TWI904296B - 感光性樹脂組合物、硬化物、黑色矩陣及圖像顯示裝置 - Google Patents

感光性樹脂組合物、硬化物、黑色矩陣及圖像顯示裝置

Info

Publication number
TWI904296B
TWI904296B TW110145629A TW110145629A TWI904296B TW I904296 B TWI904296 B TW I904296B TW 110145629 A TW110145629 A TW 110145629A TW 110145629 A TW110145629 A TW 110145629A TW I904296 B TWI904296 B TW I904296B
Authority
TW
Taiwan
Prior art keywords
mass
photosensitive resin
resin composition
group
acid
Prior art date
Application number
TW110145629A
Other languages
English (en)
Chinese (zh)
Other versions
TW202231700A (zh
Inventor
砂留知子
中谷和裕
宮崎貴裕
野口貴志
Original Assignee
日商三菱化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商三菱化學股份有限公司 filed Critical 日商三菱化學股份有限公司
Publication of TW202231700A publication Critical patent/TW202231700A/zh
Application granted granted Critical
Publication of TWI904296B publication Critical patent/TWI904296B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW110145629A 2020-12-10 2021-12-07 感光性樹脂組合物、硬化物、黑色矩陣及圖像顯示裝置 TWI904296B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020205091 2020-12-10
JP2020-205091 2020-12-10

Publications (2)

Publication Number Publication Date
TW202231700A TW202231700A (zh) 2022-08-16
TWI904296B true TWI904296B (zh) 2025-11-11

Family

ID=81974531

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110145629A TWI904296B (zh) 2020-12-10 2021-12-07 感光性樹脂組合物、硬化物、黑色矩陣及圖像顯示裝置

Country Status (5)

Country Link
JP (1) JPWO2022124296A1 (https=)
KR (1) KR20230117134A (https=)
CN (1) CN116568717A (https=)
TW (1) TWI904296B (https=)
WO (1) WO2022124296A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119717391A (zh) * 2023-09-28 2025-03-28 太阳油墨（苏州）有限公司 碱性显影型树脂组合物、干膜、固化物和具有该固化物的电子部件
JPWO2025116027A1 (https=) * 2023-12-01 2025-06-05

Citations (2)

* Cited by examiner, † Cited by third party
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JP2017142475A (ja) * 2016-02-10 2017-08-17 Dic株式会社 着色硬化性樹脂組成物及びその硬化膜
JP2018025612A (ja) * 2016-08-08 2018-02-15 株式会社Ｄｎｐファインケミカル カラーフィルタ用着色組成物、カラーフィルタ及び表示装置

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WO2000058788A1 (fr) * 1999-03-26 2000-10-05 Nippon Steel Chemical Co., Ltd. Article multicouche photopolymerisable haute definition et dispositif semiconducteur fabrique avec cet article
JP2003322716A (ja) * 2002-02-28 2003-11-14 Mitsubishi Chemicals Corp カラーフィルター用組成物及びカラーフィルター
JP2008225128A (ja) * 2007-03-14 2008-09-25 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
JP2010169813A (ja) * 2009-01-21 2010-08-05 Fujifilm Corp カラーフィルタ用着色硬化性組成物層の形成方法、カラーフィルタ、および液晶表示装置
KR101400195B1 (ko) 2010-12-21 2014-06-19 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
WO2017077662A1 (ja) * 2015-11-02 2017-05-11 互応化学工業株式会社 感光性樹脂組成物、ドライフィルム、プリント配線板
JP6607054B2 (ja) 2016-01-20 2019-11-20 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
CN109804310B (zh) * 2016-09-30 2022-09-30 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法
JP7120234B2 (ja) * 2017-06-29 2022-08-17 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
WO2019065456A1 (ja) * 2017-09-26 2019-04-04 富士フイルム株式会社 硬化性組成物、硬化膜、固体撮像装置、及び、硬化膜の製造方法
JP7230558B2 (ja) * 2018-02-16 2023-03-01 三菱ケミカル株式会社 着色樹脂組成物、カラーフィルタ、及び画像表示装置
WO2021111860A1 (ja) * 2019-12-02 2021-06-10 東レ株式会社 感光性組成物、ネガ型感光性組成物、画素分割層および有機ｅｌ表示装置
JP7676778B2 (ja) * 2019-12-20 2025-05-15 東レ株式会社 表示装置
JP7592989B2 (ja) * 2020-06-26 2024-12-03 東レ株式会社 感光性組成物、硬化物および有機ｅｌ表示装置
CN113568848B (zh) * 2020-07-29 2023-07-11 华为技术有限公司 处理器、信号调整方法及计算机系统
KR20230078994A (ko) * 2020-09-29 2023-06-05 도레이 카부시키가이샤 감광성 수지 조성물, 경화물, 및 표시 장치, 그리고 경화물의 제조 방법
JP7612368B2 (ja) * 2020-10-07 2025-01-14 株式会社Adeka 重合性組成物、硬化物、表示装置及び硬化物の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017142475A (ja) * 2016-02-10 2017-08-17 Dic株式会社 着色硬化性樹脂組成物及びその硬化膜
JP2018025612A (ja) * 2016-08-08 2018-02-15 株式会社Ｄｎｐファインケミカル カラーフィルタ用着色組成物、カラーフィルタ及び表示装置

Also Published As

Publication number Publication date
KR20230117134A (ko) 2023-08-07
TW202231700A (zh) 2022-08-16
JPWO2022124296A1 (https=) 2022-06-16
WO2022124296A1 (ja) 2022-06-16
CN116568717A (zh) 2023-08-08

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