TWI741965B - Semiconductor device and manufacturing method thereof - Google Patents
Semiconductor device and manufacturing method thereof Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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Abstract
封裝體(1)具有基底板(2)和接合至基底板(2)的主面的外周部的框架(4)。具有半導體晶片(7)的電子元件(5)藉由第1焊料(6)安裝於基底板(2)的主面。將熔點低於第1焊料(6)的第2焊料(12)塗佈於基底板(2)的主面的沒有安裝電子元件(5)的區域。藉由第3焊料(14)將蓋13接合至框架(4)以密封電子元件(5)The package (1) has a base plate (2) and a frame (4) joined to the outer periphery of the main surface of the base plate (2). The electronic component (5) with the semiconductor chip (7) is mounted on the main surface of the base board (2) by the first solder (6). A second solder (12) having a lower melting point than the first solder (6) is applied to a region on the main surface of the base board (2) where the electronic component (5) is not mounted. The cover 13 is joined to the frame (4) by the third solder (14) to seal the electronic component (5)
Description
本發明是有關於半導體裝置及其製造方法。The present invention relates to a semiconductor device and a manufacturing method thereof.
在要求高輸出的高頻FET中,為了確保電晶體的可靠度,有必要確保高散熱性。為此,作為高頻FET用封裝體,選擇銅或銅的金屬化合物作為金屬基底的金屬封裝體。為了在這種封裝體安裝半導體晶片及構成匹配電路的基板,例如,使用具有高熱傳導性的金錫焊料。此外,在要求高可靠度的情況下,要求密封後的封裝體內的氣密性,使用例如金錫焊料來密封。 [先前技術文獻] [專利文獻] In high-frequency FETs that require high output, in order to ensure the reliability of the transistor, it is necessary to ensure high heat dissipation. For this reason, as a package for high-frequency FETs, copper or a metal compound of copper is selected as a metal package with a metal base. In order to mount a semiconductor chip and a substrate constituting a matching circuit in such a package, for example, gold-tin solder having high thermal conductivity is used. In addition, when high reliability is required, the airtightness in the sealed package is required, and for example, gold-tin solder is used for sealing. [Prior Technical Literature] [Patent Literature]
[專利文獻1]日本特開昭62-194651號公報[Patent Document 1] Japanese Patent Laid-Open No. 62-194651
[發明所要解決的課題][Problems to be solved by the invention]
安裝或密封的焊接時會產生焊料屑,有時會在密封後的封裝體內移動。此焊料屑作為導電性異物會使高頻電路的配線間短路,使製品特性劣化,造成半導體晶片燒毀等不良的原因。Solder swarf may be generated during soldering during mounting or sealing, and may move inside the sealed package. As a conductive foreign material, this solder scrap will short-circuit the wiring of the high-frequency circuit, degrade the characteristics of the product, and cause defects such as burning of the semiconductor chip.
另外,為了黏著封裝體內浮游的塵埃等異物,已提出在封裝體內部的上表面形成聚醯亞胺系的樹脂層(例如,參照專利文獻1)。但是,比類似焊料屑的塵埃還重的異物會落下至封裝體內部的底面而無法黏著。因此,無法抑制不良的產生。In addition, in order to adhere foreign substances such as dust floating in the package, it has been proposed to form a polyimide-based resin layer on the upper surface of the package (for example, refer to Patent Document 1). However, foreign matter that is heavier than dust like solder scraps will fall to the bottom surface inside the package and cannot be adhered. Therefore, the occurrence of defects cannot be suppressed.
