TWI742642B - Electrical connection assembly with oblique guide wire type conductive film - Google Patents
Electrical connection assembly with oblique guide wire type conductive film Download PDFInfo
- Publication number
- TWI742642B TWI742642B TW109114910A TW109114910A TWI742642B TW I742642 B TWI742642 B TW I742642B TW 109114910 A TW109114910 A TW 109114910A TW 109114910 A TW109114910 A TW 109114910A TW I742642 B TWI742642 B TW I742642B
- Authority
- TW
- Taiwan
- Prior art keywords
- conductive film
- film
- electrical connection
- insulating sheet
- contact
- Prior art date
Links
Images
Abstract
一種具有斜向導線式導電膠片的電連接組件,其包括一導電膠片與一電連接位差補償構造,導電膠片包括一膠片本體以及間隔分布於膠片本體內且同向傾斜的多數斜向導線,電連接位差補償構造設置於導電膠片的一側且包括間隔分布之多個位差補償傳導路徑,每一位差補償傳導路徑電連接對應的斜向導線的一端,每一所述位差補償傳導路徑包括一對位接點,且每一所述位差補償傳導路徑之對位接點的位置與其電連接之所述斜向導線的另一端的位置沿著該膠片本體高度方向直線對應,解決現有單片斜向導線式導電膠片應用於檢測系統中,待測半導體元件相對於電路載板之電路接點之位差問題。An electrical connection assembly with oblique guide-line conductive film, which includes a conductive film and an electrical connection offset compensation structure. The conductive film includes a film body and a plurality of oblique guide wires that are spaced apart in the film body and inclined in the same direction, The electrical connection displacement compensation structure is arranged on one side of the conductive film and includes a plurality of displacement compensation conduction paths distributed at intervals, and each displacement compensation conduction path is electrically connected to one end of a corresponding oblique guide wire, and each displacement compensation The conduction path includes a pair of position contacts, and the position of the position contact point of each of the position difference compensation conduction paths corresponds to the position of the other end of the oblique guide wire electrically connected along the height direction of the film body. Solve the problem of the position difference between the semiconductor component to be tested and the circuit contact of the circuit carrier board when the existing monolithic oblique guide conductive film is used in the detection system.
Description
本發明係關於一種電連接組件,尤指一種能改善單片斜向導線式導電膠片之電連接位差功能之電連接組件。 The present invention relates to an electrical connection assembly, in particular to an electrical connection assembly that can improve the electrical connection position difference of a monolithic diagonal conductive film.
目前現有半導體元件檢測系統中,其主要係以探針組件或是導電膠片等作為電連接裝置,提供待測半導體元件檢測時訊號傳輸的媒介。 At present, in the current semiconductor component inspection system, the probe assembly or conductive film is mainly used as an electrical connection device to provide a signal transmission medium during the inspection of the semiconductor component under test.
前述之探針式電連接裝置或導電膠片式電連接裝置於半導體元件檢測系統各有其特點,其中,探針式電連接裝置所使用之探針,其主要工作形式是直立直線式,而其工作原理為直上直下的傳導路徑,故每一探針接觸於待測半導體元件的接點的位置與電路載板之接點位置,基本上是上下相對而沒有位差的。至於導電膠片式電連接裝置,其主要係採用單一片具有多數斜向導線的導電膠片,並利用一治具座將該導電膠片裝設在半導體元件檢測系統的電路載板上,使待測半導體元件被移置導電膠片上,並下壓待測半導體元件,使半導體元件底部的每一接點分別經由對應位置的斜向導線電連接電路載板之對應的接點,再由半導體元件檢測系統經由電路載板、導電膠片對待測半導體元件執行檢測作業。 The aforementioned probe-type electrical connection device or conductive film-type electrical connection device has its own characteristics in the semiconductor component inspection system. Among them, the probe used in the probe-type electrical connection device mainly works in an upright linear type. The working principle is a straight-up and straight-down conduction path, so the contact position of each probe contacting the semiconductor component under test and the contact position of the circuit carrier board are basically opposite from top to bottom without any position difference. As for the conductive film type electrical connection device, it mainly uses a single piece of conductive film with many oblique conductors, and uses a fixture seat to install the conductive film on the circuit carrier of the semiconductor component inspection system, so that the semiconductor to be tested The component is placed on the conductive film, and the semiconductor component to be tested is pressed down, so that each contact at the bottom of the semiconductor component is electrically connected to the corresponding contact of the circuit carrier through the diagonal conductor at the corresponding position, and then the semiconductor component inspection system Perform inspection operations on semiconductor components to be tested via circuit carrier boards and conductive films.
惟現有單片斜向導線式導電膠片應用於半導體元件檢測系統中,因導電膠片為使其多數導線於下壓時,每一受壓的導線均能朝預定方向彎曲,且下壓力量移除後,每一導線能回復起始的狀態,故現有導電膠片中之多數導線皆呈同向傾斜預定角度,而為斜向導線,因此,半導體元件之接點接觸斜向導線式導電膠片之位置因斜向導線之關係,而相對於半導體元件檢測系統 之電路載板之接點位置產生位差。因此,單片斜向導線式導電膠片的傳導路徑的位差,造成現有單片斜向導線式導電膠片不能與探針式電連接裝置共用相同的測試分類機的接合機構,因而增加檢測系統因使用不同形式電連接裝置互換的困難。 However, the existing monolithic diagonal conductive film is used in the semiconductor component inspection system, because the conductive film makes most of the wires pressed down, each pressed wire can bend in a predetermined direction, and the amount of down force is removed Afterwards, each wire can return to the initial state, so most of the wires in the current conductive film are inclined at a predetermined angle in the same direction, and are diagonally guided. Therefore, the contact point of the semiconductor element contacts the position of the diagonally guided conductive film Due to the oblique guide line, relative to the semiconductor component inspection system The position of the contact point of the circuit carrier board produces a position difference. Therefore, the position difference of the conduction path of the monolithic oblique guide conductive film causes that the existing monolithic oblique guide conductive film cannot share the same bonding mechanism of the test sorting machine with the probe type electrical connection device, thus increasing the detection system factor Difficulties in using different forms of electrical connection devices to interchange.
