TWI797871B - Two-phase immersion-type heat-dissipation substrate structure - Google Patents
Two-phase immersion-type heat-dissipation substrate structure Download PDFInfo
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- TWI797871B TWI797871B TW110145383A TW110145383A TWI797871B TW I797871 B TWI797871 B TW I797871B TW 110145383 A TW110145383 A TW 110145383A TW 110145383 A TW110145383 A TW 110145383A TW I797871 B TWI797871 B TW I797871B
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Abstract
Description
本發明涉及一種散熱基材結構,具體來說是涉及一種兩相浸沒式散熱基材結構。The invention relates to a heat dissipation substrate structure, in particular to a two-phase submerged heat dissipation substrate structure.
浸沒式冷卻技術是將發熱元件(如伺服器、磁碟陣列等)直接浸沒在不導電的冷卻液中,以透過冷卻液吸熱氣化帶走發熱元件運作所產生之熱能。然而,如何透過浸沒式冷卻技術更加有效地進行散熱一直是業界所需要解決的問題。The immersion cooling technology is to immerse the heating element (such as server, disk array, etc.) directly in the non-conductive cooling liquid, so as to take away the heat energy generated by the heating element through the heat absorption and vaporization of the cooling liquid. However, how to dissipate heat more effectively through immersion cooling technology has always been a problem to be solved in the industry.
有鑑於此,本發明人本於多年從事相關產品之開發與設計,有感上述缺失之可改善,乃特潛心研究並配合學理之運用,終於提出一種設計合理且有效改善上述缺失之本發明。In view of this, the inventor has been engaged in the development and design of related products for many years, and felt that the above-mentioned defects can be improved, so he devoted himself to research and combined with the application of theories, and finally proposed an invention with a reasonable design and effective improvement of the above-mentioned defects.
本發明所要解決的技術問題在於,針對現有技術的不足提供一種兩相浸沒式散熱基材結構。The technical problem to be solved by the present invention is to provide a two-phase submerged heat dissipation substrate structure for the deficiencies of the prior art.
本發明實施例提供一種兩相浸沒式散熱基材結構,用以與發熱元件接觸,包括:一浸沒式散熱基底及一鰭片組;所述浸沒式散熱基底具有正面和與所述正面相背對的背面,所述浸沒式散熱基底的背面用以與所述發熱元件接觸,所述浸沒式散熱基底的正面形成有所述鰭片組,所述鰭片組包含有複數個鰭片垂直於所述浸沒式散熱基底的正面,並且所述浸沒式散熱基底的正面與所述浸沒式散熱基底的背面為不平行,使每個所述鰭片的延伸方向與氣泡逸散方向不垂直也不平行。An embodiment of the present invention provides a two-phase immersion heat dissipation substrate structure for contacting with heating elements, comprising: an immersion heat dissipation substrate and a fin group; the immersion heat dissipation substrate has a front surface and a surface opposite to the front surface The back side of the immersion heat dissipation base is used to contact the heating element, the front side of the immersion heat dissipation base is formed with the fin group, and the fin group includes a plurality of fins perpendicular to the The front side of the submerged heat dissipation base, and the front side of the submerged heat dissipation base is not parallel to the back side of the submerged heat dissipation base, so that the extending direction of each fin is neither perpendicular nor parallel.
在一優選實施例中,所述浸沒式散熱基底係以鋁、銅、鋁合金、銅合金的其中之一所製成。In a preferred embodiment, the immersion heat dissipation base is made of one of aluminum, copper, aluminum alloy, and copper alloy.
在一優選實施例中,每個所述鰭片是以金屬射出成型方式垂直地一體成型在所述浸沒式散熱基底的正面。In a preferred embodiment, each of the fins is integrally formed vertically on the front surface of the submerged heat dissipation base by metal injection molding.
在一優選實施例中,每個所述鰭片是一浸沒於兩相冷卻液中且孔隙率大於7%的孔洞化金屬散熱鰭片。In a preferred embodiment, each of the fins is a porous metal cooling fin submerged in a two-phase cooling fluid with a porosity greater than 7%.
在一優選實施例中,所述浸沒式散熱基底的正面與所述浸沒式散熱基底的背面所形成的夾角角度被設置是介於10度至20度。In a preferred embodiment, the angle formed by the front surface of the immersion heat dissipation substrate and the back surface of the immersion heat dissipation substrate is set to be between 10 degrees and 20 degrees.
