KR102930155B1 - 디포커싱된 빔 가이딩으로 콘트라스트 작동 모드에서 다중-빔 입자 현미경을 작동시키는 방법, 컴퓨터 프로그램 제품 및 다중-빔 입자 현미경 - Google Patents
디포커싱된 빔 가이딩으로 콘트라스트 작동 모드에서 다중-빔 입자 현미경을 작동시키는 방법, 컴퓨터 프로그램 제품 및 다중-빔 입자 현미경Info
- Publication number
- KR102930155B1 KR102930155B1 KR1020247012552A KR20247012552A KR102930155B1 KR 102930155 B1 KR102930155 B1 KR 102930155B1 KR 1020247012552 A KR1020247012552 A KR 1020247012552A KR 20247012552 A KR20247012552 A KR 20247012552A KR 102930155 B1 KR102930155 B1 KR 102930155B1
- Authority
- KR
- South Korea
- Prior art keywords
- detection
- particle
- individual
- contrast
- individual particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
- H01J2237/24465—Sectored detectors, e.g. quadrants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24495—Signal processing, e.g. mixing of two or more signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24578—Spatial variables, e.g. position, distance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24592—Inspection and quality control of devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2814—Measurement of surface topography
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102021124099.9 | 2021-09-17 | ||
| DE102021124099.9A DE102021124099B4 (de) | 2021-09-17 | 2021-09-17 | Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskops in einem Kontrast-Betriebsmodus mit defokussierter Strahlführung, Computerprogramprodukt und Vielstrahlteilchenmikroskop |
| PCT/EP2022/025403 WO2023041191A1 (de) | 2021-09-17 | 2022-08-31 | Verfahren zum betreiben eines vielstrahl-teilchenmikroskops in einem kontrast-betriebsmodus mit defokussierter strahlführung, computerprogramprodukt und vielstrahlteilchenmikroskop |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20240055877A KR20240055877A (ko) | 2024-04-29 |
| KR102930155B1 true KR102930155B1 (ko) | 2026-02-25 |
Family
ID=83191890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020247012552A Active KR102930155B1 (ko) | 2021-09-17 | 2022-08-31 | 디포커싱된 빔 가이딩으로 콘트라스트 작동 모드에서 다중-빔 입자 현미경을 작동시키는 방법, 컴퓨터 프로그램 제품 및 다중-빔 입자 현미경 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20240222069A1 (https=) |
| EP (1) | EP4402710A1 (https=) |
| JP (1) | JP7854044B2 (https=) |
| KR (1) | KR102930155B1 (https=) |
| CN (1) | CN117957631A (https=) |
| DE (1) | DE102021124099B4 (https=) |
| NL (1) | NL2033047B1 (https=) |
| TW (1) | TWI850760B (https=) |
| WO (1) | WO2023041191A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240128051A1 (en) | 2022-10-14 | 2024-04-18 | Carl Zeiss Multisem Gmbh | Multi-beam charged particle beam system with anisotropic filtering for improved image contrast |
| WO2024227537A1 (en) | 2023-05-02 | 2024-11-07 | Carl Zeiss Multisem Gmbh | Multi-beam charged particle microscope for inspection with improved image contrast |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004134387A (ja) | 2002-08-09 | 2004-04-30 | Leo Elektronenmikroskopie Gmbh | 電子顕微鏡システム及び電子顕微鏡法 |
| US20170316912A1 (en) | 2015-02-06 | 2017-11-02 | Carl Zeiss Microscopy Gmbh | Particle beam system and method for the particle-optical examination of an object |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102709143B (zh) | 2003-09-05 | 2016-03-09 | 卡尔蔡司Smt有限责任公司 | 电子光学排布结构、多电子分束检验系统和方法 |
| JP5663717B2 (ja) | 2005-09-06 | 2015-02-04 | カール ツァイス マイクロスコピー ゲーエムベーハーＣａｒｌ Ｚｅｉｓｓ Ｍｉｃｒｏｓｃｏｐｙ Ｇｍｂｈ | 荷電粒子システム |
| CN102103966B (zh) | 2005-11-28 | 2013-02-06 | 卡尔蔡司Smt有限责任公司 | 粒子光学组件 |
| JP5572428B2 (ja) * | 2010-03-15 | 2014-08-13 | 株式会社日立ハイテクノロジーズ | 検査装置および検査方法 |
| US9336981B2 (en) | 2010-04-09 | 2016-05-10 | Applied Materials Israel Ltd. | Charged particle detection system and multi-beamlet inspection system |
| JP5951985B2 (ja) * | 2011-12-27 | 2016-07-13 | 株式会社ホロン | 円筒状原版検査装置および円筒状原版検査方法 |
| DE102013014976A1 (de) | 2013-09-09 | 2015-03-12 | Carl Zeiss Microscopy Gmbh | Teilchenoptisches System |
