TW202200921A - Method for processing ball plug of directional valve and ball plug which can achieve the purpose of shortening the processing time, reducing costs, and obtaining more wear-resistant and durable ball plug - Google Patents

Abstract

The present invention relates to a method for processing a ball plug of a directional valve, comprising the following steps of providing a ball plug including an outer diameter perimeter and a directional flow channel, wherein the outer diameter perimeter includes a runner port part and a remote part, both of which are connected to each other, the runner port part is adjacent to the directional flow channel, and the remote part is away from the directional flow channel relative to the runner port part; cutting the outer diameter perimeter, which is progressively machined from a smaller cutting thickness of the remote part to a larger cutting thickness of the runner port part; spraying an insulating layer on the directional flow channel and the runner port part; electroplating a plating layer on the runner port part and the remote part, wherein the thickness of the plating layer on the runner port part is accumulated thicker than the thickness of the remote part due to the current insulation of the insulating layer; grinding and processing the plating layer on the runner port part to a predetermined size; and removing the insulating layer. A ball plug of the present invention comprises a directional flow channel; an outer diameter perimeter including a runner port part and a remote part, both of which are connected to each other, wherein the runner port part is adjacent to the directional flow channel and the remote part is away from the directional flow channel relative to the runner port part; and a plating layer electroplated on the runner port part and the remote part, wherein the thickness of the plating layer on the runner port part is thicker than that of the remote part. Therefore, the present invention can achieve the purpose of shortening the processing time, reducing costs, and obtaining more wear-resistant and durable ball plug.

Description

Processing method of ball plug for diverter valve and ball plug

The present invention relates to a processing method for a ball plug of a diverter valve, in particular to a processing method that can surely achieve the purpose of shortening the process time, reducing the cost, and obtaining a more wear-resistant and durable (improving product life) ball plug method; the present invention also relates to a ball plug made by the aforementioned processing method.

In general mechanical equipment, a diverter valve is often used to switch the conveying direction when conveying fluid. The diverter valve includes a ball plug and a valve seat. The ball plug has a diverter flow channel, and the ball plug is placed in the valve seat and rotates, that is, when the ball plug rotates, it will switch the direction of the diverter flow channel, so as to switch the fluid delivery. the purpose of the direction.

Traditionally, the outer diameter of the ball plug (outer peripheral surface) is electroplated with a plating layer, and when the ball plug rotates in the valve seat, friction is generated between the valve seat (generally a metal material), especially in the split direction. The runner openings at both ends of the runner are the most prone to wear.

Please refer to FIG. 1 and FIG. 2 at the same time, wherein FIG. 1 is a cross-sectional view of a ball plug after conventional electroplating processing, and FIG. 2 is an enlarged schematic view of part X of FIG. 1 . As shown in FIG. 1 and FIG. 2 , in the conventional electroplating method for the ball plug 9, a layer of metal with the same thickness is cut off from the outer diameter periphery (outer peripheral surface) 91 of the ball plug 9 before electroplating (as shown in FIG. 2 ). A and B), and then electroplating a pre-set thickness of the electroplating layer 92, and the branch flow channel 94 and the flow channel mouth Part 93 is sprayed with an insulating layer 95 . In other words, the thickness of the plating layer 92 on the outer diameter periphery 91 of the ball plug 9 obtained by the conventional electroplating of the ball plug 9 is the same.

However, the electroplating layer 92 obtained by the above-mentioned conventional method will have two situations: First, if the thickness of the electroplating layer 92 is relatively thick, the entire outer diameter periphery 91 of the ball plug 9 needs to be ground after electroplating, which is relatively time-consuming. The time becomes longer and the cost increases, and the thickness of the electroplating layer 92 of the runner opening portion 93 will be relatively thinner after the grinding process, so it will soon be unusable due to wear and tear after a short period of use; , if the thickness of the electroplating layer 92 is thin, the ball plug 9 can be used without grinding, but as mentioned above, the thickness of the electroplating layer 92 of the runner opening portion 93 is thin, and it will be quickly after a short period of use. The problem of fluid leakage due to wear and tear, that is, the ball plug 9 can no longer be used.

