TWI800681B - 電子發射器、用於形成其之方法、用於操作其之方法及電子束工具 - Google Patents
電子發射器、用於形成其之方法、用於操作其之方法及電子束工具 Download PDFInfo
- Publication number
- TWI800681B TWI800681B TW108132517A TW108132517A TWI800681B TW I800681 B TWI800681 B TW I800681B TW 108132517 A TW108132517 A TW 108132517A TW 108132517 A TW108132517 A TW 108132517A TW I800681 B TWI800681 B TW I800681B
- Authority
- TW
- Taiwan
- Prior art keywords
- methods
- same
- operating
- forming
- electron
- Prior art date
Links
- 238000000034 method Methods 0.000 title 2
- 238000010894 electron beam technology Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/34—Photo-emissive cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/32—Secondary-electron-emitting electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/34—Photoemissive electrodes
- H01J2201/342—Cathodes
- H01J2201/3421—Composition of the emitting surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/34—Photoemissive electrodes
- H01J2201/342—Cathodes
- H01J2201/3421—Composition of the emitting surface
- H01J2201/3423—Semiconductors, e.g. GaAs, NEA emitters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/34—Photoemissive electrodes
- H01J2201/342—Cathodes
- H01J2201/3421—Composition of the emitting surface
- H01J2201/3425—Metals, metal alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/34—Photoemissive electrodes
- H01J2201/342—Cathodes
- H01J2201/3421—Composition of the emitting surface
- H01J2201/3426—Alkaline metal compounds, e.g. Na-K-Sb
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
- H01J2237/06333—Photo emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862732937P | 2018-09-18 | 2018-09-18 | |
| US62/732,937 | 2018-09-18 | ||
| US16/259,317 US10714295B2 (en) | 2018-09-18 | 2019-01-28 | Metal encapsulated photocathode electron emitter |
| US16/259,317 | 2019-01-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202025197A TW202025197A (zh) | 2020-07-01 |
| TWI800681B true TWI800681B (zh) | 2023-05-01 |
Family
ID=69773104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108132517A TWI800681B (zh) | 2018-09-18 | 2019-09-10 | 電子發射器、用於形成其之方法、用於操作其之方法及電子束工具 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10714295B2 (enExample) |
| JP (1) | JP7185772B2 (enExample) |
| KR (1) | KR102545439B1 (enExample) |
| CN (2) | CN118263073A (enExample) |
| DE (1) | DE112019004659T5 (enExample) |
| IL (1) | IL281346B2 (enExample) |
| TW (1) | TWI800681B (enExample) |
| WO (1) | WO2020060954A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11495428B2 (en) * | 2019-02-17 | 2022-11-08 | Kla Corporation | Plasmonic photocathode emitters at ultraviolet and visible wavelengths |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3706885A (en) * | 1971-01-29 | 1972-12-19 | Gen Electric | Photocathode-phosphor imaging system for x-ray camera tubes |
| EP1019942B1 (en) * | 1997-10-01 | 2006-05-03 | Intevac, Inc. | Electron beam microscope using electron beam patterns |
| US20100025796A1 (en) * | 2008-08-04 | 2010-02-04 | Amir Massoud Dabiran | Microchannel plate photocathode |
| CN104561901A (zh) * | 2013-10-22 | 2015-04-29 | 中国科学院上海硅酸盐研究所 | 一种掺铊的碘化铯复合薄膜及其制备方法 |
| TW201701501A (zh) * | 2015-05-21 | 2017-01-01 | 克萊譚克公司 | 包括在具有硼層之矽基板上之場發射極陣列之光電陰極 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4008106A (en) * | 1975-11-13 | 1977-02-15 | The United States Of America As Represented By The Secretary Of The Army | Method of fabricating III-V photocathodes |
| US5684360A (en) * | 1995-07-10 | 1997-11-04 | Intevac, Inc. | Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas |
| KR100423849B1 (ko) * | 2001-09-11 | 2004-03-22 | 한국과학기술원 | 매우 얇은 보호막을 갖는 광음극 |
| US7015467B2 (en) | 2002-10-10 | 2006-03-21 | Applied Materials, Inc. | Generating electrons with an activated photocathode |
| US10197501B2 (en) | 2011-12-12 | 2019-02-05 | Kla-Tencor Corporation | Electron-bombarded charge-coupled device and inspection systems using EBCCD detectors |
