TWI802063B - Cutting device, and method of manufacturing cut product - Google Patents
Cutting device, and method of manufacturing cut product Download PDFInfo
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- TWI802063B TWI802063B TW110140032A TW110140032A TWI802063B TW I802063 B TWI802063 B TW I802063B TW 110140032 A TW110140032 A TW 110140032A TW 110140032 A TW110140032 A TW 110140032A TW I802063 B TWI802063 B TW I802063B
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- 238000005520 cutting process Methods 0.000 title claims abstract description 175
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 230000007246 mechanism Effects 0.000 claims abstract description 196
- 238000003825 pressing Methods 0.000 claims abstract description 103
- 238000003754 machining Methods 0.000 claims description 12
- 239000012530 fluid Substances 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 239000000758 substrate Substances 0.000 description 86
- 239000004065 semiconductor Substances 0.000 description 21
- 238000010586 diagram Methods 0.000 description 19
- 238000000034 method Methods 0.000 description 6
- 238000004806 packaging method and process Methods 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 239000000470 constituent Substances 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 238000003860 storage Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
- B28D1/24—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising with cutting discs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mining & Mineral Resources (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Shearing Machines (AREA)
- Nonmetal Cutting Devices (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
- Control And Other Processes For Unpacking Of Materials (AREA)
Abstract
本發明所欲解決的問題在於提供一種切斷裝置等,可抑制由半切穿來在切斷對象物上形成的溝的深度的偏差。 為了解決此問題,本發明的切斷裝置,具備切斷機構。切斷機構,具有用以將切斷對象物切斷的刀刃。刀刃,具有第一側面和第二側面。切斷裝置,進一步具備第一推壓機構和第二推壓機構。第一推壓機構,設置在對向於第一側面的位置。第二推壓機構,設置在對向於第二側面的位置。第一推壓機構和第二推壓機構,各自構成為將切斷對象物自上方朝向下方推壓。當施加半切穿時,第一推壓機構和第二推壓機構的各自與切斷對象物的相對的位置關係,以與切斷機構與切斷對象物的相對的位置關係相同的方式變化。 The problem to be solved by the present invention is to provide a cutting device or the like capable of suppressing variations in the depth of grooves formed in an object to be cut by half-cutting. In order to solve this problem, the cutting device of the present invention includes a cutting mechanism. The cutting mechanism has a blade for cutting an object to be cut. A blade has a first side and a second side. The cutting device further includes a first pressing mechanism and a second pressing mechanism. The first pushing mechanism is arranged at a position opposite to the first side. The second pushing mechanism is arranged at a position opposite to the second side. Each of the first pressing mechanism and the second pressing mechanism is configured to press the object to be cut from above to below. When half-cutting is applied, the relative positional relationship between the first pressing mechanism and the second pressing mechanism and the object to be cut changes in the same manner as the relative positional relationship between the cutting mechanism and the object to be cut.
Description
本發明關於一種切斷裝置、及切斷品的製造方法。The present invention relates to a cutting device and a method for manufacturing a cut product.
日本特開2008-112961號公報(專利文獻1),揭露一種半導體裝置的製造方法。此製造方法中,由切片鋸(dicing saw)來施加半切穿(half cut),藉此在導線架上形成有溝。其後,在溝上形成有鍍層,由寬度窄的切片鋸來沿著溝切斷導線架。藉此可得到切斷成個別片材的半導體裝置(參照專利文獻1)。Japanese Patent Application Publication No. 2008-112961 (Patent Document 1) discloses a method for manufacturing a semiconductor device. In this manufacturing method, a half cut is applied by a dicing saw, whereby a groove is formed on the lead frame. Thereafter, a plating layer is formed on the groove, and the lead frame is cut along the groove by a narrow dicing saw. Thereby, a semiconductor device cut into individual sheets can be obtained (see Patent Document 1).
[先前技術文獻] (專利文獻) 專利文獻1:日本特開2008-112961號公報 [Prior Art Literature] (patent documents) Patent Document 1: Japanese Patent Laid-Open No. 2008-112961
[發明所欲解決的問題] 導線架等切斷對象物會有翹曲的情況。若在沿著切斷對象物的狀態下對於切斷對象物施加半切穿,則在切斷對象物上形成的溝的深度會偏差。上述專利文獻1中,沒有揭露這種問題的解決手段。 [Problem to be solved by the invention] Objects to be cut such as lead frames may warp. If half-cutting is applied to the object to be cut in a state along the object to be cut, the depth of the groove formed on the object to be cut will vary. In the above-mentioned Patent Document 1, a solution to such a problem is not disclosed.
本發明是用以解決這種問題而完成,其目的在於提供一種切斷裝置、及切斷品的製造方法,可減少由半切穿來在切斷對象物上形成的溝的深度的偏差。The present invention was made to solve such problems, and an object of the present invention is to provide a cutting device and a method of manufacturing a cut product capable of reducing variations in the depth of grooves formed on an object to be cut by half-cutting.
