TW201917742A - Electric wire for high-frequency coil, and electronic component - Google Patents

Electric wire for high-frequency coil, and electronic component Download PDF

Info

Publication number
TW201917742A
TW201917742A TW107121854A TW107121854A TW201917742A TW 201917742 A TW201917742 A TW 201917742A TW 107121854 A TW107121854 A TW 107121854A TW 107121854 A TW107121854 A TW 107121854A TW 201917742 A TW201917742 A TW 201917742A
Authority
TW
Taiwan
Prior art keywords
electric wire
layer
copper
frequency coil
iron
Prior art date
Application number
TW107121854A
Other languages
Chinese (zh)
Other versions
TWI772446B (en
Inventor
北沢弘
先田卓也
宮澤貴志
宮原正平
岡田洋一
柳原正宏
Original Assignee
日商東京特殊電線股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東京特殊電線股份有限公司 filed Critical 日商東京特殊電線股份有限公司
Publication of TW201917742A publication Critical patent/TW201917742A/en
Application granted granted Critical
Publication of TWI772446B publication Critical patent/TWI772446B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/617Crystalline layers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B7/00Insulated conductors or cables characterised by their form
    • H01B7/02Disposition of insulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Insulated Conductors (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Non-Insulated Conductors (AREA)

Abstract

To provide: an electric wire which is for a high-frequency coil and with which the reliability of a soldered joint is assured and AC resistance at high frequencies can be reduced; and an electronic component having the electric wire for a high-frequency coil. The problem is solved by using this electric wire 20 for a high-frequency coil, the electric wire being configured from at least: a core wire 10 having a copper conductor 1 and a ferromagnetic layer 4 provided on the outer circumference of the copper conductor 1, and an insulating covering layer 4 provided on the core wire 10, wherein the ferromagnetic layer 4 has a gap G in a radial direction X, the wetting stress during soldering is at least 3.4 mN, and the zero-cross time is not more than 0.4 seconds.

Description

高頻線圈用電線及電子零件Electric wires and electronic parts for high-frequency coils

本發明係有關高頻線圈用電線及電子零件。更詳細係本發明係有關使用於各種高頻線圈等之電子零件,可降低在高頻的交流阻抗之高頻線圈用電線及使用其高頻線圈用電線之電子零件。The present invention relates to electric wires and electronic parts for high-frequency coils. More specifically, the present invention relates to electronic parts used in various high-frequency coils and the like, and high-frequency coil wires that can reduce the high-frequency AC impedance, and electronic parts using the high-frequency coil wires.

對於專利文獻1係提案有將於銅線上施以純鐵等之強磁性體鍍敷之導體作為芯線的瓷漆絕緣電線,並記載有使高頻率增益Q提升數10%者。此特性提升係認為依據在高頻率的交流阻抗之降低,而認為經由對於導體的外周施以強磁性層之時,遮蔽外部磁場之同時,根據降低經由未完全遮蔽而侵入於內部的外部磁場之渦電流,抑制經由近接效應之損失之時,抑制交流阻抗之增大者。另外,對於專利文獻1係亦記載有對於為了焊接特性的提升,作為設置於強磁性層上之鍍敷層,鎳鍍敷層則較銅鍍敷層為佳者。Patent Document 1 proposes an enamel-insulated electric wire in which a conductor coated with a ferromagnetic material such as pure iron is applied to a copper wire as a core wire, and it is described that the high-frequency gain Q is increased by a factor of 10%. The improvement of this characteristic is considered to be based on the reduction of the high-frequency AC impedance, and it is considered that when a strong magnetic layer is applied to the outer periphery of the conductor, the external magnetic field is shielded, and the external magnetic field that penetrates into the interior through incomplete shielding is reduced. When the eddy current suppresses the loss through the proximity effect, the increase in the AC impedance is suppressed. In addition, Patent Document 1 also describes that a nickel plating layer is better than a copper plating layer as a plating layer provided on a ferromagnetic layer in order to improve soldering characteristics.

另外,對於專利文獻2係使焊接性提升作為目的,提案有:於導體之外周設置鐵鍍敷層,為了確保焊接性而設置厚度0.03~0.1μm之鎳鍍敷層,在鐵鍍敷層產生氧化之前,塗佈燒付聚氨酯絕緣塗料所成之瓷漆絕緣樹脂層之方法。 先前技術文獻 專利文獻In addition, for the purpose of improving the solderability of Patent Document 2, it is proposed that an iron plating layer be provided on the outer periphery of the conductor, and a nickel plating layer having a thickness of 0.03 to 0.1 μm is provided in order to ensure weldability. A method for applying an enamel insulating resin layer formed by firing a polyurethane insulating coating before oxidation. Prior Art Literature Patent Literature

專利文獻1:日本實公昭42-1339號公報   專利文獻2:日本特開昭62-151594號公報Patent Document 1: Japanese Patent Publication No. 42-1339 Patent Document 2: Japanese Patent Publication No. 62-151594

發明欲解決之課題Problems to be solved by the invention

在使用於線圈零件的絕緣被覆電線中,作為瓷漆絕緣層,一般而言適用聚氨酯被覆層。但線圈零件等之電子機器零件的動作環境係移轉至更高溫側,而構成絕緣被覆電線的瓷漆絕緣層亦耐熱性的要求增加。構成絕緣被覆層的絕緣性樹脂之耐熱性係以A種、E種、B種、F種、H種等之耐熱級別與容許最高溫度所表示,形成上述聚氨酯被覆層之聚氨酯係相當於溫度指數E種120℃。在最近中,有著對於使用溫度指數F種155℃之變性聚氨酯或聚酯,更且,溫度指數H種180℃之聚亞醯胺酯等之高耐熱性樹脂之要求,而在360℃以下進行作業之焊接溫度則在F種級別中變高為420℃,而在H種級別中變高為460℃。In the insulated coated wire used for coil parts, as a enamel insulation layer, a polyurethane coating is generally applicable. However, the operating environment of electronic equipment parts such as coil parts is shifted to a higher temperature side, and the enamel insulation layer constituting the insulated covered electric wires also requires increased heat resistance. The heat resistance of the insulating resin constituting the insulation coating layer is represented by the heat resistance levels and allowable maximum temperatures of A, E, B, F, and H types. The polyurethane system forming the polyurethane coating layer is equivalent to the temperature index. Type E 120 ° C. Recently, there is a demand for highly heat-resistant resins such as denatured polyurethanes or polyesters with a temperature index F of 155 ° C, and polyurethanes with a temperature index H of 180 ° C, and it is carried out below 360 ° C. The welding temperature of the operation becomes 420 ° C in the F grade and 460 ° C in the H grade.

伴隨之焊接溫度變高,容易引起經由導線(銅導體等)之焊錫熔蝕之剖面減少等,而連接強度的信賴性則成為問題之故,在極短時間,焊接處理導線者為佳。即,浸潤應力為高,且零交叉時間越短,越可擔保焊錫連接之信賴性。As the soldering temperature becomes higher, the cross section of the solder erosion through the lead wire (copper conductor, etc.) is likely to decrease, and the reliability of the connection strength becomes a problem. In a short time, it is better to solder the lead wire. That is, the higher the wetting stress and the shorter the zero-crossing time, the more reliable the solder connection can be guaranteed.

另外,伴隨著線圈零件的小型化,高頻率化等,絕緣被覆電線係多數條扭絞化,細線化則進展。特別是導線係愈是細線化愈易產生焊錫熔蝕等的問題。In addition, along with the miniaturization and high frequency of coil components, many insulated covered electric wires have been twisted, and thinning has progressed. In particular, as the wire system becomes thinner, problems such as solder erosion tend to occur.

在記載於專利文獻2之瓷漆電線的焊接中,在焊接溫度為高之環境,鎳鍍敷層與焊錫中的錫則瞬間產生反應而擴散,而實際上係成為基底的鐵鍍敷層與焊錫材料的接合。但,從不易形成鐵與錫之金屬間化合物之情況浸潤應力(即,接合強度)為低,對於接合信賴性差。對於必要以上加厚鎳之情況係強磁性體的鐵之效果則漸弱,未至經由近接效應之高頻率損失的抑制。In the welding of enamel wires described in Patent Document 2, in an environment where the welding temperature is high, the nickel plating layer and the tin in the solder react and diffuse instantly, but actually the iron plating layer and the solder that become the base Material bonding. However, since the intermetallic compound of iron and tin is not easily formed, the wetting stress (that is, the bonding strength) is low, and the reliability for bonding is poor. When the thickness of nickel is required to be thicker, the effect of iron, which is a ferromagnetic material, is gradually weakened, and the high frequency loss through the proximity effect is not suppressed.

