TWM452577U - Wiping mechanism - Google Patents
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- TWM452577U TWM452577U TW102200191U TW102200191U TWM452577U TW M452577 U TWM452577 U TW M452577U TW 102200191 U TW102200191 U TW 102200191U TW 102200191 U TW102200191 U TW 102200191U TW M452577 U TWM452577 U TW M452577U
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Abstract
Description
本創作是有關於一種擦拭機構，且特別是有關於一種較節省能源及可同時擦拭多個工件的擦拭機構。The present invention relates to a wiping mechanism, and more particularly to a wiping mechanism that is more energy efficient and can wipe multiple workpieces simultaneously.
隨著電子資訊產品快速的發展，電路板的需求亦大幅地成長。在迴焊製程中，為了增強電子元件與電路板上的銲墊的焊接效果，通常會在電路板的銲墊與電子元件之間加入助銲劑(flux)，例如：松香或活化松香等。但由於加熱揮發後，助銲劑內的物質可能會殘留而影響焊接效果，例如造成空焊等狀況。With the rapid development of electronic information products, the demand for circuit boards has also grown significantly. In the reflow process, in order to enhance the soldering effect of the electronic components and the pads on the circuit board, a flux, such as rosin or activated rosin, is usually added between the pads of the board and the electronic components. However, after heating and volatilization, the contents of the flux may remain and affect the soldering effect, such as causing air soldering.
為解決上述所指助銲劑內的物質殘留而影響焊接品質的問題，目前有採用人工擦拭的方式來進行清潔，然而這種方法長期下來不但浪費了許多人力、時間的成本，並且容易因為不同擦拭方式、不同人員操作模式等人為因素的不確定性，而無法維持穩定且優良的焊接品質。In order to solve the problem of the material residue in the above-mentioned flux, the quality of the welding is affected. At present, the method of manual wiping is used for cleaning. However, this method not only wastes a lot of labor and time, but also is easy to wipe due to different methods. Uncertainty of human factors such as methods and different personnel operating modes, and it is impossible to maintain stable and excellent welding quality.
為了避免上述狀況，亦有部分產線是透過機械的方式進行清潔，將沾有溶劑的擦拭機構整個下移至與電路板接觸之後在電路板上反覆移動以進行電路板的清潔。然而，在電路板的清潔製程中，需要移動整個擦拭機構，相當耗費電力與空間。In order to avoid the above situation, some production lines are mechanically cleaned, and the solvent-swept wiping mechanism is entirely moved down to contact with the circuit board and then moved over the circuit board to clean the circuit board. However, in the cleaning process of the circuit board, it is necessary to move the entire wiping mechanism, which is quite power and space.
本創作提供一種擦拭機構，其較為節省能源及空間。The present invention provides a wiping mechanism that saves energy and space.
本創作提出一種擦拭機構，用以擦拭位於一擦拭區的一工件。擦拭機構包括一本體及一擦拭頭。本體包括一輸送裝置，輸送裝置包括一放捲單元、一收捲單元及一擦拭巾，擦拭巾自放捲單元放出經過擦拭區且捲入收捲單元。擦拭頭沿相互垂直之一第一軸線與一第二軸線可移動地配置於本體。擦拭頭相對於本體沿第一軸線下移以使擦拭巾抵至工件並沿第二軸線進行往復運動以擦拭工件。The present application proposes a wiping mechanism for wiping a workpiece located in a wiping area. The wiping mechanism includes a body and a wiping head. The body comprises a conveying device comprising a unwinding unit, a winding unit and a wipe, the wipes being discharged from the unwinding unit through the wiping area and being wound into the winding unit. The wiping head is movably disposed on the body along one of the first axis and the second axis that are perpendicular to each other. The wiping head is moved down the first axis relative to the body to cause the wipe to abut the workpiece and reciprocate along the second axis to wipe the workpiece.
在本創作之一實施例中，上述之本體包括一對移動件，這對移動件位於該擦拭巾於擦拭區的路徑上且可沿第二軸線移動，以撐開擦拭巾或使擦拭巾垂下。In one embodiment of the present invention, the body includes a pair of moving members located in the path of the wipe on the wiping area and movable along the second axis to open the wipe or hang the wipe .
