TWI826308B - Transfer device for keeping position of wafer or die by positive pressure and method for the same - Google Patents
Transfer device for keeping position of wafer or die by positive pressure and method for the same Download PDFInfo
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Abstract
Description
本發明是涉及一種移載裝置及方法,特別是一種利用正壓保持晶圓或晶粒的位置的移載裝置及方法。The present invention relates to a transfer device and method, in particular to a transfer device and method that utilizes positive pressure to maintain the position of a wafer or die.
在半導體的製程中,晶圓或晶粒通常需要藉由移載裝置被運送到基板上。以下將介紹兩種習知的移載裝置及方法。In the semiconductor manufacturing process, wafers or die usually need to be transported to the substrate by a transfer device. Two conventional transfer devices and methods will be introduced below.
第一種移載裝置包括一第一吸盤及一第二吸盤。第一種移載方法包括下列步驟:第一吸盤產生負壓,並且藉由負壓吸取一晶圓或複數個晶粒的頂面;第一吸盤移動至第二吸盤的上方;第一吸盤向下移動,直至晶圓或該等晶粒的底面接觸到第二吸盤為止;第二吸盤產生負壓,並且藉由負壓吸取晶圓或該等晶粒的底面;第一吸盤關閉負壓,並且第一吸盤脫離晶圓或該等晶粒;第二吸盤移動至一基板的上方;第二吸盤向下移動,直至晶圓或該等晶粒的頂面接觸基板為止;以及第二吸盤關閉負壓,並且第二吸盤脫離晶圓或該等晶粒,使得晶圓或該等晶粒結合在基板上。The first transfer device includes a first suction cup and a second suction cup. The first transfer method includes the following steps: the first suction cup generates negative pressure and sucks the top surface of a wafer or a plurality of dies by the negative pressure; the first suction cup moves above the second suction cup; the first suction cup moves toward Move downward until the bottom surface of the wafer or the dies contacts the second suction cup; the second suction cup generates negative pressure and sucks the bottom surface of the wafer or the dies through the negative pressure; the first suction cup turns off the negative pressure, And the first suction cup is separated from the wafer or the dies; the second suction cup moves above a substrate; the second suction cup moves downward until the top surface of the wafer or the dies contacts the substrate; and the second suction cup is closed negative pressure, and the second suction cup is separated from the wafer or the die, so that the wafer or the die is bonded to the substrate.
然而,在第一吸盤將晶圓或該等晶粒交接給第二吸盤的過程中,晶圓或該等晶粒的位置的精度偏移,導致晶圓或該等晶粒放置在基板上的位置的精度偏移。However, when the first suction cup transfers the wafer or the die to the second suction cup, the accuracy of the position of the wafer or the die shifts, causing the wafer or the die to be placed on the substrate. The precision offset of the position.
再者,由於該等晶粒的位置的精度偏移,因此有些晶粒可能沒有完全對準第二吸盤的通孔,導致第二吸盤吸取有些晶粒的力量大幅減弱,以致於在第二吸盤移動的過程中,有些晶粒會脫離第二吸盤而向下掉落。Furthermore, due to the deviation in the accuracy of the position of these die, some die may not be completely aligned with the through hole of the second suction cup, causing the second suction cup's ability to absorb some die to be greatly weakened, so that the second suction cup becomes During the movement, some grains will break away from the second suction cup and fall downward.
