TWI820358B - Resin molding method - Google Patents

Resin molding method Download PDF

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Publication number
TWI820358B
TWI820358B TW109140037A TW109140037A TWI820358B TW I820358 B TWI820358 B TW I820358B TW 109140037 A TW109140037 A TW 109140037A TW 109140037 A TW109140037 A TW 109140037A TW I820358 B TWI820358 B TW I820358B
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Prior art keywords
resin
chamber
workpiece
supplied
nozzle
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TW109140037A
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Chinese (zh)
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TW202108334A (en
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中澤英明
村松吉和
池田正信
藤澤雅彥
川口正樹
北村秀樹
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日商山田尖端科技股份有限公司
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Priority claimed from JP2016105543A external-priority patent/JP6431871B2/en
Priority claimed from JP2016105600A external-priority patent/JP6721412B2/en
Priority claimed from JP2017032726A external-priority patent/JP6730206B2/en
Application filed by 日商山田尖端科技股份有限公司 filed Critical 日商山田尖端科技股份有限公司
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Publication of TWI820358B publication Critical patent/TWI820358B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/02Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • B29C39/10Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles incorporating preformed parts or layers, e.g. casting around inserts or for coating articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/22Component parts, details or accessories; Auxiliary operations
    • B29C39/42Casting under special conditions, e.g. vacuum

Abstract

提供一種可防止樹脂內含空氣等之不良狀況的技術。 Provide a technology that prevents problems such as air inclusion in resin.

對腔室(30)的內部(30a)進行抽真空。接著,在成為真空狀態的腔室(30)的內部(30a)從噴嘴(22)朝被供給物、即工件(W)吐出液狀樹脂(R)。接著,在停止液狀樹脂(R)的吐出,停止腔室(30)的內部(30a)的抽真空後,在腔室(30)的內部(30a)使噴嘴(22)往復移動。 The interior (30a) of the chamber (30) is evacuated. Next, the liquid resin (R) is discharged from the nozzle (22) toward the workpiece (W), which is the object to be supplied, from the inside (30a) of the chamber (30) in the vacuum state. Next, after stopping the discharge of the liquid resin (R) and stopping the vacuuming of the inside (30a) of the chamber (30), the nozzle (22) is reciprocated in the inside (30a) of the chamber (30).

Description

樹脂成形方法 Resin molding method

本發明係有關一種樹脂供給技術、樹脂成形技術及樹脂安置技術。 The present invention relates to a resin supply technology, a resin molding technology, and a resin placement technology.

日本國特開2012-126075號公報(以下稱為「專利文獻1」)記載一種液狀樹脂供給裝置。此液狀樹脂供給裝置係將填充於注射器的液狀樹脂從管嘴(tube nozzle)向工件吐出並供給者。 Japanese Patent Application Publication No. 2012-126075 (hereinafter referred to as "Patent Document 1") describes a liquid resin supply device. This liquid resin supply device discharges and supplies the liquid resin filled in the syringe from a tube nozzle to the workpiece.

日本國特開2007-111862號公報(以下稱為「專利文獻2」)記載一種真空分配裝置。此真空分配裝置係將被塗布品配置於真空室內,於真空環境氣體下供給液狀樹脂者。又,此真空分配裝置為防止因液體從噴嘴懸垂所致使裝置髒污而在真空腔室外部設有懸垂液體支承容器。 Japanese Patent Application Publication No. 2007-111862 (hereinafter referred to as "Patent Document 2") describes a vacuum distribution device. This vacuum distribution device places the object to be coated in a vacuum chamber and supplies liquid resin under vacuum ambient gas. In addition, this vacuum distribution device is provided with a hanging liquid support container outside the vacuum chamber in order to prevent the device from being soiled due to liquid hanging from the nozzle.

日本國特開2007-307843號公報(以下稱為「專利文獻3」)記載一種使用薄片樹脂將工件(被成形品)進行樹脂模製的方法。此處係在將成形模具開模且安置工件後,以覆蓋工件的樹脂模製區域的方式將薄片樹脂供給至工件上。 Japanese Patent Application Publication No. 2007-307843 (hereinafter referred to as "Patent Document 3") describes a method of resin molding a workpiece (formed article) using a sheet of resin. Here, after the molding die is opened and the workpiece is placed, a thin sheet of resin is supplied to the workpiece so as to cover the resin molding area of the workpiece.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Document]

專利文獻1 日本國特開2012-126075號公報 Patent Document 1 Japanese Patent Application Publication No. 2012-126075

專利文獻2 日本國特開2007-111862號公報 Patent Document 2 Japanese Patent Application Publication No. 2007-111862

專利文獻3 日本國特開2007-307843號公報 Patent Document 3 Japanese Patent Application Publication No. 2007-307843

[發明欲解決之課題][Problem to be solved by the invention]

在對被供給物(例如工件或薄膜)進行樹脂成形時,使用專利文獻1所記載之液狀樹脂供給裝置可對被供給物上供給液狀樹脂。然而,例如當對作為被供給物之安裝有複數個晶片零件(晶片狀的電子零件)的基板、即工件供給液狀樹脂時,有時會有覆蓋複數個晶片零件的液狀樹脂成為水珠狀的塊之情況。關於這點,會導致在基板和液狀樹脂之間殘留空氣,結果容易在成形品上發生未填充的問題。再者,在作為工件的基板上被倒裝接合的晶片零件中,有無法適切地進行所謂底部填充(underfill)之虞。When resin molding is performed on an object to be supplied (for example, a workpiece or a film), the liquid resin supply device described in Patent Document 1 can be used to supply liquid resin to the object to be supplied. However, for example, when liquid resin is supplied to a workpiece, which is a substrate on which a plurality of wafer components (wafer-shaped electronic components) are mounted as a supplied object, the liquid resin covering the plurality of wafer components may become water droplets. shaped block. In this regard, air may remain between the substrate and the liquid resin, resulting in an unfilled problem in the molded product. Furthermore, there is a risk that so-called underfill may not be performed appropriately on a wafer component that is flip-chip bonded on a substrate as a workpiece.

於是,針對液狀樹脂之供給,並非如專利文獻1所載之技術是在大氣環境下,而是可考慮如專利文獻2所記載之技術是在真空環境氣體下進行而除去殘留空氣。然而,專利文獻2所記載的技術,因為是在使真空腔室開放於大氣中後使液體懸垂容器移動至噴嘴下之構成(特別參照其說明書段落[0026]),所以會有在工件上的液狀樹脂附著灰塵之虞。Therefore, as for the supply of liquid resin, instead of using the technology described in Patent Document 1 in an atmospheric environment, it may be considered that the technology described in Patent Document 2 is performed in a vacuum ambient gas to remove residual air. However, the technology described in Patent Document 2 is configured to open the vacuum chamber to the atmosphere and then move the liquid suspension container under the nozzle (especially refer to paragraph [0026] of the specification), so there is a problem on the workpiece. There is a risk of dust adhering to liquid resin.

本發明的一目的在於:提供可防止樹脂內含空氣等之不良狀況的技術。本發明的一目的及其他目的以及新穎特徵從本說明書的記述及附件的圖面即可明瞭。An object of the present invention is to provide a technology that can prevent problems such as air inclusion in resin. One object, other objects, and novel features of the present invention will become apparent from the description of this specification and the accompanying drawings.

例如本發明的其他目的在於:提供於樹脂安置中抑制空氣混入的技術。如專利文獻3所記載,當向安置於模具開啟狀態的成形模具上的工件上供給薄片樹脂時,因藉由加熱器被預先設定為成形溫度的成形模具之輻射熱而導致薄片樹脂軟化。因此,例如在作為具有凹凸部的工件是使用安裝有複數個晶片零件的基板之情況,會有在覆蓋晶片零件的薄片樹脂與基板之間捲入空氣的狀態使薄片樹脂軟化之虞。在此情況,會有因成形品的樹脂成形部有空氣混入而導致產生空隙(void)之虞。 [解決課題之手段]For example, another object of the present invention is to provide a technology for suppressing air mixing during placement of resin. As described in Patent Document 3, when a sheet resin is supplied to a workpiece placed on a molding die with the mold open, the sheet resin softens due to radiant heat from the molding die whose molding temperature is preset to the molding temperature by the heater. Therefore, for example, when a substrate on which a plurality of wafer components are mounted is used as a workpiece having uneven portions, air may be trapped between the sheet resin covering the wafer components and the substrate, causing the sheet resin to soften. In this case, there is a risk that voids may be generated due to air being mixed into the resin molded portion of the molded product. [Means to solve the problem]

簡單地說明本案揭示的發明中之具代表性者之概要如下。A brief summary of representative inventions disclosed in this case is as follows.

本發明的一解決手段涉及之樹脂供給方法,其特徵為包含: (a)對腔室的內部進行抽真空之工序; (b)在成為真空狀態的前述腔室的前述內部從噴嘴朝被供給物吐出液狀樹脂之工序;及 (c)在停止前述液狀樹脂之吐出且停止前述腔室的前述內部的抽真空後,在前述腔室的前述內部進行前述噴嘴的斷液之工序。 更佳為:前述(c)工序中,在停止前述液狀樹脂的吐出且停止前述腔室的前述內部的抽真空後,在前述腔室的前述內部使前述噴嘴往復移動。據此,可防止樹脂內含空氣等之不良狀況。One solution of the present invention relates to a resin supply method, which is characterized by comprising: (a) The process of vacuuming the inside of the chamber; (b) The process of discharging the liquid resin from a nozzle toward the object to be supplied from the inside of the chamber in a vacuum state; and (c) After stopping the discharge of the liquid resin and stopping the evacuation of the inside of the chamber, a step of shutting off the liquid in the nozzle is performed in the inside of the chamber. More preferably, in the step (c), after stopping the discharge of the liquid resin and stopping the evacuation of the inside of the chamber, the nozzle is reciprocated in the inside of the chamber. This can prevent problems such as air inclusion in the resin.

此處,更佳為:前述(b)工序中,藉由設於前述腔室的前述內部之重量計一邊測量前述液狀樹脂的重量一邊吐出前述液狀樹脂。據此,可正確地測量液狀樹脂的重量。Here, it is more preferable that in the step (b), the liquid resin is discharged while measuring the weight of the liquid resin with a weight meter installed in the inside of the chamber. Accordingly, the weight of the liquid resin can be accurately measured.

又,更佳為:前述(b)工序中,使前述噴嘴與前述被供給物平行地一邊移動一邊吐出前述液狀樹脂。據此,可於任意的吐出位置將液狀樹脂供給至被供給物的表面內。Furthermore, it is more preferable that in the step (b), the liquid resin is ejected while moving the nozzle parallel to the object to be supplied. According to this, the liquid resin can be supplied into the surface of the object to be supplied at any discharge position.

本發明之其他解決手段所涉及之樹脂供給方法,其特徵為包含:(a)在腔室的內部從噴嘴朝被供給物吐出液狀樹脂之工序;(b)對前述腔室的前述內部進行抽真空之工序;及(c)在停止前述液狀樹脂之吐出且停止前述腔室的前述內部的抽真空後,在前述腔室的前述內部進行前述噴嘴的斷液之工序。據此,可防止樹脂內含空氣等之不良狀況。A resin supply method according to another solution of the present invention is characterized by including: (a) a process of discharging liquid resin from a nozzle toward an object to be supplied inside a chamber; (b) performing an onslaught on the inside of the chamber; The step of vacuuming; and (c) after stopping the ejection of the liquid resin and stopping the vacuuming of the inside of the chamber, performing a step of shutting off the liquid of the nozzle in the inside of the chamber. This can prevent problems such as air inclusion in the resin.

本發明之一解決手段涉及之樹脂封止方法,其特徵為包含:使用前述任一樹脂供給方法向前述被供給物供給前述液狀樹脂之工序;及使用前述被供給物且以模製模具加熱加壓並以樹脂封止成既定的形狀之工序。據此,可進行防止因含有空氣所致空隙或未填充之高品質的樹脂封止。One solution of the present invention relates to a resin sealing method, which is characterized by including: a step of supplying the liquid resin to the object to be supplied using any of the resin supply methods mentioned above; and using the object to be supplied and heating it with a molding die The process of pressurizing and sealing with resin into a predetermined shape. This enables high-quality resin sealing that prevents voids or unfilled spaces due to air inclusion.

本發明之一解決手段涉及之樹脂供給裝置,其特徵為具備:內部供被供給物安置的腔室;吐出部,具有朝前述被供給物吐出液狀樹脂的噴嘴且前述噴嘴設於前述腔室的前述內部;真空部,對前述腔室的前述內部進行抽真空;使前述噴嘴往復移動之噴嘴升降驅動部;及控制部,控制前述吐出部、前述真空部及前述噴嘴升降驅動部,在來自於前述吐出部的前述液狀樹脂之吐出停止且停止利用前述真空部抽真空之狀態中,藉由前述控制部控制前述噴嘴升降驅動部使前述噴嘴往復移動。據此,可於腔室的內部將所吐出之液狀樹脂斷液而從被供給物斷離。A resin supply device according to one of the solutions of the present invention is characterized by having: a chamber in which an object to be supplied is placed; and a discharge part having a nozzle for discharging liquid resin toward the object to be supplied, and the nozzle is provided in the chamber. the inside of the chamber; a vacuum part that evacuates the inside of the chamber; a nozzle lifting and lowering driving part that reciprocates the nozzle; and a control part that controls the discharge part, the vacuum part, and the nozzle lifting and lowering driving part from the In a state where the discharge of the liquid resin by the discharge part is stopped and the vacuuming by the vacuum part is stopped, the control part controls the nozzle lift drive part to reciprocate the nozzle. According to this, the discharged liquid resin can be cut off inside the chamber and separated from the object to be supplied.

此處,更佳為:更具備重量計,以供前述被供給物安置的方式設於前述腔室的前述內部,測量所吐出之前述液狀樹脂的重量。據此,可正確地測量液狀樹脂的重量。Here, it is more preferable that the weight meter is further provided in the inside of the chamber so as to accommodate the object to be supplied, and the weight of the discharged liquid resin is measured. Accordingly, the weight of the liquid resin can be accurately measured.

又,更佳為:前述腔室係具備一及另一腔室部、及將前述一腔室部和前述另一腔室部之間密封的密封部,且構成為可開閉,前述吐出部設於前述一腔室部,更具備腔室驅動部,使前述一腔室部對前述另一腔室部進退移動及平行移動。據此,可於任意的吐出位置對被供給物的表面內供給液狀樹脂。Furthermore, more preferably, the chamber is provided with one and another chamber part, and a sealing part for sealing between the one chamber part and the other chamber part, and is configured to be openable and closable, and the discharge part is provided with The one chamber part is further provided with a chamber driving part to move the one chamber part forward, backward and parallel to the other chamber part. According to this, the liquid resin can be supplied to the surface of the object to be supplied at any discharge position.

本發明之其他解決手段涉及之樹脂供給裝置,係在設為真空狀態的腔室內將液狀的樹脂向被供給物供給之樹脂供給裝置,其特徵為具備:構成前述腔室的腔室蓋及腔室本體;密封環,設於前述腔室本體的開口緣將前述腔室蓋與前述腔室本體之間密封;及荷重支承物,沿著前述密封環設於前述腔室本體,在前述腔室蓋與前述腔室本體之間承受荷重。據此,可於既除去空氣的真空狀態中供給樹脂。又,藉由荷重支承物而防止密封環被過度壓扁,確保密封性而可將腔室設為真空狀態。Another solution of the present invention relates to a resin supply device that supplies liquid resin to a target object in a chamber that is in a vacuum state, and is characterized by including: a chamber cover constituting the chamber; The chamber body; a sealing ring, which is provided on the opening edge of the aforementioned chamber body to seal between the aforementioned chamber cover and the aforementioned chamber body; and a load support, which is provided on the aforementioned chamber body along the aforementioned sealing ring, in the aforementioned chamber The load is borne between the chamber cover and the aforementioned chamber body. According to this, the resin can be supplied in a vacuum state in which air is removed. In addition, the load support prevents the sealing ring from being excessively flattened, thereby ensuring sealing performance and allowing the chamber to be placed in a vacuum state.

更佳為:於前述腔室開啟的狀態,在從前述腔室本體朝向前述腔室蓋的高度中,前述密封環高於前述荷重支承物。據此,在關閉腔室之際確保密封性,可將腔室設為真空狀態。More preferably, when the chamber is open, the sealing ring is higher than the load support at a height from the chamber body to the chamber cover. This ensures sealing when closing the chamber and puts the chamber into a vacuum state.

前述樹脂供給裝置中,更佳為:更具備蓋驅動部,在前述腔室關閉的狀態下使前述腔室蓋對前述腔室本體移動者更佳。據此,可於真空狀態中使腔室蓋移動。It is more preferable that the resin supply device further includes a cover driving unit for moving the chamber cover relative to the chamber body when the chamber is closed. Accordingly, the chamber cover can be moved in a vacuum state.

更佳為:前述樹脂供給裝置中,前述荷重支承物係設有複數個滾珠滾輪的構成。據此,於真空狀態可使腔室蓋容易移動。More preferably, in the resin supply device, the load support is provided with a plurality of ball rollers. Accordingly, the chamber cover can be easily moved in a vacuum state.

更佳為:前述樹脂供給裝置中,更具備重量計,設於前述腔室內且安置有前述被供給物者。據此,可即時測量供給至被供給物之樹脂量。More preferably, the resin supply device further includes a weight gauge, is installed in the chamber, and is equipped with the supplied object. Accordingly, the amount of resin supplied to the object can be measured in real time.

更佳為:前述樹脂供給裝置中更具備:安置台,設於前述腔室內且供前述被供給物安置;及使前述安置台旋轉的台驅動部。據此,縮小樹脂供給側(腔室蓋)的移動範圍而能縮小腔室的容量,因而可短時間形成既定壓力的真空狀態,或例如不使用吸引力高的真空泵而可減低製造成本。More preferably, the resin supply device further includes: a placement table provided in the chamber for placement of the supplied object; and a table drive unit for rotating the placement table. Accordingly, the movement range of the resin supply side (chamber cover) is narrowed to reduce the capacity of the chamber. Therefore, a vacuum state of a predetermined pressure can be established in a short time. For example, manufacturing costs can be reduced without using a vacuum pump with a high suction force.

較佳為:前述樹脂供給裝置中更具備重量計,設於前述腔室外且隔著貫通前述腔室本體的銷安置前述被供給物。據此,可在腔室內無設置重量計之下測量供給至被供給物之樹脂量。Preferably, the resin supply device further includes a weight gauge, which is provided outside the chamber and where the object to be supplied is placed via a pin penetrating the chamber body. According to this, the amount of resin supplied to the object to be supplied can be measured without installing a weight meter in the chamber.

本發明的一實施形態涉及之樹脂成形裝置,其特徵為具備:前述樹脂供給裝置;具有模穴且在前述模穴內使前述樹脂熱硬化的模具。據此,可防止未填充等之成形不良。A resin molding apparatus according to one embodiment of the present invention is characterized by including: the resin supply device; and a mold having a mold cavity and thermally hardening the resin in the mold cavity. This can prevent molding defects such as lack of filling.

本發明的其他實施形態涉及之樹脂供給方法,係對具有狹隘部之被供給物供給液狀樹脂,該方法之特徵為包含:(a)向腔室內安置前述被供給物之工序;(b)前述(a)工序之後,對前述腔室內進行減壓之工序;(c)前述(b)工序之後,以施加於前述狹隘部的方式供給前述樹脂之工序;及(d)前述(c)工序之後,對前述腔室內加壓之工序。據此,可向經減壓的狹隘注入被加壓的樹脂。Another embodiment of the present invention relates to a resin supply method for supplying liquid resin to a supplied object having a narrow portion, and the method is characterized by including: (a) a step of placing the supplied object into a chamber; (b) After the above-mentioned step (a), the step of decompressing the inside of the above-mentioned chamber; (c) after the above-mentioned step (b), the step of supplying the above-mentioned resin in such a manner as to be applied to the aforementioned narrow portion; and (d) the above-mentioned step (c) Thereafter, there is a process of pressurizing the chamber. Accordingly, the pressurized resin can be injected into the depressurized constriction.

前述樹脂供給方法中,更佳為:前述(b)工序中,將前述腔室設為真空狀態,前述(d)工序中,使前述腔室開放於大氣中。據此,可朝狹隘部再注入樹脂。In the resin supply method, it is more preferable that in the step (b), the chamber is placed in a vacuum state, and in the step (d), the chamber is opened to the atmosphere. Accordingly, resin can be injected into the narrow part again.

前述樹脂供給方法中,更佳為:將晶片零件是被倒裝接合的載體設為前述被供給物,將前述狹隘部設在前述載體與前述晶片零件之間者更佳。據此,可容易地進行底部填充。In the above-mentioned resin supply method, it is more preferable that a carrier to which the wafer component is flip-chip bonded is used as the supplied object, and the narrow portion is provided between the carrier and the wafer component. According to this, underfilling can be easily performed.

本發明的一解決手段涉及之樹脂安置方法係在成形模具的模穴內加熱加壓並將熱硬化成該模穴的形狀之樹脂安置於被供給物的樹脂安置方法,其特徵為包含:(a)將樹脂供給至被供給物上之工序;(b)前述(a)工序之後,向開啟狀態的腔室安置前述被供給物之工序;(c)前述(b)工序之後,將前述腔室設為關閉狀態,對前述腔室的內部進行減壓之工序;(d)前述(c)工序之後,使前述腔室的內部的壓力上升之工序;(e)前述(d)工序之後,將前述腔室設為開啟狀態,取出前述被供給物之工序。更佳為:前述被供給物係工件。又,更佳為前述被供給物係脫模片。據此,可減低被供給物、即脫模片(release film)或工件與樹脂之間隙,可進行防止未填充等之不良狀況的成形。A resin placement method related to a solution of the present invention is a resin placement method in which heat and pressure are applied in a mold cavity of a forming mold and the resin that is thermally hardened into the shape of the mold cavity is placed on a supplied object, and is characterized by including: ( a) The process of supplying the resin to the object to be supplied; (b) After the aforementioned process (a), the process of placing the aforementioned object to be supplied into the open chamber; (c) After the aforementioned process (b), the process of placing the aforementioned chamber (d) After the above-mentioned step (c), the step of increasing the pressure inside the above-mentioned chamber; (e) After the above-mentioned step (d), The process of opening the chamber and taking out the supplied object. More preferably: the aforementioned supplied object is a workpiece. Moreover, it is more preferable that the said object to be supplied is a release sheet. According to this, the gap between the supplied object, that is, the release film or the workpiece, and the resin can be reduced, and molding can be performed to prevent defects such as lack of filling.

此處,更佳為:前述(a)工序中,在具有凹凸部的被供給物上,以覆蓋前述凹凸部的方式供給樹脂,前述(d)工序中,使前述樹脂順著前述被供給物的前述凹凸部。據此,可防止凹凸部與樹脂之間隙的發生。Here, it is more preferable that in the step (a), the resin is supplied to the object having the uneven portions so as to cover the uneven portions, and in the step (d), the resin is allowed to follow the object. The aforementioned concave and convex parts. This can prevent the occurrence of gaps between the concave and convex portions and the resin.

又,更佳為:前述(c)工序中,一邊加熱前述樹脂一邊對前述腔室的內部進行減壓。據此,能用已軟化的狀態的樹脂覆蓋被供給物。Furthermore, it is more preferable that in the step (c), the pressure inside the chamber is reduced while heating the resin. Accordingly, the object to be supplied can be covered with the resin in a softened state.

又,更佳為:前述(c)工序之後,冷卻前述樹脂。據此,可抑制導致樹脂反應的情況。Furthermore, it is more preferable that after the above-mentioned step (c), the above-mentioned resin is cooled. According to this, conditions causing resin reaction can be suppressed.

又,更佳為:前述(a)工序中,作為前述樹脂是使用薄片樹脂。據此,可形成將樹脂均一地供給的狀態。Furthermore, it is more preferable that in the step (a), a flake resin is used as the resin. Accordingly, the resin can be supplied uniformly.

更佳為:將藉由前述樹脂安置方法而被供給前述樹脂的前述被供給物向成形模具搬入,在前述成形模具的模穴內將前述樹脂加熱加壓使之熱硬化。據此,於成形品的樹脂成形部中,可抑制因空氣混入導致空隙的產生。 [發明效果]More preferably, the object to which the resin is supplied by the resin placing method is carried into a mold, and the resin is heated and pressurized in a cavity of the mold to be thermally cured. Accordingly, the generation of voids due to air mixing in the resin molded portion of the molded article can be suppressed. [Effects of the invention]

簡單地說明本案揭示的發明中之具代表性者所能獲得之效果如下。依據本發明的解決手段,可防止樹脂內含空氣等之不良狀況。The following is a brief explanation of the effects achieved by representative ones of the inventions disclosed in this case. According to the solution of the present invention, undesirable conditions such as air inclusion in the resin can be prevented.

在以下本發明的實施形態中,在必要之情況會分成複數個部分等作說明,但原則上,其等並非彼此無關係,而是一者處於另一者的一部分或全部的變形例、詳細等關係。因此,在所有圖中,對具有同一機能的構件賦予同一符號且省略其重複的說明。又,針對構成要素之數(包含個數、數值、量、範圍等),除了特別明示之情況或原理上清楚限定為特定的數之情況等以外,未局限於特定之數,亦可為特定之數以上或以下。又,在提及構成要素等之形狀時,除了特別明示之情況及原理上很清楚認為不是那樣之情況等以外,設成包含有實質上與其形狀等近似或類似者等。 (實施形態1)In the following embodiments of the present invention, the description will be divided into plural parts when necessary. However, in principle, they are not unrelated to each other, but are modifications and details of one part or all of the other part. etc. relationship. Therefore, in all the drawings, members having the same function are given the same symbols, and repeated descriptions thereof are omitted. In addition, the number of constituent elements (including number, numerical value, quantity, range, etc.) is not limited to a specific number and may be a specific number, except when it is specifically stated or when it is clearly limited to a specific number in principle. above or below the number. When referring to the shape of a component, etc., it is assumed to include those that are substantially similar or similar to the shape, etc., except for cases where it is specifically stated explicitly and cases where it is clearly not the case in principle. (Embodiment 1)

針對本發明實施形態之樹脂供給裝置10,參照圖1至圖8作說明。圖1至圖8係用以說明樹脂供給動作涉及之樹脂供給裝置10之圖。此外,以樹脂供給裝置10處在三維(XYZ)正交座標系者作說明,圖中的上下方向(鉛直方向)與沿著Z軸的方向對應,水平方向成為沿著X軸及Y軸的方向。The resin supply device 10 according to the embodiment of the present invention will be described with reference to FIGS. 1 to 8 . 1 to 8 are diagrams for explaining the resin supply device 10 involved in the resin supply operation. In addition, assuming that the resin supply device 10 is in a three-dimensional (XYZ) orthogonal coordinate system, the up and down direction (vertical direction) in the figure corresponds to the direction along the Z axis, and the horizontal direction becomes along the X axis and the Y axis. direction.

本實施形態中,使用工件W作為被供給液狀樹脂R的被供給物。此工件W係於直徑12吋(約30cm)的圓型的金屬製(SUS等)的載板上貼著具有熱剝離性的黏著薄片(黏著帶),複數個半導體晶片在該黏著薄片上呈行列狀黏著者。液狀樹脂R被供給至這樣的工件W上,進行所稱E-WLP(嵌入式晶圓級封裝;Embedded Wafer Level Package)、eWLB(嵌入式晶圓級球閘陣列;embededd Wafer Lebel BGA)的樹脂成形。又,作為液狀樹脂R,例如使用聚矽氧樹脂或環氧樹脂之類的熱硬化性樹脂。In this embodiment, the workpiece W is used as the object to which the liquid resin R is supplied. This workpiece W is attached to a heat-releasable adhesive sheet (adhesive tape) on a circular metal (SUS, etc.) carrier plate with a diameter of 12 inches (about 30 cm), and a plurality of semiconductor wafers are arranged on the adhesive sheet. Row-like adherents. The liquid resin R is supplied to such a workpiece W, and what is called E-WLP (Embedded Wafer Level Package; Embedded Wafer Level Package) or eWLB (Embedded Wafer Level Ball Gate Array; embedded Wafer Lebel BGA) is performed Resin molding. As the liquid resin R, for example, a thermosetting resin such as silicone resin or epoxy resin is used.

樹脂供給裝置10具備控制部11。此控制部11具備CPU(中央演算處理裝置)及ROM、RAM等之記憶部,藉由CPU讀出被記錄在記憶部的各種控制程式並予以執行,以控制構成樹脂供給裝置10的各部分的動作。此各部分所進行的動作會成為樹脂供給裝置10的動作。The resin supply device 10 includes a control unit 11 . This control unit 11 is equipped with a CPU (central processing unit) and a memory unit such as ROM and RAM. The CPU reads out various control programs recorded in the memory unit and executes them to control the various parts constituting the resin supply device 10 . action. The operations performed by these respective parts become operations of the resin supply device 10 .

