TWI772446B - Wires and electronic parts for high frequency coils - Google Patents
Wires and electronic parts for high frequency coils Download PDFInfo
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- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
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Abstract
本發明係一種高頻線圈用電線及電子零件,其課題為提供:確保焊錫接合之信賴性,且謀求在高頻率的交流阻抗的降低之高頻線圈用電線及使用其高頻線圈用電線之電子零件。 解決手段為經由至少由具有銅導體(1)與設置於該銅導體(1)之外周的強磁性層(4)的芯線(10),和設置於該芯線(10)上的絕緣被覆層(4)而加以構成,其強磁性層(4)則具有徑方向(X)的間隙(G),或焊接時之浸潤應力為3.4mN以上,零交叉時間為0.4秒以下之高頻線圈用電線(20)而解決上述課題。The present invention is directed to an electric wire for a high frequency coil and an electronic component, and its object is to provide an electric wire for a high frequency coil which ensures the reliability of solder joints and seeks to reduce the AC impedance at a high frequency, and an electric wire for a high frequency coil using the electric wire for a high frequency coil. electronic parts. The solution is to use at least a core wire (10) having a copper conductor (1) and a ferromagnetic layer (4) provided on the outer periphery of the copper conductor (1), and an insulating coating (10) provided on the core wire (10). 4) The ferromagnetic layer (4) has a gap (G) in the radial direction (X), or the wetting stress during welding is 3.4 mN or more, and the zero-crossing time is 0.4 seconds or less High-frequency coil wire (20) to solve the above problem.
Description
本發明係有關高頻線圈用電線及電子零件。更詳細係本發明係有關使用於各種高頻線圈等之電子零件,可降低在高頻的交流阻抗之高頻線圈用電線及使用其高頻線圈用電線之電子零件。The present invention relates to electric wires and electronic components for high-frequency coils. More specifically, the present invention relates to a high-frequency coil wire used for various high-frequency coils and the like, and an electric wire for a high-frequency coil that can reduce AC impedance at high frequencies, and an electronic component using the high-frequency coil wire.
對於專利文獻1係提案有將於銅線上施以純鐵等之強磁性體鍍敷之導體作為芯線的瓷漆絕緣電線,並記載有使高頻率增益Q提升數10%者。此特性提升係認為依據在高頻率的交流阻抗之降低,而認為經由對於導體的外周施以強磁性層之時,遮蔽外部磁場之同時,根據降低經由未完全遮蔽而侵入於內部的外部磁場之渦電流,抑制經由近接效應之損失之時,抑制交流阻抗之增大者。另外,對於專利文獻1係亦記載有對於為了焊接特性的提升,作為設置於強磁性層上之鍍敷層,鎳鍍敷層則較銅鍍敷層為佳者。
另外,對於專利文獻2係使焊接性提升作為目的,提案有:於導體之外周設置鐵鍍敷層,為了確保焊接性而設置厚度0.03~0.1μm之鎳鍍敷層,在鐵鍍敷層產生氧化之前,塗佈燒付聚氨酯絕緣塗料所成之瓷漆絕緣樹脂層之方法。 先前技術文獻 專利文獻In addition, for the purpose of improving the solderability,
專利文獻1:日本實公昭42-1339號公報 專利文獻2:日本特開昭62-151594號公報Patent Document 1: Japanese Patent Publication No. 42-1339 Patent Document 2: Japanese Patent Laid-Open No. 62-151594
發明欲解決之課題The problem to be solved by the invention
在使用於線圈零件的絕緣被覆電線中,作為瓷漆絕緣層,一般而言適用聚氨酯被覆層。但線圈零件等之電子機器零件的動作環境係移轉至更高溫側,而構成絕緣被覆電線的瓷漆絕緣層亦耐熱性的要求增加。構成絕緣被覆層的絕緣性樹脂之耐熱性係以A種、E種、B種、F種、H種等之耐熱級別與容許最高溫度所表示,形成上述聚氨酯被覆層之聚氨酯係相當於溫度指數E種120℃。在最近中,有著對於使用溫度指數F種155℃之變性聚氨酯或聚酯,更且,溫度指數H種180℃之聚亞醯胺酯等之高耐熱性樹脂之要求,而在360℃以下進行作業之焊接溫度則在F種級別中變高為420℃,而在H種級別中變高為460℃。In an insulating-coated electric wire used for coil parts, a urethane coating is generally applied as an enamel insulating layer. However, the operating environment of electronic equipment parts such as coil parts has shifted to a higher temperature side, and the requirements for heat resistance of the enamel insulating layer constituting the insulated-coated electric wire have also increased. The heat resistance of the insulating resin constituting the insulating coating layer is represented by the heat resistance class of type A, type E, type B, type F, type H, etc. and the maximum allowable temperature, and the polyurethane forming the above-mentioned polyurethane coating layer is equivalent to the temperature index E species 120 ℃. In recent times, there is a requirement to use high heat-resistant resins such as modified polyurethane or polyester with a temperature index F of 155°C, and moreover, a temperature index of H of 180°C such as polyurethane, and the temperature index is below 360°C. The soldering temperature of the operation is increased to 420°C in the F class and 460°C in the H class.
