TWI786136B - Substrate holder and plating device - Google Patents
Substrate holder and plating device Download PDFInfo
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- TWI786136B TWI786136B TW107120668A TW107120668A TWI786136B TW I786136 B TWI786136 B TW I786136B TW 107120668 A TW107120668 A TW 107120668A TW 107120668 A TW107120668 A TW 107120668A TW I786136 B TWI786136 B TW I786136B
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/004—Sealing devices
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/008—Current shielding devices
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/02—Heating or cooling
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
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- Chemical Kinetics & Catalysis (AREA)
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- Electroplating Methods And Accessories (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
一種基板固持器,係用於保持基板,且具備:具有用於露出前述基板之第一面的第一開口部之第一保持構件;用於與前述第一保持構件一起夾著前述基板而保持之第二保持構件,且係具有用於露出前述基板之第二面的第二開口部;前述第一保持構件至少具有1個第一外部連接接點,前述第二保持構件具有與前述第一外部連接接點獨立之至少1個第二外部連接接點。 A substrate holder for holding a substrate, comprising: a first holding member having a first opening for exposing a first surface of the substrate; The second holding member has a second opening for exposing the second surface of the substrate; the first holding member has at least one first external connection point, and the second holding member has a At least one second external connection point independent of the external connection points.
Description
本發明係關於一種基板固持器及鍍覆裝置。 The invention relates to a substrate holder and a coating device.
過去進行在半導體晶圓或印刷基板等基板表面形成配線及凸塊(突起狀電極)等。形成該配線及凸塊等之方法習知有電解鍍覆法。用於電解鍍覆法之鍍覆裝置具備密封圓形或多角形基板之端面,並使表面(被鍍覆面)露出而保持之基板固持器。此種鍍覆裝置中,在基板表面進行鍍覆處理時,係使保持基板之基板固持器浸漬於鍍覆液中。 Conventionally, wiring, bumps (protruding electrodes), and the like have been formed on the surface of a substrate such as a semiconductor wafer or a printed circuit board. Electrolytic plating is known as a method for forming such wiring, bumps, and the like. A plating device used in the electrolytic plating method includes a substrate holder that seals the end face of a circular or polygonal substrate and holds the surface (surface to be plated) exposed. In such a plating apparatus, when plating is performed on the surface of a substrate, a substrate holder holding a substrate is immersed in a plating solution.
專利文獻1中記載有用於鍍覆處理基板兩面之基板夾具。該基板夾具具備由另外構件構成之底座部1、護蓋部2、中心部3,底座部1上在重疊中心部3狀態下搭載基板,進一步重疊護蓋部2,而將底座部1、中心部3及護蓋部2從兩側以夾具部4夾著而固定。對基板供給電流時,係從設於底座部1之支臂部14的通電路徑,經由中心部3內之一方通電棒34對底座部1的通電環6供給電流,並經由另一方之通電棒34對護蓋部2的通電環6供給電流,並從各通電環6在基板之各面供給電流(第三、六圖)。 Patent Document 1 describes a substrate jig used for plating both sides of a substrate. This substrate jig has a base part 1, a
專利文獻2中記載有用於鍍覆處理基板兩面之基板夾具70,該基板夾具70係在具備吊架14之第一保持構件11與第二保持構件12之間夾著基板而 保持。對基板供給電流時,係經由第一保持構件11內之導電板22、導電膜插銷23對基板各面供給電流。連接於基板之一方之面的導電膜插銷23與設於吊架14之一方側的端子板27連接,連接於基板另一方面之導電膜插銷23與設於吊架14之另一方側的端子板28連接(第九、十圖)。
此外,記載有藉由第一保持構件71及第二保持構件72保持方形基板之上緣部,並從第一保持構件71兩側之端子板78、79供給電流至基板各面的構成。該構成係從第一保持構件71一方之端子板79經由電極接點75供給電流至基板的一方之面,並從第一保持構件71之另一方端子板78經由通電用接點81,再經由第二保持構件72之通電用彈簧接點82、電極接點76而供給電流至基板另一方面(第二十、二一圖)。 In addition, a configuration is described in which the upper edge of the square substrate is held by the first holding member 71 and the second holding member 72 , and current is supplied to each surface of the substrate from the terminal plates 78 and 79 on both sides of the first holding member 71 . This configuration is to supply current from the terminal plate 79 on one side of the first holding member 71 to one side of the substrate through the electrode contact 75, and from the other terminal plate 78 of the first holding member 71 through the contact 81 for power supply, and then through the electrode contact point 75. The spring contacts 82 and the electrode contacts 76 of the second holding member 72 are used to supply current to the other side of the substrate (figures 20 and 21).
專利文獻3中記載有2片晶圓重疊配置,同時鍍覆處理露出外側之2個面用的晶圓載體100。該晶圓載體100具備:夾著晶圓之非導電凸緣120;及設於凸緣120上部之吊架狀的導電凸緣110。該構成係從導電凸緣110配置於非導電凸緣120之各凸緣片121、122內的導電體426、接點427,經由複數個彈簧針428供給電流至晶圓的各面。
[先前技術文獻] [Prior Art Literature]
[專利文獻] [Patent Document]
[專利文獻1]國際公開第2014-076781號 [Patent Document 1] International Publication No. 2014-076781
[專利文獻2]日本特開第2008-184692號公報 [Patent Document 2] Japanese Unexamined Patent Publication No. 2008-184692
[專利文獻3]美國專利第8236151號說明書 [Patent Document 3] Specification of US Patent No. 8236151
電解鍍覆時,需要將適合基板尺寸之數的接點(基板接點)設於基板夾具,並在此等基板接點上供給電流。此外,有時宜對各基板接點以個別之電流路徑連接於1個或複數個外部連接接點,當基板尺寸大時,接點及電流路徑數量會有增大的趨勢。但是,接點及電流路徑數量增大時,可能導致基板夾具的厚度增大。此種問題在鍍覆處理基板兩面之基板夾具上特別會成為問題,不過在鍍覆處理基板單面時也會發生。 In electrolytic plating, it is necessary to set a number of contacts (substrate contacts) suitable for the size of the substrate on the substrate jig, and to supply current to these substrate contacts. In addition, it is sometimes appropriate to connect each substrate contact to one or multiple external connection contacts with a separate current path. When the substrate size is large, the number of contacts and current paths tends to increase. However, when the number of contacts and current paths increases, the thickness of the substrate holder may increase. This kind of problem is particularly problematic on substrate holders that are plated on both sides of the substrate, but it can also occur when plating on one side of the substrate.
本發明之目的為解決上述問題的至少一部分。 It is an object of the present invention to solve at least part of the above-mentioned problems.
本發明一種基板固持器,係用於保持基板。該基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部;前述第一保持構件至少具有1個第一外部連接接點,前述第二保持構件具有與前述第一外部連接接點獨立之至少1個第二外部連接接點。 The invention relates to a substrate holder, which is used for holding a substrate. The substrate holder includes: a first holding member having a first opening for exposing the first surface of the substrate; and a second holding member for sandwiching the substrate together with the first holding member. and hold, and have a second opening for exposing the second surface of the aforementioned substrate; the aforementioned first holding member has at least one first external connection contact, and the aforementioned second holding member has a contact with the aforementioned first external connection Independent at least one second external connection point.
本發明一種鍍覆裝置係具備:基板固持器,其係用於保持基板;基板裝卸部,其係將前述基板裝卸於前述基板固持器;及鍍覆槽,其係用於對保持前述基板之前述基板固持器實施鍍覆處理。該鍍覆裝置之前述基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部;前述第一保持構件至少具有1個第一外部 連接接點,前述第二保持構件具有與前述第一外部連接接點獨立之至少1個第二外部連接接點。 A coating device of the present invention is provided with: a substrate holder, which is used to hold the substrate; a substrate loading and unloading part, which is used to load and unload the aforementioned substrate from the aforementioned substrate holder; and a plating tank, which is used to hold the aforementioned substrate. The aforementioned substrate holder is subjected to plating treatment. The aforesaid substrate holder of this coating device has: a first holding member, which has a first opening for exposing the first surface of the aforementioned substrate; Hold the aforementioned substrate together, and have a second opening for exposing the second surface of the aforementioned substrate; the aforementioned first holding member has at least one first external connection contact, and the aforementioned second holding member has a An external connection point independent of at least one second external connection point.
10、10a、10b、10c‧‧‧鍍覆槽 10, 10a, 10b, 10c‧‧‧plating tank
11‧‧‧基板固持器 11‧‧‧substrate holder
101‧‧‧架台 101‧‧‧Platform
101a~101h‧‧‧架台構件 101a~101h‧‧‧Establishment components
103‧‧‧控制部 103‧‧‧Control Department
105‧‧‧裝載載台 105‧‧‧Loading stage
107‧‧‧卸載載台 107‧‧‧Unloading the carrier
110A‧‧‧第一保持構件 110A‧‧‧first holding member
110B‧‧‧第二保持構件 110B‧‧‧Second holding member
111A‧‧‧第一本體部 111A‧‧‧First Body Department
111B‧‧‧第二本體部 111B‧‧‧Second body part
1110A‧‧‧第一本體 1110A‧‧‧First Body
1110B‧‧‧第二本體 1110B‧‧‧Second Body
112A‧‧‧第一開口部 112A‧‧‧First opening
112B‧‧‧第二開口部 112B‧‧‧Second opening
113A、113B、114A、114B、115A、115B‧‧‧安裝部 113A, 113B, 114A, 114B, 115A, 115B‧‧‧installation part
117A‧‧‧第一基板接點 117A‧‧‧First substrate contact
117B‧‧‧第二基板接點 117B‧‧‧Second board contact
118A、118B、119A、119B‧‧‧密封固持器 118A, 118B, 119A, 119B‧‧‧seal holder
120A、120B‧‧‧內側密封 120A, 120B‧‧‧inside seal
121A‧‧‧外側密封 121A‧‧‧outside seal
122‧‧‧基板搬送裝置 122‧‧‧Substrate transfer device
122A、122B、123A、123B、124A‧‧‧螺絲 122A, 122B, 123A, 123B, 124A‧‧‧Screw
125‧‧‧導電線 125‧‧‧conductive wire
126‧‧‧預濕槽 126‧‧‧Pre-wetting tank
126A‧‧‧溝 126A‧‧‧ditch
127A‧‧‧配線路徑 127A‧‧‧wiring path
128‧‧‧預浸槽 128‧‧‧prepreg tank
130a‧‧‧第一沖洗槽 130a‧‧‧First flushing tank
130b‧‧‧第二沖洗槽 130b‧‧‧Second flushing tank
130c‧‧‧第三沖洗槽 130c‧‧‧The third flushing tank
132‧‧‧噴吹槽 132‧‧‧spray tank
140‧‧‧搬送機 140‧‧‧Conveyor
141‧‧‧傳輸機 141‧‧‧Conveyor
142‧‧‧固定座 142‧‧‧fixed seat
150‧‧‧配線收容部 150‧‧‧Wiring storage unit
150A‧‧‧第一配線收容部 150A‧‧‧The first wiring storage part
150B‧‧‧第二配線收容部 150B‧‧‧The second wiring storage part
151A‧‧‧第一蓋部 151A‧‧‧First Cover
152A‧‧‧收容空間 152A‧‧‧containment space
154A、154B、155A、158A、159A、159B‧‧‧安裝部 154A, 154B, 155A, 158A, 159A, 159B‧‧‧installation part
157A、157B‧‧‧突出部 157A, 157B‧‧‧protruding part
160‧‧‧支臂部 160‧‧‧Arm
160A‧‧‧第一支臂部 160A‧‧‧first arm
160B‧‧‧第二支臂部 160B‧‧‧Second arm
161A‧‧‧第一外部連接部 161A‧‧‧The first external connection
161B‧‧‧第二外部連接部 161B‧‧‧The second external connection
162A、162B‧‧‧外部連接部護蓋 162A, 162B‧‧‧External connection cover
163L、163R‧‧‧定位部 163L, 163R‧‧‧positioning department
164A‧‧‧嚙合部 164A‧‧‧Engagement
164B‧‧‧狹窄部 164B‧‧‧Stenosis
165A‧‧‧嚙合部 165A‧‧‧Engagement
165B‧‧‧端部 165B‧‧‧end
166A、166B‧‧‧安裝部 166A, 166B‧‧‧Installation Department
167‧‧‧匯流條 167‧‧‧bus bar
168‧‧‧外部連接接點 168‧‧‧External connection contacts
169‧‧‧確認通電裝置 169‧‧‧Confirm the electrification device
170A‧‧‧裝載/卸載部 170A‧‧‧Loading/Unloading Department
170B‧‧‧基板放置部 170B‧‧‧substrate placement department
170C‧‧‧處理部 170C‧‧‧Processing Department
170D‧‧‧固持器存儲部 170D‧‧‧Retainer Storage
170E‧‧‧清洗部 170E‧‧‧Cleaning Department
173C‧‧‧處理部 173C‧‧‧Processing Department
180、180A、180B、181、181A、181B、191A、191B‧‧‧安裝部 180, 180A, 180B, 181, 181A, 181B, 191A, 191B‧‧‧installation part
192A、192B‧‧‧配線孔 192A, 192B‧‧‧wiring hole
193‧‧‧螺栓 193‧‧‧Bolts
194‧‧‧貫穿孔 194‧‧‧through hole
194a‧‧‧鍃孔 194a‧‧‧鍃hole
195‧‧‧螺絲孔 195‧‧‧Screw hole
200‧‧‧內側空間 200‧‧‧inner space
210A‧‧‧突起部 210A‧‧‧Protrusion
210B‧‧‧貫穿孔 210B‧‧‧through hole
30A‧‧‧第一陽極固持器 30A‧‧‧The first anode holder
30B‧‧‧第二陽極固持器 30B‧‧‧Second Anode Holder
31A、31B‧‧‧第一及第二陽極 31A, 31B‧‧‧first and second anode
32A、32B‧‧‧第一及第二陽極遮罩 32A, 32B‧‧‧first and second anode shield
35A、35B‧‧‧第一及第二槳葉 35A, 35B‧‧‧first and second blades
36A、36B‧‧‧第一及第二中間遮罩 36A, 36B‧‧‧first and second intermediate masks
37‧‧‧外部電源 37‧‧‧External power supply
230‧‧‧端子 230‧‧‧terminal
240‧‧‧電流供給部 240‧‧‧current supply part
250‧‧‧支臂收容部 250‧‧‧arm housing
410、420‧‧‧導電路徑部 410, 420‧‧‧Conductive Path Department
410L‧‧‧左側導電路徑構件 410L‧‧‧Left conductive path member
410R‧‧‧右側導電路徑構件 410R‧‧‧Right conductive path member
420L‧‧‧左側導電路徑構件 420L‧‧‧Left conductive path member
420R‧‧‧右側導電路徑構件 420R‧‧‧Right conductive path member
411L~415L、411R~415R、421L~425L、421R~425R‧‧‧路徑片 411L~415L, 411R~415R, 421L~425L, 421R~425R‧‧‧path piece
430‧‧‧導電板 430‧‧‧conductive plate
440L、440R‧‧‧外部連接接點 440L, 440R‧‧‧external connection contact
1000‧‧‧基板裝卸裝置 1000‧‧‧Substrate loading and unloading device
1600‧‧‧安裝凹部 1600‧‧‧Installation recess
1650A‧‧‧薄部 1650A‧‧‧thin part
L‧‧‧配線 L‧‧‧Wiring
S‧‧‧鍍覆液面 S‧‧‧plating liquid surface
W‧‧‧基板 W‧‧‧substrate
300‧‧‧循環機構 300‧‧‧Cycle mechanism
302‧‧‧循環管線 302‧‧‧Circulation pipeline
304‧‧‧閥門 304‧‧‧Valve
306‧‧‧泵浦 306‧‧‧pump
308‧‧‧溫度控制裝置 308‧‧‧temperature control device
310‧‧‧過濾器 310‧‧‧Filter
第一圖係顯示鍍覆裝置之一個實施形態的模式圖。 The first figure is a schematic view showing an embodiment of a plating device.
第二A圖係從基板固持器之第一側觀看的立體圖。 The second panel A is a perspective view from the first side of the substrate holder.
第二B圖係從基板固持器之第二側觀看的立體圖。 The second Figure B is a perspective view from a second side of the substrate holder.
第三A圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。 The third figure A is a perspective view of the first holding member and the second holding member in the open state of the substrate holder viewed from the first side.
第三B圖係從第二側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。 The third figure B is a perspective view of the first holding member and the second holding member in the open state of the substrate holder viewed from the second side.
第四A圖係從第一保持構件之第一側觀看的分解立體圖。 The fourth figure A is an exploded perspective view viewed from the first side of the first holding member.
第四B圖係從第一保持構件之第二側觀看的分解立體圖。 The fourth figure B is an exploded perspective view viewed from the second side of the first holding member.
第四C圖係配線收容部之立體圖。 The fourth figure C is a perspective view of the wiring receiving part.