在本創作之一實施例中，擦拭機構更包括位於同一水平面且相互垂直之一第一軌道及一第二軌道，本體適於沿第一軌道及第二軌道移動以使擦拭頭移至擦拭區的上方。In an embodiment of the present invention, the wiping mechanism further includes a first track and a second track that are at the same horizontal plane and perpendicular to each other, and the body is adapted to move along the first track and the second track to move the wiping head to the wiping area. Above.
在本創作之一實施例中，第一軌道平行於第二軸線方向，第二軌道平行於第三軸線方向，第三軸線垂直於第一軸線與第二軸線。In one embodiment of the present invention, the first track is parallel to the second axis direction, the second track is parallel to the third axis direction, and the third axis is perpendicular to the first axis and the second axis.
在本創作之一實施例中，擦拭機構更包括一第一驅動單元，用以驅動本體沿第一軌道與第二軌道移動。In an embodiment of the present invention, the wiping mechanism further includes a first driving unit for driving the body to move along the first track and the second track.
在本創作之一實施例中，擦拭機構更包括一第二驅動單元，用以驅動擦拭頭相對於本體沿第一軸線與第二軸線移動。In an embodiment of the present invention, the wiping mechanism further includes a second driving unit for driving the wiping head to move relative to the body along the first axis and the second axis.
在本創作之一實施例中，上述之工件設置於一承載單 元上，承載單元適於移動且頂升工件至擦拭區。In an embodiment of the present invention, the workpiece is disposed on a carrier list In the element, the carrying unit is adapted to move and lift the workpiece to the wiping area.
在本創作之一實施例中，上述之承載單元受一第三驅動單元驅動而移動或頂升工件。In an embodiment of the present invention, the above-mentioned carrying unit is driven by a third driving unit to move or lift the workpiece.
在本創作之一實施例中，上述之擦拭頭適於相對於本體轉動，以改變第二軸線的方向。In one embodiment of the present invention, the wiping head described above is adapted to rotate relative to the body to change the direction of the second axis.
在本創作之一實施例中，擦拭機構更包括一液體供應單元，適於噴灑一液體至擦拭巾。In an embodiment of the present invention, the wiping mechanism further includes a liquid supply unit adapted to spray a liquid to the wipe.
在本創作之一實施例中，上述之工件為一電路板。In one embodiment of the present invention, the workpiece is a circuit board.
基於上述，本創作之擦拭機構不需將整個本體全部下移來對工件進行擦拭，由於擦拭頭可相對於本體沿第一軸線與第二軸線移動，操作時只要將擦拭頭相對於本體沿第一軸線下移，並沿第二軸線進行往復運動以擦拭工件即可，相較於習知，本創作之擦拭機構除了較為節省操作的能源以及運作空間之外，本體上亦可設置多個擦拭頭，以同時對多個工件進行清潔。此外，本創作之擦拭機構的擦拭頭可相對於本體轉動，以改變第二軸線的方向，若承載單元上的工件發生偏移的狀況，擦拭頭可對應地調整方向以進行擦拭。Based on the above, the wiping mechanism of the present invention does not need to move the entire body down to wipe the workpiece. Since the wiping head can move along the first axis and the second axis with respect to the body, the wiping head can be operated relative to the body during operation. The axis is moved down and reciprocated along the second axis to wipe the workpiece. Compared with the prior art, the wiping mechanism of the present invention can be provided with multiple wipings in addition to the energy saving and operation space. Head to clean multiple workpieces at the same time. In addition, the wiping head of the wiping mechanism of the present invention can be rotated relative to the body to change the direction of the second axis. If the workpiece on the carrying unit is displaced, the wiping head can be correspondingly adjusted for wiping.
為讓本創作之上述特徵和優點能更明顯易懂，下文特舉實施例，並配合所附圖式作詳細說明如下。In order to make the above features and advantages of the present invention more comprehensible, the following embodiments are described in detail with reference to the accompanying drawings.
圖1是依照本創作之一實施例之一種擦拭機構的示意圖。請參閱圖1，本實施例之擦拭機構100用以擦拭位於 一擦拭區W的一工件10。在本實施例中，工件10為一電路板，但工件10的種類不以此為限制。1 is a schematic illustration of a wiping mechanism in accordance with an embodiment of the present invention. Referring to FIG. 1, the wiping mechanism 100 of the embodiment is used for wiping. A workpiece 10 of the wiping zone W. In the present embodiment, the workpiece 10 is a circuit board, but the type of the workpiece 10 is not limited thereto.
