TWM527154U - Wafer edge measuring module - Google Patents

Description

Wafer edge measurement module (2)

This creation is about a wafer edge measurement module (2), especially an integrated linear scan camera, convex lens, mirror and dark field light source. It can also improve the edge speed of the wafer and detect defects in real time.

According to the past, for the mass production of wafers, most of them use a lot of manpower, using many different gauges, and manually measuring the work. This kind of manual detection method, in addition to the shortcomings of high cost of human activities, the work of detecting by the human eye is not only boring, the eyes are easily exhausted, and the turnover rate of personnel is too high, the stability of quality is also The problem worthy of discussion, therefore, gradually replaces artificial vision with machine vision. In the aspect of industrial camera, it is distinguished by the principle of image acquisition. It mainly includes the technique of line scan and face line scanning, which is a picture element The dimensions are arranged in a line, and only one column of image data can be obtained at a time when the image is taken. When the relative motion between the industrial camera and the object being photographed is generated, two-dimensional image data is obtained; the upper line scanning type is implanted in The image sensing elements of industrial cameras use a two-dimensional matrix. In terms of the optical geometry of machine vision, it uses optical mirrors, concave lenses, convex lenses, focusing mirrors, and plano-convex lenses to perform optical reflection and refraction, but the combination is not easily accomplished by people with ordinary knowledge. Degree of research. In terms of illumination geometry of machine vision, the illumination source can be divided into a bright field source and a dark field source, and the bright field source is directly reflected into the lens by the source; the dark field source is reflected directly from the source without entering the lens.

Sub-press, wafer measurement is mainly in the effective area, not in the invalid area, usually the wafer edge is an invalid area, not the focus of measurement, but due to the gradual vitrification and enlargement of the wafer material, if the edge of the wafer appears Defects are processed, transferred, and transported in multiple process steps of lithography, diffusion, cleaning, chemical mechanical polishing, and chemical vapor deposition. When subjected to slight physical collision, the wafer is easily broken from the ineffective area. The effective area, so the defects at the edge of the wafer has quietly become a defect of limited production.

Therefore, wafer edge measurement has not been taken seriously, but how to integrate mechanical vision industrial camera technology, optical geometry technology and illumination geometry technology to effectively improve the measurement of wafer edge speed and the immediate detection of defects. Therefore, there will be more room for improvement.

The main purpose of this creation is to provide a wafer edge measurement module (2) that integrates the line scan of industrial cameras, convex lenses of optical geometry, mirrors, and dark field sources of illumination geometry to solve the prior art. Measuring the edge of the wafer, which in turn increases the efficiency of measuring the edge speed of the wafer and detecting defects on the fly.

In order to achieve the above effects, the structural features of the present invention include: at least one linear scanning camera is disposed at a predetermined position on the edge of the wafer; at least one convex lens group is located in front of the linear scanning camera, and the linear scanning camera is passed through the convex lens After the group, the edge of the edge of the wafer is linearly scanned; at least one mirror group is close to the edge of the wafer, and is formed by a first and second mirror with the reflective surface facing forward And the first and second mirrors are symmetrical with the linear scan camera as a center reference, and the two sides are inclined forward, so that the linear scan camera passes through the reflective surfaces of the first and second mirrors. And linearly scanning the bevel edge and the lower bevel edge on the edge of the wafer respectively; and at least three light source component groups, wherein the light sources are respectively projected onto the bevel edge, the middle edge and the lower slope of the edge of the wafer to be linearly scanned. The pixels on the edge are respectively formed into different dark field light sources, so that all the pixels on the edge of the wafer exhibit a low gray value area, when the linear scan camera linear sweep When a part of the pixels at the edge of the wafer exhibits a high gray value area, the high gray value area is measured as a decfect of the edge of the wafer.

According to the foregoing feature, the light source component group is composed of a first and second light source component, which is close to the edge of the wafer and projects the light source forward, and the first and second light source components are linearly scanned. The camera is a central reference, symmetrical, and the two sides are inclined forward, so that the first and second light source elements exhibit a non-180° parallel light source angle, and the angle of the light source is between 60° and 160°.