本發明實施例又提供一種兩相浸沒式散熱基材結構,用以與發熱元件接觸,包括:一浸沒式散熱基底、一第一鰭片組及一第二鰭片組;所述浸沒式散熱基底具有正面和與所述正面相背對的背面,所述浸沒式散熱基底的背面用以與所述發熱元件接觸,所述浸沒式散熱基底的正面形成有所述第一鰭片組以及所述第二鰭片組,所述第一鰭片組與所述第二鰭片組依序沿氣泡逸散方向排列於所述浸沒式散熱基底的正面,所述第一鰭片組包含有複數個第一鰭片垂直於所述浸沒式散熱基底的正面,所述第二鰭片組包含有複數個第二鰭片垂直於所述浸沒式散熱基底的正面,每個所述第一鰭片的鰭片高度大於每個所述第二鰭片的鰭片高度,並且所述浸沒式散熱基底的正面與所述浸沒式散熱基底的背面為不平行,使每個所述第一鰭片與每個所述第二鰭片與所述氣泡逸散方向不垂直也不平行。The embodiment of the present invention also provides a two-phase immersion heat dissipation substrate structure, which is used to contact the heating element, including: an immersion heat dissipation base, a first fin group and a second fin group; the immersion heat dissipation The substrate has a front surface and a back surface opposite to the front surface, the back surface of the immersion heat dissipation substrate is used to contact the heating element, the front surface of the immersion heat dissipation substrate is formed with the first fin group and the The second set of fins, the first set of fins and the second set of fins are sequentially arranged on the front side of the submerged heat dissipation base along the air bubble escape direction, and the first set of fins includes a plurality of A first fin is perpendicular to the front of the immersion heat dissipation base, and the second fin group includes a plurality of second fins perpendicular to the front of the immersion heat dissipation base, each of the first fins The height of the fins is greater than the fin height of each of the second fins, and the front of the immersion heat dissipation substrate is not parallel to the back of the immersion heat dissipation substrate, so that each of the first fins and the Each of the second fins is neither perpendicular nor parallel to the air bubble dissipation direction.
在一優選實施例中,所述浸沒式散熱基底的斷面厚度是沿所述氣泡逸散方向漸減,所述第一鰭片組的位置是對應於所述浸沒式散熱基底的斷面厚度較厚之區域,所述第二鰭片組的位置是對應於所述浸沒式散熱基底的斷面厚度較薄之區域,並且所述浸沒式散熱基底的斷面厚度較厚之區域的位置是用以對應於所述發熱元件的熱源高溫區,所述浸沒式散熱基底的斷面厚度較薄之區域的位置是用以對應於所述發熱元件的非所述熱源高溫區。In a preferred embodiment, the cross-sectional thickness of the submerged heat dissipation base decreases gradually along the air bubble dissipation direction, and the position of the first fin group corresponds to the smaller cross-sectional thickness of the submerged heat dissipation base. In the thicker area, the position of the second fin group corresponds to the thinner area of the immersion heat dissipation base, and the position of the thicker area of the immersion heat dissipation base is used Corresponding to the high temperature area of the heat source of the heating element, the position of the thinner cross-sectional thickness area of the submerged heat dissipation substrate is used to correspond to the high temperature area of the heating element that is not the heat source.
在一優選實施例中,每個所述第一鰭片與每個所述第二鰭片是以金屬射出成型方式垂直地一體成型在所述浸沒式散熱基底的正面。In a preferred embodiment, each of the first fins and each of the second fins are integrally formed vertically on the front surface of the immersion heat dissipation base by metal injection molding.
在一優選實施例中,每個所述第一鰭片與每個所述第二鰭片分別是一浸沒於兩相冷卻液中且孔隙率大於7%的孔洞化金屬散熱鰭片。In a preferred embodiment, each of the first fins and each of the second fins is respectively a holed metal cooling fin submerged in a two-phase cooling liquid with a porosity greater than 7%.
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings related to the present invention. However, the provided drawings are only for reference and description, and are not intended to limit the present invention.
以下是通過特定的具體實施例來說明本發明所公開有關的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不背離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。The following are specific examples to illustrate the implementation methods disclosed in the present invention. Those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various modifications and changes can be made to the details in this specification based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only for simple illustration, and are not drawn according to the actual size, which is stated in advance. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention. In addition, the term "or" used herein may include any one or a combination of more of the associated listed items depending on the actual situation.
