TWI746018B - Processing method of ball plug for diverter valve and ball plug - Google Patents

Processing method of ball plug for diverter valve and ball plug Download PDF

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TWI746018B
TWI746018B TW109120642A TW109120642A TWI746018B TW I746018 B TWI746018 B TW I746018B TW 109120642 A TW109120642 A TW 109120642A TW 109120642 A TW109120642 A TW 109120642A TW I746018 B TWI746018 B TW I746018B
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runner
ball plug
thickness
layer
outer diameter
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TW109120642A
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TW202200921A (en
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許周炎
翁聲文
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臺灣控制閥股份有限公司
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本發明係有關於一種用於分向閥之球塞的加工方法,包括下列步驟:提供一球塞,其包括一外徑周邊及一分向流道,外徑周邊包括彼此連接接續之一流道口部分及一遠離部分,流道口部分鄰接於分向流道,遠離部分相對於流道口部分而遠離分向流道;切削加工外徑周邊,其由遠離部分之一較小切削厚度漸進切削加工至流道口部分之一較大切削厚度;噴塗一絕緣層至分向流道與流道口部分;電鍍一電鍍層至流道口部分與遠離部分,且電鍍層於流道口部分之厚度藉由絕緣層之電流絕緣而堆積較厚於遠離部分之厚度;研磨加工流道口部分之電鍍層至一預定尺寸;以及去除絕緣層。 The present invention relates to a method for processing a ball plug for a directional valve, including the following steps: providing a ball plug, which includes an outer diameter periphery and a diverting flow channel, and the outer diameter periphery includes a flow channel port connected to each other. Part and a distant part, the runner mouth part is adjacent to the branch runner, and the far part is far away from the branch runner relative to the runner mouth part; cutting the outer diameter periphery, which is gradually cut from the smaller cutting thickness of the far part to One of the larger cutting thickness of the runner opening; spraying an insulating layer to the branching runner and the runner mouth part; electroplating a plating layer to the runner mouth part and the far part, and the thickness of the plating layer at the runner mouth part is determined by the thickness of the insulating layer The current is insulated and the accumulation is thicker than the thickness of the remote part; the electroplated layer of the runner opening part is polished to a predetermined size; and the insulating layer is removed.

Description

用於分向閥之球塞的加工方法及球塞 Processing method of ball plug for diverter valve and ball plug

本發明係有關於一種用於分向閥之球塞的加工方法,尤指一種可確實達到縮短製程時間、降低成本、並獲得更為耐磨耐用(提高產品壽命)之球塞之目的的加工方法;本發明亦有關於一種由前述加工方法所製成之球塞。 The present invention relates to a processing method for a ball plug of a diverter valve, especially a processing that can achieve the purpose of shortening the process time, reducing the cost, and obtaining a more wear-resistant and durable (improving product life) ball plug. Method; The present invention also relates to a ball plug made by the aforementioned processing method.

於一般機械設備中,常會利用一分向閥做為輸送流體時切換輸送方向使用。分向閥包括一球塞及一閥座,球塞具有分向流道,且球塞置於閥座內轉動,亦即球塞轉動時會轉換分向流道之方向,藉以達到切換流體輸送方向之目的。 In general machinery and equipment, a directional valve is often used to switch the conveying direction when conveying fluid. The diverter valve includes a ball plug and a valve seat. The ball plug has a diverging flow channel, and the ball plug is placed in the valve seat to rotate, that is, when the ball plug rotates, the direction of the diverging flow channel will be changed to switch fluid delivery. The purpose of direction.

傳統上,球塞之外徑周邊(外周表面)會電鍍一層電鍍層,而球塞於閥座內轉動時會與閥座(一般而言為金屬材質)之間產生摩擦,尤其是位於分向流道兩端之流道口部分是最容易磨損的地方。 Traditionally, the outer diameter (outer peripheral surface) of the ball plug is electroplated with a plating layer, and when the ball plug rotates in the valve seat, friction occurs between the ball plug and the valve seat (generally made of metal), especially in the split direction The part of the runner opening at both ends of the runner is the most prone to wear.

