TWI740098B - Magnetic target material with different magnetic strength distribution - Google Patents

Magnetic target material with different magnetic strength distribution Download PDF

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TWI740098B
TWI740098B TW108103394A TW108103394A TWI740098B TW I740098 B TWI740098 B TW I740098B TW 108103394 A TW108103394 A TW 108103394A TW 108103394 A TW108103394 A TW 108103394A TW I740098 B TWI740098 B TW I740098B
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magnetic
target
unit
magnetic unit
different
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TW108103394A
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TW202028497A (en
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李原吉
劉品均
陳松醮
蔡明展
邱敬凱
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友威科技股份有限公司
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Abstract

A magnetic target material with different magnetic strength distribution includes a substrate, a target material module, and a magnetic module. The target material module and the magnetic module are disposed on two opposite faces of the substrate. The target module includes an inner target ring, a middle target, and an outer target ring.The outer target ring has two straight sections and two connection sections connecting the two straight sections, respectively. The magnetic module includes a first magnetic unit disposed corresponding to the middle target, a second magnetic unit disposed corresponding to the two straight sections, and a third magnetic unit disposed corresponding to the two connection sections. Therefore, with the three magnetic units having different magnetic strengths, the ionic strikes upon the target material module are balanced, improving the service life of the target material module.

Description

具異磁性强度分布的磁性靶材Magnetic target with different magnetic intensity distribution

本發明係關於一種磁性靶材,尤指一種具異磁性强度分布的磁性靶材。The present invention relates to a magnetic target material, especially a magnetic target material with a different magnetic intensity distribution.

按,在現行的磁控濺鍍系統(magnetron sputtering system)中,主要是在濺鍍靶的靶背加裝永久磁鐵組,令永久磁鐵組所產生的磁力線朝上穿越濺鍍靶,進而在濺鍍靶的靶面上形成運作所需的封閉磁力線,促使電子運動軌跡沿磁力線方向以螺旋狀路徑迴旋前進,藉以增加電子與氬氣分子碰撞的機率,達到提升靶材利用率與鍍膜速率之目的。According to the current magnetron sputtering system (magnetron sputtering system), it is mainly to install a permanent magnet group on the back of the sputtering target, so that the magnetic field lines generated by the permanent magnet group cross the sputtering target upwards, and then the sputtering target The closed magnetic field lines required for operation are formed on the target surface of the plating target, which promotes the trajectory of the electrons to move forward in a spiral path along the direction of the magnetic field lines, thereby increasing the probability of electrons colliding with argon molecules, and achieving the purpose of improving the utilization rate of the target material and the coating rate .

然而,在實際轟擊濺鍍靶時,濺鍍靶被轟擊不會均勻的減少,尤其是濺鍍靶的短邊外側位置,其轟擊的消耗率為最高,據此濺鍍靶在轟擊速率不均的條件下,進而造成濺鍍靶被轟擊速率不均的現象,而導致靶材替換時,仍有相對大的部分未使用,因而產生濺鍍靶浪費的問題。However, in the actual bombardment of the sputtering target, the bombardment of the sputtering target will not be uniformly reduced, especially the position outside the short side of the sputtering target, the bombardment consumption rate is the highest, according to which the sputtering target is uneven in the bombardment rate Under these conditions, the uneven bombardment rate of the sputtering target may be caused, and a relatively large part of the target material is still unused when the target is replaced, thus causing the problem of wasting the sputtering target.

本發明之主要目的在於解決習知濺鍍靶之轟擊速率不均,因而造成濺鍍靶厚度使用不均,降低濺鍍靶的使用壽命的問題。The main purpose of the present invention is to solve the problem of the uneven bombardment rate of the conventional sputtering target, which causes the unevenness of the thickness of the sputtering target and reduces the service life of the sputtering target.