本發明之目的係提供:確保焊錫接合之信賴性,且謀求在高頻率的交流阻抗的降低之高頻線圈用電線及使用其高頻線圈用電線之電子零件。 為了解決課題之手段An object of the present invention is to provide a high-frequency coil electric wire and an electronic component using the high-frequency coil electric wire while ensuring the reliability of solder bonding and reducing the AC impedance at a high frequency. Means to solve the problem

(1) 一種高頻線圈用電線,係至少由具有銅導體與設置於該銅導體之外周的強磁性層的芯線,和設置於該芯線上的絕緣被覆層而加以構成之高頻線圈用電線,其特徵為前述強磁性層係具有徑方向的間隙者。如根據此發明,因強磁性層則具有徑方向的間隙之故,焊接時之焊錫中的錫則容易到達至銅導體。其結果,經由銅與焊錫中的錫產生金屬間結合之時,浸潤應力則變高,而可得到堅固的焊錫接合。(1) An electric wire for high-frequency coils is an electric wire for high-frequency coils composed of at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating coating provided on the core wire. , Characterized in that the aforementioned ferromagnetic layer has a gap in the radial direction. According to this invention, since the ferromagnetic layer has a gap in the radial direction, tin in the solder during soldering can easily reach the copper conductor. As a result, when intermetallic bonding occurs between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained.

在有關本發明之高頻線圈用電線中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層者為佳。In the electric wire for a high-frequency coil according to the present invention, the ferromagnetic layer preferably includes an iron layer and a nickel layer provided on the outer periphery of the iron layer.

在有關本發明之高頻線圈用電線中,前述間隙的數係為於前述芯線的表面可看到的數,可於由和前述芯線的直徑D相同長度之軸方向假想線與徑方向假想線所形成之正方形之中看到的數則為2以上、30以下之範圍內者為佳。如根據此發明,因可於正方形之中看到的間隙的數則為上述範圍內之故,焊接時之焊錫則容易到達至銅導體。In the electric wire for a high-frequency coil according to the present invention, the number of the gaps is a number that can be seen on the surface of the core wire, and the imaginary line and the radial direction imaginary line are the same length as the diameter D of the core wire. The number of squares formed is preferably in the range of 2 or more and 30 or less. According to this invention, since the number of gaps that can be seen in the square falls within the above range, the solder during soldering easily reaches the copper conductor.

在有關本發明之高頻線圈用電線中,前述間隙係在寬度為0.3μm以上、5μm以下之範圍內有著線圈者為佳。In the high-frequency coil electric wire according to the present invention, it is preferable that the gap has a coil in a range of a width of 0.3 μm or more and 5 μm or less.

在有關本發明之高頻線圈用電線中,前述銅導體則選自精銅,無氧銅,銅-錫合金,銅-銀合金,銅-鎳合金,銅包鋁,銅包鎂者為佳。如根據本發明,上述銅導體係因導電率60%IACS以上之低阻抗的良導電性之故,即使為細化導體徑之情況,因將銅作為主體之金屬則位於最外層之故而不易被氧化,而可提高焊接接合之信賴性者。In the high-frequency coil electric wire according to the present invention, the copper conductor is preferably selected from fine copper, oxygen-free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, copper-clad aluminum, and copper-clad magnesium . For example, according to the present invention, the above-mentioned copper conductive system is not easily susceptible to copper because the metal with the main body is located in the outermost layer because of the good electrical conductivity with a low impedance of 60% IACS or more. Oxidation can improve the reliability of welding joints.

(2) 有關本發明之電子零件係其特徵為使用有關上述本發明之高頻線圈用電線而構成者。作為電子零件係可舉出:高頻線圈等之捲線零件,具備高頻線圈等之捲線零件的電路基板等者。(2) The electronic component according to the present invention is characterized by using the electric wire for a high-frequency coil according to the present invention. Examples of the electronic component include a coiled component such as a high-frequency coil, and a circuit board including a coiled component such as a high-frequency coil.

(3) 有關本發明之高頻線圈用電線,係至少由具有銅導體與設置於該銅導體之外周的強磁性層的芯線,和設置於該芯線上的絕緣被覆層而加以構成之高頻線圈用電線,其特徵為焊接時之浸潤應力為3.4mN以上,零交叉時間為0.4秒以下者。如根據本發明,浸潤應力則變高,而可得到堅固的焊接接合。(3) The electric wire for a high-frequency coil according to the present invention is a high-frequency circuit composed of at least a core wire having a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating coating provided on the core wire. The coil wire is characterized in that the wetting stress during welding is 3.4 mN or more, and the zero-cross time is 0.4 seconds or less. According to the present invention, the wetting stress becomes high, and a strong welded joint can be obtained.

在有關本發明之高頻線圈用電線中,前述銅導體之直徑則為0.02~0.40mm之範圍內者為佳。In the high-frequency coil electric wire according to the present invention, the diameter of the copper conductor is preferably within a range of 0.02 to 0.40 mm.

在有關本發明之高頻線圈用電線中,前述浸潤應力為3.7mN以上,零交叉時間為0.2秒以下者為佳。In the high-frequency coil electric wire according to the present invention, it is preferable that the above-mentioned wetting stress is 3.7 mN or more and the zero-cross time is 0.2 seconds or less.

在有關本發明之高頻線圈用電線中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層,前述鐵層之維氏硬度為200HV者為佳。In the electric wire for a high-frequency coil according to the present invention, the ferromagnetic layer includes an iron layer and a nickel layer provided on an outer periphery of the iron layer. The Vickers hardness of the iron layer is preferably 200 HV.

在有關本發明之高頻線圈用電線中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層,前述鐵層之厚度為0.2μm以上3.0μm以下者為佳。In the electric wire for a high-frequency coil according to the present invention, the ferromagnetic layer includes an iron layer and a nickel layer provided on an outer periphery of the iron layer. The thickness of the iron layer is preferably 0.2 μm or more and 3.0 μm or less.

(4) 有關本發明之電子零件係其特徵為有關上述本發明之高頻線圈用電線則經由焊接而加以連接者。作為電子零件係可舉出:高頻線圈等之捲線零件,具備高頻線圈等之捲線零件的電路基板等者。 發明效果(4) The electronic component according to the present invention is characterized in that the electric wire for a high-frequency coil according to the present invention is connected by soldering. Examples of the electronic component include a coiled component such as a high-frequency coil, and a circuit board including a coiled component such as a high-frequency coil. Invention effect

如根據本發明,可提供確保焊接接合之信賴性,且可謀求在高頻率之交流阻抗的降低之高頻線圈用電線。According to the present invention, it is possible to provide an electric wire for a high-frequency coil capable of ensuring the reliability of the solder joint and reducing the AC impedance at a high frequency.

對於有關本發明之高頻線圈用電線及電子零件的實施形態,參照圖面同時,加以說明。然而,本發明係包含與以下所說明之實施形態及記載於圖面之形態相同技術性思想的發明者,而本發明之技術性範圍係未僅限定於實施形態之記載或圖面的記載者。Embodiments of the high-frequency coil electric wire and electronic component according to the present invention will be described with reference to the drawings. However, the present invention includes the inventors having the same technical ideas as the embodiments described below and the forms described in the drawings, and the technical scope of the present invention is not limited to the descriptions of the embodiments or the drawings. .

有關本發明之高頻線圈用電線20係如圖1及圖2所示,至少由具有銅導體1與設置於其銅導體1之外周的強磁性層4的芯線10,和設置於其芯線10上的絕緣被覆層5而加以構成。並且,如圖3(A)(B)所示,其特徵為強磁性層4則具有徑方向X之間隙G者。強磁性層4係由鐵層2,和設置於鐵層2之外周之鎳層3所成者為佳。As shown in FIGS. 1 and 2, a high-frequency coil electric wire 20 according to the present invention includes at least a core wire 10 having a copper conductor 1 and a ferromagnetic layer 4 provided on the outer periphery of the copper conductor 1, and a core wire 10 provided thereon. It is constituted by an insulating coating layer 5 on the upper surface. As shown in FIGS. 3A and 3B, the ferromagnetic layer 4 is characterized by having a gap G in the radial direction X. The ferromagnetic layer 4 is preferably formed of an iron layer 2 and a nickel layer 3 provided on the outer periphery of the iron layer 2.