In order to improve the above-mentioned problems, the present invention proposes a processing method for a ball plug of a diverter valve, comprising the following steps:

Provide a ball plug, the ball plug includes an outer diameter periphery and a branch flow channel, and the outer diameter periphery includes a flow channel mouth part and a remote part connected to each other, the flow channel mouth part is adjacent to the branch flow channel , the remote part is away from the branch flow channel relative to the flow channel mouth part;

Machining the periphery of the outer diameter, which is progressively machined from a smaller cutting thickness of the remote portion to a larger cutting thickness of the runner opening portion;

spraying an insulating layer to the runner and the mouth of the runner;

Electroplating an electroplating layer to the runner opening part and the remote part, and the thickness of the electroplating layer on the runner opening part is accumulated thicker than the current insulation of the insulating layer. the thickness of the remote portion;

grinding the plated layer of the runner opening portion to a predetermined size; and

Remove the insulating layer.

By the above-mentioned processing method, the thickness of the electroplating layer at the runner opening portion can be accumulated thicker than the thickness of the remote portion due to the current insulation of the insulating layer, that is, the thickness of the electroplating layer on the runner opening portion is thicker. The thickness of the remaining part, that is, the thickness of the electroplating layer of the remote part, is relatively thin. As a result, no deformation is required and no grinding process is required (no grinding process is required for the electroplating layer of the remote part). The port portion is subjected to some micro-grinding modification, that is, after the electroplating is completed, it is only necessary to grind the thickened electroplating layer of the flow port portion to a predetermined size.

As described above, the processing method provided by the present invention only needs to perform grinding and modification on the runner opening, which can indeed achieve the purpose of shortening the process time and reducing the cost. Furthermore, the processing method provided by the present invention can make the thickness of the electroplating layer of the runner mouth part thicker (as described in the prior art above, the runner mouth part is the most easily worn place during use), while the remaining parts, That is, the thickness of the electroplating layer of the remote part is relatively thin, so that the purpose of obtaining a more wear-resistant and durable (improved product life) ball plug can be achieved.

The present invention also provides a ball plug, which is manufactured by the above-mentioned processing method for a ball plug of a diverter valve, and the ball plug comprises: a diverter flow channel, an outer diameter periphery and an electroplating layer . Wherein, the periphery of the outer diameter includes a flow channel mouth part and a remote part connected to each other, the flow channel mouth part is adjacent to the branch flow channel, and the remote part is Relative to the runner orifice portion, the plated layer is plated on the runner orifice portion and the remote portion, and the thickness of the plated layer on the runner orifice portion is thicker than that of the remote portion.

1: Ball plug

11: Around the outer diameter

12: Split flow channel

13: runner mouth part

14: Stay Away from the Section

15: Insulation layer

16: Electroplating layer

9: Ball plug

91: perimeter of outer diameter

92: Electroplating layer

93: runner mouth part

94: Split flow channel

95: Insulation layer

t1: Smaller cutting thickness

t2: Larger cutting thickness

S01~S05: Steps

FIG. 1 is a cross-sectional view of a conventional ball plug after electroplating.

FIG. 2 is an enlarged schematic view of part X of FIG. 1 .

3 is a perspective view of a ball plug according to a preferred embodiment of the present invention.

4 is a cross-sectional view of a ball plug according to a preferred embodiment of the present invention.

FIG. 5 is a flow chart of a preferred embodiment of the present invention.

FIG. 6 is a schematic diagram of one of the implementation steps of a preferred embodiment of the present invention.

FIG. 7 is a second schematic diagram of the implementation steps of the preferred embodiment of the present invention.