第二種移載裝置包括一第一吸盤、一載台及一第二吸盤。第二種移載方法包括下列步驟:第一吸盤產生負壓,並且藉由負壓吸取一晶圓或複數個晶粒的頂面;第一吸盤移動至載台的上方;第一吸盤向下移動,直至晶圓或該等晶粒的底面接觸載台為止;第一吸盤關閉負壓,並且第一吸盤脫離晶圓或該等晶粒;載台移動至第二吸盤的下方;第二吸盤向下移動,直至晶圓或該等晶粒的頂面接觸第二吸盤為止;第二吸盤產生負壓,並且藉由負壓吸取晶圓或該等晶粒的頂面;第二吸盤移動至一基板的上方;第二吸盤向下移動,直至晶圓或該等晶粒的底面接觸基板為止;以及第二吸盤關閉負壓,並且第二吸盤脫離晶圓或該等晶粒,使得晶圓或該等晶粒結合在基板上。The second transfer device includes a first suction cup, a carrying platform and a second suction cup. The second transfer method includes the following steps: the first suction cup generates negative pressure and sucks the top surface of a wafer or a plurality of dies through the negative pressure; the first suction cup moves above the stage; the first suction cup moves downward Move until the bottom surface of the wafer or the dies contacts the stage; the first suction cup turns off the negative pressure, and the first suction cup separates from the wafer or the dies; the stage moves to below the second suction cup; the second suction cup Move downward until the top surface of the wafer or the dies contacts the second suction cup; the second suction cup generates negative pressure and sucks the top surface of the wafer or the dies by the negative pressure; the second suction cup moves to above a substrate; the second suction cup moves downward until the bottom surface of the wafer or the dies contacts the substrate; and the second suction cup turns off the negative pressure, and the second suction cup separates from the wafer or the dies, causing the wafer to Or the grains are bonded to the substrate.
然而,在第一吸盤將晶圓或該等晶粒交接給到載台以及載台將晶圓或該等晶粒交接給第二吸盤的過程中,晶圓或該等晶粒的位置的精度偏移,導致晶圓或該等晶粒放置在基板上的位置的精度偏移。However, during the process in which the first suction cup transfers the wafer or the die to the carrier and the stage transfers the wafer or the die to the second suction cup, the accuracy of the position of the wafer or the die Shift, which causes a shift in the accuracy of where a wafer or such die is placed on a substrate.
再者,由於該等晶粒的位置的精度偏移,因此有些晶粒可能沒有完全對準第二吸盤的通孔,導致在第二吸盤移動的過程中,有些晶粒會脫離第二吸盤而向下掉落。Furthermore, due to the deviation in the accuracy of the position of the die, some die may not be completely aligned with the through hole of the second suction cup, causing some die to break away from the second suction cup during the movement of the second suction cup. Fall down.
本發明的主要目的在於提供一種利用正壓保持晶圓或晶粒的位置的移載裝置及方法,能夠避免晶圓或晶粒放置在基板上的位置的精度偏移。The main purpose of the present invention is to provide a transfer device and method that uses positive pressure to maintain the position of a wafer or die, which can avoid precision deviation of the position of the wafer or die placed on the substrate.
本發明的另一目的在於提供一種利用正壓保持晶圓或晶粒的位置的移載裝置及方法,能夠防止晶粒脫離吸盤而向下掉落。Another object of the present invention is to provide a transfer device and method that utilizes positive pressure to maintain the position of a wafer or die, which can prevent the die from detaching from the suction cup and falling downward.
為了達成前述的目的,本發明提供一種利用正壓保持晶圓或晶粒的位置的移載裝置,包括一吸盤以及一保持裝置。該吸盤選擇性地產生一負壓,並且藉由該負壓吸取一晶圓或複數個晶粒的頂面。該保持裝置設置在該吸盤的底部,選擇性地產生一正壓,並且藉由該正壓向上吹拂該晶圓或該等晶粒的底面。In order to achieve the aforementioned object, the present invention provides a transfer device that uses positive pressure to maintain the position of a wafer or die, including a suction cup and a holding device. The suction cup selectively generates a negative pressure, and sucks the top surface of a wafer or a plurality of dies by the negative pressure. The holding device is disposed at the bottom of the suction cup, selectively generates a positive pressure, and blows the bottom surface of the wafer or the dies upward by the positive pressure.
在一些實施例中,該吸盤包括一本體、一上蓋及一排氣管,該本體開設複數個通孔,該上蓋設置於該本體的頂部並且形成一第一腔室,該等通孔與該第一腔室相通,該排氣管設置於該上蓋並且與該第一腔室相通;其中,該排氣管將該第一腔室內部與該等通孔內部的空氣向外排出以產生該負壓,使得該本體藉由該負壓吸取該晶圓或該等晶粒的頂面。In some embodiments, the suction cup includes a body, an upper cover and an exhaust pipe. The body is provided with a plurality of through holes. The upper cover is disposed on the top of the body and forms a first chamber. The through holes are connected with the first chamber. The exhaust pipe communicates with the first chamber, and the exhaust pipe is provided on the upper cover and communicates with the first chamber; wherein, the exhaust pipe discharges the air inside the first chamber and the through holes outward to generate the The negative pressure causes the body to suck the top surface of the wafer or the dies through the negative pressure.