在此高頻線圈用電線20中,構成芯線10之強磁性層4則因具有徑方向X之間隙G之故,焊接時之焊錫則容易到達至銅導體1。其結果,經由銅與焊錫中的錫產生金屬間結合之時,浸潤應力則變高,而可得到堅固的焊錫接合。然而,間隙G係成為貫穿強磁性層4(例如鎳層3及鐵層2)之形態。未有間隙G之情況,係焊錫中的錫則成為與鎳結合者,但對於鎳層之厚度為極薄之情況,於焊錫中瞬間擴散鎳。其結果,實際上成為與鐵之接合之故,而浸潤應力變低,而可得到良好的接合強度。In the high-frequency coil electric wire 20, the ferromagnetic layer 4 constituting the core wire 10 has a gap G in the radial direction X, and the solder during soldering easily reaches the copper conductor 1. As a result, when intermetallic bonding occurs between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained. However, the gap G is a form penetrating the ferromagnetic layer 4 (for example, the nickel layer 3 and the iron layer 2). In the case where there is no gap G, the tin in the system solder becomes a bonder with nickel, but in the case where the thickness of the nickel layer is extremely thin, nickel is diffused in the solder instantaneously. As a result, it actually becomes a joint with iron, the wetting stress becomes low, and a good joint strength can be obtained.

以下,說明高頻線圈用電線的構成要素。Hereinafter, components of the high-frequency coil electric wire will be described.

<芯線>   芯線10係具有銅導體1,和設置於銅導體1之外周的強磁性層4。高頻線圈用電線20係至少由芯線10,和設置於芯線10上之絕緣被覆層5而加以構成。<Core Wire> The core wire 10 includes a copper conductor 1 and a ferromagnetic layer 4 provided on the outer periphery of the copper conductor 1. The high-frequency coil electric wire 20 is composed of at least a core wire 10 and an insulating coating 5 provided on the core wire 10.

(銅導體)   銅導體1係作為主要的構成金屬而包含銅或銅合金,而在本申請中,選自精銅,無氧銅,銅-錫合金,銅-銀合金,銅-鎳合金,銅包鋁,銅包鎂等。此等導體係因導電率60%IACS以上之低阻抗的良導電性之故,即使為細化導體徑之情況,因將銅作為主體之金屬則位於最外層之故而不易被氧化,而可提高焊接接合之信賴性者。然而,在銅-錫合金,銅-銀合金,銅-鎳合金,銅包鋁,銅包鎂等中,作為高頻線圈用電線20而呈成為理想之上述導電率(60%IACS以上)地,其銅合金之情況係調整其合金組成者為佳,而包層之情況,係調整芯材之材質或包層材與芯材的比者為佳。(Copper conductor) Copper conductor 1 contains copper or copper alloy as the main constituent metal, and in this application, it is selected from fine copper, oxygen-free copper, copper-tin alloy, copper-silver alloy, copper-nickel alloy, Copper-clad aluminum, copper-clad magnesium, etc. These conductive systems can improve the conductivity of 60% IACS with low impedance and good conductivity, even if the conductor diameter is thinned, because the metal with copper as the main body is located in the outermost layer, it is not easy to be oxidized, and can be improved. Reliable for welding joints. However, among copper-tin alloys, copper-silver alloys, copper-nickel alloys, copper-clad aluminum, copper-clad magnesium, etc., the electrical conductivity 20 (higher than 60% IACS) as the high-frequency coil electric wire 20 is desirable. In the case of copper alloy, it is better to adjust its alloy composition, while in the case of cladding, it is better to adjust the material of the core material or the ratio of the cladding material to the core material.

銅導體1之直徑係未特別加以限定,但在焊接溫度為高之環境的連接強度之信賴性則成為問題的細度者為佳,例如,0.02~0.40mm程度之範圍內。The diameter of the copper conductor 1 is not particularly limited, but it is preferable that the reliability of connection strength in an environment where the soldering temperature is high is a problematic fineness, for example, in the range of about 0.02 to 0.40 mm.

(強磁性層)   強磁性層4係設置於銅導體1上,而以所得到之芯線10,作為高頻線圈用電線20,使用於高頻線圈之情況,呈降低交流阻抗,而高頻率特性提升地產生作用。強磁性層4之構成材料係未特別加以限定,例如,可舉出:鐵,鈷,鎳,高導磁合金(Ni78-Fe22)、高導磁合金(Ni45-Fe55)、超導磁合金(Ni75-Cu5-Fe20)、Co-Ni-Fe(Co20-Ni40-Fe40)等者。強磁性層4之形成方法係未特別加以限定,但作為形成於銅導體1上之方法中,電鍍法為佳,但上述之各組成之構成係因均可由電鍍而成膜之故,可理想使用。在有關本發明之高頻線圈用電線20中,其特徵為於此強磁性層4,形成有後述之間隙G者。(Ferromagnetic layer) The ferromagnetic layer 4 is provided on the copper conductor 1, and the obtained core wire 10 is used as the high-frequency coil electric wire 20 in the case of using the high-frequency coil to reduce the AC impedance and high frequency characteristics. Lifting ground works. The constituent material of the ferromagnetic layer 4 is not particularly limited, and examples thereof include iron, cobalt, nickel, a high magnetic permeability alloy (Ni78-Fe22), a high magnetic permeability alloy (Ni45-Fe55), and a superconductive magnetic alloy ( Ni75-Cu5-Fe20), Co-Ni-Fe (Co20-Ni40-Fe40), and the like. The method for forming the ferromagnetic layer 4 is not particularly limited, but as a method for forming the ferromagnetic layer 4, a plating method is preferable. However, each of the above-mentioned constituents can be formed by electroplating, which is desirable. use. The high-frequency coil electric wire 20 according to the present invention is characterized in that a gap G described later is formed in the ferromagnetic layer 4.

在以下中,以例說明作為強磁性層4,由鐵層2與鎳層3所成之構成。以鐵層2與鎳層3以外的構成而加以構成之強磁性層4係經由其組成而高頻率特性雖有稍微不同,但關於間隙G之作用,厚度,焊接等係為同樣。In the following, the ferromagnetic layer 4 is composed of an iron layer 2 and a nickel layer 3 as an example. The ferromagnetic layer 4 composed of a structure other than the iron layer 2 and the nickel layer 3 has slightly different high-frequency characteristics through its composition, but the effects of the gap G, thickness, and welding are the same.

(鐵層)   鐵層2係設置於銅導體1上,而與鎳層3同時構成強磁性層4。此鐵層2之厚度係以0.2μm以上3.0μm以下之範圍內加以設置者為佳,而在使用於高頻線圈等之情況,降低交流阻抗,而高頻率特性則提升。特別是純鐵鍍敷係因為為強磁性之故而被理想採用。然而,如為在未阻礙降低交流阻抗等之效果的範圍,於鐵層2,含有其他元素(例如,鎳,鈷,磷,硼等)亦可。(Iron layer) The hafnium layer 2 is provided on the copper conductor 1 and forms the ferromagnetic layer 4 at the same time as the nickel layer 3. The thickness of the iron layer 2 is preferably set in a range of 0.2 μm to 3.0 μm. When used in a high-frequency coil, etc., the AC impedance is reduced, and the high-frequency characteristics are improved. In particular, pure iron plating is ideally used because it is ferromagnetic. However, as long as the effect of reducing the AC impedance and the like is not hindered, the iron layer 2 may contain other elements (for example, nickel, cobalt, phosphorus, boron, etc.).

鐵層2係可使高頻率特性提升之同時,亦有在焊接時防止焊錫熔蝕之效果。但在形成於銅導體1上之鐵層2,防止焊錫熔蝕之情況係意味不易形成焊錫中的錫與鐵之金屬間化合物者。不易做到如此之金屬間化合物之形成係阻礙銅與焊錫中的錫之化合者,而有浸潤應力(即,接合強度)低,對於連接信賴性差,無法對應於在短時間之焊接性的要求之情況。The iron layer 2 can improve the high frequency characteristics, and also has the effect of preventing solder erosion during welding. However, in the case where the iron layer 2 is formed on the copper conductor 1 to prevent solder erosion, it means that it is not easy to form an intermetallic compound of tin and iron in the solder. It is not easy to achieve the formation of such intermetallic compounds, which hinders the combination of copper and tin in solder, but has low wetting stress (that is, joint strength), poor connection reliability, and cannot correspond to short-term solderability requirements. Situation.

在本發明中,其特徵為由鐵層2及鎳層3所成之強磁性層4則具有徑方向X之間隙G者。經由具有如此之間隙G之時,焊接時之焊錫中的錫則容易到達至銅導體1。其結果,經由銅與焊錫中的錫產生金屬間結合之時,浸潤應力則變高,而可得到堅固的焊錫接合。間隙G係成為自鎳層3貫穿於鐵層2之一體的形態。This invention is characterized in that the ferromagnetic layer 4 formed of the iron layer 2 and the nickel layer 3 has a gap G in the radial direction X. When there is such a gap G, the tin in the solder during soldering can easily reach the copper conductor 1. As a result, when intermetallic bonding occurs between copper and tin in the solder, the wetting stress becomes high, and a strong solder joint can be obtained. The gap G is a form that penetrates from the nickel layer 3 to one of the iron layers 2.