本發明為了解決上述問題,其目的為提供可以抑制不良的產生的半導體裝置及其製造方法。 [用以解決課題的手段] In order to solve the above-mentioned problems, the present invention aims to provide a semiconductor device and a manufacturing method thereof that can suppress occurrence of defects. [Means to solve the problem]
關於本發明的半導體裝置,其特徵為包括:基底板;封裝體,其具有接合至上述基底板的主面的外周部的框架;電子元件,其藉由第1焊料安裝於上述基底板的上述主面,且具有半導體晶片;第2焊料,其塗佈於上述基底板的上述主面的沒有安裝上述電子元件的區域,且熔點低於上述第1焊料;以及蓋,其藉由第3焊料接合至上述框架且密封上述電子元件。 [發明的效果] The semiconductor device of the present invention is characterized by comprising: a base plate; a package having a frame joined to the outer peripheral portion of the main surface of the base plate; and electronic components mounted on the base plate of the base plate by a first solder The main surface has a semiconductor chip; a second solder applied to the area of the main surface of the base board where the electronic component is not mounted, and has a lower melting point than the first solder; and a cover, which is made of a third solder It is bonded to the frame and seals the electronic component. [Effects of the invention]
在本發明中,將熔點低的第2焊料塗佈於沒有安裝基底板的主面的電子元件的區域。藉由此第2焊料可以使封裝體內部的焊料屑固定而無法移動。因此,可以防止高頻電路的配線間的短路,抑制不良的發生。In the present invention, the second solder with a low melting point is applied to the area where the electronic component is not mounted on the main surface of the base board. With this, the second solder can fix the solder swarf inside the package without being able to move. Therefore, it is possible to prevent short circuits between the wirings of the high-frequency circuit and suppress the occurrence of defects.
[用以實施發明之形態][Form to implement invention]
參照根據實施形態的半導體裝置及其製造方法的圖示以做說明。相同或對應的元件以相同的符號標示,且重複的說明可能會省略。The description will be made with reference to the diagrams of the semiconductor device and its manufacturing method according to the embodiment. The same or corresponding elements are marked with the same symbols, and repeated descriptions may be omitted.
實施形態1
第1圖所示為關於實施形態1的半導體裝置的製造步驟的剖面圖。第2圖所示為關於實施形態1的半導體裝置的內部的平面圖。關於本實施形態的半導體裝置為高頻FET用封裝體。
封裝體1具有基底板2、接合至基底板2的主面的外周部的陶瓷端子3及框架4。將電子元件5藉由焊料6安裝於基底板2的主面。電子元件5具有增幅信號的高頻增幅器等的半導體晶片7和印刷高頻增幅器的匹配電路的基板8。半導體晶片7和基板8藉由導線9連接。基板8藉由導線11連接至陶瓷端子3的引線(lead)10。The
焊料12塗佈於基底板2的主面的沒有安裝電子元件5的區域,且露出於封裝體1的內部。蓋13的背面藉由焊料14接合至框架4的上表面以密封電子元件5。焊料12的熔點比焊料6、14更低。例如,焊料6、14為金錫焊料,焊料12為錫銀銅焊料。The
在密封步驟中,以封裝體1在蓋13下方的狀態將封裝體1承載於加熱站15且加熱。藉此,在不使焊料6熔融的情況下使焊料12熔融。將蓋13接合至框架4時,為了與焊料14調和,在框架4的上表面切割蓋13。此時,從焊料14產生的焊料屑16在封裝體1的內部落下至基底板2的主面,成為具有影響製品特性和可靠度的可能性的導電性異物。但是熔融的焊料12卻可以固定焊料屑16,使焊料屑16無法移動。因此,可以防止因高頻電路的配線間的短路發生所造成的製品特性劣化或半導體晶片的燒毀以抑制不良的發生。此外,在實施使半導體裝置在高加速度環境中震動且檢測封裝體內部的導電性異物的PIND試驗的情況中也可以抑制不良的發生。In the sealing step, the
