TWI780343B - 印刷配線基板用貼黏膜及電磁波屏蔽膜 - Google Patents
印刷配線基板用貼黏膜及電磁波屏蔽膜 Download PDFInfo
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- TWI780343B TWI780343B TW108123825A TW108123825A TWI780343B TW I780343 B TWI780343 B TW I780343B TW 108123825 A TW108123825 A TW 108123825A TW 108123825 A TW108123825 A TW 108123825A TW I780343 B TWI780343 B TW I780343B
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- Prior art keywords
- layer
- resin
- circuit pattern
- film
- printed wiring
- Prior art date
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Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0216—Reduction of cross-talk, noise or electromagnetic interference
- H05K1/023—Reduction of cross-talk, noise or electromagnetic interference using auxiliary mounted passive components or auxiliary substances
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/281—Applying non-metallic protective coatings by means of a preformed insulating foil
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Abstract
印刷配線基板用貼黏膜101係具備電路圖案隱蔽層112、及與電路圖案隱蔽層112積層之接著劑層111。電路圖案隱蔽層112中,與接著劑層111相反側之面的Rku為2.5以上3.0以下。
Description
本發明係關於印刷配線基板用貼黏膜及電磁波屏蔽膜。
隨著電子機器複雜化,印刷配線基板之電路圖案亦複雜化。又,電路圖案設計會對電子機器性能造成很大的影響,電路圖案為需保護之重要資訊。因此檢討在印刷配線基板表面黏貼覆蓋膜等著色膜,而無法直接靠視覺識別印刷配線基板之電路圖案(例如參照專利文獻1)。
專利文獻1:日本特開2014-185247號公報。
但印刷配線基板表面中存在電路圖案所造成的台階。因此,即使於印刷配線基板貼合有著色為黑色的膜,電路圖案會因光的反射等而浮出於膜表面,無法獲得充分隱蔽性。因此需要的是隱蔽性進一步提高的膜。