請同時參照圖1及圖2,其中之圖1係為習知電鍍加工後之球塞之剖面圖,圖2係為圖1之X部分之放大示意圖。如圖1及圖2所示,於傳統對球塞9之電鍍作法上,於電鍍之前會對球塞9之外徑周邊(外周表面)91切削掉厚度相同的一層金屬(如圖2所例示之A、B處),之後電鍍一預設厚度的電鍍層92,而於分向流道94與流道口 部分93會噴塗一絕緣層95。換言之,傳統對球塞9之電鍍作法所得到的電鍍層92於球塞9之外徑周邊91上的厚度是相同的。 Please refer to FIGS. 1 and 2 at the same time. FIG. 1 is a cross-sectional view of the ball plug after conventional electroplating processing, and FIG. 2 is an enlarged schematic view of part X of FIG. 1. As shown in Figures 1 and 2, in the traditional electroplating method of the ball plug 9, a layer of metal of the same thickness is cut off the outer diameter periphery (outer peripheral surface) 91 of the ball plug 9 before electroplating (as shown in Figure 2) A, B), then electroplating a predetermined thickness of the electroplating layer 92, and in the split runner 94 and the runner mouth Part 93 will be sprayed with an insulating layer 95. In other words, the thickness of the electroplated layer 92 obtained by the traditional electroplating method of the ball plug 9 on the outer diameter periphery 91 of the ball plug 9 is the same.

然而,以上述傳統作法所得到的電鍍層92會產生兩種狀況:其一,若電鍍層92厚度較厚時,電鍍後需要進行球塞9之整個外徑周邊91的研磨加工,相對使製程時間變長,且成本增加,而且在研磨加工後會相對使流道口部分93之電鍍層92的厚度變薄,故在使用一小段時間之後即會很快地因磨耗耗損而無法使用;其二,若電鍍層92厚度較薄時,球塞9不需進行研磨加工即可使用,但如同上述,流道口部分93之電鍍層92的厚度較薄,很快地在使用一小段時間之後即會因磨耗耗損而產生流體洩漏之問題,亦即球塞9無法再使用。 However, the electroplated layer 92 obtained by the above-mentioned traditional method will have two conditions: First, if the thickness of the electroplated layer 92 is thick, the entire outer periphery 91 of the ball plug 9 needs to be polished after electroplating. The time becomes longer and the cost increases, and the thickness of the electroplated layer 92 of the runner port 93 will be relatively thinner after the grinding process, so after a short period of use, it will quickly become unusable due to wear and tear; second If the thickness of the electroplated layer 92 is thin, the ball plug 9 can be used without grinding. However, as mentioned above, the thickness of the electroplated layer 92 of the runner mouth portion 93 is thin, and it will soon be used after a short period of time. The problem of fluid leakage due to wear and tear, that is, the ball plug 9 can no longer be used.

為改善上述問題,本發明提出一種用於分向閥之球塞的加工方法,包括下列步驟: In order to improve the above-mentioned problems, the present invention proposes a method for processing the ball plug of the diverter valve, which includes the following steps:

提供一球塞,該球塞包括一外徑周邊及一分向流道,且該外徑周邊包括彼此連接接續之一流道口部分及一遠離部分,該流道口部分係鄰接於該分向流道,該遠離部分係相對於該流道口部分而遠離該分向流道; A ball plug is provided, the ball plug includes an outer diameter periphery and a branch flow channel, and the outer diameter periphery includes a flow passage opening portion and a distant part connected to each other, and the flow passage opening portion is adjacent to the branch flow channel , The far part is far away from the branch flow path relative to the flow path mouth part;

切削加工該外徑周邊,其係由該遠離部分之一較小切削厚度漸進切削加工至該流道口部分之一較大切削厚度; Cutting the periphery of the outer diameter, which is a progressive cutting process from a smaller cutting thickness of the remote part to a larger cutting thickness of the runner mouth part;

噴塗一絕緣層至該分向流道與該流道口部分; Spray an insulating layer to the branch flow channel and the flow channel opening part;

電鍍一電鍍層至該流道口部分與該遠離部分,且該電鍍層於該流道口部分之厚度藉由該絕緣層之電流絕緣而堆積較厚於 該遠離部分之厚度; A plating layer is electroplated to the runner opening part and the remote part, and the thickness of the plating layer at the runner opening part is thicker than the current insulation of the insulating layer. The thickness of the part that is far away;

研磨加工該流道口部分之該電鍍層至一預定尺寸;以及 Grinding and processing the electroplated layer of the runner mouth portion to a predetermined size; and

去除該絕緣層。 Remove the insulating layer.

