JP7854044B2 - デフォーカスされるビームの誘導でコントラスト動作モードにおいてマルチビーム粒子顕微鏡を動作させるための方法、コンピュータプログラムおよびマルチビーム粒子顕微鏡 - Google Patents

デフォーカスされるビームの誘導でコントラスト動作モードにおいてマルチビーム粒子顕微鏡を動作させるための方法、コンピュータプログラムおよびマルチビーム粒子顕微鏡

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JP7854044B2
JP7854044B2 JP2024516984A JP2024516984A JP7854044B2 JP 7854044 B2 JP7854044 B2 JP 7854044B2 JP 2024516984 A JP2024516984 A JP 2024516984A JP 2024516984 A JP2024516984 A JP 2024516984A JP 7854044 B2 JP7854044 B2 JP 7854044B2
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detection
individual
particle
individual particle
contrast
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JP2024535055A5 (https=
JP2024535055A (ja
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シュテファン シューベルト
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カール ツァイス マルティセム ゲゼルシヤフト ミット ベシュレンクテル ハフツング
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2813—Scanning microscopes characterised by the application
    • H01J2237/2814—Measurement of surface topography

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2024516984A 2021-09-17 2022-08-31 デフォーカスされるビームの誘導でコントラスト動作モードにおいてマルチビーム粒子顕微鏡を動作させるための方法、コンピュータプログラムおよびマルチビーム粒子顕微鏡 Active JP7854044B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102021124099.9 2021-09-17
DE102021124099.9A DE102021124099B4 (de) 2021-09-17 2021-09-17 Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskops in einem Kontrast-Betriebsmodus mit defokussierter Strahlführung, Computerprogramprodukt und Vielstrahlteilchenmikroskop
PCT/EP2022/025403 WO2023041191A1 (de) 2021-09-17 2022-08-31 Verfahren zum betreiben eines vielstrahl-teilchenmikroskops in einem kontrast-betriebsmodus mit defokussierter strahlführung, computerprogramprodukt und vielstrahlteilchenmikroskop

Publications (3)

Publication Number Publication Date
JP2024535055A JP2024535055A (ja) 2024-09-26
JP2024535055A5 JP2024535055A5 (https=) 2026-02-09
JP7854044B2 true JP7854044B2 (ja) 2026-04-30

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JP2024516984A Active JP7854044B2 (ja) 2021-09-17 2022-08-31 デフォーカスされるビームの誘導でコントラスト動作モードにおいてマルチビーム粒子顕微鏡を動作させるための方法、コンピュータプログラムおよびマルチビーム粒子顕微鏡

Country Status (9)

Country Link
US (1) US20240222069A1 (https=)
EP (1) EP4402710A1 (https=)
JP (1) JP7854044B2 (https=)
KR (1) KR102930155B1 (https=)
CN (1) CN117957631A (https=)
DE (1) DE102021124099B4 (https=)
NL (1) NL2033047B1 (https=)
TW (1) TWI850760B (https=)
WO (1) WO2023041191A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240128051A1 (en) 2022-10-14 2024-04-18 Carl Zeiss Multisem Gmbh Multi-beam charged particle beam system with anisotropic filtering for improved image contrast
WO2024227537A1 (en) 2023-05-02 2024-11-07 Carl Zeiss Multisem Gmbh Multi-beam charged particle microscope for inspection with improved image contrast

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JP2004134387A (ja) 2002-08-09 2004-04-30 Leo Elektronenmikroskopie Gmbh 電子顕微鏡システム及び電子顕微鏡法
JP2011192498A (ja) 2010-03-15 2011-09-29 Hitachi High-Technologies Corp 検査装置および検査方法
JP2013135136A (ja) 2011-12-27 2013-07-08 Horon:Kk 円筒状原版検査装置および円筒状原版検査方法
JP2016139467A (ja) 2015-01-26 2016-08-04 株式会社日立ハイテクノロジーズ 試料観察方法および試料観察装置
JP2017004948A (ja) 2015-06-09 2017-01-05 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子顕微鏡において、試料の表面修正を分析する方法
US20170243717A1 (en) 2014-09-04 2017-08-24 Technische Universiteit Delft Multi electron beam inspection apparatus
US20170316912A1 (en) 2015-02-06 2017-11-02 Carl Zeiss Microscopy Gmbh Particle beam system and method for the particle-optical examination of an object
JP2020506509A (ja) 2017-02-07 2020-02-27 エーエスエムエル ネザーランズ ビー．ブイ． 荷電粒子検出のための方法及び装置
US20210005423A1 (en) 2018-02-27 2021-01-07 Carl Zeiss Multisem Gmbh Charged particle beam system and method
JP2021520029A (ja) 2018-04-20 2021-08-12 エーエスエムエル ネザーランズ ビー．ブイ． 広アクティブ領域高速検出器のピクセル形状及びセクション形状の選択