本發明之目的在於能夠實現高電路圖案隱蔽性的貼黏膜。
本發明之印刷配線基板用貼黏膜之第一態樣係具備電路圖案隱蔽層、及與電路圖案隱蔽層積層之接著劑層,電路圖案隱蔽層中,與接著劑層相反側之面的Rku為2.5以上3.0以下。
印刷配線基板用貼黏膜之第一態樣中,電路圖案隱蔽層中,與接著劑層相反側之面在橫斷程度為20%時之負載長度率(Rmr)為5.3%以上8.5%以下。
本發明之印刷配線基板用貼黏膜之第二態樣係具備電路圖案隱蔽層、及與電路圖案隱蔽層積層之接著劑層,電路圖案隱蔽層中,與接著劑層相反側之面的Sku為1.8以上4.0以下。
印刷配線基板用貼黏膜之第二態樣中,電路圖案隱蔽層中,與接著劑層相反側之面中,以分離核心部與突出波峰部之負載面積率為10%且以分離核心部與突出波谷部之負載面積率80%時,核心部之實體體積(Vmc)為2.0mL/m2以上3.0mL/m2以下。
本發明之電磁波屏蔽膜之一態樣係具備本發明之印刷配線基板用貼黏膜,且接著劑層為導電性接著劑層。
電磁波屏蔽膜之一態樣係在電路圖案隱蔽層與接著劑層之間進一步具備屏蔽層。
根據本發明之印刷配線基板貼黏膜可提高電路圖案隱蔽性。
101:貼黏膜
102:印刷配線基板
111:接著劑層
112:隱蔽層
113:屏蔽層
121:底層
122:電路圖案
123:接著劑層
124:絕緣膜
圖1之剖視圖係表示黏貼有一實施形態之印刷配線基板用貼黏膜之印刷配線基板。
圖2之剖視圖係表示印刷配線基板用貼黏膜之變形例。
圖3之俯視圖係表示實施例所使用的試驗用基板。
本實施形態之印刷配線基板貼黏膜101(以下稱為貼黏膜)係具備電路圖案隱蔽層112(以下稱為隱蔽層)、及形成於隱蔽層112一面之接著劑層111。
如圖1所示,本實施形態之貼黏膜101可黏貼於印刷配線基板102。印刷配線基板102例如具有底層121、及設置於底層121表面之電路圖案122。電路圖案122例如被絕緣性接著劑層123及絕緣膜124覆蓋。
底層121係以絕緣性材料構成。絕緣性材料可使用絕緣性樹脂組成物或陶瓷等。絕緣性樹脂組成物可使用例如由聚醯亞胺系樹脂、聚醯胺醯亞胺系樹脂、聚醯胺系樹脂、聚醚醯亞胺系樹脂、聚酯醯亞胺系樹脂、聚醚腈系樹脂、聚醚碸系樹脂、聚苯硫醚系樹脂、聚對苯二甲酸乙二酯系樹脂、聚丙烯系樹脂、交聯聚乙烯系樹脂、聚酯系樹脂、聚苯并咪唑系樹脂、聚醯亞胺系樹脂、聚醯亞胺醯胺系樹脂、聚醚醯亞胺系樹脂及聚苯硫醚系樹脂所選擇至少一種。
電路圖案122係以導電性材料構成。導電性材料可使用將金屬箔或導電性填料與樹脂組成物的混合物進行印刷/硬化之導電性材料,但以費用觀點來看,較佳為使用銅箔。
電路圖案122之厚度並無特別限定,較佳為1μm~100μm,更佳為1~50μm。使電路圖案之厚度為1μm以上,藉此可降低印刷配線基板102的製造成本。使厚度為100μm以下,藉此可使印刷配線基板102薄化。
接著劑層123係以絕緣性材料構成。絕緣性材料較佳為絕緣性樹脂組成物,可使用例如由聚醯亞胺系樹脂、聚醯胺醯亞胺系樹脂、聚醯胺系樹脂、聚醚醯亞胺系樹脂、聚酯醯亞胺系樹脂、聚醚腈系樹脂、聚醚碸系樹脂、聚苯硫醚系樹脂、聚對苯二甲酸乙二酯系樹脂、聚丙烯系樹脂、交聯聚乙烯系樹脂、聚酯系樹脂、聚苯并咪唑系樹脂、聚醯亞胺系樹脂、聚醯亞胺醯胺系樹脂、聚醚醯亞胺系樹脂及聚苯硫醚系樹脂所選擇至少一
種。