間隙G的數係於芯線10之表面可看到的數,於以與芯線10之直徑D相同長度的軸方向假想線Y1與徑方向假想線X1而形成之正方形(Y1×X1)之中可看到的數。其間隙G的數係為2以上、30以下之範圍內者為佳。經由作為如此之範圍內之時,焊接時的焊錫則容易到達至銅導體,其結果,經由銅與焊錫中的錫產生金屬間結合之時,得到良好之浸潤應力,而得到堅固的焊錫接合。間隙G的數則不足2之情況,焊錫中的錫與鐵之接合則成為主要之故,浸潤應力為低,而有不易得到良好之接合強度者。另一方面,當間隙G的數超過30時,焊錫中的錫與銅則瞬間接合,焊錫熔蝕則進行,導體剖面積則容易減少之故,而有接合強度下降之情況。間隙G之寬度係0.3μm以上5μm以下之範圍內為佳,而0.5μm以上,2.0μm以下之範圍內則更佳。經由此間隙G,焊接時的焊錫則容易到達至銅導體,其結果,經由銅與焊錫中的錫產生金屬間結合之時,得到良好之浸潤應力,而得到堅固的焊錫接合。然而,當間隙G的寬度超過5μm時,而有容易成為針孔者。The number of the gap G is the number that can be seen on the surface of the core wire 10, and may be in a square (Y1 × X1) formed by the imaginary line Y1 in the axial direction and the imaginary line X1 in the radial direction with the same length as the diameter D of the core wire 10. See the number. The number of gaps G is preferably within a range of 2 or more and 30 or less. When it is within such a range, the solder during soldering easily reaches the copper conductor. As a result, when intermetallic bonding occurs between copper and tin in the solder, a good wetting stress is obtained and a strong solder joint is obtained. When the number of the gaps G is less than two, the bonding between tin and iron in the solder is the main reason, the wetting stress is low, and it is difficult to obtain good bonding strength. On the other hand, when the number of gaps G exceeds 30, tin and copper in the solder are instantaneously bonded, solder erosion proceeds, and the cross-sectional area of the conductor is likely to be reduced, and the bonding strength may be reduced. The width of the gap G is preferably within a range from 0.3 μm to 5 μm, and more preferably from 0.5 μm to 2.0 μm. Through this gap G, the solder during soldering easily reaches the copper conductor. As a result, when intermetallic bonding occurs between copper and tin in the solder, a good wetting stress is obtained and a strong solder joint is obtained. However, when the width of the gap G exceeds 5 μm, there is a possibility of becoming a pinhole.

間隙G係如後述之實施例所示,可控制銅導體1之機械性特性(拉伸強度,延伸)或滑輪的尺寸與角度而形成者。另外,作為加上添加劑於鐵鍍敷液,以及控制鍍敷條件,經由將鐵層2之硬度,以維氏硬度而增加為200HV以上之時,可形成間隙G者。The gap G is formed by controlling the mechanical characteristics (tensile strength, elongation) of the copper conductor 1 or the size and angle of the pulley as shown in the examples described later. In addition, when an additive is added to the iron plating solution and the plating conditions are controlled, when the hardness of the iron layer 2 is increased to 200 HV or more by Vickers hardness, a gap G can be formed.

作為添加劑係例如,可舉出:硫脲,糖精,苯并噻唑,JGB(健那綠B)、亞苄基丙酮,明膠,聚乙二醇,丁炔二醇,香豆素等,經由添加數10ppm此等之時,分子或離子則可以單獨吸附於析出位置而析出。另外,以此等添加劑而使鐵錯合物形成,其錯合物則可吸附於析出位置而析出。經由添加劑的效果而可得到微細,硬的結晶粒,可形成維氏硬度250HV程度之鐵層2者。經由將如此之鐵層2之厚度,作為0.5μm以上、理想為1μm以上之時,電著應力則增加,於鐵層2存在有間隙G。Examples of the additive system include thiourea, saccharin, benzothiazole, JGB (Gena Green B), benzylideneacetone, gelatin, polyethylene glycol, butynediol, and coumarin. In the case of several 10 ppm, molecules or ions can be adsorbed and deposited alone at the precipitation position. In addition, iron complexes are formed by these additives, and the complexes can be adsorbed and precipitated at the precipitation position. Through the effect of the additive, fine and hard crystal grains can be obtained, and an iron layer 2 having a Vickers hardness of about 250 HV can be formed. When the thickness of the iron layer 2 is set to 0.5 μm or more, and preferably 1 μm or more, the electrical stress increases, and a gap G exists in the iron layer 2.

作為鍍敷條件係例如,經由將鍍敷液的溫度,從30℃降低至20℃,以及將pH,從3降低至2之時,可得到微細,硬的結晶粒,可形成維氏硬度300HV程度之鐵層2者。經由將如此之鐵層2之厚度,作為0.5μm以上、理想為1μm以上之時,電著應力則增加,於鐵層2存在有間隙G。As the plating conditions, for example, when the temperature of the plating solution is lowered from 30 ° C to 20 ° C and the pH is lowered from 3 to 2, fine and hard crystal grains can be obtained, and a Vickers hardness of 300 HV can be formed. Level of iron 2 people. When the thickness of the iron layer 2 is set to 0.5 μm or more, and preferably 1 μm or more, the electrical stress increases, and a gap G exists in the iron layer 2.

鐵層2係以電鍍而加以成膜者為佳,可在鐵電解液中供電至銅導體1而形成者。作為鍍敷液係通常,如為至少具有鐵的無機鹽,和支援電解質之鍍敷液,未特別加以限定,但例如可適用硫酸鐵鍍敷液或氯化鐵鍍敷液等者。對於鍍敷液係在未阻礙本發明之效果的範圍內,因應必要,含有界面活性劑,光澤劑等之各種添加劑亦可。The iron layer 2 is preferably formed by electroplating, and can be formed by supplying electricity to the copper conductor 1 in an iron electrolyte. The plating solution is generally not particularly limited as long as it is an inorganic salt having at least iron and a supporting electrolyte. For example, a ferric sulfate plating solution or a ferric chloride plating solution can be applied. The plating solution may contain various additives such as a surfactant, a glossing agent, and the like, as long as the effects of the present invention are not hindered.

(鎳層)   鎳層3係設置於鐵層2上,而與鐵層2同時構成強磁性層4。此鎳層3之厚度係以0.01μm以上1.0μm以下之範圍內加以設置者為佳,而時焊接性提升之同時,在與鐵層2同時使用於高頻線圈等之情況,可降低交流阻抗,使高頻率特性提升者。當鎳層3過厚時,強磁性體的鐵之效果則漸弱,未至經由近接效應之高頻率損失的抑制。另一方面,當鎳層3過薄時,在焊接溫度為高的環境中,鎳層3與焊錫中的錫則瞬間產生反應而擴散,實際上係成為基底的鐵層2與焊錫材料的接合之故,浸潤應力為低,不易得到良好的接合強度。(Nickel layer) The samarium-nickel layer 3 is provided on the iron layer 2 and forms the ferromagnetic layer 4 simultaneously with the iron layer 2. The thickness of this nickel layer 3 is preferably set within the range of 0.01 μm to 1.0 μm. When the weldability is improved, the high-frequency coil and the iron layer 2 are used at the same time, which can reduce the AC impedance. To improve the high frequency characteristics. When the nickel layer 3 is too thick, the effect of iron of the ferromagnetic body becomes weaker, and the high frequency loss through the proximity effect is not suppressed. On the other hand, when the nickel layer 3 is too thin, in an environment where the soldering temperature is high, the nickel layer 3 and the tin in the solder react and diffuse instantly. In fact, it is the bonding between the iron layer 2 that becomes the base and the solder material. Therefore, the wetting stress is low and it is difficult to obtain good bonding strength.

鎳層3係與鐵層2同時構成強磁性層4,此強磁性層4係如上述,具有徑方向X之間隙G。然而,對於間隙G係因既已說明過之故,在此係省略其說明。The nickel layer 3 and the iron layer 2 constitute the ferromagnetic layer 4 at the same time. The ferromagnetic layer 4 has the gap G in the radial direction X as described above. However, since the gap G has already been described, its explanation is omitted here.