[第一實施例][first embodiment]
請參閱圖1所示,其為本發明的其中一種實施例,本發明實施例提供了兩相浸沒式散熱結構700,用以接觸發熱元件800。如圖1所示,根據本發明實施例所提供的兩相浸沒式散熱結構700,其基本上包括有一浸沒式散熱基底10及一鰭片組20。Please refer to FIG. 1 , which is one embodiment of the present invention. The embodiment of the present invention provides a two-phase immersion
在本實施例中,浸沒式散熱基底10可採用高導熱性材所製成,例如鋁、銅、鋁合金或銅合金。進一步說,本實施例的浸沒式散熱基底10可以是浸沒於兩相冷卻液900(如電子氟化液)中且孔隙率大於5%的孔洞化金屬散熱基底,用於增加氣泡的生成量,以加強浸沒式散熱效果。需說明的是,圖1是誇張或放大地示出孔洞結構,以便更好的理解本發明。In this embodiment, the immersion
在本實施例中,浸沒式散熱基底10具有正面11和與所述正面11相背對的背面12。浸沒式散熱基底10的背面12用以與發熱元件800接觸。浸沒式散熱基底10的正面11則形成有鰭片組20。In this embodiment, the submerged
進一步說,本實施例的鰭片組20包含有複數個鰭片201垂直於浸沒式散熱基底10的正面11。鰭片201可以是片狀鰭片,但也可以是柱狀鰭片。並且,鰭片201是以金屬射出成型方式垂直地一體成型在浸沒式散熱基底10的正面11且浸沒於兩相冷卻液900中。並且,本實施例的每個鰭片201皆是孔洞化金屬散熱鰭片,也就是說本實施例的鰭片組20是由複數個的孔洞化金屬散熱鰭片所組成的。再者,本實施例的鰭片201的孔隙率是高於浸沒式散熱基底10的孔隙率。進一步說,本實施例的鰭片201的是浸沒於兩相冷卻液900中且孔隙率大於7%的孔洞化金屬散熱鰭片,以更增加氣泡的生成量。並且,本實施例的浸沒式散熱基底10的正面11與背面12為不平行,使每個鰭片201的延伸方向與氣泡逸散方向D不垂直也不平行,藉此降低大量氣泡生成時氣泡向上逸散的阻力,並增加周圍流體回補效率,進而能提升整體浸沒式散熱效果。並且,經由實際試驗,浸沒式散熱基底10的正面11與背面12所形成的夾角角度
θ被設置是介於10度至20度時,整體浸沒式散熱效果為最佳。
Furthermore, the fin set 20 of this embodiment includes a plurality of
[第二實施例][Second embodiment]
請參閱圖2所示,其為本發明的第二實施例,本實施例與第一實施例大致相同,其差異說明如下。Please refer to FIG. 2 , which is the second embodiment of the present invention. This embodiment is substantially the same as the first embodiment, and the differences are described as follows.
在本實施例中,浸沒式散熱基底10具有正面11和與所述正面11相背對的背面12。浸沒式散熱基底10的背面12用以與發熱元件800接觸。浸沒式散熱基底10的正面11則形成有一第一鰭片組20a以及一第二鰭片組20b。In this embodiment, the submerged
進一步說,本實施例的第一鰭片組20a與第二鰭片組20b是依序沿氣泡逸散方向D排列於浸沒式散熱基底10的正面11,也可以說第一鰭片組20a與第二鰭片組20b是依序沿與重力的作用方向相反的方向排列於浸沒式散熱基底10的正面11,且第一鰭片組20a的複數個第一鰭片201a的鰭片高度大於第二鰭片組20b的複數個第二鰭片201b的鰭片高度,並且浸沒式散熱基底10的正面11與背面12為不平行,使得在第一鰭片組20a及其周邊區域所產生的大量氣泡沿氣泡逸散方向D(向上)逸散時可大幅降低受到第二鰭片組20b的影響所產生的逸散阻力。Further speaking, the
再者,如圖2所示,本實施例的浸沒式散熱基底10的斷面厚度是沿氣泡逸散方向D(向上)漸減,使得第一鰭片組20a的位置是對應於浸沒式散熱基底10的厚度較厚之區域,第二鰭片組20b的位置是對應於浸沒式散熱基底10的厚度較薄之區域,並且浸沒式散熱基底10的厚度較厚之區域的位置是對應於發熱元件800預定的熱源高溫區801,浸沒式散熱基底10的厚度較薄之區域的位置是對應於發熱元件800的非熱源高溫區(也可以說發熱溫度相對較低的熱源低溫區),使得鰭片高度較高的第一鰭片組20a的位置是對應於發熱元件800預定的熱源高溫區801,鰭片高度較低的第二鰭片組20b的位置是對應於發熱元件800的非熱源高溫區,從而更能將發熱元件800的熱源高溫區801產生的高熱量帶走,以更加強浸沒式散熱效果。Furthermore, as shown in FIG. 2 , the cross-sectional thickness of the submerged
綜合以上所述,本發明提供的兩相浸沒式散熱基材結構,其至少可以通過「所述浸沒式散熱基底具有正面和與所述正面相背對的背面」、「所述浸沒式散熱基底的背面用以與所述發熱元件接觸,所述浸沒式散熱基底的正面形成有所述鰭片組」、「所述鰭片組包含有複數個鰭片垂直於所述浸沒式散熱基底的正面,並且所述浸沒式散熱基底的正面與所述浸沒式散熱基底的背面為不平行,使每個所述鰭片的延伸方向與氣泡逸散方向不垂直也不平行」的整體技術方案,從而能降低氣泡大量生成時氣泡向上逸散的阻力,並增加周圍流體回補效率,進而能提升整體浸沒式散熱效果。Based on the above, the two-phase immersion heat dissipation substrate structure provided by the present invention can at least pass through "the immersion heat dissipation substrate has a front surface and a back surface opposite to the front surface", "the immersion heat dissipation substrate has The back side of the immersion heat dissipation base is used to contact the heating element, and the front side of the immersion heat dissipation base is formed