接著劑層123之厚度並無特別限定,較佳為1μm~50μm。
絕緣膜124係以絕緣性材料構成。絕緣性材料較佳為絕緣性樹脂組成物,可使用例如由聚醯亞胺系樹脂、聚醯胺醯亞胺系樹脂、聚醯胺系樹脂、聚醚醯亞胺系樹脂、聚酯醯亞胺系樹脂、聚醚腈系樹脂、聚醚碸系樹脂、聚苯硫醚系樹脂、聚對苯二甲酸乙二酯系樹脂、聚丙烯系樹脂、交聯聚乙烯系樹脂、聚酯系樹脂、聚苯并咪唑系樹脂、聚醯亞胺系樹脂、聚醯亞胺醯胺系樹脂、聚醚醯亞胺系樹脂及聚苯硫醚系樹脂所選擇至少一種。
絕緣膜124之厚度並無特別限定,較佳為1μm~100μm,更佳為10μm~25μm。使厚度為1μm以上,藉此可降低印刷配線基板的製造成本。使厚度為100μm以下,藉此可使印刷配線基板薄化。
若著色隱蔽層112並使貼黏膜101為不透明,則無法直接靠視覺識別電路圖案122。例如藉由全光線透過率較佳為20%以下,更佳為10%以下,又更佳為5%以下的膜而覆蓋電路圖案122,則幾乎無法直接靠視覺識別電路圖案122。但會因電路圖案122而在隱蔽層112表面上形成凹凸。一般電路圖案122係藉由銅線而形成,其高度為數μm~十數μm。存在線的部分與不存在線的部分之高度差可藉由埋入接著劑層123等而變小,故在隱蔽層112表面產生之凹凸高度為數μm。但即使是如此些微的凹凸,亦可靠視覺識別在容易反射光的表面中凹凸之存在,無法隱蔽電路圖案122。
為提高隱蔽性而考慮在隱蔽層112表面形成微小凹凸,並降低光於隱蔽層112中之反射。但本申請發明人等發現:電路圖案隱蔽性係與根據為一般表面粗糙度指標之日本工業規格
(JIS)B0601:2001之算術平均粗度(Ra)、及根據國際標準化機構(ISO)25178之三維算術平均高度(Sa)等無關。另一方面,本申請發明人等還發現:使隱蔽層112表面中根據JIS B 0601:2001之峰度(Rku)及根據ISO25178之峰度(Sku)為特定範圍內的值,藉此可提高隱蔽性。
具體而言,隱蔽層112之與接著劑層111相反側之面(表面)的Rku為2.5以上,較佳為2.6以上,更佳為2.7以上,且為3.0以下,較佳為2.9以下。又,隱蔽層112表面的Sku為1.8以上,較佳為1.9以上,更佳為2.1以上,且為4.0以下,較佳為3.0以下,更佳為2.5以下。使Rku及Sku之至少一者為該值,藉此可提高貼黏膜101之電路圖案122隱蔽性。
又,隱蔽層112表面在橫斷程度為20%時之相對負載長度率(Rmr)較佳為5.3%以上,更佳為5.4%以上,又更佳為5.5%以上,較佳為8.5%以下,更佳為8.0%以下,又更佳為7.8%以下,又再更佳為7.0%以下,特佳為6.0%以下。除了Rku以外,還使Rmr為該值,藉此可進一步提高隱蔽性。
又,隱蔽層112表面中,以分離核心部與突出波峰部之負載面積率為10%且以分離核心部與突出波谷部之負載面積率80%為時,核心部之實體體積(Vmc)較佳為1.8mL/m2以上,更佳為2.0mL/m2以上,又更佳為2.2mL/m2以上,較佳為3.0mL/m2以下。除了Sku以外,還使Vmc該值,藉此可進一步提高隱蔽性。
又,如實施例所示,Rku及Rmr可藉由根據JIS B 0601:2001之方法測得。如實施例所示,Sku及Vmc可藉由根據ISO25178之方法測得。
隱蔽層112可由金屬、熱塑性樹脂、熱硬化性樹脂、或活性能量線硬化性樹脂等形成。金屬可使用鎳、銅、銀、錫、金、