另外,儘管在密封後,也可以在不使焊料6熔融但使焊料12熔融的溫度下將封裝體1升溫,藉此可以將密封時無法完全捕捉而殘存的焊料屑16固定。藉此,儘管是在利用PIND試驗檢測出異物的情況下也可以使檢測出的導電性異物無法移動。In addition, even after sealing, the
實施形態2
第3圖所示為關於實施形態2的半導體裝置的製造步驟的剖面圖。第4圖所示為關於實施形態2的蓋的背面的平面圖。在本實施形態中,在蓋13的背面全面塗佈焊料14。焊料14為例如金錫焊料。
在密封步驟中,以背面在上方的狀態下將蓋13承載於加熱站15且加熱並使焊料14熔融,在蓋13的背面藉由焊料14接合框架4以密封電子元件5。焊料14露出於封裝體1內部,固定安裝電子元件5時從焊料6產生的焊料屑16和密封時從焊料14產生的焊料屑17。藉此,可以使焊料屑16、17無法移動,與實施形態1相比更能抑制不良的發生。其他的構成及效果和實施形態1相同。In the sealing step, the
實施形態3
第5圖所示為關於實施形態3的半導體裝置的製造步驟的剖面圖。第6圖所示為關於實施形態3的蓋的背面的平面圖。在本實施形態中,在蓋13的背面的外周部塗佈焊料14,在蓋13的背面的中央塗佈熔點低於焊料14的焊料18。例如,焊料14為金錫焊料,焊料18為錫銀銅焊料。
和實施形態2相同,在密封步驟中可藉由熔融的焊料14、18將焊料屑16、17固定。接著,在密封步驟後也可以在蓋13位於封裝體1下方的狀態下將蓋13承載於加熱站15且加熱,並在不熔融焊料6和焊料14的情況下將焊料18熔融。藉此,可以在密封後將密封時無法完全捕捉而殘存的焊料屑16、17固定。因此,比實施形態2更能抑制不良的發生。其他的構成及效果和實施形態2相同。As in the second embodiment, the
實施形態4
第7圖及第8圖所示為關於實施形態4的半導體裝置的製造步驟的剖面圖。藉由焊料20將半導體晶片7及基板8安裝於板19。板19為例如和基底板2相同的材料。如第7圖所示,藉由焊料6將此板19接合至基底板2的主面。接著,如第8圖所示,利用蓋13密封。藉由使用板19,使利用半導體晶片7及基板8構成的高頻電路高於基底板2的主面。
可以在封裝體外進行半導體晶片7及基板8於板19的焊接。因此,焊接時產生的焊料屑可以在封裝體外除去。此外,因為板19的尺寸比半導體晶片7及基板8還大,將板19安裝至基底板2是容易的。The
此外,在將板19安裝於基底板2之前可以確認高頻電路的特性。因此,假設發生半導體晶片7的能力不足時,可以在板19的狀態下丟棄。和丟棄已組裝為高價的高頻FET用封裝體的製品相比,可以抑制因丟棄所造成的損失。In addition, the characteristics of the high-frequency circuit can be confirmed before the
另外,雖然板19也可以是和基底板2相異的材質,選擇線膨脹係數相近的材質較佳。藉此,因為焊接時溫度上升而產生的基底板2和板19間的線膨脹係數差消失,可以迴避焊料6的破壞。其他的構成及效果和實施形態1相同。此外,實施形態4的構成也可以和實施形態2或3結合。In addition, although the
1:封裝體
2:基底板
3:陶瓷端子
4:框架
5:電子元件
6,12,14,18,20:焊料
7:半導體晶片
8:基板
9,11:導線
10:引線
13:蓋
15:加熱站
16,17:焊料屑
19:板1: Package body
2: Base plate
3: Ceramic terminal
4: frame
5:
第1圖所示為關於實施形態1的半導體裝置的製造步驟的剖面圖。 第2圖所示為關於實施形態1的半導體裝置的內部的平面圖。 第3圖所示為關於實施形態2的半導體裝置的製造步驟的剖面圖。 第4圖所示為關於實施形態2的蓋的背面的平面圖。 第5圖所示為關於實施形態3的半導體裝置的製造步驟的剖面圖。 第6圖所示為關於實施形態3的蓋的背面的平面圖。 第7圖所示為關於實施形態4的半導體裝置的製造步驟的剖面圖。 第8圖所示為關於實施形態4的半導體裝置的製造步驟的剖面圖。 FIG. 1 is a cross-sectional view showing the manufacturing steps of the semiconductor device according to the first embodiment. FIG. 2 is a plan view of the inside of the semiconductor device related to the first embodiment. FIG. 3 is a cross-sectional view showing the manufacturing steps of the semiconductor device according to the second embodiment. Fig. 4 is a plan view of the back surface of the cover of the second embodiment. Fig. 5 is a cross-sectional view showing the manufacturing steps of the semiconductor device according to the third embodiment. Fig. 6 is a plan view of the back surface of the cover of the third embodiment. Fig. 7 is a cross-sectional view showing the manufacturing steps of the semiconductor device according to the fourth embodiment. Fig. 8 is a cross-sectional view showing the manufacturing steps of the semiconductor device according to the fourth embodiment.
