TWI724281B - Hard coat film with optical adjustment layer for transparent conductive film, and transparent conductive film - Google Patents

Hard coat film with optical adjustment layer for transparent conductive film, and transparent conductive film Download PDF

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TWI724281B
TWI724281B TW107106954A TW107106954A TWI724281B TW I724281 B TWI724281 B TW I724281B TW 107106954 A TW107106954 A TW 107106954A TW 107106954 A TW107106954 A TW 107106954A TW I724281 B TWI724281 B TW I724281B
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optical adjustment
adjustment layer
film
hard coat
layer
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TW201908771A (en
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五島大治
松本裕伸
市岡和也
鈴木亜耶
福岡孝宏
木村正人
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日商東山薄膜股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • B32B27/325Layered products comprising a layer of synthetic resin comprising polyolefins comprising polycycloolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/0008Electrical discharge treatment, e.g. corona, plasma treatment; wave energy or particle radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/10Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/26Polymeric coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/418Refractive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/538Roughness

Abstract

[課題]提供一種透明導電性薄膜用的附光學調整層硬塗薄膜,即便是在設置透明導電層的透明導電性薄膜中,也能夠得到充足的耐黏結性,且能夠抑制辨識性的降低。   [解決手段]附光學調整層硬塗薄膜(1),具備:由非晶性聚合物形成的透明基材薄膜(2)、及在該透明基材薄膜(2)的一面依序層積的硬塗層(3)及該硬塗層(3)上的光學調整層(4)。在光學調整層(4),含有複數粒子(4a、4a),該等粒子(4a、4a)的平均粒徑比光學調整層(4)的平均膜厚還大,且其平均粒徑(r1)、與其平均膜厚(d1)為:50nm≦(r1-d1)≦1900nm的關係。光學調整層(4)的表面的,除了由粒子(4a)形成的凸部以外的特定部分的算術平均粗糙度(Ra)在0.3nm~20nm的範圍。[Problem] To provide a hard coat film with an optical adjustment layer for a transparent conductive film. Even in a transparent conductive film provided with a transparent conductive layer, sufficient adhesion resistance can be obtained and the decrease in visibility can be suppressed. [Solution] A hard coat film with an optical adjustment layer (1), comprising: a transparent base film (2) formed of an amorphous polymer, and a layer sequentially laminated on one side of the transparent base film (2) The hard coat layer (3) and the optical adjustment layer (4) on the hard coat layer (3). The optical adjustment layer (4) contains a plurality of particles (4a, 4a). The average particle diameter of the particles (4a, 4a) is larger than the average film thickness of the optical adjustment layer (4), and the average particle diameter (r1 ), and its average film thickness (d1) is: 50nm≦(r1-d1)≦1900nm. On the surface of the optical adjustment layer (4), the arithmetic average roughness (Ra) of the specific part other than the convex part formed by the particles (4a) is in the range of 0.3 nm to 20 nm.

Description

透明導電性薄膜用的附光學調整層硬塗薄膜,及透明導電性薄膜Hard coat film with optical adjustment layer for transparent conductive film, and transparent conductive film

本發明係有關於將透明的薄膜作為基材使用的透明導電性薄膜用的附光學調整層硬塗薄膜、及透明導電性薄膜。 The present invention relates to a hard coat film with an optical adjustment layer for a transparent conductive film using a transparent film as a base material, and a transparent conductive film.

從前,如例如智慧手機或平板終端等,作為藉由觸摸顯示畫面而將資訊輸入的裝置,廣泛地使用電容式等的觸控面板。其中,作為觸控面板用的透明導電性薄膜,一般為在基材薄膜上,作為透明導電層,將氧化銦錫(ITO:Indium Tin Oxide)藉由蒸鍍或濺鍍等工法來層積者(例如,參照專利文獻1)。 In the past, for example, smart phones or tablet terminals, as devices that input information by touching a display screen, capacitive touch panels, etc., have been widely used. Among them, as a transparent conductive film for touch panels, it is generally a transparent conductive layer that is laminated with indium tin oxide (ITO: Indium Tin Oxide) by evaporation or sputtering on a base film. (For example, refer to Patent Document 1).

接著,作為透明導電性薄膜的基材,雖使用雙折射高的結晶性聚合物薄膜,即聚乙烯對苯二甲酸酯膜,但例如通過墨鏡操作行動終端時,因為偏光墨鏡的使用會有產生干涉紋(uneven interference)的問題,而提案有將雙折射低的非晶性聚合物薄膜作為基材來使用。 Next, as the substrate of the transparent conductive film, although a crystalline polymer film with high birefringence, that is, polyethylene terephthalate film, is used, for example, when operating a mobile terminal through sunglasses, the use of polarized sunglasses may cause problems. There is a problem of uneven interference, and it has been proposed to use an amorphous polymer film with low birefringence as a substrate.

不過,使用將非晶性聚合物薄膜作為基材的透明導電性薄膜,雖能解消上述干涉紋的發生,但非晶性 聚合物薄膜與結晶性聚合物薄膜相比,會有在薄膜的表面容易損傷的缺點。又,非晶性聚合物薄膜與結晶性聚合物薄膜相比,因為也有容易破裂的缺點,在薄膜的搬送時,會有與搬送滾輪等平滑面相密著而成為皺折造成破裂的問題。在這裡,考量到在非晶性聚合物薄膜的一面或兩面設置硬塗層的透明導電性薄膜用的硬塗薄膜。不過,在該情形中,將硬塗薄膜以滾輪狀卷取後,會有重合的硬塗薄膜的基材的裏面與硬塗層、或硬塗層彼此之間密著的黏結問題產生。在這裡,提案有在非晶性聚合物薄膜上設置包含1~5μm的粒子的硬塗層,在硬塗層及該硬塗層上的ITO層(透明導電層)等表面形成凹凸,來改良耐黏結性(anti-blocking)(例如,參照專利文獻2、3)。 However, the use of a transparent conductive film using an amorphous polymer film as a base material can eliminate the occurrence of the above-mentioned interference fringes, but it is amorphous. Compared with a crystalline polymer film, a polymer film has the disadvantage of being easily damaged on the surface of the film. In addition, compared with crystalline polymer films, amorphous polymer films also have the disadvantage of being easy to break. When the film is transported, it adheres to a smooth surface such as a transport roller to cause wrinkles and cracks. Here, consider a hard coat film for a transparent conductive film in which a hard coat layer is provided on one or both sides of an amorphous polymer film. However, in this case, after the hard-coated film is wound in a roller shape, there may be a problem of adhesion between the inner surface of the substrate of the superimposed hard-coated film and the hard coat, or the hard coats adhere to each other. Here, it is proposed to provide a hard coat layer containing particles of 1 to 5 μm on an amorphous polymer film, and form irregularities on the hard coat layer and the surface of the ITO layer (transparent conductive layer) on the hard coat layer to improve Anti-blocking (for example, refer to Patent Documents 2 and 3).

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]特開平7-68690號公報 [Patent Document 1] JP 7-68690 A

[專利文獻2]特開2013-107349號公報 [Patent Document 2] JP 2013-107349 A

[專利文獻3]特開2013-243115號公報 [Patent Document 3] JP 2013-243115 A

但是,為了在ITO層(透明導電層)等的表面形成凹凸,而在成為基材的非晶性聚合物薄膜上,設置包含大小1~5μm的粒子的硬塗層時,因為硬塗層或該硬塗層 上的ITO層(透明導電層)等的厚度,粒子大小為1~2μm時會有耐黏結性不足的疑慮,而粒子大小比2μm還時會有辨識性降低的疑慮。 However, in order to form irregularities on the surface of the ITO layer (transparent conductive layer), etc., when a hard coat layer containing particles of 1 to 5 μm is provided on an amorphous polymer film used as a base material, the hard coat layer or The hard coat The thickness of the upper ITO layer (transparent conductive layer), etc., when the particle size is 1~2μm, there is a concern that the adhesion resistance is insufficient, and when the particle size is greater than 2μm, there is a concern that the visibility will be reduced.

本發明係提供一種透明導電性薄膜用的附光學調整層硬塗薄膜、及使用該附光學調整層硬塗薄膜的透明導電性薄膜,即便是在藉由蒸鍍或濺鍍法等來設置透明導電層的透明導電性薄膜中,也能夠得到充足的耐黏結性,且能夠抑制辨識性的降低。 The present invention provides a hard coat film with an optical adjustment layer for a transparent conductive film, and a transparent conductive film using the hard coat film with an optical adjustment layer, even if the transparent conductive film is installed by vapor deposition or sputtering. Also in the transparent conductive film of the conductive layer, sufficient blocking resistance can be obtained, and the decrease in visibility can be suppressed.

本發明的透明導電性薄膜用的附光學調整層硬塗薄膜、及透明導電性薄膜,為了達成前述目的,由接下來的構成形成。亦即,本發明的透明導電性薄膜用的附光學調整層硬塗薄膜,具備:由非晶性聚合物形成的透明基材薄膜、及在該透明基材薄膜的至少一面依序層積的硬塗層及該硬塗層上的光學調整層。其中,在前述光學調整層,含有複數粒子,該等粒子的平均粒徑比前述光學調整層的平均膜厚還大,且其平均粒徑r1、與其平均膜厚d1為:50nm≦(r1-d1)≦1900nm的關係。接著,前述光學調整層的表面的,除了由前述粒子形成的凸部以外的特定部分的算術平均粗糙度Ra在0.3nm~20nm的範圍。其中,光學調整層由複數層(高折射率層+低折射率層)形成時,平均粒徑r1為填入的粒子(平 均粒徑比平均膜厚d1還大的粒子)全體的平均粒徑,但平均膜厚d1在雙方的層填入粒子時、與僅在高折射率層填入粒子時為全體的平均膜厚,僅在低折射率層填入粒子時為低折射率層的平均膜厚(以下同)。 The hard coat film with an optical adjustment layer for the transparent conductive film of the present invention and the transparent conductive film are formed by the following structure in order to achieve the aforementioned object. That is, the hard coat film with an optical adjustment layer for a transparent conductive film of the present invention includes: a transparent base film formed of an amorphous polymer, and a transparent base film sequentially laminated on at least one side of the transparent base film The hard coat layer and the optical adjustment layer on the hard coat layer. Wherein, the optical adjustment layer contains a plurality of particles, the average particle diameter of the particles is larger than the average film thickness of the optical adjustment layer, and the average particle diameter r1 and the average film thickness d1 are: 50nm≦(r1- d1) The relationship of ≦1900nm. Next, the arithmetic average roughness Ra of the specific part of the surface of the optical adjustment layer except for the convex part formed by the particle is in the range of 0.3 nm to 20 nm. Among them, when the optical adjustment layer is formed of multiple layers (high refractive index layer + low refractive index layer), the average particle size r1 is the filled particles (flat Particles whose average particle size is larger than the average film thickness d1) The average particle size of the whole, but the average film thickness d1 is the average film thickness of the whole when the particles are filled in both layers and when the particles are filled only in the high refractive index layer , Only when the low refractive index layer is filled with particles, is the average film thickness of the low refractive index layer (the same below).