鈀、鋁、鉻、鈦、及鋅等任一者、或含有二種以上的合金。熱塑性樹脂並無特別限定,可使用苯乙烯系樹脂、乙酸乙烯系樹脂、聚酯系樹脂、聚乙烯系樹脂、聚丙烯系樹脂、醯亞胺系樹脂、或丙烯酸系樹脂等。熱硬化性樹脂並無特別限定,可使用苯酚系樹脂、環氧系樹脂、末端具有異氰酸酯基之胺甲酸乙酯系樹脂、末端具有異氰酸酯基之尿素系樹脂、末端具有異氰酸酯基之胺甲酸乙酯尿素系樹脂、三聚氰胺系樹脂、或醇酸系樹脂等。又,活性能量線硬化性樹脂並無特別限定,可使用例如分子中具有至少二個(甲基)丙烯醯氧基之聚合性化合物等。該等樹脂可單獨使用或併用二種以上。
可將該等樹脂塗布於剝離性基材之藉由壓印加工等而呈凹凸形狀之表面上並使其乾燥,藉此可形成具有特定表面性質、狀態之隱蔽層112。取代壓印加工,可以於表面設置表面具凹凸之消光層的膜為剝離性基材。於膜表面塗布含有微粒子之樹脂組成物,或對形成於膜表面之樹脂層表面進行壓印加工,藉此可形成消光層。
又,除了使用具有凹凸之剝離性基材以外,可藉由在該等樹脂所形成樹脂層表面吹上乾冰等之方法、或壓接具有凹凸形狀之鑄模之方法等,而形成具有特定表面性質、狀態之隱蔽層112。
為了調整隱蔽層112表面性質、狀態,亦可添加微粒子。於隱蔽層112添加之微粒子並無特別限定,可使用例如樹脂微粒子或無機微粒子。樹脂微粒子可為丙烯酸樹脂微粒子、聚丙烯腈微粒子、聚胺甲酸乙酯微粒子、聚醯胺微粒子、及聚醯亞胺微粒子等。又,無機微粒子可為碳酸鈣微粒子、矽酸鈣微粒子、黏土、高嶺土、滑石、二氧化矽微粒子、玻璃微粒子、矽藻土、
雲母粉、氧化鋁微粒子、氧化鎂微粒子、氧化鋅微粒子、硫酸鋇微粒子、硫酸鋁微粒子、硫酸鈣微粒子、及碳酸鎂微粒子等。該等樹脂微粒子及無機微粒子可單獨使用或組合複數使用。
隱蔽層112之全光線透過率較佳為20%以下,更佳為10%以下,又更佳為5%以下。使全光線透過率為20%以下,藉此,於印刷配線基板102貼黏貼黏膜101時,難以直接靠視覺識別電路圖案122。
以使光不易反射之觀點來看,隱蔽層112較佳為含有黑色系著色劑。黑色系著色劑可為黑色顏料、或複數顏料減色混合而黑色化之混合顏料等。黑色顏料例如可為碳黑,科琴黑、碳奈米管(CNT)、苝黑、鈦黑、鐵黑、及苯胺黑等任一者或該等之組合。混合顏料例如可混合紅色、綠色、藍色、黃色、紫色、青藍及洋紅等顏料而使用。以使光不易反射之觀點來看,相對於樹脂100質量份,黑色系著色劑添加量較佳為0.5質量%以上,更佳為1質量%以上。
隱蔽層112視需要可含有硬化促進劑、黏著性賦予劑、抗氧化劑、顏料、染料、塑化劑、紫外線吸收劑、消泡劑、調平劑、充填劑、阻燃劑、黏度調節劑、及抗結塊劑等至少一種。
隱蔽層112之厚度無特別限定,可視需要適宜設定,但以實現隱蔽性、形成難易度及確保可撓性等觀點來看,較佳為1μm以上,更佳為4μm以上,又,較佳為20μm以下,更佳為10μm以下,又更佳為5μm以下。
本實施形態中,接著劑層111可藉由熱塑性樹脂、熱硬化性樹脂及活性能量線硬化性樹脂等至少一種形成。
接著劑層111含有熱塑性樹脂時,熱塑性樹脂可使用例如苯乙烯系樹脂、乙酸乙烯酯系樹脂、聚酯系樹脂、聚乙烯系樹脂、
聚丙烯系樹脂、醯亞胺系樹脂、及丙烯酸系樹脂等。該等樹脂可單獨使用一種或併用二種以上。