藉由上述的加工方法,可使該電鍍層於該流道口部分之厚度藉由該絕緣層之電流絕緣而堆積較厚於該遠離部分之厚度,亦即該流道口部分之電鍍層的厚度較厚,而其餘部分、亦即該遠離部分之電鍍層的厚度較薄,其結果可以達到不變形不需進行研磨加工(不需對該遠離部分之電鍍層進行研磨加工),僅需針對該流道口部分進行些微研磨加工修飾,亦即在電鍍完成之後僅需研磨加工該流道口部分增厚的電鍍層至所定的規格尺寸即可。 By the above-mentioned processing method, the thickness of the electroplating layer at the runner opening part can be made thicker than the thickness of the remote part by the current insulation of the insulating layer, that is, the thickness of the electroplating layer at the runner opening part is larger The thickness of the remaining part, that is, the electroplated layer far away is thinner. As a result, it is possible to achieve no deformation and no grinding process (the electroplated layer at the far part does not need to be polished). The passage part is modified by micro-grinding, that is, after the electroplating is completed, only the thickened electroplated layer of the runner mouth part needs to be grind-processed to the specified size.

如上所述,本發明所提供的加工方法僅需針對該流道口部分進行研磨加工修飾即可,如此可確實達到縮短製程時間、降低成本之目的。再者,本發明所提供的加工方法可使該流道口部分之電鍍層的厚度較厚(如上面習知技術所述,流道口部分在使用時是最容易磨損的地方),而其餘部分、亦即該遠離部分之電鍍層的厚度較薄,如此可確實達到獲得更為耐磨耐用(提高產品壽命)之球塞的目的。 As mentioned above, the processing method provided by the present invention only needs to be polished and modified for the runner port part, which can indeed achieve the purpose of shortening the process time and reducing the cost. Furthermore, the processing method provided by the present invention can make the thickness of the electroplated layer of the runner mouth part thicker (as described in the above prior art, the runner mouth part is the most easily worn place during use), while the remaining part, That is, the thickness of the electroplated layer at the far part is thinner, so that the goal of obtaining a more wear-resistant and durable (improving product life) ball plug can be achieved.

本發明亦提出一種球塞,其係由如上所述之用於分向閥之球塞的加工方法所製成,且該球塞包括:一分向流道、一外徑周邊以及一電鍍層。其中,該外徑周邊包括彼此連接接續之一流道口部分及一遠離部分,該流道口部分係鄰接於該分向流道,該遠離部分係 相對於該流道口部分而遠離該分向流道;該電鍍層係電鍍於該流道口部分與該遠離部分,且該電鍍層於該流道口部分之厚度係較厚於該遠離部分之厚度。 The present invention also provides a ball plug, which is made by the above-mentioned processing method for the ball plug of the diverter valve, and the ball plug includes: a diverter flow channel, an outer diameter periphery, and an electroplating layer . Wherein, the periphery of the outer diameter includes a flow passage opening part and a distant part connected to each other, the flow passage opening part is adjacent to the branching flow passage, and the distance part is Relative to the flow passage opening part, it is far away from the branching flow channel; the electroplating layer is electroplated on the flow passage opening part and the distant part, and the thickness of the electroplating layer at the flow passage opening part is thicker than the thickness of the distant part.

1:球塞 1: ball plug

11:外徑周邊 11: Periphery of outer diameter

12:分向流道 12: Split flow channel

13:流道口部分 13: Runner mouth part

14:遠離部分 14: away from the part

15:絕緣層 15: Insulation layer

16:電鍍層 16: electroplating layer

9:球塞 9: Ball plug

91:外徑周邊 91: outer diameter periphery

92:電鍍層 92: Plating layer

93:流道口部分 93: Runner mouth part

94:分向流道 94: Split flow channel

95:絕緣層 95: insulating layer

t1:較小切削厚度 t1: Smaller cutting thickness

t2:較大切削厚度 t2: Larger cutting thickness

S01~S05:步驟 S01~S05: steps

圖1係為習知電鍍加工後之球塞之剖面圖。 Figure 1 is a cross-sectional view of the ball plug after conventional electroplating.

