TWI850760B - 以散焦束導引在對比操作模式操作一多束粒子顯微鏡的方法與電腦程式產品以及多束粒子顯微鏡 - Google Patents

以散焦束導引在對比操作模式操作一多束粒子顯微鏡的方法與電腦程式產品以及多束粒子顯微鏡 Download PDF

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Publication number
TWI850760B
TWI850760B TW111133659A TW111133659A TWI850760B TW I850760 B TWI850760 B TW I850760B TW 111133659 A TW111133659 A TW 111133659A TW 111133659 A TW111133659 A TW 111133659A TW I850760 B TWI850760 B TW I850760B
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Taiwan
Prior art keywords
detection
individual
particle
individual particle
particle beams
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TW111133659A
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English (en)
Chinese (zh)
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TW202326790A (zh
Inventor
斯特凡 舒伯特
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德商卡爾蔡司多重掃描電子顯微鏡有限公司
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2814—Measurement of surface topography

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
TW111133659A 2021-09-17 2022-09-06 以散焦束導引在對比操作模式操作一多束粒子顯微鏡的方法與電腦程式產品以及多束粒子顯微鏡 TWI850760B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021124099.9 2021-09-17
DE102021124099.9A DE102021124099B4 (de) 2021-09-17 2021-09-17 Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskops in einem Kontrast-Betriebsmodus mit defokussierter Strahlführung, Computerprogramprodukt und Vielstrahlteilchenmikroskop

Publications (2)

Publication Number Publication Date
TW202326790A TW202326790A (zh) 2023-07-01
TWI850760B true TWI850760B (zh) 2024-08-01

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TW111133659A TWI850760B (zh) 2021-09-17 2022-09-06 以散焦束導引在對比操作模式操作一多束粒子顯微鏡的方法與電腦程式產品以及多束粒子顯微鏡

Country Status (9)

Country Link
US (1) US20240222069A1 (https=)
EP (1) EP4402710A1 (https=)
JP (1) JP7854044B2 (https=)
KR (1) KR102930155B1 (https=)
CN (1) CN117957631A (https=)
DE (1) DE102021124099B4 (https=)
NL (1) NL2033047B1 (https=)
TW (1) TWI850760B (https=)
WO (1) WO2023041191A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240128051A1 (en) 2022-10-14 2024-04-18 Carl Zeiss Multisem Gmbh Multi-beam charged particle beam system with anisotropic filtering for improved image contrast
WO2024227537A1 (en) 2023-05-02 2024-11-07 Carl Zeiss Multisem Gmbh Multi-beam charged particle microscope for inspection with improved image contrast

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JP2011192498A (ja) * 2010-03-15 2011-09-29 Hitachi High-Technologies Corp 検査装置および検査方法
US20170316912A1 (en) * 2015-02-06 2017-11-02 Carl Zeiss Microscopy Gmbh Particle beam system and method for the particle-optical examination of an object
US20190355544A1 (en) * 2017-03-20 2019-11-21 Carl Zeiss Microscopy Gmbh Charged particle beam system and method
TW202107507A (zh) * 2019-07-02 2021-02-16 荷蘭商Ａｓｍｌ荷蘭公司 帶電粒子束之局部控制的裝置和方法

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DE10236738B9 (de) 2002-08-09 2010-07-15 Carl Zeiss Nts Gmbh Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren
CN102709143B (zh) 2003-09-05 2016-03-09 卡尔蔡司Smt有限责任公司 电子光学排布结构、多电子分束检验系统和方法
JP5663717B2 (ja) 2005-09-06 2015-02-04 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 荷電粒子システム
CN102103966B (zh) 2005-11-28 2013-02-06 卡尔蔡司Smt有限责任公司 粒子光学组件
US9336981B2 (en) 2010-04-09 2016-05-10 Applied Materials Israel Ltd. Charged particle detection system and multi-beamlet inspection system
JP5951985B2 (ja) * 2011-12-27 2016-07-13 株式会社ホロン 円筒状原版検査装置および円筒状原版検査方法
DE102013014976A1 (de) 2013-09-09 2015-03-12 Carl Zeiss Microscopy Gmbh Teilchenoptisches System
DE102013016113B4 (de) 2013-09-26 2018-11-29 Carl Zeiss Microscopy Gmbh Verfahren zum Detektieren von Elektronen, Elektronendetektor und Inspektionssystem
NL2013411B1 (en) * 2014-09-04 2016-09-27 Univ Delft Tech Multi electron beam inspection apparatus.
JP2016139467A (ja) * 2015-01-26 2016-08-04 株式会社日立ハイテクノロジーズ 試料観察方法および試料観察装置
EP3104155A1 (en) * 2015-06-09 2016-12-14 FEI Company Method of analyzing surface modification of a specimen in a charged-particle microscope
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JP6581940B2 (ja) 2016-04-15 2019-09-25 株式会社日立ハイテクノロジーズ 電子顕微鏡装置
KR102468155B1 (ko) * 2017-02-07 2022-11-17 에이에스엠엘 네델란즈 비.브이. 하전 입자 검출 방법 및 장치
CN112055886A (zh) * 2018-02-27 2020-12-08 卡尔蔡司MultiSEM有限责任公司 带电粒子多束系统及方法
IL278076B2 (en) * 2018-04-20 2025-08-01 Asml Netherlands Bv Pixel shape and section shape selection for large active area high speed detector
DE102020123567B4 (de) 2020-09-09 2025-02-13 Carl Zeiss Multisem Gmbh Vielzahl-Teilchenstrahl-System mit Kontrast-Korrektur-Linsen-System

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Publication number Priority date Publication date Assignee Title
JP2011192498A (ja) * 2010-03-15 2011-09-29 Hitachi High-Technologies Corp 検査装置および検査方法
US20170316912A1 (en) * 2015-02-06 2017-11-02 Carl Zeiss Microscopy Gmbh Particle beam system and method for the particle-optical examination of an object
TW202133210A (zh) * 2015-02-06 2021-09-01 德商卡爾蔡司多重掃描電子顯微鏡有限公司 粒子束系統及物件之粒子光學檢查的方法
US20190355544A1 (en) * 2017-03-20 2019-11-21 Carl Zeiss Microscopy Gmbh Charged particle beam system and method
TW202107507A (zh) * 2019-07-02 2021-02-16 荷蘭商Ａｓｍｌ荷蘭公司 帶電粒子束之局部控制的裝置和方法

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Publication number Publication date
EP4402710A1 (de) 2024-07-24
US20240222069A1 (en) 2024-07-04
TW202326790A (zh) 2023-07-01
KR102930155B1 (ko) 2026-02-25
DE102021124099A1 (de) 2023-03-23
NL2033047B1 (en) 2023-08-04
JP7854044B2 (ja) 2026-04-30
NL2033047A (en) 2023-03-24
JP2024535055A (ja) 2024-09-26
KR20240055877A (ko) 2024-04-29
DE102021124099B4 (de) 2023-09-28
WO2023041191A1 (de) 2023-03-23
CN117957631A (zh) 2024-04-30

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