本實施例之擦拭機構100包括一本體110、一擦拭頭120、一第一軌道130、一第二軌道140、一第一驅動單元150、一第二驅動單元160及一液體供應單元170。The wiping mechanism 100 of the present embodiment includes a body 110, a wiping head 120, a first rail 130, a second rail 140, a first driving unit 150, a second driving unit 160, and a liquid supply unit 170.
本體110包括一輸送裝置111，輸送裝置111包括一放捲單元112、一收捲單元114及一擦拭巾116。擦拭巾116自放捲單元112放出經過擦拭區W且捲入收捲單元114。擦拭頭120沿相互垂直之一第一軸線A1與一第二軸線A2可移動地配置於本體110。如圖1所示，本實施例之第一軸線A1的方向為垂直方向，第二軸線A2的方向為往左右水平移動的方向，但在其他實施例中第一軸線A1與第二軸線A2的方向不以此為限制。The body 110 includes a conveying device 111. The conveying device 111 includes a unwinding unit 112, a winding unit 114 and a wipe 116. The wipe 116 is discharged from the unwinding unit 112 past the wiping area W and wound into the winding unit 114. The wiping head 120 is movably disposed on the body 110 along one of the first axis A1 and the second axis A2 that are perpendicular to each other. As shown in FIG. 1, the direction of the first axis A1 of the present embodiment is a vertical direction, and the direction of the second axis A2 is a direction of horizontal movement to the left and right, but in other embodiments, the first axis A1 and the second axis A2 are The direction is not limited by this.
第一驅動單元150用以驅動本體110沿第一軌道130與第二軌道140移動，如圖1所示，第一軌道130與第二軌道140位於同一水平面且相互垂直地設置，在本實施例中，第一軌道130平行於第二軸線A2方向，第二軌道140平行於一第三軸線A3方向，其中第三軸線A3垂直於第一軸線A1與第二軸線A2，也就是圖面上的前後方向。第一驅動單元150驅動本體110沿第一軌道130與第二軌道140移動以使擦拭頭120移至擦拭區W的上方。The first driving unit 150 is configured to drive the body 110 to move along the first rail 130 and the second rail 140. As shown in FIG. 1, the first rail 130 and the second rail 140 are located at the same horizontal plane and are perpendicular to each other, in this embodiment. The first track 130 is parallel to the second axis A2 direction, and the second track 140 is parallel to a third axis A3 direction, wherein the third axis A3 is perpendicular to the first axis A1 and the second axis A2, that is, on the drawing surface. Front and rear direction. The first driving unit 150 drives the body 110 to move along the first rail 130 and the second rail 140 to move the wiping head 120 above the wiping area W.
第二驅動單元160用以驅動擦拭頭120相對於本體110沿第一軸線A1(垂直方向)與第二軸線A2(左右水平方向)移動。在本實施例中，第一驅動單元150與第二 驅動單元160可分別為汽缸，但第一驅動單元150與第二驅動單元160之種類並不以此為限制。液體供應單元170用來噴灑一液體(例如是清潔劑)至擦拭巾116，以使擦拭巾116接觸工件10時可去除工件上雜質。The second driving unit 160 is configured to drive the wiping head 120 to move relative to the body 110 along the first axis A1 (vertical direction) and the second axis A2 (left and right horizontal direction). In this embodiment, the first driving unit 150 and the second The driving unit 160 may be a cylinder, respectively, but the types of the first driving unit 150 and the second driving unit 160 are not limited thereto. The liquid supply unit 170 is used to spray a liquid (e.g., a cleaning agent) to the wipe 116 so that the wipe 116 can contact the workpiece 10 to remove impurities from the workpiece.
此外，如圖1所示，工件10設置於一承載單元20上，在本實施例中，承載單元20受一第三驅動單元30驅動以移動工件10至本體110的下方後再將工件10頂升至擦拭區W。在本實施例中，第三驅動單元30可為汽缸，但第三驅動單元30之種類並不以此為限制。In addition, as shown in FIG. 1 , the workpiece 10 is disposed on a carrying unit 20 . In the embodiment, the carrying unit 20 is driven by a third driving unit 30 to move the workpiece 10 below the body 110 and then the workpiece 10 is topped. Raise to wipe area W. In this embodiment, the third driving unit 30 may be a cylinder, but the type of the third driving unit 30 is not limited thereto.