為了解決上述課題,本發明提供一種具異磁性强度分布的磁性靶材,其包含一基板、一靶材模組及一磁性模組。基板具有一第一面以及相反於第一面之一第二面;靶材模組設於基板之第一面,靶材模組包含一環狀之內環靶材、一設於內環靶材內側之內側靶材,以及一環設於內環靶材外側之外環靶材,外環靶材具有兩相對之平直段以及兩分別連接兩平直段兩端的連接段;磁性模組,其設於基板之第二面,磁性模組包含一第一磁性單元對應設於內側靶材位置、一第二磁性單元對應設於兩平直段位置,以及一第三磁性單元對應設於兩連接段,其中,第一磁性單元的磁性強度大於第二磁性單元的磁性強度,第二磁性單元的磁性強度大於第三磁性單元的磁性強度。In order to solve the above-mentioned problems, the present invention provides a magnetic target with a different magnetic intensity distribution, which includes a substrate, a target module, and a magnetic module. The substrate has a first surface and a second surface opposite to the first surface; the target module is disposed on the first surface of the substrate, and the target module includes a ring-shaped inner ring target and a target disposed on the inner ring The inner target material on the inner side of the material, and a ring set on the outer ring target material on the outer side of the inner ring target material. The outer ring target material has two opposite straight sections and two connecting sections respectively connecting the ends of the two straight sections; the magnetic module, It is arranged on the second surface of the substrate, and the magnetic module includes a first magnetic unit corresponding to the inner target position, a second magnetic unit corresponding to the two straight section positions, and a third magnetic unit corresponding to the two The connecting section, wherein the magnetic strength of the first magnetic unit is greater than the magnetic strength of the second magnetic unit, and the magnetic strength of the second magnetic unit is greater than the magnetic strength of the third magnetic unit.

藉此,本發明經由裝設不同磁性強度的第一磁性單元、第二磁性單元及第三磁性單元,以降低對應外環靶材之兩連接段的磁性強度,且同時提升對應內側靶材的磁性強度,以平衡靶材模組的離子轟擊速率,達到靶材模組轟擊厚度平均之效果,以延長靶材模組的使用壽命之目的。In this way, the present invention reduces the magnetic strength of the two connecting sections corresponding to the outer ring target by installing the first magnetic unit, the second magnetic unit and the third magnetic unit with different magnetic strengths, and at the same time improves the corresponding inner target The magnetic strength is used to balance the ion bombardment rate of the target module to achieve the effect of the average bombardment thickness of the target module, so as to extend the service life of the target module.

為便於說明本發明於上述發明內容一欄中所表示的中心思想,茲以具體實施例表達。實施例中各種不同物件係按適於列舉說明之比例,而非按實際元件的比例予以繪製,合先敘明。In order to facilitate the description of the central idea of the present invention expressed in the column of the above-mentioned summary of the invention, specific embodiments are used to express it. Various objects in the embodiments are drawn according to the proportions suitable for enumeration and description, rather than according to the proportions of actual elements, and are described first.

請參閱圖1至圖6所示,本發明提供一種具異磁性强度分布的磁性靶材,其包含一基板10、一靶材模組20及一磁性模組30。Please refer to FIG. 1 to FIG. 6, the present invention provides a magnetic target with a different magnetic intensity distribution, which includes a substrate 10, a target module 20 and a magnetic module 30.

基板10,其為非磁性材料,基板10具有一第一面11以及相反於第一面11之一第二面12。The substrate 10 is a non-magnetic material. The substrate 10 has a first surface 11 and a second surface 12 opposite to the first surface 11.