伴隨之焊接溫度變高,容易引起經由導線(銅導體等)之焊錫熔蝕之剖面減少等,而連接強度的信賴性則成為問題之故,在極短時間,焊接處理導線者為佳。即,浸潤應力為高,且零交叉時間越短,越可擔保焊錫連接之信賴性。As the soldering temperature increases, the cross-section of the solder eroded through the wire (copper conductor, etc.) is likely to decrease, and the reliability of the connection strength becomes a problem. Therefore, it is preferable to solder the wire in a very short time. That is, the higher the wetting stress, and the shorter the zero-crossing time, the more reliable the solder connection can be.
另外,伴隨著線圈零件的小型化,高頻率化等,絕緣被覆電線係多數條扭絞化,細線化則進展。特別是導線係愈是細線化愈易產生焊錫熔蝕等的問題。In addition, along with the miniaturization and high frequency of the coil components, the insulated-coated electric wires are twisted in large numbers, and the wires are thinned. In particular, the thinner the wire system, the easier it is to cause problems such as solder erosion.
在記載於專利文獻2之瓷漆電線的焊接中,在焊接溫度為高之環境,鎳鍍敷層與焊錫中的錫則瞬間產生反應而擴散,而實際上係成為基底的鐵鍍敷層與焊錫材料的接合。但,從不易形成鐵與錫之金屬間化合物之情況浸潤應力(即,接合強度)為低,對於接合信賴性差。對於必要以上加厚鎳之情況係強磁性體的鐵之效果則漸弱,未至經由近接效應之高頻率損失的抑制。In the soldering of the enamel wire described in
本發明之目的係提供:確保焊錫接合之信賴性,且謀求在高頻率的交流阻抗的降低之高頻線圈用電線及使用其高頻線圈用電線之電子零件。 為了解決課題之手段An object of the present invention is to provide an electric wire for a high-frequency coil which secures reliability of solder joints and seeks to reduce the AC impedance at a high frequency, and an electronic component using the electric wire for a high-frequency coil. means of solving problems
(1) 一種高頻線圈用電線,係至少由具有銅導體與設置於該銅導體之外周的強磁性層的芯線,和設置於該芯線上的絕緣被覆層而加以構成之高頻線圈用電線,其特徵為前述強磁性層係具有徑方向的間隙者。如根據此發明,因強磁性層則具有徑方向的間隙之故,焊接時之焊錫中的錫則容易到達至銅導體。其結果,經由銅與焊錫中的錫產生金屬間結合之時,浸潤應力則變高,而可得到堅固的焊錫接合。(1) An electric wire for a high-frequency coil comprising at least a core wire having a copper conductor, a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating coating layer provided on the core wire. , which is characterized in that the aforementioned ferromagnetic layer has gaps in the radial direction. According to this invention, since the ferromagnetic layer has the gap in the radial direction, the tin in the solder at the time of soldering can easily reach the copper conductor. As a result, when an intermetallic bond occurs via copper and tin in the solder, the wetting stress becomes high, and a strong solder bond can be obtained.
在有關本發明之高頻線圈用電線中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層者為佳。In the high-frequency coil wire according to the present invention, it is preferable that the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer.
在有關本發明之高頻線圈用電線中,前述間隙的數係為於前述芯線的表面可看到的數,可於由和前述芯線的直徑D相同長度之軸方向假想線與徑方向假想線所形成之正方形之中看到的數則為2以上、30以下之範圍內者為佳。如根據此發明,因可於正方形之中看到的間隙的數則為上述範圍內之故,焊接時之焊錫則容易到達至銅導體。In the high-frequency coil electric wire according to the present invention, the number coefficient of the gap is the number that can be seen on the surface of the core wire, and can be determined by a virtual line in the axial direction and a virtual line in the radial direction having the same length as the diameter D of the core wire. The number seen in the formed square is preferably within the range of 2 or more and 30 or less. According to this invention, since the number of gaps that can be seen in the square is within the above-mentioned range, the solder at the time of soldering can easily reach the copper conductor.
在有關本發明之高頻線圈用電線中,前述間隙係在寬度為0.3μm以上、5μm以下之範圍內有著線圈者為佳。In the electric wire for a high-frequency coil according to the present invention, it is preferable that the gap has a coil within a range of a width of 0.3 μm or more and 5 μm or less.
在有關本發明之高頻線圈用電線中,前述銅導體則選自精銅,無氧銅,銅-錫合金,銅-銀合金,銅-鎳合金,銅包鋁,銅包鎂者為佳。如根據本發明,上述銅導體係因導電率60%IACS以上之低阻抗的良導電性之故,即使為細化導體徑之情況,因將銅作為主體之金屬則位於最外層之故而不易被氧化,而可提高焊接接合之信賴性者。In the high-frequency coil wire of the present invention, the copper conductor is preferably selected from refined copper, oxygen-free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper-clad aluminum, and copper-clad magnesium. . According to the present invention, the above-mentioned copper conductor system has low impedance and good conductivity with a conductivity of 60% IACS or more. Even if the conductor diameter is reduced, the metal containing copper as the main body is located in the outermost layer. Oxidation, which can improve the reliability of solder joints.
(2) 有關本發明之電子零件係其特徵為使用有關上述本發明之高頻線圈用電線而構成者。作為電子零件係可舉出:高頻線圈等之捲線零件,具備高頻線圈等之捲線零件的電路基板等者。(2) The electronic component according to the present invention is characterized by using the wire for the high-frequency coil according to the present invention described above. Examples of electronic components include wire winding components such as high frequency coils, circuit boards including wire winding components such as high frequency coils, and the like.