[解決問題的技術手段] 依據本發明的一種局面的切斷裝置,構成為對於由樹脂成形的切斷對象物,在切斷對象物的厚度方向上施加半切穿。此切斷裝置,具備切斷機構。切斷機構,具有用以將切斷對象物切斷的刀刃。刀刃,具有第一側面和第二側面。切斷裝置,進一步具備第一推壓機構和第二推壓機構。第一推壓機構,設置在對向於第一側面的位置。第二推壓機構,設置在對向於第二側面的位置。第一推壓機構和第二推壓機構,各自構成為將切斷對象物自上方朝向下方推壓。當施加半切穿時,第一推壓機構和第二推壓機構的各自與切斷對象物的相對的位置關係,以與切斷機構與切斷對象物的相對的位置關係相同的方式變化。 [Technical means to solve the problem] A cutting device according to an aspect of the present invention is configured to give a half-cut through the object to be cut in the thickness direction of the object to be cut which is formed of resin. This cutting device includes a cutting mechanism. The cutting mechanism has a blade for cutting an object to be cut. A blade has a first side and a second side. The cutting device further includes a first pressing mechanism and a second pressing mechanism. The first pushing mechanism is arranged at a position opposite to the first side. The second pushing mechanism is arranged at a position opposite to the second side. Each of the first pressing mechanism and the second pressing mechanism is configured to press the object to be cut from above to below. When half-cutting is applied, the relative positional relationship between the first pressing mechanism and the second pressing mechanism and the object to be cut changes in the same manner as the relative positional relationship between the cutting mechanism and the object to be cut.
依據本發明的其他局面的切斷品的製造方法,是使用上述切斷裝置之切斷品的製造方法。此切斷品的製造方法,包含下列步驟:準備安裝有第一厚度的刀刃之切斷裝置;對於切斷對象物施加半切穿;將刀刃替換成第二厚度的刀刃,該第二厚度比第一厚度更薄;及,沿著施加了半切穿的位置來將切斷對象物切斷。A method of manufacturing a cut product according to another aspect of the present invention is a method of manufacturing a cut product using the above-mentioned cutting device. The method of manufacturing the cut-off product includes the steps of: preparing a cutting device equipped with a blade of a first thickness; applying a half-cut through to an object to be cut; replacing the blade with a blade of a second thickness, the second thickness being smaller than the first thickness 1. The thickness is thinner; and, the object to be cut is cut along the position where the half-cut is applied.
[發明的效果] 依據本發明,能夠提供一種切斷裝置、及切斷品的製造方法,可減少由半切穿來在切斷對象物上形成的溝的深度的偏差。 [Effect of the invention] According to the present invention, it is possible to provide a cutting device and a method of manufacturing a cut product capable of reducing variations in the depth of grooves formed in an object to be cut by half-cutting.
