KR20230117134A - 감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치 - Google Patents

감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치 Download PDF

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KR20230117134A
KR20230117134A KR1020237019040A KR20237019040A KR20230117134A KR 20230117134 A KR20230117134 A KR 20230117134A KR 1020237019040 A KR1020237019040 A KR 1020237019040A KR 20237019040 A KR20237019040 A KR 20237019040A KR 20230117134 A KR20230117134 A KR 20230117134A
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South Korea
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mass
group
preferable
resin composition
photosensitive resin
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Korean (ko)
Inventor
도모코 스나도메
가즈히로 나카타니
다카히로 미야자키
다카시 노구치
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미쯔비시 케미컬 주식회사
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Publication of KR20230117134A publication Critical patent/KR20230117134A/ko
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020237019040A 2020-12-10 2021-12-07 감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치 Pending KR20230117134A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020205091 2020-12-10
JPJP-P-2020-205091 2020-12-10
PCT/JP2021/044876 WO2022124296A1 (ja) 2020-12-10 2021-12-07 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置

Publications (1)

Publication Number Publication Date
KR20230117134A true KR20230117134A (ko) 2023-08-07

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KR1020237019040A Pending KR20230117134A (ko) 2020-12-10 2021-12-07 감광성 수지 조성물, 경화물, 블랙 매트릭스 및 화상 표시 장치

Country Status (5)

Country Link
JP (1) JPWO2022124296A1 (https=)
KR (1) KR20230117134A (https=)
CN (1) CN116568717A (https=)
TW (1) TWI904296B (https=)
WO (1) WO2022124296A1 (https=)

Families Citing this family (2)

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Publication number Priority date Publication date Assignee Title
CN119717391A (zh) * 2023-09-28 2025-03-28 太阳油墨（苏州）有限公司 碱性显影型树脂组合物、干膜、固化物和具有该固化物的电子部件
JPWO2025116027A1 (https=) * 2023-12-01 2025-06-05

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120089914A (ko) 2010-12-21 2012-08-16 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 차광층
JP2017129740A (ja) 2016-01-20 2017-07-27 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置

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WO2000058788A1 (fr) * 1999-03-26 2000-10-05 Nippon Steel Chemical Co., Ltd. Article multicouche photopolymerisable haute definition et dispositif semiconducteur fabrique avec cet article
JP2003322716A (ja) * 2002-02-28 2003-11-14 Mitsubishi Chemicals Corp カラーフィルター用組成物及びカラーフィルター
JP2008225128A (ja) * 2007-03-14 2008-09-25 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ
JP2010169813A (ja) * 2009-01-21 2010-08-05 Fujifilm Corp カラーフィルタ用着色硬化性組成物層の形成方法、カラーフィルタ、および液晶表示装置
WO2017077662A1 (ja) * 2015-11-02 2017-05-11 互応化学工業株式会社 感光性樹脂組成物、ドライフィルム、プリント配線板
JP6844121B2 (ja) * 2016-02-10 2021-03-17 Dic株式会社 着色硬化性樹脂組成物及びその硬化膜
JP2018025612A (ja) * 2016-08-08 2018-02-15 株式会社Ｄｎｐファインケミカル カラーフィルタ用着色組成物、カラーフィルタ及び表示装置
CN109804310B (zh) * 2016-09-30 2022-09-30 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法
JP7120234B2 (ja) * 2017-06-29 2022-08-17 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置
WO2019065456A1 (ja) * 2017-09-26 2019-04-04 富士フイルム株式会社 硬化性組成物、硬化膜、固体撮像装置、及び、硬化膜の製造方法
JP7230558B2 (ja) * 2018-02-16 2023-03-01 三菱ケミカル株式会社 着色樹脂組成物、カラーフィルタ、及び画像表示装置
WO2021111860A1 (ja) * 2019-12-02 2021-06-10 東レ株式会社 感光性組成物、ネガ型感光性組成物、画素分割層および有機ｅｌ表示装置
JP7676778B2 (ja) * 2019-12-20 2025-05-15 東レ株式会社 表示装置
JP7592989B2 (ja) * 2020-06-26 2024-12-03 東レ株式会社 感光性組成物、硬化物および有機ｅｌ表示装置
CN113568848B (zh) * 2020-07-29 2023-07-11 华为技术有限公司 处理器、信号调整方法及计算机系统
KR20230078994A (ko) * 2020-09-29 2023-06-05 도레이 카부시키가이샤 감광성 수지 조성물, 경화물, 및 표시 장치, 그리고 경화물의 제조 방법
JP7612368B2 (ja) * 2020-10-07 2025-01-14 株式会社Adeka 重合性組成物、硬化物、表示装置及び硬化物の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120089914A (ko) 2010-12-21 2012-08-16 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 차광층
JP2017129740A (ja) 2016-01-20 2017-07-27 三菱ケミカル株式会社 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置

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TWI904296B (zh) 2025-11-11
TW202231700A (zh) 2022-08-16
JPWO2022124296A1 (https=) 2022-06-16
WO2022124296A1 (ja) 2022-06-16
CN116568717A (zh) 2023-08-08

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