圖2至圖4是圖1之擦拭機構作動的示意圖。請先參閱圖2，擦拭頭120與工件10分別為在擦拭巾116的上下兩側。在本實施例中，本體110包括一對移動件118，這對移動件118位於該擦拭巾116於擦拭區W的路徑上，如圖2所示，一開始這對移動件118之間的距離較遠以將擦拭巾116撐開拉平，以避免擦拭巾116被其他機構捲入或脫落。當要進行工件10的擦拭作業時，如圖3所示，這對移動件118可沿第二軸線A2相互靠近，此時擦拭巾116不接觸到這對移動件118而呈現放鬆下垂的狀態。再來，如圖4所示，擦拭頭120相對於本體110沿第一軸線A1向下移動以隔著擦拭巾116對工件10沿著第二軸線A2進行往復運動，以擦拭工件10。2 to 4 are schematic views of the operation of the wiping mechanism of Fig. 1. Referring to FIG. 2 first, the wiping head 120 and the workpiece 10 are respectively on the upper and lower sides of the wipe 116. In the present embodiment, the body 110 includes a pair of moving members 118 located on the path of the wipe 116 in the wiping area W, as shown in FIG. 2, the distance between the pair of moving members 118 at the beginning. Farther to open the wipe 116 flat to prevent the wipe 116 from being caught or detached by other mechanisms. When the wiping operation of the workpiece 10 is to be performed, as shown in FIG. 3, the pair of moving members 118 can approach each other along the second axis A2, at which time the wipe 116 does not contact the pair of moving members 118 to exhibit a state of relaxation and sagging. Further, as shown in FIG. 4, the wiping head 120 is moved downward relative to the body 110 along the first axis A1 to reciprocate the workpiece 10 along the second axis A2 across the wipe 116 to wipe the workpiece 10.
擦拭完畢之後，擦拭頭120沿第一軸線A1向上移動復位，使這對移動件118往遠離彼此的方向移動以回到一開始的位置，此時，擦拭巾116再度被撐開拉平，被使用 過的擦拭巾116往收捲單元114的方向轉動而捲入收捲單元114中，連帶地使未使用的擦拭巾116放出於放捲單元112且移動至擦拭區W的位置以等待其後的擦拭動作。第三驅動單元30再度移動承載單元20而使得工件10移出於擦拭區W。After the wiping is completed, the wiping head 120 is moved up and down along the first axis A1 to move the pair of moving members 118 away from each other to return to the initial position. At this time, the wipe 116 is again stretched and used. The wipe 116 is rotated in the direction of the winding unit 114 to be wound into the winding unit 114, and the unused wipe 116 is placed in the unwinding unit 112 and moved to the position of the wiping area W to wait for the subsequent Wipe the action. The third drive unit 30 moves the carrier unit 20 again to move the workpiece 10 out of the wiping area W.
本實施例之擦拭機構100不需將整個本體110全部下移來對工件10進行擦拭，由於擦拭頭120可相對於本體110沿第一軸線A1與第二軸線A2移動，操作時只要將擦拭頭120相對於本體110沿第一軸線A1下移，並沿第二軸線A2進行往復運動以擦拭工件10即可。The wiping mechanism 100 of the embodiment does not need to move the entire body 110 down to wipe the workpiece 10. Since the wiping head 120 can move relative to the body 110 along the first axis A1 and the second axis A2, the wiping head is only required to operate. The 120 is moved downward relative to the body 110 along the first axis A1 and reciprocated along the second axis A2 to wipe the workpiece 10.