根據該透明導電性薄膜用的附光學調整層硬塗薄膜,在層積於硬塗層上的光學調整層,含有複數粒子。接著,該光學調整層所含有的粒子的平均粒徑r1,比光學調整層的平均膜厚d1還大,且其差在50nm~1900nm的範圍。又,光學調整層的表面的,除了由粒子形成的凸部以外的特定部分的算術平均粗糙度Ra成為0.3nm~20nm的範圍。這樣的話,藉由將光學調整層含有的粒子的平均粒徑與光學調整層的平均膜厚間的差設為50nm以上,且將光學調整層的表面的前述特定部分的算術平均粗糙度Ra設為0.3nm以上,即便是之後在光學調整層上藉由蒸鍍或濺鍍法等來設置透明導電層的透明導電性薄膜中,也能得到充分的耐黏結性。又,藉由將光學調整層含有的粒子的平均粒徑與光學調整層的平均膜厚間的差設為1900nm以下,且將光學調整層的表面的前述特定部分的算術平均粗糙度Ra設為20nm以下,即便是在之後的透明導電性薄膜中,也能抑制辨識性降低。 According to this hard coat film with an optical adjustment layer for a transparent conductive film, the optical adjustment layer laminated on the hard coat layer contains plural particles. Next, the average particle diameter r1 of the particles contained in the optical adjustment layer is larger than the average film thickness d1 of the optical adjustment layer, and the difference is in the range of 50 nm to 1900 nm. In addition, the arithmetic average roughness Ra of the specific part of the surface of the optical adjustment layer excluding the convex part formed by the particles is in the range of 0.3 nm to 20 nm. In this case, by setting the difference between the average particle diameter of the particles contained in the optical adjustment layer and the average film thickness of the optical adjustment layer to 50 nm or more, and setting the arithmetic average roughness Ra of the aforementioned specific portion of the surface of the optical adjustment layer to If the thickness is 0.3 nm or more, even in a transparent conductive film in which a transparent conductive layer is formed on the optical adjustment layer by vapor deposition or sputtering, sufficient adhesion resistance can be obtained. In addition, the difference between the average particle diameter of the particles contained in the optical adjustment layer and the average film thickness of the optical adjustment layer is 1900 nm or less, and the arithmetic average roughness Ra of the aforementioned specific part of the surface of the optical adjustment layer is set to 20nm or less, even in the subsequent transparent conductive film, it is possible to suppress the decrease in visibility.

又,含有於前述光學調整層中的粒子的平均粒徑r1在100nm~2000nm的範圍,其平均粒徑r1(nm)、與其粒子的個數N(個/mm2)為:199.03exp(-0.002r1)≦N≦3676.4exp(-0.002r1) 的關係。其中,粒子的個數N指的是從光學調整層的表面(光學調整層為複數層時,其最表面)起算50nm以上的高度存在的粒子個數(以下同)。 In addition, the average particle diameter r1 of the particles contained in the optical adjustment layer is in the range of 100 nm to 2000 nm, and the average particle diameter r1 (nm) and the number of particles N (pieces/mm 2 ) are: 199.03exp(- 0.002r1)≦N≦3676.4exp(-0.002r1). Here, the number of particles N refers to the number of particles present at a height of 50 nm or more from the surface of the optical adjustment layer (when the optical adjustment layer is a plurality of layers, the outermost surface) (the same applies hereinafter).

又,前述光學調整層的平均膜厚d1、與含有於該光學調整層中的粒子的平均粒徑r1為:(d1/r1)<0.5的關係。 In addition, the average film thickness d1 of the optical adjustment layer and the average particle diameter r1 of the particles contained in the optical adjustment layer have a relationship of (d1/r1)<0.5.

又,在前述硬塗層,含有複數粒子,該等粒子的平均粒徑,比前述硬塗層的平均膜厚還小,該等粒子在前述硬塗層的表面不均勻分佈。 In addition, the hard coat layer contains a plurality of particles, and the average particle diameter of the particles is smaller than the average film thickness of the hard coat layer, and the particles are unevenly distributed on the surface of the hard coat layer.

又,前述硬塗層的平均膜厚d2、與含有於該硬塗層中的粒徑的平均粒徑r2為:(d2/r2)>2的關係。 In addition, the average film thickness d2 of the hard coat layer and the average particle diameter r2 of the particle diameter contained in the hard coat layer have a relationship of (d2/r2)>2.

又,前述光學調整層的表面的谷側面積在每661780μm2為200000μm2以下。在這裡,光學調整層的表面的谷側面積指的是從光學調整層中粒子未存在部分的光學調整層的平均高度起算到成為3nm以上谷側的光學調整層的表面的面積。(以下同) Further, the surface area of the valley side of the optical adjustment layer is 2 or less per 661780μm 2 200000μm. Here, the valley side area of the surface of the optical adjustment layer refers to the area of the surface of the optical adjustment layer on the valley side of 3 nm or more from the average height of the optical adjustment layer in the part where particles do not exist in the optical adjustment layer. (The same below)

又,前述硬塗層及前述光學調整層設於前述透明基材薄膜的一面,在該透明基材薄膜的另一面側貼合保護薄膜以形成最外層也可以。 In addition, the hard coat layer and the optical adjustment layer may be provided on one side of the transparent base film, and a protective film may be bonded to the other side of the transparent base film to form the outermost layer.

又,前述硬塗層及前述光學調整層設於前述透明基材薄膜的兩面,在該透明基材薄膜的另一面側貼合 保護薄膜以形成最外層也可以。 In addition, the hard coat layer and the optical adjustment layer are provided on both sides of the transparent base film, and are bonded to the other side of the transparent base film It is also possible to protect the film to form the outermost layer.

又,本發明的透明導電薄膜,由在前述附光學調整層硬塗薄膜中的光學調整層的表面,形成透明導電層而形成。 In addition, the transparent conductive film of the present invention is formed by forming a transparent conductive layer on the surface of the optical adjustment layer in the aforementioned hard coat film with an optical adjustment layer.

根據本發明的透明導電性薄膜用的附光學調整層硬塗薄膜,藉由使光學調整層含有粒子,且使該粒子的平均粒徑比光學調整層的平均膜厚還大且在50nm~1900nm的範圍,並使光學調整層的表面的除了由粒子形成的凸部以外的特定部分的算術平均粗糙度Ra為0.3nm~20nm,即便是在之後設有透明導電層的透明導電性薄膜中,也能夠得到充足的耐黏結性,且能夠抑制辨識性的降低。 According to the hard coat film with an optical adjustment layer for a transparent conductive film of the present invention, the optical adjustment layer contains particles, and the average particle size of the particles is larger than the average film thickness of the optical adjustment layer and is between 50 nm and 1900 nm The arithmetic average roughness Ra of the specific part of the surface of the optical adjustment layer except for the convex part formed by the particles is 0.3nm~20nm, even in the transparent conductive film provided with the transparent conductive layer later, It is also possible to obtain sufficient adhesion resistance, and it is possible to suppress the decrease in visibility.

1:附光學調整層硬塗薄膜 1: With optical adjustment layer hard coating film

2:透明基材薄膜 2: Transparent substrate film

3:硬塗層 3: Hard coating

3a:粒子 3a: particles

4:光學調整層 4: Optical adjustment layer

4a:粒子 4a: particles

6:保護薄膜 6: Protective film

[圖1]本發明的第一實施形態的附光學調整層硬塗薄膜的剖面模式圖。 [Fig. 1] A schematic cross-sectional view of a hard coat film with an optical adjustment layer according to the first embodiment of the present invention.

[圖2]表示同樣的光學調整層的粒子平均粒徑與個數的關係的圖。 [Fig. 2] A graph showing the relationship between the average particle size and the number of particles in the same optical adjustment layer.

[圖3]本發明的第二實施形態的附光學調整層硬塗薄膜的剖面模式圖。 [Fig. 3] A schematic cross-sectional view of a hard coat film with an optical adjustment layer according to a second embodiment of the present invention.

[圖4]本發明的第三實施形態的附光學調整層硬塗薄 膜的剖面模式圖。 [Fig. 4] The third embodiment of the present invention is a hard-coated thin film with an optical adjustment layer A schematic cross-sectional view of the membrane.

[圖5]本發明的其他實施形態的附光學調整層硬塗薄膜的剖面模式圖。 [Fig. 5] A schematic cross-sectional view of a hard coat film with an optical adjustment layer according to another embodiment of the present invention.

[圖6]本發明的又一個實施形態的附光學調整層硬塗薄膜的剖面模式圖。 [Fig. 6] A schematic cross-sectional view of a hard coat film with an optical adjustment layer according to another embodiment of the present invention.

以下,根據圖式說明關於用以實施本發明的透明導電性薄膜用的附光學調整層硬塗薄膜、及透明導電性薄膜的形態。 Hereinafter, the form of the hard coat film with an optical adjustment layer and the transparent conductive film for implementing the transparent conductive film of the present invention will be described based on the drawings.

圖1~圖2表示本發明的第一實施形態。圖中符號1表示用於透明導電性薄膜的附光學調整層硬塗薄膜。2表示透明基材薄膜。3表示硬塗層。4表示光學調整層。 Figures 1 to 2 show the first embodiment of the present invention. The symbol 1 in the figure represents a hard coat film with an optical adjustment layer used for a transparent conductive film. 2 represents a transparent substrate film. 3 means hard coat. 4 represents the optical adjustment layer.

附光學調整層硬塗薄膜1,具備:透明基材薄膜2、及在該透明基材薄膜2的至少一面(圖示的實施形態中為一面)依序層積的硬塗層3及該硬塗層3上的光學調整層4。 The hard coat film 1 with an optical adjustment layer includes: a transparent base film 2, and a hard coat layer 3 sequentially laminated on at least one side of the transparent base film 2 (one side in the embodiment shown in the figure) and the hard The optical adjustment layer 4 on the coating 3.

其中,在光學調整層4含有複數粒子4a、4a,該等粒子4a、4a的平均粒徑比光學調整層4的平均膜厚還大,且其平均粒徑r1、與其平均膜厚d1為:50nm≦(r1-d1)≦1900nm的關係。也就是說,平均粒徑r1比平均膜厚d1還大50nm~1900nm。接著,光學調整層4的表面的,除了由含於該光 學調整層4的前述粒子4a形成的凸部以外的特定部分的算術平均粗糙度Ra為0.3nm~20nm(較佳為0.3nm~10nm)的範圍。 Among them, the optical adjustment layer 4 contains a plurality of particles 4a, 4a, the average particle diameter of the particles 4a, 4a is larger than the average film thickness of the optical adjustment layer 4, and the average particle diameter r1 and the average film thickness d1 are: 50nm≦(r1-d1)≦1900nm. In other words, the average particle diameter r1 is larger than the average film thickness d1 by 50 nm to 1900 nm. Next, the surface of the optical adjustment layer 4, in addition to the light contained in the The arithmetic average roughness Ra of the specific part other than the convex part formed by the aforementioned particles 4a of the science adjustment layer 4 is in the range of 0.3 nm to 20 nm (preferably 0.3 nm to 10 nm).

其中,透明導電性薄膜(圖未示)為在該附光學調整層硬塗薄膜1中的光學調整層4的表面形成導電層而形成者。 Among them, the transparent conductive film (not shown) is formed by forming a conductive layer on the surface of the optical adjustment layer 4 in the hard coat film 1 with an optical adjustment layer.

