning test apparatus according to any one of claims 1 to 5, further comprising a temperature adjusting box, the probe board being located in the temperature adjusting box, wherein the temperature adjusting box is used for providing a test The temperature is such that the host device is more capable of performing a burn in test on the plurality of wafers when the pins contact the probes.
TW106200679U 2017-01-13 2017-01-13 Chip burning test equipment TWM543995U (en)

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