TW201906065A - Substrate holder and plating device - Google Patents

Substrate holder and plating device

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Publication number
TW201906065A
TW201906065A TW107120668A TW107120668A TW201906065A TW 201906065 A TW201906065 A TW 201906065A TW 107120668 A TW107120668 A TW 107120668A TW 107120668 A TW107120668 A TW 107120668A TW 201906065 A TW201906065 A TW 201906065A
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TW
Taiwan
Prior art keywords
substrate
holding member
contact
external connection
holder
Prior art date
Application number
TW107120668A
Other languages
Chinese (zh)
Other versions
TWI786136B (en
Inventor
森山翔太
宮本松太郎
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日商荏原製作所股份有限公司
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Publication of TW201906065A publication Critical patent/TW201906065A/en
Application granted granted Critical
Publication of TWI786136B publication Critical patent/TWI786136B/en

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004Sealing devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005Contacting devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008Current shielding devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated
    • C25D17/08Supporting racks, i.e. not for suspending
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/02Heating or cooling
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • C25D21/18Regeneration of process solutions of electrolytes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/12Semiconductors
    • C25D7/123Semiconductors first coated with a seed layer or a conductive layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/188Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

This substrate holder is for holding a substrate and comprises: a first holding member having a first opening part for exposing a first surface of the substrate; and a second holding member for holding the substrate by sandwiching the same with the first holding member, the second holding member having a second opening part for exposing a second surface of the substrate. The first holding member has at least one first external connection contact point, and the second holding member has at least one second external connection contact point that is separate from the first external connection contact point.

Description

基板固持器及鍍覆裝置  Substrate holder and plating device  

本發明係關於一種基板固持器及鍍覆裝置。 The present invention relates to a substrate holder and a plating apparatus.

過去進行在半導體晶圓或印刷基板等基板表面形成配線及凸塊(突起狀電極)等。形成該配線及凸塊等之方法習知有電解鍍覆法。用於電解鍍覆法之鍍覆裝置具備密封圓形或多角形基板之端面,並使表面(被鍍覆面)露出而保持之基板固持器。此種鍍覆裝置中,在基板表面進行鍍覆處理時,係使保持基板之基板固持器浸漬於鍍覆液中。 In the past, wiring, bumps (protruding electrodes), and the like have been formed on the surface of a substrate such as a semiconductor wafer or a printed substrate. A method of forming the wiring, bumps, and the like is known as an electrolytic plating method. A plating apparatus for electrolytic plating has a substrate holder that seals an end surface of a circular or polygonal substrate and exposes the surface (coated surface). In such a plating apparatus, when the plating treatment is performed on the surface of the substrate, the substrate holder holding the substrate is immersed in the plating solution.

專利文獻1中記載有用於鍍覆處理基板兩面之基板夾具。該基板夾具具備由另外構件構成之底座部1、護蓋部2、中心部3,底座部1上在重疊中心部3狀態下搭載基板,進一步重疊護蓋部2,而將底座部1、中心部3及護蓋部2從兩側以夾具部4夾著而固定。對基板供給電流時,係從設於底座部1之支臂部14的通電路徑,經由中心部3內之一方通電棒34對底座部1的通電環6供給電流,並經由另一方之通電棒34對護蓋部2的通電環6供給電流,並從各通電環6在基板之各面供給電流(第三、六圖)。 Patent Document 1 describes a substrate holder for plating both surfaces of a substrate. The substrate holder includes a base portion 1, a cover portion 2, and a center portion 3 which are formed of another member. The base portion 1 is mounted with the substrate in a state in which the center portion 3 is overlapped, and the cover portion 2 is further overlapped, and the base portion 1 is centered. The portion 3 and the cover portion 2 are fixed by sandwiching the clamp portion 4 from both sides. When an electric current is supplied to the substrate, an electric current is supplied from the energizing path of the arm portion 14 provided in the base portion 1 to the energizing ring 6 of the base portion 1 via one of the current-carrying rods 34 in the center portion 3, and the current is supplied through the other side. 34 supplies current to the energizing ring 6 of the cover portion 2, and supplies current from each of the energizing rings 6 to each surface of the substrate (third and sixth figures).

專利文獻2中記載有用於鍍覆處理基板兩面之基板夾具70,該基板夾具70係在具備吊架14之第一保持構件11與第二保持構件12之間夾著基板而 保持。對基板供給電流時,係經由第一保持構件11內之導電板22、導電膜插銷23對基板各面供給電流。連接於基板之一方之面的導電膜插銷23與設於吊架14之一方側的端子板27連接,連接於基板另一方面之導電膜插銷23與設於吊架14之另一方側的端子板28連接(第九、十圖)。 Patent Document 2 describes a substrate holder 70 for plating both surfaces of a substrate, and the substrate holder 70 is held between the first holding member 11 and the second holding member 12 including the hanger 14 with the substrate interposed therebetween. When a current is supplied to the substrate, current is supplied to each surface of the substrate via the conductive plate 22 and the conductive film plug 23 in the first holding member 11. The conductive film plug 23 connected to one of the sides of the substrate is connected to the terminal plate 27 provided on one side of the hanger 14, and is connected to the conductive film plug 23 on the other side of the substrate and the terminal provided on the other side of the hanger 14. The board 28 is connected (the ninth and tenth figures).

此外,記載有藉由第一保持構件71及第二保持構件72保持方形基板之上緣部,並從第一保持構件71兩側之端子板78、79供給電流至基板各面的構成。該構成係從第一保持構件71一方之端子板79經由電極接點75供給電流至基板的一方之面,並從第一保持構件71之另一方端子板78經由通電用接點81,再經由第二保持構件72之通電用彈簧接點82、電極接點76而供給電流至基板另一方面(第二十、二一圖)。 Further, the first holding member 71 and the second holding member 72 hold the upper edge portion of the square substrate, and the current is supplied from the terminal plates 78 and 79 on both sides of the first holding member 71 to the respective surfaces of the substrate. In this configuration, current is supplied from one terminal plate 79 of the first holding member 71 to one surface of the substrate via the electrode contact 75, and the other terminal plate 78 of the first holding member 71 is passed through the contact point 81 for energization. The second holding member 72 is energized by the spring contact 82 and the electrode contact 76 to supply current to the substrate (the twentieth and twenty-first figures).

專利文獻3中記載有2片晶圓重疊配置,同時鍍覆處理露出外側之2個面用的晶圓載體100。該晶圓載體100具備:夾著晶圓之非導電凸緣120;及設於凸緣120上部之吊架狀的導電凸緣110。該構成係從導電凸緣110配置於非導電凸緣120之各凸緣片121、122內的導電體426、接點427,經由複數個彈簧針428供給電流至晶圓的各面。 Patent Document 3 describes that two wafers are placed in a superposed manner, and the wafer carrier 100 for the two outer surfaces is exposed by a plating process. The wafer carrier 100 includes a non-conductive flange 120 sandwiching the wafer, and a hanger-shaped conductive flange 110 provided on the upper portion of the flange 120. In this configuration, the conductive body 426 and the contact 427 are disposed in the flange pieces 121 and 122 of the non-conductive flange 120 from the conductive flange 110, and current is supplied to each surface of the wafer via a plurality of spring pins 428.

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]國際公開第2014-076781號 [Patent Document 1] International Publication No. 2014-076781

[專利文獻2]日本特開第2008-184692號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-184692

[專利文獻3]美國專利第8236151號說明書 [Patent Document 3] US Patent No. 8216151

電解鍍覆時,需要將適合基板尺寸之數的接點(基板接點)設於基板夾具,並在此等基板接點上供給電流。此外,有時宜對各基板接點以個別之電流路徑連接於1個或複數個外部連接接點,當基板尺寸大時,接點及電流路徑數量會有增大的趨勢。但是,接點及電流路徑數量增大時,可能導致基板夾具的厚度增大。此種問題在鍍覆處理基板兩面之基板夾具上特別會成為問題,不過在鍍覆處理基板單面時也會發生。 In the electrolytic plating, it is necessary to provide a contact (substrate contact) suitable for the substrate size to the substrate holder, and supply current to the substrate contacts. In addition, it is sometimes preferable to connect each substrate contact to one or a plurality of external connection contacts by an individual current path. When the substrate size is large, the number of contacts and current paths tends to increase. However, as the number of contacts and current paths increases, the thickness of the substrate holder may increase. Such a problem is particularly problematic in the substrate jig on both sides of the plated substrate, but it also occurs when the substrate is plated on one side.

本發明之目的為解決上述問題的至少一部分。 It is an object of the present invention to address at least some of the above problems.

本發明一種基板固持器,係用於保持基板。該基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部;前述第一保持構件至少具有1個第一外部連接接點,前述第二保持構件具有與前述第一外部連接接點獨立之至少1個第二外部連接接點。 A substrate holder for holding a substrate. The substrate holder includes: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member for sandwiching the substrate with the first holding member And maintaining, and having a second opening for exposing the second surface of the substrate; the first holding member has at least one first external connection contact, and the second holding member has the first external connection contact Independent of at least one second external connection contact.

本發明一種鍍覆裝置係具備:基板固持器,其係用於保持基板;基板裝卸部,其係將前述基板裝卸於前述基板固持器;及鍍覆槽,其係用於對保持前述基板之前述基板固持器實施鍍覆處理。該鍍覆裝置之前述基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部;前述第一保持構件至少具有1個第一外部 連接接點,前述第二保持構件具有與前述第一外部連接接點獨立之至少1個第二外部連接接點。 A plating apparatus according to the present invention includes: a substrate holder for holding a substrate; a substrate attaching and detaching portion for attaching and detaching the substrate to the substrate holder; and a plating groove for holding the substrate The substrate holder is subjected to a plating treatment. The substrate holder of the plating apparatus includes: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member for use with the first holding member Holding the substrate together, and having a second opening for exposing the second surface of the substrate; the first holding member has at least one first external connection contact, and the second holding member has the foregoing An external connection contact is independent of at least one second external connection contact.

10、10a、10b、10c‧‧‧鍍覆槽 10, 10a, 10b, 10c‧‧‧ plating tank

11‧‧‧基板固持器 11‧‧‧Substrate Holder

101‧‧‧架台 101‧‧‧Rack

101a~101h‧‧‧架台構件 101a~101h‧‧‧Attendance components

103‧‧‧控制部 103‧‧‧Control Department

105‧‧‧裝載載台 105‧‧‧Loading platform

107‧‧‧卸載載台 107‧‧‧Unloading the stage

110A‧‧‧第一保持構件 110A‧‧‧First holding member

110B‧‧‧第二保持構件 110B‧‧‧Second holding member

111A‧‧‧第一本體部 111A‧‧‧First Body Department

111B‧‧‧第二本體部 111B‧‧‧Second body

1110A‧‧‧第一本體 1110A‧‧‧First Ontology

1110B‧‧‧第二本體 1110B‧‧‧Second Ontology

112A‧‧‧第一開口部 112A‧‧‧First opening

112B‧‧‧第二開口部 112B‧‧‧Second opening

113A、113B、114A、114B、115A、115B‧‧‧安裝部 113A, 113B, 114A, 114B, 115A, 115B‧‧‧ Installation Department

117A‧‧‧第一基板接點 117A‧‧‧First substrate contact

117B‧‧‧第二基板接點 117B‧‧‧Second substrate contacts

118A、118B、119A、119B‧‧‧密封固持器 118A, 118B, 119A, 119B‧‧‧ Seal Holder

120A、120B‧‧‧內側密封 120A, 120B‧‧‧ inside seal

121A‧‧‧外側密封 121A‧‧‧Outside seal

122‧‧‧基板搬送裝置 122‧‧‧Substrate transport device

122A、122B、123A、123B、124A‧‧‧螺絲 122A, 122B, 123A, 123B, 124A‧‧‧ screws

125‧‧‧導電線 125‧‧‧Flexible wire

126‧‧‧預濕槽 126‧‧‧Pre-wet groove

126A‧‧‧溝 126A‧‧‧ditch

127A‧‧‧配線路徑 127A‧‧‧Wiring path

128‧‧‧預浸槽 128‧‧‧Prepreg tank

130a‧‧‧第一沖洗槽 130a‧‧‧First rinse tank

130b‧‧‧第二沖洗槽 130b‧‧‧Second rinse tank

130c‧‧‧第三沖洗槽 130c‧‧‧ third flushing tank

132‧‧‧噴吹槽 132‧‧‧Blowing groove

140‧‧‧搬送機 140‧‧‧Transporter

141‧‧‧傳輸機 141‧‧‧Transporter

142‧‧‧固定座 142‧‧‧ fixed seat

150‧‧‧配線收容部 150‧‧‧Wiring accommodating department

150A‧‧‧第一配線收容部 150A‧‧‧First wiring accommodating department

150B‧‧‧第二配線收容部 150B‧‧‧Second wiring accommodating department

151A‧‧‧第一蓋部 151A‧‧‧First Cover

152A‧‧‧收容空間 152A‧‧‧ accommodating space

154A、154B、155A、158A、159A、159B‧‧‧安裝部 154A, 154B, 155A, 158A, 159A, 159B‧‧‧ Installation Department

157A、157B‧‧‧突出部 157A, 157B‧‧‧ highlights

160‧‧‧支臂部 160‧‧‧ Arms

160A‧‧‧第一支臂部 160A‧‧‧First arm

160B‧‧‧第二支臂部 160B‧‧‧Second arm

161A‧‧‧第一外部連接部 161A‧‧‧First External Connection

161B‧‧‧第二外部連接部 161B‧‧‧Second external connection

162A、162B‧‧‧外部連接部護蓋 162A, 162B‧‧‧ External connector cover

163L、163R‧‧‧定位部 163L, 163R‧‧‧ Positioning Department

164A‧‧‧嚙合部 164A‧‧‧Meshing Department

164B‧‧‧狹窄部 164B‧‧‧Sarrow

165A‧‧‧嚙合部 165A‧‧‧Meshing Department

165B‧‧‧端部 165B‧‧‧End

166A、166B‧‧‧安裝部 166A, 166B‧‧‧Installation Department

167‧‧‧匯流條 167‧‧‧ bus bar

168‧‧‧外部連接接點 168‧‧‧External connection contacts

169‧‧‧確認通電裝置 169‧‧‧Confirm energization device

170A‧‧‧裝載/卸載部 170A‧‧‧Loading/Unloading Department

170B‧‧‧基板放置部 170B‧‧‧Substrate placement

170C‧‧‧處理部 170C‧‧‧Processing Department

170D‧‧‧固持器存儲部 170D‧‧‧Retainer Storage

170E‧‧‧清洗部 170E‧‧ Cleaning Department

173C‧‧‧處理部 173C‧‧‧Processing Department

180、180A、180B、181、181A、181B、191A、191B‧‧‧安裝部 180, 180A, 180B, 181, 181A, 181B, 191A, 191B‧‧‧ Installation Department

192A、192B‧‧‧配線孔 192A, 192B‧‧‧ wiring holes

193‧‧‧螺栓 193‧‧‧ bolt

194‧‧‧貫穿孔 194‧‧‧through holes

194a‧‧‧鍃孔 194a‧‧‧鍃孔

195‧‧‧螺絲孔 195‧‧‧ screw holes

200‧‧‧內側空間 200‧‧‧ inside space

210A‧‧‧突起部 210A‧‧‧Protruding

210B‧‧‧貫穿孔 210B‧‧‧through hole

30A‧‧‧第一陽極固持器 30A‧‧‧First Anode Holder

30B‧‧‧第二陽極固持器 30B‧‧‧Second anode holder

31A、31B‧‧‧第一及第二陽極 31A, 31B‧‧‧ first and second anodes

32A、32B‧‧‧第一及第二陽極遮罩 32A, 32B‧‧‧ first and second anode masks

35A、35B‧‧‧第一及第二槳葉 35A, 35B‧‧‧ first and second blades

36A、36B‧‧‧第一及第二中間遮罩 36A, 36B‧‧‧ first and second intermediate masks

37‧‧‧外部電源 37‧‧‧External power supply

230‧‧‧端子 230‧‧‧ terminals

240‧‧‧電流供給部 240‧‧‧ Current Supply Department

250‧‧‧支臂收容部 250‧‧‧ Arm hoisting department

410、420‧‧‧導電路徑部 410, 420‧‧‧ conductive path

410L‧‧‧左側導電路徑構件 410L‧‧‧Left conductive path member

410R‧‧‧右側導電路徑構件 410R‧‧‧right conductive path member

420L‧‧‧左側導電路徑構件 420L‧‧‧Left conductive path member

420R‧‧‧右側導電路徑構件 420R‧‧‧right conductive path member

411L~415L、411R~415R、421L~425L、421R~425R‧‧‧路徑片 411L~415L, 411R~415R, 421L~425L, 421R~425R‧‧‧ path film

430‧‧‧導電板 430‧‧‧conductive plate

440L、440R‧‧‧外部連接接點 440L, 440R‧‧‧ external connection contacts

1000‧‧‧基板裝卸裝置 1000‧‧‧Substrate loading and unloading device

1600‧‧‧安裝凹部 1600‧‧‧Installation recess

1650A‧‧‧薄部 1650A‧‧‧

L‧‧‧配線 L‧‧‧ wiring

S‧‧‧鍍覆液面 S‧‧‧ plating liquid level

W‧‧‧基板 W‧‧‧Substrate

300‧‧‧循環機構 300‧‧‧Circulatory body

302‧‧‧循環管線 302‧‧‧Circular pipeline

304‧‧‧閥門 304‧‧‧ Valve

306‧‧‧泵浦 306‧‧‧ pump

308‧‧‧溫度控制裝置 308‧‧‧ Temperature control device

310‧‧‧過濾器 310‧‧‧Filter

第一圖係顯示鍍覆裝置之一個實施形態的模式圖。 The first figure shows a schematic view of one embodiment of a plating apparatus.

第二A圖係從基板固持器之第一側觀看的立體圖。 The second A is a perspective view from the first side of the substrate holder.

第二B圖係從基板固持器之第二側觀看的立體圖。 The second B diagram is a perspective view from the second side of the substrate holder.

第三A圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。 The third A is a perspective view of the first holding member and the second holding member in which the substrate holder is in an open state as viewed from the first side.

第三B圖係從第二側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。 The third B is a perspective view of the first holding member and the second holding member in which the substrate holder is in an open state as viewed from the second side.

第四A圖係從第一保持構件之第一側觀看的分解立體圖。 The fourth A diagram is an exploded perspective view from the first side of the first holding member.

第四B圖係從第一保持構件之第二側觀看的分解立體圖。 The fourth B diagram is an exploded perspective view from the second side of the first holding member.

第四C圖係配線收容部之立體圖。 The fourth C diagram is a perspective view of the wiring accommodating portion.

第五A圖係從第二保持構件之第一側觀看的分解立體圖。 The fifth A diagram is an exploded perspective view from the first side of the second holding member.

第五B圖係從第二保持構件之第二側觀看的分解立體圖。 The fifth B diagram is an exploded perspective view from the second side of the second holding member.

第六A圖係從第一側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。 The sixth A diagram is an enlarged perspective view of the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are engaged from the first side.

第六B圖係從第二側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。 Fig. 6B is an enlarged perspective view showing the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are engaged from the second side.

第六C圖係從第一側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。 The sixth C is an enlarged perspective view of the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are opened from the first side.

第六D圖係從第二側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。 The sixth D diagram is an enlarged perspective view of the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are opened from the second side.

第七A圖係用於顯示從第一外部連接部至第一本體部之配線的路徑構成之第一保持構件的部分透視立體圖。 The seventh A diagram is a partial perspective perspective view of the first holding member for displaying the path of the wiring from the first external connection portion to the first body portion.

第七B圖係在第一本體部與配線收容部之連結部中的第一本體部立體圖。 FIG. 7B is a perspective view of the first body portion in the connection portion between the first body portion and the wiring accommodating portion.

第七C圖係從內側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。 The seventh C is a perspective view of the wiring accommodating portion in the connection portion between the wiring accommodating portion and the first main body portion as viewed from the inside.

第七D圖係從外側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。 The seventh D diagram is a perspective view of the wiring accommodating portion in the connection portion between the wiring accommodating portion and the first main body portion as viewed from the outside.

第八圖係配線收容部及本體部之連結部中的放大俯視圖。 The eighth drawing is an enlarged plan view of the connection portion between the wiring accommodating portion and the main body portion.

第八A圖係第八圖之A-A的剖面圖。 Figure 8A is a cross-sectional view of the A-A of the eighth figure.

第八B圖係在並未形成配線孔之部分的第八圖之B-B的剖面圖。 Fig. 8B is a cross-sectional view taken along line B-B of the eighth diagram in which the wiring hole is not formed.

第八C圖係在形成有配線孔之部分的第八圖之C-C的剖面圖。 The eighth C diagram is a cross-sectional view taken along line C-C of the eighth diagram in which the wiring holes are formed.

第九A圖係從第一保持構件之內側面側觀看的前視圖。 The ninth A diagram is a front view as seen from the inner side surface side of the first holding member.

第九B圖係從第一保持構件之內側面側觀看的部分放大前視圖。 The ninth B diagram is a partially enlarged front view seen from the inner side surface side of the first holding member.

第九C圖係與第一保持構件一起顯示第二保持構件之在第九B圖的C-C剖面圖。 The ninth C diagram shows a C-C cross-sectional view of the second holding member in the ninth B diagram together with the first holding member.

第十圖係顯示固定基板接點之螺絲配置的第一及第二本體部之剖面圖。 Figure 11 is a cross-sectional view showing the first and second body portions of the screw arrangement of the fixed substrate contacts.

第十一圖係顯示固定用於安裝內側密封之密封固持器的螺絲之配置的第一及第二本體部之剖面圖。 The eleventh figure shows a cross-sectional view of the first and second body portions of the arrangement of the screws for fixing the seal holder for the inner seal.

第十二A圖係卸下配線護蓋狀態之外部連接部的放大立體圖。 The twelfth A is an enlarged perspective view of the external connection portion in which the wiring cover is removed.

第十二B圖係第一保持構件中之電流路徑的說明圖。 The twelfth B-picture is an explanatory diagram of a current path in the first holding member.

第十二C圖係第二保持構件中之電流路徑的說明圖。 The twelfth Cth is an explanatory diagram of a current path in the second holding member.

第十二D圖係顯示確認通電時外部連接部之各接點的連接模式圖。 The twelfth D is a diagram showing the connection pattern of the contacts of the external connection portion when the energization is confirmed.

第十二E圖係顯示鍍覆處理時外部連接部之各接點的連接模式圖。 The twelfth E is a connection mode diagram showing the contacts of the external connection portion during the plating process.

第十三A圖係說明將基板放置部中之基板設置於基板固持器的模式圖。 Fig. 13A is a schematic view showing the arrangement of the substrate in the substrate placing portion on the substrate holder.

第十三B圖顯示基板固持器的固定方法之一例。 Fig. 13B shows an example of a method of fixing the substrate holder.

第十四A圖係第一保持構件之定位部附近的放大立體圖。 Fig. 14A is an enlarged perspective view showing the vicinity of the positioning portion of the first holding member.

第十四B圖係第二保持構件之定位部的放大立體圖。 The fourteenth Bth diagram is an enlarged perspective view of the positioning portion of the second holding member.

第十五圖係概略顯示鍍覆槽之構成的側視圖。 The fifteenth diagram schematically shows a side view of the configuration of the plating tank.

第十六A圖係在與第一保持構件之第一支臂部的外部連接部相反側之定位部附近的放大立體圖。 Fig. 16A is an enlarged perspective view showing the vicinity of the positioning portion on the side opposite to the external connection portion of the first arm portion of the first holding member.

第十六B圖係第一保持構件之第一支臂部的外部連接部側之定位部附近的放大立體圖。 Fig. 16B is an enlarged perspective view showing the vicinity of the positioning portion on the outer connecting portion side of the first arm portion of the first holding member.

第十七圖係從其他實施形態之基板固持器的第一側觀看之立體圖。 Figure 17 is a perspective view of the substrate holder of the other embodiment as viewed from the first side.

第十八圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。 The eighteenth view is a perspective view of the first holding member and the second holding member in which the substrate holder is in an open state as viewed from the first side.

第十九圖係基板固持器之第一保持構件及第二保持構件的分解立體圖。 The nineteenth embodiment is an exploded perspective view of the first holding member and the second holding member of the substrate holder.

第二十圖係其他實施形態之導電路徑部的立體圖。 Fig. 20 is a perspective view of a conductive path portion of another embodiment.

第二十一圖係第一保持構件及第二保持構件從基板保持面側觀看之箭視圖。 The twenty-first figure is an arrow view of the first holding member and the second holding member as viewed from the substrate holding surface side.

第二十二A圖係基板固持器之基板接點附近的放大圖。 The twenty-second A-picture is an enlarged view of the vicinity of the substrate contact of the substrate holder.

第二十二B圖係在卸下一部分基板接點狀態下顯示基板固持器之基板接點附近的放大圖者。 The twenty-second B-picture is an enlarged view showing the vicinity of the substrate contact of the substrate holder in a state where a part of the substrate contact is removed.

第二十三圖係與第一保持構件一起顯示第二保持構件之在第二十二B圖的C-C剖面圖。 The twenty-third figure shows a C-C cross-sectional view of the second holding member in the twenty-second B-picture together with the first holding member.

第二十四圖係在卸下外部連接部護蓋狀態之外部連接部的放大立體圖。 The twenty-fourth embodiment is an enlarged perspective view of the external connection portion in a state where the outer connecting portion cover is removed.

第二十五圖係外部連接部之剖面圖。 The twenty-fifth figure is a cross-sectional view of the external connection portion.