又,樹脂供給裝置10具備吐出並供給液狀樹脂R之吐出部20。吐出部20具備:供液狀樹脂R儲存的注射器21;設於注射器21的前端的噴嘴22;及插入注射器21內可按住液狀樹脂R的柱塞23。又,吐出部20係具備例如以掐住由彈性體所構成之管狀的噴嘴22的方式設置且藉由未圖示的驅動機構開閉而進行噴嘴22之開閉的夾管閥(pinch valve) 24。此外,關於噴嘴22,只要可任意切換噴嘴22之開閉(換言之,液狀樹脂可否通過),則亦可不使用如上述般藉由掐住由彈性體所構成的噴嘴22以進行噴嘴22之開閉的夾管閥24。例如亦可作成在噴嘴前端具備閘板的構成或具備開閉閥之構成。Moreover, the resin supply device 10 is provided with the discharge part 20 which discharges and supplies the liquid resin R. The discharge part 20 includes a syringe 21 for storing the liquid resin R; a nozzle 22 provided at the front end of the syringe 21; and a plunger 23 inserted into the syringe 21 to hold the liquid resin R. Furthermore, the discharge part 20 is provided with, for example, a pinch valve (pinch valve) 24 that is provided to pinch a tubular nozzle 22 made of an elastic body and that opens and closes the nozzle 22 by opening and closing a drive mechanism (not shown). In addition, as for the nozzle 22, as long as the opening and closing of the nozzle 22 can be switched arbitrarily (in other words, whether the liquid resin can pass through), it is not necessary to use the method of pinching the nozzle 22 made of an elastic body to open and close the nozzle 22 as described above. Pinch valve 24. For example, a gate plate may be provided at the front end of the nozzle or an on-off valve may be provided.

吐出部20係藉由未圖示的驅動機構將夾管閥24開閉且柱塞23向下移動使注射器21內的液狀樹脂R往擠出方向流動而從噴嘴22吐出液狀樹脂R。另一方面,吐出部20係柱塞23停止向下移動且夾管閥24被關閉而停止從噴嘴22吐出液狀樹脂R。The discharge part 20 opens and closes the pinch valve 24 by a drive mechanism (not shown) and moves the plunger 23 downward so that the liquid resin R in the syringe 21 flows in the extrusion direction, and the liquid resin R is discharged from the nozzle 22 . On the other hand, the discharge unit 20 stops the downward movement of the plunger 23 and closes the pinch valve 24 to stop discharge of the liquid resin R from the nozzle 22 .

又,樹脂供給裝置10具備內部30a供工件W(被供給物)安置的腔室30。腔室30係具備一對的腔室部31、32(一方設為上腔室部31,另一方設為下腔室部32)且構成為可開閉。又,樹脂供給裝置10係具備將上腔室部31和下腔室部32之間密封的密封部33(例如O環)。藉此,當腔室30成為被關閉的狀態時,上腔室部31與下腔室部32成為隔著密封部33接觸的狀態,形成腔室30的內部30a(成為閉鎖狀態)。此外,在腔室30設有將其內部的溫度任意調整的溫度調節部(未圖示)。又,下腔室部32亦可構成為例如裝置框體的工作台部分,亦可作成板狀的構件被固定於裝置框體的構成。Furthermore, the resin supply device 10 is provided with the chamber 30 in which the workpiece W (object to be supplied) is placed inside 30a. The chamber 30 includes a pair of chamber parts 31 and 32 (one is an upper chamber part 31 and the other is a lower chamber part 32), and is configured to be openable and closable. Moreover, the resin supply device 10 is provided with the sealing part 33 (for example, an O ring) which seals between the upper chamber part 31 and the lower chamber part 32. Thereby, when the chamber 30 is in a closed state, the upper chamber part 31 and the lower chamber part 32 are in contact with each other via the sealing part 33, thereby forming the interior 30a of the chamber 30 (in a closed state). In addition, the chamber 30 is provided with a temperature adjustment unit (not shown) for arbitrarily adjusting the temperature inside the chamber 30 . In addition, the lower chamber portion 32 may be configured as, for example, a table portion of the device frame, or may be a plate-shaped member fixed to the device frame.

後面將會述及,從噴嘴22向被安置於腔室30的內部30a(參照圖3)的工件W吐出液狀樹脂R。為此,樹脂供給裝置10中,構成為:在上腔室部31設有吐出部20。具體言之,樹脂供給裝置10中,構成為:於注射器21在腔室30的外部被保持的狀態下,噴嘴22貫通上腔室部31被設置於腔室30的內部30a。於是,樹脂供給裝置10具備吐出保持部34及密封部35、36(例如O環)。吐出保持部34係在使噴嘴22貫通的狀態下將注射器21保持者。又,吐出保持部34係以覆蓋上腔室部31所具有的貫通突起部31a之方式作為貫通突起部31a的開口的蓋部設置。密封部35係將注射器21與吐出保持部34之間密封。密封部36係將上腔室部31的貫通突起部31a與吐出保持部34之間密封。因此,於腔室30關閉所形成的內部30a設有噴嘴22。As will be described later, the liquid resin R is discharged from the nozzle 22 toward the workpiece W placed in the interior 30 a of the chamber 30 (see FIG. 3 ). For this reason, the resin supply device 10 is configured such that the discharge portion 20 is provided in the upper chamber portion 31 . Specifically, the resin supply device 10 is configured such that the nozzle 22 penetrates the upper chamber portion 31 and is installed in the interior 30 a of the chamber 30 while the syringe 21 is held outside the chamber 30 . Therefore, the resin supply device 10 is provided with the discharge holding part 34 and the sealing parts 35 and 36 (for example, an O ring). The discharge holding part 34 holds the syringe 21 with the nozzle 22 passing through it. Moreover, the discharge holding part 34 is provided as a cover part of the opening of the penetration protrusion part 31a so that it may cover the penetration protrusion part 31a of the upper chamber part 31. The sealing portion 35 seals between the syringe 21 and the discharge holding portion 34 . The sealing portion 36 seals between the penetrating protrusion 31 a of the upper chamber portion 31 and the discharge holding portion 34 . Therefore, the nozzle 22 is provided in the interior 30a formed by closing the chamber 30.

又,樹脂供給裝置10具備測量從噴嘴22吐出之液狀樹脂R的重量之重量計40。重量計40係以供工件W安置的方式設於腔室30的內部30a。在此情況,如圖1所示,在下腔室部32可設置從表面32a下凹的下沈部32b。重量計40在下沈部32b以固定的狀態設置。就此重量計40而言,在已安置工件W的狀態下,測量被吐出至工件W之液狀樹脂R的重量。據此,重量計40可穩定測量腔室30的內部30a中被供給至工件W之液狀樹脂R的重量,可正確地測量。此外,重量計40和控制部11電連接,藉由控制部11處理重量計40之測量資料。Moreover, the resin supply device 10 is equipped with the weight meter 40 which measures the weight of the liquid resin R discharged from the nozzle 22. The weight scale 40 is provided in the interior 30a of the chamber 30 for placement of the workpiece W. In this case, as shown in FIG. 1 , the lower chamber portion 32 may be provided with a sunken portion 32 b that is concave from the surface 32 a. The weight scale 40 is installed in a fixed state on the sinking part 32b. This weight gauge 40 measures the weight of the liquid resin R discharged to the workpiece W in a state where the workpiece W is placed. Accordingly, the weight meter 40 can stably measure the weight of the liquid resin R supplied to the workpiece W in the interior 30 a of the chamber 30 , and can measure it accurately. In addition, the weight meter 40 is electrically connected to the control unit 11 , and the control unit 11 processes the measurement data of the weight meter 40 .

又,樹脂供給裝置10具備對腔室30的內部30a抽真空使成為真空狀態(或減壓狀態)的真空部41(例如真空泵)。真空部41在腔室30的內部30a被閉鎖狀態下,經由設於腔室部32的空氣路42對內部30a抽真空而形成真空狀態。因為可在這樣的腔室30內進行樹脂供給,故可防止樹脂內含空氣等之不良狀況。此外,真空部41和控制部11電連接,藉由控制部11控制真空部41。Moreover, the resin supply apparatus 10 is equipped with the vacuum part 41 (for example, a vacuum pump) which evacuates the inside 30a of the chamber 30 into a vacuum state (or a reduced pressure state). The vacuum part 41 evacuates the interior 30a of the chamber 30 via the air path 42 provided in the chamber part 32, while the interior 30a of the chamber 30 is in a closed state, thereby forming a vacuum state. Since resin can be supplied in such a chamber 30, problems such as air inclusion in the resin can be prevented. In addition, the vacuum part 41 and the control part 11 are electrically connected, and the vacuum part 41 is controlled by the control part 11.

又,樹脂供給裝置10具備進行腔室30之開閉的腔室驅動部50。腔室驅動部50係藉由使上腔室部31對下腔室部32在沿著Z軸的方向進退移動(接近、離開),進行腔室30之開閉。腔室驅動部50具備保持部51、第1軌道52、第1滑件53及第1馬達54。Moreover, the resin supply device 10 is provided with the chamber drive part 50 which opens and closes the chamber 30. The chamber driving part 50 opens and closes the chamber 30 by moving the upper chamber part 31 forward and backward (approaching, away from) the lower chamber part 32 in the direction along the Z axis. The chamber driving part 50 includes a holding part 51, a first rail 52, a first slider 53, and a first motor 54.

腔室驅動部50中,保持部51構成為柱狀且以在下腔室部32的表面32a上立起的方式設置。在此保持部51設有在上下方向(順著Z軸的方向、鉛直方向)延伸的第1軌道52。以可在此第1軌道52上滑動的方式設置第1滑件53。此第1滑件53係藉第1馬達54之驅動而在第1軌道52上滑動。而且,本實施形態中,在第1滑件53設有上腔室部31且構成為藉由第1滑件53在上下方向滑動,使上腔室部31對下腔室部32進退移動(上下移動)。此外,第1馬達54和控制部11電連接,藉由控制部11控制腔室驅動部50。此外,在以下的說明中,除了腔室驅動部50以外,要針對將複數個驅動部以同樣的構成所形成的例作說明,但此等不僅是如圖示那樣的構成,是可作成具備使用了連桿構造的關節型機器人(articulated robot)等任意的移動構造之構成者。In the chamber driving part 50 , the holding part 51 is configured in a columnar shape and is provided so as to stand on the surface 32 a of the lower chamber part 32 . Here, the holding portion 51 is provided with a first rail 52 extending in the up-and-down direction (direction along the Z-axis, vertical direction). The first slider 53 is provided to be slidable on the first rail 52 . The first slider 53 is driven by the first motor 54 to slide on the first track 52 . Furthermore, in this embodiment, the upper chamber part 31 is provided on the first slider 53, and the upper chamber part 31 moves forward and backward with respect to the lower chamber part 32 by the first slider 53 sliding in the up and down direction ( move up and down). In addition, the first motor 54 is electrically connected to the control unit 11 , and the chamber driving unit 50 is controlled by the control unit 11 . In addition, in the following description, an example in which a plurality of drive units are formed with the same structure except for the chamber drive unit 50 will be described. However, these are not only structures as shown in the figures, but may also be provided with The constructor of any moving structure such as an articulated robot using a link structure.

又,樹脂供給裝置10具備使噴嘴22往復移動之噴嘴升降驅動部70。噴嘴升降驅動部70係在腔室30的內部30a使吐出部20的噴嘴22於升降方向往復移動。噴嘴升降驅動部70具備第2軌道72、第2滑件73及第2馬達74。Furthermore, the resin supply device 10 is provided with a nozzle lifting and lowering drive unit 70 that reciprocates the nozzle 22 . The nozzle lifting and lowering drive unit 70 reciprocates the nozzle 22 of the discharge unit 20 in the lifting and lowering direction in the interior 30 a of the chamber 30 . The nozzle lifting and lowering drive unit 70 includes a second rail 72 , a second slider 73 , and a second motor 74 .

噴嘴升降驅動部70中,第2軌道72是在上下方向延伸,連同上腔室部31一起設於腔室驅動部50的第1滑件53。亦即,相對於第1滑件53,第2軌道72及上腔室部31係一起被保持。以可在此第2軌道72上滑動的方式設置第2滑件73。此第2滑件73藉第2馬達74之驅動而在第2軌道72上滑動。在此第2滑件73設有吐出保持部34。本實施形態中,藉由第2滑件73在上下方向滑動,透過吐出保持部34使吐出部20的噴嘴22往復移動(升降)。後面將會述及,藉由使吐出液狀樹脂R的噴嘴22往復移動,可將液狀樹脂R斷液。此外,第2馬達74和控制部11電連接,藉由控制部11控制噴嘴升降驅動部70。In the nozzle lifting and lowering driving unit 70 , the second rail 72 extends in the vertical direction and is provided to the first slider 53 of the chamber driving unit 50 together with the upper chamber portion 31 . That is, the second rail 72 and the upper chamber portion 31 are held together with the first slider 53 . The second slider 73 is provided to be slidable on the second rail 72 . The second slider 73 is driven by the second motor 74 to slide on the second rail 72 . Here, the second slider 73 is provided with a discharge holding portion 34 . In this embodiment, the second slider 73 slides in the up-down direction, and the nozzle 22 of the discharge part 20 is reciprocated (raised and lowered) through the discharge holding part 34 . As will be described later, the liquid resin R can be cut off by reciprocating the nozzle 22 that discharges the liquid resin R. In addition, the second motor 74 is electrically connected to the control unit 11, and the control unit 11 controls the nozzle lifting and lowering driving unit 70.

此處,所謂液狀樹脂R的斷液,係指將液狀樹脂R從噴嘴22往下方吐出向工件W供給時,於黏度高的液狀樹脂R因其自重未從噴嘴22斷離下成為被拖長的狀態(拉伸(drawing)狀態)的情況,從噴嘴22斷離的情況。以下的實施形態中,假設藉由使結束吐出液狀樹脂R的噴嘴22升降並將與工件W之距離反覆伸縮而從噴嘴22斷離的方法。惟斷液的手法不受此所局限,亦可為從噴嘴22的前端物理性地割除那樣的手法。Here, the liquid resin R is cut off. It means that when the liquid resin R is discharged downward from the nozzle 22 and supplied to the workpiece W, the liquid resin R with high viscosity is not separated from the nozzle 22 due to its own weight. In the case of being in an elongated state (drawing state), or in the case of being disconnected from the nozzle 22 . In the following embodiment, a method is assumed in which the nozzle 22 that has finished discharging the liquid resin R is raised and lowered and the distance from the workpiece W is repeatedly expanded and contracted to be disconnected from the nozzle 22 . However, the method of cutting off the liquid is not limited to this, and it may also be a method of physically cutting off the tip of the nozzle 22 .

又,樹脂供給裝置10的吐出部20具備使柱塞23往復移動的吐出驅動部80。吐出驅動部80具備第3軌道82、第3滑件83及第3馬達84。Moreover, the discharge part 20 of the resin supply device 10 is equipped with the discharge drive part 80 which reciprocates the plunger 23. The discharge driving part 80 includes a third rail 82, a third slider 83, and a third motor 84.

吐出驅動部80中,第3軌道82在上下方向延伸,設於第2滑件73。以可在此第3軌道82上滑動的方式設置第3滑件83。此第3滑件83藉第3馬達84之驅動而在第3軌道82上滑動。在此第3滑件83設有柱塞23,藉由第3滑件83在上下方向滑動而使柱塞23往復移動。本實施形態中,注射器21內插入有柱塞23,藉由柱塞23推壓注射器21內所儲存的液狀樹脂R而從設於注射器21的前端的噴嘴22吐出液狀樹脂R。此外,第3馬達84和控制部11電連接,藉由控制部11控制吐出部20的吐出驅動部80。In the discharge driving part 80, the third rail 82 extends in the up-and-down direction and is provided on the second slider 73. The third slider 83 is provided to be slidable on the third rail 82 . The third slider 83 is driven by the third motor 84 to slide on the third rail 82 . Here, the third slider 83 is provided with the plunger 23, and the plunger 23 reciprocates when the third slider 83 slides in the up and down direction. In this embodiment, the plunger 23 is inserted into the syringe 21 , and the liquid resin R is discharged from the nozzle 22 provided at the front end of the syringe 21 by pushing the liquid resin R stored in the syringe 21 . In addition, the third motor 84 is electrically connected to the control unit 11 , and the control unit 11 controls the discharge drive unit 80 of the discharge unit 20 .

樹脂供給裝置10中,於停止來自吐出部20的液狀樹脂R的吐出且停止利用真空部41抽真空的狀態下,藉由控制部11控制噴嘴升降驅動部70,俾在腔室30的內部30a使噴嘴22往復移動。據此,於腔室30的內部30a中,可將被吐出的液狀樹脂R斷液並從工件W斷離。藉由在被閉鎖的空間內(內部30a)進行斷液,可防止灰塵等之捲入等。In the resin supply device 10 , in a state where the discharge of the liquid resin R from the discharge part 20 is stopped and the vacuuming by the vacuum part 41 is stopped, the control part 11 controls the nozzle lifting and lowering driving part 70 so that the nozzle lifting and lowering driving part 70 is controlled inside the chamber 30 30a causes the nozzle 22 to reciprocate. Accordingly, the discharged liquid resin R can be disconnected from the workpiece W in the interior 30 a of the chamber 30 . By cutting off the fluid in the locked space (inside 30a), it is possible to prevent dust and the like from being drawn in.

其次,針對本發明實施形態之樹脂供給裝置10的動作方法、亦即樹脂供給方法作說明。Next, the operation method of the resin supply device 10 according to the embodiment of the present invention, that is, the resin supply method will be described.

圖1所示的樹脂供給裝置10係工件W被供給前的狀態。此處,腔室30係開啟。又,注射器21的噴嘴22藉夾管閥24而被關閉,柱塞23在上方待機。如此在腔室30開啟的狀態下,藉由搬送裝置(例如裝載機)搬送工件W,如圖2所示,工件W被供給至樹脂供給裝置10。本實施形態中,在重量計40安置有工件W。The resin supply device 10 shown in FIG. 1 is in a state before the workpiece W is supplied. Here, chamber 30 is open. Furthermore, the nozzle 22 of the syringe 21 is closed by the pinch valve 24, and the plunger 23 waits upward. In this way, with the chamber 30 open, the workpiece W is transported by a transport device (for example, a loader), and as shown in FIG. 2 , the workpiece W is supplied to the resin supply device 10 . In this embodiment, the workpiece W is mounted on the weight scale 40 .

接著,如圖3所示,以成為閉鎖狀態的方式形成腔室30的內部30a,對腔室30的內部30a開始抽真空。此處係藉由控制部11控制真空部41及腔室驅動部50。具體言之,依腔室驅動部50的第1馬達54之驅動,設置有上腔室部31的第1滑件53在第1軌道52上逐漸下降,上腔室部31與下腔室部32成為隔著密封部33接觸的狀態。藉此,形成既成為閉鎖狀態的腔室30的內部30a。然後,藉由真空部41的驅動,將安置有工件W的腔室30的內部30a設為真空狀態。此外,以在設定此真空狀態之動作前或並行地使腔室30的內部的溫度成為既定的值之方式控制溫度調節部者較佳。在此情況,因為不是裝置整體而是僅將腔室30設為既定的溫度即可,故可快速地進行溫度調整。Next, as shown in FIG. 3 , the interior 30 a of the chamber 30 is formed to be in a closed state, and vacuuming of the interior 30 a of the chamber 30 is started. Here, the vacuum part 41 and the chamber driving part 50 are controlled by the control part 11. Specifically, according to the driving of the first motor 54 of the chamber driving part 50, the first slider 53 provided with the upper chamber part 31 gradually descends on the first rail 52, and the upper chamber part 31 and the lower chamber part 32 are in contact with each other via the sealing portion 33 . This forms the interior 30a of the chamber 30 in a closed state. Then, by driving the vacuum part 41, the interior 30a of the chamber 30 in which the workpiece W is placed is brought into a vacuum state. In addition, it is preferable to control the temperature adjustment unit so that the temperature inside the chamber 30 becomes a predetermined value before or in parallel with the operation of setting the vacuum state. In this case, it is sufficient to set only the chamber 30 to a predetermined temperature, not the entire device, so the temperature can be adjusted quickly.

接著,如圖4所示,在真空狀態的腔室30的內部30a從噴嘴22朝工件W吐出液狀樹脂R。此處係藉由控制部11控制吐出部20(吐出驅動部80)及真空部41。具體言之,藉由真空部41之驅動將腔室30的內部30a繼續設為真空狀態。然後,藉由吐出部20的第3馬達84之驅動,設置有柱塞23的第3滑件83在第3軌道82上逐漸下降。在此情況,柱塞23推壓注射器21內的液狀樹脂R,藉由利用未圖示的驅動機構將夾管閥24開放而從噴嘴22吐出液狀樹脂R。Next, as shown in FIG. 4 , the liquid resin R is discharged toward the workpiece W from the nozzle 22 in the interior 30 a of the vacuum chamber 30 . Here, the discharge part 20 (discharge drive part 80) and the vacuum part 41 are controlled by the control part 11. Specifically, the interior 30 a of the chamber 30 is continuously brought into a vacuum state by driving the vacuum part 41 . Then, the third slider 83 provided with the plunger 23 gradually descends on the third rail 82 by driving the third motor 84 of the discharge part 20 . In this case, the plunger 23 presses the liquid resin R in the syringe 21, and the pinch valve 24 is opened by a driving mechanism not shown, so that the liquid resin R is discharged from the nozzle 22.

此際,以設於腔室30的內部30a的重量計40一邊測量液狀樹脂R的重量一邊吐出液狀樹脂R。控制部11係處理重量計40的測量資料,例如在液狀樹脂R的重量達到既定值之情況,可停止液狀樹脂R的吐出。又,如上述般若藉由溫度調節部使腔室30的內部30a成為既定的溫度,則可正確地進行液狀樹脂R之吐出或重量之測量,可更適切地供給液狀樹脂R。At this time, the liquid resin R is discharged while measuring the weight of the liquid resin R with the weight meter 40 installed in the interior 30 a of the chamber 30 . The control unit 11 processes the measurement data of the weight meter 40 and can stop the discharge of the liquid resin R, for example, when the weight of the liquid resin R reaches a predetermined value. In addition, if the inside 30a of the chamber 30 is brought to a predetermined temperature by the temperature regulator as described above, the liquid resin R can be accurately discharged or the weight can be measured, and the liquid resin R can be supplied more appropriately.

接著,在停止液狀樹脂R的吐出,停止腔室30的內部30a的抽真空後,如圖5及圖6所示,在腔室30的內部30a使噴嘴22往復移動。此處係藉由控制部11控制吐出部20,真空部41及噴嘴升降驅動部70。具體言之,藉由停止吐出部20的第3馬達84而停止柱塞23向下移動並使夾管閥24被關閉而停止從噴嘴22吐出液狀樹脂R。接著,因停止利用真空部41抽真空而解除腔室30的內部30a之真空狀態。藉此,例如於被供給至工件W上的液狀樹脂R之下方,在有無法填充液狀樹脂R的空間之情況(換言之在發生含有空氣的情況),成為能以周圍環境氣體的壓力對其間隙填充液狀樹脂R。Next, after the discharge of the liquid resin R is stopped and the vacuuming of the interior 30a of the chamber 30 is stopped, the nozzle 22 is reciprocated in the interior 30a of the chamber 30 as shown in FIGS. 5 and 6 . Here, the control unit 11 controls the discharge unit 20, the vacuum unit 41, and the nozzle lifting and lowering driving unit 70. Specifically, by stopping the third motor 84 of the discharge unit 20 , the downward movement of the plunger 23 is stopped, the pinch valve 24 is closed, and the discharge of the liquid resin R from the nozzle 22 is stopped. Next, since the vacuuming by the vacuum part 41 is stopped, the vacuum state of the interior 30a of the chamber 30 is released. Thereby, for example, when there is a space below the liquid resin R supplied to the workpiece W that cannot be filled with the liquid resin R (in other words, when air is contained), the pressure of the surrounding ambient gas can be used to control the space. The gap is filled with liquid resin R.

接著,藉由噴嘴升降驅動部70的第2馬達74之驅動使吐出部20的噴嘴22向上移動(參照圖5)。接著,藉由噴嘴升降驅動部70的第2馬達74之驅動使吐出部20的噴嘴22向下移動(參照圖6)。然後,進行使吐出部20的噴嘴22反覆既定次數的往復移動(升降)之斷液動作。雖解除腔室30的內部30a的真空狀態,但能一邊維持腔室30的閉塞狀態一邊使吐出保持部34升降。Next, the nozzle 22 of the discharge part 20 is moved upward by driving the second motor 74 of the nozzle lifting and lowering driving part 70 (see FIG. 5 ). Next, the nozzle 22 of the discharge part 20 is moved downward by driving the second motor 74 of the nozzle lifting and lowering driving part 70 (see FIG. 6 ). Then, a liquid shutoff operation is performed in which the nozzle 22 of the discharge unit 20 repeats the reciprocating movement (lifting and lowering) a predetermined number of times. Although the vacuum state of the interior 30a of the chamber 30 is released, the discharge holding part 34 can be raised and lowered while maintaining the closed state of the chamber 30.

本實施形態中,噴嘴22的往復動作係在關閉腔室30而在維持已形成內部30a的狀態(閉鎖狀態)下進行。在不移動上腔室部31下藉由將上腔室部31的貫通突起部31a用作為引導部使吐出保持部34往復移動,一邊維持閉鎖的空間一邊使由吐出保持部34所保持的噴嘴22往復移動。如此,在閉塞的內部30a進行液狀樹脂R的斷液。對此,例如藉由連同上腔室部31使之升降,亦可使噴嘴22升降進行斷液動作。但是,在欲進行這樣的動作時,用於升降的構成構件變大。又,可想像在藉由上腔室部31上下移動使工件W周圍環境氣體流動,而在周圍存在有粉塵時可能導致附著於液狀樹脂R。從這樣的理由,如本實施形態所示以作成在上腔室部31與吐出保持部34之間設置密封部36且使具有噴嘴22的注射器21升降的構成者較佳。如此,可解消含有空氣並防止粉塵之附著。圖7所示的樹脂供給裝置10係液狀樹脂R已被斷液的狀態。In this embodiment, the reciprocating operation of the nozzle 22 is performed while closing the chamber 30 and maintaining the state in which the interior 30a is formed (locked state). The discharge holding part 34 is reciprocally moved without moving the upper chamber part 31 by using the penetration protrusion 31a of the upper chamber part 31 as a guide part, so that the nozzle held by the discharge holding part 34 can be moved while maintaining a closed space. 22 reciprocating movement. In this way, the liquid resin R is cut off in the closed interior 30a. In this regard, for example, by raising and lowering the upper chamber portion 31, the nozzle 22 can also be raised and lowered to perform a liquid shutoff operation. However, when such an operation is to be performed, the components for lifting and lowering become larger. Furthermore, it is conceivable that when the upper chamber portion 31 moves up and down, the ambient gas around the workpiece W flows, and if dust exists in the surroundings, it may adhere to the liquid resin R. For such reasons, it is preferable to provide a sealing portion 36 between the upper chamber portion 31 and the discharge holding portion 34 and to move the syringe 21 having the nozzle 22 up and down as shown in this embodiment. In this way, the air contained can be eliminated and the adhesion of dust can be prevented. The resin supply device 10 shown in FIG. 7 is in a state where the liquid resin R has been cut off.

接著,利用控制部11控制腔室驅動部50,如圖8所示,開啟腔室30,使已被供給液狀樹脂R的工件W開放於大氣中。此處,亦藉由從液狀樹脂R的周圍施加大氣壓以促進液狀樹脂R在工件W上的填充。例如在晶片構件藉由倒裝接合被搭載於作為工件W的基板或晶圓上時,可對將晶片與基板等連接的多數個凸塊間填充液狀樹脂R。又,在不進行倒裝接合的情況亦是,可想像在工件W中的由搭載於基板等之上的晶片的側面與基板等之平面所構成的角部分的空間,可能產生液狀樹脂R未充分地遍布(未被填充的)部分。亦可考慮藉由以包含那樣的部分(空間)的方式供給液狀樹脂R以成為含有空氣的狀態。然而,藉由從在真空狀態(減壓環境氣體下)所供給的液狀樹脂R的周圍施加大氣壓,可將這樣的含有空氣(無液狀樹脂R的區域)徹底消滅。Next, the control unit 11 controls the chamber drive unit 50 to open the chamber 30 as shown in FIG. 8 so that the workpiece W to which the liquid resin R has been supplied is exposed to the atmosphere. Here, filling of the workpiece W with the liquid resin R is also accelerated by applying atmospheric pressure from around the liquid resin R. For example, when a chip component is mounted on a substrate or a wafer as a workpiece W by flip-chip bonding, the liquid resin R can be filled between a plurality of bumps connecting the chip and the substrate. Furthermore, even when flip-chip bonding is not performed, it is conceivable that the liquid resin R may be generated in the space at the corner of the workpiece W formed by the side surface of the wafer mounted on the substrate or the like and the plane of the substrate or the like. Inadequately spread (unfilled) parts. It is also conceivable to supply the liquid resin R so as to include such a portion (space) so as to be in a state containing air. However, such air-containing (area without liquid resin R) can be completely eliminated by applying atmospheric pressure from around the liquid resin R supplied in a vacuum state (under reduced pressure ambient gas).