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CN102709143B (zh) 2003-09-05 2016-03-09 卡尔蔡司Smt有限责任公司 电子光学排布结构、多电子分束检验系统和方法
JP5663717B2 (ja) 2005-09-06 2015-02-04 カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ 荷電粒子システム
CN102103966B (zh) 2005-11-28 2013-02-06 卡尔蔡司Smt有限责任公司 粒子光学组件
US9336981B2 (en) 2010-04-09 2016-05-10 Applied Materials Israel Ltd. Charged particle detection system and multi-beamlet inspection system
DE102013014976A1 (de) 2013-09-09 2015-03-12 Carl Zeiss Microscopy Gmbh Teilchenoptisches System
DE102013016113B4 (de) 2013-09-26 2018-11-29 Carl Zeiss Microscopy Gmbh Verfahren zum Detektieren von Elektronen, Elektronendetektor und Inspektionssystem
US10192716B2 (en) 2015-09-21 2019-01-29 Kla-Tencor Corporation Multi-beam dark field imaging
JP6581940B2 (ja) 2016-04-15 2019-09-25 株式会社日立ハイテクノロジーズ 電子顕微鏡装置
KR102520386B1 (ko) 2017-03-20 2023-04-11 칼 짜이스 마이크로스카피 게엠베하 하전 입자 빔 시스템 및 방법
EP3761340A1 (en) * 2019-07-02 2021-01-06 ASML Netherlands B.V. Apparatus for and method of local phase control of a charged particle beam
DE102020123567B4 (de) 2020-09-09 2025-02-13 Carl Zeiss Multisem Gmbh Vielzahl-Teilchenstrahl-System mit Kontrast-Korrektur-Linsen-System

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004134387A (ja) 2002-08-09 2004-04-30 Leo Elektronenmikroskopie Gmbh 電子顕微鏡システム及び電子顕微鏡法
JP2011192498A (ja) 2010-03-15 2011-09-29 Hitachi High-Technologies Corp 検査装置および検査方法
JP2013135136A (ja) 2011-12-27 2013-07-08 Horon:Kk 円筒状原版検査装置および円筒状原版検査方法
US20170243717A1 (en) 2014-09-04 2017-08-24 Technische Universiteit Delft Multi electron beam inspection apparatus
JP2016139467A (ja) 2015-01-26 2016-08-04 株式会社日立ハイテクノロジーズ 試料観察方法および試料観察装置
US20170316912A1 (en) 2015-02-06 2017-11-02 Carl Zeiss Microscopy Gmbh Particle beam system and method for the particle-optical examination of an object
JP2017004948A (ja) 2015-06-09 2017-01-05 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 荷電粒子顕微鏡において、試料の表面修正を分析する方法
JP2020506509A (ja) 2017-02-07 2020-02-27 エーエスエムエル ネザーランズ ビー．ブイ． 荷電粒子検出のための方法及び装置
US20210005423A1 (en) 2018-02-27 2021-01-07 Carl Zeiss Multisem Gmbh Charged particle beam system and method
JP2021520029A (ja) 2018-04-20 2021-08-12 エーエスエムエル ネザーランズ ビー．ブイ． 広アクティブ領域高速検出器のピクセル形状及びセクション形状の選択

Also Published As

Publication number Publication date
EP4402710A1 (de) 2024-07-24
US20240222069A1 (en) 2024-07-04
TW202326790A (zh) 2023-07-01
KR102930155B1 (ko) 2026-02-25
DE102021124099A1 (de) 2023-03-23
NL2033047B1 (en) 2023-08-04
TWI850760B (zh) 2024-08-01
NL2033047A (en) 2023-03-24
JP2024535055A (ja) 2024-09-26
KR20240055877A (ko) 2024-04-29
DE102021124099B4 (de) 2023-09-28
WO2023041191A1 (de) 2023-03-23
CN117957631A (zh) 2024-04-30

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