以下,參照附圖說明本發明之鍍覆裝置及使用於鍍覆裝置之基板固持器的實施形態。附圖中,對相同或類似之元件註記相同或類似參考符號,在各種實施形態之說明中,省略關於相同或類似元件之重複說明。此外,各種實施形態顯示之特徵只要彼此不矛盾,亦可適用於其他實施形態。另外,本說明書中,所謂「基板」,除了半導體基板、玻璃基板、印刷電路板之外,還包含磁性記錄媒介、磁性記錄感測器、反射鏡、光學元件及微小機械元件、或是局部製作之積體電路。基板包含任意形狀(方形、圓形等)者。此外,本說明書中使用「前面」、「背面」、「前方」、「後方」、「上」、「下」、「左」、「右」等之表現,而此等是為了方便說明而顯示在例示之圖式紙面上的位置、方向者,在使用裝置時等的實際配置上會有不同。 Hereinafter, embodiments of the plating apparatus of the present invention and the substrate holder used in the plating apparatus will be described with reference to the drawings. In the drawings, the same or similar components are designated by the same or similar reference numerals, and the repeated description of the same or similar elements is omitted in the description of the various embodiments. Further, the features shown in the various embodiments can be applied to other embodiments as long as they do not contradict each other. In addition, in the present specification, the "substrate" includes a magnetic recording medium, a magnetic recording sensor, a mirror, an optical element, a micro mechanical element, or a partial production in addition to a semiconductor substrate, a glass substrate, and a printed circuit board. The integrated circuit. The substrate includes any shape (square, round, etc.). In addition, the expressions "front", "back", "front", "rear", "up", "down", "left", "right", etc. are used in this specification, and these are displayed for convenience of explanation. The position and orientation on the illustrated paper surface may differ in the actual configuration when the device is used.

第一圖係顯示鍍覆裝置之一個實施形態的模式圖。如第一圖所示,鍍覆裝置具備:架台101;控制鍍覆裝置之運轉的控制部103;裝載及卸載基板W(參照第二圖)之裝載/卸載部170A;在基板固持器11(參照第二圖)上放置基板W,且從基板固持器11卸下基板W之基板放置部(機械房、基板裝卸部)170B;鍍覆基板W之處理部(前處理室、鍍覆室)170C;收納基板固持器11之固持器存儲部(暫存室)170D;及清洗及乾燥鍍覆後之基板W的清洗部170E。 本實施形態之鍍覆裝置係藉由電流在鍍覆液中流動,以金屬鍍覆基板W之第一面及第二面的電解鍍覆裝置。第一面及第二面係彼此相對之面,本實施形態係表面及背面。此外,成為本實施形態處理對象之基板W係半導體封裝基板等。此外,分別在基板W之表面側及背面側形成由種層等構成之導電層,進一步在該導電層上之圖案面形成區域形成有抗蝕層,在該抗蝕層中預先形成有溝渠(Trench)及連通孔(Via)。本實施形態中,可包含具備連接基板表面與背面之貫穿孔的基板(即通孔基板)作為處理對象。 The first figure shows a schematic view of one embodiment of a plating apparatus. As shown in the first figure, the plating apparatus includes a gantry 101, a control unit 103 that controls the operation of the plating apparatus, a loading/unloading unit 170A that loads and unloads the substrate W (see FIG. 2), and a substrate holder 11 ( Referring to the second drawing), the substrate W is placed thereon, and the substrate placement portion (machine room, substrate attaching and detaching portion) 170B of the substrate W is removed from the substrate holder 11; the processing portion (pretreatment chamber, plating chamber) for plating the substrate W 170C; a holder storage portion (storage chamber) 170D for accommodating the substrate holder 11; and a cleaning portion 170E for cleaning and drying the plated substrate W. The plating apparatus of the present embodiment is an electrolytic plating apparatus that applies a current to the plating liquid to plate the first surface and the second surface of the substrate W with a metal. The first surface and the second surface are opposed to each other, and the present embodiment is a front surface and a back surface. Further, the substrate W to be processed in the present embodiment is a semiconductor package substrate or the like. Further, a conductive layer made of a seed layer or the like is formed on the front surface side and the back surface side of the substrate W, and a resist layer is further formed on the pattern surface forming region on the conductive layer, and a trench is formed in advance in the resist layer ( Trench) and connecting holes (Via). In the present embodiment, a substrate (that is, a via substrate) having a through hole connecting the surface of the substrate and the back surface may be included as a processing target.

如第一圖所示,架台101由複數個架台構件101a~101h構成,此等架台構件101a~101h可連結而構成。裝載/卸載部170A之元件配置於第一架台構件101a上,基板放置部170B之元件配置於第二架台構件101b上,處理部170C之元件配置於第三架台構件101c~第六架台構件101f上,固持器存儲部170D之元件配置於第七架台構件101g及第八架台構件101h上。 As shown in the first figure, the gantry 101 is composed of a plurality of gantry members 101a to 101h, and the gantry members 101a to 101h can be coupled to each other. The components of the loading/unloading unit 170A are disposed on the first gantry member 101a, the components of the substrate placing portion 170B are disposed on the second gantry member 101b, and the components of the processing portion 170C are disposed on the third gantry member 101c to the sixth gantry member 101f. The components of the holder storage unit 170D are disposed on the seventh gantry member 101g and the eighth gantry member 101h.

裝載/卸載部170A設有:搭載收納鍍覆前之基板W的匣盒(無圖示)之裝載載台105;及搭載接收以處理部170C鍍覆之基板W的匣盒(無圖示)之卸載載台107。進一步在裝載/卸載部170A中配置有由搬送基板W之搬送用機器人構成的基板搬送裝置122。 The loading/unloading unit 170A is provided with a loading stage 105 on which a cassette (not shown) for storing the substrate W before plating is mounted, and a cassette (not shown) on which the substrate W plated by the processing unit 170C is mounted. The loading stage 107 is unloaded. Further, the substrate transfer device 122 including the transfer robot that transports the substrate W is disposed in the loading/unloading unit 170A.

基板搬送裝置122進入搭載於裝載載台105之匣盒,從匣盒取出鍍覆前之基板W,將基板W送交基板放置部170B而構成。基板放置部170B將鍍覆前之基板W放置於基板固持器11上,並將鍍覆後之基板W從基板固持器11取出。 The substrate transfer device 122 enters the cassette mounted on the loading stage 105, takes out the substrate W before plating from the cassette, and sends the substrate W to the substrate placement portion 170B. The substrate placing portion 170B places the substrate W before plating on the substrate holder 11 and takes out the plated substrate W from the substrate holder 11.

處理部170C中配置有:預濕槽126、預浸槽128、第一沖洗槽130a、噴吹槽132、第二沖洗槽130b、第一鍍覆槽10a、第二鍍覆槽10b、第三沖洗槽130c、第三鍍覆槽10c。此等槽126、128、130a、132、130b、10a、10b、130c、10c依該 順序配置。以下說明時,會將第一鍍覆槽10a、第二鍍覆槽10b、第三鍍覆槽10c合併,或是參照此等鍍覆槽中任意的鍍覆槽,而稱為鍍覆槽10。 The treatment unit 170C is provided with a pre-wet tank 126, a pre-dip tank 128, a first rinse tank 130a, a blowing tank 132, a second rinse tank 130b, a first plating tank 10a, a second plating tank 10b, and a third. The tank 130c and the third plating tank 10c are rinsed. These slots 126, 128, 130a, 132, 130b, 10a, 10b, 130c, 10c are arranged in this order. In the following description, the first plating tank 10a, the second plating tank 10b, and the third plating tank 10c are combined, or any plating tank in any of the plating tanks is referred to as a plating tank 10 .

預濕槽126係進行前處理準備而將基板W浸漬於純水中。預浸槽128係藉由藥劑蝕刻除去形成於基板W表面之種層等導電層表面的氧化膜。第一沖洗槽130a係以清洗液(例如純水)清洗預浸後之基板W。 The pre-wet groove 126 is prepared by pretreatment to immerse the substrate W in pure water. The prepreg 128 removes an oxide film formed on the surface of a conductive layer such as a seed layer on the surface of the substrate W by a chemical etching. The first rinse tank 130a cleans the pre-impregnated substrate W with a cleaning liquid (for example, pure water).

第一鍍覆槽10a、第二鍍覆槽10b、及第三鍍覆槽10c之至少1個鍍覆槽10係鍍覆基板W之兩面。另外,在第一圖所示之實施形態中,鍍覆槽10係3個,不過其他實施形態亦可具備任意數量之鍍覆槽10。 At least one plating tank 10 of the first plating tank 10a, the second plating tank 10b, and the third plating tank 10c is plated on both surfaces of the substrate W. Further, in the embodiment shown in the first embodiment, the number of plating tanks 10 is three. However, in other embodiments, any number of plating tanks 10 may be provided.

第二沖洗槽130b係將以第一鍍覆槽10a或第二鍍覆槽10b鍍覆後之基板W與基板固持器11一起用清洗液(例如純水)清洗。第三沖洗槽130c係將被第三鍍覆槽10c鍍覆後之基板W與基板固持器11一起用清洗液(例如純水)清洗。噴吹槽132係在鍍覆處理前後進行清洗後之基板W的脫液。 The second rinse tank 130b washes the substrate W plated with the first plating tank 10a or the second plating tank 10b together with the substrate holder 11 with a cleaning liquid (for example, pure water). The third rinse tank 130c cleans the substrate W that has been plated by the third plating tank 10c together with the substrate holder 11 with a cleaning liquid (for example, pure water). The blowing groove 132 is a liquid removal of the substrate W after cleaning before and after the plating treatment.

預濕槽126、預浸槽128、沖洗槽130a~130c、及鍍覆槽10a~10c係在此等內部可貯存處理液(液體)之處理槽。此等處理槽具備貯存處理液之複數個處理室,不過不限於本實施形態,此等處理槽亦可具備單一的處理室。此外,亦可此等處理槽之至少一部分具備單一的處理室,而其他處理槽具備複數個處理室。 The pre-wet tank 126, the pre-dip tank 128, the rinsing tanks 130a-130c, and the plating tanks 10a-10c are the processing tank which can store the process liquid (liquid) internally. These processing tanks have a plurality of processing chambers for storing the processing liquid. However, the processing tanks are not limited to the embodiment, and the processing tanks may be provided with a single processing chamber. Further, at least a portion of the processing tanks may have a single processing chamber, and the other processing tanks may have a plurality of processing chambers.

鍍覆裝置進一步具備搬送基板固持器11之搬送機140。搬送機140構成可在鍍覆裝置之元件間移動。搬送機140具備:從基板放置部170B至處理部170C在水平方向延伸之固定座142;及構成可沿著固定座142移動之複數個傳輸機141。 The plating apparatus further includes a conveyor 140 that transports the substrate holder 11 . The conveyor 140 is configured to move between components of the plating apparatus. The conveyor 140 includes a fixing base 142 that extends in the horizontal direction from the substrate placing portion 170B to the processing portion 170C, and a plurality of conveyors 141 that are movable along the fixing base 142.

此等傳輸機141分別具有用於保持基板固持器11之活動部(無圖示),而構成可保持基板固持器11。傳輸機141係構成在基板放置部170B、固持器存儲部170D、及處理部170C之間搬送基板固持器11,進一步使基板固持器11與基板W一起上下運動。例如,傳輸機141之1個藉由使保持基板W之基板固持器11從鍍覆槽10上下降,可使基板W與基板固持器11一起浸漬於鍍覆槽10內的鍍覆液中。傳輸機141之移動機構例如可採用馬達與齒輪齒條副的組合。另外,第一圖所示之實施形態係設有3個傳輸機,不過其他實施形態亦可採用任意數量之傳輸機。 These conveyors 141 each have a movable portion (not shown) for holding the substrate holder 11, and are configured to hold the substrate holder 11. The conveyor 141 is configured to transport the substrate holder 11 between the substrate placing portion 170B, the holder storage portion 170D, and the processing portion 170C, and further move the substrate holder 11 up and down together with the substrate W. For example, one of the conveyors 141 can be immersed in the plating solution in the plating tank 10 together with the substrate holder 11 by lowering the substrate holder 11 holding the substrate W from the plating tank 10. The moving mechanism of the conveyor 141 can employ, for example, a combination of a motor and a rack and pinion pair. Further, in the embodiment shown in the first embodiment, three conveyors are provided, but in other embodiments, any number of conveyors may be employed.

(基板固持器) (substrate holder)

第二A圖係從基板固持器之第一側觀看的立體圖。第二B圖係從基板固持器之第二側觀看的立體圖。第三A圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。第三B圖係從第二側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。第四A圖係從第一保持構件之第一側觀看的分解立體圖。第四B圖係從第一保持構件之第二側觀看的分解立體圖。第四C圖係配線收容部之立體圖。第五A圖係從第二保持構件之第一側觀看的分解立體圖。第五B圖係從第二保持構件之第二側觀看的分解立體圖。 The second A is a perspective view from the first side of the substrate holder. The second B diagram is a perspective view from the second side of the substrate holder. The third A is a perspective view of the first holding member and the second holding member in which the substrate holder is in an open state as viewed from the first side. The third B is a perspective view of the first holding member and the second holding member in which the substrate holder is in an open state as viewed from the second side. The fourth A diagram is an exploded perspective view from the first side of the first holding member. The fourth B diagram is an exploded perspective view from the second side of the first holding member. The fourth C diagram is a perspective view of the wiring accommodating portion. The fifth A diagram is an exploded perspective view from the first side of the second holding member. The fifth B diagram is an exploded perspective view from the second side of the second holding member.

基板固持器11具備:具有第一開口部112A之第一保持構件110A;及具有第二開口部112B之第二保持構件110B。基板固持器11係藉由第一保持構件110A及第二保持構件110B夾著基板W來保持基板W。第一保持構件110A及第二保持構件110B分別藉由第一開口部112A及第二開口部112B,以基板W之第一面(表面)及第二面(背面)的各個被鍍覆面露出之方式保持。換言之,第一開口部112A係藉由從兩側僅夾著基板W之外周部來保持基板W。基板固持器11具 備支臂部160,支臂部160在保持於傳輸機141之狀態下搬送。以下之說明,有時將基板固持器11中露出基板W的第一面(表面)之側稱為第一側,並將露出基板的第二面(背面)之側稱為第二側。第二A圖係顯示基板W之第一面(表面)從第一保持構件110A的第一開口部112A露出。第二B圖係顯示基板W之第二面(背面)從第二保持構件110B之第二開口部112B露出。 The substrate holder 11 includes a first holding member 110A having a first opening portion 112A and a second holding member 110B having a second opening portion 112B. In the substrate holder 11 , the substrate W is held by sandwiching the substrate W between the first holding member 110A and the second holding member 110B. The first holding member 110A and the second holding member 110B are exposed by the respective coated surfaces of the first surface (surface) and the second surface (back surface) of the substrate W by the first opening portion 112A and the second opening portion 112B, respectively. Way to keep. In other words, the first opening portion 112A holds the substrate W by sandwiching only the outer peripheral portion of the substrate W from both sides. The substrate holder 11 has an arm portion 160, and the arm portion 160 is conveyed while being held by the conveyor 141. In the following description, the side of the substrate holder 11 on which the first surface (surface) of the substrate W is exposed may be referred to as a first side, and the side on which the second surface (back surface) of the substrate is exposed may be referred to as a second side. The second A diagram shows that the first surface (surface) of the substrate W is exposed from the first opening portion 112A of the first holding member 110A. The second B diagram shows that the second surface (back surface) of the substrate W is exposed from the second opening portion 112B of the second holding member 110B.

本實施形態之基板固持器11係用於保持方形的基板W者,不過並非限定於此者,亦可為保持圓形之基板者。此時,第一開口部112A及第二開口部112B亦成為圓形。或是,基板W亦可為六角形等之多角形基板。此時,第一開口部112A及第二開口部112B亦同樣地成為多角形。 The substrate holder 11 of the present embodiment is for holding a square substrate W, but is not limited thereto, and may be a substrate that holds a circular shape. At this time, the first opening portion 112A and the second opening portion 112B also have a circular shape. Alternatively, the substrate W may be a polygonal substrate such as a hexagon. At this time, the first opening portion 112A and the second opening portion 112B are also polygonal in the same manner.

第一保持構件110A具備:第一本體部111A、第一配線收容部150A、第一支臂部160A(第三A圖、第四A圖)。第二保持構件110B具備:第二本體部111B、第二配線收容部150B、第二支臂部160B(第三A圖、第五A圖)。 The first holding member 110A includes a first body portion 111A, a first wire accommodating portion 150A, and a first arm portion 160A (third A picture, fourth A picture). The second holding member 110B includes a second main body portion 111B, a second wiring accommodating portion 150B, and a second arm portion 160B (third A diagram, fifth A diagram).

第一本體部111A與第二本體部111B一起提供保持基板W之本體部111(第二A圖、第三A圖)。第一本體部111A具備形成有第一開口部112A之第一本體1110A、及後述之密封、基板接點等構成構件。第一本體1110A係在嚙合第一保持構件110A與第二保持構件110B時,具有成為外側及內側之外側面及內側面的板狀構件。在第一本體1110A之內側面配置有密封、基板接點等構成構件。第一本體部111A在第一配線收容部150A之突出部157A的兩側具有安裝於第一配線收容部150A之安裝部155A的安裝部113A(第四A圖)。各安裝部113A在第一配線收容部150A之突出部157A的兩側突出。此外,第一本體部111A具有安裝於第一配線收容部150A側概略中央部之安裝部158A的作為突出部之安裝部114A(第四A圖)。安裝部113A、114A、安裝部155A、158A中設有螺栓孔等安 裝構造。安裝部113A、114A以螺栓等緊固構件固定於安裝部155A、158A。本實施形態之安裝部113A、114A係與第一本體1110A一體形成。 The first body portion 111A and the second body portion 111B together provide a body portion 111 (second A, third A) that holds the substrate W. The first main body portion 111A includes a first main body 1110A in which the first opening portion 112A is formed, and a constituent member such as a seal or a substrate contact to be described later. The first body 1110A has a plate-like member that becomes the outer side and the inner side and the inner side when the first holding member 110A and the second holding member 110B are engaged. A constituent member such as a seal or a substrate contact is disposed on the inner side surface of the first body 1110A. The first main body portion 111A has a mounting portion 113A (fourth A diagram) attached to the mounting portion 155A of the first wiring accommodating portion 150A on both sides of the protruding portion 157A of the first wiring accommodating portion 150A. Each of the mounting portions 113A protrudes on both sides of the protruding portion 157A of the first wiring accommodating portion 150A. Further, the first main body portion 111A has a mounting portion 114A (a fourth A diagram) as a protruding portion of the mounting portion 158A attached to the substantially central portion of the first wiring accommodating portion 150A side. Mounting portions 113A and 114A and mounting portions 155A and 158A are provided with mounting structures such as bolt holes. The attachment portions 113A and 114A are fixed to the attachment portions 155A and 158A by fastening members such as bolts. The mounting portions 113A and 114A of the present embodiment are integrally formed with the first body 1110A.

第一配線收容部150A提供使複數條配線L(電流路徑)通過之路徑,並且提供收容各配線L多餘長度部分之配線收容部150(第二A圖、第三A圖)。第一配線收容部150A具有收容空間152A(第四C圖)。收容空間152A提供使從第一支臂部160A之外部連接部161A延伸至基板接點的複數條配線L(電流路徑)通過之路徑,並且收容各配線L之多餘長度部分。第一配線收容部150A具有關閉收容空間152A之第一蓋部151A。本實施形態係以個別之配線L連接各外部連接接點168與各基板接點117,並藉由將各配線L之長度形成概略相同長度,而使各外部連接接點168與各基板接點117(第十二B圖)間之電阻值均勻。這是為了使流入各基板接點117之電流均勻。此時,各外部連接接點168與各基板接點117間之距離依基板接點117之位置而不同,並配合距離最大的路徑來設定配線長度。因而,依基板接點117之位置,而產生配線多餘長度部分,並將其收納在第一配線收容部150A中。 The first wire accommodating portion 150A provides a path through which a plurality of wires L (current path) are passed, and provides a wire accommodating portion 150 (second A diagram, third A diagram) that accommodates an excess length portion of each of the wires L. The first wiring accommodating portion 150A has a housing space 152A (fourth C diagram). The accommodating space 152A provides a path through which a plurality of wires L (current paths) extending from the external connection portion 161A of the first arm portion 160A to the substrate contacts pass, and accommodates excess length portions of the respective wires L. The first wire accommodating portion 150A has a first cover portion 151A that closes the accommodating space 152A. In the present embodiment, each of the external connection contacts 168 and each of the substrate contacts 117 are connected by an individual wiring L, and the lengths of the respective wirings L are formed to have substantially the same length, so that the external connection contacts 168 are connected to the respective substrates. The resistance value between 117 (Fig. 12B) is uniform. This is to make the current flowing into the substrate contacts 117 uniform. At this time, the distance between each external connection contact 168 and each substrate contact 117 differs depending on the position of the substrate contact 117, and the wiring length is set in accordance with the path having the largest distance. Therefore, the excess length portion of the wiring is generated depending on the position of the substrate contact 117, and is accommodated in the first wiring accommodating portion 150A.

第一配線收容部150A具有安裝於第一支臂部160A之安裝部166A的2個安裝部154A(第四A圖)。安裝部154A中設有用於安裝於第一支臂部160A之螺栓孔等的安裝構造。此外,第一配線收容部150A進一步具有:分別安裝於第一本體部111A之2處的安裝部113A之2個安裝部155A;及安裝於第一本體部111A之安裝部114A的安裝部158A。安裝部155A、158A中設有用於安裝於第一配線收容部150A之螺栓孔等的安裝構造。第一配線收容部150A對第一支臂部160A及第一本體部111A,在各安裝部中例如藉由螺栓等之旋緊機構固定。 The first wire accommodating portion 150A has two mounting portions 154A (fourth A diagram) attached to the mounting portion 166A of the first arm portion 160A. The mounting portion 154A is provided with a mounting structure for attaching to a bolt hole or the like of the first arm portion 160A. Further, the first wiring accommodating portion 150A further includes two mounting portions 155A of the mounting portion 113A attached to the two main body portions 111A, and a mounting portion 158A attached to the mounting portion 114A of the first body portion 111A. The mounting portions 155A and 158A are provided with a mounting structure for attaching to a bolt hole or the like of the first wiring accommodating portion 150A. The first wire accommodating portion 150A fixes the first arm portion 160A and the first body portion 111A to each of the mounting portions by, for example, a fastening mechanism such as a bolt.

第一支臂部160A與第二支臂部160B一起提供傳輸機141保持之部分,以及在鍍覆槽中保持的支臂部160(第二A圖、第三A圖)。第一支臂部160A具備細長板狀構件或棒狀構件。第一支臂部160A具有:外部連接部161A、與用於保護外部連接部161A及配線L之外部連接部護蓋162A。此外,第一支臂部160A具有與第二保持構件110B之第二支臂部160B嚙合的嚙合部164A、165A(第三B圖)。第一支臂部160A與第二支臂部160B藉由嚙合部164A、165A而彼此嚙合定位。此外,第一支臂部160A具有分別對應於第一配線收容部150A之2個安裝部154A的2個安裝部166A(第四A圖)。如第四B圖及第六D圖所示,嚙合部165A具備比細長板狀構件或棒狀構件之其他部分(例如,中央部分)在第一本體部111A側延長的薄部1650A。此外,在薄部1650A之第一本體部111A側凸緣狀地設有具有與其他部分(例如,中央部分)概略相同厚度的部分。此外,在薄部1650A之外部連接部161A側設有比薄部厚的方塊狀部分。因此,薄部1650A成為從三方面包圍之凹部,可在該凹部中嚙合第二支臂部160B之端部165B。 The first arm portion 160A together with the second arm portion 160B provides a portion that the conveyor 141 holds, and an arm portion 160 that is held in the plating tank (second A, third A). The first arm portion 160A is provided with an elongated plate member or a rod member. The first arm portion 160A has an external connection portion 161A and an external connection portion cover 162A for protecting the external connection portion 161A and the wiring L. Further, the first arm portion 160A has meshing portions 164A, 165A (third B-picture) that mesh with the second arm portion 160B of the second holding member 110B. The first arm portion 160A and the second arm portion 160B are engaged with each other by the engaging portions 164A, 165A. Further, the first arm portion 160A has two mounting portions 166A (fourth A diagram) corresponding to the two mounting portions 154A of the first wiring accommodating portion 150A. As shown in FIGS. 4B and 6D, the engaging portion 165A includes a thin portion 1650A that is longer than the other portion (for example, the central portion) of the elongated plate-shaped member or the rod-shaped member on the first main body portion 111A side. Further, a portion having a thickness substantially the same as that of the other portion (for example, the central portion) is provided in a flange shape on the side of the first body portion 111A of the thin portion 1650A. Further, a rectangular portion thicker than the thin portion is provided on the outer connecting portion 161A side of the thin portion 1650A. Therefore, the thin portion 1650A is a recess surrounded by three aspects, and the end portion 165B of the second arm portion 160B can be engaged in the recess.

第十六A圖係在與第一保持構件之第一支臂部的外部連接部相反側之定位部附近的放大立體圖。第十六B圖係第一保持構件之第一支臂部的外部連接部側之定位部附近的放大立體圖。如第十六A圖及第十六B圖所示,第一支臂部160A在其兩端部具有用於將基板固持器11在基板放置部170B及鍍覆槽10中定位的定位部163R、163L。各定位部163R、163L具有定位孔,並藉由與設於基板放置部170B及鍍覆槽10之定位銷(無圖示)嚙合,可將基板固持器11定位。另外,亦可將一方定位孔作成長孔來調整基板固持器11在左右方向的位置。第十六A圖中顯示將定位部163L之定位孔形成長孔的情況。 Fig. 16A is an enlarged perspective view showing the vicinity of the positioning portion on the side opposite to the external connection portion of the first arm portion of the first holding member. Fig. 16B is an enlarged perspective view showing the vicinity of the positioning portion on the outer connecting portion side of the first arm portion of the first holding member. As shown in FIGS. 16A and 16B, the first arm portion 160A has positioning portions 163R for positioning the substrate holder 11 in the substrate placing portion 170B and the plating groove 10 at both end portions thereof. , 163L. Each of the positioning portions 163R and 163L has a positioning hole, and the substrate holder 11 can be positioned by being engaged with a positioning pin (not shown) provided in the substrate placing portion 170B and the plating groove 10. Further, one of the positioning holes may be used as a growth hole to adjust the position of the substrate holder 11 in the left-right direction. The case where the positioning hole of the positioning portion 163L is formed into a long hole is shown in Fig. 16A.