以下,針對關於本發明的一側面的實施形態(以下,也稱為「本實施形態」),參照圖式並詳細地說明。另外,對於圖中相同或相當部分賦予相同符號而不重複其說明。又,為了容易理解,各圖式中對於適當對象會省略或誇張且示意地描繪。又,各圖式中的各箭頭所表示的方向,在各圖式中是共通的。Hereinafter, an embodiment (hereinafter also referred to as "the present embodiment") related to one aspect of the present invention will be described in detail with reference to the drawings. In addition, the same code|symbol is attached|subjected to the same or a corresponding part in a figure, and the description is not repeated. In addition, for easy understanding, appropriate objects are omitted or exaggerated and schematically drawn in each drawing. In addition, the directions indicated by the arrows in the drawings are common to the drawings.
[1.實施形態1]
<1-1.概要>
第1圖是示意地表示依據實施形態1的切斷裝置10的平面的一部分之圖。如第1圖所示,切斷裝置10,包含切斷台30和切斷機構40。
[1. Embodiment 1]
<1-1. Overview>
Fig. 1 is a diagram schematically showing a part of a plane of a
切斷台30,保持要切斷的封裝基板20。切斷台30,包含保持構件31、旋轉機構32、及移動機構33。保持構件31,自下方吸附封裝基板20,藉此保持封裝基板20。旋轉機構32,可使保持構件31在圖中的θ方向上旋轉。移動機構33,使保持構件31沿著圖中的Y軸移動。另外,在封裝基板20中,由樹脂封裝有已連接有半導體晶片之基板或導線架。另外,在參照後述第2圖來說明的半導體封裝50的製造中使用的封裝基板20,作為其一例是使用導線架之封裝基板。The cutting table 30 holds the
切斷機構40,包含刀刃41。切斷機構40,是由刀刃41來切斷封裝基板20,藉此將封裝基板20切斷成個別片材的複數個半導體封裝。切斷機構40,可沿著圖中的X軸和Z軸移動。另外,切斷裝置10,也可以由具有2個切斷機構40之雙主軸來構成,也可以由具有1個切斷機構40之單主軸來構成。The
又,切斷機構40,也可以構成為由刀刃41來去除封裝基板20的一部分,藉此在封裝基板20上形成溝。亦即,切斷機構40,可以在封裝基板20中,對於封裝基板20的厚度方向施加半切穿。切斷裝置10的名稱(切斷裝置)所包含的所謂「切斷」的用語的概念,包含將切斷對象分離成複數個、及去除切斷對象的一部分。Furthermore, the
切斷裝置10,例如為了可以進行切斷品的一例也就是半導體封裝50般的可濕性側面(wettable flank)QFN(方形扁平無引腳封裝,Quad Flat No-leaded)的製造,而具有對於封裝基板20施加半切穿的機能。接著針對半導體封裝50、及半導體封裝50的製造方法進行說明。The
第2圖是示意地表示半導體封裝50之斜視圖。如第2圖所示,半導體封裝50中,在圖式的頂面(形成有端子52的一面)與側面的邊界部分形成有段差部51。當要對半導體封裝50進行表面構裝時,焊料會進入段差部51。藉此,關於半導體封裝50,能夠實現立體的焊料連接構造。又,焊料會進入段差部51,所以構裝後的外觀檢查中,能夠容易地從半導體封裝50的側面觀察到焊縫。FIG. 2 is a perspective view schematically showing a
第3圖是用以對於段差部51的形成方法進行說明之圖。參照第3圖,為了形成段差部51,首先,由具有第一厚度之刀刃41來在封裝基板20上形成有溝G1。其後,由具有第二厚度(比第一厚度更薄)之刀刃41來在位置P1切斷封裝基板20,藉此將封裝基板20切斷成個別片材。藉此,製造形成有段差部51之複數個半導體封裝50。FIG. 3 is a diagram for explaining a method of forming the
如上述,半導體封裝50中存在各種優點。藉由施加半切穿而能夠實現將段差部51形成於半導體封裝50。切斷裝置10,例如為了製造半導體封裝50而具有對於封裝基板20施加半切穿的機能。As described above, various advantages exist in the
當對於封裝基板20施加半切穿時,重要的是盡可能在封裝基板20上形成有均勻深度的溝。在切斷裝置10中,施加可以抑制由半切穿來形成的溝的深度的偏差之巧思。以下,對於切斷裝置10的構成等進行詳細說明。When applying the half-cut through to the
<1-2.切斷裝置的構成>
第4圖是自側方來表示切斷裝置10的一部分之示意圖。如第4圖所示,切斷裝置10,包含切斷台30、切斷機構40、推壓機構60、及吐出機構70。
<1-2. Configuration of cutting device>
Fig. 4 is a schematic diagram showing a part of the
推壓機構60和吐出機構70,各自地安裝於切斷機構40。推壓機構60安裝於切斷機構40的後方,吐出機構70安裝於切斷機構40的前方。另外,切斷機構40的「前方」,當切斷台30往刀刃41的下方的位置移動過來時,是切斷台30進入過來的方向。刀刃41,由推壓機構60和吐出機構70來夾在Y軸方向上。相對於刀刃41,推壓機構60,設置於與吐出機構70相反的一側的位置。藉此,推壓機構60和吐出機構70的兩方,成為可安裝於切斷機構40。The
推壓機構60,構成為可自上方朝向下方推壓被配置於切斷台30上的封裝基板20。推壓機構60的構成、及設置有推壓機構60的理由,詳細說明於後。The