(3) 有關本發明之高頻線圈用電線,係至少由具有銅導體與設置於該銅導體之外周的強磁性層的芯線,和設置於該芯線上的絕緣被覆層而加以構成之高頻線圈用電線,其特徵為焊接時之浸潤應力為3.4mN以上,零交叉時間為0.4秒以下者。如根據本發明,浸潤應力則變高,而可得到堅固的焊接接合。(3) The high-frequency coil wire according to the present invention is a high-frequency coil comprising at least a core wire having a copper conductor, a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating coating layer provided on the core wire. The wire for coils is characterized in that the wetting stress during soldering is 3.4 mN or more, and the zero-crossing time is 0.4 seconds or less. According to the present invention, the wetting stress becomes high and a strong welded joint can be obtained.
在有關本發明之高頻線圈用電線中,前述銅導體之直徑則為0.02~0.40mm之範圍內者為佳。In the high-frequency coil wire according to the present invention, the diameter of the copper conductor is preferably within the range of 0.02 to 0.40 mm.
在有關本發明之高頻線圈用電線中,前述浸潤應力為3.7mN以上,零交叉時間為0.2秒以下者為佳。In the electric wire for a high frequency coil according to the present invention, the wetting stress is preferably 3.7 mN or more, and the zero-crossing time is preferably 0.2 seconds or less.
在有關本發明之高頻線圈用電線中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層,前述鐵層之維氏硬度為200HV者為佳。In the high frequency coil wire according to the present invention, the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer, and the Vickers hardness of the iron layer is preferably 200HV.
在有關本發明之高頻線圈用電線中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層,前述鐵層之厚度為0.2μm以上3.0μm以下者為佳。In the high-frequency coil wire according to the present invention, the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer, and the thickness of the iron layer is preferably 0.2 μm or more and 3.0 μm or less.
(4) 有關本發明之電子零件係其特徵為有關上述本發明之高頻線圈用電線則經由焊接而加以連接者。作為電子零件係可舉出:高頻線圈等之捲線零件,具備高頻線圈等之捲線零件的電路基板等者。 發明效果(4) The electronic component according to the present invention is characterized in that the high-frequency coil wire according to the present invention is connected by welding. Examples of electronic components include wire winding components such as high frequency coils, circuit boards including wire winding components such as high frequency coils, and the like. Invention effect
如根據本發明,可提供確保焊接接合之信賴性,且可謀求在高頻率之交流阻抗的降低之高頻線圈用電線。According to the present invention, it is possible to provide an electric wire for a high-frequency coil that can ensure the reliability of solder joints and can achieve a reduction in AC impedance at high frequencies.
對於有關本發明之高頻線圈用電線及電子零件的實施形態,參照圖面同時,加以說明。然而,本發明係包含與以下所說明之實施形態及記載於圖面之形態相同技術性思想的發明者,而本發明之技術性範圍係未僅限定於實施形態之記載或圖面的記載者。Embodiments of the high-frequency coil wire and electronic component of the present invention will be described with reference to the drawings. However, the present invention includes the inventors who have the same technical idea as the embodiments described below and the forms described in the drawings, and the technical scope of the present invention is not limited only to the descriptions of the embodiments or the drawings. .
有關本發明之高頻線圈用電線20係如圖1及圖2所示,至少由具有銅導體1與設置於其銅導體1之外周的強磁性層4的芯線10,和設置於其芯線10上的絕緣被覆層5而加以構成。並且,如圖3(A)(B)所示,其特徵為強磁性層4則具有徑方向X之間隙G者。強磁性層4係由鐵層2,和設置於鐵層2之外周之鎳層3所成者為佳。As shown in FIGS. 1 and 2 , a high-
在此高頻線圈用電線20中,構成芯線10之強磁性層4則因具有徑方向X之間隙G之故,焊接時之焊錫則容易到達至銅導體1。其結果,經由銅與焊錫中的錫產生金屬間結合之時,浸潤應力則變高,而可得到堅固的焊錫接合。然而,間隙G係成為貫穿強磁性層4(例如鎳層3及鐵層2)之形態。未有間隙G之情況,係焊錫中的錫則成為與鎳結合者,但對於鎳層之厚度為極薄之情況,於焊錫中瞬間擴散鎳。其結果,實際上成為與鐵之接合之故,而浸潤應力變低,而難以得到良好的接合強度。
In this high-
以下,說明高頻線圈用電線的構成要素。 Hereinafter, the constituent elements of the high-frequency coil wire will be described.
