TWI833015B - Laminated body and manufacturing method thereof - Google Patents
Laminated body and manufacturing method thereof Download PDFInfo
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- TWI833015B TWI833015B TW109114322A TW109114322A TWI833015B TW I833015 B TWI833015 B TW I833015B TW 109114322 A TW109114322 A TW 109114322A TW 109114322 A TW109114322 A TW 109114322A TW I833015 B TWI833015 B TW I833015B
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- adherend
- adhesive layer
- film
- reinforcing film
- meth
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- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
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- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical class C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
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- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- RLJWTAURUFQFJP-UHFFFAOYSA-N propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)O.CC(C)O.CC(C)O RLJWTAURUFQFJP-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
- B32B3/14—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material characterised by a face layer formed of separate pieces of material which are juxtaposed side-by-side
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/12—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/0004—Cutting, tearing or severing, e.g. bursting; Cutter details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Abstract
本發明提供一種適於對軟性被黏著體中之補強膜間區域之彎曲確保彎曲留隙之積層體及其製造方法,該積層體具備軟性被黏著體及貼合於其同一面側之複數個補強膜。 本發明之積層體X具備被黏著體10(軟性被黏著體)及膜20(補強膜)。膜20包含基材21與黏著劑層22且以黏著劑層22側貼合於被黏著體10,並且包含於被黏著體10上相鄰之膜部分20A、20B。膜部分20A之基材21具有與膜部分20B對向之端面21a,端面21a以越為遠離被黏著體10之部位越向膜部分20A內側退避之方式傾斜。膜部分20B之基材21具有與膜部分20A對向之端面21b,端面21b以越為遠離被黏著體10之部位越向膜部分20B內側退避之方式傾斜。The present invention provides a laminated body suitable for ensuring bending clearance in the bending of the reinforcing inter-membrane area in a soft adherend, and a manufacturing method thereof. The laminated body has a soft adherend and a plurality of layers attached to the same side thereof. Reinforcement membrane. The laminated body X of the present invention includes an adherend 10 (soft adherend) and a film 20 (reinforcement film). The film 20 includes a base material 21 and an adhesive layer 22 and is attached to the adherend 10 with the adhesive layer 22 side, and includes adjacent film portions 20A and 20B on the adherend 10 . The base material 21 of the film portion 20A has an end surface 21 a facing the film portion 20B, and the end surface 21 a is inclined in such a manner that the portion farther away from the adherend 10 retreats toward the inside of the film portion 20A. The base material 21 of the film portion 20B has an end surface 21b facing the film portion 20A, and the end surface 21b is inclined in such a manner that the portion farther away from the adherend 10 recedes toward the inside of the film portion 20B.
Description
本發明係關於一種例如作為軟性器件構成零件之積層體及其製造方法。The present invention relates to a laminated body that is a component component of a soft device, for example, and a manufacturing method thereof.
於光學器件或電子器件等各種器件之製造過程中,存在如下情況:就保護器件構成零件之表面或保護其免於衝擊等觀點而言,於對該零件貼附特定之黏著膜後實施各種步驟。此種保護用膜存在如下情況:根據貼附有其之器件構成零件,為了補充其強度而在貼附於該構成零件之狀態下作為器件結構材料被組入至製品器件。關於兼具保護功能與補強功能之此種黏著膜之相關技術,例如記載於下述專利文獻1中。 [先前技術文獻] [專利文獻]In the manufacturing process of various devices such as optical devices and electronic devices, there are cases where various steps are performed after attaching a specific adhesive film to the parts from the viewpoint of protecting the surface of the component parts of the device or protecting them from impact. . Such a protective film may be incorporated into a product device as a device structural material in a state of being attached to the component parts in order to supplement the strength of the component parts of the device to which it is attached. Technology related to such an adhesive film having both a protective function and a reinforcing function is described in the following Patent Document 1, for example. [Prior technical literature] [Patent Document]
[專利文獻1]日本專利特開2017-132977號公報[Patent Document 1] Japanese Patent Application Publication No. 2017-132977
[發明所欲解決之問題][Problem to be solved by the invention]
關於軟性印刷配線基板(FPC)等軟性器件構成零件,存在如下情況:要求於其同一面中之複數個部位分別貼合有上述黏著膜(即,亦承擔製造過程中之保護功能之補強膜)。並且,複數個補強膜貼合於同一面側之軟性器件構成零件存在如下情況:於以在該補強膜間區域處補強膜彼此接近之方式被彎曲而回折之形態下被組裝至製品器件內。Regarding flexible device components such as flexible printed circuit boards (FPC), there are cases where the above-mentioned adhesive films (that is, reinforcing films that also serve as protective functions during the manufacturing process) are required to be bonded to multiple locations on the same surface. . In addition, a soft device component with a plurality of reinforcing films attached to the same surface side may be assembled into the product device in a state where the reinforcing films are bent and folded so that the reinforcing films come close to each other in the region between the reinforcing films.
於帶有複數個補強膜之此種器件構成零件(軟性被黏著體)中,就該器件構成零件之小型化或輕量化之觀點而言,較佳為橫跨該彎曲預定部位而相鄰之兩個補強膜之間之分離距離較短。然而,若橫跨彎曲預定部位而相鄰之兩個補強膜之間之分離距離過短,則存在如下情況:於軟性被黏著體之彎曲變形時補強膜彼此抵接,而軟性被黏著體無法獲得所需之回折形態。In such a device component (soft adherend) having a plurality of reinforcing films, from the viewpoint of miniaturization or weight reduction of the device component, it is preferable that they span the planned bending portion and be adjacent to each other. The separation distance between the two reinforcing membranes is short. However, if the separation distance between two adjacent reinforcing films across the planned bending position is too short, there may be a situation where the reinforcing films contact each other when the soft adherend is bent and deformed, and the soft adherend cannot Get the desired reversal shape.
本發明提供一種適於對軟性被黏著體中之補強膜間區域之彎曲確保彎曲留隙之積層體、及其製造方法,該積層體具備軟性被黏著體及貼合於其同一面側之複數個補強膜。 [解決問題之技術手段]The present invention provides a laminated body suitable for ensuring bending clearance in the bending of the reinforcing inter-membrane region in a soft adherend, and a manufacturing method thereof. A reinforcing film. [Technical means to solve problems]
根據本發明之第1態樣,提供一種積層體。該積層體具備軟性被黏著體及補強膜。補強膜包含基材及其上之黏著劑層,且以黏著劑層側貼合於軟性被黏著體。於補強膜中,基材及黏著劑層可直接接合,亦可經由其他層而接合。又,補強膜包含於軟性被黏著體上分離而相鄰之第1補強膜部分及第2補強膜部分。第1補強膜部分之基材具有與第2補強膜部分對向之第1傾斜端面。該第1傾斜端面以越為遠離軟性被黏著體之部位越向第1補強膜部分內側退避之方式傾斜。第2補強膜部分之基材具有與第1補強膜部分對向之第2傾斜端面。該第2傾斜端面以越為遠離軟性被黏著體之部位越向第2補強膜部分內側退避之方式傾斜。According to a first aspect of the present invention, a laminated body is provided. The laminated body has a soft adherend and a reinforcing film. The reinforcing film includes a base material and an adhesive layer on it, and is attached to the soft adherend with the adhesive layer side. In the reinforced film, the base material and the adhesive layer can be directly connected or connected through other layers. Furthermore, the reinforcing film includes a first reinforcing film part and a second reinforcing film part that are separated and adjacent to each other on the soft adherend. The base material of the first reinforcing film part has a first inclined end face facing the second reinforcing film part. The first inclined end surface is inclined in such a manner that the portion further away from the soft adherend is retreated toward the inside of the first reinforcing film portion. The base material of the second reinforcing film part has a second inclined end face facing the first reinforcing film part. The second inclined end surface is inclined in such a manner that the portion further away from the soft adherend is retreated toward the inside of the second reinforcing film portion.
於本發明之第1態樣之積層體中,如上所述,軟性被黏著體上之第1補強膜部分之基材中與第2補強膜部分對向之端面以越為遠離軟性被黏著體之部位越向第1補強膜部分內側退避之方式傾斜,且軟性被黏著體上之第2補強膜部分之基材中與第1補強膜部分對向之端面以越為遠離軟性被黏著體之部位越向第2補強膜部分內側退避之方式傾斜。此種構成適於對軟性被黏著體中之第1及第2補強膜部分間區域處之彎曲確保彎曲留隙(即,適於抑制補強膜彼此之抵接)。此種積層體容易獲得使軟性被黏著體之補強膜貼合面朝向內側之適當之回折形態。此外,關於容易如此獲得適當之回折形態之本發明之積層體,容易將軟性被黏著體上之補強膜間距離設計得較短,從而容易謀求小型化或輕量化。In the laminate of the first aspect of the present invention, as described above, the end surface of the base material of the first reinforcing film portion on the soft adherend that faces the second reinforcing film portion is farther away from the soft adherend. The part is inclined toward the inside of the first reinforcing film part, and the end surface of the base material of the second reinforcing film part on the soft adherend that is opposite to the first reinforcing film part is further away from the soft adherend. The part is tilted in such a way that it recedes toward the inside of the second reinforcing membrane part. This configuration is suitable for ensuring a bending clearance for bending in the region between the first and second reinforcing film portions in the soft adherend (that is, suitable for suppressing contact between the reinforcing films). This kind of laminate can easily obtain an appropriate folded shape such that the reinforcing film bonding surface of the soft adherend faces inward. In addition, for the laminate of the present invention that can easily obtain an appropriate folded shape in this way, it is easy to design the distance between the reinforcing films on the soft adherend to be shorter, so that it is easy to achieve miniaturization or weight reduction.
於本發明之第1態樣之積層體中,較佳為第1補強膜部分之黏著劑層於第2補強膜部分側緣端具有改性部,且第2補強膜部分之黏著劑層於第1補強膜部分側緣端具有改性部。此種構成適於在各補強膜部分之黏著劑層中抑制其構成成分之滲出。In the laminated body of the first aspect of the present invention, it is preferable that the adhesive layer of the first reinforcing film part has a modified portion at the side edge end of the second reinforcing film part, and the adhesive layer of the second reinforcing film part preferably The side edge end of the first reinforcing membrane portion has a modified portion. This structure is suitable for suppressing the leakage of the constituent components in the adhesive layer of each reinforcing film part.
根據本發明之第2態樣,提供一種積層體之製造方法。本製造方法包括:貼附步驟、切割步驟、剝離步驟、及黏著力上升步驟。According to a second aspect of the present invention, a method for manufacturing a laminated body is provided. The manufacturing method includes: an attaching step, a cutting step, a peeling step, and an adhesion increasing step.
於貼附步驟中,將包含基材及基材上之黏著劑層的補強膜以其黏著劑層側貼附於軟性被黏著體。於補強膜中,基材及黏著劑層可直接接合,亦可經由其他層而接合。黏著劑層由如下黏著性組合物所構成,該黏著性組合物例如能夠藉由活性能量線照射或加熱等外部刺激自黏著力相對較低之狀態(低黏著力狀態)向黏著力相對較高之狀態(高黏著力狀態)不可逆地變化。In the attaching step, the reinforcing film including the base material and the adhesive layer on the base material is attached to the soft adherend with its adhesive layer side. In the reinforced film, the base material and the adhesive layer can be directly connected or connected through other layers. The adhesive layer is composed of an adhesive composition that can move from a state with relatively low adhesive force (low adhesive force state) to a relatively high adhesive force by external stimulation such as active energy ray irradiation or heating. The state (high adhesion state) changes irreversibly.
於切割步驟中,對軟性被黏著體上之補強膜實施形成切溝之加工,而於補強膜中劃分形成分離之兩個第1區域部與第1區域部間之第2區域部。於本步驟中,區分各第1區域部與第2區域部之切溝越遠離軟性被黏著體越為寬幅。即,各第1區域部中之第2區域部側之切斷端面以越為遠離軟性被黏著體之部位越向該第1區域部內側退避之方式傾斜。於該切斷端面中包含第1區域部之基材之切斷端面(傾斜)。又,經由本步驟而產生之第1及第2區域部之各黏著劑層處於上述低黏著力狀態。In the cutting step, the reinforcing film on the soft adherend is processed to form cutting grooves, and two separated first regions and a second region between the first regions are divided and formed in the reinforcing film. In this step, the cutting grooves that distinguish each of the first and second regions become wider as they are farther away from the soft adherend. That is, the cut end surface on the second region side of each first region is inclined in such a manner that the portion further away from the soft adherend recedes toward the inside of the first region. The cut end face includes the cut end face (inclined) of the base material in the first region. In addition, each adhesive layer in the first and second regions produced through this step is in the above-mentioned low adhesive force state.
於剝離步驟中,藉由以上方式將劃分形成於第1區域部間之第2區域部自軟性被黏著體剝離。軟性被黏著體上之第2區域部如上所述般處於低黏著力狀態。此種構成就自軟性被黏著體適當地剝離第2區域部之方面而言較佳。In the peeling step, the second region portions divided and formed between the first region portions are peeled off from the soft adherend in the above manner. The second area on the soft adherend is in a low adhesion state as described above. This configuration is preferable in terms of appropriately peeling the second region portion from the soft adherend.
