TWI746268B - Resin supply device and resin molding device - Google Patents

Resin supply device and resin molding device Download PDF

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Publication number
TWI746268B
TWI746268B TW109140035A TW109140035A TWI746268B TW I746268 B TWI746268 B TW I746268B TW 109140035 A TW109140035 A TW 109140035A TW 109140035 A TW109140035 A TW 109140035A TW I746268 B TWI746268 B TW I746268B
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resin
chamber
workpiece
state
supplied
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TW109140035A
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Chinese (zh)
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TW202114844A (en
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中澤英明
村松吉和
池田正信
藤澤雅彥
川口正樹
北村秀樹
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日商山田尖端科技股份有限公司
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Priority claimed from JP2016105543A external-priority patent/JP6431871B2/en
Priority claimed from JP2016105600A external-priority patent/JP6721412B2/en
Priority claimed from JP2017032726A external-priority patent/JP6730206B2/en
Application filed by 日商山田尖端科技股份有限公司 filed Critical 日商山田尖端科技股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/02Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • B29C39/10Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of definite length, i.e. discrete articles incorporating preformed parts or layers, e.g. casting around inserts or for coating articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/22Component parts, details or accessories; Auxiliary operations
    • B29C39/42Casting under special conditions, e.g. vacuum

Abstract

提供一種可防止樹脂內含空氣等之不良狀況的技術。 Provides a technology that can prevent undesirable conditions such as air in the resin.

對腔室(30)的內部(30a)進行抽真空。接著,在成為真空狀態的腔室(30)的內部(30a)從噴嘴(22)朝被供給物、即工件(W)吐出液狀樹脂(R)。接著,在停止液狀樹脂(R)的吐出,停止腔室(30)的內部(30a)的抽真空後,在腔室(30)的內部(30a)使噴嘴(22)往復移動。 The inside (30a) of the chamber (30) is evacuated. Next, the liquid resin (R) is discharged from the nozzle (22) to the workpiece (W), which is the workpiece (W), in the interior (30a) of the chamber (30) in a vacuum state. Next, after stopping the discharge of the liquid resin (R) and stopping the vacuuming of the inside (30a) of the chamber (30), the nozzle (22) is reciprocated in the inside (30a) of the chamber (30).

Description

樹脂供給裝置及樹脂成形裝置 Resin supply device and resin molding device

本發明係有關一種樹脂供給技術、樹脂成形技術及樹脂安置技術。 The present invention relates to a resin supply technology, resin molding technology and resin placement technology.

日本國特開2012-126075號公報(以下稱為「專利文獻1」)記載一種液狀樹脂供給裝置。此液狀樹脂供給裝置係將填充於注射器的液狀樹脂從管嘴(tube nozzle)向工件吐出並供給者。 Japanese Patent Application Laid-Open No. 2012-126075 (hereinafter referred to as "Patent Document 1") describes a liquid resin supply device. This liquid resin supply device discharges and supplies the liquid resin filled in the syringe from a tube nozzle to the workpiece.

日本國特開2007-111862號公報(以下稱為「專利文獻2」)記載一種真空分配裝置。此真空分配裝置係將被塗布品配置於真空室內,於真空環境氣體下供給液狀樹脂者。又,此真空分配裝置為防止因液體從噴嘴懸垂所致使裝置髒污而在真空腔室外部設有懸垂液體支承容器。 Japanese Patent Application Laid-Open No. 2007-111862 (hereinafter referred to as "Patent Document 2") describes a vacuum distribution device. This vacuum distribution device arranges the product to be coated in a vacuum chamber and supplies liquid resin under a vacuum atmosphere. In addition, this vacuum distribution device is provided with a suspension liquid support container outside the vacuum chamber in order to prevent the device from being dirty due to the suspension of liquid from the nozzle.

日本國特開2007-307843號公報(以下稱為「專利文獻3」)記載一種使用薄片樹脂將工件(被成形品)進行樹脂模製的方法。此處係在將成形模具開模且安置工件後,以覆蓋工件的樹脂模製區域的方式將薄片樹脂供給至工件上。 Japanese Patent Application Laid-Open No. 2007-307843 (hereinafter referred to as "Patent Document 3") describes a method of resin-molding a workpiece (a molded article) using sheet resin. Here, after the molding die is opened and the workpiece is set, the sheet resin is supplied to the workpiece so as to cover the resin molding area of the workpiece.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

專利文獻1 日本國特開2012-126075號公報 Patent Document 1 Japanese Patent Application Publication No. 2012-126075

專利文獻2 日本國特開2007-111862號公報 Patent Document 2 Japanese Patent Application Publication No. 2007-111862

專利文獻3 日本國特開2007-307843號公報 Patent Document 3 Japanese Patent Application Publication No. 2007-307843

[發明欲解決之課題][The problem to be solved by the invention]

在對被供給物(例如工件或薄膜)進行樹脂成形時,使用專利文獻1所記載之液狀樹脂供給裝置可對被供給物上供給液狀樹脂。然而,例如當對作為被供給物之安裝有複數個晶片零件(晶片狀的電子零件)的基板、即工件供給液狀樹脂時,有時會有覆蓋複數個晶片零件的液狀樹脂成為水珠狀的塊之情況。關於這點,會導致在基板和液狀樹脂之間殘留空氣,結果容易在成形品上發生未填充的問題。再者,在作為工件的基板上被倒裝接合的晶片零件中,有無法適切地進行所謂底部填充(underfill)之虞。When resin molding is performed on an object (for example, a workpiece or a film), the liquid resin supply device described in Patent Document 1 can be used to supply liquid resin to the object. However, for example, when liquid resin is supplied to a substrate on which a plurality of chip components (wafer-shaped electronic components) are mounted as a workpiece, that is, a workpiece, the liquid resin covering the plurality of chip components may become water droplets. The situation of the shape of the block. In this regard, air will remain between the substrate and the liquid resin, and as a result, the molded product will easily become unfilled. In addition, there is a possibility that so-called underfilling may not be appropriately performed in wafer parts that are flip-chip bonded on a substrate as a work.

於是,針對液狀樹脂之供給,並非如專利文獻1所載之技術是在大氣環境下,而是可考慮如專利文獻2所記載之技術是在真空環境氣體下進行而除去殘留空氣。然而,專利文獻2所記載的技術,因為是在使真空腔室開放於大氣中後使液體懸垂容器移動至噴嘴下之構成(特別參照其說明書段落[0026]),所以會有在工件上的液狀樹脂附著灰塵之虞。Therefore, for the supply of the liquid resin, the technique described in Patent Document 1 is not in an atmospheric environment, but the technique described in Patent Document 2 can be considered to be carried out under a vacuum atmosphere to remove residual air. However, the technique described in Patent Document 2 is a structure in which the liquid suspension container is moved under the nozzle after the vacuum chamber is opened to the atmosphere (refer to the paragraph [0026] of the specification in particular), so there may be a problem on the workpiece. Liquid resin may adhere to dust.

本發明的一目的在於:提供可防止樹脂內含空氣等之不良狀況的技術。本發明的一目的及其他目的以及新穎特徵從本說明書的記述及附件的圖面即可明瞭。An object of the present invention is to provide a technology that can prevent the undesirable conditions such as air contained in the resin. One objective, other objectives, and novel features of the present invention can be understood from the description of this specification and the attached drawings.

例如本發明的其他目的在於:提供於樹脂安置中抑制空氣混入的技術。如專利文獻3所記載,當向安置於模具開啟狀態的成形模具上的工件上供給薄片樹脂時,因藉由加熱器被預先設定為成形溫度的成形模具之輻射熱而導致薄片樹脂軟化。因此,例如在作為具有凹凸部的工件是使用安裝有複數個晶片零件的基板之情況,會有在覆蓋晶片零件的薄片樹脂與基板之間捲入空氣的狀態使薄片樹脂軟化之虞。在此情況,會有因成形品的樹脂成形部有空氣混入而導致產生空隙(void)之虞。 [解決課題之手段]For example, another object of the present invention is to provide a technique for suppressing air mixing during resin installation. As described in Patent Document 3, when sheet resin is supplied to a workpiece placed on a forming mold in an open state, the sheet resin is softened due to the radiant heat of the forming mold set to the molding temperature by a heater. Therefore, for example, when a substrate on which a plurality of wafer parts are mounted is used as a work having uneven portions, there is a possibility that the sheet resin may be softened in a state where air is drawn between the sheet resin covering the wafer parts and the substrate. In this case, air may enter the resin molded part of the molded product, which may cause voids. [Means to solve the problem]

簡單地說明本案揭示的發明中之具代表性者之概要如下。A brief description of the representative ones of the inventions disclosed in this case is as follows.

本發明的一解決手段涉及之樹脂供給方法,其特徵為包含: (a)對腔室的內部進行抽真空之工序; (b)在成為真空狀態的前述腔室的前述內部從噴嘴朝被供給物吐出液狀樹脂之工序;及 (c)在停止前述液狀樹脂之吐出且停止前述腔室的前述內部的抽真空後,在前述腔室的前述內部進行前述噴嘴的斷液之工序。 更佳為:前述(c)工序中,在停止前述液狀樹脂的吐出且停止前述腔室的前述內部的抽真空後,在前述腔室的前述內部使前述噴嘴往復移動。據此,可防止樹脂內含空氣等之不良狀況。The resin supply method related to a solution of the present invention is characterized by including: (a) The process of vacuuming the inside of the chamber; (b) A step of discharging liquid resin from a nozzle toward the object to be supplied from the inside of the chamber in a vacuum state; and (c) After stopping the discharge of the liquid resin and stopping the evacuation of the inside of the chamber, the process of shutting off the nozzle is performed in the inside of the chamber. More preferably, in the step (c), after stopping the discharge of the liquid resin and stopping the vacuuming of the inside of the chamber, the nozzle is reciprocated in the inside of the chamber. Accordingly, it is possible to prevent defects such as air in the resin.

此處,更佳為:前述(b)工序中,藉由設於前述腔室的前述內部之重量計一邊測量前述液狀樹脂的重量一邊吐出前述液狀樹脂。據此,可正確地測量液狀樹脂的重量。Here, it is more preferable that in the step (b), the liquid resin is discharged while measuring the weight of the liquid resin by a weight meter provided in the interior of the chamber. According to this, the weight of the liquid resin can be accurately measured.

又,更佳為:前述(b)工序中,使前述噴嘴與前述被供給物平行地一邊移動一邊吐出前述液狀樹脂。據此,可於任意的吐出位置將液狀樹脂供給至被供給物的表面內。Furthermore, it is more preferable that in the step (b), the liquid resin is discharged while moving the nozzle in parallel with the object to be supplied. According to this, the liquid resin can be supplied into the surface of the object to be supplied at any discharge position.

本發明之其他解決手段所涉及之樹脂供給方法,其特徵為包含:(a)在腔室的內部從噴嘴朝被供給物吐出液狀樹脂之工序;(b)對前述腔室的前述內部進行抽真空之工序;及(c)在停止前述液狀樹脂之吐出且停止前述腔室的前述內部的抽真空後,在前述腔室的前述內部進行前述噴嘴的斷液之工序。據此,可防止樹脂內含空氣等之不良狀況。The resin supply method according to another solution of the present invention is characterized by comprising: (a) a step of discharging liquid resin from a nozzle toward the object to be supplied in the inside of the chamber; (b) performing the inside of the chamber Step of vacuuming; and (c) after stopping the ejection of the liquid resin and stopping the vacuuming of the inside of the chamber, the step of shutting off the nozzle is performed in the inside of the chamber. Accordingly, it is possible to prevent defects such as air in the resin.

本發明之一解決手段涉及之樹脂封止方法,其特徵為包含:使用前述任一樹脂供給方法向前述被供給物供給前述液狀樹脂之工序;及使用前述被供給物且以模製模具加熱加壓並以樹脂封止成既定的形狀之工序。據此,可進行防止因含有空氣所致空隙或未填充之高品質的樹脂封止。The resin sealing method according to one of the solutions of the present invention is characterized by comprising: using any one of the resin supply methods described above to supply the liquid resin to the object to be supplied; and using the object to be supplied and heating with a mold The process of pressing and sealing with resin into a predetermined shape. According to this, high-quality resin sealing can be performed to prevent voids or unfilled caused by air contained.

本發明之一解決手段涉及之樹脂供給裝置,其特徵為具備:內部供被供給物安置的腔室;吐出部,具有朝前述被供給物吐出液狀樹脂的噴嘴且前述噴嘴設於前述腔室的前述內部;真空部,對前述腔室的前述內部進行抽真空;使前述噴嘴往復移動之噴嘴升降驅動部;及控制部,控制前述吐出部、前述真空部及前述噴嘴升降驅動部,在來自於前述吐出部的前述液狀樹脂之吐出停止且停止利用前述真空部抽真空之狀態中,藉由前述控制部控制前述噴嘴升降驅動部使前述噴嘴往復移動。據此,可於腔室的內部將所吐出之液狀樹脂斷液而從被供給物斷離。The resin supply device according to one of the solutions of the present invention is characterized by comprising: a chamber in which an object to be supplied is placed; a discharge portion having a nozzle for discharging liquid resin toward the object to be supplied, and the nozzle is provided in the chamber A vacuum part, which evacuates the inside of the chamber; a nozzle lift drive part that reciprocates the nozzle; and a control part, which controls the discharge part, the vacuum part and the nozzle lift drive part, in In the state where the ejection of the liquid resin from the ejection section is stopped and the vacuum is stopped by the vacuum section, the control section controls the nozzle elevation drive section to reciprocate the nozzle. According to this, the discharged liquid resin can be cut off from the object to be supplied in the inside of the chamber.

此處,更佳為:更具備重量計,以供前述被供給物安置的方式設於前述腔室的前述內部,測量所吐出之前述液狀樹脂的重量。據此,可正確地測量液狀樹脂的重量。Here, it is more preferable that a weight meter is further provided, which is provided in the interior of the chamber so that the object to be supplied is placed, and the weight of the liquid resin discharged is measured. According to this, the weight of the liquid resin can be accurately measured.

又,更佳為:前述腔室係具備一及另一腔室部、及將前述一腔室部和前述另一腔室部之間密封的密封部,且構成為可開閉,前述吐出部設於前述一腔室部,更具備腔室驅動部,使前述一腔室部對前述另一腔室部進退移動及平行移動。據此,可於任意的吐出位置對被供給物的表面內供給液狀樹脂。Furthermore, it is more preferable that the chamber includes one and the other chamber part, and a sealing part that seals between the one chamber part and the other chamber part, and is configured to be openable and closable, and the discharge part is provided The one chamber part is further provided with a chamber driving part to make the one chamber part advance and retreat and move in parallel with the other chamber part. According to this, the liquid resin can be supplied to the surface of the object at any discharge position.

本發明之其他解決手段涉及之樹脂供給裝置,係在設為真空狀態的腔室內將液狀的樹脂向被供給物供給之樹脂供給裝置,其特徵為具備:構成前述腔室的腔室蓋及腔室本體;密封環,設於前述腔室本體的開口緣將前述腔室蓋與前述腔室本體之間密封;及荷重支承物,沿著前述密封環設於前述腔室本體,在前述腔室蓋與前述腔室本體之間承受荷重。據此,可於既除去空氣的真空狀態中供給樹脂。又,藉由荷重支承物而防止密封環被過度壓扁,確保密封性而可將腔室設為真空狀態。The resin supply device according to another solution of the present invention is a resin supply device that supplies liquid resin to an object to be supplied in a chamber set in a vacuum state, and is characterized by comprising: a chamber cover constituting the aforementioned chamber and The chamber body; a sealing ring provided on the opening edge of the chamber body to seal between the chamber cover and the chamber body; and the load support is provided on the chamber body along the sealing ring, in the chamber The chamber cover and the aforementioned chamber body bear a load. According to this, the resin can be supplied in a vacuum state in which air is removed. In addition, the seal ring is prevented from being excessively crushed by the load support, and the airtightness is ensured, so that the chamber can be placed in a vacuum state.

更佳為:於前述腔室開啟的狀態,在從前述腔室本體朝向前述腔室蓋的高度中,前述密封環高於前述荷重支承物。據此,在關閉腔室之際確保密封性,可將腔室設為真空狀態。More preferably, in a state where the chamber is opened, the sealing ring is higher than the load support in the height from the chamber body to the chamber cover. According to this, when the chamber is closed, the hermeticity is ensured, and the chamber can be set to a vacuum state.

前述樹脂供給裝置中,更佳為:更具備蓋驅動部,在前述腔室關閉的狀態下使前述腔室蓋對前述腔室本體移動者更佳。據此,可於真空狀態中使腔室蓋移動。In the resin supply device, it is more preferable to further include a cover driving part, and it is more preferable to move the chamber cover to the chamber body in a state where the chamber is closed. According to this, the chamber cover can be moved in a vacuum state.

更佳為:前述樹脂供給裝置中,前述荷重支承物係設有複數個滾珠滾輪的構成。據此,於真空狀態可使腔室蓋容易移動。More preferably, in the resin supply device, the load support has a configuration in which a plurality of ball rollers are provided. Accordingly, the chamber cover can be easily moved in a vacuum state.

更佳為:前述樹脂供給裝置中,更具備重量計,設於前述腔室內且安置有前述被供給物者。據此,可即時測量供給至被供給物之樹脂量。More preferably, the resin supply device is further provided with a weight scale, and is provided in the cavity and the object to be supplied is placed. According to this, the amount of resin supplied to the object can be measured immediately.

更佳為:前述樹脂供給裝置中更具備:安置台,設於前述腔室內且供前述被供給物安置;及使前述安置台旋轉的台驅動部。據此,縮小樹脂供給側(腔室蓋)的移動範圍而能縮小腔室的容量,因而可短時間形成既定壓力的真空狀態,或例如不使用吸引力高的真空泵而可減低製造成本。More preferably, the resin supply device is further provided with: a setting table provided in the chamber and for setting the object to be supplied; and a table driving unit that rotates the setting table. According to this, the moving range of the resin supply side (chamber cover) can be reduced to reduce the capacity of the chamber, so that a vacuum state of a predetermined pressure can be formed in a short time, or, for example, a vacuum pump with high attractive force can be not used, thereby reducing manufacturing costs.

較佳為:前述樹脂供給裝置中更具備重量計,設於前述腔室外且隔著貫通前述腔室本體的銷安置前述被供給物。據此,可在腔室內無設置重量計之下測量供給至被供給物之樹脂量。Preferably, the resin supply device is further provided with a weight scale, and the object to be supplied is arranged outside the chamber and placed via a pin penetrating the chamber body. According to this, the amount of resin supplied to the object can be measured without a weight meter in the chamber.

本發明的一實施形態涉及之樹脂成形裝置,其特徵為具備:前述樹脂供給裝置;具有模穴且在前述模穴內使前述樹脂熱硬化的模具。據此,可防止未填充等之成形不良。A resin molding apparatus according to an embodiment of the present invention is characterized by including: the resin supply device; and a mold having a cavity and thermosetting the resin in the cavity. According to this, molding defects such as unfilled can be prevented.

本發明的其他實施形態涉及之樹脂供給方法,係對具有狹隘部之被供給物供給液狀樹脂,該方法之特徵為包含:(a)向腔室內安置前述被供給物之工序;(b)前述(a)工序之後,對前述腔室內進行減壓之工序;(c)前述(b)工序之後,以施加於前述狹隘部的方式供給前述樹脂之工序;及(d)前述(c)工序之後,對前述腔室內加壓之工序。據此,可向經減壓的狹隘注入被加壓的樹脂。The resin supply method according to another embodiment of the present invention is to supply a liquid resin to an object having a narrow portion, and the method is characterized by comprising: (a) the step of placing the object to be supplied into the chamber; (b) After the step (a), the step of depressurizing the chamber; (c) after the step (b), the step of supplying the resin to the narrow part; and (d) the step (c) After that, the step of pressurizing the aforementioned chamber. Accordingly, the pressurized resin can be injected into the reduced pressure narrow.

前述樹脂供給方法中,更佳為:前述(b)工序中,將前述腔室設為真空狀態,前述(d)工序中,使前述腔室開放於大氣中。據此,可朝狹隘部再注入樹脂。In the resin supply method, it is more preferable that in the step (b), the chamber is put in a vacuum state, and in the step (d), the chamber is opened to the atmosphere. According to this, resin can be injected again toward the narrow part.

前述樹脂供給方法中,更佳為:將晶片零件是被倒裝接合的載體設為前述被供給物,將前述狹隘部設在前述載體與前述晶片零件之間者更佳。據此,可容易地進行底部填充。In the aforementioned resin supply method, it is more preferable that the carrier to which the wafer component is flip-chip bonded is used as the object to be supplied, and it is more preferable that the narrow portion is provided between the carrier and the wafer component. According to this, underfilling can be easily performed.

本發明的一解決手段涉及之樹脂安置方法係在成形模具的模穴內加熱加壓並將熱硬化成該模穴的形狀之樹脂安置於被供給物的樹脂安置方法,其特徵為包含:(a)將樹脂供給至被供給物上之工序;(b)前述(a)工序之後,向開啟狀態的腔室安置前述被供給物之工序;(c)前述(b)工序之後,將前述腔室設為關閉狀態,對前述腔室的內部進行減壓之工序;(d)前述(c)工序之後,使前述腔室的內部的壓力上升之工序;(e)前述(d)工序之後,將前述腔室設為開啟狀態,取出前述被供給物之工序。更佳為:前述被供給物係工件。又,更佳為前述被供給物係脫模片。據此,可減低被供給物、即脫模片(release film)或工件與樹脂之間隙,可進行防止未填充等之不良狀況的成形。One solution of the present invention relates to a resin placement method that heats and presses in a mold cavity of a forming mold and places a resin thermally hardened into the shape of the cavity on the object to be supplied. It is characterized by including:( a) The process of supplying resin to the object to be supplied; (b) After the step (a), the process of placing the object to be supplied in the open chamber; (c) After the step (b), the cavity The chamber is placed in a closed state to depressurize the inside of the chamber; (d) after the step (c), the pressure inside the chamber is increased; (e) after the step (d), The process of putting the chamber in an open state and taking out the object to be supplied. More preferably: the aforementioned supplied material is a workpiece. Moreover, it is more preferable that it is the said to-be-supply-type release sheet. According to this, it is possible to reduce the gap between the object to be supplied, that is, the release film or the workpiece, and the resin, and the molding can be performed to prevent defects such as unfilling.

此處,更佳為:前述(a)工序中,在具有凹凸部的被供給物上,以覆蓋前述凹凸部的方式供給樹脂,前述(d)工序中,使前述樹脂順著前述被供給物的前述凹凸部。據此,可防止凹凸部與樹脂之間隙的發生。Here, it is more preferable that in the step (a), the resin is supplied on the object having uneven portions so as to cover the uneven portions, and in the step (d), the resin is allowed to follow the object to be supplied. The aforementioned concavities and convexities. According to this, it is possible to prevent the occurrence of a gap between the uneven portion and the resin.

又,更佳為:前述(c)工序中,一邊加熱前述樹脂一邊對前述腔室的內部進行減壓。據此,能用已軟化的狀態的樹脂覆蓋被供給物。Furthermore, it is more preferable that in the step (c), the pressure of the inside of the cavity is reduced while heating the resin. According to this, it is possible to cover the object to be supplied with the resin in a softened state.

又,更佳為:前述(c)工序之後,冷卻前述樹脂。據此,可抑制導致樹脂反應的情況。Furthermore, it is more preferable to cool the said resin after the said (c) process. According to this, it is possible to suppress the occurrence of resin reaction.

又,更佳為:前述(a)工序中,作為前述樹脂是使用薄片樹脂。據此,可形成將樹脂均一地供給的狀態。Furthermore, it is more preferable that in the step (a), a sheet resin is used as the resin. According to this, it is possible to form a state where the resin is uniformly supplied.

更佳為:將藉由前述樹脂安置方法而被供給前述樹脂的前述被供給物向成形模具搬入,在前述成形模具的模穴內將前述樹脂加熱加壓使之熱硬化。據此,於成形品的樹脂成形部中,可抑制因空氣混入導致空隙的產生。 [發明效果]More preferably, the object to be supplied to which the resin is supplied by the resin placement method is carried into a molding die, and the resin is heated and pressurized in the cavity of the molding die to thermally harden it. Accordingly, in the resin molded part of the molded product, the generation of voids due to air mixing can be suppressed. [Effects of the invention]

簡單地說明本案揭示的發明中之具代表性者所能獲得之效果如下。依據本發明的解決手段,可防止樹脂內含空氣等之不良狀況。A brief description of the effects that can be obtained by a representative of the inventions disclosed in this case is as follows. According to the solution of the present invention, it is possible to prevent undesirable conditions such as air contained in the resin.

在以下本發明的實施形態中,在必要之情況會分成複數個部分等作說明,但原則上,其等並非彼此無關係,而是一者處於另一者的一部分或全部的變形例、詳細等關係。因此,在所有圖中,對具有同一機能的構件賦予同一符號且省略其重複的說明。又,針對構成要素之數(包含個數、數值、量、範圍等),除了特別明示之情況或原理上清楚限定為特定的數之情況等以外,未局限於特定之數,亦可為特定之數以上或以下。又,在提及構成要素等之形狀時,除了特別明示之情況及原理上很清楚認為不是那樣之情況等以外,設成包含有實質上與其形狀等近似或類似者等。 (實施形態1)In the following embodiments of the present invention, when necessary, the description will be divided into plural parts, etc., but in principle, they are not irrelevant to each other, but one is part or all of the modification of the other. And so on. Therefore, in all the drawings, the same reference numerals are given to members having the same function, and repeated descriptions thereof are omitted. In addition, the number of constituent elements (including number, numerical value, amount, range, etc.) is not limited to a specific number, and may be specific, except for the case where it is specifically stated or when it is clearly limited to a specific number in principle. The number above or below. In addition, when referring to the shape of the constituent elements, etc., except for cases where it is specifically stated and the principle is clearly considered to be otherwise, it is assumed to include those that are substantially similar to or similar to the shape or the like. (Embodiment 1)

針對本發明實施形態之樹脂供給裝置10,參照圖1至圖8作說明。圖1至圖8係用以說明樹脂供給動作涉及之樹脂供給裝置10之圖。此外,以樹脂供給裝置10處在三維(XYZ)正交座標系者作說明,圖中的上下方向(鉛直方向)與沿著Z軸的方向對應,水平方向成為沿著X軸及Y軸的方向。The resin supply device 10 according to the embodiment of the present invention will be described with reference to FIGS. 1 to 8. 1 to 8 are diagrams for explaining the resin supply device 10 involved in the resin supply operation. In addition, assuming that the resin supply device 10 is in a three-dimensional (XYZ) orthogonal coordinate system, the vertical direction (vertical direction) in the figure corresponds to the direction along the Z axis, and the horizontal direction is along the X axis and Y axis. direction.

本實施形態中,使用工件W作為被供給液狀樹脂R的被供給物。此工件W係於直徑12吋(約30cm)的圓型的金屬製(SUS等)的載板上貼著具有熱剝離性的黏著薄片(黏著帶),複數個半導體晶片在該黏著薄片上呈行列狀黏著者。液狀樹脂R被供給至這樣的工件W上,進行所稱E-WLP(嵌入式晶圓級封裝;Embedded Wafer Level Package)、eWLB(嵌入式晶圓級球閘陣列;embededd Wafer Lebel BGA)的樹脂成形。又,作為液狀樹脂R,例如使用聚矽氧樹脂或環氧樹脂之類的熱硬化性樹脂。In this embodiment, the workpiece W is used as the object to which the liquid resin R is supplied. This work W is attached to a circular metal (SUS, etc.) carrier plate with a diameter of 12 inches (about 30 cm) with a thermally peelable adhesive sheet (adhesive tape), and a plurality of semiconductor chips are formed on the adhesive sheet Adherents in ranks. The liquid resin R is supplied to such a workpiece W, and the so-called E-WLP (Embedded Wafer Level Package) and eWLB (Embedded Wafer Lebel BGA) are performed. Resin molding. In addition, as the liquid resin R, for example, a thermosetting resin such as silicone resin or epoxy resin is used.

樹脂供給裝置10具備控制部11。此控制部11具備CPU(中央演算處理裝置)及ROM、RAM等之記憶部,藉由CPU讀出被記錄在記憶部的各種控制程式並予以執行,以控制構成樹脂供給裝置10的各部分的動作。此各部分所進行的動作會成為樹脂供給裝置10的動作。The resin supply device 10 includes a control unit 11. The control unit 11 is equipped with a CPU (central processing unit) and a memory unit such as ROM and RAM. The CPU reads and executes various control programs recorded in the memory unit to control the components of the resin supply device 10 action. The actions performed by these parts become actions of the resin supply device 10.