本發明之目的在於提供一種具有斜向導線式導電膠片的電連接組件,解決單片斜向導線式導電膠片之電連接位差之問題。 The purpose of the present invention is to provide an electrical connection assembly with oblique wire-guided conductive film, which solves the problem of electrical connection position difference of a single-chip oblique wire-guided conductive film.
為了達成前述目的,本發明所提出之具有斜向導線式導電膠片的電連接組件係包括:一導電膠片,其包括一膠片本體,以及間隔分布於該膠片本體內且相對於膠片本體之厚度方向呈同向傾斜的多數斜向導線;以及一電連接位差補償構造,其係設置於該導電膠片之厚度方向的一側,且該電連接位差補償構造包括間隔分布之多個位差補償傳導路徑,每一所述位差補償傳導路徑相異的兩端分別為一導線接觸部與一電接觸部,每一所述位差補償傳導路徑的導線接觸部係能電性接觸其位置對應的所述斜向導線的一端,每一所述位差補償傳導路徑的電接觸部偏位於同一所述導線接觸部的一側邊具有一對位接點,且每一所述位差補償傳導路徑之對位接點的位置與同一所述位差補償傳導路徑電連接之斜向導線的另一端的位置係沿著該膠片本體厚度方向呈直線相對應。 In order to achieve the foregoing objective, the electrical connection assembly with diagonal conductive film provided by the present invention includes: a conductive film, which includes a film body, and is distributed in the film body at intervals relative to the thickness direction of the film body A plurality of oblique guide wires inclined in the same direction; and an electrical connection level difference compensation structure, which is arranged on one side of the thickness direction of the conductive film, and the electrical connection level difference compensation structure includes a plurality of gap compensations distributed at intervals Conduction paths, the two ends of each of the displacement compensation conduction paths are respectively a wire contact part and an electrical contact part, and the wire contact part of each of the displacement compensation conduction paths can electrically contact its corresponding position One end of the oblique guide wire, the electrical contact part of each of the displacement compensation conduction paths is eccentrically located on one side of the same wire contact part with a pair of position contacts, and each of the displacement compensation conduction The position of the alignment contact of the path corresponds to the position of the other end of the oblique guide wire electrically connected to the same displacement compensation conductive path in a straight line along the thickness direction of the film body.
藉由前述電連接組件之組成構造發明,其主要係利用電連接位差補償構造與具有斜向導線之導電膠片之組合,其中利用電連接位差補償構造間隔分布之多個位差補償傳導路徑,每一位差補償傳導路徑電連接對應的斜向導線的一端,且每一位差補償傳導路徑中之對位接點的位置與其電連接之斜向導線的另一端的位置沿著該膠片本體高度方向(上下)直線對應,使電連接組件 與檢測系統之電路載板的電連接位置與待測半導體元件電接觸電連接組件之位置呈上下直線對應關係,解決現有單片斜向導線式導電膠片應用於檢測系統中,待測半導體元件相對於電路載板之電路接點因斜向導線產生之位差問題。因此,藉由本發明具有斜向導線式導電膠片的電連接組件克服了電連接位差之問題,使其能夠與現有的探針式電連接裝置共用相同的測試分類機的接合機構,解決現有檢測系統難以使用不同形式電連接裝置之問題。 The invention is based on the composition of the aforementioned electrical connection components, which mainly utilizes the combination of an electrical connection level difference compensation structure and a conductive film with oblique guide lines, wherein the electrical connection level difference compensation structure is used to construct a plurality of gap compensation conductive paths distributed at intervals , Each level difference compensation conduction path is electrically connected to one end of the corresponding oblique guide wire, and the position of the alignment contact in each level difference compensation conduction path and the position of the other end of the oblique guide wire electrically connected along the film The height direction (up and down) of the main body corresponds to a straight line, so that the electrical connection components The electrical connection position of the circuit carrier board of the detection system and the position of the electrical contact of the semiconductor component under test are in a straight line up and down. This solves the problem that the existing monolithic diagonal conductive film is used in the detection system, and the semiconductor component under test is opposite. The position difference of the circuit contacts on the circuit carrier board due to the oblique conductor. Therefore, the electrical connection assembly with diagonal conductive film of the present invention overcomes the problem of electrical connection position difference, so that it can share the same bonding mechanism of the test sorting machine with the existing probe-type electrical connection device, and solve the existing detection The system is difficult to use different forms of electrical connection devices.