芯線10係具有銅導體1,和設置於銅導體1之外周的強磁性層4。高頻線圈用電線20係至少由芯線10,和設置於芯線10上之絕緣被覆層5而加以構成。
The
銅導體1係作為主要的構成金屬而包含銅或銅合金,而在本申請中,選自精銅,無氧銅,銅-錫合金,銅-銀合金,銅-鎳合金,銅包鋁,銅包鎂等。此等導體係因導電率60%IACS以上之低阻抗的良導電性之故,即使為細化導體徑之情況,因將銅作為主體之金屬則位於最外層之故而不易被氧化,而可提高焊接接合之信賴性者。然而,在銅-錫合金,銅-銀合金,銅-鎳合金,銅包鋁,銅包鎂等中,
作為高頻線圈用電線20而呈成為理想之上述導電率(60%IACS以上)地,其銅合金之情況係調整其合金組成者為佳,而包層之情況,係調整芯材之材質或包層材與芯材的比者為佳。
The
銅導體1之直徑係未特別加以限定,但在焊接溫度為高之環境的連接強度之信賴性則成為問題的細度者為佳,例如,0.02~0.40mm程度之範圍內。
The diameter of the
強磁性層4係設置於銅導體1上,而以所得到之芯線10,作為高頻線圈用電線20,使用於高頻線圈之情況,呈降低交流阻抗,而高頻率特性提升地產生作用。強磁性層4之構成材料係未特別加以限定,例如,可舉出:鐵,鈷,鎳,高導磁合金(Ni78-Fe22)、高導磁合金(Ni45-Fe55)、超導磁合金(Ni75-Cu5-Fe20)、Co-Ni-Fe(Co20-Ni40-Fe40)等者。強磁性層4之形成方法係未特別加以限定,但作為形成於銅導體1上之方法中,電鍍法為佳,但上述之各組成之構成係因均可由電鍍而成膜之故,可理想使用。在有關本發明之高頻線圈用電線20中,其特徵為於此強磁性層4,形成有後述之間隙G者。
The
在以下中,以例說明作為強磁性層4,由鐵層2與鎳層3所成之構成。以鐵層2與鎳層3以外的構成而加以構成之強磁性層4係經由其組成而高頻率特性雖有稍微不同,但關於間隙G之作用,厚度,焊接等係為同樣。In the following, a configuration of the
(鐵層) 鐵層2係設置於銅導體1上,而與鎳層3同時構成強磁性層4。此鐵層2之厚度係以0.2μm以上3.0μm以下之範圍內加以設置者為佳,而在使用於高頻線圈等之情況,降低交流阻抗,而高頻率特性則提升。特別是純鐵鍍敷係因為為強磁性之故而被理想採用。然而,如為在未阻礙降低交流阻抗等之效果的範圍,於鐵層2,含有其他元素(例如,鎳,鈷,磷,硼等)亦可。(Iron Layer) The
鐵層2係可使高頻率特性提升之同時,亦有在焊接時防止焊錫熔蝕之效果。但在形成於銅導體1上之鐵層2,防止焊錫熔蝕之情況係意味不易形成焊錫中的錫與鐵之金屬間化合物者。不易做到如此之金屬間化合物之形成係阻礙銅與焊錫中的錫之化合者,而有浸潤應力(即,接合強度)低,對於連接信賴性差,無法對應於在短時間之焊接性的要求之情況。The
在本發明中,其特徵為由鐵層2及鎳層3所成之強磁性層4則具有徑方向X之間隙G者。經由具有如此之間隙G之時,焊接時之焊錫中的錫則容易到達至銅導體1。其結果,經由銅與焊錫中的錫產生金屬間結合之時,浸潤應力則變高,而可得到堅固的焊錫接合。間隙G係成為自鎳層3貫穿於鐵層2之一體的形態。In the present invention, the feature is that the
間隙G的數係於芯線10之表面可看到的數,於以與芯線10之直徑D相同長度的軸方向假想線Y1與徑方向假想線X1而形成之正方形(Y1×X1)之中可看到的數。其間隙G的數係為2以上、30以下之範圍內者為佳。經由作為如此之範圍內之時,焊接時的焊錫則容易到達至銅導體,其結果,經由銅與焊錫中的錫產生金屬間結合之時,得到良好之浸潤應力,而得到堅固的焊錫接合。間隙G的數則不足2之情況,焊錫中的錫與鐵之接合則成為主要之故,浸潤應力為低,而有不易得到良好之接合強度者。另一方面,當間隙G的數超過30時,焊錫中的錫與銅則瞬間接合,焊錫熔蝕則進行,導體剖面積則容易減少之故,而有接合強度下降之情況。間隙G之寬度係0.3μm以上5μm以下之範圍內為佳,而0.5μm以上,2.0μm以下之範圍內則更佳。經由此間隙G,焊接時的焊錫則容易到達至銅導體,其結果,經由銅與焊錫中的錫產生金屬間結合之時,得到良好之浸潤應力,而得到堅固的焊錫接合。然而,當間隙G的寬度超過5μm時,而有容易成為針孔者。The number of the gap G is the number that can be seen on the surface of the
間隙G係如後述之實施例所示,可控制銅導體1之機械性特性(拉伸強度,延伸)或滑輪的尺寸與角度而形成者。另外,作為加上添加劑於鐵鍍敷液,以及控制鍍敷條件,經由將鐵層2之硬度,以維氏硬度而增加為200HV以上之時,可形成間隙G者。The gap G is formed by controlling the mechanical properties (tensile strength, elongation) of the