在一些實施例中,該保持裝置包括一下蓋及一進氣管,該下蓋設置於該本體的底部並且形成一第二腔室,該進氣管設置於該下蓋並且與該第二腔室相通;其中,該進氣管將外部空氣引導進入該第二腔室內部以產生該正壓,使得該下蓋藉由該正壓向上吹拂該晶圓或該等晶粒的底面。 In some embodiments, the holding device includes a lower cover and an air inlet pipe. The lower cover is disposed at the bottom of the body and forms a second chamber. The air inlet pipe is disposed on the lower cover and communicates with the second chamber. The air inlet pipe guides external air into the second chamber to generate the positive pressure, so that the lower cover blows upward the bottom surface of the wafer or the dies through the positive pressure.
在一些實施例中,所述的移載裝置進一步包括一夾持機構,該夾持機構夾住該本體的周圍的頂部與該下蓋的周圍的底部。 In some embodiments, the transfer device further includes a clamping mechanism that clamps the top around the body and the bottom around the lower cover.
在一些實施例中,該保持裝置進一步包括一密封件,該密封件沿著一圓周方向環繞設置在該本體的周圍的底部與該下蓋的周圍的頂部之間的一縫隙中。 In some embodiments, the holding device further includes a sealing member, the sealing member is circumferentially disposed in a gap between the surrounding bottom of the body and the surrounding top of the lower cover.
為了達成前述的目的,本發明提供一種利用正壓保持晶圓或晶粒的位置的移載方法,包括下列步驟:(a)一吸盤產生一負壓,並且藉由該負壓吸取一晶圓或複數個晶粒的頂面;(b)一保持裝置移動至該吸盤的底部,產生一正壓,並且藉由該正壓向上吹拂該晶圓或該等晶粒的底面;(c)該吸盤關閉該負壓,並且該吸盤與該保持裝置同步移動至一基板的上方;(d)該吸盤產生該負壓,並且藉由該負壓吸取該晶圓或該等晶粒的頂面;以及該保持裝置關閉該正壓,並且該保持裝置脫離該吸盤;(e)該吸盤向下移動,直至該晶圓或該等晶粒的底面接觸到該基板為止;以及(f)該吸盤關閉該負壓,並且該吸盤脫離該晶圓或該等晶粒,使得該晶圓或該等晶粒結合在該基板上。 In order to achieve the aforementioned objectives, the present invention provides a transfer method that utilizes positive pressure to maintain the position of a wafer or die, including the following steps: (a) a suction cup generates a negative pressure, and uses the negative pressure to suck a wafer or the top surface of a plurality of dies; (b) a holding device moves to the bottom of the suction cup, generates a positive pressure, and blows the wafer or the bottom surface of the dies upward through the positive pressure; (c) the The suction cup turns off the negative pressure, and the suction cup moves to above a substrate synchronously with the holding device; (d) the suction cup generates the negative pressure, and sucks the top surface of the wafer or the dies through the negative pressure; and the holding device turns off the positive pressure, and the holding device detaches from the suction cup; (e) the suction cup moves downward until the bottom surface of the wafer or the dies contacts the substrate; and (f) the suction cup closes The negative pressure causes the suction cup to separate from the wafer or the die, so that the wafer or the die is bonded to the substrate.
在一些實施例中,步驟(a)進一步包括:該吸盤的一排氣管將該吸盤的一本體的一第一腔室內部與該本體的複數個通孔內部的空氣向外排出以產生該負壓,使得該本體藉由該負壓吸取該晶圓或該等晶粒的頂面。 In some embodiments, step (a) further includes: an exhaust pipe of the suction cup discharges the air inside a first chamber of a body of the suction cup and a plurality of through holes of the body outward to generate the The negative pressure causes the body to suck the top surface of the wafer or the dies through the negative pressure.