於黏著力上升步驟中,使第1區域部中之黏著劑層之黏著力上升。於本步驟中,藉由針對第1區域部之黏著劑層之活性能量線照射或加熱等外部刺激,使軟性被黏著體上之各第1區域部之黏著劑層向高黏著力狀態變化。藉此,於第1區域部中,針對軟性被黏著體之貼合狀態變牢固。此種構成就將源自上述補強膜之第1區域部作為結構材料殘留於積層體之方面而言適宜。黏著劑層處於高黏著力狀態之第1區域部構成本發明之第1態樣之上述積層體中之補強膜部分(第1補強膜部分、第2補強膜部分)。又,第1區域部之基材之切斷端面(傾斜)構成第1態樣之上述積層體中之第1及第2補強膜部分之基材之傾斜端面。In the step of increasing the adhesive force, the adhesive force of the adhesive layer in the first region is increased. In this step, external stimulation such as active energy ray irradiation or heating to the adhesive layer in the first region causes the adhesive layer in each first region on the soft adherend to change to a high-adhesion state. Thereby, the bonding state with respect to the soft adherend becomes firm in the 1st area|region part. This structure is suitable in that the first region derived from the reinforcing film remains in the laminate as a structural material. The first region portion in which the adhesive layer is in a high adhesive force state constitutes the reinforcing film portion (the first reinforcing film portion and the second reinforcing film portion) in the above-mentioned laminated body according to the first aspect of the present invention. Furthermore, the cut end surface (inclined) of the base material in the first region constitutes the inclined end surface of the base material of the first and second reinforcing film parts in the above-mentioned laminated body of the first aspect.
根據包括如上所述之各步驟之本積層體製造方法,可適當地製造本發明之第1態樣之上述積層體。根據此種本製造方法,可於所製造之積層體中享受與上文中關於本發明之第1態樣之積層體所述之效果相同之效果。又,於本製造方法中,無需將作為補強材料之複數個膜分別個別地貼附於軟性被黏著體。此種製造方法有助於積層體或供組裝其之器件之製造之效率化。According to the present laminated body manufacturing method including each of the above-mentioned steps, the above-mentioned laminated body according to the first aspect of the present invention can be appropriately manufactured. According to this manufacturing method, the manufactured laminated body can enjoy the same effect as mentioned above with respect to the laminated body of the 1st aspect of this invention. Furthermore, in this manufacturing method, there is no need to individually attach a plurality of films as reinforcing materials to the soft adherend. This manufacturing method contributes to the efficiency of manufacturing the laminated body or the device to which it is assembled.
於上述切割步驟中,較佳為於各第1區域部之黏著劑層形成面向與第2區域部之間之切溝的改性部。此種構成適於在各補強膜部分之黏著劑層中抑制其構成成分之滲出。In the above-mentioned cutting step, it is preferable to form a modified portion facing the cutting groove between the second area portion and the adhesive layer of each first area portion. This structure is suitable for suppressing the leakage of the constituent components in the adhesive layer of each reinforcing film part.
於上述切割步驟中,較佳為區分各第1區域部與第2區域部之切溝係對補強膜藉由自其基材側至黏著劑層之中途為止之半切而形成。此種構成就如下方面而言適宜,即,於在切割步驟之後進行之上述剝離步驟中抑制所謂之糊劑殘留。於將被黏著體上之補強膜沿著其整個厚度方向進行切斷之情形時,根據其切斷方法或切斷條件,會因位於被黏著體與補強膜黏著劑層之界面及其附近之黏著劑層構成材料中之局部之升溫或按壓力之作用導致面向該界面之黏著劑層之一部分容易固著於被黏著體。於切割步驟中,藉由如上所述之半切而於切溝底端與被黏著體之間預先殘留未切斷之黏著劑部分的這一構成適於避免位於上述界面與其附近之黏著劑層構成材料中之局部之升溫或按壓力之作用。並且,藉由如上所述之半切而於切溝底端與被黏著體之間預先殘留未切斷之黏著劑部分的這一構成存在如下情況:就利用該黏著劑殘存部分之凝集力將第2區域部或其黏著劑層以無黏著劑殘渣(糊劑殘留)之方式自被黏著體表面剝離之方面而言較佳。In the above-mentioned cutting step, it is preferable that the cutting grooves that distinguish each first region part and the second region part are formed by half-cutting the reinforcing film from the base material side to the middle of the adhesive layer. This structure is suitable in order to suppress so-called paste residue in the peeling step performed after the cutting step. When the reinforcing film on the adherend is cut along its entire thickness direction, depending on the cutting method or cutting conditions, the interface between the adherend and the adhesive layer of the reinforcing film and its vicinity may The part of the adhesive layer facing the interface is easily fixed to the adherend due to the local heating or pressing force in the material constituting the adhesive layer. In the cutting step, the structure of leaving an uncut adhesive portion between the bottom end of the cutting groove and the adherend by half-cutting as described above is suitable to avoid the formation of an adhesive layer located at the above-mentioned interface and its vicinity. The effect of local heating or pressing force in the material. Furthermore, in this configuration in which an uncut adhesive portion remains between the bottom end of the cut groove and the adherend by half-cutting as described above, there is a case where the cohesive force of the remaining portion of the adhesive is used to remove the adhesive. 2. It is preferable that the area part or its adhesive layer is peeled off from the surface of the adherend without adhesive residue (paste residue).
圖1及圖2表示本發明之一實施形態之積層體X。圖1係積層體X之立體圖。圖2係積層體X之局部放大剖視圖。積層體X具備被黏著體10及膜20。1 and 2 show a laminated body X according to an embodiment of the present invention. Figure 1 is a perspective view of the laminated body X. FIG. 2 is a partially enlarged sectional view of the laminated body X. The laminated body X includes an adherend 10 and a film 20 .
被黏著體10為本發明之一實施形態中之軟性被黏著體,具有可撓性,且具有彼此對向之第1面11及第2面12。作為被黏著體10,例如可例舉:軟性顯示面板等軟性之光學器件、軟性印刷配線基板(FPC)等軟性之電子器件、及作為該等之構成零件之軟性基材。於被黏著體10為軟性之光學器件之情形時,於被黏著體10之第1面11側例如形成有包含呈陣列狀存在之複數個像素之像素區域、包含驅動電路等各種電路元件之電路區域、及將該等電性連接之配線圖案。於被黏著體10為軟性之電子器件之情形時,於被黏著體10之第1面11側例如形成有各種電路元件及配線圖案。此種被黏著體10能夠根據製造目標器件之設計獲得各種俯視形狀。The adherend 10 is a soft adherend in one embodiment of the present invention. It is flexible and has a first surface 11 and a second surface 12 facing each other. Examples of the adherend 10 include flexible optical devices such as a flexible display panel, flexible electronic devices such as a flexible printed wiring board (FPC), and soft base materials that are components thereof. When the adherend 10 is a flexible optical device, for example, a pixel area including a plurality of pixels in an array and a circuit including various circuit elements such as a drive circuit are formed on the first surface 11 side of the adherend 10 . areas, and the wiring patterns that electrically connect them. When the adherend 10 is a flexible electronic device, for example, various circuit elements and wiring patterns are formed on the first surface 11 side of the adherend 10 . This adherend 10 can obtain various top-view shapes according to the design of the manufacturing target device.
膜20如於圖2中詳細所示,包含基材21及黏著劑層22,且以黏著劑層22側貼合於上述被黏著體10之第2面12。於膜20中,基材21及黏著劑層22可直接接合,亦可經由其他層而接合。此種膜20為本發明中之補強膜之一例,除了具有對被黏著體10之保護功能以外還用於補充補強功能,其係與被黏著體10一起作為器件結構材料被組入至製品器件之要素。As shown in detail in FIG. 2 , the film 20 includes a base material 21 and an adhesive layer 22 , and is bonded to the second surface 12 of the adherend 10 with the adhesive layer 22 side. In the film 20, the base material 21 and the adhesive layer 22 can be directly connected or connected through other layers. This kind of film 20 is an example of the reinforcing film in the present invention. In addition to having a protective function for the adherend 10, it is also used to supplement the reinforcing function. It is incorporated into the product device together with the adherend 10 as a device structural material. of elements.
膜20包含於被黏著體10上分離而相鄰之膜部分20A(第1補強膜部分)及膜部分20B(第2補強膜部分)(膜部分20A、20B分別包含基材21及黏著劑層22)。膜部分20A、20B於與膜20之厚度方向D1正交之面方向D2上分離而相鄰。The film 20 includes a film portion 20A (a first reinforcing film portion) and a film portion 20B (a second reinforcing film portion) that are separated and adjacent to the adherend 10 (the film portions 20A and 20B respectively include the base material 21 and the adhesive layer twenty two). The film portions 20A and 20B are spaced apart and adjacent to each other in the plane direction D2 orthogonal to the thickness direction D1 of the film 20 .
膜部分20A之基材21於面方向D2上具有與膜部分20B對向之端面21a(第1傾斜端面)。該端面21a以越為遠離被黏著體10之部位越向膜部分20A內側退避之方式傾斜。即,端面21a以如下方式傾斜,即,隨著向在膜20之厚度方向D1上自被黏著體10朝向膜20之方向前進而於面方向D2上遠離膜部分20B。此種端面21a之相對於上述厚度方向D1之傾斜角度α例如為1°以上、較佳為2°以上、更佳為3°以上、進而較佳為5°以上,例如為45°以下、較佳為30°以下。膜部分20A之黏著劑層22於膜部分20B側之緣端具有改性部22a。改性部22a係膜部分20A中之黏著劑層22之露出表面因加熱等而硬化之部位。The base material 21 of the film portion 20A has an end surface 21a (first inclined end surface) facing the film portion 20B in the surface direction D2. The end surface 21a is inclined in such a manner that the portion farther away from the adherend 10 recedes toward the inside of the film portion 20A. That is, the end surface 21 a is inclined in a direction away from the film portion 20B in the surface direction D2 as it advances from the adherend 10 toward the film 20 in the thickness direction D1 of the film 20 . The inclination angle α of the end surface 21a relative to the thickness direction D1 is, for example, 1° or more, preferably 2° or more, more preferably 3° or more, further preferably 5° or more, for example, 45° or less, preferably The best temperature is below 30°. The adhesive layer 22 of the film portion 20A has a modified portion 22a at an edge on the film portion 20B side. The modified part 22a is a part where the exposed surface of the adhesive layer 22 in the film part 20A is hardened by heating or the like.
膜部分20B之基材21於面方向D2上具有與膜部分20A對向之端面21b(第2傾斜端面)。該端面21b以越為遠離被黏著體10之部位越向膜部分20B內側退避之方式傾斜。即,端面21b以如下方式傾斜,即,隨著向在膜20之厚度方向D1上自被黏著體10朝向膜20之方向前進而於面方向D2上遠離膜部分20B。此種端面21b之相對於上述厚度方向D1之傾斜角度α例如為1°以上、較佳為2°以上、更佳為3°以上、進而較佳為5°以上,例如為45°以下、較佳為30°以下。膜部分20B之黏著劑層22於膜部分20A側之緣端具有改性部22b。改性部22b係膜部分20B中之黏著劑層22之露出表面因加熱等而硬化之部位。The base material 21 of the film portion 20B has an end surface 21b (second inclined end surface) facing the film portion 20A in the surface direction D2. The end surface 21b is inclined in such a manner that the portion farther away from the adherend 10 recedes toward the inside of the film portion 20B. That is, the end surface 21 b is inclined in a direction away from the film portion 20B in the surface direction D2 as it advances from the adherend 10 toward the film 20 in the thickness direction D1 of the film 20 . The inclination angle α of the end surface 21b with respect to the thickness direction D1 is, for example, 1° or more, preferably 2° or more, more preferably 3° or more, further preferably 5° or more, for example, 45° or less, preferably The best temperature is below 30°. The adhesive layer 22 of the film portion 20B has a modified portion 22b at an edge on the film portion 20A side. The modified part 22b is a part where the exposed surface of the adhesive layer 22 in the film part 20B is hardened by heating or the like.
膜20中之基材21係用以確保膜20之機械強度之支持體,且為用以於膜20中表現其補強功能或保護功能之主要要素。The base material 21 in the film 20 is a support used to ensure the mechanical strength of the film 20 and is the main element used in the film 20 to express its reinforcing function or protective function.