第二保持構件110B具備:第二本體部111B、第二配線收容部150B、第二支臂部160B(第三A圖、第五A圖)。由於第二本體部111B及第二配線收容部150B之構成與第一本體部111A及第一配線收容部150A的構成概略相同,因此省略詳細之說明,並在同樣之構成中註記相同編號與英文字母B所顯示的符號。 The second holding member 110B includes a second main body portion 111B, a second wiring accommodating portion 150B, and a second arm portion 160B (third A diagram, fifth A diagram). Since the configurations of the second main body portion 111B and the second electric wire accommodating portion 150B are substantially the same as those of the first main body portion 111A and the first electric wire accommodating portion 150A, the detailed description thereof will be omitted, and the same reference numerals and the same numbers will be noted in the same configuration. The symbol displayed by the letter B.

第二支臂部160B具備細長板狀構件或棒狀構件。第二支臂部160B具有:外部連接部161B、與用於保護外部連接部161B及配線L之外部連接部護蓋162B。此外,第二支臂部160B具有分別對應於第二配線收容部150B之2個安裝部154B的2個安裝部166B(第五A圖)。第二支臂部160B藉由安裝部166B,例如藉由螺栓等旋緊機構而固定於第二配線收容部150B之安裝部154B。此外,第二支臂部160B在2個安裝部166B之間具有寬度比其他部分窄之狹窄部164B。 The second arm portion 160B is provided with an elongated plate member or a rod member. The second arm portion 160B has an external connection portion 161B and an external connection portion cover 162B for protecting the external connection portion 161B and the wiring L. Further, the second arm portion 160B has two mounting portions 166B (fifth A diagram) corresponding to the two mounting portions 154B of the second wiring accommodating portion 150B. The second arm portion 160B is fixed to the mounting portion 154B of the second wire accommodating portion 150B by the attaching portion 166B by, for example, a tightening mechanism such as a bolt. Further, the second arm portion 160B has a narrow portion 164B having a narrower width than the other portions between the two attachment portions 166B.

第六A圖係從第一側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。第六B圖係從第二側觀看第一支臂部及第二支臂部嚙合之狀態的支臂部附近之放大立體圖。第六C圖係從第一側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。第六D圖係從第二側觀看開放第一支臂部及第二支臂部之狀態的支臂部附近之放大立體圖。 The sixth A diagram is an enlarged perspective view of the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are engaged from the first side. Fig. 6B is an enlarged perspective view showing the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are engaged from the second side. The sixth C is an enlarged perspective view of the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are opened from the first side. The sixth D diagram is an enlarged perspective view of the vicinity of the arm portion in a state in which the first arm portion and the second arm portion are opened from the second side.

如第六A~D圖所示,第一支臂部160A之嚙合部164A與第二支臂部160B之外部連接部護蓋162B的上面及端面嚙合(第六A圖、第六B圖)。在第一支臂部160A之嚙合部165A的凹部嚙合與第二支臂部160B之外部連接部護蓋162B相反側的端部165B(第六B圖)。此時,第一支臂部160A之嚙合部165A係從上下方向及端面側嵌合第二支臂部160B之端部165B的形狀。因而,第一支臂部160A及第二支臂部160B整體在第一支臂部160A重疊於第二支臂部160B之上 方的狀態下彼此嚙合。亦即,在第一保持構件110A與第二保持構件110B嚙合狀態下,第一支臂部160A與第二支臂部160B在從第一及第二本體部111A、111B朝向第一及第二支臂部160A、160B之方向排列。亦即,在第一支臂部160A及第二支臂部160B中,分別分配基板固持器11之上方及下方的空間,而分開上下棲息。藉由該構成可抑制或防止基板固持器11在厚度方向之尺寸增大。 As shown in the sixth A to D, the meshing portion 164A of the first arm portion 160A meshes with the upper surface and the end surface of the outer connecting portion cover 162B of the second arm portion 160B (Fig. 6A, Fig. 6B). . The recessed portion of the engaging portion 165A of the first arm portion 160A engages with the end portion 165B on the opposite side of the outer connecting portion cover 162B of the second arm portion 160B (Fig. 6B). At this time, the meshing portion 165A of the first arm portion 160A has a shape in which the end portion 165B of the second arm portion 160B is fitted from the vertical direction and the end surface side. Therefore, the first arm portion 160A and the second arm portion 160B are integrally engaged with each other in a state where the first arm portion 160A overlaps the second arm portion 160B. That is, in a state where the first holding member 110A and the second holding member 110B are engaged, the first arm portion 160A and the second arm portion 160B are oriented from the first and second body portions 111A, 111B toward the first and second portions. The arms 160A and 160B are arranged in the direction. That is, in the first arm portion 160A and the second arm portion 160B, the spaces above and below the substrate holder 11 are respectively distributed, and are vertically separated. With this configuration, the size of the substrate holder 11 in the thickness direction can be suppressed or prevented from increasing.

此外,在第二支臂部160B之狹窄部164B的部分,在第一支臂部160A與第二支臂部160B之間形成有間隙,而形成傳輸機141之爪(用於握持基板固持器11之爪)的退入空間。 Further, in a portion of the narrow portion 164B of the second arm portion 160B, a gap is formed between the first arm portion 160A and the second arm portion 160B to form a claw of the conveyor 141 (for holding the substrate holding) The retraction space of the claw of the device 11).

此外,如第六A~D圖所示,嚙合第一支臂部160A及第二支臂部160B時,第一及第二支臂部160A、160B之第一及第二外部連接部161A、161B係以彼此不致干擾之方式而配置於基板固持器11之寬度方向的相反側。亦即,第一及第二外部連接部161A、161B位於基板固持器11之左右兩端,換言之,位於支臂部160之左右兩端。在鍍覆槽10中,由於可從基板固持器11之支臂部160的左右兩端對基板W之第一面及第二面進行饋電,因此,比起使外部連接部集中在支臂部160之一方端部的形態,可防止基板固持器11之厚度增大。 Further, as shown in FIGS. 6A to D, when the first arm portion 160A and the second arm portion 160B are engaged, the first and second outer connecting portions 161A of the first and second arm portions 160A and 160B, 161B is disposed on the opposite side of the width direction of the substrate holder 11 so as not to interfere with each other. That is, the first and second outer connecting portions 161A, 161B are located at the left and right ends of the substrate holder 11, in other words, at the left and right ends of the arm portion 160. In the plating tank 10, since the first surface and the second surface of the substrate W can be fed from the left and right ends of the arm portion 160 of the substrate holder 11, the external connection portion is concentrated on the arm. The form of one end portion of the portion 160 prevents the thickness of the substrate holder 11 from increasing.

第七A圖係用於顯示從第一外部連接部至第一本體部之配線的路徑構成之第一保持構件的部分透視立體圖。第七B圖係在第一本體部與配線收容部之連結部中的第一本體部立體圖。第七C圖係從內側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。第七D圖係從外側觀看在配線收容部與第一本體部之連結部中的配線收容部立體圖。另外,以下之說明係說明第一保持構件110A之配線L的路徑構成,不過,關於第二保持構件110B之配線L的路徑亦同。 The seventh A diagram is a partial perspective perspective view of the first holding member for displaying the path of the wiring from the first external connection portion to the first body portion. FIG. 7B is a perspective view of the first body portion in the connection portion between the first body portion and the wiring accommodating portion. The seventh C is a perspective view of the wiring accommodating portion in the connection portion between the wiring accommodating portion and the first main body portion as viewed from the inside. The seventh D diagram is a perspective view of the wiring accommodating portion in the connection portion between the wiring accommodating portion and the first main body portion as viewed from the outside. In addition, the following description explains the path configuration of the wiring L of the first holding member 110A, but the path of the wiring L of the second holding member 110B is also the same.

如第七A圖所示,連接於第一外部連接部161A之複數條配線L通過第一配線收容部150A內側之收容空間152A(第四C圖),再通過設於第一本體部111A之配線孔116A(第七A、B圖)而導入第一本體部111A內。配線孔116A係藉由加工而形成的錐孔,並對應於各配線L而設置。在第一配線收容部150A之第一本體部111A側的厚部設有對應於各配線L之複數個配線孔192A(第七C、D圖),複數條配線L通過此等配線孔192A而導出第一本體部111A側。從複數個配線孔192A送出之配線L通過第一本體部111A對應之配線孔116A(第七B圖)而導入第一本體部111A內。 As shown in FIG. 7A, the plurality of wires L connected to the first external connection portion 161A pass through the accommodating space 152A (fourth C-figure) inside the first wiring accommodating portion 150A, and pass through the first body portion 111A. The wiring hole 116A (Fig. 7A, B) is introduced into the first body portion 111A. The wiring hole 116A is a tapered hole formed by machining, and is provided corresponding to each wiring L. A plurality of wiring holes 192A (seventh C and D diagrams) corresponding to the respective wirings L are provided in the thick portion on the first main body portion 111A side of the first wiring accommodating portion 150A, and the plurality of wirings L pass through the wiring holes 192A. The first body portion 111A side is derived. The wiring L sent from the plurality of wiring holes 192A is introduced into the first main body portion 111A through the wiring hole 116A (Fig. 7B) corresponding to the first main body portion 111A.

第八圖係配線收容部及本體部之連結部中的放大俯視圖。第八A圖係第八圖之A-A的剖面圖。第八B圖係在並未形成配線孔之部分的第八圖之B-B的剖面圖。第八C圖係在形成有配線孔之部分的第八圖之C-C的剖面圖。 The eighth drawing is an enlarged plan view of the connection portion between the wiring accommodating portion and the main body portion. Figure 8A is a cross-sectional view of the A-A of the eighth figure. Fig. 8B is a cross-sectional view taken along line B-B of the eighth diagram in which the wiring hole is not formed. The eighth C diagram is a cross-sectional view taken along line C-C of the eighth diagram in which the wiring holes are formed.

如第八圖及第八A圖所示,第一本體部111A具有在寬度方向之概略中央係薄部之安裝部114A。安裝部114A在內側面(第二保持構件110B側之面)及外側面(與第二保持構件110B相反側之面)具有比第一本體部111A之其他部分厚度小的薄部構成之階差部。第一配線收容部150A具有形成對應於第一本體部111A之安裝部114A的階差部之形狀的凹部之安裝部158A及159A。第一本體部111A之安裝部114A與第一配線收容部150A的安裝部158A中例如形成有螺栓孔(無圖示),並藉由螺栓固定安裝部114A及安裝部158A。第二保持構件110B之第二本體部111B及第二配線收容部150B的構成亦同。 As shown in FIG. 8 and FIG. 8A, the first main body portion 111A has a mounting portion 114A having a thin central portion in the width direction. The mounting portion 114A has a stepped portion formed on the inner side surface (surface on the second holding member 110B side) and the outer side surface (surface opposite to the second holding member 110B) having a thickness smaller than that of the other portions of the first main body portion 111A. unit. The first wire accommodating portion 150A has mounting portions 158A and 159A that form recesses corresponding to the shape of the step portion of the mounting portion 114A of the first body portion 111A. For example, bolt holes (not shown) are formed in the mounting portion 114A of the first main body portion 111A and the mounting portion 158A of the first wiring accommodating portion 150A, and the mounting portion 114A and the mounting portion 158A are fixed by bolts. The second main body portion 111B and the second electric wire accommodating portion 150B of the second holding member 110B have the same configuration.

因為該構成係成為第一配線收容部150A之安裝部159A重疊於第一本體部111A之安裝部114A之外側面的傘構造,所以可抑制或防止鍍覆液從第一保持構件110A之外側面側侵入第一保持構件110A與第二保持構件110B之間 的內側空間200。同樣地,因為成為第二配線收容部150B之安裝部159B重疊於第二本體部111B之安裝部114B的外側面之傘構造,所以可抑制或防止鍍覆液從第二保持構件110B之外側面側(與第一保持構件110A相反側)侵入內側空間200。換言之,藉由傘構造可抑制或防止鍍覆液藉由液體槳葉等而侵入基板固持器11的內側空間200。 Since the configuration is such that the mounting portion 159A of the first wiring accommodating portion 150A overlaps the outer surface of the mounting portion 114A of the first body portion 111A, the plating liquid can be suppressed or prevented from the outside of the first holding member 110A. The side invades the inner space 200 between the first holding member 110A and the second holding member 110B. In the same manner, since the mounting portion 159B of the second wiring accommodating portion 150B is overlapped with the umbrella structure of the outer surface of the mounting portion 114B of the second main body portion 111B, the plating liquid can be suppressed or prevented from the outside of the second holding member 110B. The side (opposite side of the first holding member 110A) intrudes into the inner space 200. In other words, the umbrella structure can suppress or prevent the plating solution from intruding into the inner space 200 of the substrate holder 11 by the liquid blade or the like.

如第八圖及第八B圖所示,第一本體部111A在安裝部114A以外未形成配線孔116A之部分具有安裝部115A。安裝部115A在外側面(與第二保持構件110B相反側之面)具有由厚度比第一本體部111A之其他部分小的薄部構成之階差部。第一配線收容部150A具有由對應於第一本體部111A之安裝部115A的階差部之形狀的凸緣部構成之安裝部191A。第一保持構件110A與第二保持構件110B嚙合時,第一配線收容部150A之安裝部191A與第一本體部111A之安裝部115A的階差部嚙合。第二保持構件110B之第二本體部111B及第二配線收容部150B的構成亦同。 As shown in FIGS. 8 and 8B, the first body portion 111A has a mounting portion 115A at a portion where the wiring hole 116A is not formed other than the mounting portion 114A. The mounting portion 115A has a step portion formed of a thin portion having a smaller thickness than the other portions of the first body portion 111A on the outer side surface (the surface opposite to the second holding member 110B). The first wire accommodating portion 150A has a mounting portion 191A composed of a flange portion corresponding to the shape of the step portion of the mounting portion 115A of the first body portion 111A. When the first holding member 110A is engaged with the second holding member 110B, the mounting portion 191A of the first wiring accommodating portion 150A meshes with the step portion of the mounting portion 115A of the first body portion 111A. The second main body portion 111B and the second electric wire accommodating portion 150B of the second holding member 110B have the same configuration.

因為該構成係成為第一配線收容部150A之安裝部191A重疊於第一本體部111A之安裝部115A的外側面之傘構造,所以可抑制或防止鍍覆液從第一保持構件110A之外側面側侵入基板固持器11的內側空間200。同樣地,因為成為第二配線收容部150B之安裝部191B重疊於第二本體部111B之安裝部115B的外側面之傘構造,所以可抑制或防止鍍覆液從第二保持構件110B之外側面側侵入基板固持器11的內側空間200。換言之,藉由傘構造可抑制或防止鍍覆液藉由液體槳葉等而侵入基板固持器11的內側空間200。 Since this configuration is an umbrella structure in which the mounting portion 191A of the first wiring accommodating portion 150A is overlapped with the outer surface of the mounting portion 115A of the first body portion 111A, the plating liquid can be suppressed or prevented from the outside of the first holding member 110A. The side invades the inner space 200 of the substrate holder 11. In the same manner, since the mounting portion 191B of the second wiring accommodating portion 150B is overlapped with the umbrella structure of the outer surface of the mounting portion 115B of the second main body portion 111B, the plating liquid can be suppressed or prevented from the outside of the second holding member 110B. The side invades the inner space 200 of the substrate holder 11. In other words, the umbrella structure can suppress or prevent the plating solution from intruding into the inner space 200 of the substrate holder 11 by the liquid blade or the like.

如第八C圖所示,第八圖之C-C的位置係在第一配線收容部150A及第一本體部111A分別設有配線孔192A及配線孔116A。第一配線收容部150A與 第一本體部111A之連結構造與第八B圖的情況相同。配線L從第一配線收容部150A之收容空間152A通過配線孔192A,再通過第一本體部111A之配線孔116A。第二保持構件110B之第二本體部111B及第二配線收容部150B的構成亦同。 As shown in FIG. C, the positions of C-C in the eighth diagram are provided with wiring holes 192A and wiring holes 116A in the first wiring accommodating portion 150A and the first main body portion 111A, respectively. The connection structure between the first wire accommodating portion 150A and the first body portion 111A is the same as that in the case of the eighth B diagram. The wiring L passes through the wiring hole 192A from the accommodating space 152A of the first wiring accommodating portion 150A, and passes through the wiring hole 116A of the first main body portion 111A. The second main body portion 111B and the second electric wire accommodating portion 150B of the second holding member 110B have the same configuration.

因為該構成係成為第一配線收容部150A之安裝部191A重疊於第一本體部111A的安裝部115A之外側面的傘構造,所以可抑制或防止鍍覆液從第一保持構件110A之外側面側侵入基板固持器11的內側空間200。同樣地,因為成為第二配線收容部150B之安裝部191B重疊於第二本體部111B的安裝部115B之外側面的傘構造,所以可抑制或防止鍍覆液從第二保持構件110B之外側面側侵入基板固持器11的內側空間200。換言之,藉由傘構造可抑制或防止鍍覆液藉由液體槳葉等而侵入基板固持器11的內側空間200。 Since the configuration is such that the mounting portion 191A of the first wiring accommodating portion 150A overlaps the outer surface of the mounting portion 115A of the first body portion 111A, the plating liquid can be suppressed or prevented from the outside of the first holding member 110A. The side invades the inner space 200 of the substrate holder 11. In the same manner, since the mounting portion 191B of the second wiring accommodating portion 150B is overlapped with the umbrella structure on the outer side of the mounting portion 115B of the second main body portion 111B, the plating liquid can be suppressed or prevented from the outside of the second holding member 110B. The side invades the inner space 200 of the substrate holder 11. In other words, the umbrella structure can suppress or prevent the plating solution from intruding into the inner space 200 of the substrate holder 11 by the liquid blade or the like.

如參照第八圖至第八C圖之以上說明,第一本體部111A與第一配線收容部150A在連結部中具有第一配線收容部150A之壁部(安裝部)從外側重疊於第一本體部111A之壁部(安裝部)的傘構造。藉由該構成可抑制或防止鍍覆液從第一保持構件110A之外側面側經由第一本體部111A及第一配線收容部150A的連結部、及/或經由內側空間200侵入配線孔192A及配線孔116A。同樣地,第二本體部111B與第二配線收容部150B在連結部中具有第二配線收容部150B之壁部(安裝部)從外側重疊於第二本體部111B之壁部(安裝部)的傘構造。藉由該構成可抑制或防止鍍覆液從第二保持構件110B之外側面側經由第二本體部111B及第二配線收容部150B之連結部、及/或經由內側空間200侵入配線孔192B及配線孔116B。因為該構成可保護配線L避免鍍覆液侵入,所以可省略密閉配線孔192及配線孔116之密封構件。 As described above with reference to FIGS. 8 to 8C, the first body portion 111A and the first wire accommodating portion 150A have the wall portion (mounting portion) of the first wire accommodating portion 150A in the connecting portion overlapping from the outside from the first side. The umbrella structure of the wall portion (mounting portion) of the main body portion 111A. With this configuration, it is possible to suppress or prevent the plating solution from entering the wiring hole 192A through the connection portion between the first main body portion 111A and the first wiring accommodating portion 150A from the outer surface side of the first holding member 110A and/or through the inner space 200 and Wiring hole 116A. Similarly, the second main body portion 111B and the second wiring accommodating portion 150B have the wall portion (mounting portion) of the second wiring accommodating portion 150B in the connecting portion overlapping the wall portion (mounting portion) of the second main body portion 111B from the outside. Umbrella construction. According to this configuration, it is possible to suppress or prevent the plating liquid from entering the wiring hole 192B through the connection portion between the second main body portion 111B and the second wiring accommodating portion 150B from the outer surface side of the second holding member 110B and/or through the inner space 200 and Wiring hole 116B. Since this configuration can protect the wiring L from intrusion of the plating liquid, the sealing member that seals the wiring hole 192 and the wiring hole 116 can be omitted.

此外,本實施形態將基板固持器11配置於鍍覆槽10時,係以第一本體部111A及第一配線收容部150A之連結部、以及第二本體部111B及第二配線收容部150B之連結部比鍍覆液面S位於上方的方式,來配置各連結部之位置(第八A圖至第八C圖)。換言之,係以鍍覆液面S比基板W之保持位置上方,且比第一本體部111A及第一配線收容部150A之連結部、以及第二本體部111B及第二配線收容部150B之連結部下方的方式構成基板固持器11。因此,藉由第一本體部111A及第一配線收容部150A之連結部、以及第二本體部111B及第二配線收容部150B之連結部中的傘構造、與連結部離開鍍覆液之配置,可更有效抑制或防止鍍覆液侵入配線孔192及配線孔116。因為該構成可保護配線L避免鍍覆液侵入,所以可省略密閉配線孔192及配線孔116之密封構件。 Further, in the present embodiment, when the substrate holder 11 is placed in the plating tank 10, the connection portion between the first main body portion 111A and the first wiring accommodating portion 150A, and the second main body portion 111B and the second wiring accommodating portion 150B are The position of each connection portion (eighth A to eighth C) is arranged such that the connection portion is positioned above the plating liquid surface S. In other words, the plating liquid surface S is positioned above the holding position of the substrate W, and is connected to the connection portion between the first main body portion 111A and the first wiring accommodating portion 150A, and the second main body portion 111B and the second wiring accommodating portion 150B. The lower portion of the portion constitutes the substrate holder 11. Therefore, the arrangement of the umbrella portion in the connection portion between the first main body portion 111A and the first wiring accommodating portion 150A and the connection portion between the second main body portion 111B and the second wiring accommodating portion 150B and the arrangement of the plating liquid from the connection portion are separated from the connection portion. The plating solution can be more effectively suppressed or prevented from intruding into the wiring hole 192 and the wiring hole 116. Since this configuration can protect the wiring L from intrusion of the plating liquid, the sealing member that seals the wiring hole 192 and the wiring hole 116 can be omitted.

此外,本實施形態將基板固持器11配置於鍍覆槽10時,係以第一及第二配線收容部150A、150B比鍍覆液面S位於上方之方式,來配置第一及第二配線收容部150A、150B。由於該構成係接近本體部111兩側並在比配置槳葉之空間上方配置第一及第二配線收容部150A、150B,因此第一及第二配線收容部150A、150B之厚度方向的尺寸不易受到限制。 In the present embodiment, when the substrate holder 11 is placed in the plating tank 10, the first and second wirings are disposed such that the first and second wiring accommodating portions 150A and 150B are positioned above the plating liquid surface S. The accommodating portions 150A and 150B. Since the configuration is close to both sides of the main body portion 111 and the first and second wiring accommodating portions 150A and 150B are disposed above the space in which the blades are disposed, the first and second wiring accommodating portions 150A and 150B are not easily dimensioned in the thickness direction. restricted.

第九A圖係從第一保持構件之內側面側觀看的前視圖。第九B圖係從第一保持構件之內側面側觀看的部分放大前視圖。第九C圖係與第一保持構件一起顯示第二保持構件之在第九B圖的C-C剖面圖。 The ninth A diagram is a front view as seen from the inner side surface side of the first holding member. The ninth B diagram is a partially enlarged front view seen from the inner side surface side of the first holding member. The ninth C diagram shows a C-C cross-sectional view of the second holding member in the ninth B diagram together with the first holding member.

第九A圖、第九B圖係以第一保持構件110A為例作說明。另外,第二保持構件110B除了不具外側密封這一點之外,亦適用同樣之說明。如第九A圖所示,第一保持構件110A在第一開口部112A之周圍具有複數個基板接點117A。本實施形態係例示設置18個基板接點117A的情況,不過可依基板W之尺寸、鍍 覆電流之大小等設置任意數量的基板接點。各基板接點117A藉由各條配線L而連接於外部連接部161A(第三A圖)。 The ninth A and ninth B drawings are described by taking the first holding member 110A as an example. In addition, the second holding member 110B applies the same description except that it does not have an outer seal. As shown in FIG. 9A, the first holding member 110A has a plurality of substrate contacts 117A around the first opening portion 112A. In the present embodiment, the case where 18 substrate contacts 117A are provided is exemplified, but an arbitrary number of substrate contacts may be provided depending on the size of the substrate W, the magnitude of the plating current, and the like. Each of the substrate contacts 117A is connected to the external connection portion 161A (third A diagram) by the respective wires L.