圖2係為圖1之X部分之放大示意圖。 Fig. 2 is an enlarged schematic diagram of part X of Fig. 1.

圖3係為本發明較佳具體實施例之球塞之立體圖。 Figure 3 is a perspective view of the ball plug of the preferred embodiment of the present invention.

圖4係為本發明較佳具體實施例之球塞之剖面圖。 Fig. 4 is a cross-sectional view of the ball plug of the preferred embodiment of the present invention.

圖5係為本發明較佳具體實施例之流程圖。 Fig. 5 is a flowchart of a preferred embodiment of the present invention.

圖6係為本發明較佳具體實施例之實施步驟示意圖之一。 Fig. 6 is one of the schematic diagrams of the implementation steps of the preferred embodiment of the present invention.

圖7係為本發明較佳具體實施例之實施步驟示意圖之二。 FIG. 7 is the second schematic diagram of the implementation steps of the preferred embodiment of the present invention.

圖8係為本發明較佳具體實施例之實施步驟示意圖之三。 FIG. 8 is the third schematic diagram of the implementation steps of the preferred embodiment of the present invention.

圖9係為本發明較佳具體實施例之實施步驟示意圖之四。 FIG. 9 is the fourth schematic diagram of the implementation steps of the preferred embodiment of the present invention.

請同時參照圖3及圖4,其中之圖3係為本發明較佳具體實施例之球塞之立體圖,圖4係為本發明較佳具體實施例之球塞之剖面圖。於圖3及圖4中顯示有一用於分向閥(圖未示)之球塞1,且其係利用本發明所提供的加工方法所製成。 Please refer to FIGS. 3 and 4 at the same time. FIG. 3 is a perspective view of the ball plug according to a preferred embodiment of the present invention, and FIG. 4 is a cross-sectional view of the ball plug according to a preferred embodiment of the present invention. In Figs. 3 and 4, a ball plug 1 for a diverter valve (not shown) is shown, and it is made by the processing method provided by the present invention.

圖3及圖4所顯示之球塞1包括一分向流道12、一外徑周邊11以及一電鍍層16。其中,外徑周邊11包括彼此連接接續之一流道口部分13及一遠離部分14,流道口部分13係鄰接於分向流道12,遠離部分14係相對於流道口部分13而遠離分向流道12;電鍍層16係電鍍於流道口部分13與遠離部分14,且電鍍層16於流道口部分13之厚度係較厚於遠離部分14之厚度。 The ball plug 1 shown in FIGS. 3 and 4 includes a branch runner 12, an outer periphery 11 and an electroplating layer 16. Among them, the outer diameter periphery 11 includes a runner opening part 13 and a remote part 14 connected to each other. The runner mouth part 13 is adjacent to the branch flow channel 12, and the away part 14 is far away from the branch flow channel relative to the runner mouth part 13 12; The electroplating layer 16 is electroplated on the runner opening portion 13 and the remote portion 14, and the thickness of the electroplating layer 16 in the runner opening portion 13 is thicker than the thickness of the remote portion 14.

以下將詳述上述用於分向閥(圖未示)之球塞1的加工方法。另外,圖4之剖面圖顯示有一Y部分,其係標註球塞1在鄰近流道口部分13處的部分,之後的各圖式(圖5至圖9)將以Y部分的放大圖來顯示以便於說明,以更為明瞭本發明所提供的加工方法。 The processing method of the ball plug 1 for the diverter valve (not shown) will be described in detail below. In addition, the cross-sectional view of Fig. 4 shows a Y part, which is to mark the part of the ball plug 1 adjacent to the runner port 13, and the subsequent drawings (Figs. 5 to 9) will be shown as an enlarged view of the Y part for convenience. In the description, in order to better understand the processing method provided by the present invention.

