TWI785159B - 濾光器及攝像裝置 - Google Patents
濾光器及攝像裝置 Download PDFInfo
- Publication number
- TWI785159B TWI785159B TW107144019A TW107144019A TWI785159B TW I785159 B TWI785159 B TW I785159B TW 107144019 A TW107144019 A TW 107144019A TW 107144019 A TW107144019 A TW 107144019A TW I785159 B TWI785159 B TW I785159B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- wavelength
- optical filter
- spectral transmittance
- filter
- Prior art date
Links
- 238000002834 transmittance Methods 0.000 claims abstract description 239
- 230000003595 spectral effect Effects 0.000 claims abstract description 205
- 230000003287 optical effect Effects 0.000 claims abstract description 199
- 238000003384 imaging method Methods 0.000 claims description 84
- 239000006096 absorbing agent Substances 0.000 claims description 36
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 29
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 229910001431 copper ion Inorganic materials 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000010410 layer Substances 0.000 description 160
- 239000007788 liquid Substances 0.000 description 135
- 239000000758 substrate Substances 0.000 description 90
- 239000011248 coating agent Substances 0.000 description 73
- 238000000576 coating method Methods 0.000 description 73
- 239000000243 solution Substances 0.000 description 68
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 64
- 238000000411 transmission spectrum Methods 0.000 description 57
- 239000011521 glass Substances 0.000 description 53
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 42
- 229920005989 resin Polymers 0.000 description 42
- 239000011347 resin Substances 0.000 description 42
- 230000000052 comparative effect Effects 0.000 description 41
- -1 benzyl halide Chemical class 0.000 description 32
- 239000000203 mixture Substances 0.000 description 32
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 32
- 238000003756 stirring Methods 0.000 description 30
- 239000002904 solvent Substances 0.000 description 26
- 239000011159 matrix material Substances 0.000 description 19
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 229920002050 silicone resin Polymers 0.000 description 18
- 239000000047 product Substances 0.000 description 17
- 239000000126 substance Substances 0.000 description 15
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 12
- 239000010419 fine particle Substances 0.000 description 12
- 230000035945 sensitivity Effects 0.000 description 12
- NWFNSTOSIVLCJA-UHFFFAOYSA-L copper;diacetate;hydrate Chemical compound O.[Cu+2].CC([O-])=O.CC([O-])=O NWFNSTOSIVLCJA-UHFFFAOYSA-L 0.000 description 10
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 10
- 239000000178 monomer Substances 0.000 description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 9
- 229910019142 PO4 Inorganic materials 0.000 description 8
- 150000001879 copper Chemical class 0.000 description 8
- 238000013461 design Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 235000021317 phosphate Nutrition 0.000 description 8
- 239000011241 protective layer Substances 0.000 description 8