又,樹脂供給裝置10具備吐出並供給液狀樹脂R之吐出部20。吐出部20具備:供液狀樹脂R儲存的注射器21;設於注射器21的前端的噴嘴22;及插入注射器21內可按住液狀樹脂R的柱塞23。又,吐出部20係具備例如以掐住由彈性體所構成之管狀的噴嘴22的方式設置且藉由未圖示的驅動機構開閉而進行噴嘴22之開閉的夾管閥(pinch valve) 24。此外,關於噴嘴22,只要可任意切換噴嘴22之開閉(換言之,液狀樹脂可否通過),則亦可不使用如上述般藉由掐住由彈性體所構成的噴嘴22以進行噴嘴22之開閉的夾管閥24。例如亦可作成在噴嘴前端具備閘板的構成或具備開閉閥之構成。Moreover, the resin supply apparatus 10 is equipped with the discharge part 20 which discharges and supplies the liquid resin R. The discharge part 20 includes: a syringe 21 for storing the liquid resin R; a nozzle 22 provided at the tip of the syringe 21; and a plunger 23 inserted into the syringe 21 and capable of pressing the liquid resin R. Moreover, the discharge part 20 is provided with the pinch valve 24 which is provided so as to pinch the tubular nozzle 22 which consists of an elastic body, and opens and closes the nozzle 22 by the drive mechanism which is not shown in figure, for example. In addition, as for the nozzle 22, as long as the opening and closing of the nozzle 22 can be arbitrarily switched (in other words, whether the liquid resin can pass through), the nozzle 22 can be opened and closed by pinching the nozzle 22 made of an elastic body as described above. Pinch valve 24. For example, it can also be made into the structure equipped with the shutter at the nozzle tip, or the structure equipped with the opening-and-closing valve.

吐出部20係藉由未圖示的驅動機構將夾管閥24開閉且柱塞23向下移動使注射器21內的液狀樹脂R往擠出方向流動而從噴嘴22吐出液狀樹脂R。另一方面,吐出部20係柱塞23停止向下移動且夾管閥24被關閉而停止從噴嘴22吐出液狀樹脂R。The discharging unit 20 opens and closes the pinch valve 24 by a driving mechanism not shown, and the plunger 23 moves downward to cause the liquid resin R in the syringe 21 to flow in the extrusion direction to discharge the liquid resin R from the nozzle 22. On the other hand, the discharge part 20 stops the plunger 23 from moving downward and the pinch valve 24 is closed to stop the discharge of the liquid resin R from the nozzle 22.

又,樹脂供給裝置10具備內部30a供工件W(被供給物)安置的腔室30。腔室30係具備一對的腔室部31、32(一方設為上腔室部31,另一方設為下腔室部32)且構成為可開閉。又,樹脂供給裝置10係具備將上腔室部31和下腔室部32之間密封的密封部33(例如O環)。藉此,當腔室30成為被關閉的狀態時,上腔室部31與下腔室部32成為隔著密封部33接觸的狀態,形成腔室30的內部30a(成為閉鎖狀態)。此外,在腔室30設有將其內部的溫度任意調整的溫度調節部(未圖示)。又,下腔室部32亦可構成為例如裝置框體的工作台部分,亦可作成板狀的構件被固定於裝置框體的構成。In addition, the resin supply device 10 includes a chamber 30 in which a workpiece W (an object to be supplied) is placed inside 30a. The chamber 30 is provided with a pair of chamber parts 31, 32 (one is set as the upper chamber section 31, and the other is set as the lower chamber section 32) and is configured to be openable and closable. Moreover, the resin supply device 10 is equipped with the sealing part 33 (for example, O ring) which seals between the upper chamber part 31 and the lower chamber part 32. As shown in FIG. Thereby, when the chamber 30 is in a closed state, the upper chamber portion 31 and the lower chamber portion 32 are in contact with each other via the sealing portion 33, and the interior 30a of the chamber 30 is formed (in a closed state). In addition, a temperature adjustment unit (not shown) that arbitrarily adjusts the temperature inside the chamber 30 is provided. In addition, the lower chamber portion 32 may be configured as, for example, a table portion of the device frame, or a plate-shaped member may be fixed to the device frame.

後面將會述及,從噴嘴22向被安置於腔室30的內部30a(參照圖3)的工件W吐出液狀樹脂R。為此,樹脂供給裝置10中,構成為:在上腔室部31設有吐出部20。具體言之,樹脂供給裝置10中,構成為:於注射器21在腔室30的外部被保持的狀態下,噴嘴22貫通上腔室部31被設置於腔室30的內部30a。於是,樹脂供給裝置10具備吐出保持部34及密封部35、36(例如O環)。吐出保持部34係在使噴嘴22貫通的狀態下將注射器21保持者。又,吐出保持部34係以覆蓋上腔室部31所具有的貫通突起部31a之方式作為貫通突起部31a的開口的蓋部設置。密封部35係將注射器21與吐出保持部34之間密封。密封部36係將上腔室部31的貫通突起部31a與吐出保持部34之間密封。因此,於腔室30關閉所形成的內部30a設有噴嘴22。As will be described later, the liquid resin R is discharged from the nozzle 22 to the work W placed in the interior 30a of the chamber 30 (refer to FIG. 3). For this reason, in the resin supply device 10, the upper chamber portion 31 is provided with the ejection portion 20. Specifically, the resin supply device 10 is configured such that the nozzle 22 penetrates the upper chamber portion 31 and is provided in the interior 30 a of the chamber 30 while the syringe 21 is held outside the chamber 30. Therefore, the resin supply device 10 includes a discharge holding portion 34 and sealing portions 35 and 36 (for example, O-rings). The discharge holder 34 is a person who holds the syringe 21 in a state where the nozzle 22 is penetrated. In addition, the ejection holding portion 34 is provided as a lid portion of the opening of the penetrating protrusion 31a so as to cover the penetrating protrusion 31a of the upper chamber portion 31. The sealing part 35 seals between the syringe 21 and the discharge holding part 34. The sealing portion 36 seals between the penetrating protrusion 31 a of the upper chamber portion 31 and the discharge holding portion 34. Therefore, the nozzle 22 is provided in the interior 30a formed by closing the chamber 30. As shown in FIG.

又,樹脂供給裝置10具備測量從噴嘴22吐出之液狀樹脂R的重量之重量計40。重量計40係以供工件W安置的方式設於腔室30的內部30a。在此情況,如圖1所示,在下腔室部32可設置從表面32a下凹的下沈部32b。重量計40在下沈部32b以固定的狀態設置。就此重量計40而言,在已安置工件W的狀態下,測量被吐出至工件W之液狀樹脂R的重量。據此,重量計40可穩定測量腔室30的內部30a中被供給至工件W之液狀樹脂R的重量,可正確地測量。此外,重量計40和控制部11電連接,藉由控制部11處理重量計40之測量資料。In addition, the resin supply device 10 includes a weight meter 40 that measures the weight of the liquid resin R discharged from the nozzle 22. The weight scale 40 is provided in the interior 30a of the chamber 30 in a manner for the workpiece W to be placed. In this case, as shown in FIG. 1, the lower chamber portion 32 may be provided with a sink portion 32b that is recessed from the surface 32a. The weight scale 40 is installed in a fixed state in the sink part 32b. With this weight meter 40, the weight of the liquid resin R discharged to the workpiece W is measured in a state where the workpiece W has been set. Accordingly, the weight meter 40 can stably measure the weight of the liquid resin R supplied to the workpiece W in the interior 30a of the chamber 30, and can accurately measure the weight. In addition, the weight meter 40 is electrically connected to the control unit 11, and the control unit 11 processes the measurement data of the weight meter 40.

又,樹脂供給裝置10具備對腔室30的內部30a抽真空使成為真空狀態(或減壓狀態)的真空部41(例如真空泵)。真空部41在腔室30的內部30a被閉鎖狀態下,經由設於腔室部32的空氣路42對內部30a抽真空而形成真空狀態。因為可在這樣的腔室30內進行樹脂供給,故可防止樹脂內含空氣等之不良狀況。此外,真空部41和控制部11電連接,藉由控制部11控制真空部41。Moreover, the resin supply apparatus 10 is equipped with the vacuum part 41 (for example, a vacuum pump) which evacuates the inside 30a of the chamber 30 to a vacuum state (or a reduced pressure state). The vacuum unit 41 evacuates the interior 30 a through the air passage 42 provided in the cavity 32 in a state where the interior 30 a of the chamber 30 is closed, thereby forming a vacuum state. Since the resin can be supplied in such a cavity 30, it is possible to prevent defects such as air in the resin. In addition, the vacuum unit 41 and the control unit 11 are electrically connected, and the vacuum unit 41 is controlled by the control unit 11.

又,樹脂供給裝置10具備進行腔室30之開閉的腔室驅動部50。腔室驅動部50係藉由使上腔室部31對下腔室部32在沿著Z軸的方向進退移動(接近、離開),進行腔室30之開閉。腔室驅動部50具備保持部51、第1軌道52、第1滑件53及第1馬達54。In addition, the resin supply device 10 includes a chamber drive unit 50 that opens and closes the chamber 30. The chamber driving unit 50 opens and closes the chamber 30 by moving (approaching and leaving) the upper chamber part 31 to the lower chamber part 32 in a direction along the Z axis. The chamber driving unit 50 includes a holding unit 51, a first rail 52, a first slider 53, and a first motor 54.

腔室驅動部50中,保持部51構成為柱狀且以在下腔室部32的表面32a上立起的方式設置。在此保持部51設有在上下方向(順著Z軸的方向、鉛直方向)延伸的第1軌道52。以可在此第1軌道52上滑動的方式設置第1滑件53。此第1滑件53係藉第1馬達54之驅動而在第1軌道52上滑動。而且,本實施形態中,在第1滑件53設有上腔室部31且構成為藉由第1滑件53在上下方向滑動,使上腔室部31對下腔室部32進退移動(上下移動)。此外,第1馬達54和控制部11電連接,藉由控制部11控制腔室驅動部50。此外,在以下的說明中,除了腔室驅動部50以外,要針對將複數個驅動部以同樣的構成所形成的例作說明,但此等不僅是如圖示那樣的構成,是可作成具備使用了連桿構造的關節型機器人(articulated robot)等任意的移動構造之構成者。In the chamber driving part 50, the holding part 51 is configured in a columnar shape and is provided so as to stand up on the surface 32 a of the lower chamber part 32. Here, the holding portion 51 is provided with a first rail 52 extending in the vertical direction (the direction along the Z axis, the vertical direction). The first slider 53 is provided so as to be slidable on the first rail 52. The first sliding member 53 is driven by the first motor 54 to slide on the first rail 52. Furthermore, in the present embodiment, the upper chamber portion 31 is provided on the first slider 53 and is configured to move the upper chamber portion 31 forward and backward with respect to the lower chamber portion 32 by sliding the first slider 53 in the vertical direction ( Moving up and down). In addition, the first motor 54 and the control unit 11 are electrically connected, and the chamber drive unit 50 is controlled by the control unit 11. In addition, in the following description, in addition to the chamber drive unit 50, an example in which a plurality of drive units are formed with the same configuration will be described. However, these are not only the configuration as shown in the figure, but also can be made with It is a structure of arbitrary movement structures such as articulated robots using a link structure.

又,樹脂供給裝置10具備使噴嘴22往復移動之噴嘴升降驅動部70。噴嘴升降驅動部70係在腔室30的內部30a使吐出部20的噴嘴22於升降方向往復移動。噴嘴升降驅動部70具備第2軌道72、第2滑件73及第2馬達74。In addition, the resin supply device 10 includes a nozzle raising/lowering drive unit 70 that reciprocates the nozzle 22. The nozzle raising/lowering drive unit 70 is provided in the interior 30a of the chamber 30 to reciprocate the nozzle 22 of the discharge unit 20 in the raising/lowering direction. The nozzle raising/lowering drive unit 70 includes a second rail 72, a second slider 73, and a second motor 74.

噴嘴升降驅動部70中,第2軌道72是在上下方向延伸,連同上腔室部31一起設於腔室驅動部50的第1滑件53。亦即,相對於第1滑件53,第2軌道72及上腔室部31係一起被保持。以可在此第2軌道72上滑動的方式設置第2滑件73。此第2滑件73藉第2馬達74之驅動而在第2軌道72上滑動。在此第2滑件73設有吐出保持部34。本實施形態中,藉由第2滑件73在上下方向滑動,透過吐出保持部34使吐出部20的噴嘴22往復移動(升降)。後面將會述及,藉由使吐出液狀樹脂R的噴嘴22往復移動,可將液狀樹脂R斷液。此外,第2馬達74和控制部11電連接,藉由控制部11控制噴嘴升降驅動部70。In the nozzle raising/lowering drive unit 70, the second rail 72 is a first slider 53 that extends in the vertical direction and is provided in the chamber drive unit 50 together with the upper chamber portion 31. That is, with respect to the first slider 53, the second rail 72 and the upper chamber portion 31 are held together. The second slider 73 is provided so as to be slidable on the second rail 72. The second sliding member 73 is driven by the second motor 74 to slide on the second rail 72. Here, the second slider 73 is provided with a discharge holding portion 34. In the present embodiment, the second slider 73 slides in the vertical direction, so that the nozzle 22 of the discharge section 20 is reciprocated (lifted and lowered) through the discharge holding section 34. As will be described later, the liquid resin R can be shut off by reciprocating the nozzle 22 that discharges the liquid resin R. In addition, the second motor 74 is electrically connected to the control unit 11, and the nozzle raising/lowering drive unit 70 is controlled by the control unit 11.

此處,所謂液狀樹脂R的斷液,係指將液狀樹脂R從噴嘴22往下方吐出向工件W供給時,於黏度高的液狀樹脂R因其自重未從噴嘴22斷離下成為被拖長的狀態(拉伸(drawing)狀態)的情況,從噴嘴22斷離的情況。以下的實施形態中,假設藉由使結束吐出液狀樹脂R的噴嘴22升降並將與工件W之距離反覆伸縮而從噴嘴22斷離的方法。惟斷液的手法不受此所局限,亦可為從噴嘴22的前端物理性地割除那樣的手法。Here, the cut-off of the liquid resin R means that when the liquid resin R is ejected from the nozzle 22 downward and supplied to the workpiece W, the liquid resin R with high viscosity is not separated from the nozzle 22 due to its own weight. In the case of the drawn state (drawing state), the case is disconnected from the nozzle 22. In the following embodiment, it is assumed that the nozzle 22 that has finished discharging the liquid resin R is lifted and lowered, and the distance from the workpiece W is repeatedly expanded and contracted to separate the nozzle 22 from the nozzle 22. However, the method of cutting the liquid is not limited by this, and it may be a method of physically cutting off the tip of the nozzle 22.

又,樹脂供給裝置10的吐出部20具備使柱塞23往復移動的吐出驅動部80。吐出驅動部80具備第3軌道82、第3滑件83及第3馬達84。Moreover, the discharge part 20 of the resin supply apparatus 10 is equipped with the discharge drive part 80 which reciprocates the plunger 23. As shown in FIG. The discharge drive unit 80 includes a third rail 82, a third slider 83, and a third motor 84.

吐出驅動部80中,第3軌道82在上下方向延伸,設於第2滑件73。以可在此第3軌道82上滑動的方式設置第3滑件83。此第3滑件83藉第3馬達84之驅動而在第3軌道82上滑動。在此第3滑件83設有柱塞23,藉由第3滑件83在上下方向滑動而使柱塞23往復移動。本實施形態中,注射器21內插入有柱塞23,藉由柱塞23推壓注射器21內所儲存的液狀樹脂R而從設於注射器21的前端的噴嘴22吐出液狀樹脂R。此外,第3馬達84和控制部11電連接,藉由控制部11控制吐出部20的吐出驅動部80。In the discharge drive unit 80, the third rail 82 extends in the vertical direction and is provided on the second slider 73. The third slider 83 is provided so as to be slidable on the third rail 82. The third sliding member 83 is driven by the third motor 84 to slide on the third rail 82. Here, the third slider 83 is provided with a plunger 23, and the plunger 23 is reciprocated by sliding the third slider 83 in the vertical direction. In this embodiment, a plunger 23 is inserted in the syringe 21, and the plunger 23 presses the liquid resin R stored in the syringe 21 to discharge the liquid resin R from a nozzle 22 provided at the tip of the syringe 21. In addition, the third motor 84 is electrically connected to the control unit 11, and the discharge drive unit 80 of the discharge unit 20 is controlled by the control unit 11.

樹脂供給裝置10中,於停止來自吐出部20的液狀樹脂R的吐出且停止利用真空部41抽真空的狀態下,藉由控制部11控制噴嘴升降驅動部70,俾在腔室30的內部30a使噴嘴22往復移動。據此,於腔室30的內部30a中,可將被吐出的液狀樹脂R斷液並從工件W斷離。藉由在被閉鎖的空間內(內部30a)進行斷液,可防止灰塵等之捲入等。In the resin supply device 10, in the state where the ejection of the liquid resin R from the ejection section 20 is stopped and the vacuuming by the vacuum section 41 is stopped, the control section 11 controls the nozzle raising and lowering drive section 70 so as to be inside the chamber 30 30a makes the nozzle 22 reciprocate. According to this, in the interior 30a of the chamber 30, the discharged liquid resin R can be cut off and separated from the workpiece W. By shutting off the liquid in the locked space (inside 30a), it is possible to prevent the entrapment of dust and the like.

其次,針對本發明實施形態之樹脂供給裝置10的動作方法、亦即樹脂供給方法作說明。Next, the operating method of the resin supply device 10 according to the embodiment of the present invention, that is, the resin supply method will be described.

圖1所示的樹脂供給裝置10係工件W被供給前的狀態。此處,腔室30係開啟。又,注射器21的噴嘴22藉夾管閥24而被關閉,柱塞23在上方待機。如此在腔室30開啟的狀態下,藉由搬送裝置(例如裝載機)搬送工件W,如圖2所示,工件W被供給至樹脂供給裝置10。本實施形態中,在重量計40安置有工件W。The resin supply device 10 shown in FIG. 1 is a state before the workpiece W is supplied. Here, the chamber 30 is opened. In addition, the nozzle 22 of the syringe 21 is closed by the pinch valve 24, and the plunger 23 stands by upward. In the state in which the chamber 30 is opened in this way, the workpiece W is transferred by the transfer device (for example, a loader), and as shown in FIG. 2, the workpiece W is supplied to the resin supply device 10. In this embodiment, the workpiece W is placed on the weight meter 40.

接著,如圖3所示,以成為閉鎖狀態的方式形成腔室30的內部30a,對腔室30的內部30a開始抽真空。此處係藉由控制部11控制真空部41及腔室驅動部50。具體言之,依腔室驅動部50的第1馬達54之驅動,設置有上腔室部31的第1滑件53在第1軌道52上逐漸下降,上腔室部31與下腔室部32成為隔著密封部33接觸的狀態。藉此,形成既成為閉鎖狀態的腔室30的內部30a。然後,藉由真空部41的驅動,將安置有工件W的腔室30的內部30a設為真空狀態。此外,以在設定此真空狀態之動作前或並行地使腔室30的內部的溫度成為既定的值之方式控制溫度調節部者較佳。在此情況,因為不是裝置整體而是僅將腔室30設為既定的溫度即可,故可快速地進行溫度調整。Next, as shown in FIG. 3, the inside 30a of the chamber 30 is formed so as to be in a closed state, and the inside 30a of the chamber 30 is evacuated. Here, the vacuum unit 41 and the chamber driving unit 50 are controlled by the control unit 11. Specifically, driven by the first motor 54 of the chamber drive part 50, the first slider 53 provided with the upper chamber part 31 gradually descends on the first rail 52, and the upper chamber part 31 and the lower chamber part 32 is in a state of contact via the sealing portion 33. Thereby, the inside 30a of the chamber 30 which has been in the closed state is formed. Then, by the driving of the vacuum unit 41, the inside 30a of the chamber 30 in which the workpiece W is placed is set to a vacuum state. In addition, it is preferable to control the temperature adjustment unit so that the temperature inside the chamber 30 becomes a predetermined value before or in parallel with the operation of setting this vacuum state. In this case, it is only necessary to set the chamber 30 to a predetermined temperature instead of the entire device, so that the temperature can be adjusted quickly.

接著,如圖4所示,在真空狀態的腔室30的內部30a從噴嘴22朝工件W吐出液狀樹脂R。此處係藉由控制部11控制吐出部20(吐出驅動部80)及真空部41。具體言之,藉由真空部41之驅動將腔室30的內部30a繼續設為真空狀態。然後,藉由吐出部20的第3馬達84之驅動,設置有柱塞23的第3滑件83在第3軌道82上逐漸下降。在此情況,柱塞23推壓注射器21內的液狀樹脂R,藉由利用未圖示的驅動機構將夾管閥24開放而從噴嘴22吐出液狀樹脂R。Next, as shown in FIG. 4, the liquid resin R is discharged from the nozzle 22 toward the workpiece W in the interior 30 a of the chamber 30 in a vacuum state. Here, the discharge unit 20 (discharge drive unit 80) and the vacuum unit 41 are controlled by the control unit 11. Specifically, the interior 30a of the chamber 30 continues to be in a vacuum state by the driving of the vacuum unit 41. Then, the third slider 83 provided with the plunger 23 is gradually lowered on the third rail 82 by the driving of the third motor 84 of the discharge unit 20. In this case, the plunger 23 presses the liquid resin R in the syringe 21, and the pinch valve 24 is opened by a driving mechanism not shown, and the liquid resin R is discharged from the nozzle 22.

此際,以設於腔室30的內部30a的重量計40一邊測量液狀樹脂R的重量一邊吐出液狀樹脂R。控制部11係處理重量計40的測量資料,例如在液狀樹脂R的重量達到既定值之情況,可停止液狀樹脂R的吐出。又,如上述般若藉由溫度調節部使腔室30的內部30a成為既定的溫度,則可正確地進行液狀樹脂R之吐出或重量之測量,可更適切地供給液狀樹脂R。At this time, the liquid resin R is discharged while measuring the weight of the liquid resin R based on the weight 40 provided in the inside 30 a of the chamber 30. The control unit 11 processes the measurement data of the weight meter 40, and for example, when the weight of the liquid resin R reaches a predetermined value, the discharge of the liquid resin R can be stopped. In addition, if the inside 30a of the chamber 30 is brought to a predetermined temperature by the temperature adjustment unit as described above, the discharge of the liquid resin R or the weight measurement can be accurately performed, and the liquid resin R can be supplied more appropriately.

接著,在停止液狀樹脂R的吐出,停止腔室30的內部30a的抽真空後,如圖5及圖6所示,在腔室30的內部30a使噴嘴22往復移動。此處係藉由控制部11控制吐出部20,真空部41及噴嘴升降驅動部70。具體言之,藉由停止吐出部20的第3馬達84而停止柱塞23向下移動並使夾管閥24被關閉而停止從噴嘴22吐出液狀樹脂R。接著,因停止利用真空部41抽真空而解除腔室30的內部30a之真空狀態。藉此,例如於被供給至工件W上的液狀樹脂R之下方,在有無法填充液狀樹脂R的空間之情況(換言之在發生含有空氣的情況),成為能以周圍環境氣體的壓力對其間隙填充液狀樹脂R。Next, after stopping the discharge of the liquid resin R and stopping the vacuuming of the interior 30a of the chamber 30, as shown in FIGS. 5 and 6, the nozzle 22 is reciprocated in the interior 30a of the chamber 30. Here, the discharge unit 20, the vacuum unit 41, and the nozzle raising and lowering drive unit 70 are controlled by the control unit 11. Specifically, the third motor 84 of the discharge unit 20 is stopped to stop the downward movement of the plunger 23 and the pinch valve 24 is closed to stop the discharge of the liquid resin R from the nozzle 22. Next, the vacuum state in the interior 30a of the chamber 30 is released by stopping the vacuuming by the vacuum unit 41. In this way, for example, under the liquid resin R supplied to the workpiece W, when there is a space that cannot be filled with the liquid resin R (in other words, when it contains air), the pressure of the ambient gas can be The gap is filled with liquid resin R.

接著,藉由噴嘴升降驅動部70的第2馬達74之驅動使吐出部20的噴嘴22向上移動(參照圖5)。接著,藉由噴嘴升降驅動部70的第2馬達74之驅動使吐出部20的噴嘴22向下移動(參照圖6)。然後,進行使吐出部20的噴嘴22反覆既定次數的往復移動(升降)之斷液動作。雖解除腔室30的內部30a的真空狀態,但能一邊維持腔室30的閉塞狀態一邊使吐出保持部34升降。Next, the nozzle 22 of the discharge unit 20 is moved upward by the driving of the second motor 74 of the nozzle elevation drive unit 70 (refer to FIG. 5). Next, the nozzle 22 of the discharge unit 20 is moved downward by the driving of the second motor 74 of the nozzle elevation drive unit 70 (refer to FIG. 6). Then, a liquid shut-off operation is performed in which the nozzle 22 of the discharge unit 20 reciprocates a predetermined number of times (up and down). Although the vacuum state of the interior 30a of the chamber 30 is released, the discharge holding portion 34 can be raised and lowered while maintaining the closed state of the chamber 30.

本實施形態中,噴嘴22的往復動作係在關閉腔室30而在維持已形成內部30a的狀態(閉鎖狀態)下進行。在不移動上腔室部31下藉由將上腔室部31的貫通突起部31a用作為引導部使吐出保持部34往復移動,一邊維持閉鎖的空間一邊使由吐出保持部34所保持的噴嘴22往復移動。如此,在閉塞的內部30a進行液狀樹脂R的斷液。對此,例如藉由連同上腔室部31使之升降,亦可使噴嘴22升降進行斷液動作。但是,在欲進行這樣的動作時,用於升降的構成構件變大。又,可想像在藉由上腔室部31上下移動使工件W周圍環境氣體流動,而在周圍存在有粉塵時可能導致附著於液狀樹脂R。從這樣的理由,如本實施形態所示以作成在上腔室部31與吐出保持部34之間設置密封部36且使具有噴嘴22的注射器21升降的構成者較佳。如此,可解消含有空氣並防止粉塵之附著。圖7所示的樹脂供給裝置10係液狀樹脂R已被斷液的狀態。In the present embodiment, the reciprocating motion of the nozzle 22 is performed by closing the chamber 30 while maintaining the state in which the inner portion 30a has been formed (closed state). Without moving the upper chamber portion 31, by using the penetrating protrusion 31a of the upper chamber portion 31 as a guide, the ejection holding portion 34 is reciprocated, and the nozzle held by the ejection holding portion 34 is maintained while maintaining the closed space. 22 reciprocating movement. In this way, the liquid resin R is shut off in the closed interior 30a. In this regard, for example, by raising and lowering the upper chamber portion 31 together, the nozzle 22 may be raised and lowered to perform a liquid-cutting operation. However, when such an operation is to be performed, the component member for raising and lowering becomes larger. In addition, it is conceivable that when the upper chamber portion 31 moves up and down to cause the ambient air around the workpiece W to flow, and there is dust in the surroundings, it may adhere to the liquid resin R. For such reasons, as shown in the present embodiment, it is preferable to form a configuration in which a sealing portion 36 is provided between the upper chamber portion 31 and the discharge holding portion 34 and the syringe 21 having the nozzle 22 is raised and lowered. In this way, the air contained in it can be eliminated and the adhesion of dust can be prevented. The resin supply device 10 shown in FIG. 7 is in a state where the liquid resin R has been shut off.

接著,利用控制部11控制腔室驅動部50,如圖8所示,開啟腔室30,使已被供給液狀樹脂R的工件W開放於大氣中。此處,亦藉由從液狀樹脂R的周圍施加大氣壓以促進液狀樹脂R在工件W上的填充。例如在晶片構件藉由倒裝接合被搭載於作為工件W的基板或晶圓上時,可對將晶片與基板等連接的多數個凸塊間填充液狀樹脂R。又,在不進行倒裝接合的情況亦是,可想像在工件W中的由搭載於基板等之上的晶片的側面與基板等之平面所構成的角部分的空間,可能產生液狀樹脂R未充分地遍布(未被填充的)部分。亦可考慮藉由以包含那樣的部分(空間)的方式供給液狀樹脂R以成為含有空氣的狀態。然而,藉由從在真空狀態(減壓環境氣體下)所供給的液狀樹脂R的周圍施加大氣壓,可將這樣的含有空氣(無液狀樹脂R的區域)徹底消滅。Next, the chamber drive part 50 is controlled by the control part 11, and as shown in FIG. 8, the chamber 30 is opened, and the work W to which the liquid resin R has been supplied is opened to the atmosphere. Here, by applying atmospheric pressure from the periphery of the liquid resin R, the filling of the liquid resin R on the workpiece W is promoted. For example, when a wafer member is mounted on a substrate or a wafer as the workpiece W by flip-chip bonding, the liquid resin R may be filled between a plurality of bumps connecting the wafer and the substrate or the like. In addition, even when flip-chip bonding is not performed, it is conceivable that the corner space formed by the side surface of the wafer mounted on the substrate etc. and the plane of the substrate etc. in the workpiece W may generate liquid resin R The (unfilled) part is not sufficiently spread. It is also conceivable to supply the liquid resin R so as to include such a portion (space) so as to be in a state containing air. However, by applying atmospheric pressure from around the liquid resin R supplied in a vacuum state (under reduced pressure atmosphere), such air (areas without liquid resin R) can be completely eliminated.