靶材模組20,其設於基板10之第一面11上,,靶材模組20包含一環狀之內環靶材21、一設於內環靶材21內側之內側靶材22,以及一環設於內環靶材21外側之外環靶材23,內側靶材22概為長矩形狀,內側靶材22具有一長邊方向221及垂直於長邊方向221之一短邊方向222,外環靶材23係由兩平直段231及兩連接段232所組成,於本實施例中,兩平直段231彼此相對設置,並分別沿著內側靶材22之長邊方向221而設,而兩連接段232分別連接於兩平直段231兩端,並分別沿著內側靶材22兩側之短邊方向222而設,各平直段231之長度分別大於各連接段232之長度,進一步來說,各連接段232係由一平直部232a及兩延伸部232b所組成,各延伸部232b之一端弧形連接於各平直部232a,而另一端弧形連接於各平直段231。The target module 20 is arranged on the first surface 11 of the substrate 10. The target module 20 includes a ring-shaped inner ring target 21 and an inner target 22 arranged inside the inner ring target 21, And a ring is set on the outer ring target 23 outside the inner ring target 21, the inner target 22 is generally a long rectangle, and the inner target 22 has a long side direction 221 and a short side direction 222 perpendicular to the long side direction 221, The outer ring target 23 is composed of two straight sections 231 and two connecting sections 232. In this embodiment, the two straight sections 231 are arranged opposite to each other and are respectively arranged along the long side direction 221 of the inner target 22 , And the two connecting sections 232 are respectively connected to the two ends of the two straight sections 231, and are respectively arranged along the short side direction 222 on both sides of the inner target material 22, the length of each straight section 231 is greater than the length of each connecting section 232 Furthermore, each connecting section 232 is composed of a straight portion 232a and two extension portions 232b. One end of each extension portion 232b is connected to each straight portion 232a in an arc shape, and the other end is connected to each straight portion 232a in an arc shape.段231.

磁性模組30,其設於基板10之第二面12,磁性模組30包含有一第一磁性單元31對應設於內側靶材22位置、一第二磁性單元32對應設於兩平直段231位置,以及一第三磁性單元33對應設於兩連接段232,以使第二磁性單元32與第三磁性單元33環設在第一磁性單元31的周圍,其中,第一磁性單元31、第二磁性單元32及第三磁性單元33彼此間磁性強度互不相同,於本實施例中,第一磁性單元31的磁性強度大於第二磁性單元32的磁性強度,第二磁性單元32的磁性強度大於第三磁性單元33的磁性強度,而且,第一磁性單元31與第二磁性單元32相鄰於基板10之同一端磁極呈異極設置,第二磁性單元32與第三磁性單元33相鄰於基板10之同一端磁極呈同極設置;請配合圖3至圖6所示,於本實施例中,第一磁性單元31之S極相鄰於基板10,而N極則是遠離基板10,相反地,第二磁性單元32及第三磁性單元33之N極相鄰於基板10,而S極則是遠離基板10,藉以磁性模組30的磁場會由第二磁性單元32及第三磁性單元33與第一磁性單元31之相異極性形成封閉磁力線。The magnetic module 30 is arranged on the second surface 12 of the substrate 10. The magnetic module 30 includes a first magnetic unit 31 corresponding to the position of the inner target material 22, and a second magnetic unit 32 corresponding to the two straight sections 231 Position, and a third magnetic unit 33 corresponding to the two connecting sections 232, so that the second magnetic unit 32 and the third magnetic unit 33 are arranged around the first magnetic unit 31, wherein the first magnetic unit 31, the second magnetic unit 31 The magnetic strength of the two magnetic units 32 and the third magnetic unit 33 are different from each other. In this embodiment, the magnetic strength of the first magnetic unit 31 is greater than the magnetic strength of the second magnetic unit 32, and the magnetic strength of the second magnetic unit 32 The magnetic strength is greater than that of the third magnetic unit 33, and the first magnetic unit 31 and the second magnetic unit 32 are adjacent to the same end of the substrate 10 and the magnetic poles are arranged in different poles, and the second magnetic unit 32 and the third magnetic unit 33 are adjacent to each other. The magnetic poles at the same end of the substrate 10 are arranged in the same pole; please cooperate with Figures 3 to 6. In this embodiment, the S pole of the first magnetic unit 31 is adjacent to the substrate 10, and the N pole is far away from the substrate 10. On the contrary, the N pole of the second magnetic unit 32 and the third magnetic unit 33 is adjacent to the substrate 10, and the S pole is far away from the substrate 10, so that the magnetic field of the magnetic module 30 is caused by the second magnetic unit 32 and the third magnetic unit 32. The magnetic unit 33 and the first magnetic unit 31 have different polarities to form closed magnetic lines of force.