1A:電連接組件 1A: Electrical connection components
1B:電連接組件 1B: Electrical connection components
1C:電連接組件 1C: Electrical connection components
10:導電膠片 10: Conductive film
11:膠片本體 11: Film body
12:斜向導線 12: Diagonal guide line
20A:電連接位差補償構造 20A: Electric connection displacement compensation structure
21A:位差補償傳導路徑 21A: Displacement compensation conduction path
211A:導線接觸部 211A: Wire contact part
212A:電接觸部 212A: Electrical contact
213A:對位接點 213A: Counterpoint contact
22A:電路膜片 22A: Circuit diaphragm
23A:絕緣片體 23A: Insulating sheet body
24A:導電體 24A: Conductor
241A:接地路徑 241A: Ground path
25A:絕緣層 25A: Insulation layer
20B:電連接位差補償構造 20B: Electric connection displacement compensation structure
21B:位差補償傳導路徑 21B: Displacement compensation conduction path
211B:導線接觸部 211B: Wire contact part
212B:電接觸部 212B: Electrical contact
213B:對位接點 213B: counterpoint contact
22B:電路膜片 22B: Circuit diaphragm
23B:絕緣片體 23B: Insulating sheet body
24B:導電體 24B: Conductor
241B:接地路徑 241B: Ground path
25B:絕緣層 25B: Insulation layer
26B:元件電連接片 26B: component electrical connection piece
261B:絕緣基材 261B: Insulating base material
262B:電接觸墊 262B: Electrical contact pad
263B:上電接觸點 263B: Power-on contact
264B:下電接觸點 264B: Power-off contact point
265B:接地線路 265B: Ground line
20C:電連接位差補償構造 20C: Electric connection displacement compensation structure
21C:位差補償傳導路徑 21C: Displacement compensation conduction path
211C:導線接觸部 211C: Wire contact part
212C:電接觸部 212C: Electrical contact
213C:對位接點 213C: counterpoint contact
22C:電路膜片 22C: Circuit diaphragm
23C:絕緣片體 23C: Insulating sheet body
24C:導電體 24C: Conductor
241C:上接點 241C: Upper contact
242C:下接點 242C: Lower contact
243C:接地路徑 243C: Ground path
25C:導電膠輔片 25C: Conductive adhesive auxiliary sheet
251C:膠片基材 251C: Film substrate
252C:傾斜導線 252C: Inclined wire
26C:元件電連接片 26C: Component electrical connection piece
261C:絕緣基材 261C: Insulating base material
262C:電接觸墊 262C: Electrical contact pad
263C:上電接觸點 263C: Power-on contact
264C:下電接觸點 264C: Power-off contact point
265C:接地線路 265C: Ground line
30:待測半導體元件 30: Semiconductor components to be tested
31:接點 31: Contact
40:電路載板 40: circuit carrier board
41:電路接點 41: circuit contact
圖1係本發明具有斜向導線式導電膠片的電連接組件之第一較佳實施例之平面示意圖。 FIG. 1 is a schematic plan view of the first preferred embodiment of the electrical connection assembly with diagonal conductive film of the present invention.
圖2係圖1所示具有斜向導線式導電膠片的電連接組件第一較佳實施例應用於半導體檢測系統之電路載板上,執行半導體元件檢測作業之使用狀態參考圖。 2 is a reference diagram of the first preferred embodiment of the electrical connection assembly with diagonal conductive film shown in FIG.
圖3係本發明具有斜向導線式導電膠片的電連接組件之第二較佳實施例之平面示意圖。 Fig. 3 is a schematic plan view of the second preferred embodiment of the electrical connection assembly with diagonal conductive film of the present invention.
圖4係圖3所示具有斜向導線式導電膠片的電連接組件第二較佳實施例應用於半導體檢測系統之電路載板上,執行半導體元件檢測作業之使用狀態參考圖。 4 is a reference diagram of the second preferred embodiment of the electrical connection assembly with diagonal conductive film shown in FIG.
圖5係圖3所示具有斜向導線式導電膠片的電連接組件第二較佳實施例增設元件電連接片之平面示意圖。 FIG. 5 is a schematic plan view of an additional component electrical connection piece of the second preferred embodiment of the electrical connection assembly with diagonal conductive film shown in FIG. 3. FIG.
圖6係圖5所示具有斜向導線式導電膠片的電連接組件較佳實施例應用於半導體檢測系統之電路載板上,執行半導體元件檢測作業之使用狀態參考圖。 6 is a reference diagram of a preferred embodiment of the electrical connection assembly with diagonal conductive film shown in FIG. 5 applied to a circuit carrier of a semiconductor inspection system to perform semiconductor component inspection operations.
圖7本發明具有斜向導線式導電膠片的電連接組件之第三較佳實施例之平面示意圖。 Fig. 7 is a schematic plan view of the third preferred embodiment of the electrical connection assembly with oblique wire-guided conductive film according to the present invention.
圖8係圖7所示具有斜向導線式導電膠片的電連接組件第三較佳實施例應用於半導體檢測系統之電路載板上,執行半導體元件檢測作業之使用狀態參考圖。 8 is a reference diagram of the third preferred embodiment of the electrical connection assembly with diagonal conductive film shown in FIG. 7 applied to a circuit carrier of a semiconductor inspection system to perform semiconductor component inspection operations.
圖9係圖7所示具有斜向導線式導電膠片的電連接組件第三較佳實施例增設元件電連接片之平面示意圖。 FIG. 9 is a schematic plan view of an additional component electrical connection piece of the third preferred embodiment of the electrical connection assembly with diagonal conductive film shown in FIG. 7.