具體言之,藉由利用腔室驅動部50的第1馬達54的驅動,使設有上腔室部31的第1滑件53在第1軌道52上逐漸上升,上腔室部31與下腔室部32分離而成為腔室30開啟的狀態。之後,藉由搬送裝置(例如裝載機)取出已被供給液狀樹脂R的工件W並搬送。Specifically, the first slider 53 provided with the upper chamber portion 31 is gradually raised on the first rail 52 by the driving of the first motor 54 of the chamber driving portion 50, and the upper chamber portion 31 is connected to the lower The chamber part 32 is separated and the chamber 30 is in an open state. After that, the work W to which the liquid resin R has been supplied is taken out and transported by a transport device (for example, a loader).

接著,例如於模製裝置內設置本實施形態中的樹脂供給裝置10與未圖示的模製模具,此模製模具中被供給至工件W上的液狀樹脂R在減壓環境氣體下被加熱加壓而被樹脂封止成既定的形狀。據此,能進行可防止因含有空氣所致空隙或未填充之高品質的樹脂封止。在此情況,因為如上述一邊防止含有空氣等之不良狀況一邊將液狀樹脂R供給至工件W,故可進行防止未填充的樹脂封止。此外,本實施形態中,針對作為被供給物是適用工件W的情況作了說明,但亦可有別於工件W而將供給至模製模具的脫模片當作被供給物而供給液狀樹脂R。 (實施形態2)Next, for example, the resin supply device 10 in this embodiment and a molding die not shown in the figure are set in a molding apparatus, and the liquid resin R supplied to the workpiece W in the molding die is heated under a reduced pressure atmosphere. It is heated and pressurized and sealed into a predetermined shape by resin. According to this, it is possible to perform high-quality resin sealing that can prevent voids or unfilling due to air content. In this case, since the liquid resin R is supplied to the workpiece W while preventing problems such as the inclusion of air as described above, it is possible to prevent unfilled resin sealing. In addition, in this embodiment, the case where the workpiece W is applied as the object to be supplied has been described, but the release sheet supplied to the molding die may be treated as the object to be supplied and supplied in liquid form different from the workpiece W. Resin R. (Embodiment 2)

針對本發明實施形態2的樹脂供給裝置10A,參照圖9至圖17作說明。圖9至圖15係用以說明樹脂供給動作涉及之樹脂供給裝置10A之圖。圖16及圖17係分別為被供給液狀樹脂的被供給物、即工件W的俯視圖及側視圖。本實施形態中,與前述實施形態1涉及之腔室驅動部50的構成相異,故以下以這點為中心作說明。The resin supply device 10A according to the second embodiment of the present invention will be described with reference to FIGS. 9 to 17. 9 to 15 are diagrams for explaining the resin supply device 10A related to the resin supply operation. 16 and 17 are respectively a plan view and a side view of the workpiece W to which the liquid resin is supplied. In this embodiment, the structure of the chamber drive unit 50 according to the aforementioned first embodiment is different, so the following description will focus on this point.

本實施形態涉及之樹脂供給裝置10A,係具備在平面方向的任意位置構成腔室30並進行開閉的腔室驅動部50A。亦即,腔室驅動部50A係構成為使含有注射器21(噴嘴22)的上腔室部31可在圖9中的X方向或Y方向移動。又,腔室驅動部50A係藉由使上腔室部31對下腔室部32進退移動,進行腔室30的開閉。藉由這樣的構造,在構成腔室30的狀態(例如減壓的狀態)下,構成為使注射器21的噴嘴22部分對於工件W可在XY方向的任意位置移動。The resin supply device 10A according to the present embodiment is provided with a chamber drive unit 50A that constitutes the chamber 30 at an arbitrary position in the plane direction and opens and closes it. That is, the chamber drive unit 50A is configured to allow the upper chamber unit 31 including the syringe 21 (nozzle 22) to be movable in the X direction or the Y direction in FIG. 9. In addition, the chamber drive unit 50A opens and closes the chamber 30 by advancing and retreating the upper chamber part 31 with respect to the lower chamber part 32. With such a structure, in a state that constitutes the chamber 30 (for example, a reduced pressure state), the nozzle 22 portion of the syringe 21 is configured to be movable in an arbitrary position in the XY direction with respect to the workpiece W.

具體言之,腔室驅動部50A具備保持部51、第1軌道52、第1滑件53、第1馬達54、上座部60、第4軌道61、第4滑件62、第4馬達63、第5軌道64、第5滑件65及第5馬達66。又,腔室驅動部50A中,上座部60是以不移動的方式被固定於裝置框體。在此上座部60的下面設有在順著Y軸的方向延伸的第4軌道61。以可在此第4軌道61上滑動的方式設置第4滑件62。此第4滑件62係藉第4馬達63之驅動而在第4軌道61上滑動。又,在第4滑件62設有在順著X軸的方向延伸的第5軌道64。以可在此第5軌道64上滑動的方式設置第5滑件65。此第5滑件65係藉第5馬達66之驅動而在第5軌道64上滑動。而且,在此第5滑件65,保持部51以懸掛的方式設置。Specifically, the chamber drive unit 50A includes a holding portion 51, a first rail 52, a first slider 53, a first motor 54, an upper seat 60, a fourth rail 61, a fourth slider 62, a fourth motor 63, The fifth rail 64, the fifth slider 65, and the fifth motor 66. In addition, in the chamber driving portion 50A, the upper seat portion 60 is fixed to the device frame so as not to move. A fourth rail 61 extending in the direction along the Y axis is provided on the lower surface of the upper seat 60. The fourth slider 62 is provided so as to be slidable on the fourth rail 61. The fourth sliding member 62 is driven by the fourth motor 63 to slide on the fourth rail 61. In addition, the fourth slider 62 is provided with a fifth rail 64 extending in the direction along the X axis. The fifth slider 65 is provided so as to be slidable on the fifth rail 64. The fifth sliding member 65 is driven by the fifth motor 66 to slide on the fifth rail 64. In addition, in the fifth slider 65, the holding portion 51 is provided in a suspended manner.

在此保持部51設有在順著Z軸的方向延伸的第1軌道52,以藉由第1馬達54而可在此第1軌道52上滑動的方式設置第1滑件53。而且,在第1滑件53上設有上腔室部31。因此,上腔室部31係藉由腔室驅動部50A而可在沿著3軸(XYZ)的方向上移動。亦即,腔室驅動部50A可使上腔室部31對下腔室部32進退移動(朝沿著Z軸的方向移動)及平行移動(朝沿著X軸及Y軸的方向移動)。為此,樹脂供給裝置10A中,可藉由腔室驅動部50A維持關閉腔室30的狀態使上腔室部31平行移動。Here, the holding portion 51 is provided with a first rail 52 extending in a direction along the Z axis, and a first slider 53 is provided so as to be slidable on the first rail 52 by the first motor 54. In addition, the upper chamber portion 31 is provided on the first slider 53. Therefore, the upper chamber portion 31 can be moved in the direction along the 3-axis (XYZ) by the chamber driving portion 50A. That is, the chamber driving unit 50A can move the upper chamber part 31 forward and backward (moving in the direction along the Z axis) and parallel movement (moving in the direction along the X axis and the Y axis) relative to the lower chamber part 32. For this reason, in the resin supply device 10A, the upper chamber portion 31 can be moved in parallel by maintaining the closed state of the chamber 30 by the chamber driving portion 50A.

而且,如前述實施形態1所說明在上腔室部31設置有吐出部20。為此,樹脂供給裝置10A中,在維持關閉腔室30的狀態,可使吐出部20一邊平行移動一邊從噴嘴22吐出液狀樹脂R。據此,不僅是前述的實施形態中的效果,還可於任意的吐出位置對工件W的表面內供給液狀樹脂R(參照圖16及圖17)。Furthermore, as described in the first embodiment described above, the upper chamber portion 31 is provided with the discharge portion 20. For this reason, in the resin supply device 10A, the liquid resin R can be discharged from the nozzle 22 while maintaining the state in which the chamber 30 is closed. According to this, not only the effect in the aforementioned embodiment, but also the liquid resin R can be supplied into the surface of the workpiece W at an arbitrary discharge position (refer to FIGS. 16 and 17).

其次,針對本發明實施形態之樹脂供給裝置10A的動作方法,亦即,樹脂供給方法作說明。Next, the operating method of the resin supply device 10A according to the embodiment of the present invention, that is, the resin supply method will be described.

圖9所示的樹脂供給裝置10係在腔室30開啟的狀態下工件W被供給後的狀態。此處,注射器21的噴嘴22係藉由夾管閥24而被關閉,柱塞23在上方待機。又,在重量計40安置有工件W。The resin supply device 10 shown in FIG. 9 is a state after the workpiece W is supplied in a state where the chamber 30 is opened. Here, the nozzle 22 of the syringe 21 is closed by the pinch valve 24, and the plunger 23 stands by upward. In addition, a workpiece W is placed on the weight meter 40.

接著,如圖10所示,以成為閉鎖狀態的方式形成腔室30的內部30a,對腔室30的內部30a開始抽真空。此處係藉由控制部11控制真空部41及腔室驅動部50A。具體言之,依腔室驅動部50A的第1馬達54的驅動,設置有上腔室部31的第1滑件53在第1軌道52上逐漸下降,上腔室部31與下腔室部32成為隔著密封部33接觸的狀態。藉此,形成既成為閉鎖狀態的腔室30的內部30a。然後,藉由真空部41的驅動,將被安置有工件W的腔室30的內部30a設為真空狀態。Next, as shown in FIG. 10, the inside 30a of the chamber 30 is formed so as to be in a closed state, and the inside 30a of the chamber 30 is started to be evacuated. Here, the vacuum unit 41 and the chamber drive unit 50A are controlled by the control unit 11. Specifically, according to the drive of the first motor 54 of the chamber drive part 50A, the first slide 53 provided with the upper chamber part 31 gradually descends on the first rail 52, and the upper chamber part 31 and the lower chamber part 32 is in a state of contact via the sealing portion 33. Thereby, the inside 30a of the chamber 30 which has been in the closed state is formed. Then, by the driving of the vacuum unit 41, the inside 30a of the chamber 30 in which the workpiece W is placed is set to a vacuum state.

接著,如圖11所示,以噴嘴22會成為在相對於工件W的表面之既定位置(吐出開始位置)之方式使上腔室部31對下腔室部32平行移動。此處係藉由控制部11控制真空部41及腔室驅動部50A。具體言之,藉由真空部41之驅動將腔室30的內部30a繼續設為真空狀態。然後,第4滑件62或第5滑件65至少一方因腔室驅動部50A的第4馬達63或第5馬達66至少一方驅動而滑動,使得上腔室部31對下腔室部32平行移動。藉此,噴嘴22可對工件W的表面平行移動到既定位置。Next, as shown in FIG. 11, the upper chamber portion 31 and the lower chamber portion 32 are moved in parallel so that the nozzle 22 will be at a predetermined position (discharge start position) relative to the surface of the workpiece W. Here, the vacuum unit 41 and the chamber drive unit 50A are controlled by the control unit 11. Specifically, the interior 30a of the chamber 30 continues to be in a vacuum state by the driving of the vacuum unit 41. Then, at least one of the fourth slider 62 or the fifth slider 65 is slid by at least one of the fourth motor 63 or the fifth motor 66 of the chamber driving section 50A, so that the upper chamber portion 31 and the lower chamber portion 32 are parallel to each other. move. Thereby, the nozzle 22 can move parallel to the surface of the workpiece W to a predetermined position.

接著,在腔室30關閉的狀態下使噴嘴22平行於工件W一邊移動一邊吐出液狀樹脂R。此處係藉由控制部11控制吐出部20(吐出驅動部80)、真空部41及腔室驅動部50A。對工件W吐出(供給)液狀樹脂R係可對工件W的表面整體進行,但本實施形態中,如圖16及圖17所示,係對工件W的表面中央部(最大供給區域90)進行。例如如圖16所示,能以旋渦狀或複數同心圓狀供給液狀樹脂R。樹脂供給裝置10A中,因為是使構成腔室30的內部30a的上腔室部31連同噴嘴22一起移動的構成,故可藉由對工件W的表面中央部供給液狀樹脂R而防止腔室尺寸的大型化。又,藉由防止腔室尺寸的大型化,可縮短抽真空的時間。又,藉由以旋渦狀或複數個同心圓狀供給液狀樹脂R,可達成減低所供給之液狀樹脂R的高度。Next, the nozzle 22 is moved parallel to the workpiece W while the chamber 30 is closed, and the liquid resin R is discharged. Here, the discharge unit 20 (discharge drive unit 80), the vacuum unit 41, and the chamber drive unit 50A are controlled by the control unit 11. The discharge (supply) of the liquid resin R to the workpiece W can be performed on the entire surface of the workpiece W, but in this embodiment, as shown in FIGS. 16 and 17, it is to the center of the surface of the workpiece W (maximum supply area 90) conduct. For example, as shown in FIG. 16, the liquid resin R can be supplied in a spiral shape or a plurality of concentric circles. In the resin supply device 10A, since the upper chamber portion 31 constituting the interior 30a of the chamber 30 is moved together with the nozzle 22, it is possible to prevent the cavity by supplying the liquid resin R to the center portion of the surface of the workpiece W. Increase in size. In addition, by preventing an increase in the size of the chamber, the time for vacuuming can be shortened. In addition, by supplying the liquid resin R in a spiral shape or a plurality of concentric circles, the height of the supplied liquid resin R can be reduced.

具體言之,藉由真空部41之驅動將腔室30的內部30a繼續設為真空狀態。接著,如圖12所示,藉由吐出部20的第3馬達84之驅動使柱塞23下降,將注射器21內的液狀樹脂R從噴嘴22吐出。接著,如圖13所示,藉由腔室驅動部50A使上腔室部31一邊對下腔室部32平行移動一邊使液狀樹脂R從噴嘴22吐出。最終,如圖14所示,藉由使噴嘴22平行移動到工件W的中心且吐出液狀樹脂R,可將液狀樹脂R以旋渦狀供給至工件W。此際,以設於腔室30的內部30a的重量計40一邊測量液狀樹脂R的重量一邊吐出液狀樹脂R。Specifically, the interior 30a of the chamber 30 continues to be in a vacuum state by the driving of the vacuum unit 41. Next, as shown in FIG. 12, the plunger 23 is lowered by the driving of the third motor 84 of the discharge unit 20, and the liquid resin R in the syringe 21 is discharged from the nozzle 22. Next, as shown in FIG. 13, the upper chamber portion 31 is moved in parallel with the lower chamber portion 32 by the chamber driving portion 50A, and the liquid resin R is discharged from the nozzle 22. Finally, as shown in FIG. 14, by moving the nozzle 22 in parallel to the center of the workpiece W and discharging the liquid resin R, the liquid resin R can be supplied to the workpiece W in a spiral shape. At this time, the liquid resin R is discharged while measuring the weight of the liquid resin R based on the weight 40 provided in the inside 30 a of the chamber 30.

當然,亦可對工件W全面以旋渦狀等方式供給液狀樹脂R且使工件W上的樹脂的供給量均一化。在此情況,可將上述圖所示那樣的有底筒狀的上腔室部31形成平板狀,將平板狀的下腔室部32形成有底筒狀。在藉由這樣的構造所構成的腔室中,不但可得到與上述構成同樣的效果,亦可加大噴嘴22的移動區域,因為腔室尺寸沒有變大,故而更佳。Of course, the liquid resin R may be supplied to the entire workpiece W in a spiral shape or the like, and the supply amount of resin on the workpiece W may be made uniform. In this case, the bottomed cylindrical upper chamber portion 31 as shown in the above-mentioned figure may be formed into a flat plate shape, and the flat bottom chamber portion 32 may be formed into a bottomed cylindrical shape. In a chamber constructed with such a structure, not only can the same effect as the above-mentioned structure be obtained, but the movement area of the nozzle 22 can also be enlarged, which is better because the chamber size is not increased.

此外,針對供給至工件W上之液狀樹脂R的形狀,除了上述般的旋渦狀或同心圓狀以外,還可供給任意的形狀。例如在工件W上可供給多點狀或格子狀,再者排列複數條線的形狀,或者放射線狀之類的任意的形狀。In addition, with regard to the shape of the liquid resin R supplied to the workpiece W, any shape can be supplied in addition to the above-mentioned spiral shape or concentric shape. For example, the workpiece W can be supplied in a multi-dot shape or a grid shape, and a shape in which a plurality of lines are arranged, or an arbitrary shape such as a radial shape.

又,亦可具備攝像在工件W上被供給之液狀樹脂R的攝像裝置。在此情況,例如於上腔室部31設置利用具有透光性的材質所構成之攝像用的窗部,利用攝像部(相機)或照明部攝像被供給至工件W上的液狀樹脂R之形狀,以作成可進行確認供給狀態者較佳。In addition, an imaging device for imaging the liquid resin R supplied to the workpiece W may be provided. In this case, for example, the upper chamber portion 31 is provided with a window portion for imaging made of a light-transmitting material, and the imaging portion (camera) or the illuminating portion is used to image the liquid resin R supplied to the workpiece W. The shape is better to make it possible to confirm the supply state.

接著,如前述實施形態參照圖5及圖6所說明,在停止液狀樹脂R的吐出,停止腔室30的內部30a的抽真空後,在腔室30的內部30a使噴嘴22往復移動。藉此,能在內部30a進行液狀樹脂R的斷液。藉由在被閉鎖的空間內(內部30a)進行斷液,可防止灰塵等之捲入等。Next, as described in the foregoing embodiment with reference to FIGS. 5 and 6, after stopping the discharge of the liquid resin R and stopping the vacuuming of the inside 30 a of the chamber 30, the nozzle 22 is reciprocated in the inside 30 a of the chamber 30. Thereby, the liquid resin R can be shut off in the interior 30a. By shutting off the liquid in the locked space (inside 30a), it is possible to prevent the entrapment of dust and the like.

接著,如圖15所示,開啟腔室30,使被供給液狀樹脂R的工件W開放於大氣中。此處係藉由控制部11控制腔室驅動部50A。具體言之,依腔室驅動部50A的第1馬達54的驅動,設置有上腔室部31的第1滑件53在第1軌道52上逐漸上升,上腔室部31與下腔室部32分離而成為腔室30開啟的狀態。之後,藉由搬送裝置(例如裝載機)取出已被供給液狀樹脂R的工件W並搬送。 (實施形態3)Next, as shown in FIG. 15, the chamber 30 is opened, and the work W to which the liquid resin R is supplied is opened to the atmosphere. Here, the chamber drive unit 50A is controlled by the control unit 11. Specifically, according to the drive of the first motor 54 of the chamber drive part 50A, the first slider 53 provided with the upper chamber part 31 gradually rises on the first rail 52, and the upper chamber part 31 and the lower chamber part 32 is separated and the chamber 30 is opened. After that, the work W to which the liquid resin R has been supplied is taken out and transported by a transport device (for example, a loader). (Embodiment 3)

針對本發明實施形態之樹脂供給裝置110(writing dispenser),主要參照圖19至圖21作說明。圖19至圖21係用以說明樹脂供給動作涉及之樹脂供給裝置110之圖。此樹脂供給裝置110係具備供給部120(吐出部)及腔室130,在設為真空狀態的腔室130內將來自供給部120的液狀的樹脂R向工件W(被供給物)供給(塗布)者。本實施形態中,以樹脂供給裝置110是處在三維(XYZ)正交座標系者作說明,圖19等所示的上下方向(鉛直方向)對應於和Z軸平行的方向,橫方向(水平方向)成為與X軸及Y軸平行的方向。The resin supply device 110 (writing dispenser) according to the embodiment of the present invention will be described mainly with reference to FIGS. 19 to 21. 19 to 21 are diagrams for explaining the resin supply device 110 involved in the resin supply operation. This resin supply device 110 is provided with a supply unit 120 (discharge unit) and a chamber 130. The liquid resin R from the supply unit 120 is supplied to the workpiece W (the object to be supplied) in the chamber 130 set in a vacuum state. Coating). In this embodiment, the resin supply device 110 is described in a three-dimensional (XYZ) orthogonal coordinate system. The vertical direction (vertical direction) shown in Fig. 19 and the like corresponds to the direction parallel to the Z axis, and the horizontal direction (horizontal The direction) is a direction parallel to the X axis and the Y axis.

本實施形態中,作為工件W,例如適用複數個晶片零件200(例如半導體晶片)是被倒裝接合(凸塊連接)成行列狀的圓板形狀的載體201(例如半導體晶圓)。為此,工件W具有狹隘部202(晶片零件200與載體201之間)。又,本實施形態中,作為樹脂R,例如適用聚矽氧樹脂或環氧樹脂之類的液狀(包含熔融的狀態)的熱硬化性樹脂。對既被供給這樣的樹脂R的工件W,使用成形模具191(參照圖27),例如進行所稱eWLB(晶圓級球閘陣列封裝;Embedded Wafer Level Ballgrid-Array Package)的成形工序之樹脂成形。In this embodiment, as the workpiece W, for example, a plurality of wafer components 200 (for example, semiconductor wafers) are flip-chip bonded (bump-connected) disc-shaped carriers 201 (for example, semiconductor wafers) in rows and columns. For this reason, the workpiece W has a narrow portion 202 (between the wafer part 200 and the carrier 201). In addition, in this embodiment, as the resin R, for example, a liquid (including a molten state) thermosetting resin such as silicone resin or epoxy resin is used. For the workpiece W supplied with such resin R, the molding die 191 (refer to FIG. 27) is used, for example, resin molding of the molding process called eWLB (Embedded Wafer Level Ballgrid-Array Package) is performed .

樹脂供給裝置110在構成供給部120時係具備:供液狀樹脂R儲存的注射器121;設於注射器121的前端,吐出樹脂R的噴嘴122(管嘴);及被插入注射器121內,按住樹脂R的柱塞123。注射器121收納於注射器外殼125(筒座(cartridge holder))。藉此,可容易地交換注射器121。又,柱塞123係藉由驅動部180(Z軸驅動機構)而可在Z軸方向上下移動(往復移動)。藉此,可使被柱塞123按住的樹脂R從噴嘴122吐出。又,注射器外殼125係藉由驅動部170(Z軸驅動機構)而可在Z軸方向上下移動(往復移動)。藉此,噴嘴122可隔著注射器外殼125、注射器121在Z軸方向移動,可完成後述的斷液。此外,作為驅動部170、180,可使用具備藉由馬達而在軌道上移動的滑件或使用連桿構造的關節型機器人等任意之移動構造。When forming the supply unit 120, the resin supply device 110 is equipped with: a syringe 121 for storing liquid resin R; a nozzle 122 (nozzle) provided at the tip of the syringe 121 and ejecting the resin R; and inserted into the syringe 121 and held down Plunger 123 of resin R. The syringe 121 is housed in a syringe housing 125 (cartridge holder). Thereby, the syringe 121 can be exchanged easily. In addition, the plunger 123 can move up and down (reciprocate) in the Z-axis direction by the drive unit 180 (Z-axis drive mechanism). Thereby, the resin R held by the plunger 123 can be ejected from the nozzle 122. In addition, the syringe housing 125 can be moved up and down in the Z-axis direction (reciprocating movement) by the drive unit 170 (Z-axis drive mechanism). Thereby, the nozzle 122 can move in the Z-axis direction via the syringe housing 125 and the syringe 121, and the liquid stop described later can be completed. In addition, as the driving parts 170 and 180, any moving structure including a slider that moves on a rail by a motor or an articulated robot using a link structure can be used.

又,樹脂供給裝置110係具備:例如以掐住由彈性體所構成的噴嘴122(管嘴)之方式設置而進行噴嘴122之開閉的夾管閥124;進行此夾管閥124之驅動的閥驅動部126(例如以氣缸驅動)。夾管閥124設於閥驅動部126,閥驅動部126設於注射器外殼125。樹脂供給裝置110中,在夾管閥124開啟的狀態下,藉由柱塞123向下移動使注射器121內的樹脂R往擠出方向流動,使樹脂R從噴嘴122被吐出。另一方面,當柱塞123的向下移動停止時夾管閥124關閉而停止從噴嘴122吐出樹脂R。In addition, the resin supply device 110 is provided with: for example, a pinch valve 124 that is provided to pinch the nozzle 122 (nozzle) made of an elastic body to open and close the nozzle 122; and a valve that drives the pinch valve 124 The driving unit 126 (for example, driven by an air cylinder). The pinch valve 124 is provided in the valve driving part 126, and the valve driving part 126 is provided in the syringe housing 125. In the resin supply device 110, when the pinch valve 124 is opened, the plunger 123 moves downward to cause the resin R in the syringe 121 to flow in the extrusion direction, and the resin R is discharged from the nozzle 122. On the other hand, when the downward movement of the plunger 123 stops, the pinch valve 124 is closed and the discharge of the resin R from the nozzle 122 stops.

於吐出停止之後,藉由進行液狀的樹脂R的斷液,可防止樹脂R從噴嘴122懸垂。所謂液狀樹脂R的斷液,係指將液狀樹脂R從噴嘴122往下方吐出向工件W供給,樹脂R因其自重未從噴嘴122斷離下成為被拖長的狀態(拉伸(drawing)狀態)的情況,從噴嘴122斷離的情況。本實施形態中,假設藉由使結束吐出樹脂R的噴嘴122上下移動並反覆伸縮與工件W之距離而從噴嘴122斷離的方法。藉由在腔室130關閉的狀態下進行斷液,可防止灰塵等之捲入等。此外,斷液的手法不受此所局限,亦可為從噴嘴122的前端實際地割除那樣的手法或經由與噴嘴122連通且分岐的路徑導入空氣而斷離的手法。After the discharge is stopped, the liquid resin R is cut off, so that the resin R can be prevented from hanging down from the nozzle 122. The so-called breaking of the liquid resin R means that the liquid resin R is discharged from the nozzle 122 downward to be supplied to the workpiece W. The resin R is in a state of being drawn due to its own weight without breaking off the nozzle 122 (drawing ) State), it is disconnected from the nozzle 122. In this embodiment, it is assumed that the nozzle 122 is separated from the nozzle 122 by moving the nozzle 122 that has finished discharging the resin R up and down to repeatedly expand and contract the distance from the workpiece W. By cutting off the liquid with the chamber 130 closed, it is possible to prevent dust and the like from getting involved. In addition, the method of cutting the liquid is not limited to this, and may be a method of actually cutting off the tip of the nozzle 122 or a method of introducing air through a path communicating with the nozzle 122 and branching off.

又,樹脂供給裝置110係具備具有一對的腔室部131、132(一方設為腔室蓋131,另一方設為腔室本體132)之腔室130(例如由鋼材所構成)。樹脂供給裝置110中,從設於腔室蓋131側的噴嘴122對安置於腔室130內的工件W吐出並供給液狀的樹脂R。又,樹脂供給裝置110亦可藉由具備溫度調節部(例如加熱器或冷卻器)而事先調節腔室130的內部溫度,亦可調節所供給的樹脂R之溫度。In addition, the resin supply device 110 includes a chamber 130 (for example, made of steel) having a pair of chamber portions 131 and 132 (one is a chamber cover 131 and the other is a chamber body 132). In the resin supply device 110, the liquid resin R is discharged from the nozzle 122 provided on the side of the chamber cover 131 to the workpiece W placed in the chamber 130 and supplied. In addition, the resin supply device 110 may adjust the internal temperature of the chamber 130 in advance by providing a temperature adjustment unit (for example, a heater or a cooler), and may also adjust the temperature of the resin R to be supplied.

腔室蓋131藉由蓋驅動部150(XYZ軸驅動機構)可在XYZ軸方向往復移動。作為蓋驅動部150,可使用前述的一軸(Z軸)用的驅動部170、180與三軸(XYZ軸)的每一者對應者。藉此,藉由使腔室蓋131對腔室本體132在沿著Z軸的方向(鉛直方向)上下移動(接近、離開),可開閉腔室130。又,後面將會述及,藉由蓋驅動部150可在腔室130關閉的狀態使腔室蓋131對腔室本體132移動(水平移動)。據此,即便腔室130在真空狀態亦可使腔室蓋131及設於其上的噴嘴122移動。亦即,可在真空狀態下於任意的吐出位置對工件W的面內供給樹脂R。The chamber cover 131 can reciprocate in the XYZ axis direction by the cover driving part 150 (XYZ axis driving mechanism). As the cover drive unit 150, the aforementioned drive units 170 and 180 for one axis (Z axis) and each of the three axes (XYZ axis) can be used. Thereby, the chamber 130 can be opened and closed by moving the chamber cover 131 up and down (approaching and leaving) the chamber body 132 in the direction (vertical direction) along the Z axis. In addition, as will be described later, the cover driving unit 150 can move the chamber cover 131 to the chamber body 132 (horizontal movement) in a state where the chamber 130 is closed. Accordingly, even if the chamber 130 is in a vacuum state, the chamber cover 131 and the nozzle 122 provided thereon can be moved. That is, the resin R can be supplied to the surface of the workpiece W at any discharge position in a vacuum state.