在一些實施例中,步驟(b)進一步包括:一保持裝置的一下蓋移動至該本體的底部;以及該保持裝置的一進氣管將外部空氣引導進入該保持裝置的一下蓋的一第二腔室內部以產生該正壓,使得該下蓋藉由該正壓向上吹拂該晶圓或該等晶粒的底面。 In some embodiments, step (b) further includes: moving a lower cover of the retaining device to the bottom of the body; and an air inlet pipe of the retaining device guiding external air into a second portion of the lower cover of the retaining device. The positive pressure is generated inside the chamber, so that the lower cover blows upward the bottom surface of the wafer or the dies through the positive pressure.
在一些實施例中,步驟(b)進一步包括:一夾持機構夾住該本體的周圍的頂部與該下蓋的周圍的底部;其中,步驟(c)進一步包括:該排氣管停止將該第一腔室內部與該等通孔內部的空氣向外排出以關閉該負壓;一上蓋向上移動以脫離該本體;該本體、該保持裝置與該夾持機構同步移動至該基板的上方;以及該上蓋移動至該本體的頂部;其中,步驟(d)進一步包括:該排氣管將該第一腔室內部與該等通孔內部的空氣向外排出以產生該負壓,使得該本體藉由該負壓吸取該晶圓或該等晶粒;該進氣管停止將外部空氣引導進入該第二腔室以關閉該正壓;該夾持機構脫離該本體與該上蓋;以及該保持裝置向下移動以脫離該吸盤。In some embodiments, step (b) further includes: a clamping mechanism clamps the top around the body and the bottom around the lower cover; wherein step (c) further includes: stopping the exhaust pipe to move the lower cover. The air inside the first chamber and the through holes is discharged outward to close the negative pressure; an upper cover moves upward to separate from the body; the body, the holding device and the clamping mechanism move synchronously to above the substrate; And the upper cover moves to the top of the body; wherein step (d) further includes: the exhaust pipe exhausts the air inside the first chamber and the through holes to generate the negative pressure, so that the body The wafer or the dies are sucked by the negative pressure; the air inlet pipe stops guiding external air into the second chamber to close the positive pressure; the clamping mechanism is separated from the body and the upper cover; and the holding The device moves downward to disengage the suction cup.
在一些實施例中,步驟(b)進一步包括:該保持裝置的一密封件沿著一圓周方向環繞設置在該本體的周圍的底部與該下蓋的周圍的頂部之間的一縫隙中。In some embodiments, step (b) further includes: a sealing member of the retaining device is circumferentially disposed in a gap between the surrounding bottom of the body and the surrounding top of the lower cover along a circumferential direction.
本發明的功效在於,在該晶圓或該等晶粒從吸盤移載至基板的期間,本發明能夠藉由單一吸盤吸取並移動該晶圓或該等晶粒,同時藉由保持裝置所產生的正壓保持吸盤上的該晶圓或該等晶粒的位置固定不變,不需要再交接給另一吸盤或連續交接給載台與另一吸盤,有效減少交接次數,避免該晶圓或該等晶粒放置在基板上的位置的精度偏移。The effect of the present invention is that during the transfer of the wafer or the die from the suction cup to the substrate, the present invention can suck and move the wafer or the die with a single suction cup, and at the same time, the wafer or the die is generated by the holding device. The positive pressure keeps the position of the wafer or the die on the suction cup fixed, and there is no need to hand it over to another suction cup or continuously hand it over to the carrier and another suction cup, effectively reducing the number of handovers and preventing the wafer or The accuracy of the placement of the dies on the substrate shifts.
再者,因為吸盤上的該等晶粒的位置固定不變,所以該等晶粒能夠保持對準該等通孔,吸盤吸取該等晶粒的力量保持不變,該等晶粒完全不會脫離吸盤而向下掉落。Furthermore, because the positions of the die on the suction cup are fixed, the die can remain aligned with the through holes, and the force of the suction cup to absorb the die remains unchanged, and the die will not move at all. It breaks away from the suction cup and falls downward.