如第九B圖所示,第一本體部111A在第一本體1110A之內側面具備:內側密封120A、用於安裝內側密封120A之密封固持器118A、外側密封121A、用於安裝外側密封121A之密封固持器119A。在密封固持器118A與密封固持器119A之間形成有供配線L通過的配線路徑127A。各基板接點117A在內側密封120A之外側藉由螺絲122A而固定於密封固持器118A。密封固持器118A在將內側密封120A夾在與第一本體1110A之間的狀態下固定於第一本體1110A(第九C圖)。本實施形態之密封固持器118A係藉由螺絲123A而固定於第一本體1110A(第九B圖)。配置螺絲123A之部分在基板接點117A上設有孔,並以螺絲123A不接觸於基板接點117A的方式構成。密封固持器119A在將外側密封121A夾在與第一本體1110A之間的狀態下固定於第一本體1110A(第九C圖)。本實施形態之密封固持器119A係藉由螺絲124A而固定於第一本體1110A(第九B圖)。 As shown in FIG. BB, the first body portion 111A is provided on the inner side surface of the first body 1110A with an inner seal 120A, a seal holder 118A for mounting the inner seal 120A, an outer seal 121A, and an outer seal 121A. Seal holder 119A. A wiring path 127A through which the wiring L passes is formed between the seal holder 118A and the seal holder 119A. Each of the substrate contacts 117A is fixed to the seal holder 118A by a screw 122A on the outer side of the inner seal 120A. The seal holder 118A is fixed to the first body 1110A (ninth C-picture) in a state where the inner seal 120A is sandwiched between the inner body 12010A and the first body 1110A. The seal holder 118A of the present embodiment is fixed to the first body 1110A (Fig. IX) by a screw 123A. A portion of the arrangement screw 123A is provided with a hole in the substrate contact 117A, and is configured such that the screw 123A does not contact the substrate contact 117A. The seal holder 119A is fixed to the first body 1110A in a state where the outer seal 121A is sandwiched between the first body 1110A (ninth C-figure). The seal holder 119A of the present embodiment is fixed to the first body 1110A (Fig. IX) by a screw 124A.

各配線L延伸至對應之基板接點117A附近,除去前端側之被覆而露出導電線125(第九B圖)。配線L之導電線125被導入設於密封固持器118A之溝126A(第九C圖)中,配線L之導電線125及基板接點117A藉由螺絲122A(第九B圖)而對密封固持器118A緊固。藉此,配線L與對應之基板接點117A電性連接。另外,第九C圖係顯示在第二保持構件110B之第二本體部111B中,配線L之導電線125及基板接點117B藉由螺絲122B而對密封固持器118A緊固的部分。第二本體部111B如第九C圖所示,除了不具外側密封及其密封固持器這一點之外,具有與第一本體部111A同樣之構成。其他實施形態亦可在第二本體部111B中設置外側密封。 Each of the wires L extends to the vicinity of the corresponding substrate contact 117A, and the coating on the front end side is removed to expose the conductive line 125 (Fig. IX). The conductive line 125 of the wiring L is introduced into the groove 126A (Fig. C) provided in the sealing holder 118A, and the conductive line 125 of the wiring L and the substrate contact 117A are sealed by the screw 122A (Fig. VIII). The device 118A is fastened. Thereby, the wiring L is electrically connected to the corresponding substrate contact 117A. Further, the ninth C diagram shows a portion where the conductive line 125 of the wiring L and the substrate contact 117B are fastened to the seal holder 118A by the screw 122B in the second body portion 111B of the second holding member 110B. As shown in FIG. 9C, the second main body portion 111B has the same configuration as the first main body portion 111A except that it does not have an outer seal and a seal holder. In other embodiments, an outer seal may be provided in the second body portion 111B.

如第九C圖所示,藉由內側密封120來密封基板W之被鍍覆區域(第一及第二開口部112A、112B側)、與第一及第二本體部111A、111B的內周側端部之間。此外,藉由第一保持構件110A之外側密封121A密合於第二保持構件110B之第二本體部111B的內側面,而將第一及第二本體部111A、111B之間在外周側密閉。結果,第一及第二本體部111A、111B之間的內部空間藉由內側密封120A、B及外側密封121A而密閉,保護基板接點117、纜線L避免鍍覆液侵入。 As shown in FIG. C, the inner region of the first and second body portions 111A and 111B is sealed by the inner seal 120 to seal the plated region (the first and second openings 112A and 112B sides) of the substrate W. Between the side ends. Further, the first holding member 110A outer side seal 121A is in close contact with the inner side surface of the second main body portion 111B of the second holding member 110B, and the first and second main body portions 111A and 111B are sealed on the outer peripheral side. As a result, the internal space between the first and second main body portions 111A and 111B is sealed by the inner seals 120A and B and the outer seal 121A, and the substrate contact 117 and the cable L are protected from intrusion of the plating liquid.

第十圖係顯示固定基板接點之螺絲配置的第一及第二本體部之剖面圖。第十一圖係顯示固定用於安裝內側密封之密封固持器的螺絲之配置的第一及第二本體部之剖面圖。如第十圖所示,固定基板接點117A之螺絲122A、與固定基板接點117B之螺絲122B在第一保持構件110A與第二保持構件110B嚙合狀態下彼此不重疊而配置。避免第一保持構件110A之螺絲122A與第二保持構件110B的螺絲122B之間干擾,可使第一保持構件110A與第二保持構件110B之間更接近。此外,如第十一圖所示,固定密封固持器118A之螺絲123A與固定密封固持器118B的螺絲123B,在第一保持構件110A與第二保持構件110B嚙合狀態下,彼此不重疊而配置。避免第一保持構件110A之螺絲123A與第二保持構件110B的螺絲123B之間干擾,可使第一保持構件110A與第二保持構件110B之間更接近。結果,避免第一保持構件110A之螺絲122A、123A與第二保持構件110B的螺絲122B、123B之間的干擾,可使第一保持構件110A與第二保持構件110B之間更接近。 Figure 11 is a cross-sectional view showing the first and second body portions of the screw arrangement of the fixed substrate contacts. The eleventh figure shows a cross-sectional view of the first and second body portions of the arrangement of the screws for fixing the seal holder for the inner seal. As shown in the tenth diagram, the screw 122A of the fixed substrate contact 117A and the screw 122B of the fixed substrate contact 117B are disposed so as not to overlap each other in a state where the first holding member 110A and the second holding member 110B are engaged with each other. Avoiding interference between the screw 122A of the first holding member 110A and the screw 122B of the second holding member 110B can bring the first holding member 110A and the second holding member 110B closer together. Further, as shown in the eleventh diagram, the screw 123A of the fixed seal holder 118A and the screw 123B of the fixed seal holder 118B are disposed so as not to overlap each other in a state where the first holding member 110A and the second holding member 110B are engaged. Avoiding interference between the screw 123A of the first holding member 110A and the screw 123B of the second holding member 110B can bring the first holding member 110A and the second holding member 110B closer together. As a result, interference between the screws 122A, 123A of the first holding member 110A and the screws 122B, 123B of the second holding member 110B can be avoided, and the first holding member 110A and the second holding member 110B can be brought closer together.

第十二A圖係卸下外部連接部護蓋狀態之外部連接部的放大立體圖。此處係以第一保持構件110A之第一外部連接部161A為例作說明,不過第二保持構件110B之第二外部連接部161B亦具有同樣之構成。第一外部連接部161A 具有對應於第一保持構件110A之基板接點117A數量之數量的個別各外部連接接點168。本實施形態係將18個基板接點117A各9個配置兩列。以下之說明,係在第十二A圖中,以紙面近端對應於基板固持器的內側,以紙面遠端對應於基板固持器的外側。第一外部連接部161A中,在複數個基板接點117A的內側設有匯流條167。各外部連接接點168藉由個別之配線L而連接於對應之基板接點117A,且彼此電性絕緣。確認通電時,如第十二D圖所示,確認通電裝置169之各接點230分別抵接於個別的外部連接接點168而電性連接。另外,鍍覆處理時,如後述,各外部連接接點168彼此電性短路而供給相同電位(第十二E圖)。其他實施形態亦可在1個外部連接接點168上連接2條以上配線L,並將此等2條以上之配線的另一端分別連接於不同的基板接點117A。此外,亦可將複數個外部連接接點168連接於複數條配線L,再將此等配線L連接於1個基板接點。 The twelfth A is an enlarged perspective view of the external connection portion in which the outer connecting portion cover is removed. Here, the first outer connecting portion 161A of the first holding member 110A is taken as an example, but the second outer connecting portion 161B of the second holding member 110B has the same configuration. The first external connection portion 161A has individual external connection contacts 168 corresponding to the number of substrate contacts 117A of the first holding member 110A. In the present embodiment, nine of the 18 substrate contacts 117A are arranged in two rows. In the following description, in the twelfth A, the proximal end of the paper corresponds to the inner side of the substrate holder, and the distal end of the paper corresponds to the outer side of the substrate holder. In the first external connection portion 161A, a bus bar 167 is provided inside the plurality of substrate contacts 117A. Each of the external connection contacts 168 is connected to the corresponding substrate contact 117A by an individual wiring L, and is electrically insulated from each other. When the energization is confirmed, as shown in FIG. 12D, it is confirmed that the respective contacts 230 of the energization device 169 are electrically connected to the respective external connection contacts 168. Further, at the time of the plating treatment, as will be described later, each of the external connection contacts 168 is electrically short-circuited to each other and supplied with the same potential (Twelfth E-E). In other embodiments, two or more wirings L may be connected to one external connection contact 168, and the other ends of the two or more wirings may be connected to different substrate contacts 117A, respectively. Further, a plurality of external connection contacts 168 may be connected to the plurality of wirings L, and the wirings L may be connected to one substrate contact.

第十二B圖係第一保持構件中之電流路徑的說明圖。第十二C圖係第二保持構件中之電流路徑的說明圖。第一保持構件110A係從第一外部連接部161A之各外部連接接點168按照箭頭顯示的路徑供給電流至各基板接點117A(第十二B圖)。第二保持構件110B係從第二外部連接部161B之各外部連接接點168按照箭頭顯示的路徑供給電流至各基板接點117B(第十二C圖)。第一保持構件110A及第二保持構件110B之各外部連接接點168、基板接點117A、117B中,在鍍覆處理時供給共用之電位,在確認通電時,則對部分或全部外部連接接點168供給不同電位。 The twelfth B-picture is an explanatory diagram of a current path in the first holding member. The twelfth Cth is an explanatory diagram of a current path in the second holding member. The first holding member 110A supplies current from each of the external connection contacts 168 of the first external connection portion 161A to each of the substrate contacts 117A in a path indicated by an arrow (Twelfth B). The second holding member 110B supplies current from each of the external connection contacts 168 of the second external connection portion 161B to each of the substrate contacts 117B in accordance with the path indicated by the arrow (Twelfth C-C). In each of the external connection contacts 168 and the substrate contacts 117A and 117B of the first holding member 110A and the second holding member 110B, a common potential is supplied during the plating process, and when the energization is confirmed, some or all of the external connections are connected. Point 168 supplies different potentials.

第十二D圖係顯示確認通電時外部連接部之各接點的連接模式圖。確認通電處理在基板放置部170B(第一圖)中係在基板固持器11夾著基板W之狀態下執行。基板放置部170B中配置有確認通電裝置169之端子230。本實施 形態之外部連接部161A具有兩列排列9個外部連接接點168之列(第十二A圖)。確認通電處理係在外部連接部161A之各外部連接接點168不接觸於匯流條167的狀態,且接觸於確認通電裝置169之端子230的狀態下執行(第十二D圖)。確認通電裝置169之各端子230可對對應之外部連接接點168供給個別的電位,且可測定任意2個外部連接接點168之間的電流。此外,還可將複數個外部連接接點168作為一群,各群測定外部連接接點168間之電流。 The twelfth D is a diagram showing the connection pattern of the contacts of the external connection portion when the energization is confirmed. It is confirmed that the energization process is performed in a state where the substrate holder 11 is sandwiched between the substrate W in the substrate placement portion 170B (first drawing). A terminal 230 for confirming the energization device 169 is disposed in the substrate placement portion 170B. The external connection portion 161A of this embodiment has two rows of nine external connection contacts 168 arranged in two rows (Fig. 12A). It is confirmed that the energization processing is performed in a state where the external connection contacts 168 of the external connection portion 161A are not in contact with the bus bar 167 and are in contact with the terminal 230 of the confirmation energization device 169 (Twelfth D). It is confirmed that each terminal 230 of the energizing device 169 can supply an individual potential to the corresponding external connection contact 168, and can measure the current between any two external connection contacts 168. In addition, a plurality of external connection contacts 168 can be used as a group, and each group measures the current between the external connection contacts 168.

例如,第十二A圖所示,將彼此相對之各列有3個的接點作為一群,分成3個群I、II、III執行確認通電處理。一個例子係在連接於群I之近端列的3個外部連接接點168之端子230、與連接於遠端列之3個外部連接接點168的端子230之間施加電位差來測定電流。其次,在連接於群II之近端列的3個外部連接接點168之端子230、與連接於遠端列之3個外部連接接點168的端子230之間施加電位差來測定電流。其次,在連接於群III之近端列的3個外部連接接點168之端子230、與連接於遠端列之3個外部連接接點168的端子230之間施加電位差來測定電流。 For example, as shown in FIG. 12A, three sets of contacts are arranged as a group, and three groups I, II, and III are divided into three groups I, II, and III to perform confirmation energization processing. One example is to measure the current by applying a potential difference between the terminal 230 of the three external connection contacts 168 connected to the proximal column of the group I and the terminal 230 connected to the three external connection contacts 168 of the distal column. Next, a potential difference is applied between the terminal 230 connected to the three external connection contacts 168 in the proximal column of the group II and the terminal 230 connected to the three external connection contacts 168 in the distal column to measure the current. Next, a potential difference is applied between the terminal 230 connected to the three external connection contacts 168 in the proximal column of the group III and the terminal 230 connected to the three external connection contacts 168 in the distal column to measure the current.

電流,例如近端之端子230為高電位,遠端之端子230為低電位時,群I係以近端之端子230、群I近端列之3個外部連接接點168、連接於此等3個接點之配線L、連接於此等配線L之基板接點117A、基板W之第一面(表面)的種層、連接於遠端之端子230的基板接點117A、配線L、遠端之3個外部連接接點168、及端子230的路徑而流動。同樣地,測定在其他2個群II、III之第一側及第二側的外部連接接點168間流動之電流。結果,電流之測定值在指定範圍內時,判定為外部連接部161A之外部連接接點168、配線L、基板接點117、基板W皆正常,並將基板固持器11搬送至處理部173C(第一圖)實施鍍覆處理。另外,電流之測定值超出指定範圍外時,表示外部連接部161A之外部連接接點168、配線L、基板 接點117或基板W有異常,而從基板固持器11取出基板W,並將基板固持器11送回固持器存儲部170D(第一圖)。 The current, for example, the terminal 230 at the proximal end is at a high potential, and when the terminal 230 at the distal end is at a low potential, the group I is connected to the terminal 230 at the proximal end, the three external connection contacts 168 at the proximal end of the group I, and the like. The wiring L of the three contacts, the substrate contact 117A connected to the wiring L, the seed layer of the first surface (surface) of the substrate W, the substrate contact 117A of the terminal 230 connected to the distal end, the wiring L, and the far The three external connection contacts 168 and the path of the terminal 230 flow. Similarly, the current flowing between the external connection contacts 168 on the first side and the second side of the other two groups II, III was measured. As a result, when the measured value of the current is within the specified range, it is determined that the external connection contact 168 of the external connection portion 161A, the wiring L, the substrate contact 117, and the substrate W are all normal, and the substrate holder 11 is transported to the processing portion 173C ( The first figure) performs a plating process. When the measured value of the current is outside the specified range, the external connection contact 168, the wiring L, the substrate contact 117, or the substrate W of the external connection portion 161A is abnormal, and the substrate W is taken out from the substrate holder 11 and the substrate is removed. The holder 11 is returned to the holder storage unit 170D (first figure).

另外,各群包含之外部連接接點數不拘,群間外部連接接點數亦可不同。此外,亦可在近端或遠端的各外部連接接點168之間施加電位差來測定電流。此外,亦可各群中包含之外部連接接點數為2個,各2個外部連接接點168測定電流。藉由各群測定外部連接接點168間之電流,容易找出異常部位。 In addition, the number of external connection contacts included in each group is not limited, and the number of external connection contacts between groups may be different. Alternatively, a potential difference can be applied between the external connection contacts 168 at the proximal or distal end to determine the current. In addition, the number of external connection contacts included in each group may be two, and the current is measured by two external connection contacts 168. It is easy to find an abnormal portion by measuring the current between the external connection contacts 168 by each group.

第二保持構件110B之第二外部連接部161B中亦設置同樣的確認通電裝置169,且對基板W之第二面(背面)執行同樣的確認通電處理。 The same confirmation energization device 169 is also provided in the second external connection portion 161B of the second holding member 110B, and the same confirmation energization process is performed on the second surface (back surface) of the substrate W.

第十二E圖係顯示鍍覆處理時外部連接部之各接點的連接模式圖。基板固持器11在鍍覆槽10之支臂收容部250中收容支臂部160而保持。支臂收容部250在鍍覆槽之兩脇分別各配置1個,藉由以支臂收容部250支撐支臂部160之兩端,可懸掛基板固持器11。支臂收容部250中配置有電流供給部240,電流供給部240上設置外部連接部161A、161B。此時,藉由第一及第二外部連接部161A、161B之本身重量或是追加的致動器等,各外部連接接點168按壓於電流供給部240,並以接觸於匯流條167之方式變形。結果,全部外部連接接點168藉由電流供給部240及匯流條167而電性短路。在該狀態下,從外部電源37(第十五圖)供給電位至電流供給部240時,全部接點168係供給相同電位。鍍覆處理時,電流在從外部電源37通過陽極31A(31B)、鍍覆液、基板W之表面(背面)的種層、基板接點117A(117B)、配線L、第一及第二外部連接部161A(161B)之各外部連接接點168,而返回外部電源37的路徑上流動。為了使外部連接接點168間之短路更確實而設置匯流條167。另外,第一外部連接部161A接觸之電流供給部240、與第二外部連接部161B接觸的電流供給部240中亦可流入不同之電流。 The twelfth E is a connection mode diagram showing the contacts of the external connection portion during the plating process. The substrate holder 11 holds and holds the arm portion 160 in the arm housing portion 250 of the plating tank 10. The arm accommodating portion 250 is disposed one by one in each of the two sides of the plating tank, and the both ends of the arm portion 160 are supported by the arm accommodating portion 250 to suspend the substrate holder 11. The arm supply unit 250 is provided with a current supply unit 240, and the current supply unit 240 is provided with external connection units 161A and 161B. At this time, each of the external connection contacts 168 is pressed against the current supply unit 240 by the weight of the first and second external connection portions 161A and 161B or an additional actuator or the like, and is in contact with the bus bar 167. Deformation. As a result, all of the external connection contacts 168 are electrically short-circuited by the current supply portion 240 and the bus bar 167. In this state, when the potential is supplied from the external power source 37 (fifteenth diagram) to the current supply unit 240, all the contacts 168 are supplied with the same potential. In the plating treatment, the current flows from the external power source 37 through the anode 31A (31B), the plating liquid, the surface layer (back surface) of the substrate W, the substrate contact 117A (117B), the wiring L, the first and second external portions. Each of the external portions of the connection portion 161A (161B) is connected to the contact 168, and flows back to the path of the external power source 37. The bus bar 167 is provided in order to make the short circuit between the external connection contacts 168 more reliable. Further, a different current may flow into the current supply unit 240 that is in contact with the first external connection portion 161A and the current supply unit 240 that is in contact with the second external connection portion 161B.

第十三A圖係說明將基板放置部中之基板設置於基板固持器的模式圖。第十三A圖包含第一保持構件110A與第二保持構件110B而模式顯示各構成。基板放置部170B(第一圖)中配置有基板裝卸裝置1000。基板裝卸裝置1000具備:旋轉裝置1100、及工作站1200。旋轉裝置1100在將基板固持器11之第二保持構件110B保持在概略水平姿勢的狀態下,進行基板W對第二保持構件110B的裝卸或搭載,並在將第二保持構件110B在概略垂直方向豎立狀態下,在保持於工作站1200之第一保持構件110A與第二保持構件110B之間夾著基板W。藉此,可將基板W對基板固持器11裝卸。工作站1200例如亦可由懸掛基板固持器11之靜止站、與將保持於靜止站之基板固持器11朝向旋轉裝置1100側而支撐的支撐裝置構成。前述之確認通電裝置例如可設於放置工作站1200之基板固持器11的支臂部160之第一及第二外部連接部161A、161B的部分。 Fig. 13A is a schematic view showing the arrangement of the substrate in the substrate placing portion on the substrate holder. The thirteenth A diagram includes the first holding member 110A and the second holding member 110B and is in a mode display configuration. The substrate attaching and detaching device 1000 is disposed in the substrate placing portion 170B (first drawing). The substrate handling device 1000 includes a rotating device 1100 and a workstation 1200. In the state in which the second holding member 110B of the substrate holder 11 is held in the substantially horizontal posture, the rotation device 1100 detaches or mounts the substrate W to the second holding member 110B, and the second holding member 110B is vertically oriented. In the erected state, the substrate W is sandwiched between the first holding member 110A and the second holding member 110B held by the workstation 1200. Thereby, the substrate W can be attached to and detached from the substrate holder 11. The workstation 1200 may be constituted by, for example, a stationary station that suspends the substrate holder 11 and a supporting device that supports the substrate holder 11 held at the stationary station toward the rotating device 1100 side. The above-described confirmation energization means can be provided, for example, at a portion where the first and second external connection portions 161A, 161B of the arm portion 160 of the substrate holder 11 of the workstation 1200 are placed.

安裝基板前之基板固持器11被分離成第一保持構件110A與第二保持構件110B,第一保持構件110A以豎立狀態配置於工作站1200,第二保持構件110B以概略水平狀態配置於旋轉裝置1100的載台上。在該狀態下,保持於搬送裝置122之機器人手臂的基板W設置於旋轉裝置1100上之第二保持構件110B上。然後,旋轉裝置1100之載台旋轉,使第二保持構件110B移動成概略垂直狀態,在該狀態下將第二保持構件110B對第一保持構件按壓,而嚙合(固定)第一保持構件110A與第二保持構件110B,並藉由第一保持構件110A與第二保持構件110B保持基板W。在該狀態下執行前述之確認通電處理。確認通電處理結果良好時,保持基板W之基板固持器11藉由傳輸機141搬送至處理部170C(第一圖)進行鍍覆處理。確認通電處理結果不良時,從基板固持器11取出基板W,並將基板固持器11送回固持器存儲部170D(第一圖)。 The substrate holder 11 before mounting the substrate is separated into the first holding member 110A and the second holding member 110B, the first holding member 110A is disposed in the standing state on the workstation 1200, and the second holding member 110B is disposed in the substantially horizontal state on the rotating device 1100. On the stage. In this state, the substrate W of the robot arm held by the transport device 122 is placed on the second holding member 110B on the rotating device 1100. Then, the stage of the rotating device 1100 rotates to move the second holding member 110B into a substantially vertical state, in which the second holding member 110B is pressed against the first holding member to engage (fix) the first holding member 110A with The second holding member 110B holds the substrate W by the first holding member 110A and the second holding member 110B. In this state, the aforementioned confirmation energization process is executed. When it is confirmed that the energization processing result is good, the substrate holder 11 holding the substrate W is transported to the processing unit 170C (first drawing) by the transporter 141 to perform a plating process. When it is confirmed that the result of the energization process is defective, the substrate W is taken out from the substrate holder 11 and the substrate holder 11 is returned to the holder storage portion 170D (first drawing).

從基板固持器11卸下基板W時,在工作站1200中,藉由旋轉裝置1100將第二保持構件110B與基板W一起從第一保持構件110A卸下。然後如第十三A圖所示,使第二保持構件110B轉動成概略水平姿勢,搬送裝置122之機器人手臂搬出基板W。 When the substrate W is detached from the substrate holder 11, in the workstation 1200, the second holding member 110B is detached from the first holding member 110A together with the substrate W by the rotating device 1100. Then, as shown in FIG. 13A, the second holding member 110B is rotated into a substantially horizontal posture, and the robot arm of the transport device 122 carries out the substrate W.

此處,係說明使第一保持構件110A及第二保持構件110B在豎立狀態下嚙合之情況,不過,亦可使第一保持構件110A及第二保持構件110B在水平狀態嚙合。 Here, the case where the first holding member 110A and the second holding member 110B are engaged in the upright state will be described, but the first holding member 110A and the second holding member 110B may be engaged in a horizontal state.

第十三B圖顯示基板固持器的固定方法之一例。第一保持構件110A與第二保持構件110B可以任意之固定方法固定。例如第十三B圖所示,第一保持構件110A與第二保持構件110B可以螺栓等旋緊機構固定。本例係在第一保持構件110A之第一本體1110A中設置螺絲孔195,並在第二保持構件110B之第二本體1110B中設置貫穿孔194,而藉由螺栓193旋緊第一保持構件110A與第二保持構件110B。另外,本例係對應於貫穿孔194而設置鍃孔194a,並將螺栓193頭部配置於鍃孔194a內。藉此,可減少基板固持器11之厚度。第一保持構件110A與第二保持構件110B適切在複數處藉由螺栓193固定而構成。此外,亦可在第一保持構件110A及第二保持構件110B之一方設置夾具,而將第一保持構件110A與第二保持構件110B彼此固定。採用任何固定方法時,仍可在基板裝卸裝置1000中設置致動器等,而採用自動固定的方法。 Fig. 13B shows an example of a method of fixing the substrate holder. The first holding member 110A and the second holding member 110B can be fixed by any fixing method. For example, as shown in FIG. 13B, the first holding member 110A and the second holding member 110B may be fixed by a fastening mechanism such as a bolt. In this example, a screw hole 195 is provided in the first body 1110A of the first holding member 110A, and a through hole 194 is provided in the second body 1110B of the second holding member 110B, and the first holding member 110A is screwed by the bolt 193. And the second holding member 110B. Further, in this example, the bore 194a is provided corresponding to the through hole 194, and the head of the bolt 193 is disposed in the bore 194a. Thereby, the thickness of the substrate holder 11 can be reduced. The first holding member 110A and the second holding member 110B are configured to be fixed at a plurality of places by bolts 193. Further, a jig may be provided on one of the first holding member 110A and the second holding member 110B, and the first holding member 110A and the second holding member 110B may be fixed to each other. When any fixing method is employed, an actuator or the like can be provided in the substrate handling apparatus 1000, and an automatic fixing method can be employed.