基材21包含可撓性之塑膠材料。作為此種塑膠材料,例如可例舉:聚酯樹脂、聚烯烴樹脂、聚甲基丙烯酸酯等(甲基)丙烯酸系樹脂(丙烯酸系樹脂及/或甲基丙烯酸系樹脂)、聚醯亞胺樹脂、聚碳酸酯樹脂、聚醚碸樹脂、聚芳酯樹脂、三聚氰胺樹脂、聚醯胺樹脂、纖維素樹脂、及聚苯乙烯樹脂。作為聚酯樹脂,例如可例舉:聚對苯二甲酸乙二酯(PET)、聚對苯二甲酸丁二酯、及聚萘二甲酸乙二酯。作為聚烯烴樹脂,例如可例舉:聚乙烯、聚丙烯、及環烯烴聚合物(COP)。於黏著劑層22如下所述般由能夠藉由照射活性能量線而進行高黏著力狀態化之黏著性組合物所構成之情形時,基材21較佳為具有針對活性能量線之透明性。就兼顧此種透明性與機械強度之觀點而言,基材21構成用之塑膠材料較佳為聚酯樹脂,更佳為聚對苯二甲酸乙二酯(PET)。The base material 21 includes flexible plastic material. Examples of such plastic materials include polyester resin, polyolefin resin, (meth)acrylic resin such as polymethacrylate (acrylic resin and/or methacrylic resin), polyimide Resin, polycarbonate resin, polyether resin, polyarylate resin, melamine resin, polyamide resin, cellulose resin, and polystyrene resin. Examples of the polyester resin include polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate. Examples of the polyolefin resin include polyethylene, polypropylene, and cycloolefin polymer (COP). When the adhesive layer 22 is composed of an adhesive composition that can be transformed into a high adhesive state by irradiation with active energy rays as described below, the base material 21 is preferably transparent to the active energy rays. From the viewpoint of balancing transparency and mechanical strength, the plastic material used to constitute the base material 21 is preferably polyester resin, and more preferably polyethylene terephthalate (PET).
基材21之厚度例如為4 μm以上,就補強被黏著體10之觀點而言,較佳為20 μm以上,更佳為30 μm以上,進而較佳為45 μm以上。又,基材21之厚度例如為500 μm以下,就膜20之可撓性或處理性之觀點而言,較佳為300 μm以下,更佳為200 μm以下,進而較佳為100 μm以下。The thickness of the base material 21 is, for example, 4 μm or more. From the viewpoint of reinforcing the adherend 10, it is preferably 20 μm or more, more preferably 30 μm or more, and further preferably 45 μm or more. Moreover, the thickness of the base material 21 is, for example, 500 μm or less. From the viewpoint of flexibility or handleability of the film 20, it is preferably 300 μm or less, more preferably 200 μm or less, and still more preferably 100 μm or less.
膜20中之黏著劑層22係用以將膜20貼附至被黏著體10之要素,且由黏著性組合物所構成。本實施形態中之黏著劑層22係由能夠藉由外部刺激而自黏著力相對較低之狀態(低黏著力狀態)向黏著力相對較高之狀態(高黏著力狀態)不可逆地變化之黏著性組合物所形成之層,且於經過製造過程之積層體X中獲得高黏著力狀態。The adhesive layer 22 in the film 20 is an element used to attach the film 20 to the adherend 10 and is composed of an adhesive composition. The adhesive layer 22 in this embodiment is an adhesive that can irreversibly change from a state of relatively low adhesion (low adhesion state) to a state of relatively high adhesion (high adhesion state) through external stimulation. A layer formed of a sexual composition, and a high adhesion state is obtained in the laminate X after the manufacturing process.
作為用以形成黏著劑層22之黏著性組合物,例如可例舉:能夠藉由照射紫外線或電子束等活性能量線而自低黏著力狀態向高黏著力狀態變化之黏著性組合物(第1黏著性組合物)、及能夠藉由加熱而自低黏著力狀態向高黏著力狀態變化之黏著性組合物(第2黏著性組合物)。Examples of the adhesive composition used to form the adhesive layer 22 include an adhesive composition capable of changing from a low-adhesion state to a high-adhesion state by irradiating active energy rays such as ultraviolet rays or electron beams (Part 2). 1 adhesive composition), and an adhesive composition capable of changing from a low adhesive force state to a high adhesive force state by heating (second adhesive composition).
第1黏著性組合物包含基礎聚合物、光硬化劑、及光聚合起始劑。The first adhesive composition includes a base polymer, a photohardener, and a photopolymerization initiator.
作為基礎聚合物,例如可例舉:丙烯酸系聚合物、天然橡膠、苯乙烯-異戊二烯-苯乙烯嵌段共聚物(SIS嵌段共聚物)、苯乙烯-丁二烯-苯乙烯嵌段共聚物(SBS嵌段共聚物)、苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS嵌段共聚物)、苯乙烯-丁二烯橡膠、聚丁二烯、聚異戊二烯、聚異丁烯、丁基橡膠、氯丁二烯橡膠、及矽酮橡膠。就抑制黏著力之觀點而言,作為基礎聚合物,較佳為丙烯酸系聚合物。Examples of the base polymer include acrylic polymers, natural rubber, styrene-isoprene-styrene block copolymers (SIS block copolymers), styrene-butadiene-styrene block copolymers, and Segment copolymer (SBS block copolymer), styrene-ethylene-butylene-styrene block copolymer (SEBS block copolymer), styrene-butadiene rubber, polybutadiene, polyisoprene vinyl, polyisobutylene, butyl rubber, chloroprene rubber, and silicone rubber. From the viewpoint of suppressing adhesion, an acrylic polymer is preferred as the base polymer.
基礎聚合物之玻璃轉移溫度(Tg)例如為0℃以下,較佳為-100℃~-5℃,更佳為-80℃~-10℃,進而較佳為-40℃~-10℃。此種構成於確保第1黏著性組合物中之基礎聚合物之流動性之方面而言適宜,因此,於藉由活性能量線使第1黏著性組合物變化為高黏著力狀態之方面而言適宜。The glass transition temperature (Tg) of the base polymer is, for example, 0°C or lower, preferably -100°C to -5°C, more preferably -80°C to -10°C, further preferably -40°C to -10°C. This structure is suitable for ensuring the fluidity of the base polymer in the first adhesive composition and, therefore, for changing the first adhesive composition into a high adhesive state by active energy rays. Appropriate.
玻璃轉移溫度係文獻或目錄等中所記載之值、或基於下述式(X)(Fox式)計算所得之值。關於下述其他聚合物之玻璃轉移溫度亦同樣如此。The glass transition temperature is a value described in literature, catalogs, etc., or a value calculated based on the following formula (X) (Fox formula). The same is true for the glass transition temperatures of other polymers described below.
1/Tg=W1/Tg1+W2/Tg2+…+Wn/Tgn (X) [式(X)中,Tg表示聚合物(A)之玻璃轉移溫度(單位:K),Tgi(i=1、2、…n)表示單體i形成均聚物時之玻璃轉移溫度(單位:K),Wi(i=1、2、…n)表示單體i在所有單體成分中之質量分率]1/Tg=W1/Tg1+W2/Tg2+…+Wn/Tgn (X) [In formula (X), Tg represents the glass transition temperature (unit: K) of polymer (A), and Tgi (i=1, 2,...n) represents the glass transition temperature (unit: K) when monomer i forms a homopolymer. : K), Wi (i=1, 2,...n) represents the mass fraction of monomer i among all monomer components]
第1黏著性組合物中之丙烯酸系聚合物係藉由包含(甲基)丙烯酸烷基酯作為主成分之單體成分(第1單體成分)之聚合而獲得。所謂「(甲基)丙烯酸」,設為意指丙烯酸及/或甲基丙烯酸。The acrylic polymer in the first adhesive composition is obtained by polymerization of a monomer component (first monomer component) containing alkyl (meth)acrylate as a main component. "(Meth)acrylic acid" means acrylic acid and/or methacrylic acid.
作為(甲基)丙烯酸烷基酯,例如可例舉直鏈狀或支鏈狀之(甲基)丙烯酸C1-20烷基酯。作為此種(甲基)丙烯酸烷基酯,例如可例舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸異三(十二烷基)酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸鯨蠟酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、(甲基)丙烯酸十九烷基酯、及(甲基)丙烯酸二十烷基酯。就形成丙烯酸系聚合物之方面而言,可使用一種(甲基)丙烯酸烷基酯,亦可使用兩種以上之(甲基)丙烯酸烷基酯。Examples of the alkyl (meth)acrylate include linear or branched C1-20 alkyl (meth)acrylate. Examples of such (meth)acrylic acid alkyl esters include: (meth)acrylic acid methyl ester, (meth)acrylic acid ethyl ester, (meth)acrylic acid propyl ester, (meth)acrylic acid isopropyl ester, Butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, third butyl (meth)acrylate, amyl (meth)acrylate, (meth)acrylic acid Isoamyl ester, neopentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, ( Isooctyl methacrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecane (meth)acrylate ester, dodecyl (meth)acrylate, isotri(dodecyl)(meth)acrylate, myristyl (meth)acrylate, isotetradecyl (meth)acrylate Ester, pentadecyl (meth)acrylate, cetyl (meth)acrylate, heptadecyl (meth)acrylate, stearyl (meth)acrylate, iso(meth)acrylate Octadecyl ester, nonadecyl (meth)acrylate, and eicosanyl (meth)acrylate. In terms of forming an acrylic polymer, one type of (meth)acrylic acid alkyl ester may be used, or two or more types of (meth)acrylic acid alkyl esters may be used.
就調整丙烯酸系聚合物之玻璃轉移溫度之觀點而言,作為(甲基)丙烯酸烷基酯,較佳為併用甲基丙烯酸甲酯與丙烯酸C4-12烷基酯。於併用該等之情形時,相對於甲基丙烯酸甲酯及丙烯酸C4-12烷基酯之總量100質量份,甲基丙烯酸甲酯之調配量例如為5質量份以上,例如為20質量份以下,又,丙烯酸C4-12烷基酯之調配量例如為80質量份以上,例如為95質量份以下。From the viewpoint of adjusting the glass transition temperature of the acrylic polymer, it is preferable to use a combination of methyl methacrylate and C4-12 alkyl acrylate as the (meth)acrylic acid alkyl ester. When these are used together, the compounding amount of methyl methacrylate is, for example, 5 parts by mass or more, for example, 20 parts by mass, relative to 100 parts by mass of the total amount of methyl methacrylate and C4-12 alkyl acrylate. Hereinafter, the compounding amount of C4-12 alkyl acrylate is, for example, 80 parts by mass or more, for example, 95 parts by mass or less.
第1單體成分中之(甲基)丙烯酸烷基酯之調配比率例如為50質量%以上,較佳為60質量%以上,又,例如為80質量%以下。The blending ratio of the alkyl (meth)acrylate in the first monomer component is, for example, 50 mass% or more, preferably 60 mass% or more, and, for example, 80 mass% or less.
第1單體成分較佳為包含能夠與(甲基)丙烯酸烷基酯進行共聚之含官能基之乙烯基單體。作為含官能基之乙烯基單體,例如可例舉:含羥基之乙烯基單體、含羧基之乙烯基單體、含氮之乙烯基單體、(甲基)丙烯腈等含氰基之乙烯基單體、(甲基)丙烯酸縮水甘油酯等含縮水甘油基之乙烯基單體、含磺基之乙烯基單體、2-羥基乙基丙烯醯基磷酸酯等含磷酸基之乙烯基單體、芳香族乙烯基單體、乙烯酯單體、及甲基乙烯基醚等乙烯基醚單體。The first monomer component preferably contains a functional group-containing vinyl monomer capable of being copolymerized with alkyl (meth)acrylate. Examples of the functional group-containing vinyl monomer include hydroxyl group-containing vinyl monomer, carboxyl group-containing vinyl monomer, nitrogen-containing vinyl monomer, (meth)acrylonitrile and other cyano group-containing vinyl monomers. Vinyl monomers, glycidyl group-containing vinyl monomers such as glycidyl (meth)acrylate, sulfo group-containing vinyl monomers, phosphate group-containing vinyl monomers such as 2-hydroxyethylacrylyl phosphate Monomers, aromatic vinyl monomers, vinyl ester monomers, and vinyl ether monomers such as methyl vinyl ether.
作為含羥基之乙烯基單體,例如可例舉(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、及(甲基)丙烯酸4-(羥基甲基)環己基甲酯,較佳可例舉(甲基)丙烯酸2-羥基乙酯,更佳可例舉丙烯酸2-羥基乙酯。Examples of the hydroxyl-containing vinyl monomer include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, and (meth)acrylate. 6-hydroxyhexyl acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, and 4-(hydroxymeth)acrylate Methyl)cyclohexylmethyl ester, preferably 2-hydroxyethyl (meth)acrylate, more preferably 2-hydroxyethyl acrylate.
作為含羧基之乙烯基單體,例如可例舉:(甲基)丙烯酸、(甲基)丙烯酸2-羧基乙酯、羧基戊基(甲基)丙烯酸羧基戊酯、伊康酸、馬來酸、富馬酸、及丁烯酸。又,作為含羧基之乙烯基單體,例如亦可例舉馬來酸酐或伊康酸酐等含酸酐基之單體。Examples of the carboxyl group-containing vinyl monomer include: (meth)acrylic acid, 2-carboxyethyl (meth)acrylate, carboxypentylcarboxypentyl(meth)acrylate, itaconic acid, and maleic acid. , fumaric acid, and crotonic acid. Examples of the carboxyl group-containing vinyl monomer include acid anhydride group-containing monomers such as maleic anhydride and itaconic anhydride.
作為含氮之乙烯基單體,例如可例舉:N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基𠰌啉、N-丙烯醯𠰌啉、N-乙烯基羧醯胺類、及N-乙烯基己內醯胺。Examples of the nitrogen-containing vinyl monomer include: N-vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpyrrolidone, ethylene vinylpyrrole, vinylpyrrole, vinylimidazole, vinylethazole, vinylpyridine, N-acrylamide, N-vinylcarboxamides, and N-vinylcaprolactamide.
