TWM449795U - Substrate conveying system - Google Patents

Description

Substrate delivery system

This creation relates to a substrate transport system, and more particularly to a substrate transport system that avoids liquid leakage.

In modern high-tech industries such as PCB (printed circuit board), FPD (flat panel display), PV (light energy battery), etc., the product structure may include a sheet-shaped and flexible flexible substrate. In the PCB industry, the flexible substrate can be formed by a chemical pretreatment process, a development/etching/stripping process, a horizontal desmear and copper plating process, a horizontal browning process, and a horizontal chemical silver process.

The processing method of the soft substrate processing flow includes a immersion type and a spray type, wherein the immersion type is provided with a chemical treatment liquid in a treatment tank, and the soft substrate is sent into the treatment tank by the roller device, and the chemical treatment liquid is The flexible substrate is chemically treated, and the soft substrate from which the chemical reaction is completed is sent out of the treatment tank by a roller device. In the shower type, the flexible substrate is sent to a processing chamber, and the chemical treatment liquid is sprayed on the flexible substrate for chemical treatment by spraying, and the soft substrate completed by the chemical reaction is sent out to the processing chamber by the roller device. Regardless of the method, when the flexible substrate is sent out of the treatment tank or the processing chamber, the chemical treatment liquid is trapped, which not only causes waste of the chemical treatment liquid, but also pollutes the roller device, the conveying system and the environment.

In addition, in a conventional etching apparatus described in Taiwan Patent No. M363073, a feeding floating wheel and an discharging floating wheel are respectively arranged at the inlet and the outlet of a soaking tank, and the floating wheel and the discharging float are respectively arranged. One of the wheels is used to close the inlet and outlet of the soaking tank to avoid leakage of the soaking liquid. When the substrate is to enter the immersion tank, the clamp holding the substrate will top the feed floating wheel to smoothly feed the substrate into the immersion tank. When the substrate is processed, the clamp will send the substrate out of the immersion tank, and the fixture will The discharge floating wheel is topped up to smoothly send the substrate out of the soaking tank. During the process of the feeding floating wheel and the discharging floating wheel being topped, some soaking liquids are leaked from the soaking tank.

In view of the lack of prior art, the present invention proposes a substrate delivery system that avoids handling liquid leakage.

In order to achieve the above object, in the implementation of the present invention, a substrate transport system is provided, including a processing section, an input section and an output section, the processing section is located at a first height, and the input section has a relative first And a second end, the first end is located at a second height, the second height is higher than the first height, and the second end is connected in series with one end of the processing segment, and the input segment provides a The substrate is transported into the processing section, the output section has a third end and a fourth end, the third end is connected in series with the processing section with respect to one end of the input section, and the fourth end is located at a The third height is higher than the first height, and the substrate is transported into the output section by the processing section.

In order to enable your review committee to have a better understanding and recognition of the structural purpose and efficacy of this creation, please follow the detailed description of the illustration.

The following description will be made with reference to the accompanying drawings to make this creation The technical means and functions used, and the embodiments listed in the following figures are only supplementary explanations, which are useful to the reviewers, but the technical means of the case are not limited to the listed figures.

Referring to the first to third figures, the substrate transport system 100 includes a processing section 10, an input section 20, and an output section 30. In the present embodiment, the substrate transport system 100 includes two symmetrically disposed tracks 1A, 1B, each of which presents a trapezoidal concave structure.

The processing section 10 is located at a first height H1. The processing section 10 is provided with a processing tank 40. The processing tank 40 is provided with a processing liquid 41 having a liquid level height H and the first height. H1 is preferably greater than the liquid level H. The processing liquid 41 is used for chemical treatment of a substrate 50, such as development/etching/stripping treatment, horizontal degreasing and copper plating, horizontal browning, and horizontal chemical silver processing, depending on the processing process. The type of liquid 41 and the chemical properties it has are also different. The substrate 50 can be a soft electronic material, a flexible electronic substrate, a malleable material, or a material having elasticity or flexibility, or a copper foil suitable for the PCB industry. In this embodiment, the substrate 50 is clamped and supported by a clamp 60. The shape of the clamp 60 is not limited. For example, a magnetic clamp can be used, and the magnetic force is used to attract and clamp the opposite sides of the substrate 50. The substrate or the tension device described in the Taiwan Patent Application No. 101, 214, 591, issued to the Japanese Patent Application Serial No The clamp 60 has two sides extending corresponding to the positions of the rails 1A, 1B. The plurality of rollers 61 are provided. The clamp 60 can be driven by a chain (not shown), and the rollers 61 roll in the rails 1A, 1B to assist the clamp 60 together. The substrate 50 is moved to transfer the substrate 50 The input segment 20 is transmitted to the processing segment 10, and the substrate 50 is transferred to the output segment 30 by the processing segment 10.