圖10係圖9所示具有斜向導線式導電膠片的電連接組件較佳實施例應用於半導體檢測系統之電路載板上,執行半導體元件檢測作業之使用狀態參考圖。 FIG. 10 is a reference diagram of a preferred embodiment of the electrical connection assembly with diagonal conductive film shown in FIG. 9 applied to a circuit carrier of a semiconductor inspection system to perform semiconductor component inspection operations.
本發明係提供用於半導體元件檢測系統之電路載板與待測半導體元件之間的電性連接的媒介,本發明具有斜向導線式導電膠片的電連接組件依據前述發明內容揭示之技術手段,請配合參看圖1、圖3、圖5、圖7及圖9所示,所述具有斜向導線式導電膠片的電連接組件1A、1B、1C主要係包括一導電膠片10與一電連接位差補償構造20A、20B、20C。所述該導電膠片10包括一膠片本體11,以及間隔分布於膠片本體11內且相對於膠片本體11厚度方向(上下方向)呈同向傾斜的多數斜向導線12,該電連接位差補償構造20A、20B、20C係設置於該導電膠片10的一側(上側或下側),且該電連接位差補償構造20A、20B、20C包括間隔分布之多個位差補償傳導路徑21A、21B、21C,每一所述位差補償傳導路徑21A、21B、21C相異的兩端分別為一導線接觸部211A、211B、211C與一電接觸部212A、212B、212C,每一所述位差補償傳導路徑21A、21B、21C的導線接觸部211A、211B、211C係能電性接觸其位置對應的斜向導線12的一端(上端或下端),每一所述位差補償傳導路徑21A、21B、21C的電接觸部212A、212B、212C具有橫向偏位於該導線接觸部211A、211B、211C一側的一對位接點213A、213B、213C,且每一所述位差補償傳導路徑21A、21B、21C之對位接點213A、213B、213C的位置與同一所述位差補償傳
導路徑21A、21B、21C電連接之斜向導線12的另一端的位置係沿著該膠片本體11厚度方向(上下方向)直線相對應。
The present invention provides a medium for the electrical connection between the circuit carrier board of the semiconductor component inspection system and the semiconductor component to be tested. The electrical connection assembly with diagonal conductive film of the present invention is based on the technical means disclosed in the foregoing content of the invention. Please refer to FIG. 1, FIG. 3, FIG. 5, FIG. 7 and FIG. 9. The
基於前述技術手段之基礎,本發明至少可以下列數種具體可行的較佳實施例予以實現。以下分別就每一較佳實施例配合圖式詳加說明。 Based on the foregoing technical means, the present invention can be implemented at least in the following specific and feasible preferred embodiments. The following is a detailed description of each preferred embodiment in conjunction with the drawings.
如圖1所示,其揭示本發明電連接組件1A之第一較佳實施例,由圖式中可以見及,該電連接組件1A包括一導電膠片10,以及設置於導電膠片10之膠片本體11之上側的一電連接位差補償構造20A,該導電膠片10之構造係同上所述,其包括一膠片本體11,以及分布於該膠片本體11中且相對於膠片本體11厚度方向(上下方向)呈同向傾斜的多數斜向導線12,所述斜向導線12可以選用金線或其他具有電性連接特性之導線,多數所述斜向導線12係自膠片本體11之上側同向傾斜延伸至該膠片本體11之下側。
As shown in FIG. 1, it discloses the first preferred embodiment of the
如圖1所示,該電連接位差補償構造20A包括一電路膜片22A,該電路膜片22A包括一絕緣片體23A、多個導電體24A以及一絕緣層25A,該絕緣片體23A之下表面面向該導電膠片10,多個所述導電體24A係間隔分布於該絕緣片體23A中,每一所述導電體24A皆自絕緣片體23A的上表面通過絕緣片體23A延伸至絕緣片體23A的下表面,且每一所述導電體24A皆包括位於該絕緣片體23A的下表面的一導線接觸部211A以及位於該絕緣片體23A的上表面的一電接觸部212A,所述電接觸部212A具有橫向偏位於該導線接觸部211A一側的一所述對位接點213A,該絕緣層25A係覆設於該絕緣片體23A之上表面,且每一所述導電體24A的電接觸部212A的對位接點213A分別顯露於絕緣層25A上表面,所述導線接觸部211A能分別電性接觸該導電膠片10中位置對應之斜向導線12的上端,每一所述導電體24A之對位接點213A的位置與該導電體24A電連接之斜向導線12的下端的位置係沿著該膠片本體11高度方向(上下)直線對應,使該電路膜片22A之每一所述導電體24A分別構成一所述位差補償傳導路徑21A。
As shown in FIG. 1, the electrical connection level
如圖1所示,前述的電路膜片22A中,該絕緣層25A之厚度依據待測半導體元件底面之每一接點皆能分別電接觸該電路膜片22A對應位置之導電體24A的電接觸部212A之距離而設定,同時待測半導體元件之底面也能經由絕緣層25A平均施壓在絕緣片體23A上,使每一導電體24A能分別對該導電膠片10之斜向導線12的上端施以下壓力。
As shown in FIG. 1, in the
如圖1所示,所述電路膜片22A還包括一接地路徑241A,所述接地路徑241A能電性接觸該導電膠片10中非電連接導電體24A之斜向導線12,即所述接地路徑241A與所述導電體24A及其電連接之導電膠片10中位置對應之斜向導線12相互隔離,使所述接地路徑241A不連通所述位差補償傳導路徑21A及其連接導電膠片10中位置對應的斜向導線12。
As shown in FIG. 1, the
關於電連接組件1A第一較佳實施例應用於半導體元件檢測作業之使用情形,如圖2所示,該電連接組件1A係裝設於半導體元件檢測系統之電路載板40上,電路載板40上表面的電路接點41分別與該電連接組件1A中位置在下的導電膠片10對應位置之斜向導線12的下端電接觸,並以該電連接位差補償構造20A之電路膜片22A作為待測半導體元件30電接觸的媒介。