請參照圖5,其係為本發明較佳具體實施例之流程圖,並請同時一併參照圖3及圖4。於本發明所提供之用於分向閥之球塞1的加工方法中,首先係提供一球塞1(步驟S01),如同上述,此球塞1包括一外徑周邊11及一分向流道12,其中之外徑周邊11包括彼此連接接續之一流道口部分13及一遠離部分14,流道口部分13係鄰接於分向流道12,遠離部分14係相對於流道口部分13而遠離分向流道12,亦即外徑周邊11係由鄰接於分向流道12之流道口部分13連接接續至遠離分向流道12之遠離部分14(如圖3及圖4所示)。 Please refer to FIG. 5, which is a flowchart of a preferred embodiment of the present invention, and please refer to FIGS. 3 and 4 at the same time. In the method for processing the ball plug 1 for the diverter valve provided by the present invention, a ball plug 1 is first provided (step S01). As mentioned above, the ball plug 1 includes an outer diameter periphery 11 and a diverter flow The channel 12, in which the outer periphery 11 includes a runner opening part 13 and a remote part 14 which are connected to each other. The flow passage 12, that is, the outer periphery 11 is connected from the flow passage opening portion 13 adjacent to the branch flow passage 12 to the distant part 14 far away from the branch flow passage 12 (as shown in FIGS. 3 and 4).

請同時參照圖5及圖6,其中之圖6係為本發明較佳具體實施例之實施步驟示意圖之一,並請同時一併參照圖3及圖4。於上述步驟S01之後,切削加工球塞1之外徑周邊11,在此切削加工之步驟中,係由遠離部分14之一較小切削厚度t1漸進切削加工至流道 口部分13之一較大切削厚度t2(步驟S02)(如圖6所示,其中以虛線表示切削加工掉的部分)。換言之,球塞1之外徑周邊11的遠離部分14係被切削加工成具有一較小切削厚度t1,然後以漸進式逐漸朝向流道口部分13增加切削厚度,進而切削加工至流道口部分13之一較大切削厚度t2。 Please refer to FIGS. 5 and 6 at the same time. FIG. 6 is one of the schematic diagrams of the implementation steps of the preferred embodiment of the present invention, and please refer to FIGS. 3 and 4 at the same time. After the above step S01, the outer diameter periphery 11 of the ball plug 1 is cut and processed. In this cutting step, the smaller cutting thickness t1 of the far part 14 is progressively cut to the runner One of the mouth portions 13 has a larger cutting thickness t2 (step S02) (as shown in FIG. 6, the cut-out portion is indicated by a broken line). In other words, the remote portion 14 of the outer diameter periphery 11 of the ball plug 1 is cut to have a smaller cutting thickness t1, and then gradually increases the cutting thickness toward the runner opening portion 13, and then is cut to the runner opening portion 13 A larger cutting thickness t2.

請同時參照圖5及圖7,其中之圖7係為本發明較佳具體實施例之實施步驟示意圖之二,並請同時一併參照圖3及圖4。於上述步驟S02之後,噴塗一絕緣層15至分向流道12與流道口部分13(步驟S03)(如圖7所示)。 Please refer to FIGS. 5 and 7 at the same time. FIG. 7 is the second schematic diagram of the implementation steps of the preferred embodiment of the present invention. Please also refer to FIGS. 3 and 4 at the same time. After the above step S02, an insulating layer 15 is sprayed onto the branch runner 12 and the runner opening 13 (step S03) (as shown in FIG. 7).

請同時參照圖5及圖8,其中之圖8係為本發明較佳具體實施例之實施步驟示意圖之三,並請同時一併參照圖3及圖4。於上述步驟S03之後,電鍍一電鍍層16至流道口部分13與遠離部分14,且電鍍層16於流道口部分13之厚度藉由絕緣層15之電流絕緣而堆積較厚於遠離部分14之厚度(步驟S04)(如圖8所示)。換言之,因為流道口部分13噴塗有絕緣層15,使得於電鍍時的電流無法通過流道口部分13,故電鍍層16於流道口部分13會逐漸堆積增厚。 Please refer to FIGS. 5 and 8 at the same time. FIG. 8 is the third schematic diagram of the implementation steps of the preferred embodiment of the present invention. Please also refer to FIGS. 3 and 4 at the same time. After the above step S03, a plating layer 16 is electroplated to the runner opening portion 13 and the remote portion 14, and the thickness of the plating layer 16 at the runner opening portion 13 is deposited thicker than the thickness of the remote portion 14 by the current insulation of the insulating layer 15 (Step S04) (as shown in Fig. 8). In other words, because the runner opening portion 13 is sprayed with the insulating layer 15, the current during electroplating cannot pass through the runner opening portion 13, so the electroplating layer 16 will gradually accumulate and thicken on the runner opening portion 13.