作為含磺基之乙烯基單體,例如可例舉苯乙烯磺酸及烯丙基磺酸。Examples of the sulfo group-containing vinyl monomer include styrenesulfonic acid and allylsulfonic acid.
作為芳香族乙烯基單體,例如可例舉:苯乙烯、對甲基苯乙烯、鄰甲基苯乙烯、及α-甲基苯乙烯。Examples of the aromatic vinyl monomer include styrene, p-methylstyrene, o-methylstyrene, and α-methylstyrene.
作為乙烯酯單體,例如可例舉乙酸乙烯酯及丙酸乙烯酯。Examples of the vinyl ester monomer include vinyl acetate and vinyl propionate.
就形成丙烯酸系聚合物之方面而言,可使用一種含官能基之乙烯基單體,亦可使用兩種以上之含官能基之乙烯基單體。就對丙烯酸系聚合物導入交聯結構之觀點而言,作為含官能基之乙烯基單體,較佳為使用含羥基之乙烯基單體及/或含羧基之乙烯基單體。就於黏著劑層22中確保充分之凝集力之觀點而言,作為含官能基之乙烯基單體,較佳為使用含氮之乙烯基單體,較佳為與含氮之乙烯基單體一起使用含羥基之乙烯基單體及/或含羧基之乙烯基單體。In terms of forming an acrylic polymer, one type of vinyl monomer containing functional groups may be used, or two or more types of vinyl monomers containing functional groups may be used. From the viewpoint of introducing a crosslinked structure into the acrylic polymer, it is preferable to use a hydroxyl group-containing vinyl monomer and/or a carboxyl group-containing vinyl monomer as the functional group-containing vinyl monomer. From the viewpoint of ensuring sufficient cohesive force in the adhesive layer 22, as the functional group-containing vinyl monomer, it is preferred to use a nitrogen-containing vinyl monomer, and it is preferred to use a nitrogen-containing vinyl monomer. A hydroxyl group-containing vinyl monomer and/or a carboxyl group-containing vinyl monomer are used together.
第1單體成分中之含官能基之乙烯基單體之調配比率例如為5質量%以上、較佳為10質量%以上、更佳為15質量%以上,又,例如為30質量%以下、較佳為20質量%以下。The blending ratio of the functional group-containing vinyl monomer in the first monomer component is, for example, 5 mass% or more, preferably 10 mass% or more, more preferably 15 mass% or more, and, for example, 30 mass% or less. Preferably it is 20 mass % or less.
上述丙烯酸系聚合物可藉由使包含(甲基)丙烯酸烷基酯作為主成分之如上所述之第1單體成分聚合而形成。作為聚合方法,例如可例舉溶液聚合、塊狀聚合、及乳化聚合,較佳可例舉溶液聚合。The acrylic polymer can be formed by polymerizing the above-described first monomer component containing alkyl (meth)acrylate as a main component. Examples of the polymerization method include solution polymerization, block polymerization, and emulsion polymerization. Preferably, solution polymerization is used.
於溶液聚合中,例如於將第1單體成分與聚合起始劑調配於溶劑中而製備反應溶液後,對該反應溶液進行加熱。然後,藉由經由反應溶液中之第1單體成分之聚合反應,可獲得包含丙烯酸系聚合物之丙烯酸系聚合物溶液。In solution polymerization, for example, after mixing the first monomer component and the polymerization initiator in a solvent to prepare a reaction solution, the reaction solution is heated. Then, by polymerizing the first monomer component in the reaction solution, an acrylic polymer solution containing an acrylic polymer can be obtained.
藉由溶液聚合所獲得之丙烯酸系聚合物溶液之固形物成分濃度例如為20質量%以上,例如為80質量%以下。丙烯酸系聚合物之重量平均分子量例如為100000以上、較佳為300000以上、更佳為500000以上,例如為5000000以下、較佳為3000000以下、更佳為2000000以下。丙烯酸系聚合物之重量平均分子量設為藉由凝膠滲透層析法(GPC)進行測定並藉由聚苯乙烯換算而算出之值。The solid content concentration of the acrylic polymer solution obtained by solution polymerization is, for example, 20 mass% or more, for example, 80 mass% or less. The weight average molecular weight of the acrylic polymer is, for example, 100,000 or more, preferably 300,000 or more, more preferably 500,000 or more, for example, 5,000,000 or less, preferably 3,000,000 or less, more preferably 2,000,000 or less. The weight average molecular weight of the acrylic polymer is measured by gel permeation chromatography (GPC) and calculated in terms of polystyrene.
第1黏著性組合物中之丙烯酸系聚合物之調配比率例如為50質量%以上、較佳為80質量%以上,又,例如為90質量%以下。第1黏著性組合物中之丙烯酸系聚合物之調配量相對於丙烯酸系聚合物與光硬化劑與光聚合起始劑之總量的比率例如為70質量%以上,又,例如為95質量%以下。The compounding ratio of the acrylic polymer in the first adhesive composition is, for example, 50 mass% or more, preferably 80 mass% or more, and, for example, 90 mass% or less. The ratio of the compounding amount of the acrylic polymer in the first adhesive composition to the total amount of the acrylic polymer, photohardener, and photopolymerization initiator is, for example, 70 mass % or more, and, for example, 95 mass %. the following.
第1黏著性組合物中之光硬化劑例如為多官能(甲基)丙烯酸酯,就能夠藉由照射活性能量線而使黏著劑層22之黏著力充分地上升之觀點而言,較佳可例舉2官能(甲基)丙烯酸酯及3官能(甲基)丙烯酸酯。作為2官能(甲基)丙烯酸酯,例如可例舉:聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚四亞甲基二醇二(甲基)丙烯酸酯、雙酚A環氧乙烷改性二(甲基)丙烯酸酯、雙酚A環氧丙烷改性二(甲基)丙烯酸酯、烷二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、及甘油二(甲基)丙烯酸酯。作為3官能(甲基)丙烯酸酯,例如可例舉:乙氧化異三聚氰酸三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、及三羥甲基丙烷三(甲基)丙烯酸酯。作為光硬化劑,亦可例舉:其他丙烯酸系光反應性低聚物、以及胺基甲酸酯系、聚醚系、聚酯系、聚碳酸酯系、聚丁二烯系等光反應性低聚物。該等光硬化劑可單獨使用,亦可併用兩種以上。The photocuring agent in the first adhesive composition is, for example, polyfunctional (meth)acrylate. From the viewpoint that the adhesive force of the adhesive layer 22 can be sufficiently increased by irradiating active energy rays, it is preferably Examples include bifunctional (meth)acrylate and trifunctional (meth)acrylate. Examples of bifunctional (meth)acrylates include polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, and polytetramethylene glycol di(meth)acrylate. Ester, bisphenol A ethylene oxide modified di(meth)acrylate, bisphenol A propylene oxide modified di(meth)acrylate, alkylene glycol di(meth)acrylate, tricyclodecane Dimethanol di(meth)acrylate, pentaerythritol di(meth)acrylate, neopentyl glycol di(meth)acrylate, and glycerol di(meth)acrylate. Examples of the trifunctional (meth)acrylate include ethoxyisocyanuric acid tri(meth)acrylate, pentaerythritol tri(meth)acrylate, and trimethylolpropane tri(meth)acrylate. Acrylate. Examples of the photohardening agent include other acrylic photoreactive oligomers, and photoreactive oligomers such as urethane series, polyether series, polyester series, polycarbonate series, and polybutadiene series. Oligomer. These photohardeners may be used alone, or two or more types may be used in combination.
光硬化劑之官能基當量例如為50 g/eq以上,例如為500 g/eq以下。光硬化劑在25℃下之黏度例如為5 mPa・s以上,例如為1000 mPa・s以下。光硬化劑之分子量就於第1黏著性組合物中之相溶性之觀點而言,例如為200以下,例如為1000以上。The functional group equivalent of the photohardener is, for example, 50 g/eq or more, for example, 500 g/eq or less. The viscosity of the photohardener at 25°C is, for example, 5 mPa·s or more, for example, 1000 mPa·s or less. The molecular weight of the photocuring agent is, for example, 200 or less, for example, 1,000 or more, from the viewpoint of compatibility in the first adhesive composition.
光硬化劑相對於上述丙烯酸系聚合物之相溶性較佳為較低。光硬化劑相對於丙烯酸系聚合物之相溶性較低的這一構成如下所述,關於黏著劑層22黏著力,就實現能夠於事後向高黏著力狀態變化之低黏著力狀態之方面而言較佳。The compatibility of the photohardener with respect to the above-mentioned acrylic polymer is preferably low. The low compatibility of the photohardener with the acrylic polymer is as follows. Regarding the adhesive force of the adhesive layer 22, it is possible to realize a low adhesive force state that can be subsequently changed to a high adhesive force state. Better.
第1黏著性組合物中之光硬化劑之調配比率例如為10質量%以上,又,例如為50質量%以下。第1黏著性組合物中之光硬化劑之調配量相對於丙烯酸系聚合物100質量份,例如為10質量份以上,例如為50質量份以下、較佳為30質量份以下。第1黏著性組合物中之光硬化劑之調配量相對於丙烯酸系聚合物與光硬化劑與光聚合起始劑之總量的比率例如為5質量%以上,又,例如為30質量%以下。The compounding ratio of the photocuring agent in the first adhesive composition is, for example, 10% by mass or more, and, for example, 50% by mass or less. The compounding amount of the photohardener in the first adhesive composition is, for example, 10 parts by mass or more, for example, 50 parts by mass or less, and preferably 30 parts by mass or less based on 100 parts by mass of the acrylic polymer. The ratio of the compounding amount of the photocuring agent in the first adhesive composition to the total amount of the acrylic polymer, photocuring agent, and photopolymerization initiator is, for example, 5 mass % or more, and, for example, 30 mass % or less. .
第1黏著性組合物中之光聚合起始劑係促進光硬化劑之硬化反應者,且根據光硬化劑之種類等而選擇。作為光聚合起始劑,例如可例舉:光陽離子起始劑(光酸產生劑)、光自由基起始劑、及光陰離子起始劑(光鹼產生劑)。作為光自由基起始劑,例如可例舉:1-羥基環己基苯基酮等羥基酮類、苯偶醯二甲基縮酮類、胺基酮類、醯基氧化膦類、二苯甲酮類、及含三氯甲基之三𠯤衍生物。該等光聚合起始劑可單獨使用,亦可併用兩種以上。於使用多官能(甲基)丙烯酸酯作為上述光硬化劑之情形時,作為光聚合起始劑,較佳可例舉光自由基起始劑,更佳可例舉羥基酮類。此種光聚合起始劑之光吸收區域例如為300 nm以上,又,例如為450 nm以下。The photopolymerization initiator in the first adhesive composition is one that accelerates the curing reaction of the photocuring agent, and is selected according to the type of the photocuring agent and the like. Examples of the photopolymerization initiator include a photocation initiator (photoacid generator), a photoradical initiator, and a photoanion initiator (photobase generator). Examples of the photoradical initiator include hydroxyketones such as 1-hydroxycyclohexylphenyl ketone, benzyldimethyl ketals, aminoketones, acylphosphine oxides, benzyl Ketones, and trichloromethyl-containing triclosan derivatives. These photopolymerization initiators may be used alone, or two or more types may be used in combination. When a polyfunctional (meth)acrylate is used as the photohardener, the photopolymerization initiator preferably includes a photoradical initiator, and more preferably includes hydroxyketones. The light absorption region of such a photopolymerization initiator is, for example, 300 nm or more, and, for example, 450 nm or less.
第1黏著性組合物中之光聚合起始劑之調配比率例如為0.01質量%以上,又,例如為0.5質量%以下、較佳為0.1質量%以下。第1黏著性組合物中之光聚合起始劑之調配量相對於丙烯酸系聚合物100質量份,例如為0.01質量份以上,又,例如為1質量份以下、較佳為0.5質量份以下。第1黏著性組合物中之光聚合起始劑之調配量相對於丙烯酸系聚合物與光硬化劑與光聚合起始劑之總量的比率例如為0.01質量%以上,又,例如為1質量%以下、較佳為0.5質量%以下。The compounding ratio of the photopolymerization initiator in the first adhesive composition is, for example, 0.01 mass% or more, and, for example, it is 0.5 mass% or less, preferably 0.1 mass% or less. The compounding amount of the photopolymerization initiator in the first adhesive composition is, for example, 0.01 part by mass or more, and, for example, 1 part by mass or less, preferably 0.5 part by mass or less based on 100 parts by mass of the acrylic polymer. The ratio of the compounding amount of the photopolymerization initiator in the first adhesive composition to the total amount of the acrylic polymer, the photohardening agent, and the photopolymerization initiator is, for example, 0.01 mass % or more, and, for example, 1 mass %. % or less, preferably 0.5 mass% or less.
於製備第1黏著性組合物時,將丙烯酸系聚合物(於藉由溶液聚合而製備丙烯酸系聚合物之情形時,為丙烯酸系聚合物溶液)、光硬化劑、及光聚合起始劑以上述比率進行調配並混合。When preparing the first adhesive composition, an acrylic polymer (when the acrylic polymer is prepared by solution polymerization, an acrylic polymer solution), a photohardener, and a photopolymerization initiator are mixed with Prepare and mix in the above ratios.