Regarding the use of the first preferred embodiment of the
前述中,待測半導體元件30被移置該電連接組件1A的正上方後,並垂直下壓在該電路膜片22A上,待測半導體元件30底面的每一接點31分別與該電路膜片22A中對應位置之導電體24A的電接觸部212A,同時待測半導體元件30底面經由絕緣層25A平均施壓在絕緣片體23A上,使每一導電體24A皆能分別對該導電膠片10之斜向導線12的上端施以下壓力,進而使待測半導體元件30之每一接點31分別經由電路膜片22A對應位置之導電體及其電連接之導電膠片之斜向導線12而電連接該電路載板40,如此,半導體元件檢測系統即能透過電路載板40及電連接組件1A對待測半導體元件30執行檢測作業。
In the foregoing, after the
於檢測作業中,還能透過電連接組件1A中之電路膜片22A之接地路徑241A及其電連接的導電膠片10之斜向導線12電連接電路載板40中之接地電路,用以接地。前述中,該電連接組件1A還能藉由電路膜片22A設置在導電膠片10之上方,避免待測半導體元件30之接點31表面之氧化皮膜殘屑附著在導電膠片10上,以利氧化皮膜殘屑之清除並提高導電膠片10的耐用性。
In the detection operation, the
如圖3所示,其揭示本發明電連接組件1B之第二較佳實施例,由圖式中可以見及,該電連接組件1B包括一導電膠片10以及一電連接位差補償構造20B,該導電膠片10之構造係同上所述,其包括一膠片本體11,以及分布於該膠片本體11中且相對於膠片本體11厚度方向呈同向傾斜的多數斜向導線12,所述斜向導線12可以選用金線或其他具有電性連接特性之導線。於本較佳實施例中,該膠片本體11之厚度方向(上下方向)相對兩側分別為一上側與一下側,多數所述斜向導線12係自膠片本體11之上側同向傾斜延伸至膠片本體11之下側。
As shown in FIG. 3, it discloses a second preferred embodiment of the
如圖3所示,該電連接位差補償構造20B係設置於導電膠片10之膠片本體11之下側,該電連接位差補償構造20B具有一電路膜片22B,該電路膜片22B包括一絕緣片體23B、多個導電體24B以及一絕緣層25B,該絕緣片體23B之上表面面向該導電膠片10之底面,多個所述導電體24B係間隔分布於該絕緣片體23B中,每一所述導電體24B皆自絕緣片體23B的上表面通過絕緣片體23B延伸至絕緣片體23B的下表面,且每一所述導電體24B皆包括位於該絕緣片體23B之下表面的一電接觸部212B以及位於於該絕緣片體23B之上表面的一導線接觸部211B,該絕緣層25B覆設於該絕緣片體23B之上表面,每一所述導電體24B的導線接觸部211B顯露於絕緣層25B的上表面,且所述導線接觸部211B電性接觸該導電膠片10中位置對應之斜向導線12的下端,所述電接觸部212B具有橫向偏位於該導線接觸部211B一側的一對位接點213B,每一所述導電體24B之
對位接點213B的位置與該導電體24B電連接之斜向導線12的上端的位置係沿著該膠片本體11高度方向(上下)直線對應,使該電路膜片22B之每一所述導電體24B分別構成一位差補償傳導路徑21B。
As shown in FIG. 3, the electrical connection level
如圖3所示,所述電路膜片22B還包括一接地路徑241B,所述接地路徑241B能電性接觸該導電膠片10中非電連接導電體24B之斜向導線12,即所述接地路徑241B與所述導電體24B及其電連接之導電膠片10中位置對應之斜向導線12相互隔離,所述接地路徑241B自面向該導電膠片10之絕緣片體23B之上表面延伸至絕緣片體23B之下表面,且所述接地路徑241B於絕緣片體23B之下表面形成至少一接地接點。所述接地接點係用以連接電路載板之接地電路。
As shown in FIG. 3, the
如圖5所示,該電連接組件1B還包括一元件電連接片26B,該元件電連接片26B係設置於導電膠片10之膠片本體11之上側,該元件電連接片26B包括一絕緣基材261B以及多個電接觸墊262B,多個所述電接觸墊262B係間隔分布於絕緣基材261B中,所述電接觸墊262B皆自絕緣基材261B的上側面通過絕緣基材261B延伸至絕緣基材261B的下側面,且每一所述電接觸墊262B皆包括顯露於絕緣基材261B上側面之一上電接觸點263B以及顯露於絕緣基材261B下側面之下電接觸點264B,每一所述下電接觸點264B分別通過導電膠片10中的位置對應的斜向導線12電連接所述電路膜片22B之位差補償傳導路徑21B。
As shown in FIG. 5, the
如圖5所示,所述電路膜片22B除了如前所述增設一接地路徑241B之外,該元件電連接片26B還包括一接地線路265B,該接地線路265B係與所述電接觸墊262B及其電連接之導電膠片10中位置對應之斜向導線12相互隔離,該接地線路265B自該絕緣基材261B之上側面延伸至絕緣基材261B之下側面,且該接地線路265B能通過所述導電膠片10中位置對應的斜向導線12電連接該電路膜片22B之接地路徑241B。
As shown in FIG. 5, in addition to adding a
關於電連接組件第二較佳實施例應用於半導體元件檢測作業之使用情形,如圖4及圖5所示,該電連接組件1B係裝設於半導體元件檢測系統之電路載板40上,電路載板40上表面的電路接點41分別與該電連接組件1B中位置在下的電路膜片22B對應位置之導電體24B之電連接觸部212B接觸,以導電膠片10作為待測半導體元件30電接觸的媒介,或是以位於導電膠片10上的元件電連接片26B作為待測半導體元件30電接觸的媒介。
Regarding the use of the second preferred embodiment of the electrical connection assembly for semiconductor component inspection operations, as shown in FIGS. 4 and 5, the
待測半導體元件30被移置該電連接組件1B的正上方後,並垂直下壓在該導電膠片10中位置對應之斜向導線12的上端施以下壓力,使待測半導體元件30之每一接點31分別經由導電膠片10中位置對應之斜向導線12以及其電連接之電路膜片22B對應位置之導電體24B而電連接該電路載板40相對應的電路接點41,如此,半導體元件檢測系統即能透過電路載板40及電連接組件1B對待測半導體元件30執行檢測作業。
After the
或者,待測半導體元件30被移置該電連接組件1B的正上方後,並垂直下壓在該電路膜片22B上,待測半導體元件30底面的每一接點31分別與該元件電連接片26B中對應位置之電接觸墊262B接觸,同時,經由元件電連接件26B之下電接觸點264B施壓在導電膠片10上,進而經由導電膠片10中對應下電接觸點264B位置之斜向導線12的上端施以下壓力,使待測半導體元件30之每一接點31分別經由元件電連接片26B、導電膠片10以及電路膜片22B電連接該電路載板40相對應的電路接點41,如此,半導體元件檢測系統即能透過電路載板40及電連接組件1B對待測半導體元件30執行檢測作業。