第十四A圖係第一保持構件之定位部附近的放大立體圖。第十四B圖係第二保持構件之定位部的放大立體圖。第一保持構件110A在第一本體部111A之第一本體1110A中具有作為定位部的突起部(定位銷)210A。第二保持構件110B在第二本體部111B之第二本體1110B中具有貫穿孔210B作為定位部。突 起部210A以螺栓等旋緊構件固定於第一本體1110A。突起部210A亦可以其他固定手段來固定於第一本體1110A,亦可與第一本體1110A一體形成。突起部210A及貫穿孔210B分別在第一本體部111A及第二本體部111B中設置複數個,第一保持構件110A及第二保持構件110B嚙合時,各貫穿孔210B中可插入、嵌合各突起部210A。藉此,進行第一保持構件110A與第二保持構件110B之間的定位。另外,亦可將貫穿孔210B設於第一保持構件110A,而將突起部210A設於第二保持構件110B。 Fig. 14A is an enlarged perspective view showing the vicinity of the positioning portion of the first holding member. The fourteenth Bth diagram is an enlarged perspective view of the positioning portion of the second holding member. The first holding member 110A has a protrusion (positioning pin) 210A as a positioning portion in the first body 1110A of the first body portion 111A. The second holding member 110B has a through hole 210B as a positioning portion in the second body 1110B of the second body portion 111B. The projecting portion 210A is fixed to the first body 1110A by a fastening member such as a bolt. The protruding portion 210A may be fixed to the first body 1110A by other fixing means, or may be integrally formed with the first body 1110A. Each of the first main body portion 111A and the second main body portion 111B is provided in a plurality of the protruding portion 210A and the through hole 210B. When the first holding member 110A and the second holding member 110B are engaged, each of the through holes 210B can be inserted and fitted. Projection portion 210A. Thereby, the positioning between the first holding member 110A and the second holding member 110B is performed. Further, the through hole 210B may be provided in the first holding member 110A, and the protruding portion 210A may be provided in the second holding member 110B.

第十五圖係概略顯示鍍覆槽10之構成的側視圖。鍍覆處理中,第一陽極固持器30A與基板W之第一面(表面)相對而配置,第二陽極固持器30B與基板W之第二面(背面)相對而配置。第一陽極固持器30A具有用於調節第一陽極31A與基板W間之電場的陽極遮罩(無圖示)。陽極遮罩例如係由電介質材料構成之概略板狀構件,且配置於第一陽極固持器30A與基板固持器11相對側之面。陽極遮罩在概略中央部具有在第一陽極31A與基板W之間流入的電流通過之開口,開口徑或邊長宜比第一陽極31A直徑或邊長小。此外,陽極遮罩亦可構成可調節開口徑或邊長。例如在開口設置複數個節流葉片,藉由與相機之光圈機構同樣的構造,可使開口徑或邊長擴大或縮小。第二陽極固持器30B之構成亦與第一陽極固持器30A同樣。 The fifteenth diagram schematically shows a side view of the configuration of the plating tank 10. In the plating treatment, the first anode holder 30A is disposed to face the first surface (surface) of the substrate W, and the second anode holder 30B is disposed to face the second surface (back surface) of the substrate W. The first anode holder 30A has an anode mask (not shown) for adjusting the electric field between the first anode 31A and the substrate W. The anode mask is, for example, a schematic plate member made of a dielectric material, and is disposed on a surface of the first anode holder 30A opposite to the substrate holder 11. The anode mask has an opening through which a current flowing between the first anode 31A and the substrate W passes at a schematic central portion, and the opening diameter or the side length is preferably smaller than the diameter or side length of the first anode 31A. In addition, the anode mask can also constitute an adjustable opening diameter or side length. For example, a plurality of throttle blades are provided in the opening, and the opening diameter or the side length can be enlarged or reduced by the same structure as the aperture mechanism of the camera. The second anode holder 30B is also constructed in the same manner as the first anode holder 30A.

在第一陽極固持器30A與基板固持器11之間設有第一中間遮罩36A。此外,在第二陽極固持器30B與基板固持器11之間設有第二中間遮罩36B。此等第一及第二中間遮罩36A、36B係藉由與第一及第二陽極遮罩32A、32B類似之構造,調整設於第一及第二中間遮罩36A、36B之開口徑或邊長,用於調節第一及第二陽極31A、31B與基板W間之電場者。一個實施形態亦可構成對第一中 間遮罩36A及第二中間遮罩36B分別連結移動機構,可變更基板W與第一中間遮罩36A間之距離、及基板W與第二中間遮罩36B間之距離。另外,採用不溶性陽極時,由於需要在鍍覆液中持續補充鍍覆金屬,因此,亦可在後述之循環機構中設置鍍覆金屬之補充機構。 A first intermediate mask 36A is provided between the first anode holder 30A and the substrate holder 11. Further, a second intermediate mask 36B is provided between the second anode holder 30B and the substrate holder 11. The first and second intermediate masks 36A, 36B are configured to adjust the opening diameters of the first and second intermediate masks 36A, 36B by a configuration similar to the first and second anode masks 32A, 32B. The side length is used to adjust the electric field between the first and second anodes 31A, 31B and the substrate W. In one embodiment, the first intermediate mask 36A and the second intermediate mask 36B may be coupled to the moving mechanism, and the distance between the substrate W and the first intermediate mask 36A and the substrate W and the second intermediate mask 36B may be changed. The distance between them. Further, when an insoluble anode is used, since it is necessary to continuously replenish the plating metal in the plating solution, a replenishing mechanism for plating the metal may be provided in a circulation mechanism to be described later.

在第一陽極固持器30A與基板固持器11之間設有用於攪拌在基板W之第一面附近的鍍覆液之第一槳葉35A。此外,在第二陽極固持器30B與基板固持器11之間設有用於攪拌在基板W之被鍍覆面附近的鍍覆液之第二槳葉35B。此等槳葉35A、35B例如可為概略棒狀之構件,並可朝向鉛直方向而設於鍍覆處理槽內。槳葉35A、35B係構成可藉由無圖示之驅動裝置而沿著基板W的被鍍覆面水平移動。此外,槳葉35A、35B亦可係在板狀構件中設置複數個縱方向之縫隙者。 A first paddle 35A for agitating the plating solution in the vicinity of the first surface of the substrate W is provided between the first anode holder 30A and the substrate holder 11. Further, a second paddle 35B for agitating the plating liquid in the vicinity of the plated surface of the substrate W is provided between the second anode holder 30B and the substrate holder 11. These blades 35A and 35B may be, for example, a substantially rod-shaped member, and may be provided in the plating treatment tank in the vertical direction. The paddles 35A and 35B are configured to be horizontally movable along the plated surface of the substrate W by a driving device (not shown). Further, the blades 35A, 35B may be provided with a plurality of slits in the longitudinal direction in the plate member.

第一陽極31A經由第一陽極固持器30A內之配線而連接於外部電源37。此外,如前述,露出基板固持器11之基板W的第一面(表面)之第一保持構件110A的第一外部連接部161A連接於外部電源37。在第一陽極31A與基板固持器11的第一外部連接部161A之間從外部電源37供給電壓時,係以從外部電源37通過第一陽極31A、鍍覆液、基板固持器11之基板W的第一面之種層、第一外部連接部161A(第一保持構件110A)而返回外部電源37的路徑流入鍍覆電流。經由第二陽極31B、第二陽極固持器30B內之配線而連接於外部電源37。此外,如前述,露出基板固持器11之基板W的第二面(表面)之第二保持構件110B的第二外部連接部161B連接於外部電源37。在第二陽極31B與基板固持器11的第二外部連接部161B之間從外部電源37供給電壓時,係以從外部電源37通過第二陽極 31B、鍍覆液、基板固持器11之基板W的第二面之種層、第二外部連接部161B(第二保持構件110B)而返回外部電源37的路徑流入鍍覆電流。 The first anode 31A is connected to the external power source 37 via wiring in the first anode holder 30A. Further, as described above, the first external connection portion 161A of the first holding member 110A exposing the first surface (surface) of the substrate W of the substrate holder 11 is connected to the external power source 37. When a voltage is supplied from the external power source 37 between the first anode 31A and the first external connection portion 161A of the substrate holder 11, the substrate W is passed from the external power source 37 through the first anode 31A, the plating liquid, and the substrate holder 11. The first layer of the seed layer and the first external connection portion 161A (the first holding member 110A) return to the external power source 37 to flow a plating current. The external power source 37 is connected via wiring in the second anode 31B and the second anode holder 30B. Further, as described above, the second external connection portion 161B of the second holding member 110B exposing the second surface (surface) of the substrate W of the substrate holder 11 is connected to the external power source 37. When a voltage is supplied from the external power source 37 between the second anode 31B and the second external connection portion 161B of the substrate holder 11, the substrate W is passed from the external power source 37 through the second anode 31B, the plating solution, and the substrate holder 11. The second surface layer and the second external connection portion 161B (second holding member 110B) return to the external power source 37 to flow a plating current.

採用第十五圖所示之實施形態的鍍覆裝置具備使鍍覆液在鍍覆槽10與外槽16之間循環的循環機構300。循環機構300具備連接收容從鍍覆槽10溢出之鍍覆液的外槽16、及鍍覆槽10的循環管線302。循環管線302中設有閥門304,可進行循環管線302之開閉。閥門304例如可為電磁閥,亦可藉由控制部103(參照第一圖)來控制循環管線302之開閉。循環管線302中設有泵浦306,藉由泵浦306可使鍍覆液通過循環管線302從外槽16向鍍覆槽10循環。循環管線302中設有溫度控制裝置308,可控制通過循環管線302之鍍覆液的溫度。例如,亦可在鍍覆槽10中設置無圖示之溫度計,依該溫度計所測定之鍍覆液溫度,藉由控制部103控制溫度控制裝置308。循環管線302中設有過濾器310,可清除通過循環管線302之鍍覆液的固態物質。 The plating apparatus according to the embodiment shown in the fifteenth diagram includes a circulation mechanism 300 that circulates the plating solution between the plating tank 10 and the outer tank 16. The circulation mechanism 300 includes a circulation line 302 that connects the outer tank 16 that accommodates the plating liquid overflowing from the plating tank 10, and the plating tank 10. A valve 304 is provided in the circulation line 302 to open and close the circulation line 302. The valve 304 may be, for example, a solenoid valve, and the opening and closing of the circulation line 302 may be controlled by the control unit 103 (refer to the first diagram). A pump 306 is provided in the circulation line 302, and the pumping liquid 306 can circulate the plating solution from the outer tank 16 to the plating tank 10 through the circulation line 302. A temperature control device 308 is provided in the circulation line 302 to control the temperature of the plating solution passing through the circulation line 302. For example, a thermometer (not shown) may be provided in the plating tank 10, and the temperature control device 308 may be controlled by the control unit 103 depending on the temperature of the plating solution measured by the thermometer. A filter 310 is disposed in the circulation line 302 to remove solid matter from the plating liquid of the circulation line 302.

本實施形態係第一保持構件110A及第二保持構件110B分別設有彼此獨立之第一外部連接部161A及第二外部連接部161B。藉此,可將第一外部連接部161A、配線L、由基板接點117A構成之基板W的第一面用之電流路徑;與第二外部連接部161B、配線L、由基板接點117B構成之基板W的第二面用之電流路徑,分別分配於第一及第二保持構件110A、110B。結果,可抑制基板固持器之厚度增大,而且可確保設置對基板之第一面及第二面供給電流路徑的空間。這在因基板尺寸造成配線數量增大時、或是因電流大小造成配線直徑增大時等有效。此外,由於兩面鍍覆基板與單面鍍覆基板比較,通常為兩倍的配線數,因此特別有效。此外,因為可對基板之第一面及第二面獨立供給電流,所以可獨立控制各面之鍍覆厚度等的鍍覆規格。 In the present embodiment, the first holding member 110A and the second holding member 110B are provided with a first external connecting portion 161A and a second external connecting portion 161B which are independent of each other. Thereby, the first external connection portion 161A, the wiring L, the current path for the first surface of the substrate W composed of the substrate contact 117A, and the second external connection portion 161B, the wiring L, and the substrate contact 117B can be formed. The current paths for the second surface of the substrate W are respectively distributed to the first and second holding members 110A and 110B. As a result, it is possible to suppress an increase in the thickness of the substrate holder, and it is possible to secure a space for supplying a current path to the first surface and the second surface of the substrate. This is effective when the number of wirings is increased due to the size of the substrate, or when the wiring diameter is increased due to the magnitude of the current. Further, since the double-sided plated substrate is generally twice as large as the one-sided plated substrate, it is particularly effective. Further, since the current can be independently supplied to the first surface and the second surface of the substrate, the plating specifications such as the plating thickness of each surface can be independently controlled.

另外,上述係說明兩面鍍覆用之基板固持器,不過,即使在單面鍍覆用之基板固持器中,亦可在第一保持構件及第二保持構件中分別設置彼此獨立之第一外部連接部及第二外部連接部。設置連接分別設於第一保持構件及第二保持構件之電流路徑的連接路徑時,可從第一及第二保持構件的第一及第二外部連接部兩者,在被鍍覆面供給電流。此時,可將基板之第一面用的電流路徑分配於第一及第二保持構件,以確保設置電流供給路徑的空間。即使在單面鍍覆用之基板固持器中,因基板尺寸、電流大小等造成配線數量、配線直徑增大時仍然有效。 In the above, the substrate holder for double-sided plating is described. However, even in the substrate holder for single-sided plating, the first holding member and the second holding member may be provided with the first outer portions independent of each other. a connecting portion and a second external connecting portion. When the connection paths of the current paths of the first holding member and the second holding member are respectively connected, the current can be supplied from the first and second external connecting portions of the first and second holding members to the surface to be plated. At this time, the current path for the first surface of the substrate can be distributed to the first and second holding members to secure the space in which the current supply path is provided. Even in the substrate holder for single-sided plating, it is effective when the number of wires and the wire diameter increase due to the substrate size, current magnitude, and the like.

(其他實施形態) (Other embodiments)

第十七圖係從其他實施形態之基板固持器的第一側觀看之立體圖。第十八圖係從第一側觀看基板固持器在開放狀態之第一保持構件及第二保持構件的立體圖。第十九圖係基板固持器之第一保持構件及第二保持構件的分解立體圖。 Figure 17 is a perspective view of the substrate holder of the other embodiment as viewed from the first side. The eighteenth view is a perspective view of the first holding member and the second holding member in which the substrate holder is in an open state as viewed from the first side. The nineteenth embodiment is an exploded perspective view of the first holding member and the second holding member of the substrate holder.

由於其他實施形態之基板固持器11具有與第二A圖等中前述之基板固持器11概略同樣的構成,因此對同樣之構成註記相同符號,而省略詳細之說明。本實施形態係取代纜線構成之配線L,而藉由具有更大剖面積之導電路徑部410、420(參照第二十圖),連接複數個基板接點117與外部連接接點161A、161B。藉此,可省略配線收容部150(第一配線收容部150A、第二配線收容部150B)以謀求基板固持器之小型化及降低成本。另外,適用於單面鍍覆用之基板固持器情況下,亦可在第一保持構件或第二保持構件之一方設置導電路徑部。 The substrate holder 11 of the other embodiment has the same configuration as that of the above-described substrate holder 11 in the second A diagram and the like. Therefore, the same components are denoted by the same reference numerals, and detailed description thereof will be omitted. In this embodiment, instead of the wiring L formed of the cable, the plurality of substrate contacts 117 and the external connection contacts 161A, 161B are connected by the conductive path portions 410 and 420 having a larger sectional area (refer to the twentieth diagram). . Thereby, the wiring accommodating portion 150 (the first wiring accommodating portion 150A and the second wiring accommodating portion 150B) can be omitted to reduce the size and cost of the substrate holder. Further, in the case of a substrate holder for single-sided plating, a conductive path portion may be provided on one of the first holding member or the second holding member.

如第十七圖、第十八圖所示,基板固持器11具備:本體部111、左右之安裝部180、中央之安裝部181、支臂部160。基板固持器11分割成具有第一 開口部112A之第一保持構件110A;與具有第二開口部112B之第二保持構件110B。第一保持構件110A具備:第一本體部111A、左右之安裝部180A、中央之安裝部181A、第一支臂部160A(第十八圖、第十九圖)。第二保持構件110B具備:第二本體部111B、左右之安裝部180B、中央之安裝部181B、第二支臂部160B(第十八圖、第十九圖)。 As shown in FIGS. 17 and 18, the substrate holder 11 includes a main body portion 111, left and right mounting portions 180, a central mounting portion 181, and an arm portion 160. The substrate holder 11 is divided into a first holding member 110A having a first opening portion 112A and a second holding member 110B having a second opening portion 112B. The first holding member 110A includes a first body portion 111A, left and right mounting portions 180A, a center mounting portion 181A, and a first arm portion 160A (eighteenth and nineteenth views). The second holding member 110B includes a second main body portion 111B, left and right mounting portions 180B, a center mounting portion 181B, and a second arm portion 160B (eighteenth and nineteenth views).

第一本體部111A藉由左右之安裝部180A與左右之安裝部180A間的中央之安裝部181A,而安裝於第一支臂部160A。左右之安裝部180A、中央之安裝部181A分別以螺栓等旋緊機構固定於第一本體部111A與第一支臂部160A,藉此,將第一本體部111A固定於第一支臂部160A。 The first body portion 111A is attached to the first arm portion 160A by a mounting portion 181A at the center between the left and right mounting portions 180A and the right and left mounting portions 180A. The right and left attachment portions 180A and the central attachment portion 181A are respectively fixed to the first body portion 111A and the first arm portion 160A by a fastening mechanism such as a bolt, thereby fixing the first body portion 111A to the first arm portion 160A. .

第一支臂部160A具備細長板狀構件或棒狀構件。第一支臂部160A具有:外部連接部161A;及用於保護外部連接部161A及導電路徑部410之外部連接部護蓋162A。此外,第一支臂部160A與前述同樣地在其兩端部具有用於將基板固持器11在基板放置部170B及鍍覆槽10中進行定位之定位部163R、163L。 The first arm portion 160A is provided with an elongated plate member or a rod member. The first arm portion 160A has an external connection portion 161A and an external connection portion cover 162A for protecting the external connection portion 161A and the conductive path portion 410. Further, the first arm portion 160A has positioning portions 163R and 163L for positioning the substrate holder 11 in the substrate placing portion 170B and the plating groove 10 at both end portions thereof in the same manner as described above.

第二保持構件110B具備:第二本體部111B、左右之安裝部180B、中央之安裝部181B、第二支臂部160B(第十八圖、第十九圖)。由於第二本體部111B及安裝部180B、181B之構成與第一本體部111A及安裝部180A、181A之構成同樣,因此省略詳細之說明,並在同樣之構造上註記以相同編號及英文字母B顯示的符號。 The second holding member 110B includes a second main body portion 111B, left and right mounting portions 180B, a center mounting portion 181B, and a second arm portion 160B (eighteenth and nineteenth views). Since the configurations of the second main body portion 111B and the mounting portions 180B and 181B are the same as those of the first main body portion 111A and the mounting portions 180A and 181A, detailed descriptions thereof will be omitted, and the same numbers and the same letter B will be noted in the same structure. The symbol shown.

第二支臂部160B具備細長板狀構件或棒狀構件。第二支臂部160B具有:外部連接部161B;及用於保護外部連接部161B及導電路徑部420之外部連接部護蓋162B。與前述實施形態同樣地,嚙合第一支臂部160A及第二支臂部 160B時,第一及第二支臂部160A、160B之第一及第二外部連接部161A、161B係以彼此不致干擾之方式配置於基板固持器11的左右方向之相反側。 The second arm portion 160B is provided with an elongated plate member or a rod member. The second arm portion 160B has an external connection portion 161B and an external connection portion cover 162B for protecting the external connection portion 161B and the conductive path portion 420. Similarly to the above-described embodiment, when the first arm portion 160A and the second arm portion 160B are engaged, the first and second outer connecting portions 161A, 161B of the first and second arm portions 160A, 160B are not in contact with each other. The interference is disposed on the opposite side of the substrate holder 11 in the left-right direction.

第二十圖係其他實施形態之導電路徑部的立體圖。第二十一圖係第一保持構件及第二保持構件從基板保持面側觀看之箭視圖。第二十圖中,符號410表示配置於第一保持構件110A之導電路徑部,符號420表示配置於第二保持構件110B之導電路徑部。另外,此處係說明導電路徑部410(導電路徑部420)具備左側導電路徑構件410L(420L)及右側導電路徑構件410R(420R)兩個系統的情況,不過,導電路徑部410亦可為一體或由複數個路徑片構成之1個系統的導電路徑構件。 Fig. 20 is a perspective view of a conductive path portion of another embodiment. The twenty-first figure is an arrow view of the first holding member and the second holding member as viewed from the substrate holding surface side. In the twenty-fifth diagram, reference numeral 410 denotes a conductive path portion disposed in the first holding member 110A, and reference numeral 420 denotes a conductive path portion disposed in the second holding member 110B. In addition, here, the case where the conductive path portion 410 (the conductive path portion 420) includes the two systems of the left conductive path member 410L (420L) and the right conductive path member 410R (420R) will be described. However, the conductive path portion 410 may be integrated. Or a conductive path member of one system composed of a plurality of path pieces.

各導電路徑部410、420由銅(例如無氧銅)等電阻值小之材料構成。本實施形態如第二十圖所示,係由板狀構件形成。藉由將各導電路徑部410、420形成板狀,可抑制基板固持器之厚度增大。另外,亦可將各導電路徑部410、420形成棒狀,如此沿著路徑加工容易。此外,各導電路徑部410、420除了接點、與其他配線等的導通部分之外,亦可以具有耐藥劑性之樹脂(例如PFA)塗布。 Each of the conductive path portions 410 and 420 is made of a material having a small resistance value such as copper (for example, oxygen-free copper). This embodiment is formed of a plate member as shown in the twentieth diagram. By forming each of the conductive path portions 410 and 420 into a plate shape, the thickness of the substrate holder can be suppressed from increasing. Further, each of the conductive path portions 410 and 420 may be formed in a rod shape, and thus it is easy to process along the path. Further, each of the conductive path portions 410 and 420 may be coated with a resin (for example, PFA) having a chemical resistance in addition to a contact portion and a conductive portion such as another wiring.

由於導電路徑部410與導電路徑部420具有類似之構成,因此,以下以導電路徑部410為例作說明。 Since the conductive path portion 410 and the conductive path portion 420 have a similar configuration, the conductive path portion 410 will be described below as an example.

導電路徑部410具備左側導電路徑構件410L、與右側導電路徑構件410R。左側導電路徑構件410L與右側導電路徑構件410R在第一保持構件110A內彼此分離而電性絕緣。另外,其他實施例亦可左側導電路徑構件410L與右側導電路徑構件410R在第一保持構件110A內彼此短路,亦可形成一體之構件。 The conductive path portion 410 includes a left conductive path member 410L and a right conductive path member 410R. The left conductive path member 410L and the right conductive path member 410R are separated from each other and electrically insulated within the first holding member 110A. In addition, in other embodiments, the left conductive path member 410L and the right conductive path member 410R may be short-circuited to each other in the first holding member 110A, or an integral member may be formed.

左側導電路徑構件410L及右側導電路徑構件410R分別具有連接複數個路徑片(此處為5個路徑片)之構成。另外,左側導電路徑構件410L及右 側導電路徑構件410R亦可分別一體形成,亦可為連接5個以下路徑片的構成,或是,亦可為連接6個以上路徑片的構成。 The left conductive path member 410L and the right conductive path member 410R each have a configuration in which a plurality of path pieces (here, five path pieces) are connected. Further, the left conductive path member 410L and the right conductive path member 410R may be integrally formed, or may be configured to connect five or less path pieces, or may be configured to connect six or more path pieces.

左側導電路徑構件410L具備:第一路徑片411L、第二路徑片412L、第三路徑片413L、第四路徑片414L、及第五路徑片415L,並藉由連接此等而構成。右側導電路徑構件410R具備:第一路徑片411R、第二路徑片412R、第三路徑片413R、第四路徑片414R、及第五路徑片415R,並藉由連接此等而構成。 The left conductive path member 410L includes a first path piece 411L, a second path piece 412L, a third path piece 413L, a fourth path piece 414L, and a fifth path piece 415L, and is configured by being connected thereto. The right conductive path member 410R includes a first path piece 411R, a second path piece 412R, a third path piece 413R, a fourth path piece 414R, and a fifth path piece 415R, and is configured by being connected thereto.

左側導電路徑構件410L之第一路徑片411L、第二路徑片412L與右側導電路徑構件410R之第一路徑片411R、第二路徑片412R彼此在分離狀態下平行延伸。左側導電路徑構件410L之第三路徑片413L、第四路徑片414L、及第五路徑片415L配置於第一本體部111A之左側一半部分(第二十一圖)。右側導電路徑構件410R之第三路徑片413R、第四路徑片414R、及第五路徑片415R配置於第一本體部111A之右側一半部分(第二十一圖)。右側導電路徑構件410R之第五路徑片415R如第二十一圖所示,與左側導電路徑構件410L的第五路徑片415L之間保留間隙而彼此分離。如此,藉由以右側導電路徑構件410R與左側導電路徑構件410L分割導電路徑構件而形成,以基板放置部170B(第一圖)在基板固持器11上保持基板時,在右側導電路徑構件410R與左側導電路徑構件410L之間施加電位差,係以左側導電路徑構件410L→基板(種層)→右側導電路徑構件410R(或是顛倒)的路徑流入電流,可進行電阻值有異常時判斷為基板固持器11或基板有異常的通電試驗。 The first path piece 411L, the second path piece 412L of the left conductive path member 410L, and the first path piece 411R and the second path piece 412R of the right side conductive path member 410R extend in parallel with each other in a separated state. The third path piece 413L, the fourth path piece 414L, and the fifth path piece 415L of the left side conductive path member 410L are disposed on the left half portion (the twenty-first figure) of the first body portion 111A. The third path piece 413R, the fourth path piece 414R, and the fifth path piece 415R of the right side conductive path member 410R are disposed on the right half portion (the twenty-first diagram) of the first body portion 111A. The fifth path piece 415R of the right side conductive path member 410R is separated from each other by leaving a gap with the fifth path piece 415L of the left side conductive path member 410L as shown in the twenty-first figure. Thus, by dividing the conductive path member by the right conductive path member 410R and the left conductive path member 410L, when the substrate is held on the substrate holder 11 by the substrate placing portion 170B (first drawing), the right conductive path member 410R is A potential difference is applied between the left conductive path members 410L, and a current flows in a path of the left conductive path member 410L→substrate (seed layer)→right conductive path member 410R (or reversed), and the substrate can be determined to be held when the resistance value is abnormal. The device 11 or the substrate has an abnormal energization test.

