TWI795545B - 厚膜電阻用組成物、厚膜電阻用膏體及厚膜電阻 - Google Patents

厚膜電阻用組成物、厚膜電阻用膏體及厚膜電阻 Download PDF

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Publication number
TWI795545B
TWI795545B TW108110721A TW108110721A TWI795545B TW I795545 B TWI795545 B TW I795545B TW 108110721 A TW108110721 A TW 108110721A TW 108110721 A TW108110721 A TW 108110721A TW I795545 B TWI795545 B TW I795545B
Authority
TW
Taiwan
Prior art keywords
thick film
ruthenium oxide
film resistors
mass
glass
Prior art date
Application number
TW108110721A
Other languages
English (en)
Chinese (zh)
Other versions
TW201942265A (zh
Inventor
川久保勝弘
Original Assignee
日商住友金屬礦山股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友金屬礦山股份有限公司 filed Critical 日商住友金屬礦山股份有限公司
Publication of TW201942265A publication Critical patent/TW201942265A/zh
Application granted granted Critical
Publication of TWI795545B publication Critical patent/TWI795545B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H01C17/06506—Precursor compositions therefor, e.g. pastes, inks, glass frits
    • H01C17/06513—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component
    • H01C17/06533—Precursor compositions therefor, e.g. pastes, inks, glass frits characterised by the resistive component composed of oxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G55/00—Compounds of ruthenium, rhodium, palladium, osmium, iridium, or platinum
    • C01G55/004—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C12/00—Powdered glass; Bead compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/003—Thick film resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/003—Thick film resistors
    • H01C7/005—Polymer thick films

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electromagnetism (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Compositions (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Non-Adjustable Resistors (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Conductive Materials (AREA)
TW108110721A 2018-03-29 2019-03-27 厚膜電阻用組成物、厚膜電阻用膏體及厚膜電阻 TWI795545B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP2018-066146 2018-03-29
JP2018066146A JP7110671B2 (ja) 2018-03-29 2018-03-29 厚膜抵抗体用組成物、厚膜抵抗体用ペースト、及び厚膜抵抗体

Publications (2)

Publication Number Publication Date
TW201942265A TW201942265A (zh) 2019-11-01
TWI795545B true TWI795545B (zh) 2023-03-11

Family

ID=68112953

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108110721A TWI795545B (zh) 2018-03-29 2019-03-27 厚膜電阻用組成物、厚膜電阻用膏體及厚膜電阻

Country Status (4)

Country Link
JP (1) JP7110671B2 (ja)
KR (1) KR102646508B1 (ja)
CN (1) CN110322984B (ja)
TW (1) TWI795545B (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722202A (ja) * 1993-06-07 1995-01-24 E I Du Pont De Nemours & Co 厚膜抵抗体組成物
JP2009007199A (ja) * 2007-06-28 2009-01-15 Sumitomo Metal Mining Co Ltd 厚膜抵抗体組成物、抵抗ペースト及び厚膜抵抗体

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL137152C (ja) * 1966-10-24
JPS50103499A (ja) * 1974-01-18 1975-08-15
JPH0812802B2 (ja) * 1986-11-14 1996-02-07 株式会社日立製作所 サ−マルヘツド用厚膜抵抗体材料，サ−マルヘツド用厚膜抵抗体，並びにサ−マルヘツド
JPH11157845A (ja) * 1997-11-18 1999-06-15 Sumitomo Metal Mining Co Ltd Ｒｕ酸化物粉末およびＲｕ複合酸化物粉末の製造方法
JP2007227114A (ja) 2006-02-23 2007-09-06 Sumitomo Metal Mining Co Ltd 抵抗ペースト及びこれを用いた厚膜抵抗体
WO2012176696A1 (ja) 2011-06-21 2012-12-27 住友金属鉱山株式会社 酸化ルテニウム粉末、それを用いた厚膜抵抗体用組成物および厚膜抵抗体

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722202A (ja) * 1993-06-07 1995-01-24 E I Du Pont De Nemours & Co 厚膜抵抗体組成物
JP2009007199A (ja) * 2007-06-28 2009-01-15 Sumitomo Metal Mining Co Ltd 厚膜抵抗体組成物、抵抗ペースト及び厚膜抵抗体

Also Published As

Publication number Publication date
JP2019172555A (ja) 2019-10-10
KR102646508B1 (ko) 2024-03-11
CN110322984A (zh) 2019-10-11
JP7110671B2 (ja) 2022-08-02
KR20190114821A (ko) 2019-10-10
TW201942265A (zh) 2019-11-01
CN110322984B (zh) 2022-09-16

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