以下配合圖式及元件符號對本發明的實施方式做更詳細的說明,俾使熟習該項技藝者在研讀本說明書後能據以實施。The following is a more detailed description of the embodiments of the present invention with reference to drawings and component symbols, so that those skilled in the art can implement them after reading this specification.
圖1是本發明的裝置的立體分解圖,圖2是本發明的裝置的剖面圖。如圖1及圖2所示,本發明提供一種利用正壓保持晶圓或晶粒的位置的移載裝置,包括一吸盤10、一保持裝置20以及一夾持機構30。吸盤10包括一本體11、一上蓋12及一排氣管13,本體11開設複數個通孔111,上蓋12設置於本體11的頂部並且形成一第一腔室121,該等通孔111與第一腔室121相通,排氣管13設置於上蓋12並且與第一腔室121相通。保持裝置20包括一下蓋21、一進氣管22及一密封件23,下蓋21設置於本體11的底部並且形成一第二腔室211,進氣管22設置於下蓋21並且與第二腔室211相通,密封件23沿著一圓周方向環繞設置在本體11的周圍的底部與下蓋21的周圍的頂部之間的一縫隙中。夾持機構30包括二第一夾持件31及二第二夾持件32,該等第一夾持件31分別夾住本體11的兩側的頂部,並且該等第二夾持件32分別夾住在下蓋21的兩側的底部。Figure 1 is an exploded perspective view of the device of the present invention, and Figure 2 is a cross-sectional view of the device of the present invention. As shown in FIGS. 1 and 2 , the present invention provides a transfer device that uses positive pressure to maintain the position of a wafer or die, including a
如圖1所示,在較佳實施例中,吸盤10的形狀為矩形。在一些實施例中,吸盤10的形狀為圓形。然而,吸盤10的形狀不限於此。As shown in Figure 1, in a preferred embodiment, the shape of the
在一些實施例中,吸盤10的材質可以是橡膠、金屬、塑膠或多孔隙陶瓷等,然而不限於此。In some embodiments, the
在一些實施例中,密封件23可以是O形環或橡膠墊片,然而不限於此。In some embodiments, the
圖3是本發明的方法的流程圖,圖4是本發明的方法的步驟S100的示意圖,圖5A至圖5D是本發明的方法的步驟S200的示意圖,圖6A至圖6D是本發明的方法的步驟S300的示意圖,圖7A至圖7E是本發明的方法的步驟S400的示意圖,圖8A及圖8B是本發明的方法的步驟S500的示意圖,圖9A及圖9B是本發明的方法的步驟S600的示意圖。本發明提供一種利用正壓保持晶圓或晶粒的位置的移載方法,包括下列步驟:Figure 3 is a flow chart of the method of the present invention. Figure 4 is a schematic diagram of step S100 of the method of the present invention. Figures 5A to 5D are schematic diagrams of step S200 of the method of the present invention. Figures 6A to 6D are schematic diagrams of the method of the present invention. 7A to 7E are schematic diagrams of step S400 of the method of the present invention. Figures 8A and 8B are schematic diagrams of step S500 of the method of the present invention. Figures 9A and 9B are schematic diagrams of step S500 of the method of the present invention. Schematic diagram of the S600. The present invention provides a transfer method that utilizes positive pressure to maintain the position of wafers or die, which includes the following steps:
步驟S100,如圖3及圖4所示, 吸盤10產生一負壓14,並且藉由負壓14吸取複數個晶粒40的頂面。更明確地說,步驟S100進一步包括:排氣管13將第一腔室121內部與該等通孔111內部的空氣向外排出以產生負壓14,使得本體11藉由負壓14吸取該等晶粒40的頂面。In step S100 , as shown in FIGS. 3 and 4 , the