具體言之,藉由利用腔室驅動部50的第1馬達54的驅動,使設有上腔室部31的第1滑件53在第1軌道52上逐漸上升,上腔室部31與下腔室部32分離而成為腔室30開啟的狀態。之後,藉由搬送裝置(例如裝載機)取出已被供給液狀樹脂R的工件W並搬送。Specifically, by driving the first motor 54 of the chamber driving part 50, the first slider 53 provided with the upper chamber part 31 is gradually raised on the first rail 52, and the upper chamber part 31 and the lower chamber part 31 are moved upward. The chamber portion 32 is separated and the chamber 30 is in an open state. Thereafter, the workpiece W to which the liquid resin R has been supplied is taken out and transported by a transport device (for example, a loader).

接著,例如於模製裝置內設置本實施形態中的樹脂供給裝置10與未圖示的模製模具,此模製模具中被供給至工件W上的液狀樹脂R在減壓環境氣體下被加熱加壓而被樹脂封止成既定的形狀。據此,能進行可防止因含有空氣所致空隙或未填充之高品質的樹脂封止。在此情況,因為如上述一邊防止含有空氣等之不良狀況一邊將液狀樹脂R供給至工件W,故可進行防止未填充的樹脂封止。此外,本實施形態中,針對作為被供給物是適用工件W的情況作了說明,但亦可有別於工件W而將供給至模製模具的脫模片當作被供給物而供給液狀樹脂R。 (實施形態2)Next, for example, the resin supply device 10 in this embodiment and a molding die (not shown) are installed in a molding device, and the liquid resin R supplied to the workpiece W in the molding die is ejected under a reduced pressure atmosphere. It is heated and pressurized to be sealed by resin into a predetermined shape. This enables high-quality resin sealing that prevents voids or unfilled spaces due to air inclusion. In this case, since the liquid resin R is supplied to the workpiece W while preventing problems such as inclusion of air as described above, unfilled resin sealing can be prevented. In addition, in this embodiment, the case where the workpiece W is applied as the object to be supplied has been described. However, unlike the workpiece W, the release sheet supplied to the molding die may be used as the object to be supplied and supplied in a liquid form. Resin R. (Embodiment 2)

針對本發明實施形態2的樹脂供給裝置10A,參照圖9至圖17作說明。圖9至圖15係用以說明樹脂供給動作涉及之樹脂供給裝置10A之圖。圖16及圖17係分別為被供給液狀樹脂的被供給物、即工件W的俯視圖及側視圖。本實施形態中,與前述實施形態1涉及之腔室驅動部50的構成相異,故以下以這點為中心作說明。The resin supply device 10A according to Embodiment 2 of the present invention will be described with reference to FIGS. 9 to 17 . 9 to 15 are diagrams for explaining the resin supply device 10A involved in the resin supply operation. 16 and 17 are respectively a top view and a side view of the workpiece W to which the liquid resin is supplied. This embodiment is different from the structure of the chamber driving unit 50 according to the first embodiment, so the following description will focus on this point.

本實施形態涉及之樹脂供給裝置10A,係具備在平面方向的任意位置構成腔室30並進行開閉的腔室驅動部50A。亦即,腔室驅動部50A係構成為使含有注射器21(噴嘴22)的上腔室部31可在圖9中的X方向或Y方向移動。又,腔室驅動部50A係藉由使上腔室部31對下腔室部32進退移動,進行腔室30的開閉。藉由這樣的構造,在構成腔室30的狀態(例如減壓的狀態)下,構成為使注射器21的噴嘴22部分對於工件W可在XY方向的任意位置移動。The resin supply device 10A according to this embodiment is provided with a chamber drive unit 50A that configures the chamber 30 at any position in the plane direction and opens and closes the chamber. That is, the chamber driving part 50A is configured to move the upper chamber part 31 including the syringe 21 (nozzle 22) in the X direction or the Y direction in FIG. 9 . Moreover, the chamber driving part 50A opens and closes the chamber 30 by moving the upper chamber part 31 forward and backward with respect to the lower chamber part 32. With such a structure, in the state in which the chamber 30 is configured (for example, in a reduced pressure state), the nozzle 22 portion of the syringe 21 can move to any position in the XY direction with respect to the workpiece W.

具體言之,腔室驅動部50A具備保持部51、第1軌道52、第1滑件53、第1馬達54、上座部60、第4軌道61、第4滑件62、第4馬達63、第5軌道64、第5滑件65及第5馬達66。又,腔室驅動部50A中,上座部60是以不移動的方式被固定於裝置框體。在此上座部60的下面設有在順著Y軸的方向延伸的第4軌道61。以可在此第4軌道61上滑動的方式設置第4滑件62。此第4滑件62係藉第4馬達63之驅動而在第4軌道61上滑動。又,在第4滑件62設有在順著X軸的方向延伸的第5軌道64。以可在此第5軌道64上滑動的方式設置第5滑件65。此第5滑件65係藉第5馬達66之驅動而在第5軌道64上滑動。而且,在此第5滑件65,保持部51以懸掛的方式設置。Specifically, the chamber driving part 50A includes the holding part 51, the first rail 52, the first slider 53, the first motor 54, the upper seat part 60, the fourth rail 61, the fourth slider 62, the fourth motor 63, The fifth rail 64 , the fifth slider 65 and the fifth motor 66 . In addition, in the chamber driving unit 50A, the upper seat 60 is fixed to the device frame so as not to move. A fourth rail 61 extending in the Y-axis direction is provided on the lower surface of the upper seat 60 . The fourth slider 62 is provided to be slidable on the fourth rail 61 . The fourth slider 62 is driven by the fourth motor 63 to slide on the fourth track 61 . Furthermore, the fourth slider 62 is provided with a fifth rail 64 extending in the direction of the X-axis. The fifth slider 65 is provided to be slidable on the fifth rail 64 . The fifth slider 65 is driven by the fifth motor 66 to slide on the fifth track 64 . Furthermore, in the fifth slider 65, the holding portion 51 is provided in a suspended manner.

在此保持部51設有在順著Z軸的方向延伸的第1軌道52,以藉由第1馬達54而可在此第1軌道52上滑動的方式設置第1滑件53。而且,在第1滑件53上設有上腔室部31。因此,上腔室部31係藉由腔室驅動部50A而可在沿著3軸(XYZ)的方向上移動。亦即,腔室驅動部50A可使上腔室部31對下腔室部32進退移動(朝沿著Z軸的方向移動)及平行移動(朝沿著X軸及Y軸的方向移動)。為此,樹脂供給裝置10A中,可藉由腔室驅動部50A維持關閉腔室30的狀態使上腔室部31平行移動。The holding part 51 is provided with a first rail 52 extending in the direction of the Z-axis, and the first slider 53 is provided so as to be slidable on the first rail 52 by the first motor 54 . Furthermore, the first slider 53 is provided with an upper chamber portion 31 . Therefore, the upper chamber part 31 is movable in the directions along the three axes (XYZ) by the chamber driving part 50A. That is, the chamber drive unit 50A can move the upper chamber part 31 forward and backward (move in the direction along the Z axis) and move parallelly (move in the direction along the X axis and the Y axis) relative to the lower chamber part 32 . For this reason, in the resin supply device 10A, the upper chamber portion 31 can be moved in parallel by the chamber driving portion 50A while maintaining the closed state of the chamber 30 .

而且,如前述實施形態1所說明在上腔室部31設置有吐出部20。為此,樹脂供給裝置10A中,在維持關閉腔室30的狀態,可使吐出部20一邊平行移動一邊從噴嘴22吐出液狀樹脂R。據此,不僅是前述的實施形態中的效果,還可於任意的吐出位置對工件W的表面內供給液狀樹脂R(參照圖16及圖17)。Furthermore, as described in the first embodiment, the discharge portion 20 is provided in the upper chamber portion 31 . For this reason, in the resin supply device 10A, the liquid resin R can be discharged from the nozzle 22 while moving the discharge part 20 in parallel while maintaining the closed state of the chamber 30 . According to this, in addition to the effects of the above-described embodiment, the liquid resin R can be supplied to the surface of the workpiece W at an arbitrary discharge position (see FIGS. 16 and 17 ).

其次,針對本發明實施形態之樹脂供給裝置10A的動作方法,亦即,樹脂供給方法作說明。Next, the operation method of the resin supply device 10A according to the embodiment of the present invention, that is, the resin supply method will be described.

圖9所示的樹脂供給裝置10係在腔室30開啟的狀態下工件W被供給後的狀態。此處,注射器21的噴嘴22係藉由夾管閥24而被關閉,柱塞23在上方待機。又,在重量計40安置有工件W。The resin supply device 10 shown in FIG. 9 is in a state in which the workpiece W is supplied with the chamber 30 open. Here, the nozzle 22 of the syringe 21 is closed by the pinch valve 24, and the plunger 23 waits above. In addition, the workpiece W is placed on the weight scale 40 .

接著,如圖10所示,以成為閉鎖狀態的方式形成腔室30的內部30a,對腔室30的內部30a開始抽真空。此處係藉由控制部11控制真空部41及腔室驅動部50A。具體言之,依腔室驅動部50A的第1馬達54的驅動,設置有上腔室部31的第1滑件53在第1軌道52上逐漸下降,上腔室部31與下腔室部32成為隔著密封部33接觸的狀態。藉此,形成既成為閉鎖狀態的腔室30的內部30a。然後,藉由真空部41的驅動,將被安置有工件W的腔室30的內部30a設為真空狀態。Next, as shown in FIG. 10 , the interior 30 a of the chamber 30 is formed to be in a closed state, and vacuuming of the interior 30 a of the chamber 30 is started. Here, the vacuum part 41 and the chamber driving part 50A are controlled by the control part 11. Specifically, according to the driving of the first motor 54 of the chamber driving part 50A, the first slider 53 provided with the upper chamber part 31 gradually descends on the first rail 52, and the upper chamber part 31 and the lower chamber part 32 are in contact with each other via the sealing portion 33 . This forms the interior 30a of the chamber 30 in a closed state. Then, by driving the vacuum part 41, the inside 30a of the chamber 30 in which the workpiece W is placed is brought into a vacuum state.

接著,如圖11所示,以噴嘴22會成為在相對於工件W的表面之既定位置(吐出開始位置)之方式使上腔室部31對下腔室部32平行移動。此處係藉由控制部11控制真空部41及腔室驅動部50A。具體言之,藉由真空部41之驅動將腔室30的內部30a繼續設為真空狀態。然後,第4滑件62或第5滑件65至少一方因腔室驅動部50A的第4馬達63或第5馬達66至少一方驅動而滑動,使得上腔室部31對下腔室部32平行移動。藉此,噴嘴22可對工件W的表面平行移動到既定位置。Next, as shown in FIG. 11 , the upper chamber part 31 is moved in parallel with the lower chamber part 32 so that the nozzle 22 is at a predetermined position (discharge start position) with respect to the surface of the workpiece W. Here, the vacuum part 41 and the chamber driving part 50A are controlled by the control part 11. Specifically, the interior 30 a of the chamber 30 is continuously brought into a vacuum state by driving the vacuum part 41 . Then, at least one of the fourth slider 62 or the fifth slider 65 is driven by at least one of the fourth motor 63 or the fifth motor 66 of the chamber driving part 50A to slide, so that the upper chamber part 31 is parallel to the lower chamber part 32 Move. Thereby, the nozzle 22 can move parallel to the surface of the workpiece W to a predetermined position.

接著,在腔室30關閉的狀態下使噴嘴22平行於工件W一邊移動一邊吐出液狀樹脂R。此處係藉由控制部11控制吐出部20(吐出驅動部80)、真空部41及腔室驅動部50A。對工件W吐出(供給)液狀樹脂R係可對工件W的表面整體進行,但本實施形態中,如圖16及圖17所示,係對工件W的表面中央部(最大供給區域90)進行。例如如圖16所示,能以旋渦狀或複數同心圓狀供給液狀樹脂R。樹脂供給裝置10A中,因為是使構成腔室30的內部30a的上腔室部31連同噴嘴22一起移動的構成,故可藉由對工件W的表面中央部供給液狀樹脂R而防止腔室尺寸的大型化。又,藉由防止腔室尺寸的大型化,可縮短抽真空的時間。又,藉由以旋渦狀或複數個同心圓狀供給液狀樹脂R,可達成減低所供給之液狀樹脂R的高度。Next, while the chamber 30 is closed, the nozzle 22 is moved parallel to the workpiece W and discharges the liquid resin R. Here, the control unit 11 controls the discharge unit 20 (the discharge drive unit 80), the vacuum unit 41, and the chamber drive unit 50A. The liquid resin R can be discharged (supplied) to the workpiece W over the entire surface of the workpiece W. However, in this embodiment, as shown in FIGS. 16 and 17 , the liquid resin R is discharged (supplied) to the center portion of the surface of the workpiece W (maximum supply area 90 ). conduct. For example, as shown in FIG. 16 , the liquid resin R can be supplied in a spiral shape or a plurality of concentric circles. In the resin supply device 10A, since the upper chamber portion 31 constituting the interior 30a of the chamber 30 is moved together with the nozzle 22, the liquid resin R can be supplied to the central portion of the surface of the workpiece W to prevent the chamber from being blocked. Enlargement of size. Furthermore, by preventing the chamber from being enlarged, the vacuuming time can be shortened. Furthermore, by supplying the liquid resin R in a spiral shape or a plurality of concentric circles, the height of the supplied liquid resin R can be reduced.

具體言之,藉由真空部41之驅動將腔室30的內部30a繼續設為真空狀態。接著,如圖12所示,藉由吐出部20的第3馬達84之驅動使柱塞23下降,將注射器21內的液狀樹脂R從噴嘴22吐出。接著,如圖13所示,藉由腔室驅動部50A使上腔室部31一邊對下腔室部32平行移動一邊使液狀樹脂R從噴嘴22吐出。最終,如圖14所示,藉由使噴嘴22平行移動到工件W的中心且吐出液狀樹脂R,可將液狀樹脂R以旋渦狀供給至工件W。此際,以設於腔室30的內部30a的重量計40一邊測量液狀樹脂R的重量一邊吐出液狀樹脂R。Specifically, the interior 30 a of the chamber 30 is continuously brought into a vacuum state by driving the vacuum part 41 . Next, as shown in FIG. 12 , the plunger 23 is lowered by driving the third motor 84 of the discharge part 20 , and the liquid resin R in the syringe 21 is discharged from the nozzle 22 . Next, as shown in FIG. 13 , the liquid resin R is ejected from the nozzle 22 while the upper chamber part 31 is moved parallel to the lower chamber part 32 by the chamber driving part 50A. Finally, as shown in FIG. 14 , by moving the nozzle 22 in parallel to the center of the workpiece W and discharging the liquid resin R, the liquid resin R can be supplied to the workpiece W in a spiral shape. At this time, the liquid resin R is discharged while measuring the weight of the liquid resin R with the weight meter 40 installed in the interior 30 a of the chamber 30 .

當然,亦可對工件W全面以旋渦狀等方式供給液狀樹脂R且使工件W上的樹脂的供給量均一化。在此情況,可將上述圖所示那樣的有底筒狀的上腔室部31形成平板狀,將平板狀的下腔室部32形成有底筒狀。在藉由這樣的構造所構成的腔室中,不但可得到與上述構成同樣的效果,亦可加大噴嘴22的移動區域,因為腔室尺寸沒有變大,故而更佳。Of course, the liquid resin R may be supplied over the entire workpiece W in a spiral shape or the like, and the supply amount of the resin on the workpiece W may be made uniform. In this case, the bottomed cylindrical upper chamber part 31 as shown in the above figure may be formed into a flat plate shape, and the flat plate shaped lower chamber part 32 may be formed into a bottomed cylindrical shape. In a chamber constructed with such a structure, not only the same effects as the above-mentioned structure can be obtained, but also the moving area of the nozzle 22 can be enlarged, which is preferable since the chamber size does not become larger.

此外,針對供給至工件W上之液狀樹脂R的形狀,除了上述般的旋渦狀或同心圓狀以外,還可供給任意的形狀。例如在工件W上可供給多點狀或格子狀,再者排列複數條線的形狀,或者放射線狀之類的任意的形狀。In addition, the shape of the liquid resin R supplied to the workpiece W can be provided in any shape other than the above-mentioned spiral shape or concentric circular shape. For example, the workpiece W can be provided with a multi-point shape, a grid shape, a shape in which a plurality of lines are arranged, or any shape such as a radial shape.

又,亦可具備攝像在工件W上被供給之液狀樹脂R的攝像裝置。在此情況,例如於上腔室部31設置利用具有透光性的材質所構成之攝像用的窗部,利用攝像部(相機)或照明部攝像被供給至工件W上的液狀樹脂R之形狀,以作成可進行確認供給狀態者較佳。Furthermore, an imaging device for imaging the liquid resin R supplied on the workpiece W may be provided. In this case, for example, an imaging window made of a translucent material is provided in the upper chamber 31, and the liquid resin R supplied to the workpiece W is imaged using an imaging unit (camera) or an illumination unit. The shape is preferably such that the supply status can be confirmed.

接著,如前述實施形態參照圖5及圖6所說明,在停止液狀樹脂R的吐出,停止腔室30的內部30a的抽真空後,在腔室30的內部30a使噴嘴22往復移動。藉此,能在內部30a進行液狀樹脂R的斷液。藉由在被閉鎖的空間內(內部30a)進行斷液,可防止灰塵等之捲入等。Next, as described in the aforementioned embodiment with reference to FIGS. 5 and 6 , after stopping the discharge of the liquid resin R and stopping the vacuuming of the interior 30 a of the chamber 30 , the nozzle 22 is reciprocated in the interior 30 a of the chamber 30 . Thereby, the liquid resin R can be cut off in the interior 30a. By cutting off the fluid in the locked space (inside 30a), it is possible to prevent dust and the like from being drawn in.

接著,如圖15所示,開啟腔室30,使被供給液狀樹脂R的工件W開放於大氣中。此處係藉由控制部11控制腔室驅動部50A。具體言之,依腔室驅動部50A的第1馬達54的驅動,設置有上腔室部31的第1滑件53在第1軌道52上逐漸上升,上腔室部31與下腔室部32分離而成為腔室30開啟的狀態。之後,藉由搬送裝置(例如裝載機)取出已被供給液狀樹脂R的工件W並搬送。 (實施形態3)Next, as shown in FIG. 15 , the chamber 30 is opened, and the workpiece W to which the liquid resin R is supplied is exposed to the atmosphere. Here, the control unit 11 controls the chamber driving unit 50A. Specifically, according to the driving of the first motor 54 of the chamber driving part 50A, the first slider 53 provided with the upper chamber part 31 gradually rises on the first rail 52, and the upper chamber part 31 and the lower chamber part 32 is separated and the chamber 30 is opened. Thereafter, the workpiece W to which the liquid resin R has been supplied is taken out and transported by a transport device (for example, a loader). (Embodiment 3)

針對本發明實施形態之樹脂供給裝置110(writing dispenser),主要參照圖19至圖21作說明。圖19至圖21係用以說明樹脂供給動作涉及之樹脂供給裝置110之圖。此樹脂供給裝置110係具備供給部120(吐出部)及腔室130,在設為真空狀態的腔室130內將來自供給部120的液狀的樹脂R向工件W(被供給物)供給(塗布)者。本實施形態中,以樹脂供給裝置110是處在三維(XYZ)正交座標系者作說明,圖19等所示的上下方向(鉛直方向)對應於和Z軸平行的方向,橫方向(水平方向)成為與X軸及Y軸平行的方向。The resin supply device 110 (writing dispenser) according to the embodiment of the present invention will be mainly described with reference to FIGS. 19 to 21 . 19 to 21 are diagrams for explaining the resin supply device 110 involved in the resin supply operation. This resin supply device 110 is provided with a supply part 120 (discharge part) and a chamber 130, and supplies the liquid resin R from the supply part 120 to the workpiece W (the object to be supplied) in the chamber 130 which is in a vacuum state ( coating). In this embodiment, it is assumed that the resin supply device 110 is in a three-dimensional (XYZ) orthogonal coordinate system. The up-and-down direction (vertical direction) shown in FIG. 19 and others corresponds to the direction parallel to the Z-axis, and the lateral direction (horizontal direction) direction) becomes a direction parallel to the X-axis and Y-axis.

本實施形態中,作為工件W,例如適用複數個晶片零件200(例如半導體晶片)是被倒裝接合(凸塊連接)成行列狀的圓板形狀的載體201(例如半導體晶圓)。為此,工件W具有狹隘部202(晶片零件200與載體201之間)。又,本實施形態中,作為樹脂R,例如適用聚矽氧樹脂或環氧樹脂之類的液狀(包含熔融的狀態)的熱硬化性樹脂。對既被供給這樣的樹脂R的工件W,使用成形模具191(參照圖27),例如進行所稱eWLB(晶圓級球閘陣列封裝;Embedded Wafer Level Ballgrid-Array Package)的成形工序之樹脂成形。In this embodiment, as the workpiece W, for example, a disc-shaped carrier 201 (for example, a semiconductor wafer) in which a plurality of wafer components 200 (for example, semiconductor wafers) are flip-chip bonded (bump-connected) in a matrix is used. To this end, the workpiece W has a narrow portion 202 (between the wafer part 200 and the carrier 201). In addition, in this embodiment, as the resin R, a liquid (including a molten state) thermosetting resin such as a silicone resin or an epoxy resin is suitable. The workpiece W to which such resin R is supplied is subjected to resin molding in a molding process called eWLB (Embedded Wafer Level Ballgrid-Array Package) using the molding die 191 (see FIG. 27 ). .

樹脂供給裝置110在構成供給部120時係具備:供液狀樹脂R儲存的注射器121;設於注射器121的前端,吐出樹脂R的噴嘴122(管嘴);及被插入注射器121內,按住樹脂R的柱塞123。注射器121收納於注射器外殼125(筒座(cartridge holder))。藉此,可容易地交換注射器121。又,柱塞123係藉由驅動部180(Z軸驅動機構)而可在Z軸方向上下移動(往復移動)。藉此,可使被柱塞123按住的樹脂R從噴嘴122吐出。又,注射器外殼125係藉由驅動部170(Z軸驅動機構)而可在Z軸方向上下移動(往復移動)。藉此,噴嘴122可隔著注射器外殼125、注射器121在Z軸方向移動,可完成後述的斷液。此外,作為驅動部170、180,可使用具備藉由馬達而在軌道上移動的滑件或使用連桿構造的關節型機器人等任意之移動構造。The resin supply device 110 constitutes the supply unit 120 and includes: a syringe 121 for storing the liquid resin R; a nozzle 122 (nozzle) provided at the front end of the syringe 121 for discharging the resin R; and a nozzle 122 inserted into the syringe 121 and pressed. Plunger 123 of resin R. The syringe 121 is housed in a syringe housing 125 (cartridge holder). Thereby, the syringe 121 can be easily exchanged. Moreover, the plunger 123 is movable up and down (reciprocating movement) in the Z-axis direction by the driving part 180 (Z-axis driving mechanism). Thereby, the resin R held down by the plunger 123 can be ejected from the nozzle 122 . In addition, the syringe housing 125 is movable up and down (reciprocating movement) in the Z-axis direction by the drive unit 170 (Z-axis drive mechanism). Thereby, the nozzle 122 can move in the Z-axis direction via the syringe housing 125 and the syringe 121, and can complete the liquid shutoff described later. In addition, as the driving parts 170 and 180, any moving structure such as a slider that moves on a track by a motor or an articulated robot using a link structure can be used.

又,樹脂供給裝置110係具備:例如以掐住由彈性體所構成的噴嘴122(管嘴)之方式設置而進行噴嘴122之開閉的夾管閥124;進行此夾管閥124之驅動的閥驅動部126(例如以氣缸驅動)。夾管閥124設於閥驅動部126,閥驅動部126設於注射器外殼125。樹脂供給裝置110中,在夾管閥124開啟的狀態下,藉由柱塞123向下移動使注射器121內的樹脂R往擠出方向流動,使樹脂R從噴嘴122被吐出。另一方面,當柱塞123的向下移動停止時夾管閥124關閉而停止從噴嘴122吐出樹脂R。Furthermore, the resin supply device 110 is provided with: a pinch valve 124 that is provided to pinch a nozzle 122 (nozzle) made of an elastic body to open and close the nozzle 122; and a valve that drives the pinch valve 124. The driving part 126 (for example driven by a cylinder). The pinch valve 124 is provided in the valve driving part 126 , and the valve driving part 126 is provided in the syringe housing 125 . In the resin supply device 110 , when the pinch valve 124 is open, the plunger 123 moves downward to cause the resin R in the syringe 121 to flow in the extrusion direction, so that the resin R is discharged from the nozzle 122 . On the other hand, when the downward movement of the plunger 123 stops, the pinch valve 124 closes and the discharge of the resin R from the nozzle 122 stops.

於吐出停止之後,藉由進行液狀的樹脂R的斷液,可防止樹脂R從噴嘴122懸垂。所謂液狀樹脂R的斷液,係指將液狀樹脂R從噴嘴122往下方吐出向工件W供給,樹脂R因其自重未從噴嘴122斷離下成為被拖長的狀態(拉伸(drawing)狀態)的情況,從噴嘴122斷離的情況。本實施形態中,假設藉由使結束吐出樹脂R的噴嘴122上下移動並反覆伸縮與工件W之距離而從噴嘴122斷離的方法。藉由在腔室130關閉的狀態下進行斷液,可防止灰塵等之捲入等。此外,斷液的手法不受此所局限,亦可為從噴嘴122的前端實際地割除那樣的手法或經由與噴嘴122連通且分岐的路徑導入空氣而斷離的手法。After the discharge is stopped, the liquid resin R is cut off to prevent the resin R from hanging from the nozzle 122 . The cutting of the liquid resin R means that the liquid resin R is discharged downward from the nozzle 122 and supplied to the workpiece W. The resin R is in a stretched state (drawing) due to its own weight without being separated from the nozzle 122. ) state), disconnected from the nozzle 122. In this embodiment, a method is assumed in which the nozzle 122 that has finished discharging the resin R moves up and down and repeatedly expands and contracts the distance from the workpiece W to disconnect from the nozzle 122 . By cutting off the fluid while the chamber 130 is closed, it is possible to prevent dust and the like from being drawn in. In addition, the method of cutting off the liquid is not limited to this, and may be a method of actually cutting off the tip of the nozzle 122 or a method of introducing air through a branched path connected to the nozzle 122 to cut off the liquid.

又,樹脂供給裝置110係具備具有一對的腔室部131、132(一方設為腔室蓋131,另一方設為腔室本體132)之腔室130(例如由鋼材所構成)。樹脂供給裝置110中,從設於腔室蓋131側的噴嘴122對安置於腔室130內的工件W吐出並供給液狀的樹脂R。又,樹脂供給裝置110亦可藉由具備溫度調節部(例如加熱器或冷卻器)而事先調節腔室130的內部溫度,亦可調節所供給的樹脂R之溫度。Moreover, the resin supply device 110 is provided with the chamber 130 (for example, made of steel) which has a pair of chamber parts 131 and 132 (one is a chamber cover 131, and the other is a chamber body 132). In the resin supply device 110, the liquid resin R is ejected and supplied to the workpiece W placed in the chamber 130 from the nozzle 122 provided on the chamber cover 131 side. In addition, the resin supply device 110 may be equipped with a temperature adjustment unit (for example, a heater or a cooler) to adjust the internal temperature of the chamber 130 in advance, and may also adjust the temperature of the supplied resin R.

腔室蓋131藉由蓋驅動部150(XYZ軸驅動機構)可在XYZ軸方向往復移動。作為蓋驅動部150,可使用前述的一軸(Z軸)用的驅動部170、180與三軸(XYZ軸)的每一者對應者。藉此,藉由使腔室蓋131對腔室本體132在沿著Z軸的方向(鉛直方向)上下移動(接近、離開),可開閉腔室130。又,後面將會述及,藉由蓋驅動部150可在腔室130關閉的狀態使腔室蓋131對腔室本體132移動(水平移動)。據此,即便腔室130在真空狀態亦可使腔室蓋131及設於其上的噴嘴122移動。亦即,可在真空狀態下於任意的吐出位置對工件W的面內供給樹脂R。The chamber cover 131 can reciprocate in the XYZ axis direction by the cover driving part 150 (XYZ axis driving mechanism). As the cover driving part 150, one corresponding to each of the driving parts 170 and 180 for one axis (Z axis) mentioned above and the three axes (XYZ axis) can be used. Thereby, the chamber 130 can be opened and closed by moving the chamber cover 131 up and down (approaching, away from) the chamber body 132 in the direction along the Z axis (vertical direction). In addition, as will be described later, the chamber cover 131 can be moved (horizontally moved) relative to the chamber body 132 when the chamber 130 is closed by the cover driving unit 150 . Accordingly, even if the chamber 130 is in a vacuum state, the chamber cover 131 and the nozzle 122 provided thereon can be moved. That is, the resin R can be supplied into the surface of the workpiece W at any discharge position in a vacuum state.