鎳層3係以電鍍而加以成膜者為佳,可在鎳電解液中,供電至設置有鐵層2之銅導體1而形成者。作為鍍敷液係通常,如為至少具有鎳的無機鹽,和支援電解質之鍍敷液,未特別加以限定,但例如可適用硫酸鎳鍍敷液或氯化鎳鍍敷液等者。對於鍍敷液係在未阻礙本發明之效果的範圍內,因應必要,含有界面活性劑,光澤劑等之各種添加劑亦可。The nickel layer 3 is preferably formed by electroplating, and can be formed by supplying electricity to a copper conductor 1 provided with an iron layer 2 in a nickel electrolyte. The plating solution is generally not particularly limited as long as it is an inorganic salt having at least nickel and a supporting electrolyte. For example, a nickel sulfate plating solution or a nickel chloride plating solution can be applied. The plating solution may contain various additives such as a surfactant, a glossing agent, and the like, as long as the effects of the present invention are not hindered.

<絕緣被覆層>   絕緣被覆層5係如圖2所示,加以設置於強磁性層4上。經由設置絕緣被覆層5之時,可將高頻線圈用電線20,可作為各種高頻線圈,高頻線圈用的電線(經由絕緣被覆而一體化絞線,所集合之裸線的外周之絕緣電線等)而有用地利用。作為絕緣被覆層5係於形成強磁性層4之後的芯線10之外周,塗佈燒付而形成焊接可能之絕緣瓷漆被膜,或焊接可能之絕緣瓷漆被膜與熔著瓷漆被膜。焊接可能之絕緣瓷漆被膜係例如,可塗佈燒付而形成泛用聚氨酯,變性聚氨酯,聚亞醯胺酯等之焊接可能之瓷漆塗料。另外,更且形成於其外周之熔著瓷漆被膜係例如,可塗佈燒付而形成尼龍或環氧等之熔著瓷漆塗料。此等之被膜係可使用通常的瓷漆線之製造裝置而製造。然而,對於設置無法焊接之絕緣被覆層5(聚醯胺醯亞胺,聚醯亞胺,聚酯等)之情況,係由機械性及/或化學性地剝離絕緣被覆層5者,可良好地進行焊接。<Insulation Coating Layer> As shown in FIG. 2, the insulation coating layer 5 is provided on the ferromagnetic layer 4. When the insulating coating layer 5 is provided, the high-frequency coil electric wire 20 can be used as various high-frequency coils, and high-frequency coil electric wires (integrated stranded wires are insulated through the insulation coating, and the outer periphery of the collected bare wires is insulated. Electric wires, etc.). The insulating coating layer 5 is formed on the outer periphery of the core wire 10 after the ferromagnetic layer 4 is formed, and is coated and fired to form a solderable insulating enamel film, or a solderable insulating enamel film and a fused enamel film. Welding possible insulating enamel coatings are, for example, enamel coatings that can be coated and fired to form universal polyurethanes, denatured polyurethanes, and polyurethanes. In addition, for example, a fused enamel coating film system formed on the outer periphery thereof can be applied to form a fused enamel coating such as nylon or epoxy. These coating systems can be manufactured using a common enamel line manufacturing apparatus. However, in the case where an insulating coating layer 5 (polyimide, polyimide, polyester, etc.) is provided which cannot be welded, it is good to peel off the insulating coating layer 5 mechanically and / or chemically. Ground welding.

設置有絕緣被覆層5之有關本發明之高頻線圈用電線20係即使在高頻線圈用以外,亦可使用於李茲線的構成線材,或三層絕緣電線的構成線材等者。另外,此等之其他,作為使用設置絕緣被覆層5之前的芯線10,或者於其芯線10的表面具備咪唑錯合物等之保護膜之構成,絞合此等而作為絞線或作為使其集合之集合線,以壓出,捲帶,燒付等而一體化其絞線或集合線的外周之高頻用的絕緣電線等亦可。The high-frequency coil electric wire 20 according to the present invention provided with the insulating coating layer 5 can be used as a constituent wire of a litz wire, a constituent wire of a three-layer insulated wire, or the like even for a high-frequency coil. In addition, these others are used as the core wire 10 before the insulating coating layer 5 is provided, or the surface of the core wire 10 is provided with a protective film such as an imidazole complex, and these are twisted as a twisted wire or as a The assembled wire may be a high-frequency insulated wire integrated with the outer periphery of the stranded wire or the assembled wire by pressing, winding, burning, etc.

<電子零件>   有關本發明之電子零件係使用有關上述之本發明之高頻線圈用電線20而加以構成。作為電子零件係可舉出:高頻線圈等之捲線零件,具備高頻線圈等之捲線零件的電路基板等者。 實施例<Electronic component> (1) The electronic component according to the present invention is configured using the high-frequency coil electric wire 20 of the present invention described above. Examples of the electronic component include a coiled component such as a high-frequency coil, and a circuit board including a coiled component such as a high-frequency coil. Examples

於以下,舉出實施例,更具體地說明本發明。然而,本發明係未加以限定於以下之實施例者。Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples.

[實施例1]   將直徑0.1mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火的直徑0.1mm之退火材(ACW、拉伸強度:240MPa、延伸:27%)作為銅導體1而使用,進行表面脫脂,酸活化處理之後,以電鍍法而形成厚度1μm之鐵層2,接著,以電鍍法而形成厚度0.03μm之鎳層3,得到具備強磁性層4(鐵層2與鎳層3)之芯線10。鐵鍍敷係使用硫酸鐵鍍敷液(硫酸亞鐵250g/L、氯化鐵50g/L、氯化銨30g/L),而鎳鍍敷係使用硫酸鎳鍍敷液(硫酸鎳250g/L、氯化鎳30g/L、硼酸15g/L)。使所得到之芯線10,以120°角度接觸於直徑之350倍的滑輪同時,進行卷繞,於強磁性層4之徑方向X,設置間隙G。如此得到具備間隙G之芯線10。[Example 1] (1) A 0.1 mm diameter annealed material (ACW, tensile strength: 240 MPa, elongation: 27%) was annealed with a 0.1 mm diameter hard copper wire (HCW) annealed in an inert gas environment at 360 ° C. Conductor 1 is used. After surface degreasing and acid activation treatment, an iron layer 2 having a thickness of 1 μm is formed by an electroplating method, and then a nickel layer 3 having a thickness of 0.03 μm is formed by an electroplating method to obtain a ferromagnetic layer 4 (iron layer). 2 and the core layer 10 of the nickel layer 3). Iron plating uses a ferric sulfate plating solution (ferrous sulfate 250g / L, ferric chloride 50g / L, ammonium chloride 30g / L), and nickel plating uses a nickel sulfate plating solution (nickel sulfate 250g / L , Nickel chloride 30g / L, boric acid 15g / L). The obtained core wire 10 was brought into contact with a pulley having a diameter of 350 times at an angle of 120 ° while being wound, and a gap G was set in the radial direction X of the ferromagnetic layer 4. In this way, a core wire 10 having a gap G is obtained.

[實施例2]   將鐵層2之厚度做成2μm。除此之外係與實施例1相同作為,得到芯線10。[Example 2] The thickness of the iron layer 2 was 2 μm. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例3]   將鐵層2之厚度做成3μm。除此之外係與實施例1相同作為,得到芯線10。[Example 3] The thickness of the iron layer 2 was 3 μm. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例4]   作為銅導體1,使用將直徑0.1mm之硬銅銀合金線(HCAW),以650℃之非活性氣體環境進行退火之直徑0.1mm之退火材(ACAW、拉伸強度:330MPa、延伸:24%)。除此之外係與實施例1相同作為,得到芯線10。[Example 4] As the copper conductor 1, an annealed material (ACAW, tensile strength: 330MPa) with a diameter of 0.1mm, which was annealed a hard copper-silver alloy wire (HCAW) with a diameter of 0.1mm, in an inert gas environment at 650 ° C, was used. , Extension: 24%). Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例5]   作為銅導體1,使用將直徑0.1mm之硬銅錫合金線(HCSW),以600℃之非活性氣體環境進行退火之直徑0.1mm之退火材(ACSW、拉伸強度:300MPa、延伸:25%)。除此之外係與實施例1相同作為,得到芯線10。[Example 5] As the copper conductor 1, an annealed material (ACSW, tensile strength: 300 MPa) with a diameter of 0.1 mm was used to anneal a hard copper-tin alloy wire (HCSW) with a diameter of 0.1 mm in an inert gas environment at 600 ° C. , Extension: 25%). Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例6]   使用直徑之300倍的滑輪。除此之外係與實施例1相同作為,得到芯線10。[Example 6] (2) A pulley having a diameter of 300 times was used. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例7]   使用直徑之200倍的滑輪。除此之外係與實施例1相同作為,得到芯線10。[Example 7] (2) A pulley having a diameter of 200 times was used. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例8]   使用直徑之100倍的滑輪。除此之外係與實施例1相同作為,得到芯線10。[Embodiment 8] (1) A pulley having a diameter of 100 times was used. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例9]   以300℃之非活性氣體環境進行退火。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:280MPa、延伸:15%。[Example 9] Annealed in an inert gas environment at 300 ° C. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10. Annealed material (ACW) based tensile strength: 280 MPa, elongation: 15%.

