TWI799809B - 化學除汙方法及化學除汙裝置 - Google Patents

化學除汙方法及化學除汙裝置 Download PDF

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Publication number
TWI799809B
TWI799809B TW110108494A TW110108494A TWI799809B TW I799809 B TWI799809 B TW I799809B TW 110108494 A TW110108494 A TW 110108494A TW 110108494 A TW110108494 A TW 110108494A TW I799809 B TWI799809 B TW I799809B
Authority
TW
Taiwan
Prior art keywords
chemical decontamination
chemical
decontamination device
decontamination method
decontamination
Prior art date
Application number
TW110108494A
Other languages
English (en)
Other versions
TW202137241A (zh
Inventor
大平高史
大内智
會澤元浩
太田信之
細川秀幸
浜田涼
吉川博雄
坪川尚史
風間正彦
Original Assignee
日商日立Ｇｅ核子能源股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立Ｇｅ核子能源股份有限公司 filed Critical 日商日立Ｇｅ核子能源股份有限公司
Publication of TW202137241A publication Critical patent/TW202137241A/zh
Application granted granted Critical
Publication of TWI799809B publication Critical patent/TWI799809B/zh

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
    • G21F9/002—Decontamination of the surface of objects with chemical or electrochemical processes
    • G21F9/004—Decontamination of the surface of objects with chemical or electrochemical processes of metallic surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/08—Selective adsorption, e.g. chromatography
    • B01D15/10—Selective adsorption, e.g. chromatography characterised by constructional or operational features
    • B01D15/12—Selective adsorption, e.g. chromatography characterised by constructional or operational features relating to the preparation of the feed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/08—Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/24—Carbon, coal or tar
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21C—NUCLEAR REACTORS
    • G21C17/00—Monitoring; Testing ; Maintaining
    • G21C17/02—Devices or arrangements for monitoring coolant or moderator
    • G21C17/022—Devices or arrangements for monitoring coolant or moderator for monitoring liquid coolants or moderators
    • G21C17/0225—Chemical surface treatment, e.g. corrosion
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/04—Treating liquids
    • G21F9/06—Processing
    • G21F9/12—Processing by absorption; by adsorption; by ion-exchange
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D15/00—Separating processes involving the treatment of liquids with solid sorbents; Apparatus therefor
    • B01D15/08—Selective adsorption, e.g. chromatography
    • B01D15/26—Selective adsorption, e.g. chromatography characterised by the separation mechanism
    • B01D15/36—Selective adsorption, e.g. chromatography characterised by the separation mechanism involving ionic interaction
    • B01D15/361—Ion-exchange
    • B01D15/362—Cation-exchange
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/30—Nuclear fission reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analytical Chemistry (AREA)
  • Electrochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Food Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
TW110108494A 2020-03-17 2021-03-10 化學除汙方法及化學除汙裝置 TWI799809B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-046084 2020-03-17
JP2020046084A JP7475171B2 (ja) 2020-03-17 2020-03-17 化学除染方法および化学除染装置

Publications (2)

Publication Number Publication Date
TW202137241A TW202137241A (zh) 2021-10-01
TWI799809B true TWI799809B (zh) 2023-04-21

Family

ID=77746801

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110108494A TWI799809B (zh) 2020-03-17 2021-03-10 化學除汙方法及化學除汙裝置

Country Status (3)

Country Link
US (1) US20210296019A1 (zh)
JP (1) JP7475171B2 (zh)
TW (1) TWI799809B (zh)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI267874B (en) * 2002-11-21 2006-12-01 Toshiba Corp System and method for chemical decontamination of radioactive material
JP4131814B2 (ja) * 2002-11-21 2008-08-13 株式会社東芝 放射化部品の化学除染方法および装置
US20120138086A1 (en) * 2009-12-04 2012-06-07 Areva Np Gmbh Method for decontaminating surfaces
TW201907414A (zh) * 2017-07-06 2019-02-16 德商法瑪通股份有限公司 去污核電廠中之金屬表面之方法
TWI684998B (zh) * 2017-03-10 2020-02-11 日商栗田工程股份有限公司 化學除污方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3105384B2 (ja) * 1993-08-26 2000-10-30 荏原工業洗浄株式会社 シュウ酸含有水溶液の処理方法と放射性クラッド除染処理装置及び除染方法
JP4020512B2 (ja) * 1998-09-29 2007-12-12 株式会社日立製作所 化学除染方法及びその装置
US6973154B2 (en) * 1998-09-29 2005-12-06 Hitachi, Ltd. Method of chemical decontamination and system therefor
JP2006038684A (ja) 2004-07-28 2006-02-09 Hitachi Ltd 原子炉水回収装置
JP4916828B2 (ja) * 2006-09-11 2012-04-18 オルガノ株式会社 放射性物質含有排水の処理方法および装置
JP2008232773A (ja) 2007-03-20 2008-10-02 Japan Organo Co Ltd 原子力発電所における放射性物質含有水の処理装置
JP6620081B2 (ja) * 2016-09-20 2019-12-11 日立Ｇｅニュークリア・エナジー株式会社 原子力プラントの炭素鋼部材への貴金属の付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法
JP6619717B2 (ja) * 2016-09-30 2019-12-11 日立Ｇｅニュークリア・エナジー株式会社 原子力プラントの炭素鋼部材への貴金属の付着方法及び原子力プラントの炭素鋼部材への放射性核種の付着抑制方法
JP6751010B2 (ja) 2016-12-19 2020-09-02 日立Ｇｅニュークリア・エナジー株式会社 放射性物質付着抑制皮膜の形成方法
JP6868545B2 (ja) 2017-12-20 2021-05-12 日立Ｇｅニュークリア・エナジー株式会社 プラントの炭素鋼部材の腐食抑制方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI267874B (en) * 2002-11-21 2006-12-01 Toshiba Corp System and method for chemical decontamination of radioactive material
JP4131814B2 (ja) * 2002-11-21 2008-08-13 株式会社東芝 放射化部品の化学除染方法および装置
US20120138086A1 (en) * 2009-12-04 2012-06-07 Areva Np Gmbh Method for decontaminating surfaces
TWI684998B (zh) * 2017-03-10 2020-02-11 日商栗田工程股份有限公司 化學除污方法
TW201907414A (zh) * 2017-07-06 2019-02-16 德商法瑪通股份有限公司 去污核電廠中之金屬表面之方法

Also Published As

Publication number Publication date
JP7475171B2 (ja) 2024-04-26
US20210296019A1 (en) 2021-09-23
TW202137241A (zh) 2021-10-01
JP2021148478A (ja) 2021-09-27

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