第一路徑片411L係以從外部連接部161A延伸至中央之安裝部181A的連接部之方式配置於第十八圖中的第一支臂部160A之本體內。第十九圖係顯示第一路徑片411L之一端露出於設於第一支臂部160A之安裝凹部1600內的 狀態。第一路徑片411L之另一端在外部連接部161A中連接於外部連接接點440L(第二十四圖)。 The first path piece 411L is disposed in the body of the first arm portion 160A in the eighteenth figure so as to extend from the external connection portion 161A to the connection portion of the center attachment portion 181A. The nineteenth diagram shows a state in which one end of the first path piece 411L is exposed in the mounting recess 1600 provided in the first arm portion 160A. The other end of the first path piece 411L is connected to the external connection contact 440L in the external connection portion 161A (Fig. 24).

第二路徑片412L如第十九圖所示,係以延伸於中央之安裝部181A內部的方式配置於安裝部181A。第二路徑片412L之第一支臂部160A側的一端在安裝部181A之一端部露出(與第十九圖之第二路徑片412R同樣),安裝部181A之一端部與第一支臂部160A之安裝凹部1600嵌合時,與配置於第一支臂部160A內之第一路徑片411L的一端接觸,而與第一路徑片411L電性連接。安裝部181A對第一支臂部160A以螺栓等旋緊構件固定時,第一路徑片411L與第二路徑片412L亦一起以螺栓止動而彼此固定。第二路徑片412L之另一端從安裝部181A之另一端部突出,將安裝部181A安裝於第一本體部111A時,插入設於第一本體1110A之開口,並連接於第三路徑片413L之一端(第二十一圖)。第二路徑片412L與第三路徑片413L亦以螺絲、螺栓等旋緊構件彼此固定(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。 As shown in FIG. 19, the second path piece 412L is disposed on the mounting portion 181A so as to extend inside the mounting portion 181A at the center. One end of the second path piece 412L on the side of the first arm portion 160A is exposed at one end of the mounting portion 181A (similar to the second path piece 412R of the nineteenth diagram), and one end portion of the mounting portion 181A and the first arm portion When the mounting recess 1600 of the 160A is fitted, it is in contact with one end of the first path piece 411L disposed in the first arm portion 160A, and is electrically connected to the first path piece 411L. When the attachment portion 181A fixes the first arm portion 160A with a fastening member such as a bolt, the first path piece 411L and the second path piece 412L are also fixed together by bolt stoppers. The other end of the second path piece 412L protrudes from the other end of the mounting portion 181A, and when the mounting portion 181A is attached to the first body portion 111A, the opening is inserted into the opening of the first body 1110A, and is connected to the third path piece 413L. One end (the twenty-first figure). The second path piece 412L and the third path piece 413L are also fixed to each other by a screwing member such as a screw or a bolt (and the third path piece 413R and the fourth path piece 414R of the twenty-second A picture, the twenty-second B picture) Connect the same).

第三路徑片413L、第四路徑片414L、及第五路徑片415L如第二十一圖所示,在第一本體部111A之第一本體1110A的基板保持面側配置於左邊一半部分。第三路徑片413L在靠近第一支臂部160A之側沿著第一開口部112A的上邊而設。第三路徑片413L之一端在第一保持構件110A之中央部附近對第二路徑片412L的另一端連接。第三路徑片413L之另一端在第一開口部112A之上部角部附近,以螺絲416連接於第四路徑片414L的一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第四路徑片414L從第一支臂部160A之近端朝向遠端,沿著第一開口部112A之左邊設置。第四路徑片414L之另一端在第一開口部112A之下部角部附近,以螺絲等旋緊構件連接於第五路 徑片415L之一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第五路徑片415L在從第一支臂部160A之遠端沿著第一開口部112A的下邊設置。第五路徑片415L之另一端在第一保持構件110A之中央部附近,與第五路徑片415R分離狀態下成為終端。 As shown in the twenty-first diagram, the third path piece 413L, the fourth path piece 414L, and the fifth path piece 415L are disposed on the left half of the substrate holding surface side of the first body 1110A of the first body portion 111A. The third path piece 413L is provided along the upper side of the first opening portion 112A on the side close to the first arm portion 160A. One end of the third path piece 413L is connected to the other end of the second path piece 412L near the central portion of the first holding member 110A. The other end of the third path piece 413L is connected to one end of the fourth path piece 414L with a screw 416 near the upper corner portion of the first opening portion 112A (the third of the second path piece 414L and the second piece of the twenty-second A picture The path piece 413R is the same as the connection of the fourth path piece 414R). The fourth path piece 414L is disposed from the proximal end of the first arm portion 160A toward the distal end, along the left side of the first opening portion 112A. The other end of the fourth path piece 414L is connected to one end of the fifth path piece 415L by a screw or the like near the corner of the lower portion of the first opening portion 112A (with the twenty-second A picture, the twenty-second B picture) The third path piece 413R is the same as the fourth path piece 414R. The fifth path piece 415L is disposed along the lower side of the first opening portion 112A from the distal end of the first arm portion 160A. The other end of the fifth path piece 415L is in the vicinity of the central portion of the first holding member 110A, and is terminated in a state of being separated from the fifth path piece 415R.

右側導電路徑構件410R之各路徑片411R~415R與左側導電路徑構件410L之各路徑片411L~415L概略同樣地配置。但是,右側導電路徑構件410R之第三路徑片413R、第四路徑片414R、及第五路徑片415R在第一本體1110A中,與左側導電路徑構件410L之第三路徑片413L、第四路徑片414L、及第五路徑片415L,係對第一開口部112A配置於相反側(右側一半部分)。 Each of the path pieces 411R to 415R of the right conductive path member 410R is arranged in substantially the same manner as each of the path pieces 411L to 415L of the left conductive path member 410L. However, the third path piece 413R, the fourth path piece 414R, and the fifth path piece 415R of the right conductive path member 410R are in the first body 1110A, and the third path piece 413L and the fourth path piece of the left conductive path member 410L. The 414L and the fifth path piece 415L are disposed on the opposite side (the right half portion) of the first opening portion 112A.

第一路徑片411R係以從外部連接部161A延伸至與中央之安裝部181A的連結部之方式配置於第十八圖中之第一支臂部160A的本體內。第十九圖係顯示第一路徑片411R之一端露出於設於第一支臂部160A之安裝凹部1600內的狀態。第一路徑片411R之另一端在外部連接部161A中連接於外部連接接點440R(第二十四圖)。 The first path piece 411R is disposed in the body of the first arm portion 160A in the eighteenth figure so as to extend from the external connection portion 161A to the connection portion with the center attachment portion 181A. The nineteenth diagram shows a state in which one end of the first path piece 411R is exposed in the mounting recess 1600 provided in the first arm portion 160A. The other end of the first path piece 411R is connected to the external connection contact 440R (the twenty-fourth figure) in the external connection portion 161A.

第二路徑片412R如第十九圖所示,以延伸於中央之安裝部181A的內部之方式配置於安裝部181A。第二路徑片412R之第一支臂部160A側的一端在安裝部181A之一端部露出(與第十九圖之第二路徑片412L同樣),將安裝部181A之一端部嵌合於第一支臂部160A的安裝凹部1600時,與配置於第一支臂部160A內之第一路徑片411R的一端接觸,而與第一路徑片411R電性連接。安裝部181A對第一支臂部160A以螺栓等旋緊構件固定時,第一路徑片411R與第二路徑片412R亦一起以螺栓止動而彼此固定。第二路徑片412R之另一端從安裝部181A之另一端部突出,將安裝部181A安裝於第一本體部111A時,插入設於第一本體 1110A之開口,而與第三路徑片413R之一端連接(第二十一圖)。第二路徑片412R與第三路徑片413R亦以螺絲、螺栓等旋緊構件彼此固定(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。 As shown in FIG. 19, the second path piece 412R is disposed on the mounting portion 181A so as to extend inside the mounting portion 181A at the center. One end of the second path piece 412R on the side of the first arm portion 160A is exposed at one end of the attachment portion 181A (similar to the second path piece 412L of the nineteenth diagram), and one end of the attachment portion 181A is fitted to the first end. When the concave portion 1600 of the arm portion 160A is attached, it is in contact with one end of the first path piece 411R disposed in the first arm portion 160A, and is electrically connected to the first path piece 411R. When the attachment portion 181A fixes the first arm portion 160A with a fastening member such as a bolt, the first path piece 411R and the second path piece 412R are also fixed together by bolt stoppers. The other end of the second path piece 412R protrudes from the other end of the mounting portion 181A, and when the mounting portion 181A is attached to the first body portion 111A, the opening is provided in the opening of the first body 1110A, and one end of the third path piece 413R Connection (21st picture). The second path piece 412R and the third path piece 413R are also fixed to each other by a screwing member such as a screw or a bolt (and the third path piece 413R and the fourth path piece 414R of the twenty-second A picture, the twenty-second B picture) Connect the same).

第三路徑片413R、第四路徑片414R、及第五路徑片415R如第二十一圖所示,在第一本體部111A之第一本體1110A的基板保持面側配置於右邊一半部分。第三路徑片413R在靠近第一支臂部160A之側沿著第一開口部112A的上邊設置。第三路徑片413R之一端在第一保持構件110A之中央部附近,對第二路徑片412R之另一端連接。第三路徑片413R之另一端在第一開口部112A之上部角部附近以螺絲416連接於第四路徑片414R的一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第四路徑片414R從第一支臂部160A之近端朝向遠端沿著第一開口部112A的右邊設置。第四路徑片414R之另一端在第一開口部112A之下部角部附近,以螺絲等旋緊構件連接於第五路徑片415R之一端(與第二十二A圖、第二十二B圖之第三路徑片413R與第四路徑片414R的連接同樣)。第五路徑片415R在從第一支臂部160A之遠端沿著第一開口部112A的下邊設置。第五路徑片415R之另一端在第一保持構件110A之中央部附近,與第五路徑片415L分離狀態下成為終端。 As shown in the twenty-first diagram, the third path piece 413R, the fourth path piece 414R, and the fifth path piece 415R are disposed on the right half of the substrate holding surface side of the first body 1110A of the first body portion 111A. The third path piece 413R is disposed along the upper side of the first opening portion 112A on the side close to the first arm portion 160A. One end of the third path piece 413R is connected to the other end of the second path piece 412R in the vicinity of the central portion of the first holding member 110A. The other end of the third path piece 413R is connected to one end of the fourth path piece 414R by screws 416 near the upper corner portion of the first opening portion 112A (the third path with the 22nd A picture and the 22nd B picture) The sheet 413R is the same as the fourth path piece 414R. The fourth path piece 414R is disposed along the right side of the first opening portion 112A from the proximal end toward the distal end of the first arm portion 160A. The other end of the fourth path piece 414R is connected to one end of the fifth path piece 415R by a screw or the like near the corner portion of the lower portion of the first opening portion 112A (with the twenty-second A picture, the twenty-second B picture) The third path piece 413R is the same as the fourth path piece 414R. The fifth path piece 415R is disposed along the lower side of the first opening portion 112A from the distal end of the first arm portion 160A. The other end of the fifth path piece 415R is terminated in the vicinity of the central portion of the first holding member 110A and separated from the fifth path piece 415L.

如上述,第一路徑片411L、R插入第一支臂部160A內,第二路徑片412L、R插入安裝部181A內,第三至第五路徑片413L、R、414L、R、415L、R插入第一本體部111A後,將第一支臂部160A、安裝部181A、第一本體部111A相互組合。因而可輕易進行各導電路徑構件之形成。 As described above, the first path pieces 411L, R are inserted into the first arm portion 160A, the second path pieces 412L, R are inserted into the mounting portion 181A, and the third to fifth path pieces 413L, R, 414L, R, 415L, R are inserted. After the first body portion 111A is inserted, the first arm portion 160A, the mounting portion 181A, and the first body portion 111A are combined with each other. Thus, the formation of each conductive path member can be easily performed.

因為導電路徑部420之構成與導電路徑部410概略同樣,所以將關於導電路徑部410之符號410、411替換成420、421來表示對應的構成,而省略詳 細之說明。左側導電路徑構件420L及右側導電路徑構件420R之各路徑片在第二保持構件110B內,從外部連接部161B包含第二本體部111B之第二本體1110B,而與導電路徑部410之左側導電路徑構件410L及右側導電路徑構件410R的各路徑片同樣配置(參照第十九圖、第二十一圖、第二十二A圖、第二十二B圖、第二十四圖、第二十五圖)。 Since the configuration of the conductive path portion 420 is substantially the same as that of the conductive path portion 410, the symbols 410 and 411 of the conductive path portion 410 are replaced by 420 and 421 to indicate the corresponding configurations, and the detailed description is omitted. The path pieces of the left conductive path member 420L and the right conductive path member 420R are in the second holding member 110B, and the second body 1110B of the second body portion 111B is included from the external connection portion 161B, and the left conductive path with the conductive path portion 410 The path pieces of the member 410L and the right conductive path member 410R are also arranged in the same manner (refer to the nineteenth, twenty-first, twenty-second, twenty-second, twenty-fourth, and twenty-th) Five maps).

第二十二A圖係基板固持器之基板接點附近的放大圖。第二十二B圖係在卸下一部分基板接點狀態下顯示基板固持器之基板接點附近的放大圖者。第二十三圖係與第一保持構件一起顯示第二保持構件之在第二十二B圖的C-C剖面圖。 The twenty-second A-picture is an enlarged view of the vicinity of the substrate contact of the substrate holder. The twenty-second B-picture is an enlarged view showing the vicinity of the substrate contact of the substrate holder in a state where a part of the substrate contact is removed. The twenty-third figure shows a C-C cross-sectional view of the second holding member in the twenty-second B-picture together with the first holding member.

如第二十三圖所示,導電路徑部410及導電路徑部420配置於被內側密封120A、120B與外側密封121A所密閉的空間內。用於固定內側密封120A之密封固持器118A藉由螺絲123而固定於第一本體1110A(第二十二A圖)。 As shown in the twenty-third diagram, the conductive path portion 410 and the conductive path portion 420 are disposed in a space sealed by the inner seals 120A and 120B and the outer seal 121A. The seal holder 118A for fixing the inner seal 120A is fixed to the first body 1110A by screws 123 (Fig. 22A).

如第二十二A圖及第二十二B圖所示,導電路徑部410之各路徑片413R、414R係在重疊各端部之狀態下藉由螺絲416而固定於第一本體1110A,其他部分則藉由螺絲417而固定於第一本體1110A。螺絲417沿著各路徑片之長度方向均等配置,並將各路徑片沿著長度方向均等地按壓。換言之,藉由卸下螺絲416、417可個別地更換各路徑片。例如基板固持器11中發生處理液洩漏時,依基板固持器11在處理槽內之姿勢,存在容易受到處理液影響之部分。以豎立姿勢將基板固持器配置於鍍覆槽情況下,發生處理液洩漏時,處理液容易蓄積在基板固持器之最下部附近。因而,當處理液發生洩漏,僅基板固持器最下部附近之路徑片接觸到處理液時,無須更換整個導電路徑部410、420(或是各導電路徑構件 410L、410R、420L、420R),可僅更換接觸到處理液之路徑片。與更換整個基板固持器、或是整個導電路徑部(或各導電路徑構件)時比較,可減少費用。 As shown in FIG. 22A and FIG. 22B, each of the path pieces 413R and 414R of the conductive path portion 410 is fixed to the first body 1110A by screws 416 in a state in which the respective end portions are overlapped. The portion is fixed to the first body 1110A by a screw 417. The screws 417 are equally arranged along the longitudinal direction of each of the path pieces, and the respective path pieces are equally pressed in the longitudinal direction. In other words, each of the path pieces can be individually replaced by removing the screws 416, 417. For example, when the processing liquid leaks in the substrate holder 11, depending on the posture of the substrate holder 11 in the processing tank, there is a portion that is easily affected by the processing liquid. When the substrate holder is placed in the plating tank in an upright posture, when the treatment liquid leaks, the treatment liquid is likely to accumulate in the vicinity of the lowermost portion of the substrate holder. Therefore, when the processing liquid leaks, only when the path piece near the lowermost portion of the substrate holder contacts the processing liquid, it is not necessary to replace the entire conductive path portions 410, 420 (or the respective conductive path members 410L, 410R, 420L, 420R). Replace only the path piece that is in contact with the treatment fluid. The cost can be reduced as compared to when the entire substrate holder is replaced or the entire conductive path portion (or each conductive path member) is replaced.

導電路徑部410之右側導電路徑構件410R上藉由螺絲122A連接有複數個基板接點117A。換言之,藉由卸下螺絲122A,可從導電路徑部410個別地更換各基板接點117A。藉由更換一部分基板接點,可繼續使用基板固持器,可減少基板固持器之維修及更換所需的費用。例如,發生處理液洩漏時,依基板固持器11在處理槽內之姿勢,藉由僅更換容易接觸到處理液之基板接點(例如,上述基板固持器的最下部之例)等的一部分基板接點,與更換整個基板固持器11或整個基板接點時比較,可減少費用。 A plurality of substrate contacts 117A are connected to the right conductive path member 410R of the conductive path portion 410 by screws 122A. In other words, each of the substrate contacts 117A can be individually replaced from the conductive path portion 410 by removing the screws 122A. By replacing a portion of the substrate contacts, the substrate holder can continue to be used, reducing the cost of repair and replacement of the substrate holder. For example, when the processing liquid leaks, a part of the substrate such as the substrate contact (for example, the lowermost portion of the substrate holder) which is easily contacted with the processing liquid is replaced in the posture of the substrate holder 11 in the processing tank. The contact can be reduced in cost compared to when the entire substrate holder 11 or the entire substrate contact is replaced.

此處,係說明導電路徑部410之右側導電路徑構件410R,不過,導電路徑部410之左側導電路徑構件410L、導電路徑部420之右側導電路徑構件420R、左側導電路徑構件420L亦同樣地配置。 Here, the right conductive path member 410R of the conductive path portion 410 will be described. However, the left conductive path member 410L of the conductive path portion 410, the right conductive path member 420R of the conductive path portion 420, and the left conductive path member 420L are also disposed in the same manner.

第二十四圖係在卸下外部連接部護蓋狀態之外部連接部的放大立體圖。第二十五圖係外部連接部之剖面圖。導電路徑部410之右側導電路徑構件410R(第一路徑片411R)的一端在外部連接部161A中,對外部連接接點440R與導電板430一起以螺絲止動,而與外部連接接點440R電性連接。第一路徑片411R藉由卸下螺絲可對外部連接接點440R拆卸。外部連接接點440R具有複數個薄片(此處為9個),係各薄片部之基端側成為一體的薄片接點。導電路徑部410之左側導電路徑構件410L(第一路徑片411L)的一端在外部連接部161A中,對外部連接接點440L與導電板430一起以螺絲止動,而與外部連接接點440L電性連接。第一路徑片411L藉由卸下螺絲,可對外部連接接點440L拆卸。外部連接接點440L具有複數個薄片(此處為9個),係各薄片部之基端側成為一體的薄片接 點。將基板固持器11配置於鍍覆槽時,如第二十五圖所示,外部連接接點440R與外部連接接點440L之各薄片部接觸於匯流條167,而經由匯流條167電性短路。另外,通電試驗時,與第十二D圖同樣地,外部連接接點440R及外部連接接點440L之各薄片部從匯流條167離開。因而,在外部連接接點440R及外部連接接點440L上分別連接確認通電裝置169之各接點230,並通過外部連接接點440R、右側導電路徑構件410R、基板接點、基板W、基板接點、左側導電路徑構件410L、外部連接接點440L流入電流,可進行通電試驗。關於導電路徑部420亦同樣。 The twenty-fourth embodiment is an enlarged perspective view of the external connection portion in a state where the outer connecting portion cover is removed. The twenty-fifth figure is a cross-sectional view of the external connection portion. One end of the right conductive path member 410R (first path piece 411R) of the conductive path portion 410 is in the external connection portion 161A, and the external connection contact 440R is screwed together with the conductive plate 430, and is electrically connected to the external connection contact 440R. Sexual connection. The first path piece 411R can be detached from the external connection contact 440R by removing the screw. The external connection contact 440R has a plurality of sheets (here, nine sheets), and the base end side of each sheet portion is an integral sheet contact. One end of the left conductive path member 410L (first path piece 411L) of the conductive path portion 410 is in the external connection portion 161A, and the external connection contact 440L is screwed together with the conductive plate 430, and is electrically connected to the external connection contact 440L. Sexual connection. The first path piece 411L can be detached from the external connection contact 440L by removing the screw. The external connection contact 440L has a plurality of sheets (here, nine sheets), and the base end side of each sheet portion is an integral sheet contact. When the substrate holder 11 is disposed in the plating tank, as shown in the twenty-fifth figure, the respective sheet portions of the external connection contact 440R and the external connection contact 440L are in contact with the bus bar 167, and are electrically short-circuited via the bus bar 167. . Further, in the energization test, similarly to the twelfth DD, the respective sheet portions of the external connection contact 440R and the external connection contact 440L are separated from the bus bar 167. Therefore, each of the contacts 230 of the confirmation energization device 169 is connected to the external connection contact 440R and the external connection contact 440L, and the external connection contact 440R, the right conductive path member 410R, the substrate contact, the substrate W, and the substrate are connected. The point, the left conductive path member 410L, and the external connection contact 440L flow current to perform an energization test. The same applies to the conductive path portion 420.

另外,此處係說明對右側導電路徑構件410R與左側導電路徑構件410L分別設置外部連接接點440R及外部連接接點440L的情況,不過,將導電路徑部410作為1個系統時,亦可將外部連接接點作為一體之構件。另外,第二保持構件110B之外部連接部161B亦同樣地構成。 Here, the case where the external connection contact 440R and the external connection contact 440L are provided to the right conductive path member 410R and the left conductive path member 410L will be described here. However, when the conductive path portion 410 is used as one system, The external connection contact is an integral component. Further, the external connection portion 161B of the second holding member 110B is also configured in the same manner.

上述實施形態之基板固持器具備:至少1個基板接點、至少1個外部接點、及連接此等之導電路徑構件,導電路徑構件及/或基板接點可更換地設置。因而,當導電路徑構件及/或基板接點與鍍覆液接觸而產生腐蝕或析出金屬時,即可更換導電路徑構件及/或基板接點。因而,藉由更換導電路徑構件及/或基板接點,可繼續使用基板固持器,可減少基板固持器之維修及更換所需的費用。特別是因為導電路徑構件被分割成複數個路徑片,可僅更換需要更換之部分。此外,還可僅更換一部分基板接點。例如,發生處理液洩漏時,依基板固持器在處理槽內之姿勢,藉由僅更換容易接觸到處理液之基板接點及/或路徑片(基板固持器採取垂直姿勢時,為基板固持器底部側)等之一部分基板接點及/或路徑片,與更換整個基板固持器、整個導電路徑構件、或整個基板接點時比較,可減少費用。 The substrate holder of the above embodiment includes at least one substrate contact, at least one external contact, and a conductive path member connected thereto, and the conductive path member and/or the substrate contact are replaceably provided. Thus, when the conductive path member and/or the substrate contact are in contact with the plating solution to cause corrosion or precipitation of the metal, the conductive path member and/or the substrate contact can be replaced. Thus, by replacing the conductive path members and/or substrate contacts, the substrate holder can continue to be used, reducing the cost of repair and replacement of the substrate holder. In particular, since the conductive path member is divided into a plurality of path pieces, only the portion to be replaced can be replaced. In addition, only a portion of the substrate contacts can be replaced. For example, when the treatment liquid leaks, the substrate holder and the path piece which are easily accessible to the treatment liquid are replaced by the substrate holder in the treatment tank. (The substrate holder is used when the substrate holder adopts the vertical posture. One of the substrate contacts and/or the path piece, such as the bottom side, can be reduced in cost compared to when the entire substrate holder, the entire conductive path member, or the entire substrate contact is replaced.

藉由將對複數個基板接點117之配線彙整成導電路徑部,可確保各導電路徑部大的剖面積(一個例子為纜線10-20條部分),可降低各導電路徑部每單位長度之配線電阻。藉此,可減少外部連接部至各第一基板接點的路徑中電壓下降之差。結果可使通過各第一基板接點而流動之鍍覆電流均勻化,並使鍍覆膜厚均勻化。此外,由於係將對複數個第一基板接點之配線彙整成各導電路徑部,因此可減少至複數個第一基板接點的配線尺寸,或是省略纜線配線。 By arranging the wirings of the plurality of substrate contacts 117 into the conductive path portions, it is possible to ensure a large cross-sectional area of each of the conductive path portions (one example is a cable 10-20 portions), and the per-unit length of each conductive path portion can be reduced. Wiring resistance. Thereby, the difference in voltage drop in the path from the external connection portion to each of the first substrate contacts can be reduced. As a result, the plating current flowing through the contacts of the respective first substrates can be made uniform, and the thickness of the plating film can be made uniform. Further, since the wiring of the plurality of first substrate contacts is formed into the respective conductive path portions, the wiring size to the plurality of first substrate contacts can be reduced, or the cable wiring can be omitted.