根據該附光學調整層硬塗薄膜1,在層積於硬塗層3上的光學調整層4,含有複數粒子4a、4a。接著,該光學調整層4含有的粒子4a的平均粒徑r1,比光學調整層4的平均膜厚d1還大,且其差在50nm~1900nm的範圍。又,光學調整層4的表面的,除了由粒子4a形成的凸部以外的特定部分的算術平均粗糙度Ra成為0.3nm~20nm的範圍。藉由將光學調整層4含有的粒子4a的平均粒徑r1與光學調整層4的平均膜厚d1間的差設為50nm以上,且將光學調整層4的表面的前述特定部分的算術平均粗糙度Ra設為0.3nm以上,即便是之後在光學調整層4上藉由蒸鍍或濺鍍法等來設置透明導電層的透明導電性薄膜中,也能得到充分的耐黏結性。也就是說,藉由由粒子4a形成的凸部、及形成特定部分的算術平均粗糙度的凸部4b的2種類的凸部,不只是該附光學調整層硬塗薄膜1,連在之後的透明導電性薄膜中,也發現耐黏結性。又,藉由將光學調整層4含有的粒子4a的平均粒徑r1與光學調整層4的平均膜厚d1間的差設為1900nm以下,且將光學調整層4的表面的前述特定部分的算術平均粗糙度Ra設為20nm以下,即便是在 之後的透明導電性薄膜中,也能抑制辨識性降低。 According to this hard coat film 1 with an optical adjustment layer, the optical adjustment layer 4 laminated on the hard coat layer 3 contains plural particles 4a and 4a. Next, the average particle diameter r1 of the particles 4a contained in the optical adjustment layer 4 is larger than the average film thickness d1 of the optical adjustment layer 4, and the difference is in the range of 50 nm to 1900 nm. In addition, the arithmetic average roughness Ra of the specific part of the surface of the optical adjustment layer 4 excluding the convex part formed by the particles 4a is in the range of 0.3 nm to 20 nm. By setting the difference between the average particle diameter r1 of the particles 4a contained in the optical adjustment layer 4 and the average film thickness d1 of the optical adjustment layer 4 to 50 nm or more, and the arithmetic average roughness of the aforementioned specific part of the surface of the optical adjustment layer 4 When the degree Ra is set to 0.3 nm or more, even in a transparent conductive film in which a transparent conductive layer is provided on the optical adjustment layer 4 by vapor deposition, sputtering, or the like, sufficient adhesion resistance can be obtained. In other words, two types of protrusions, including the protrusions formed by the particles 4a and the protrusions 4b that form the arithmetic average roughness of the specific part, are not only the hard coat film with optical adjustment layer 1, but also the subsequent ones. In the transparent conductive film, adhesion resistance is also found. In addition, by setting the difference between the average particle size r1 of the particles 4a contained in the optical adjustment layer 4 and the average film thickness d1 of the optical adjustment layer 4 to 1900 nm or less, the arithmetic calculation of the aforementioned specific part of the surface of the optical adjustment layer 4 The average roughness Ra is set to 20nm or less, even in In the subsequent transparent conductive film, the reduction in visibility can also be suppressed.

這樣,藉由使光學調整層4含有粒子4a,且使該粒子4a的平均粒徑比光學調整層4的平均膜厚還大且在50nm~1900nm的範圍,並使光學調整層4的表面的特定部分的算術平均粗糙度Ra為0.3nm~20nm,即便是在之後設置透明導電層的透明導電性薄膜中,也能夠得到充足的耐黏結性,且能夠抑制辨識性的降低。 In this way, by making the optical adjustment layer 4 contain the particles 4a, and the average particle size of the particles 4a is larger than the average film thickness of the optical adjustment layer 4 and in the range of 50nm~1900nm, and the surface of the optical adjustment layer 4 The arithmetic average roughness Ra of the specific part is 0.3nm~20nm. Even in the transparent conductive film where the transparent conductive layer is provided later, sufficient adhesion resistance can be obtained and the decrease in visibility can be suppressed.

此外,本發明的透明導電性薄膜用的附光學調整層硬塗薄膜1雖較適合作為靜電容量式的觸控面板使用,但其不限於前述觸控面板用。 In addition, although the hard coat film 1 with an optical adjustment layer for a transparent conductive film of the present invention is more suitable for use as a capacitive touch panel, it is not limited to the aforementioned touch panel use.

具體來說,透明基材薄膜2由非晶性聚合物形成。作為該非晶性聚合物,為具有脂環構造的非晶質烯烴較佳,但不限於此。作為非晶質烯烴,例如,有環烯烴聚合物及環烯烴共聚物等。又,該透明基材薄膜2的材料,可以是聚碳酸酯及三醋酸纖維素及聚醯亞胺等。該透明基材薄膜2的厚度,較佳為10μm~500μm,更佳為10μm~200μm,再更佳為20μm~100μm。又,藉由在透明基材薄膜2的表面,預先施以易黏接層的塗佈或電暈放電處理等的物理處理等的前處理,能夠使與層積的硬塗層3間的密著性提升。 Specifically, the transparent base film 2 is formed of an amorphous polymer. As the amorphous polymer, an amorphous olefin having an alicyclic structure is preferred, but it is not limited to this. Examples of amorphous olefins include cycloolefin polymers and cycloolefin copolymers. In addition, the material of the transparent base film 2 may be polycarbonate, cellulose triacetate, polyimide, or the like. The thickness of the transparent substrate film 2 is preferably 10 μm to 500 μm, more preferably 10 μm to 200 μm, and still more preferably 20 μm to 100 μm. In addition, by applying pretreatments such as coating of an easy-adhesion layer or physical treatment such as corona discharge treatment on the surface of the transparent base film 2, it is possible to make the layered hard coat layer 3 dense Significant improvement.

硬塗層3其平均膜厚,為了得到硬塗層性在0.5μm~10.0μm的範圍較佳,在0.75μm~5.0μm的範圍更佳。膜厚未滿0.5μm的話,會有硬塗層3的硬度不充足的疑慮,超過10.0μm的話,硬塗層3或其上的層會產生裂縫, 不只有卷取困難的疑慮,也有透明性等光學特性降低的疑慮。 The average film thickness of the hard coat layer 3 is preferably in the range of 0.5 μm to 10.0 μm, and more preferably in the range of 0.75 μm to 5.0 μm in order to obtain hard coat properties. If the film thickness is less than 0.5 μm, the hardness of the hard coat layer 3 may be insufficient. If the thickness exceeds 10.0 μm, the hard coat layer 3 or the layer on it may crack. There is not only the difficulty of winding, but also the deterioration of optical properties such as transparency.

再來,為了得到光學調整層的前述特定部分的凸部4b(也就是特定部分的算術平均粗糙度Ra的前述值),硬塗層3的表面(也就是與透明基材薄膜2之側相反的面),算術平均粗糙度Ra為2nm~20nm的範圍較佳,為3nm~10nm更佳。硬塗層3的表面的算術平均粗糙度Ra若未滿2nm,之後的光學調整層4的前述特定部分的算術平均粗糙度Ra會有未滿0.3nm的疑慮,耐黏結性會降低。又,硬塗層3的表面的算術平均粗糙度Ra若比20nm還大,透明性等的光學特性會有降低的疑慮。 Furthermore, in order to obtain the convex part 4b of the aforementioned specific part of the optical adjustment layer (that is, the aforementioned value of the arithmetic mean roughness Ra of the specific part), the surface of the hard coat layer 3 (that is, the surface opposite to the transparent substrate film 2)的面), the arithmetic average roughness Ra is preferably in the range of 2nm~20nm, more preferably 3nm~10nm. If the arithmetic average roughness Ra of the surface of the hard coat layer 3 is less than 2 nm, the arithmetic average roughness Ra of the aforementioned specific part of the subsequent optical adjustment layer 4 may be less than 0.3 nm, and the adhesion resistance may decrease. In addition, if the arithmetic average roughness Ra of the surface of the hard coat layer 3 is greater than 20 nm, there is a concern that optical properties such as transparency may be reduced.

在圖示實施形態中,在硬塗層3含有複數粒子3a、3a,該等粒子3a、3a的平均粒徑比硬塗層3的平均膜厚還小。接著,該等粒子3a、3a在硬塗層3的表面(也就是與透明基材薄膜2存在之側相反的面)不均勻分佈。其中,如追隨著在硬塗層3的表面不均勻分佈的該等粒子3a、3a所形成的表面凸部那樣,在該硬塗層3之上的光學調整層4的表面形成凸部4b、4b,該等凸部4b、4b反映至光學調整層4的表面的特定部分的算術平均粗糙度Ra之值。 In the illustrated embodiment, the hard coat layer 3 contains plural particles 3 a and 3 a, and the average particle diameter of the particles 3 a and 3 a is smaller than the average film thickness of the hard coat layer 3. Next, the particles 3a and 3a are unevenly distributed on the surface of the hard coat layer 3 (that is, the surface opposite to the side where the transparent base film 2 exists). Among them, as the surface protrusions formed by the particles 3a, 3a that are unevenly distributed on the surface of the hard coat layer 3, protrusions 4b, 4b, 3a are formed on the surface of the optical adjustment layer 4 on the hard coat layer 3, 4b, the convex portions 4b and 4b reflect the value of the arithmetic average roughness Ra of the specific part of the surface of the optical adjustment layer 4.

詳細來說,用以形成硬塗層3的硬塗塗佈液包含:黏結劑、比硬塗層3的平均膜厚還小的平均粒徑的複數粒子3a、3a、及溶劑。接著,將該硬塗塗佈液塗佈於透明基材薄膜2,並乾燥,而在UV曝光中(特別是在乾燥工程中),使粒子3a在硬塗層3的表面不均勻分佈。藉由使用 該方法,能夠均勻且有效率地得到硬塗層3的表面的適合的表面粗糙度。 Specifically, the hard coat coating liquid for forming the hard coat layer 3 includes a binder, plural particles 3 a and 3 a having an average particle diameter smaller than the average film thickness of the hard coat layer 3, and a solvent. Next, the hard coat coating liquid is applied to the transparent substrate film 2 and dried, and during UV exposure (especially in the drying process), the particles 3 a are unevenly distributed on the surface of the hard coat 3. By using With this method, the suitable surface roughness of the surface of the hard coat layer 3 can be obtained uniformly and efficiently.

硬塗塗佈液詳細來說是形成硬塗層3的硬化性組成物,含有粒子3a、黏結劑,較佳為藉由紫外光硬化者。硬塗塗佈液中含有的黏結劑,雖沒有特別的限定,但為了確保耐傷性並賦予柔軟性,可以使用聚氨酯丙烯酸。硬塗塗佈液中含有的粒子3a的平均粒徑較佳為50nm~500nm的範圍,更佳為80nm~400nm的範圍,再更佳為120nm~400nm的範圍。其中,雖藉由該等粒子3a、3a在表面形成凸部,但平均粒徑未滿50nm時會有無法在表面形成充足凸部的疑慮,平均粒徑超過500nm的話,會有霧度(haze)上升的疑慮。又,硬塗層3的平均膜厚d2、與含有於該硬塗層3中的粒子3a的平均粒徑r2為(d2/r2)>2的關係較佳,藉由使其在該範圍,能夠抑制霧度(haze)的上升。 Specifically, the hard coat coating liquid is a curable composition that forms the hard coat 3, and contains particles 3a and a binder, and is preferably cured by ultraviolet light. Although the binder contained in the hard coat coating liquid is not particularly limited, in order to ensure scratch resistance and impart flexibility, urethane acrylic can be used. The average particle diameter of the particles 3a contained in the hard coat coating liquid is preferably in the range of 50 nm to 500 nm, more preferably in the range of 80 nm to 400 nm, and still more preferably in the range of 120 nm to 400 nm. Among them, although these particles 3a, 3a form convex parts on the surface, if the average particle size is less than 50nm, there is a concern that sufficient convex parts cannot be formed on the surface. If the average particle size exceeds 500nm, there will be haze (haze ) Rising doubts. In addition, the average film thickness d2 of the hard coat layer 3 and the average particle diameter r2 of the particles 3a contained in the hard coat layer 3 preferably have a relationship of (d2/r2)>2. By making it within this range, The increase in haze can be suppressed.