第五A圖係從第二保持構件之第一側觀看的分解立體圖。 The fifth figure A is an exploded perspective view viewed from the first side of the second holding member.
第五B圖係從第二保持構件之第二側觀看的分解立體圖。 The fifth figure B is an exploded perspective view viewed from the second side of the second holding member.
第六A圖係從第一側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。 The sixth figure A is an enlarged perspective view of the vicinity of the arm part viewed from the first side in the state where the first arm part and the second arm part are meshed.
第六B圖係從第二側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。 Figure 6B is an enlarged perspective view of the vicinity of the arm portion viewed from the second side in a state where the first arm portion and the second arm portion are meshed.
第六C圖係從第一側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。 Figure 6 C is an enlarged perspective view of the vicinity of the arm portion viewed from the first side in a state in which the first arm portion and the second arm portion are opened.
第六D圖係從第二側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。 Figure 6D is an enlarged perspective view of the vicinity of the arm portion viewed from the second side in a state in which the first arm portion and the second arm portion are opened.
第七A圖係用於顯示從第一外部連接部至第一本體部之配線的路徑構成之第一保持構件的部分透視立體圖。 The seventh figure A is a partial perspective perspective view of the first holding member for showing the path of the wiring from the first external connection part to the first body part.
第七B圖係在第一本體部與配線收容部之連結部中的第一本體部立體圖。 The seventh figure B is a perspective view of the first body part in the connecting part of the first body part and the wiring receiving part.
第七C圖係從內側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。 The seventh figure C is a perspective view of the wiring accommodating part in the connecting part of the wiring accommodating part and the first body part viewed from the inside.
第七D圖係從外側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。 The seventh figure D is a perspective view of the wiring accommodating part in the connecting part of the wiring accommodating part and the first main body viewed from the outside.
第八圖係配線收容部及本體部之連結部中的放大俯視圖。 The eighth figure is an enlarged plan view of the connecting part between the wiring receiving part and the main body part.
第八A圖係第八圖之A-A的剖面圖。 The eighth figure A is a sectional view of A-A of the eighth figure.
第八B圖係在並未形成配線孔之部分的第八圖之B-B的剖面圖。 The eighth figure B is a cross-sectional view of B-B of the eighth figure where no wiring hole is formed.
第八C圖係在形成有配線孔之部分的第八圖之C-C的剖面圖。 The eighth figure C is a sectional view of C-C of the eighth figure at the part where the wiring hole is formed.
第九A圖係從第一保持構件之內側面側觀看的前視圖。 Figure 9 A is a front view viewed from the inside side of the first retaining member.
第九B圖係從第一保持構件之內側面側觀看的部分放大前視圖。 Figure 9B is a partially enlarged front view viewed from the inner side of the first holding member.
第九C圖係與第一保持構件一起顯示第二保持構件之在第九B圖的C-C剖面圖。 The ninth figure C shows the C-C sectional view of the ninth B figure of the second retaining member together with the first retaining member.
第十圖係顯示固定基板接點之螺絲配置的第一及第二本體部之剖面圖。 Figure 10 is a cross-sectional view of the first and second body parts showing the arrangement of screws for fixing the contacts of the substrate.
第十一圖係顯示固定用於安裝內側密封之密封固持器的螺絲之配置的第一及第二本體部之剖面圖。 Figure 11 is a cross-sectional view of the first and second body portions showing the arrangement of the screws securing the seal holder for installing the inner seal.
第十二A圖係卸下配線護蓋狀態之外部連接部的放大立體圖。 Figure 12A is an enlarged perspective view of the external connection part in a state where the wiring cover is removed.
第十二B圖係第一保持構件中之電流路徑的說明圖。 Figure 12B is an explanatory view of the current path in the first holding member.
第十二C圖係第二保持構件中之電流路徑的說明圖。 Figure 12C is an explanatory view of the current path in the second holding member.
第十二D圖係顯示確認通電時外部連接部之各接點的連接模式圖。 The twelfth figure D is a diagram showing the connection mode of each contact point of the external connection part when the power is confirmed.
第十二E圖係顯示鍍覆處理時外部連接部之各接點的連接模式圖。 Figure 12E is a diagram showing the connection mode of each contact point of the external connection part during the plating process.
第十三A圖係說明將基板放置部中之基板設置於基板固持器的模式圖。 FIG. 13A is a schematic diagram illustrating setting the substrate in the substrate placing part on the substrate holder.
第十三B圖顯示基板固持器的固定方法之一例。 FIG. 13B shows an example of a method for fixing a substrate holder.
第十四A圖係第一保持構件之定位部附近的放大立體圖。 Figure 14A is an enlarged perspective view near the positioning portion of the first holding member.
第十四B圖係第二保持構件之定位部的放大立體圖。 Figure 14B is an enlarged perspective view of the positioning portion of the second holding member.
第十五圖係概略顯示鍍覆槽之構成的側視圖。 Figure 15 is a side view schematically showing the composition of the plating tank.
第十六A圖係在與第一保持構件之第一支臂部的外部連接部相反側之定位部附近的放大立體圖。 Figure 16A is an enlarged perspective view of the vicinity of the positioning portion on the opposite side to the external connection portion of the first arm portion of the first holding member.
第十六B圖係第一保持構件之第一支臂部的外部連接部側之定位部附近的放大立體圖。 Figure 16B is an enlarged perspective view of the vicinity of the positioning portion on the side of the external connection portion of the first arm portion of the first holding member.
第十七圖係從其他實施形態之基板固持器的第一側觀看之立體圖。 Fig. 17 is a perspective view viewed from the first side of the substrate holder of another embodiment.
第十八圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。 Figure 18 is a perspective view of the first holding member and the second holding member in the open state of the substrate holder viewed from the first side.
第十九圖係基板固持器之第一保持構件及第二保持構件的分解立體圖。 Figure 19 is an exploded perspective view of the first holding member and the second holding member of the substrate holder.
第二十圖係其他實施形態之導電路徑部的立體圖。 Fig. 20 is a perspective view of a conductive path portion in another embodiment.
第二十一圖係第一保持構件及第二保持構件從基板保持面側觀看之箭視圖。 Figure 21 is an arrow view of the first holding member and the second holding member viewed from the side of the substrate holding surface.
第二十二A圖係基板固持器之基板接點附近的放大圖。 Figure 22A is an enlarged view of the vicinity of the substrate contacts of the substrate holder.
第二十二B圖係在卸下一部分基板接點狀態下顯示基板固持器之基板接點附近的放大圖者。 Figure 22B is an enlarged view showing the vicinity of the substrate contact of the substrate holder in a state where a part of the substrate contact is removed.
第二十三圖係與第一保持構件一起顯示第二保持構件之在第二十二B圖的C-C剖面圖。 Figure 23 is a cross-sectional view along line C-C of Figure 22B showing the second retaining member together with the first retaining member.
第二十四圖係在卸下外部連接部護蓋狀態之外部連接部的放大立體圖。 Figure 24 is an enlarged perspective view of the external connection part in the state where the external connection part cover is removed.
第二十五圖係外部連接部之剖面圖。 Figure 25 is a sectional view of the external connection part.
以下,參照附圖說明本發明之鍍覆裝置及使用於鍍覆裝置之基板固持器的實施形態。附圖中,對相同或類似之元件註記相同或類似參考符號,在各種實施形態之說明中,省略關於相同或類似元件之重複說明。此外,各種實施形態顯示之特徵只要彼此不矛盾,亦可適用於其他實施形態。另外,本說明書中,所謂「基板」,除了半導體基板、玻璃基板、印刷電路板之外,還包含磁性記錄媒介、磁性記錄感測器、反射鏡、光學元件及微小機械元件、或是局部製作之積體電路。基板包含任意形狀(方形、圓形等)者。此外,本說明書中使用「前面」、「背面」、「前方」、「後方」、「上」、「下」、「左」、「右」等之表現,而此等是為了方便說明而顯示在例示之圖式紙面上的位置、方向者,在使用裝置時等的實際配置上會有不同。 Hereinafter, embodiments of the coating device and the substrate holder used in the coating device will be described with reference to the drawings. In the drawings, the same or similar reference signs are attached to the same or similar elements, and repeated description of the same or similar elements will be omitted in the description of various embodiments. In addition, the features shown in various embodiments can be applied to other embodiments as long as they do not contradict each other. In addition, in this specification, the term "substrate" includes not only semiconductor substrates, glass substrates, and printed circuit boards, but also magnetic recording media, magnetic recording sensors, mirrors, optical elements and micromechanical elements, or partially fabricated integrated circuits. The substrate includes any shape (square, circular, etc.). In addition, expressions such as "front", "rear", "front", "rear", "upper", "lower", "left", "right", etc. are used in this manual, and these are shown for the convenience of explanation The positions and directions on the drawing paper shown as examples may be different in the actual arrangement when the device is used.
第一圖係顯示鍍覆裝置之一個實施形態的模式圖。如第一圖所示,鍍覆裝置具備:架台101;控制鍍覆裝置之運轉的控制部103;裝載及卸載基板W(參照第二圖)之裝載/卸載部170A;在基板固持器11(參照第二圖)上放置基板W,且從基板固持器11卸下基板W之基板放置部(機械房、基板裝卸部)170B;鍍覆基板W之處理部(前處理室、鍍覆室)170C;收納基板固持器11之固持器存儲部(暫存室)170D;及清洗及乾燥鍍覆後之基板W的清洗部170E。 本實施形態之鍍覆裝置係藉由電流在鍍覆液中流動,以金屬鍍覆基板W之第一面及第二面的電解鍍覆裝置。第一面及第二面係彼此相對之面,本實施形態係表面及背面。此外,成為本實施形態處理對象之基板W係半導體封裝基板等。此外,分別在基板W之表面側及背面側形成由種層等構成之導電層,進一步在該導電層上之圖案面形成區域形成有抗蝕層,在該抗蝕層中預先形成有溝渠(Trench)及連通孔(Via)。本實施形態中,可包含具備連接基板表面與背面之貫穿孔的基板(即通孔基板)作為處理對象。 The first figure is a schematic view showing an embodiment of a plating device. As shown in the first figure, the plating apparatus has: a
如第一圖所示,架台101由複數個架台構件101a~101h構成,此等架台構件101a~101h可連結而構成。裝載/卸載部170A之元件配置於第一架台構件101a上,基板放置部170B之元件配置於第二架台構件101b上,處理部170C之元件配置於第三架台構件101c~第六架台構件101f上,固持器存儲部170D之元件配置於第七架台構件101g及第八架台構件101h上。 As shown in the first figure, the
裝載/卸載部170A設有:搭載收納鍍覆前之基板W的匣盒(無圖示)之裝載載台105;及搭載接收以處理部170C鍍覆之基板W的匣盒(無圖示)之卸載載台107。進一步在裝載/卸載部170A中配置有由搬送基板W之搬送用機器人構成的基板搬送裝置122。 The loading/
基板搬送裝置122進入搭載於裝載載台105之匣盒,從匣盒取出鍍覆前之基板W,將基板W送交基板放置部170B而構成。基板放置部170B將鍍覆前之基板W放置於基板固持器11上,並將鍍覆後之基板W從基板固持器11取出。 The
處理部170C中配置有:預濕槽126、預浸槽128、第一沖洗槽130a、噴吹槽132、第二沖洗槽130b、第一鍍覆槽10a、第二鍍覆槽10b、第三沖洗槽130c、第三鍍覆槽10c。此等槽126、128、130a、132、130b、10a、10b、130c、10c依該 順序配置。以下說明時,會將第一鍍覆槽10a、第二鍍覆槽10b、第三鍍覆槽10c合併,或是參照此等鍍覆槽中任意的鍍覆槽,而稱為鍍覆槽10。 The
預濕槽126係進行前處理準備而將基板W浸漬於純水中。預浸槽128係藉由藥劑蝕刻除去形成於基板W表面之種層等導電層表面的氧化膜。第一沖洗槽130a係以清洗液(例如純水)清洗預浸後之基板W。 In the
第一鍍覆槽10a、第二鍍覆槽10b、及第三鍍覆槽10c之至少1個鍍覆槽10係鍍覆基板W之兩面。另外,在第一圖所示之實施形態中,鍍覆槽10係3個,不過其他實施形態亦可具備任意數量之鍍覆槽10。 At least one
第二沖洗槽130b係將以第一鍍覆槽10a或第二鍍覆槽10b鍍覆後之基板W與基板固持器11一起用清洗液(例如純水)清洗。第三沖洗槽130c係將被第三鍍覆槽10c鍍覆後之基板W與基板固持器11一起用清洗液(例如純水)清洗。噴吹槽132係在鍍覆處理前後進行清洗後之基板W的脫液。 The
預濕槽126、預浸槽128、沖洗槽130a~130c、及鍍覆槽10a~10c係在此等內部可貯存處理液(液體)之處理槽。此等處理槽具備貯存處理液之複數個處理室,不過不限於本實施形態,此等處理槽亦可具備單一的處理室。此外,亦可此等處理槽之至少一部分具備單一的處理室,而其他處理槽具備複數個處理室。 The
鍍覆裝置進一步具備搬送基板固持器11之搬送機140。搬送機140構成可在鍍覆裝置之元件間移動。搬送機140具備:從基板放置部170B至處理部170C在水平方向延伸之固定座142;及構成可沿著固定座142移動之複數個傳輸機141。 The plating apparatus further includes a
此等傳輸機141分別具有用於保持基板固持器11之活動部(無圖示),而構成可保持基板固持器11。傳輸機141係構成在基板放置部170B、固持器存儲部170D、及處理部170C之間搬送基板固持器11,進一步使基板固持器11與基板W一起上下運動。例如,傳輸機141之1個藉由使保持基板W之基板固持器11從鍍覆槽10上下降,可使基板W與基板固持器11一起浸漬於鍍覆槽10內的鍍覆液中。傳輸機141之移動機構例如可採用馬達與齒輪齒條副的組合。另外,第一圖所示之實施形態係設有3個傳輸機,不過其他實施形態亦可採用任意數量之傳輸機。 Each of these
(基板固持器) (substrate holder)
第二A圖係從基板固持器之第一側觀看的立體圖。第二B圖係從基板固持器之第二側觀看的立體圖。第三A圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。第三B圖係從第二側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。第四A圖係從第一保持構件之第一側觀看的分解立體圖。第四B圖係從第一保持構件之第二側觀看的分解立體圖。第四C圖係配線收容部之立體圖。第五A圖係從第二保持構件之第一側觀看的分解立體圖。第五B圖係從第二保持構件之第二側觀看的分解立體圖。 The second panel A is a perspective view from the first side of the substrate holder. The second Figure B is a perspective view from a second side of the substrate holder. The third figure A is a perspective view of the first holding member and the second holding member in the open state of the substrate holder viewed from the first side. The third figure B is a perspective view of the first holding member and the second holding member in the open state of the substrate holder viewed from the second side. The fourth figure A is an exploded perspective view viewed from the first side of the first holding member. The fourth figure B is an exploded perspective view viewed from the second side of the first holding member. The fourth figure C is a perspective view of the wiring receiving part. The fifth figure A is an exploded perspective view viewed from the first side of the second holding member. The fifth figure B is an exploded perspective view viewed from the second side of the second holding member.