According to the foregoing feature, the first and second mirrors exhibit a non-180° parallel reflection angle, and the reflection angle is between 60° and 160°.

According to the foregoing features, a screen may be further included to observe defects of the edge of the wafer.

According to the foregoing feature, a defect judging unit is further included, and the defect of the edge of the wafer is automatically determined.

By means of the above-mentioned technical means, the present invention selects the fast scanning of the linear scanning camera, the convex lens group, the mirror body of the mirror group and the dark field light source of the light source component group to be integrated, and excludes the non-rapid scanning of the upper line scanning type, The convex lens group, the mirror body of the mirror group and the bright field light source which can not exhibit high contrast can also replace the manual measurement and application of the wafer edge, thereby improving the edge speed of the measurement wafer and the effect of detecting defects in real time.

First, referring to FIG. 1, the preferred embodiment of the wafer edge measuring module (2) of the present invention comprises: at least one linear scanning camera 10, which is placed at a predetermined position on the edge (E) of the wafer. The linear scanning technology of the industrial camera can quickly scan the edge of the wafer (E) by the image projected on the sensing element through the lens, but is not limited thereto.

At least one convex lens group 20 is located in front of the linear scanning camera 10, and after the linear scanning camera 10 is transmitted through the convex lens group 20, the edge (E ₂ ) of the wafer edge (E) is linearly scanned. However, it is not limited to this.

At least one mirror group 30 is adjacent to the edge (E) of the wafer, and is formed by a first and second mirrors 31, 32 with the reflecting surface 33 facing forward and the first and second reflections The mirrors 31 and 32 are symmetrical with respect to the linear scanning camera 10, and both sides are inclined forward, so that the linear scanning camera 10 passes through the reflecting surfaces 33 of the first and second reflecting mirrors 31 and 33. Then, the bevel edge (E ₁ ) and the lower bevel edge (E ₃ ) of the wafer edge (E) are linearly scanned. In this embodiment, the first and second mirrors 31 and 32 are not 180°. The parallel reflection angle (θ ₁ ) is such that the reflection angle (θ ₁ ) is between 60° and 160°, but is not limited thereto.

At least three light source component groups 40, the light sources of which are respectively projected onto the pixels on the bevel edge (E ₁ ), the middle end edge (E ₂ ) and the lower bevel edge (E ₃ ) of the edge of the wafer to be linearly scanned, according to Forming different dark field light sources (F) respectively, so that all pixels (P) of the wafer edge (E) exhibit a low gray value area (P ₁ ), when the linear scan camera 10 linearly scans the wafer edge (E) When a part of the pixel (P) exhibits a high gray value area (P ₂ ), the high gray value area (P ₂ ) is measured as a defect (D) of the wafer edge (E), in this embodiment The light source element group 40 is composed of a first and second light source elements 41, 42 which are close to the edge (E) of the wafer and project the light source toward the front, and the first and second light source elements 41, 42 is a central reference of the linear scan camera 10, and is symmetrically inclined to tilt both sides forward, so that the first and second light source elements 41, 42 exhibit a non-180° parallel light source angle (θ ₂ ), and The angle (θ ₂ ) of the light source is between 60° and 160°.

In addition, a hardware device of the screen 50 may be included to observe the defect (D) of the edge (E) of the wafer, or a software device of the defect determination unit 60 may be included, and the edge of the wafer is automatically determined (E). The defect (D) is analyzed and the image is differentiated, but is not limited thereto.

By means of the above-mentioned technical means, the present invention effectively integrates the fast scanning of the linear scanning camera 10, the convex lens group 20, the mirror body of the mirror group 30 and the dark field light source of the light source component group 40, thereby not only improving the measurement of the wafer edge (E) speed and immediate discovery of the defect (D), and at the same time, it can be combined with a hardware device or a software device to increase the defect (D) identification rate of the edge (E) of the wafer, and correctly determine the defect (D) type, And different treatment according to different defects (D), to achieve the optimization of labor costs and equipment costs.