請同時參照圖5及圖9,其中之圖9係為本發明較佳具體實施例之實施步驟示意圖之四,並請同時一併參照圖3及圖4。於上述步驟S04之後,研磨加工流道口部分13之電鍍層16至一預定尺寸(步驟S05)(如圖9所示),前述預定尺寸即為所定之規格尺寸。換言之,球塞1之外徑周邊11的遠離部分14的電鍍層16不會產生變形而不需要再進行研磨加工,僅需針對流道口部分13堆積增厚的電鍍層 16稍做些微研磨加工至需求的規格尺寸即可,此時即可得到流道口部分13的電鍍層16之厚度大於遠離部分14之電鍍層16的厚度之球塞1。 Please refer to FIGS. 5 and 9 at the same time. FIG. 9 is the fourth schematic diagram of the implementation steps of the preferred embodiment of the present invention, and please refer to FIGS. 3 and 4 at the same time. After the above step S04, the electroplated layer 16 of the runner opening portion 13 is polished to a predetermined size (step S05) (as shown in FIG. 9), and the predetermined size is the predetermined size. In other words, the electroplated layer 16 of the outer periphery 11 of the ball plug 1 far away from the part 14 will not be deformed, and no grinding process is required. It is only necessary to deposit a thickened electroplated layer on the runner opening 13 16 can be slightly polished to the required specifications. At this time, the thickness of the electroplated layer 16 of the runner opening portion 13 is greater than the thickness of the electroplated layer 16 away from the portion 14 of the ball plug 1.

最後,因為絕緣層15的主要作用是在電鍍時不讓分向流道12中有電鍍層16,所以在電鍍完成時會去除絕緣層15(步驟S06)。 Finally, because the main function of the insulating layer 15 is to prevent the electroplating layer 16 in the branch runner 12 during electroplating, the insulating layer 15 will be removed when the electroplating is completed (step S06).

如上所述,藉由上述的加工方法,在球塞1電鍍後僅需針對流道口部分13進行些微研磨加工修飾即可,如此可確實縮短球塞1的製程時間,並相對地降低成本。 As mentioned above, with the above-mentioned processing method, after the ball plug 1 is electroplated, it is only necessary to perform some micro-grinding processing and modification on the runner opening portion 13, which can indeed shorten the process time of the ball plug 1 and relatively reduce the cost.

此外,如同上面習知技術所述,流道口部分13在使用時是最容易磨損的地方,而藉由本發明所提供的加工方法可使流道口部分13之電鍍層16的厚度較厚,而其餘部分、亦即遠離部分14之電鍍層16的厚度較薄,亦即藉由流道口部分13增厚的電鍍層16,可使球塞1在使用時更為耐磨耐用,並相對地提高球塞1的使用壽命。 In addition, as described above in the prior art, the runner opening 13 is the most easily worn area during use, and the processing method provided by the present invention can make the thickness of the plating layer 16 of the runner opening 13 thicker, while the rest Part, that is, the thickness of the electroplated layer 16 far away from the portion 14 is relatively thin, that is, the thickened electroplated layer 16 of the runner portion 13 can make the ball plug 1 more wear-resistant and durable during use, and relatively improve the ball The service life of plug 1.

以上所述僅為本發明的較佳具體實施例,其並不用以限制本發明,凡在本發明的精神和原則之內,所作的任何修改、等同替換、改進等,均應包含在本發明的保護範圍之內。 The above are only the preferred specific embodiments of the present invention, which are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the present invention. Within the scope of protection.