基板固持器11具備:具有第一開口部112A之第一保持構件110A;及具有第二開口部112B之第二保持構件110B。基板固持器11係藉由第一保持構件110A及第二保持構件110B夾著基板W來保持基板W。第一保持構件110A及第二保持構件110B分別藉由第一開口部112A及第二開口部112B,以基板W之第一面(表面)及第二面(背面)的各個被鍍覆面露出之方式保持。換言之,第一開口部112A係藉由從兩側僅夾著基板W之外周部來保持基板W。基板固持器11具 備支臂部160,支臂部160在保持於傳輸機141之狀態下搬送。以下之說明,有時將基板固持器11中露出基板W的第一面(表面)之側稱為第一側,並將露出基板的第二面(背面)之側稱為第二側。第二A圖係顯示基板W之第一面(表面)從第一保持構件110A的第一開口部112A露出。第二B圖係顯示基板W之第二面(背面)從第二保持構件110B之第二開口部112B露出。 The
本實施形態之基板固持器11係用於保持方形的基板W者,不過並非限定於此者,亦可為保持圓形之基板者。此時,第一開口部112A及第二開口部112B亦成為圓形。或是,基板W亦可為六角形等之多角形基板。此時,第一開口部112A及第二開口部112B亦同樣地成為多角形。 The
第一保持構件110A具備:第一本體部111A、第一配線收容部150A、第一支臂部160A(第三A圖、第四A圖)。第二保持構件110B具備:第二本體部111B、第二配線收容部150B、第二支臂部160B(第三A圖、第五A圖)。 110 A of 1st holding members are equipped with 111 A of 1st main body parts, 150 A of 1st wiring accommodating parts, and 160 A of 1st arm parts (3rd drawing A, 4th drawing A). The
第一本體部111A與第二本體部111B一起提供保持基板W之本體部111(第二A圖、第三A圖)。第一本體部111A具備形成有第一開口部112A之第一本體1110A、及後述之密封、基板接點等構成構件。第一本體1110A係在嚙合第一保持構件110A與第二保持構件110B時,具有成為外側及內側之外側面及內側面的板狀構件。在第一本體1110A之內側面配置有密封、基板接點等構成構件。第一本體部111A在第一配線收容部150A之突出部157A的兩側具有安裝於第一配線收容部150A之安裝部155A的安裝部113A(第四A圖)。各安裝部113A在第一配線收容部150A之突出部157A的兩側突出。此外,第一本體部111A具有安裝於第一配線收容部150A側概略中央部之安裝部158A的作為突出部之安裝部114A(第四A圖)。安裝部113A、114A、安裝部155A、158A中設有螺栓孔等安 裝構造。安裝部113A、114A以螺栓等緊固構件固定於安裝部155A、158A。本實施形態之安裝部113A、114A係與第一本體1110A一體形成。 The
第一配線收容部150A提供使複數條配線L(電流路徑)通過之路徑,並且提供收容各配線L多餘長度部分之配線收容部150(第二A圖、第三A圖)。第一配線收容部150A具有收容空間152A(第四C圖)。收容空間152A提供使從第一支臂部160A之外部連接部161A延伸至基板接點的複數條配線L(電流路徑)通過之路徑,並且收容各配線L之多餘長度部分。第一配線收容部150A具有關閉收容空間152A之第一蓋部151A。本實施形態係以個別之配線L連接各外部連接接點168與各基板接點117,並藉由將各配線L之長度形成概略相同長度,而使各外部連接接點168與各基板接點117(第十二B圖)間之電阻值均勻。這是為了使流入各基板接點117之電流均勻。此時,各外部連接接點168與各基板接點117間之距離依基板接點117之位置而不同,並配合距離最大的路徑來設定配線長度。因而,依基板接點117之位置,而產生配線多餘長度部分,並將其收納在第一配線收容部150A中。 The first
第一配線收容部150A具有安裝於第一支臂部160A之安裝部166A的2個安裝部154A(第四A圖)。安裝部154A中設有用於安裝於第一支臂部160A之螺栓孔等的安裝構造。此外,第一配線收容部150A進一步具有:分別安裝於第一本體部111A之2處的安裝部113A之2個安裝部155A;及安裝於第一本體部111A之安裝部114A的安裝部158A。安裝部155A、158A中設有用於安裝於第一配線收容部150A之螺栓孔等的安裝構造。第一配線收容部150A對第一支臂部160A及第一本體部111A,在各安裝部中例如藉由螺栓等之旋緊機構固定。 150 A of 1st wiring accommodating parts have two mounting
第一支臂部160A與第二支臂部160B一起提供傳輸機141保持之部分,以及在鍍覆槽中保持的支臂部160(第二A圖、第三A圖)。第一支臂部160A具備細長板狀構件或棒狀構件。第一支臂部160A具有:外部連接部161A、與用於保護外部連接部161A及配線L之外部連接部護蓋162A。此外,第一支臂部160A具有與第二保持構件110B之第二支臂部160B嚙合的嚙合部164A、165A(第三B圖)。第一支臂部160A與第二支臂部160B藉由嚙合部164A、165A而彼此嚙合定位。此外,第一支臂部160A具有分別對應於第一配線收容部150A之2個安裝部154A的2個安裝部166A(第四A圖)。如第四B圖及第六D圖所示,嚙合部165A具備比細長板狀構件或棒狀構件之其他部分(例如,中央部分)在第一本體部111A側延長的薄部1650A。此外,在薄部1650A之第一本體部111A側凸緣狀地設有具有與其他部分(例如,中央部分)概略相同厚度的部分。此外,在薄部1650A之外部連接部161A側設有比薄部厚的方塊狀部分。因此,薄部1650A成為從三方面包圍之凹部,可在該凹部中嚙合第二支臂部160B之端部165B。 The
第十六A圖係在與第一保持構件之第一支臂部的外部連接部相反側之定位部附近的放大立體圖。第十六B圖係第一保持構件之第一支臂部的外部連接部側之定位部附近的放大立體圖。如第十六A圖及第十六B圖所示,第一支臂部160A在其兩端部具有用於將基板固持器11在基板放置部170B及鍍覆槽10中定位的定位部163R、163L。各定位部163R、163L具有定位孔,並藉由與設於基板放置部170B及鍍覆槽10之定位銷(無圖示)嚙合,可將基板固持器11定位。另外,亦可將一方定位孔作成長孔來調整基板固持器11在左右方向的位置。第十六A圖中顯示將定位部163L之定位孔形成長孔的情況。 Figure 16A is an enlarged perspective view of the vicinity of the positioning portion on the opposite side to the external connection portion of the first arm portion of the first holding member. Figure 16B is an enlarged perspective view of the vicinity of the positioning portion on the side of the external connection portion of the first arm portion of the first holding member. As shown in Figures 16A and 16B, the
第二保持構件110B具備:第二本體部111B、第二配線收容部150B、第二支臂部160B(第三A圖、第五A圖)。由於第二本體部111B及第二配線收容部150B之構成與第一本體部111A及第一配線收容部150A的構成概略相同,因此省略詳細之說明,並在同樣之構成中註記相同編號與英文字母B所顯示的符號。 The
第二支臂部160B具備細長板狀構件或棒狀構件。第二支臂部160B具有:外部連接部161B、與用於保護外部連接部161B及配線L之外部連接部護蓋162B。此外,第二支臂部160B具有分別對應於第二配線收容部150B之2個安裝部154B的2個安裝部166B(第五A圖)。第二支臂部160B藉由安裝部166B,例如藉由螺栓等旋緊機構而固定於第二配線收容部150B之安裝部154B。此外,第二支臂部160B在2個安裝部166B之間具有寬度比其他部分窄之狹窄部164B。 The
第六A圖係從第一側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。第六B圖係從第二側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。第六C圖係從第一側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。第六D圖係從第二側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。 The sixth figure A is an enlarged perspective view of the vicinity of the arm part viewed from the first side in the state where the first arm part and the second arm part are meshed. Figure 6B is an enlarged perspective view of the vicinity of the arm portion viewed from the second side in a state where the first arm portion and the second arm portion are meshed. Figure 6 C is an enlarged perspective view of the vicinity of the arm portion viewed from the first side in a state in which the first arm portion and the second arm portion are opened. Figure 6D is an enlarged perspective view of the vicinity of the arm portion viewed from the second side in a state in which the first arm portion and the second arm portion are opened.
如第六A~D圖所示,第一支臂部160A之嚙合部164A與第二支臂部160B之外部連接部護蓋162B的上面及端面嚙合(第六A圖、第六B圖)。在第一支臂部160A之嚙合部165A的凹部嚙合與第二支臂部160B之外部連接部護蓋162B相反側的端部165B(第六B圖)。此時,第一支臂部160A之嚙合部165A係從上下方向及端面側嵌合第二支臂部160B之端部165B的形狀。因而,第一支臂部160A及第二支臂部160B整體在第一支臂部160A重疊於第二支臂部160B之上 方的狀態下彼此嚙合。亦即,在第一保持構件110A與第二保持構件110B嚙合狀態下,第一支臂部160A與第二支臂部160B在從第一及第二本體部111A、111B朝向第一及第二支臂部160A、160B之方向排列。亦即,在第一支臂部160A及第二支臂部160B中,分別分配基板固持器11之上方及下方的空間,而分開上下棲息。藉由該構成可抑制或防止基板固持器11在厚度方向之尺寸增大。 As shown in Figures 6 A to D, the engaging
此外,在第二支臂部160B之狹窄部164B的部分,在第一支臂部160A與第二支臂部160B之間形成有間隙,而形成傳輸機141之爪(用於握持基板固持器11之爪)的退入空間。 In addition, at the part of the
此外,如第六A~D圖所示,嚙合第一支臂部160A及第二支臂部160B時,第一及第二支臂部160A、160B之第一及第二外部連接部161A、161B係以彼此不致干擾之方式而配置於基板固持器11之寬度方向的相反側。亦即,第一及第二外部連接部161A、161B位於基板固持器11之左右兩端,換言之,位於支臂部160之左右兩端。在鍍覆槽10中,由於可從基板固持器11之支臂部160的左右兩端對基板W之第一面及第二面進行饋電,因此,比起使外部連接部集中在支臂部160之一方端部的形態,可防止基板固持器11之厚度增大。 In addition, as shown in Figures 6 A to D, when engaging the
第七A圖係用於顯示從第一外部連接部至第一本體部之配線的路徑構成之第一保持構件的部分透視立體圖。第七B圖係在第一本體部與配線收容部之連結部中的第一本體部立體圖。第七C圖係從內側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。第七D圖係從外側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。另外,以下之說明係說明第一保持構件110A之配線L的路徑構成,不過,關於第二保持構件110B之配線L的路徑亦同。 The seventh figure A is a partial perspective perspective view of the first holding member for showing the path of the wiring from the first external connection part to the first body part. The seventh figure B is a perspective view of the first body part in the connecting part of the first body part and the wiring receiving part. The seventh figure C is a perspective view of the wiring accommodating part in the connecting part of the wiring accommodating part and the first body part viewed from the inside. The seventh figure D is a perspective view of the wiring accommodating part in the connecting part of the wiring accommodating part and the first main body viewed from the outside. In addition, although the following description describes the route configuration of the wiring L of the first holding
如第七A圖所示,連接於第一外部連接部161A之複數條配線L通過第一配線收容部150A內側之收容空間152A(第四C圖),再通過設於第一本體部111A之配線孔116A(第七A、B圖)而導入第一本體部111A內。配線孔116A係藉由加工而形成的錐孔,並對應於各配線L而設置。在第一配線收容部150A之第一本體部111A側的厚部設有對應於各配線L之複數個配線孔192A(第七C、D圖),複數條配線L通過此等配線孔192A而導出第一本體部111A側。從複數個配線孔192A送出之配線L通過第一本體部111A對應之配線孔116A(第七B圖)而導入第一本體部111A內。 As shown in FIG. 7A, a plurality of wires L connected to the first
第八圖係配線收容部及本體部之連結部中的放大俯視圖。第八A圖係第八圖之A-A的剖面圖。第八B圖係在並未形成配線孔之部分的第八圖之B-B的剖面圖。第八C圖係在形成有配線孔之部分的第八圖之C-C的剖面圖。 The eighth figure is an enlarged plan view of the connecting part between the wiring receiving part and the main body part. The eighth figure A is a sectional view of A-A of the eighth figure. The eighth figure B is a cross-sectional view of B-B of the eighth figure where no wiring hole is formed. The eighth figure C is a sectional view of C-C of the eighth figure at the part where the wiring hole is formed.
如第八圖及第八A圖所示,第一本體部111A具有在寬度方向之概略中央係薄部之安裝部114A。安裝部114A在內側面(第二保持構件110B側之面)及外側面(與第二保持構件110B相反側之面)具有比第一本體部111A之其他部分厚度小的薄部構成之階差部。第一配線收容部150A具有形成對應於第一本體部111A之安裝部114A的階差部之形狀的凹部之安裝部158A及159A。第一本體部111A之安裝部114A與第一配線收容部150A的安裝部158A中例如形成有螺栓孔(無圖示),並藉由螺栓固定安裝部114A及安裝部158A。第二保持構件110B之第二本體部111B及第二配線收容部150B的構成亦同。 As shown in FIG. 8 and FIG. 8A, the first
因為該構成係成為第一配線收容部150A之安裝部159A重疊於第一本體部111A之安裝部114A之外側面的傘構造,所以可抑制或防止鍍覆液從第一保持構件110A之外側面側侵入第一保持構件110A與第二保持構件110B之間 的內側空間200。同樣地,因為成為第二配線收容部150B之安裝部159B重疊於第二本體部111B之安裝部114B的外側面之傘構造,所以可抑制或防止鍍覆液從第二保持構件110B之外側面側(與第一保持構件110A相反側)侵入內側空間200。換言之,藉由傘構造可抑制或防止鍍覆液藉由液體槳葉等而侵入基板固持器11的內側空間200。 Because this structure is an umbrella structure in which the mounting
如第八圖及第八B圖所示,第一本體部111A在安裝部114A以外未形成配線孔116A之部分具有安裝部115A。安裝部115A在外側面(與第二保持構件110B相反側之面)具有由厚度比第一本體部111A之其他部分小的薄部構成之階差部。第一配線收容部150A具有由對應於第一本體部111A之安裝部115A的階差部之形狀的凸緣部構成之安裝部191A。第一保持構件110A與第二保持構件110B嚙合時,第一配線收容部150A之安裝部191A與第一本體部111A之安裝部115A的階差部嚙合。第二保持構件110B之第二本體部111B及第二配線收容部150B的構成亦同。 As shown in FIG. 8 and FIG. 8B, the
因為該構成係成為第一配線收容部150A之安裝部191A重疊於第一本體部111A之安裝部115A的外側面之傘構造,所以可抑制或防止鍍覆液從第一保持構件110A之外側面側侵入基板固持器11的內側空間200。同樣地,因為成為第二配線收容部150B之安裝部191B重疊於第二本體部111B之安裝部115B的外側面之傘構造,所以可抑制或防止鍍覆液從第二保持構件110B之外側面側侵入基板固持器11的內側空間200。換言之,藉由傘構造可抑制或防止鍍覆液藉由液體槳葉等而侵入基板固持器11的內側空間200。 Because this structure is an umbrella structure in which the mounting
如第八C圖所示,第八圖之C-C的位置係在第一配線收容部150A及第一本體部111A分別設有配線孔192A及配線孔116A。第一配線收容部150A與 第一本體部111A之連結構造與第八B圖的情況相同。配線L從第一配線收容部150A之收容空間152A通過配線孔192A,再通過第一本體部111A之配線孔116A。第二保持構件110B之第二本體部111B及第二配線收容部150B的構成亦同。 As shown in the eighth figure C, the position C-C in the eighth figure is that a
因為該構成係成為第一配線收容部150A之安裝部191A重疊於第一本體部111A的安裝部115A之外側面的傘構造,所以可抑制或防止鍍覆液從第一保持構件110A之外側面側侵入基板固持器11的內側空間200。同樣地,因為成為第二配線收容部150B之安裝部191B重疊於第二本體部111B的安裝部115B之外側面的傘構造,所以可抑制或防止鍍覆液從第二保持構件110B之外側面側侵入基板固持器11的內側空間200。換言之,藉由傘構造可抑制或防止鍍覆液藉由液體槳葉等而侵入基板固持器11的內側空間200。 Since this structure is an umbrella structure in which the mounting
如參照第八圖至第八C圖之以上說明,第一本體部111A與第一配線收容部150A在連結部中具有第一配線收容部150A之壁部(安裝部)從外側重疊於第一本體部111A之壁部(安裝部)的傘構造。藉由該構成可抑制或防止鍍覆液從第一保持構件110A之外側面側經由第一本體部111A及第一配線收容部150A的連結部、及/或經由內側空間200侵入配線孔192A及配線孔116A。同樣地,第二本體部111B與第二配線收容部150B在連結部中具有第二配線收容部150B之壁部(安裝部)從外側重疊於第二本體部111B之壁部(安裝部)的傘構造。藉由該構成可抑制或防止鍍覆液從第二保持構件110B之外側面側經由第二本體部111B及第二配線收容部150B之連結部、及/或經由內側空間200侵入配線孔192B及配線孔116B。因為該構成可保護配線L避免鍍覆液侵入,所以可省略密閉配線孔192及配線孔116之密封構件。 As described above with reference to the eighth figure to the eighth C figure, the
此外,本實施形態將基板固持器11配置於鍍覆槽10時,係以第一本體部111A及第一配線收容部150A之連結部、以及第二本體部111B及第二配線收容部150B之連結部比鍍覆液面S位於上方的方式,來配置各連結部之位置(第八A圖至第八C圖)。換言之,係以鍍覆液面S比基板W之保持位置上方,且比第一本體部111A及第一配線收容部150A之連結部、以及第二本體部111B及第二配線收容部150B之連結部下方的方式構成基板固持器11。因此,藉由第一本體部111A及第一配線收容部150A之連結部、以及第二本體部111B及第二配線收容部150B之連結部中的傘構造、與連結部離開鍍覆液之配置,可更有效抑制或防止鍍覆液侵入配線孔192及配線孔116。因為該構成可保護配線L避免鍍覆液侵入,所以可省略密閉配線孔192及配線孔116之密封構件。 In addition, in this embodiment, when the
此外,本實施形態將基板固持器11配置於鍍覆槽10時,係以第一及第二配線收容部150A、150B比鍍覆液面S位於上方之方式,來配置第一及第二配線收容部150A、150B。由於該構成係接近本體部111兩側並在比配置槳葉之空間上方配置第一及第二配線收容部150A、150B,因此第一及第二配線收容部150A、150B之厚度方向的尺寸不易受到限制。 In addition, in this embodiment, when the
第九A圖係從第一保持構件之內側面側觀看的前視圖。第九B圖係從第一保持構件之內側面側觀看的部分放大前視圖。第九C圖係與第一保持構件一起顯示第二保持構件之在第九B圖的C-C剖面圖。 Figure 9 A is a front view viewed from the inside side of the first retaining member. Figure 9B is a partially enlarged front view viewed from the inner side of the first holding member. The ninth figure C shows the C-C sectional view of the ninth B figure of the second retaining member together with the first retaining member.