- 239000011265 semifinished product Substances 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000010452 phosphate Substances 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 7
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 6
- 239000006059 cover glass Substances 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 150000003014 phosphoric acid esters Chemical class 0.000 description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229910052594 sapphire Inorganic materials 0.000 description 5
- 239000010980 sapphire Substances 0.000 description 5
- 238000007738 vacuum evaporation Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 4
- 239000004962 Polyamide-imide Substances 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- 239000005388 borosilicate glass Substances 0.000 description 4
- UOKRBSXOBUKDGE-UHFFFAOYSA-N butylphosphonic acid Chemical compound CCCCP(O)(O)=O UOKRBSXOBUKDGE-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229920002312 polyamide-imide Polymers 0.000 description 4
- 239000012266 salt solution Substances 0.000 description 4
- XDGIQCFWQNHSMV-UHFFFAOYSA-N (4-bromophenyl)phosphonic acid Chemical compound OP(O)(=O)C1=CC=C(Br)C=C1 XDGIQCFWQNHSMV-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 102100026353 F-box-like/WD repeat-containing protein TBL1XR1 Human genes 0.000 description 3
- 101000835675 Homo sapiens F-box-like/WD repeat-containing protein TBL1XR1 Proteins 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 101100341123 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) IRA2 gene Proteins 0.000 description 3
- RRJHFUHAKCSNRY-UHFFFAOYSA-L [Cu+2].[O-]P([O-])=O Chemical compound [Cu+2].[O-]P([O-])=O RRJHFUHAKCSNRY-UHFFFAOYSA-L 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- WOYKGBHMRHXOCY-UHFFFAOYSA-L copper;(4-bromophenyl)-dioxido-oxo-$l^{5}-phosphane Chemical compound [Cu+2].[O-]P([O-])(=O)C1=CC=C(Br)C=C1 WOYKGBHMRHXOCY-UHFFFAOYSA-L 0.000 description 3
- DHGSSULXZRNIPW-UHFFFAOYSA-L copper;dioxido-oxo-phenyl-$l^{5}-phosphane Chemical compound [Cu+2].[O-]P([O-])(=O)C1=CC=CC=C1 DHGSSULXZRNIPW-UHFFFAOYSA-L 0.000 description 3
- 238000004807 desolvation Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002454 metastable transfer emission spectrometry Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 239000004431 polycarbonate resin Substances 0.000 description 3
- 238000006068 polycondensation reaction Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 229920005672 polyolefin resin Polymers 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- ZKZQOJRUDTWMMA-UHFFFAOYSA-L P([O-])([O-])=O.C(CCC)[Cu+2] Chemical compound P([O-])([O-])=O.C(CCC)[Cu+2] ZKZQOJRUDTWMMA-UHFFFAOYSA-L 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 239000005303 fluorophosphate glass Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229940078552 o-xylene Drugs 0.000 description 2