於第1黏著性組合物中,就對丙烯酸系聚合物導入交聯結構之觀點而言,較佳為調配交聯劑。於將具有羥基或羧基等交聯點之丙烯酸系聚合物與交聯劑調配於第1黏著性組合物之情形時,丙烯酸系聚合物之交聯點與交聯劑能夠進行反應,而能夠對丙烯酸系聚合物導入交聯結構。作為用於此之交聯劑,例如可例舉:異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、及金屬螯合物系交聯劑,較佳可例舉異氰酸酯系交聯劑。In the first adhesive composition, from the viewpoint of introducing a cross-linked structure into the acrylic polymer, it is preferable to mix a cross-linking agent. When an acrylic polymer having cross-linking points such as hydroxyl groups or carboxyl groups and a cross-linking agent are blended into the first adhesive composition, the cross-linking points of the acrylic polymer and the cross-linking agent can react, thereby enabling the The acrylic polymer introduces a cross-linked structure. Examples of cross-linking agents used for this include isocyanate-based cross-linking agents, epoxy-based cross-linking agents, oxazoline-based cross-linking agents, aziridine-based cross-linking agents, and carbodiimide-based cross-linking agents. The cross-linking agent and the metal chelate cross-linking agent are preferably an isocyanate-based cross-linking agent.
作為異氰酸酯系交聯劑,例如可例舉:伸丁基二異氰酸酯或六亞甲基二異氰酸酯等脂肪族二異氰酸酯、伸環戊基二異氰酸酯或伸環己基二異氰酸酯、異佛爾酮二異氰酸酯等脂環族二異氰酸酯、2,4-甲苯二異氰酸酯或4,4'-二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族二異氰酸酯。作為異氰酸酯系交聯劑,亦可例舉該等異氰酸酯之衍生物(例如異氰尿酸酯改性體或多元醇改性體等)。又,作為異氰酸酯系交聯劑,亦可使用市售品。作為該市售品,例如可例舉:Coronate L(甲苯二異氰酸酯之三羥甲基丙烷加成物,Tosoh製造)、Coronate HL(六亞甲基二異氰酸酯之三羥甲基丙烷加成物,Tosoh製造)、Coronate HX(六亞甲基二異氰酸酯之異氰尿酸酯體,Tosoh製造)、及Takenate D110N(苯二甲基二異氰酸酯之三羥甲基丙烷加成物,三井化學製造)。該等交聯劑可單獨使用,亦可併用兩種以上。Examples of the isocyanate-based crosslinking agent include aliphatic diisocyanates such as butyl diisocyanate and hexamethylene diisocyanate, cyclopentyl diisocyanate or cyclohexyl diisocyanate, isophorone diisocyanate, and the like. Aromatic diisocyanates such as alicyclic diisocyanate, 2,4-toluene diisocyanate or 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate. Examples of the isocyanate-based crosslinking agent include derivatives of these isocyanates (for example, isocyanurate modified products or polyol modified products, etc.). In addition, as the isocyanate-based cross-linking agent, commercially available products can also be used. Examples of such commercially available products include Coronate L (trimethylolpropane adduct of toluene diisocyanate, manufactured by Tosoh), Coronate HL (trimethylolpropane adduct of hexamethylene diisocyanate, Manufactured by Tosoh), Coronate HX (isocyanurate body of hexamethylene diisocyanate, manufactured by Tosoh), and Takenate D110N (trimethylolpropane adduct of xylylene diisocyanate, manufactured by Mitsui Chemicals). These cross-linking agents may be used alone, or two or more types may be used in combination.
交聯劑之官能基當量例如為50 g/eq以上,又,例如為500 g/eq以下。The functional group equivalent of the cross-linking agent is, for example, 50 g/eq or more, or, for example, 500 g/eq or less.
第1黏著性組合物中之交聯劑之調配比率相對於丙烯酸系聚合物100質量份,例如為0.1質量份以上、較佳為1.0質量份以上、更佳為1.5質量份以上、進而較佳為2.0質量份以上,又,例如為10質量份以下、較佳為5質量份以下、更佳為4質量份以下。The blending ratio of the cross-linking agent in the first adhesive composition is, for example, 0.1 parts by mass or more, preferably 1.0 parts by mass or more, more preferably 1.5 parts by mass or more, still more preferably, based on 100 parts by mass of the acrylic polymer. It is 2.0 parts by mass or more, and for example, it is 10 parts by mass or less, preferably 5 parts by mass or less, and more preferably 4 parts by mass or less.
於在第1黏著性組合物中調配如上所述之交聯劑之情形時,亦可將用以促進交聯反應之交聯觸媒調配於第1黏著性組合物中。When the above-described cross-linking agent is blended in the first adhesive composition, a cross-linking catalyst for accelerating the cross-linking reaction may also be blended in the first adhesive composition.
作為交聯觸媒,例如可例舉:鈦酸四正丁酯、鈦酸四異丙酯、三乙醯丙酮鐵、氧化丁基錫、二月桂酸二辛基錫等金屬系交聯觸媒。交聯觸媒可單獨使用,亦可併用兩種以上。Examples of the cross-linking catalyst include metal-based cross-linking catalysts such as tetra-n-butyl titanate, tetraisopropyl titanate, iron triacetyl acetonate, butyl tin oxide, and dioctyl tin dilaurate. The cross-linking catalyst can be used alone, or two or more types can be used in combination.
第1黏著性組合物中之交聯觸媒之調配比率相對於丙烯酸系聚合物100質量份,例如為0.001質量份以上、較佳為0.01質量份以上,又,例如為0.05質量份以下。The compounding ratio of the crosslinking catalyst in the first adhesive composition is, for example, 0.001 parts by mass or more, preferably 0.01 parts by mass or more, and, for example, 0.05 parts by mass or less based on 100 parts by mass of the acrylic polymer.
於第1黏著性組合物中,亦可視需要調配其他成分。作為其他成分,例如可例舉:矽烷偶合劑、黏著性賦予劑、塑化劑、軟化劑、抗劣化劑、填充劑、著色劑、紫外線吸收劑(就於螢光燈下或自然光下之穩定化之觀點而言)、抗氧化劑、界面活性劑、及抗靜電劑。In the first adhesive composition, other ingredients may also be blended as necessary. Examples of other ingredients include: silane coupling agents, adhesion-imparting agents, plasticizers, softeners, anti-deterioration agents, fillers, colorants, and ultraviolet absorbers (for stability under fluorescent lamps or natural light). From a chemical perspective), antioxidants, surfactants, and antistatic agents.
上述第2黏著性組合物包含基礎聚合物(第1聚合物)、及含有有機矽氧烷之聚合物(第2聚合物)。The second adhesive composition includes a base polymer (first polymer) and an organosiloxane-containing polymer (second polymer).
作為基礎聚合物,例如可例舉:丙烯酸系聚合物、天然橡膠、苯乙烯-異戊二烯-苯乙烯嵌段共聚物(SIS嵌段共聚物)、苯乙烯-丁二烯-苯乙烯嵌段共聚物(SBS嵌段共聚物)、苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS嵌段共聚物)、苯乙烯-丁二烯橡膠、聚丁二烯、聚異戊二烯、聚異丁烯、丁基橡膠、氯丁二烯橡膠、及矽酮橡膠。就抑制黏著力之觀點而言,作為基礎聚合物,較佳為丙烯酸系聚合物。Examples of the base polymer include acrylic polymers, natural rubber, styrene-isoprene-styrene block copolymers (SIS block copolymers), styrene-butadiene-styrene block copolymers, and Segment copolymer (SBS block copolymer), styrene-ethylene-butylene-styrene block copolymer (SEBS block copolymer), styrene-butadiene rubber, polybutadiene, polyisoprene vinyl, polyisobutylene, butyl rubber, chloroprene rubber, and silicone rubber. From the viewpoint of suppressing adhesion, an acrylic polymer is preferred as the base polymer.
基礎聚合物之玻璃轉移溫度(Tg)例如為0℃以下、較佳為-100℃~-5℃、更佳為-80℃~-10℃、進而較佳為-40℃~-10℃。此種構成就確保第2黏著性組合物中之基礎聚合物之流動性之方面而言適宜,因此,就藉由加熱使第2黏著性組合物向高黏著力狀態變化之方面而言適宜。The glass transition temperature (Tg) of the base polymer is, for example, 0°C or lower, preferably -100°C to -5°C, more preferably -80°C to -10°C, further preferably -40°C to -10°C. This structure is suitable for ensuring the fluidity of the base polymer in the second adhesive composition, and therefore is suitable for changing the second adhesive composition to a high adhesive state by heating.
第2黏著性組合物中之丙烯酸系聚合物係藉由包含(甲基)丙烯酸烷基酯作為主成分之單體成分(第2單體成分)之聚合而獲得。The acrylic polymer in the second adhesive composition is obtained by polymerization of a monomer component (second monomer component) containing alkyl (meth)acrylate as a main component.
作為第2單體成分中之(甲基)丙烯酸烷基酯,例如可使用與上述第1單體成分中之(甲基)丙烯酸烷基酯相同者。第2單體成分中之(甲基)丙烯酸烷基酯之調配比率例如為50質量%以上、較佳為60質量%以上,又,例如為80質量%以下。As the (meth)acrylic acid alkyl ester in the second monomer component, for example, the same thing as the (meth)acrylic acid alkyl ester in the above-mentioned first monomer component can be used. The blending ratio of the alkyl (meth)acrylate in the second monomer component is, for example, 50 mass% or more, preferably 60 mass% or more, and, for example, 80 mass% or less.
第2單體成分較佳為包含能夠與(甲基)丙烯酸烷基酯進行共聚之含官能基之乙烯基單體。作為含官能基之乙烯基單體,例如可使用與上述第1單體成分中之含官能基之乙烯基單體相同者。第2單體成分中之含官能基之乙烯基單體之調配比率例如為5質量%以上、較佳為10質量%以上、更佳為15質量%以上,又,例如為30質量%以下、較佳為20質量%以下。The second monomer component preferably contains a functional group-containing vinyl monomer capable of being copolymerized with alkyl (meth)acrylate. As the functional group-containing vinyl monomer, for example, the same functional group-containing vinyl monomer as the above-mentioned first monomer component can be used. The blending ratio of the functional group-containing vinyl monomer in the second monomer component is, for example, 5% by mass or more, preferably 10% by mass or more, more preferably 15% by mass or more, and, for example, 30% by mass or less. Preferably it is 20 mass % or less.
第2黏著性組合物中之丙烯酸系聚合物可藉由使包含(甲基)丙烯酸烷基酯作為主成分之第2單體成分聚合而形成。作為聚合方法,例如可例舉:溶液聚合、塊狀聚合、及乳化聚合,較佳可例舉溶液聚合。The acrylic polymer in the second adhesive composition can be formed by polymerizing a second monomer component containing alkyl (meth)acrylate as a main component. Examples of the polymerization method include solution polymerization, block polymerization, and emulsion polymerization. Preferably, solution polymerization is used.
第2黏著性組合物中之丙烯酸系聚合物之調配量相對於丙烯酸系聚合物與含有有機矽氧烷之聚合物之總量的比率例如為70質量%以上,又,例如為99質量%以下、較佳為90質量%以下。The ratio of the blending amount of the acrylic polymer in the second adhesive composition to the total amount of the acrylic polymer and the organosiloxane-containing polymer is, for example, 70 mass % or more, and, for example, 99 mass % or less. , preferably 90% by mass or less.
作為含有有機矽氧烷之聚合物,例如可例舉具有有機矽氧烷骨架之丙烯酸系、胺基甲酸酯系、聚醚系、聚酯系、聚碳酸酯系、及聚丁二烯系聚合物,就控制黏著力之觀點而言,適宜地使用具有有機矽氧烷骨架之丙烯酸系聚合物。Examples of polymers containing organosiloxane include acrylic, urethane, polyether, polyester, polycarbonate, and polybutadiene based polymers having an organosiloxane skeleton. From the viewpoint of controlling the adhesive force, an acrylic polymer having an organosiloxane skeleton is suitably used as the polymer.
具有有機矽氧烷骨架之丙烯酸系聚合物係藉由包含(甲基)丙烯酸烷基酯與具有有機矽氧烷骨架之單體的單體成分(第3單體成分)之聚合而獲得。作為第3單體成分中之(甲基)丙烯酸烷基酯,例如可使用與上述第1單體成分中之(甲基)丙烯酸烷基酯相同者。作為含有有機矽氧烷骨架之單體,例如可使用下述通式(1)所表示之化合物或通式(2)所表示之化合物。於通式(1)(2)中,R1 表示氫或甲基,R2 表示甲基或一價有機基,m及n為0以上之整數。An acrylic polymer having an organosiloxane skeleton is obtained by polymerization of a monomer component (third monomer component) containing an alkyl (meth)acrylate and a monomer having an organosiloxane skeleton. As the (meth)acrylic acid alkyl ester in the third monomer component, for example, the same thing as the (meth)acrylic acid alkyl ester in the above-mentioned first monomer component can be used. As the monomer containing an organosiloxane skeleton, for example, a compound represented by the following general formula (1) or a compound represented by the general formula (2) can be used. In the general formula (1) (2), R 1 represents hydrogen or a methyl group, R 2 represents a methyl group or a monovalent organic group, and m and n are integers above 0.