Alternatively, after the
於檢測作業中,還能透過電連接組件1B中之電路膜片22B之接地路徑241B結合其電連接的導電膠片10之斜向導線12電連接電路載板40中之接地電路,用以接地。或是元件電連接片26B中之接地線路265B通過位置對應之導電膠片10中之斜向導線12以及電路膜片22B之接地路徑241B電連接電路載板
40中之接地電路,用以接地。此外,該電連接組件1B還能藉由元件電連接片26B設置在導電膠片10之上方,避免待測半導體元件30之接點31表面之氧化皮膜殘屑附著在導電膠片10上,以利氧化皮膜殘屑之清除並提高導電膠片10的耐用性。
In the detection operation, the
如圖7所示,其揭示本發明電連接組件1C之第三較佳實施例,由圖式中可以見及,該電連接組件1C同樣包括一導電膠片10以及一電連接位差補償構造20C,該導電膠片10之構造係同上所述,其包括一膠片本體11,以及分布於該膠片本體11中且相對於膠片本體11厚度方向(上下方向)呈同向傾斜的多數斜向導線12,所述斜向導線12可以選用金線或其他具有電性傳輸特性之導線。於本較佳實施例中,多數所述斜向導線12係自膠片本體11之上側同向傾斜延伸至膠片本體11之下側。
As shown in FIG. 7, it discloses a third preferred embodiment of the
如圖7所示,該電連接位差補償構造20C係設置於該導電膠片10之下側,該電連接位差補償構造20C包括一電路膜片22C以及一導電膠輔片25C,該電路膜片22C包括一絕緣片體23C以及多個導電體24C,多個所述導電體24C係間隔分布於絕緣片體23C中,所述導電體24C皆自絕緣片體23C的上表面通過絕緣片體23C延伸至絕緣片體23C的下表面,且每一所述導電體24C皆包括顯露於絕緣片體23C上表面的一上接點241C以及顯露於絕緣片體23C下表面的下接點242C,且上接點241C之位置與下接點242C之位置呈上下直線相對,該電路膜片22C之上接點241C分別電性接觸該導電膠片10中位置對應之斜向導線12的下端。
As shown in FIG. 7, the electrical connection level
如圖7所示,該導電膠輔片25C裝設於該電路膜片22C的下側,該導電膠輔片25C包括一膠片基材251C,以及分布於該膠片基材251C中且相對於膠片基材251C厚度方向(上下方向)呈同向傾斜的多數傾斜導線252C,該導電膠輔片25C之傾斜導線252C與導電膠片10之斜向導線12互為反向傾斜,該電路
膜片22C的每一導電體24C結合其電連接之導電膠輔片25C之傾斜導線252C構成一位差補償傳導路徑21C,該電路膜片22C之下接點242C分別電性接觸該導電膠輔片25C中位置對應之斜向導線12的上端,且每一位差補償傳導路徑21C中之導電膠輔片25C之複數傾斜導線252C遠離電路膜片22C之底端構成一對位接點213C,且每一所述位差補償傳導路徑21C之對位接點213C的位置與該位差補償傳導路徑21C電連接之導電膠片10的斜向導線12的另一端的位置係沿著該膠片本體11高度方向(上下方向)直線對應。
As shown in FIG. 7, the conductive adhesive
如圖7所示,該電路膜片22C還包括一接地路徑243C,該接地路徑243C與每一所述導電體24C及其電連接之導電膠片10中位置對應之斜向導線12相互隔離,且該接地路徑243C與每一所述導電體24C電連接之導電膠輔片25C中位置對應之傾斜導線252C相互隔離,即該接地路徑243C自該電路膜片22C面向該導電膠片10之絕緣片體23C之上表面延伸至絕緣片體23C之下表面,且與所述位差補償傳導路徑21C相互隔離。
As shown in FIG. 7, the
如圖9所示,該電連接組件1C還包括一元件電連接片26C,該元件電連接片26C係設置於導電膠片10之膠片本體11之上側,該元件電連接片26C包括一絕緣基材261C以及多個電接觸墊262C,多個所述電接觸墊262C係間隔分布於絕緣基材261C中,所述電接觸墊262C皆自絕緣基材261B、261C的上側面通過絕緣基材261C延伸至絕緣基材261C的下側面,且每一所述電接觸墊262C皆包括顯露於絕緣基材261C的上側面的一上電接觸點263C以及顯露於絕緣基材261C的下側面的一下電接觸點264C,每一所述下電接觸點264C分別通過導電膠片10中的位置對應的斜向導線12電連接所述位差補償傳導路徑21C。
As shown in FIG. 9, the
如圖9所示,該元件電連接片26C還包括一接地線路265C,該接地線路265C與所述電接觸墊262C及其電連接之導電膠片10中位置對應之斜向導線12相互隔離,該接地線路265C自該絕緣基材261C之上側面延伸至下側面,且
該接地線路265C能通過該導電膠片10中位置對應的的斜向導線12而電連接該電路膜片22C之接地路徑243C以及該接地路徑243C電連接之該導電膠輔片25C中位置對應的傾斜導線252C。
As shown in FIG. 9, the component
關於電連接組件第三較佳實施例應用於半導體元件檢測作業之使用情形,如圖8及圖10所示,該電連接組件1C係裝設於半導體元件檢測系統之電路載板40上,電路載板40上表面的電路接點41分別與該電連接組件1C中位置在下的導電膠輔片25C對應位置之傾斜導線252C之下端接觸,以位置在上的導電膠片10作為待測半導體元件30電接觸的媒介,或是以位於導電膠片10上的元件電連接片26C作為待測半導體元件30電接觸的媒介。
Regarding the use of the third preferred embodiment of the electrical connection assembly for semiconductor component inspection operations, as shown in FIGS. 8 and 10, the
待測半導體元件30被移置該電連接組件1C的正上方後,並垂直下壓在該導電膠片10中位置對應之斜向導線12的上端施以下壓力,使待測半導體元件30之每一接點31分別經由導電膠片10中位置對應之斜向導線12以及其電連接之電路膜片22C對應位置之導電體24C、導電膠輔片25C對應位置之傾斜導線252C電連接該電路載板40相對應的電路接點41,如此,半導體元件檢測系統即能透過電路載板40及電連接組件1C對待測半導體元件30執行檢測作業。
After the
或者,待測半導體元件30被移置該電連接組件1C的正上方後,並垂直下壓在該電路膜片22C上,待測半導體元件30底面的每一接點31分別與該元件電連接片26C中對應位置之電接觸墊262C接觸,同時,經由元件電連接件26C之下電接觸點264C施壓在導電膠片10上,進而經由導電膠片10中對應下電接觸點264C位置之斜向導線12的上端施以下壓力,使待測半導體元件30之每一接點31分別經由元件電連接片26C、導電膠片10、電路膜片22C與導電膠輔片25C電連接該電路載板40相對應的電路接點41,如此,半導體元件檢測系統即能透過電路載板40及電連接組件1C對待測半導體元件30執行檢測作業。