相較於習知將整個本體110全部下移需要提供較高的能源以及運作空間，本實施例之擦拭機構100除了較為節省操作的能源及空間之外，在本實施例中，雖本體110上僅配置一個擦拭頭120，但在其他實施例中，本體110上亦可設置多個擦拭頭120，以同時對多個工件10進行清潔。並且，這些擦拭頭120之間的相對位置可配合工件10擺放的位置來配置，擦拭頭120的數量並不以此為限制。The wiper mechanism 100 of the present embodiment has a higher energy source and a working space than the conventional one. In addition to the energy saving and space saving operation, in the present embodiment, the body 110 is provided on the body 110. Only one wiping head 120 is disposed, but in other embodiments, a plurality of wiping heads 120 may be disposed on the body 110 to simultaneously clean a plurality of workpieces 10. Moreover, the relative positions between the wiping heads 120 can be configured in accordance with the position at which the workpiece 10 is placed. The number of the wiping heads 120 is not limited thereto.
此外，由於承載單元20上的工件10若在輸送的過程中發生偏移的狀況，也就是工件10雖仍維持水平但工件10的邊緣並非與第二軸線A2與第三軸線A3平行。為了避免工件10偏移時，擦拭頭120進行往復運動不能準確地對應到工件10上需要被擦拭的位置。在本實施例中，擦拭頭120可相對於本體110略微轉動至符合工件10上需要被擦拭位置的方向，也就是說，轉動後擦拭頭120仍然呈水 平，但擦拭頭120所沿第二軸線A2的運動方向可對應地被改變，例如第二軸線A2的方向由原本的左右方向變為左上右下的方向等。因此，若本體110上配置有多個擦拭頭120，這些擦拭頭120可分別相對於本體110轉動，而在運作時分別依據所需沿著不同方向移動。Furthermore, due to the situation in which the workpiece 10 on the carrier unit 20 is displaced during transport, that is, the workpiece 10 remains horizontal but the edge of the workpiece 10 is not parallel to the second axis A2 and the third axis A3. In order to avoid the offset of the workpiece 10, the reciprocating motion of the wiping head 120 does not accurately correspond to the position on the workpiece 10 that needs to be wiped. In the present embodiment, the wiping head 120 can be slightly rotated relative to the body 110 to conform to the direction of the workpiece 10 to be wiped, that is, the wiping head 120 is still water after the rotation. Flat, but the moving direction of the wiping head 120 along the second axis A2 can be correspondingly changed, for example, the direction of the second axis A2 is changed from the original left-right direction to the upper left and lower right directions, and the like. Therefore, if the body 110 is provided with a plurality of wiping heads 120, the wiping heads 120 can be respectively rotated relative to the body 110, and in operation, respectively, moved in different directions according to the requirements.
綜上所述，本創作之擦拭機構不需將整個本體全部下移來對工件進行擦拭，由於擦拭頭可相對於本體沿第一軸線與第二軸線移動，操作時只要將擦拭頭相對於本體沿第一軸線下移，並沿第二軸線進行往復運動以擦拭工件即可，相較於習知，本創作之擦拭機構除了較為節省操作的能源以及運作空間之外，本體上亦可設置多個擦拭頭，以同時對多個工件進行清潔。此外，本創作之擦拭機構的擦拭頭可相對於本體轉動，以改變第二軸線的方向，若承載單元上的工件發生偏移的狀況，擦拭頭可對應地調整方向以進行擦拭。In summary, the wiping mechanism of the present invention does not need to move the entire body down to wipe the workpiece. Since the wiping head can move relative to the body along the first axis and the second axis, the wiping head can be operated relative to the body. It can be moved down along the first axis and reciprocated along the second axis to wipe the workpiece. Compared with the prior art, the wiping mechanism of the present invention can be installed on the body in addition to the energy saving and operation space. Wipe the head to clean multiple workpieces at the same time. In addition, the wiping head of the wiping mechanism of the present invention can be rotated relative to the body to change the direction of the second axis. If the workpiece on the carrying unit is displaced, the wiping head can be correspondingly adjusted for wiping.
雖然本創作已以實施例揭露如上，然其並非用以限定本創作，任何所屬技術領域中具有通常知識者，在不脫離本創作之精神和範圍內，當可作些許之更動與潤飾，故本創作之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any person having ordinary knowledge in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of protection of this creation is subject to the definition of the scope of the patent application attached.