吐出機構70,包含以各自地吐出加工液的方式構成的3個噴嘴(例如,第一噴嘴、第二噴嘴及第三噴嘴)。第一噴嘴,朝向刀刃41吐出加工液。第二噴嘴,朝向刀刃41與封裝基板20的接觸處所(切斷部分)吐出加工液。第三噴嘴,朝向當封裝基板20的切斷時所產生的不要的邊料部分吐出加工液。另外,吐出機構70,不一定要包含3個噴嘴。例如,吐出機構70,也可以由1個或2個噴嘴來構成,也可以由4個以上的噴嘴來構成。吐出機構70,例如是吐出由儲水槽或從自來水管所供給的加工液。若由吐出機構70來將加工液噴射到旋轉中的刀刃41,則大量的加工液接觸到刀刃41,可更有效果地冷卻刀刃41。又,若加工液噴射到切斷部分,則大量的加工液供給到加工點,能夠抑制切斷時產生的熱,而能夠適當地切斷封裝基板20。又,利用加工液來噴射到邊材部分,能夠去除在切斷台30上殘留的邊材部分。The
第5圖是自側方來表示推壓機構60與刀刃41的關係之示意圖。第6圖是示意地表示推壓機構60之平面圖。第7圖是自正面來表示推壓機構60與刀刃41的關係之示意圖。FIG. 5 is a schematic view showing the relationship between the
參照第5圖、第6圖及第7圖,推壓機構60,包含第一推壓機構61和第二推壓機構62。第一推壓機構61設置於靠近刀刃41的一方的側面的位置,第二推壓機構62設置於靠近刀刃41的另一方的側面的位置。當由刀刃41來進行封裝基板20的切斷時,刀刃41位於夾在第一推壓機構61與第二推壓機構62之間的區域。亦即,由刀刃41來進行封裝基板20的切斷時,在側視中,第一推壓機構61的一部分與刀刃的一方的側面對向,第二推壓機構62的一部分與刀刃的另一方的側面對向。Referring to FIG. 5 , FIG. 6 and FIG. 7 , the pushing
第一推壓機構61和第二推壓機構62,各自構成為自上方朝向下方推壓封裝基板20(參照第1圖)。第一推壓機構61和第二推壓機構62,各自地包含板彈簧610、推壓單元620、基部構件630、640、螺絲624、625、631、633、634。The first
基部構件630、640、650,例如各自以金屬來構成。基部構件650,是沿著高度方向延伸的板狀的構件,且安裝於切斷機構40的後端部。在基部構件650的兩側面,各自地形成有孔H1、H2。孔H1、H2各自是在縱方向長的孔。利用螺絲來通過孔H1、H2,以將基部構件650固定於切斷機構40。在孔H1、H2中,各自能夠藉由改變螺絲鎖固的高度方向的位置來改變推壓機構60的高度方向上的位置。The
基部構件640,是自基部構件650的下端部往前方延伸的構件,且安裝於基部構件650。基部構件630,是安裝於基部構件640的頂面之棒狀的構件,且自基部構件640往前方延伸。在基部構件630、640,各自地形成有螺絲孔,基部構件630、640彼此由螺絲633、634來鎖固成一體。在基部構件630、640的各自上所形成的孔H3,具有在前後方向長的形狀,能夠藉由調整螺絲鎖固的位置來調整輥子622的前後方向上的位置。The
在基部構件630的底面,安裝有往斜下方延伸的板彈簧610。板彈簧610,例如是金屬製。在板彈簧610形成有螺絲孔,以將基部構件630和板彈簧610彼此由螺絲632來鎖固成一體。螺絲631,貫穿基部構件630的螺絲孔,並自上方推壓板彈簧610。板彈簧610中的由螺絲631推壓的位置,是在比由螺絲632來螺絲鎖固的位置更前方。調整螺絲631的高度方向的位置,藉此調整板彈簧610的彎曲程度。藉此,調整板彈簧610的彈力。A
在板彈簧610的前端部,安裝有推壓單元620。推壓單元620,包含基部構件621、輥子622、旋轉軸623、螺絲624、625。基部構件621,例如是由金屬或樹脂來構成。在基部構件621形成有螺絲孔,基部構件621和板彈簧610彼此由螺絲624、625來鎖固成一體。在俯視中的基部構件621的前端部形成有凹部,輥子622位於該凹部。輥子622,隔著旋轉軸623而安裝於基部構件621,且可相對於基部構件621旋轉。旋轉軸623,在X軸方向(刀刃41的厚度方向)上延伸。輥子622,例如是由橡膠或樹脂來構成。輥子622,是本發明的「推壓構件」的一例。使用橡膠或樹脂般具有彈性的輥子622,藉此能夠減少由輥子622推壓所產生的痕跡附加在封裝基板20上。又,能夠減少要壓碎的當半切穿時產生的毛邊。At the front end portion of the
在輥子622的下方不存在封裝基板20的狀態,輥子622的下端,位於比用以表示刀刃41的下端位置之假想面Z1更下方。因此,當封裝基板20的切斷時,輥子622的下端過來到比刀刃41的下端位置更高的位置,所以輥子622藉由板彈簧610的彈力來將封裝基板20往下壓。In a state where the
第8圖是用以說明當對於封裝基板20施加半切穿時的刀刃41與輥子622的位置關係之示意圖。如第8圖所示,當對於封裝基板20施加半切穿時,刀刃41會切除封裝基板20的一部分。因此,刀刃41在高度方向上進入到比封裝基板20的頂面更下方。另一方面,半切穿的形成時,輥子622將封裝基板20的頂面往下壓。因此,輥子622的下端過來到比刀刃41的下端位置更高的位置。FIG. 8 is a schematic diagram for explaining the positional relationship between the
又,Y軸方向上的輥子622的旋轉中心的位置(位置P6),位於比Y軸方向上的刀刃41的旋轉中心的位置(位置P5)更前方。此是因為由刀刃41來對於封裝基板20的切入開始位置(位置P7),位於比Y軸方向上的刀刃41的旋轉中心的位置(位置P5)更前方。依據切斷裝置10,輥子622的旋轉中心的位置,位於比刀刃41的旋轉中心的位置更前方,所以能夠在更靠近切入開始位置的位置由輥子622來推壓封裝基板20。接著,對於在切斷裝置10中設置有推壓裝置60的理由進行說明。Also, the position of the rotation center of the
<1-3.設置有推壓裝置的理由>
第9圖是自側方來表示比較對象也就是切斷裝置10X的一部分之示意圖。如第9圖所示,切斷裝置10X不具有推壓裝置。例如,會有封裝基板20翹曲的情況。若在封裝基板20翹曲的狀態下,對於封裝基板20施加半切穿,則會產生溝的深度依據位置而偏差的問題。例如,會產生相較於在位置P2形成的溝的深度,在位置P3形成的溝的深度更深;相較於在位置P3形成的溝的深度,在位置P4形成的溝的深度更深之情況。在依據本實施形態1的切斷裝置10中,為了解決這種問題而設置有推壓裝置60。