又,樹脂供給裝置110係具備設於腔室本體132(例如構成有底筒狀體的容器)的開口緣132a(例如俯視圖呈圓形狀,俯視圖呈矩形狀,或,俯視圖呈多角形狀)且將腔室蓋131與腔室本體132之間密封的密封環133(例如O環)。藉此,腔室蓋131與腔室本體132成為隔著密封環133接觸的狀態,成為腔室130被關閉的狀態(內部被密閉的狀態)。此外,亦可為了密封環133的高度調節而在密封環133下設置調節構件(例如板或薄片)。In addition, the resin supply device 110 is provided with an opening edge 132a (for example, a circular shape in a plan view, a rectangular shape in a plan view, or a polygonal shape in a plan view) provided in the chamber body 132 (for example, a container constituting a bottomed cylindrical body), and has an opening edge 132a. A sealing ring 133 (such as an O-ring) is used to seal between the chamber cover 131 and the chamber body 132 . Thereby, the chamber cover 131 and the chamber body 132 are in contact with each other via the sealing ring 133, and the chamber 130 is in a closed state (the inside is sealed). In addition, an adjustment member (for example, a plate or a sheet) may be provided under the sealing ring 133 for height adjustment of the sealing ring 133 .

樹脂供給裝置110係在設為真空狀態的腔室130內從噴嘴122向工件W將液狀的樹脂R吐出並供給予工件W。為此,樹脂供給裝置110中,噴嘴122構成為設置在腔室130內。具體言之,樹脂供給裝置110具備保持部134(凹部)及密封環136(O環)。保持部134係以於腔室蓋131的中央部收容噴嘴122的方式從腔室蓋131的面131a(位在腔室本體132側的面131a)凹設,將貫通腔室蓋131的注射器外殼125予以保持。又,密封環136係將注射器外殼125與保持部134(腔室蓋131)之間密封。藉此,即便在腔室130被關閉的狀態中藉由驅動部170使注射器外殼125上下移動,亦可將腔室130內設為密閉狀態。The resin supply device 110 discharges the liquid resin R toward the workpiece W from the nozzle 122 in the chamber 130 which is in a vacuum state, and supplies the liquid resin R to the workpiece W. For this reason, in the resin supply device 110, the nozzle 122 is provided in the chamber 130. Specifically, the resin supply device 110 includes a holding portion 134 (recessed portion) and a seal ring 136 (O-ring). The holding part 134 is recessed from the surface 131a of the chamber cover 131 (the surface 131a on the side of the chamber body 132) to accommodate the nozzle 122 in the center of the chamber cover 131, and holds the syringe shell penetrating through the chamber cover 131. 125 is maintained. Moreover, the sealing ring 136 seals between the syringe housing 125 and the holding part 134 (chamber cover 131). Thereby, even if the syringe housing 125 is moved up and down by the driving unit 170 while the chamber 130 is closed, the inside of the chamber 130 can be brought into a sealed state.

此處,針對腔室蓋131和腔室本體132的大小作說明。為了將腔室130設為關閉的狀態,腔室本體132的開口(開口緣132a的內側)是被腔室蓋131堵塞(覆蓋)。亦即,俯視圖中(上視圖中)中,腔室蓋131的大小比腔室本體132的開口還大。具體言之,成為可一邊維持腔室130被關閉的狀態一邊使腔室蓋131對腔室本體132水平移動那樣的腔室蓋131之大小。換言之,成為可於Y軸方向及X軸方向,一邊維持真空一邊使噴嘴122在涵蓋工件W的一端到另一端的範圍移動那樣的腔室蓋131之大小。為此,如圖21所示,當噴嘴122的位置到達被安置於腔室本體132內的工件W的最外周時,腔室蓋131在Y軸方向及X軸方向大大地露出。Here, the sizes of the chamber cover 131 and the chamber body 132 will be described. In order to keep the chamber 130 in a closed state, the opening of the chamber body 132 (inside the opening edge 132 a ) is blocked (covered) by the chamber cover 131 . That is, in a plan view (top view), the size of the chamber cover 131 is larger than the opening of the chamber body 132 . Specifically, the chamber cover 131 is sized such that the chamber cover 131 can move horizontally with respect to the chamber body 132 while maintaining the closed state of the chamber 130 . In other words, the chamber cover 131 has a size that allows the nozzle 122 to move in a range covering the workpiece W from one end to the other end while maintaining a vacuum in the Y-axis direction and the X-axis direction. For this reason, as shown in FIG. 21 , when the position of the nozzle 122 reaches the outermost periphery of the workpiece W placed in the chamber body 132 , the chamber cover 131 is greatly exposed in the Y-axis direction and the X-axis direction.

又,樹脂供給裝置110係具備:調節腔室130的內部壓力之壓力調節部141;通往腔室130內且與壓力調節部141連通的路徑142(例如貫通腔室本體132的底部的孔)。樹脂供給裝置110中,關閉的狀態(密閉狀態)的腔室130內例如藉由具備真空泵的壓力調節部141被排出空氣而成為真空狀態(減壓狀態)。如此,因為可作成空氣被排出的真空狀態的腔室130,故可防止在向工件W供給樹脂R時所導致樹脂R內含空氣之不良狀況。Furthermore, the resin supply device 110 is provided with: a pressure regulating part 141 that regulates the internal pressure of the chamber 130; and a path 142 (for example, a hole penetrating the bottom of the chamber body 132) that leads into the chamber 130 and communicates with the pressure regulating part 141. . In the resin supply device 110, air is exhausted from the closed state (sealed state) of the chamber 130 by, for example, the pressure regulator 141 provided with a vacuum pump, and becomes a vacuum state (reduced pressure state). In this way, since the chamber 130 in a vacuum state in which the air is discharged can be formed, a defective situation in which air is contained in the resin R when the resin R is supplied to the workpiece W can be prevented.

又,樹脂供給裝置110係具備在腔室蓋131與腔室本體132之間支承荷重的荷重支承物137(例如由鋼材所構成)。此荷重支承物137係藉由沿著圓形的密封環133設置在腔室本體132而防止密封環133過度的壓扁。作為荷重支承物137,例如可作成沿著圓形的密封環133在腔室本體132設置複數個的構成。在此情況,藉由複數個荷重支承物137一邊支持施加於腔室蓋131的大氣壓一邊使腔室蓋131位在腔室本體132上的任意的高度。藉此,防止密封環133過度的壓扁,防止因腔室蓋131與腔室本體132之接觸所致的摩擦,可確保密封性而將腔室130設為真空狀態。又,因為是藉由複數個荷重支承物137將腔室蓋131作多點支承,所以可使荷重分散。又,因為複數個荷重支承物137被設於密封環133的外側,亦即在腔室130內沒有複數個荷重支承物137,所以腔室130內的空氣變得容易除去。又,在腔室130開啟的狀態中,在從腔室本體132朝向腔室蓋131的高度中,密封環133高於荷重支承物137。換言之,在腔室130開啟的狀態下,密封環133配置在比荷重支承物137還靠近腔室蓋131的位置。據此,在腔室130關閉的狀態中,可作成將腔室蓋131確實地接觸於密封環133的狀態,可確保密封性將腔室130設為真空狀態。Furthermore, the resin supply device 110 is provided with a load support 137 (for example, made of steel) that supports a load between the chamber cover 131 and the chamber body 132 . The load support 137 is arranged on the chamber body 132 along the circular sealing ring 133 to prevent the sealing ring 133 from being excessively crushed. As the load support 137 , for example, a plurality of load supports 137 may be provided on the chamber body 132 along the circular seal ring 133 . In this case, the chamber cover 131 is positioned at an arbitrary height on the chamber body 132 while supporting the atmospheric pressure applied to the chamber cover 131 by the plurality of load supports 137 . This prevents the sealing ring 133 from being excessively flattened, prevents friction caused by the contact between the chamber cover 131 and the chamber body 132, ensures sealing performance, and sets the chamber 130 in a vacuum state. In addition, since the chamber cover 131 is supported at multiple points by a plurality of load supports 137, the load can be distributed. In addition, since the plurality of load supports 137 are provided outside the sealing ring 133, that is, there are no plurality of load supports 137 in the chamber 130, the air in the chamber 130 becomes easy to remove. In addition, when the chamber 130 is open, the sealing ring 133 is higher than the load support 137 at a height from the chamber body 132 toward the chamber cover 131 . In other words, when the chamber 130 is open, the sealing ring 133 is disposed closer to the chamber cover 131 than the load support 137 . Accordingly, when the chamber 130 is closed, the chamber cover 131 can be brought into a state of being reliably contacted with the sealing ring 133, and the chamber 130 can be placed in a vacuum state while ensuring sealing performance.

樹脂供給裝置110中,構成為在腔室130關閉的狀態(腔室構造被保持的狀態)下,腔室蓋131相對於腔室本體132(注射器121相對於工件W)在水平方向移動。具體言之,使用滾珠滾輪作為荷重支承物137。滾珠滾輪係具備例如自由旋轉球體及將此自由旋轉球體以一部分突出的狀態(以此與腔室蓋131接觸)下予以旋轉保持的球體支承物(就座)所構成。據此,於藉由將腔室130內設成真空狀態使大氣壓施加於腔室蓋131的狀態中,藉由作成在點動體的滾珠滾輪中之滾轉方式的荷重支承物構造,與例如滑動方式中的荷重支承物構造相較下,係可極為順暢地使腔室蓋131在水平方向移動。The resin supply device 110 is configured such that the chamber cover 131 moves in the horizontal direction relative to the chamber body 132 (the syringe 121 relative to the workpiece W) when the chamber 130 is closed (the chamber structure is maintained). Specifically, ball rollers are used as load supports 137 . The ball roller system is composed of, for example, a freely rotating sphere and a sphere support (seat) that rotates and holds the freely rotating sphere in a partially protruded state (thereby contacting the chamber cover 131 ). Accordingly, in a state where atmospheric pressure is applied to the chamber cover 131 by placing the inside of the chamber 130 in a vacuum state, the load support structure is configured to rotate in the ball roller of the inching body, and for example Compared with the load support structure in the sliding method, the chamber cover 131 can be moved in the horizontal direction extremely smoothly.

特別在因工件W是大尺寸而腔室本體132亦需要大型化時,由於藉由大氣壓而施加於腔室蓋131的力變大,所以施加於荷重支承物137的力也會變大。為此,藉由設置與施加於荷重支承物137的力對應之個數的荷重支承物137,將施加於各個荷重支承物137的力分散化並縮小,可使腔室蓋131順暢地移動。此外,作為荷重支承物137,不僅是因應於施加到腔室蓋131之像滾珠滾輪柱那樣的滾轉荷重支承物,也可使用滑動荷重支承物。此外,為確保密封環133與荷重支承物137對於腔室蓋131的易滑動性,亦可在此等之間事先塗布潤滑劑。Especially when the size of the workpiece W is large and the chamber body 132 also needs to be enlarged, the force exerted on the chamber cover 131 by the atmospheric pressure becomes larger, so the force exerted on the load support 137 also becomes larger. Therefore, by providing a number of load supports 137 corresponding to the force applied to the load supports 137, the force applied to each load support 137 is dispersed and reduced, so that the chamber cover 131 can be moved smoothly. In addition, as the load support 137, not only a rolling load support such as a ball roller column applied to the chamber cover 131, but also a sliding load support may be used. In addition, in order to ensure easy sliding of the sealing ring 133 and the load support 137 with respect to the chamber cover 131, lubricant may also be applied in advance between them.

又,樹脂供給裝置110具備設於腔室130內的重量計140。樹脂供給裝置110中,於重量計140安置有工件W,重量計140係測量工件W的重量。此重量計140中,在工件W被安置的狀態下,測量向工件W吐出的樹脂R之重量。據此,可即時測量於真空狀態的腔室130內向工件W吐出並供給的樹脂R。Moreover, the resin supply device 110 is equipped with the weight gauge 140 provided in the chamber 130. In the resin supply device 110, a workpiece W is placed on a weight gauge 140, and the weight gauge 140 measures the weight of the workpiece W. In this weight meter 140, the weight of the resin R discharged to the workpiece W is measured with the workpiece W being placed. Accordingly, the resin R discharged and supplied to the workpiece W in the chamber 130 in a vacuum state can be measured in real time.

又,樹脂供給裝置110係具備:貫通腔室本體132的底部地設置且藉由驅動部144(參照圖25)而在Z軸方向上下移動(往復移動)的銷143;將此銷143與腔室本體132之間密封的密封環145(參照圖25)。此銷143被使用在對搬送裝置遞交工件W。從搬送裝置承接工件W時,銷143係向上移動使前端從腔室本體132突出(參照圖19)。在從銷143朝重量計140安置工件W時,銷143係向下移動而朝腔室本體132的底部側退避(參照圖20)。In addition, the resin supply device 110 is provided with: a pin 143 provided through the bottom of the chamber body 132 and moved up and down (reciprocating movement) in the Z-axis direction by the driving part 144 (see FIG. 25 ); and the pin 143 is connected to the chamber. The sealing ring 145 seals between the chamber bodies 132 (refer to Figure 25). This pin 143 is used to deliver the workpiece W to the conveying device. When receiving the workpiece W from the conveyor, the pin 143 moves upward so that the front end protrudes from the chamber body 132 (see FIG. 19 ). When the workpiece W is placed from the pin 143 toward the weight scale 140, the pin 143 moves downward and retreats toward the bottom side of the chamber body 132 (see FIG. 20).

其次,針對樹脂供給裝置110的動作方法(樹脂供給方法)作說明。樹脂供給裝置110係具備具有CPU(中央演算處理裝置)及ROM、RAM等之記憶部之控制部(未圖示)。藉由CPU讀出被記錄在記憶部的各種控制程式並予以執行,以控制構成樹脂供給裝置110的各部分(機構)的動作。各部分所進行的動作會成為樹脂供給裝置110的動作。此外,在樹脂供給裝置110被組裝於樹脂成形裝置的情況,亦可作成藉由樹脂成形裝置的控制部控制樹脂供給裝置110的構成。Next, the operation method of the resin supply device 110 (resin supply method) will be described. The resin supply device 110 is provided with a control unit (not shown) including a CPU (Central Processing Unit) and a memory unit such as ROM and RAM. The CPU reads out various control programs recorded in the memory unit and executes them to control the operations of each part (mechanism) constituting the resin supply device 110 . The operations performed by each part become operations of the resin supply device 110 . In addition, when the resin supply device 110 is incorporated in a resin molding device, the resin supply device 110 may be controlled by a control unit of the resin molding device.

圖19所示的樹脂供給裝置110係工件W被供給至腔室130前之狀態。此處,腔室130開啟,又注射器121的噴嘴122是藉由夾管閥124而被關閉,柱塞123在上方待機。如此在腔室130開啟的狀態下,例如將藉由搬送裝置或作業人員所搬送的工件W安置於腔室130。本實施形態中,搬送裝置將工件W遞交給銷143,藉由接收到工件W的銷143向下移動而使工件W被安置於重量計140(參照圖20)。The resin supply device 110 shown in FIG. 19 is in a state before the workpiece W is supplied to the chamber 130. Here, the chamber 130 is open, the nozzle 122 of the syringe 121 is closed by the pinch valve 124, and the plunger 123 is waiting above. In this way, when the chamber 130 is opened, the workpiece W transported by, for example, a transport device or an operator is placed in the chamber 130 . In this embodiment, the transfer device delivers the workpiece W to the pin 143, and the pin 143 that receives the workpiece W moves downward, so that the workpiece W is placed on the weight scale 140 (see FIG. 20).

接著,如圖20所示,以關閉腔室130的狀態,將其內部的空氣排出以設為真空狀態。具體言之,首先,藉由蓋驅動部150使腔室蓋131逐漸向下移動,腔室蓋131一邊將密封環133壓扁一邊與荷重支承物137接觸而設成關閉腔室130的狀態。接著,藉由壓力調節部141將腔室130內逐漸減壓,作成既定壓的真空狀態。此處,藉由以荷重支承物137支持腔室蓋131,可防止密封環133被過度壓扁。此外,藉由以在設定此真空狀態的動作前或並行地使腔室130的內部溫度成為既定的值之方式控制溫度調節部(未圖示),可抑制熱對於所供給之樹脂R的影響。Next, as shown in FIG. 20 , with the chamber 130 closed, the air inside the chamber 130 is exhausted to establish a vacuum state. Specifically, first, the chamber cover 131 is gradually moved downward by the cover driving part 150, and the chamber cover 131 contacts the load support 137 while flattening the sealing ring 133, thereby closing the chamber 130. Next, the pressure in the chamber 130 is gradually reduced by the pressure regulator 141 to achieve a vacuum state of a predetermined pressure. Here, by supporting the chamber cover 131 with the load support 137, the sealing ring 133 can be prevented from being excessively crushed. In addition, by controlling the temperature adjustment unit (not shown) so that the internal temperature of the chamber 130 reaches a predetermined value before or in parallel with the operation of setting the vacuum state, the influence of heat on the supplied resin R can be suppressed. .

接著,在設為真空狀態的腔室130內開始朝工件W供給樹脂R。具體言之,藉由壓力調節部141將腔室130繼續設為真空狀態。然後,藉閥驅動部126使夾管閥124驅動以開啟噴嘴122,藉驅動部180使柱塞123向下移動並由噴嘴122吐出樹脂R,形成可朝工件W供給樹脂R。此時,成為以重量計140即時一邊測量工件W的重量、即樹脂R的重量一邊供給樹脂R。Next, supply of the resin R to the workpiece W starts in the chamber 130 which is in a vacuum state. Specifically, the pressure regulator 141 keeps the chamber 130 in a vacuum state. Then, the pinch valve 124 is driven by the valve driving part 126 to open the nozzle 122, and the plunger 123 is moved downward by the driving part 180 to discharge the resin R from the nozzle 122, so that the resin R can be supplied to the workpiece W. At this time, the resin R is supplied while measuring the weight of the workpiece W, that is, the weight of the resin R, in real time using the weight meter 140 .

接著,如圖21所示,以噴嘴122與工件W的既定位置對向之方式使噴嘴122一邊移動一邊從噴嘴122吐出樹脂R。具體言之,藉由壓力調節部141將腔室130繼續設為真空狀態。然後,藉由蓋驅動部150使腔室蓋131水平移動且使設於腔室蓋131的噴嘴122一邊移動,一邊藉由驅動部180使柱塞123進一步向下移動而使樹脂R從噴嘴122吐出。此際,以即便噴嘴122到達工件W的最外周,還是會藉由密封環133維持密閉狀態(真空狀態)的方式使噴嘴122的移動範圍小於密封環133的內徑。此處,以施加於工件W的狹隘部202(晶片零件200與載體201之間)的方式逐漸供給(塗布)樹脂R。Next, as shown in FIG. 21 , the resin R is ejected from the nozzle 122 while moving so that the nozzle 122 faces a predetermined position of the workpiece W. Specifically, the pressure regulator 141 keeps the chamber 130 in a vacuum state. Then, the chamber cover 131 is moved horizontally by the cover driving unit 150 and the nozzle 122 provided on the chamber cover 131 is moved, and the plunger 123 is further moved downward by the driving unit 180 to cause the resin R to flow from the nozzle 122 spit out. At this time, even if the nozzle 122 reaches the outermost periphery of the workpiece W, the moving range of the nozzle 122 is smaller than the inner diameter of the seal ring 133 so that the sealed state (vacuum state) is maintained by the seal ring 133 . Here, the resin R is gradually supplied (coated) so as to be applied to the narrow portion 202 of the workpiece W (between the wafer component 200 and the carrier 201 ).

如此,能以成為既定的塗布式樣的方式向工件W的表面供給(塗布)樹脂R。作為塗布式樣,如圖22所示,例如可在工件W的表面整體作成旋渦狀或格子狀。此處,圖22係用以說明朝圓板形狀的工件W塗布樹脂R的塗布式樣之圖,圖22A係顯示旋渦,圖22B係顯示格子的狀態。在供給既定量的樹脂R時,藉由使設置有噴嘴122的腔室蓋131一邊移動一邊向工件W的表面整體供給樹脂R,與例如僅向工件W的表面中央供給樹脂R的方式相較下,在使用成形模具191(參照圖27)於模穴(cavity)C內壓縮樹脂R之際,能將樹脂R流動的距離(熱施加的時間)作成相同程度,可防止含有空氣。In this way, the resin R can be supplied (coated) to the surface of the workpiece W in a predetermined coating pattern. As a coating pattern, as shown in FIG. 22 , for example, the entire surface of the workpiece W can be formed into a spiral shape or a grid shape. Here, FIG. 22 is a diagram illustrating a coating pattern of applying resin R to a disk-shaped workpiece W. FIG. 22A shows a vortex, and FIG. 22B shows a grid state. When supplying a predetermined amount of resin R, the chamber cover 131 provided with the nozzle 122 is moved while supplying the resin R to the entire surface of the workpiece W. This is compared with the method of supplying the resin R only to the center of the surface of the workpiece W, for example. When the resin R is compressed in the cavity C using the molding die 191 (see FIG. 27 ), the flow distance (heat application time) of the resin R can be made the same, thereby preventing the inclusion of air.

又,亦可作成將晶片零件200的側面以樹脂R覆蓋那樣的圖22B所示的塗布式樣,亦可不論晶片零件200的側面是否用樹脂R覆蓋下,以格子狀等對晶片零件200的全面供給樹脂R。此處,在設為將晶片零件200的側面以樹脂R覆蓋那樣的圖22B所示的塗布式樣時,利用後述的工序中的大氣壓快速將樹脂R注入狹隘部202可進行底部填充(相當於所謂的毛細管底部填充(capillary underfill))。再者,在模具內進行樹脂成形之際,藉由適切地進行排出狹隘部202中的空氣,藉由模具內的壓縮(利用成形模具191加壓)亦可更確實地進行底部填充。此外,即使未如圖22B所示的那樣供給填埋晶片零件200間的樹脂R,只要能向晶片零件200全周供給樹脂R,則亦能以比圖22B所示之樹脂R的線寬(晶片間寬度)還窄線寬的方式供給樹脂R。In addition, the coating pattern shown in FIG. 22B may be made such that the side surfaces of the wafer component 200 are covered with the resin R. Alternatively, the entire surface of the wafer component 200 may be coated in a grid pattern or the like regardless of whether the side surfaces of the wafer component 200 are covered with the resin R. Supply resin R. Here, when the coating pattern shown in FIG. 22B is used to cover the side surface of the wafer component 200 with the resin R, the resin R can be quickly injected into the narrow portion 202 using the atmospheric pressure in a process described later to perform underfilling (equivalent to so-called capillary underfill). Furthermore, when resin molding is performed in the mold, underfilling can be performed more reliably by properly exhausting the air in the narrow portion 202 and by compressing the mold (pressurization by the molding die 191 ). In addition, even if the resin R filling between the wafer components 200 is not supplied as shown in FIG. 22B , as long as the resin R can be supplied to the entire circumference of the wafer component 200 , the line width of the resin R shown in FIG. 22B ( The resin R is supplied in such a way that the width between wafers) and the line width are narrow.

此外,關於樹脂R的塗布式樣是可作多種考量。圖23係用以說明針對搭載有晶片零件(未圖示)而具有狹隘部的面板形狀(矩形狀)的工件W之樹脂R的塗布式樣(包含與工件W對向之噴嘴122的吐出路徑)之圖。圖23A係向工件W的中央部將樹脂R作點狀(一點)塗布(中心點)的狀態。即使是這樣的簡易塗布式樣,例如於真空環境氣體下進行樹脂R之供給後,藉由於大氣環境下放置工件W,藉其壓力差可使樹脂R注入狹隘部。又可縮短塗布時間。圖23B係向工件W面內進行樹脂R多點狀地塗布之狀態。就此狀態而言,與中心點相較下,可容易地排出空氣,且在模穴C內壓縮樹脂R之際可將樹脂R流動的距離設為相同程度。In addition, there are many considerations regarding the coating pattern of resin R. FIG. 23 is a diagram illustrating a coating pattern of resin R (including the discharge path of the nozzle 122 facing the workpiece W) for a workpiece W having a panel shape (rectangular shape) with a narrow portion on which a chip component (not shown) is mounted. picture. FIG. 23A shows a state in which the resin R is applied to the central portion of the workpiece W in a dot-like manner (center point). Even with such a simple coating method, for example, after the resin R is supplied under a vacuum atmosphere, the workpiece W is placed in an atmospheric environment, and the pressure difference can cause the resin R to be injected into the narrow portion. It can also shorten the coating time. FIG. 23B shows a state in which the resin R is applied in multiple spots on the surface of the workpiece W. In this state, the air can be easily discharged compared with the center point, and when the resin R is compressed in the cavity C, the distance over which the resin R flows can be made approximately the same.

圖23C係在工件W面內將樹脂R塗布成例如大致模穴尺寸的大旋渦狀之狀態。此狀態中,以旋渦狀作成容易排出空氣,藉由塗布成模穴尺寸,在模穴C內壓縮樹脂R之際,可將樹脂R流動的距離設為相同程度。圖23D係例如將樹脂R的高度降到低於中心點(圖23A)(中心點的矮背化)且在小的可動區域作旋渦狀的小塗布之狀態。此狀態中,藉由放慢樹脂R對模具面接觸的時序以拉長在關模動作中可排出空氣的時間而得以容易排出空氣。又,亦可想像在從一點塗布樹脂R時,因黏度高使得呈線狀塗布的樹脂R一邊不均等地積疊一邊塗布,變得難以塗布成均一的形狀之情況,但亦可藉由小的旋渦狀塗布而塗布成適切的圓形等之形狀。此外,可防止處於高的位置之樹脂R被壓縮而移往低的位置之際發生含有空氣之類的不良狀況。FIG. 23C shows a state in which the resin R is applied to the surface of the workpiece W in a large vortex shape of approximately the size of a mold cavity. In this state, the vortex shape makes it easy to discharge the air, and by coating to the mold cavity size, when the resin R is compressed in the mold cavity C, the distance over which the resin R flows can be made equal. FIG. 23D shows a state in which, for example, the height of the resin R is lowered to be lower than the center point (FIG. 23A) (lowering of the center point), and a small swirl-like coating is performed on a small movable area. In this state, the air can be easily discharged by slowing down the timing of contact of the resin R with the mold surface to lengthen the time during which the air can be discharged during the mold closing operation. In addition, it is also conceivable that when the resin R is applied from one point, the resin R applied in a linear shape is stacked unevenly due to the high viscosity, making it difficult to apply the resin R in a uniform shape. However, it is also possible to use a small Apply in a swirl shape to form an appropriate circular shape. In addition, it is possible to prevent the resin R at a high position from being compressed and moving to a low position, causing problems such as air inclusion.

圖23E係配合矩形狀的工件W的角以可作成角的方式塗布旋渦狀的狀態。此狀態中,配合工件W的形狀可容易以旋渦狀進行空氣之排出。圖23F係配合矩形狀的工件W一筆劃塗布成格子狀的狀態。此狀態中,可配合工件W的形狀以均一寛度塗布樹脂R。圖23G係在工件W的面內將樹脂R從中央部朝向外周部那樣的放射狀地塗布(虛線係沒有從噴嘴122吐出的路徑)的狀態。此狀態中,於模穴內壓縮樹脂R之際,可從中央部朝外周部進行空氣之排出。FIG. 23E shows a state in which the spiral coating is applied in a angular manner according to the corners of the rectangular workpiece W. In this state, the air can be easily discharged in a vortex shape according to the shape of the workpiece W. Figure 23F shows a state in which a rectangular workpiece is coated in a grid shape in one stroke. In this state, the resin R can be applied in a uniform width according to the shape of the workpiece W. 23G shows a state in which the resin R is applied radially on the surface of the workpiece W from the central portion toward the outer peripheral portion (the dotted line indicates a path without discharge from the nozzle 122). In this state, when the resin R is compressed in the mold cavity, air can be discharged from the central part toward the outer peripheral part.

又,關於樹脂R朝晶片零件200塗布的塗布式樣是可考量多種。圖24係用以說明樹脂R朝工件W的主要部分(晶片零件200)塗布的塗布式樣之圖。圖24A係遍布晶片零件200全周一筆劃塗布樹脂R的狀態。圖24B係在未將鄰接的晶片零件200間覆蓋地以一筆劃僅外周塗布樹脂R的狀態。圖24C係將鄰接的晶片零件200間(一部分的樹脂R係位在晶片零件200上)覆蓋地塗布樹脂R的狀態。如圖24所示,藉由將塗布式樣設為環狀,樹脂R變得容易朝位在其內側的狹隘部202注入。In addition, various coating patterns for coating the wafer component 200 with the resin R can be considered. FIG. 24 is a diagram illustrating a coating pattern in which the resin R is applied to the main part of the workpiece W (the wafer component 200 ). FIG. 24A shows a state in which the resin R is applied in one stroke over the entire wafer component 200 . FIG. 24B shows a state in which only the outer periphery of the adjacent wafer components 200 is coated with the resin R in one stroke without covering the space between the adjacent wafer components 200 . FIG. 24C shows a state in which resin R is applied to cover the space between adjacent wafer components 200 (part of the resin R is located on the wafer components 200 ). As shown in FIG. 24 , by making the coating pattern into a ring shape, the resin R becomes easier to be injected into the narrow portion 202 located inside.