The input section 20 includes a first horizontal section 21 and a first buffer section 22, the first horizontal section 21 is located at a second height H2, the second height H2 is higher than the first height H1, and the first horizontal section 21 Extending horizontally at the second height H2 has a length. The first buffer section 22 has opposite ends, and one end of the first buffer section 22 (that is, the left end of the first buffer section 22 is shown) is connected to the first horizontal section 21, and the other end of the first buffer section 22 (ie, The right end of the first buffer section 22 is shown connected to the processing section 10.

The output section 30 includes a second buffer section 31 and a second horizontal section 32. The second buffer section 31 has opposite ends, and one end of the second buffer section 31 (that is, the left end of the second buffer section 31 is shown) is connected to the processing section 10 with respect to one end of the input section 20, and the second buffer is connected. The other end of the segment 31 (i.e., the right end of the second buffer segment 31 is shown) is located at a third height H3. The second horizontal section 32 is located at the third height H3, and the second horizontal section 32 extends horizontally at the third height H3 to have a length, and one end of the second horizontal section 32 (ie, the second horizontal section is illustrated) The left end of 32 is connected in series with the end of the second buffer section 31 at the third height H3. The third height H3 may be the same as or different from the second height H2, but the second height H2 and the third height H3 are both higher than the first height H1.

Referring to the fourth to sixth figures, the continuous operation of the substrate for transporting the present invention will be described. The partial structure is simplified in the fourth to sixth figures to clearly show the progress of the substrate. The substrate 50 passes through the first buffer section 22 from the first horizontal section 21 and then enters the processing section 10 (as shown in the fourth figure). When the substrate 50 is transported in the processing section 10, the substrate 50 is located in the processing tank 40. And The substrate 50 is submerged in the processing liquid 41 (as shown in FIG. 5). At this time, the substrate 50 stays in the processing tank 40, and can react with the processing liquid 41 in the processing tank 40. After the reaction is completed, The substrate 50 is then sent out of the processing tank 40 (as shown in FIG. 6), and the substrate 50 can be climbed by the second buffer section 31 to the second horizontal section 32. When the substrate 50 leaves the processing tank 40, the processing liquid 41 attached to the substrate 50 may drip into the second buffer section 31 and be returned to the processing tank 40. In the present embodiment, since the additional jig is used, the substrate can be kept flat and hardly deformed when changing the traveling direction, and the conveying system of the present invention can be used to keep the processing liquid from leaking before and after the immersion.

Referring to the seventh embodiment, the embodiment shows that the output section 30 is provided with a cleaning device 70 for spraying the cleaning liquid 71 toward the output section 30, and the cleaning liquid 71 can use water. The cleaning liquid 71 is sprayed on the substrate 50 by the cleaning device 70, and the processing liquid carried by the substrate 50 is cleaned by the cleaning liquid 71 to prevent the processing liquid from remaining on the substrate 50. The amount of the cleaning liquid 71 actually required to be sprayed can be controlled depending on the size of the substrate 50 and the type of the processing liquid 41. The sprayed cleaning liquid 71 together with the processing liquid flushed by the substrate 50 can flow into the processing tank 40 at the same time, so that waste of the processing liquid 41 is not caused. The amount of the cleaning liquid 71 that the cleaning device 70 cleans the substrate 50 each time is small with respect to the amount of the processing liquid 41 in the processing tank 40, in other words, within a tolerance range, even if the cleaning liquid 71 flows into the processing tank 40 and is processed The mixing of the liquid 41, although causing the treatment liquid 41 to be diluted, does not affect the chemical reaction ability of the treatment liquid 41 to the substrate 50. The user can also monitor the purity of the treatment liquid 41 according to actual needs. When the purity of the treatment liquid 41 is lower than the allowable value, the treatment liquid 41 can be further added to make the treatment The purity of the liquid 41 can always be maintained within the permissible range.

Referring to the embodiment shown in FIG. 8, the substrate transport system 200 includes an input section 210, a processing section 220, and an output section 230 in series. A plurality of clamps 240 are disposed on two sides of the substrate 50. The clamps 240 are driven by a chain belt 250 and a plurality of rollers 260 to move the substrate 50 from the input section 210 and the processing section 220 to the output section 230. A processing tank 40 is disposed in the processing section 220, a processing liquid 41 is disposed in the processing tank 40, and a cleaning device 70 is disposed in the output section 230. The main feature of this embodiment is that the height of the processing section 220 is lower than the height of the input section 210 and the output 230, so that the processing liquid 41 carried by the substrate 50 can be returned to the processing liquid 41 without causing leakage.