第九A圖、第九B圖係以第一保持構件110A為例作說明。另外,第二保持構件110B除了不具外側密封這一點之外,亦適用同樣之說明。如第九A圖所示,第一保持構件110A在第一開口部112A之周圍具有複數個基板接點117A。本實施形態係例示設置18個基板接點117A的情況,不過可依基板W之尺寸、鍍 覆電流之大小等設置任意數量的基板接點。各基板接點117A藉由各條配線L而連接於外部連接部161A(第三A圖)。 The ninth figure A and the ninth figure B are illustrated by taking the first holding
如第九B圖所示,第一本體部111A在第一本體1110A之內側面具備:內側密封120A、用於安裝內側密封120A之密封固持器118A、外側密封121A、用於安裝外側密封121A之密封固持器119A。在密封固持器118A與密封固持器119A之間形成有供配線L通過的配線路徑127A。各基板接點117A在內側密封120A之外側藉由螺絲122A而固定於密封固持器118A。密封固持器118A在將內側密封120A夾在與第一本體1110A之間的狀態下固定於第一本體1110A(第九C圖)。本實施形態之密封固持器118A係藉由螺絲123A而固定於第一本體1110A(第九B圖)。配置螺絲123A之部分在基板接點117A上設有孔,並以螺絲123A不接觸於基板接點117A的方式構成。密封固持器119A在將外側密封121A夾在與第一本體1110A之間的狀態下固定於第一本體1110A(第九C圖)。本實施形態之密封固持器119A係藉由螺絲124A而固定於第一本體1110A(第九B圖)。 As shown in FIG. 9B, the
各配線L延伸至對應之基板接點117A附近,除去前端側之被覆而露出導電線125(第九B圖)。配線L之導電線125被導入設於密封固持器118A之溝126A(第九C圖)中,配線L之導電線125及基板接點117A藉由螺絲122A(第九B圖)而對密封固持器118A緊固。藉此,配線L與對應之基板接點117A電性連接。另外,第九C圖係顯示在第二保持構件110B之第二本體部111B中,配線L之導電線125及基板接點117B藉由螺絲122B而對密封固持器118A緊固的部分。第二本體部111B如第九C圖所示,除了不具外側密封及其密封固持器這一點之外,具有與第一本體部111A同樣之構成。其他實施形態亦可在第二本體部111B中設置外側密封。 Each wiring L extends to the vicinity of the corresponding
如第九C圖所示,藉由內側密封120來密封基板W之被鍍覆區域(第一及第二開口部112A、112B側)、與第一及第二本體部111A、111B的內周側端部之間。此外,藉由第一保持構件110A之外側密封121A密合於第二保持構件110B之第二本體部111B的內側面,而將第一及第二本體部111A、111B之間在外周側密閉。結果,第一及第二本體部111A、111B之間的內部空間藉由內側密封120A、B及外側密封121A而密閉,保護基板接點117、纜線L避免鍍覆液侵入。 As shown in FIG. 9C, the area to be plated (on the side of the first and
第十圖係顯示固定基板接點之螺絲配置的第一及第二本體部之剖面圖。第十一圖係顯示固定用於安裝內側密封之密封固持器的螺絲之配置的第一及第二本體部之剖面圖。如第十圖所示,固定基板接點117A之螺絲122A、與固定基板接點117B之螺絲122B在第一保持構件110A與第二保持構件110B嚙合狀態下彼此不重疊而配置。避免第一保持構件110A之螺絲122A與第二保持構件110B的螺絲122B之間干擾,可使第一保持構件110A與第二保持構件110B之間更接近。此外,如第十一圖所示,固定密封固持器118A之螺絲123A與固定密封固持器118B的螺絲123B,在第一保持構件110A與第二保持構件110B嚙合狀態下,彼此不重疊而配置。避免第一保持構件110A之螺絲123A與第二保持構件110B的螺絲123B之間干擾,可使第一保持構件110A與第二保持構件110B之間更接近。結果,避免第一保持構件110A之螺絲122A、123A與第二保持構件110B的螺絲122B、123B之間的干擾,可使第一保持構件110A與第二保持構件110B之間更接近。 Figure 10 is a cross-sectional view of the first and second body parts showing the arrangement of screws for fixing the contacts of the substrate. Figure 11 is a cross-sectional view of the first and second body portions showing the arrangement of the screws securing the seal holder for installing the inner seal. As shown in FIG. 10 , the
第十二A圖係卸下外部連接部護蓋狀態之外部連接部的放大立體圖。此處係以第一保持構件110A之第一外部連接部161A為例作說明,不過第二保持構件110B之第二外部連接部161B亦具有同樣之構成。第一外部連接部161A 具有對應於第一保持構件110A之基板接點117A數量之數量的個別各外部連接接點168。本實施形態係將18個基板接點117A各9個配置兩列。以下之說明,係在第十二A圖中,以紙面近端對應於基板固持器的內側,以紙面遠端對應於基板固持器的外側。第一外部連接部161A中,在複數個基板接點117A的內側設有匯流條167。各外部連接接點168藉由個別之配線L而連接於對應之基板接點117A,且彼此電性絕緣。確認通電時,如第十二D圖所示,確認通電裝置169之各接點230分別抵接於個別的外部連接接點168而電性連接。另外,鍍覆處理時,如後述,各外部連接接點168彼此電性短路而供給相同電位(第十二E圖)。其他實施形態亦可在1個外部連接接點168上連接2條以上配線L,並將此等2條以上之配線的另一端分別連接於不同的基板接點117A。此外,亦可將複數個外部連接接點168連接於複數條配線L,再將此等配線L連接於1個基板接點。 Figure 12A is an enlarged perspective view of the external connection part with the external connection part cover removed. Here, the first
第十二B圖係第一保持構件中之電流路徑的說明圖。第十二C圖係第二保持構件中之電流路徑的說明圖。第一保持構件110A係從第一外部連接部161A之各外部連接接點168按照箭頭顯示的路徑供給電流至各基板接點117A(第十二B圖)。第二保持構件110B係從第二外部連接部161B之各外部連接接點168按照箭頭顯示的路徑供給電流至各基板接點117B(第十二C圖)。第一保持構件110A及第二保持構件110B之各外部連接接點168、基板接點117A、117B中,在鍍覆處理時供給共用之電位,在確認通電時,則對部分或全部外部連接接點168供給不同電位。 Figure 12B is an explanatory view of the current path in the first holding member. Figure 12C is an explanatory view of the current path in the second holding member. The
第十二D圖係顯示確認通電時外部連接部之各接點的連接模式圖。確認通電處理在基板放置部170B(第一圖)中係在基板固持器11夾著基板W之狀態下執行。基板放置部170B中配置有確認通電裝置169之端子230。本實施 形態之外部連接部161A具有兩列排列9個外部連接接點168之列(第十二A圖)。確認通電處理係在外部連接部161A之各外部連接接點168不接觸於匯流條167的狀態,且接觸於確認通電裝置169之端子230的狀態下執行(第十二D圖)。確認通電裝置169之各端子230可對對應之外部連接接點168供給個別的電位,且可測定任意2個外部連接接點168之間的電流。此外,還可將複數個外部連接接點168作為一群,各群測定外部連接接點168間之電流。 The twelfth figure D is a diagram showing the connection mode of each contact point of the external connection part when the power is confirmed. It is confirmed that the energization process is performed in a state where the substrate W is sandwiched between the
例如,第十二A圖所示,將彼此相對之各列有3個的接點作為一群,分成3個群I、II、III執行確認通電處理。一個例子係在連接於群I之近端列的3個外部連接接點168之端子230、與連接於遠端列之3個外部連接接點168的端子230之間施加電位差來測定電流。其次,在連接於群II之近端列的3個外部連接接點168之端子230、與連接於遠端列之3個外部連接接點168的端子230之間施加電位差來測定電流。其次,在連接於群III之近端列的3個外部連接接點168之端子230、與連接於遠端列之3個外部連接接點168的端子230之間施加電位差來測定電流。 For example, as shown in FIG. 12A, three contacts in each row facing each other are regarded as a group, and are divided into three groups I, II, and III to perform the confirmation energization process. One example is to measure the current by applying a potential difference between the
電流,例如近端之端子230為高電位,遠端之端子230為低電位時,群I係以近端之端子230、群I近端列之3個外部連接接點168、連接於此等3個接點之配線L、連接於此等配線L之基板接點117A、基板W之第一面(表面)的種層、連接於遠端之端子230的基板接點117A、配線L、遠端之3個外部連接接點168、及端子230的路徑而流動。同樣地,測定在其他2個群II、III之第一側及第二側的外部連接接點168間流動之電流。結果,電流之測定值在指定範圍內時,判定為外部連接部161A之外部連接接點168、配線L、基板接點117、基板W皆正常,並將基板固持器11搬送至處理部173C(第一圖)實施鍍覆處理。另外,電流之測定值超出指定範圍外時,表示外部連接部161A之外部連接接點168、配線L、基板 接點117或基板W有異常,而從基板固持器11取出基板W,並將基板固持器11送回固持器存儲部170D(第一圖)。 For example, when the near-
另外,各群包含之外部連接接點數不拘,群間外部連接接點數亦可不同。此外,亦可在近端或遠端的各外部連接接點168之間施加電位差來測定電流。此外,亦可各群中包含之外部連接接點數為2個,各2個外部連接接點168測定電流。藉由各群測定外部連接接點168間之電流,容易找出異常部位。 In addition, the number of external connection points included in each group is not limited, and the number of external connection points may be different between groups. In addition, the current can also be measured by applying a potential difference between the external connection points 168 at the proximal end or the distal end. In addition, the number of external connection contacts included in each group may be two, and each of the two
第二保持構件110B之第二外部連接部161B中亦設置同樣的確認通電裝置169,且對基板W之第二面(背面)執行同樣的確認通電處理。 The same confirmation energization device 169 is also provided in the second
第十二E圖係顯示鍍覆處理時外部連接部之各接點的連接模式圖。基板固持器11在鍍覆槽10之支臂收容部250中收容支臂部160而保持。支臂收容部250在鍍覆槽之兩脇分別各配置1個,藉由以支臂收容部250支撐支臂部160之兩端,可懸掛基板固持器11。支臂收容部250中配置有電流供給部240,電流供給部240上設置外部連接部161A、161B。此時,藉由第一及第二外部連接部161A、161B之本身重量或是追加的致動器等,各外部連接接點168按壓於電流供給部240,並以接觸於匯流條167之方式變形。結果,全部外部連接接點168藉由電流供給部240及匯流條167而電性短路。在該狀態下,從外部電源37(第十五圖)供給電位至電流供給部240時,全部接點168係供給相同電位。鍍覆處理時,電流在從外部電源37通過陽極31A(31B)、鍍覆液、基板W之表面(背面)的種層、基板接點117A(117B)、配線L、第一及第二外部連接部161A(161B)之各外部連接接點168,而返回外部電源37的路徑上流動。為了使外部連接接點168間之短路更確實而設置匯流條167。另外,第一外部連接部161A接觸之電流供給部240、與第二外部連接部161B接觸的電流供給部240中亦可流入不同之電流。 Figure 12E is a diagram showing the connection mode of each contact point of the external connection part during the plating process. The
第十三A圖係說明將基板放置部中之基板設置於基板固持器的模式圖。第十三A圖包含第一保持構件110A與第二保持構件110B而模式顯示各構成。基板放置部170B(第一圖)中配置有基板裝卸裝置1000。基板裝卸裝置1000具備:旋轉裝置1100、及工作站1200。旋轉裝置1100在將基板固持器11之第二保持構件110B保持在概略水平姿勢的狀態下,進行基板W對第二保持構件110B的裝卸或搭載,並在將第二保持構件110B在概略垂直方向豎立狀態下,在保持於工作站1200之第一保持構件110A與第二保持構件110B之間夾著基板W。藉此,可將基板W對基板固持器11裝卸。工作站1200例如亦可由懸掛基板固持器11之靜止站、與將保持於靜止站之基板固持器11朝向旋轉裝置1100側而支撐的支撐裝置構成。前述之確認通電裝置例如可設於放置工作站1200之基板固持器11的支臂部160之第一及第二外部連接部161A、161B的部分。 FIG. 13A is a schematic diagram illustrating setting the substrate in the substrate placing part on the substrate holder. Fig. 13A includes the first holding
安裝基板前之基板固持器11被分離成第一保持構件110A與第二保持構件110B,第一保持構件110A以豎立狀態配置於工作站1200,第二保持構件110B以概略水平狀態配置於旋轉裝置1100的載台上。在該狀態下,保持於搬送裝置122之機器人手臂的基板W設置於旋轉裝置1100上之第二保持構件110B上。然後,旋轉裝置1100之載台旋轉,使第二保持構件110B移動成概略垂直狀態,在該狀態下將第二保持構件110B對第一保持構件按壓,而嚙合(固定)第一保持構件110A與第二保持構件110B,並藉由第一保持構件110A與第二保持構件110B保持基板W。在該狀態下執行前述之確認通電處理。確認通電處理結果良好時,保持基板W之基板固持器11藉由傳輸機141搬送至處理部170C(第一圖)進行鍍覆處理。確認通電處理結果不良時,從基板固持器11取出基板W,並將基板固持器11送回固持器存儲部170D(第一圖)。 The
從基板固持器11卸下基板W時,在工作站1200中,藉由旋轉裝置1100將第二保持構件110B與基板W一起從第一保持構件110A卸下。然後如第十三A圖所示,使第二保持構件110B轉動成概略水平姿勢,搬送裝置122之機器人手臂搬出基板W。 When unloading the substrate W from the
此處,係說明使第一保持構件110A及第二保持構件110B在豎立狀態下嚙合之情況,不過,亦可使第一保持構件110A及第二保持構件110B在水平狀態嚙合。 Here, the case where the first holding
第十三B圖顯示基板固持器的固定方法之一例。第一保持構件110A與第二保持構件110B可以任意之固定方法固定。例如第十三B圖所示,第一保持構件110A與第二保持構件110B可以螺栓等旋緊機構固定。本例係在第一保持構件110A之第一本體1110A中設置螺絲孔195,並在第二保持構件110B之第二本體1110B中設置貫穿孔194,而藉由螺栓193旋緊第一保持構件110A與第二保持構件110B。另外,本例係對應於貫穿孔194而設置鍃孔194a,並將螺栓193頭部配置於鍃孔194a內。藉此,可減少基板固持器11之厚度。第一保持構件110A與第二保持構件110B適切在複數處藉由螺栓193固定而構成。此外,亦可在第一保持構件110A及第二保持構件110B之一方設置夾具,而將第一保持構件110A與第二保持構件110B彼此固定。採用任何固定方法時,仍可在基板裝卸裝置1000中設置致動器等,而採用自動固定的方法。 FIG. 13B shows an example of a method for fixing a substrate holder. The
第十四A圖係第一保持構件之定位部附近的放大立體圖。第十四B圖係第二保持構件之定位部的放大立體圖。第一保持構件110A在第一本體部111A之第一本體1110A中具有作為定位部的突起部(定位銷)210A。第二保持構件110B在第二本體部111B之第二本體1110B中具有貫穿孔210B作為定位部。突 起部210A以螺栓等旋緊構件固定於第一本體1110A。突起部210A亦可以其他固定手段來固定於第一本體1110A,亦可與第一本體1110A一體形成。突起部210A及貫穿孔210B分別在第一本體部111A及第二本體部111B中設置複數個,第一保持構件110A及第二保持構件110B嚙合時,各貫穿孔210B中可插入、嵌合各突起部210A。藉此,進行第一保持構件110A與第二保持構件110B之間的定位。另外,亦可將貫穿孔210B設於第一保持構件110A,而將突起部210A設於第二保持構件110B。 Figure 14A is an enlarged perspective view near the positioning portion of the first holding member. Figure 14B is an enlarged perspective view of the positioning portion of the second holding member. The
第十五圖係概略顯示鍍覆槽10之構成的側視圖。鍍覆處理中,第一陽極固持器30A與基板W之第一面(表面)相對而配置,第二陽極固持器30B與基板W之第二面(背面)相對而配置。第一陽極固持器30A具有用於調節第一陽極31A與基板W間之電場的陽極遮罩(無圖示)。陽極遮罩例如係由電介質材料構成之概略板狀構件,且配置於第一陽極固持器30A與基板固持器11相對側之面。陽極遮罩在概略中央部具有在第一陽極31A與基板W之間流入的電流通過之開口,開口徑或邊長宜比第一陽極31A直徑或邊長小。此外,陽極遮罩亦可構成可調節開口徑或邊長。例如在開口設置複數個節流葉片,藉由與相機之光圈機構同樣的構造,可使開口徑或邊長擴大或縮小。第二陽極固持器30B之構成亦與第一陽極固持器30A同樣。 Fig. 15 is a side view schematically showing the composition of the
在第一陽極固持器30A與基板固持器11之間設有第一中間遮罩36A。此外,在第二陽極固持器30B與基板固持器11之間設有第二中間遮罩36B。此等第一及第二中間遮罩36A、36B係藉由與第一及第二陽極遮罩32A、32B類似之構造,調整設於第一及第二中間遮罩36A、36B之開口徑或邊長,用於調節第一及第二陽極31A、31B與基板W間之電場者。一個實施形態亦可構成對第一中 間遮罩36A及第二中間遮罩36B分別連結移動機構,可變更基板W與第一中間遮罩36A間之距離、及基板W與第二中間遮罩36B間之距離。另外,採用不溶性陽極時,由於需要在鍍覆液中持續補充鍍覆金屬,因此,亦可在後述之循環機構中設置鍍覆金屬之補充機構。 A first