[實施例10]   以280℃之非活性氣體環境進行退火。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:300MPa、延伸:5%。[Example 10] Annealed in an inert gas environment at 280 ° C. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10. Annealed material (ACW) based tensile strength: 300 MPa, elongation: 5%.

[實施例11]   以90°之角度使其接觸於滑輪同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。[Embodiment 11] 使其 It was wound while being brought into contact with a pulley at an angle of 90 °. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例12]   使用直徑之100倍的滑輪,且以90°之角度使其接觸於滑輪同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。[Example 12] (1) A pulley having a diameter 100 times as large as that of the pulley was wound while being brought into contact with the pulley at an angle of 90 °. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例13]   將直徑0.05mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火之直徑0.05mm之退火材(ACW、拉伸強度:280MPa、延伸:18%)作為銅導體1。除此之外係與實施例1相同作為,得到芯線10。[Example 13] 0.05 Annealed material (ACW, tensile strength: 280 MPa, elongation: 18%) of 0.05 mm diameter annealed material (ACW, tensile strength: 280 MPa, elongation: 18%) was used as copper for a hard copper wire (HCW) having a diameter of 0.05 mm and annealed in an inert gas environment at 360 ° C. Conductor 1. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例14]   將直徑0.08mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火之直徑0.08mm之退火材(ACW、拉伸強度:260MPa、延伸:22%)作為銅導體1。除此之外係與實施例1相同作為,得到芯線10。[Example 14] 0.0 Annealed material (ACW, tensile strength: 260 MPa, elongation: 22%) with a diameter of 0.08 mm and a hard copper wire (HCW) having a diameter of 0.08 mm and annealed in an inert gas environment at 360 ° C was used as copper. Conductor 1. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[實施例15]   將直徑0.12mm之硬銅線(HCW),以360℃之非活性氣體環境進行退火之直徑0.12mm之退火材(ACW、拉伸強度:240MPa、延伸:28%)作為銅導體1。除此之外係與實施例1相同作為,得到芯線10。[Example 15] (1) A 0.12 mm diameter annealed material (ACW, tensile strength: 240 MPa, elongation: 28%) was annealed with a hard copper wire (HCW) having a diameter of 0.12 mm and annealed in an inert gas environment at 360 ° C. Conductor 1. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[比較例1]   未以非活性氣體環境進行退火。除此之外係與實施例1相同作為,得到芯線10。未進行退火之硬銅線(HCW)係拉伸強度:400MPa、延伸:2%。[Comparative Example 1] Rhenium was not annealed in an inert gas atmosphere. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10. Hard copper wire (HCW) without annealing is tensile strength: 400 MPa, elongation: 2%.

[比較例2]   將鐵層2之厚度做成2μm。除此之外係與比較例1相同作為,得到芯線10。[Comparative Example 2] (2) The thickness of the iron layer 2 was 2 μm. Except for this, the same procedure as in Comparative Example 1 was performed to obtain a core wire 10.

[比較例3]   將鐵層2之厚度做成3μm。除此之外係與比較例1相同作為,得到芯線10。[Comparative Example 3] The thickness of the iron layer 2 was made 3 μm. Except for this, the same procedure as in Comparative Example 1 was performed to obtain a core wire 10.

[比較例4]   以280℃之非活性氣體環境進行退火,且使用直徑之400倍的滑輪。除此之外係與實施例1相同作為,得到高頻線圈用電線。退火材(ACW)係拉伸強度:300MPa、延伸:5%。[Comparative Example 4] 退火 Annealing was performed in an inert gas environment at 280 ° C, and a pulley having a diameter of 400 times was used. Except for this, the same operation as in Example 1 was performed to obtain a high-frequency coil electric wire. Annealed material (ACW) based tensile strength: 300 MPa, elongation: 5%.

[比較例5]   以280℃之非活性氣體環境進行退火,且於直徑之400倍的滑輪,以90°之角度使其接觸之同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:300MPa、延伸:5%。[Comparative Example 5] 退火 Annealed in an inert gas environment at 280 ° C, and wound on a pulley having a diameter 400 times that of the pulley at an angle of 90 °. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10. Annealed material (ACW) based tensile strength: 300 MPa, elongation: 5%.

[比較例6]   作為銅導體1,使用將直徑0.1mm之硬銅錫合金線(HCSW),以600℃之非活性氣體環境進行退火之直徑0.1mm之退火材(ACSW、拉伸強度:300MPa、延伸:25%)。更且,於直徑之400倍的滑輪,以120°之角度使其接觸之同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。[Comparative Example 6] As the copper conductor 1, an annealed material (ACSW, tensile strength: 300 MPa) with a diameter of 0.1 mm, which was annealed a hard copper-tin alloy wire (HCSW) with a diameter of 0.1 mm, in an inert gas atmosphere at 600 ° C, was used. , Extension: 25%). Furthermore, a pulley having a diameter of 400 times was wound while being brought into contact with it at an angle of 120 °. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10.

[比較例7]   以300℃之非活性氣體環境進行退火,且於直徑之350倍的滑輪,以160°之角度使其接觸之同時,進行卷繞。除此之外係與實施例1相同作為,得到芯線10。退火材(ACW)係拉伸強度:240MPa、延伸:15%。[Comparative Example 7] 退火 Annealed in an inert gas environment at 300 ° C, and wound on a pulley having a diameter 350 times that of the pulley at an angle of 160 °. Except for this, the same operation as in Example 1 was performed to obtain a core wire 10. Annealed material (ACW) based tensile strength: 240 MPa, elongation: 15%.

[測定與結果] (間隙與焊接特性)   於表1顯示在實施例與比較例所得到之芯線10之要素。各芯線10之間隙G係以顯微鏡(股份有限公司keyence製、VX600型、500倍)而進行測定。測定係測定可於以軸方向假想線Y1與徑方向假想線X1而形成之正方形(0.1mm角)之中看到之間隙G的數之同時,測定其間隙G之平均寬度。間隙G的數之測定係計數徑方向假想線X1(=芯線的直徑)之1/4之長度以上者。可以連續或非連續而分支有間隙G之構成之情況係看作關連之同一(1個)之間隙G。將其結果示於表2。[Measurement and Results] (Gap and Welding Characteristics) Table 1 shows the elements of the core wire 10 obtained in Examples and Comparative Examples. The gap G of each core wire 10 is measured with a microscope (manufactured by Keyence Corporation, VX600 type, 500 times). The measurement system measures the number of gaps G that can be seen in a square (0.1 mm angle) formed by an imaginary line Y1 in the axial direction and an imaginary line X1 in the radial direction, and measures the average width of the gap G. The number of gaps G is measured by counting the length of the imaginary line X1 (= the diameter of the core wire) in the radial direction by a length of 1/4 or more. The case where the branches can be continuous or discontinuous and have a gap G is considered to be related to the same (one) gap G. The results are shown in Table 2.

將焊接時之浸潤應力(mN)與零交叉時間(秒),以活動性浸潤性試驗機(股份有限公司RHESCA製,WET-6100型)而進行測定。焊錫係使用Sn-3Ag-0.5Cu(日本千住金屬工業股份有限公司製),以380℃之溫度進行試驗。將其結果示於表2。The wetting stress (mN) and the zero-crossing time (seconds) during welding were measured with a mobile wetting tester (manufactured by RHESCA, WET-6100). The solder was tested at a temperature of 380 ° C using Sn-3Ag-0.5Cu (manufactured by Senju Metal Industry Co., Ltd.). The results are shown in Table 2.