又,樹脂供給裝置110係具備設於腔室本體132(例如構成有底筒狀體的容器)的開口緣132a(例如俯視圖呈圓形狀,俯視圖呈矩形狀,或,俯視圖呈多角形狀)且將腔室蓋131與腔室本體132之間密封的密封環133(例如O環)。藉此,腔室蓋131與腔室本體132成為隔著密封環133接觸的狀態,成為腔室130被關閉的狀態(內部被密閉的狀態)。此外,亦可為了密封環133的高度調節而在密封環133下設置調節構件(例如板或薄片)。In addition, the resin supply device 110 is provided with an opening edge 132a (e.g., a circular shape in a plan view, a rectangular shape in a plan view, or a polygonal shape in a plan view) provided in the chamber body 132 (e.g., a container that constitutes a bottomed cylindrical body). A sealing ring 133 (for example, an O ring) for sealing between the chamber cover 131 and the chamber body 132. Thereby, the chamber cover 131 and the chamber main body 132 are in contact with each other via the seal ring 133, and the chamber 130 is in a closed state (in a state where the inside is sealed). In addition, in order to adjust the height of the seal ring 133, an adjustment member (for example, a plate or a sheet) may be provided under the seal ring 133.

樹脂供給裝置110係在設為真空狀態的腔室130內從噴嘴122向工件W將液狀的樹脂R吐出並供給予工件W。為此,樹脂供給裝置110中,噴嘴122構成為設置在腔室130內。具體言之,樹脂供給裝置110具備保持部134(凹部)及密封環136(O環)。保持部134係以於腔室蓋131的中央部收容噴嘴122的方式從腔室蓋131的面131a(位在腔室本體132側的面131a)凹設,將貫通腔室蓋131的注射器外殼125予以保持。又,密封環136係將注射器外殼125與保持部134(腔室蓋131)之間密封。藉此,即便在腔室130被關閉的狀態中藉由驅動部170使注射器外殼125上下移動,亦可將腔室130內設為密閉狀態。The resin supply device 110 discharges the liquid resin R to the workpiece W from the nozzle 122 in the chamber 130 set in a vacuum state, and supplies it to the workpiece W. For this reason, in the resin supply device 110, the nozzle 122 is configured to be provided in the chamber 130. Specifically, the resin supply device 110 includes a holding portion 134 (recessed portion) and a seal ring 136 (O ring). The holding portion 134 is recessed from the surface 131a of the chamber cover 131 (the surface 131a on the side of the chamber body 132) so as to house the nozzle 122 in the center of the chamber cover 131, and penetrates the syringe housing of the chamber cover 131 125 to be maintained. Moreover, the sealing ring 136 seals between the syringe housing 125 and the holding part 134 (chamber cover 131). Thereby, even if the syringe housing 125 is moved up and down by the driving part 170 in the state where the chamber 130 is closed, the inside of the chamber 130 can be set in a sealed state.

此處,針對腔室蓋131和腔室本體132的大小作說明。為了將腔室130設為關閉的狀態,腔室本體132的開口(開口緣132a的內側)是被腔室蓋131堵塞(覆蓋)。亦即,俯視圖中(上視圖中)中,腔室蓋131的大小比腔室本體132的開口還大。具體言之,成為可一邊維持腔室130被關閉的狀態一邊使腔室蓋131對腔室本體132水平移動那樣的腔室蓋131之大小。換言之,成為可於Y軸方向及X軸方向,一邊維持真空一邊使噴嘴122在涵蓋工件W的一端到另一端的範圍移動那樣的腔室蓋131之大小。為此,如圖21所示,當噴嘴122的位置到達被安置於腔室本體132內的工件W的最外周時,腔室蓋131在Y軸方向及X軸方向大大地露出。Here, the size of the chamber cover 131 and the chamber body 132 will be described. In order to set the chamber 130 in a closed state, the opening of the chamber body 132 (inside the opening edge 132a) is blocked (covered) by the chamber cover 131. That is, in the top view (in the top view), the size of the chamber cover 131 is larger than the opening of the chamber body 132. Specifically, the size of the chamber cover 131 is such that the chamber cover 131 can be moved horizontally with respect to the chamber body 132 while maintaining the closed state of the chamber 130. In other words, the size of the chamber cover 131 is such that the nozzle 122 can be moved in the range from one end to the other end of the workpiece W while maintaining the vacuum in the Y-axis direction and the X-axis direction. For this reason, as shown in FIG. 21, when the position of the nozzle 122 reaches the outermost periphery of the workpiece W placed in the chamber body 132, the chamber cover 131 is largely exposed in the Y-axis direction and the X-axis direction.

又,樹脂供給裝置110係具備:調節腔室130的內部壓力之壓力調節部141;通往腔室130內且與壓力調節部141連通的路徑142(例如貫通腔室本體132的底部的孔)。樹脂供給裝置110中,關閉的狀態(密閉狀態)的腔室130內例如藉由具備真空泵的壓力調節部141被排出空氣而成為真空狀態(減壓狀態)。如此,因為可作成空氣被排出的真空狀態的腔室130,故可防止在向工件W供給樹脂R時所導致樹脂R內含空氣之不良狀況。In addition, the resin supply device 110 is provided with: a pressure adjusting part 141 that adjusts the internal pressure of the chamber 130; . In the resin supply device 110, the inside of the chamber 130 in the closed state (closed state) is discharged into a vacuum state (decompression state) by the pressure regulator 141 provided with a vacuum pump, for example. In this way, since the chamber 130 in a vacuum state in which air is exhausted can be made, it is possible to prevent the problem that the resin R contains air when the resin R is supplied to the workpiece W.

又,樹脂供給裝置110係具備在腔室蓋131與腔室本體132之間支承荷重的荷重支承物137(例如由鋼材所構成)。此荷重支承物137係藉由沿著圓形的密封環133設置在腔室本體132而防止密封環133過度的壓扁。作為荷重支承物137,例如可作成沿著圓形的密封環133在腔室本體132設置複數個的構成。在此情況,藉由複數個荷重支承物137一邊支持施加於腔室蓋131的大氣壓一邊使腔室蓋131位在腔室本體132上的任意的高度。藉此,防止密封環133過度的壓扁,防止因腔室蓋131與腔室本體132之接觸所致的摩擦,可確保密封性而將腔室130設為真空狀態。又,因為是藉由複數個荷重支承物137將腔室蓋131作多點支承,所以可使荷重分散。又,因為複數個荷重支承物137被設於密封環133的外側,亦即在腔室130內沒有複數個荷重支承物137,所以腔室130內的空氣變得容易除去。又,在腔室130開啟的狀態中,在從腔室本體132朝向腔室蓋131的高度中,密封環133高於荷重支承物137。換言之,在腔室130開啟的狀態下,密封環133配置在比荷重支承物137還靠近腔室蓋131的位置。據此,在腔室130關閉的狀態中,可作成將腔室蓋131確實地接觸於密封環133的狀態,可確保密封性將腔室130設為真空狀態。In addition, the resin supply device 110 is provided with a load support 137 (for example, made of steel) that supports a load between the chamber cover 131 and the chamber main body 132. The load support 137 is arranged on the chamber body 132 along the circular sealing ring 133 to prevent the sealing ring 133 from being excessively crushed. As the load support 137, for example, a structure in which a plurality of the chamber body 132 is provided along a circular sealing ring 133 can be made. In this case, the chamber cover 131 is positioned at an arbitrary height on the chamber body 132 while supporting the atmospheric pressure applied to the chamber cover 131 by a plurality of load supports 137. Thereby, the seal ring 133 is prevented from being excessively crushed, friction caused by the contact between the chamber cover 131 and the chamber body 132 is prevented, and the sealing property can be ensured and the chamber 130 can be set to a vacuum state. In addition, since the chamber cover 131 is supported at multiple points by a plurality of load supports 137, the load can be distributed. In addition, since the plurality of load supports 137 are provided outside the seal ring 133, that is, there is no plurality of load supports 137 in the chamber 130, the air in the chamber 130 can be easily removed. In the state where the chamber 130 is opened, the seal ring 133 is higher than the load support 137 in the height from the chamber body 132 toward the chamber cover 131. In other words, when the chamber 130 is opened, the seal ring 133 is arranged at a position closer to the chamber cover 131 than the load support 137. According to this, in the state where the chamber 130 is closed, the chamber cover 131 can be reliably brought into contact with the sealing ring 133, and the sealing property can be ensured and the chamber 130 can be set to a vacuum state.

樹脂供給裝置110中,構成為在腔室130關閉的狀態(腔室構造被保持的狀態)下,腔室蓋131相對於腔室本體132(注射器121相對於工件W)在水平方向移動。具體言之,使用滾珠滾輪作為荷重支承物137。滾珠滾輪係具備例如自由旋轉球體及將此自由旋轉球體以一部分突出的狀態(以此與腔室蓋131接觸)下予以旋轉保持的球體支承物(就座)所構成。據此,於藉由將腔室130內設成真空狀態使大氣壓施加於腔室蓋131的狀態中,藉由作成在點動體的滾珠滾輪中之滾轉方式的荷重支承物構造,與例如滑動方式中的荷重支承物構造相較下,係可極為順暢地使腔室蓋131在水平方向移動。In the resin supply device 110, in a state in which the chamber 130 is closed (a state in which the chamber structure is maintained), the chamber cover 131 is moved horizontally with respect to the chamber body 132 (the syringe 121 with respect to the workpiece W). Specifically, a ball roller is used as the load support 137. The ball roller system includes, for example, a freely rotating sphere and a sphere support (seating) that is rotatably held in a partially protruding state of the freely rotating sphere (in contact with the chamber cover 131). According to this, in a state where atmospheric pressure is applied to the chamber cover 131 by setting the chamber 130 in a vacuum state, by creating a rolling type load support structure in the ball roller of the inching body, and for example Compared with the load support structure in the sliding mode, the chamber cover 131 can be moved in the horizontal direction extremely smoothly.

特別在因工件W是大尺寸而腔室本體132亦需要大型化時,由於藉由大氣壓而施加於腔室蓋131的力變大,所以施加於荷重支承物137的力也會變大。為此,藉由設置與施加於荷重支承物137的力對應之個數的荷重支承物137,將施加於各個荷重支承物137的力分散化並縮小,可使腔室蓋131順暢地移動。此外,作為荷重支承物137,不僅是因應於施加到腔室蓋131之像滾珠滾輪柱那樣的滾轉荷重支承物,也可使用滑動荷重支承物。此外,為確保密封環133與荷重支承物137對於腔室蓋131的易滑動性,亦可在此等之間事先塗布潤滑劑。In particular, when the chamber body 132 needs to be enlarged due to the large size of the workpiece W, the force applied to the chamber cover 131 by the atmospheric pressure increases, so the force applied to the load support 137 also increases. For this reason, by providing the number of load supports 137 corresponding to the force applied to the load supports 137, the force applied to the respective load supports 137 is dispersed and reduced, and the chamber cover 131 can be moved smoothly. In addition, as the load support 137, not only a rolling load support such as a ball roller column applied to the chamber cover 131, but also a sliding load support may be used. In addition, in order to ensure the slidability of the seal ring 133 and the load support 137 with respect to the chamber cover 131, a lubricant may be applied in advance between them.

又,樹脂供給裝置110具備設於腔室130內的重量計140。樹脂供給裝置110中,於重量計140安置有工件W,重量計140係測量工件W的重量。此重量計140中,在工件W被安置的狀態下,測量向工件W吐出的樹脂R之重量。據此,可即時測量於真空狀態的腔室130內向工件W吐出並供給的樹脂R。In addition, the resin supply device 110 includes a weight gauge 140 provided in the cavity 130. In the resin supply device 110, a workpiece W is placed on a weight meter 140, and the weight meter 140 measures the weight of the workpiece W. In this weight meter 140, the weight of the resin R discharged to the workpiece W is measured in the state where the workpiece W is placed. According to this, it is possible to immediately measure the resin R discharged and supplied to the workpiece W in the chamber 130 in the vacuum state.

又,樹脂供給裝置110係具備:貫通腔室本體132的底部地設置且藉由驅動部144(參照圖25)而在Z軸方向上下移動(往復移動)的銷143;將此銷143與腔室本體132之間密封的密封環145(參照圖25)。此銷143被使用在對搬送裝置遞交工件W。從搬送裝置承接工件W時,銷143係向上移動使前端從腔室本體132突出(參照圖19)。在從銷143朝重量計140安置工件W時,銷143係向下移動而朝腔室本體132的底部側退避(參照圖20)。In addition, the resin supply device 110 is provided with a pin 143 provided to penetrate through the bottom of the chamber body 132 and move up and down (reciprocately) in the Z-axis direction by the drive unit 144 (refer to FIG. 25); this pin 143 is connected to the cavity A seal ring 145 for sealing between the chamber bodies 132 (refer to FIG. 25). This pin 143 is used to deliver the workpiece W to the conveying device. When the workpiece W is received from the conveying device, the pin 143 moves upward so that the front end protrudes from the chamber body 132 (refer to FIG. 19). When the workpiece W is set from the pin 143 to the weight scale 140, the pin 143 moves downward and retreats toward the bottom side of the chamber body 132 (refer to FIG. 20).

其次,針對樹脂供給裝置110的動作方法(樹脂供給方法)作說明。樹脂供給裝置110係具備具有CPU(中央演算處理裝置)及ROM、RAM等之記憶部之控制部(未圖示)。藉由CPU讀出被記錄在記憶部的各種控制程式並予以執行,以控制構成樹脂供給裝置110的各部分(機構)的動作。各部分所進行的動作會成為樹脂供給裝置110的動作。此外,在樹脂供給裝置110被組裝於樹脂成形裝置的情況,亦可作成藉由樹脂成形裝置的控制部控制樹脂供給裝置110的構成。Next, the operation method (resin supply method) of the resin supply device 110 will be described. The resin supply device 110 is provided with a control unit (not shown) having a CPU (central arithmetic processing unit) and storage units such as ROM and RAM. The CPU reads and executes various control programs recorded in the memory unit to control the operations of the various parts (mechanisms) constituting the resin supply device 110. The actions performed by each part become actions of the resin supply device 110. In addition, when the resin supply device 110 is incorporated in a resin molding device, a configuration in which the resin supply device 110 is controlled by a control unit of the resin molding device may be adopted.

圖19所示的樹脂供給裝置110係工件W被供給至腔室130前之狀態。此處,腔室130開啟,又注射器121的噴嘴122是藉由夾管閥124而被關閉,柱塞123在上方待機。如此在腔室130開啟的狀態下,例如將藉由搬送裝置或作業人員所搬送的工件W安置於腔室130。本實施形態中,搬送裝置將工件W遞交給銷143,藉由接收到工件W的銷143向下移動而使工件W被安置於重量計140(參照圖20)。The resin supply device 110 shown in FIG. 19 is a state before the workpiece W is supplied to the cavity 130. Here, the chamber 130 is opened, and the nozzle 122 of the syringe 121 is closed by the pinch valve 124, and the plunger 123 is on standby. In such a state where the chamber 130 is opened, for example, the workpiece W conveyed by a conveying device or an operator is placed in the chamber 130. In this embodiment, the conveying device delivers the work W to the pin 143, and the pin 143 that has received the work W moves downward to place the work W on the weight scale 140 (refer to FIG. 20).

接著,如圖20所示,以關閉腔室130的狀態,將其內部的空氣排出以設為真空狀態。具體言之,首先,藉由蓋驅動部150使腔室蓋131逐漸向下移動,腔室蓋131一邊將密封環133壓扁一邊與荷重支承物137接觸而設成關閉腔室130的狀態。接著,藉由壓力調節部141將腔室130內逐漸減壓,作成既定壓的真空狀態。此處,藉由以荷重支承物137支持腔室蓋131,可防止密封環133被過度壓扁。此外,藉由以在設定此真空狀態的動作前或並行地使腔室130的內部溫度成為既定的值之方式控制溫度調節部(未圖示),可抑制熱對於所供給之樹脂R的影響。Next, as shown in FIG. 20, in a state where the chamber 130 is closed, the air inside the chamber 130 is exhausted to be in a vacuum state. Specifically, first, the chamber cover 131 is gradually moved downward by the cover driving part 150, and the chamber cover 131 contacts the load support 137 while crushing the seal ring 133 to close the chamber 130. Next, the pressure adjustment part 141 gradually reduces the pressure in the chamber 130 to create a vacuum state of a predetermined pressure. Here, by supporting the chamber cover 131 with the load support 137, the sealing ring 133 can be prevented from being excessively crushed. In addition, by controlling the temperature adjustment unit (not shown) to set the internal temperature of the chamber 130 to a predetermined value before or in parallel with the operation of setting the vacuum state, the influence of heat on the supplied resin R can be suppressed .

接著,在設為真空狀態的腔室130內開始朝工件W供給樹脂R。具體言之,藉由壓力調節部141將腔室130繼續設為真空狀態。然後,藉閥驅動部126使夾管閥124驅動以開啟噴嘴122,藉驅動部180使柱塞123向下移動並由噴嘴122吐出樹脂R,形成可朝工件W供給樹脂R。此時,成為以重量計140即時一邊測量工件W的重量、即樹脂R的重量一邊供給樹脂R。Next, the supply of resin R to the workpiece W is started in the chamber 130 set in a vacuum state. Specifically, the pressure adjusting part 141 keeps the chamber 130 in a vacuum state. Then, the pinch valve 124 is driven by the valve driving part 126 to open the nozzle 122, and the plunger 123 is moved downward by the driving part 180 and the resin R is discharged from the nozzle 122, so that the resin R can be supplied to the workpiece W. At this time, the weight 140 is to supply the resin R while measuring the weight of the workpiece W, that is, the weight of the resin R in real time.

接著,如圖21所示,以噴嘴122與工件W的既定位置對向之方式使噴嘴122一邊移動一邊從噴嘴122吐出樹脂R。具體言之,藉由壓力調節部141將腔室130繼續設為真空狀態。然後,藉由蓋驅動部150使腔室蓋131水平移動且使設於腔室蓋131的噴嘴122一邊移動,一邊藉由驅動部180使柱塞123進一步向下移動而使樹脂R從噴嘴122吐出。此際,以即便噴嘴122到達工件W的最外周,還是會藉由密封環133維持密閉狀態(真空狀態)的方式使噴嘴122的移動範圍小於密封環133的內徑。此處,以施加於工件W的狹隘部202(晶片零件200與載體201之間)的方式逐漸供給(塗布)樹脂R。Next, as shown in FIG. 21, the resin R is discharged from the nozzle 122 while moving the nozzle 122 so that the nozzle 122 opposes the predetermined position of the workpiece|work W. Specifically, the pressure adjusting part 141 keeps the chamber 130 in a vacuum state. Then, the cover driving part 150 moves the chamber cover 131 horizontally, and while moving the nozzle 122 provided on the chamber cover 131, the driving part 180 further moves the plunger 123 downward to move the resin R from the nozzle 122. Spit out. At this time, even if the nozzle 122 reaches the outermost periphery of the workpiece W, the sealing ring 133 maintains the sealed state (vacuum state) so that the movement range of the nozzle 122 is smaller than the inner diameter of the seal ring 133. Here, the resin R is gradually supplied (coated) so as to be applied to the narrow part 202 of the work W (between the wafer component 200 and the carrier 201).

如此,能以成為既定的塗布式樣的方式向工件W的表面供給(塗布)樹脂R。作為塗布式樣,如圖22所示,例如可在工件W的表面整體作成旋渦狀或格子狀。此處,圖22係用以說明朝圓板形狀的工件W塗布樹脂R的塗布式樣之圖,圖22A係顯示旋渦,圖22B係顯示格子的狀態。在供給既定量的樹脂R時,藉由使設置有噴嘴122的腔室蓋131一邊移動一邊向工件W的表面整體供給樹脂R,與例如僅向工件W的表面中央供給樹脂R的方式相較下,在使用成形模具191(參照圖27)於模穴(cavity)C內壓縮樹脂R之際,能將樹脂R流動的距離(熱施加的時間)作成相同程度,可防止含有空氣。In this way, the resin R can be supplied (coated) to the surface of the work W in a predetermined coating pattern. As the coating pattern, as shown in FIG. 22, for example, the entire surface of the workpiece W may be formed in a spiral shape or a lattice shape. Here, FIG. 22 is a diagram for explaining a coating pattern for coating the resin R on the disc-shaped workpiece W, FIG. 22A shows the vortex, and FIG. 22B shows the state of the grid. When supplying a predetermined amount of resin R, by moving the chamber cover 131 provided with the nozzle 122 while supplying the resin R to the entire surface of the workpiece W, for example, compared to the method of supplying the resin R only to the center of the surface of the workpiece W Next, when the resin R is compressed in the cavity C using the molding die 191 (refer to FIG. 27), the flow distance (heat application time) of the resin R can be made the same level, and the inclusion of air can be prevented.

又,亦可作成將晶片零件200的側面以樹脂R覆蓋那樣的圖22B所示的塗布式樣,亦可不論晶片零件200的側面是否用樹脂R覆蓋下,以格子狀等對晶片零件200的全面供給樹脂R。此處,在設為將晶片零件200的側面以樹脂R覆蓋那樣的圖22B所示的塗布式樣時,利用後述的工序中的大氣壓快速將樹脂R注入狹隘部202可進行底部填充(相當於所謂的毛細管底部填充(capillary underfill))。再者,在模具內進行樹脂成形之際,藉由適切地進行排出狹隘部202中的空氣,藉由模具內的壓縮(利用成形模具191加壓)亦可更確實地進行底部填充。此外,即使未如圖22B所示的那樣供給填埋晶片零件200間的樹脂R,只要能向晶片零件200全周供給樹脂R,則亦能以比圖22B所示之樹脂R的線寬(晶片間寬度)還窄線寬的方式供給樹脂R。In addition, the coating pattern shown in FIG. 22B in which the side surface of the wafer component 200 is covered with resin R can also be made. Regardless of whether the side surface of the wafer component 200 is covered with resin R or not, the entire surface of the wafer component 200 can be covered in a grid pattern. Supply resin R. Here, in the case of the coating pattern shown in FIG. 22B such that the side surface of the wafer component 200 is covered with resin R, the resin R is quickly injected into the narrow portion 202 by the atmospheric pressure in the process described later to perform underfilling (corresponding to the so-called The capillary underfill (capillary underfill)). In addition, when resin molding is performed in the mold, by appropriately discharging the air in the narrow portion 202, underfilling can be performed more reliably by compression in the mold (pressurization with the molding die 191). In addition, even if the resin R that fills the gap between the wafer components 200 is not supplied as shown in FIG. 22B, as long as the resin R can be supplied to the entire circumference of the wafer component 200, the line width ( The width between wafers) is also supplied with resin R in a narrow line width.

此外,關於樹脂R的塗布式樣是可作多種考量。圖23係用以說明針對搭載有晶片零件(未圖示)而具有狹隘部的面板形狀(矩形狀)的工件W之樹脂R的塗布式樣(包含與工件W對向之噴嘴122的吐出路徑)之圖。圖23A係向工件W的中央部將樹脂R作點狀(一點)塗布(中心點)的狀態。即使是這樣的簡易塗布式樣,例如於真空環境氣體下進行樹脂R之供給後,藉由於大氣環境下放置工件W,藉其壓力差可使樹脂R注入狹隘部。又可縮短塗布時間。圖23B係向工件W面內進行樹脂R多點狀地塗布之狀態。就此狀態而言,與中心點相較下,可容易地排出空氣,且在模穴C內壓縮樹脂R之際可將樹脂R流動的距離設為相同程度。In addition, various considerations can be made regarding the coating style of the resin R. FIG. 23 is for explaining the coating pattern of the resin R (including the discharge path of the nozzle 122 facing the workpiece W) for the workpiece W with a narrow panel shape (rectangular shape) mounted with a wafer component (not shown)之图. FIG. 23A shows a state where the resin R is applied to the center of the workpiece W in a dot (one point) (center point). Even with such a simple coating style, for example, after the resin R is supplied under a vacuum atmosphere, by placing the workpiece W in the atmospheric environment, the resin R can be injected into the narrow part due to the pressure difference. It can also shorten the coating time. FIG. 23B shows a state where the resin R is applied in a multi-dot pattern to the surface of the workpiece W. In this state, compared with the center point, air can be easily discharged, and when the resin R is compressed in the cavity C, the flow distance of the resin R can be set to the same level.

圖23C係在工件W面內將樹脂R塗布成例如大致模穴尺寸的大旋渦狀之狀態。此狀態中,以旋渦狀作成容易排出空氣,藉由塗布成模穴尺寸,在模穴C內壓縮樹脂R之際,可將樹脂R流動的距離設為相同程度。圖23D係例如將樹脂R的高度降到低於中心點(圖23A)(中心點的矮背化)且在小的可動區域作旋渦狀的小塗布之狀態。此狀態中,藉由放慢樹脂R對模具面接觸的時序以拉長在關模動作中可排出空氣的時間而得以容易排出空氣。又,亦可想像在從一點塗布樹脂R時,因黏度高使得呈線狀塗布的樹脂R一邊不均等地積疊一邊塗布,變得難以塗布成均一的形狀之情況,但亦可藉由小的旋渦狀塗布而塗布成適切的圓形等之形狀。此外,可防止處於高的位置之樹脂R被壓縮而移往低的位置之際發生含有空氣之類的不良狀況。FIG. 23C shows a state in which the resin R is applied to the surface of the workpiece W in a large spiral shape having a substantially cavity size, for example. In this state, it is made in a vortex shape to easily discharge air, and by coating to a cavity size, when the resin R is compressed in the cavity C, the distance that the resin R flows can be made the same. FIG. 23D shows, for example, a state in which the height of the resin R is lowered below the center point (FIG. 23A) (the center point is lowered) and the small movable area is applied in a whirlpool shape. In this state, by slowing down the timing of the contact of the resin R with the mold surface to lengthen the time during which the air can be discharged during the mold closing operation, the air can be easily discharged. In addition, it is also conceivable that when the resin R is applied from one point, the resin R applied in a linear shape is unevenly stacked while being applied due to its high viscosity, and it becomes difficult to apply a uniform shape. Swirl-shaped coating and coating into a suitable circular shape or the like. In addition, it is possible to prevent the occurrence of problems such as containing air when the resin R at a high position is compressed and moved to a low position.

圖23E係配合矩形狀的工件W的角以可作成角的方式塗布旋渦狀的狀態。此狀態中,配合工件W的形狀可容易以旋渦狀進行空氣之排出。圖23F係配合矩形狀的工件W一筆劃塗布成格子狀的狀態。此狀態中,可配合工件W的形狀以均一寛度塗布樹脂R。圖23G係在工件W的面內將樹脂R從中央部朝向外周部那樣的放射狀地塗布(虛線係沒有從噴嘴122吐出的路徑)的狀態。此狀態中,於模穴內壓縮樹脂R之際,可從中央部朝外周部進行空氣之排出。FIG. 23E shows a state in which the spiral shape is applied to the corner of the rectangular workpiece W so as to be angled. In this state, according to the shape of the workpiece W, the air can be easily discharged in a spiral shape. FIG. 23F shows a state in which a rectangular workpiece W is applied in a grid with one stroke. In this state, the resin R can be coated with a uniform width in accordance with the shape of the workpiece W. FIG. 23G shows a state in which the resin R is applied radially in the surface of the workpiece W from the center to the outer periphery (the broken line shows the path not discharged from the nozzle 122). In this state, when the resin R is compressed in the cavity, air can be discharged from the central part to the outer peripheral part.

又,關於樹脂R朝晶片零件200塗布的塗布式樣是可考量多種。圖24係用以說明樹脂R朝工件W的主要部分(晶片零件200)塗布的塗布式樣之圖。圖24A係遍布晶片零件200全周一筆劃塗布樹脂R的狀態。圖24B係在未將鄰接的晶片零件200間覆蓋地以一筆劃僅外周塗布樹脂R的狀態。圖24C係將鄰接的晶片零件200間(一部分的樹脂R係位在晶片零件200上)覆蓋地塗布樹脂R的狀態。如圖24所示,藉由將塗布式樣設為環狀,樹脂R變得容易朝位在其內側的狹隘部202注入。In addition, various coating patterns for applying the resin R to the wafer component 200 can be considered. FIG. 24 is a diagram for explaining a coating pattern in which the resin R is applied to the main part of the workpiece W (the wafer component 200). FIG. 24A shows a state where the resin R is applied across the entire circumference of the wafer component 200 in one stroke. FIG. 24B shows a state in which only the outer periphery of the resin R is coated with one stroke without covering between the adjacent wafer parts 200. FIG. 24C shows a state in which the resin R is applied so as to cover between adjacent wafer components 200 (a part of the resin R is located on the wafer component 200). As shown in FIG. 24, by making the coating pattern into a ring shape, the resin R becomes easy to inject toward the narrow part 202 located in the inner side.

如此在供給既定量的樹脂R後(亦即塗布式樣完成之後),停止從噴嘴122吐出樹脂R。具體言之,停止利用驅動部180使柱塞123向下移動,同時藉由夾管閥124關閉噴嘴122以停止樹脂R的吐出。又,亦可拉回柱塞123以輔助停止樹脂R的吐出。In this way, after a predetermined amount of resin R is supplied (that is, after the coating pattern is completed), the discharge of resin R from the nozzle 122 is stopped. Specifically, the driving part 180 stops the plunger 123 from moving downward, and the pinch valve 124 closes the nozzle 122 to stop the discharge of the resin R. In addition, the plunger 123 may be pulled back to assist in stopping the discharge of the resin R.