FIG. 8 is a third schematic diagram of the implementation steps of the preferred embodiment of the present invention.

FIG. 9 is a fourth schematic diagram of the implementation steps of the preferred embodiment of the present invention.

Please refer to FIG. 3 and FIG. 4 at the same time, wherein FIG. 3 is a perspective view of a ball plug according to a preferred embodiment of the present invention, and FIG. 4 is a cross-sectional view of a ball plug according to a preferred embodiment of the present invention. A ball plug 1 for a diverter valve (not shown) is shown in FIG. 3 and FIG. 4 , and it is manufactured by the processing method provided by the present invention.

The ball plug 1 shown in FIGS. 3 and 4 includes a branched flow channel 12 , an outer diameter periphery 11 and an electroplating layer 16 . The outer diameter periphery 11 includes a runner port portion 13 and a distance portion 14 that are connected to each other. The runner port portion 13 is adjacent to the branch flow channel 12 , and the remote portion 14 is relative to the runner port portion 13 and away from the branch flow channel. 12; The electroplating layer 16 is electroplated on the runner opening portion 13 and the remote portion 14, and the thickness of the electroplating layer 16 in the runner opening portion 13 is thicker than that in the remote portion 14.

The processing method of the above-mentioned ball plug 1 for a diverter valve (not shown) will be described in detail below. In addition, the cross-sectional view of FIG. 4 shows a Y part, which is the part of the ball plug 1 adjacent to the runner opening part 13, and the subsequent drawings (FIGS. 5 to 9) will be shown as enlarged views of the Y part so as to facilitate the In the description, in order to make the processing method provided by the present invention more clear.

Please refer to FIG. 5 , which is a flowchart of a preferred embodiment of the present invention, and please refer to FIG. 3 and FIG. 4 at the same time. In the processing method of the ball plug 1 for a diverter valve provided by the present invention, a ball plug 1 is first provided (step S01 ). As mentioned above, the ball plug 1 includes an outer diameter periphery 11 and a diverter flow The channel 12, wherein the outer diameter periphery 11 includes a flow channel mouth portion 13 and a distance portion 14 connected to each other, the flow channel mouth portion 13 is adjacent to the branch flow channel 12, and the distance portion 14 is relative to the flow channel mouth portion 13. The outward flow channel 12, that is, the outer diameter periphery 11, is connected and connected by the flow channel opening portion 13 adjacent to the branch flow channel 12 to the remote portion 14 away from the branch flow channel 12 (as shown in Figs. 3 and 4).

Please refer to FIG. 5 and FIG. 6 at the same time, wherein FIG. 6 is one of the schematic diagrams of the implementation steps of the preferred embodiment of the present invention, and please refer to FIG. 3 and FIG. 4 at the same time. After the above step S01, the outer diameter periphery 11 of the ball plug 1 is machined. In this machining step, a smaller cutting thickness t1 of the remote portion 14 is progressively machined to the runner. One of the mouth portions 13 has a larger cutting thickness t2 (step S02) (as shown in FIG. 6, in which the cut-off portion is indicated by a broken line). In other words, the remote portion 14 of the outer diameter periphery 11 of the ball plug 1 is machined to have a small cutting thickness t1 , and then the cutting thickness is gradually increased toward the runner opening portion 13 in a progressive manner, and then cutting to the runner opening portion 13 . A larger cutting thickness t2.

Please refer to FIG. 5 and FIG. 7 at the same time, wherein FIG. 7 is the second schematic diagram of the implementation steps of the preferred embodiment of the present invention, and please refer to FIG. 3 and FIG. 4 at the same time. After the above-mentioned step S02, an insulating layer 15 is sprayed onto the branch flow channel 12 and the flow channel opening portion 13 (step S03) (as shown in FIG. 7).