作為粒子3a,雖沒有特別的限定,但能使用各種無機系、有機系的粒子。作為該粒子3a,例如,有將二氧化矽、氧化鋁、二氧化鈦、丙烯酸樹脂、苯乙烯-丙烯酸共聚合樹脂、苯乙烯樹脂、聚氨酯樹脂、環氧樹脂、有機矽樹脂、聚乙烯樹脂、酚醛樹脂等作為素材的粒子等,但不限於此,組合2種以上也可以。 Although there are no particular limitations on the particles 3a, various inorganic and organic particles can be used. As the particles 3a, for example, there are silicon dioxide, aluminum oxide, titanium dioxide, acrylic resin, styrene-acrylic copolymer resin, styrene resin, polyurethane resin, epoxy resin, silicone resin, polyethylene resin, and phenol resin. However, it is not limited to particles and the like as materials, and two or more types may be combined.

粒子3a使用有機系粒子時,為了得到所期望的平均粒徑的粒子,使用丙烯酸系粒子而藉由乳化聚合法來合成者較佳。 When organic particles are used as the particles 3a, in order to obtain particles with a desired average particle diameter, it is preferable to use acrylic particles and synthesize by an emulsion polymerization method.

又,粒子3a使用無機系粒子時,使用以表面 處理及界面活性劑等將表面自由能降低的二氧化矽粒子較佳。藉由這樣讓表面自由能降低,粒子3a容易不均勻分佈於硬塗層3的表面。 In addition, when inorganic particles are used for the particles 3a, the surface Silicon dioxide particles whose surface free energy is reduced by treatment and surfactants are preferred. By reducing the surface free energy in this way, the particles 3a are likely to be unevenly distributed on the surface of the hard coat layer 3.

又,在硬塗塗佈液中,因應必要,在不影響性能的範圍內包含分散劑、均勻劑、消泡劑、觸變劑、防污劑、抗菌劑、阻燃劑、損傷防止劑、增滑劑等添加劑也可以。 In addition, in the hard coat coating liquid, if necessary, dispersing agents, leveling agents, defoaming agents, thixotropic agents, antifouling agents, antibacterial agents, flame retardants, damage prevention agents, etc. are contained within a range that does not affect performance. Additives such as slip agents may also be used.

又,從膜厚的調整等觀點來看,使用有機溶劑將硬塗塗佈液稀釋也可以。例如,能夠使用乙二醇單甲基醚、丙二醇單甲基醚(PGM)、二乙二醇單丁基醚的這種醇系有機溶劑、或甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環己酮(anone)、丙酮等的這種酮系有機溶劑、或乙酸丁酯、乙酸乙酯、乳酸乙酯、丙二醇單甲基醚乙酸酯等這種酯系有機溶劑、或甲苯、二甲苯等的芳香族系有機溶劑、或N-甲基吡咯烷酮、二甲基乙醯胺、二甲基甲醯胺等這種醯胺系有機溶劑等。接著,該等例示的有機溶劑,可以單獨,也可以組合2種以上來使用,但該溶解度參數δ為8~11的範圍較佳,溶解度參數δ為8~10的範圍更佳。 In addition, from the viewpoint of adjustment of the film thickness, etc., the hard coat coating liquid may be diluted with an organic solvent. For example, alcohol-based organic solvents such as ethylene glycol monomethyl ether, propylene glycol monomethyl ether (PGM), and diethylene glycol monobutyl ether, or methyl ethyl ketone (MEK), methyl isopropyl ether can be used. Ketone organic solvents such as butyl ketone (MIBK), cyclohexanone (anone), and acetone, or ester systems such as butyl acetate, ethyl acetate, ethyl lactate, and propylene glycol monomethyl ether acetate Organic solvents, aromatic organic solvents such as toluene and xylene, or amine-based organic solvents such as N-methylpyrrolidone, dimethylacetamide, and dimethylformamide. Next, the exemplified organic solvents may be used alone or in combination of two or more, but the solubility parameter δ is preferably in the range of 8-11, and the solubility parameter δ is more preferably in the range of 8-10.

塗佈,例如,可以使用反向凹印塗佈法、直接凹印塗佈法、晶片塗層法、模塗布法、線棒塗層法、滾輪塗佈法、旋轉塗佈法、浸塗法、噴塗法、刮塗法、觸壓塗佈法等這種塗佈方法、或各種印刷方法,但不限於該等方法。 For coating, for example, reverse gravure coating method, direct gravure coating method, wafer coating method, die coating method, wire bar coating method, roller coating method, spin coating method, dip coating method can be used , Spraying method, blade coating method, contact pressure coating method and other coating methods, or various printing methods, but not limited to these methods.

關於乾燥工程,若乾燥過快,因為凝集/向表面的不均勻分佈會變得不充分,乾燥以50℃~120℃的溫度以10秒~180秒左右進行較佳,特別是乾燥溫度為50℃~80℃較佳。乾燥時間雖越長越好,但若考慮生產性,設為10秒~120秒更佳。 Regarding the drying process, if the drying process is too fast, the aggregation/uneven distribution to the surface will become insufficient. Drying is preferably carried out at a temperature of 50°C to 120°C for 10 seconds to 180 seconds, especially the drying temperature is 50 ℃~80℃ is better. The longer the drying time is, the better, but in consideration of productivity, it is better to set it to 10 seconds to 120 seconds.

關於UV曝光工程,在乾燥後,藉由對硬塗層3照射紫外光而使其硬化,能夠將粒子3a的凝集體在硬塗層3的表面之側固定化。紫外光的照射,可以使用高壓水銀燈、無電極(微波方式)燈、氙氣燈、金屬鹵素燈、及其他任意的紫外光照射裝置,因應必要以氮等的不活性氣體氛圍化進行紫外光照射也可以。又,紫外光的照射量為50~800mJ/cm2的範圍較佳,更佳為100~300mJ/cm2的範圍。 Regarding the UV exposure process, after drying, by irradiating the hard coat layer 3 with ultraviolet light to harden it, it is possible to fix the aggregates of the particles 3 a on the surface side of the hard coat layer 3. Ultraviolet light can be irradiated with high-pressure mercury lamp, electrodeless (microwave method) lamp, xenon lamp, metal halide lamp, and any other ultraviolet light irradiation device. If necessary, it can also be irradiated with inert gas atmosphere such as nitrogen. can. In addition, the irradiation amount of ultraviolet light is preferably in the range of 50 to 800 mJ/cm 2 and more preferably in the range of 100 to 300 mJ/cm 2 .

光學調整層4,根據透明導電性薄膜的經圖案化的透明導電層存在的部分與不存在的部分的反射率差異,為了緩和可目視該圖案的現象(也就是圖形可視現象),在硬塗層3上層積。為了緩和該圖形可視現象,可以將光學調整層4的折射率設在透明導電層的折射率與硬塗層3的折射率之間,因此,光學調整層4的折射率為1.55~1.80的範圍較佳。又,該光學調整層4的平均膜厚,雖根據透明基材薄膜2、硬塗層3、光學調整層4的折射率而有所不同,但在5nm~500nm的範圍,調整成透明導電層存在的部分與不存在的部分的反射率差盡可能地變小的厚度較佳。光學調整層4的膜厚若未滿5nm的話,會有粒子4a脫落的疑慮,當為比500nm還大的膜厚時,在將透明導電層 及金屬層等製膜後會有無法得到充足的耐黏結性之疑慮。 The optical adjustment layer 4 is based on the difference in reflectance between the part where the patterned transparent conductive layer of the transparent conductive film and the part where the transparent conductive layer does not exist. In order to alleviate the phenomenon that the pattern can be seen visually (that is, the pattern visibility phenomenon), it is hard-coated Layer 3 is stacked on top. In order to alleviate the visible phenomenon of the figure, the refractive index of the optical adjustment layer 4 can be set between the refractive index of the transparent conductive layer and the refractive index of the hard coat layer 3. Therefore, the refractive index of the optical adjustment layer 4 is in the range of 1.55 to 1.80 Better. In addition, the average film thickness of the optical adjustment layer 4 varies depending on the refractive index of the transparent base film 2, the hard coat layer 3, and the optical adjustment layer 4, but it is adjusted to a transparent conductive layer in the range of 5 nm to 500 nm The thickness of the difference in reflectance between the existing part and the non-existing part is made as small as possible. If the film thickness of the optical adjustment layer 4 is less than 5nm, there is a concern that the particles 4a will fall off. When the film thickness is greater than 500nm, the transparent conductive layer There is a concern that sufficient adhesion resistance cannot be obtained after film formation, such as the metal layer.

光學調整層4中含有的粒子4a的平均粒徑為100nm~2000nm的範圍較佳,為200nm~1500nm更佳,為400nm~1000nm又更佳。藉由使粒子4a的平均粒徑在該範圍內,藉由蒸鍍或濺鍍法將透明導電層或金屬層製膜後也能使其維持充分的耐黏結性,且能夠抑制辨識性的降低。粒子4a的平均粒徑若未滿100nm,藉由蒸鍍或濺鍍法將透明導電層及金屬層等製膜後會有無法得到充足的耐黏結性之疑慮,粒子4a的平均粒徑比2000nm還大時會有辨識性降低的疑慮。 The average particle diameter of the particles 4a contained in the optical adjustment layer 4 is preferably in the range of 100 nm to 2000 nm, more preferably 200 nm to 1500 nm, and even more preferably 400 nm to 1000 nm. By making the average particle size of the particles 4a within this range, the transparent conductive layer or the metal layer can be formed by vapor deposition or sputtering to maintain sufficient adhesion resistance, and it is possible to suppress the decrease in visibility . If the average particle size of the particles 4a is less than 100nm, there is a concern that sufficient adhesion resistance cannot be obtained after the transparent conductive layer and the metal layer are formed by vapor deposition or sputtering. The average particle size of the particles 4a is more than 2000nm When it is still old, there will be doubts about reduced identifiability.

又,光學調整層4的平均膜厚d1、與含有於該光學調整層4中的粒子4a的平均粒徑r1的關係設為(d1/r1)<0.5較佳。藉由設為該範圍,即便縮小粒子4a的平均粒徑r1,也能夠製作有充足高度的凸部。接著,能夠調整光學調整層4的膜厚、透明導電層的膜厚、金屬層的膜厚調整粒子4a的平均粒徑。 In addition, the relationship between the average film thickness d1 of the optical adjustment layer 4 and the average particle diameter r1 of the particles 4a contained in the optical adjustment layer 4 is preferably (d1/r1)<0.5. By setting it as this range, even if the average particle diameter r1 of the particle 4a is reduced, the convex part with sufficient height can be produced. Next, the film thickness of the optical adjustment layer 4, the film thickness of the transparent conductive layer, and the average particle diameter of the film thickness adjustment particles 4a of the metal layer can be adjusted.