接著,停止從腔室130內排出空氣。具體言之,藉由停止利用壓力調節部141排出空氣而解除腔室130在既定壓力的真空狀態。藉由壓力調節部141的停止,腔室130內成為從在真空狀態的既定壓而被加壓的情況。藉此,例如在被供給至工件W上的樹脂R的下方具有狹隘部202(應填充樹脂R的空間)的情況,以會被進行底部填充的方式向被減壓的狹隘部202注入經周圍環境氣體的壓力加壓後的樹脂R。Then, the exhaust of air from the chamber 130 is stopped. Specifically, the vacuum state of the chamber 130 at a predetermined pressure is released by stopping the discharge of air by the pressure regulator 141. When the pressure adjusting unit 141 is stopped, the inside of the chamber 130 is pressurized from a predetermined pressure in a vacuum state. In this way, for example, if there is a narrow part 202 (a space where the resin R should be filled) below the resin R supplied to the workpiece W, the pressure-reduced narrow part 202 is injected so as to be underfilled. Resin R pressurized by the pressure of the ambient gas.

接著,在關閉狀態的腔室130內使噴嘴122上下移動(升降)。具體言之,在未移動腔室蓋131而腔室130被關閉的狀態下,藉由驅動部170透過注射器外殼125(注射器121)使噴嘴122上下移動。如此,進行使噴嘴122的上下移動反覆既定次數的斷液動作。本實施形態中,在腔室130被關閉且維持形成有內部的狀態下進行斷液(噴嘴122的上下移動)。Next, the nozzle 122 is moved up and down (up and down) in the chamber 130 in the closed state. Specifically, in a state where the chamber 130 is closed without moving the chamber cover 131, the nozzle 122 is moved up and down by the drive unit 170 through the syringe housing 125 (syringe 121). In this way, a liquid cut operation is performed in which the up and down movement of the nozzle 122 is repeated a predetermined number of times. In the present embodiment, the liquid is cut off (the up and down movement of the nozzle 122) while the chamber 130 is closed and the inside is maintained.

接著,將腔室130設為開啟的狀態。具體言之,藉由利用蓋驅動部150使腔室蓋131逐漸向上移動,腔室蓋131從腔室本體132(荷重支承物137及密封環133)逐漸離開且成為腔室130開啟狀態(參照圖19)。因此,藉由開放於大氣中且從樹脂R的周圍施加大氣壓而將樹脂R朝狹隘部202注入(填充)。如同本實施形態,在晶片零件200藉由倒裝晶片接合而搭載於作為工件W的載體201上時,可在將晶片零件200與載體201連接的多數個凸塊之間注入、填充樹脂R,可抑制含有空氣(在狹隘部202無樹脂R的區域)。此外,即使晶片零件200在載體201上是以非為倒裝接合的方式搭載於工件W上的情況,就算在由晶片零件200的側面與載體201的主面所構成之角部的空間囤積有空氣的情況亦可填充樹脂R。Next, the chamber 130 is set to an open state. Specifically, by using the cover driving part 150 to gradually move the chamber cover 131 upward, the chamber cover 131 gradually separates from the chamber body 132 (the load support 137 and the sealing ring 133) and the chamber 130 is opened (refer to Figure 19). Therefore, the resin R is injected (filled) toward the narrow part 202 by opening to the atmosphere and applying atmospheric pressure from the periphery of the resin R. As in the present embodiment, when the wafer component 200 is mounted on the carrier 201 as the workpiece W by flip chip bonding, resin R can be injected and filled between the plurality of bumps connecting the wafer component 200 and the carrier 201. It is possible to suppress the inclusion of air (the area where there is no resin R in the narrow part 202). In addition, even if the wafer component 200 is mounted on the workpiece W on the carrier 201 in a flip-chip bonding manner, even if it is accumulated in the corner space formed by the side surface of the wafer component 200 and the main surface of the carrier 201 Resin R can also be filled in the case of air.

此外,於再度關閉腔室130將腔室130內設為真空狀態(減壓)之後,亦可反覆將腔室130開啟以設為開放於大氣中(加壓)的工序。據此,可更確實地朝狹隘部202注入樹脂R。此外,若壓力調節部141具備例如壓縮機等之加壓裝置,則在關閉腔室130的狀態亦可進行腔室130內的加壓,可一邊解消含有空氣一邊加壓環境氣體而朝狹隘部202更加確實地注入樹脂R。In addition, after the chamber 130 is closed again to set the inside of the chamber 130 to a vacuum state (reduced pressure), the process of opening the chamber 130 to open to the atmosphere (pressurized) may be repeated. According to this, the resin R can be injected into the narrow part 202 more reliably. In addition, if the pressure regulating unit 141 is equipped with a pressurizing device such as a compressor, the pressure in the chamber 130 can be pressurized while the chamber 130 is closed, and the ambient gas can be pressurized toward the narrow part while depleting the air. 202 injects the resin R more reliably.

之後,在腔室130開啟的狀態下,例如藉由搬送裝置使工件W(被供給樹脂R者)被取出。此際,安置於重量計140的工件W係被向上移動的銷143所支持(排出(eject))並遞往搬送裝置。之後,已被供給樹脂R的工件W,例如係朝成形模具191(參照圖27)搬送並被安置。接著,在由成形模具191所形成的模穴C內被壓縮使樹脂R被熱硬化。藉由此壓縮使樹脂R被加壓並朝狹隘部202注入,能更確實地進行底部填充。如此,因為使用前述的樹脂供給方法而防止含有空氣等之不良狀況,所以製造出已抑制在狹隘部202未填充等之成形不良的成形品。 (實施形態4)After that, in a state in which the chamber 130 is opened, the workpiece W (to which the resin R is supplied) is taken out by, for example, a conveying device. At this time, the work W placed on the weight scale 140 is supported (ejected) by the pin 143 that moves upward, and is delivered to the conveying device. After that, the workpiece W to which the resin R has been supplied is transported and placed toward the forming die 191 (see FIG. 27), for example. Next, it is compressed in the cavity C formed by the molding die 191 so that the resin R is thermally cured. By this compression, the resin R is pressurized and injected into the narrow part 202, so that underfilling can be performed more reliably. In this way, since the aforementioned resin supply method is used to prevent defects such as the inclusion of air, a molded product in which molding defects such as unfilling in the narrow part 202 are suppressed is manufactured. (Embodiment 4)

針對本發明實施形態之樹脂供給裝置110A,主要參照圖25及圖26作說明。圖25及圖26係用以說明樹脂供給動作涉及之樹脂供給裝置110A之圖。本實施形態中,與前述實施形態3相較下,在可縮小腔室蓋131且裝置可小型化這點不同,故以下以這點為中心作說明。此外,樹脂供給裝置110A亦與前述實施形態3同樣為使用壓力調節部141(參照圖19)將腔室130內設為真空狀態,但圖25及圖26中省略壓力調節部141。且為了容易說明,一部分附上剖面線。The resin supply device 110A according to the embodiment of the present invention will be described mainly with reference to FIGS. 25 and 26. 25 and FIG. 26 are diagrams for explaining the resin supply device 110A related to the resin supply operation. In this embodiment, compared with the third embodiment described above, the chamber cover 131 can be reduced and the device can be downsized in that it is different, so the following description will focus on this point. In addition, the resin supply device 110A also uses the pressure adjustment unit 141 (see FIG. 19) to set the inside of the chamber 130 into a vacuum state as in the aforementioned third embodiment, but the pressure adjustment unit 141 is omitted in FIGS. 25 and 26. And for ease of explanation, part of it is hatched.

樹脂供給裝置110A係具備:使腔室蓋131移動的蓋驅動部150A(XZ軸驅動機構或YZ軸驅動機構);設於腔室130內且供工件W安置的安置台151;及使安置台151旋轉的台驅動部152(旋轉驅動機構)。作為蓋驅動部150A,可使用使前述的一軸(Z軸)用的驅動部170、180與二軸(XZ軸或YZ軸)分別對應者,可使腔室蓋131(噴嘴122)在水平方向(X軸或Y軸方向)及鉛直方向(Z軸方向)移動。又,作為台驅動部152,可使用被安裝於安置台151的旋轉軸153是透過皮帶154藉由馬達155進行旋轉驅動者,可使安置台151在旋轉方向(水平方向)移動。又,因為旋轉軸153是在腔室本體132的底部貫通地設置,所以樹脂供給裝置110A係具備將旋轉軸153與腔室本體132之間密封的密封環157。The resin supply device 110A is provided with: a cover driving unit 150A (XZ-axis drive mechanism or YZ-axis drive mechanism) that moves the chamber cover 131; a placement table 151 provided in the chamber 130 for the workpiece W to be placed; and a placement table 151 Rotating table driving unit 152 (rotation driving mechanism). As the cover driving unit 150A, the aforementioned driving units 170, 180 for one axis (Z axis) and two axes (XZ axis or YZ axis) can be used respectively, so that the chamber cover 131 (nozzle 122) can be in the horizontal direction. (X-axis or Y-axis direction) and vertical direction (Z-axis direction) movement. In addition, as the table driving unit 152, a rotating shaft 153 attached to the setting table 151 can be rotated and driven by a motor 155 through a belt 154, so that the setting table 151 can be moved in the rotation direction (horizontal direction). In addition, since the rotating shaft 153 is penetratingly provided at the bottom of the chamber body 132, the resin supply device 110A is provided with a seal ring 157 that seals between the rotating shaft 153 and the chamber body 132.

據此,即便腔室130在真空狀態亦可使腔室蓋131及設於其上的噴嘴122對工件W相對地移動。亦即,可於任意的吐出位置向工件W的面內供給樹脂R。又,藉由設置作為工件安置側進行旋轉的安置台151,可縮小作為樹脂供給側而設置有噴嘴122的腔室蓋131的移動範圍(可動範圍)。具體言之,相較於腔室蓋131在水平方向的移動範圍在前述實施形態3中是X軸及Y軸方向,本實施形態中則只要是Y軸方向或X軸方向任一者中的半徑份量的距離即可。亦即,藉由從工件W的中心部到一端部使工件W與移動噴嘴122的動作平行地旋轉,可對工件W全面以旋渦狀塗布樹脂R。又,在這樣的構成中,藉由將噴嘴122的進退動作與工件W的旋轉作組合,亦可在工件W作任意的直線或曲線之放射狀的塗布。因此,本實施形態中,比前述實施形態3還能縮小腔室蓋131。又,因為腔室蓋131變小,所以可縮小樹脂供給裝置110A整體的覆蓋區(footprint)(省空間化)。Accordingly, even if the chamber 130 is in a vacuum state, the chamber cover 131 and the nozzle 122 provided thereon can be moved relative to the workpiece W. That is, the resin R can be supplied into the surface of the workpiece W at any discharge position. In addition, by providing the mounting table 151 that rotates as the workpiece mounting side, the moving range (moving range) of the chamber cover 131 on which the nozzle 122 is mounted as the resin supply side can be reduced. Specifically, compared to the horizontal movement range of the chamber cover 131 in the X-axis and Y-axis directions in the third embodiment, in this embodiment, it is only in either the Y-axis direction or the X-axis direction. The distance of the radius is enough. That is, by rotating the workpiece W from the center to one end of the workpiece W in parallel with the movement of the moving nozzle 122, the entire surface of the workpiece W can be coated with the resin R in a spiral shape. Moreover, in such a configuration, by combining the forward and backward movement of the nozzle 122 and the rotation of the workpiece W, it is also possible to apply an arbitrary straight line or a curved radial pattern to the workpiece W. Therefore, in this embodiment, the chamber cover 131 can be made smaller than in the third embodiment described above. In addition, since the chamber cover 131 becomes smaller, the footprint of the entire resin supply device 110A can be reduced (space saving).

又,樹脂供給裝置110A係具備設於安置台151,例如以將工件W包夾的方式固定的夾盤156。因此,從噴嘴122向工件W吐出的樹脂R具有黏著性,即使是因樹脂R而使工件W的旋轉受阻那樣的情況,亦可配合安置台151之旋轉使工件W穩定地旋轉。In addition, the resin supply device 110A is provided with a chuck 156 which is provided on the mounting table 151 and is fixed so as to clamp the work W, for example. Therefore, the resin R discharged from the nozzle 122 to the workpiece W has adhesiveness, and even if the rotation of the workpiece W is blocked by the resin R, the workpiece W can be rotated stably in accordance with the rotation of the mounting table 151.

又,樹脂供給裝置110A係具備:設於腔室130外且隔著貫通腔室本體132的銷161安置工件W的重量計160;在重量計160立起而設置的銷161。重量計160及銷161可藉由驅動部163(Z軸驅動機構)而在Z軸方向上下移動(往復移動)。據此,在沒有如同前述實施形態3的重量計140設置於腔室130內的情況下可測量被供給至工件W的樹脂量。因此,可縮小腔室130的容量。又,因為重量計160被設於腔室130外,故可進行測量而無需待機到於腔室130內成為真空狀態後迄至可測量的穩定狀態。根據這點,前述實施形態3中即便是真空狀態亦使用可測量的重量計140,但會導致價格變高,所以本實施形態中因為使用低價的重量計160而可減低樹脂供給裝置110A的製造成本。又,因為腔室130的容量變小而可抑制例如施加於作為壓力調節部141的真空泵之負荷。In addition, the resin supply device 110A is provided with a weight meter 160 provided outside the chamber 130 and placing the workpiece W via a pin 161 penetrating the chamber body 132; The weight 160 and the pin 161 can be moved up and down (reciprocatingly) in the Z-axis direction by the drive part 163 (Z-axis drive mechanism). According to this, the amount of resin supplied to the workpiece W can be measured without the weight meter 140 of the aforementioned third embodiment being installed in the cavity 130. Therefore, the capacity of the chamber 130 can be reduced. In addition, since the weight 160 is provided outside the chamber 130, measurement can be performed without having to wait until the chamber 130 becomes a vacuum state and reaches a stable state that can be measured. According to this point, in the foregoing embodiment 3, a measurable weight scale 140 is used even in a vacuum state, but this will increase the price. Therefore, in this embodiment, the low-cost weight scale 160 is used, which reduces the cost of the resin supply device 110A. manufacturing cost. In addition, since the volume of the chamber 130 becomes smaller, for example, the load applied to the vacuum pump as the pressure regulator 141 can be suppressed.

又,樹脂供給裝置110A係具備在銷161朝向腔室130外退避的狀態下,塞住銷161所貫通的腔室本體132的孔132b之閘板162。作為閘板162,例如可使用藉由驅動部(未圖示)而可滑動的構成。藉由在腔室130關閉的狀態下以閘板162塞住(密封)孔132b而可將腔室130內設為密閉狀態。In addition, the resin supply device 110A includes a shutter 162 that plugs the hole 132 b of the chamber body 132 through which the pin 161 penetrates in a state where the pin 161 is retracted toward the outside of the chamber 130. As the shutter 162, for example, a structure that can be slid by a drive unit (not shown) can be used. By plugging (sealing) the hole 132b with the shutter 162 in the state where the chamber 130 is closed, the inside of the chamber 130 can be sealed.

閘板162係具備:供銷161貫通的孔162a;供旋轉軸153貫通的孔162b。閘板162以在工件W的重量被測量的狀態下孔132b與孔162a會連通的方式移動(存在)。又,閘板162在工件W被測量的狀態與被供給樹脂R的狀態之間移動(存在),但以旋轉軸153在此間不與閘板162接觸的大小來形成孔162a。The shutter 162 is provided with a hole 162a through which the pin 161 penetrates, and a hole 162b through which the rotating shaft 153 penetrates. The shutter 162 moves (exists) such that the hole 132b and the hole 162a will communicate with each other in a state where the weight of the workpiece W is measured. In addition, the shutter 162 moves (exists) between the state where the workpiece W is measured and the state where the resin R is supplied, but the hole 162a is formed so that the rotating shaft 153 does not contact the shutter 162 therebetween.

於進行樹脂供給時,可考慮即使不讓銷161往腔室130外退避,亦可使之留在腔室130內。在此情況,因為將腔室130內設為密閉狀態,所以無需事先在孔132b設置將腔室本體132與銷161之間密封的密封環。因此,會有發生利用隔著銷161的重量計160所進行之測量無法正確之虞。關於這點,本實施形態中,關於孔132b的密封係設置閘板162而非使用密封環。藉此,即便是在腔室130外設置重量計160的構成,亦可正確地進行重量測量。此外,因孔132b、孔162a的徑大於銷161的徑,而在銷161未接觸於腔室本體132之下隔著銷161利用重量計160測量工件W的重量。When the resin is supplied, it can be considered that the pin 161 can be left in the cavity 130 even if the pin 161 is not allowed to escape from the cavity 130. In this case, since the inside of the chamber 130 is in a sealed state, it is not necessary to provide a seal ring for sealing between the chamber body 132 and the pin 161 in the hole 132b in advance. Therefore, there is a possibility that the measurement performed by the weight meter 160 through the pin 161 may not be accurate. In this regard, in the present embodiment, a shutter 162 is provided for the sealing system of the hole 132b instead of using a seal ring. Accordingly, even if the weight meter 160 is provided outside the chamber 130, the weight can be accurately measured. In addition, since the diameters of the holes 132b and 162a are larger than the diameter of the pin 161, the weight of the workpiece W is measured with the weight meter 160 through the pin 161 under the pin 161 not in contact with the chamber body 132.

其次,針對樹脂供給裝置110A的動作方法(樹脂供給方法)作說明。此外,與前述實施形態3重複的工序係概略地說明。Next, the operating method (resin supply method) of the resin supply device 110A will be described. In addition, the steps overlapped with the third embodiment described above are briefly explained.

首先,如圖25所示,在測量了工件W被供給樹脂R前之重量後,朝安置台151安置工件W。具體言之,在腔室130開啟的狀態下,預先以銷161的前端會成為高於安置台151的位置之方式藉由驅動部163使重量計160及銷161事先向上移動。於此狀態,例如將藉由搬送裝置或作業人員所搬送之工件W安置於銷161,以重量計160測量在被供給樹脂R前之工件W的重量。接著,藉由驅動部163使重量計160及銷161向下移動,在從銷161朝安置台151遞交工件W後,藉由夾盤156將工件W固定並安置於安置台151。First, as shown in FIG. 25, after measuring the weight of the workpiece W before the resin R is supplied, the workpiece W is placed on the setting table 151. Specifically, when the chamber 130 is opened, the drive unit 163 moves the weight 160 and the pin 161 upward in advance in such a way that the tip of the pin 161 will be higher than the position of the placement table 151 in advance. In this state, for example, the workpiece W transported by a transport device or an operator is set on the pin 161, and the weight of the workpiece W before the resin R is supplied is measured with a weight 160. Next, the weight 160 and the pin 161 are moved downward by the driving part 163, and after the workpiece W is delivered from the pin 161 to the setting table 151, the workpiece W is fixed and placed on the setting table 151 by the chuck 156.

接著,在使銷161從腔室本體132退避後,滑動閘板162以塞住銷161所貫通的孔132b(成為閘板162關閉的狀態)。之後,以關閉腔室130的狀態,藉由壓力調節部141將腔室130內的空氣開始排出,設成真空狀態(減壓狀態)。Next, after the pin 161 is retracted from the chamber body 132, the shutter 162 is slid to plug the hole 132b through which the pin 161 penetrates (the shutter 162 is in a closed state). After that, in a state where the chamber 130 is closed, the air in the chamber 130 is started to be exhausted by the pressure adjusting part 141, and the air in the chamber 130 is set to a vacuum state (decompression state).

接著,如圖26所示,在設為真空狀態的腔室130內,對工件W相對地使噴嘴122一邊移動一邊從噴嘴122吐出樹脂R地作供給。具體言之,藉由壓力調節部141將腔室130繼續設為真空狀態。然後,藉由台驅動部152使安置台151旋轉(水平移動)且使安置於安置台151的工件W一邊移動,一邊藉由蓋驅動部150A使腔室蓋131水平移動而使設於腔室蓋131的噴嘴122移動。此時,腔室蓋131係與前述實施形態3不同而在Y軸方向或X軸方向任一方水平移動。藉由閥驅動部126使夾管閥124驅動而開啟噴嘴122,藉由驅動部180使柱塞123朝向下移動而從噴嘴122工件W吐出樹脂R而作供給。能以成為在前述實施形態3所說明之既定的塗布式樣中的旋渦狀或放射狀之類的塗布式樣之方式向工件W的表面供給(塗布)樹脂R。Next, as shown in FIG. 26, in the chamber 130 set in a vacuum state, the nozzle 122 is relatively moved to the workpiece W while the resin R is discharged from the nozzle 122 for supply. Specifically, the pressure adjusting part 141 keeps the chamber 130 in a vacuum state. Then, the table driving unit 152 rotates (horizontally move) the setting table 151, and while moving the workpiece W placed on the setting table 151, the lid driving unit 150A moves the chamber cover 131 horizontally to be installed in the chamber. The nozzle 122 of the cap 131 moves. At this time, unlike the third embodiment described above, the chamber cover 131 moves horizontally in either the Y-axis direction or the X-axis direction. The pinch valve 124 is driven by the valve driving part 126 to open the nozzle 122, and the driving part 180 moves the plunger 123 downward to discharge the resin R from the nozzle 122 and the workpiece W for supply. The resin R can be supplied (coated) to the surface of the workpiece W in a spiral or radial coating pattern in the predetermined coating pattern described in the third embodiment.

接著,停止從腔室130內排出空氣。具體言之,藉由停止利用壓力調節部141排出空氣而解除腔室130在既定壓力中的真空狀態。因此,經周圍環境氣體的壓力所加壓的樹脂R被注入減壓的狹隘部202。且將噴嘴122之上下移動反覆既定次數而進行斷液。Then, the exhaust of air from the chamber 130 is stopped. Specifically, the vacuum state of the chamber 130 at a predetermined pressure is released by stopping the air discharge by the pressure adjusting part 141. Therefore, the resin R pressurized by the pressure of the surrounding atmosphere is injected into the reduced pressure narrow portion 202. And the nozzle 122 is moved up and down for a predetermined number of times to cut off the liquid.

接著,在關閉狀態的腔室130內測量樹脂R的供給量。具體言之,使閘板162滑動而將孔132b與孔162a連通(成為閘板162開啟的狀態)。藉此,腔室130被開放於大氣中,促進朝狹隘部202注入(填充)樹脂R。且成為銷161可進入腔室130內的狀態。接著,藉由驅動部163使重量計160及銷161向上移動,用貫通腔室本體132的銷161將工件W抬起。藉此,以重量計160測量工件W的重量,經與樹脂供給前的重量作比較,可測量樹脂R的供給量。此外,若樹脂供給量未達到既定量,則將工件W安置於安置台151,在真空狀態的腔室130內再度供給樹脂R。Next, the supply amount of the resin R is measured in the chamber 130 in the closed state. Specifically, the shutter 162 is slid to connect the hole 132b and the hole 162a (the shutter 162 is in an open state). Thereby, the cavity 130 is opened to the atmosphere, and the injection (filling) of the resin R into the narrow part 202 is promoted. In addition, the pin 161 can enter the cavity 130. Next, the weight 160 and the pin 161 are moved upward by the driving part 163, and the work W is lifted up by the pin 161 penetrating the chamber body 132. Thereby, the weight of the workpiece W is measured by the weight 160, and the supply amount of the resin R can be measured by comparing with the weight before the resin supply. In addition, if the resin supply amount has not reached the predetermined amount, the workpiece W is set on the mounting table 151, and the resin R is supplied again in the chamber 130 in a vacuum state.

在供給既定量樹脂R後,將腔室130設為開啟狀態。具體言之,藉由蓋驅動部150A使腔室蓋131朝上移動,腔室蓋131從腔室本體132遠離,成為腔室130已開啟的狀態。之後,例如藉由搬送裝置使工件W(被供給樹脂R者)被取出,例如朝成形模具191(參照圖27)搬送。此際,安置於安置台151的工件W係在夾盤156被解除後,被向上移動的銷143所支持(排出),遞往搬送裝置。此外,之後,將已被供給樹脂R的件W朝成形模具191安置,在成形模具191所具有的模穴C內使樹脂R被熱硬化。因為使用前述的樹脂供給方法而防止含有空氣等之不良狀況,故能製造已抑制在狹隘部202發生未填充等之成形不良的成形品。 (實施形態5)After the predetermined amount of resin R is supplied, the chamber 130 is set to an open state. Specifically, the chamber cover 131 is moved upward by the cover driving part 150A, and the chamber cover 131 is moved away from the chamber body 132 and the chamber 130 is opened. After that, the workpiece W (to which the resin R is supplied) is taken out by, for example, a conveying device, and is conveyed to the forming die 191 (see FIG. 27 ), for example. At this time, after the chuck 156 is released, the workpiece W placed on the placement table 151 is supported (ejected) by the pin 143 that moves upward, and is delivered to the conveying device. In addition, after that, the workpiece W to which the resin R has been supplied is set toward the molding die 191, and the resin R is thermally cured in the cavity C of the molding die 191. Since the aforementioned resin supply method is used to prevent defects such as air being included, it is possible to manufacture molded products in which the occurrence of molding defects such as unfilling in the narrow part 202 is suppressed. (Embodiment 5)

首先,針對本發明實施形態之樹脂成形裝置190,主要參照圖27及圖37作說明。圖27係用以說明樹脂成形方法(樹脂成形裝置190)之圖(斷面圖)。圖37係用以說明樹脂成形裝置190之圖(概略構成圖)。此外,在這樣的樹脂成形裝置190的構成在其他的實施形態亦可作成具備同樣的構成,可構成作為自動機的樹脂成形裝置。First, the resin molding apparatus 190 according to the embodiment of the present invention will be described mainly with reference to FIGS. 27 and 37. Fig. 27 is a diagram (cross-sectional view) for explaining the resin molding method (resin molding apparatus 190). FIG. 37 is a diagram for explaining the resin molding apparatus 190 (a schematic configuration diagram). In addition, the structure of such a resin molding apparatus 190 may be provided with the same structure in other embodiments, and a resin molding apparatus as an automatic machine can be configured.

樹脂成形裝置190在作為自動機方面,係具備供給部197、壓機部198、收納部199及在此等之間搬送工件W或樹脂R之搬送裝置204(搬送部)。供給部197具備前述的樹脂供給裝置110,以進行朝壓機部198供給工件W或樹脂R之準備等。又,壓機部198係具備具有模穴C的成形模具191,在模穴C內使樹脂R熱硬化。此成形模具191係具備可藉公知的壓機機構可開閉模具的一對的模具(一方設為上模192,另一方設為下模193),在下模193安置有工件W,在上模192設置有模穴C(凹部)而進行「上模穴成形」。此外,亦可作成在上模192安置有工件W,在下模193設置有模穴C(凹部)而進行「下模穴成形」之模具構成。又,收納部199係進行收納被樹脂成形的工件W(成形品)之準備等。此外,樹脂成形裝置190係具備控制各部分的控制部205,此控制部205亦兼用作為樹脂供給裝置110、110A的控制部,但亦可分別被使用。As an automatic machine, the resin molding apparatus 190 includes a supply unit 197, a press unit 198, a storage unit 199, and a conveying device 204 (conveying unit) that conveys the workpiece W or the resin R therebetween. The supply unit 197 is provided with the aforementioned resin supply device 110 to perform preparations for supplying the workpiece W or the resin R to the press unit 198 and the like. In addition, the press section 198 is provided with a molding die 191 having a cavity C, and the resin R is thermally cured in the cavity C. This forming mold 191 is equipped with a pair of molds (one is set as an upper mold 192 and the other is set as a lower mold 193) capable of opening and closing the mold by a known press mechanism. The workpiece W is placed on the lower mold 193, and the upper mold 192 A cavity C (recess) is provided, and "upper cavity molding" is performed. In addition, it is also possible to create a mold structure in which the upper mold 192 is provided with a workpiece W and the lower mold 193 is provided with a cavity C (recess) to perform "lower cavity forming". In addition, the accommodating part 199 performs preparations and the like for accommodating the workpiece W (molded product) molded by the resin. Moreover, the resin molding apparatus 190 is equipped with the control part 205 which controls each part. This control part 205 is also used as a control part of the resin supply apparatus 110, 110A, but it may be used separately.

此外,作為是自動機的樹脂成形裝置190的別的構成,亦可作成具備可收納工件W的供給部197、具備前述的樹脂供給裝置110的樹脂R的供給部、及在壓機部198及此等之間搬送工件W或樹脂R的搬送裝置204(搬送部)之構成。供給部197係準備將工件W朝壓機部198供給,收納已進行成形後的工件W。又,樹脂R的供給部係對工件W或脫模片可任意地供給樹脂R。In addition, as another configuration of the resin molding apparatus 190, which is an automatic machine, a supply unit 197 that can accommodate the workpiece W, a resin R supply unit that includes the aforementioned resin supply device 110, and a press unit 198 and The structure of the conveying device 204 (conveying part) that conveys the workpiece W or the resin R between these. The supply unit 197 prepares to supply the workpiece W to the press unit 198, and stores the workpiece W after being formed. In addition, the resin R supply unit can arbitrarily supply the resin R to the workpiece W or the release sheet.