如此在供給既定量的樹脂R後(亦即塗布式樣完成之後),停止從噴嘴122吐出樹脂R。具體言之,停止利用驅動部180使柱塞123向下移動,同時藉由夾管閥124關閉噴嘴122以停止樹脂R的吐出。又,亦可拉回柱塞123以輔助停止樹脂R的吐出。After the predetermined amount of resin R is supplied in this way (that is, after the coating pattern is completed), the discharge of the resin R from the nozzle 122 is stopped. Specifically, the downward movement of the plunger 123 by the driving unit 180 is stopped, and the nozzle 122 is closed by the pinch valve 124 to stop the discharge of the resin R. In addition, the plunger 123 may be pulled back to assist in stopping the discharge of the resin R.

接著,停止從腔室130內排出空氣。具體言之,藉由停止利用壓力調節部141排出空氣而解除腔室130在既定壓力的真空狀態。藉由壓力調節部141的停止,腔室130內成為從在真空狀態的既定壓而被加壓的情況。藉此,例如在被供給至工件W上的樹脂R的下方具有狹隘部202(應填充樹脂R的空間)的情況,以會被進行底部填充的方式向被減壓的狹隘部202注入經周圍環境氣體的壓力加壓後的樹脂R。Then, the exhaust of air from the chamber 130 is stopped. Specifically, the vacuum state of the chamber 130 at a predetermined pressure is released by stopping the exhaust of air using the pressure regulator 141 . By stopping the pressure regulator 141, the inside of the chamber 130 is pressurized from the predetermined pressure in the vacuum state. With this, for example, when there is a narrow portion 202 (a space to be filled with the resin R) below the resin R supplied to the workpiece W, the depressurized narrow portion 202 is injected through the surroundings so as to be underfilled. Resin R after pressurization by ambient gas pressure.

接著,在關閉狀態的腔室130內使噴嘴122上下移動(升降)。具體言之,在未移動腔室蓋131而腔室130被關閉的狀態下,藉由驅動部170透過注射器外殼125(注射器121)使噴嘴122上下移動。如此,進行使噴嘴122的上下移動反覆既定次數的斷液動作。本實施形態中,在腔室130被關閉且維持形成有內部的狀態下進行斷液(噴嘴122的上下移動)。Next, the nozzle 122 is moved up and down (raised and lowered) in the closed chamber 130 . Specifically, in a state where the chamber cover 131 is not moved and the chamber 130 is closed, the driving part 170 moves the nozzle 122 up and down through the syringe housing 125 (syringe 121). In this way, the liquid shutoff operation is performed by repeating the up and down movement of the nozzle 122 a predetermined number of times. In this embodiment, the fluid shutoff (up and down movement of the nozzle 122) is performed while the chamber 130 is closed and the inside is maintained.

接著,將腔室130設為開啟的狀態。具體言之,藉由利用蓋驅動部150使腔室蓋131逐漸向上移動,腔室蓋131從腔室本體132(荷重支承物137及密封環133)逐漸離開且成為腔室130開啟狀態(參照圖19)。因此,藉由開放於大氣中且從樹脂R的周圍施加大氣壓而將樹脂R朝狹隘部202注入(填充)。如同本實施形態,在晶片零件200藉由倒裝晶片接合而搭載於作為工件W的載體201上時,可在將晶片零件200與載體201連接的多數個凸塊之間注入、填充樹脂R,可抑制含有空氣(在狹隘部202無樹脂R的區域)。此外,即使晶片零件200在載體201上是以非為倒裝接合的方式搭載於工件W上的情況,就算在由晶片零件200的側面與載體201的主面所構成之角部的空間囤積有空氣的情況亦可填充樹脂R。Next, the chamber 130 is set to an open state. Specifically, by gradually moving the chamber lid 131 upward using the lid driving part 150, the chamber lid 131 is gradually separated from the chamber body 132 (the load support 137 and the sealing ring 133) and the chamber 130 becomes an open state (see Figure 19). Therefore, the resin R is injected (filled) into the narrow portion 202 by being open to the atmosphere and applying atmospheric pressure from the periphery of the resin R. As in this embodiment, when the chip component 200 is mounted on the carrier 201 as the workpiece W by flip-chip bonding, the resin R can be injected and filled between the plurality of bumps connecting the chip component 200 and the carrier 201. The inclusion of air (the area without resin R in the narrow portion 202) can be suppressed. In addition, even if the wafer component 200 is mounted on the workpiece W on the carrier 201 in a manner other than flip-chip bonding, even if there is accumulation in the corner space formed by the side surface of the wafer component 200 and the main surface of the carrier 201 In the case of air, resin R can also be filled.

此外,於再度關閉腔室130將腔室130內設為真空狀態(減壓)之後,亦可反覆將腔室130開啟以設為開放於大氣中(加壓)的工序。據此,可更確實地朝狹隘部202注入樹脂R。此外,若壓力調節部141具備例如壓縮機等之加壓裝置,則在關閉腔室130的狀態亦可進行腔室130內的加壓,可一邊解消含有空氣一邊加壓環境氣體而朝狹隘部202更加確實地注入樹脂R。In addition, after closing the chamber 130 again to bring the inside of the chamber 130 into a vacuum state (decompression), the process of opening the chamber 130 to the atmosphere (pressurization) may be repeated. Accordingly, the resin R can be injected into the narrow portion 202 more reliably. In addition, if the pressure regulator 141 is equipped with a pressurizing device such as a compressor, the chamber 130 can be pressurized even when the chamber 130 is closed, and the ambient air can be pressurized toward the narrow portion while eliminating the contained air. 202 injects resin R more reliably.

之後,在腔室130開啟的狀態下,例如藉由搬送裝置使工件W(被供給樹脂R者)被取出。此際,安置於重量計140的工件W係被向上移動的銷143所支持(排出(eject))並遞往搬送裝置。之後,已被供給樹脂R的工件W,例如係朝成形模具191(參照圖27)搬送並被安置。接著,在由成形模具191所形成的模穴C內被壓縮使樹脂R被熱硬化。藉由此壓縮使樹脂R被加壓並朝狹隘部202注入,能更確實地進行底部填充。如此,因為使用前述的樹脂供給方法而防止含有空氣等之不良狀況,所以製造出已抑制在狹隘部202未填充等之成形不良的成形品。 (實施形態4)Thereafter, with the chamber 130 open, the workpiece W (to which the resin R is supplied) is taken out, for example, by a conveying device. At this time, the workpiece W placed on the weight scale 140 is supported (ejected) by the upwardly moving pin 143 and delivered to the conveying device. Thereafter, the workpiece W to which the resin R has been supplied is transported toward, for example, the molding die 191 (see FIG. 27 ) and placed therein. Next, the resin R is compressed in the cavity C formed by the molding die 191 so that the resin R is thermally hardened. By this compression, the resin R is pressurized and injected into the narrow portion 202, thereby enabling more reliable underfilling. In this way, since the above-described resin supply method is used to prevent defects such as air inclusion, a molded product can be manufactured in which defects such as lack of filling in the narrow portion 202 are suppressed. (Embodiment 4)

針對本發明實施形態之樹脂供給裝置110A,主要參照圖25及圖26作說明。圖25及圖26係用以說明樹脂供給動作涉及之樹脂供給裝置110A之圖。本實施形態中,與前述實施形態3相較下,在可縮小腔室蓋131且裝置可小型化這點不同,故以下以這點為中心作說明。此外,樹脂供給裝置110A亦與前述實施形態3同樣為使用壓力調節部141(參照圖19)將腔室130內設為真空狀態,但圖25及圖26中省略壓力調節部141。且為了容易說明,一部分附上剖面線。The resin supply device 110A according to the embodiment of the present invention will be mainly described with reference to FIGS. 25 and 26 . 25 and 26 are diagrams for explaining the resin supply device 110A involved in the resin supply operation. This embodiment is different from the above-mentioned Embodiment 3 in that the chamber cover 131 can be reduced in size and the device can be miniaturized, so the following description will focus on this point. In addition, the resin supply device 110A also uses the pressure regulator 141 (see FIG. 19 ) to bring the inside of the chamber 130 into a vacuum state like the above-mentioned Embodiment 3. However, the pressure regulator 141 is omitted in FIGS. 25 and 26 . For ease of explanation, hatching is attached to some parts.

樹脂供給裝置110A係具備:使腔室蓋131移動的蓋驅動部150A(XZ軸驅動機構或YZ軸驅動機構);設於腔室130內且供工件W安置的安置台151;及使安置台151旋轉的台驅動部152(旋轉驅動機構)。作為蓋驅動部150A,可使用使前述的一軸(Z軸)用的驅動部170、180與二軸(XZ軸或YZ軸)分別對應者,可使腔室蓋131(噴嘴122)在水平方向(X軸或Y軸方向)及鉛直方向(Z軸方向)移動。又,作為台驅動部152,可使用被安裝於安置台151的旋轉軸153是透過皮帶154藉由馬達155進行旋轉驅動者,可使安置台151在旋轉方向(水平方向)移動。又,因為旋轉軸153是在腔室本體132的底部貫通地設置,所以樹脂供給裝置110A係具備將旋轉軸153與腔室本體132之間密封的密封環157。The resin supply device 110A is provided with: a cover driving part 150A (XZ-axis driving mechanism or YZ-axis driving mechanism) that moves the chamber lid 131; a placement table 151 provided in the chamber 130 for placing the workpiece W; and a placement table 151 that moves the chamber cover 131. The stage drive unit 152 (rotation drive mechanism) rotates by 151 degrees. As the cover drive unit 150A, a drive unit 170 and 180 for the aforementioned one-axis (Z-axis) and two axes (XZ-axis or YZ-axis) can be used, which can move the chamber cover 131 (nozzle 122) in the horizontal direction. (X-axis or Y-axis direction) and vertical direction (Z-axis direction) movement. In addition, as the table driving part 152, the rotating shaft 153 attached to the setting table 151 can be rotated and driven by the motor 155 through the belt 154, so that the setting table 151 can be moved in the rotation direction (horizontal direction). In addition, since the rotating shaft 153 is provided through the bottom of the chamber body 132, the resin supply device 110A is provided with a sealing ring 157 that seals between the rotating shaft 153 and the chamber body 132.

據此,即便腔室130在真空狀態亦可使腔室蓋131及設於其上的噴嘴122對工件W相對地移動。亦即,可於任意的吐出位置向工件W的面內供給樹脂R。又,藉由設置作為工件安置側進行旋轉的安置台151,可縮小作為樹脂供給側而設置有噴嘴122的腔室蓋131的移動範圍(可動範圍)。具體言之,相較於腔室蓋131在水平方向的移動範圍在前述實施形態3中是X軸及Y軸方向,本實施形態中則只要是Y軸方向或X軸方向任一者中的半徑份量的距離即可。亦即,藉由從工件W的中心部到一端部使工件W與移動噴嘴122的動作平行地旋轉,可對工件W全面以旋渦狀塗布樹脂R。又,在這樣的構成中,藉由將噴嘴122的進退動作與工件W的旋轉作組合,亦可在工件W作任意的直線或曲線之放射狀的塗布。因此,本實施形態中,比前述實施形態3還能縮小腔室蓋131。又,因為腔室蓋131變小,所以可縮小樹脂供給裝置110A整體的覆蓋區(footprint)(省空間化)。Accordingly, even if the chamber 130 is in a vacuum state, the chamber cover 131 and the nozzle 122 provided thereon can move relative to the workpiece W. That is, the resin R can be supplied into the surface of the workpiece W at any discharge position. Furthermore, by providing the mounting table 151 that rotates as the workpiece mounting side, the movement range (movable range) of the chamber cover 131 provided with the nozzle 122 as the resin supply side can be narrowed. Specifically, while the horizontal movement range of the chamber cover 131 is the X-axis direction and the Y-axis direction in the third embodiment, in the present embodiment, it is any one of the Y-axis direction and the X-axis direction. The distance of the radius component is sufficient. That is, by rotating the workpiece W from the center to one end of the workpiece W in parallel with the movement of the moving nozzle 122 , the resin R can be applied to the entire workpiece W in a spiral shape. In addition, in such a structure, by combining the forward and backward motion of the nozzle 122 with the rotation of the workpiece W, it is possible to apply arbitrary linear or curved radial coating on the workpiece W. Therefore, in this embodiment, the chamber cover 131 can be made smaller than in the third embodiment. In addition, since the chamber cover 131 is reduced in size, the overall footprint of the resin supply device 110A can be reduced (space saving).

又,樹脂供給裝置110A係具備設於安置台151,例如以將工件W包夾的方式固定的夾盤156。因此,從噴嘴122向工件W吐出的樹脂R具有黏著性,即使是因樹脂R而使工件W的旋轉受阻那樣的情況,亦可配合安置台151之旋轉使工件W穩定地旋轉。Furthermore, the resin supply device 110A is provided on the setting table 151 and includes a chuck 156 that is fixed to sandwich the workpiece W, for example. Therefore, the resin R discharged from the nozzle 122 to the workpiece W has adhesiveness. Even if the rotation of the workpiece W is hindered by the resin R, the workpiece W can be stably rotated in conjunction with the rotation of the mounting table 151 .

又,樹脂供給裝置110A係具備:設於腔室130外且隔著貫通腔室本體132的銷161安置工件W的重量計160;在重量計160立起而設置的銷161。重量計160及銷161可藉由驅動部163(Z軸驅動機構)而在Z軸方向上下移動(往復移動)。據此,在沒有如同前述實施形態3的重量計140設置於腔室130內的情況下可測量被供給至工件W的樹脂量。因此,可縮小腔室130的容量。又,因為重量計160被設於腔室130外,故可進行測量而無需待機到於腔室130內成為真空狀態後迄至可測量的穩定狀態。根據這點,前述實施形態3中即便是真空狀態亦使用可測量的重量計140,但會導致價格變高,所以本實施形態中因為使用低價的重量計160而可減低樹脂供給裝置110A的製造成本。又,因為腔室130的容量變小而可抑制例如施加於作為壓力調節部141的真空泵之負荷。Furthermore, the resin supply device 110A is provided with a weight scale 160 that is provided outside the chamber 130 and holds the workpiece W via a pin 161 that penetrates the chamber body 132 , and a pin 161 that is provided to stand upright on the weight scale 160 . The weight scale 160 and the pin 161 can move up and down (reciprocate) in the Z-axis direction by the driving part 163 (Z-axis driving mechanism). According to this, the amount of resin supplied to the workpiece W can be measured without the weight meter 140 being installed in the chamber 130 as in the third embodiment. Therefore, the capacity of the chamber 130 can be reduced. In addition, because the weight gauge 160 is installed outside the chamber 130, measurement can be performed without waiting until the chamber 130 reaches a vacuum state and reaches a stable state where measurement is possible. From this point of view, in the aforementioned third embodiment, the weight meter 140 that can measure even in a vacuum state is used, but this will increase the price. Therefore, in the present embodiment, the low-price weight meter 160 can be used to reduce the load of the resin supply device 110A. Manufacturing costs. In addition, since the capacity of the chamber 130 is reduced, for example, the load applied to the vacuum pump serving as the pressure regulator 141 can be suppressed.

又,樹脂供給裝置110A係具備在銷161朝向腔室130外退避的狀態下,塞住銷161所貫通的腔室本體132的孔132b之閘板162。作為閘板162,例如可使用藉由驅動部(未圖示)而可滑動的構成。藉由在腔室130關閉的狀態下以閘板162塞住(密封)孔132b而可將腔室130內設為密閉狀態。Moreover, the resin supply device 110A is provided with the shutter 162 which closes the hole 132b of the chamber body 132 penetrated by the pin 161 in the state in which the pin 161 is retracted toward the outside of the chamber 130. As the shutter 162, for example, a structure that can be slid by a driving part (not shown) can be used. By plugging (sealing) the hole 132b with the shutter 162 when the chamber 130 is closed, the inside of the chamber 130 can be placed in a sealed state.

閘板162係具備:供銷161貫通的孔162a;供旋轉軸153貫通的孔162b。閘板162以在工件W的重量被測量的狀態下孔132b與孔162a會連通的方式移動(存在)。又,閘板162在工件W被測量的狀態與被供給樹脂R的狀態之間移動(存在),但以旋轉軸153在此間不與閘板162接觸的大小來形成孔162a。The gate 162 has a hole 162a through which the pin 161 passes, and a hole 162b through which the rotation shaft 153 passes. The shutter 162 moves (exists) so that the hole 132b and the hole 162a are connected when the weight of the workpiece W is measured. Moreover, the shutter 162 moves (exists) between the state in which the workpiece W is measured and the state in which the resin R is supplied, but the hole 162a is formed in a size such that the rotation shaft 153 does not come into contact with the shutter 162 during this period.

於進行樹脂供給時,可考慮即使不讓銷161往腔室130外退避,亦可使之留在腔室130內。在此情況,因為將腔室130內設為密閉狀態,所以無需事先在孔132b設置將腔室本體132與銷161之間密封的密封環。因此,會有發生利用隔著銷161的重量計160所進行之測量無法正確之虞。關於這點,本實施形態中,關於孔132b的密封係設置閘板162而非使用密封環。藉此,即便是在腔室130外設置重量計160的構成,亦可正確地進行重量測量。此外,因孔132b、孔162a的徑大於銷161的徑,而在銷161未接觸於腔室本體132之下隔著銷161利用重量計160測量工件W的重量。When supplying the resin, it may be considered that the pin 161 can remain in the chamber 130 even if the pin 161 is not retracted outside the chamber 130 . In this case, since the inside of the chamber 130 is in a sealed state, there is no need to provide a sealing ring in advance in the hole 132b to seal between the chamber body 132 and the pin 161. Therefore, there is a risk that measurement using the weight gauge 160 with the pin 161 interposed therebetween may not be accurate. In this regard, in this embodiment, the shutter 162 is provided for sealing the hole 132b instead of using a sealing ring. Accordingly, even if the weight meter 160 is installed outside the chamber 130, the weight can be accurately measured. In addition, since the diameters of the holes 132b and 162a are larger than the diameter of the pin 161, the weight of the workpiece W is measured with the weight meter 160 through the pin 161 when the pin 161 is not in contact with the chamber body 132.

其次,針對樹脂供給裝置110A的動作方法(樹脂供給方法)作說明。此外,與前述實施形態3重複的工序係概略地說明。Next, the operation method (resin supply method) of the resin supply device 110A will be described. In addition, the steps that are the same as those in the above-mentioned Embodiment 3 are briefly described.

首先,如圖25所示,在測量了工件W被供給樹脂R前之重量後,朝安置台151安置工件W。具體言之,在腔室130開啟的狀態下,預先以銷161的前端會成為高於安置台151的位置之方式藉由驅動部163使重量計160及銷161事先向上移動。於此狀態,例如將藉由搬送裝置或作業人員所搬送之工件W安置於銷161,以重量計160測量在被供給樹脂R前之工件W的重量。接著,藉由驅動部163使重量計160及銷161向下移動,在從銷161朝安置台151遞交工件W後,藉由夾盤156將工件W固定並安置於安置台151。First, as shown in FIG. 25 , after measuring the weight of the workpiece W before the resin R is supplied, the workpiece W is placed on the placement table 151 . Specifically, when the chamber 130 is opened, the weight scale 160 and the pin 161 are moved upward in advance by the driving part 163 so that the front end of the pin 161 is positioned higher than the mounting table 151 . In this state, for example, the workpiece W transported by a transport device or an operator is placed on the pin 161 , and the weight of the workpiece W before the resin R is supplied is measured with the weight meter 160 . Next, the driving part 163 moves the weight scale 160 and the pin 161 downward, and after the workpiece W is delivered from the pin 161 to the setting table 151, the workpiece W is fixed by the chuck 156 and placed on the setting table 151.

接著,在使銷161從腔室本體132退避後,滑動閘板162以塞住銷161所貫通的孔132b(成為閘板162關閉的狀態)。之後,以關閉腔室130的狀態,藉由壓力調節部141將腔室130內的空氣開始排出,設成真空狀態(減壓狀態)。Next, after the pin 161 is retracted from the chamber body 132, the shutter 162 is slid to close the hole 132b penetrated by the pin 161 (the shutter 162 is in a closed state). Thereafter, with the chamber 130 closed, the air in the chamber 130 is started to be discharged through the pressure regulator 141 to bring it into a vacuum state (reduced pressure state).

接著,如圖26所示,在設為真空狀態的腔室130內,對工件W相對地使噴嘴122一邊移動一邊從噴嘴122吐出樹脂R地作供給。具體言之,藉由壓力調節部141將腔室130繼續設為真空狀態。然後,藉由台驅動部152使安置台151旋轉(水平移動)且使安置於安置台151的工件W一邊移動,一邊藉由蓋驅動部150A使腔室蓋131水平移動而使設於腔室蓋131的噴嘴122移動。此時,腔室蓋131係與前述實施形態3不同而在Y軸方向或X軸方向任一方水平移動。藉由閥驅動部126使夾管閥124驅動而開啟噴嘴122,藉由驅動部180使柱塞123朝向下移動而從噴嘴122工件W吐出樹脂R而作供給。能以成為在前述實施形態3所說明之既定的塗布式樣中的旋渦狀或放射狀之類的塗布式樣之方式向工件W的表面供給(塗布)樹脂R。Next, as shown in FIG. 26 , in the chamber 130 set to a vacuum state, the resin R is ejected from the nozzle 122 while moving the nozzle 122 relative to the workpiece W. Specifically, the pressure regulator 141 keeps the chamber 130 in a vacuum state. Then, the mounting table 151 is rotated (horizontally moved) by the table driving unit 152 and the workpiece W mounted on the mounting table 151 is moved, and the chamber cover 131 is horizontally moved by the cover driving unit 150A to be installed in the chamber. The nozzle 122 of the cover 131 moves. At this time, unlike the above-mentioned Embodiment 3, the chamber cover 131 moves horizontally in either the Y-axis direction or the X-axis direction. The pinch valve 124 is driven by the valve driving part 126 to open the nozzle 122, and the plunger 123 is moved downward by the driving part 180, so that the resin R is discharged from the nozzle 122 to the workpiece W and supplied. The resin R can be supplied (coated) to the surface of the workpiece W in a predetermined coating pattern such as a spiral or radial coating pattern described in the third embodiment.

接著,停止從腔室130內排出空氣。具體言之,藉由停止利用壓力調節部141排出空氣而解除腔室130在既定壓力中的真空狀態。因此,經周圍環境氣體的壓力所加壓的樹脂R被注入減壓的狹隘部202。且將噴嘴122之上下移動反覆既定次數而進行斷液。Then, the exhaust of air from the chamber 130 is stopped. Specifically, the vacuum state of the chamber 130 at a predetermined pressure is released by stopping the discharge of air by the pressure regulator 141 . Therefore, the resin R pressurized by the pressure of the ambient gas is injected into the depressurized narrow portion 202 . The nozzle 122 is moved up and down a predetermined number of times to cut off the fluid.

接著,在關閉狀態的腔室130內測量樹脂R的供給量。具體言之,使閘板162滑動而將孔132b與孔162a連通(成為閘板162開啟的狀態)。藉此,腔室130被開放於大氣中,促進朝狹隘部202注入(填充)樹脂R。且成為銷161可進入腔室130內的狀態。接著,藉由驅動部163使重量計160及銷161向上移動,用貫通腔室本體132的銷161將工件W抬起。藉此,以重量計160測量工件W的重量,經與樹脂供給前的重量作比較,可測量樹脂R的供給量。此外,若樹脂供給量未達到既定量,則將工件W安置於安置台151,在真空狀態的腔室130內再度供給樹脂R。Next, the supply amount of resin R is measured in the closed chamber 130 . Specifically, the shutter 162 is slid to connect the hole 132b and the hole 162a (the shutter 162 is in an open state). Thereby, the chamber 130 is opened to the atmosphere, and the injection (filling) of the resin R into the narrow portion 202 is promoted. Then, the pin 161 can enter the chamber 130 . Next, the weight scale 160 and the pin 161 are moved upward by the driving part 163, and the workpiece W is lifted up by the pin 161 penetrating the chamber body 132. Thereby, the weight of the workpiece W is measured with the weight meter 160, and the supply amount of the resin R can be measured by comparing it with the weight before the resin is supplied. In addition, if the resin supply amount does not reach the predetermined amount, the workpiece W is placed on the mounting table 151 and the resin R is supplied again in the vacuum chamber 130 .

在供給既定量樹脂R後,將腔室130設為開啟狀態。具體言之,藉由蓋驅動部150A使腔室蓋131朝上移動,腔室蓋131從腔室本體132遠離,成為腔室130已開啟的狀態。之後,例如藉由搬送裝置使工件W(被供給樹脂R者)被取出,例如朝成形模具191(參照圖27)搬送。此際,安置於安置台151的工件W係在夾盤156被解除後,被向上移動的銷143所支持(排出),遞往搬送裝置。此外,之後,將已被供給樹脂R的件W朝成形模具191安置,在成形模具191所具有的模穴C內使樹脂R被熱硬化。因為使用前述的樹脂供給方法而防止含有空氣等之不良狀況,故能製造已抑制在狹隘部202發生未填充等之成形不良的成形品。 (實施形態5)After the predetermined amount of resin R is supplied, the chamber 130 is set to an open state. Specifically, the chamber cover 131 is moved upward by the cover driving unit 150A, so that the chamber cover 131 is separated from the chamber body 132 and the chamber 130 is in an open state. Thereafter, the workpiece W (to which the resin R is supplied) is taken out, for example, by a conveying device, and is conveyed, for example, to the molding die 191 (see FIG. 27 ). At this time, after the chuck 156 is released, the workpiece W placed on the setting table 151 is supported (ejected) by the upwardly moving pin 143 and delivered to the conveying device. Then, the workpiece W to which the resin R has been supplied is placed toward the molding die 191, and the resin R is thermally hardened in the cavity C of the molding die 191. Since the above-mentioned resin supply method is used to prevent defects such as air inclusion, it is possible to produce a molded product in which molding defects such as lack of filling in the narrow portion 202 are suppressed. (Embodiment 5)

首先,針對本發明實施形態之樹脂成形裝置190,主要參照圖27及圖37作說明。圖27係用以說明樹脂成形方法(樹脂成形裝置190)之圖(斷面圖)。圖37係用以說明樹脂成形裝置190之圖(概略構成圖)。此外,在這樣的樹脂成形裝置190的構成在其他的實施形態亦可作成具備同樣的構成,可構成作為自動機的樹脂成形裝置。First, the resin molding device 190 according to the embodiment of the present invention will be described mainly with reference to FIG. 27 and FIG. 37 . Fig. 27 is a diagram (cross-sectional view) for explaining the resin molding method (resin molding device 190). Fig. 37 is a diagram (schematic configuration diagram) for explaining the resin molding device 190. In addition, the structure of such a resin molding device 190 can also be made to have the same structure in other embodiments, and a resin molding device as an automatic machine can be constructed.

樹脂成形裝置190在作為自動機方面,係具備供給部197、壓機部198、收納部199及在此等之間搬送工件W或樹脂R之搬送裝置204(搬送部)。供給部197具備前述的樹脂供給裝置110,以進行朝壓機部198供給工件W或樹脂R之準備等。又,壓機部198係具備具有模穴C的成形模具191,在模穴C內使樹脂R熱硬化。此成形模具191係具備可藉公知的壓機機構可開閉模具的一對的模具(一方設為上模192,另一方設為下模193),在下模193安置有工件W,在上模192設置有模穴C(凹部)而進行「上模穴成形」。此外,亦可作成在上模192安置有工件W,在下模193設置有模穴C(凹部)而進行「下模穴成形」之模具構成。又,收納部199係進行收納被樹脂成形的工件W(成形品)之準備等。此外,樹脂成形裝置190係具備控制各部分的控制部205,此控制部205亦兼用作為樹脂供給裝置110、110A的控制部,但亦可分別被使用。The resin molding apparatus 190 is an automatic machine and includes a supply part 197, a press part 198, a storage part 199, and a transfer device 204 (transfer part) that transfers the workpiece W or the resin R therebetween. The supply part 197 is equipped with the resin supply device 110 mentioned above, and prepares to supply the workpiece W or the resin R to the press part 198, etc. Furthermore, the press section 198 is provided with a molding die 191 having a cavity C, and the resin R is thermally cured in the cavity C. This forming mold 191 is provided with a pair of molds (one is an upper mold 192 and the other is a lower mold 193) that can be opened and closed by a known press mechanism. The workpiece W is placed on the lower mold 193, and the workpiece W is placed on the upper mold 192. A cavity C (recessed portion) is provided to perform "upper cavity molding". Alternatively, the workpiece W may be placed on the upper mold 192 and a cavity C (recessed portion) may be provided on the lower mold 193 to perform "lower cavity molding". In addition, the storage unit 199 prepares and stores the resin-molded workpiece W (molded product). In addition, the resin molding apparatus 190 is provided with the control part 205 which controls each part. This control part 205 also serves as the control part of the resin supply apparatus 110 and 110A, but may be used separately.