S01~S06:步驟 S01~S06: Step

Claims (2)

一種用於分向閥之球塞的加工方法,包括下列步驟: A processing method for the ball plug of the diverter valve, including the following steps: 提供一球塞,該球塞包括一外徑周邊及一分向流道,且該外徑周邊包括彼此連接接續之一流道口部分及一遠離部分,該流道口部分係鄰接於該分向流道,該遠離部分係相對於該流道口部分而遠離該分向流道; A ball plug is provided, the ball plug includes an outer diameter periphery and a branch flow channel, and the outer diameter periphery includes a flow passage opening portion and a distant part connected to each other, and the flow passage opening portion is adjacent to the branch flow channel , The far part is far away from the branch flow path relative to the flow path mouth part; 切削加工該外徑周邊,其係由該遠離部分之一較小切削厚度漸進切削加工至該流道口部分之一較大切削厚度; Cutting the periphery of the outer diameter, which is a progressive cutting process from a smaller cutting thickness of the remote part to a larger cutting thickness of the runner mouth part; 噴塗一絕緣層至該分向流道與該流道口部分; Spray an insulating layer to the branch flow channel and the flow channel opening part; 電鍍一電鍍層至該流道口部分與該遠離部分,且該電鍍層於該流道口部分之厚度藉由該絕緣層之電流絕緣而堆積較厚於該遠離部分之厚度; Electroplating an electroplated layer to the runner opening part and the remote part, and the thickness of the plating layer at the runner opening part is deposited thicker than the thickness of the remote part by the current insulation of the insulating layer; 研磨加工該流道口部分之該電鍍層至一預定尺寸;以及 Grinding and processing the electroplated layer of the runner mouth portion to a predetermined size; and 去除該絕緣層。 Remove the insulating layer. 一種球塞,係由如申請專利範圍第1項所述之用於分向閥之球塞的加工方法所製成,且該球塞包括: A ball plug is made by the processing method of the ball plug for the diverter valve as described in item 1 of the scope of patent application, and the ball plug includes: 一分向流道; One-way flow path; 一外徑周邊,該外徑周邊包括彼此連接接續之一流道口部分及一遠離部分,該流道口部分係鄰接於該分向流道,該遠離部分係相對於該流道口部分而遠離該分向流道;以及 An outer diameter periphery, the outer diameter periphery includes a flow passage opening portion connected to each other and a distant portion, the flow passage opening portion is adjacent to the branching flow channel, and the distant part is far away from the branching direction relative to the flow passage opening part Runner; and 一電鍍層,係電鍍於該流道口部分與該遠離部分,且該電鍍層於該流道口部分之厚度係較厚於該遠離部分之厚度。 An electroplating layer is electroplated on the runner opening part and the remote part, and the thickness of the electroplating layer at the runner opening part is thicker than the thickness of the remote part.
TW109120642A 2020-06-18 2020-06-18 Processing method of ball plug for diverter valve and ball plug TWI746018B (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2573799Y (en) * 2002-09-27 2003-09-17 律德精密股份有限公司 Reinforced valve ball structure
TWM288664U (en) * 2005-09-23 2006-03-11 Guo-Jen Wei Hollow ball plug structure for controlling gate of a valve
TWM409328U (en) * 2011-03-03 2011-08-11 Taiwan Control Valve Co Ltd Diverter valve having improved leak stoppage structure
EP2631515A2 (en) * 2012-02-23 2013-08-28 Johnson Electric S.A. Plug valve with a spring biased plug
TWM460967U (en) * 2013-04-18 2013-09-01 Lih Shen Machinery Co Ltd Multiple-sheet ball valve
EP3051190A2 (en) * 2015-02-02 2016-08-03 Dmitry Olegovich Levin Valve

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2573799Y (en) * 2002-09-27 2003-09-17 律德精密股份有限公司 Reinforced valve ball structure
TWM288664U (en) * 2005-09-23 2006-03-11 Guo-Jen Wei Hollow ball plug structure for controlling gate of a valve
TWM409328U (en) * 2011-03-03 2011-08-11 Taiwan Control Valve Co Ltd Diverter valve having improved leak stoppage structure
EP2631515A2 (en) * 2012-02-23 2013-08-28 Johnson Electric S.A. Plug valve with a spring biased plug
TWM460967U (en) * 2013-04-18 2013-09-01 Lih Shen Machinery Co Ltd Multiple-sheet ball valve
EP3051190A2 (en) * 2015-02-02 2016-08-03 Dmitry Olegovich Levin Valve

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