成形模具191具備用以構成模穴C(凹部)的模穴件194(第1模具塊)及將其包圍的夾持器195(第2模具塊)。成形模具191中,因為在上模192設有模穴C,所以模穴C的底部是以模穴件194的下面,模穴C的側部是以夾持器195的內壁面所構成。又,成形模具191具備將上模192和下模193之間(模具內部)密封的密封環196(例如O環)。此外,雖未圖示,但樹脂成形裝置190具備調節成形模具191的內部壓力的壓力調節部(例如真空泵)或調節內部溫度(成形溫度)的溫度調節部(例如加熱器)。The forming mold 191 is provided with a cavity piece 194 (first mold block) for forming the cavity C (recess) and a clamp 195 (second mold block) surrounding the cavity. In the forming mold 191, since the upper mold 192 is provided with a cavity C, the bottom of the cavity C is below the cavity member 194, and the side of the cavity C is formed by the inner wall surface of the holder 195. In addition, the forming mold 191 includes a seal ring 196 (for example, an O ring) that seals between the upper mold 192 and the lower mold 193 (inside the mold). In addition, although not shown, the resin molding apparatus 190 includes a pressure regulator (e.g., vacuum pump) that adjusts the internal pressure of the molding die 191 or a temperature regulator (e.g., heater) that adjusts the internal temperature (molding temperature).

其次,針對樹脂成形方法(樹脂成形裝置190的動作方法)作說明。首先,例如使用前述的樹脂供給裝置110將樹脂R供給至工件W上(圖27A)。接著,將已被供給樹脂R的工件W利用搬送裝置204,從樹脂供給裝置110朝已開啟模具的狀態之成形模具191搬入,以晶片零件200朝向模穴C側而將工件W安置於成形模具191(下模193的上面)(圖27B)。Next, the resin molding method (the operating method of the resin molding apparatus 190) will be described. First, for example, the resin R is supplied to the workpiece W using the aforementioned resin supply device 110 (FIG. 27A ). Next, the workpiece W to which the resin R has been supplied is transferred from the resin supply device 110 to the forming mold 191 in the opened mold state by the transfer device 204, and the workpiece W is placed on the forming mold with the wafer part 200 facing the cavity C side 191 (top of lower mold 193) (Figure 27B).

接著,將成形模具191逐漸關模,將模穴C設為減壓(真空)狀態(圖27C)。具體言之,藉由壓機機構使下模193對上模192逐漸接近。因此,設於下模193的密封環196接觸於上模192的夾持器195,使工件W(載體201)上的晶片零件200及樹脂R被收容於模穴C。此時,藉由以壓力調節部(未圖示)排出空氣而可將模具內部設為減壓狀態。Next, the forming mold 191 is gradually closed, and the cavity C is brought into a reduced pressure (vacuum) state (FIG. 27C ). Specifically, the lower mold 193 and the upper mold 192 are gradually approached by the press mechanism. Therefore, the seal ring 196 provided in the lower mold 193 contacts the holder 195 of the upper mold 192, and the wafer component 200 and the resin R on the workpiece W (carrier 201) are accommodated in the cavity C. At this time, by discharging air through a pressure regulator (not shown), the inside of the mold can be brought into a reduced pressure state.

接著,藉由成形模具191進一步關模,在上模192和下模193之間夾持(圖27D)工件W(載體201),進行壓縮成形(圖27E)。此時,因為成形模具191藉由溫度調節部(未圖示)加熱到成形溫度,所以樹脂R係在模穴C內被熱硬化(加熱、硬化)。樹脂R被壓縮(加壓)並朝狹隘部202注入,但因為使用前述的樹脂供給方法以防止含有空氣等之不良狀況,所以形成已抑制了在狹隘部202的未填充等之成形不良的成形品(工件W)。之後,將成形模具191設為模具開啟狀態,利用搬送裝置204從成形模具191取出工件W(成形品),往收納部199搬出。Next, the molding die 191 is further closed, and the workpiece W (carrier 201) is clamped between the upper die 192 and the lower die 193 (FIG. 27D), and compression molding is performed (FIG. 27E). At this time, since the molding die 191 is heated to the molding temperature by the temperature adjustment part (not shown), the resin R is thermally cured (heated, hardened) in the cavity C. The resin R is compressed (pressurized) and injected into the narrow part 202, but because the aforementioned resin supply method is used to prevent defects such as air, etc., the formation of the narrow part 202 has been suppressed such as unfilled molding defects. Product (workpiece W). After that, the forming mold 191 is placed in the mold open state, and the workpiece W (molded product) is taken out from the forming mold 191 by the conveying device 204 and carried out to the storage portion 199.

本實施形態中,在樹脂成形前利用前述的樹脂供給方法抑制空氣混入工件W與樹脂R之間。因此,於工件W(成形品)的樹脂成形部,可抑制因空氣混入所致空隙的發生。又,在工件W中,於狹隘部202亦抑制空氣的混入,故抑制空隙之發生而進行底部填充。 (實施形態6)In this embodiment, the aforementioned resin supply method is used to prevent air from being mixed between the workpiece W and the resin R before resin molding. Therefore, in the resin molded part of the workpiece W (molded product), the occurrence of voids due to air mixing can be suppressed. In addition, in the work W, the intrusion of air is also suppressed in the narrow part 202, so that the occurrence of voids is suppressed and the underfill is performed. (Embodiment 6)

首先,針對本發明實施形態之樹脂成形裝置190A,主要參照圖28作說明。圖28係用以說明樹脂成形方法(樹脂成形裝置190A)之圖(斷面圖)。此外,樹脂成形裝置190A的概略構成係與前述的樹脂成形裝置190(圖37)同樣。First, the resin molding apparatus 190A according to the embodiment of the present invention will be described mainly with reference to FIG. 28. FIG. 28 is a diagram (cross-sectional view) for explaining the resin molding method (resin molding apparatus 190A). In addition, the schematic configuration of the resin molding apparatus 190A is the same as the aforementioned resin molding apparatus 190 (FIG. 37 ).

樹脂成形裝置190A所具備的成形模具191A係具備藉由公知的壓機機構可開閉模具的一對的模具(一方設為上模192,另一方設為下模193),上模192安置有工件W,下模193設有模穴C(凹部)而進行「下模穴成形」。本實施形態中,在進行「下模穴成形」這點及使用不同的2種類的樹脂R、Ra成形這點與前述實施形態5相異,故以下針對這點為中心作說明。The molding die 191A included in the resin molding apparatus 190A is equipped with a pair of dies (an upper die 192 and the other lower die 193) that can be opened and closed by a known press mechanism, and the upper die 192 is provided with a workpiece W, the lower mold 193 is provided with a cavity C (recess) to perform "lower cavity forming". In this embodiment, the point of performing "lower cavity molding" and the point of molding using two different types of resins R and Ra are different from the above-mentioned fifth embodiment, so the following description will focus on this point.

其次,針對樹脂成形方法(樹脂成形裝置190A的動作方法)作說明。首先,例如使用前述的樹脂供給裝置110將樹脂R供給至工件W上(圖28A)。再者,依據樹脂供給裝置110,可使經周圍環境氣體的壓力加壓後的樹脂R注入於被減壓的狹隘部202(圖28B)。此處,亦可從藉由朝工件W的狹隘部202填充樹脂R以使晶片零件200與載體201的連接部分封止而完成成形。Next, the resin molding method (the operating method of the resin molding apparatus 190A) will be described. First, for example, the resin R is supplied to the workpiece W using the aforementioned resin supply device 110 (FIG. 28A ). Furthermore, according to the resin supply device 110, the resin R pressurized by the pressure of the ambient gas can be injected into the depressurized narrow part 202 (FIG. 28B). Here, it is also possible to complete molding by filling the narrow part 202 of the workpiece W with resin R to seal the connection part of the wafer component 200 and the carrier 201.

然而,在晶片零件200的外周亦藉由樹脂封止而一體化以保持機械強度、晶片零件200外周亦藉由樹脂封止較佳的情況,進行以下的工序。具體言之,將已被供給樹脂R的工件W藉由搬送裝置204從樹脂供給裝置110朝模具開啟狀態的成形模具191A搬入,以晶片零件200朝向模穴C側將工件W安置於成形模具191A(上模192的下面)(圖28C)。此工件W,例如係經由在上模192下面開口的路(孔)而藉由吸引裝置被吸着保持於上模192的下面。又,將有別於供給至工件W的樹脂R之別的樹脂Ra向模穴C內作供給。此處,所謂別的樹脂Ra係指以與使用樹脂供給裝置110的工序不同的工序所供給者,材質可相同或不同。又,在樹脂供給裝置110的樹脂R係液狀,但樹脂Ra亦可為液狀、顆粒狀、粉狀、薄片狀。又,樹脂Ra可利用適宜的搬送裝置204搬送,例如可在覆蓋模具面而防止模具面與樹脂Ra之接觸的脫模片上搭載著樹脂Ra的狀態下向模穴C內進行供給。However, if the outer periphery of the chip component 200 is also sealed by resin and integrated to maintain mechanical strength, and the outer periphery of the chip component 200 is preferably sealed by resin, the following steps are performed. Specifically, the workpiece W to which the resin R has been supplied is transported by the transport device 204 from the resin supply device 110 to the molding die 191A in the mold open state, and the workpiece W is placed on the molding die 191A with the wafer part 200 facing the cavity C side (Under the upper mold 192) (Figure 28C). This workpiece W is sucked and held on the lower surface of the upper mold 192 by a suction device, for example, through a passage (hole) that is opened under the upper mold 192. In addition, resin Ra different from the resin R supplied to the workpiece W is supplied into the cavity C. Here, the other resin Ra means one supplied in a process different from the process in which the resin supply device 110 is used, and the material may be the same or different. In addition, the resin R in the resin supply device 110 is liquid, but the resin Ra may be liquid, pellet, powder, or flake. In addition, the resin Ra can be conveyed by an appropriate conveying device 204, and for example, the resin Ra can be supplied into the cavity C with the resin Ra mounted on a release sheet covering the mold surface to prevent contact between the mold surface and the resin Ra.

接著,將成形模具191A逐漸關模,將模穴C設為減壓(真空)狀態(圖28D)。藉此,設於上模192的密封環196接觸於下模193的夾持器195,晶片零件200及樹脂R、Ra被收容於模穴C。Next, the forming mold 191A is gradually closed, and the cavity C is brought into a reduced pressure (vacuum) state (FIG. 28D ). Thereby, the seal ring 196 provided in the upper mold 192 contacts the holder 195 of the lower mold 193, and the wafer component 200 and the resins R and Ra are accommodated in the cavity C.

接著,藉由成形模具191A進一步逐漸關模,在上模192與下模193之間夾持工件W(載體201),進行壓縮成形(圖28E)。此時,因為成形模具191A被溫度調節部(未圖示)加熱到成形溫度,所以樹脂R、Ra係在模穴C內被熱硬化(加熱、硬化)。但因為使用前述的樹脂供給方法以防止含有空氣等之不良狀況,所以形成在狹隘部202未填充等之成形不良的成形品(工件W)。又,例如可使用適合於狹隘部202的填充之樹脂R與放熱性或屏蔽性等優異且適合於晶片零件200的封止之樹脂Ra來形成成形品。之後,將成形模具191A設為模具開啟狀態,利用搬送裝置204從成形模具191A取出工件W(成形品),往收納部199搬出。 (實施形態7)Next, the molding die 191A is further closed gradually, the workpiece W (carrier 201) is clamped between the upper die 192 and the lower die 193, and compression molding is performed (FIG. 28E). At this time, since the molding die 191A is heated to the molding temperature by the temperature adjusting part (not shown), the resins R and Ra are thermally cured (heated, hardened) in the cavity C. However, because the aforementioned resin supply method is used to prevent defects such as the inclusion of air, a molded product (work W) with poor molding such as unfilled in the narrow part 202 is formed. In addition, for example, resin R suitable for filling the narrow part 202 and resin Ra suitable for sealing of the wafer component 200 with excellent heat dissipation and shielding properties can be used to form a molded product. After that, the forming mold 191A is placed in the mold open state, and the workpiece W (molded product) is taken out from the forming mold 191A by the conveying device 204 and carried out to the storage portion 199. (Embodiment 7)

針對本發明實施形態之樹脂成形方法,主要參照圖29至圖32作說明。圖29至圖32係用以說明樹脂成形方法之圖(立體圖)。本實施形態中,例如在朝工件W供給樹脂R方面,可使用前述的樹脂供給裝置110、110A,在樹脂成形方面,可使用前述的樹脂成形裝置190、190A,但在樹脂成形上以進行「上模穴成形」的樹脂成形裝置190較佳。The resin molding method of the embodiment of the present invention will be described mainly with reference to FIGS. 29 to 32. Figures 29 to 32 are diagrams (perspective views) for explaining the resin molding method. In this embodiment, for example, in supplying resin R to the workpiece W, the aforementioned resin supply apparatuses 110 and 110A can be used, and in terms of resin molding, the aforementioned resin molding apparatuses 190 and 190A can be used, but the resin molding can be carried out. The "upper cavity molding" resin molding device 190 is preferable.

首先,準備被供給樹脂R前的工件W(被供給物)(圖29)。作為工件W,適用複數個晶片零件200(例如半導體晶片等)是被倒裝接合(凸塊連接)成行列狀的圓板形狀的載體201(例如形成有半導體晶圓、配線層的玻璃板等)。First, the work W (the object to be supplied) before the resin R is supplied is prepared (FIG. 29 ). As the work W, a plurality of wafer parts 200 (for example, semiconductor wafers, etc.) are applied to be flip-chip bonded (bump-connected) a disc-shaped carrier 201 (for example, a glass plate on which semiconductor wafers and wiring layers are formed). ).

接著,例如使用樹脂供給裝置110將樹脂R供給至工件W上(圖30)。此處,藉由向工件W(載體201)全面以空出間隙地將液狀的樹脂R呈旋渦狀塗布供給,作成在工件W上沒有被樹脂R覆蓋的晶片零件200之狀態。Next, for example, the resin R is supplied to the workpiece W using the resin supply device 110 (FIG. 30 ). Here, by applying and supplying the liquid resin R in a spiral shape to the entire surface of the workpiece W (carrier 201) with a gap, the wafer component 200 is formed without being covered by the resin R on the workpiece W.

接著,在將既被供給樹脂R的工件W朝已開模的成形模具191安置之後,將成形模具191關模,使密封環196接觸夾持器195,進一步夾持工件W。此時,含有被關模的模穴C的模具內部被減壓。如此,藉由對周圍環境氣體減壓而將晶片零件200與載體201之間(圖19所示的狹隘部202)的空氣排出,可防止經底部填充後的樹脂R內產生空隙。此外,為提高空氣的排出效果,以在密封環196接觸之際樹脂R不與模穴件194的下面接觸的高度的方式對工件W供給樹脂R者較佳(圖27C)。Next, after the workpiece W to which the resin R has been supplied is set to the opened mold 191, the mold 191 is closed, the seal ring 196 is brought into contact with the holder 195, and the workpiece W is further clamped. At this time, the inside of the mold containing the closed cavity C is decompressed. In this way, the air between the wafer component 200 and the carrier 201 (the narrow part 202 shown in FIG. 19) is exhausted by depressurizing the ambient air, thereby preventing voids in the resin R after underfilling. In addition, in order to improve the air discharge effect, it is preferable to supply the resin R to the workpiece W at a height where the resin R does not contact the lower surface of the cavity member 194 when the seal ring 196 is in contact (FIG. 27C ).

接著,藉由進一步關模而壓縮液狀的樹脂R(圖31),使得在模穴C內被填充的樹脂R硬化並成形(圖32)。旋渦狀(複數個線狀)塗布的液狀的樹脂R係被成形模具191擴張而僅流動鄰接之線狀的樹脂R間的距離程度,與例如為縮短塗布時間而被堆積於工件W中央的一點作供給的樹脂R流到外周的情況相較下,可削減樹脂R的流動距離。藉此,可抑制一邊因交聯反應而進行硬化一邊流動的樹脂之樹脂流動所致使晶片偏移等不良狀況的發生。又,也可減低因樹脂流動而產生的流痕。且,防止在距離長的情況因流動時的受熱所致樹脂R的硬化而可提升在工件W外周之底部填充性。Next, by further closing the mold, the liquid resin R is compressed (FIG. 31 ), so that the resin R filled in the cavity C is hardened and molded (FIG. 32 ). The liquid resin R coated in a spiral shape (a plurality of linear shapes) is expanded by the forming die 191 to flow only the distance between adjacent linear resin R, which is, for example, accumulated in the center of the workpiece W in order to shorten the coating time. Compared with the case where the resin R supplied at one point flows to the outer periphery, the flow distance of the resin R can be reduced. Thereby, it is possible to suppress the occurrence of defects such as wafer shift due to the resin flow of the resin that flows while being cured by the crosslinking reaction. In addition, flow marks caused by resin flow can also be reduced. In addition, when the distance is long, the resin R is prevented from hardening due to heat during flow, and the underfilling property on the outer periphery of the workpiece W can be improved.

在將樹脂R僅以旋渦狀塗布並供給至工件W的情況,當以成形模具191逐漸壓縮樹脂R時,因為鄰接的線狀的樹脂R彼此會合流,所以在減壓不充分的情況會有導致空氣被包含於合流處之虞。於是,例如藉由作成圖33至圖36所示在工件W中的既定部位有空氣可流出的部分之塗布式樣,在以成形模具191逐漸壓縮樹脂R之際可充分進行空氣之排出,可防止成形不良。此外,在使用樹脂供給裝置110、110A對工件W供給樹脂R時,就算未將腔室130內設為真空狀態仍可防止樹脂R內含空氣等之不良狀況的樹脂R的塗布式樣作說明。When the resin R is applied only in a spiral shape and supplied to the workpiece W, when the resin R is gradually compressed by the molding die 191, the adjacent linear resins R will merge with each other, so there may be insufficient pressure reduction. Cause the air to be contained in the confluence. Thus, for example, by creating a coating pattern in which air can flow out of a predetermined portion of the workpiece W as shown in FIGS. 33 to 36, the air can be discharged sufficiently when the resin R is gradually compressed by the molding die 191, which can prevent Poor forming. In addition, when the resin supply devices 110 and 110A are used to supply the resin R to the workpiece W, even if the inside of the cavity 130 is not set to a vacuum state, the description will be given of a coating pattern of the resin R that can prevent defects such as air in the resin R.

圖33係顯示使旋渦狀的一部分(既定位置203)供給較細的樹脂R後的工件W之狀態。此處,在將液狀的樹脂R呈旋渦狀供給之際,在工件W的表面以圖33所示的十字方向或6方向、8方向等既定方向(既定位置203)或任意間隔,降低樹脂R的高度,或減少樹脂R。作為這樣的樹脂供給方法,例如藉由提高噴嘴122的移動速度,能使在其位置的塗布量比其他的位置還降低。又,作為別的方法,可減少來自於噴嘴122的樹脂R之塗布量。例如可考慮降低噴嘴122的開度(掐住噴嘴122)的方法或使柱塞123的動作速度變慢的方法。藉此,在以成形模具191壓縮樹脂R之際,因為空氣可通過既定位置203,故可順暢地排出空氣,可防止空隙的產生。FIG. 33 shows the state of the workpiece W after the fine resin R is supplied to a part of the spiral shape (the predetermined position 203). Here, when the liquid resin R is supplied in a spiral shape, the surface of the workpiece W is reduced in a predetermined direction (predetermined position 203) such as the cross direction shown in FIG. The height of R, or reduce the resin R. As such a resin supply method, for example, by increasing the moving speed of the nozzle 122, the coating amount at that position can be lower than other positions. In addition, as another method, the amount of resin R applied from the nozzle 122 can be reduced. For example, a method of reducing the opening degree of the nozzle 122 (pinching the nozzle 122) or a method of slowing down the movement speed of the plunger 123 can be considered. Thereby, when the resin R is compressed by the molding die 191, since the air can pass through the predetermined position 203, the air can be discharged smoothly, and the generation of voids can be prevented.

圖34顯示間歇地呈旋渦狀供給樹脂R後的工件W之狀態。此處,為了設置空氣可流動的空間,實質使用多點塗布的方法。在此情況,關於以成為旋渦狀的塗布式樣的方式移動中的噴嘴122,作成反覆於接近工件W時吐出樹脂R且於離開時既吐出的樹脂R被斷離的動作。因此,藉由在未完全結束塗布下移往下個吐出點,可即時進行移往下個吐出點之動作。藉此,因為在到達吐出點而接近工件W時可將樹脂R高速地反覆吐出,所以可高速地供給樹脂R。又,因為空氣可在被塗布樹脂R的點之間流動,可防止空隙的發生。又,因為從噴嘴122一點一點吐出樹脂R,所以可對工件W全面塗布樹脂R迄至既定的供給量為止。據此,例如因為可完成將旋渦的線高密度配置的塗布,所以減低樹脂R的流動量亦可減少流痕。FIG. 34 shows the state of the workpiece W after the resin R is intermittently supplied in a spiral shape. Here, in order to provide a space in which air can flow, a multi-point coating method is essentially used. In this case, regarding the nozzle 122 that is moving so as to become a spiral coating pattern, an operation in which the resin R is discharged when approaching the workpiece W is repeated, and the resin R that has been discharged when leaving is disconnected. Therefore, by moving down to the next discharge point before the coating is completely finished, the action of moving to the next discharge point can be performed in real time. Thereby, since the resin R can be repeatedly discharged at high speed when it reaches the discharge point and approaches the workpiece W, the resin R can be supplied at a high speed. In addition, since air can flow between the points where the resin R is applied, the occurrence of voids can be prevented. In addition, since the resin R is discharged little by little from the nozzle 122, the resin R can be applied to the entire surface of the workpiece W up to a predetermined supply amount. According to this, for example, since it is possible to complete the coating in which the vortex lines are arranged at a high density, reducing the flow amount of the resin R can also reduce the flow mark.

圖35顯示間歇地呈直線狀被供給樹脂R後的工件W之狀態。此處係使用參照圖34所說明的方法,為設置能使空氣流動的空間,作成實質地進行多點塗布那樣的直線狀的塗布式樣。又,藉由將樹脂R呈直線狀供給,亦可適用於向晶片間供給的情況,例如在圖24B所示最後對作為一封裝區域被切開的複數個晶片間作塗布的情況亦可適用。FIG. 35 shows the state of the work W after the resin R is supplied intermittently in a straight line. Here, the method described with reference to FIG. 34 is used to provide a space in which air can flow, and a linear coating pattern is created such that multi-point coating is substantially performed. In addition, by supplying the resin R in a straight line, it can also be applied to the case of supplying between the wafers. For example, it can also be applied to the case of coating between a plurality of wafers cut as a package area at the end as shown in FIG. 24B.

圖36顯示對晶片零件200間以多點供給樹脂R後的工件W之狀態。此處,使用參照圖34所說明的方法,例如藉由在4個鄰接的晶片零件200間塗布樹脂R,在以成形模具191壓縮樹脂R之際,可確保空氣流動並使樹脂R在模穴C內容易填充。 (實施形態8)FIG. 36 shows the state of the workpiece W after the resin R is supplied at multiple points between the wafer parts 200. Here, the method described with reference to FIG. 34 is used. For example, by applying resin R between four adjacent wafer parts 200, when the resin R is compressed by the molding die 191, air flow can be ensured and the resin R can be placed in the cavity. C is easy to fill. (Embodiment 8)

針對本發明實施形態之樹脂安置裝置310及具備其之樹脂成形裝置350,參照圖38至圖46作說明。圖38至圖42係用以說明動作中的樹脂安置裝置310之圖。圖43至圖46係用以說明動作中的樹脂成形裝置350的主要部分之圖。本實施形態中,作為被供給樹脂R的被供給物是使用工件W。The resin placement device 310 and the resin molding device 350 equipped with the resin placement device 310 according to the embodiment of the present invention will be described with reference to FIGS. 38 to 46. 38 to 42 are diagrams for explaining the resin placement device 310 in operation. FIGS. 43 to 46 are diagrams for explaining the main parts of the resin molding apparatus 350 in operation. In this embodiment, the workpiece W is used as the object to which the resin R is supplied.

首先,針對樹脂安置裝置310的構成作說明。樹脂安置裝置310係如圖38等所示,具備供樹脂R及工件W(被供給物)載置的腔室311。腔室311係具備一對的腔室部(一方設為上腔室部312,另一方設為下腔室部313)且構成為可開閉。工件W係被安置於下腔室部313的表面313a(安置面)。First, the structure of the resin installation device 310 will be described. As shown in FIG. 38 etc., the resin installation apparatus 310 is equipped with the chamber 311 in which resin R and the workpiece|work W (to-be-supply) are placed. The chamber 311 is provided with a pair of chamber parts (one is the upper chamber part 312 and the other is the lower chamber part 313) and is configured to be openable and closable. The workpiece W is set on the surface 313a (set surface) of the lower chamber portion 313.

此樹脂安置裝置310係藉由未圖示的控制部控制升降部。此控制部係具備CPU(中央演算處理裝置)、ROM、RAM等之記憶部所構成的電腦,藉由CPU讀出被記錄在記憶部的各種控制程式並予以執行,以控制構成樹脂安置裝置310的各部分之構成要素的動作。此外,本實施形態中,具備樹脂安置裝置310的樹脂成形裝置350是以具備控制部者作說明,但亦可為樹脂安置裝置310是單獨具備控制部。In this resin installation device 310, the lifting part is controlled by the control part which is not shown in figure. This control unit is a computer composed of a memory unit such as CPU (central arithmetic processing unit), ROM, RAM, etc. The CPU reads out and executes various control programs recorded in the memory unit to control the resin placement device 310 The actions of the constituent elements of each part. In addition, in the present embodiment, the resin molding apparatus 350 provided with the resin placement device 310 is described as having a control unit, but the resin placement device 310 may be separately provided with the control unit.

此等上腔室部312及下腔室部313係利用可承受腔室311內的任意壓力狀態者、例如金屬等之材質所構成。當腔室311成為關閉的狀態時,藉由具有凹部的上腔室部312與下腔室部313接觸,形成腔室311的內部311a(成為閉塞狀態)(參照圖39)。同圖中雖未圖示,但在上腔室部312與下腔室部313之間可設置適宜的密封機構。The upper chamber portion 312 and the lower chamber portion 313 are made of materials that can withstand any pressure state in the chamber 311, such as metal. When the chamber 311 is in the closed state, the upper chamber portion 312 having the recessed portion contacts the lower chamber portion 313 to form the inner portion 311a of the chamber 311 (in a closed state) (see FIG. 39). Although not shown in the figure, an appropriate sealing mechanism may be provided between the upper chamber portion 312 and the lower chamber portion 313.

又,樹脂安置裝置310具備對腔室311的內部311a進行空氣吸引以形成減壓狀態的減壓部314(例如真空泵)。減壓部314在已形成腔室311的內部311a的狀態下,經由設置於上腔室部312的空氣路315對內部311a進行空氣吸引而形成減壓狀態。此外,此減壓部314係受控制部所控制。In addition, the resin installation device 310 includes a decompression unit 314 (for example, a vacuum pump) that sucks air into the interior 311a of the chamber 311 to form a decompressed state. In a state where the interior 311a of the cavity 311 has been formed, the decompression portion 314 sucks air into the interior 311a through the air passage 315 provided in the upper cavity portion 312 to form a decompression state. In addition, the decompression unit 314 is controlled by the control unit.

又,樹脂安置裝置310具備將腔室311加熱的加熱部316。加熱部316(例如筒式加熱器(cartridge heater))係以與下腔室部313的表面313a平行地延伸的方式設置複數個。又,樹脂安置裝置310具備將腔室311冷卻的冷卻部317。冷卻部317(例如冷媒進行循環的冷卻管)係以與下腔室部313的表面313a平行地延伸的方式設置複數個。藉此,可將安置於表面313a的工件W的樹脂R加熱或冷卻。此外,此等加熱部316及冷卻部317係由控制部所控制。此外,加熱部316及冷卻部317可設於上腔室部312,亦可設於上腔室部312與下腔室部313雙方。In addition, the resin installation device 310 includes a heating unit 316 that heats the cavity 311. The heating part 316 (for example, a cartridge heater) is provided in plural so as to extend in parallel with the surface 313 a of the lower chamber part 313. In addition, the resin installation device 310 includes a cooling unit 317 that cools the cavity 311. A plurality of cooling parts 317 (for example, cooling pipes through which a refrigerant circulates) is provided so as to extend parallel to the surface 313a of the lower chamber part 313. Thereby, the resin R of the work W placed on the surface 313a can be heated or cooled. In addition, the heating part 316 and the cooling part 317 are controlled by the control part. In addition, the heating part 316 and the cooling part 317 may be provided in the upper chamber part 312, or may be provided in both the upper chamber part 312 and the lower chamber part 313.

此處,如圖39所示,可在比加熱部316還靠近表面313a側設置冷卻部317。藉此,使冷卻部317對下腔室部313的表面313a作動,俾遮蔽來自於加熱部316的熱。例如可使安置於表面313a的工件W的樹脂R從被加熱的狀態快速朝被冷卻的狀態移行。Here, as shown in FIG. 39, the cooling part 317 may be provided on the side closer to the surface 313 a than the heating part 316. Thereby, the cooling part 317 is actuated on the surface 313a of the lower chamber part 313 to shield the heat from the heating part 316. For example, the resin R of the workpiece W placed on the surface 313a can be quickly moved from the heated state to the cooled state.