The architecture of the different embodiments described above has many different implementation modes. The main feature of the present invention is that the trapezoidal recessed processing tank is used with the descending input section and the climbed output section, and is carried by the cleaning device with the cleaning device. The treatment liquid can reflow the processing liquid carried by the substrate into the treatment tank, and the purpose of avoiding the leakage of the treatment liquid can be achieved, so that the treatment liquid can exert the optimal treatment benefit and reaction effect.

In order to avoid unnecessarily obscuring the technical content of the present invention, the above description omits several components or devices. In other words, the chain, chain belt or roller must be operated by the connection of a transmission mechanism such as a motor or a gear. These transmission mechanisms can be easily accomplished by those skilled in the art with reference to the technical content of the present invention.

However, the above is only an embodiment of the present invention, and the scope of the creation of the present invention cannot be limited. That is to say, the equal changes and modifications made by Dafan in accordance with the scope of application for the creation of this creation should still fall within the scope covered by this creation patent. I would like to ask your review committee to give a clear understanding and pray for it. It is the prayer.

100, 200‧‧‧ substrate transport system

1A, 1B‧‧ Track

10, 220‧‧ ‧ processing section

20, 210‧‧‧ input section

21‧‧‧First horizontal section

22‧‧‧First buffer section

30, 230‧‧‧ Output section

31‧‧‧Second buffer

32‧‧‧Second horizontal section

40‧‧‧Processing tank

41‧‧‧Processing liquid

50‧‧‧Substrate

60, 240‧‧ ‧ fixture

61, 260‧‧‧ Wheels

70‧‧‧cleaning device

71‧‧‧ Cleaning liquid

250‧‧‧Chain

H‧‧‧ liquid level

H1‧‧‧ first height

H2‧‧‧second height

H3‧‧‧ third height

The first figure is a schematic side view of one embodiment of the present creation.

The second figure is a schematic view of the top view of the first embodiment with the fixture.

The third figure is a schematic view of the A-A cross-sectional structure of the second figure.

The fourth to sixth figures are schematic diagrams of the actions of the first embodiment with the jig.

The seventh figure is a schematic diagram of the structure of the cleaning device.

The eighth figure is a schematic view of a front view of another embodiment of the present creation.

100‧‧‧Substrate delivery system

10‧‧‧Processing section

20‧‧‧ Input section

21‧‧‧First horizontal section

22‧‧‧First buffer section

30‧‧‧Output segment

31‧‧‧Second buffer

32‧‧‧Second horizontal section

40‧‧‧Processing tank

41‧‧‧Processing liquid

50‧‧‧Substrate

60‧‧‧ fixture

61‧‧‧Roller

H‧‧‧ liquid level

H1‧‧‧ first height

H2‧‧‧second height

H3‧‧‧ third height

Claims (6)

A substrate transport system comprising: a processing section at a first height; an input section having a first end and a second end, the first end being at a second height, the second a height system is higher than the first height, the second end is connected in series with one end of the processing section, the input section provides a substrate to be transported into the processing section; and an output section having a third end And a fourth end, the third end is connected in series with the processing segment with respect to one end of the input segment, the fourth end is located at a third height, and the third height is higher than the first height, the substrate The processing segment is transmitted into the output segment. The substrate transport system of claim 1, wherein the input segment comprises: a first horizontal segment, the first horizontal segment is located at the second height, and the first horizontal segment is at the second height level And extending a length; and a first buffer segment having opposite ends, wherein one end of the first buffer segment is connected to the first horizontal segment, and the other end of the first buffer segment is connected to the processing segment. The substrate transport system of claim 1, wherein the output section comprises: a second buffer section having opposite ends, wherein one end of the second buffer section is connected to the processing section with respect to the input section One end is connected, the other end of the second buffer segment is located at the third height; and a second horizontal segment is located at the third height, and the second horizontal segment extends a length horizontally at the third height. One end of the second horizontal section The end of the second buffer segment is located in series with the third height. The substrate transport system of claim 1, wherein the processing section is located in a processing tank, the processing tank is provided with a processing liquid, the processing liquid has a liquid level, and the substrate is transported at the processing In the segment, the substrate is located in the processing tank, and the substrate is submerged in the processing liquid. The substrate transport system of claim 1, wherein the output section is provided with at least one cleaning device that sprays the cleaning liquid toward the substrate located at the output section. The substrate delivery system of claim 5, wherein the cleaning liquid is water.