此外,作為是自動機的樹脂成形裝置190的別的構成,亦可作成具備可收納工件W的供給部197、具備前述的樹脂供給裝置110的樹脂R的供給部、及在壓機部198及此等之間搬送工件W或樹脂R的搬送裝置204(搬送部)之構成。供給部197係準備將工件W朝壓機部198供給,收納已進行成形後的工件W。又,樹脂R的供給部係對工件W或脫模片可任意地供給樹脂R。In addition, as another structure of the automatic resin molding apparatus 190, it may be provided with a supply part 197 capable of accommodating the workpiece W, a supply part for the resin R including the aforementioned resin supply device 110, and a press part 198 and The structure of the conveying device 204 (conveying part) which conveys the workpiece W or the resin R among these. The supply unit 197 prepares to supply the workpiece W to the press unit 198 and accommodates the formed workpiece W. In addition, the resin R supply unit can arbitrarily supply the resin R to the workpiece W or the release sheet.

成形模具191具備用以構成模穴C(凹部)的模穴件194(第1模具塊)及將其包圍的夾持器195(第2模具塊)。成形模具191中,因為在上模192設有模穴C,所以模穴C的底部是以模穴件194的下面,模穴C的側部是以夾持器195的內壁面所構成。又,成形模具191具備將上模192和下模193之間(模具內部)密封的密封環196(例如O環)。此外,雖未圖示,但樹脂成形裝置190具備調節成形模具191的內部壓力的壓力調節部(例如真空泵)或調節內部溫度(成形溫度)的溫度調節部(例如加熱器)。The forming mold 191 is provided with a cavity material 194 (first mold block) for forming a cavity C (recessed portion) and a clamper 195 (second mold block) surrounding the cavity C (recessed portion). In the forming mold 191, since the upper mold 192 is provided with a cavity C, the bottom of the cavity C is formed by the lower surface of the cavity member 194, and the side portions of the cavity C are formed by the inner wall surface of the holder 195. Furthermore, the molding die 191 is provided with a seal ring 196 (for example, an O-ring) that seals between the upper mold 192 and the lower mold 193 (inside the mold). In addition, although not shown in the figure, the resin molding apparatus 190 includes a pressure regulator (for example, a vacuum pump) that regulates the internal pressure of the mold 191 or a temperature regulator (for example, a heater) that regulates the internal temperature (molding temperature).

其次,針對樹脂成形方法(樹脂成形裝置190的動作方法)作說明。首先,例如使用前述的樹脂供給裝置110將樹脂R供給至工件W上(圖27A)。接著,將已被供給樹脂R的工件W利用搬送裝置204,從樹脂供給裝置110朝已開啟模具的狀態之成形模具191搬入,以晶片零件200朝向模穴C側而將工件W安置於成形模具191(下模193的上面)(圖27B)。Next, the resin molding method (the operation method of the resin molding device 190) will be described. First, the resin R is supplied to the workpiece W using, for example, the aforementioned resin supply device 110 ( FIG. 27A ). Next, the workpiece W to which the resin R has been supplied is carried from the resin supply device 110 to the molding mold 191 in the opened state using the transfer device 204, and the workpiece W is placed in the molding mold with the wafer component 200 facing the cavity C side. 191 (the upper surface of the lower mold 193) (Fig. 27B).

接著,將成形模具191逐漸關模,將模穴C設為減壓(真空)狀態(圖27C)。具體言之,藉由壓機機構使下模193對上模192逐漸接近。因此,設於下模193的密封環196接觸於上模192的夾持器195,使工件W(載體201)上的晶片零件200及樹脂R被收容於模穴C。此時,藉由以壓力調節部(未圖示)排出空氣而可將模具內部設為減壓狀態。Next, the forming mold 191 is gradually closed, and the mold cavity C is brought into a reduced pressure (vacuum) state (Fig. 27C). Specifically, the lower mold 193 is gradually brought closer to the upper mold 192 through the press mechanism. Therefore, the sealing ring 196 provided on the lower mold 193 contacts the holder 195 of the upper mold 192, so that the wafer component 200 and the resin R on the workpiece W (carrier 201) are accommodated in the mold cavity C. At this time, the inside of the mold can be brought into a depressurized state by discharging air through a pressure regulator (not shown).

接著,藉由成形模具191進一步關模,在上模192和下模193之間夾持(圖27D)工件W(載體201),進行壓縮成形(圖27E)。此時,因為成形模具191藉由溫度調節部(未圖示)加熱到成形溫度,所以樹脂R係在模穴C內被熱硬化(加熱、硬化)。樹脂R被壓縮(加壓)並朝狹隘部202注入,但因為使用前述的樹脂供給方法以防止含有空氣等之不良狀況,所以形成已抑制了在狹隘部202的未填充等之成形不良的成形品(工件W)。之後,將成形模具191設為模具開啟狀態,利用搬送裝置204從成形模具191取出工件W(成形品),往收納部199搬出。Next, the molding die 191 is further closed, and the workpiece W (carrier 201) is clamped (FIG. 27D) between the upper mold 192 and the lower mold 193, and compression molding is performed (FIG. 27E). At this time, since the molding die 191 is heated to the molding temperature by the temperature regulator (not shown), the resin R is thermally hardened (heated and hardened) in the cavity C. The resin R is compressed (pressurized) and injected into the narrow portion 202. However, since the resin supply method described above is used to prevent defects such as inclusion of air, molding defects such as lack of filling in the narrow portion 202 are suppressed. Product(workpiece W). Thereafter, the molding die 191 is brought into the mold open state, and the workpiece W (molded product) is taken out from the molding die 191 using the transfer device 204 and carried out to the accommodating part 199 .

本實施形態中,在樹脂成形前利用前述的樹脂供給方法抑制空氣混入工件W與樹脂R之間。因此,於工件W(成形品)的樹脂成形部,可抑制因空氣混入所致空隙的發生。又,在工件W中,於狹隘部202亦抑制空氣的混入,故抑制空隙之發生而進行底部填充。 (實施形態6)In this embodiment, the aforementioned resin supply method is used to prevent air from being mixed between the workpiece W and the resin R before resin molding. Therefore, the occurrence of voids due to air mixing in the resin molded portion of the workpiece W (molded article) can be suppressed. In addition, in the workpiece W, the mixing of air is also suppressed in the narrow portion 202, so the occurrence of voids is suppressed and underfilling is performed. (Embodiment 6)

首先,針對本發明實施形態之樹脂成形裝置190A,主要參照圖28作說明。圖28係用以說明樹脂成形方法(樹脂成形裝置190A)之圖(斷面圖)。此外,樹脂成形裝置190A的概略構成係與前述的樹脂成形裝置190(圖37)同樣。First, the resin molding apparatus 190A according to the embodiment of the present invention will be described mainly with reference to FIG. 28 . FIG. 28 is a diagram (cross-sectional view) for explaining the resin molding method (resin molding device 190A). In addition, the schematic structure of the resin molding apparatus 190A is the same as the resin molding apparatus 190 mentioned above (FIG. 37).

樹脂成形裝置190A所具備的成形模具191A係具備藉由公知的壓機機構可開閉模具的一對的模具(一方設為上模192,另一方設為下模193),上模192安置有工件W,下模193設有模穴C(凹部)而進行「下模穴成形」。本實施形態中,在進行「下模穴成形」這點及使用不同的2種類的樹脂R、Ra成形這點與前述實施形態5相異,故以下針對這點為中心作說明。The molding mold 191A included in the resin molding apparatus 190A is provided with a pair of molds (one is an upper mold 192 and the other is a lower mold 193) that can be opened and closed by a known press mechanism. The upper mold 192 is equipped with a workpiece. W. The lower mold 193 is provided with a cavity C (recessed portion) to perform "lower cavity molding". This embodiment is different from the aforementioned Embodiment 5 in that "lower cavity molding" is performed and that two different types of resins R and Ra are used for molding. Therefore, the following description will focus on this point.

其次,針對樹脂成形方法(樹脂成形裝置190A的動作方法)作說明。首先,例如使用前述的樹脂供給裝置110將樹脂R供給至工件W上(圖28A)。再者,依據樹脂供給裝置110,可使經周圍環境氣體的壓力加壓後的樹脂R注入於被減壓的狹隘部202(圖28B)。此處,亦可從藉由朝工件W的狹隘部202填充樹脂R以使晶片零件200與載體201的連接部分封止而完成成形。Next, the resin molding method (the operation method of the resin molding device 190A) will be described. First, the resin R is supplied to the workpiece W using, for example, the aforementioned resin supply device 110 (Fig. 28A). Furthermore, according to the resin supply device 110, the resin R pressurized by the pressure of the ambient air can be injected into the depressurized narrow portion 202 (FIG. 28B). Here, molding can also be completed by filling the narrow portion 202 of the workpiece W with the resin R to seal the connection portion between the chip component 200 and the carrier 201 .

然而,在晶片零件200的外周亦藉由樹脂封止而一體化以保持機械強度、晶片零件200外周亦藉由樹脂封止較佳的情況,進行以下的工序。具體言之,將已被供給樹脂R的工件W藉由搬送裝置204從樹脂供給裝置110朝模具開啟狀態的成形模具191A搬入,以晶片零件200朝向模穴C側將工件W安置於成形模具191A(上模192的下面)(圖28C)。此工件W,例如係經由在上模192下面開口的路(孔)而藉由吸引裝置被吸着保持於上模192的下面。又,將有別於供給至工件W的樹脂R之別的樹脂Ra向模穴C內作供給。此處,所謂別的樹脂Ra係指以與使用樹脂供給裝置110的工序不同的工序所供給者,材質可相同或不同。又,在樹脂供給裝置110的樹脂R係液狀,但樹脂Ra亦可為液狀、顆粒狀、粉狀、薄片狀。又,樹脂Ra可利用適宜的搬送裝置204搬送,例如可在覆蓋模具面而防止模具面與樹脂Ra之接觸的脫模片上搭載著樹脂Ra的狀態下向模穴C內進行供給。However, in the case where the outer periphery of the chip component 200 is also sealed with resin and integrated to maintain mechanical strength, and it is preferable that the outer periphery of the chip component 200 is also sealed with resin, the following process is performed. Specifically, the workpiece W to which the resin R has been supplied is transported from the resin supply device 110 to the molding die 191A in the open state by the transport device 204, and the workpiece W is placed in the molding die 191A with the wafer component 200 facing the cavity C side. (Underside of the upper mold 192) (Fig. 28C). This workpiece W is suctioned and held on the lower surface of the upper mold 192 by a suction device through a path (hole) opened on the lower surface of the upper mold 192, for example. Furthermore, a resin Ra different from the resin R supplied to the workpiece W is supplied into the cavity C. Here, the other resin Ra refers to one supplied in a process different from the process using the resin supply device 110, and the material may be the same or different. In addition, the resin R in the resin supply device 110 is in liquid form, but the resin Ra may be in liquid form, granular form, powder form, or flake form. In addition, the resin Ra can be transported by an appropriate transport device 204. For example, the resin Ra can be supplied into the mold cavity C with the resin Ra mounted on a release sheet that covers the mold surface and prevents contact between the mold surface and the resin Ra.

接著,將成形模具191A逐漸關模,將模穴C設為減壓(真空)狀態(圖28D)。藉此,設於上模192的密封環196接觸於下模193的夾持器195,晶片零件200及樹脂R、Ra被收容於模穴C。Next, the forming mold 191A is gradually closed, and the mold cavity C is brought into a reduced pressure (vacuum) state (Fig. 28D). Thereby, the sealing ring 196 provided in the upper mold 192 comes into contact with the holder 195 of the lower mold 193, and the wafer component 200 and the resins R and Ra are accommodated in the mold cavity C.

接著,藉由成形模具191A進一步逐漸關模,在上模192與下模193之間夾持工件W(載體201),進行壓縮成形(圖28E)。此時,因為成形模具191A被溫度調節部(未圖示)加熱到成形溫度,所以樹脂R、Ra係在模穴C內被熱硬化(加熱、硬化)。但因為使用前述的樹脂供給方法以防止含有空氣等之不良狀況,所以形成在狹隘部202未填充等之成形不良的成形品(工件W)。又,例如可使用適合於狹隘部202的填充之樹脂R與放熱性或屏蔽性等優異且適合於晶片零件200的封止之樹脂Ra來形成成形品。之後,將成形模具191A設為模具開啟狀態,利用搬送裝置204從成形模具191A取出工件W(成形品),往收納部199搬出。 (實施形態7)Next, the molding die 191A is further gradually closed, and the workpiece W (carrier 201 ) is sandwiched between the upper mold 192 and the lower mold 193 to perform compression molding ( FIG. 28E ). At this time, since the molding die 191A is heated to the molding temperature by the temperature regulator (not shown), the resins R and Ra are thermally hardened (heated and hardened) in the cavity C. However, since the above-mentioned resin supply method is used to prevent defects such as inclusion of air, the narrow portion 202 is not filled with a defective molded product (workpiece W). Furthermore, for example, the molded product can be formed using a resin R suitable for filling the narrow portion 202 and a resin Ra which is excellent in heat dissipation properties, shielding properties, etc. and suitable for sealing the wafer component 200 . Thereafter, the molding die 191A is brought into the mold open state, and the workpiece W (molded product) is taken out from the molding die 191A using the transfer device 204 and carried out to the storage part 199 . (Embodiment 7)

針對本發明實施形態之樹脂成形方法,主要參照圖29至圖32作說明。圖29至圖32係用以說明樹脂成形方法之圖(立體圖)。本實施形態中,例如在朝工件W供給樹脂R方面,可使用前述的樹脂供給裝置110、110A,在樹脂成形方面,可使用前述的樹脂成形裝置190、190A,但在樹脂成形上以進行「上模穴成形」的樹脂成形裝置190較佳。The resin molding method according to the embodiment of the present invention will be mainly described with reference to FIGS. 29 to 32 . 29 to 32 are diagrams (perspective views) for explaining the resin molding method. In this embodiment, for example, to supply the resin R to the workpiece W, the aforementioned resin supply devices 110 and 110A can be used, and to perform resin molding, the aforementioned resin molding devices 190 and 190A can be used. However, in resin molding, " The resin molding device 190 of "upper cavity molding" is preferred.

首先,準備被供給樹脂R前的工件W(被供給物)(圖29)。作為工件W,適用複數個晶片零件200(例如半導體晶片等)是被倒裝接合(凸塊連接)成行列狀的圓板形狀的載體201(例如形成有半導體晶圓、配線層的玻璃板等)。First, the workpiece W (object to be supplied) before the resin R is supplied is prepared (Fig. 29). As the workpiece W, a plurality of wafer parts 200 (for example, semiconductor wafers, etc.) are used, which are disk-shaped carriers 201 (for example, semiconductor wafers, wiring layers, etc., formed on a glass plate) that are flip-chip bonded (bump-connected) in a matrix. ).

接著,例如使用樹脂供給裝置110將樹脂R供給至工件W上(圖30)。此處,藉由向工件W(載體201)全面以空出間隙地將液狀的樹脂R呈旋渦狀塗布供給,作成在工件W上沒有被樹脂R覆蓋的晶片零件200之狀態。Next, the resin R is supplied to the workpiece W using, for example, the resin supply device 110 (Fig. 30). Here, the liquid resin R is applied and supplied in a spiral shape to the entire surface of the workpiece W (carrier 201) with a gap, so that the wafer component 200 on the workpiece W is not covered with the resin R.

接著,在將既被供給樹脂R的工件W朝已開模的成形模具191安置之後,將成形模具191關模,使密封環196接觸夾持器195,進一步夾持工件W。此時,含有被關模的模穴C的模具內部被減壓。如此,藉由對周圍環境氣體減壓而將晶片零件200與載體201之間(圖19所示的狹隘部202)的空氣排出,可防止經底部填充後的樹脂R內產生空隙。此外,為提高空氣的排出效果,以在密封環196接觸之際樹脂R不與模穴件194的下面接觸的高度的方式對工件W供給樹脂R者較佳(圖27C)。Next, after the workpiece W to which the resin R has been supplied is placed toward the opened molding die 191, the molding die 191 is closed and the seal ring 196 is brought into contact with the holder 195 to further clamp the workpiece W. At this time, the pressure inside the mold including the closed mold cavity C is reduced. In this way, by depressurizing the ambient air and expelling the air between the chip component 200 and the carrier 201 (the narrow portion 202 shown in FIG. 19 ), the generation of voids in the resin R after underfilling can be prevented. In addition, in order to improve the air discharge effect, it is preferable to supply the resin R to the workpiece W at a height such that the resin R does not come into contact with the lower surface of the cavity member 194 when the seal ring 196 comes into contact (Fig. 27C).

接著,藉由進一步關模而壓縮液狀的樹脂R(圖31),使得在模穴C內被填充的樹脂R硬化並成形(圖32)。旋渦狀(複數個線狀)塗布的液狀的樹脂R係被成形模具191擴張而僅流動鄰接之線狀的樹脂R間的距離程度,與例如為縮短塗布時間而被堆積於工件W中央的一點作供給的樹脂R流到外周的情況相較下,可削減樹脂R的流動距離。藉此,可抑制一邊因交聯反應而進行硬化一邊流動的樹脂之樹脂流動所致使晶片偏移等不良狀況的發生。又,也可減低因樹脂流動而產生的流痕。且,防止在距離長的情況因流動時的受熱所致樹脂R的硬化而可提升在工件W外周之底部填充性。Next, the liquid resin R is compressed by further closing the mold (Fig. 31), so that the resin R filled in the mold cavity C is hardened and formed (Fig. 32). The liquid resin R applied in a spiral shape (plural lines) is expanded by the molding die 191 and flows only to the extent of the distance between adjacent linear resins R, and is accumulated in the center of the workpiece W to shorten the coating time, for example. Compared with the case where the resin R supplied at one point flows to the outer periphery, the flow distance of the resin R can be reduced. This can suppress the occurrence of problems such as wafer deflection due to resin flow of the resin that flows while curing due to the cross-linking reaction. In addition, flow marks caused by resin flow can also be reduced. In addition, when the distance is long, hardening of the resin R due to heat during flow can be prevented, thereby improving the underfilling properties around the outer circumference of the workpiece W.

在將樹脂R僅以旋渦狀塗布並供給至工件W的情況,當以成形模具191逐漸壓縮樹脂R時,因為鄰接的線狀的樹脂R彼此會合流,所以在減壓不充分的情況會有導致空氣被包含於合流處之虞。於是,例如藉由作成圖33至圖36所示在工件W中的既定部位有空氣可流出的部分之塗布式樣,在以成形模具191逐漸壓縮樹脂R之際可充分進行空氣之排出,可防止成形不良。此外,在使用樹脂供給裝置110、110A對工件W供給樹脂R時,就算未將腔室130內設為真空狀態仍可防止樹脂R內含空氣等之不良狀況的樹脂R的塗布式樣作說明。When the resin R is applied only in a spiral shape and supplied to the workpiece W, when the resin R is gradually compressed with the molding die 191, the adjacent linear resin R will merge with each other, so the pressure reduction may not be sufficient. There is a risk of air being included in the confluence. Therefore, for example, by creating a coating pattern in which a predetermined portion of the workpiece W has a portion where air can flow out as shown in FIGS. 33 to 36 , when the resin R is gradually compressed with the molding die 191 , the air can be fully discharged, thereby preventing Poor forming. In addition, when the resin supply devices 110 and 110A are used to supply the resin R to the workpiece W, a coating method of the resin R that can prevent problems such as air inclusion in the resin R even if the inside of the chamber 130 is not put into a vacuum state will be described.

圖33係顯示使旋渦狀的一部分(既定位置203)供給較細的樹脂R後的工件W之狀態。此處,在將液狀的樹脂R呈旋渦狀供給之際,在工件W的表面以圖33所示的十字方向或6方向、8方向等既定方向(既定位置203)或任意間隔,降低樹脂R的高度,或減少樹脂R。作為這樣的樹脂供給方法,例如藉由提高噴嘴122的移動速度,能使在其位置的塗布量比其他的位置還降低。又,作為別的方法,可減少來自於噴嘴122的樹脂R之塗布量。例如可考慮降低噴嘴122的開度(掐住噴嘴122)的方法或使柱塞123的動作速度變慢的方法。藉此,在以成形模具191壓縮樹脂R之際,因為空氣可通過既定位置203,故可順暢地排出空氣,可防止空隙的產生。FIG. 33 shows the state of the workpiece W after the fine resin R is supplied to a part of the spiral shape (predetermined position 203). Here, when the liquid resin R is supplied in a spiral shape, the resin is lowered on the surface of the workpiece W in a predetermined direction (predetermined position 203) such as the cross direction, the 6-direction, and the 8-direction shown in FIG. 33, or at arbitrary intervals. The height of R, or reduce the resin R. As such a resin supply method, for example, by increasing the moving speed of the nozzle 122, the coating amount at this position can be reduced compared to other positions. As another method, the amount of resin R applied from the nozzle 122 can be reduced. For example, a method of lowering the opening of the nozzle 122 (pinch the nozzle 122) or a method of slowing down the operating speed of the plunger 123 can be considered. Thereby, when the resin R is compressed by the molding die 191, since the air can pass through the predetermined position 203, the air can be discharged smoothly, and the generation of voids can be prevented.

圖34顯示間歇地呈旋渦狀供給樹脂R後的工件W之狀態。此處,為了設置空氣可流動的空間,實質使用多點塗布的方法。在此情況,關於以成為旋渦狀的塗布式樣的方式移動中的噴嘴122,作成反覆於接近工件W時吐出樹脂R且於離開時既吐出的樹脂R被斷離的動作。因此,藉由在未完全結束塗布下移往下個吐出點,可即時進行移往下個吐出點之動作。藉此,因為在到達吐出點而接近工件W時可將樹脂R高速地反覆吐出,所以可高速地供給樹脂R。又,因為空氣可在被塗布樹脂R的點之間流動,可防止空隙的發生。又,因為從噴嘴122一點一點吐出樹脂R,所以可對工件W全面塗布樹脂R迄至既定的供給量為止。據此,例如因為可完成將旋渦的線高密度配置的塗布,所以減低樹脂R的流動量亦可減少流痕。FIG. 34 shows the state of the workpiece W after the resin R is intermittently supplied in a spiral shape. Here, in order to provide a space through which air can flow, a multi-point coating method is essentially used. In this case, the nozzle 122 that is moving in a swirling coating pattern is configured to repeatedly eject the resin R when approaching the workpiece W and to disconnect the ejected resin R when moving away from the workpiece W. Therefore, by moving to the next discharge point before coating is completely completed, the movement to the next discharge point can be performed immediately. Thereby, when the resin R reaches the discharge point and approaches the workpiece W, the resin R can be repeatedly discharged at a high speed, so the resin R can be supplied at a high speed. In addition, since air can flow between the points where the resin R is coated, the occurrence of voids can be prevented. In addition, since the resin R is discharged little by little from the nozzle 122, the entire workpiece W can be coated with the resin R until a predetermined supply amount is reached. According to this, for example, since it is possible to complete coating in which the lines of vortices are arranged at a high density, reducing the flow amount of the resin R can also reduce flow marks.

圖35顯示間歇地呈直線狀被供給樹脂R後的工件W之狀態。此處係使用參照圖34所說明的方法,為設置能使空氣流動的空間,作成實質地進行多點塗布那樣的直線狀的塗布式樣。又,藉由將樹脂R呈直線狀供給,亦可適用於向晶片間供給的情況,例如在圖24B所示最後對作為一封裝區域被切開的複數個晶片間作塗布的情況亦可適用。FIG. 35 shows the state of the workpiece W after the resin R is intermittently supplied linearly. Here, the method described with reference to FIG. 34 is used to create a linear coating pattern that allows for substantial multi-point coating by providing a space that allows air to flow. In addition, by supplying the resin R in a linear shape, it is also applicable to the case of supplying between wafers. For example, it is also applicable to the case of coating between a plurality of wafers that are finally cut as one package area as shown in FIG. 24B.

圖36顯示對晶片零件200間以多點供給樹脂R後的工件W之狀態。此處,使用參照圖34所說明的方法,例如藉由在4個鄰接的晶片零件200間塗布樹脂R,在以成形模具191壓縮樹脂R之際,可確保空氣流動並使樹脂R在模穴C內容易填充。 (實施形態8)FIG. 36 shows the state of the workpiece W after the resin R is supplied between the wafer components 200 at multiple points. Here, the method described with reference to FIG. 34 is used, for example, by applying resin R between four adjacent wafer parts 200. When compressing the resin R with the mold 191, air flow can be ensured and the resin R can be placed in the mold cavity. C is easy to fill. (Embodiment 8)

針對本發明實施形態之樹脂安置裝置310及具備其之樹脂成形裝置350,參照圖38至圖46作說明。圖38至圖42係用以說明動作中的樹脂安置裝置310之圖。圖43至圖46係用以說明動作中的樹脂成形裝置350的主要部分之圖。本實施形態中,作為被供給樹脂R的被供給物是使用工件W。The resin placement device 310 and the resin molding device 350 provided with the resin placement device 310 according to the embodiment of the present invention will be described with reference to FIGS. 38 to 46 . 38 to 42 are diagrams for explaining the resin placement device 310 in operation. 43 to 46 are diagrams for explaining the main parts of the resin molding device 350 in operation. In this embodiment, the workpiece W is used as the object to be supplied with the resin R.

首先,針對樹脂安置裝置310的構成作說明。樹脂安置裝置310係如圖38等所示,具備供樹脂R及工件W(被供給物)載置的腔室311。腔室311係具備一對的腔室部(一方設為上腔室部312,另一方設為下腔室部313)且構成為可開閉。工件W係被安置於下腔室部313的表面313a(安置面)。First, the structure of the resin placement device 310 will be described. The resin placement device 310 is equipped with a chamber 311 in which the resin R and the workpiece W (to-be-supplied object) are placed, as shown in FIG. 38 and others. The chamber 311 includes a pair of chamber parts (one is an upper chamber part 312 and the other is a lower chamber part 313) and is configured to be openable and closable. The workpiece W is placed on the surface 313a (seating surface) of the lower chamber part 313.

此樹脂安置裝置310係藉由未圖示的控制部控制升降部。此控制部係具備CPU(中央演算處理裝置)、ROM、RAM等之記憶部所構成的電腦,藉由CPU讀出被記錄在記憶部的各種控制程式並予以執行,以控制構成樹脂安置裝置310的各部分之構成要素的動作。此外,本實施形態中,具備樹脂安置裝置310的樹脂成形裝置350是以具備控制部者作說明,但亦可為樹脂安置裝置310是單獨具備控制部。This resin placement device 310 controls the lifting part through a control part not shown in the figure. This control unit is a computer composed of a CPU (central processing unit), a memory unit such as ROM and RAM, and the CPU reads out various control programs recorded in the memory unit and executes them to control the resin placement device 310 The actions of the constituent elements of each part. In addition, in this embodiment, the resin molding device 350 including the resin placement device 310 is described as having a control unit, but the resin placement device 310 may have a separate control unit.

此等上腔室部312及下腔室部313係利用可承受腔室311內的任意壓力狀態者、例如金屬等之材質所構成。當腔室311成為關閉的狀態時,藉由具有凹部的上腔室部312與下腔室部313接觸,形成腔室311的內部311a(成為閉塞狀態)(參照圖39)。同圖中雖未圖示,但在上腔室部312與下腔室部313之間可設置適宜的密封機構。The upper chamber part 312 and the lower chamber part 313 are made of materials that can withstand any pressure state in the chamber 311, such as metal. When the chamber 311 is in a closed state, the upper chamber part 312 having a recess comes into contact with the lower chamber part 313, thereby forming the interior 311a of the chamber 311 (in a closed state) (see FIG. 39). Although not shown in the figure, a suitable sealing mechanism may be provided between the upper chamber part 312 and the lower chamber part 313.

又,樹脂安置裝置310具備對腔室311的內部311a進行空氣吸引以形成減壓狀態的減壓部314(例如真空泵)。減壓部314在已形成腔室311的內部311a的狀態下,經由設置於上腔室部312的空氣路315對內部311a進行空氣吸引而形成減壓狀態。此外,此減壓部314係受控制部所控制。Furthermore, the resin placement device 310 is provided with a decompression part 314 (for example, a vacuum pump) that sucks air into the interior 311a of the chamber 311 to create a decompressed state. In a state where the interior 311a of the chamber 311 is formed, the decompression part 314 sucks air into the interior 311a through the air path 315 provided in the upper chamber part 312 to create a decompressed state. In addition, the pressure reducing part 314 is controlled by the control part.