其次,針對圖43以後所示的樹脂成形裝置350的構成作說明。樹脂成形裝置350係具備構成為可藉由公知的模具開閉機構作開閉之包含有成形模具360的壓機部。此成形模具360係具備藉由壓機部進行開閉之一對的模具(一方設為上模361,另一方設為下模362)所構成。Next, the configuration of the resin molding apparatus 350 shown in FIG. 43 and later will be described. The resin molding apparatus 350 is provided with a press unit including a molding die 360 configured to be opened and closed by a well-known die opening and closing mechanism. This forming mold 360 is configured by including a pair of molds (one is set as an upper mold 361 and the other is set as a lower mold 362) that is opened and closed by a press section.

又,在作為自動機的樹脂成形裝置350中,壓機部是與未圖示的供給部及收納部一起設置。就供給部而言,係進行將工件W(此處為被成形品)或樹脂R朝向壓機部作供給的準備、處理。在此供給部設有樹脂安置裝置310。又,就收納部而言,係進行對經樹脂成形後的工件W(此處為成形品)收納的準備、處理。又,在供給部、壓機部及收納部間的工件W或樹脂R之搬送方面,使用進行朝壓機部之搬入的裝載機(未圖示)及進行來自於壓機部之搬出的卸載機(未圖示),此等係由公知的機構所構成。此外,模具開閉機構、裝載機及卸載機係由控制部所控制。如此,基於後述那樣在搬送時的理由,以作成將樹脂安置裝置310與樹脂成形裝置350一體具備的構成者較佳,但亦可將此等分開地設置。Moreover, in the resin molding apparatus 350 which is an automatic machine, the press part is provided with the supply part and the storage part which are not shown in figure. As for the supply part, preparation and processing for supplying the workpiece W (here, the molded product) or the resin R toward the press part are performed. A resin installation device 310 is provided in this supply part. In addition, the accommodating portion prepares and processes for accommodating the resin-molded workpiece W (here, a molded product). In addition, for the transfer of the workpiece W or resin R between the supply unit, the press unit, and the storage unit, a loader (not shown) for carrying in to the press unit and unloading from the press unit are used. Machines (not shown), these are constituted by well-known mechanisms. In addition, the mold opening and closing mechanism, loader and unloader are controlled by the control unit. In this way, for the reason at the time of transportation as described later, it is preferable to have a configuration in which the resin placement device 310 and the resin molding device 350 are integrally provided, but these may be installed separately.

上模361係具備上夾持器363、模穴件364及上座365,且被組裝有此等模具塊(例如由合金工具鋼所構成)所構成。在上夾持器363,於厚度方向形成有貫通孔363a,於此貫通孔363a設有模穴件364。模穴件364係固定於上座365而被支持。本實施形態中,上模361雖具備模穴凹部367,但模穴凹部367的側部是由上夾持器363所構成,模穴凹部367的深部是由模穴件364所構成。又,上模361係具備設置在上夾持器363和上座365之間的彈性構件366(例如彈簧)。構成為隔著此彈性構件366使上夾持器363被組裝於上座365且在模具開閉方向可往復移動。此外,在成形模具360關模的狀態,模穴凹部367閉塞而構成模穴C(參照圖44)。此外,在這樣的成形模具360中,藉由被覆模穴凹部367的模具面而防止樹脂R與模具面之接觸以促進脫模,可使用防止來自滑動部分的樹脂漏洩之脫模片。The upper mold 361 is provided with an upper holder 363, a cavity member 364, and an upper seat 365, and is constituted by assembling these mold blocks (for example, made of alloy tool steel). In the upper holder 363, a through hole 363a is formed in the thickness direction, and a cavity member 364 is provided in the through hole 363a. The cavity member 364 is fixed to the upper base 365 and supported. In this embodiment, the upper mold 361 is provided with the cavity recess 367, but the side portion of the cavity recess 367 is formed by the upper clamp 363, and the deep portion of the cavity recess 367 is formed by the cavity member 364. In addition, the upper mold 361 is provided with an elastic member 366 (for example, a spring) provided between the upper holder 363 and the upper seat 365. The upper holder 363 is assembled to the upper base 365 via this elastic member 366, and it is comprised so that it may reciprocate in the mold opening and closing direction. In the state where the molding die 360 is closed, the cavity recess 367 is closed to form a cavity C (see FIG. 44). In addition, in such a forming mold 360, by covering the mold surface of the cavity recess 367 to prevent contact between the resin R and the mold surface to promote mold release, a release sheet that prevents resin leakage from the sliding portion can be used.

又,上模361具備密封構件370(例如O環),設在上夾持器363的貫通孔363a的內周面與模穴件364的外周面之間。又,樹脂成形裝置350具備對模穴C進行空氣吸引以形成真空狀態的真空部371(例如真空泵)。真空部371在藉由關模而既形成模穴C的狀態下,經由設置於上模361的上夾持器363之空氣路372對模穴C進行空氣吸引而形成真空狀態。又,樹脂成形裝置350具備加熱上模361的加熱部368。加熱部368(例如筒式加熱器(cartridge heater))係以與模穴件364的下面(模穴凹部367的裏面)平行地延伸的方式設置複數個。此外,真空部371及加熱部368係受控制部所控制。In addition, the upper mold 361 includes a sealing member 370 (for example, an O ring), and is provided between the inner peripheral surface of the through hole 363 a of the upper holder 363 and the outer peripheral surface of the cavity member 364. In addition, the resin molding apparatus 350 includes a vacuum unit 371 (for example, a vacuum pump) that sucks air into the cavity C to form a vacuum state. In a state where the cavity C is formed by closing the mold, the vacuum unit 371 suctions the cavity C through the air passage 372 provided in the upper holder 363 of the upper mold 361 to form a vacuum state. In addition, the resin molding apparatus 350 includes a heating unit 368 that heats the upper mold 361. A plurality of heating parts 368 (for example, a cartridge heater) are provided so as to extend in parallel with the lower surface of the cavity member 364 (the inner side of the cavity recess 367). In addition, the vacuum unit 371 and the heating unit 368 are controlled by the control unit.

下模362係具備下夾持器373、嵌件374及下座375,經將此等模具塊安置所構成。在下夾持器373,於厚度方向形成有貫通孔373a,在此貫通孔373a設有嵌件374。嵌件374係固定於下座375而被支持。此下模362中,在嵌件374的上面安置有工件W。又,下模362係具備彈性構件376(例如彈簧),設在下夾持器373與下座375之間。構成為:隔著此彈性構件376使下夾持器373被組裝於下座375且可在模具開閉方向往復移動。The lower mold 362 is provided with a lower holder 373, an insert 374, and a lower seat 375, and is constituted by placing these mold blocks. In the lower holder 373, a through hole 373a is formed in the thickness direction, and an insert 374 is provided in the through hole 373a. The insert 374 is fixed to the lower base 375 and supported. In this lower mold 362, a workpiece W is placed on the upper surface of the insert 374. In addition, the lower mold 362 is provided with an elastic member 376 (for example, a spring), and is provided between the lower holder 373 and the lower seat 375. The structure is such that the lower clamper 373 is assembled to the lower seat 375 via this elastic member 376 and is capable of reciprocating movement in the mold opening and closing direction.

又,下模362具備密封構件379(例如O環),設在下夾持器373的貫通孔373a的內周面與嵌件374的外周面之間。又,下模362具備密封構件380(例如O環),設於下夾持器373的上面,在關模之際與上模361的上夾持器363的下面接觸。又,樹脂成形裝置350具備對模穴C進行空氣吸引使成為真空狀態的真空部381(例如真空泵)。真空部381係在關模且已形成模穴C的狀態下,經由設置於下模362的下夾持器373之空氣路382對模穴C進行空氣吸引而形成真空狀態。又,樹脂成形裝置350具備加熱下模362的加熱部378。加熱部378(例如筒式加熱器)係以與嵌件374的上面平行地延伸的方式設置複數個。此外,真空部381及加熱部378係受控制部所控制。In addition, the lower mold 362 includes a sealing member 379 (for example, an O ring), and is provided between the inner peripheral surface of the through hole 373 a of the lower holder 373 and the outer peripheral surface of the insert 374. In addition, the lower mold 362 is provided with a sealing member 380 (for example, an O-ring), is provided on the upper surface of the lower clamp 373, and contacts the lower surface of the upper clamp 363 of the upper mold 361 when the mold is closed. In addition, the resin molding apparatus 350 includes a vacuum unit 381 (for example, a vacuum pump) that sucks air into the cavity C to be in a vacuum state. The vacuum part 381 is in a state where the mold is closed and the mold cavity C has been formed, and the mold cavity C is air sucked through the air passage 382 provided in the lower holder 373 of the lower mold 362 to form a vacuum state. In addition, the resin molding apparatus 350 includes a heating unit 378 that heats the lower mold 362. A plurality of heating parts 378 (for example, cartridge heaters) are provided so as to extend in parallel with the upper surface of the insert 374. In addition, the vacuum unit 381 and the heating unit 378 are controlled by the control unit.

其次,針對樹脂安置方法(樹脂安置裝置310的動作方法)作說明。首先,在將樹脂R供給(搭載)於工件W上之後,如圖38所示,在已開啟狀態的腔室311安置已被供給樹脂R的工件W。工件W朝向腔室311的安置係藉由裝載機來進行。Next, the resin installation method (the operating method of the resin installation device 310) will be described. First, after the resin R is supplied (mounted) on the work W, as shown in FIG. 38, the work W to which the resin R has been supplied is placed in the opened chamber 311. The placement of the workpiece W toward the cavity 311 is performed by a loader.

作為被安置樹脂R的工件W,例如使用複數個晶片零件400(半導體晶片等)是藉由微細的凸塊被倒裝封裝的基板401(例如形成有配線構造的暫時載體、配線基板及晶圓等)。這樣的工件W中,在晶片零件400與基板401之間形成有狹隘的部位(凸塊高度份量或窄間隙的凸塊間之間隙(gap))。在此情況,工件W成為因基板401上封裝有複數個晶片零件400而具有凹凸部402。本實施形態中,在具有凹凸部402的工件W上,以覆蓋凹凸部402的方式供給樹脂R。又,作為樹脂R是使用薄片樹脂(薄片狀的環氧系樹脂等之熱硬化性樹脂)。依據薄片樹脂,即便工件W的大小是大尺寸(例如12吋的晶圓級或例如一邊的長度超過300mm的大型的面板狀物),亦可藉由覆蓋工件W而形成均一地供給之狀態。As the workpiece W on which the resin R is placed, for example, a plurality of chip parts 400 (semiconductor wafers, etc.) are used. The substrate 401 (for example, a temporary carrier formed with a wiring structure, a wiring substrate, and a wafer) is flip-chip packaged by fine bumps. Wait). In such a workpiece W, a narrow portion (a bump height portion or a gap between bumps with a narrow gap) is formed between the wafer component 400 and the substrate 401. In this case, the workpiece W has uneven portions 402 due to the plurality of wafer components 400 being packaged on the substrate 401. In this embodiment, the resin R is supplied to the workpiece W having the uneven portion 402 so as to cover the uneven portion 402. In addition, as the resin R, a sheet resin (thermosetting resin such as a sheet-like epoxy resin) is used. According to the sheet resin, even if the size of the workpiece W is a large size (for example, a 12-inch wafer level or a large panel-like object with a side length of more than 300 mm), the workpiece W can be covered and uniformly supplied.

此處,薄片樹脂、即樹脂R,例如可使用被保護薄片所保護者。在此情況,於使用單面是被保護薄片所保護者時,亦可將其保護薄片配置於工件W的相反側,連同保護薄片一起安置於工件W。在此情況,藉由保護薄片可防止樹脂R之劣化或髒污等。於此際,只要在將樹脂R安置於工件W後剝離保護薄片即可。又,亦可將薄片樹脂、即樹脂R重疊複數片作使用。又,樹脂R係亦可使用將工件W上具有任意面積的薄片樹脂(樹脂R)排列複數片作使用。Here, as the sheet resin, that is, the resin R, for example, what is protected by the protective sheet can be used. In this case, when one side is protected by a protective sheet, the protective sheet may be arranged on the opposite side of the workpiece W, and the protective sheet may be placed on the workpiece W together with the protective sheet. In this case, the protection sheet can prevent deterioration or contamination of the resin R. In this case, it is only necessary to peel off the protective sheet after placing the resin R on the work W. In addition, a plurality of sheets of resin R, that is, resin R, may be stacked and used. In addition, the resin R system can also be used by arranging a plurality of sheets of resin (resin R) having an arbitrary area on the workpiece W.

接著,如圖39所示,以關閉腔室311的狀態,將腔室311的內部311a設為減壓狀態。此時,一邊加熱樹脂R一邊對腔室311的內部311a進行減壓。具體言之,藉由升降部使上腔室部312對下腔室部313逐漸接近。此時,藉由減壓部314事先開始進行空氣吸引,可形成內部311a而直接減壓。又,藉由利用加熱部316事先加熱腔室311的內部311a,加熱工件W與樹脂R,可使樹脂R軟化。此處,藉由在供工件W載置的下腔室部313設有加熱部316,可將工件W利用熱傳導直接加熱而快速加熱。如此,藉由加熱部316加熱工件W上的樹脂R,可縮短在樹脂成形裝置350中的加熱時間以縮短成形時間。此外,藉由事先加熱下腔室部313,可藉其輻射熱將含有上腔室部312的腔室311整體加熱,亦從樹脂R上面加熱而使之容易軟化。Next, as shown in FIG. 39, in a state where the chamber 311 is closed, the inside 311a of the chamber 311 is brought into a reduced pressure state. At this time, the pressure of the interior 311a of the cavity 311 is reduced while the resin R is being heated. Specifically, the upper chamber part 312 and the lower chamber part 313 are gradually approached by the lifting part. At this time, by starting air suction in advance by the decompression part 314, the inner portion 311a can be formed and the pressure can be directly reduced. In addition, by heating the interior 311a of the cavity 311 by the heating part 316 in advance, the workpiece W and the resin R are heated, and the resin R can be softened. Here, by providing the heating portion 316 in the lower chamber portion 313 where the workpiece W is placed, the workpiece W can be directly heated by heat conduction and quickly heated. In this way, by heating the resin R on the workpiece W by the heating part 316, the heating time in the resin molding apparatus 350 can be shortened to shorten the molding time. In addition, by heating the lower chamber portion 313 in advance, the entire chamber 311 including the upper chamber portion 312 can be heated by its radiant heat, and the resin R can also be heated from above to make it easy to soften.

藉此,可設成用被減壓的腔室311內的軟化狀態(柔軟狀態)的樹脂R覆蓋工件W的狀態。在此情況,如圖39所示,例如亦可設成樹脂R在工件W的外周等密接於基板401的狀態,被樹脂R與基板401所包夾的空間成為被減壓的狀態。此際,亦可在適宜地進行減壓與加熱之後,加熱部316於既定的時序停止,俾於內部311a的減壓狀態中樹脂R的交聯反應不會過度進行。此外,若作為樹脂R使用的薄片樹脂在大氣環境下為柔軟狀態,則亦可不使用加熱部316加熱。Thereby, it can be set as the state which covered the workpiece|work W with the resin R in the softened state (soft state) in the cavity 311 which was decompressed. In this case, as shown in FIG. 39, for example, the resin R may be in a state where the resin R is in close contact with the substrate 401 on the outer periphery of the workpiece W, and the space enclosed by the resin R and the substrate 401 is in a decompressed state. At this time, after decompression and heating are appropriately performed, the heating portion 316 is stopped at a predetermined timing so that the crosslinking reaction of the resin R does not proceed excessively in the decompressed state of the interior 311a. In addition, if the sheet resin used as the resin R is in a soft state in an atmospheric environment, the heating part 316 may not be used for heating.

接著,如圖40所示,於關閉腔室311的狀態,使腔室311的內部11a的壓力上升。具體言之,只要是藉由停止減壓部314將腔室311開放而使腔室311的內部311a開放於大氣中即可。此處,在使腔室311的內部311a的壓力上升的情況,不僅開放於大氣中的方法,亦包含參照圖39所說明之為了比減壓狀態的內部311a的壓力高而解除減壓狀態或積極地加壓的情況。如此,因未腔室311的內部311a的壓力相對變高而使樹脂R被按壓於工件W側。又,此際可減低工件W與樹脂R之間隙。本實施形態中,能以沿著凹凸部402的方式使樹脂R密接於工件W。據此,可防止凹凸部402與樹脂R之間隙的發生。Next, as shown in FIG. 40, in a state where the chamber 311 is closed, the pressure in the interior 11a of the chamber 311 is increased. Specifically, it is only necessary to stop the decompression part 314 to open the chamber 311 to open the inside 311a of the chamber 311 to the atmosphere. Here, when the pressure in the interior 311a of the chamber 311 is increased, not only the method of opening to the atmosphere, but also the method of releasing the decompression state or releasing the decompression state in order to be higher than the pressure of the interior 311a in the decompression state as described with reference to FIG. 39 The case of positive pressure. In this way, the pressure of the inside 311a of the cavity 311 is relatively high, so that the resin R is pressed against the workpiece W side. In addition, the gap between the workpiece W and the resin R can be reduced at this time. In this embodiment, the resin R can be brought into close contact with the workpiece W so as to follow the uneven portion 402. Accordingly, it is possible to prevent the occurrence of a gap between the uneven portion 402 and the resin R.

此外,亦可在空氣路315事先連接不同於減壓部314的加壓部(例如壓縮機),而在將減壓部314停止後,藉由加壓部提高腔室311的內部311a之壓力。又,亦可在空氣路315事先連接流量計,用流量計一邊測量一邊調整腔室311的內部311a之壓力。In addition, a pressurizing part (for example, a compressor) different from the depressurizing part 314 may be connected to the air path 315 in advance, and after the depressurizing part 314 is stopped, the pressure of the interior 311a of the chamber 311 can be increased by the pressurizing part. . In addition, a flow meter may be connected to the air path 315 in advance, and the pressure in the interior 311a of the chamber 311 may be adjusted while measuring the flow meter.

接著,如圖41所示,於關閉腔室311的狀態,亦可冷卻工件W及樹脂R。具體言之,藉由以冷卻部317冷卻下腔室部313,使得位在此表面313a上的工件W的樹脂R冷卻,就算樹脂R具有熱,亦可抑制交聯反應進行,能確保將工件W和樹脂R延緩搬送至成形模具360。此外,若是在加熱樹脂R使之軟化並在覆蓋工件W之後,則亦可利用冷卻部317將樹脂R冷卻。Next, as shown in FIG. 41, in the state where the cavity 311 is closed, the workpiece W and the resin R may also be cooled. Specifically, by cooling the lower chamber portion 313 with the cooling portion 317, the resin R of the workpiece W on the surface 313a is cooled, even if the resin R has heat, the crosslinking reaction can be suppressed, and the workpiece can be secured The transfer of W and resin R to the forming die 360 is delayed. In addition, after heating the resin R to soften it and covering the workpiece W, the resin R may be cooled by the cooling part 317.

接著,如圖42所示,將腔室311設為開啟的狀態。之後,藉由裝載機從腔室311取出工件W。依據這樣的樹脂安置方法,可在已從工件W與樹脂R之間除去空氣的狀態下將樹脂R安置於工件W。亦即,可抑制空氣在安置樹脂時中混入。換言之,可設成在安置樹脂時工件W與樹脂R之間未含有空氣的狀態。如同圖所示,亦可想成在晶片零件400與基板401之間存在有未被樹脂R填充的空間。然而,因為在使此區域減壓後會用熔融的樹脂R覆蓋,成為可維持既從晶片零件400下的空間除去大氣所含有的成分(空氣或水蒸氣)的狀態。Next, as shown in FIG. 42, the chamber 311 is set to an open state. After that, the workpiece W is taken out from the chamber 311 by the loader. According to such a resin placement method, the resin R can be placed on the workpiece W in a state where air has been removed from between the workpiece W and the resin R. That is, it is possible to prevent air from being mixed in when the resin is installed. In other words, it can be set in a state where no air is contained between the workpiece W and the resin R when the resin is placed. As shown in the figure, it is also conceivable that there is a space not filled with the resin R between the wafer component 400 and the substrate 401. However, since this area is covered with molten resin R after depressurizing, it is possible to maintain a state where components (air or water vapor) contained in the atmosphere can be removed from the space under the wafer component 400.

其次,針對樹脂成形方法(樹脂成形裝置350的動作方法)作說明。首先,如圖43所示,將藉由前述的樹脂安置方法而被供給樹脂R的工件W,往成形模具360搬入。具體言之,藉由裝載機從樹脂安置裝置310朝已開啟模具的成形模具360搬送工件W,安置在下夾持器373的上面。在此情況,如同上述,若樹脂R因冷卻部317而冷卻的話,就算是使用成為既定的溫度硬化會進行的熱硬化性樹脂,亦可防止在搬送中導致硬化進行而使在成形模具360中加熱加壓時變得難以流動那樣的狀態。Next, the resin molding method (the operating method of the resin molding apparatus 350) will be described. First, as shown in FIG. 43, the workpiece W supplied with the resin R by the aforementioned resin placement method is carried into the forming mold 360. Specifically, the workpiece W is transferred from the resin placement device 310 to the forming mold 360 whose mold has been opened by a loader, and is placed on the upper surface of the lower gripper 373. In this case, as described above, if the resin R is cooled by the cooling part 317, even if a thermosetting resin that cures at a predetermined temperature is used, it can prevent the curing from progressing during transportation and causing it to be in the mold 360. It becomes difficult to flow when heated and pressurized.

接著,如圖44所示,將成形模具360逐漸關模,將成形模具360的模穴C設為減壓(真空)狀態。具體言之,藉由模具開閉機構使上模361逐漸接近於下模362。藉此,於模穴C收容樹脂R。此時,藉由真空部371事先開始進行空氣吸引,可形成模穴C並直接減壓而設為真空狀態。Next, as shown in FIG. 44, the molding die 360 is gradually closed, and the cavity C of the molding die 360 is brought into a reduced pressure (vacuum) state. Specifically, the upper mold 361 gradually approaches the lower mold 362 by the mold opening and closing mechanism. Thereby, the resin R is accommodated in the cavity C. As shown in FIG. At this time, when the vacuum unit 371 starts air suction in advance, the cavity C can be formed and the pressure can be directly reduced to a vacuum state.

接著,迄至成為既定的成形壓以前,如圖45所示,進一步將成形模具360關模而進行壓縮成形。此時,因為成形模具360被加熱部378加熱到成形溫度,所以樹脂R係被成形模具360加熱、加壓。在此情況,工件W中,在晶片零件400與基板401之間形成有狹隘的部位(凸塊高度的份量或窄間隙的凸塊間之間隙)。即便有這樣的狹隘部位,如同上述,由於從晶片零件400下的空間除去包含於大氣中的成分(空氣或水蒸氣),所以能在未填充的情況下進行填充,可抑制空隙之發生並進行底部填充。之後進行必要充分的加熱加壓,使樹脂R熱硬化並完成成形模具360的模穴C的形狀。Then, until the predetermined molding pressure is reached, as shown in FIG. 45, the molding die 360 is further closed and compression molding is performed. At this time, since the molding die 360 is heated to the molding temperature by the heating unit 378, the resin R-based is heated and pressurized by the molding die 360. In this case, in the workpiece W, a narrow portion (a portion of the bump height or a gap between bumps with a narrow gap) is formed between the wafer component 400 and the substrate 401. Even if there is such a narrow part, as mentioned above, since the components (air or water vapor) contained in the atmosphere are removed from the space under the wafer part 400, it can be filled without filling, and the occurrence of voids can be suppressed and performed. Underfill. After that, heating and pressurization is performed sufficiently as necessary to thermally harden the resin R and complete the shape of the cavity C of the forming mold 360.

接著,如圖46所示,將成形模具360設為模具開啟狀態,從成形模具360搬出工件W(成形品)。具體言之,藉由模具開閉機構使上模361對下模362逐漸離開。從藉由卸載機而開啟模具的成形模具360取出工件W並往收納部搬出。Next, as shown in FIG. 46, the molding die 360 is set to the mold open state, and the workpiece W (molded product) is carried out from the molding die 360. Specifically, the upper mold 361 is gradually separated from the lower mold 362 by the mold opening and closing mechanism. The workpiece W is taken out from the forming mold 360 whose mold is opened by the unloader and carried out to the storage section.

本實施形態中,在樹脂成形前利用前述的樹脂安置方法抑制空氣混入工件W與樹脂R之間。因此,在工件W(成形品)的樹脂成形部,可抑制因空氣混入所致空隙的發生。又,在工件W中,即使有晶片零件400與基板401間的狹隘的部位,因為空氣的混入受到抑制(除去大氣所含有的空氣或水蒸氣等),故可抑制空隙的發生而確實地進行底部填充。In this embodiment, the aforementioned resin installation method is used to prevent air from entering between the workpiece W and the resin R before resin molding. Therefore, in the resin molded part of the workpiece W (molded product), the occurrence of voids due to air mixing can be suppressed. In addition, even in the workpiece W, even if there is a narrow part between the wafer part 400 and the substrate 401, the mixing of air is suppressed (air or water vapor contained in the atmosphere is removed), so the occurrence of voids can be suppressed and the process can be performed reliably. Underfill.

以上,已依據實施形態具體說明本發明,本發明並未受限於前述實施形態,當然可在不逸脫其要旨的範圍下作各種變更。又,上述實施形態中具體表示的本發明涉及之方法或裝置的各工序或各構成要素,係未必所有都需要,只要在未悖離可獲得各個效果之發明的範圍下都可適宜地作取捨選擇。As mentioned above, the present invention has been specifically described based on the embodiments, and the present invention is not limited to the foregoing embodiments, and of course various changes can be made without departing from the scope of the gist. In addition, the steps or the constituent elements of the method or apparatus of the present invention specifically shown in the above-mentioned embodiments are not necessarily required at all, as long as they do not deviate from the scope of the invention that can obtain the various effects, they can be appropriately selected. choose.

例如在作為工件是使用被倒裝接合於基板上的晶片零件之情況,在向基板供給液狀樹脂之際,可設成將基板與晶片零件之間減壓的狀態。因此,例如於壓縮成形中,在其基板與晶片零件之間變得容易填充樹脂,可適切地進行所謂的底部填充。For example, when a wafer component that is flip-chip bonded to a substrate is used as a workpiece, when the liquid resin is supplied to the substrate, the pressure can be reduced between the substrate and the wafer component. Therefore, for example, in compression molding, it becomes easy to fill the space between the substrate and the wafer component with resin, and so-called underfilling can be appropriately performed.

又,已針對在上述的實施形態1中於真空狀態(減壓環境氣體下)下供給液狀樹脂R的例子作了說明,但本發明不受此所限。亦即,依據上述的實施形態1所示的樹脂供給裝置,於在腔室的內部從噴嘴朝被供給物吐出(供給)液狀樹脂後,以真空狀態(減壓環境氣體下)排出空氣,亦可防止樹脂內含空氣等之不良狀況。In addition, the example in which the liquid resin R is supplied in a vacuum state (under reduced pressure atmosphere) in the above-mentioned first embodiment has been described, but the present invention is not limited to this. That is, according to the resin supply device shown in the above-mentioned first embodiment, after the liquid resin is ejected (supply) from the nozzle to the object to be supplied from the inside of the chamber, the air is discharged in a vacuum state (under reduced pressure atmosphere), It can also prevent undesirable conditions such as air in the resin.

又,可想像因以腔室30的內部30a成為高真空度的方式減壓而導致就算用夾管閥24閉塞噴嘴22,儲存於注射器21的液狀樹脂R還是會向腔室30的內部30a吐出那樣的情況。在這樣的情況,以作成將液狀樹脂R拉回注射器21內的構成者較佳。藉此,可防止液狀樹脂R無預期地吐出。例如圖18所示,亦可藉由在注射器21內部將沒有液狀樹脂R的空間(上側的空間)減壓使與藉由腔室30中之減壓而欲抽出液狀樹脂R的力均衡。Also, it is conceivable that the pressure is reduced so that the interior 30a of the chamber 30 becomes a high vacuum degree. Even if the nozzle 22 is closed by the pinch valve 24, the liquid resin R stored in the syringe 21 will still flow into the interior 30a of the chamber 30. Spit out such a situation. In such a case, it is preferable to have a structure that pulls the liquid resin R back into the syringe 21. This prevents the liquid resin R from being discharged unexpectedly. For example, as shown in FIG. 18, it is also possible to balance the pressure of the space (upper space) without the liquid resin R in the syringe 21 with the force required to draw out the liquid resin R by the pressure reduction in the chamber 30 .