自表1及表2的結果,對於浸潤應力為3.4mN以上,零交叉時間為0.4秒以下之情況,間隙G的數為6以上,間隙G的數與寬度的積為6以上之情況。作為特別理想之構成,浸潤應力為3.7mN以上,零交叉時間為0.2秒以下之情況,間隙G的數為12以上,間隙G的數與寬度的積為12以上之情況。如此之結果係主要可實現於間隙G的數與寬度的積為12以上之情況。如此之間隙G係可以表1所示之製造條件而形成者。From the results of Tables 1 and 2, for a case where the wetting stress is 3.4 mN or more and the zero crossing time is 0.4 seconds or less, the number of gaps G is 6 or more, and the product of the number of gaps G and the width is 6 or more. As a particularly desirable configuration, when the wetting stress is 3.7 mN or more and the zero-crossing time is 0.2 seconds or less, the number of gaps G is 12 or more, and the product of the number of gaps G and the width is 12 or more. Such a result is mainly achieved when the product of the number of gaps G and the width is 12 or more. Such a gap G is formed by the manufacturing conditions shown in Table 1.

對於銅導體1之直徑不同之實施例13~15的芯線10,進行與實施例1同樣的測定(浸潤應力,零交叉時間,間隙的數)。在實施例13(導體徑:0.05mm)中,浸潤應力:1.8mN、零交叉時間:0.2秒、間隙G的數:25、間隙G的寬度:1.5mm、數與寬度的積:37.5。在實施例14(導體徑:0.08mm)中,浸潤應力:2.9mN、零交叉時間:0.2秒、間隙G的數:19、間隙G的寬度:1.0mm、數與寬度的積:19。在實施例15(導體徑:0.12mm)中,浸潤應力:4.3mN、零交叉時間:0.2秒、間隙G的數:12、間隙G的寬度:1.0mm、數與寬度的積:12。由此等之結果,對於浸潤應力(mN),在以每單位表面積進行分割比較的結果,實施例1(導體徑:0.10mm)、實施例13(導體徑:0.05mm)、實施例14(導體徑:0.08mm)、實施例15(導體徑:0.12mm)係均在5.7mN/mm2 附近。The core wires 10 of Examples 13 to 15 having different diameters of the copper conductor 1 were measured in the same manner as in Example 1 (wetting stress, zero crossing time, and number of gaps). In Example 13 (conductor diameter: 0.05 mm), wetting stress: 1.8 mN, zero crossing time: 0.2 seconds, number of gaps G: 25, width of gap G: 1.5 mm, and product of number and width: 37.5. In Example 14 (conductor diameter: 0.08 mm), wetting stress: 2.9 mN, zero crossing time: 0.2 seconds, number of gaps G: 19, width of gap G: 1.0 mm, and product of number and width: 19. In Example 15 (conductor diameter: 0.12 mm), wetting stress: 4.3 mN, zero crossing time: 0.2 seconds, number of gaps G: 12, width of gap G: 1.0 mm, and product of number and width: 12. As a result, the infiltration stress (mN) was divided and compared per unit surface area. Examples 1 (conductor diameter: 0.10 mm), Example 13 (conductor diameter: 0.05 mm), and Example 14 ( Conductor diameter: 0.08 mm) and Example 15 (conductor diameter: 0.12 mm) are all around 5.7 mN / mm 2 .

(高頻率特性)   將高頻率特性,以LCR測量儀(精密LCR測量儀、4284A、20Hz~1MHz、Agilent公司製)而進行測定。測定係試料長:1.50m、專用線軸:內徑φ67mm、旋轉數:5轉,終端係兩端附上焊錫,與織體連接進行測定。使用將2種胺甲酸乙酯作為絕緣被覆層5而設置之下記的試料1~3(高頻線圈用電線20),使頻率變化至1kHz~1MHz為止進行測定。(High-frequency characteristics) 高 The high-frequency characteristics were measured with an LCR meter (precision LCR meter, 4284A, 20Hz to 1MHz, manufactured by Agilent Corporation). Measurement system sample length: 1.50m, dedicated bobbin: inner diameter φ67mm, rotation number: 5 turns, solder is attached to both ends of the terminal system, and connected to the fabric for measurement. The measurements were performed using samples 1 to 3 (high-frequency coil electric wires 20) described below in which two types of urethane were used as the insulating coating layer 5 and the frequency was changed to 1 kHz to 1 MHz.

試料1:2種胺甲酸乙酯被覆瓷漆銅鍍敷絞線(21條/φ0.10mm)試料2:2種胺甲酸乙酯被覆瓷漆鐵鍍敷絞線(21條/φ0.10mm),間隙G:無,鐵鍍敷液(與實施例相同之鐵鍍敷液,未有添加劑),鎳鍍敷液(與實施例1相同之鎳鍍敷液),Fe層之厚度:0.8μm、Ni層之厚度:0.05μm試料3:2種胺甲酸乙酯被覆瓷漆鐵鍍敷絞線(21條/φ0.10mm),間隙G:有,鐵鍍敷液(與實施例1相同之鐵鍍敷液,添加劑:糖精2m/L),鎳鍍敷液(與實施例1相同之鎳鍍敷液),Fe層之厚度:0.8μm、Ni層之厚度:0.05μm。Sample 1: Two kinds of urethane-coated enamel-coated copper-plated stranded wires (21 pieces / φ0.10mm) Sample 2: Two kinds of urethane-coated enamel-coated iron-plated stranded wires (21 pieces / φ0.10mm), gap G: None, iron plating solution (same iron plating solution as in Example, without additives), nickel plating solution (same nickel plating solution as in Example 1), thickness of Fe layer: 0.8 μm, Ni Layer thickness: 0.05 μm Sample 3: Two types of urethane-coated enamel iron plating stranded wires (21 pieces / φ0.10mm), gap G: Yes, iron plating solution (same iron plating as in Example 1) Liquid, additive: saccharin 2m / L), nickel plating solution (the same nickel plating solution as in Example 1), the thickness of the Fe layer: 0.8 μm, and the thickness of the Ni layer: 0.05 μm.

圖3(A)係試料3之胺甲酸乙酯被覆瓷漆磁性鍍敷絞線的表面照片。圖3(B)係試料2之2種胺甲酸乙酯被覆瓷漆磁性鍍敷絞線的表面照片。圖3(C)係試料1之2種胺甲酸乙酯被覆瓷漆銅絞線的表面照片。FIG. 3 (A) is a surface photograph of a urethane-coated enamel magnetic plating strand of sample 3. FIG. Figure 3 (B) is a photograph of the surface of two urethane-coated enamel magnetic plating strands of sample 2. FIG. 3 (C) is a photograph of the surface of two kinds of urethane-coated enamel-coated copper strands of sample 1. FIG.

表3係阻抗結果,表4係阻抗損失之結果。自表3及表4了解到,對於設置有強磁性層4之情況,無關於間隙G之有無,而顯是相同之高頻率特性,而確認到間隙G之存在則未有使高頻率特性降低之情況。Table 3 is the result of impedance, and Table 4 is the result of impedance loss. It is understood from Tables 3 and 4 that for the case where the ferromagnetic layer 4 is provided, there is no relation to the presence or absence of the gap G, but the same high-frequency characteristics are apparent, and the existence of the gap G does not reduce the high-frequency characteristics. Situation.

1‧‧‧銅導體1‧‧‧copper conductor

2‧‧‧鐵層2‧‧‧ iron layer

3‧‧‧鎳層3‧‧‧ nickel layer

4‧‧‧強磁性層4‧‧‧ ferromagnetic layer

5‧‧‧絕緣被覆層5‧‧‧ insulation coating

10‧‧‧芯線10‧‧‧ core wire

20‧‧‧高頻線圈用電線20‧‧‧Wire for high frequency coil

11‧‧‧正方形11‧‧‧ square

12‧‧‧圓12‧‧‧circle

G‧‧‧間隙G‧‧‧ Clearance

W‧‧‧間隙的寬度W‧‧‧Width of the gap

X‧‧‧徑方向X‧‧‧ diameter direction

X1‧‧‧徑方向假想線X1‧‧‧ imaginary line in radial direction

Y‧‧‧軸方向Y‧‧‧ axis direction

Y1‧‧‧軸方向假想線Y1‧‧‧axis imaginary line

圖1係顯示構成有關本發明之高頻線圈用電線之芯線的一例之剖面圖。   圖2係顯示有關本發明之高頻線圈用電線之一例之剖面圖。   圖3係在實施例所得到之芯線的強磁性層表面之電子顯微鏡照片。(A)係具有間隙之情況。(B)係間隙少之情況。(C)係幾乎未有間隙之情況。Fig. 1 is a cross-sectional view showing an example of a core wire constituting a high-frequency coil electric wire according to the present invention. Fig. 2 is a sectional view showing an example of a high-frequency coil electric wire according to the present invention. Fig. 3 is an electron microscope photograph of the surface of the ferromagnetic layer of the core wire obtained in the example. (A) is a case where there is a gap. (B) When there are few gaps. (C) is a case where there is almost no gap.