進一步來說,請配合圖3所示,第一磁性單元31為複數個圓形磁件,其中,第一磁性單元31具有複數第一磁件311及複數第二磁件312,各第一磁件311的直徑大於各第二磁件312的直徑,於本實施例中,各第一磁件311對應沿著內側靶材22的長邊方向221並排設置,各第二磁件312對應沿著內側靶材22兩側的短邊方向222弧形設置;第二磁性單元32為複數個圓形磁件,第二磁性單元32之圓形磁件對應沿著各平直段231排列,且彼此呈間隔設置,第三磁性單元33為複數個圓形磁件,第三磁性單元33之圓形磁件對應沿著各平直部232a及各延伸部232b排列,其中,第三磁性單元33相鄰於第一磁性單元31之第二磁件312,且第二磁件312對應於第三磁性單元33呈弧形排列,而各連接段232與各平直段231交界的第二磁性單元32及第三磁性單元33互不接觸;藉此,本發明藉由第三磁性單元33降低對應外環靶材23之兩連接段232的磁性強度,並透過第一磁性單元31相對提升對應內側靶材22的磁性強度,以平衡靶材模組20的離子轟擊速率,達到靶材模組20轟擊厚度平均之效果。Furthermore, please cooperate with FIG. 3, the first magnetic unit 31 is a plurality of circular magnetic parts, wherein the first magnetic unit 31 has a plurality of first magnetic parts 311 and a plurality of second magnetic parts 312, each of the first magnetic The diameter of the member 311 is greater than the diameter of each second magnetic member 312. In this embodiment, the first magnetic members 311 are arranged side by side along the longitudinal direction 221 of the inner target 22, and the second magnetic members 312 are correspondingly arranged along the The short side direction 222 on both sides of the inner target material 22 is arranged in an arc shape; the second magnetic unit 32 is a plurality of circular magnetic parts, and the circular magnetic parts of the second magnetic unit 32 are arranged along each straight section 231 corresponding to each other. Are arranged at intervals, the third magnetic unit 33 is a plurality of circular magnetic parts, and the circular magnetic parts of the third magnetic unit 33 are arranged along each straight portion 232a and each extension portion 232b. Among them, the third magnetic unit 33 is The second magnetic member 312 adjacent to the first magnetic unit 31, and the second magnetic member 312 is arranged in an arc shape corresponding to the third magnetic unit 33, and the second magnetic unit 32 at the junction of each connecting section 232 and each straight section 231 And the third magnetic unit 33 are not in contact with each other; therefore, the present invention uses the third magnetic unit 33 to reduce the magnetic intensity of the two connecting sections 232 corresponding to the outer ring target 23, and relatively raises the corresponding inner target through the first magnetic unit 31 The magnetic strength of the material 22 balances the ion bombardment rate of the target module 20 to achieve an average bombardment thickness of the target module 20.

值得說明的是,請配合圖3及圖4所示,本發明可依據濺鍍需求而適當地調整第二磁性單元32及第三磁性單元33的設置數量及範圍;舉例來說,請配合圖3所示,於本發明實施例中,第二磁性單元32的排列範圍略等於第一磁性單元31的排列範圍,而第三磁性單元33則縱向排列於平直部232a且弧形排列於兩延伸部232b的位置,使得第三磁性單元33的排列範圍位於第一磁性單元31的兩側,以降低對應連接段232的磁性強度;請配合圖4所示,於本發明又一實施例中,可適當地減少第二磁性單元32的設置數量,以相對縮短第二磁性單元32的排列範圍,進而增加第三磁性單元33設置數量,使得各連接段232所界定的延伸部232b範圍往兩平直段231方向延伸,藉以增進第三磁性單元33排列範圍,達到調整平衡靶材模組20的轟擊速率之目的。It is worth noting that, please cooperate with the figures shown in FIG. 3 and FIG. 4, the present invention can appropriately adjust the number and range of the second magnetic unit 32 and the third magnetic unit 33 according to the sputtering requirements; for example, please follow the figure As shown in Fig. 3, in the embodiment of the present invention, the arrangement range of the second magnetic unit 32 is slightly equal to the arrangement range of the first magnetic unit 31, and the third magnetic unit 33 is arranged longitudinally on the straight portion 232a and arranged in an arc shape. The position of the extension 232b is such that the arrangement range of the third magnetic unit 33 is located on both sides of the first magnetic unit 31, so as to reduce the magnetic strength of the corresponding connecting section 232; please refer to FIG. 4, in another embodiment of the present invention , The number of second magnetic units 32 can be appropriately reduced, so as to relatively shorten the arrangement range of the second magnetic units 32, and then increase the number of third magnetic units 33, so that the extent of the extension 232b defined by each connecting section 232 is two The straight section 231 extends in the direction, so as to increase the arrangement range of the third magnetic unit 33 and achieve the purpose of adjusting and balancing the bombardment rate of the target module 20.