接著劑層111含有熱硬化性樹脂時,熱硬化性樹脂可使用例如苯酚系樹脂、環氧系樹脂、胺甲酸乙酯系樹脂、三聚氰胺系樹脂、聚醯胺系樹脂及醇酸系樹脂等。活性能量線硬化性樹脂並無特別限定,例如可使用分子中具有至少二個(甲基)丙烯醯氧基之聚合性化合物等。該等樹脂可單獨使用一種或併用二種以上。
熱硬化性樹脂例如含有具有反應性第一官能基之第一樹脂成分、及與第一官能基反應之第二樹脂成分。第一官能基例如可為環氧基、醯胺基、或羥基等。第二官能基可因應第一官能基選擇,例如第一官能基為環氧基時,可為羥基、羧基、環氧基及胺基等。具體而言,例如使第一樹脂成分為環氧樹脂時,第二樹脂成分可使用環氧基改質聚酯樹脂、環氧基改質聚醯胺樹脂、環氧基改質丙烯酸樹脂、環氧基改質聚胺甲酸乙酯聚尿素樹脂、羧基改質聚酯樹脂、羧基改質聚醯胺樹脂、羧基改質丙烯酸樹脂、羧基改質聚胺甲酸乙酯聚尿素樹脂、及胺甲酸乙酯改質聚酯樹脂等。該等中較佳為羧基改質聚酯樹脂、羧基改質聚醯胺樹脂、羧基改質聚胺甲酸乙酯聚尿素樹脂、及胺甲酸乙酯改質聚酯樹脂。又,第一樹脂成分為羥基時,第二樹脂成分可使用環氧基改質聚酯樹脂、環氧基改質聚醯胺樹脂、環氧基改質丙烯酸樹脂、環氧基改質聚胺甲酸乙酯聚尿素樹脂、羧基改質聚酯樹脂、羧基改質聚醯胺樹脂、羧基改質丙烯酸樹脂、羧基改質聚胺甲酸乙酯聚尿素樹脂、及胺甲酸乙酯改質聚酯樹脂等。該等中較佳為羧基改質聚酯樹脂、羧基改質聚醯胺樹脂、羧基改質聚胺甲酸乙酯聚尿素樹脂、及胺甲酸乙酯
改質聚酯樹脂。
熱硬化性樹脂可含有促進熱硬化反應之硬化劑。熱硬化性樹脂具有第一官能基與第二官能基時,硬化劑可因應第一官能基及第二官能基之種類而適宜選擇。第一官能基為環氧基且第二官能基為羥基時,可使用咪唑系硬化劑、苯酚系硬化劑、及陽離子系硬化劑等。該等可單獨使用一種或併用二種以上。此外,可含有消泡劑、抗氧化劑、黏度調整劑、稀釋劑、沉降防止劑、調平劑、耦合劑、著色劑、及阻燃劑等作為任意成分。
接著劑層111之厚度並無特別限定,以確保接著性及可撓性等觀點來看較佳為1μm~50μm。
接著劑層111可為在常溫(例如20℃)環境下具有黏性,亦即具有黏著劑性的層。接著劑層111在常溫環境下具有黏性,藉此,可在印刷配線基板102的任意位置容易地貼合印刷配線基板用貼黏膜101。
可於接著劑層111添加導電性填料,使接著劑層111成為具有導電性之導電性接著劑層。使接著劑層111為導電性且使隱蔽層112為絕緣保護層,藉此可將貼黏膜101作為電磁波屏蔽膜使用。將貼黏膜101作為電磁波屏蔽膜使用時,只要將導電性接著劑層111與設置於印刷配線基板102之接地圖案連接起來即可。
導電性填料並無特別限定,例如可使用金屬填料,覆蓋有金屬之樹脂填料,碳填料及該等之混合物。金屬填料可舉出銅粉、銀粉、鎳粉、銀覆銅粉、金覆銅粉、銀覆鎳粉、及金覆鎳粉等。該等金屬粉可藉由電解法、霧化法、或還元法等製成。其中較佳為銀粉、銀覆銅粉及銅粉之任一者。
以填料彼此接觸之觀點來看,導電性填料之平均粒徑較佳為1μm以上,更佳為3μm以上,較佳為50μm以下,更佳為
40μm以下。導電性填料之形狀無特別限定,可為球狀、薄片狀、樹枝狀、或纖維狀等。
導電性填料含量可因應用途而適宜選擇,在全固體成分中較佳為5質量%以上,更佳為10質量%以上,較佳為95質量%以下,更佳為90質量%以下。以埋入性之觀點來看,較佳為70質量%以下,更佳為60質量%以下。又,要實現異向導電性時,較佳為40質量%以下,更佳為35質量%以下。