with the fin group", "the fin group includes a plurality of fins perpendicular to the front side of the immersion type heat dissipation base , and the front of the immersion heat dissipation base is not parallel to the back of the immersion heat dissipation base, so that the extension direction of each of the fins is neither perpendicular nor parallel to the air bubble dissipation direction", thus It can reduce the resistance of the bubbles to dissipate upward when a large number of bubbles are generated, and increase the replenishment efficiency of the surrounding fluid, thereby improving the overall immersion heat dissipation effect.
以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。The content disclosed above is only a preferred feasible embodiment of the present invention, and does not therefore limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the application of the present invention. within the scope of the patent.
700:兩相浸沒式散熱基材結構
10:浸沒式散熱基底
11:正面
12:背面
20:鰭片組
201:鰭片
20a:第一鰭片組
201a:第一鰭片
20b:第二鰭片組
201b:第二鰭片
800:發熱元件
801:熱源高溫區
900:兩相冷卻液
θ:夾角角度
D:氣泡逸散方向
700: two-phase immersion heat dissipation substrate structure 10: immersion heat dissipation substrate 11: front 12: back 20: fin group 201:
圖1為本發明第一實施例的兩相浸沒式散熱基材結構的側視示意圖。FIG. 1 is a schematic side view of a two-phase submerged heat dissipation substrate structure according to a first embodiment of the present invention.
圖2為本發明第二實施例的兩相浸沒式散熱基材結構的側視示意圖。FIG. 2 is a schematic side view of a two-phase submerged heat dissipation substrate structure according to a second embodiment of the present invention.
700:兩相浸沒式散熱基材結構 700: two-phase immersion heat dissipation substrate structure
10:浸沒式散熱基底 10: Submerged cooling base
11:正面 11: front
12:背面 12: back
20:鰭片組 20: fin group
201:鰭片 201: fins
800:發熱元件 800: heating element
900:兩相冷卻液 900: two-phase coolant
θ:夾角角度 θ: included angle
D:氣泡逸散方向 D: Bubble escape direction
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TWI378219B (en) * | 2008-09-26 | 2012-12-01 | Pegatron Corp | Vapor chamber with skive fin structure and manufacturing method thereof |
TWI696416B (en) * | 2019-09-12 | 2020-06-11 | 英業達股份有限公司 | Immersion cooling apparatus |
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2021
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US20100214740A1 (en) * | 2005-07-30 | 2010-08-26 | Articchoke Enterprises | Phase-Separated Evaporator, Blade-Thru Condenser and Heat Dissipation System Thereof |
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CN102037426A (en) * | 2008-04-21 | 2011-04-27 | 固核电脑公司 | A case and rack system for liquid submersion cooling of electronic devices connected in an array |
TWI378219B (en) * | 2008-09-26 | 2012-12-01 | Pegatron Corp | Vapor chamber with skive fin structure and manufacturing method thereof |
TWI696416B (en) * | 2019-09-12 | 2020-06-11 | 英業達股份有限公司 | Immersion cooling apparatus |
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