TWI808136B - 含有放電燈之光源裝置、照射裝置、及放電燈之判定方法 - Google Patents

含有放電燈之光源裝置、照射裝置、及放電燈之判定方法 Download PDF

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Publication number
TWI808136B
TWI808136B TW108107961A TW108107961A TWI808136B TW I808136 B TWI808136 B TW I808136B TW 108107961 A TW108107961 A TW 108107961A TW 108107961 A TW108107961 A TW 108107961A TW I808136 B TWI808136 B TW I808136B
Authority
TW
Taiwan
Prior art keywords
discharge lamp
light source
ultraviolet light
switch
lamp
Prior art date
Application number
TW108107961A
Other languages
English (en)
Chinese (zh)
Other versions
TW201945858A (zh
Inventor
池田富彥
Original Assignee
日商鳳凰電機股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商鳳凰電機股份有限公司 filed Critical 日商鳳凰電機股份有限公司
Publication of TW201945858A publication Critical patent/TW201945858A/zh
Application granted granted Critical
Publication of TWI808136B publication Critical patent/TWI808136B/zh

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/24—Testing of discharge tubes
    • G01R31/245—Testing of gas discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/82—Lamps with high-pressure unconstricted discharge having a cold pressure > 400 Torr
    • H01J61/822—High-pressure mercury lamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/54—Igniting arrangements, e.g. promoting ionisation for starting
    • H01J61/548—Igniting arrangements, e.g. promoting ionisation for starting using radioactive means to promote ionisation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B35/00—Electric light sources using a combination of different types of light generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/02—Details
    • H05B41/04—Starting switches
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B45/00—Circuit arrangements for operating light-emitting diodes [LED]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Circuit Arrangements For Discharge Lamps (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
TW108107961A 2018-03-13 2019-03-11 含有放電燈之光源裝置、照射裝置、及放電燈之判定方法 TWI808136B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-046077 2018-03-13
JP2018046077 2018-03-13

Publications (2)

Publication Number Publication Date
TW201945858A TW201945858A (zh) 2019-12-01
TWI808136B true TWI808136B (zh) 2023-07-11

Family

ID=67907669

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108107961A TWI808136B (zh) 2018-03-13 2019-03-11 含有放電燈之光源裝置、照射裝置、及放電燈之判定方法

Country Status (5)

Country Link
US (1) US11913985B2 (ja)
JP (1) JP7274761B2 (ja)
CN (1) CN111819496B (ja)
TW (1) TWI808136B (ja)
WO (1) WO2019176600A1 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009212041A (ja) * 2008-03-06 2009-09-17 Phoenix Denki Kk 補助光源およびその補助光源を備える光源装置
JP2016200751A (ja) * 2015-04-13 2016-12-01 フェニックス電機株式会社 光源装置及び露光装置とその検査方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007317529A (ja) * 2006-05-26 2007-12-06 Mitsubishi Electric Corp 高圧放電ランプ
JP4826446B2 (ja) * 2006-11-27 2011-11-30 ウシオ電機株式会社 光源装置
JP3137962U (ja) * 2007-10-03 2007-12-13 岩崎電気株式会社 光源装置
JP3137961U (ja) * 2007-10-03 2007-12-13 岩崎電気株式会社 光源装置
DE102008058819A1 (de) * 2007-11-28 2009-06-25 Toshiba Lighting & Technology Corp. Entladungslampenzündvorrichtung
JP4788719B2 (ja) 2008-02-01 2011-10-05 パナソニック株式会社 高圧放電ランプシステム、およびそれを用いたプロジェクタ
WO2010131574A1 (ja) * 2009-05-14 2010-11-18 岩崎電気株式会社 光源装置
JP4752959B2 (ja) * 2009-06-30 2011-08-17 岩崎電気株式会社 光源装置
JP4995342B1 (ja) * 2011-11-21 2012-08-08 フェニックス電機株式会社 露光用光源およびこれを用いた露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009212041A (ja) * 2008-03-06 2009-09-17 Phoenix Denki Kk 補助光源およびその補助光源を備える光源装置
JP2016200751A (ja) * 2015-04-13 2016-12-01 フェニックス電機株式会社 光源装置及び露光装置とその検査方法
TW201708971A (zh) * 2015-04-13 2017-03-01 鳳凰電機股份有限公司 曝光裝置及其檢查方法

Also Published As

Publication number Publication date
US20210003627A1 (en) 2021-01-07
JPWO2019176600A1 (ja) 2021-03-11
JP7274761B2 (ja) 2023-05-17
US11913985B2 (en) 2024-02-27
CN111819496A (zh) 2020-10-23
CN111819496B (zh) 2023-10-03
TW201945858A (zh) 2019-12-01
WO2019176600A1 (ja) 2019-09-19

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