又,樹脂安置裝置310具備將腔室311加熱的加熱部316。加熱部316(例如筒式加熱器(cartridge heater))係以與下腔室部313的表面313a平行地延伸的方式設置複數個。又,樹脂安置裝置310具備將腔室311冷卻的冷卻部317。冷卻部317(例如冷媒進行循環的冷卻管)係以與下腔室部313的表面313a平行地延伸的方式設置複數個。藉此,可將安置於表面313a的工件W的樹脂R加熱或冷卻。此外,此等加熱部316及冷卻部317係由控制部所控制。此外,加熱部316及冷卻部317可設於上腔室部312,亦可設於上腔室部312與下腔室部313雙方。Moreover, the resin placement device 310 is provided with the heating part 316 which heats the chamber 311. A plurality of heating parts 316 (for example, cartridge heaters) are provided so as to extend in parallel with the surface 313 a of the lower chamber part 313 . Moreover, the resin placement device 310 is provided with the cooling part 317 which cools the chamber 311. A plurality of cooling parts 317 (for example, cooling pipes through which refrigerant circulates) are provided to extend parallel to the surface 313 a of the lower chamber part 313 . Thereby, the resin R of the workpiece W placed on the surface 313a can be heated or cooled. In addition, the heating part 316 and the cooling part 317 are controlled by the control part. In addition, the heating part 316 and the cooling part 317 may be provided in the upper chamber part 312, or may be provided in both the upper chamber part 312 and the lower chamber part 313.

此處,如圖39所示,可在比加熱部316還靠近表面313a側設置冷卻部317。藉此,使冷卻部317對下腔室部313的表面313a作動,俾遮蔽來自於加熱部316的熱。例如可使安置於表面313a的工件W的樹脂R從被加熱的狀態快速朝被冷卻的狀態移行。Here, as shown in FIG. 39 , the cooling part 317 may be provided closer to the surface 313 a than the heating part 316 . Thereby, the cooling part 317 acts on the surface 313a of the lower chamber part 313, so as to shield the heat from the heating part 316. For example, the resin R of the workpiece W placed on the surface 313a can be quickly moved from a heated state to a cooled state.

其次,針對圖43以後所示的樹脂成形裝置350的構成作說明。樹脂成形裝置350係具備構成為可藉由公知的模具開閉機構作開閉之包含有成形模具360的壓機部。此成形模具360係具備藉由壓機部進行開閉之一對的模具(一方設為上模361,另一方設為下模362)所構成。Next, the structure of the resin molding device 350 shown in FIG. 43 and later will be described. The resin molding device 350 includes a press section including a molding die 360 that can be opened and closed by a known die opening and closing mechanism. This molding die 360 is composed of a pair of dies (one is an upper die 361 and the other is a lower die 362) that are opened and closed by a press unit.

又,在作為自動機的樹脂成形裝置350中,壓機部是與未圖示的供給部及收納部一起設置。就供給部而言,係進行將工件W(此處為被成形品)或樹脂R朝向壓機部作供給的準備、處理。在此供給部設有樹脂安置裝置310。又,就收納部而言,係進行對經樹脂成形後的工件W(此處為成形品)收納的準備、處理。又,在供給部、壓機部及收納部間的工件W或樹脂R之搬送方面,使用進行朝壓機部之搬入的裝載機(未圖示)及進行來自於壓機部之搬出的卸載機(未圖示),此等係由公知的機構所構成。此外,模具開閉機構、裝載機及卸載機係由控制部所控制。如此,基於後述那樣在搬送時的理由,以作成將樹脂安置裝置310與樹脂成形裝置350一體具備的構成者較佳,但亦可將此等分開地設置。Moreover, in the resin molding apparatus 350 which is an automatic machine, the press part is provided together with the supply part and the storage part which are not shown in figure. The supply section performs preparation and processing for supplying the workpiece W (here, the molded article) or the resin R to the press section. The supply unit is provided with a resin placement device 310 . In addition, the accommodating part performs preparation and processing for accommodating the resin-molded workpiece W (here, a molded product). In addition, in order to transport the workpiece W or the resin R between the supply section, the press section and the storage section, a loader (not shown) for loading into the press section and unloading for carrying out from the press section are used. machine (not shown), which are composed of well-known mechanisms. In addition, the mold opening and closing mechanism, loader and unloader are controlled by the control department. In this way, for reasons during transportation as described later, it is preferable to have a structure in which the resin placement device 310 and the resin molding device 350 are integrally provided, but they may be provided separately.

上模361係具備上夾持器363、模穴件364及上座365,且被組裝有此等模具塊(例如由合金工具鋼所構成)所構成。在上夾持器363,於厚度方向形成有貫通孔363a,於此貫通孔363a設有模穴件364。模穴件364係固定於上座365而被支持。本實施形態中,上模361雖具備模穴凹部367,但模穴凹部367的側部是由上夾持器363所構成,模穴凹部367的深部是由模穴件364所構成。又,上模361係具備設置在上夾持器363和上座365之間的彈性構件366(例如彈簧)。構成為隔著此彈性構件366使上夾持器363被組裝於上座365且在模具開閉方向可往復移動。此外,在成形模具360關模的狀態,模穴凹部367閉塞而構成模穴C(參照圖44)。此外,在這樣的成形模具360中,藉由被覆模穴凹部367的模具面而防止樹脂R與模具面之接觸以促進脫模,可使用防止來自滑動部分的樹脂漏洩之脫模片。The upper mold 361 is provided with an upper holder 363, a cavity piece 364 and an upper seat 365, and is composed of these mold blocks (for example, made of alloy tool steel) assembled therewith. The upper holder 363 has a through hole 363a formed in the thickness direction, and a cavity member 364 is provided in the through hole 363a. The mold cavity piece 364 is fixed to the upper base 365 and supported. In this embodiment, the upper mold 361 is provided with a cavity recess 367 , but the side portions of the cavity recess 367 are formed by the upper clamper 363 , and the deep portion of the cavity recess 367 is formed by the cavity member 364 . In addition, the upper mold 361 is provided with an elastic member 366 (for example, a spring) provided between the upper holder 363 and the upper seat 365 . The upper holder 363 is assembled to the upper seat 365 via the elastic member 366 and is configured to be reciprocally movable in the mold opening and closing direction. In addition, when the molding die 360 is closed, the cavity recess 367 is closed to form the cavity C (see FIG. 44 ). In addition, in such a molding die 360, the mold surface of the mold cavity recess 367 is covered to prevent contact between the resin R and the mold surface to promote demolding, and a release sheet that prevents resin leakage from the sliding portion can be used.

又,上模361具備密封構件370(例如O環),設在上夾持器363的貫通孔363a的內周面與模穴件364的外周面之間。又,樹脂成形裝置350具備對模穴C進行空氣吸引以形成真空狀態的真空部371(例如真空泵)。真空部371在藉由關模而既形成模穴C的狀態下,經由設置於上模361的上夾持器363之空氣路372對模穴C進行空氣吸引而形成真空狀態。又,樹脂成形裝置350具備加熱上模361的加熱部368。加熱部368(例如筒式加熱器(cartridge heater))係以與模穴件364的下面(模穴凹部367的裏面)平行地延伸的方式設置複數個。此外,真空部371及加熱部368係受控制部所控制。Furthermore, the upper mold 361 is provided with a sealing member 370 (for example, an O-ring) provided between the inner peripheral surface of the through hole 363 a of the upper holder 363 and the outer peripheral surface of the cavity 364 . Moreover, the resin molding apparatus 350 is provided with the vacuum part 371 (for example, a vacuum pump) which sucks air into the mold cavity C and establishes a vacuum state. When the mold cavity C is formed by closing the mold, the vacuum part 371 sucks air into the mold cavity C through the air path 372 provided in the upper clamper 363 of the upper mold 361 to form a vacuum state. Moreover, the resin molding apparatus 350 is provided with the heating part 368 which heats the upper mold 361. A plurality of heating parts 368 (for example, cartridge heaters) are provided so as to extend parallel to the lower surface of the cavity member 364 (the back surface of the cavity recess 367 ). In addition, the vacuum part 371 and the heating part 368 are controlled by the control part.

下模362係具備下夾持器373、嵌件374及下座375,經將此等模具塊安置所構成。在下夾持器373,於厚度方向形成有貫通孔373a,在此貫通孔373a設有嵌件374。嵌件374係固定於下座375而被支持。此下模362中,在嵌件374的上面安置有工件W。又,下模362係具備彈性構件376(例如彈簧),設在下夾持器373與下座375之間。構成為:隔著此彈性構件376使下夾持器373被組裝於下座375且可在模具開閉方向往復移動。The lower mold 362 is provided with a lower holder 373, an insert 374 and a lower seat 375, and is formed by placing these mold blocks. The lower holder 373 has a through hole 373a formed in the thickness direction, and an insert 374 is provided in the through hole 373a. The insert 374 is fixed to the lower seat 375 and supported. In this lower mold 362, the workpiece W is placed on the insert 374. In addition, the lower mold 362 is provided with an elastic member 376 (for example, a spring) and is provided between the lower clamper 373 and the lower seat 375 . The lower clamper 373 is assembled to the lower seat 375 via the elastic member 376 and is configured to be reciprocally movable in the mold opening and closing direction.

又,下模362具備密封構件379(例如O環),設在下夾持器373的貫通孔373a的內周面與嵌件374的外周面之間。又,下模362具備密封構件380(例如O環),設於下夾持器373的上面,在關模之際與上模361的上夾持器363的下面接觸。又,樹脂成形裝置350具備對模穴C進行空氣吸引使成為真空狀態的真空部381(例如真空泵)。真空部381係在關模且已形成模穴C的狀態下,經由設置於下模362的下夾持器373之空氣路382對模穴C進行空氣吸引而形成真空狀態。又,樹脂成形裝置350具備加熱下模362的加熱部378。加熱部378(例如筒式加熱器)係以與嵌件374的上面平行地延伸的方式設置複數個。此外,真空部381及加熱部378係受控制部所控制。 Furthermore, the lower mold 362 is provided with a sealing member 379 (for example, an O-ring) provided between the inner peripheral surface of the through hole 373 a of the lower holder 373 and the outer peripheral surface of the insert 374 . In addition, the lower mold 362 is provided with a sealing member 380 (for example, an O-ring), which is provided on the upper surface of the lower holder 373 and contacts the lower surface of the upper holder 363 of the upper mold 361 when the mold is closed. Moreover, the resin molding apparatus 350 is provided with the vacuum part 381 (for example, a vacuum pump) which sucks air into the mold cavity C and brings it into a vacuum state. When the mold is closed and the mold cavity C is formed, the vacuum part 381 sucks air into the mold cavity C through the air path 382 of the lower holder 373 of the lower mold 362 to form a vacuum state. Moreover, the resin molding apparatus 350 is provided with the heating part 378 which heats the lower mold 362. A plurality of heating parts 378 (for example, cartridge heaters) are provided to extend parallel to the upper surface of the insert 374 . In addition, the vacuum part 381 and the heating part 378 are controlled by the control part.

其次,針對樹脂安置方法(樹脂安置裝置310的動作方法)作說明。首先,在將樹脂R供給(搭載)於工件W上之後,如圖38所示,在已開啟狀態的腔室311安置已被供給樹脂R的工件W。工件W朝向腔室311的安置係藉由裝載機來進行。 Next, the resin placement method (the operation method of the resin placement device 310) will be described. First, after the resin R is supplied (mounted) on the workpiece W, as shown in FIG. 38 , the workpiece W to which the resin R has been supplied is placed in the opened chamber 311 . The placement of the workpiece W toward the chamber 311 is performed by a loader.

作為被安置樹脂R的工件W,例如使用複數個晶片零件400(半導體晶片等)是藉由微細的凸塊被倒裝封裝的基板401(例如形成有配線構造的暫時載體、配線基板及晶圓等)。這樣的工件W中,在晶片零件400與基板401之間形成有狹隘的部位(凸塊高度份量或窄間隙的凸塊間之間隙(gap))。在此情況,工件W成為因基板401上封裝有複數個晶片零件400而具有凹凸部402。本實施形態中,在具有凹凸部402的工件W上,以樹脂R的外端成為比封裝有晶片零件400的位置還外側(參照圖38)且覆蓋凹凸部402的方式供給樹脂R。又,作為樹脂R是使用薄片樹脂(薄片狀的環氧系樹脂等之熱硬化性樹脂)。依據薄片樹脂,即便工件W的大小是大尺寸(例如12吋的晶圓級或例如一邊的長度超過300mm的大型的面板狀物),亦可藉由覆蓋工件W而形成均一地供給之狀態。 As the workpiece W on which the resin R is mounted, for example, a plurality of chip components 400 (semiconductor wafers, etc.) are used, and a substrate 401 (for example, a temporary carrier on which a wiring structure is formed, a wiring substrate, and a wafer) is flip-chip packaged using fine bumps. wait). In such a workpiece W, a narrow portion (a gap corresponding to a bump height or a narrow gap between bumps) is formed between the wafer component 400 and the substrate 401 . In this case, the workpiece W has the uneven portion 402 because a plurality of chip components 400 are packaged on the substrate 401 . In this embodiment, on the workpiece W having the uneven portion 402 , the resin R is supplied so that the outer end of the resin R is outside the position where the chip component 400 is sealed (see FIG. 38 ) and covers the uneven portion 402 . In addition, as the resin R, a sheet resin (a thermosetting resin such as a sheet-shaped epoxy resin) is used. According to the sheet resin, even if the size of the workpiece W is large (for example, a 12-inch wafer level or a large panel-shaped object with a side length exceeding 300 mm), the workpiece W can be covered to achieve a uniform supply state.

此處,薄片樹脂、即樹脂R,例如可使用被保護薄片所保護者。在此情況,於使用單面是被保護薄片所保護者時,亦可將其保護薄片配置於工件W的相反側,連同保護薄片一起安置於工件W。在此情況,藉由保護薄片可防止樹脂R之劣化或髒污等。於此際,只要在將樹脂R安置於工件W後剝離保護薄片即可。又,亦可將薄片樹脂、即樹脂R重疊複數片作使用。又,樹脂R係亦可使用將工件W上具有任意面積的薄片樹脂(樹脂R)排列複數片作使用。 Here, the sheet resin, that is, the resin R, may be protected by a protective sheet, for example. In this case, when one side is protected by a protective sheet, the protective sheet can also be arranged on the opposite side of the workpiece W, and the protective sheet can be placed on the workpiece W together. In this case, the protective sheet can prevent the resin R from deterioration, contamination, and the like. In this case, it is sufficient to peel off the protective sheet after placing the resin R on the workpiece W. Alternatively, a plurality of sheets of resin R, that is, resin R, may be stacked on each other and used. In addition, the resin R system can also be used by arranging a plurality of thin resin sheets (resin R) having any area on the workpiece W.

接著,如圖39所示,以關閉腔室311的狀態,將腔室311的內部311a設為減壓狀態。此時,一邊加熱樹脂R一邊對腔室311的內部311a進行減壓。具體言之,藉由升降部使上腔室部312對下腔室部313逐漸接近。此時,藉由減壓部314事先開始進行空氣吸引,可形成內部311a而直接減壓。又,藉由利用加熱部316事先加熱腔室311的內部311a,加熱工件W與樹脂R,可使樹脂R軟化。此處,藉由在供工件W載置的下腔室部313設有加熱部316,可將工件W利用熱傳導直接加熱而快速加熱。如此,藉由加熱部316加熱工件W上的樹脂R,可縮短在樹脂成形裝置350中的加熱時間以縮短成形時間。此外,藉由事先加熱下腔室部313,可藉其輻射熱將含有上腔室部312的腔室311整體加熱,亦從樹脂R上面加熱而使之容易軟化,使樹脂R的外端在晶片零件400的外側與工件W的基板接觸(參照圖39)。 Next, as shown in FIG. 39 , with the chamber 311 closed, the interior 311 a of the chamber 311 is brought into a reduced pressure state. At this time, while heating the resin R, the inside 311a of the chamber 311 is decompressed. Specifically, the upper chamber part 312 gradually approaches the lower chamber part 313 by the lifting part. At this time, by starting air suction in advance by the decompression part 314, the interior 311a can be formed and the pressure can be directly reduced. Furthermore, by heating the interior 311a of the chamber 311 in advance with the heating unit 316, the workpiece W and the resin R can be heated, so that the resin R can be softened. Here, by providing the heating portion 316 in the lower chamber portion 313 on which the workpiece W is placed, the workpiece W can be directly heated by heat conduction and rapidly heated. In this way, by heating the resin R on the workpiece W by the heating unit 316, the heating time in the resin molding device 350 can be shortened, thereby shortening the molding time. In addition, by heating the lower chamber part 313 in advance, the entire chamber 311 including the upper chamber part 312 can be heated by its radiant heat, and the resin R can also be heated from above to make it easier to soften, so that the outer end of the resin R can be on the wafer. The outer side of the component 400 is in contact with the substrate of the workpiece W (see FIG. 39 ).

藉此,可設成用被減壓的腔室311內的軟化狀態(柔軟狀態)的樹脂R覆蓋工件W的狀態。在此情況,如圖39所示,例如亦可設成樹脂R在工件W的外周等密接於基板401的狀態,被樹脂R與基板401所包夾的空間成為被減壓的狀態。此際,亦可在適宜地進行減壓與加熱之後,加熱部316於既定的時序停止,俾於內部311a的減壓狀態中樹脂R的交聯反應不會過度進行。此外,若作為樹脂R使用的薄片樹脂在大氣環境下為柔軟狀態,則亦可不使用加熱部316加熱。Thereby, the workpiece W can be covered with the resin R in the softened state (soft state) in the depressurized chamber 311 . In this case, as shown in FIG. 39 , for example, the resin R may be in close contact with the substrate 401 on the outer periphery of the workpiece W or the like, and the space sandwiched between the resin R and the substrate 401 may be in a depressurized state. At this time, the heating unit 316 may be stopped at a predetermined timing after decompression and heating are appropriately performed, so that the cross-linking reaction of the resin R does not proceed excessively in the depressurized state of the interior 311a. In addition, if the sheet resin used as the resin R is in a soft state under the atmospheric environment, heating by the heating unit 316 does not need to be performed.

接著,如圖40所示,於關閉腔室311的狀態,使腔室311的內部11a的壓力上升。具體言之,只要是藉由停止減壓部314將腔室311開放而使腔室311的內部311a開放於大氣中即可。此處,在使腔室311的內部311a的壓力上升的情況,不僅開放於大氣中的方法,亦包含參照圖39所說明之為了比減壓狀態的內部311a的壓力高而解除減壓狀態或積極地加壓的情況。如此,因未腔室311的內部311a的壓力相對變高而使樹脂R被按壓於工件W側。又,此際可減低工件W與樹脂R之間隙。本實施形態中,能以沿著凹凸部402的方式使樹脂R密接於工件W。據此,可防止凹凸部402與樹脂R之間隙的發生。Next, as shown in FIG. 40 , with the chamber 311 closed, the pressure in the interior 11 a of the chamber 311 is increased. Specifically, it suffices to open the chamber 311 by stopping the pressure reducing unit 314 so that the interior 311a of the chamber 311 is opened to the atmosphere. Here, when raising the pressure in the interior 311a of the chamber 311, not only the method of opening it to the atmosphere, but also the method of releasing the decompressed state in order to make the pressure higher than the pressure of the interior 311a in the decompressed state as described with reference to FIG. 39 or Aggressively pressurize the situation. In this way, the pressure in the interior 311a of the unchamber 311 becomes relatively high, so that the resin R is pressed against the workpiece W side. In addition, at this time, the gap between the workpiece W and the resin R can be reduced. In this embodiment, the resin R can be brought into close contact with the workpiece W along the uneven portion 402 . Accordingly, the occurrence of gaps between the uneven portion 402 and the resin R can be prevented.

此外,亦可在空氣路315事先連接不同於減壓部314的加壓部(例如壓縮機),而在將減壓部314停止後,藉由加壓部提高腔室311的內部311a之壓力。又,亦可在空氣路315事先連接流量計,用流量計一邊測量一邊調整腔室311的內部311a之壓力。In addition, a pressurizing part (such as a compressor) different from the decompressing part 314 may also be connected to the air path 315 in advance, and after the decompressing part 314 is stopped, the pressure in the interior 311a of the chamber 311 can be increased by the pressurizing part. . Alternatively, a flow meter may be connected to the air path 315 in advance, and the pressure in the interior 311a of the chamber 311 may be adjusted while measuring using the flow meter.

接著,如圖41所示,於關閉腔室311的狀態,亦可冷卻工件W及樹脂R。具體言之,藉由以冷卻部317冷卻下腔室部313,使得位在此表面313a上的工件W的樹脂R冷卻,就算樹脂R具有熱,亦可抑制交聯反應進行,能確保將工件W和樹脂R延緩搬送至成形模具360。此外,若是在加熱樹脂R使之軟化並在覆蓋工件W之後,則亦可利用冷卻部317將樹脂R冷卻。Next, as shown in FIG. 41 , the workpiece W and the resin R can also be cooled while the chamber 311 is closed. Specifically, by cooling the lower chamber portion 313 with the cooling portion 317 to cool the resin R of the workpiece W located on the surface 313a, even if the resin R has heat, the cross-linking reaction can be suppressed and the workpiece can be ensured to be W and resin R are transferred to the molding die 360 in a delayed manner. In addition, after heating the resin R to soften it and covering the workpiece W, the cooling unit 317 may be used to cool the resin R.

接著,如圖42所示,將腔室311設為開啟的狀態。之後,藉由裝載機從腔室311取出工件W。依據這樣的樹脂安置方法,可在已從工件W與樹脂R之間除去空氣的狀態下將樹脂R安置於工件W。亦即,可抑制空氣在安置樹脂時中混入。換言之,可設成在安置樹脂時工件W與樹脂R之間未含有空氣的狀態。如同圖所示,亦可想成在晶片零件400與基板401之間存在有未被樹脂R填充的空間。然而,因為在使此區域減壓後會用熔融的樹脂R覆蓋,成為可維持既從晶片零件400下的空間除去大氣所含有的成分(空氣或水蒸氣)的狀態。Next, as shown in FIG. 42 , the chamber 311 is opened. After that, the workpiece W is taken out from the chamber 311 by the loader. According to such a resin placement method, the resin R can be placed on the workpiece W in a state where air has been removed from between the workpiece W and the resin R. That is, air can be suppressed from being mixed in when placing the resin. In other words, when setting the resin, it is possible to set the state in which air is not contained between the workpiece W and the resin R. As shown in the figure, it can also be imagined that there is a space that is not filled with the resin R between the chip component 400 and the substrate 401 . However, since this area is covered with the molten resin R after depressurizing, the state in which components (air or water vapor) contained in the atmosphere can be maintained is removed from the space under the wafer component 400 .

其次,針對樹脂成形方法(樹脂成形裝置350的動作方法)作說明。首先,如圖43所示,將藉由前述的樹脂安置方法而被供給樹脂R的工件W,往成形模具360搬入。具體言之,藉由裝載機從樹脂安置裝置310朝已開啟模具的成形模具360搬送工件W,安置在下夾持器373的上面。在此情況,如同上述,若樹脂R因冷卻部317而冷卻的話,就算是使用成為既定的溫度硬化會進行的熱硬化性樹脂,亦可防止在搬送中導致硬化進行而使在成形模具360中加熱加壓時變得難以流動那樣的狀態。Next, the resin molding method (the operation method of the resin molding device 350) will be described. First, as shown in FIG. 43 , the workpiece W to which the resin R is supplied by the aforementioned resin placement method is loaded into the molding die 360 . Specifically, the workpiece W is transported from the resin placement device 310 to the molded mold 360 of which the mold has been opened by a loader, and is placed on the upper surface of the lower clamper 373 . In this case, as described above, if the resin R is cooled by the cooling unit 317, even if a thermosetting resin is used that hardens at a predetermined temperature, it can be prevented from being hardened in the mold 360 during transportation. A state in which it becomes difficult to flow when heated and pressurized.

接著,如圖44所示,將成形模具360逐漸關模,將成形模具360的模穴C設為減壓(真空)狀態。具體言之,藉由模具開閉機構使上模361逐漸接近於下模362。藉此,於模穴C收容樹脂R。此時,藉由真空部371事先開始進行空氣吸引,可形成模穴C並直接減壓而設為真空狀態。Next, as shown in FIG. 44 , the molding die 360 is gradually closed, and the cavity C of the molding die 360 is brought into a reduced pressure (vacuum) state. Specifically, the upper mold 361 gradually approaches the lower mold 362 through the mold opening and closing mechanism. Thereby, the resin R is accommodated in the cavity C. At this time, by starting air suction in advance by the vacuum part 371, the mold cavity C can be formed and the pressure can be directly reduced to a vacuum state.

接著,迄至成為既定的成形壓以前,如圖45所示,進一步將成形模具360關模而進行壓縮成形。此時,因為成形模具360被加熱部378加熱到成形溫度,所以樹脂R係被成形模具360加熱、加壓。在此情況,工件W中,在晶片零件400與基板401之間形成有狹隘的部位(凸塊高度的份量或窄間隙的凸塊間之間隙)。即便有這樣的狹隘部位,如同上述,由於從晶片零件400下的空間除去包含於大氣中的成分(空氣或水蒸氣),所以能在未填充的情況下進行填充,可抑制空隙之發生並進行底部填充。之後進行必要充分的加熱加壓,使樹脂R熱硬化並完成成形模具360的模穴C的形狀。Next, until the predetermined molding pressure is reached, as shown in FIG. 45 , the molding die 360 is further closed to perform compression molding. At this time, since the molding die 360 is heated to the molding temperature by the heating unit 378 , the resin R is heated and pressurized by the molding die 360 . In this case, in the workpiece W, a narrow portion (a gap corresponding to the bump height or a narrow gap between the bumps) is formed between the wafer component 400 and the substrate 401 . Even if there is such a narrow place, as mentioned above, since the components (air or water vapor) contained in the atmosphere are removed from the space under the wafer component 400, it can be filled without being filled, and the occurrence of voids can be suppressed and carried out. Bottom padding. Then, necessary and sufficient heating and pressure are applied to thermally harden the resin R and complete the shape of the cavity C of the mold 360 .

接著,如圖46所示,將成形模具360設為模具開啟狀態,從成形模具360搬出工件W(成形品)。具體言之,藉由模具開閉機構使上模361對下模362逐漸離開。從藉由卸載機而開啟模具的成形模具360取出工件W並往收納部搬出。Next, as shown in FIG. 46 , the molding die 360 is set to the mold open state, and the workpiece W (molded product) is unloaded from the molding die 360 . Specifically, the upper mold 361 gradually moves away from the lower mold 362 through the mold opening and closing mechanism. The workpiece W is taken out from the molding die 360 opened by the unloader and carried out to the storage portion.

本實施形態中,在樹脂成形前利用前述的樹脂安置方法抑制空氣混入工件W與樹脂R之間。因此,在工件W(成形品)的樹脂成形部,可抑制因空氣混入所致空隙的發生。又,在工件W中,即使有晶片零件400與基板401間的狹隘的部位,因為空氣的混入受到抑制(除去大氣所含有的空氣或水蒸氣等),故可抑制空隙的發生而確實地進行底部填充。In this embodiment, the above-mentioned resin placement method is used to prevent air from being mixed between the workpiece W and the resin R before resin molding. Therefore, the occurrence of voids due to air mixing in the resin molded portion of the workpiece W (molded article) can be suppressed. In addition, in the workpiece W, even if there is a narrow place between the wafer component 400 and the substrate 401, since the mixing of air is suppressed (air, water vapor, etc. contained in the atmosphere are removed), the occurrence of voids can be suppressed and the work can be performed reliably. Bottom padding.

以上,已依據實施形態具體說明本發明,本發明並未受限於前述實施形態,當然可在不逸脫其要旨的範圍下作各種變更。又,上述實施形態中具體表示的本發明涉及之方法或裝置的各工序或各構成要素,係未必所有都需要,只要在未悖離可獲得各個效果之發明的範圍下都可適宜地作取捨選擇。As mentioned above, the present invention has been specifically described based on the embodiments. However, the present invention is not limited to the above-mentioned embodiments, and various changes can be made without departing from the gist of the invention. In addition, not all of the steps or components of the method or device of the present invention specifically shown in the above embodiments are required, and they can be appropriately selected without departing from the scope of the invention that can achieve the respective effects. select.

例如在作為工件是使用被倒裝接合於基板上的晶片零件之情況,在向基板供給液狀樹脂之際,可設成將基板與晶片零件之間減壓的狀態。因此,例如於壓縮成形中,在其基板與晶片零件之間變得容易填充樹脂,可適切地進行所謂的底部填充。For example, when a wafer component flip-chip bonded to a substrate is used as the workpiece, the pressure between the substrate and the wafer component can be reduced when supplying the liquid resin to the substrate. Therefore, for example, in compression molding, resin can be easily filled between the substrate and the wafer component, and so-called underfilling can be appropriately performed.

又,已針對在上述的實施形態1中於真空狀態(減壓環境氣體下)下供給液狀樹脂R的例子作了說明,但本發明不受此所限。亦即,依據上述的實施形態1所示的樹脂供給裝置,於在腔室的內部從噴嘴朝被供給物吐出(供給)液狀樹脂後,以真空狀態(減壓環境氣體下)排出空氣,亦可防止樹脂內含空氣等之不良狀況。Furthermore, in the above-mentioned Embodiment 1, the example in which the liquid resin R is supplied in a vacuum state (under reduced pressure ambient gas) has been described, but the present invention is not limited thereto. That is, according to the resin supply device shown in the above-described Embodiment 1, after the liquid resin is discharged (supplied) from the nozzle to the object to be supplied inside the chamber, the air is discharged in a vacuum state (under reduced pressure ambient air), It can also prevent undesirable conditions such as air contained in the resin.