步驟S200,如圖3及圖5A至圖5D所示,保持裝置20移動至吸盤10的底部,產生一正壓24,並且藉由正壓24向上吹拂該等晶粒40的底面。更詳而言之,步驟S200進一步包括:步驟S210,如圖5A所示,保持裝置20移動至吸盤10的下方;步驟S220,如圖5B所示,保持裝置20向上移動,使得下蓋21移動至本體11的底部,並且密封件23沿著圓周方向環繞設置在本體11的周圍的底部與下蓋21的周圍的頂部之間的縫隙中;步驟S230,如圖5C所示,該等第一夾持件31分別夾住本體11的兩側的頂部,並且該等第二夾持件32分別夾住在下蓋21的兩側的底部;以及步驟S240,如圖5D所示,進氣管22將外部空氣引導進入第二腔室211以產生正壓24,使得下蓋21藉由正壓24向上吹拂該等晶粒40的底面。Step S200 , as shown in FIG. 3 and FIG. 5A to FIG. 5D , the holding
步驟S300,如圖3及圖6A至圖6D所示,吸盤10關閉負壓14,並且吸盤10與保持裝置20同步移動至一基板50的上方。具體來說,步驟S300進一步包括:步驟S310,如圖6A所示,排氣管13停止將第一腔室121內部與該等通孔111內部的空氣向外排出以關閉負壓14;步驟S320,如圖6B所示,上蓋12向上移動以脫離本體11;步驟S330,如圖6C所示,本體11、保持裝置20與夾持機構30同步移動至基板50的上方;以及步驟S340,如圖6D所示,上蓋12移動至本體11的頂部。Step S300 , as shown in FIG. 3 and FIG. 6A to FIG. 6D , the
步驟S400,如圖3及圖7A至圖7E所示,吸盤10產生負壓14,並且藉由負壓14吸取該等晶粒40的頂面;以及保持裝置20關閉正壓24,並且保持裝置20脫離吸盤10。更清楚地說,步驟S400進一步包括:步驟S410,如圖7A所示,排氣管13將第一腔室121內部與該等通孔111內部的空氣向外排出以產生負壓14,使得本體11藉由負壓14吸取該等晶粒40;步驟S420,如圖7B所示,進氣管22停止將外部空氣引導進入第二腔室211以關閉正壓24;步驟S430,如圖7C所示,該等第一夾持件31向上移動以脫離本體11,並且該等第二夾持件32向下移動以脫離上蓋12;步驟S440,如圖7D及圖7E所示,保持裝置20向下移動以脫離吸盤10。Step S400, as shown in FIG. 3 and FIG. 7A to FIG. 7E , the
步驟S500,如圖3、圖8A及圖8B所示,吸盤10向下移動,直至該等晶粒40的底面接觸基板50為止。In step S500 , as shown in FIG. 3 , FIG. 8A and FIG. 8B , the
步驟S600,如圖3、圖9A及圖9B所示,吸盤10關閉負壓14,並且吸盤10脫離該等晶粒40,使得該等晶粒40結合在基板50上。具體而言,步驟S600進一步包括:步驟S610,如圖9A所示,排氣管13停止將第一腔室121內部與該等通孔111內部的空氣向外排出以關閉負壓14;以及步驟S620,如圖9B所示,吸盤10向上移動以脫離該等晶粒40,使得該等晶粒40結合在基板50上。Step S600 , as shown in FIG. 3 , FIG. 9A and FIG. 9B , the
在一些實施例中,本發明的移載裝置及方法移載的對象也可以是一晶圓(圖未示)。In some embodiments, the object transferred by the transfer device and method of the present invention may also be a wafer (not shown).
綜上所述,在晶圓或該等晶粒40從吸盤10移載至基板50的期間,本發明能夠藉由單一吸盤10吸取並移動晶圓或該等晶粒40,同時藉由保持裝置20所產生的正壓24保持吸盤10上的晶圓或該等晶粒40的位置固定不變,不需要再交接給另一吸盤或連續交接給一載台與另一吸盤,有效減少交接次數,避免晶圓或該等晶粒40放置在基板50上的位置的精度偏移。To sum up, during the period when the wafer or the
再者,因為吸盤10上的該等晶粒40的位置固定不變,所以該等晶粒40能夠保持對準該等通孔111,吸盤10吸取該等晶粒40的力量保持不變,該等晶粒40完全不會脫離吸盤10而向下掉落。Furthermore, because the positions of the die 40 on the
此外,本體11與上蓋12是可分離的,減輕吸盤10移動時的重量。In addition, the
又,夾持機構30能夠將本體11和下蓋21固定,以防本體11受到上蓋12移動的影響,還可輔助本體11與下蓋21同步移動。In addition, the
值得一提的是,密封件23能夠防止第二腔室211的空氣通過縫隙向外洩漏,避免正壓24的壓力下降。It is worth mentioning that the
以上所述者僅為用以解釋本發明的較佳實施例,並非企圖據以對本發明做任何形式上的限制,是以,凡有在相同的發明精神下所作有關本發明的任何修飾或變更,皆仍應包括在本發明意圖保護的範疇。The above are only used to explain the preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Therefore, any modifications or changes related to the present invention are made under the same spirit of the invention. , should still be included in the scope of protection intended by the present invention.