在第一陽極固持器30A與基板固持器11之間設有用於攪拌在基板W之第一面附近的鍍覆液之第一槳葉35A。此外,在第二陽極固持器30B與基板固持器11之間設有用於攪拌在基板W之被鍍覆面附近的鍍覆液之第二槳葉35B。此等槳葉35A、35B例如可為概略棒狀之構件,並可朝向鉛直方向而設於鍍覆處理槽內。槳葉35A、35B係構成可藉由無圖示之驅動裝置而沿著基板W的被鍍覆面水平移動。此外,槳葉35A、35B亦可係在板狀構件中設置複數個縱方向之縫隙者。 A
第一陽極31A經由第一陽極固持器30A內之配線而連接於外部電源37。此外,如前述,露出基板固持器11之基板W的第一面(表面)之第一保持構件110A的第一外部連接部161A連接於外部電源37。在第一陽極31A與基板固持器11的第一外部連接部161A之間從外部電源37供給電壓時,係以從外部電源37通過第一陽極31A、鍍覆液、基板固持器11之基板W的第一面之種層、第一外部連接部161A(第一保持構件110A)而返回外部電源37的路徑流入鍍覆電流。經由第二陽極31B、第二陽極固持器30B內之配線而連接於外部電源37。此外,如前述,露出基板固持器11之基板W的第二面(表面)之第二保持構件110B的第二外部連接部161B連接於外部電源37。在第二陽極31B與基板固持器11的第二外部連接部161B之間從外部電源37供給電壓時,係以從外部電源37通過第二陽極 31B、鍍覆液、基板固持器11之基板W的第二面之種層、第二外部連接部161B(第二保持構件110B)而返回外部電源37的路徑流入鍍覆電流。 The
採用第十五圖所示之實施形態的鍍覆裝置具備使鍍覆液在鍍覆槽10與外槽16之間循環的循環機構300。循環機構300具備連接收容從鍍覆槽10溢出之鍍覆液的外槽16、及鍍覆槽10的循環管線302。循環管線302中設有閥門304,可進行循環管線302之開閉。閥門304例如可為電磁閥,亦可藉由控制部103(參照第一圖)來控制循環管線302之開閉。循環管線302中設有泵浦306,藉由泵浦306可使鍍覆液通過循環管線302從外槽16向鍍覆槽10循環。循環管線302中設有溫度控制裝置308,可控制通過循環管線302之鍍覆液的溫度。例如,亦可在鍍覆槽10中設置無圖示之溫度計,依該溫度計所測定之鍍覆液溫度,藉由控制部103控制溫度控制裝置308。循環管線302中設有過濾器310,可清除通過循環管線302之鍍覆液的固態物質。 The plating apparatus according to the embodiment shown in FIG. 15 includes a
本實施形態係第一保持構件110A及第二保持構件110B分別設有彼此獨立之第一外部連接部161A及第二外部連接部161B。藉此,可將第一外部連接部161A、配線L、由基板接點117A構成之基板W的第一面用之電流路徑;與第二外部連接部161B、配線L、由基板接點117B構成之基板W的第二面用之電流路徑,分別分配於第一及第二保持構件110A、110B。結果,可抑制基板固持器之厚度增大,而且可確保設置對基板之第一面及第二面供給電流路徑的空間。這在因基板尺寸造成配線數量增大時、或是因電流大小造成配線直徑增大時等有效。此外,由於兩面鍍覆基板與單面鍍覆基板比較,通常為兩倍的配線數,因此特別有效。此外,因為可對基板之第一面及第二面獨立供給電流,所以可獨立控制各面之鍍覆厚度等的鍍覆規格。 In this embodiment, the first holding
另外,上述係說明兩面鍍覆用之基板固持器,不過,即使在單面鍍覆用之基板固持器中,亦可在第一保持構件及第二保持構件中分別設置彼此獨立之第一外部連接部及第二外部連接部。設置連接分別設於第一保持構件及第二保持構件之電流路徑的連接路徑時,可從第一及第二保持構件的第一及第二外部連接部兩者,在被鍍覆面供給電流。此時,可將基板之第一面用的電流路徑分配於第一及第二保持構件,以確保設置電流供給路徑的空間。即使在單面鍍覆用之基板固持器中,因基板尺寸、電流大小等造成配線數量、配線直徑增大時仍然有效。 In addition, the above describes the substrate holder for double-side plating, but even in the substrate holder for single-side plating, it is also possible to set the first outer parts independent of each other in the first holding member and the second holding member. The connection part and the second external connection part. When a connection path is provided to connect the current paths respectively provided in the first holding member and the second holding member, current can be supplied to the surface to be plated from both the first and second external connection portions of the first and second holding members. At this time, the current path for the first surface of the substrate can be allocated to the first and second holding members to secure a space for setting the current supply path. Even in substrate holders for single-sided plating, it is still effective when the number of wires and the diameter of wires increase due to the size of the substrate, the magnitude of the current, etc.
(其他實施形態) (Other implementation forms)
第十七圖係從其他實施形態之基板固持器的第一側觀看之立體圖。第十八圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。第十九圖係基板固持器之第一保持構件及第二保持構件的分解立體圖。 Fig. 17 is a perspective view viewed from the first side of the substrate holder of another embodiment. Figure 18 is a perspective view of the first holding member and the second holding member in the open state of the substrate holder viewed from the first side. Figure 19 is an exploded perspective view of the first holding member and the second holding member of the substrate holder.
由於其他實施形態之基板固持器11具有與第二A圖等中前述之基板固持器11概略同樣的構成,因此對同樣之構成註記相同符號,而省略詳細之說明。本實施形態係取代纜線構成之配線L,而藉由具有更大剖面積之導電路徑部410、420(參照第二十圖),連接複數個基板接點117與外部連接接點161A、161B。藉此,可省略配線收容部150(第一配線收容部150A、第二配線收容部150B)以謀求基板固持器之小型化及降低成本。另外,適用於單面鍍覆用之基板固持器情況下,亦可在第一保持構件或第二保持構件之一方設置導電路徑部。 Since the
如第十七圖、第十八圖所示,基板固持器11具備:本體部111、左右之安裝部180、中央之安裝部181、支臂部160。基板固持器11分割成具有第一 開口部112A之第一保持構件110A;與具有第二開口部112B之第二保持構件110B。第一保持構件110A具備:第一本體部111A、左右之安裝部180A、中央之安裝部181A、第一支臂部160A(第十八圖、第十九圖)。第二保持構件110B具備:第二本體部111B、左右之安裝部180B、中央之安裝部181B、第二支臂部160B(第十八圖、第十九圖)。 As shown in FIG. 17 and FIG. 18 , the
第一本體部111A藉由左右之安裝部180A與左右之安裝部180A間的中央之安裝部181A,而安裝於第一支臂部160A。左右之安裝部180A、中央之安裝部181A分別以螺栓等旋緊機構固定於第一本體部111A與第一支臂部160A,藉此,將第一本體部111A固定於第一支臂部160A。 The
第一支臂部160A具備細長板狀構件或棒狀構件。第一支臂部160A具有:外部連接部161A;及用於保護外部連接部161A及導電路徑部410之外部連接部護蓋162A。此外,第一支臂部160A與前述同樣地在其兩端部具有用於將基板固持器11在基板放置部170B及鍍覆槽10中進行定位之定位部163R、163L。 The
第二保持構件110B具備:第二本體部111B、左右之安裝部180B、中央之安裝部181B、第二支臂部160B(第十八圖、第十九圖)。由於第二本體部111B及安裝部180B、181B之構成與第一本體部111A及安裝部180A、181A之構成同樣,因此省略詳細之說明,並在同樣之構造上註記以相同編號及英文字母B顯示的符號。 The
第二支臂部160B具備細長板狀構件或棒狀構件。第二支臂部160B具有:外部連接部161B;及用於保護外部連接部161B及導電路徑部420之外部連接部護蓋162B。與前述實施形態同樣地,嚙合第一支臂部160A及第二支臂部 160B時,第一及第二支臂部160A、160B之第一及第二外部連接部161A、161B係以彼此不致干擾之方式配置於基板固持器11的左右方向之相反側。 The
第二十圖係其他實施形態之導電路徑部的立體圖。第二十一圖係第一保持構件及第二保持構件從基板保持面側觀看之箭視圖。第二十圖中,符號410表示配置於第一保持構件110A之導電路徑部,符號420表示配置於第二保持構件110B之導電路徑部。另外,此處係說明導電路徑部410(導電路徑部420)具備左側導電路徑構件410L(420L)及右側導電路徑構件410R(420R)兩個系統的情況,不過,導電路徑部410亦可為一體或由複數個路徑片構成之1個系統的導電路徑構件。 Fig. 20 is a perspective view of a conductive path portion in another embodiment. Figure 21 is an arrow view of the first holding member and the second holding member viewed from the side of the substrate holding surface. In FIG. 20,
各導電路徑部410、420由銅(例如無氧銅)等電阻值小之材料構成。本實施形態如第二十圖所示,係由板狀構件形成。藉由將各導電路徑部410、420形成板狀,可抑制基板固持器之厚度增大。另外,亦可將各導電路徑部410、420形成棒狀,如此沿著路徑加工容易。此外,各導電路徑部410、420除了接點、與其他配線等的導通部分之外,亦可以具有耐藥劑性之樹脂(例如PFA)塗布。 Each
由於導電路徑部410與導電路徑部420具有類似之構成,因此,以下以導電路徑部410為例作說明。 Since the
導電路徑部410具備左側導電路徑構件410L、與右側導電路徑構件410R。左側導電路徑構件410L與右側導電路徑構件410R在第一保持構件110A內彼此分離而電性絕緣。另外,其他實施例亦可左側導電路徑構件410L與右側導電路徑構件410R在第一保持構件110A內彼此短路,亦可形成一體之構件。 The
左側導電路徑構件410L及右側導電路徑構件410R分別具有連接複數個路徑片(此處為5個路徑片)之構成。另外,左側導電路徑構件410L及右 側導電路徑構件410R亦可分別一體形成,亦可為連接5個以下路徑片的構成,或是,亦可為連接6個以上路徑片的構成。 The left
左側導電路徑構件410L具備:第一路徑片411L、第二路徑片412L、第三路徑片413L、第四路徑片414L、及第五路徑片415L,並藉由連接此等而構成。右側導電路徑構件410R具備:第一路徑片411R、第二路徑片412R、第三路徑片413R、第四路徑片414R、及第五路徑片415R,並藉由連接此等而構成。 The left
左側導電路徑構件410L之第一路徑片411L、第二路徑片412L與右側導電路徑構件410R之第一路徑片411R、第二路徑片412R彼此在分離狀態下平行延伸。左側導電路徑構件410L之第三路徑片413L、第四路徑片414L、及第五路徑片415L配置於第一本體部111A之左側一半部分(第二十一圖)。右側導電路徑構件410R之第三路徑片413R、第四路徑片414R、及第五路徑片415R配置於第一本體部111A之右側一半部分(第二十一圖)。右側導電路徑構件410R之第五路徑片415R如第二十一圖所示,與左側導電路徑構件410L的第五路徑片415L之間保留間隙而彼此分離。如此,藉由以右側導電路徑構件410R與左側導電路徑構件410L分割導電路徑構件而形成,以基板放置部170B(第一圖)在基板固持器11上保持基板時,在右側導電路徑構件410R與左側導電路徑構件410L之間施加電位差,係以左側導電路徑構件410L→基板(種層)→右側導電路徑構件410R(或是顛倒)的路徑流入電流,可進行電阻值有異常時判斷為基板固持器11或基板有異常的通電試驗。 The
第一路徑片411L係以從外部連接部161A延伸至中央之安裝部181A的連接部之方式配置於第十八圖中的第一支臂部160A之本體內。第十九圖係顯示第一路徑片411L之一端露出於設於第一支臂部160A之安裝凹部1600內的 狀態。第一路徑片411L之另一端在外部連接部161A中連接於外部連接接點440L(第二十四圖)。 The
第二路徑片412L如第十九圖所示,係以延伸於中央之安裝部181A內部的方式配置於安裝部181A。第二路徑片412L之第一支臂部160A側的一端在安裝部181A之一端部露出(與第十九圖之第二路徑片412R同樣),安裝部181A之一端部與第一支臂部160A之安裝凹部1600嵌合時,與配置於第一支臂部160A內之第一路徑片411L的一端接觸,而與第一路徑片411L電性連接。安裝部181A對第一支臂部160A以螺栓等旋緊構件固定時,第一路徑片411L與第二路徑片412L亦一起以螺栓止動而彼此固定。第二路徑片412L之另一端從安裝部181A之另一端部突出,將安裝部181A安裝於第一本體部111A時,插入設於第一本體1110A之開口,並連接於第三路徑片413L之一端(第二十一圖)。第二路徑片412L與第三路徑片413L亦以螺絲、螺栓等旋緊構件彼此固定(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。 As shown in FIG. 19, the
第三路徑片413L、第四路徑片414L、及第五路徑片415L如第二十一圖所示,在第一本體部111A之第一本體1110A的基板保持面側配置於左邊一半部分。第三路徑片413L在靠近第一支臂部160A之側沿著第一開口部112A的上邊而設。第三路徑片413L之一端在第一保持構件110A之中央部附近對第二路徑片412L的另一端連接。第三路徑片413L之另一端在第一開口部112A之上部角部附近,以螺絲416連接於第四路徑片414L的一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第四路徑片414L從第一支臂部160A之近端朝向遠端,沿著第一開口部112A之左邊設置。第四路徑片414L之另一端在第一開口部112A之下部角部附近,以螺絲等旋緊構件連接於第五路 徑片415L之一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第五路徑片415L在從第一支臂部160A之遠端沿著第一開口部112A的下邊設置。第五路徑片415L之另一端在第一保持構件110A之中央部附近,與第五路徑片415R分離狀態下成為終端。 The
右側導電路徑構件410R之各路徑片411R~415R與左側導電路徑構件410L之各路徑片411L~415L概略同樣地配置。但是,右側導電路徑構件410R之第三路徑片413R、第四路徑片414R、及第五路徑片415R在第一本體1110A中,與左側導電路徑構件410L之第三路徑片413L、第四路徑片414L、及第五路徑片415L,係對第一開口部112A配置於相反側(右側一半部分)。 The
第一路徑片411R係以從外部連接部161A延伸至與中央之安裝部181A的連結部之方式配置於第十八圖中之第一支臂部160A的本體內。第十九圖係顯示第一路徑片411R之一端露出於設於第一支臂部160A之安裝凹部1600內的狀態。第一路徑片411R之另一端在外部連接部161A中連接於外部連接接點440R(第二十四圖)。 The
第二路徑片412R如第十九圖所示,以延伸於中央之安裝部181A的內部之方式配置於安裝部181A。第二路徑片412R之第一支臂部160A側的一端在安裝部181A之一端部露出(與第十九圖之第二路徑片412L同樣),將安裝部181A之一端部嵌合於第一支臂部160A的安裝凹部1600時,與配置於第一支臂部160A內之第一路徑片411R的一端接觸,而與第一路徑片411R電性連接。安裝部181A對第一支臂部160A以螺栓等旋緊構件固定時,第一路徑片411R與第二路徑片412R亦一起以螺栓止動而彼此固定。第二路徑片412R之另一端從安裝部181A之另一端部突出,將安裝部181A安裝於第一本體部111A時,插入設於第一本體 1110A之開口,而與第三路徑片413R之一端連接(第二十一圖)。第二路徑片412R與第三路徑片413R亦以螺絲、螺栓等旋緊構件彼此固定(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。 As shown in FIG. 19, the
第三路徑片413R、第四路徑片414R、及第五路徑片415R如第二十一圖所示,在第一本體部111A之第一本體1110A的基板保持面側配置於右邊一半部分。第三路徑片413R在靠近第一支臂部160A之側沿著第一開口部112A的上邊設置。第三路徑片413R之一端在第一保持構件110A之中央部附近,對第二路徑片412R之另一端連接。第三路徑片413R之另一端在第一開口部112A之上部角部附近以螺絲416連接於第四路徑片414R的一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第四路徑片414R從第一支臂部160A之近端朝向遠端沿著第一開口部112A的右邊設置。第四路徑片414R之另一端在第一開口部112A之下部角部附近,以螺絲等旋緊構件連接於第五路徑片415R之一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第五路徑片415R在從第一支臂部160A之遠端沿著第一開口部112A的下邊設置。第五路徑片415R之另一端在第一保持構件110A之中央部附近,與第五路徑片415L分離狀態下成為終端。 The
如上述,第一路徑片411L、R插入第一支臂部160A內,第二路徑片412L、R插入安裝部181A內,第三至第五路徑片413L、R、414L、R、415L、R插入第一本體部111A後,將第一支臂部160A、安裝部181A、第一本體部111A相互組合。因而可輕易進行各導電路徑構件之形成。 As mentioned above, the
因為導電路徑部420之構成與導電路徑部410概略同樣,所以將關於導電路徑部410之符號410、411替換成420、421來表示對應的構成,而省略詳 細之說明。左側導電路徑構件420L及右側導電路徑構件420R之各路徑片在第二保持構件110B內,從外部連接部161B包含第二本體部111B之第二本體1110B,而與導電路徑部410之左側導電路徑構件410L及右側導電路徑構件410R的各路徑片同樣配置(參照第十九圖、第二十一圖、第二十二A圖、第二十二B圖、第二十四圖、第二十五圖)。 Since the configuration of the
第二十二A圖係基板固持器之基板接點附近的放大圖。第二十二B圖係在卸下一部分基板接點狀態下顯示基板固持器之基板接點附近的放大圖者。第二十三圖係與第一保持構件一起顯示第二保持構件之在第二十二B圖的C-C剖面圖。 Figure 22A is an enlarged view of the vicinity of the substrate contacts of the substrate holder. Figure 22B is an enlarged view showing the vicinity of the substrate contact of the substrate holder in a state where a part of the substrate contact is removed. Figure 23 is a cross-sectional view along line C-C of Figure 22B showing the second retaining member together with the first retaining member.