以貼黏膜101為電磁波屏蔽膜時,如圖2所示,可將屏蔽層113設置在隱蔽層112與接著劑層111之間。可由金屬箔、蒸鍍膜及導電性填料等形成屏蔽層113。
金屬箔並無特別限定,可為鎳、銅、銀、錫、金、鈀、鋁、鉻、鈦、及鋅等任一者或含有兩種以上之合金所構成之箔。
金屬箔之厚度並無特別限定,較佳為0.5μm以上,更佳為1.0μm以上。若金屬箔之厚度為0.5μm以上,傳送10MHz~100GHz之高頻訊號至屏蔽印刷配線基板時,可抑制高頻訊號的衰減量。又,金屬箔之厚度較佳為12μm以下,更佳為10μm以下,又更佳為7μm以下。若金屬層之厚度為12μm以下,則可確保良好破裂延伸特性。
蒸鍍膜並無特別限定,可蒸鍍鎳、銅、銀、錫、金、鈀、鋁、鉻、鈦、及鋅等而形成。蒸鍍可使用電解電鍍法、化學電鍍法、濺鍍法、電子束蒸鍍法、真空蒸鍍法、化學氣相沈積(CVD)法、或有機金屬化學氣相沈積(MOCVD)法等。
蒸鍍膜之厚度並無特別限定,較佳為0.05μm以上,更佳為0.1μm以上。若蒸鍍膜之厚度為0.05μm以上,將電磁波屏蔽膜貼合於屏蔽印刷配線基板時,電磁波屏蔽膜屏蔽電磁波之特性優異。又,蒸鍍膜之厚度較佳為未滿0.5μm,更佳為未滿
0.3μm。若蒸鍍膜之厚度為未滿0.5μm,則電磁波屏蔽膜之耐折彎性優異,可抑制因設置於印刷配線基板之台階而使屏蔽層被破壞。
由導電性填料形成屏蔽層113時,可將摻配導電性填料之溶劑塗布於隱蔽層112表面並乾燥,藉此可形成屏蔽層113。導電性填料可使用金屬填料、覆蓋有金屬之樹脂填料、碳填料及該等之混合物。金屬填料可使用銅粉、銀粉、鎳粉、銀覆銅粉、金覆銅粉、銀覆鎳粉、及金覆鎳粉等。該等金屬粉可藉由電解法、霧化法、還元法製成。金屬粉之形狀可舉出球狀、薄片狀、纖維狀、樹枝狀等。
本實施形態中,屏蔽層113之厚度只要因應所求電磁屏蔽效果及重複折彎/滑動耐性而適宜選擇。
貼黏膜101之全光線透過率較佳為20%以下,更佳為10%以下,又更佳為5%以下。使全光線透過率為20%以下,藉此,於印刷配線基板102已貼合有貼黏膜101時,難以直接靠視覺識別電路圖案122。為了使貼黏膜101之全光線透過率為20%以下,只要於隱蔽層112及/或接著劑層111添加著色劑或導電性填料等即可。又,設置金屬箔等所構成之屏蔽層113時,全光線透過率幾乎可為0。又,全光線透過率可根據JIS K 7136測得。
以下使用實施例進一步詳細說明貼黏膜。以下實施例僅為例示,並無限定本發明之意圖。
<剝離性基材之製作>
於厚度25μm之聚對苯二甲酸乙二酯膜(以下稱為PET膜)表面吹上乾冰微粒子而形成凹凸後,設置三聚氰胺系樹脂所構成之剝離層,而得到剝離性基材1。
調整由二氧化矽粒子、三聚氰胺系樹脂、甲苯所構成之消光層組成物,於厚度25μm之聚對苯二甲酸乙二酯膜表面使用線棒塗布並加熱乾燥,而得具有厚度5μm之消光層之離性基材2。改變二氧化矽粒子之粒徑及添加量,藉此以同樣方式而得表面狀態相異之剝離基材3~7。剝離性基材1~5表面(形成隱蔽層的面)之表面性質、狀態示於表1。
<隱蔽層之製作>