| US9601299B2 (en) * | 2012-08-03 | 2017-03-21 | Kla-Tencor Corporation | Photocathode including silicon substrate with boron layer |
| US10141155B2 (en) | 2016-12-20 | 2018-11-27 | Kla-Tencor Corporation | Electron beam emitters with ruthenium coating |
| US10395884B2 (en) * | 2017-10-10 | 2019-08-27 | Kla-Tencor Corporation | Ruthenium encapsulated photocathode electron emitter |
-
2019
- 2019-01-28 US US16/259,317 patent/US10714295B2/en active Active
- 2019-09-10 TW TW108132517A patent/TWI800681B/zh active
- 2019-09-17 CN CN202311361910.8A patent/CN118263073A/zh active Pending
- 2019-09-17 DE DE112019004659.4T patent/DE112019004659T5/de active Pending
- 2019-09-17 IL IL281346A patent/IL281346B2/en unknown
- 2019-09-17 JP JP2021514985A patent/JP7185772B2/ja active Active
- 2019-09-17 CN CN201980059591.0A patent/CN112673448A/zh active Pending
- 2019-09-17 KR KR1020217011219A patent/KR102545439B1/ko active Active
- 2019-09-17 WO PCT/US2019/051372 patent/WO2020060954A1/en not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3706885A (en) * | 1971-01-29 | 1972-12-19 | Gen Electric | Photocathode-phosphor imaging system for x-ray camera tubes |
| EP1019942B1 (en) * | 1997-10-01 | 2006-05-03 | Intevac, Inc. | Electron beam microscope using electron beam patterns |
| US20100025796A1 (en) * | 2008-08-04 | 2010-02-04 | Amir Massoud Dabiran | Microchannel plate photocathode |
| CN104561901A (zh) * | 2013-10-22 | 2015-04-29 | 中国科学院上海硅酸盐研究所 | 一种掺铊的碘化铯复合薄膜及其制备方法 |
| TW201701501A (zh) * | 2015-05-21 | 2017-01-01 | 克萊譚克公司 | 包括在具有硼層之矽基板上之場發射極陣列之光電陰極 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20200090895A1 (en) | 2020-03-19 |
| WO2020060954A1 (en) | 2020-03-26 |
| JP7185772B2 (ja) | 2022-12-07 |
| KR102545439B1 (ko) | 2023-06-20 |
| KR20210046820A (ko) | 2021-04-28 |
| US10714295B2 (en) | 2020-07-14 |
| CN118263073A (zh) | 2024-06-28 |
| DE112019004659T5 (de) | 2021-06-17 |
| IL281346B1 (en) | 2024-04-01 |
| TW202025197A (zh) | 2020-07-01 |
| IL281346B2 (en) | 2024-08-01 |
| CN112673448A (zh) | 2021-04-16 |
| JP2022501772A (ja) | 2022-01-06 |
| IL281346A (en) | 2021-04-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP3989790A4 (en) | VACUUM TOOLS | |
| EP3973182A4 (en) | Apparatus for electrospray emission | |
| EP4004858A4 (en) | SYSTEMS, METHODS AND DEVICES FOR GENERATE REAL-TIME ANALYSIS | |
| EP4050637A4 (en) | TRANSMITTER, ELECTRON GUN USING SAME, ELECTRONIC DEVICE USING SAME AND METHOD FOR MANUFACTURING SAME | |
| EP3911355A4 (en) | RECOMBINANT LUBRICINS AND COMPOSITIONS AND METHODS OF USE THEREOF | |
| EP3774208A4 (en) | MANIPULATOR, SYSTEM AND METHOD OF OPERATION THEREOF | |
| SG11202108591PA (en) | Afabicin formulation, method for making the same | |
| EP3951830A4 (en) | ELECTRON BEAM DELIVERY DEVICE AND ELECTRON BEAM DELIVERY DEVICE ELECTRON BEAM EMISSION METHOD | |
| EP3858873A4 (en) | Fluororesin, fluororesin particles, and methods for producing these | |
| EP3297786A4 (en) | ROBOTIC TUNGSTEN GAS ARC WELDING APPARATUS AND METHOD OF OPERATING SAME | |
| EP3394873A4 (en) | METHODS AND DEVICES FOR GENERATING AN ELECTRON BEAM | |
| EP3926657A4 (en) | ELECTRON SOURCE AND ELECTRON SOURCE UNIT | |
| TWI800681B (zh) | 電子發射器、用於形成其之方法、用於操作其之方法及電子束工具 | |
| WO2019043522A3 (en) | METHODS, SYSTEMS AND DEVICES FOR CONTROLLING ELECTROSURGERY INSTRUMENTS | |
| EP3974001A4 (en) | ELECTRON BEAM STERILIZATION DEVICE | |
| EP3534379A4 (en) | ELECTRONIC RADIATION DEVICE | |
| EP3884124A4 (en) | ELECTRON BEAM IRADIATED PRODUCT AND PROCESS | |
| EP3959730A4 (en) | BROADBAND TUNABLE ENERGY ELECTRONIC BEAM PULSE GENERATOR | |
| GB201914695D0 (en) | An electron cryomicroscope | |
| EP4038772A4 (en) | BEAM MANAGEMENT | |
| EP3896480A4 (en) | Beam formation device, radar device, and beam formation method | |
| KR102200515B9 (ko) | 절삭공구 및 전자빔을 이용한 절삭공구의 브레이징 방법 및 이를 위한 전자빔 장치 | |
| GB2570441B (en) | Vacuum chamber, parts therefor and method for manufacturing the same | |
| WO2021107514A3 (ko) | 리피테그라스트의 제조방법 | |
| EP4081508A4 (en) | SURFACTANTS FROM ALDEHYDES |