| DE102013016113B4 (de) | 2013-09-26 | 2018-11-29 | Carl Zeiss Microscopy Gmbh | Verfahren zum Detektieren von Elektronen, Elektronendetektor und Inspektionssystem |
| NL2013411B1 (en) * | 2014-09-04 | 2016-09-27 | Univ Delft Tech | Multi electron beam inspection apparatus. |
| JP2016139467A (ja) * | 2015-01-26 | 2016-08-04 | 株式会社日立ハイテクノロジーズ | 試料観察方法および試料観察装置 |
| EP3104155A1 (en) * | 2015-06-09 | 2016-12-14 | FEI Company | Method of analyzing surface modification of a specimen in a charged-particle microscope |
| US10192716B2 (en) | 2015-09-21 | 2019-01-29 | Kla-Tencor Corporation | Multi-beam dark field imaging |
| JP6581940B2 (ja) | 2016-04-15 | 2019-09-25 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡装置 |
| KR102468155B1 (ko) * | 2017-02-07 | 2022-11-17 | 에이에스엠엘 네델란즈 비.브이. | 하전 입자 검출 방법 및 장치 |
| KR102520386B1 (ko) | 2017-03-20 | 2023-04-11 | 칼 짜이스 마이크로스카피 게엠베하 | 하전 입자 빔 시스템 및 방법 |
| CN112055886A (zh) * | 2018-02-27 | 2020-12-08 | 卡尔蔡司MultiSEM有限责任公司 | 带电粒子多束系统及方法 |
| IL278076B2 (en) * | 2018-04-20 | 2025-08-01 | Asml Netherlands Bv | Pixel shape and section shape selection for large active area high speed detector |
| EP3761340A1 (en) * | 2019-07-02 | 2021-01-06 | ASML Netherlands B.V. | Apparatus for and method of local phase control of a charged particle beam |
| DE102020123567B4 (de) | 2020-09-09 | 2025-02-13 | Carl Zeiss Multisem Gmbh | Vielzahl-Teilchenstrahl-System mit Kontrast-Korrektur-Linsen-System |
-
2021
- 2021-09-17 DE DE102021124099.9A patent/DE102021124099B4/de active Active
-
2022
- 2022-08-31 WO PCT/EP2022/025403 patent/WO2023041191A1/de not_active Ceased
- 2022-08-31 JP JP2024516984A patent/JP7854044B2/ja active Active
- 2022-08-31 CN CN202280062793.2A patent/CN117957631A/zh active Pending
- 2022-08-31 EP EP22764650.2A patent/EP4402710A1/de active Pending
- 2022-08-31 KR KR1020247012552A patent/KR102930155B1/ko active Active
- 2022-09-06 TW TW111133659A patent/TWI850760B/zh active
- 2022-09-15 NL NL2033047A patent/NL2033047B1/en active
-
2024
- 2024-03-14 US US18/605,106 patent/US20240222069A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004134387A (ja) | 2002-08-09 | 2004-04-30 | Leo Elektronenmikroskopie Gmbh | 電子顕微鏡システム及び電子顕微鏡法 |
| US20170316912A1 (en) | 2015-02-06 | 2017-11-02 | Carl Zeiss Microscopy Gmbh | Particle beam system and method for the particle-optical examination of an object |
Also Published As
| Publication number | Publication date |
|---|---|
| EP4402710A1 (de) | 2024-07-24 |
| US20240222069A1 (en) | 2024-07-04 |
| TW202326790A (zh) | 2023-07-01 |
| DE102021124099A1 (de) | 2023-03-23 |
| NL2033047B1 (en) | 2023-08-04 |
| TWI850760B (zh) | 2024-08-01 |
| JP7854044B2 (ja) | 2026-04-30 |
| NL2033047A (en) | 2023-03-24 |
| JP2024535055A (ja) | 2024-09-26 |
| KR20240055877A (ko) | 2024-04-29 |
| DE102021124099B4 (de) | 2023-09-28 |
| WO2023041191A1 (de) | 2023-03-23 |
| CN117957631A (zh) | 2024-04-30 |
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| JP7530583B2 (ja) | ミラー動作モードを有する複数粒子ビームシステム、ミラー動作モードを有する複数粒子ビームシステムを動作させる方法、および関連するコンピュータプログラム製品 | |
| US20240222069A1 (en) | Method for operating a multi-beam particle microscope in a contrast operating mode with defocused beam guiding, computer program product and multi-beam particle microscope | |
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| JP2024535055A5 (https=) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| D21 | Rejection of application intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
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| P11 | Amendment of application requested |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| D22 | Grant of ip right intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
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| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
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| Q13 | Ip right document published |
Free format text: ST27 STATUS EVENT CODE: A-4-4-Q10-Q13-NAP-PG1601 (AS PROVIDED BY THE NATIONAL OFFICE) |