Claims (12)

一種高頻線圈用電線,係至少由具有銅導體與設置於該銅導體之外周的強磁性層的芯線,和設置於該芯線上的絕緣被覆層而加以構成之高頻線圈用電線,其特徵為前述強磁性層係具有徑方向的間隙者。A high-frequency coil electric wire is a high-frequency coil electric wire composed of a core wire having at least a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating coating provided on the core wire. The ferromagnetic layer has a gap in the radial direction. 如申請專利範圍第1項記載之高頻線圈用電線,其中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層。The high-frequency coil electric wire according to item 1 of the patent application scope, wherein the ferromagnetic layer includes an iron layer and a nickel layer provided on the outer periphery of the iron layer. 如申請專利範圍第1項或第2項記載之高頻線圈用電線,其中,前述間隙的數係為於前述芯線的表面可看到的數,可於由和前述芯線的直徑D相同長度之軸方向假想線與徑方向假想線所形成之正方形之中看到的數則為2以上、30以下之範圍內者。For example, the electric wire for high-frequency coils described in item 1 or 2 of the scope of the patent application, wherein the number of the gap is a number that can be seen on the surface of the core wire, and can be equal to the length of the same diameter as the diameter D of the core wire. The number seen in the square formed by the axial imaginary line and the radial imaginary line is in the range of 2 or more and 30 or less. 如申請專利範圍第1項至第3項任一項記載之高頻線圈用電線,其中,前述間隙係寬度為0.5μm以上、5μm以下之範圍內。The electric wire for a high-frequency coil according to any one of claims 1 to 3, wherein the gap is in a range of 0.5 μm or more and 5 μm or less. 如申請專利範圍第1項至第4項任一項記載之高頻線圈用電線,其中,前述銅導體則選自精銅,無氧銅,銅-錫合金,銅-銀合金,銅-鎳合金,銅包鋁,銅包鎂者。The high-frequency coil electric wire according to any one of claims 1 to 4, wherein the aforementioned copper conductor is selected from fine copper, oxygen-free copper, copper-tin alloy, copper-silver alloy, and copper-nickel Alloy, copper-clad aluminum, copper-clad magnesium. 一種電子零件,其特徵為使用如申請專利範圍第1項至第5項任一項記載之高頻線圈用電線而加以構成。An electronic component characterized in that it is constructed using a high-frequency coil electric wire as described in any one of claims 1 to 5 of the scope of patent application. 一種高頻線圈用電線,係至少由具有銅導體與設置於該銅導體之外周的強磁性層的芯線,和設置於該芯線上的絕緣被覆層而加以構成之高頻線圈用電線,其特徵為焊接時之浸潤應力為3.4mN以上,零交叉時間為0.4秒以下者。A high-frequency coil electric wire is a high-frequency coil electric wire composed of a core wire having at least a copper conductor and a ferromagnetic layer provided on the outer periphery of the copper conductor, and an insulating coating provided on the core wire. For welding, the wetting stress is 3.4mN or more, and the zero crossing time is 0.4s or less. 如申請專利範圍第7項記載之高頻線圈用電線,其中,前述銅導體之直徑則為0.02~0.40mm之範圍內者。For example, the electric wire for high-frequency coils described in item 7 of the scope of patent application, wherein the diameter of the aforementioned copper conductor is in the range of 0.02 to 0.40 mm. 如申請專利範圍第7項或第8項記載之高頻線圈用電線,其中,前述浸潤應力為3.7mN以上,零交叉時間為0.2秒以下者。For example, the electric wire for high-frequency coils described in item 7 or item 8 of the patent application range, wherein the above-mentioned wetting stress is 3.7 mN or more and the zero-cross time is 0.2 seconds or less. 如申請專利範圍第7項至第9項任一項記載之高頻線圈用電線,其中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層,前述鐵層之維氏硬度為200HV者。For example, the high-frequency coil electric wire according to any one of claims 7 to 9, wherein the ferromagnetic layer has an iron layer and a nickel layer provided on the outer periphery of the iron layer, and the dimension of the iron layer is Those with a hardness of 200 HV. 如申請專利範圍第7項至第9項任一項記載之高頻線圈用電線,其中,前述強磁性層則具有鐵層,和設置於該鐵層之外周的鎳層,前述鐵層之厚度為0.2μm以上3.0μm以下者。The high-frequency coil electric wire according to any one of claims 7 to 9 in the scope of the patent application, wherein the ferromagnetic layer has an iron layer, a nickel layer provided on the outer periphery of the iron layer, and the thickness of the iron layer. It is 0.2 μm or more and 3.0 μm or less. 一種電子零件,其特徵為如申請專利範圍第7項至第11項任一項記載之高頻線圈用電線則經由焊接而加以連接。An electronic component characterized in that the electric wire for a high-frequency coil as described in any one of claims 7 to 11 of the scope of patent application is connected by welding.
TW107121854A 2017-06-26 2018-06-26 Wires and electronic parts for high frequency coils TWI772446B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-123866 2017-06-26
JP2017123866A JP6352501B1 (en) 2017-06-26 2017-06-26 High-frequency coil wires and electronic components

Publications (2)

Publication Number Publication Date
TW201917742A true TW201917742A (en) 2019-05-01
TWI772446B TWI772446B (en) 2022-08-01

Family

ID=62779850

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107121854A TWI772446B (en) 2017-06-26 2018-06-26 Wires and electronic parts for high frequency coils

Country Status (4)

Country Link
JP (1) JP6352501B1 (en)
CN (1) CN110800068B (en)
TW (1) TWI772446B (en)
WO (1) WO2019004110A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS421339Y1 (en) * 1964-10-31 1967-01-26
WO2011118054A1 (en) * 2010-03-23 2011-09-29 株式会社フジクラ High-frequency electric wire and high-frequency coil
JP2011222617A (en) * 2010-04-06 2011-11-04 Furukawa Electric Co Ltd:The Wire for inductor and inductor
CN106342011B (en) * 2010-09-30 2013-08-07 上海航天设备制造总厂 The welding method of a kind of stranded copper wire wire harness and silver foil
WO2013051102A1 (en) * 2011-10-04 2013-04-11 古河電気工業株式会社 Wire rod for inductor, and inductor
JP2016046522A (en) * 2014-08-22 2016-04-04 住友電気工業株式会社 Wiring material for coil

Also Published As

Publication number Publication date
CN110800068B (en) 2021-10-01
TWI772446B (en) 2022-08-01
JP6352501B1 (en) 2018-07-04
JP2019008994A (en) 2019-01-17
CN110800068A (en) 2020-02-14
WO2019004110A1 (en) 2019-01-03

Similar Documents

Publication Publication Date Title
JP6000314B2 (en) Chip electronic component and manufacturing method thereof
TWI550648B (en) Insulated wires and manufacturing methods using such coils and insulated wires
US9478328B2 (en) High frequency cable, high frequency coil and method for manufacturing high frequency cable
US20110198118A1 (en) Magnet wire
KR101947231B1 (en) Method for manufacturing ceramic electronic component, and ceramic electronic component
US20140375413A1 (en) Metal magnetic powder and method for forming the same, and inductor manufactured using the metal magnetic powder
CN104851569B (en) Coil component and its terminal component used
JP2014209590A (en) Multilayer inductor
CN110459389A (en) Surface mounting inductor
JP2016046522A (en) Wiring material for coil
JP2019029579A (en) Coil component
TWI772446B (en) Wires and electronic parts for high frequency coils
JP6896677B2 (en) Wires and electronic components for high frequency coils
WO2014024767A1 (en) Insulating cable and electric coil using same
JP2000057850A (en) Copper-clad aluminum wire and insulated copper-clad aluminum wire
JP2004111072A (en) Flat angular ferromagnetic conductor and its manufacturing method, enamel-coated flat angular ferromagnetic wire, self-fusible enamel-coated flat angular ferromagnetic wire and ferromagnetic flat cable using the conductor
JP2022162384A (en) Coil type electronic component
JP2003073883A (en) Electrodeposited iron film for high-frequency, insulated wire for high-frequency coil, and manufacturing method for these
TWI389145B (en) Magnetic wire, its application, and magnetic wire and enameled wire production methods
JP5286645B2 (en) Inductance component and manufacturing method thereof
JPH10237673A (en) Plated aluminum electric wire, insulating plated aluminum electric wire and their production
JP2000030538A (en) Copper covered aluminum wire and insulated copper covered aluminum wire
JP2002185118A (en) Soldering method
JP4841613B2 (en) Ferrite core, manufacturing method thereof, and common mode noise filter
JP2021125486A (en) Coil component and electronic device