W‧‧‧擦拭區W‧‧‧Washing area
A1‧‧‧第一軸線A1‧‧‧first axis
A2‧‧‧第二軸線A2‧‧‧second axis
A3‧‧‧第二軸線A3‧‧‧second axis
10‧‧‧工件10‧‧‧Workpiece
20‧‧‧承載單元20‧‧‧Loading unit
30‧‧‧第三驅動單元30‧‧‧third drive unit
100‧‧‧擦拭機構100‧‧‧wiping mechanism
110‧‧‧本體110‧‧‧ body
111‧‧‧輸送裝置111‧‧‧Conveyor
112‧‧‧放捲單元112‧‧‧Unwinding unit
114‧‧‧收捲單元114‧‧‧Winding unit
116‧‧‧擦拭巾116‧‧‧ wipes
118‧‧‧移動件118‧‧‧Mobile parts
120‧‧‧擦拭頭120‧‧‧Wiping head
130‧‧‧第一軌道130‧‧‧First track
140‧‧‧第二軌道140‧‧‧second track
150‧‧‧第一驅動單元150‧‧‧First drive unit
160‧‧‧第二驅動單元160‧‧‧Second drive unit
170‧‧‧液體供應單元170‧‧‧Liquid supply unit
圖1是依照本創作之一實施例之一種擦拭機構的示意圖。1 is a schematic illustration of a wiping mechanism in accordance with an embodiment of the present invention.
圖2至圖4是圖1之擦拭機構作動的示意圖。2 to 4 are schematic views of the operation of the wiping mechanism of Fig. 1.
W‧‧‧擦拭區W‧‧‧Washing area
A1‧‧‧第一軸線A1‧‧‧first axis
A2‧‧‧第二軸線A2‧‧‧second axis
A3‧‧‧第二軸線A3‧‧‧second axis
10‧‧‧工件10‧‧‧Workpiece
20‧‧‧承載單元20‧‧‧Loading unit
30‧‧‧第三驅動單元30‧‧‧third drive unit
100‧‧‧擦拭機構100‧‧‧wiping mechanism
110‧‧‧本體110‧‧‧ body
111‧‧‧輸送裝置111‧‧‧Conveyor
112‧‧‧放捲單元112‧‧‧Unwinding unit
114‧‧‧收捲單元114‧‧‧Winding unit
116‧‧‧擦拭巾116‧‧‧ wipes
118‧‧‧移動件118‧‧‧Mobile parts
120‧‧‧擦拭頭120‧‧‧Wiping head
130‧‧‧第一軌道130‧‧‧First track
140‧‧‧第二軌道140‧‧‧second track
150‧‧‧第一驅動單元150‧‧‧First drive unit
160‧‧‧第二驅動單元160‧‧‧Second drive unit
170‧‧‧液體供應單元170‧‧‧Liquid supply unit
Claims (11)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW102200191U TWM452577U (en) | 2013-01-04 | 2013-01-04 | Wiping mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW102200191U TWM452577U (en) | 2013-01-04 | 2013-01-04 | Wiping mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWM452577U true TWM452577U (en) | 2013-05-01 |
Family
ID=49079007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102200191U TWM452577U (en) | 2013-01-04 | 2013-01-04 | Wiping mechanism |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWM452577U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111743439A (en) * | 2020-07-02 | 2020-10-09 | 许凤霞 | Patient back belt cleaning device |
| CN114713534A (en) * | 2022-06-08 | 2022-07-08 | 深圳市誉辰智能装备股份有限公司 | Battery filling port wiping device |
| WO2023061144A1 (en) * | 2021-10-12 | 2023-04-20 | 宁德时代新能源科技股份有限公司 | Wiping device and cleaning apparatus |
-
2013
- 2013-01-04 TW TW102200191U patent/TWM452577U/en not_active IP Right Cessation
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111743439A (en) * | 2020-07-02 | 2020-10-09 | 许凤霞 | Patient back belt cleaning device |
| CN111743439B (en) * | 2020-07-02 | 2022-01-28 | 许凤霞 | Patient back belt cleaning device |
| WO2023061144A1 (en) * | 2021-10-12 | 2023-04-20 | 宁德时代新能源科技股份有限公司 | Wiping device and cleaning apparatus |
| US11833549B1 (en) | 2021-10-12 | 2023-12-05 | Contemporary Amperex Technology Co., Limited | Wiping device and cleaning device |
| CN114713534A (en) * | 2022-06-08 | 2022-07-08 | 深圳市誉辰智能装备股份有限公司 | Battery filling port wiping device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4K | Annulment or lapse of a utility model due to non-payment of fees |