Alternatively, after the
於檢測作業中,還能透過電連接組件1C中之電路膜片22C之接地路徑243C結合其電連接之導電膠片10的斜向導線12與導電膠輔片25C之傾斜導線252C電連接電路載板40中之接地電路,用以接地。或是元件電連接片26C中之接地線路265C通過位置對應之導電膠片10中之斜向導線12、導電膠輔片25C之傾斜導線252C以及電路膜片22C之接地路徑243C電連接電路載板40中之接地電路,用以接地。此外,該電連接組件1C還能藉由元件電連接片26C設置在導電膠片10之上方,避免待測半導體元件30之接點31表面之氧化皮膜殘屑附著在導電膠片10上,以利氧化皮膜殘屑之清除並提高導電膠片10的耐用性。
In the inspection operation, the
1A:電連接組件 1A: Electrical connection components
10:導電膠片 10: Conductive film
11:膠片本體 11: Film body
12:斜向導線 12: Diagonal guide line
20A:電連接位差補償構造 20A: Electric connection displacement compensation structure
21A:位差補償傳導路徑 21A: Displacement compensation conduction path
211A:導線接觸部 211A: Wire contact part
212A:電接觸部 212A: Electrical contact
213A:對位接點 213A: Counterpoint contact
22A:電路膜片 22A: Circuit diaphragm
23A:絕緣片體 23A: Insulating sheet body
24A:導電體 24A: Conductor
241A:接地路徑 241A: Ground path
25A:絕緣層 25A: Insulation layer
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109114910A TWI742642B (en) | 2020-05-05 | 2020-05-05 | Electrical connection assembly with oblique guide wire type conductive film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109114910A TWI742642B (en) | 2020-05-05 | 2020-05-05 | Electrical connection assembly with oblique guide wire type conductive film |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI742642B true TWI742642B (en) | 2021-10-11 |
TW202143588A TW202143588A (en) | 2021-11-16 |
Family
ID=80782462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109114910A TWI742642B (en) | 2020-05-05 | 2020-05-05 | Electrical connection assembly with oblique guide wire type conductive film |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI742642B (en) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1134869C (en) * | 2000-02-10 | 2004-01-14 | 富士康(昆山)电脑接插件有限公司 | Manufacture of socket connector |
EP1487058A1 (en) * | 2002-03-20 | 2004-12-15 | J.S.T. Mfg. Co., Ltd. | Anisotropic conductive sheet and its manufacturing method |
EP1515399A2 (en) * | 2003-09-09 | 2005-03-16 | Nitto Denko Corporation | Anisotropic conductive film, production method thereof and method of use thereof |
EP1615297A1 (en) * | 2003-04-16 | 2006-01-11 | JSR Corporation | Anisotropic conductive connector and circuit-device electrical-inspection device |
US20070054513A1 (en) * | 2000-04-12 | 2007-03-08 | Formfactor, Inc. | Methods of fabricating and using shaped springs |
EP1912286A1 (en) * | 2005-07-19 | 2008-04-16 | Sumitomo Electric Industries, Ltd. | Composite porous resin base material and method for manufacturing same |
TW200929610A (en) * | 2007-12-31 | 2009-07-01 | Everlight Electronics Co Ltd | Light-emitting diode packaging structure and assembling method thereof |
TWI399890B (en) * | 2008-10-21 | 2013-06-21 | Asahi Denka Kenkyusho Co Ltd | Female connector, male connector to be assembled to the female connector, electrical connection device, and electrical, electronic apparatus using these connectors |
TWM536830U (en) * | 2016-10-14 | 2017-02-11 | Chunghwa Precision Test Tech Co Ltd | Interconnect structure |
US20200133046A1 (en) * | 2018-10-26 | 2020-04-30 | Apple Inc. | Electronic Device Display with a Backlight |