- 125000005429 oxyalkyl group Chemical group 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000005365 phosphate glass Substances 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- FUTSMJLWQZAVAO-UHFFFAOYSA-N C(C1CO1)OCCCOCCC[Si](OCC)(OCC)C Chemical compound C(C1CO1)OCCCOCCC[Si](OCC)(OCC)C FUTSMJLWQZAVAO-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- ORBWDPCMBBPOQU-UHFFFAOYSA-L P(OCCCC)([O-])=O.[Cu+2].C(CCC)OP([O-])=O Chemical compound P(OCCCC)([O-])=O.[Cu+2].C(CCC)OP([O-])=O ORBWDPCMBBPOQU-UHFFFAOYSA-L 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- RYGMFSIKBFXOCR-AHCXROLUSA-N copper-60 Chemical compound [60Cu] RYGMFSIKBFXOCR-AHCXROLUSA-N 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 125000006501 nitrophenyl group Chemical group 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- RCMHUQGSSVZPDG-UHFFFAOYSA-N phenoxybenzene;phosphoric acid Chemical compound OP(O)(O)=O.C=1C=CC=CC=1OC1=CC=CC=C1 RCMHUQGSSVZPDG-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- CNTXYLCDFKRSRI-UHFFFAOYSA-N phosphoric acid;1-tridecoxytridecane Chemical compound OP(O)(O)=O.CCCCCCCCCCCCCOCCCCCCCCCCCCC CNTXYLCDFKRSRI-UHFFFAOYSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/50—Constructional details
- H04N23/55—Optical parts specially adapted for electronic image sensors; Mounting thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Optical Filters (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Glass Compositions (AREA)
- Burglar Alarm Systems (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP2017-235002 | 2017-12-07 | ||
| JP2017235002 | 2017-12-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201939071A TW201939071A (zh) | 2019-10-01 |
| TWI785159B true TWI785159B (zh) | 2022-12-01 |
Family
ID=66751483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107144019A TWI785159B (zh) | 2017-12-07 | 2018-12-07 | 濾光器及攝像裝置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11531149B2 (https=) |
| JP (1) | JP7240234B2 (https=) |
| KR (1) | KR102709607B1 (https=) |
| CN (1) | CN111406227B (https=) |
| TW (1) | TWI785159B (https=) |
| WO (1) | WO2019111965A1 (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6259155B1 (ja) * | 2017-10-03 | 2018-01-10 | 日本板硝子株式会社 | 光学フィルタ及び撮像装置 |
| JP6273064B1 (ja) | 2017-10-03 | 2018-01-31 | 日本板硝子株式会社 | 光学フィルタ及び撮像装置 |
| WO2020235610A1 (ja) | 2019-05-23 | 2020-11-26 | 日本板硝子株式会社 | 光吸収性組成物、光吸収膜、及び光学フィルタ |
| JP7344091B2 (ja) * | 2019-11-06 | 2023-09-13 | 日本板硝子株式会社 | 光吸収性組成物、光吸収膜、及び光学フィルタ |
| JP2021110868A (ja) * | 2020-01-14 | 2021-08-02 | ソニーセミコンダクタソリューションズ株式会社 | 受光装置及び電子システム |
| KR102475669B1 (ko) * | 2020-09-22 | 2022-12-09 | 주식회사 창강화학 | 광학 필터 |
| JP2022084412A (ja) * | 2020-11-26 | 2022-06-07 | パナソニックIpマネジメント株式会社 | 輝度調整システム、表示システム |
| JP7511102B2 (ja) * | 2021-07-07 | 2024-07-05 | Agc株式会社 | 光学フィルタ |
| JP7511103B2 (ja) | 2021-07-07 | 2024-07-05 | Agc株式会社 | 光学フィルタ |
| WO2023282186A1 (ja) * | 2021-07-07 | 2023-01-12 | Agc株式会社 | 光学フィルタ |
| JPWO2024048511A1 (https=) * | 2022-08-31 | 2024-03-07 | ||
| CN119790329A (zh) * | 2022-08-31 | 2025-04-08 | Agc株式会社 | 滤光片 |
| JP7586387B1 (ja) * | 2022-12-27 | 2024-11-19 | Agc株式会社 | 光学フィルタ |
| WO2024143130A1 (ja) * | 2022-12-27 | 2024-07-04 | Agc株式会社 | 光学フィルタ |
| TWI864831B (zh) * | 2023-06-16 | 2024-12-01 | 白金科技股份有限公司 | 具有一體化架構之鏡頭模組 |
| TWI880245B (zh) * | 2023-06-16 | 2025-04-11 | 白金科技股份有限公司 | 濾光透鏡及其製法 |
| TWI882363B (zh) * | 2023-06-16 | 2025-05-01 | 白金科技股份有限公司 | 複合感光結構及其製法 |
| TWI882362B (zh) * | 2023-06-16 | 2025-05-01 | 白金科技股份有限公司 | 濾光片 |