<1-3. The reason for installing the pressing device>
Fig. 9 is a schematic diagram showing a part of the
第10圖是用以說明依據本實施形態1的切斷裝置10中的推壓機構60的有效性之圖。如第10圖所示,切斷裝置10中,當對於封裝基板20施加半切穿時,由輥子622來將鄰接於封裝基板20的切入開始處所之位置往下壓。在由輥子622來往下壓,藉此抑制封裝基板20的翹曲的狀態下,對於封裝基板20施加半切穿。因此,依據切斷裝置10,在抑制封裝基板20的翹曲的狀態下,實行封裝基板20的半切穿,所以能夠抑制由半切穿來形成的溝的深度的偏差。Fig. 10 is a diagram for explaining the effectiveness of the
第11圖是自側方來表示在刀刃41的直徑變小的狀態下的推壓機構60與刀刃41的關係之示意圖。如第11圖所示,即便刀刃41的直徑變小,輥子622也會藉由板彈簧610的彈力來往下方賦能,所以能夠將切斷對象物自上方往下方推壓。FIG. 11 is a schematic view showing the relationship between the
第12圖是用以說明推壓機構60的動作之示意圖。如第12圖所示,在安裝有推壓機構60之切斷機構40的一部分上設置有旋轉軸J1,並構成為該切斷機構40的一部分可旋轉。亦即,該切斷機構40的一部分可旋轉,藉此在側視中,能夠使推壓機構60自與刀刃41重疊的位置避開。其結果,能夠容易地實行刀刃41的交換。這樣一來,可說是依據本實施形態1的切斷裝置10包含避開機構,該避開機構包含的旋轉軸J1,構成為在側視中,能夠使推壓機構60避開到不會與刀刃41重疊的位置。FIG. 12 is a schematic diagram for explaining the operation of the
<1-4.切斷裝置的動作>
例如,藉由以下方法來製造半導體封裝50(參照第2圖)。在切斷裝置10中安裝有第一厚度的刀刃41。
<1-4. Operation of cutting device>
For example, the
其後,在切斷裝置10中,切斷台30自切斷機構40的前方進入到刀刃41的下方。伴隨著切斷台30的進入,推壓機構60將切斷台30上的封裝基板20自上方朝向下方推壓,並且開始由刀刃41來進行對於封裝基板20的半切穿。在切斷機構40安裝有推壓機構60,所以當施加半切穿時,推壓機構60與封裝基板20的相對的位置關係,以與切斷機構40與封裝基板20的相對的位置關係相同的方式變化。Thereafter, in the
若結束封裝基板20的半切穿,則在切斷裝置10中替換刀刃41。替換後的刀刃41,具有第二厚度(比第一厚度更薄)。When the half-cutting of the
其後,在切斷裝置10中,切斷台30自切斷機構40的前方進入到刀刃41的下方。伴隨著切斷台30的進入,推壓機構60將切斷台30上的封裝基板20自上方朝向下方推壓,並且開始由刀刃41來進行對於封裝基板20的切斷。實行沿著由半切穿所形成的溝來將封裝基板20切斷,藉此完成複數個半導體封裝50。Thereafter, in the
<1-5.特徵>
如以上,依據本實施形態1的切斷裝置10,具備推壓機構60,當對於封裝基板20施加半切穿時,第一推壓機構61和第二推壓機構62的各自與封裝基板20的相對的位置關係,以與切斷機構40與封裝基板20的相對的位置關係相同的方式變化。在切斷裝置10中,當對於封裝基板20施加半切穿時,由輥子622來將封裝基板20往下壓。在由輥子622來往下壓藉此抑制封裝基板20的翹曲的狀態下,對於封裝基板20施加半切穿。因此,依據切斷裝置10,在抑制封裝基板20的翹曲的狀態下,實行封裝基板20的半切穿,所以能夠抑制由半切穿來形成的溝的深度的偏差。
<1-5. Characteristics>
As described above, according to the
[2.實施形態2]
依據上述實施形態1的切斷裝置10,包含推壓機構60。依據本實施形態2的切斷裝置80,與依據上述實施形態1的切斷裝置10,主要是在推壓機構的構造有所不同。以下,以與上述實施形態1的不同部分為中心進行說明。
[2. Embodiment 2]
The
<2-1.切斷裝置的構成>
第13圖是自側方來表示依據實施形態2的切斷裝置80的一部分之示意圖。如第13圖所示,切斷裝置80,包含切斷台30、切斷機構40、推壓機構90、及吐出機構70。
<2-1. Configuration of cutting device>
Fig. 13 is a schematic diagram showing part of the cutting device 80 according to the second embodiment from the side. As shown in FIG. 13 , the cutting device 80 includes a cutting table 30 , a
推壓機構90和吐出機構70,各自地安裝於切斷機構40。推壓機構90安裝於切斷機構40的後方,吐出機構70安裝於切斷機構40的前方。刀刃41,由推壓機構90和吐出機構70來夾在Y軸方向上。相對於刀刃41,推壓機構90,設置於與吐出機構70相反的一側的位置。藉此,推壓機構90和吐出機構70的兩方,成為可安裝於切斷機構40。推壓機構90,構成為可自上方朝向下方推壓被配置於切斷台30上的封裝基板20。The
第14圖是自側面來表示推壓機構90與刀刃41的關係之示意圖。第15圖是示意地表示推壓機構90之平面圖。第16圖是自正面來表示推壓機構90與刀刃41的關係之示意圖。FIG. 14 is a schematic view showing the relationship between the