以固體成分的量達到20質量%之方式,於甲苯摻配雙酚A型環氧系樹脂(三菱化學製jER1256)100質量份、硬化劑(三菱化學製ST14)0.1質量份、作為黑色系著色劑之碳粒子(Tokai Carbon製TOKABLACK #8300/F)15質量份,而調製出了隱蔽層組成物。於剝離性基材表面使用線棒塗布該組成物並加熱乾燥,在剝離性基材表面製作厚度5μm之隱蔽層。
<接著劑層之製作>
以固體成分的量達到20質量%之方式,於甲苯添加雙酚A型環氧系樹脂(三菱化學製jER1256)100質量份、硬化劑(三菱化學製ST14)0.1質量份,攪拌混合,而調製出了接著劑層組成物。於表面經脫模處理之PET膜(以下稱為支持膜)使用線棒塗布所得接著劑層組成物,加熱乾燥,藉此於支持膜表面形成了厚度5μm之接著劑層。
<貼黏膜之製作>
貼合形成於剝離性基材表面之隱蔽層與形成於支持膜表面之接著劑層,使用加熱至100℃之一對金屬輥,以5MPa壓力加熱加壓,而得貼黏膜。所得貼黏膜之全光線透過率為5%以下。
<評價用基板之製作>
將所得貼黏膜與印刷配線基板使用壓製機以溫度:170℃,時間:3分鐘,壓力:2~3MPa之條件接著後,剝離剝離性基材,而製作出評價用基板。
印刷配線基板係使用在聚醯亞胺膜所構成之底層121上形成有如圖3所示電路圖案122者。電路圖案122係藉由線寬度為0.1mm、高度為12μm之銅箔而形成。在底層121上以覆蓋電路圖案122之方式設置厚度為25μm之接著劑層、及厚度為12.5μm之聚醯亞胺膜所構成之覆蓋膜(絕緣膜)。
<表面狀態之評價>
使用共焦顯微鏡(Lasertec公司製OPTELICS HYBRID,對物透鏡20倍),根據JIS B 0601:2001設定表面任意五處。其後使用資料解析軟體(LMeye7)進行傾斜修正,測量了Rku、Rmr及Ra。又,根據ISO25178測量了表面任意五處。其後,使用資料解析軟體(LMeye7)進行表面之傾斜修正,測量了Sku、Vmr、Sa、
Sv及Sz。又,S過濾器之截止波長為0.0025mm,L過濾器之截止波長為0.8mm。又,各數值為五處測量值之平均值。
<隱蔽性之評價>
將評價用基板置於平坦桌面上,在對屏蔽配線基板表面之照度為500Lux之環境下,以距離評價用基板30cm之高度且以45度之角度,看看從隱蔽層側靠視覺可否識別出電路圖案。將無法靠視覺識別電路圖案之情形評價為隱蔽性良好(○),將可靠視覺識別電路圖案之情形評價為隱蔽性不良(×)。
(實施例1)
藉由使用剝離性基材1形成之隱蔽層而製作貼黏膜,而得評價用基板。去除剝離性基材後測得的評價用基板之隱蔽層表面的Rku為2.6,Sku為2.0。橫斷程度為20%時之Rmr為7.7%,以分離核心部與突出波峰部之負載面積率為10%且以分離核心部與突出波谷部之負載面積率80%時,Vmc為2.8mL/m2。又,Ra、Sa、Sv及Sz分別為1.8μm、2.3μm、-10.2μm及18.3μm。目視檢查時,無法靠視覺識別電路圖案,隱蔽性非常良好。
(實施例2)
除了使用剝離性基材2以外,以與實施例1相同方式而得評價用基板。去除剝離性基材後測得的評價用基板之隱蔽層表面的Rku為2.9,Sku為2.1。Rmr為5.6%,Vmc為2.9mL/m2。又,Ra、Sa、Sv及Sz分別為1.8μm、2.5μm、-12.9μm及23.6μm。目視檢查時,無法靠視覺識別電路圖案,隱蔽性非常良好。
(實施例3)