| WO2025041772A1 (ja) * | 2023-08-23 | 2025-02-27 | Agc株式会社 | 光学フィルタ |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6232161B2 (https=) * | 1983-04-07 | 1987-07-13 | Dainippon Jochugiku Kk | |
| CN1836176A (zh) * | 2003-08-11 | 2006-09-20 | 东洋纺织株式会社 | 近红外线吸收薄膜及其制造方法、近红外线吸收薄膜卷及其制造方法、以及近红外线吸收滤光器 |
| TW201716808A (zh) * | 2015-07-09 | 2017-05-16 | Nippon Sheet Glass Company Limited | 截斷紅外線之濾光器、攝像裝置、及截斷紅外線之濾光器之製造方法 |
| JP6232161B1 (ja) | 2017-07-27 | 2017-11-15 | 日本板硝子株式会社 | 光学フィルタ |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011071052A1 (ja) | 2009-12-07 | 2011-06-16 | 旭硝子株式会社 | 光学部材、近赤外線カットフィルタ、固体撮像素子、撮像装置用レンズ、およびそれらを用いた撮像・表示装置 |
| JP5463937B2 (ja) | 2010-02-01 | 2014-04-09 | 旭硝子株式会社 | 固体撮像素子およびそれを備えた撮像装置 |
| JP5936299B2 (ja) | 2010-11-08 | 2016-06-22 | Jsr株式会社 | 近赤外線カットフィルター、およびそれを備える固体撮像素子ならびに固体撮像装置 |
| CN104755969B (zh) | 2012-08-23 | 2018-06-08 | 旭硝子株式会社 | 近红外线截止滤波器和固体摄像装置 |
| JP6317875B2 (ja) | 2012-09-06 | 2018-04-25 | 日本板硝子株式会社 | 赤外線カットフィルタ、撮像装置および赤外線カットフィルタの製造方法 |
| JP2014203044A (ja) | 2013-04-09 | 2014-10-27 | 日本板硝子株式会社 | 赤外線カットフィルタおよび撮像装置 |
| JP6020746B2 (ja) | 2013-12-26 | 2016-11-02 | 旭硝子株式会社 | 光学フィルタ |
| WO2016114363A1 (ja) * | 2015-01-14 | 2016-07-21 | 旭硝子株式会社 | 近赤外線カットフィルタおよび撮像装置 |
| JP6210180B2 (ja) * | 2015-07-28 | 2017-10-11 | Jsr株式会社 | 光学フィルター及び光学フィルターを具備する環境光センサー |
| JP2017146506A (ja) | 2016-02-18 | 2017-08-24 | 旭硝子株式会社 | 光学フィルタおよび撮像装置 |
| JP6267823B1 (ja) * | 2017-07-27 | 2018-01-24 | 日本板硝子株式会社 | 光学フィルタ、カメラモジュール、及び情報端末 |
-
2018
- 2018-12-05 CN CN201880076217.7A patent/CN111406227B/zh active Active
- 2018-12-05 WO PCT/JP2018/044776 patent/WO2019111965A1/ja not_active Ceased
- 2018-12-05 KR KR1020207014717A patent/KR102709607B1/ko active Active
- 2018-12-05 US US16/770,487 patent/US11531149B2/en active Active
- 2018-12-07 TW TW107144019A patent/TWI785159B/zh active
-
2019
- 2019-04-16 JP JP2019077759A patent/JP7240234B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6232161B2 (https=) * | 1983-04-07 | 1987-07-13 | Dainippon Jochugiku Kk | |
| CN1836176A (zh) * | 2003-08-11 | 2006-09-20 | 东洋纺织株式会社 | 近红外线吸收薄膜及其制造方法、近红外线吸收薄膜卷及其制造方法、以及近红外线吸收滤光器 |
| TW201716808A (zh) * | 2015-07-09 | 2017-05-16 | Nippon Sheet Glass Company Limited | 截斷紅外線之濾光器、攝像裝置、及截斷紅外線之濾光器之製造方法 |
| JP6232161B1 (ja) | 2017-07-27 | 2017-11-15 | 日本板硝子株式会社 | 光学フィルタ |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7240234B2 (ja) | 2023-03-15 |
| TW201939071A (zh) | 2019-10-01 |
| CN111406227A (zh) | 2020-07-10 |
| US20200379150A1 (en) | 2020-12-03 |
| CN111406227B (zh) | 2022-06-10 |
| WO2019111965A1 (ja) | 2019-06-13 |
| US11531149B2 (en) | 2022-12-20 |
| KR20200096221A (ko) | 2020-08-11 |
| KR102709607B1 (ko) | 2024-09-26 |
| JP2019144578A (ja) | 2019-08-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI785159B (zh) | 濾光器及攝像裝置 | |
| TWI771532B (zh) | 濾光器及攝像裝置 | |
| TWI741195B (zh) | 濾光器 | |
| US12072517B2 (en) | Light-absorbing composition and method of manufacturing | |
| TWI765095B (zh) | 濾光器及攝像裝置 | |
| TWI762722B (zh) | 濾光器及攝像裝置 | |
| TWI787431B (zh) | 濾光器及攝像裝置 | |
| TWI754100B (zh) | 濾光器及攝像裝置 | |
| JP6966334B2 (ja) | 光学フィルタ及び撮像装置 | |
| JP6516948B1 (ja) | 光学フィルタ及び撮像装置 |