如第二十三圖所示,導電路徑部410及導電路徑部420配置於被內側密封120A、120B與外側密封121A所密閉的空間內。用於固定內側密封120A之密封固持器118A藉由螺絲123而固定於第一本體1110A(第二十二A圖)。 As shown in FIG. 23, the
如第二十二A圖及第二十二B圖所示,導電路徑部410之各路徑片413R、414R係在重疊各端部之狀態下藉由螺絲416而固定於第一本體1110A,其他部分則藉由螺絲417而固定於第一本體1110A。螺絲417沿著各路徑片之長度方向均等配置,並將各路徑片沿著長度方向均等地按壓。換言之,藉由卸下螺絲416、417可個別地更換各路徑片。例如基板固持器11中發生處理液洩漏時,依基板固持器11在處理槽內之姿勢,存在容易受到處理液影響之部分。以豎立姿勢將基板固持器配置於鍍覆槽情況下,發生處理液洩漏時,處理液容易蓄積在基板固持器之最下部附近。因而,當處理液發生洩漏,僅基板固持器最下部附近之路徑片接觸到處理液時,無須更換整個導電路徑部410、420(或是各導電路徑構件 410L、410R、420L、420R),可僅更換接觸到處理液之路徑片。與更換整個基板固持器、或是整個導電路徑部(或各導電路徑構件)時比較,可減少費用。 As shown in Figure 22A and Figure 22B, each
導電路徑部410之右側導電路徑構件410R上藉由螺絲122A連接有複數個基板接點117A。換言之,藉由卸下螺絲122A,可從導電路徑部410個別地更換各基板接點117A。藉由更換一部分基板接點,可繼續使用基板固持器,可減少基板固持器之維修及更換所需的費用。例如,發生處理液洩漏時,依基板固持器11在處理槽內之姿勢,藉由僅更換容易接觸到處理液之基板接點(例如,上述基板固持器的最下部之例)等的一部分基板接點,與更換整個基板固持器11或整個基板接點時比較,可減少費用。 A plurality of
此處,係說明導電路徑部410之右側導電路徑構件410R,不過,導電路徑部410之左側導電路徑構件410L、導電路徑部420之右側導電路徑構件420R、左側導電路徑構件420L亦同樣地配置。 Here, the right
第二十四圖係在卸下外部連接部護蓋狀態之外部連接部的放大立體圖。第二十五圖係外部連接部之剖面圖。導電路徑部410之右側導電路徑構件410R(第一路徑片411R)的一端在外部連接部161A中,對外部連接接點440R與導電板430一起以螺絲止動,而與外部連接接點440R電性連接。第一路徑片411R藉由卸下螺絲可對外部連接接點440R拆卸。外部連接接點440R具有複數個薄片(此處為9個),係各薄片部之基端側成為一體的薄片接點。導電路徑部410之左側導電路徑構件410L(第一路徑片411L)的一端在外部連接部161A中,對外部連接接點440L與導電板430一起以螺絲止動,而與外部連接接點440L電性連接。第一路徑片411L藉由卸下螺絲,可對外部連接接點440L拆卸。外部連接接點440L具有複數個薄片(此處為9個),係各薄片部之基端側成為一體的薄片接 點。將基板固持器11配置於鍍覆槽時,如第二十五圖所示,外部連接接點440R與外部連接接點440L之各薄片部接觸於匯流條167,而經由匯流條167電性短路。另外,通電試驗時,與第十二D圖同樣地,外部連接接點440R及外部連接接點440L之各薄片部從匯流條167離開。因而,在外部連接接點440R及外部連接接點440L上分別連接確認通電裝置169之各接點230,並通過外部連接接點440R、右側導電路徑構件410R、基板接點、基板W、基板接點、左側導電路徑構件410L、外部連接接點440L流入電流,可進行通電試驗。關於導電路徑部420亦同樣。 Figure 24 is an enlarged perspective view of the external connection part in the state where the external connection part cover is removed. Figure 25 is a sectional view of the external connection part. One end of the right
另外,此處係說明對右側導電路徑構件410R與左側導電路徑構件410L分別設置外部連接接點440R及外部連接接點440L的情況,不過,將導電路徑部410作為1個系統時,亦可將外部連接接點作為一體之構件。另外,第二保持構件110B之外部連接部161B亦同樣地構成。 In addition, the case where the
上述實施形態之基板固持器具備:至少1個基板接點、至少1個外部接點、及連接此等之導電路徑構件,導電路徑構件及/或基板接點可更換地設置。因而,當導電路徑構件及/或基板接點與鍍覆液接觸而產生腐蝕或析出金屬時,即可更換導電路徑構件及/或基板接點。因而,藉由更換導電路徑構件及/或基板接點,可繼續使用基板固持器,可減少基板固持器之維修及更換所需的費用。特別是因為導電路徑構件被分割成複數個路徑片,可僅更換需要更換之部分。此外,還可僅更換一部分基板接點。例如,發生處理液洩漏時,依基板固持器在處理槽內之姿勢,藉由僅更換容易接觸到處理液之基板接點及/或路徑片(基板固持器採取垂直姿勢時,為基板固持器底部側)等之一部分基板接點及/或路徑片,與更換整個基板固持器、整個導電路徑構件、或整個基板接點時比較,可減少費用。 The substrate holder of the above embodiment includes at least one substrate contact, at least one external contact, and a conductive path member connecting them, and the conductive path member and/or the substrate contact are replaceably provided. Therefore, when the conductive path member and/or the substrate contact contacts with the plating solution to cause corrosion or metal precipitation, the conductive path member and/or the substrate contact can be replaced. Therefore, by replacing the conductive path member and/or the substrate contact, the substrate holder can continue to be used, reducing the cost required for maintenance and replacement of the substrate holder. In particular, since the conductive path member is divided into a plurality of path pieces, only the part that needs to be replaced can be replaced. In addition, only a part of the substrate contacts can be replaced. For example, when the processing liquid leaks, according to the posture of the substrate holder in the processing tank, by replacing only the substrate contacts and/or path pieces that are easily exposed to the processing liquid (when the substrate holder is in a vertical posture, it is the substrate holder A portion of the substrate contacts and/or path pieces, etc., can reduce costs compared to replacing the entire substrate holder, the entire conductive path member, or the entire substrate contact.
藉由將對複數個基板接點117之配線彙整成導電路徑部,可確保各導電路徑部大的剖面積(一個例子為纜線10-20條部分),可降低各導電路徑部每單位長度之配線電阻。藉此,可減少外部連接部至各第一基板接點的路徑中電壓下降之差。結果可使通過各第一基板接點而流動之鍍覆電流均勻化,並使鍍覆膜厚均勻化。此外,由於係將對複數個第一基板接點之配線彙整成各導電路徑部,因此可減少至複數個第一基板接點的配線尺寸,或是省略纜線配線。 By consolidating the wiring for a plurality of substrate contacts 117 into conductive path parts, a large cross-sectional area of each conductive path part can be ensured (one example is a part of 10-20 cables), and the per unit length of each conductive path part can be reduced The wiring resistance. Thereby, the difference of voltage drop in the path from the external connection part to each contact point of the first substrate can be reduced. As a result, the plating current flowing through each first substrate contact can be made uniform, and the plating film thickness can be made uniform. In addition, since the wiring to the plurality of first substrate contacts is integrated into each conductive path portion, the size of the wiring to the plurality of first substrate contacts can be reduced, or cable wiring can be omitted.
從上述實施形態至少可掌握以下之形態。 At least the following aspects can be grasped from the above-described embodiments.
第一形態係關於一種基板固持器,其係用於保持基板。該基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部。前述第一保持構件具有:至少1個第一基板接點,其係用於對前述基板之前述第一面供給電流;至少1個第一外部連接接點;及至少1個第一配線,其係電性連接前述至少1個第一基板接點與前述至少1個第一外部連接接點。前述第二保持構件具有:至少1個第二基板接點,其係用於對前述基板之前述第二面供給電流;至少1個第二外部連接接點;及至少1個第二配線,其係電性連接前述至少1個第二基板接點與前述至少1個第二外部連接接點。前述至少1個第一外部連接接點與前述至少1個第二外部連接接點係電性獨立。所謂「電性獨立」,係指在基板固持器內彼此電性絕緣。 The first aspect relates to a substrate holder for holding a substrate. The substrate holder includes: a first holding member having a first opening for exposing the first surface of the substrate; and a second holding member for sandwiching the substrate together with the first holding member. and held, and has a second opening for exposing the second surface of the aforementioned substrate. The first holding member has: at least one first substrate contact, which is used to supply current to the first surface of the aforementioned substrate; at least one first external connection contact; and at least one first wiring, which The at least one first substrate contact is electrically connected to the at least one first external connection contact. The second holding member has: at least one second substrate contact for supplying current to the second surface of the aforementioned substrate; at least one second external connection contact; and at least one second wiring for It is electrically connected to the at least one second substrate contact and the at least one second external connection contact. The aforementioned at least one first external connection contact is electrically independent from the aforementioned at least one second external connection contact. The term "electrically independent" means that they are electrically insulated from each other within the substrate holder.
第一形態由於係在第一及第二保持構件中分別獨立地設置第一及第二外部連接接點、第一基板接點及第二基板接點、第一配線及第二配線,因此可將對基板之第一面及第二面供給電流的路徑分別分配至第一及第二保持構件。藉此,可抑制基板固持器之厚度增大,而且可確保設置對基板之第一面及第 二面供給電流路徑的空間。此外,因為可對基板之第一面及第二面獨立地供給電流,所以可獨立控制各面之鍍覆厚度等的鍍覆規格。 In the first form, since the first and second external connection contacts, the first substrate contacts and the second substrate contacts, the first wiring and the second wiring are independently provided in the first and second holding members, it is possible to The paths for supplying current to the first surface and the second surface of the substrate are assigned to the first and second holding members, respectively. This suppresses an increase in the thickness of the substrate holder and secures a space for providing a current supply path to the first surface and the second surface of the substrate. In addition, since current can be independently supplied to the first surface and the second surface of the substrate, it is possible to independently control plating specifications such as the plating thickness of each surface.
此外,可從至少1個第一外部連接接點經由至少1個第一配線及至少1個第一基板接點,對基板之第一面供給電流。藉由調整第一配線之長度,可調整至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值。同樣地,可從至少1個第二外部連接接點經由至少1個第二配線及至少1個第二基板接點,對基板之第二面供給電流。藉由調整第二配線之長度,可調整至少1個第二基板接點與至少1個第二外部連接接點之間的電阻值。 In addition, current can be supplied to the first surface of the substrate from at least one first external connection contact via at least one first wiring and at least one first substrate contact. By adjusting the length of the first wiring, the resistance value between at least one first substrate contact and at least one first external connection contact can be adjusted. Likewise, current can be supplied to the second surface of the substrate from at least one second external connection contact via at least one second wiring and at least one second substrate contact. By adjusting the length of the second wiring, the resistance value between at least one second substrate contact and at least one second external connection contact can be adjusted.
上述實施形態中,第一保持構件與第二保持構件分別具有複數個基板接點,其係例如分別沿著基板之外周配置,並為了對基板供給電流而與基板接觸。另外,為了對基板供給電流而與基板接觸之基板接點,亦可係沿著基板外周彼此連結成為一體之1個基板接點。 In the above-mentioned embodiment, the first holding member and the second holding member each have a plurality of substrate contact points, which are respectively arranged along the outer periphery of the substrate, for example, and are in contact with the substrate for supplying current to the substrate. In addition, the substrate contacts that come into contact with the substrate for supplying current to the substrate may be one substrate contact integrally connected to each other along the outer periphery of the substrate.
第二形態如第一形態之基板固持器,其中前述第一保持構件具有:複數個前述第一基板接點;複數個前述第一外部連接接點;及複數個前述第一配線,其係電性連接前述複數個前述第一基板接點與前述複數個前述第一外部連接接點。 The second form is the substrate holder of the first form, wherein the first holding member has: a plurality of the first substrate contacts; a plurality of the first external connection contacts; and a plurality of the first wirings, which are electrical Sexually connect the aforementioned plurality of first substrate contacts and the aforementioned plurality of aforementioned first external connection contacts.
亦可使1個第一基板接點與1個外部連接接點一對一地對應,並以1個第一配線連接。此外,亦可在1個第一外部連接接點上連接2條以上第一配線,亦可將此等2條以上第一配線之另一端分別連接於不同的第一基板接點。此外,亦可將複數個外部連接接點連接於複數條第一配線,並將此等第一配線連接於1個基板接點。此外,亦可組合此等連接方法中之2個以上。 One first substrate contact and one external connection contact may correspond one-to-one, and may be connected by one first wiring. In addition, two or more first wirings may be connected to one first external connection contact, and the other ends of the two or more first wirings may be connected to different first substrate contacts. In addition, a plurality of external connection contacts may be connected to a plurality of first wirings, and these first wirings may be connected to one substrate contact. In addition, two or more of these connection methods may be combined.
第二形態藉由調整各第一配線之長度,可調整至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值。例如,藉由使各第一配線之長度相同,可使至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值均勻。此外,在使基板保持於基板固持器狀態下,藉由在一部分之第一配線與其他一部分的第一配線之間施加電位差,可在鍍覆處理之前確認通電。 In the second form, the resistance value between at least one first substrate contact and at least one first external connection contact can be adjusted by adjusting the length of each first wiring. For example, by making the lengths of the first wirings the same, the resistance value between at least one first substrate contact and at least one first external connection contact can be made uniform. In addition, by applying a potential difference between a part of the first wiring and the other part of the first wiring with the substrate held in the substrate holder state, it is possible to confirm energization before the plating process.
第三形態如第二形態之基板固持器,其中前述第一保持構件具有第一支臂部,前述至少1個第一外部連接接點配置於前述第一支臂部,前述第二保持構件具有第二支臂部,前述至少1個第二外部連接接點配置於前述第二支臂部,前述至少1個第一外部連接接點與前述至少1個第二外部連接接點位於基板固持器之左右兩端。 The third aspect is the substrate holder of the second aspect, wherein the first holding member has a first arm portion, the at least one first external connection contact is arranged on the first arm portion, and the second holding member has a The second arm part, the at least one second external connection point is arranged on the second arm part, the at least one first external connection point and the at least one second external connection point are located on the substrate holder The left and right ends.