作為添加劑係例如,可舉出:硫脲,糖精,苯并噻唑,JGB(健那綠B)、亞苄基丙酮,明膠,聚乙二醇,丁炔二醇,香豆素等,經由添加數10ppm此等之時,分子或離子則可以單獨吸附於析出位置而析出。另外,以此等添加劑而使鐵錯合物形成,其錯合物則可吸附於析出位置而析出。經由添加劑的效果而可得到微細,硬的結晶粒,可形成維氏硬度250HV程度之鐵層2者。經由將如此之鐵層2之厚度,作為0.5μm以上、理想為1μm以上之時,電著應力則增加,於鐵層2存在有間隙G。Examples of the additive system include thiourea, saccharin, benzothiazole, JGB (Guinea green B), benzylidene acetone, gelatin, polyethylene glycol, butynediol, coumarin, etc. In the case of several 10 ppm or the like, molecules or ions can be adsorbed at the precipitation site alone and precipitated. In addition, iron complexes are formed by these additives, and the complexes can be adsorbed and deposited at the precipitation sites. Through the effect of additives, fine and hard crystal grains can be obtained, and the
作為鍍敷條件係例如,經由將鍍敷液的溫度,從30℃降低至20℃,以及將pH,從3降低至2之時,可得到微細,硬的結晶粒,可形成維氏硬度300HV程度之鐵層2者。經由將如此之鐵層2之厚度,作為0.5μm以上、理想為1μm以上之時,電著應力則增加,於鐵層2存在有間隙G。As the plating conditions, for example, when the temperature of the plating solution is lowered from 30°C to 20°C and the pH is lowered from 3 to 2, fine and hard crystal grains can be obtained, and a Vickers hardness of 300HV can be obtained. Degree of
鐵層2係以電鍍而加以成膜者為佳,可在鐵電解液中供電至銅導體1而形成者。作為鍍敷液係通常,如為至少具有鐵的無機鹽,和支援電解質之鍍敷液,未特別加以限定,但例如可適用硫酸鐵鍍敷液或氯化鐵鍍敷液等者。對於鍍敷液係在未阻礙本發明之效果的範圍內,因應必要,含有界面活性劑,光澤劑等之各種添加劑亦可。The
(鎳層) 鎳層3係設置於鐵層2上,而與鐵層2同時構成強磁性層4。此鎳層3之厚度係以0.01μm以上1.0μm以下之範圍內加以設置者為佳,而時焊接性提升之同時,在與鐵層2同時使用於高頻線圈等之情況,可降低交流阻抗,使高頻率特性提升者。當鎳層3過厚時,強磁性體的鐵之效果則漸弱,未至經由近接效應之高頻率損失的抑制。另一方面,當鎳層3過薄時,在焊接溫度為高的環境中,鎳層3與焊錫中的錫則瞬間產生反應而擴散,實際上係成為基底的鐵層2與焊錫材料的接合之故,浸潤應力為低,不易得到良好的接合強度。(Nickel layer) The
鎳層3係與鐵層2同時構成強磁性層4,此強磁性層4係如上述,具有徑方向X之間隙G。然而,對於間隙G係因既已說明過之故,在此係省略其說明。The
鎳層3係以電鍍而加以成膜者為佳,可在鎳電解液中,供電至設置有鐵層2之銅導體1而形成者。作為鍍敷液係通常,如為至少具有鎳的無機鹽,和支援電解質之鍍敷液,未特別加以限定,但例如可適用硫酸鎳鍍敷液或氯化鎳鍍敷液等者。對於鍍敷液係在未阻礙本發明之效果的範圍內,因應必要,含有界面活性劑,光澤劑等之各種添加劑亦可。The
<絕緣被覆層> 絕緣被覆層5係如圖2所示,加以設置於強磁性層4上。經由設置絕緣被覆層5之時,可將高頻線圈用電線20,可作為各種高頻線圈,高頻線圈用的電線(經由絕緣被覆而一體化絞線,所集合之裸線的外周之絕緣電線等)而有用地利用。作為絕緣被覆層5係於形成強磁性層4之後的芯線10之外周,塗佈燒付而形成焊接可能之絕緣瓷漆被膜,或焊接可能之絕緣瓷漆被膜與熔著瓷漆被膜。焊接可能之絕緣瓷漆被膜係例如,可塗佈燒付而形成泛用聚氨酯,變性聚氨酯,聚亞醯胺酯等之焊接可能之瓷漆塗料。另外,更且形成於其外周之熔著瓷漆被膜係例如,可塗佈燒付而形成尼龍或環氧等之熔著瓷漆塗料。此等之被膜係可使用通常的瓷漆線之製造裝置而製造。然而,對於設置無法焊接之絕緣被覆層5(聚醯胺醯亞胺,聚醯亞胺,聚酯等)之情況,係由機械性及/或化學性地剝離絕緣被覆層5者,可良好地進行焊接。<Insulating coating layer> The insulating
設置有絕緣被覆層5之有關本發明之高頻線圈用電線20係即使在高頻線圈用以外,亦可使用於李茲線的構成線材,或三層絕緣電線的構成線材等者。另外,此等之其他,作為使用設置絕緣被覆層5之前的芯線10,或者於其芯線10的表面具備咪唑錯合物等之保護膜之構成,絞合此等而作為絞線或作為使其集合之集合線,以壓出,捲帶,燒付等而一體化其絞線或集合線的外周之高頻用的絕緣電線等亦可。The high-
<電子零件> 有關本發明之電子零件係使用有關上述之本發明之高頻線圈用電線20而加以構成。作為電子零件係可舉出:高頻線圈等之捲線零件,具備高頻線圈等之捲線零件的電路基板等者。 實施例<Electronic component> The electronic component according to the present invention is constructed using the high-
於以下,舉出實施例,更具體地說明本發明。然而,本發明係未加以限定於以下之實施例者。Hereinafter, an Example is given and this invention is demonstrated more concretely. However, the present invention is not limited to the following examples.