10:吸盤 11:本體 111:通孔 12:上蓋 121:第一腔室 13:排氣管 14:負壓 20:保持裝置 21:下蓋 211:第二腔室 22:進氣管 23:密封件 24:正壓 30:夾持機構 31:第一夾持件 32:第二夾持件 40:晶粒 50:基板 S100~S600:步驟 S210~S240:步驟 S310~S340:步驟 S410~S440:步驟 S610,S620:步驟 10:Suction cup 11:Ontology 111:Through hole 12: Upper cover 121:First chamber 13:Exhaust pipe 14: Negative pressure 20: Holding device 21:Lower cover 211:Second chamber 22:Intake pipe 23:Seals 24: Positive pressure 30: Clamping mechanism 31: First clamping piece 32: Second clamping piece 40:Grain 50:Substrate S100~S600: steps S210~S240: steps S310~S340: steps S410~S440: steps S610, S620: steps
圖1是本發明的裝置的立體分解圖。 圖2是本發明的裝置的剖面圖。 圖3是本發明的方法的流程圖。 圖4是本發明的方法的步驟S100的示意圖。 圖5A至圖5D是本發明的方法的步驟S200的示意圖。 圖6A至圖6D是本發明的方法的步驟S300的示意圖。 圖7A至圖7E是本發明的方法的步驟S400的示意圖。 圖8A及圖8B是本發明的方法的步驟S500的示意圖。 圖9A及圖9B是本發明的方法的步驟S600的示意圖。 Figure 1 is an exploded perspective view of the device of the present invention. Figure 2 is a cross-sectional view of the device of the present invention. Figure 3 is a flow chart of the method of the present invention. Figure 4 is a schematic diagram of step S100 of the method of the present invention. 5A to 5D are schematic diagrams of step S200 of the method of the present invention. 6A to 6D are schematic diagrams of step S300 of the method of the present invention. 7A to 7E are schematic diagrams of step S400 of the method of the present invention. 8A and 8B are schematic diagrams of step S500 of the method of the present invention. 9A and 9B are schematic diagrams of step S600 of the method of the present invention.
S100~S600:步驟 S100~S600: steps
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JP2003142557A (en) * | 2001-11-07 | 2003-05-16 | Toshiba Mach Co Ltd | Wafer carrier |
TW201818490A (en) * | 2016-11-10 | 2018-05-16 | 致茂電子股份有限公司 | Spacer, wafer stack package, movable sucking structure and wafer moving method using the same |
TWM628357U (en) * | 2022-03-09 | 2022-06-11 | 宏捷科技股份有限公司 | Wafer transfer device |
TWI787043B (en) * | 2022-01-05 | 2022-12-11 | 梭特科技股份有限公司 | Die transferring method for preventing enclosed bubble |
TW202305999A (en) * | 2021-07-28 | 2023-02-01 | 日商迪思科股份有限公司 | Chip conveying apparatus and die bonder |
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JP2003142557A (en) * | 2001-11-07 | 2003-05-16 | Toshiba Mach Co Ltd | Wafer carrier |
TW201818490A (en) * | 2016-11-10 | 2018-05-16 | 致茂電子股份有限公司 | Spacer, wafer stack package, movable sucking structure and wafer moving method using the same |
TW202305999A (en) * | 2021-07-28 | 2023-02-01 | 日商迪思科股份有限公司 | Chip conveying apparatus and die bonder |
TWI787043B (en) * | 2022-01-05 | 2022-12-11 | 梭特科技股份有限公司 | Die transferring method for preventing enclosed bubble |
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