參照第14圖、第15圖及第16圖,推壓機構90,包含第一推壓機構91和第二推壓機構92。第一推壓機構91設置於靠近刀刃41的一方的側面的位置,第二推壓機構92設置於靠近刀刃41的另一方的側面的位置。當由刀刃41來進行封裝基板20的切斷時,刀刃41位於夾在第一推壓機構91與第二推壓機構92之間的區域。亦即,由刀刃41來進行封裝基板20的切斷時,在側視中,第一推壓機構91的一部分與刀刃的一方的側面對向,第二推壓機構92的一部分與刀刃的另一方的側面對向。Referring to FIG. 14 , FIG. 15 and FIG. 16 , the pushing
第一推壓機構91和第二推壓機構92,各自構成為自上方朝向下方推壓封裝基板20。第一推壓機構91,包含基部構件940、推壓單元950、960。第二推壓機構92,包含基部構件910、推壓單元920、930。The first
基部構件910、940、970,例如各自以金屬來構成。由基部構件910、940、970構成的構件,是略呈L字狀的構件,且安裝於切斷機構40的後端部。在該構件的兩側面,各自地形成有孔H4、H5。孔H4、H5各自是在縱方向長的孔。利用螺絲來通過孔H4、H5,將該構件固定於切斷機構40。在孔H4、H5中,各自能夠藉由改變螺絲鎖固的高度方向的位置來改變推壓機構90的高度方向上的位置。又,在基部構件910、940,各自地形成有在X軸方向(刀刃41的厚度方向)上延伸的支持軸926。The
推壓單元920、930、950、960,各自地包含旋轉構件921、輥子922、旋轉軸923、925、及扭力彈簧(torsion spring)924。旋轉軸923、925,各自沿著X軸方向延伸。旋轉構件921,例如是金屬製的板狀構件,以可旋轉的方式安裝於基部構件910或基部構件940。基部構件910或基部構件940,與旋轉構件921,是隔著旋轉軸925來安裝在一起。在旋轉軸925的周圍,安裝有扭力彈簧924。The
在旋轉構件921的前端部,以可旋轉的方式安裝有輥子922。輥子922,例如是以橡膠或樹脂來構成。旋轉構件921與輥子922,是隔著旋轉軸923來連接在一起。扭力彈簧924的一端將旋轉軸923往下方推壓,扭力彈簧924的另一端將支持軸926往下方推壓。藉此,對於輥子922,往旋轉方向賦能。另外,在刀刃41的厚度方向上,輥子922安裝於旋轉構件921的內側。亦即,輥子922與刀刃41之間的長度,比旋轉構件921與刀刃41之間的長度更短。藉此,當對於封裝基板20施加半切穿時,能夠由輥子922來推壓更靠近半切穿位置。包含推壓單元930、960之旋轉構件921,是本發明的「第一旋轉構件」的一例。安裝於包含推壓單元930、960之旋轉構件921之輥子922,設置於比刀刃41的旋轉中心更前方側,是本發明的「第一推壓構件」的一例。又,包含推壓單元920、950之旋轉構件921,且是本發明的「第二旋轉構件」的一例。安裝於包含推壓單元920、950之旋轉構件921之輥子922,設置於比刀刃41的旋轉中心更後方側,且是本發明的「第二推壓構件」的一例。At the front end portion of the rotating
在輥子922的下方不存在封裝基板20的狀態,輥子922的下端,位於比用以表示刀刃41的下端位置之假想面Z2更下方。因此,當封裝基板20的切斷時,輥子922的下端過來到比刀刃41的下端位置更高的位置,所以輥子922藉由扭力彈簧924的彈力來將封裝基板20往下壓。In a state where the
第17圖是自側方來示意地表示在刀刃41的直徑變小的狀態下的推壓機構90與刀刃41的關係之圖。如第17圖所示,即便刀刃41的直徑變小,輥子922也會藉由扭力彈簧924的彈力來往下方賦能,所以能夠將切斷對象物自上方往下方推壓。FIG. 17 is a diagram schematically showing the relationship between the
另外,在依據本實施形態2的切斷裝置80中,也設置有如第12圖所示的避開機構。In addition, the cutting device 80 according to the second embodiment is also provided with an avoiding mechanism as shown in FIG. 12 .
<2-2.特徵>
如以上,依據本實施形態2的切斷裝置80,具備推壓機構90,當對於封裝基板20施加半切穿時,第一推壓機構91和第二推壓機構92的各自與封裝基板20的相對的位置關係,以與切斷機構40與封裝基板20的相對的位置關係相同的方式變化。在切斷裝置80中,當對於封裝基板20施加半切穿時,由輥子922來將封裝基板20往下壓。在由輥子922來往下壓藉此抑制封裝基板20的翹曲的狀態下,對於封裝基板20施加半切穿。因此,依據切斷裝置80,在抑制封裝基板20的翹曲的狀態下,實行封裝基板20的半切穿,所以能夠減少由半切穿來形成的溝的深度的偏差。
<2-2. Characteristics>
As described above, according to the cutting device 80 of the second embodiment, the
[3.其他實施形態] 上述實施形態1、2的思想,不限定於以上說明的實施形態1、2。以下,對於能夠適用於上述實施形態1、2的思想之其他實施形態的一例進行說明。 [3. Other embodiments] The concept of the first and second embodiments described above is not limited to the first and second embodiments described above. Hereinafter, an example of another embodiment to which the concept of the first and second embodiments described above can be applied will be described.