[實施例1] 將直徑0.1mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火的直徑0.1mm之退火材(ACW、拉伸強度:240MPa、延伸:27%)作為銅導體1而使用,進行表面脫脂,酸活化處理之後,以電鍍法而形成厚度1μm之鐵層2,接著,以電鍍法而形成厚度0.03μm之鎳層3,得到具備強磁性層4(鐵層2與鎳層3)之芯線10。鐵鍍敷係使用硫酸鐵鍍敷液(硫酸亞鐵250g/L、氯化鐵50g/L、氯化銨30g/L),而鎳鍍敷係使用硫酸鎳鍍敷液(硫酸鎳250g/L、氯化鎳30g/L、硼酸15g/L)。使所得到之芯線10,以120°角度接觸於直徑之350倍的滑輪同時,進行卷繞,於強磁性層4之徑方向X,設置間隙G。如此得到具備間隙G之芯線10。[Example 1] An annealed material (ACW, tensile strength: 240 MPa, elongation: 27%) with a diameter of 0.1 mm was annealed with a hard copper wire (HCW) with a diameter of 0.1 mm in an inert gas atmosphere at 360° C. as
[實施例2] 將鐵層2之厚度做成2μm。除此之外係與實施例1相同作為,得到芯線10。[Example 2] The thickness of the
[實施例3] 將鐵層2之厚度做成3μm。除此之外係與實施例1相同作為,得到芯線10。[Example 3] The thickness of the
[實施例4] 作為銅導體1,使用將直徑0.1mm之硬銅銀合金線(HCAW),以650℃之非活性氣體環境進行退火之直徑0.1mm之退火材(ACAW、拉伸強度:330MPa、延伸:24%)。除此之外係與實施例1相同作為,得到芯線10。[Example 4] As the
[實施例5] 作為銅導體1,使用將直徑0.1mm之硬銅錫合金線(HCSW),以600℃之非活性氣體環境進行退火之直徑0.1mm之退火材(ACSW、拉伸強度:300MPa、延伸:25%)。除此之外係與實施例1相同作為,得到芯線10。[Example 5] As the
[實施例6] 使用直徑之300倍的滑輪。除此之外係與實施例1相同作為,得到芯線10。[Example 6] A pulley 300 times the diameter was used. Except for this, the
[實施例7] 使用直徑之200倍的滑輪。除此之外係與實施例1相同作為,得到芯線10。[Example 7] A pulley 200 times the diameter was used. Except for this, the
[實施例8] 使用直徑之100倍的滑輪。除此之外係與實施例1相同作為,得到芯線10。[Example 8] A pulley 100 times the diameter was used. Except for this, the
[實施例9] 以300℃之非活性氣體環境進行退火。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:280MPa、延伸:15%。[Example 9] Annealing was performed in an inert gas atmosphere at 300°C. Except for this, the
[實施例10] 以280℃之非活性氣體環境進行退火。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:300MPa、延伸:5%。[Example 10] Annealing was performed in an inert gas atmosphere at 280°C. Except for this, the
[實施例11] 以90°之角度使其接觸於滑輪同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。[Example 11] Winding was performed while contacting the pulley at an angle of 90°. Except for this, the
[實施例12] 使用直徑之100倍的滑輪,且以90°之角度使其接觸於滑輪同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。[Example 12] A pulley with a diameter of 100 times the diameter was used, and the winding was performed while contacting the pulley at an angle of 90°. Except for this, the
[實施例13] 將直徑0.05mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火之直徑0.05mm之退火材(ACW、拉伸強度:280MPa、延伸:18%)作為銅導體1。除此之外係與實施例1相同作為,得到芯線10。[Example 13] A hard copper wire (HCW) with a diameter of 0.05 mm and an annealed material with a diameter of 0.05 mm (ACW, tensile strength: 280 MPa, elongation: 18%) annealed in an inert gas atmosphere at 360°C were used as
[實施例14] 將直徑0.08mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火之直徑0.08mm之退火材(ACW、拉伸強度:260MPa、延伸:22%)作為銅導體1。除此之外係與實施例1相同作為,得到芯線10。[Example 14] A hard copper wire (HCW) with a diameter of 0.08 mm and an annealed material with a diameter of 0.08 mm (ACW, tensile strength: 260 MPa, elongation: 22%) annealed in an inert gas environment at 360°C were used as
[實施例15] 將直徑0.12mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火之直徑0.12mm之退火材(ACW、拉伸強度:240MPa、延伸:28%)作為銅導體1。除此之外係與實施例1相同作為,得到芯線10。[Example 15] A hard copper wire (HCW) with a diameter of 0.12 mm and an annealed material with a diameter of 0.12 mm (ACW, tensile strength: 240 MPa, elongation: 28%) annealed in an inert gas environment at 360° C. were used as
[比較例1] 未以非活性氣體環境進行退火。除此之外係與實施例1相同作為,得到芯線10。未進行退火之硬銅線(HCW)係拉伸強度:400MPa、延伸:2%。[Comparative Example 1] Annealing was not performed in an inert gas atmosphere. Except for this, the
[比較例2] 將鐵層2之厚度做成2μm。除此之外係與比較例1相同作為,得到芯線10。[Comparative Example 2] The thickness of the
[比較例3] 將鐵層2之厚度做成3μm。除此之外係與比較例1相同作為,得到芯線10。[Comparative Example 3] The thickness of the
[比較例4] 以280℃之非活性氣體環境進行退火,且使用直徑之400倍的滑輪。除此之外係與實施例1相同作為,得到高頻線圈用電線。退火材(ACW)係拉伸強度:300MPa、延伸:5%。[Comparative Example 4] Annealing was performed in an inert gas atmosphere at 280°C, and a pulley having a diameter of 400 times was used. Other than that, it was performed in the same manner as in Example 1, and an electric wire for a high-frequency coil was obtained. Annealed material (ACW) tensile strength: 300 MPa, elongation: 5%.