-
2020
- 2020-05-05 TW TW109114910A patent/TWI742642B/en active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1134869C (en) * | 2000-02-10 | 2004-01-14 | 富士康(昆山)电脑接插件有限公司 | Manufacture of socket connector |
US20070054513A1 (en) * | 2000-04-12 | 2007-03-08 | Formfactor, Inc. | Methods of fabricating and using shaped springs |
EP1487058A1 (en) * | 2002-03-20 | 2004-12-15 | J.S.T. Mfg. Co., Ltd. | Anisotropic conductive sheet and its manufacturing method |
EP1615297A1 (en) * | 2003-04-16 | 2006-01-11 | JSR Corporation | Anisotropic conductive connector and circuit-device electrical-inspection device |
EP1515399A2 (en) * | 2003-09-09 | 2005-03-16 | Nitto Denko Corporation | Anisotropic conductive film, production method thereof and method of use thereof |
EP1912286A1 (en) * | 2005-07-19 | 2008-04-16 | Sumitomo Electric Industries, Ltd. | Composite porous resin base material and method for manufacturing same |
TW200929610A (en) * | 2007-12-31 | 2009-07-01 | Everlight Electronics Co Ltd | Light-emitting diode packaging structure and assembling method thereof |
TWI399890B (en) * | 2008-10-21 | 2013-06-21 | Asahi Denka Kenkyusho Co Ltd | Female connector, male connector to be assembled to the female connector, electrical connection device, and electrical, electronic apparatus using these connectors |
TWM536830U (en) * | 2016-10-14 | 2017-02-11 | Chunghwa Precision Test Tech Co Ltd | Interconnect structure |
US20200133046A1 (en) * | 2018-10-26 | 2020-04-30 | Apple Inc. | Electronic Device Display with a Backlight |
Also Published As
Publication number | Publication date |
---|---|
TW202143588A (en) | 2021-11-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100915643B1 (en) | Probe card | |
KR100867330B1 (en) | Probe assembly for probe card | |
JPH0814603B2 (en) | Test connector for electrical equipment | |
JP2005300545A5 (en) | ||
JPH07109840B2 (en) | Semiconductor IC test apparatus and test method | |
CN101666816A (en) | Electric connecting device and contactor | |
US6946860B2 (en) | Modularized probe head | |
TWI742642B (en) | Electrical connection assembly with oblique guide wire type conductive film | |
JP2010025765A (en) | Contact structure for inspection | |
KR20180092027A (en) | Probe card assembly | |
CN113675165B (en) | Display device and method for manufacturing the same | |
JP3214420B2 (en) | Film carrier type semiconductor device, inspection probe head, and alignment method | |
JPS612338A (en) | Inspection device | |
JP3989631B2 (en) | Semiconductor device | |
JP4585111B2 (en) | Probe card | |
JP4264310B2 (en) | Board inspection equipment | |
KR102182216B1 (en) | Probe Card | |
JP7471778B2 (en) | Probe Card | |
JPH0618559A (en) | Probe card | |
JPS6225433A (en) | Semiconductor element characteristic measuring device | |
JPH01150863A (en) | Probe card | |
CN115032430A (en) | Probe structure and manufacturing method thereof | |
JPH06201750A (en) | Inspecting device for wiring board | |
KR20070009133A (en) | The probe card using coaxial cable for semiconductor wafer | |
JPH04364485A (en) | Inspecting method of hybrid integrated circuit device |