特別說明的是,請配合參閱圖5及圖6所示,第一磁性單元31與第二磁性單元32及第三磁性單元33之磁力線會藉由內環靶材21與外環靶材23的間隙導引,其中,外環靶材23具有一內側邊233,內側邊233鄰接於基板10之第一面11且環繞內環靶材21,而第二磁性單元32與第三磁性單元33的邊緣係縱向對齊於內側邊233,因此第二磁性單元32與第三磁性單元33能夠有效讓磁力線有效地通過內環靶材21與外環靶材23的間隙,避免磁力耗損之狀況。In particular, please refer to FIGS. 5 and 6, the magnetic field lines of the first magnetic unit 31, the second magnetic unit 32 and the third magnetic unit 33 will pass through the inner ring target 21 and the outer ring target 23. Gap guidance, wherein the outer ring target 23 has an inner side 233, the inner side 233 is adjacent to the first surface 11 of the substrate 10 and surrounds the inner ring target 21, and the second magnetic unit 32 and the third magnetic unit The edge of 33 is longitudinally aligned with the inner side 233, so the second magnetic unit 32 and the third magnetic unit 33 can effectively allow the magnetic lines of force to pass through the gap between the inner ring target 21 and the outer ring target 23, avoiding the loss of magnetic force .

藉此,本發明具有以下優點:Therefore, the present invention has the following advantages:

1.本發明在基板10上裝設不同磁性強度的第一磁性單元31、第二磁性單元32及第三磁性單元33,以降低對應外環靶材23之兩連接段232的磁性強度,並相對提升對應內側靶材22的磁性強度,以平衡靶材模組20的離子轟擊速率,達到靶材模組20轟擊厚度平均之效果,以延長靶材模組20的使用壽命之目的。1. In the present invention, a first magnetic unit 31, a second magnetic unit 32, and a third magnetic unit 33 with different magnetic strengths are installed on the substrate 10 to reduce the magnetic strength of the two connecting sections 232 corresponding to the outer ring target 23, and The magnetic strength of the corresponding inner target 22 is relatively increased to balance the ion bombardment rate of the target module 20 to achieve the effect of averaging the bombardment thickness of the target module 20, so as to extend the service life of the target module 20.

2.藉由第二磁性單元32與第三磁性單元33縱向切齊內側邊233,能夠有效讓磁力線有效地通過內環靶材21與外環靶材23的間隙,避免磁力耗損之狀況。2. The second magnetic unit 32 and the third magnetic unit 33 are longitudinally aligned with the inner side 233, so that the lines of magnetic force can effectively pass through the gap between the inner ring target 21 and the outer ring target 23, avoiding the loss of magnetic force.

3.本發明可依據濺鍍需求而適當地調整第二磁性單元32及第三磁性單元33的設置數量及範圍,達到調整平衡靶材模組20的轟擊速率之目的。3. The present invention can appropriately adjust the number and range of the second magnetic unit 32 and the third magnetic unit 33 according to the sputtering requirements, so as to achieve the purpose of adjusting and balancing the bombardment rate of the target module 20.

以上所舉實施例僅用以說明本發明而已,非用以限制本發明之範圍。舉凡不違本發明精神所從事的種種修改或變化,俱屬本發明意欲保護之範疇。The above-mentioned embodiments are only used to illustrate the present invention, and are not used to limit the scope of the present invention. All modifications or changes made without violating the spirit of the present invention fall within the scope of the present invention's intended protection.