Please refer to FIG. 5 and FIG. 8 at the same time, wherein FIG. 8 is the third schematic diagram of the implementation steps of the preferred embodiment of the present invention, and please refer to FIG. 3 and FIG. 4 at the same time. After the above step S03, an electroplating layer 16 is electroplated on the runner opening portion 13 and the remote portion 14, and the thickness of the electroplating layer 16 on the runner opening portion 13 is deposited thicker than the thickness of the remote portion 14 by the current insulation of the insulating layer 15. (Step S04) (as shown in FIG. 8). In other words, since the runner opening portion 13 is sprayed with the insulating layer 15 , the current cannot pass through the runner opening portion 13 during electroplating, so the plating layer 16 will gradually accumulate and thicken on the runner opening portion 13 .

Please refer to FIG. 5 and FIG. 9 at the same time, wherein FIG. 9 is the fourth schematic diagram of the implementation steps of the preferred embodiment of the present invention, and please refer to FIG. 3 and FIG. 4 at the same time. After the above step S04, the electroplating layer 16 of the runner opening 13 is ground to a predetermined size (step S05) (as shown in FIG. 9). The predetermined size is the predetermined size. In other words, the plating layer 16 of the outer diameter periphery 11 of the ball plug 1 away from the portion 14 will not be deformed, and no grinding process is required, and only the thickened plating layer needs to be deposited on the runner opening portion 13 16 is slightly micro-grinding to the required size. At this time, the thickness of the plating layer 16 of the runner opening portion 13 is greater than the thickness of the plating layer 16 of the remote portion 14. The ball plug 1 can be obtained.

Finally, since the main function of the insulating layer 15 is to prevent the electroplating layer 16 from being present in the branch flow channel 12 during electroplating, the insulating layer 15 will be removed when the electroplating is completed (step S06 ).

As described above, with the above-mentioned processing method, after the ball plug 1 is electroplated, it is only necessary to perform micro-grinding processing on the runner opening 13 , which can indeed shorten the processing time of the ball plug 1 and relatively reduce the cost.

In addition, as described in the prior art above, the runner port portion 13 is the most easily worn place, and by the processing method provided by the present invention, the thickness of the electroplating layer 16 of the runner port portion 13 can be thicker, and the rest The thickness of the electroplating layer 16 in the part, that is, the part away from the part 14, is relatively thin, that is, the thick electroplating layer 16 through the runner opening part 13 can make the ball plug 1 more wear-resistant and durable during use, and relatively improve the performance of the ball. Service life of plug 1.

The above descriptions are only preferred specific embodiments of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the present invention. within the scope of protection.

S01~S06: Steps

Claims (2)

A processing method for a ball plug of a diverter valve, comprising the following steps: Provide a ball plug, the ball plug includes an outer diameter periphery and a branch flow channel, and the outer diameter periphery includes a flow channel mouth part and a remote part connected to each other, the flow channel mouth part is adjacent to the branch flow channel , the remote part is away from the branch flow channel relative to the flow channel mouth part; Machining the periphery of the outer diameter, which is progressively machined from a smaller cutting thickness of the remote portion to a larger cutting thickness of the runner opening portion; spraying an insulating layer to the runner and the mouth of the runner; Electroplating an electroplating layer to the runner opening portion and the remote portion, and the thickness of the electroplating layer on the runner opening portion is deposited thicker than the thickness of the remote portion due to the current insulation of the insulating layer; grinding the plated layer of the runner opening portion to a predetermined size; and Remove the insulating layer. A ball plug is manufactured by the processing method for a ball plug for a diverter valve as described in the first item of the patent application scope, and the ball plug comprises: A split flow channel; an outer diameter perimeter, the outer diameter perimeter includes a flow channel opening part and a distance part connected to each other, the flow channel opening part is adjacent to the branch flow channel, the distance part is away from the branch direction relative to the flow channel opening part runner; and An electroplating layer is electroplated on the runner opening part and the remote part, and the thickness of the electroplating layer on the runner opening part is thicker than that of the remote part.

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