其中,設為(d1/r1)<0.5的話,粒子4a的一半以上成為凸部,雖有因摩擦等而造成粒子4a脫落的疑慮,但因為存在光學調整層4的前述特定部分的凸部4b,易滑性上升,能夠防止摩擦等造成的粒子4a脫落。 However, if (d1/r1)<0.5, more than half of the particles 4a become convex portions. Although there is a concern that the particles 4a may fall off due to friction or the like, it is because there are convex portions 4b in the aforementioned specific portion of the optical adjustment layer 4 , The slipperiness is increased, and the particles 4a can be prevented from falling off due to friction or the like.

粒子4a的添加量根據粒子4a的平均粒徑而最適的量有所差異,該平均粒徑r1(nm)、與該粒子4a的個數N(個/mm2)為:199.03exp(-0.002r1)≦N≦3676.4exp(-0.002r1) 的關係較佳(將該N的範圍以圖2中的向右上升的斜線來表示)。接著,更佳為:480.48exp(-0.002r1)≦N≦2277exp(-0.002r1)的關係(將該N的範圍以圖2中的向右下降的斜線來表示)。 The amount of particles 4a added varies according to the average particle size of the particles 4a. The average particle size r1 (nm) and the number of particles 4a N (pieces/mm 2 ) are: 199.03exp(-0.002) The relationship of r1)≦N≦3676.4exp(-0.002r1) is preferable (the range of N is represented by the diagonal line rising to the right in FIG. 2). Next, it is more preferable to have a relationship of 480.48exp(-0.002r1)≦N≦2277exp(-0.002r1) (the range of N is represented by a diagonal line descending to the right in FIG. 2).

又,當在該光學調整層4中含有的粒子4a所未存在的部分的光學調整層4的表面產生大起伏時,設置ITO等導電膜時,會有難以通導的情形。在這裡,從前述粒子4a的未存在部分的光學調整層4的平均高度起算到成為3nm以上谷側的光學調整層4的表面的面積(光學調整層4的表面的谷側面積),較佳為每661780μm2為200000μm2以下,更佳為150000μm2以下。亦即,粒子4a的未存在部分的光學調整層4的表面完全平坦雖然對透明導電膜的導通而言較佳,但因為有耐黏結性的問題,藉由前述凸部4b能解決該相反的問題。 Moreover, when the surface of the optical adjustment layer 4 in the portion where the particles 4a contained in the optical adjustment layer 4 does not exist has large undulations, it may be difficult to conduct conduction when a conductive film such as ITO is provided. Here, the area of the surface of the optical adjustment layer 4 (the area of the valley side of the surface of the optical adjustment layer 4) on the valley side of 3 nm or more from the average height of the optical adjustment layer 4 in the non-existent part of the particle 4a is preferably per 661780μm 2 is 200000μm 2 or less, more preferably 150000μm 2 or less. That is, the surface of the optical adjustment layer 4 of the non-existing part of the particle 4a is completely flat. Although it is better for the conduction of the transparent conductive film, it has the problem of adhesion resistance. The opposite can be solved by the aforementioned convex portion 4b. problem.

該光學調整層4,藉由將該光學調整層塗佈液,塗佈於硬塗層3的表面並乾燥,進行UV曝光而得到。作為光學調整層塗佈液,可以使用調整折射率的習知塗材(例如愛克工業株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L(製品名)」或東洋科美株式會社(Toyochem Co.,Ltd.)製「(LIODURAS)TYZ-A15-S(製品名)」)。為了得到1.55~1.80的高折射率,包含金屬氧化粒子也可以。作為該金屬氧化粒子,例如,有鈦、鋯、錫、鋅、矽、鈮、鋁、鉻、鎂、鍺、鎵、銻、鉑等的氧化物,但特別是氧化鋯、氧化鈦較佳。又,將該等氧化物作 複數種組合也可以。 The optical adjustment layer 4 is obtained by applying the optical adjustment layer coating liquid on the surface of the hard coat layer 3, drying, and UV exposure. As the coating liquid for the optical adjustment layer, a conventional coating material for adjusting refractive index (for example, "(AICAAITRON) Z-816-3L (product name)" manufactured by Aica Kogyo Co., Ltd.) can be used. "(LIODURAS)TYZ-A15-S (product name)" manufactured by Toyochem Co., Ltd.). In order to obtain a high refractive index of 1.55 to 1.80, metal oxide particles may be included. Examples of the metal oxide particles include oxides of titanium, zirconium, tin, zinc, silicon, niobium, aluminum, chromium, magnesium, germanium, gallium, antimony, platinum, etc., but zirconium oxide and titanium oxide are particularly preferred. Also, make these oxides Multiple combinations are also possible.

作為含有於光學調整層4中的粒子4a的材料,能使用無機系、有機系的多分散或單分散的習知粒子(例如,綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「MX-80H3wT(製品名)」)。 As the material of the particles 4a contained in the optical adjustment layer 4, inorganic or organic polydispersed or monodispersed conventional particles (for example, manufactured by Soken Chemical & Engineering Co., Ltd.) can be used. "MX-80H3wT (product name)").

又,因應必要,在不影響性能的範圍內在光學調整層塗佈液中包含分散劑、均勻劑、消泡劑、觸變劑、防污劑、抗菌劑、阻燃劑、損傷防止劑、增滑劑等添加劑也可以。特別是均勻劑,以減少光學調整層4表面的谷側面積為目的,調整表面張力降低能力較佳。 In addition, if necessary, a dispersant, leveling agent, defoaming agent, thixotropic agent, antifouling agent, antibacterial agent, flame retardant, damage prevention agent, and enhancement agent are included in the optical adjustment layer coating liquid within the range that does not affect the performance. Additives such as slip agents may also be used. In particular, the leveling agent has the purpose of reducing the valley side area of the surface of the optical adjustment layer 4, and has a better ability to adjust the surface tension reduction.

又,從膜厚的調整等觀點來看,使用有機溶劑將光學調整層塗佈液稀釋也可以。例如,能夠使用乙二醇單甲基醚、丙二醇單甲基醚(PGM)、二乙二醇單丁基醚的這種醇系有機溶劑、或甲基乙基酮(MEK)、甲基異丁基酮(MIBK)、環己酮(anone)、丙酮等的這種酮系有機溶劑、或乙酸丁酯、乙酸乙酯、乳酸乙酯、丙二醇單甲基醚乙酸酯等這種酯系有機溶劑、或甲苯、二甲苯等的芳香族系有機溶劑、或N-甲基吡咯烷酮、二甲基乙醯胺、二甲基甲醯胺等這種醯胺系有機溶劑等。接著,該等例示的有機溶劑,可以單獨,也可以組合2種以上來使用,但該溶解度參數δ為8~11的範圍較佳,δ為8~10的範圍又更佳。使用的有機溶劑的表面張力為20~40dyne/cm2的範圍較佳,以減少光學調整層4表面的谷側面積為目的,在乾燥工程引起的塗膜的濃度上升中,以減少對各濃度的表面張力的 差的方式選定光學調整層塗佈液的有機溶劑種類較佳。 In addition, from the viewpoint of adjustment of the film thickness, etc., the optical adjustment layer coating liquid may be diluted with an organic solvent. For example, it is possible to use alcohol-based organic solvents such as ethylene glycol monomethyl ether, propylene glycol monomethyl ether (PGM), and diethylene glycol monobutyl ether, or methyl ethyl ketone (MEK) and methyl isopropyl ether. Ketone organic solvents such as butyl ketone (MIBK), cyclohexanone (anone), and acetone, or ester systems such as butyl acetate, ethyl acetate, ethyl lactate, and propylene glycol monomethyl ether acetate Organic solvents, aromatic organic solvents such as toluene and xylene, or amine-based organic solvents such as N-methylpyrrolidone, dimethylacetamide, and dimethylformamide. Next, these exemplified organic solvents may be used alone or in combination of two or more, but the solubility parameter δ is preferably in the range of 8-11, and δ is more preferably in the range of 8-10. The surface tension of the organic solvent used is 20 ~ 40dyne / cm 2 and preferably, in order to reduce the area of the valley-side surface of the optical adjustment layer 4 for the purpose of drying the coating concentration increases due to engineering in order to reduce the concentration of each It is better to select the organic solvent type of the coating liquid for the optical adjustment layer as the method of the difference in surface tension.

塗佈,例如,可以使用反向凹印塗佈法、直接凹印塗佈法、晶片塗層法、模塗布法、線棒塗層法、滾輪塗佈法、旋轉塗佈法、浸塗法、噴塗法、刮塗法、觸壓塗佈法等這種塗佈方法、或各種印刷方法,但不限於該等方法。 For coating, for example, reverse gravure coating method, direct gravure coating method, wafer coating method, die coating method, wire bar coating method, roller coating method, spin coating method, dip coating method can be used , Spraying method, blade coating method, contact pressure coating method and other coating methods, or various printing methods, but not limited to these methods.

關於乾燥工程,從生產性的觀點來看以50℃~150℃的溫度以10秒~180秒左右進行較佳。溫度若在不影響性能的範圍內,若高的話因為硬化的塗膜面的黏度下降,快速平坦化(平滑化)而光學調整層4表面的谷側面積會減少,因此設為80℃~150℃較佳。 Regarding the drying process, it is preferable to perform the drying process at a temperature of 50°C to 150°C for about 10 seconds to 180 seconds from the viewpoint of productivity. If the temperature is within the range that does not affect the performance, if it is high, the viscosity of the hardened coating film surface will decrease, and the surface area of the valley side of the optical adjustment layer 4 will decrease due to rapid flattening (smoothing), so set it to 80°C~150 ℃ is better.

關於UV曝光工程,在乾燥後,藉由對光學調整層4照射紫外光而使其硬化能將膜固定。紫外光的照射,可以使用高壓水銀燈、無電極(微波方式)燈、氙氣燈、金屬鹵素燈、及其他任意的紫外光照射裝置,因應必要以氮等的不活性氣體氛圍化進行紫外光照射也可以。又,紫外光的照射量為50~800mJ/cm2的範圍較佳,更佳為100~300mJ/cm2的範圍。 Regarding the UV exposure process, after drying, the optical adjustment layer 4 is irradiated with ultraviolet light to harden the film to fix the film. Ultraviolet light can be irradiated with high-pressure mercury lamp, electrodeless (microwave method) lamp, xenon lamp, metal halide lamp, and any other ultraviolet light irradiation device. If necessary, it can also be irradiated with inert gas atmosphere such as nitrogen. can. In addition, the irradiation amount of ultraviolet light is preferably in the range of 50 to 800 mJ/cm 2 and more preferably in the range of 100 to 300 mJ/cm 2 .

圖3表示本發明的第二實施形態。該實施形態與第一實施形態相比,在透明基材薄膜2的另一面也設置硬塗層這點有所不同,但其他都一樣,以下,在相同的部分附加相同符號,主要說明不同的部分。 Fig. 3 shows the second embodiment of the present invention. Compared with the first embodiment, this embodiment is different in that a hard coat layer is also provided on the other side of the transparent base film 2, but everything else is the same. In the following, the same symbols are attached to the same parts, and the differences are mainly explained. section.