又,可想像因以腔室30的內部30a成為高真空度的方式減壓而導致就算用夾管閥24閉塞噴嘴22,儲存於注射器21的液狀樹脂R還是會向腔室30的內部30a吐出那樣的情況。在這樣的情況,以作成將液狀樹脂R拉回注射器21內的構成者較佳。藉此,可防止液狀樹脂R無預期地吐出。例如圖18所示,亦可藉由在注射器21內部將沒有液狀樹脂R的空間(上側的空間)減壓使與藉由腔室30中之減壓而欲抽出液狀樹脂R的力均衡。Furthermore, it is conceivable that even if the nozzle 22 is blocked with the pinch valve 24 due to the pressure reduction in the interior 30a of the chamber 30, the liquid resin R stored in the syringe 21 will still flow into the interior 30a of the chamber 30. Spit out situations like that. In such a case, it is preferable to have a structure that draws the liquid resin R back into the syringe 21 . This prevents the liquid resin R from being discharged unexpectedly. For example, as shown in FIG. 18 , the space (the space on the upper side) without the liquid resin R inside the syringe 21 can be decompressed to equalize the force to extract the liquid resin R by depressurizing the chamber 30 . .

具體言之,如圖18所示,作成具備柱塞軸23a及柱塞密封部23b的柱塞23。柱塞軸23a係前端擴徑且推壓設於注射器21的注射器蓋部21a而將液狀樹脂R吐出。柱塞密封部23b具備柱塞軸23a被插入中央的環狀的構造,藉由與筒狀的注射器本體21b組合,將注射器本體21b內與注射器蓋部21a的空間設為既定的密閉空間。又,柱塞密封部23b具備:用以確保與注射器本體21b的緣部之密封性的密封23b1;用以維持與柱塞軸23a之密封性的密封23b2;及用以對注射器本體21b的內部進行空氣吸引之吸引路23b3。藉此,於注射器21的內部,藉由注射器蓋部21a、注射器本體21b、柱塞軸23a及柱塞密封部23b形成環狀的密閉空間。在既形成這樣的密閉空間的狀態下,藉由經由設於柱塞密封部23b的吸引路23b3利用未圖示的配管或真空泵進行空氣吸引,將此空間減壓拉回注射器蓋部21a,可施加將液狀樹脂R拉回注射器21內的力。Specifically, as shown in FIG. 18 , the plunger 23 including the plunger shaft 23 a and the plunger seal portion 23 b is produced. The front end of the plunger shaft 23a is enlarged in diameter and presses the syringe cap 21a provided on the syringe 21 to discharge the liquid resin R. The plunger seal 23b has an annular structure in which the plunger shaft 23a is inserted into the center. By being combined with the cylindrical syringe body 21b, the space between the syringe body 21b and the syringe cap 21a is set as a predetermined sealed space. In addition, the plunger seal portion 23b is provided with: a seal 23b1 for ensuring sealing with the edge of the syringe body 21b; a seal 23b2 for maintaining sealing with the plunger shaft 23a; and a seal for sealing the inside of the syringe body 21b. Carry out air suction suction path 23b3. Thereby, an annular sealed space is formed inside the syringe 21 by the syringe cover 21a, the syringe body 21b, the plunger shaft 23a, and the plunger sealing portion 23b. With such a sealed space formed, air is sucked through the suction path 23b3 provided in the plunger sealing portion 23b using a pipe or a vacuum pump (not shown) to depressurize the space and pull it back to the syringe cap 21a. A force is applied to draw the liquid resin R back into the syringe 21 .

此外,注射器21係在以注射器本體21b與注射器蓋部21a儲存著液狀樹脂R的狀態下向裝置內供給。因此,例如於圖1所示那樣的位置安置有未使用的注射器21的狀態中,使柱塞23下降並將柱塞軸23a的前端插入注射器本體21b。又,此際以柱塞密封部23b使注射器本體21b的上端的開口部閉塞,可於進行適宜的樹脂吐出後施加使液狀樹脂R返回注射器21內的力。據此,除了可防止液狀樹脂R無預期地吐出以外,即使是沒有無預期地吐出之情況,藉由利用使液狀樹脂R返回注射器21內的力亦可進行斷液。In addition, the syringe 21 is supplied into the device in a state where the liquid resin R is stored in the syringe body 21b and the syringe cap 21a. Therefore, for example, with the unused syringe 21 placed at the position shown in FIG. 1 , the plunger 23 is lowered and the tip of the plunger shaft 23 a is inserted into the syringe body 21 b. At this time, by blocking the opening at the upper end of the syringe body 21b with the plunger sealing portion 23b, a force can be applied to return the liquid resin R into the syringe 21 after appropriate resin discharge. Accordingly, in addition to preventing the liquid resin R from being discharged unexpectedly, even if the liquid resin R is not discharged unexpectedly, the liquid resin R can be cut off by utilizing the force that returns the liquid resin R into the syringe 21 .

又,作為將液狀樹脂R拉回注射器21內的構成,不僅是依據上述那樣的減壓的方法,亦可作成將注射器蓋部21a以機械方式拉回的構成。在此情況,藉由作成使柱塞軸23a的前端對注射器蓋部21a螺合或嵌合等而任意地卡合的構成,也能利用柱塞軸23a將注射器蓋部21a直接拉回。例如可藉由在柱塞軸23a的前端設置陽螺紋並在注射器蓋部21a的主面設置陰螺紋,使此等螺合。當然,若可任意卡合則不受此種構成所局限,也可作成將柱塞軸23a的前端作成T字狀,使之於在注射器蓋部21a上適宜地設置的溝部旋轉並卡合等。Furthermore, as a structure for drawing the liquid resin R back into the syringe 21, not only the pressure reduction method as described above, but also a structure in which the syringe cap 21a is drawn back mechanically may be used. In this case, by arbitrarily engaging the tip of the plunger shaft 23a with the syringe cap 21a by screwing or fitting the plunger shaft 23a, the syringe cap 21a can be directly pulled back by the plunger shaft 23a. For example, these can be screwed together by providing a male thread on the front end of the plunger shaft 23a and a female thread on the main surface of the syringe cap 21a. Of course, if it can be arbitrarily engaged, it is not limited to this structure. The front end of the plunger shaft 23a can also be made into a T-shape, and the front end of the plunger shaft 23a can be rotated and engaged with a groove portion appropriately provided on the syringe cover 21a. .

例如圖16、圖17、圖22、圖23、圖33至圖36所示那樣的各種樹脂供給方法,作為工件W不僅是搭載晶片零件200的載體201,對於在平坦的工件或圖28所示那樣的下模穴成形中以確保離形成或防止樹脂漏洩等之目的所使用的脫模片也可適用。For example, in various resin supply methods as shown in FIGS. 16 , 17 , 22 , 23 , and 33 to 36 , the workpiece W is not only the carrier 201 on which the wafer component 200 is mounted, but also a flat workpiece or a flat workpiece as shown in FIG. 28 A release sheet used for the purpose of ensuring separation formation or preventing resin leakage in such lower cavity molding can also be applied.

在前述實施形態3等之實施形態中已針對在減壓後使吐出樹脂R的噴嘴122的位置移動的構成作了說明,但本發明不受此所限。例如針對藉由使吐出樹脂R的噴嘴122的位置移動以任意的形狀將樹脂R塗布於工件W上或脫模片上的構成,亦可在未減壓下供給樹脂R。又,例如亦能以任意的形狀將樹脂R塗布於脫模片上,藉此也可排出在脫模片與樹脂R之間隙所包夾的空氣或樹脂R內的空氣。又,作為具備複數個注射器121或噴嘴122的構成,亦可作成使塗布時間縮短的構成。例如藉由設置複數個注射器121或噴嘴122且使之對脫模片一邊相對移動一邊進行塗布,可縮短對脫模片之塗布時間。In the embodiments such as Embodiment 3 described above, the structure in which the position of the nozzle 122 that discharges the resin R is moved after the pressure is reduced has been described, but the present invention is not limited thereto. For example, in a structure in which the resin R is applied to the workpiece W or the release sheet in an arbitrary shape by moving the position of the nozzle 122 that discharges the resin R, the resin R may be supplied without reducing the pressure. Furthermore, for example, the resin R can be coated on the release sheet in any shape, and thereby the air trapped in the gap between the release sheet and the resin R or the air in the resin R can be discharged. Moreover, as a structure provided with a plurality of syringes 121 or nozzles 122, it is also possible to shorten the coating time. For example, by providing a plurality of syringes 121 or nozzles 122 and coating the release sheet while moving relative to each other, the coating time for the release sheet can be shortened.

又,例如圖33至圖36等所示那樣的各種樹脂供給方法,係在工件W中既定部位具有空氣可流出的部分之塗布式樣,在進行樹脂R的吐出之際即使未減壓,例如藉由在被減壓的模具內使空氣一邊流出(排出)一邊進行成形,可進行防止空隙的發生之成形。In addition, various resin supply methods such as those shown in FIGS. 33 to 36 are coating patterns in which a predetermined portion of the workpiece W has a portion through which air can flow out. Even if the pressure is not reduced when the resin R is ejected, for example, by By allowing air to flow out (discharge) from the depressurized mold while molding, molding can be performed to prevent the occurrence of voids.

前述實施形態3中,作為腔室蓋的荷重支承物是使用滾珠滾輪,但例如可使用藉由來自壓縮機的空氣承受荷重的構成。此外,亦可將設置腔室蓋的荷重支承物之構成利用在圖1至圖15所示那樣的樹脂供給裝置。例如藉由在移動於既定方向的上腔室部31所設的密封部33之內周或外周,將滾珠滾輪設為荷重支承物,在同圖所示那樣的構成中亦可防止密封部33的壓扁而順暢地動作。In the above-mentioned Embodiment 3, the ball roller is used as the load support of the chamber cover. However, for example, a structure in which the load is received by air from the compressor may be used. In addition, a resin supply device as shown in FIGS. 1 to 15 may be used to provide a load support for the chamber cover. For example, by providing a ball roller as a load support on the inner or outer periphery of the sealing portion 33 provided in the upper chamber portion 31 that moves in a predetermined direction, the sealing portion 33 can be prevented from being prevented in the structure as shown in the figure. of flattening and smooth movement.

又,雖針對在前述任一實施形態中都將注射器21等配置成鉛直方向(縱向)的構成例作了說明,但本發明不受此所限。例如亦可將注射器21等配置於水平方方向(橫向)。藉此,可降低裝置的高度。Moreover, although the structure example in which the syringe 21 etc. are arrange|positioned in the vertical direction (longitudinal direction) was demonstrated in any of the said embodiments, this invention is not limited to this. For example, the syringe 21 and the like may be arranged in the horizontal direction (lateral direction). Thereby, the height of the device can be reduced.

前述實施形態8中,已針對作為覆蓋工件的樹脂是使用薄片樹脂的情況作了說明。惟不受此所局限,樹脂方面使用顆粒樹脂,亦可作成在經加熱、熔融而藉由表面張力一體化的狀態(平均的狀態)下覆蓋工件。據此,可從顆粒樹脂間去除空氣並以樹脂覆蓋工件。又,亦可將顆粒樹脂預先加壓並形成薄片狀而作為薄片樹脂使用。In the eighth embodiment described above, the case where a sheet resin is used as the resin covering the workpiece has been described. However, it is not limited to this. For resin, granular resin can be used to cover the workpiece in a state (average state) that is heated, melted and integrated by surface tension. This removes air from between the resin particles and covers the workpiece with resin. Alternatively, the granular resin may be pressed in advance and formed into a sheet shape to be used as a sheet resin.

又,前述實施形態8中,針對作為被供給物的一例之工件是使用複數個晶片零件被倒裝封裝的基板之情況作了說明。惟不受此所局限,作為工件也可使用平坦的放熱板或屏蔽板等,再者此等亦可為具有用於熱傳導或電導的凹凸部者。再者,作為工件,亦可是未設置晶片而僅搭載著凸塊的晶圓,也能作成在環構件的單面貼附黏著膜且於黏著膜上貼附晶片構件等之構成。在此等之情況中亦可防止工件與薄片樹脂產生間隙,即便有間隙亦可除去大氣所含有的空氣或水蒸氣等而可防止未填充的情況。Furthermore, in the eighth embodiment described above, the case where the workpiece as an example of the object to be supplied is a substrate flip-chip packaged using a plurality of chip parts. However, it is not limited to this. As the workpiece, a flat heat radiation plate or a shielding plate can also be used. Furthermore, these can also have concave and convex portions for heat conduction or electrical conduction. Furthermore, the workpiece may be a wafer on which only bumps are mounted without a chip. Alternatively, an adhesive film may be attached to one side of the ring member and the chip member may be attached to the adhesive film. In such cases, gaps between the workpiece and the resin sheet can be prevented. Even if there is a gap, air, water vapor, etc. contained in the atmosphere can be removed to prevent non-filling.

再者,被供給物亦可為脫模片。在此情況,例如作為將圖43所示的樹脂成形裝置350上下反轉那種構成,可考慮將脫模片往下模供給的構成。在此情況,可考慮於脫模片上安置薄片樹脂、即樹脂R之後,往樹脂成形裝置350搬入而對另外搬入的工件W進行樹脂成形。即使在此情況,就算在脫模片與樹脂R之間有夾入空氣亦可予以除去,故而可防止產生殘留空氣膨脹而發生在成形品上留下痕跡的那樣種不良狀況之成形。Furthermore, the object to be supplied may also be a release sheet. In this case, for example, as a structure in which the resin molding device 350 shown in FIG. 43 is turned upside down, a structure in which the release sheet is supplied to the lower mold can be considered. In this case, it is conceivable to place the sheet of resin, that is, the resin R on the release sheet, and then carry the workpiece W into the resin molding device 350 to perform resin molding on the workpiece W that has been carried separately. Even in this case, even if there is air trapped between the release sheet and the resin R, it can be removed. Therefore, it is possible to prevent the occurrence of molding defects such as residual air expanding and leaving marks on the molded product.

22:噴嘴 30:腔室 30a:內部 R:液狀樹脂 W:工件(被供給物)22:Nozzle 30: Chamber 30a: Internal R: liquid resin W: workpiece (supplied object)

圖1係用以說明本發明的一實施形態涉及之樹脂供給裝置之圖。 圖2係用以說明接於圖1後之動作的樹脂供給裝置之圖。 圖3係用以說明接於圖2後之動作的樹脂供給裝置之圖。 圖4係用以說明接於圖3後之動作的樹脂供給裝置之圖。 圖5係用以說明接於圖4後之動作的樹脂供給裝置之圖。 圖6係用以說明接於圖5後之動作的樹脂供給裝置之圖。 圖7係用以說明接於圖6後之動作的樹脂供給裝置之圖。 圖8係用以說明接於圖7後之動作的樹脂供給裝置之圖。 圖9係用以說明本發明的其他實施形態涉及之樹脂供給裝置之圖。 圖10係用以說明接於圖9後之動作的樹脂供給裝置之圖。 圖11係用以說明接於圖10後之動作的樹脂供給裝置之圖。 圖12係用以說明接於圖11後之動作的樹脂供給裝置之圖。 圖13係用以說明接於圖12後之動作的樹脂供給裝置之圖。 圖14係用以說明接於圖13後之動作的樹脂供給裝置之圖。 圖15係用以說明接於圖14後之動作的樹脂供給裝置之圖。 圖16係已被供給液狀樹脂之被供給物的俯視圖。 圖17係已被供給液狀樹脂之被供給物的側視圖。 圖18係用以說明注射器之構造的一例之圖。 圖19係用以說明本發明其他實施形態涉及之樹脂供給裝置之圖,顯示被供給物供給至腔室的狀態。 圖20係用以說明接於圖19後之動作的樹脂供給裝置之圖,顯示腔室被關閉的狀態。 圖21係用以說明接於圖20後之動作的樹脂供給裝置之圖,顯示正供給著樹脂的狀態。 圖22係用以說明朝向圓板形狀的被供給物之樹脂的塗布式樣之圖,圖22A係表示旋渦,圖22B係表示格子的狀態。 圖23係用以說明朝向面板形狀的被供給物之樹脂的塗布式樣之圖,顯示圖23A為中心點,圖23B為多點,圖23C為大旋渦,圖23D為小旋渦,圖23E為角旋渦,圖23F為格子,圖23G為放射線的狀態。 圖24係用以說明朝向被供給物的主要部分(晶片零件)之樹脂的塗布式樣之圖,圖24A顯示晶片零件的全周塗布,圖24B顯示在未將鄰接的晶片零件間覆蓋下作塗布,圖24C顯示在將鄰接的晶片零件間覆蓋並作塗布的狀態。 圖25係用以說明本發明其他實施形態涉及之樹脂供給裝置之圖,顯示進行重量測量的狀態。 圖26係用以說明接於圖25後之動作的樹脂供給裝置之圖,顯示塗布樹脂的狀態。 圖27係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示圖27A係被供給物已被供給樹脂的狀態,圖27B係在成形模具安置有被供給物的狀態,圖27C係成形模具內被減壓的狀態,圖27D係被供給物被夾持的狀態,圖27E係在模穴(cavity)內使樹脂被熱硬化的狀態。 圖28係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示圖28A係被供給物已被供給樹脂的狀態,圖28B係於被供給物被底部填充的狀態,圖28C係在成形模具安置有被供給物的狀態,圖28D係成形模具內被減壓的狀態,圖28E係在模穴內使樹脂被熱硬化的狀態。 圖29係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示被供給樹脂前之被供給物的狀態。 圖30係用以說明接於圖29後的樹脂成形方法之圖,顯示被供給旋渦狀樹脂後之被供給物的狀態。 圖31係用以說明接於圖30後的樹脂成形方法之圖,顯示被樹脂壓縮中的被供給物之狀態。 圖32係用以說明接於圖31後的樹脂成形方法之圖,顯示成形有樹脂的被供給物之狀態。 圖33係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示使旋渦狀的一部分較細地供給樹脂後之狀態。 圖34係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示間歇地呈旋渦狀被供給樹脂後之被供給物之狀態。 圖35係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示間歇地呈直線狀被供給樹脂後之被供給物之狀態。 圖36係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示對晶片零件間以多點供給樹脂後之被供給物之狀態。 圖37係用以說明本發明其他實施形態涉及之樹脂成形裝置之圖。 圖38係用以說明本發明其他實施形態涉及之樹脂安置裝置之圖。 圖39係用以說明接於圖38後之動作中的樹脂安置裝置之圖。 圖40係用以說明接於圖39後之動作中的樹脂安置裝置之圖。 圖41係用以說明接於圖40後之動作中的樹脂安置裝置之圖。 圖42係用以說明接於圖41後之動作中的樹脂安置裝置之圖。 圖43係用以說明本發明其他實施形態涉及之樹脂成形裝置的主要部分之圖。 圖44係用以說明接於圖43後之動作中的樹脂成形裝置的主要部分之圖。 圖45係用以說明接於圖44後之動作中的樹脂成形裝置的主要部分之圖。 圖46係用以說明接於圖45後之動作中的樹脂成形裝置的主要部分之圖。FIG. 1 is a diagram illustrating a resin supply device according to an embodiment of the present invention. FIG. 2 is a diagram for explaining the resin supply device following the operation of FIG. 1 . FIG. 3 is a diagram for explaining the resin supply device following the operation following FIG. 2 . FIG. 4 is a diagram for explaining the resin supply device following the operation following FIG. 3 . FIG. 5 is a diagram for explaining the resin supply device following the operation following FIG. 4 . FIG. 6 is a diagram for explaining the resin supply device following the operation after FIG. 5 . FIG. 7 is a diagram for explaining the resin supply device following the operation of FIG. 6 . FIG. 8 is a diagram for explaining the resin supply device following the operation following FIG. 7 . FIG. 9 is a diagram illustrating a resin supply device according to another embodiment of the present invention. FIG. 10 is a diagram for explaining the resin supply device following the operation after FIG. 9 . FIG. 11 is a diagram for explaining the resin supply device following the operation following FIG. 10 . FIG. 12 is a diagram for explaining the resin supply device following the operation after FIG. 11 . FIG. 13 is a diagram for explaining the resin supply device following the operation of FIG. 12 . FIG. 14 is a diagram for explaining the resin supply device following the operation following FIG. 13 . FIG. 15 is a diagram for explaining the resin supply device following the operation following FIG. 14 . Fig. 16 is a top view of the object to which liquid resin has been supplied. Fig. 17 is a side view of the object to which liquid resin has been supplied. Fig. 18 is a diagram illustrating an example of the structure of a syringe. FIG. 19 is a diagram illustrating a resin supply device according to another embodiment of the present invention, showing a state in which a material to be supplied is supplied to the chamber. Fig. 20 is a diagram for explaining the operation of the resin supply device following Fig. 19, showing a state in which the chamber is closed. FIG. 21 is a diagram for explaining the operation of the resin supply device after FIG. 20 , showing a state in which resin is being supplied. FIG. 22 is a diagram illustrating a pattern of applying resin to a disk-shaped object to be supplied. FIG. 22A shows a vortex, and FIG. 22B shows a grid state. Fig. 23 is a diagram illustrating the coating pattern of resin toward a panel-shaped object to be supplied. Fig. 23A is a center point, Fig. 23B is a multi-point, Fig. 23C is a large vortex, Fig. 23D is a small vortex, and Fig. 23E is a corner. For the vortex, Figure 23F shows the grid, and Figure 23G shows the state of radiation. Figure 24 is a diagram illustrating the coating pattern of resin toward the main part of the object to be supplied (wafer component). Figure 24A shows coating of the entire circumference of the wafer component, and Figure 24B shows coating without covering the adjacent wafer components. , Figure 24C shows a state in which adjacent wafer parts are covered and coated. FIG. 25 is a diagram illustrating a resin supply device according to another embodiment of the present invention, showing a state in which weight measurement is performed. FIG. 26 is a diagram for explaining the operation of the resin supply device after FIG. 25 , showing a state in which resin is applied. Fig. 27 is a diagram for explaining a resin molding method according to another embodiment of the present invention. Fig. 27A shows a state in which the object to be supplied has been supplied with resin, Fig. 27B shows a state in which the object to be supplied is placed in the molding die, and Fig. 27C shows The pressure inside the mold is reduced. Figure 27D shows a state in which the object to be supplied is clamped. Figure 27E shows a state in which the resin is thermally hardened in the cavity. FIG. 28 is a diagram for explaining a resin molding method according to another embodiment of the present invention. FIG. 28A shows a state in which the object to be supplied has been supplied with resin, FIG. 28B shows a state in which the object to be supplied is underfilled, and FIG. 28C shows a state in which the object to be supplied is underfilled. The molding die is in a state where the object to be supplied is placed. FIG. 28D shows a state in which the pressure in the molding die is reduced, and FIG. 28E shows a state in which the resin is thermally hardened in the mold cavity. FIG. 29 is a diagram for explaining a resin molding method according to another embodiment of the present invention, showing the state of the object before the resin is supplied. Fig. 30 is a diagram for explaining the resin molding method following Fig. 29, showing the state of the object after the spiral resin is supplied. Fig. 31 is a diagram for explaining the resin molding method following Fig. 30, showing the state of the object being supplied being compressed by the resin. Fig. 32 is a diagram for explaining the resin molding method following Fig. 31, showing a state in which the resin is molded into the supplied object. 33 is a diagram for explaining a resin molding method according to another embodiment of the present invention, showing a state in which resin is supplied to a spiral portion in a finer shape. 34 is a diagram for explaining a resin molding method according to another embodiment of the present invention, showing the state of the object after resin is intermittently supplied in a spiral shape. 35 is a diagram for explaining a resin molding method according to another embodiment of the present invention, showing the state of the object after resin is intermittently supplied linearly. 36 is a diagram for explaining a resin molding method according to another embodiment of the present invention, showing the state of the object to be supplied after resin is supplied between wafer parts at multiple points. Fig. 37 is a diagram illustrating a resin molding device according to another embodiment of the present invention. Fig. 38 is a diagram illustrating a resin placement device according to another embodiment of the present invention. Fig. 39 is a diagram for explaining the resin placement device in the operation following Fig. 38. Fig. 40 is a diagram for explaining the resin placement device in the operation following Fig. 39. Fig. 41 is a diagram for explaining the resin placement device in the operation following Fig. 40. Fig. 42 is a diagram for explaining the resin placement device in the operation following Fig. 41. Fig. 43 is a diagram illustrating the main part of a resin molding apparatus according to another embodiment of the present invention. Fig. 44 is a diagram for explaining the main part of the resin molding device in the operation following Fig. 43. Fig. 45 is a diagram for explaining the main part of the resin molding device in the operation following Fig. 44. Fig. 46 is a diagram for explaining the main part of the resin molding device in the operation following Fig. 45.

10:樹脂供給裝置 10: Resin supply device

11:控制部 11:Control Department

20:吐出部 20: spitting part

21:注射器 21: syringe

22:噴嘴 22:Nozzle

23:柱塞 23:Plunger

24:夾管閥 24:Pinch valve

30:腔室 30: Chamber

30a:內部 30a: Internal

31:上腔室部 31: Upper chamber part

31a:貫通突起部 31a: Penetrating protrusion

32:下腔室部 32: Lower chamber part

32a:表面 32a: Surface

32b:下沈部 32b: sinking part

33:密封部 33:Sealing part

34:吐出保持部 34: spit out holding part

35:密封部 35:Sealing part

36:密封部 36:Sealing part

40:重量計 40: Weight meter

41:真空部 41:Vacuum Department

42:空氣路 42:Air path

50:腔室驅動部 50: Chamber drive unit

51:保持部 51:Maintenance Department

52:第1軌道 52:Track 1

53:第1滑件 53: 1st slider

54:第1馬達 54: 1st motor

70:噴嘴升降驅動部 70: Nozzle lift drive unit

72:第2軌道 72:Track 2

73:第2滑件 73: 2nd slider

74:第2馬達 74: 2nd motor

80:吐出驅動部 80: Discharge drive unit

82:第3軌道 82:Track 3

83:第3滑件 83: 3rd slider

84:第3馬達 84:3rd motor

W:工件 W: workpiece

R:液狀樹脂 R: liquid resin

Claims (1)

一種樹脂成形方法,其特徵為具備:藉由樹脂安置方法將被供給有樹脂的被供給物搬入成形模具,且在被加熱到成形溫度之前述成形模具的模穴內接觸前述樹脂並予以加熱加壓使之熱硬化的工序,前述樹脂安置方法係將在前述成形模具的模穴內加熱加壓且以充滿該模穴的空間地熱硬化成該模穴的形狀之前述樹脂安置於作為前述被供給物的工件,前述樹脂安置方法包含:(a)將作為前述樹脂使用的薄片樹脂供給至前述被供給物上之工序;(b)在前述(a)工序之後,向開啟狀態的腔室安置前述被供給物之工序;(c)在前述(b)工序之後,將前述腔室設為關閉狀態,一邊加熱前述樹脂一邊對前述腔室的內部進行減壓,於既定的時序停止加熱並冷卻樹脂,俾使前述樹脂的交聯反應不會過度進行之工序;(d)在前述(c)工序之後,使前述腔室的內部的壓力上升之工序;及(e)在前述(d)工序之後,將前述腔室設為開啟狀態,取出前述被供給物之工序,前述工件係由封裝有晶片零件的基板構成,在前述(a)工序中,以前述薄片樹脂的外端成為比封裝有前述晶片零件的位置還外側之方式供給前述薄片樹脂,在前述(c)工序中,被加熱的前述薄片樹脂的外端在前述晶片零件的外側與前述工件的前述基板接觸, 在前述(d)工序中,在前述薄片樹脂的外端與前述基板接觸的狀態下,藉由對前述薄片樹脂施加壓力,使前述薄片樹脂成為順著由前述基板與前述晶片零件所構成的凹凸部之狀態。 A resin molding method, characterized by the following steps: carrying a supplied object supplied with resin into a molding mold by a resin placement method, and contacting and heating the resin in a cavity of the molding mold before being heated to a molding temperature. In the process of pressing and thermally hardening, the resin placement method is to heat and press the cavity of the molding mold and thermally harden the cavity into the shape of the mold cavity by filling the space of the mold cavity. The resin placement method includes: (a) the step of supplying the sheet resin used as the resin to the supplied object; (b) after the step (a), placing the resin in the opened chamber. The process of supplying the object; (c) After the aforementioned process (b), the chamber is closed, the inside of the chamber is depressurized while heating the resin, and the heating is stopped at a predetermined timing to cool the resin. , a process so that the cross-linking reaction of the resin does not proceed excessively; (d) after the process (c), a process of increasing the pressure inside the chamber; and (e) after the process (d), , the process of opening the chamber and taking out the supplied object. The workpiece is composed of a substrate on which a chip component is packaged. In the process (a), the outer end of the resin sheet is made larger than the one on which the chip component is packaged. The resin sheet is supplied so that the position of the wafer component is outward, and in the step (c), the outer end of the heated resin sheet contacts the substrate of the workpiece on the outside of the wafer component, In the step (d), by applying pressure to the resin sheet while the outer end of the resin sheet is in contact with the substrate, the resin sheet conforms to the unevenness formed by the substrate and the wafer component. The status of the department.
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