上述實施形態1、2中,保持構件31的頂面平坦。然而,保持構件31的頂面不必一定要完全的平坦。例如,也可以配合封裝基板20的翹曲,使保持構件31的頂面翹曲。此時,一邊調整刀刃41的高度,一邊對於封裝基板20施加半切穿。即便此情況下,當封裝基板20比保持構件31的頂面更加翹曲時,推壓機構也有效地發揮機能。In Embodiments 1 and 2 described above, the top surface of the holding
上述實施形態1、2中,藉由切斷台30在Y軸方向上移動來實行封裝基板20的切斷。然而,切斷方法不限定於此。也可以將切斷台30可進行的動作僅設為旋轉動作,並藉由使切斷機構40在Y軸方向上移動來實行封裝基板20的切斷。亦即,只要使切斷台30與切斷機構40相對地移動來實行封裝基板20的切斷即可。In Embodiments 1 and 2, the cutting of the
又,上述述實施形態1中,例如基部構件630、640、650也可以一體成形。In addition, in the first embodiment described above, for example, the
又,上述述實施形態2中,例如基部構件910、940、970也可以一體成形。In addition, in the above-mentioned second embodiment, for example, the
以上,對於本發明的實施形態進行例示的說明。亦即,為了進行例示的說明而揭露了詳細的說明和附圖。因此,詳細的說明和附圖中記載的構成要素之中,會包含當為了解決問題時的不是必要的構成要素。因此,即便這些不是必要的構成要素是記載於詳細的說明和附圖中,也不應該立刻將這些不是必要的構成要素認定為是必要的。As mentioned above, the embodiment of this invention was demonstrated as an example. That is, the detailed description and drawings are disclosed for illustrative purposes. Therefore, among the constituent elements described in the detailed description and the drawings, constituent elements that are not necessary for solving problems may be included. Therefore, even if these unnecessary constituent elements are described in the detailed description and drawings, these unnecessary constituent elements should not be recognized as essential immediately.
又,以上實施形態,在各種點上僅是本發明的例示。上述實施形態,在本發明的範圍中可進行各種改良和變化。亦即,對於本發明的實施,能夠對應於實施形態來採用適當的具體構成。In addition, the above embodiments are merely illustrations of the present invention in various points. Various modifications and changes can be made to the above-described embodiments within the scope of the present invention. That is, for implementation of the present invention, appropriate specific configurations can be adopted in accordance with the embodiments.
10,10X,80:切斷裝置
20:封裝基板
30:切斷台
31:保持構件
32:旋轉機構
33:移動機構
40:切斷機構
41:刀刃
50:半導體封裝
51:段差部
52:端子
60,90:推壓機構
61,91:第一推壓機構
62,92:第二推壓機構
70:吐出機構
610:板彈簧
620,920,930,950,960:推壓單元
621,630,640,650,910,940,970:基部構件
622,922:輥子
623,923,925,J1:旋轉軸
624,625,631,632,633,634:螺絲
921:旋轉構件
924:扭力彈簧
926:支持軸
G1:溝
H1,H2,H3,H4,H5:孔
P1,P2,P3,P4,P5,P6,P7:位置
Z1,Z2:假想面
10,10X,80: cut-off device
20: Package substrate
30: cutting table
31: Hold member
32: Rotary mechanism
33: Mobile Mechanism
40: Cutting mechanism
41: blade
50: Semiconductor packaging
51: Segment difference department
52:
第1圖是示意地表示依據實施形態1的切斷裝置的平面的一部分之圖。 第2圖是示意地表示半導體封裝之斜視圖。 第3圖是用以對於段差部的形成方法進行說明之圖。 第4圖是自側方來表示切斷裝置的一部分之示意圖。 第5圖是自側方來表示推壓機構與刀刃的關係之示意圖。 第6圖是示意地表示推壓機構之平面圖。 第7圖是自正面來表示推壓機構與刀刃的關係之示意圖。 第8圖是用以說明當對於封裝基板施加半切穿時的刀刃與輥子的位置關係之示意圖。 第9圖是自側方來表示比較對象也就是切斷裝置的一部分之示意圖。 第10圖是用以說明切斷裝置中的推壓機構的有效性之圖。 第11圖是自側方來表示在刀刃的直徑變小的狀態下的推壓機構與刀刃的關係之示意圖。 第12圖是用以說明推壓機構的動作之示意圖。 第13圖是自側方來表示依據實施形態2的切斷裝置的一部分之示意圖。 第14圖是自側面來表示實施形態2中的推壓機構與刀刃的關係之示意圖。 第15圖是示意地表示實施形態2中的推壓機構之平面圖。 第16圖是自正面來表示實施形態2中的推壓機構與刀刃的關係之示意圖。 第17圖是自側方來示意地表示實施形態2中的在刀刃的直徑變小的狀態下的推壓機構與刀刃的關係之圖。 Fig. 1 is a diagram schematically showing a part of a plane of a cutting device according to Embodiment 1. Fig. 2 is a perspective view schematically showing a semiconductor package. Fig. 3 is a diagram for explaining a method of forming a step portion. Fig. 4 is a schematic diagram showing a part of the cutting device from the side. Fig. 5 is a schematic diagram showing the relationship between the pressing mechanism and the blade from the side. Fig. 6 is a plan view schematically showing the pressing mechanism. Fig. 7 is a schematic view showing the relationship between the pressing mechanism and the blade from the front. FIG. 8 is a schematic diagram for explaining the positional relationship between the blade and the roller when a half-cut is applied to the package substrate. Fig. 9 is a schematic diagram showing a part of the cutting device, which is the object of comparison, from the side. Fig. 10 is a diagram for explaining the effectiveness of the pressing mechanism in the cutting device. Fig. 11 is a schematic view showing the relationship between the pressing mechanism and the blade when the diameter of the blade is reduced from the side. Fig. 12 is a schematic diagram for explaining the action of the pushing mechanism. Fig. 13 is a schematic diagram showing part of a cutting device according to Embodiment 2 from the side. Fig. 14 is a schematic view showing the relationship between the pressing mechanism and the blade in the second embodiment from the side. Fig. 15 is a plan view schematically showing a pressing mechanism in Embodiment 2. Fig. 16 is a schematic view showing the relationship between the pressing mechanism and the blade in Embodiment 2 from the front. Fig. 17 is a diagram schematically showing the relationship between the pressing mechanism and the blade in a state in which the diameter of the blade in Embodiment 2 is reduced from the side.