第三形態由於將基板固持器設置於鍍覆槽時,可從支臂部之左右兩端對基板之第一面及第二面進行饋電,因此,比使外部接點集中於支臂部之一方端部的形態,可防止基板固持器之厚度增大。 In the third aspect, when the substrate holder is installed in the plating tank, power can be fed to the first surface and the second surface of the substrate from the left and right ends of the arm portion, so it is easier to concentrate the external contacts on the arm portion. The shape of one side end can prevent the thickness of the substrate holder from increasing.
第四形態如第一形態之基板固持器,其中前述第一保持構件具有第一支臂部,且在前述第一支臂部之兩側分別具有用於在鍍覆槽內定位前述基板固持器之第一及第二定位部。 The fourth aspect is the substrate holder of the first aspect, wherein the first holding member has a first arm portion, and on both sides of the first arm portion are respectively provided with the substrate holder for positioning the substrate holder in the plating tank. The first and second positioning parts.
第四形態由於將支臂部兩側之定位部設於第一保持構件,因此,即使第一保持構件與第二保持構件之嚙合狀態有偏差,不致影響兩側定位部之間的位置關係。 In the fourth aspect, since the positioning portions on both sides of the arm portion are provided on the first holding member, even if the meshing state of the first holding member and the second holding member deviates, the positional relationship between the positioning portions on both sides will not be affected.
第五形態如第一形態之基板固持器,其中前述第一保持構件具有第一本體部,其係具有前述第一開口部,前述第二保持構件具有第二本體部,其 係具有前述第二開口部,前述第一本體部及前述第二本體部具有彼此嚙合之定位構造。 The fifth aspect is the substrate holder of the first aspect, wherein the first holding member has a first body portion having the first opening, and the second holding member has a second body portion having the second opening. The opening, the aforementioned first body portion and the aforementioned second body portion have positioning structures engaging with each other.
第五形態由於具有第一及第二本體部之間的定位構造,因此,基板對第一及第二保持構件之定位精度提高。 Since the fifth aspect has a positioning structure between the first and second body parts, the positioning accuracy of the substrate with respect to the first and second holding members is improved.
第六形態如第一形態之基板固持器,其中前述第一保持構件具有:第一本體部,其係具有前述第一開口部;及第一支臂部,其係設於前述第一本體部之一端側;前述第二保持構件具有:第二本體部,其係具有前述第二開口部;及第二支臂部,其係設於前述第二本體部之一端側;在前述第一保持構件與前述第二保持構件嚙合狀態下,前述第一支臂部與前述第二支臂部在從前述第一及第二本體部朝向前述第一及第二支臂部的方向排列。 A sixth aspect is the substrate holder of the first aspect, wherein the first holding member has: a first body portion having the first opening portion; and a first arm portion provided on the first body portion One end side; the aforementioned second holding member has: a second body portion, which has the aforementioned second opening portion; and a second arm portion, which is set on one end side of the aforementioned second body portion; When the member is engaged with the second holding member, the first arm portion and the second arm portion are aligned in a direction from the first and second body portions toward the first and second arm portions.
第六形態由於第一支臂部與第二支臂部係在基板固持器之面方向排列而配置,因此可抑制支臂部之厚度增大。藉此,可減少排列複數個基板固持器時的整體厚度。 In the sixth aspect, since the first arm portion and the second arm portion are arranged in a row in the surface direction of the substrate holder, an increase in the thickness of the arm portion can be suppressed. Thereby, the overall thickness when arranging a plurality of substrate holders can be reduced.
第七形態如第一形態之基板固持器,其中前述第一保持構件具有:第一本體部,其係具有前述第一開口部及前述至少1個前述第一基板接點;第一支臂部,其係具有至少1個前述第一外部連接接點;及第一配線收容部,其係配置於前述第一本體部與前述第一支臂部之間,用於收容前述至少1個第一配線之多餘長度。 The seventh aspect is the substrate holder of the first aspect, wherein the first holding member has: a first body portion having the first opening portion and the at least one first substrate contact point; a first arm portion , which has at least one first external connection point; and a first wiring receiving part, which is arranged between the first main body part and the first arm part, and is used to accommodate the at least one first Excess length of wiring.
第七形態為了調整至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值,而調整至少1個第一配線之長度時,會產生至少1個第一配線多餘的長度,不過可將此種第一配線之多餘長度收容於第一配線收容部。另外,以複數條第一配線個別地連接複數個第一基板接點情況下,為了調整複數個 第一基板接點與至少1個第一外部連接接點之間的電阻值而調整各第一配線的長度時,會依第一基板接點之位置而產生第一配線的多餘長度,不過可將此種第一配線之多餘長度收容於第一配線收容部。例如,係以複數個第一基板接點與至少1個第一外部連接接點之間的電阻值均勻之方式,來調整第一配線之長度。此外,為了調整對特定之基板接點的電流量,亦可以變更電阻值之方式改變第一配線的長度。 In the seventh aspect, when the length of at least one first wiring is adjusted to adjust the resistance value between at least one first substrate contact and at least one first external connection contact, at least one first wiring is redundant. length, but the excess length of the first wiring can be accommodated in the first wiring accommodating part. In addition, in the case of individually connecting a plurality of first substrate contacts with a plurality of first wirings, in order to adjust the resistance value between the plurality of first substrate contacts and at least one first external connection contact, each first Depending on the length of the wiring, an excess length of the first wiring will be generated depending on the position of the contact point on the first substrate, but such excess length of the first wiring can be accommodated in the first wiring accommodating portion. For example, the length of the first wiring is adjusted so that the resistance values between the plurality of first substrate contacts and at least one first external connection contact are uniform. In addition, in order to adjust the amount of current to a specific substrate contact point, the length of the first wiring can also be changed by changing the resistance value.
第八形態如第七形態之基板固持器,其中前述第一配線收容部係與將前述第一配線收容部安裝於前述第一支臂部的第一安裝部一體形成。 The eighth aspect is the substrate holder of the seventh aspect, wherein the first wiring receiving portion is integrally formed with a first mounting portion for mounting the first wiring receiving portion on the first arm portion.
第八形態不需要另外設置將第一配線收容部安裝於第一支臂部的第一安裝部。可減少組合零件數量,抑制組合體的變動。 In the eighth aspect, there is no need to separately provide a first attachment portion for attaching the first wiring accommodating portion to the first arm portion. The number of combined parts can be reduced, and changes in the combined body can be suppressed.
第九形態如第八形態之基板固持器,其中前述第一配線收容部具有第一突出部,其係朝向前述第一本體部而突出,前述第一本體部具有2個第二突出部,其係突出於前述第一配線收容部之前述第一突出部的兩側。 The ninth aspect is the board holder of the eighth aspect, wherein the first wiring receiving portion has a first protruding portion protruding toward the first main body portion, and the first main body portion has two second protruding portions, which are It protrudes from both sides of the first protruding part of the first wiring receiving part.
第九形態避開主要配置收容第一配線收容部內之第一配線的收容空間部分,可在第一配線收容部厚的部分安裝第一本體部,可提高第一保持構件之剛性。 The ninth form avoids mainly accommodating the storage space for the first wiring in the first wiring storage section, and the first main body can be mounted on the thick part of the first wiring storage section, thereby improving the rigidity of the first holding member.
第十形態如第七形態之基板固持器,其中在前述第一配線收容部及前述第一本體部之連結部位,於基板固持器外側面之側,前述第一配線收容部之壁在前述第一本體部之壁的外側重疊。 The tenth aspect is the substrate holder of the seventh aspect, wherein at the connecting portion of the first wiring accommodating portion and the first main body portion, on the side of the outer surface of the substrate holder, the wall of the aforesaid first wiring accommodating portion is on the side of the aforementioned first wiring accommodating portion. The outer sides of the walls of a body overlap.
第十形態由於係在基板固持器外側面之面,將第一配線收容部之壁配置於第一本體部之壁的外側,第一配線收容部之壁成為傘構造,因此,可抑 制或防止鍍覆液藉由液體槳葉等而侵入基板固持器內部。抑制或防止鍍覆液侵入基板固持器內部,即可省略在基板固持器內之配線孔等配置密封。 In the tenth aspect, since the wall of the first wiring accommodating part is arranged outside the wall of the first main body part on the outer surface of the substrate holder, the wall of the first wiring accommodating part becomes an umbrella structure, therefore, it is possible to suppress or prevent The plating liquid penetrates into the inside of the substrate holder by liquid paddles and the like. Suppressing or preventing the plating solution from invading the inside of the substrate holder can omit the arrangement and sealing of wiring holes in the substrate holder.
第十一形態如第七形態之基板固持器,其中係以前述第一配線收容部及前述第一本體部之連結部位,在將前述基板固持器配置於鍍覆槽時,位於比鍍覆液面上方之方式構成前述第一保持構件。 The eleventh aspect is the substrate holder of the seventh aspect, wherein the connecting portion of the first wiring accommodating portion and the first main body portion is located at a lower position than the plating solution when the substrate holder is placed in the plating tank. The way above the surface constitutes the aforementioned first holding member.
第十一形態進一步抑制或防止鍍覆液侵入基板固持器內部,可省略在基板固持器內之配線孔等配置密封。 The eleventh aspect further suppresses or prevents the plating solution from invading into the substrate holder, and can omit arrangement and sealing of wiring holes in the substrate holder.
第十二形態如第一形態之基板固持器,其中前述第一保持構件具有第一基板接點,其係用於在前述基板之前述第一面供給電流,前述第二保持構件具有第二基板接點,其係用於在前述基板之前述第二面供給電流,用於將前述第一基板接點在前述第一保持構件內固定之第一接點固定部、及用於將前述第二基板接點在前述第二保持構件內固定之第二接點固定部,在使前述第一保持構件及前述第二保持構件嚙合狀態下彼此不重疊。 The twelfth aspect is the substrate holder of the first aspect, wherein the first holding member has a first substrate contact for supplying current to the first surface of the substrate, and the second holding member has a second substrate The contacts are used to supply current on the second surface of the substrate, the first contact fixing part for fixing the contacts of the first substrate in the first holding member, and the second contact fixing part for fixing the contacts of the second substrate. The second contact fixing portion where the substrate contacts are fixed in the second holding member does not overlap with each other when the first holding member and the second holding member are engaged.
第十二形態防止第一接點固定部及第二接點固定部之間的干擾,可抑制或防止基板固持器之厚度增加。 The twelfth aspect prevents interference between the first contact fixing portion and the second contact fixing portion, and can suppress or prevent an increase in the thickness of the substrate holder.
第十三形態如第十二形態之基板固持器,其中前述第一保持構件具有第一密封固持器,其係設於前述第一開口部之外側,前述第二保持構件具有第二密封固持器,其係設於前述第二開口部之外側,前述第一及第二基板接點分別藉由前述第一及第二接點固定部而安裝於前述第一及第二密封固持器,用於將前述第一密封固持器在前述第一保持構件內固定的第一密封固持器固定部、與用於將前述第二密封固持器在前述第二保持構件內固定的第二密封固持器固定部,在使前述第一保持構件及前述第二保持構件嚙合狀態下彼此不重疊。 The thirteenth aspect is the substrate holder of the twelfth aspect, wherein the first holding member has a first sealing holder provided outside the first opening, and the second holding member has a second sealing holder , which is arranged outside the second opening, the first and second substrate contacts are mounted on the first and second sealing holders by the first and second contact fixing parts respectively, for a first seal holder fixing portion for fixing the first seal holder in the first holding member, and a second seal holder fixing portion for fixing the second seal holder in the second holding member , in a state where the first holding member and the second holding member are engaged with each other so as not to overlap each other.
第十三形態防止第一密封固持器固定部及第二密封固持器固定部之間的干擾,可抑制或防止基板固持器之厚度增加。 The thirteenth aspect prevents interference between the first seal holder fixing portion and the second seal holder fixing portion, and can suppress or prevent an increase in the thickness of the substrate holder.
第十四形態如第一形態之基板固持器,其中前述第一保持構件具有第一密封,其係設於前述第一開口部之周圍,前述第二保持構件具有第二密封,其係設於前述第二開口部之周圍,前述第一保持構件及前述第二保持構件之至少一方,在比前述第一密封及前述第二密封外側進一步設有外側密封。 The fourteenth form is the substrate holder of the first form, wherein the first holding member has a first seal provided around the first opening, and the second holding member has a second seal provided on the periphery of the first opening. Around the second opening, at least one of the first holding member and the second holding member is provided with an outer seal further outside the first seal and the second seal.
第十四形態可藉由設於第一保持構件及第二保持構件之至少一方的外側密封,與第一及第二密封一起從基板固持器外部保護基板接點。 In the fourteenth aspect, the outer seal provided on at least one of the first holding member and the second holding member can protect the substrate contact from the outside of the substrate holder together with the first and second seals.
第十五形態如第一形態之基板固持器,其中前述第一及第二開口部係矩形狀。 A fifteenth aspect is the substrate holder of the first aspect, wherein the first and second openings are rectangular.
第十五形態可提供具有大型化趨勢之矩形形狀的基板用基板固持器。 The fifteenth aspect can provide a substrate holder for a substrate having a rectangular shape that tends to increase in size.
第十六形態提供一種鍍覆裝置,係具備:基板固持器,其係用於保持基板;基板裝卸部,其係用於將前述基板裝卸於前述基板固持器;鍍覆槽,其係對保持前述基板之前述基板固持器實施鍍覆處理;及搬送機,其係搬送前述基板固持器。該鍍覆裝置之基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部。前述第一保持構件具有:至少1個第一基板接點,其係用於對前述基板之前述第一面供給電流;至少1個第一外部連接接點;及至少1個第一配線,其係電性連接前述至少1個第一基板接點與前述至少1個第一外部連接接點。前述第二保持構件具有:至少1個第二基板接點,其係用於對前述基板之前述第二面供給電流;至少 1個第二外部連接接點;及至少1個第二配線,其係電性連接前述至少1個第二基板接點與前述至少1個第二外部連接接點。前述至少1個第一外部連接接點與前述至少1個第二外部連接接點係電性獨立。 A sixteenth aspect provides a coating device comprising: a substrate holder for holding a substrate; a substrate attachment and detachment unit for attaching and detaching the substrate to the substrate holder; and a plating tank for holding the substrate. The aforementioned substrate holder of the aforementioned substrate is subjected to plating treatment; and a conveyer for conveying the aforementioned substrate holder. The substrate holder of this coating device has: a first holding member having a first opening for exposing the first surface of the substrate; and a second holding member sandwiching the first holding member together with the first holding member The aforementioned substrate is held, and has a second opening for exposing the second surface of the aforementioned substrate. The first holding member has: at least one first substrate contact, which is used to supply current to the first surface of the aforementioned substrate; at least one first external connection contact; and at least one first wiring, which The at least one first substrate contact is electrically connected to the at least one first external connection contact. The second holding member has: at least one second substrate contact for supplying current to the second surface of the aforementioned substrate; at least one second external connection contact; and at least one second wiring for It is electrically connected to the at least one second substrate contact and the at least one second external connection contact. The aforementioned at least one first external connection contact is electrically independent from the aforementioned at least one second external connection contact.
第十六形態由於在第一及第二保持構件上分別設有第一及第二外部連接接點、第一基板接點及第二基板接點、第一配線及第二配線,因此可將對基板之第一面及第二面供給電流的路徑分別分配於第一及第二保持構件。藉此,在鍍覆裝置中可抑制基板固持器之厚度增大,而且可確保設置對基板之第一面及第二面供給電流路徑的空間。此外,因為可對基板之第一面及第二面獨立供給電流,所以可獨立控制各面之鍍覆厚度等的鍍覆規格。 Sixteenth Form Since the first and second external connection contacts, the first substrate contacts and the second substrate contacts, the first wiring and the second wiring are respectively provided on the first and second holding members, the The paths for supplying current to the first surface and the second surface of the substrate are distributed to the first and second holding members, respectively. Thereby, in the plating apparatus, the increase in the thickness of the substrate holder can be suppressed, and a space for providing a current supply path to the first surface and the second surface of the substrate can be ensured. In addition, since current can be independently supplied to the first surface and the second surface of the substrate, it is possible to independently control plating specifications such as the plating thickness of each surface.
第十七形態提供一種基板固持器,係用於保持基板,且具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持;前述第一保持構件具有:第一外部連接部;至少1個第一基板接點,其係與前述基板之前述第一面接觸,用於對前述基板之前述第一面供給電流;及第一導電路徑構件,其係連接於前述第一外部連接部、與前述至少1個第一基板接點;前述第一導電路徑構件中可拆卸地安裝前述第一基板接點,前述第一導電路徑構件配置於以前述第一保持構件與前述第二保持構件所密封的空間內,並可裝卸地安裝於前述第一保持構件之本體。 A seventeenth aspect provides a substrate holder for holding a substrate, and includes: a first holding member having a first opening for exposing the first surface of the substrate; and a second holding member that is Used to clamp and hold the aforementioned substrate together with the aforementioned first holding member; the aforementioned first holding member has: a first external connection portion; at least one first substrate contact, which is in contact with the aforementioned first surface of the aforementioned substrate, Used to supply current to the aforementioned first surface of the aforementioned substrate; and a first conductive path member, which is connected to the aforementioned first external connection portion and the aforementioned at least one contact point of the first substrate; the aforementioned first conductive path member may be The first substrate contact is detachably installed, the first conductive path member is arranged in the space sealed by the first holding member and the second holding member, and is detachably mounted on the body of the first holding member.