該附光學調整層硬塗薄膜1在透明基材薄膜2的另一面(也就是與設有硬塗層3及光學調整層4的面相反 的面)具有第2硬塗層5。該第2硬塗層5含有複數粒子5a、5a,該等粒子5a、5a在第2硬塗層5的表面(也就是與透明基材薄膜2存在之側相反的面)不均勻分佈。藉此,不只是在附光學調整層硬塗薄膜1的一面,在另一面也能夠提供耐傷性與耐黏結性。因此,即便在透明基材薄膜2使用具有容易對易破裂的表面產生傷的缺點的非晶性聚合物薄膜,也能得到具有充足的硬塗層性與充足的耐黏結性的附光學調整層硬塗薄膜。在這裡,為了不降低辨視性,將複數粒子5a、5a的平均粒徑設為比第2硬塗層5的平均膜厚還小較佳,但為了能夠更加賦予易滑性或薄膜的配置性的目的,因應必要將粒子5a的平均粒徑設為比第2硬塗層5的平均膜厚還大較佳。 The hard coat film 1 with an optical adjustment layer is on the other side of the transparent substrate film 2 (that is, the opposite side of the hard coat layer 3 and the optical adjustment layer 4). 的面) has a second hard coat layer 5. The second hard coat layer 5 contains a plurality of particles 5a, 5a, and the particles 5a, 5a are unevenly distributed on the surface of the second hard coat layer 5 (that is, the surface opposite to the side where the transparent base film 2 exists). Thereby, it is possible to provide scratch resistance and adhesion resistance not only on one side of the hard coat film 1 with an optical adjustment layer, but also on the other side. Therefore, even if an amorphous polymer film having the disadvantage of easily causing damage to the easily broken surface is used for the transparent base film 2, an optical adjustment layer with sufficient hard coat properties and sufficient adhesion resistance can be obtained. Hard coating film. Here, in order not to reduce the visibility, it is better to set the average particle size of the plural particles 5a, 5a to be smaller than the average film thickness of the second hard coat layer 5, but in order to provide more slipperiness or thin film placement For the purpose of performance, it is better to set the average particle size of the particles 5a to be larger than the average film thickness of the second hard coat layer 5 if necessary.

圖4表示本發明的第三實施形態。該實施形態與第二實施形態相比,設有保護薄膜這點有所不同,但其他都一樣,以下,在相同的部分附加相同符號,主要說明不同的部分。 Fig. 4 shows the third embodiment of the present invention. Compared with the second embodiment, this embodiment is different in that a protective film is provided, but everything else is the same. Hereinafter, the same symbols are attached to the same parts, and the different parts are mainly described.

在該附光學調整層硬塗薄膜1中,硬塗層3及光學調整層4設於透明基材薄膜2的一面,在該透明基材薄膜2的另一面側,以形成最外層的方式貼合保護薄膜6。詳言之,該附光學調整層硬塗薄膜1,將第2實施形態的附光學調整層硬塗薄膜1作為附光學調整層硬塗薄膜本體1a,在該附光學調整層硬塗薄膜本體1a中的透明基材薄膜2的另一面側即第2硬塗層5的表面,將由保護薄膜用透明基材薄膜6a與黏著層6b形成的保護薄膜6,利用該粘著層6b貼 合。 In the hard coat film 1 with an optical adjustment layer, the hard coat layer 3 and the optical adjustment layer 4 are provided on one side of the transparent base film 2, and the other side of the transparent base film 2 is pasted to form the outermost layer.合保护膜6。 Protection film 6. In detail, the hard coat film with an optical adjustment layer 1 uses the hard coat film with an optical adjustment layer 1 of the second embodiment as a main body 1a of the hard coat film with an optical adjustment layer, and the hard coat film with an optical adjustment layer 1a On the other side of the transparent base film 2 in the second hard coat layer 5, the protective film 6 formed of the transparent base film 6a for the protective film and the adhesive layer 6b is attached by the adhesive layer 6b. Together.

這樣藉由在附光學調整層硬塗薄膜1設置保護薄膜6,即便是在透明基材薄膜2非常薄的情形等,能使作業性優化,也能防止污染等。 In this way, by providing the protective film 6 on the hard coat film 1 with an optical adjustment layer, even when the transparent base film 2 is very thin, the workability can be optimized and contamination can be prevented.

雖形成保護薄膜6的材料沒有特別的限定,但從熱處理工程中及熱處理工程後的捲曲的控制這種觀點來看,加熱收縮率及線膨漲係數與附光學調整層硬塗薄膜本體1a接近的材料較佳。 Although the material for forming the protective film 6 is not particularly limited, from the viewpoint of control of curling during and after the heat treatment process, the heat shrinkage rate and linear expansion coefficient are close to those of the hard coat film body 1a with an optical adjustment layer. The material is better.

此外,本發明並不限定於上述實施形態,可以有其他各種變形。例如,光學調整層4中含有的複數粒子4a、4a,即便該粒徑不相同,如圖5所示不相同也可以。又,在硬塗層3中含有的粒子3a、3a中也一樣。 In addition, the present invention is not limited to the above-mentioned embodiment, and various other modifications are possible. For example, the plural particles 4a and 4a contained in the optical adjustment layer 4 may be different as shown in FIG. 5 even if the particle diameters are different. The same applies to the particles 3a and 3a contained in the hard coat layer 3.

又,光學調整層4非1層,而由高折射率層、低折射率層等2層以上的多層來形成也可以。此時,藉由將位於硬塗層3側的光學調整層的折射率設為1.55~1.80的高折射率,層積透明導電層側的光學調整層的折射率設為1.50以下的低折射率,能夠緩和圖形可視現象。接著,光學調整層中含有的粒子4a,在任何層含有都可以,又,在複數層中含有也可以,但含有於最遠離透明基材薄膜2側的光學調整層中較佳。 In addition, the optical adjustment layer 4 is not one layer, but may be formed of two or more layers such as a high refractive index layer and a low refractive index layer. At this time, by setting the refractive index of the optical adjustment layer on the side of the hard coat layer 3 to a high refractive index of 1.55 to 1.80, the refractive index of the optical adjustment layer on the side of the laminated transparent conductive layer is set to a low refractive index of 1.50 or less , Can alleviate the visual phenomenon of graphics. Next, the particles 4a contained in the optical adjustment layer may be contained in any layer, and may be contained in a plurality of layers, but they are preferably contained in the optical adjustment layer on the side farthest from the transparent base film 2.

又,為了將光學調整層4表面的特定部分的算術平均粗糙度Ra設在預定的範圍內,雖在硬塗層3中含有複數的粒子3a、3a,而在硬塗層3的表面(與存在透明基材薄膜2之側相反的面)設置凸部,使該凸部反映至光學調整 層的表面,但作為在該硬塗層3表面設置凸部的方法,不使用粒子3a,而採用藉由使2種類以上的材料相分離(phase separation)來形成凸部的方法、或由壓紋加工來形成凸部的方法等也可以(參照圖6所示的凸部3b)。 In addition, in order to set the arithmetic average roughness Ra of a specific part of the surface of the optical adjustment layer 4 within a predetermined range, although the hard coat layer 3 contains plural particles 3a, 3a, the surface of the hard coat layer 3 (and There is a transparent base film 2 on the opposite side) to set the convex part to reflect the convex part to the optical adjustment However, as a method of providing protrusions on the surface of the hard coat layer 3, particles 3a are not used, and a method of forming protrusions by phase separation of two or more types of materials, or by pressing A method of forming a convex portion by patterning may be used (refer to the convex portion 3b shown in FIG. 6).

又,該附光學調整層硬塗薄膜1雖在透明基材薄膜2的一面設有硬塗層3及光學調整層4,但在透明基材薄膜2的兩面設置硬塗層3及光學調整層4也可以。接著,在此時,在透明基材薄膜2的任一面側(也就是任一個光學調整層4的表面),以形成最外層的方式貼合保護薄膜也可以。 In addition, the hard coat film 1 with an optical adjustment layer is provided with a hard coat layer 3 and an optical adjustment layer 4 on one side of the transparent base film 2, but a hard coat layer 3 and an optical adjustment layer are provided on both sides of the transparent base film 2 4 is fine too. Next, at this time, a protective film may be attached to any surface side of the transparent base film 2 (that is, the surface of any optical adjustment layer 4) so as to form the outermost layer.

又,在第二及第三圖示的實施形態中,在第2硬塗層5中雖含有複數粒子5a,但不含有該等粒子5a也可以。 In addition, in the second and third illustrated embodiments, the second hard coat layer 5 contains plural particles 5a, but these particles 5a may not be included.

[實施例] [Example]

以下,利用實施例來更進一步具體說明本發明。 Hereinafter, the present invention will be explained in more detail using examples.

<實施例1> <Example 1>

透明基材薄膜2使用日本瑞翁株式會社(Zeon Corporation)製「ZeonorFilm ZF16-100(製品名)」。在該透明基材薄膜2的一面施予電暈處理後,在該一面層積硬塗層3,製作硬塗薄膜。再來,在硬塗薄膜中的硬塗層3的表面層積光學調整層4,製作附光學調整層硬塗薄膜。 The transparent base film 2 used "ZeonorFilm ZF16-100 (product name)" manufactured by Zeon Corporation. After corona treatment is applied to one side of the transparent base film 2, a hard coat layer 3 is laminated on this side to produce a hard coat film. Next, the optical adjustment layer 4 was laminated on the surface of the hard coat layer 3 in the hard coat film to produce a hard coat film with an optical adjustment layer.

(硬塗塗佈液(1a)的調製) (Preparation of Hard Coating Liquid (1a))

在可拋棄式杯中將DIC株式會社(DIC Corporation)製「PC16-2291(製品名)」及乙酸丁酯及甲基乙基酮(MEK)以接下來的調配比混合,調製硬塗塗佈液(1a)。 In a disposable cup, "PC16-2291 (product name)" manufactured by DIC Corporation, butyl acetate and methyl ethyl ketone (MEK) are mixed in the next mixing ratio to prepare a hard coat coating.液(1a).

Figure 107106954-A0305-02-0023-1
Figure 107106954-A0305-02-0023-1

(硬塗薄膜(1A)的製作) (Production of Hard Coated Film (1A))

將前述硬塗塗佈液(1a)利用# 5的線棒,在透明基材薄膜2的經電暈處理的面上塗佈,之後以80℃的溫度進行1.0分的乾燥,接著利用高壓水銀燈,以光量200mJ/cm2的條件照射紫外光,製作硬塗薄膜(1A)。 The aforementioned hard coat coating liquid (1a) was coated on the corona-treated surface of the transparent substrate film 2 using a #5 wire rod, and then dried at 80°C for 1.0 minute, and then a high-pressure mercury lamp was used , Irradiate ultraviolet light with a light quantity of 200mJ/cm 2 to produce a hard coat film (1A).