國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無 Domestic deposit information (please note in order of depositor, date, and number) none
國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無 Overseas storage information (please note in order of storage country, organization, date, and number) none
10:切斷裝置 10: Cut-off device
20:封裝基板 20: Package substrate
30:切斷台 30: cutting table
31:保持構件 31: Hold member
32:旋轉機構 32: Rotary mechanism
33:移動機構 33: Mobile Mechanism
40:切斷機構 40: Cutting mechanism
41:刀刃 41: blade
Claims (6)
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JP2020-190780 | 2020-11-17 | ||
JP2020190780A JP7121788B2 (en) | 2020-11-17 | 2020-11-17 | CUTTING DEVICE AND METHOD FOR MANUFACTURING CUTTING GOODS |
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TW202234549A TW202234549A (en) | 2022-09-01 |
TWI802063B true TWI802063B (en) | 2023-05-11 |
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JP (1) | JP7121788B2 (en) |
KR (1) | KR20230098900A (en) |
CN (1) | CN115989112A (en) |
TW (1) | TWI802063B (en) |
WO (1) | WO2022107455A1 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003218064A (en) * | 2002-01-25 | 2003-07-31 | Mitsui High Tec Inc | Manufacturing apparatus of semiconductor device |
JP2008103648A (en) * | 2006-10-23 | 2008-05-01 | Matsushita Electric Ind Co Ltd | Apparatus for manufacturing semiconductor device, and method for manufacturing the semiconductor device |
JP2010123683A (en) * | 2008-11-18 | 2010-06-03 | Nec Electronics Corp | Dicing apparatus and adaptor for dicing apparatus |
TWI481893B (en) * | 2011-12-22 | 2015-04-21 | Intel Corp | Apparatus employing a proximity and context-based global positioning mechanism, and system and method for semantically deducing geographic locations of computing devices |
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JP5259978B2 (en) | 2006-10-04 | 2013-08-07 | ローム株式会社 | Manufacturing method of semiconductor device |
JP2009101617A (en) | 2007-10-24 | 2009-05-14 | Seiko Epson Corp | Auto cutter-fitted printer |
JP2012049260A (en) | 2010-08-25 | 2012-03-08 | Ricoh Microelectronics Co Ltd | Cutting method and cutting device |
-
2020
- 2020-11-17 JP JP2020190780A patent/JP7121788B2/en active Active
-
2021
- 2021-09-29 WO PCT/JP2021/035844 patent/WO2022107455A1/en active Application Filing
- 2021-09-29 KR KR1020237019978A patent/KR20230098900A/en unknown
- 2021-09-29 CN CN202180052234.9A patent/CN115989112A/en active Pending
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003218064A (en) * | 2002-01-25 | 2003-07-31 | Mitsui High Tec Inc | Manufacturing apparatus of semiconductor device |
JP2008103648A (en) * | 2006-10-23 | 2008-05-01 | Matsushita Electric Ind Co Ltd | Apparatus for manufacturing semiconductor device, and method for manufacturing the semiconductor device |
JP2010123683A (en) * | 2008-11-18 | 2010-06-03 | Nec Electronics Corp | Dicing apparatus and adaptor for dicing apparatus |
TWI481893B (en) * | 2011-12-22 | 2015-04-21 | Intel Corp | Apparatus employing a proximity and context-based global positioning mechanism, and system and method for semantically deducing geographic locations of computing devices |
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JP2022079910A (en) | 2022-05-27 |
CN115989112A (en) | 2023-04-18 |
JP7121788B2 (en) | 2022-08-18 |
KR20230098900A (en) | 2023-07-04 |
TW202234549A (en) | 2022-09-01 |
WO2022107455A1 (en) | 2022-05-27 |
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