10:基板 232:連接段 11:第一面 232a:平直部 12:第二面 232b:延伸部 20:靶材模組 233:內側邊 21:內環靶材 30:磁性模組 22:內側靶材 31:第一磁性單元 221:長邊方向 311:第一磁件 222:短邊方向 312:第二磁件 23:外環靶材 32:第二磁性單元 231:平直段 33:第三磁性單元 10: substrate 232: connection segment 11: First side 232a: straight part 12: Second side 232b: Extension 20: Target module 233: inner side 21: Inner ring target 30: Magnetic module 22: Inside target 31: The first magnetic unit 221: Long side direction 311: The first magnet 222: Short side direction 312: The second magnet 23: Outer ring target 32: The second magnetic unit 231: Straight section 33: The third magnetic unit

圖1係為本發明之立體示意圖。 圖2係為本發明之另一視角立體示意圖。 圖3係為本發明之仰視圖。 圖4係為本發明又一實施例之仰視圖。 圖5係圖3沿5-5剖面線之剖面示意圖。 圖6係圖3沿6-6剖面線之剖面示意圖。Figure 1 is a three-dimensional schematic diagram of the present invention. Fig. 2 is a three-dimensional schematic diagram of the present invention from another perspective. Figure 3 is a bottom view of the present invention. Fig. 4 is a bottom view of another embodiment of the present invention. Fig. 5 is a schematic cross-sectional view of Fig. 3 along the line 5-5. Fig. 6 is a schematic cross-sectional view of Fig. 3 along the line 6-6.

10:基板 10: substrate

12:第二面 12: Second side

20:靶材模組 20: Target module

22:內側靶材 22: Inside target

221:長邊方向 221: Long side direction

222:短邊方向 222: Short side direction

23:外環靶材 23: Outer ring target

231:平直段 231: Straight section

232:連接段 232: connection segment

232a:平直部 232a: straight part

232b:延伸部 232b: Extension

233:內側邊 233: inner side

30:磁性模組 30: Magnetic module

31:第一磁性單元 31: The first magnetic unit

311:第一磁件 311: The first magnet

312:第二磁件 312: The second magnet

32:第二磁性單元 32: The second magnetic unit

33:第三磁性單元 33: The third magnetic unit

Claims (9)