(光學調整層塗佈液(1b)的調製) (Preparation of optical adjustment layer coating liquid (1b))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L(製品名)」及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「(CHEMISNOW)MX-80H3wT(製品名)」及甲基乙基酮(MEK)以接下來的調配比混合,調製光學調整層塗佈液(1b)。 Among the disposable cups are "(AICAAITRON) Z-816-3L (product name)" made by Aica Kogyo Co., Ltd. and Soken Chemical & Engineering Co., Ltd. ) "(CHEMISNOW) MX-80H3wT (product name)" and methyl ethyl ketone (MEK) were mixed at the next mixing ratio to prepare an optical adjustment layer coating liquid (1b).

Figure 107106954-A0305-02-0024-2
Figure 107106954-A0305-02-0024-2

(附光學調整層硬塗薄膜(1B)的製作) (Production of hard coat film with optical adjustment layer (1B))

在硬塗薄膜(1A)的硬塗層3的表面將光學調整層塗佈液(1b)利用# 3的線棒塗佈,之後以80℃的溫度進行1.0分的乾燥,接著在透過紫外光的窗設於上面的容器之中將薄膜放入,使容器內處於氮環境中3分鐘。之後利用高壓水銀燈,以光量200mJ/cm2的條件照射紫外光,製作附光學調整層硬塗薄膜(1B)。 Coating the optical adjustment layer coating liquid (1b) on the surface of the hard coating layer 3 of the hard coating film (1A) with a #3 wire rod, and then drying it at 80°C for 1.0 minute, and then passing ultraviolet light The window is set in the upper container, and the film is put into it, and the container is placed in a nitrogen environment for 3 minutes. Then, a high-pressure mercury lamp was used to irradiate ultraviolet light with a light quantity of 200 mJ/cm 2 to produce a hard coat film with an optical adjustment layer (1B).

<實施例2> <Example 2>

變更實施例1的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 1 was changed to produce a hard coat film with an optical adjustment layer.

(光學調整層塗佈液(2b)的調製) (Preparation of optical adjustment layer coating liquid (2b))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L(製品名)」及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「(CHEMISNOW)MX-40(製品名)」及甲基乙基酮(MEK)以接下來的調配比混合,調製光學調整層塗佈液(2b)。 Among the disposable cups are "(AICAAITRON) Z-816-3L (product name)" made by Aica Kogyo Co., Ltd. and Soken Chemical & Engineering Co., Ltd. ) Manufactured "(CHEMISNOW) MX-40 (product name)" and methyl ethyl ketone (MEK) were mixed in the next mixing ratio to prepare an optical adjustment layer coating liquid (2b).

Figure 107106954-A0305-02-0025-3
Figure 107106954-A0305-02-0025-3

(附光學調整層硬塗薄膜(2B)的製作) (Production of hard coat film with optical adjustment layer (2B))

使用光學調整層塗佈液(2b),其他與實施例1完全相同,製作附光學調整層硬塗薄膜(2B)。 The optical adjustment layer coating liquid (2b) was used, and the others were completely the same as in Example 1, to produce a hard coat film with an optical adjustment layer (2B).

<實施例3> <Example 3>

變更實施例1的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 1 was changed to produce a hard coat film with an optical adjustment layer.

(光學調整層塗佈液(3b)的調製) (Preparation of optical adjustment layer coating liquid (3b))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L(製品名)」及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「(CHEMISNOW)MX-150(製品名)」及甲基乙基酮(MEK)以接下來的調配比混合,調製光學調整層塗佈液(3b)。 Among the disposable cups are "(AICAAITRON) Z-816-3L (product name)" made by Aica Kogyo Co., Ltd. and Soken Chemical & Engineering Co., Ltd. ) "(CHEMISNOW) MX-150 (product name)" and methyl ethyl ketone (MEK) were mixed in the next mixing ratio to prepare an optical adjustment layer coating liquid (3b).

Figure 107106954-A0305-02-0025-4
Figure 107106954-A0305-02-0025-4

(附光學調整層硬塗薄膜(3B)的製作) (Production of hard coat film with optical adjustment layer (3B))

使用光學調整層塗佈液(3b),其他與實施例1完全相同,製作附光學調整層硬塗薄膜(3B)。 The optical adjustment layer coating liquid (3b) was used, and other things were completely the same as in Example 1, to produce a hard coat film with an optical adjustment layer (3B).

<實施例4> <Example 4>

變更實施例1的硬塗層3的塗佈液,製作硬塗薄膜。再來,在硬塗薄膜中的硬塗層3的表面與層積與實施例1一樣的光學調整層4,製作附光學調整層硬塗薄膜。 The coating liquid of the hard coat layer 3 of Example 1 was changed to produce a hard coat film. Next, the same optical adjustment layer 4 as in Example 1 was laminated on the surface of the hard coat layer 3 in the hard coat film to produce a hard coat film with an optical adjustment layer.

(硬塗塗佈液(4a)的調製) (Preparation of Hard Coating Liquid (4a))

在可拋棄式杯中將DIC株式會社(DIC Corporation)製硬塗劑「PC16-2291(製品名)」及「PC16-9081(製品名)」及乙酸丁酯及甲基乙基酮(MEK)以接下來的調配比混合,調製硬塗塗佈液(4a)。 Put DIC Corporation (DIC Corporation) hard coat agents "PC16-2291 (product name)" and "PC16-9081 (product name)", butyl acetate and methyl ethyl ketone (MEK) in a disposable cup The mixture was mixed at the next mixing ratio to prepare a hard coat coating liquid (4a).

Figure 107106954-A0305-02-0026-6
Figure 107106954-A0305-02-0026-6

(硬塗薄膜(4A)的製作) (Production of hard coat film (4A))

使用硬塗塗佈液(4a),其他與實施例1的硬塗硬塗層薄膜(1A)的製作完全相同,製作硬塗薄膜(4A)。 Using the hard-coating coating liquid (4a), and other things being completely the same as the production of the hard-coating hard-coating film (1A) of Example 1, a hard-coating film (4A) was produced.

(附光學調整層硬塗薄膜(4B)的製作) (Production of hard coat film with optical adjustment layer (4B))

使用硬塗薄膜(4A),其他與實施例1完全相同層積光學調整層4,製作附光學調整層硬塗薄膜(4B)。 Using the hard-coated film (4A), the optical adjustment layer 4 was laminated in the same manner as in Example 1, and a hard-coated film with an optical adjustment layer (4B) was produced.

<實施例5> <Example 5>

變更實施例4的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 4 was changed to produce a hard coat film with an optical adjustment layer.

(附光學調整層硬塗薄膜(5B)的製作) (Production of hard coat film with optical adjustment layer (5B))

使用光學調整層塗佈液(2b),其他與實施例4完全相同,製作附光學調整層硬塗薄膜(5B)。 Using the optical adjustment layer coating liquid (2b), and the rest were completely the same as in Example 4, a hard coat film with an optical adjustment layer (5B) was produced.

<實施例6> <Example 6>

變更實施例4的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 4 was changed to produce a hard coat film with an optical adjustment layer.

(附光學調整層硬塗薄膜(6B)的製作) (Production of hard coat film with optical adjustment layer (6B))

使用光學調整層塗佈液3b,其他與實施例4完全相同,製作附光學調整層硬塗薄膜(6B)。 Using the optical adjustment layer coating liquid 3b, and other things were completely the same as in Example 4, a hard coat film with an optical adjustment layer (6B) was produced.

<實施例7> <Example 7>

變更實施例1的硬塗層3的塗佈液,製作硬塗薄膜。再來,在硬塗薄膜中的硬塗層3的表面與層積與實施例1一樣的光學調整層4,製作附光學調整層硬塗薄膜。 The coating liquid of the hard coat layer 3 of Example 1 was changed to produce a hard coat film. Next, the same optical adjustment layer 4 as in Example 1 was laminated on the surface of the hard coat layer 3 in the hard coat film to produce a hard coat film with an optical adjustment layer.

(硬塗塗佈液(7a)的調製) (Preparation of Hard Coating Liquid (7a))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-739L(製品名)」及東麗‧道康寧株式會社(Dow Corning Toray Co.,Ltd.)製「8019ADDITIVE(製品名)」及甲基異丁基酮(MIBK)以接下來的調配比混合,調製光學調整層塗佈液(7a)。 Among the disposable cups are "(AICAAITRON) Z-739L (product name)" made by Aica Kogyo Co., Ltd. and Dow Corning Toray Co., Ltd. "8019 ADDITIVE (product name)" and methyl isobutyl ketone (MIBK) were mixed in the next mixing ratio to prepare an optical adjustment layer coating liquid (7a).

Figure 107106954-A0305-02-0028-7
Figure 107106954-A0305-02-0028-7

(硬塗薄膜(7A)的製作) (Production of hard coating film (7A))

使用硬塗塗佈液(7a),其他與實施例1的硬塗薄膜(1A)的製作完全相同,製作硬塗薄膜(7A)。 Using the hard-coating coating liquid (7a), and other things being completely the same as the production of the hard-coating film (1A) of Example 1, a hard-coating film (7A) was produced.

(附光學調整層硬塗薄膜(7B)的製作) (Production of hard coat film with optical adjustment layer (7B))

使用硬塗薄膜(7A),其他與實施例1完全相同層積光學調整層4,製作附光學調整層硬塗薄膜(7B)。 Using the hard coat film (7A), the optical adjustment layer 4 was laminated in the same manner as in Example 1, and a hard coat film with an optical adjustment layer (7B) was produced.

<實施例8> <Example 8>

在實施例1的附光學調整層硬塗薄膜(1B)的透明基材薄膜2之面(另一面)以與實施例1相同的順序形成硬塗層3與光學調整層4,製作兩面附光學調整層硬塗薄膜(8B)。 The hard coat layer 3 and the optical adjustment layer 4 were formed on the side (the other side) of the transparent substrate film 2 of the hard coat film with an optical adjustment layer (1B) of Example 1 in the same order as in Example 1, to produce a double-sided optical Adjustment layer hard coating film (8B).

<實施例9> <Example 9>

變更實施例1的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 1 was changed to produce a hard coat film with an optical adjustment layer.

(光學調整層塗佈液(9b)的調製) (Preparation of optical adjustment layer coating liquid (9b))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L(製品名)」及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「(CHEMISNOW)MX-80H3wT(製品名)」及甲基乙基酮(MEK)以接下來的調配比混合,調製光學調整層塗佈液(9b)。 Among the disposable cups are "(AICAAITRON) Z-816-3L (product name)" made by Aica Kogyo Co., Ltd. and Soken Chemical & Engineering Co., Ltd. ) Manufactured "(CHEMISNOW) MX-80H3wT (product name)" and methyl ethyl ketone (MEK) were mixed at the next mixing ratio to prepare an optical adjustment layer coating liquid (9b).

Figure 107106954-A0305-02-0029-8
Figure 107106954-A0305-02-0029-8

(附光學調整層硬塗薄膜(9B)的製作) (Production of hard coat film with optical adjustment layer (9B))

使用光學調整層塗佈液(9b),其他與實施例1完全相同,製作附光學調整層硬塗薄膜(9B)。 The optical adjustment layer coating liquid (9b) was used, and other things were completely the same as in Example 1, to produce a hard coat film with an optical adjustment layer (9B).

<實施例10> <Example 10>

變更實施例1的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 1 was changed to produce a hard coat film with an optical adjustment layer.