從上述實施形態至少可掌握以下之形態。 At least the following aspects can be grasped from the above embodiment.

第一形態係關於一種基板固持器,其係用於保持基板。該基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部。前述第一保持構件具有:至少1個第一基板接點,其係用於對前述基板之前述第一面供給電流;至少1個第一外部連接接點;及至少1個第一配線,其係電性連接前述至少1個第一基板接點與前述至少1個第一外部連接接點。前述第二保持構件具有:至少1個第二基板接點,其係用於對前述基板之前述第二面供給電流;至少1個第二外部連接接點;及至少1個第二配線,其係電性連接前述至少1個第二基板接點與前述至少1個第二外部連接接點。前述至少1個第一外部連接接點與前述至少1個第二外部連接接點係電性獨立。所謂「電性獨立」,係指在基板固持器內彼此電性絕緣。 The first aspect relates to a substrate holder for holding a substrate. The substrate holder includes: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member for sandwiching the substrate with the first holding member And holding, and having a second opening for exposing the second surface of the substrate. The first holding member has at least one first substrate contact for supplying current to the first surface of the substrate, at least one first external connection contact, and at least one first wiring. The at least one first substrate contact and the at least one first external connection contact are electrically connected. The second holding member has at least one second substrate contact for supplying current to the second surface of the substrate, at least one second external connection contact, and at least one second wiring. The at least one second substrate contact and the at least one second external connection contact are electrically connected. The at least one first external connection contact is electrically independent of the at least one second external connection contact. "Electrically independent" means electrically insulated from each other in the substrate holder.

第一形態由於係在第一及第二保持構件中分別獨立地設置第一及第二外部連接接點、第一基板接點及第二基板接點、第一配線及第二配線,因此可將對基板之第一面及第二面供給電流的路徑分別分配至第一及第二保持構件。藉此,可抑制基板固持器之厚度增大,而且可確保設置對基板之第一面及第 二面供給電流路徑的空間。此外,因為可對基板之第一面及第二面獨立地供給電流,所以可獨立控制各面之鍍覆厚度等的鍍覆規格。 In the first aspect, the first and second external connection contacts, the first substrate contact and the second substrate contact, the first wiring, and the second wiring are respectively disposed in the first and second holding members, respectively. A path for supplying current to the first surface and the second surface of the substrate is respectively distributed to the first and second holding members. Thereby, it is possible to suppress an increase in the thickness of the substrate holder, and it is possible to secure a space for supplying a current path to the first surface and the second surface of the substrate. Further, since the current can be independently supplied to the first surface and the second surface of the substrate, the plating specifications such as the plating thickness of each surface can be independently controlled.

此外,可從至少1個第一外部連接接點經由至少1個第一配線及至少1個第一基板接點,對基板之第一面供給電流。藉由調整第一配線之長度,可調整至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值。同樣地,可從至少1個第二外部連接接點經由至少1個第二配線及至少1個第二基板接點,對基板之第二面供給電流。藉由調整第二配線之長度,可調整至少1個第二基板接點與至少1個第二外部連接接點之間的電阻值。 Further, a current may be supplied to the first surface of the substrate from at least one of the first external connection contacts via the at least one first wiring and the at least one first substrate contact. The resistance value between the at least one first substrate contact and the at least one first external connection contact can be adjusted by adjusting the length of the first wiring. Similarly, current can be supplied to the second surface of the substrate via at least one second external connection contact via at least one second wiring and at least one second substrate contact. The resistance value between the at least one second substrate contact and the at least one second external connection contact can be adjusted by adjusting the length of the second wiring.

上述實施形態中,第一保持構件與第二保持構件分別具有複數個基板接點,其係例如分別沿著基板之外周配置,並為了對基板供給電流而與基板接觸。另外,為了對基板供給電流而與基板接觸之基板接點,亦可係沿著基板外周彼此連結成為一體之1個基板接點。 In the above embodiment, each of the first holding member and the second holding member has a plurality of substrate contacts, which are disposed, for example, along the outer circumference of the substrate, and are in contact with the substrate in order to supply current to the substrate. Further, the substrate contacts that are in contact with the substrate in order to supply a current to the substrate may be one substrate contact that is integrally connected to each other along the outer periphery of the substrate.

第二形態如第一形態之基板固持器,其中前述第一保持構件具有:複數個前述第一基板接點;複數個前述第一外部連接接點;及複數個前述第一配線,其係電性連接前述複數個前述第一基板接點與前述複數個前述第一外部連接接點。 The substrate holder of the first aspect, wherein the first holding member has: a plurality of the first substrate contacts; a plurality of the first external connection contacts; and a plurality of the first wirings The plurality of the first substrate contacts are connected to the plurality of the first external connection contacts.

亦可使1個第一基板接點與1個外部連接接點一對一地對應,並以1個第一配線連接。此外,亦可在1個第一外部連接接點上連接2條以上第一配線,亦可將此等2條以上第一配線之另一端分別連接於不同的第一基板接點。此外,亦可將複數個外部連接接點連接於複數條第一配線,並將此等第一配線連接於1個基板接點。此外,亦可組合此等連接方法中之2個以上。 One of the first substrate contacts may be one-to-one corresponding to one external connection contact, and may be connected by one first wiring. In addition, two or more first wires may be connected to one first external connection contact, and the other ends of the two or more first wires may be connected to different first substrate contacts, respectively. In addition, a plurality of external connection contacts may be connected to the plurality of first wires, and the first wires may be connected to one substrate contact. Further, two or more of these connection methods may be combined.

第二形態藉由調整各第一配線之長度,可調整至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值。例如,藉由使各第一配線之長度相同,可使至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值均勻。此外,在使基板保持於基板固持器狀態下,藉由在一部分之第一配線與其他一部分的第一配線之間施加電位差,可在鍍覆處理之前確認通電。 In the second aspect, the resistance value between the at least one first substrate contact and the at least one first external connection contact can be adjusted by adjusting the length of each of the first wires. For example, by making the lengths of the respective first wires the same, the resistance value between the at least one first substrate contact and the at least one first external connection contact can be made uniform. Further, by holding the substrate in the substrate holder state, it is possible to confirm the energization before the plating process by applying a potential difference between the first wiring and the other portion of the first wiring.

第三形態如第二形態之基板固持器,其中前述第一保持構件具有第一支臂部,前述至少1個第一外部連接接點配置於前述第一支臂部,前述第二保持構件具有第二支臂部,前述至少1個第二外部連接接點配置於前述第二支臂部,前述至少1個第一外部連接接點與前述至少1個第二外部連接接點位於基板固持器之左右兩端。 A substrate holder according to a second aspect, wherein the first holding member has a first arm portion, the at least one first external connection contact is disposed on the first arm portion, and the second holding member has The second arm portion, the at least one second external connection contact is disposed on the second arm portion, and the at least one first external connection contact and the at least one second external connection contact are located at the substrate holder The left and right ends.

第三形態由於將基板固持器設置於鍍覆槽時,可從支臂部之左右兩端對基板之第一面及第二面進行饋電,因此,比使外部接點集中於支臂部之一方端部的形態,可防止基板固持器之厚度增大。 In the third aspect, when the substrate holder is placed in the plating tank, the first surface and the second surface of the substrate can be fed from the left and right ends of the arm portion, so that the external contact is concentrated on the arm portion. The shape of one of the square ends prevents the thickness of the substrate holder from increasing.

第四形態如第一形態之基板固持器,其中前述第一保持構件具有第一支臂部,且在前述第一支臂部之兩側分別具有用於在鍍覆槽內定位前述基板固持器之第一及第二定位部。 A substrate holder according to the first aspect, wherein the first holding member has a first arm portion, and has a substrate holder for positioning the substrate holder in the plating groove on both sides of the first arm portion First and second positioning portions.

第四形態由於將支臂部兩側之定位部設於第一保持構件,因此,即使第一保持構件與第二保持構件之嚙合狀態有偏差,不致影響兩側定位部之間的位置關係。 In the fourth aspect, since the positioning portions on both sides of the arm portion are provided to the first holding member, even if the meshing state of the first holding member and the second holding member is deviated, the positional relationship between the positioning portions on both sides is not affected.

第五形態如第一形態之基板固持器,其中前述第一保持構件具有第一本體部,其係具有前述第一開口部,前述第二保持構件具有第二本體部,其 係具有前述第二開口部,前述第一本體部及前述第二本體部具有彼此嚙合之定位構造。 A substrate holder according to the first aspect, wherein the first holding member has a first body portion having the first opening portion, and the second holding member has a second body portion having the second portion The opening portion, the first body portion and the second body portion have a positioning structure that meshes with each other.

第五形態由於具有第一及第二本體部之間的定位構造,因此,基板對第一及第二保持構件之定位精度提高。 According to the fifth aspect, since the positioning structure between the first and second body portions is provided, the positioning accuracy of the substrate with respect to the first and second holding members is improved.

第六形態如第一形態之基板固持器,其中前述第一保持構件具有:第一本體部,其係具有前述第一開口部;及第一支臂部,其係設於前述第一本體部之一端側;前述第二保持構件具有:第二本體部,其係具有前述第二開口部;及第二支臂部,其係設於前述第二本體部之一端側;在前述第一保持構件與前述第二保持構件嚙合狀態下,前述第一支臂部與前述第二支臂部在從前述第一及第二本體部朝向前述第一及第二支臂部的方向排列。 A substrate holder according to a first aspect, wherein the first holding member has: a first body portion having the first opening portion; and a first arm portion that is coupled to the first body portion One of the end faces; the second holding member has: a second body portion having the second opening portion; and a second arm portion attached to one end side of the second body portion; In a state in which the member is engaged with the second holding member, the first arm portion and the second arm portion are arranged in a direction from the first and second body portions toward the first and second arm portions.

第六形態由於第一支臂部與第二支臂部係在基板固持器之面方向排列而配置,因此可抑制支臂部之厚度增大。藉此,可減少排列複數個基板固持器時的整體厚度。 In the sixth aspect, since the first arm portion and the second arm portion are arranged in the direction of the surface of the substrate holder, the thickness of the arm portion can be suppressed from increasing. Thereby, the overall thickness when a plurality of substrate holders are arranged can be reduced.

第七形態如第一形態之基板固持器,其中前述第一保持構件具有:第一本體部,其係具有前述第一開口部及前述至少1個前述第一基板接點;第一支臂部,其係具有至少1個前述第一外部連接接點;及第一配線收容部,其係配置於前述第一本體部與前述第一支臂部之間,用於收容前述至少1個第一配線之多餘長度。 According to a seventh aspect, the substrate holder of the first aspect, wherein the first holding member has a first body portion having the first opening portion and the at least one of the first substrate contacts; and the first arm portion Having at least one of the first external connection contacts; and a first wiring accommodating portion disposed between the first body portion and the first arm portion for accommodating the at least one first The excess length of the wiring.

第七形態為了調整至少1個第一基板接點與至少1個第一外部連接接點之間的電阻值,而調整至少1個第一配線之長度時,會產生至少1個第一配線多餘的長度,不過可將此種第一配線之多餘長度收容於第一配線收容部。另外,以複數條第一配線個別地連接複數個第一基板接點情況下,為了調整複數個 第一基板接點與至少1個第一外部連接接點之間的電阻值而調整各第一配線的長度時,會依第一基板接點之位置而產生第一配線的多餘長度,不過可將此種第一配線之多餘長度收容於第一配線收容部。例如,係以複數個第一基板接點與至少1個第一外部連接接點之間的電阻值均勻之方式,來調整第一配線之長度。此外,為了調整對特定之基板接點的電流量,亦可以變更電阻值之方式改變第一配線的長度。 In a seventh aspect, in order to adjust a resistance value between at least one first substrate contact and at least one first external connection contact, and at least one first wiring is adjusted, at least one first wiring is generated. The length of the first wiring may be accommodated in the first wiring accommodating portion. In addition, when a plurality of first substrate contacts are individually connected by the plurality of first wires, the first one is adjusted to adjust a resistance value between the plurality of first substrate contacts and at least one first external connection contact. When the length of the wiring is long, the excess length of the first wiring is generated depending on the position of the first substrate contact, but the excess length of the first wiring can be accommodated in the first wiring accommodating portion. For example, the length of the first wiring is adjusted in such a manner that the resistance between the plurality of first substrate contacts and the at least one first external connection contact is uniform. Further, in order to adjust the amount of current to a specific substrate contact, the length of the first wiring may be changed by changing the resistance value.

第八形態如第七形態之基板固持器,其中前述第一配線收容部係與將前述第一配線收容部安裝於前述第一支臂部的第一安裝部一體形成。 According to a seventh aspect of the invention, in the substrate holder of the seventh aspect, the first wiring accommodating portion is integrally formed with the first mounting portion that mounts the first wiring accommodating portion to the first arm portion.

第八形態不需要另外設置將第一配線收容部安裝於第一支臂部的第一安裝部。可減少組合零件數量,抑制組合體的變動。 In the eighth aspect, it is not necessary to separately provide the first mounting portion that mounts the first wiring accommodating portion to the first arm portion. It can reduce the number of combined parts and suppress the variation of the combination.

第九形態如第八形態之基板固持器,其中前述第一配線收容部具有第一突出部,其係朝向前述第一本體部而突出,前述第一本體部具有2個第二突出部,其係突出於前述第一配線收容部之前述第一突出部的兩側。 According to a ninth aspect, in the substrate holder of the eighth aspect, the first wiring accommodating portion has a first protruding portion that protrudes toward the first body portion, and the first body portion has two second protruding portions. It protrudes from both sides of the first protruding portion of the first wiring accommodating portion.

第九形態避開主要配置收容第一配線收容部內之第一配線的收容空間部分,可在第一配線收容部厚的部分安裝第一本體部,可提高第一保持構件之剛性。 According to the ninth aspect, the accommodating space portion in which the first wiring in the first wiring accommodating portion is housed is disposed, and the first main body portion can be attached to the thick portion of the first wiring accommodating portion, whereby the rigidity of the first holding member can be improved.

第十形態如第七形態之基板固持器,其中在前述第一配線收容部及前述第一本體部之連結部位,於基板固持器外側面之側,前述第一配線收容部之壁在前述第一本體部之壁的外側重疊。 According to a tenth aspect, in the substrate holder of the seventh aspect, the first wiring housing portion and the first body portion are connected to each other on a side of the outer surface of the substrate holder, and the wall of the first wiring housing portion is in the The outer sides of the walls of a body portion overlap.

第十形態由於係在基板固持器外側面之面,將第一配線收容部之壁配置於第一本體部之壁的外側,第一配線收容部之壁成為傘構造,因此,可抑 制或防止鍍覆液藉由液體槳葉等而侵入基板固持器內部。抑制或防止鍍覆液侵入基板固持器內部,即可省略在基板固持器內之配線孔等配置密封。 According to the tenth aspect, since the wall of the first wiring accommodating portion is disposed outside the wall of the first main body portion on the outer surface of the substrate holder, the wall of the first wiring accommodating portion has an umbrella structure, thereby suppressing or preventing The plating solution intrudes into the inside of the substrate holder by a liquid blade or the like. By suppressing or preventing the plating solution from intruding into the inside of the substrate holder, the arrangement of the wiring holes and the like in the substrate holder can be omitted.

第十一形態如第七形態之基板固持器,其中係以前述第一配線收容部及前述第一本體部之連結部位,在將前述基板固持器配置於鍍覆槽時,位於比鍍覆液面上方之方式構成前述第一保持構件。 According to a seventh aspect of the invention, in the substrate holder of the seventh aspect, the connection portion between the first wiring accommodating portion and the first main body portion is located at a specific plating solution when the substrate holder is disposed in the plating groove The first holding member is formed in a manner above the surface.

第十一形態進一步抑制或防止鍍覆液侵入基板固持器內部,可省略在基板固持器內之配線孔等配置密封。 In the eleventh aspect, the plating solution is further suppressed or prevented from intruding into the inside of the substrate holder, and the arrangement of the wiring holes and the like in the substrate holder can be omitted.

第十二形態如第一形態之基板固持器,其中前述第一保持構件具有第一基板接點,其係用於在前述基板之前述第一面供給電流,前述第二保持構件具有第二基板接點,其係用於在前述基板之前述第二面供給電流,用於將前述第一基板接點在前述第一保持構件內固定之第一接點固定部、及用於將前述第二基板接點在前述第二保持構件內固定之第二接點固定部,在使前述第一保持構件及前述第二保持構件嚙合狀態下彼此不重疊。 According to a twelfth aspect, the substrate holder of the first aspect, wherein the first holding member has a first substrate contact for supplying a current to the first surface of the substrate, and the second holding member has a second substrate a contact for supplying a current to the second surface of the substrate, a first contact fixing portion for fixing the first substrate contact in the first holding member, and for using the second The second contact fixing portion, in which the substrate contact is fixed in the second holding member, does not overlap each other when the first holding member and the second holding member are engaged.

第十二形態防止第一接點固定部及第二接點固定部之間的干擾,可抑制或防止基板固持器之厚度增加。 The twelfth aspect prevents interference between the first contact fixing portion and the second contact fixing portion, and can suppress or prevent an increase in thickness of the substrate holder.

第十三形態如第十二形態之基板固持器,其中前述第一保持構件具有第一密封固持器,其係設於前述第一開口部之外側,前述第二保持構件具有第二密封固持器,其係設於前述第二開口部之外側,前述第一及第二基板接點分別藉由前述第一及第二接點固定部而安裝於前述第一及第二密封固持器,用於將前述第一密封固持器在前述第一保持構件內固定的第一密封固持器固定部、與用於將前述第二密封固持器在前述第二保持構件內固定的第二密封固持器固定部,在使前述第一保持構件及前述第二保持構件嚙合狀態下彼此不重疊。 According to a thirteenth aspect, the substrate holder of the twelfth aspect, wherein the first holding member has a first sealing holder attached to an outer side of the first opening portion, and the second holding member has a second sealing holder Provided on the outer side of the second opening, the first and second substrate contacts are respectively attached to the first and second sealing holders by the first and second contact fixing portions, and are used for a first sealing holder fixing portion in which the first sealing holder is fixed in the first holding member, and a second sealing holder fixing portion for fixing the second sealing holder in the second holding member The first holding member and the second holding member are not overlapped with each other in a meshed state.

第十三形態防止第一密封固持器固定部及第二密封固持器固定部之間的干擾,可抑制或防止基板固持器之厚度增加。 The thirteenth aspect prevents interference between the first seal holder fixing portion and the second seal holder fixing portion, and can suppress or prevent an increase in thickness of the substrate holder.

第十四形態如第一形態之基板固持器,其中前述第一保持構件具有第一密封,其係設於前述第一開口部之周圍,前述第二保持構件具有第二密封,其係設於前述第二開口部之周圍,前述第一保持構件及前述第二保持構件之至少一方,在比前述第一密封及前述第二密封外側進一步設有外側密封。 A substrate holder according to the first aspect, wherein the first holding member has a first seal that is disposed around the first opening, and the second holding member has a second seal that is attached to At least one of the first holding member and the second holding member is further provided with an outer seal around the first sealing member and the second sealing member around the second opening portion.

第十四形態可藉由設於第一保持構件及第二保持構件之至少一方的外側密封,與第一及第二密封一起從基板固持器外部保護基板接點。 The fourteenth aspect can be sealed from the outside of the substrate holder by the first and second seals by being sealed on the outer side of at least one of the first holding member and the second holding member.

第十五形態如第一形態之基板固持器,其中前述第一及第二開口部係矩形狀。 A fifteenth aspect is the substrate holder according to the first aspect, wherein the first and second openings are rectangular.

第十五形態可提供具有大型化趨勢之矩形形狀的基板用基板固持器。 According to the fifteenth aspect, it is possible to provide a substrate holder for a substrate having a rectangular shape having a large size.

第十六形態提供一種鍍覆裝置,係具備:基板固持器,其係用於保持基板;基板裝卸部,其係用於將前述基板裝卸於前述基板固持器;鍍覆槽,其係對保持前述基板之前述基板固持器實施鍍覆處理;及搬送機,其係搬送前述基板固持器。該鍍覆裝置之基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部。前述第一保持構件具有:至少1個第一基板接點,其係用於對前述基板之前述第一面供給電流;至少1個第一外部連接接點;及至少1個第一配線,其係電性連接前述至少1個第一基板接點與前述至少1個第一外部連接接點。前述第二保持構件具有:至少1個第二基板接點,其係用於對前述基板之前述第二面供給電流;至少 1個第二外部連接接點;及至少1個第二配線,其係電性連接前述至少1個第二基板接點與前述至少1個第二外部連接接點。前述至少1個第一外部連接接點與前述至少1個第二外部連接接點係電性獨立。 A sixteenth aspect provides a plating apparatus comprising: a substrate holder for holding a substrate; a substrate attaching and detaching portion for detaching the substrate to the substrate holder; and a plating groove for holding the substrate The substrate holder of the substrate is subjected to a plating treatment, and the conveyor is configured to transport the substrate holder. The substrate holder of the plating apparatus includes: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member sandwiching the first holding member The substrate is held and has a second opening for exposing the second surface of the substrate. The first holding member has at least one first substrate contact for supplying current to the first surface of the substrate, at least one first external connection contact, and at least one first wiring. The at least one first substrate contact and the at least one first external connection contact are electrically connected. The second holding member has at least one second substrate contact for supplying current to the second surface of the substrate, at least one second external connection contact, and at least one second wiring. The at least one second substrate contact and the at least one second external connection contact are electrically connected. The at least one first external connection contact is electrically independent of the at least one second external connection contact.

第十六形態由於在第一及第二保持構件上分別設有第一及第二外部連接接點、第一基板接點及第二基板接點、第一配線及第二配線,因此可將對基板之第一面及第二面供給電流的路徑分別分配於第一及第二保持構件。藉此,在鍍覆裝置中可抑制基板固持器之厚度增大,而且可確保設置對基板之第一面及第二面供給電流路徑的空間。此外,因為可對基板之第一面及第二面獨立供給電流,所以可獨立控制各面之鍍覆厚度等的鍍覆規格。 According to a sixteenth aspect, the first and second external connection contacts, the first substrate contact and the second substrate contact, the first wiring, and the second wiring are respectively disposed on the first and second holding members, and thus The paths for supplying current to the first surface and the second surface of the substrate are respectively distributed to the first and second holding members. Thereby, in the plating apparatus, it is possible to suppress an increase in the thickness of the substrate holder, and it is possible to secure a space for supplying a current path to the first surface and the second surface of the substrate. Further, since the current can be independently supplied to the first surface and the second surface of the substrate, the plating specifications such as the plating thickness of each surface can be independently controlled.

第十七形態提供一種基板固持器,係用於保持基板,且具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持;前述第一保持構件具有:第一外部連接部;至少1個第一基板接點,其係與前述基板之前述第一面接觸,用於對前述基板之前述第一面供給電流;及第一導電路徑構件,其係連接於前述第一外部連接部、與前述至少1個第一基板接點;前述第一導電路徑構件中可拆卸地安裝前述第一基板接點,前述第一導電路徑構件配置於以前述第一保持構件與前述第二保持構件所密封的空間內,並可裝卸地安裝於前述第一保持構件之本體。 A seventeenth aspect provides a substrate holder for holding a substrate, comprising: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member And being held by sandwiching the substrate together with the first holding member; the first holding member has: a first external connecting portion; at least one first substrate contact, which is in contact with the first surface of the substrate, And a first conductive path member connected to the first external connecting portion and the at least one first substrate; wherein the first conductive path member is The first substrate contact is detachably mounted, and the first conductive path member is disposed in a space sealed by the first holding member and the second holding member, and is detachably attached to the body of the first holding member.

該形態在將基板固持器配置於處理槽時,防止第一導電路徑構件接觸到處理液。此外,因為至少1個第一基板接點可對第一導電路徑構件拆卸地安裝,所以至少1個第一基板接點之更換容易。因而,藉由更換一部分第一基板接點,可繼續使用基板固持器,可減少基板固持器之維修及更換需要的費用。例 如處理液發生洩漏時,依基板固持器在處理槽內之姿勢,藉由僅更換容易接觸到處理液之基板接點等(基板固持器採用垂直姿勢時,為基板固持器底部側)一部分基板接點,與更換整個基板固持器或整個第一基板接點時比較可減少費用。 In this embodiment, when the substrate holder is disposed in the processing tank, the first conductive path member is prevented from coming into contact with the processing liquid. Further, since at least one of the first substrate contacts can be detachably mounted to the first conductive path member, replacement of at least one of the first substrate contacts is easy. Therefore, by replacing a part of the first substrate contacts, the substrate holder can be continuously used, and the cost required for maintenance and replacement of the substrate holder can be reduced. For example, when the processing liquid leaks, the substrate holder is in the processing tank, and only a part of the substrate which is easily contacted with the processing liquid is replaced (the substrate holder is in the vertical posture, and the substrate holder is on the bottom side) The contact can be reduced in cost when replacing the entire substrate holder or the entire first substrate contact.

此外,基板固持器具備:至少1個基板接點、至少1個外部接點、及連接此等之導電路徑構件,且可更換地設有導電路徑構件。如此,當導電路徑構件與鍍覆液接觸而產生腐蝕或析出金屬時,可更換導電路徑構件。因而,藉由更換導電路徑構件可繼續使用基板固持器,可減少基板固持器之維修及更換需要的費用。 Further, the substrate holder includes at least one substrate contact, at least one external contact, and a conductive path member connected thereto, and the conductive path member is replaceably provided. As such, when the conductive path member comes into contact with the plating solution to cause corrosion or precipitation of the metal, the conductive path member can be replaced. Therefore, the substrate holder can be continuously used by replacing the conductive path member, and the cost required for maintenance and replacement of the substrate holder can be reduced.