除了使用剝離性基材3以外,以與實施例1相同方式而得評價用基板。去除剝離性基材後測得的評價用基板之隱蔽層表面的Rku為3.0,Sku為2.3。Rmr為5.8%,Vmc為2.5mL/m2。又,Ra、
Sa、Sv及Sz分別為1.0μm、2.0μm、-9.8μm及18.2μm。目視檢查時,無法靠視覺識別電路圖案,隱蔽性非常良好。
(比較例1)
除了使用剝離性基材4以外,以與實施例1相同方式而得評價用基板。去除剝離性基材後測得的評價用基板之隱蔽層表面的Rku為2.3,Sku為1.8。Rmr為8.8%,Vmc為3.5mL/m2。又,Ra、Sa、Sv及Sz分別為2.0μm、2.7μm、-11.5μm及18.8μm。目視檢查時,可靠視覺識別電路圖案,隱蔽性不良。
(比較例2)
除了使用剝離性基材5以外,以與實施例1相同方式而得評價用基板。去除剝離性基材後測得的評價用基板之隱蔽層表面的Rku為2.3,Sku為1.8。Rmr為10.1%,Vmc為3.5mL/m2。又,Ra、Sa、Sv及Sz分別為1.7μm、2.7μm、-10.9μm及18.4μm。目視檢查時,可靠視覺識別電路圖案,隱蔽性不良。
(比較例3)
除了使用剝離性基材6以外,以與實施例1相同方式而得評價用基板。去除剝離性基材後測得的評價用基板之隱蔽層表面的Rku為2.4,Sku為1.8。Rmr為9.5%,Vmc為3.2mL/m2。又,Ra、Sa、Sv及Sz分別為1.9μm、2.6μm、-10.0μm及16.9μm。目視檢查時,可靠視覺識別電路圖案,隱蔽性不良。
(比較例4)
除了使用剝離性基材7以外,以與實施例1相同方式而得評價用基板。去除剝離性基材後測得的評價用基板之隱蔽層表面的Rku為3.1,Sku為4.2。Rmr為5.1%,Vmc為1.7mL/m2。又,Ra、Sa、Sv及Sz分別為0.7μm、1.5μm、-11.1μm及16.2μm。目視檢查時,可靠視覺識別電路圖案,隱蔽性不良。
表2係顯示各實施例及比較例之結果。
本發明之印刷配線基板用貼黏膜之電路圖案隱蔽性高,可利用作為隱蔽電路圖案之貼黏膜、或電磁波屏蔽膜等。
101:貼黏膜
102:印刷配線基板
111:接著劑層
112:隱蔽層
121:底層
122:電路圖案
123:接著劑層
124:絕緣膜
Claims (4)
- 一種印刷配線基板用貼黏膜,係具備電路圖案隱蔽層、及與前述電路圖案隱蔽層積層之接著劑層,前述電路圖案隱蔽層中,與前述接著劑層相反側之面的Rku為2.5以上3.0以下,且與前述接著劑層相反側之面在橫斷程度為20%時之Rmr為5.3%以上8.5%以下。
- 一種印刷配線基板用貼黏膜,係具備電路圖案隱蔽層、及與前述電路圖案隱蔽層積層之接著劑層,前述電路圖案隱蔽層中,與前述接著劑層相反側之面的Sku為1.8以上4.0以下,且與前述接著劑層相反側之面中,以分離核心部與突出波峰部之負載面積率為10%且以分離核心部與突出波谷部之負載面積率為80%時,Vmc為2.0mL/m2以上3.0mL/m2以下。
- 一種電磁波屏蔽膜,係具備如請求項1或2所記載之印刷配線基板用貼黏膜,前述接著劑層為導電性接著劑層。
- 如請求項3所記載之電磁波屏蔽膜,其中於前述電路圖案隱蔽層與前述接著劑層之間進一步具備屏蔽層。
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