[比較例5] 以280℃之非活性氣體環境進行退火,且於直徑之400倍的滑輪,以90°之角度使其接觸之同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:300MPa、延伸:5%。[Comparative Example 5] Annealing was performed in an inert gas atmosphere at 280°C, and a pulley having a diameter of 400 times the diameter was brought into contact at an angle of 90° while being wound. Except for this, the
[比較例6] 作為銅導體1,使用將直徑0.1mm之硬銅錫合金線(HCSW),以600℃之非活性氣體環境進行退火之直徑0.1mm之退火材(ACSW、拉伸強度:300MPa、延伸:25%)。更且,於直徑之400倍的滑輪,以120°之角度使其接觸之同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。[Comparative Example 6] As the
[比較例7] 以300℃之非活性氣體環境進行退火,且於直徑之350倍的滑輪,以160°之角度使其接觸之同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:240MPa、延伸:15%。[Comparative Example 7] Annealing was performed in an inert gas atmosphere at 300°C, and a pulley 350 times the diameter was brought into contact at an angle of 160° while being wound. Except for this, the
[測定與結果] (間隙與焊接特性) 於表1顯示在實施例與比較例所得到之芯線10之要素。各芯線10之間隙G係以顯微鏡(股份有限公司keyence製、VX600型、500倍)而進行測定。測定係測定可於以軸方向假想線Y1與徑方向假想線X1而形成之正方形(0.1mm角)之中看到之間隙G的數之同時,測定其間隙G之平均寬度。間隙G的數之測定係計數徑方向假想線X1(=芯線的直徑)之1/4之長度以上者。可以連續或非連續而分支有間隙G之構成之情況係看作關連之同一(1個)之間隙G。將其結果示於表2。[Measurement and Results] (Gap and Welding Properties) Table 1 shows the elements of the
將焊接時之浸潤應力(mN)與零交叉時間(秒),以活動性浸潤性試驗機(股份有限公司RHESCA製,WET-6100型)而進行測定。焊錫係使用Sn-3Ag-0.5Cu(日本千住金屬工業股份有限公司製),以380℃之溫度進行試驗。將其結果示於表2。Wetting stress (mN) and zero-crossing time (seconds) at the time of welding were measured with an active wettability tester (manufactured by RHESCA Co., Ltd., model WET-6100). As the solder, Sn-3Ag-0.5Cu (manufactured by Senju Metal Industry Co., Ltd.) was used, and the test was carried out at a temperature of 380°C. The results are shown in Table 2.
自表1及表2的結果,對於浸潤應力為3.4mN以上,零交叉時間為0.4秒以下之情況,間隙G的數為6以上,間隙G的數與寬度的積為6以上之情況。作為特別理想之構成,浸潤應力為3.7mN以上,零交叉時間為0.2秒以下之情況,間隙G的數為12以上,間隙G的數與寬度的積為12以上之情況。如此之結果係主要可實現於間隙G的數與寬度的積為12以上之情況。如此之間隙G係可以表1所示之製造條件而形成者。From the results of Tables 1 and 2, when the wetting stress is 3.4 mN or more and the zero-crossing time is 0.4 seconds or less, the number of gaps G is 6 or more, and the product of the number of gaps G and the width is 6 or more. A particularly desirable configuration is when the wetting stress is 3.7 mN or more, the zero-crossing time is 0.2 seconds or less, the number of gaps G is 12 or more, and the product of the number and width of gaps G is 12 or more. Such a result can be realized mainly when the product of the number and the width of the gap G is 12 or more. Such a gap G can be formed under the manufacturing conditions shown in Table 1.