[化1] [Chemical 1]
[化2] [Chemicalization 2]
作為含有有機矽氧烷骨架之單體,亦可使用市售品,具體而言,可例舉:X-22-174ASX、X-22-2426、X-22-2475、及KF-2012(以上為信越化學工業股份有限公司製造之單末端反應性矽酮)。As the monomer containing the organosiloxane skeleton, commercially available products can also be used. Specifically, X-22-174ASX, X-22-2426, X-22-2475, and KF-2012 (above) It is a single-end reactive silicone manufactured by Shin-Etsu Chemical Industry Co., Ltd.).
含有有機矽氧烷骨架之單體之官能基當量例如為700 g/mol以上、較佳為800 g/mol以上、更佳為850 g/mol以上、進而較佳為1500 g/mol以上,又,例如為未達20000 g/mol、較佳為未達15000 g/mol、更佳為未達10000 g/mol、進而較佳為未達6000 g/mol、尤佳為未達5000 g/mol。The functional group equivalent of the monomer containing the organosiloxane skeleton is, for example, 700 g/mol or more, preferably 800 g/mol or more, more preferably 850 g/mol or more, and further preferably 1500 g/mol or more, and , for example, less than 20000 g/mol, preferably less than 15000 g/mol, more preferably less than 10000 g/mol, further preferably less than 6000 g/mol, particularly preferably less than 5000 g/mol .
第3單體成分中之含有有機矽氧烷骨架之單體相對於(甲基)丙烯酸烷基酯及含有有機矽氧烷骨架之單體之總量的調配量之比率例如為10質量%以上、較佳為15質量%以上、更佳為20質量%以上,又,例如為60質量%以下、較佳為50質量%以下、更佳為40質量%以下、進而較佳為30質量%以下。The ratio of the compounding amount of the organosiloxane skeleton-containing monomer in the third monomer component to the total amount of the alkyl (meth)acrylate and the organosiloxane skeleton-containing monomer is, for example, 10 mass % or more , preferably 15 mass% or more, more preferably 20 mass% or more, and, for example, 60 mass% or less, preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 30 mass% or less. .
第3單體成分亦可含有含官能基之乙烯基單體。作為含官能基之乙烯基單體,例如可使用與上述第1單體成分中之含官能基之乙烯基單體相同者。The third monomer component may also contain a vinyl monomer containing a functional group. As the functional group-containing vinyl monomer, for example, the same functional group-containing vinyl monomer as the above-mentioned first monomer component can be used.
第2黏著性組合物中之含有有機矽氧烷之聚合物可藉由包含(甲基)丙烯酸烷基酯與含有有機矽氧烷骨架之單體且視需要含有含官能基之乙烯基單體的第3單體成分聚合而形成。作為聚合方法,例如可例舉溶液聚合、塊狀聚合、及乳化聚合,較佳可例舉溶液聚合。於溶液聚合中,例如於將第3單體成分與例如上述聚合起始劑調配於溶劑中而製備反應溶液後,對該反應溶液進行加熱。然後,藉由經由反應溶液中之第3單體成分之聚合反應,可獲得包含含有有機矽氧烷之聚合物之聚合物溶液。於該聚合反應中,亦可為了調整所形成之聚合物之分子量而使用鏈轉移劑。The organosiloxane-containing polymer in the second adhesive composition can be formed by containing an alkyl (meth)acrylate and a monomer containing an organosiloxane skeleton and, if necessary, a vinyl monomer containing a functional group. The third monomer component is polymerized to form. Examples of the polymerization method include solution polymerization, block polymerization, and emulsion polymerization. Preferably, solution polymerization is used. In solution polymerization, for example, after preparing a reaction solution by blending the third monomer component and, for example, the above-mentioned polymerization initiator in a solvent, the reaction solution is heated. Then, by polymerizing the third monomer component in the reaction solution, a polymer solution including an organosiloxane-containing polymer can be obtained. In this polymerization reaction, a chain transfer agent may also be used in order to adjust the molecular weight of the polymer formed.
於第2黏著性組合物中,就對調配其中之丙烯酸系聚合物及/或含有有機矽氧烷之聚合物導入交聯結構之觀點而言,較佳為調配交聯劑。作為第2黏著性組合物中之交聯劑,例如可使用與上文中作為第1黏著性組合物中之交聯劑所述者相同者。In the second adhesive composition, from the viewpoint of introducing a cross-linked structure into the acrylic polymer and/or the polymer containing organosiloxane prepared therein, a cross-linking agent is preferably prepared. As the cross-linking agent in the second adhesive composition, for example, the same ones as those described above as the cross-linking agent in the first adhesive composition can be used.
於第2黏著性組合物中,亦可視需要調配其他成分。作為其他成分,例如可例舉:矽烷偶合劑、黏著性賦予劑、塑化劑、軟化劑、抗劣化劑、填充劑、著色劑、紫外線吸收劑(就於螢光燈下或自然光下之穩定化之觀點而言)、抗氧化劑、界面活性劑、及抗靜電劑。In the second adhesive composition, other ingredients may also be blended as necessary. Examples of other ingredients include: silane coupling agents, adhesion-imparting agents, plasticizers, softeners, anti-deterioration agents, fillers, colorants, and ultraviolet absorbers (for stability under fluorescent lamps or natural light). From a chemical perspective), antioxidants, surfactants, and antistatic agents.
第2黏著性組合物中之含有有機矽氧烷之聚合物之調配比率相對於丙烯酸系聚合物100質量份,例如為0.1質量份以上、較佳為0.3質量份以上、更佳為0.4質量份以上、進而較佳為0.5質量份以上、尤佳為1質量份以上、最佳為2質量份以上,又,例如為75質量份以下、較佳為50質量份以下、更佳為20質量份以下、進而較佳為10質量份以下、尤佳為8質量份以下、最佳為5質量份以下。The compounding ratio of the organosiloxane-containing polymer in the second adhesive composition is, for example, 0.1 parts by mass or more, preferably 0.3 parts by mass or more, and more preferably 0.4 parts by mass, based on 100 parts by mass of the acrylic polymer. More than 0.5 parts by mass, more preferably 0.5 parts by mass or more, particularly preferably 1 part by mass or more, most preferably 2 parts by mass or more, and, for example, 75 parts by mass or less, preferably 50 parts by mass or less, more preferably 20 parts by mass or less, more preferably 10 parts by mass or less, particularly preferably 8 parts by mass or less, most preferably 5 parts by mass or less.
就確保相對於被黏著體10之充分之黏著性之觀點而言,黏著劑層22之厚度例如為5 μm以上、較佳為10 μm以上、更佳為15 μm以上、進而較佳為20 μm以上,又,就處理性之觀點而言,例如為300 μm以下、較佳為100 μm以下、更佳為50 μm以下、進而較佳為40 μm以下、尤佳為30 μm以下。From the viewpoint of ensuring sufficient adhesion to the adherend 10 , the thickness of the adhesive layer 22 is, for example, 5 μm or more, preferably 10 μm or more, more preferably 15 μm or more, and still more preferably 20 μm. As mentioned above, from the viewpoint of handleability, it is, for example, 300 μm or less, preferably 100 μm or less, more preferably 50 μm or less, further preferably 40 μm or less, particularly preferably 30 μm or less.
於積層體X中,如上文中參照圖2所述般,被黏著體10上之膜部分20A之基材21中與膜部分20B對向之端面21a以越為遠離被黏著體10之部位越向膜部分20A內側退避之方式傾斜,且被黏著體10上之膜部分20B之基材21中與膜部分20A對向之端面21b以越為遠離被黏著體10之部位越向膜部分20B部分內側退避之方式傾斜。此種構成適於在使被黏著體10中之膜部分20A、20B間區域沿以圖2內之箭頭R所示之方向彎曲而將積層體X回折之情形時,對該彎曲確保彎曲留隙(即,適於抑制膜部分20A、20B彼此之抵接)。就獲得此種技術效果之方面而言,例如根據膜部分20A、20B間之距離適宜地設定端面21a、21b之上述各傾斜角度α。In the laminated body The inner side of the film portion 20A is inclined in such a way that the base material 21 of the film portion 20B on the adherend 10 is opposite to the film portion 20A. The way to retreat is tilted. This structure is suitable for ensuring a bending clearance when bending the area between the film portions 20A and 20B in the adherend 10 in the direction indicated by the arrow R in FIG. 2 and folding back the laminated body X. (That is, it is suitable for suppressing the contact of the film parts 20A and 20B with each other). In order to obtain such technical effects, for example, the above-described inclination angles α of the end surfaces 21a and 21b are appropriately set according to the distance between the membrane portions 20A and 20B.
假設於端面21a並非如上所述般傾斜而相對於被黏著體10之第2面12垂直之情形時,依相鄰之膜部分20A、20B間之距離,導致膜部分20A、20B之端面21a、21b彼此相互干涉,而積層體X無法採取適當之回折形態。Assuming that the end surface 21a is not inclined as described above but is perpendicular to the second surface 12 of the adherend 10, depending on the distance between the adjacent film parts 20A and 20B, the end surfaces 21a of the film parts 20A and 20B will be 21b interfere with each other, and the laminated body X cannot adopt an appropriate folded form.
相對於此,於本發明之一實施形態之積層體X中,由於端面21a、21b如上所述般傾斜,故而能夠對膜部分20A、20B間區域中之被黏著體10之彎曲(向箭頭R所示之方向之彎曲)確保彎曲留隙。因此,即便於膜部分20A或其端面21a與膜部分20B或其端面21b接近配置之情形時,亦容易獲得適當之回折形態。On the other hand, in the laminated body X according to one embodiment of the present invention, since the end surfaces 21a and 21b are inclined as described above, it is possible to respond to the bending of the adherend 10 in the area between the film portions 20A and 20B (in the direction of the arrow R bend in the direction shown) to ensure bending clearance. Therefore, even when the membrane part 20A or its end surface 21a and the membrane part 20B or its end surface 21b are arranged close to each other, it is easy to obtain an appropriate folded shape.
此種積層體X容易獲得使被黏著體10之膜20貼合面朝向內側之適當之回折形態。此外,關於容易如此獲得適當之回折形態之積層體X,容易將被黏著體10上之膜部分20A、20B間距離設計得較短,因此容易謀求小型化或輕量化。Such a laminated body X can easily obtain an appropriate folded shape such that the film 20 bonding surface of the adherend 10 faces inward. In addition, for the laminated body X that is easy to obtain an appropriate folded shape in this way, it is easy to design the distance between the film portions 20A and 20B on the adherend 10 to be short, so it is easy to achieve miniaturization or weight reduction.
此外,於積層體X中,如上所述,膜部分20A中之黏著劑層22於膜部分20B側緣端具有改性部22a,且膜部分20B中之黏著劑層22於膜部分20A側緣端具有改性部22b。此種構成適於在膜部分20A、20B之端面21a、21b抑制黏著劑層構成成分之滲出。In addition, in the laminated body The end has a modified portion 22b. This structure is suitable for suppressing the leakage of the constituent components of the adhesive layer on the end surfaces 21a and 21b of the film portions 20A and 20B.
圖3A至圖3D表示上述積層體X之製造方法。本製造方法包括:準備步驟、貼附步驟、切割步驟、剝離步驟、及黏著力上升步驟。3A to 3D illustrate the manufacturing method of the above-mentioned laminated body X. The manufacturing method includes: a preparation step, an attaching step, a cutting step, a peeling step, and an adhesion increasing step.
首先,於準備步驟中,如圖3A所示,準備作為軟性被黏著體之上述被黏著體10與膜20'。被黏著體10具有如上所述之第1面11及第2面12。膜20'包含上述基材21及處於上述低黏著力狀態之黏著劑層22。First, in the preparation step, as shown in FIG. 3A , the above-mentioned adherend 10 and the film 20' as the soft adherend are prepared. The adherend 10 has the first surface 11 and the second surface 12 as described above. The film 20' includes the above-mentioned base material 21 and the adhesive layer 22 in the above-mentioned low adhesion state.