具體言之,如圖18所示,作成具備柱塞軸23a及柱塞密封部23b的柱塞23。柱塞軸23a係前端擴徑且推壓設於注射器21的注射器蓋部21a而將液狀樹脂R吐出。柱塞密封部23b具備柱塞軸23a被插入中央的環狀的構造,藉由與筒狀的注射器本體21b組合,將注射器本體21b內與注射器蓋部21a的空間設為既定的密閉空間。又,柱塞密封部23b具備:用以確保與注射器本體21b的緣部之密封性的密封23b1;用以維持與柱塞軸23a之密封性的密封23b2;及用以對注射器本體21b的內部進行空氣吸引之吸引路23b3。藉此,於注射器21的內部,藉由注射器蓋部21a、注射器本體21b、柱塞軸23a及柱塞密封部23b形成環狀的密閉空間。在既形成這樣的密閉空間的狀態下,藉由經由設於柱塞密封部23b的吸引路23b3利用未圖示的配管或真空泵進行空氣吸引,將此空間減壓拉回注射器蓋部21a,可施加將液狀樹脂R拉回注射器21內的力。Specifically, as shown in FIG. 18, the plunger 23 provided with the plunger shaft 23a and the plunger sealing part 23b is produced. The plunger shaft 23a has a diameter enlarged at its tip and presses the syringe cap 21a provided on the syringe 21 to eject the liquid resin R. The plunger seal 23b has an annular structure in which the plunger shaft 23a is inserted in the center. By combining with the cylindrical syringe body 21b, the space between the syringe body 21b and the syringe cap 21a is set as a predetermined sealed space. In addition, the plunger sealing portion 23b includes: a seal 23b1 to ensure the sealing performance with the edge of the syringe body 21b; a seal 23b2 to maintain the sealing performance with the plunger shaft 23a; The suction path 23b3 for air suction. As a result, the syringe cap 21a, the syringe body 21b, the plunger shaft 23a, and the plunger seal 23b form an annular closed space inside the syringe 21. In a state where such a closed space is formed, by sucking air through the suction path 23b3 provided in the plunger seal portion 23b with a piping or a vacuum pump not shown, the space can be decompressed and pulled back to the syringe cover portion 21a. A force to pull the liquid resin R back into the syringe 21 is applied.

此外,注射器21係在以注射器本體21b與注射器蓋部21a儲存著液狀樹脂R的狀態下向裝置內供給。因此,例如於圖1所示那樣的位置安置有未使用的注射器21的狀態中,使柱塞23下降並將柱塞軸23a的前端插入注射器本體21b。又,此際以柱塞密封部23b使注射器本體21b的上端的開口部閉塞,可於進行適宜的樹脂吐出後施加使液狀樹脂R返回注射器21內的力。據此,除了可防止液狀樹脂R無預期地吐出以外,即使是沒有無預期地吐出之情況,藉由利用使液狀樹脂R返回注射器21內的力亦可進行斷液。In addition, the syringe 21 is supplied into the device with the liquid resin R stored in the syringe body 21b and the syringe cap 21a. Therefore, for example, in a state where the unused syringe 21 is set in a position as shown in FIG. 1, the plunger 23 is lowered and the tip of the plunger shaft 23a is inserted into the syringe body 21b. In addition, at this time, the opening of the upper end of the syringe body 21b is closed by the plunger seal 23b, and a force for returning the liquid resin R to the syringe 21 can be applied after proper resin ejection. According to this, in addition to preventing the liquid resin R from being discharged unexpectedly, even if the liquid resin R is not discharged unexpectedly, the liquid resin R can be shut off by using the force that returns the liquid resin R into the syringe 21.

又,作為將液狀樹脂R拉回注射器21內的構成,不僅是依據上述那樣的減壓的方法,亦可作成將注射器蓋部21a以機械方式拉回的構成。在此情況,藉由作成使柱塞軸23a的前端對注射器蓋部21a螺合或嵌合等而任意地卡合的構成,也能利用柱塞軸23a將注射器蓋部21a直接拉回。例如可藉由在柱塞軸23a的前端設置陽螺紋並在注射器蓋部21a的主面設置陰螺紋,使此等螺合。當然,若可任意卡合則不受此種構成所局限,也可作成將柱塞軸23a的前端作成T字狀,使之於在注射器蓋部21a上適宜地設置的溝部旋轉並卡合等。In addition, as a configuration for pulling the liquid resin R back into the syringe 21, not only the method of reducing pressure as described above, but also a configuration for pulling the syringe cap 21a back mechanically. In this case, by making the tip of the plunger shaft 23a screw or fit the syringe cap 21a to arbitrarily engage with each other, the syringe cap 21a can be directly pulled back by the plunger shaft 23a. For example, a male screw may be provided at the front end of the plunger shaft 23a and a female screw may be provided on the main surface of the syringe cap 21a, so that these can be screwed together. Of course, if it can be arbitrarily engaged, it is not limited by this structure. The tip of the plunger shaft 23a can be made into a T-shape, and it can be rotated and engaged with a groove provided on the syringe cover 21a. .

例如圖16、圖17、圖22、圖23、圖33至圖36所示那樣的各種樹脂供給方法,作為工件W不僅是搭載晶片零件200的載體201,對於在平坦的工件或圖28所示那樣的下模穴成形中以確保離形成或防止樹脂漏洩等之目的所使用的脫模片也可適用。For example, the various resin supply methods shown in Fig. 16, Fig. 17, Fig. 22, Fig. 23, Fig. 33 to Fig. 36, as the workpiece W is not only the carrier 201 on which the wafer component 200 is mounted, but also for a flat workpiece or as shown in Fig. 28 The mold release sheet used for the purpose of securing separation formation or preventing resin leakage in such lower cavity molding can also be applied.

在前述實施形態3等之實施形態中已針對在減壓後使吐出樹脂R的噴嘴122的位置移動的構成作了說明,但本發明不受此所限。例如針對藉由使吐出樹脂R的噴嘴122的位置移動以任意的形狀將樹脂R塗布於工件W上或脫模片上的構成,亦可在未減壓下供給樹脂R。又,例如亦能以任意的形狀將樹脂R塗布於脫模片上,藉此也可排出在脫模片與樹脂R之間隙所包夾的空氣或樹脂R內的空氣。又,作為具備複數個注射器121或噴嘴122的構成,亦可作成使塗布時間縮短的構成。例如藉由設置複數個注射器121或噴嘴122且使之對脫模片一邊相對移動一邊進行塗布,可縮短對脫模片之塗布時間。In the foregoing embodiment 3 and other embodiments, the configuration in which the position of the nozzle 122 for discharging the resin R is moved after the pressure is reduced has been described, but the present invention is not limited to this. For example, in a configuration in which the resin R is applied to the workpiece W or the release sheet in an arbitrary shape by moving the position of the nozzle 122 that discharges the resin R, the resin R may be supplied without reduced pressure. In addition, for example, the resin R can be applied to the release sheet in an arbitrary shape, and thereby the air trapped in the gap between the release sheet and the resin R or the air in the resin R can also be discharged. In addition, as a configuration provided with a plurality of syringes 121 or nozzles 122, a configuration that shortens the coating time may also be adopted. For example, by providing a plurality of syringes 121 or nozzles 122 and coating the release sheet while relatively moving, the coating time for the release sheet can be shortened.

又,例如圖33至圖36等所示那樣的各種樹脂供給方法,係在工件W中既定部位具有空氣可流出的部分之塗布式樣,在進行樹脂R的吐出之際即使未減壓,例如藉由在被減壓的模具內使空氣一邊流出(排出)一邊進行成形,可進行防止空隙的發生之成形。In addition, for example, various resin supply methods as shown in FIGS. 33 to 36, etc., are coating patterns in which a predetermined portion of the workpiece W has a portion through which air can flow. Even if the pressure is not reduced when the resin R is being discharged, for example, by Molding is performed while air is flowing out (discharged) in the decompressed mold, and molding can be performed to prevent the occurrence of voids.

前述實施形態3中,作為腔室蓋的荷重支承物是使用滾珠滾輪,但例如可使用藉由來自壓縮機的空氣承受荷重的構成。此外,亦可將設置腔室蓋的荷重支承物之構成利用在圖1至圖15所示那樣的樹脂供給裝置。例如藉由在移動於既定方向的上腔室部31所設的密封部33之內周或外周,將滾珠滾輪設為荷重支承物,在同圖所示那樣的構成中亦可防止密封部33的壓扁而順暢地動作。In the third embodiment described above, the ball roller is used as the load support of the chamber cover, but for example, a configuration in which the load is received by the air from the compressor can be used. In addition, it is also possible to use a resin supply device as shown in FIGS. 1 to 15 for the structure in which the load support provided with the chamber cover is provided. For example, by setting the ball roller as a load bearing on the inner or outer circumference of the sealing portion 33 provided in the upper chamber portion 31 that moves in a predetermined direction, the sealing portion 33 can also be prevented in the structure shown in the same figure. The squash and smooth movement.

又,雖針對在前述任一實施形態中都將注射器21等配置成鉛直方向(縱向)的構成例作了說明,但本發明不受此所限。例如亦可將注射器21等配置於水平方方向(橫向)。藉此,可降低裝置的高度。In addition, although the configuration example in which the syringe 21 and the like are arranged in the vertical direction (vertical direction) in any of the foregoing embodiments has been described, the present invention is not limited to this. For example, the syringe 21 etc. may be arrange|positioned in the horizontal direction (lateral direction). In this way, the height of the device can be reduced.

前述實施形態8中,已針對作為覆蓋工件的樹脂是使用薄片樹脂的情況作了說明。惟不受此所局限,樹脂方面使用顆粒樹脂,亦可作成在經加熱、熔融而藉由表面張力一體化的狀態(平均的狀態)下覆蓋工件。據此,可從顆粒樹脂間去除空氣並以樹脂覆蓋工件。又,亦可將顆粒樹脂預先加壓並形成薄片狀而作為薄片樹脂使用。In the above-mentioned Embodiment 8, the case where a sheet resin is used as the resin covering the workpiece has been described. However, it is not limited by this. For the resin, granular resin is used, and it can also be made to cover the workpiece in a state (average state) integrated by surface tension after heating and melting. According to this, air can be removed from the granular resin and the workpiece can be covered with resin. In addition, the pelletized resin may be previously pressurized and formed into a flake shape to be used as a flake resin.

又,前述實施形態8中,針對作為被供給物的一例之工件是使用複數個晶片零件被倒裝封裝的基板之情況作了說明。惟不受此所局限,作為工件也可使用平坦的放熱板或屏蔽板等,再者此等亦可為具有用於熱傳導或電導的凹凸部者。再者,作為工件,亦可是未設置晶片而僅搭載著凸塊的晶圓,也能作成在環構件的單面貼附黏著膜且於黏著膜上貼附晶片構件等之構成。在此等之情況中亦可防止工件與薄片樹脂產生間隙,即便有間隙亦可除去大氣所含有的空氣或水蒸氣等而可防止未填充的情況。In addition, in the above-mentioned Embodiment 8, the case where the workpiece as an example of the supply is a substrate in which a plurality of chip parts are flip-chip mounted is used. However, it is not limited by this, and a flat heat radiating plate or shielding plate can also be used as a workpiece, and these can also be those having uneven portions for heat conduction or electrical conduction. Furthermore, as a workpiece, it may be a wafer without a chip but only bumps, and it can also be configured such that an adhesive film is attached to a single side of the ring member and a chip member is attached to the adhesive film. In these cases, it is also possible to prevent gaps between the workpiece and the sheet resin, and even if there are gaps, it is possible to remove the air or water vapor contained in the atmosphere to prevent unfilling.

再者,被供給物亦可為脫模片。在此情況,例如作為將圖43所示的樹脂成形裝置350上下反轉那種構成,可考慮將脫模片往下模供給的構成。在此情況,可考慮於脫模片上安置薄片樹脂、即樹脂R之後,往樹脂成形裝置350搬入而對另外搬入的工件W進行樹脂成形。即使在此情況,就算在脫模片與樹脂R之間有夾入空氣亦可予以除去,故而可防止產生殘留空氣膨脹而發生在成形品上留下痕跡的那樣種不良狀況之成形。Furthermore, the object to be supplied may be a release sheet. In this case, for example, as a configuration in which the resin molding apparatus 350 shown in FIG. 43 is reversed up and down, a configuration in which the release sheet is supplied to the lower mold can be considered. In this case, it is conceivable that after placing a sheet of resin, that is, resin R, on the release sheet, it is loaded into the resin molding device 350 and the workpiece W that has been loaded separately is resin-molded. Even in this case, even if the air trapped between the release sheet and the resin R can be removed, it is possible to prevent the occurrence of residual air expansion and the formation of defects that leave marks on the molded product.

22:噴嘴 30:腔室 30a:內部 R:液狀樹脂 W:工件(被供給物)22: Nozzle 30: Chamber 30a: internal R: Liquid resin W: Workpiece (Supply)

圖1係用以說明本發明的一實施形態涉及之樹脂供給裝置之圖。 圖2係用以說明接於圖1後之動作的樹脂供給裝置之圖。 圖3係用以說明接於圖2後之動作的樹脂供給裝置之圖。 圖4係用以說明接於圖3後之動作的樹脂供給裝置之圖。 圖5係用以說明接於圖4後之動作的樹脂供給裝置之圖。 圖6係用以說明接於圖5後之動作的樹脂供給裝置之圖。 圖7係用以說明接於圖6後之動作的樹脂供給裝置之圖。 圖8係用以說明接於圖7後之動作的樹脂供給裝置之圖。 圖9係用以說明本發明的其他實施形態涉及之樹脂供給裝置之圖。 圖10係用以說明接於圖9後之動作的樹脂供給裝置之圖。 圖11係用以說明接於圖10後之動作的樹脂供給裝置之圖。 圖12係用以說明接於圖11後之動作的樹脂供給裝置之圖。 圖13係用以說明接於圖12後之動作的樹脂供給裝置之圖。 圖14係用以說明接於圖13後之動作的樹脂供給裝置之圖。 圖15係用以說明接於圖14後之動作的樹脂供給裝置之圖。 圖16係已被供給液狀樹脂之被供給物的俯視圖。 圖17係已被供給液狀樹脂之被供給物的側視圖。 圖18係用以說明注射器之構造的一例之圖。 圖19係用以說明本發明其他實施形態涉及之樹脂供給裝置之圖,顯示被供給物供給至腔室的狀態。 圖20係用以說明接於圖19後之動作的樹脂供給裝置之圖,顯示腔室被關閉的狀態。 圖21係用以說明接於圖20後之動作的樹脂供給裝置之圖,顯示正供給著樹脂的狀態。 圖22係用以說明朝向圓板形狀的被供給物之樹脂的塗布式樣之圖,圖22A係表示旋渦,圖22B係表示格子的狀態。 圖23係用以說明朝向面板形狀的被供給物之樹脂的塗布式樣之圖,顯示圖23A為中心點,圖23B為多點,圖23C為大旋渦,圖23D為小旋渦,圖23E為角旋渦,圖23F為格子,圖23G為放射線的狀態。 圖24係用以說明朝向被供給物的主要部分(晶片零件)之樹脂的塗布式樣之圖,圖24A顯示晶片零件的全周塗布,圖24B顯示在未將鄰接的晶片零件間覆蓋下作塗布,圖24C顯示在將鄰接的晶片零件間覆蓋並作塗布的狀態。 圖25係用以說明本發明其他實施形態涉及之樹脂供給裝置之圖,顯示進行重量測量的狀態。 圖26係用以說明接於圖25後之動作的樹脂供給裝置之圖,顯示塗布樹脂的狀態。 圖27係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示圖27A係被供給物已被供給樹脂的狀態,圖27B係在成形模具安置有被供給物的狀態,圖27C係成形模具內被減壓的狀態,圖27D係被供給物被夾持的狀態,圖27E係在模穴(cavity)內使樹脂被熱硬化的狀態。 圖28係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示圖28A係被供給物已被供給樹脂的狀態,圖28B係於被供給物被底部填充的狀態,圖28C係在成形模具安置有被供給物的狀態,圖28D係成形模具內被減壓的狀態,圖28E係在模穴內使樹脂被熱硬化的狀態。 圖29係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示被供給樹脂前之被供給物的狀態。 圖30係用以說明接於圖29後的樹脂成形方法之圖,顯示被供給旋渦狀樹脂後之被供給物的狀態。 圖31係用以說明接於圖30後的樹脂成形方法之圖,顯示被樹脂壓縮中的被供給物之狀態。 圖32係用以說明接於圖31後的樹脂成形方法之圖,顯示成形有樹脂的被供給物之狀態。 圖33係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示使旋渦狀的一部分較細地供給樹脂後之狀態。 圖34係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示間歇地呈旋渦狀被供給樹脂後之被供給物之狀態。 圖35係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示間歇地呈直線狀被供給樹脂後之被供給物之狀態。 圖36係用以說明本發明其他實施形態涉及之樹脂成形方法之圖,顯示對晶片零件間以多點供給樹脂後之被供給物之狀態。 圖37係用以說明本發明其他實施形態涉及之樹脂成形裝置之圖。 圖38係用以說明本發明其他實施形態涉及之樹脂安置裝置之圖。 圖39係用以說明接於圖38後之動作中的樹脂安置裝置之圖。 圖40係用以說明接於圖39後之動作中的樹脂安置裝置之圖。 圖41係用以說明接於圖40後之動作中的樹脂安置裝置之圖。 圖42係用以說明接於圖41後之動作中的樹脂安置裝置之圖。 圖43係用以說明本發明其他實施形態涉及之樹脂成形裝置的主要部分之圖。 圖44係用以說明接於圖43後之動作中的樹脂成形裝置的主要部分之圖。 圖45係用以說明接於圖44後之動作中的樹脂成形裝置的主要部分之圖。 圖46係用以說明接於圖45後之動作中的樹脂成形裝置的主要部分之圖。Fig. 1 is a diagram for explaining a resin supply device according to an embodiment of the present invention. FIG. 2 is a diagram for explaining the operation of the resin supply device following FIG. 1. Fig. 3 is a diagram for explaining the resin supply device following the operation of Fig. 2; Fig. 4 is a diagram for explaining the resin supply device following the operation of Fig. 3; Fig. 5 is a diagram for explaining the resin supply device following the operation of Fig. 4; Fig. 6 is a diagram for explaining the resin supply device following the operation of Fig. 5; FIG. 7 is a diagram for explaining the resin supply device following the operation of FIG. 6; FIG. 8 is a diagram for explaining the resin supply device following the operation of FIG. 7. Fig. 9 is a diagram for explaining a resin supply device according to another embodiment of the present invention. Fig. 10 is a diagram for explaining the resin supply device following the operation of Fig. 9; Fig. 11 is a diagram for explaining the resin supply device following the operation of Fig. 10; Fig. 12 is a diagram for explaining the resin supply device following the operation of Fig. 11; Fig. 13 is a diagram for explaining the resin supply device following the operation of Fig. 12; Fig. 14 is a diagram for explaining the resin supply device following the operation of Fig. 13. Fig. 15 is a diagram for explaining the resin supply device following the operation of Fig. 14; Fig. 16 is a plan view of the object to which the liquid resin has been supplied. Fig. 17 is a side view of the object to which the liquid resin has been supplied. Fig. 18 is a diagram for explaining an example of the structure of the syringe. Fig. 19 is a diagram for explaining a resin supply device according to another embodiment of the present invention, and shows a state in which an object to be supplied is supplied to the chamber. Fig. 20 is a diagram for explaining the operation of the resin supply device following Fig. 19, showing a state in which the chamber is closed. Fig. 21 is a diagram for explaining the operation of the resin supply device following Fig. 20, showing a state in which resin is being supplied. FIG. 22 is a diagram for explaining a coating pattern of resin toward the object to be supplied in the shape of a disc, FIG. 22A shows the vortex, and FIG. 22B shows the state of the grid. Figure 23 is a diagram for explaining the coating pattern of the resin facing the supplied object in the shape of the panel. Figure 23A is the center point, Figure 23B is the multi-point, Figure 23C is the large vortex, Figure 23D is the small vortex, and Figure 23E is the corner For the vortex, Fig. 23F is a grid, and Fig. 23G is a state of radiation. Fig. 24 is a diagram for explaining the coating pattern of the resin facing the main part (wafer part) of the object to be supplied. Fig. 24A shows the coating on the whole circumference of the chip part, and Fig. 24B shows the coating without covering the adjacent wafer parts. , Figure 24C shows the state of covering and coating adjacent wafer parts. Fig. 25 is a diagram for explaining a resin supply device according to another embodiment of the present invention, showing a state in which weight measurement is performed. Fig. 26 is a diagram for explaining the resin supply device following the operation of Fig. 25, showing the state of applying resin. Fig. 27 is a diagram for explaining a resin molding method related to another embodiment of the present invention. Fig. 27A is a state where the object has been supplied with resin, Fig. 27B is a state where the object is placed in the molding die, and Fig. 27C is The state in which the pressure in the molding die is decompressed, FIG. 27D shows the state in which the object to be supplied is clamped, and FIG. 27E shows the state in which the resin is thermally cured in the cavity. Fig. 28 is a diagram for explaining a resin molding method related to another embodiment of the present invention. Fig. 28A is a state in which the object has been supplied with resin, Fig. 28B is in a state where the object is underfilled, and Fig. 28C is in Fig. 28D shows a state in which the mold is decompressed, and Fig. 28E shows a state in which the resin is thermally cured in the mold cavity. Fig. 29 is a diagram for explaining a resin molding method according to another embodiment of the present invention, showing the state of the object before the resin is supplied. Fig. 30 is a diagram for explaining the resin molding method following Fig. 29, showing the state of the object to be supplied after the spiral resin is supplied. Fig. 31 is a diagram for explaining the resin molding method following Fig. 30, showing the state of the object being supplied while being compressed by the resin. Fig. 32 is a diagram for explaining the resin molding method following Fig. 31, showing the state of the resin molded object. FIG. 33 is a diagram for explaining a resin molding method according to another embodiment of the present invention, and shows a state where a part of a spiral shape is thinly supplied with resin. FIG. 34 is a diagram for explaining a resin molding method according to another embodiment of the present invention, and shows the state of the object to be supplied after the resin is supplied intermittently in a spiral shape. 35 is a diagram for explaining a resin molding method according to another embodiment of the present invention, showing the state of the object to be supplied after the resin is supplied intermittently in a straight line. FIG. 36 is a diagram for explaining a resin molding method according to another embodiment of the present invention, and shows the state of the object to be supplied after the resin is supplied to the chip parts at multiple points. Fig. 37 is a diagram for explaining a resin molding apparatus according to another embodiment of the present invention. Fig. 38 is a diagram for explaining a resin placement device according to another embodiment of the present invention. FIG. 39 is a diagram for explaining the resin placement device in the operation subsequent to FIG. 38. FIG. FIG. 40 is a diagram for explaining the resin placement device in the operation subsequent to FIG. 39. FIG. Fig. 41 is a diagram for explaining the resin installation device in operation following Fig. 40; FIG. 42 is a diagram for explaining the resin placement device in operation following FIG. 41. FIG. Fig. 43 is a diagram for explaining the main part of a resin molding apparatus according to another embodiment of the present invention. FIG. 44 is a diagram for explaining the main part of the resin molding apparatus in operation subsequent to FIG. 43. FIG. 45 is a diagram for explaining the main part of the resin molding apparatus in operation subsequent to FIG. 44. FIG. Fig. 46 is a diagram for explaining the main part of the resin molding apparatus in operation subsequent to Fig. 45;

10:樹脂供給裝置 10: Resin supply device

11:控制部 11: Control Department

20:吐出部 20: Discharge part

21:注射器 21: Syringe

22:噴嘴 22: Nozzle

23:柱塞 23: Plunger

24:夾管閥 24: Pinch valve

30:腔室 30: Chamber

30a:內部 30a: internal

31:上腔室部 31: Upper chamber

31a:貫通突起部 31a: Through protrusion

32:下腔室部 32: Lower chamber

32a:表面 32a: surface

32b:下沈部 32b: sinking part

33:密封部 33: Sealing part

34:吐出保持部 34: spit out holding part

35:密封部 35: Sealing part

36:密封部 36: Sealing part

40:重量計 40: weight meter

41:真空部 41: Vacuum Department

42:空氣路 42: Air Way

50:腔室驅動部 50: Chamber drive unit

51:保持部 51: holding part

52:第1軌道 52: Track 1

53:第1滑件 53: Slide 1

54:第1馬達 54: 1st motor

70:噴嘴升降驅動部 70: Nozzle lifting drive

72:第2軌道 72: Track 2

73:第2滑件 73: Slide 2

74:第2馬達 74: 2nd motor

80:吐出驅動部 80: Discharge drive part

82:第3軌道 82: Track 3

83:第3滑件 83: Slide 3

84:第3馬達 84: 3rd motor

W:工件 W: Workpiece

R:液狀樹脂 R: Liquid resin

Claims (7)

一種樹脂供給裝置,係在設為真空狀態的腔室內將液狀的樹脂向被供給物供給之樹脂供給裝置,其特徵為具備:構成前述腔室的腔室蓋及腔室本體;密封環,設於前述腔室本體的開口緣,以將前述腔室蓋與前述腔室本體之間密封;及荷重支承物,沿著前述密封環設於前述腔室本體,在前述腔室蓋與前述腔室本體之間承受荷重,該樹脂供給裝置更具備蓋驅動部,其在前述腔室關閉的狀態下使前述腔室蓋對前述腔室本體移動,前述腔室蓋為可水平移動之構成,作為前述腔室蓋的荷重支承物,係具備滾轉荷重支承物或滑動荷重支承物之構成。 A resin supply device is a resin supply device that supplies liquid resin to an object to be supplied in a chamber set in a vacuum state, and is characterized by comprising: a chamber cover and a chamber body constituting the aforementioned chamber; a sealing ring, Is provided on the opening edge of the chamber body to seal between the chamber cover and the chamber body; and a load support is provided on the chamber body along the sealing ring, between the chamber cover and the chamber Loads are placed between the chamber bodies, and the resin supply device is further equipped with a cover driving part that moves the chamber cover to the chamber body when the chamber is closed, and the chamber cover is configured to be horizontally movable, as The load support of the aforementioned chamber cover is configured with a rolling load support or a sliding load support. 如請求項1之樹脂供給裝置,其中於前述腔室開啟的狀態,在從前述腔室本體朝向前述腔室蓋的高度中,前述密封環高於前述荷重支承物。 The resin supply device of claim 1, wherein in the state where the chamber is opened, the seal ring is higher than the load support in the height from the chamber body to the chamber cover. 如請求項1或2之樹脂供給裝置,其中前述荷重支承物係設有複數個滾珠滾輪的構成。 The resin supply device of claim 1 or 2, wherein the load support is a structure in which a plurality of ball rollers are provided. 如請求項1或2之樹脂供給裝置,其更具備重量計,設於前述腔室內且供前述被供給物安置。 Such as the resin supply device of claim 1 or 2, which is further equipped with a weight scale, which is arranged in the aforementioned chamber and is provided for the aforementioned objects to be placed. 如請求項1或2之樹脂供給裝置,其更具備:安置台,設於前述腔室內且供前述被供給物安置;及台驅動部,其使前述安置台旋轉。 For example, the resin supply device of claim 1 or 2 is further provided with: a setting table, which is provided in the chamber and is used for setting the object to be supplied; and a table driving part, which rotates the setting table. 如請求項5之樹脂供給裝置,其更具備重量計,設 於前述腔室外且隔著貫通前述腔室本體的銷而供前述被供給物安置。 Such as the resin supply device of claim 5, which is further equipped with a weight meter, designed The object to be supplied is placed outside the chamber and via a pin penetrating the chamber body. 一種樹脂成形裝置,其特徵為具備:如請求項1至6中任一項之樹脂供給裝置;及模具,其具有模穴且在前述模穴內使前述樹脂熱硬化。 A resin molding device characterized by comprising: a resin supply device according to any one of claims 1 to 6; and a mold having a cavity and thermally hardening the resin in the cavity.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101014455A (en) * 2004-09-08 2007-08-08 视瑞尔技术公司 Method and apparatus for replicating microstructured optical masks
US20080254626A1 (en) * 2004-03-29 2008-10-16 Canon Kabushiki Kaisha Processing apparatus
JP2012126075A (en) * 2010-12-17 2012-07-05 Apic Yamada Corp Liquid resin supplying device and resin molding device
CN105599976A (en) * 2015-11-06 2016-05-25 上海福帝包装机械有限公司 Modified atmosphere packaging machine

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3791578B2 (en) * 1999-02-15 2006-06-28 Nok株式会社 Molding equipment
JP2007307843A (en) * 2006-05-20 2007-11-29 Apic Yamada Corp Resin molding method/device
JP5817044B2 (en) * 2011-12-14 2015-11-18 アピックヤマダ株式会社 Resin sealing device and resin sealing method
JP6058431B2 (en) * 2013-03-08 2017-01-11 アピックヤマダ株式会社 Resin molding apparatus and resin molding method
WO2015159743A1 (en) * 2014-04-18 2015-10-22 アピックヤマダ株式会社 Resin molding die and resin molding method
CN105459397B (en) * 2015-12-16 2018-01-30 浙江大学 A kind of drip-proof shower nozzle for fused glass pellet 3D printer
CN106493349A (en) * 2016-02-19 2017-03-15 珠海天威飞马打印耗材有限公司 3 D-printing material, FDM three-dimensional printers and its Method of printing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080254626A1 (en) * 2004-03-29 2008-10-16 Canon Kabushiki Kaisha Processing apparatus
CN101014455A (en) * 2004-09-08 2007-08-08 视瑞尔技术公司 Method and apparatus for replicating microstructured optical masks
JP2012126075A (en) * 2010-12-17 2012-07-05 Apic Yamada Corp Liquid resin supplying device and resin molding device
CN105599976A (en) * 2015-11-06 2016-05-25 上海福帝包装机械有限公司 Modified atmosphere packaging machine

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