對於銅導體1之直徑不同之實施例13~15的芯線10,進行與實施例1同樣的測定(浸潤應力,零交叉時間,間隙的數)。在實施例13(導體徑:0.05mm)中,浸潤應力:1.8mN、零交叉時間:0.2秒、間隙G的數:25、間隙G的寬度:1.5mm、數與寬度的積:37.5。在實施例14(導體徑:0.08mm)中,浸潤應力:2.9mN、零交叉時間:0.2秒、間隙G的數:19、間隙G的寬度:1.0mm、數與寬度的積:19。在實施例15(導體徑:0.12mm)中,浸潤應力:4.3mN、零交叉時間:0.2秒、間隙G的數:12、間隙G的寬度:1.0mm、數與寬度的積:12。由此等之結果,對於浸潤應力(mN),在以每單位表面積進行分割比較的結果,實施例1(導體徑:0.10mm)、實施例13(導體徑:0.05mm)、實施例14(導體徑:0.08mm)、實施例15(導體徑:0.12mm)係均在5.7mN/mm2
附近。For the
(高頻率特性) 將高頻率特性,以LCR測量儀(精密LCR測量儀、4284A、20Hz~1MHz、Agilent公司製)而進行測定。測定係試料長:1.50m、專用線軸:內徑φ67mm、旋轉數:5轉,終端係兩端附上焊錫,與織體連接進行測定。使用將2種胺甲酸乙酯作為絕緣被覆層5而設置之下記的試料1~3(高頻線圈用電線20),使頻率變化至1kHz~1MHz為止進行測定。(High-frequency characteristics) The high-frequency characteristics were measured with an LCR measuring instrument (Precision LCR measuring instrument, 4284A, 20 Hz to 1 MHz, manufactured by Agilent). Measurement system: Sample length: 1.50 m, special spool: inner diameter φ67 mm, number of revolutions: 5 revolutions, and the terminal is measured by attaching solder to both ends and connecting it to the fabric. Using the
試料1:2種胺甲酸乙酯被覆瓷漆銅鍍敷絞線(21條/φ0.10mm)試料2:2種胺甲酸乙酯被覆瓷漆鐵鍍敷絞線(21條/φ0.10mm),間隙G:無,鐵鍍敷液(與實施例相同之鐵鍍敷液,未有添加劑),鎳鍍敷液(與實施例1相同之鎳鍍敷液),Fe層之厚度:0.8μm、Ni層之厚度:0.05μm試料3:2種胺甲酸乙酯被覆瓷漆鐵鍍敷絞線(21條/φ0.10mm),間隙G:有,鐵鍍敷液(與實施例1相同之鐵鍍敷液,添加劑:糖精2m/L),鎳鍍敷液(與實施例1相同之鎳鍍敷液),Fe層之厚度:0.8μm、Ni層之厚度:0.05μm。Sample 1: Two kinds of urethane-coated enamel-coated copper-plated strands (21 wires/φ0.10mm) Sample 2: Two kinds of urethane-coated enamel-coated iron-plated strands (21 wires/φ0.10mm), gap G: None, iron plating solution (same iron plating solution as in Example, without additives), nickel plating solution (same nickel plating solution as in Example 1), thickness of Fe layer: 0.8 μm, Ni Thickness of layer: 0.05 μm Sample 3: Two kinds of urethane-coated enamel iron plating strands (21 wires/φ0.10 mm), Gap G: Yes, iron plating solution (same iron plating as in Example 1) solution, additive: saccharin 2m/L), nickel plating solution (same nickel plating solution as in Example 1), thickness of Fe layer: 0.8 μm, thickness of Ni layer: 0.05 μm.
圖3(A)係試料3之胺甲酸乙酯被覆瓷漆磁性鍍敷絞線的表面照片。圖3(B)係試料2之2種胺甲酸乙酯被覆瓷漆磁性鍍敷絞線的表面照片。圖3(C)係試料1之2種胺甲酸乙酯被覆瓷漆銅絞線的表面照片。FIG. 3(A) is a photograph of the surface of the urethane-coated enamel magnetically plated strand of
表3係阻抗結果,表4係阻抗損失之結果。自表3及表4了解到,對於設置有強磁性層4之情況,無關於間隙G之有無,而顯是相同之高頻率特性,而確認到間隙G之存在則未有使高頻率特性降低之情況。Table 3 shows the impedance results, and Table 4 shows the impedance loss results. As can be seen from Tables 3 and 4, in the case where the
1:銅導體 1: Copper conductor
2:鐵層 2: Iron layer
3:鎳層 3: Nickel layer
4:強磁性層 4: ferromagnetic layer
5:絕緣被覆層 5: Insulation coating
10:芯線 10: Core wire
20:高頻線圈用電線 20: Wires for high frequency coils
D:直徑 D: diameter
G:間隙 G: Gap
X:徑方向 X: radial direction
圖1係顯示構成有關本發明之高頻線圈用電線之芯線的一例之剖面圖。 圖2係顯示有關本發明之高頻線圈用電線之一例之剖面圖。 圖3係在實施例所得到之芯線的強磁性層表面之電子顯微鏡照片。(A)係具有間隙之情況。(B)係間隙少之情況。(C)係幾乎未有間隙之情況。FIG. 1 is a cross-sectional view showing an example of a core wire constituting an electric wire for a high-frequency coil according to the present invention. Fig. 2 is a cross-sectional view showing an example of the electric wire for the high-frequency coil of the present invention. Fig. 3 is an electron microscope photograph of the surface of the ferromagnetic layer of the core wire obtained in the Example. (A) is the case with a gap. (B) is the case where the clearance is small. (C) is the case where there is almost no gap.
1‧‧‧銅導體 1‧‧‧Copper conductor
2‧‧‧鐵層 2‧‧‧Iron Layer
3‧‧‧鎳層 3‧‧‧Ni layer
4‧‧‧強磁性層 4‧‧‧Ferrous magnetic layer
10‧‧‧芯線 10‧‧‧Core wire
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