1:封裝體 1: Package body
2:基底板 2: Base plate
3:陶瓷端子 3: Ceramic terminal
4:框架 4: frame
5:電子元件 5: Electronic components
6,12,14:焊料 6, 12, 14: Solder
7:半導體晶片 7: Semiconductor wafer
8:基板 8: substrate
9,11:導線 9, 11: wire
10:引線 10: Lead
13:蓋 13: cover
15:加熱站 15: Heating station
16:焊料屑 16: Solder chips
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PCT/JP2019/018263 WO2020225852A1 (en) | 2019-05-07 | 2019-05-07 | Semiconductor device and method for manufacturing same |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05275553A (en) * | 1992-05-18 | 1993-10-22 | Hitachi Ltd | Electronic circuit device |
JP2011009542A (en) * | 2009-06-26 | 2011-01-13 | Senju Metal Ind Co Ltd | Solder-coated lid |
JP5275553B2 (en) | 2006-06-27 | 2013-08-28 | スリーエム イノベイティブ プロパティズ カンパニー | Method for manufacturing divided chips |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS62194651A (en) * | 1986-02-21 | 1987-08-27 | Hitachi Ltd | Electronic device |
JPH06188288A (en) * | 1992-12-18 | 1994-07-08 | Hitachi Ltd | Semiconductor integrated circuit device |
JP4114488B2 (en) * | 2003-01-16 | 2008-07-09 | 日産自動車株式会社 | Semiconductor package mounting structure |
JP2007227510A (en) * | 2006-02-22 | 2007-09-06 | Mitsubishi Electric Corp | Semiconductor device |
JP6379494B2 (en) * | 2014-01-23 | 2018-08-29 | 日産自動車株式会社 | Power module |
JPWO2016207985A1 (en) * | 2015-06-23 | 2018-04-12 | オリンパス株式会社 | Mounting structure |
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2019
- 2019-05-07 WO PCT/JP2019/018263 patent/WO2020225852A1/en active Application Filing
- 2019-05-07 JP JP2021518232A patent/JP6984787B2/en active Active
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- 2020-04-27 TW TW109114014A patent/TWI740470B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05275553A (en) * | 1992-05-18 | 1993-10-22 | Hitachi Ltd | Electronic circuit device |
JP5275553B2 (en) | 2006-06-27 | 2013-08-28 | スリーエム イノベイティブ プロパティズ カンパニー | Method for manufacturing divided chips |
JP2011009542A (en) * | 2009-06-26 | 2011-01-13 | Senju Metal Ind Co Ltd | Solder-coated lid |
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TWI743018B (en) | 2021-10-11 |
JPWO2020225852A1 (en) | 2021-10-21 |
TW202139372A (en) | 2021-10-16 |
JP6984787B2 (en) | 2021-12-22 |
WO2020225852A1 (en) | 2020-11-12 |
TW202109774A (en) | 2021-03-01 |
TW202139371A (en) | 2021-10-16 |
TWI740470B (en) | 2021-09-21 |
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