膜20'例如可藉由以下方式製造,即,於基材21上塗佈黏著性組合物而形成塗膜,視需要自塗膜對溶劑進行乾燥而去除。作為黏著性組合物之塗佈方法,例如可例舉:輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥式刷塗、噴塗、浸漬輥式塗佈、棒式塗佈、刮塗、氣刀塗佈、淋幕式塗佈、模唇塗佈、及模嘴塗佈。用以去除溶劑之乾燥溫度例如為50℃以上、較佳為70℃以上、更佳為100℃以上,又,例如為200℃以下、較佳為180℃以下、更佳為150℃以下。其乾燥時間例如為5秒以上、較佳為10秒以上,又,例如為20分鐘以下、較佳為15分鐘以下、更佳為10分鐘以下。於所使用之黏著性組合物包含交聯劑之情形時,藉由與上述乾燥同時或其後之老化使黏著性組合物中之交聯劑所參與之交聯反應進行。老化條件係根據交聯劑之種類適宜設定。老化溫度例如為20℃以上,又,例如為160℃以下、較佳為100℃以下。老化時間例如為1分鐘以上、較佳為12小時以上、更佳為1天以上,又,例如為7天以下。又,關於製造後之膜20',亦可視需要於黏著劑層22中之與基材21相反之側積層剝離膜。作為此種剝離膜,例如可例舉:聚乙烯膜、聚丙烯膜、聚對苯二甲酸乙二酯膜、聚酯膜等可撓性塑膠膜。The film 20' can be produced, for example, by applying an adhesive composition on the base material 21 to form a coating film, and if necessary, drying and removing the solvent from the coating film. Examples of coating methods for the adhesive composition include roll coating, contact roll coating, gravure coating, reverse coating, roller brush coating, spray coating, dip roll coating, and rod coating. Coating, knife coating, air knife coating, curtain coating, die lip coating, and die nozzle coating. The drying temperature for removing the solvent is, for example, 50°C or higher, preferably 70°C or higher, more preferably 100°C or higher, and, for example, 200°C or lower, preferably 180°C or lower, and more preferably 150°C or lower. The drying time is, for example, 5 seconds or more, preferably 10 seconds or more, and, for example, 20 minutes or less, preferably 15 minutes or less, more preferably 10 minutes or less. When the adhesive composition used contains a cross-linking agent, the cross-linking reaction involving the cross-linking agent in the adhesive composition proceeds by aging simultaneously with or after the above-mentioned drying. Aging conditions are appropriately set according to the type of cross-linking agent. The aging temperature is, for example, 20°C or higher, and may be, for example, 160°C or lower, preferably 100°C or lower. The aging time is, for example, 1 minute or more, preferably 12 hours or more, more preferably 1 day or more, and, for example, 7 days or less. Furthermore, regarding the manufactured film 20', a release film may be laminated on the side of the adhesive layer 22 opposite to the base material 21 if necessary. Examples of such release films include flexible plastic films such as polyethylene films, polypropylene films, polyethylene terephthalate films, and polyester films.
其次,於貼附步驟中,如圖3B所示,對被黏著體10貼附膜20'。膜20'係以其黏著劑層22側被貼附於被黏著體10之第2面12側。膜20'之黏著劑層22(處於低黏著力狀態)之黏著力例如為4 N/25 mm以下、較佳為1 N/25 mm以下。帶有黏著劑層22之膜20'之黏著力係設為藉由剝離試驗所測定之值,該剝離試驗係將自膜20'視需要切出之試片以25℃貼合於聚醯亞胺膜之表面後自該聚醯亞胺膜剝離。於該剝離試驗中,將剝離溫度設為25℃,將剝離角度設為180°,將剝離速度設為300 mm/分鐘。Next, in the attachment step, as shown in FIG. 3B , the film 20' is attached to the adherend 10. The film 20' is attached to the second surface 12 side of the adherend 10 with its adhesive layer 22 side. The adhesive force of the adhesive layer 22 (in a low adhesive force state) of the film 20' is, for example, 4 N/25 mm or less, preferably 1 N/25 mm or less. The adhesive force of the film 20' with the adhesive layer 22 is a value measured by a peeling test in which a test piece cut out from the film 20' is bonded to polyethylene at 25°C. The surface of the amine film is then peeled off from the polyimide film. In this peeling test, the peeling temperature was set to 25°C, the peeling angle was set to 180°, and the peeling speed was set to 300 mm/min.
於膜20'之黏著劑層22由上述第1黏著性組合物(包含丙烯酸系聚合物、光硬化劑及光聚合起始劑)所構成之情形時,由於黏著劑層22內之光硬化劑處於未硬化之狀態,故而黏著劑層22能夠獲得低黏著力狀態。於膜20'之黏著劑層22由上述第2黏著性組合物(包含丙烯酸系聚合物、及含有有機矽氧烷之聚合物)所構成之情形時,作為黏著劑層22內之含有有機矽氧烷之聚合物之側鏈的聚有機矽氧烷部位由於在黏著劑層22內為相對低極性且有於黏著劑層22之被黏著體10側表面與其附近偏集存在之傾向,故而黏著劑層22能夠獲得低黏著力狀態。When the adhesive layer 22 of the film 20' is composed of the above-mentioned first adhesive composition (including an acrylic polymer, a photohardening agent and a photopolymerization initiator), due to the photohardening agent in the adhesive layer 22 In an unhardened state, the adhesive layer 22 can obtain a low adhesion state. When the adhesive layer 22 of the film 20' is composed of the above-described second adhesive composition (including an acrylic polymer and a polymer containing organosiloxane), the adhesive layer 22 contains organosiloxane. The polyorganosiloxane part of the side chain of the oxane polymer is relatively low-polar in the adhesive layer 22 and tends to be concentrated on the surface of the adherend 10 side of the adhesive layer 22 and its vicinity, so it adheres The agent layer 22 can achieve a low adhesion state.
貼附步驟中所使用之膜20'之黏著劑層22處於低黏著力狀態的這一構成就確保本步驟中之返工性之方面而言適宜。對膜20'要求用以自被黏著體10適當地剝離之輕剝離性,以便於在本步驟中產生貼附不良(膜20'相對於被黏著體10之位置偏移、或氣泡混入至被黏著體10與膜20'之間)之情形時,能夠利用替代之膜20'進行貼附作業。黏著劑層22處於低黏著力狀態之膜20'(其黏著劑層22能夠於事後向高黏著力狀態變化)適於關於膜20'對被黏著體10之貼附作業確保返工性,並且於適當之貼附後確保對被黏著體10之充分之接合狀態。The configuration in which the adhesive layer 22 of the film 20' used in the attaching step is in a low adhesive force state is suitable in terms of ensuring reworkability in this step. The film 20' is required to have light releasability for proper peeling from the adherend 10, so that poor adhesion occurs in this step (the position of the film 20' relative to the adherend 10 is shifted, or air bubbles are mixed into the adherend). (between the adhesive body 10 and the film 20'), an alternative film 20' can be used to perform the adhesion operation. The film 20' in which the adhesive layer 22 is in a low adhesion state (the adhesive layer 22 of which can be later changed to a high adhesion state) is suitable for ensuring reworkability with respect to the attachment operation of the film 20' to the adherend 10, and in After proper attachment, a sufficient bonding state to the adherend 10 is ensured.
繼而,於切割步驟中,如圖3C所示,對被黏著體10上之膜20'實施形成切溝G之切割加工(於圖3C中,以粗實線模式性地表示切溝),於膜20'中劃分形成所分離之兩個第1區域部S1與第1區域部S1間之第2區域部S2。第1區域部S1係構成所製造之積層體X中之上述膜20(膜部分20A、20B)之區域。第2區域部S2係如下所述般被去除之區域。作為本步驟中之切割加工之方法,例如可例舉刀具切斷及雷射切斷。作為用以進行刀具切斷之刀具,例如可例舉:旋轉刀、湯姆森刀(Thomson blade)、及畢諾克刀(Pinnacle blade)。作為用以進行雷射切斷之雷射,例如可例舉CO2 雷射或YAG雷射。Then, in the cutting step, as shown in FIG. 3C , the film 20 ′ on the adherend 10 is subjected to a cutting process to form the cutting groove G (in FIG. 3C , the cutting groove is schematically represented by a thick solid line). The film 20' is divided and formed with a second area portion S2 between the two separated first area portions S1 and the first area portion S1. The first region portion S1 is a region constituting the above-mentioned film 20 (film portions 20A, 20B) in the manufactured laminated body X. The second area portion S2 is an area removed as follows. Examples of the cutting processing method in this step include knife cutting and laser cutting. Examples of the cutter used for cutter cutting include a rotary cutter, a Thomson blade, and a Pinnacle blade. Examples of the laser used for laser cutting include CO 2 laser and YAG laser.
於切割步驟中,區分各第1區域部S1與第2區域部S2之切溝G如圖4所示,越自被黏著體10朝向基材21側離開越為寬幅。切溝G係具有截面V字形狀之V字溝。即,各第1區域部S1中之第2區域部S2側之切斷端面Ga以越為遠離被黏著體10之部位越向第1區域部S1之內側退避之方式傾斜。關於切溝G之切斷端面Ga之傾斜程度(例如相當於上述傾斜角度α之角度),於刀具切斷中,可藉由適宜地選擇使用刀具之刀尖之刃角來進行調整,於雷射切斷中,可藉由適宜地調整使用雷射之照射能量或照射直徑、照射位置等照射條件來進行調整。In the cutting step, as shown in FIG. 4 , the cutting groove G that separates the first region portion S1 and the second region portion S2 becomes wider as it moves away from the adherend 10 toward the base material 21 side. The cut groove G is a V-shaped groove having a V-shaped cross section. That is, the cut end surface Ga on the second area portion S2 side of each first area portion S1 is inclined in such a manner that the portion farther away from the adherend 10 retreats toward the inside of the first area portion S1. The degree of inclination of the cutting end surface Ga of the cutting groove G (for example, the angle corresponding to the above-mentioned inclination angle α) can be adjusted by appropriately selecting the edge angle of the tool tip during cutting. During laser cutting, adjustments can be made by appropriately adjusting the irradiation energy, irradiation diameter, irradiation position and other irradiation conditions of the laser.
又,於本實施形態中之切割步驟中,在各第1區域部S1之黏著劑層22形成面向與第2區域部S2之間之切溝G的改性部22a、22b。改性部22a、22b例如可藉由切溝形成時之黏著劑層22之局部升溫來形成。如上所述,改性部22a、22b適於抑制黏著劑層22構成成分之滲出。In addition, in the cutting step in this embodiment, the modified portions 22a and 22b facing the cut groove G between the first region portion S1 and the second region portion S2 are formed in the adhesive layer 22. The modified portions 22a and 22b can be formed, for example, by local heating of the adhesive layer 22 during groove formation. As described above, the modified portions 22a and 22b are suitable for suppressing the bleeding of the constituent components of the adhesive layer 22.
於如上所述之切割步驟中,區分各第1區域部S1與第2區域部S2之切溝G亦可對膜20'藉由自其基材21側至黏著劑層22之中途為止之半切來形成。於半切中,將基材21沿其厚度方向之整體切斷且切入至黏著劑層22之厚度方向之中途之位置為止。半切中之對黏著劑層22之切入深度為黏著劑層22之厚度整體(100%)中之例如70%以上、較佳為80%以上、更佳為90%以上,例如為未達100%、較佳為99%以下、更佳為98%以下。關於此種半切後之黏著劑層22中之殘存厚度,可根據與黏著劑層22之黏彈性等物性及剝離力之關係適宜地設定。In the above-mentioned cutting step, the cutting groove G that distinguishes each first area part S1 and the second area part S2 may also be cut in half from the base material 21 side to the middle of the adhesive layer 22 of the film 20 ′. to form. In the half-cutting, the entire base material 21 is cut along the thickness direction and is cut to a position halfway along the thickness direction of the adhesive layer 22 . The cutting depth of the adhesive layer 22 in the half-cut is, for example, 70% or more, preferably 80% or more, more preferably 90% or more, for example, less than 100% of the entire thickness of the adhesive layer 22 (100%). , preferably less than 99%, more preferably less than 98%. The remaining thickness of the adhesive layer 22 after such half-cutting can be appropriately set based on the relationship with the physical properties such as viscoelasticity of the adhesive layer 22 and the peeling force.
此種半切加工適於減輕因雷射切斷等切斷加工所產生之熱對被黏著體10之影響,因此,適於抑制被黏著體10產生因經由切割步驟而造成之熱歷程。例如於被黏著體10為軟性顯示面板或軟性印刷配線基板等電子器件之情形時,如上所述之半切加工就避免、減輕對設置於被黏著體10之第1面11側之各種元件或配線的熱影響之方面而言適宜。This half-cut processing is suitable for reducing the impact of heat generated by cutting processes such as laser cutting on the adherend 10, and therefore is suitable for suppressing the thermal history of the adherend 10 caused by the cutting step. For example, when the adherend 10 is an electronic device such as a flexible display panel or a flexible printed wiring board, the half-cut processing as described above can avoid and reduce the damage to various components or wiring provided on the first surface 11 side of the adherend 10 It is suitable in terms of thermal influence.
繼而,於剝離步驟中,如圖3D所示,將劃分形成於第1區域部S1間之第2區域部S2自被黏著體10剝離。被黏著體10上之第2區域部S2中之黏著劑層22如上所述般處於低黏著力狀態,結果此種構成就將第2區域部S2自被黏著體10適當地剝離之方面而言較佳。Next, in the peeling step, as shown in FIG. 3D , the second region portion S2 divided and formed between the first region portions S1 is peeled off from the adherend 10 . The adhesive layer 22 in the second region S2 on the adherend 10 is in a low adhesion state as described above. As a result, this configuration can properly peel the second region S2 from the adherend 10 . Better.