In summary, the technical means revealed in this creation are indeed new patents such as "novelty", "progressiveness" and "available for industrial use". German sense.

However, the drawings and descriptions disclosed above are only preferred embodiments of the present invention, and modifications or equivalent changes made by those skilled in the art in accordance with the spirit of the present invention should still be included in the scope of the patent application.

10‧‧‧Linear Scan Camera
20‧‧‧ convex lens group
30‧‧‧Mirror group
31‧‧‧First mirror
32‧‧‧second mirror
33‧‧‧reflecting surface
40‧‧‧Light source component group
41‧‧‧First light source component
42‧‧‧Second light source components
50‧‧‧ screen
60‧‧‧Defect judgment unit
D‧‧‧ Defects
E‧‧‧ wafer edge
E ₁ ‧‧‧Upper bevel edge
E ₂ ‧‧‧ mid-end edge
E ₃ ‧‧‧ Lower bevel edge
F‧‧‧ dark field light source
P‧‧ ‧ pixels
P ₁ ‧‧‧Low gray value area
P ₂ ‧‧‧High gray value area θ ₁ ‧‧‧Reflection angle θ ₂ ‧‧‧Light source angle

Figure 1 is a schematic diagram of the edge of a linear scan wafer of the present author. Figure 2 is a schematic diagram of the wafer edge defects measured by this creation.

10‧‧‧Linear Scan Camera

20‧‧‧ convex lens group

30‧‧‧Mirror group

31‧‧‧First mirror

32‧‧‧second mirror

33‧‧‧reflecting surface

50‧‧‧ screen

60‧‧‧Defect judgment unit

D‧‧‧ Defects

E‧‧‧ wafer edge

E ₁ ‧‧‧Upper bevel edge

E ₂ ‧‧‧ mid-end edge

E ₃ ‧‧‧ Lower bevel edge

P‧‧ ‧ pixels

P ₁ ‧‧‧Low gray value area

θ ₁ ‧‧‧reflection angle

Claims (5)

A wafer edge measuring module (2) comprising: at least one linear scanning camera disposed at a predetermined position on a wafer edge; at least one convex lens group located in front of the linear scanning camera to enable the linear scanning camera to pass through After the convex lens group, linearly scanning the edge of the edge of the wafer; at least one mirror group is close to the edge of the wafer, and is formed by a first and second mirror, and the reflective surface is formed Further, the first and second mirrors are symmetrical with the linear scanning camera as a central reference, and both sides are inclined forward, so that the linear scanning camera transmits the reflection surface of the first and second mirrors Then, linearly scanning the bevel edge and the lower bevel edge on the edge of the wafer respectively; and at least three light source component groups, wherein the light sources are respectively projected onto the bevel edge, the middle edge of the edge of the wafer to be linearly scanned, and Pixels on the edge of the lower bevel, respectively, to form different dark field sources, so that all pixels of the edge of the wafer exhibit low gray value regions, when the linear scan camera When a portion of the pixels at the edge of the wafer are linearly scanned to exhibit a high gray value region, the high gray value region is measured as a decfect of the edge of the wafer. The wafer edge measuring module (2) according to claim 1, wherein the light source component group is composed of a first and second light source components, which are close to the edge of the wafer and cause the light source to project forward. And the first and second light source elements are centered on the linear scanning camera, and are symmetrically inclined to tilt the two sides forward, so that the first and second light source elements exhibit a non-180° parallel light source angle, and The angle of the light source is between 60° and 160°. The wafer edge measuring module (2) according to claim 1 or 2, wherein the first and second mirrors exhibit a non-180° parallel reflection angle, and the reflection angle is 60°-160. ° between. The wafer edge measurement module (2) according to claim 3 further includes a screen for observing defects of the edge of the wafer. The wafer edge measurement module (2) according to claim 3 further includes a defect determination unit that automatically determines defects of the edge of the wafer.