該形態在將基板固持器配置於處理槽時,防止第一導電路徑構件接觸到處理液。此外,因為至少1個第一基板接點可對第一導電路徑構件拆卸地安裝,所以至少1個第一基板接點之更換容易。因而,藉由更換一部分第一基板接點,可繼續使用基板固持器,可減少基板固持器之維修及更換需要的費用。例 如處理液發生洩漏時,依基板固持器在處理槽內之姿勢,藉由僅更換容易接觸到處理液之基板接點等(基板固持器採用垂直姿勢時,為基板固持器底部側)一部分基板接點,與更換整個基板固持器或整個第一基板接點時比較可減少費用。 This aspect prevents the first conductive path member from coming into contact with the processing liquid when the substrate holder is placed in the processing tank. In addition, since the at least one first substrate contact is detachably attached to the first conductive path member, replacement of the at least one first substrate contact is easy. Therefore, by replacing a part of the first substrate contacts, the substrate holder can continue to be used, and the cost of maintenance and replacement of the substrate holder can be reduced. For example, when the processing liquid leaks, according to the posture of the substrate holder in the processing tank, by replacing only a part of the substrate such as the substrate contacts that are easily exposed to the processing liquid (when the substrate holder is in a vertical posture, it is the bottom side of the substrate holder) contact, which reduces costs compared to replacing the entire substrate holder or the entire first substrate contact.
此外,基板固持器具備:至少1個基板接點、至少1個外部接點、及連接此等之導電路徑構件,且可更換地設有導電路徑構件。如此,當導電路徑構件與鍍覆液接觸而產生腐蝕或析出金屬時,可更換導電路徑構件。因而,藉由更換導電路徑構件可繼續使用基板固持器,可減少基板固持器之維修及更換需要的費用。 In addition, the substrate holder is provided with at least one substrate contact, at least one external contact, and a conductive path member connecting them, and the conductive path member is replaceably provided. In this way, when the conductive path member is corroded or metal is deposited due to contact with the plating solution, the conductive path member can be replaced. Therefore, the substrate holder can be continued to be used by replacing the conductive path member, and the cost of maintenance and replacement of the substrate holder can be reduced.
此外,使用連接於複數個第一基板接點之第一導電路徑構件情況下,可省略配線收容部,而謀求基板固持器之小型化及降低成本。此外,藉由將對複數個基板接點之配線彙整成導電路徑構件,可確保增大導電路徑構件之剖面積,可減少導電路徑構件每個單位長度之配線電阻。藉此,可減少在從外部連接部至各第一基板接點的路徑上電壓下降之差。結果,可使通過各第一基板接點而流動之鍍覆電流均勻化,可使鍍覆膜厚均勻化。此外,由於彙整對複數個第一基板接點之配線成為導電路徑構件,因此可減少複數個第一基板接點為止的配線尺寸,或是省略纜線配線。 In addition, in the case of using the first conductive path member connected to a plurality of first substrate contacts, the wiring accommodating portion can be omitted, thereby achieving miniaturization and cost reduction of the substrate holder. In addition, by integrating the wiring for a plurality of substrate contacts into a conductive path member, the cross-sectional area of the conductive path member can be ensured to be increased, and the wiring resistance per unit length of the conductive path member can be reduced. Thereby, the difference of voltage drop on the path from the external connection part to each contact point of the first substrate can be reduced. As a result, the plating current flowing through each first substrate contact can be made uniform, and the plating film thickness can be made uniform. In addition, since the wiring to the plurality of first substrate contacts is integrated into a conductive path member, the size of the wiring up to the plurality of first substrate contacts can be reduced, or cable wiring can be omitted.
第十八形態如第十七形態之基板固持器,其中前述第一保持構件具有複數個第一基板接點,並且進一步具有第二導電路徑構件,其係連接於前述第一外部連接部、及前述複數個第一基板接點之至少1個,並與前述第一導電路徑構件分離。 The eighteenth aspect is the substrate holder of the seventeenth aspect, wherein the first holding member has a plurality of first substrate contacts, and further has a second conductive path member connected to the first external connection portion, and At least one of the plurality of first substrate contacts is separated from the first conductive path member.
該形態藉由將導電路徑分割形成第一導電路徑構件、第二導電路徑構件,在使基板保持於基板固持器狀態下,藉由在第一導電路徑構件與第二導 電路徑構件之間施加電位差,可在鍍覆處理之前確認通電。此外,藉由將複數個第一基板接點分配於第一及第二導電路徑構件,可抑制從外部連接部至各第一基板接點之路徑長度差異。例如,藉由將在第一保持構件對稱之各一半部分的第一基板連接接點分配於第一及第二導電路徑構件,可使從外部連接部至各第一基板接點的路徑長度差異大致相同。此外,各導電路徑構件可進行更換。 In this form, the first conductive path member and the second conductive path member are formed by dividing the conductive path, and by applying a potential difference between the first conductive path member and the second conductive path member while the substrate is held in the substrate holder , It is possible to confirm the energization before the plating process. In addition, by allocating a plurality of first substrate contacts to the first and second conductive path members, it is possible to suppress the difference in path length from the external connection part to each first substrate contact. For example, by allocating the first substrate connection contacts in the symmetrical halves of the first holding member to the first and second conductive path members, the path lengths from the external connection to the respective first substrate contacts can be made different. Much the same. In addition, each conductive path member is replaceable.
第十九形態如第十八形態之基板固持器,其中前述第一導電路徑構件及前述第二導電路徑構件之至少一方可分割成複數個路徑片。 A nineteenth aspect is the substrate holder of the eighteenth aspect, wherein at least one of the first conductive path member and the second conductive path member can be divided into a plurality of path pieces.
該形態各路徑片可進行更換。例如基板固持器中發生處理液洩漏時,依基板固持器在處理槽內之姿勢,存在容易受到處理液影響的部分。將基板固持器以豎立姿勢配置於鍍覆槽情況下,發生處理液洩漏時,處理液容易蓄積在基板固持器之最下部附近。因而,處理液發生洩漏,僅基板固持器最下部附近之路徑片接觸處理液時,可取代更換整個導電路徑構件,而僅更換接觸到處理液的路徑片。與更換整個基板固持器、或整個導電路徑構件時比較可減少費用。此外,藉由形成各個路徑片然後加以組合,可廉價製造導電路徑構件。 In this form, each path piece can be replaced. For example, when the processing liquid leaks from the substrate holder, there are parts that are easily affected by the processing liquid depending on the posture of the substrate holder in the processing tank. When the substrate holder is placed in the plating tank in an upright position, the treatment liquid tends to accumulate near the lowermost part of the substrate holder when leakage of the treatment liquid occurs. Therefore, when the processing liquid leaks and only the path piece near the lowermost part of the substrate holder contacts the processing liquid, instead of replacing the entire conductive path member, only the path piece contacted with the processing liquid can be replaced. Costs can be reduced compared to replacing the entire substrate holder, or the entire conductive path member. Furthermore, by forming individual path pieces and then combining them, conductive path members can be manufactured inexpensively.
第二十形態如第十七形態之基板固持器,其中前述第一導電路徑構件係板狀或棒狀。 A twentieth aspect is the substrate holder of the seventeenth aspect, wherein the aforementioned first conductive path member is in the shape of a plate or a rod.
藉由將第一導電路徑構件形成板狀,可抑制基板固持器之厚度增大。藉由將第一導電路徑構件形成棒狀,沿著彎曲之導電路徑的形狀加工容易。 By forming the first conductive path member into a plate shape, an increase in the thickness of the substrate holder can be suppressed. By forming the first conductive path member into a rod shape, the shape processing along the curved conductive path is easy.
第二一形態如第十七至第二十形態中任何一種形態之基板固持器,其中前述第二保持構件具有第二開口部,其係用於露出前述基板之第二面,且具有:至少1個第二基板接點,其係接觸於前述基板之前述第二面,用於對前述基板之前述第二面供給電流;第二外部連接部;及第三導電路徑構件,其係連 接於前述第二外部連接部與前述至少1個第二基板接點;前述第三導電路徑構件中可拆卸地安裝前述第二基板接點。 The second aspect is the substrate holder of any one of the seventeenth to twentieth aspects, wherein the second holding member has a second opening for exposing the second surface of the substrate, and has: at least 1 second substrate contact, which is in contact with the aforementioned second surface of the aforementioned substrate, for supplying current to the aforementioned second surface of the aforementioned substrate; a second external connection; and a third conductive path member, which is connected to The aforementioned second external connection portion is connected to the aforementioned at least one second substrate contact; the aforementioned second substrate contact is detachably installed in the aforementioned third conductive path member.
該形態在兩面鍍覆處理用之基板固持器的各保持構件中,可達到上述形態所敘述之作用效果。 This aspect can achieve the effect described in the above-mentioned aspect in each holding member of the substrate holder for double-side plating treatment.
第二二形態提供一種鍍覆裝置,係具備:基板固持器,其係用於保持基板;基板裝卸部,其係用於將前述基板裝卸於前述基板固持器;及鍍覆槽,其係用於對保持前述基板之前述基板固持器實施鍍覆處理。前述基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持。前述第一保持構件具有:第一外部連接部;至少1個第一基板接點,其係接觸於前述基板之前述第一面,用於對前述基板之前述第一面供給電流;及第一導電路徑構件,其係連接於前述第一外部連接部、與前述至少1個第一基板接點;前述第一導電路徑構件中可拆卸地安裝前述第一基板接點,前述第一導電路徑構件配置於以前述第一保持構件與前述第二保持構件所密封之空間內,並可裝卸地安裝於前述第一保持構件之本體。該形態可達到與第十七形態同樣之作用效果。 The second aspect provides a plating device, which is equipped with: a substrate holder for holding a substrate; a substrate loading and unloading part for loading and unloading the substrate from the substrate holder; and a plating tank for Plating treatment is performed on the aforementioned substrate holder holding the aforementioned substrate. The substrate holder includes: a first holding member having a first opening for exposing the first surface of the substrate; and a second holding member for clamping the substrate together with the first holding member. And keep. The aforementioned first holding member has: a first external connection portion; at least one first substrate contact, which is in contact with the aforementioned first surface of the aforementioned substrate, and is used to supply current to the aforementioned first surface of the aforementioned substrate; and a first A conductive path member, which is connected to the first external connection part and the at least one first substrate contact; the first conductive path member is detachably mounted on the first substrate contact, and the first conductive path member It is arranged in the space sealed by the first holding member and the second holding member, and is detachably mounted on the body of the first holding member. This form can achieve the same effect as the seventeenth form.
以上,係依據幾個例子說明本發明之實施形態,不過上述發明之實施形態係為了容易理解本發明者,而並非限定本發明者。本發明在不脫離其旨趣範圍內可變更及改良,並且本發明當然包含其等價物。例如大型基板之形狀不限定於矩形,亦可為正方形,亦可為其他多角形狀,例如五角形或六角形。此外,將圓形形狀之基板裝卸於基板固持器的基板裝卸裝置當然亦可適用本發明。此外,在可解決上述問題之至少一部分的範圍內、或是可達到效果之至少一部分的範圍內,申請專利範圍及說明書所記載之各元件可任意組合或省略。 The embodiments of the present invention have been described above based on some examples, but the embodiments of the invention described above are for the sake of easy understanding of the present invention and are not intended to limit the present invention. The present invention can be changed and improved without departing from the gist thereof, and the present invention of course includes equivalents thereof. For example, the shape of the large substrate is not limited to a rectangle, it can also be a square, and can also be other polygonal shapes, such as pentagon or hexagon. In addition, of course, the present invention can also be applied to a substrate loading and unloading device that loads and unloads a circular substrate to a substrate holder. In addition, within the scope of solving at least a part of the above-mentioned problems, or achieving at least a part of the effects, the elements described in the scope of the claims and the specification can be combined or omitted arbitrarily.
本申請案依據2017年6月28日提出之日本申請專利編號特願2017-126582號及2018年4月17日提出之日本申請專利編號特願2018-079388號主張優先權。包含2017年6月28日提出之日本申請專利編號特願2017-126582號、及2018年4月17日提出之日本申請專利編號特願2018-079388號之說明書、申請專利範圍、發明摘要的全部揭示內容,以參考之方式全部納入本申請案。 This application claims priority based on Japanese Application Patent No. 2017-126582 filed on June 28, 2017 and Japanese Application No. 2018-079388 filed on April 17, 2018. Including the specification, scope of patent application, and abstract of the Japanese application No. 2017-126582 filed on June 28, 2017, and Japanese application No. 2018-079388 filed on April 17, 2018 The disclosed content is fully incorporated into this application by reference.
包含國際公開第2014-076781號(專利文獻1)、日本特開2008-184692號公報(專利文獻2)、美國專利第8236151號說明書(專利文獻3)之說明書、申請專利範圍、發明摘要的全部揭示內容,以參考之方式全部納入本申請案。 All of the specifications, claims, and abstracts of International Publication No. 2014-076781 (Patent Document 1), Japanese Patent Application Laid-Open No. 2008-184692 (Patent Document 2), and US Patent No. 8236151 (Patent Document 3) are included The disclosed content is fully incorporated into this application by reference.
11‧‧‧基板固持器 11‧‧‧substrate holder
110A‧‧‧第一保持構件 110A‧‧‧first holding member
111A‧‧‧第一本體部 111A‧‧‧First Body Department
111B‧‧‧第二本體部 111B‧‧‧Second body part
1110A‧‧‧第一本體 1110A‧‧‧First Body
1110B‧‧‧第二本體 1110B‧‧‧Second Body
112A‧‧‧第一開口部 112A‧‧‧First opening
112B‧‧‧第二開口部 112B‧‧‧Second opening
150A‧‧‧第一配線收容部 150A‧‧‧The first wiring storage part
150B‧‧‧第二配線收容部 150B‧‧‧The second wiring storage part
160A‧‧‧第一支臂部 160A‧‧‧first arm
160B‧‧‧第二支臂部 160B‧‧‧Second arm
161A‧‧‧第一外部連接部 161A‧‧‧The first external connection
161B‧‧‧第二外部連接部 161B‧‧‧The second external connection
162A、162B‧‧‧外部連接部護蓋 162A, 162B‧‧‧External connection cover
163L、163R‧‧‧定位部 163L, 163R‧‧‧positioning unit
164A‧‧‧嚙合部 164A‧‧‧Engagement
164B‧‧‧狹窄部 164B‧‧‧Stenosis
165B‧‧‧端部 165B‧‧‧end
Claims (21)
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JP2017126582 | 2017-06-28 | ||
JP2017-126582 | 2017-06-28 | ||
JP2018079388A JP6952007B2 (en) | 2017-06-28 | 2018-04-17 | Board holder and plating equipment |
JP2018-079388 | 2018-04-17 |
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TW201906065A TW201906065A (en) | 2019-02-01 |
TWI786136B true TWI786136B (en) | 2022-12-11 |
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KR (1) | KR102498053B1 (en) |
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WO2019003891A1 (en) * | 2017-06-28 | 2019-01-03 | 株式会社荏原製作所 | Substrate holder and plating device |
JP7079224B2 (en) * | 2019-06-14 | 2022-06-01 | 株式会社荏原製作所 | Non-volatile storage medium for storing plating methods, plating equipment, and programs |
JP7256708B2 (en) | 2019-07-09 | 2023-04-12 | 株式会社荏原製作所 | Plating equipment |
JP7158816B2 (en) * | 2019-08-05 | 2022-10-24 | ダイハツ工業株式会社 | Motor support structure |
JP7227875B2 (en) | 2019-08-22 | 2023-02-22 | 株式会社荏原製作所 | Substrate holder and plating equipment |
JP7264780B2 (en) | 2019-09-10 | 2023-04-25 | 株式会社荏原製作所 | Substrate holder, substrate plating device with same, and electrical contact |
JP7244408B2 (en) | 2019-12-13 | 2023-03-22 | 株式会社荏原製作所 | substrate holder |
JP7242516B2 (en) * | 2019-12-13 | 2023-03-20 | 株式会社荏原製作所 | substrate holder |
CN114075688B (en) * | 2020-08-21 | 2024-09-27 | 盛合晶微半导体(江阴)有限公司 | Electroplating carrier and electroplating method |
CN113543525B (en) * | 2021-06-02 | 2023-05-05 | 深圳市英诺泰克科技有限公司 | Chemical copper deposition device for producing PCB double-sided board |
CN115552060B (en) * | 2021-10-28 | 2023-07-28 | 株式会社荏原制作所 | Plating device |
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CN110799677A (en) | 2020-02-14 |
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