一種具異磁性強度分布的磁性靶材,其包含:一基板,其具有一第一面以及相反於該第一面之一第二面;一靶材模組,其設於該基板之第一面,該靶材模組包含一環狀之內環靶材、一設於該內環靶材內側之內側靶材,以及一環設於該內環靶材外側之外環靶材,該外環靶材具有兩相對之平直段以及兩分別連接該兩平直段兩端的連接段;以及一磁性模組,其設於該基板之第二面,該磁性模組包含一第一磁性單元對應設於該內側靶材位置、一第二磁性單元對應設於該兩平直段位置,以及一第三磁性單元對應設於該兩連接段,其中,該第一磁性單元的磁性強度大於該第二磁性單元的磁性強度,該第二磁性單元的磁性強度大於該第三磁性單元的磁性強度。 A magnetic target with a different magnetic intensity distribution, comprising: a substrate having a first surface and a second surface opposite to the first surface; a target module set on the first of the substrate Surface, the target module includes a ring-shaped inner ring target, an inner target set on the inner side of the inner ring target, and an outer ring target set on the outer side of the inner ring target, the outer ring The target has two opposite straight sections and two connecting sections respectively connecting the two ends of the two straight sections; and a magnetic module, which is arranged on the second surface of the substrate, and the magnetic module includes a first magnetic unit corresponding to A second magnetic unit is located at the inner target position, corresponding to the two straight sections, and a third magnetic unit is located at the two connecting sections, wherein the magnetic strength of the first magnetic unit is greater than that of the first magnetic unit. The magnetic strength of the two magnetic units, the magnetic strength of the second magnetic unit is greater than the magnetic strength of the third magnetic unit. 如請求項1所述之具異磁性强度分布的磁性靶材,其中,該第一磁性單元為複數個圓形磁件。 The magnetic target material with different magnetic intensity distribution according to claim 1, wherein the first magnetic unit is a plurality of circular magnetic parts. 如請求項2所述之具異磁性强度分布的磁性靶材,其中,該第一磁性單元為複數第一磁件及複數第二磁件,各該第一磁件的直徑大於各該第二磁件的直徑,該內側靶材為長矩形狀,該等第一磁件對應沿著該內側靶材的長邊方向並排設置,該等第二磁件對應沿著該內側靶材的短邊方向設置,且該等第二磁件相鄰於該第三磁性單元。 The magnetic target with a different magnetic intensity distribution according to claim 2, wherein the first magnetic unit is a plurality of first magnetic parts and a plurality of second magnetic parts, and the diameter of each of the first magnetic parts is larger than the diameter of each of the second magnetic parts. The diameter of the magnetic part, the inner target material is a long rectangle, the first magnetic parts are arranged side by side along the long side direction of the inner target material, and the second magnetic parts are correspondingly arranged along the short side direction of the inner target material And the second magnetic elements are adjacent to the third magnetic unit. 如請求項3所述之具異磁性强度分布的磁性靶材,其中,該第二磁性單元為複數個圓形磁件,該兩平直段分別沿著該內側靶材之長邊方向而設。 The magnetic target with a different magnetic intensity distribution according to claim 3, wherein the second magnetic unit is a plurality of circular magnetic parts, and the two straight sections are respectively arranged along the longitudinal direction of the inner target . 如請求項3所述之具異磁性强度分布的磁性靶材,其中,該第三磁性單元為複數個圓形磁件,該兩連接段分別沿著該內側靶材兩側之短邊方向而 設。 The magnetic target with a different magnetic intensity distribution according to claim 3, wherein the third magnetic unit is a plurality of circular magnetic parts, and the two connecting sections are respectively formed along the short side direction on both sides of the inner target Assume. 如請求項5所述之具異磁性强度分布的磁性靶材,其中,各該連接段係由一平直部及兩延伸部所組成,各該延伸部之一端弧形連接於各該平直部,而另一端弧形連接於各該平直段。 The magnetic target material with different magnetic intensity distribution according to claim 5, wherein each of the connecting sections is composed of a straight portion and two extension portions, and one end of each extension portion is arc-shaped connected to each straight portion Section, and the other end is arc-shaped connected to each of the straight sections. 如請求項5所述之具異磁性强度分布的磁性靶材,其中,該外環靶材具有一內側邊,該內側邊鄰接於該基板之第一面且環繞該內環靶材,該第二磁性單元與該第三磁性單元的邊緣係縱向對齊於該內側邊。 The magnetic target with a different magnetic intensity distribution according to claim 5, wherein the outer ring target has an inner side, and the inner side is adjacent to the first surface of the substrate and surrounds the inner ring target, The edges of the second magnetic unit and the third magnetic unit are longitudinally aligned with the inner side. 如請求項3所述之具異磁性强度分布的磁性靶材,其中,各該平直段之長度分別大於各該連接段之長度。 The magnetic target material with a different magnetic intensity distribution according to claim 3, wherein the length of each straight section is greater than the length of each connecting section. 如請求項1所述之具異磁性强度分布的磁性靶材,其中,該第一磁性單元與該第二磁性單元相鄰於該基板之同一端磁極呈異極設置,該第二磁性單元與該第三磁性單元相鄰於該基板之同一端磁極呈同極設置。The magnetic target material with a different magnetic intensity distribution according to claim 1, wherein the first magnetic unit and the second magnetic unit are adjacent to the same end of the substrate and are arranged in different poles, and the second magnetic unit and The third magnetic unit is adjacent to the same end magnetic pole of the substrate and is arranged in the same pole.
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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101375366A (en) * 2005-12-13 2009-02-25 Oc欧瑞康巴尔斯公司 Improved sputter target utilization

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101375366A (en) * 2005-12-13 2009-02-25 Oc欧瑞康巴尔斯公司 Improved sputter target utilization

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