此外,使用連接於複數個第一基板接點之第一導電路徑構件情況下,可省略配線收容部,而謀求基板固持器之小型化及降低成本。此外,藉由將對複數個基板接點之配線彙整成導電路徑構件,可確保增大導電路徑構件之剖面積,可減少導電路徑構件每個單位長度之配線電阻。藉此,可減少在從外部連接部至各第一基板接點的路徑上電壓下降之差。結果,可使通過各第一基板接點而流動之鍍覆電流均勻化,可使鍍覆膜厚均勻化。此外,由於彙整對複數個第一基板接點之配線成為導電路徑構件,因此可減少複數個第一基板接點為止的配線尺寸,或是省略纜線配線。 Further, in the case of using the first conductive path member connected to the plurality of first substrate contacts, the wiring accommodating portion can be omitted, and the substrate holder can be downsized and cost can be reduced. Further, by arranging the wirings of the plurality of substrate contacts into the conductive path members, it is possible to ensure an increase in the sectional area of the conductive path members, and it is possible to reduce the wiring resistance per unit length of the conductive path members. Thereby, the difference in voltage drop across the path from the external connection portion to each of the first substrate contacts can be reduced. As a result, the plating current flowing through the respective first substrate contacts can be made uniform, and the thickness of the plating film can be made uniform. Further, since the wiring for the plurality of first substrate contacts is a conductive path member, the wiring size up to the plurality of first substrate contacts can be reduced, or the cable wiring can be omitted.

第十八形態如第十七形態之基板固持器,其中前述第一保持構件具有複數個第一基板接點,並且進一步具有第二導電路徑構件,其係連接於前述第一外部連接部、及前述複數個第一基板接點之至少1個,並與前述第一導電路徑構件分離。 The substrate holder of the seventeenth aspect, wherein the first holding member has a plurality of first substrate contacts, and further has a second conductive path member connected to the first external connecting portion, and At least one of the plurality of first substrate contacts is separated from the first conductive path member.

該形態藉由將導電路徑分割形成第一導電路徑構件、第二導電路徑構件,在使基板保持於基板固持器狀態下,藉由在第一導電路徑構件與第二導 電路徑構件之間施加電位差,可在鍍覆處理之前確認通電。此外,藉由將複數個第一基板接點分配於第一及第二導電路徑構件,可抑制從外部連接部至各第一基板接點之路徑長度差異。例如,藉由將在第一保持構件對稱之各一半部分的第一基板連接接點分配於第一及第二導電路徑構件,可使從外部連接部至各第一基板接點的路徑長度差異大致相同。此外,各導電路徑構件可進行更換。 The form is formed by dividing the conductive path into the first conductive path member and the second conductive path member, and applying a potential difference between the first conductive path member and the second conductive path member while holding the substrate in the substrate holder state , the power can be confirmed before the plating process. Further, by allocating a plurality of first substrate contacts to the first and second conductive path members, the difference in path length from the external connection portion to each of the first substrate contacts can be suppressed. For example, by assigning the first substrate connection contacts of the respective half portions of the first holding member symmetrical to the first and second conductive path members, the path length difference from the external connection portion to each of the first substrate contacts can be made. Roughly the same. In addition, each conductive path member can be replaced.

第十九形態如第十八形態之基板固持器,其中前述第一導電路徑構件及前述第二導電路徑構件之至少一方可分割成複數個路徑片。 A substrate holder according to the eighteenth aspect, wherein at least one of the first conductive path member and the second conductive path member is divided into a plurality of path pieces.

該形態各路徑片可進行更換。例如基板固持器中發生處理液洩漏時,依基板固持器在處理槽內之姿勢,存在容易受到處理液影響的部分。將基板固持器以豎立姿勢配置於鍍覆槽情況下,發生處理液洩漏時,處理液容易蓄積在基板固持器之最下部附近。因而,處理液發生洩漏,僅基板固持器最下部附近之路徑片接觸處理液時,可取代更換整個導電路徑構件,而僅更換接觸到處理液的路徑片。與更換整個基板固持器、或整個導電路徑構件時比較可減少費用。此外,藉由形成各個路徑片然後加以組合,可廉價製造導電路徑構件。 In this form, each path piece can be replaced. For example, when a treatment liquid leaks in the substrate holder, depending on the posture of the substrate holder in the treatment tank, there is a portion that is easily affected by the treatment liquid. When the substrate holder is placed in the plating tank in an upright position, when the treatment liquid leaks, the treatment liquid is likely to accumulate in the vicinity of the lowermost portion of the substrate holder. Therefore, the processing liquid leaks, and only when the path piece near the lowermost portion of the substrate holder contacts the processing liquid, instead of replacing the entire conductive path member, only the path piece contacting the processing liquid is replaced. The cost can be reduced compared to when replacing the entire substrate holder, or the entire conductive path member. Further, by forming the respective path sheets and then combining them, the conductive path members can be manufactured at low cost.

第二十形態如第十七形態之基板固持器,其中前述第一導電路徑構件係板狀或棒狀。 According to a twenty-first aspect, the substrate holder of the seventeenth aspect, wherein the first conductive path member is plate-shaped or rod-shaped.

藉由將第一導電路徑構件形成板狀,可抑制基板固持器之厚度增大。藉由將第一導電路徑構件形成棒狀,沿著彎曲之導電路徑的形狀加工容易。 By forming the first conductive path member into a plate shape, the thickness of the substrate holder can be suppressed from increasing. By forming the first conductive path member into a rod shape, it is easy to process along the shape of the curved conductive path.

第二一形態如第十七至第二十形態中任何一種形態之基板固持器,其中前述第二保持構件具有第二開口部,其係用於露出前述基板之第二面,且具有:至少1個第二基板接點,其係接觸於前述基板之前述第二面,用於對前述基板之前述第二面供給電流;第二外部連接部;及第三導電路徑構件,其係連 接於前述第二外部連接部與前述至少1個第二基板接點;前述第三導電路徑構件中可拆卸地安裝前述第二基板接點。 The substrate holder of any one of the seventeenth to twentieth aspects, wherein the second holding member has a second opening portion for exposing the second surface of the substrate, and having: at least a second substrate contact contacting the second surface of the substrate for supplying current to the second surface of the substrate; a second external connection portion; and a third conductive path member connected to The second external connection portion is in contact with the at least one second substrate; and the second substrate contact is detachably mounted on the third conductive path member.

該形態在兩面鍍覆處理用之基板固持器的各保持構件中,可達到上述形態所敘述之作用效果。 In this embodiment, the effects of the above-described embodiments can be achieved in the respective holding members of the substrate holder for the double-side plating treatment.

第二二形態提供一種鍍覆裝置,係具備:基板固持器,其係用於保持基板;基板裝卸部,其係用於將前述基板裝卸於前述基板固持器;及鍍覆槽,其係用於對保持前述基板之前述基板固持器實施鍍覆處理。前述基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持。前述第一保持構件具有:第一外部連接部;至少1個第一基板接點,其係接觸於前述基板之前述第一面,用於對前述基板之前述第一面供給電流;及第一導電路徑構件,其係連接於前述第一外部連接部、與前述至少1個第一基板接點;前述第一導電路徑構件中可拆卸地安裝前述第一基板接點,前述第一導電路徑構件配置於以前述第一保持構件與前述第二保持構件所密封之空間內,並可裝卸地安裝於前述第一保持構件之本體。該形態可達到與第十七形態同樣之作用效果。 A second aspect of the invention provides a plating apparatus comprising: a substrate holder for holding a substrate; a substrate attaching and detaching portion for attaching and detaching the substrate to the substrate holder; and a plating groove for use The plating process is performed on the substrate holder holding the substrate. The substrate holder includes: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member for sandwiching the substrate with the first holding member And keep it. The first holding member has: a first external connecting portion; at least one first substrate contact contacting the first surface of the substrate for supplying current to the first surface of the substrate; and first a conductive path member connected to the first external connection portion and the at least one first substrate contact; the first conductive path member detachably mounting the first substrate contact, the first conductive path member The utility model is disposed in a space sealed by the first holding member and the second holding member, and is detachably attached to the body of the first holding member. This form can achieve the same effects as the seventeenth aspect.

以上,係依據幾個例子說明本發明之實施形態,不過上述發明之實施形態係為了容易理解本發明者,而並非限定本發明者。本發明在不脫離其旨趣範圍內可變更及改良,並且本發明當然包含其等價物。例如大型基板之形狀不限定於矩形,亦可為正方形,亦可為其他多角形狀,例如五角形或六角形。此外,將圓形形狀之基板裝卸於基板固持器的基板裝卸裝置當然亦可適用本發明。此外,在可解決上述問題之至少一部分的範圍內、或是可達到效果之至少一部分的範圍內,申請專利範圍及說明書所記載之各元件可任意組合或省略。 The embodiments of the present invention have been described above based on a few examples, but the embodiments of the invention are not intended to limit the invention. The present invention may be modified and improved without departing from the scope of the invention, and the invention may of course include equivalents thereof. For example, the shape of the large substrate is not limited to a rectangle, and may be a square shape, or may be other polygonal shapes such as a pentagon or a hexagon. Further, the present invention can be applied to a substrate attaching and detaching device that attaches and detaches a circular-shaped substrate to a substrate holder. Further, within the scope of at least a part of the above-mentioned problems, or at least a part of the effect, the components described in the claims and the description can be arbitrarily combined or omitted.

本申請案依據2017年6月28日提出之日本申請專利編號特願2017-126582號及2018年4月17日提出之日本申請專利編號特願2018-079388號主張優先權。包含2017年6月28日提出之日本申請專利編號特願2017-126582號、及2018年4月17日提出之日本申請專利編號特願2018-079388號之說明書、申請專利範圍、發明摘要的全部揭示內容,以參考之方式全部納入本申請案。 The present application claims priority based on Japanese Patent Application No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The Japanese Patent Application No. 2017-126582, filed on June 28, 2017, and the specification of the Japanese Patent Application No. 2018-079388, filed on April 17, 2018, the entire disclosure of The disclosure is incorporated herein by reference in its entirety.

包含國際公開第2014-076781號(專利文獻1)、日本特開2008-184692號公報(專利文獻2)、美國專利第8236151號說明書(專利文獻3)之說明書、申請專利範圍、發明摘要的全部揭示內容,以參考之方式全部納入本申請案。 The specification, the scope of the patent application, and the summary of the invention are disclosed in the specification of the Japanese Patent Publication No. Hei. No. 2008-184692 (Patent Document 1), JP-A-2008-184692 (Patent Document 2), and U.S. Patent No. 82,615,151 (Patent Document 3). The disclosure is incorporated herein by reference in its entirety.

Claims (22)

一種基板固持器,其係用於保持基板,且具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部;前述第一保持構件具有:至少1個第一基板接點,其係用於對前述基板之前述第一面供給電流;至少1個第一外部連接接點;及至少1個第一配線,其係電性連接前述至少1個第一基板接點與前述至少1個第一外部連接接點;前述第二保持構件具有:至少1個第二基板接點,其係用於對前述基板之前述第二面供給電流;至少1個第二外部連接接點;及至少1個第二配線,其係電性連接前述至少1個第二基板接點與前述至少1個第二外部連接接點;其中,前述至少1個第一外部連接接點與前述至少1個第二外部連接接點係電性獨立。  A substrate holder for holding a substrate, comprising: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member for use in the foregoing The first holding member is held together with the substrate, and has a second opening for exposing the second surface of the substrate; the first holding member has: at least one first substrate contact, which is used for Supplying current to the first surface of the substrate; at least one first external connection contact; and at least one first wiring electrically connecting the at least one first substrate contact and the at least one first external Connecting the contact; the second holding member has: at least one second substrate contact for supplying current to the second surface of the substrate; at least one second external connection contact; and at least one a second wiring electrically connecting the at least one second substrate contact and the at least one second external connection contact; wherein the at least one first external connection contact and the at least one second external connection Contact is electrically independent   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有: 複數個前述第一基板接點;複數個前述第一外部連接接點;及複數個前述第一配線,其係電性連接前述複數個前述第一基板接點與前述複數個前述第一外部連接接點。  The substrate holder of claim 1, wherein the first holding member has: a plurality of the first substrate contacts; a plurality of the first external connection contacts; and a plurality of the first wirings The plurality of the first substrate contacts are connected to the plurality of the first external connection contacts.   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有第一支臂部,前述至少1個第一外部連接接點配置於前述第一支臂部,前述第二保持構件具有第二支臂部,前述至少1個第二外部連接接點配置於前述第二支臂部,前述至少1個第一外部連接接點與前述至少1個第二外部連接接點位於基板固持器之左右兩端。  The substrate holder of claim 1, wherein the first holding member has a first arm portion, and the at least one first outer connecting contact is disposed on the first arm portion, and the second holding member has The second arm portion, the at least one second external connection contact is disposed on the second arm portion, and the at least one first external connection contact and the at least one second external connection contact are located at the substrate holder The left and right ends.   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有第一支臂部,且在前述第一支臂部之兩側分別具有用於在鍍覆槽內定位前述基板固持器之第一及第二定位部。  The substrate holder of claim 1, wherein the first holding member has a first arm portion, and has a substrate holder for positioning the substrate holder in the plating groove on both sides of the first arm portion First and second positioning portions.   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有第一本體部,該第一本體部具有前述第一開口部,前述第二保持構件具有第二本體部,該第二本體部具有前述第二開口部,前述第一本體部及前述第二本體部具有彼此嚙合之定位構造。  The substrate holder of claim 1, wherein the first holding member has a first body portion, the first body portion has the first opening portion, and the second holding member has a second body portion, the second portion The main body portion has the second opening portion, and the first body portion and the second body portion have a positioning structure that meshes with each other.   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有: 第一本體部,其係具有前述第一開口部;及第一支臂部,其係設於前述第一本體部之一端側;前述第二保持構件具有:第二本體部,其係具有前述第二開口部;及第二支臂部,其係設於前述第二本體部之一端側;其中,在前述第一保持構件與前述第二保持構件嚙合狀態下,前述第一支臂部與前述第二支臂部在從前述第一及第二本體部朝向前述第一及第二支臂部的方向排列。  The substrate holder of claim 1, wherein the first holding member has: a first body portion having the first opening portion; and a first arm portion coupled to the first body portion The second holding member has: a second main body portion having the second opening portion; and a second arm portion attached to one end side of the second main body portion; wherein, in the foregoing In a state in which the holding member is engaged with the second holding member, the first arm portion and the second arm portion are arranged in a direction from the first and second body portions toward the first and second arm portions.   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有:第一本體部,其係具有前述第一開口部及前述至少1個前述第一基板接點;第一支臂部,其係具有至少1個前述第一外部連接接點;及第一配線收容部,其係配置於前述第一本體部與前述第一支臂部之間,用於收容前述至少1個第一配線之多餘長度。  The substrate holder of claim 1, wherein the first holding member has: a first body portion having the first opening portion and the at least one of the first substrate contacts; and a first arm portion Having at least one of the first external connection contacts; and a first wiring accommodating portion disposed between the first body portion and the first arm portion for accommodating the at least one first The excess length of the wiring.   如申請專利範圍第7項之基板固持器,其中前述第一配線收容部係與將前述第一本體部安裝於前述第一支臂部的第一安裝部一體形成。  The substrate holder of claim 7, wherein the first wiring accommodating portion is integrally formed with a first mounting portion that mounts the first body portion to the first arm portion.   如申請專利範圍第8項之基板固持器,其中前述第一配線收容部具有第一突出部,其係朝向前述第一本體部而突出, 前述第一本體部具有2個第二突出部,其係突出於前述第一配線收容部之前述第一突出部的兩側。  The substrate holder of claim 8, wherein the first wiring accommodating portion has a first protruding portion that protrudes toward the first body portion, and the first body portion has two second protruding portions. It protrudes from both sides of the first protruding portion of the first wiring accommodating portion.   如申請專利範圍第7項之基板固持器,其中在前述第一配線收容部及前述第一本體部之連結部位,於基板固持器外側面之側,前述第一配線收容部之壁在前述第一本體部之壁的外側重疊。  The substrate holder of claim 7, wherein the wall of the first wiring accommodating portion is on the side of the outer surface of the substrate holder at a portion where the first wiring accommodating portion and the first body portion are connected to each other The outer sides of the walls of a body portion overlap.   如申請專利範圍第7項之基板固持器,其中係以前述第一配線收容部及前述第一本體部之連結部位,在將前述基板固持器配置於鍍覆槽時,位於比鍍覆液面上方之方式構成前述第一保持構件。  The substrate holder according to claim 7, wherein the substrate holder is disposed in the plating tank when the substrate holder is disposed in the plating chamber, and the plating layer is located The above manner constitutes the aforementioned first holding member.   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有第一基板接點,其係用於在前述基板之前述第一面供給電流,前述第二保持構件具有第二基板接點,其係用於在前述基板之前述第二面供給電流,用於將前述第一基板接點在前述第一保持構件內固定之第一接點固定部、及用於將前述第二基板接點在前述第二保持構件內固定之第二接點固定部,在使前述第一保持構件及前述第二保持構件嚙合狀態下彼此不重疊。  The substrate holder of claim 1, wherein the first holding member has a first substrate contact for supplying current to the first surface of the substrate, and the second holding member has a second substrate a point for supplying a current to the second surface of the substrate, a first contact fixing portion for fixing the first substrate contact in the first holding member, and a second substrate for the second substrate The second contact fixing portion that is fixed in the second holding member at the contact does not overlap each other when the first holding member and the second holding member are engaged.   如申請專利範圍第12項之基板固持器,其中前述第一保持構件具有第一密封固持器,其係設於前述第一開口部之外側, 前述第二保持構件具有第二密封固持器,其係設於前述第二開口部之外側,前述第一及第二基板接點分別藉由前述第一及第二接點固定部而安裝於前述第一及第二密封固持器,用於將前述第一密封固持器在前述第一保持構件內固定的第一固持器固定部、與用於將前述第二密封固持器在前述第二保持構件內固定的第二固持器固定部,在使前述第一保持構件及前述第二保持構件嚙合狀態下彼此不重疊。  The substrate holder of claim 12, wherein the first holding member has a first sealing holder disposed on an outer side of the first opening portion, and the second holding member has a second sealing holder, Provided on the outer side of the second opening, the first and second substrate contacts are respectively attached to the first and second sealing holders by the first and second contact fixing portions, and are used for a first holder fixing portion fixed in the first holding member by the first sealing holder and a second holder fixing portion for fixing the second sealing holder in the second holding member, The first holding member and the second holding member do not overlap each other in an engaged state.   如申請專利範圍第1項之基板固持器,其中前述第一保持構件具有第一密封,其係設於前述第一開口部之周圍,前述第二保持構件具有第二密封,其係設於前述第二開口部之周圍,前述第一保持構件及前述第二保持構件之至少一方,在比前述第一密封及前述第二密封外側進一步設有外側密封。  The substrate holder of claim 1, wherein the first holding member has a first seal disposed around the first opening portion, and the second holding member has a second seal, which is provided in the foregoing At least one of the first holding member and the second holding member is further provided with an outer seal around the first seal and the second seal outside the second opening.   如申請專利範圍第1項之基板固持器,其中前述第一及第二開口部係矩形狀。  The substrate holder of claim 1, wherein the first and second openings are rectangular.   一種鍍覆裝置,係具備:基板固持器,其係用於保持基板;基板裝卸部,其係用於將前述基板裝卸於前述基板固持器;鍍覆槽,其係對保持前述基板之前述基板固持器實施鍍覆處理;及搬送機,其係搬送前述基板固持器;前述基板固持器具備: 第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係與前述第一保持構件一起夾著前述基板而保持,且具有用於露出前述基板之第二面的第二開口部;前述第一保持構件具有:至少1個第一基板接點,其係用於對前述基板之前述第一面供給電流;至少1個第一外部連接接點;及至少1個第一配線,其係電性連接前述至少1個第一基板接點與前述至少1個第一外部連接接點;前述第二保持構件具有:至少1個第二基板接點,其係用於對前述基板之前述第二面供給電流;至少1個第二外部連接接點;及至少1個第二配線,其係電性連接前述至少1個第二基板接點與前述至少1個第二外部連接接點;其中,前述至少1個第一外部連接接點與前述至少1個第二外部連接接點係電性獨立。  A plating apparatus comprising: a substrate holder for holding a substrate; a substrate attaching and detaching portion for detaching the substrate to the substrate holder; and a plating groove for holding the substrate of the substrate The holder is subjected to a plating treatment; and the conveyor is configured to convey the substrate holder; the substrate holder includes: a first holding member having a first opening for exposing the first surface of the substrate; and a second holding member held together with the first holding member sandwiching the substrate, and having a second opening for exposing the second surface of the substrate; the first holding member having: at least one first substrate a contact for supplying current to the first surface of the substrate; at least one first external connection contact; and at least one first wiring electrically connecting the at least one first substrate contact And the at least one first external connection contact; the second holding member has: at least one second substrate contact for supplying current to the second surface of the substrate; at least one second And at least one second wiring electrically connecting the at least one second substrate contact and the at least one second external connection contact; wherein the at least one first external connection The point is electrically independent of the at least one second external connection contact.   一種基板固持器,係用於保持基板,且具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及 第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持;前述第一保持構件具有:第一外部連接部;至少1個第一基板接點,其係與前述基板之前述第一面接觸,用於對前述基板之前述第一面供給電流;及第一導電路徑構件,其係連接於前述第一外部連接部、與前述至少1個第一基板接點;前述第一導電路徑構件中可拆卸地安裝前述第一基板接點,前述第一導電路徑構件配置於以前述第一保持構件與前述第二保持構件所密封的空間內,並可裝卸地安裝於前述第一保持構件之本體。  A substrate holder for holding a substrate, comprising: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member for use in the foregoing Holding the holding member together with the substrate; the first holding member has: a first external connecting portion; at least one first substrate contact contacting the first surface of the substrate for the substrate The first surface is supplied with current; and the first conductive path member is connected to the first external connection portion and the at least one first substrate contact; and the first conductive path member is detachably mounted to the first surface The first conductive path member is disposed in a space sealed by the first holding member and the second holding member, and is detachably attached to the body of the first holding member.   如申請專利範圍第17項之基板固持器,其中前述第一保持構件具有複數個第一基板接點,並且進一步具有第二導電路徑構件,其係連接於前述第一外部連接部、及前述複數個第一基板接點之至少1個,並與前述第一導電路徑構件分離。  The substrate holder of claim 17, wherein the first holding member has a plurality of first substrate contacts, and further has a second conductive path member connected to the first external connecting portion, and the foregoing plurality At least one of the first substrate contacts is separated from the first conductive path member.   如申請專利範圍第18項之基板固持器,其中前述第一導電路徑構件及前述第二導電路徑構件之至少一方可分割成複數個路徑片。  The substrate holder of claim 18, wherein at least one of the first conductive path member and the second conductive path member is divided into a plurality of path pieces.   如申請專利範圍第17項之基板固持器,其中前述第一導電路徑構件係板狀或棒狀。  The substrate holder of claim 17, wherein the first conductive path member is plate-shaped or rod-shaped.   如申請專利範圍第17~20項中任一項之基板固持器, 其中前述第二保持構件具有第二開口部,其係用於露出前述基板之第二面,且具有:至少1個第二基板接點,其係接觸於前述基板之前述第二面,用於對前述基板之前述第二面供給電流;第二外部連接部;及第三導電路徑構件,其係連接於前述第二外部連接部與前述至少1個第二基板接點;其中,前述第三導電路徑構件中可拆卸地安裝前述第二基板接點。  The substrate holder according to any one of claims 17 to 20, wherein the second holding member has a second opening for exposing the second surface of the substrate, and has at least one second a substrate contact that contacts the second surface of the substrate for supplying current to the second surface of the substrate; a second external connection portion; and a third conductive path member connected to the second external portion The connecting portion is in contact with the at least one second substrate; wherein the second substrate contact is detachably mounted on the third conductive path member.   一種鍍覆裝置,係具備:基板固持器,其係用於保持基板;基板裝卸部,其係用於將前述基板裝卸於前述基板固持器;及鍍覆槽,其係用於對保持前述基板之前述基板固持器實施鍍覆處理;前述基板固持器具備:第一保持構件,其係具有用於露出前述基板之第一面的第一開口部;及第二保持構件,其係用於與前述第一保持構件一起夾著前述基板而保持;前述第一保持構件具有:第一外部連接部;至少1個第一基板接點,其係接觸於前述基板之前述第一面,用於對前述基板之前述第一面供給電流;及 第一導電路徑構件,其係連接於前述第一外部連接部、與前述至少1個第一基板接點;前述第一導電路徑構件中可拆卸地安裝前述第一基板接點,前述第一導電路徑構件配置於以前述第一保持構件與前述第二保持構件所密封之空間內,並可裝卸地安裝於前述第一保持構件之本體。  A plating apparatus comprising: a substrate holder for holding a substrate; a substrate attaching and detaching portion for detaching the substrate to the substrate holder; and a plating groove for holding the substrate The substrate holder is subjected to a plating treatment; the substrate holder includes: a first holding member having a first opening for exposing a first surface of the substrate; and a second holding member for The first holding member is held together with the substrate; the first holding member has: a first external connecting portion; at least one first substrate contact contacting the first surface of the substrate for The first surface of the substrate is supplied with current; and the first conductive path member is connected to the first external connection portion and the at least one first substrate contact; and the first conductive path member is detachably mounted In the first substrate contact, the first conductive path member is disposed in a space sealed by the first holding member and the second holding member, and is detachably attached to the foregoing A holding member of the body.  
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