又,於本剝離步驟中,就抑制所謂之糊劑殘留之方面而言,適宜的是於在剝離步驟之前之切割步驟中如上所述般進行半切。於對被黏著體10上之膜20'沿其厚度方向之整體進行切斷之情形時,根據其切斷方法及切斷條件,會因位於被黏著體10與膜20'之黏著劑層22之界面及其附近的黏著劑層構成材料中之局部之升溫或按壓力之作用,導致面向該界面之黏著劑層22之一部分容易固著於被黏著體10(黏著劑之局部固著)。例如於黏著劑層22由上述第1黏著性組合物所構成之情形時,會因該組合物中之多官能(甲基)丙烯酸酯等光硬化劑進行硬化而產生此種黏著劑之局部固著。於切割步驟中,藉由如上所述之半切而於切溝G之底端與被黏著體10之間預先殘留未切斷之黏著劑部分的這一構成適於避免位於上述界面與其附近之黏著劑層構成材料中之局部之升溫或按壓力的作用。並且,藉由如上所述之半切而於切溝G之底端與被黏著體10之間預先殘留未切斷之黏著劑部分的這一構成存在就如下方面而言較佳之情況,即,利用該黏著劑殘存部分之凝集力將第2區域部S2或其黏著劑層22以無黏著劑殘渣(糊劑殘留)之方式自被黏著體10表面剝離。Moreover, in this peeling step, from the viewpoint of suppressing so-called paste residue, it is suitable to perform half-cutting as described above in the cutting step before the peeling step. When the entire film 20' on the adherend 10 is cut along its thickness direction, depending on the cutting method and cutting conditions, the adhesive layer 22 located on the adherend 10 and the film 20' may Due to the local heating or pressing force in the interface and the adjacent adhesive layer material, a part of the adhesive layer 22 facing the interface is easily fixed to the adherend 10 (local fixation of the adhesive). For example, when the adhesive layer 22 is composed of the above-mentioned first adhesive composition, local solidification of the adhesive may occur due to curing of photohardeners such as polyfunctional (meth)acrylates in the composition. write. In the cutting step, the structure in which an uncut adhesive portion remains between the bottom end of the cutting groove G and the adherend 10 through half-cutting as described above is suitable for avoiding adhesion at the above-mentioned interface and its vicinity. The effect of local heating or pressing force in the material forming the agent layer. Furthermore, there is a case in which the uncut adhesive portion remains between the bottom end of the cut groove G and the adherend 10 by half-cutting as described above, which is preferable from the following point of view. That is, using The cohesive force of the remaining adhesive portion peels off the second area portion S2 or its adhesive layer 22 from the surface of the adherend 10 without adhesive residue (paste residue).
繼而,於黏著力上升步驟中,使第1區域部S1中之黏著劑層22之黏著力上升。於膜20'之黏著劑層22由上述第1黏著性組合物(包含丙烯酸系聚合物、光硬化劑及光聚合起始劑)所構成之情形時,於剝離步驟中,對黏著劑層22照射紫外線或電子束等活性能量線。藉此,經由黏著劑層22內之光硬化劑之聚合或硬化,黏著劑層22成為高黏著力狀態。於膜20'之黏著劑層22由上述第2黏著性組合物(包含丙烯酸系聚合物及含有有機矽氧烷之聚合物)所構成之情形時,於剝離步驟中,對黏著劑層22進行加熱。加熱溫度例如為40℃以上、較佳為50℃以上、更佳為60℃以上,又,例如為未達150℃、較佳為120℃以下、更佳為100℃以下、進而較佳為80℃以下。加熱時間例如為1小時以下、較佳為30分鐘以下、更佳為10分鐘以下、進而較佳為5分鐘以下,又,例如為1分鐘以上。藉由此種加熱,黏著劑層22內之丙烯酸系聚合物與含有有機矽氧烷之聚合物之相溶性變高,含有有機矽氧烷之聚合物或作為其側鏈之聚有機矽氧烷部位(於低黏著力狀態下,有在黏著劑層22之被黏著體10側表面與其附近偏集存在之傾向)進行熱擴散,黏著劑層22之被黏著體10側表面與其附近之丙烯酸系聚合物之存在比率上升。藉此,黏著劑層22成為高黏著力狀態。處於高黏著力狀態之黏著劑層22之黏著力例如為5 N/25 mm以上、較佳為8 N/25 mm以上、更佳為10 N/25 mm以上、進而較佳為12 N/25 mm以上。又,相對於處於低黏著力狀態之黏著劑層22之黏著力,處於高黏著力狀態之黏著劑層22之黏著力例如為2倍以上、較佳為4倍以上、更佳為8倍以上、進而較佳為10倍以上。Next, in the adhesive force increasing step, the adhesive force of the adhesive layer 22 in the first region S1 is increased. When the adhesive layer 22 of the film 20' is composed of the above-mentioned first adhesive composition (including an acrylic polymer, a photohardener and a photopolymerization initiator), in the peeling step, the adhesive layer 22 is Irradiate active energy rays such as ultraviolet rays or electron beams. Thereby, the adhesive layer 22 becomes a high adhesive state through polymerization or hardening of the photohardener in the adhesive layer 22 . When the adhesive layer 22 of the film 20' is composed of the above-mentioned second adhesive composition (including an acrylic polymer and a polymer containing an organosiloxane), in the peeling step, the adhesive layer 22 is Heat. The heating temperature is, for example, 40°C or higher, preferably 50°C or higher, more preferably 60°C or higher, and, for example, less than 150°C, preferably 120°C or less, more preferably 100°C or less, and still more preferably 80°C. below ℃. The heating time is, for example, 1 hour or less, preferably 30 minutes or less, more preferably 10 minutes or less, further preferably 5 minutes or less, and, for example, 1 minute or more. By such heating, the compatibility between the acrylic polymer in the adhesive layer 22 and the polymer containing organosiloxane becomes higher. The polymer containing organosiloxane or the polyorganosiloxane as its side chain becomes higher. (In a low adhesion state, there is a tendency to be concentrated on the adherend 10 side surface of the adhesive layer 22 and its vicinity) for thermal diffusion, and the acrylic system on the adherend 10 side surface of the adhesive layer 22 and its vicinity The presence ratio of polymer increases. Thereby, the adhesive layer 22 becomes a high adhesive force state. The adhesive force of the adhesive layer 22 in a high adhesive state is, for example, 5 N/25 mm or more, preferably 8 N/25 mm or more, more preferably 10 N/25 mm or more, and further preferably 12 N/25 mm or more. In addition, the adhesive force of the adhesive layer 22 in the high adhesive force state is, for example, 2 times or more, preferably 4 times or more, and more preferably 8 times or more, compared to the adhesive force of the adhesive layer 22 in the low adhesive force state. , and more preferably 10 times or more.
於本步驟中,藉由針對第1區域部S1之黏著劑層22的如上所述之活性能量線照射或加熱等外部刺激,使被黏著體10上之各第1區域部S1之黏著劑層22向高黏著力狀態變化。藉此,於源自膜20之第1區域部S1中,對被黏著體10之貼合狀態變得牢固。此種構成就將第1區域部S1作為結構材料殘留於積層體X之方面而言適宜。黏著劑層22處於高黏著力狀態之第1區域部S1構成積層體X中之膜部分20A、20B。In this step, by applying external stimulation such as active energy ray irradiation or heating to the adhesive layer 22 of the first region S1 as described above, the adhesive layer of each first region S1 on the adherend 10 is 22 changes to a high adhesion state. Thereby, in the first region portion S1 originating from the film 20, the bonding state to the adherend 10 becomes firm. This configuration is suitable in that the first region portion S1 remains in the laminated body X as a structural material. The first region portion S1 in which the adhesive layer 22 is in a high adhesive force state constitutes the film portions 20A and 20B in the laminated body X.
根據包括如上所述之各步驟之積層體製造方法,可適當地製造上述積層體X。因此,根據本製造方法,可於所製造之積層體X中享受與上文中關於積層體X所述之效果相同之效果。又,於本製造方法中,無需將作為補強材料之複數個膜部分20A、20B分別個別地貼附於被黏著體10。此種製造方法有助於積層體X或供組裝其之器件之製造之效率化。 [產業上之可利用性]The above-mentioned laminated body X can be produced appropriately according to the laminated body manufacturing method including each step as described above. Therefore, according to this manufacturing method, the same effect as described above with respect to the laminated body X can be enjoyed in the manufactured laminated body X. In addition, in this manufacturing method, it is not necessary to individually attach the plurality of film portions 20A and 20B as reinforcing materials to the adherend 10 . This manufacturing method contributes to the efficiency of manufacturing the laminated body X or the device to which it is assembled. [Industrial availability]
本發明之積層體例如可應用於複數個補強膜貼合於同一面側之軟性器件構成零件。The laminate of the present invention can be used, for example, in a flexible device component in which a plurality of reinforcing films are bonded to the same surface.
10:被黏著體(軟性被黏著體) 11:第1面 12:第2面 20:膜(補強膜) 20':膜 20A:膜部分(第1膜部分) 20B:膜部分(第2膜部分) 21:基材 21a:端面(第1傾斜端面) 21b:端面(第2傾斜端面) 22:黏著劑層 22a:改性部 22b:改性部 D1:厚度方向 D2:面方向 G:切溝 Ga:切斷端面 R:箭頭 S1:第1區域部 S2:第2區域部 X:積層體 α:傾斜角度10: Adhered body (soft adhered body) 11:Side 1 12:Side 2 20: Membrane (reinforcement membrane) 20':membrane 20A: Membrane part (1st membrane part) 20B: Membrane part (2nd membrane part) 21:Substrate 21a: End face (1st inclined end face) 21b: End face (2nd inclined end face) 22: Adhesive layer 22a: Modification Department 22b: Modification Department D1:Thickness direction D2: Face direction G: cut groove Ga: cut end face R: arrow S1: Region 1 S2: 2nd Regional Department X: Laminated body α:tilt angle
圖1係本發明之一實施形態之積層體之立體圖。 圖2係圖1所示之積層體之局部放大剖視圖。 圖3A表示圖1及圖2所示之積層體之製造方法中之一部分步驟,圖3B表示繼圖3A所示之步驟之後之步驟,圖3C表示繼圖3B所示之步驟之後之步驟,圖3D表示繼圖3C所示之步驟之後之步驟。 圖4係圖3C中之局部放大圖。FIG. 1 is a perspective view of a laminated body according to an embodiment of the present invention. FIG. 2 is a partially enlarged sectional view of the laminated body shown in FIG. 1 . 3A shows some steps in the manufacturing method of the laminated body shown in FIGS. 1 and 2 , FIG. 3B shows the steps following the step shown in FIG. 3A , and FIG. 3C shows the steps following the step shown in FIG. 3B . 3D represents the steps following those shown in Figure 3C. Figure 4 is a partial enlarged view of Figure 3C.
10:被黏著體(軟性被黏著體) 10: Adhered body (soft adhered body)
11:第1面11 11: Side 1 11
12:第2面12 12: Side 2 12
20:膜(補強膜) 20: Membrane (reinforcement membrane)
20A:膜部分(第1膜部分) 20A: Membrane part (1st membrane part)
20B:膜部分(第2膜部分) 20B: Membrane part (2nd membrane part)
21:基材 21:Substrate
21a:端面(第1傾斜端面) 21a: End face (1st inclined end face)
21b:端面(第2傾斜端面) 21b: End face (2nd inclined end face)
22:黏著劑層 22:Adhesive layer
22a:改性部 22a: Modification Department
22b:改性部 22b: Modification Department
D1:厚度方向 D1:Thickness direction
D2:面方向 D2: Face direction
R:箭頭 R: arrow
α:傾斜角度 α:tilt angle
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CN108538198B (en) * | 2018-05-02 | 2023-11-21 | 京东方科技集团股份有限公司 | Protective film, display panel and display device |
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2019
- 2019-05-14 JP JP2019091676A patent/JP6803426B2/en active Active
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2020
- 2020-04-17 WO PCT/JP2020/016949 patent/WO2020230525A1/en active Application Filing
- 2020-04-17 KR KR1020207033184A patent/KR102248500B1/en active IP Right Grant
- 2020-04-17 CN CN202080002910.7A patent/CN112236297A/en active Pending
- 2020-04-29 TW TW109114322A patent/TWI833015B/en active
Patent Citations (5)
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JP2006224581A (en) * | 2005-02-21 | 2006-08-31 | Lintec Corp | Laminated sheet, winding member of laminated sheet, and methods for producing them |
JP2014019787A (en) * | 2012-07-18 | 2014-02-03 | Sumitomo Electric Ind Ltd | Adhesive composition and flexible printed wiring board with reinforcement plate using the same |
JP2014065899A (en) * | 2012-09-04 | 2014-04-17 | Nitto Denko Corp | Anti-fouling adhesive sheet, and anti-fouling treatment method for structure using the same |
JP2015068908A (en) * | 2013-09-27 | 2015-04-13 | Hoya株式会社 | Method of manufacturing cover glass for electronic apparatus |
TWI617441B (en) * | 2017-03-31 | 2018-03-11 | 長興材料工業股份有限公司 | Method for preparing a patterned coverlay on a substrate |
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KR102248500B1 (en) | 2021-05-06 |
KR20200138405A (en) | 2020-12-09 |
JP6803426B2 (en) | 2020-12-23 |
WO2020230525A1 (en) | 2020-11-19 |
TW202103914A (en) | 2021-02-01 |
CN112236297A (en) | 2021-01-15 |
JP2020185719A (en) | 2020-11-19 |
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