(光學調整層塗佈液(10b)的調製) (Preparation of optical adjustment layer coating liquid (10b))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L(製品名)」及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「(CHEMISNOW)MX-80H3wT(製品名)」及甲基乙基酮(MEK)以接下來的調配比混合,調製光學調整層塗佈液(10b)。 Among the disposable cups are "(AICAAITRON) Z-816-3L (product name)" made by Aica Kogyo Co., Ltd. and Soken Chemical & Engineering Co., Ltd. ) Manufactured "(CHEMISNOW) MX-80H3wT (product name)" and methyl ethyl ketone (MEK) were mixed at the next mixing ratio to prepare an optical adjustment layer coating liquid (10b).

Figure 107106954-A0305-02-0030-9
Figure 107106954-A0305-02-0030-9

(附光學調整層硬塗薄膜(10B)的製作) (Production of hard coat film with optical adjustment layer (10B))

使用光學調整層塗佈液(10b),其他與實施例1完全相同,製作附光學調整層硬塗薄膜(10B)。 The optical adjustment layer coating liquid (10b) was used, and other things were completely the same as in Example 1, to produce a hard coat film with an optical adjustment layer (10B).

<實施例11> <Example 11>

變更實施例1的硬塗層3的塗佈液及線棒的順序,製作硬塗薄膜。再來,在硬塗薄膜中的硬塗層3的表面與層積與實施例1一樣的光學調整層4,製作附光學調整層硬塗薄膜。 The order of the coating liquid and the wire bar of the hard coat layer 3 of Example 1 was changed to produce a hard coat film. Next, the same optical adjustment layer 4 as in Example 1 was laminated on the surface of the hard coat layer 3 in the hard coat film to produce a hard coat film with an optical adjustment layer.

(硬塗塗佈液(11a)的調製) (Preparation of Hard Coating Liquid (11a))

在可拋棄式杯中將日本塗料‧汽車塗料(Nippon Paint Automotive Coatings Co.,Ltd.)製「UT-1147/P55(製品 名)」及乙酸丁酯及甲基異丁基酮(MIBK)以接下來的調配比混合,調製硬塗塗佈液(11a)。 In a disposable cup, Nippon Paint Automotive Coatings (Nippon Paint Automotive Coatings Co., Ltd.) manufactured "UT-1147/P55 (products) Name)", butyl acetate and methyl isobutyl ketone (MIBK) are mixed in the next mixing ratio to prepare a hard coat coating liquid (11a).

Figure 107106954-A0305-02-0031-10
Figure 107106954-A0305-02-0031-10

(硬塗薄膜(11A)的製作) (Production of hard coat film (11A))

使用硬塗塗佈液(11a),在該塗佈液的塗佈利用# 7的線棒,其他與實施例1的硬塗薄膜(1A)的製作完全相同,製作硬塗薄膜(11A)。 The hard-coated coating liquid (11a) was used, and a #7 wire rod was used for the coating of the coating liquid, and the other things were completely the same as the production of the hard-coated film (1A) of Example 1, to produce a hard-coated film (11A).

(附光學調整層硬塗薄膜(11B)的製作) (Production of hard coat film with optical adjustment layer (11B))

使用硬塗薄膜(11A),其他與實施例1完全相同層積光學調整層4,製作附光學調整層硬塗薄膜(11B)。 Using the hard-coated film (11A), the optical adjustment layer 4 was laminated in the same manner as in Example 1, and a hard-coated film with an optical adjustment layer (11B) was produced.

<實施例12> <Example 12>

變更實施例1的硬塗層3的塗佈液及光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the hard coat layer 3 and the coating liquid of the optical adjustment layer 4 of Example 1 were changed to produce a hard coat film with an optical adjustment layer.

(硬塗塗佈液(12a)的調製) (Preparation of Hard Coating Liquid (12a))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-735L-35(製品名)」及丙二醇單甲基醚(PGM)以接下來的調配比混合,硬塗塗佈液(12a)。 In a disposable cup, Aica Kogyo Co., Ltd. made "(AICAAITRON) Z-735L-35 (product name)" and propylene glycol monomethyl ether (PGM) in the following blending ratio Mix and hard coat the coating liquid (12a).

Figure 107106954-A0305-02-0032-12
Figure 107106954-A0305-02-0032-12

(硬塗薄膜(12A)的製作) (Production of hard coating film (12A))

使用硬塗塗佈液(12a),其他與實施例1的硬塗薄膜(1A)的製作完全相同,製作硬塗薄膜(12A)。 Using the hard-coating coating liquid (12a), and other things being completely the same as the production of the hard-coating film (1A) of Example 1, a hard-coating film (12A) was produced.

(光學調整層塗佈液(12b)的調製) (Preparation of optical adjustment layer coating liquid (12b))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L改(製品名)」、及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「(CHEMISNOW)MX-80H3wT(製品名)」、丙二醇單甲基醚(PGM)、及畢克化學‧日本株式會社(BYK Japan KK)製「BYK-UV3570(製品名)」以接下來的調配比混合,調製光學調整層塗佈液(12b)。 In the disposable cup, "(AICAAITRON) Z-816-3L made by Aica Kogyo Co., Ltd. is changed to (product name)", and Soken Chemical & Engineering Co., Ltd. Ltd.) "(CHEMISNOW) MX-80H3wT (product name)", propylene glycol monomethyl ether (PGM), and BYK Japan KK "BYK-UV3570 (product name)" The following mixing ratio is mixed to prepare an optical adjustment layer coating liquid (12b).

Figure 107106954-A0305-02-0032-13
Figure 107106954-A0305-02-0032-13

(附光學調整層硬塗薄膜(12B)的製作) (Production of hard coat film with optical adjustment layer (12B))

使用光學調整層塗佈液(12b),其他與實施例1完全相 同,製作附光學調整層硬塗薄膜(12B)。 Use the optical adjustment layer coating solution (12b), and the others are completely the same as in Example 1. At the same time, a hard coat film with an optical adjustment layer (12B) was produced.

<實施例13> <Example 13>

變更實施例12的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 12 was changed to produce a hard coat film with an optical adjustment layer.

(光學調整層塗佈液(13b)的調製) (Preparation of optical adjustment layer coating liquid (13b))

在可拋棄式杯中將東洋科美株式會社(Toyochem Co.,Ltd.)製「(LIODURAS)TYZ-A15-S(製品名)」、及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製「(CHEMISNOW)MX-80H3wT(製品名)」、及丙二醇單甲基醚(PGM)以接下來的調配比混合,調製光學調整層塗佈液(13b)。 In the disposable cup, Toyochem Co., Ltd. (LIODURAS) TYZ-A15-S (product name), and Soken Chemical & Engineering Co., Ltd. .) "(CHEMISNOW) MX-80H3wT (product name)" and propylene glycol monomethyl ether (PGM) were mixed at the next mixing ratio to prepare an optical adjustment layer coating liquid (13b).

Figure 107106954-A0305-02-0033-14
Figure 107106954-A0305-02-0033-14

(附光學調整層硬塗薄膜(13B)的製作) (Production of hard coat film with optical adjustment layer (13B))

使用光學調整層塗佈液(13b),其他與實施例12完全相同,製作附光學調整層硬塗薄膜(13B)。 The optical adjustment layer coating liquid (13b) was used, and other things were completely the same as in Example 12, to produce a hard coat film with an optical adjustment layer (13B).

<實施例14> <Example 14>

變更實施例13的光學調整層4的乾燥條件,製作附光 學調整層硬塗薄膜。 The drying conditions of the optical adjustment layer 4 of Example 13 were changed to produce an attached light Learn to adjust the hard-coated film.

(附光學調整層硬塗薄膜(14B)的製作) (Production of hard coat film with optical adjustment layer (14B))

除了將光學調整層的塗佈後的乾燥溫度設為100℃以外,與實施例13完全相同,製作附光學調整層硬塗薄膜(14B)。 Except that the drying temperature after application of the optical adjustment layer was set to 100°C, it was completely the same as in Example 13, and a hard coat film with an optical adjustment layer (14B) was produced.

<實施例15> <Example 15>

變更實施例14的光學調整層4的乾燥條件,製作附光學調整層硬塗薄膜。 The drying conditions of the optical adjustment layer 4 of Example 14 were changed to produce a hard coat film with an optical adjustment layer.

(附光學調整層硬塗薄膜(15B)的製作) (Production of hard coat film with optical adjustment layer (15B))

除了將光學調整層的塗佈後的乾燥溫度設為130℃以外,與實施例14完全相同,製作附光學調整層硬塗薄膜(15B)。 Except that the drying temperature after application of the optical adjustment layer was set to 130°C, it was completely the same as in Example 14, and a hard coat film with an optical adjustment layer (15B) was produced.

<實施例16> <Example 16>

變更實施例15的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 15 was changed to produce a hard coat film with an optical adjustment layer.

(光學調整層塗佈液(16b)的調製) (Preparation of optical adjustment layer coating liquid (16b))

在可拋棄式杯中將東洋科美株式會社(Toyochem Co.,Ltd.)製「(LIODURAS)TYZ-A15-S(製品名)」、及綜研化學株式會社(Soken Chemical & Engineering Co.,Ltd.)製 「(CHEMISNOW)MX-80H3wT(製品名)」、及丙二醇單甲基醚(PGM)以接下來的調配比混合,調製光學調整層塗佈液(16b)。 In the disposable cup, Toyochem Co., Ltd. (LIODURAS) TYZ-A15-S (product name), and Soken Chemical & Engineering Co., Ltd. .)system "(CHEMISNOW) MX-80H3wT (product name)" and propylene glycol monomethyl ether (PGM) were mixed in the next mixing ratio to prepare an optical adjustment layer coating liquid (16b).

Figure 107106954-A0305-02-0035-15
Figure 107106954-A0305-02-0035-15

(附光學調整層硬塗薄膜(16B)的製作) (Production of hard coat film with optical adjustment layer (16B))

使用光學調整層塗佈液(16b),其他與實施例15完全相同,製作附光學調整層硬塗薄膜(16B)。 The optical adjustment layer coating liquid (16b) was used, and other things were completely the same as in Example 15, to produce a hard coat film with an optical adjustment layer (16B).

<比較例1> <Comparative Example 1>

變更實施例1的光學調整層4的塗佈液,製作附光學調整層硬塗薄膜。 The coating liquid of the optical adjustment layer 4 of Example 1 was changed to produce a hard coat film with an optical adjustment layer.

(光學調整層塗佈液(Xb)的調製) (Preparation of optical adjustment layer coating liquid (Xb))

在可拋棄式杯中將愛克株式會社(Aica Kogyo Co.,Ltd.)製「(AICAAITRON)Z-816-3L(製品名)」及甲基乙基酮(MEK)以接下來的調配比混合,調製光學調整層塗佈液(Xb)。 In a disposable cup, "(AICAAITRON) Z-816-3L (product name)" manufactured by Aica Kogyo Co., Ltd. and methyl ethyl ketone (MEK) are blended in the following ratio Mix and prepare an optical adjustment layer coating liquid (Xb).

Figure 107106954-A0305-02-0036-16
Figure 107106954-A0305-02-0036-16

(附光學調整層硬塗薄膜(XB)的製作) (Production of hard coat film (XB) with optical adjustment layer)

使用光學調整層塗佈液(Xb),其他與實施例1完全相同,製作附光學調整層硬塗薄膜(XB)。 The optical adjustment layer coating liquid (Xb) was used, and other things were completely the same as in Example 1, to produce a hard coat film with an optical adjustment layer (XB).

<實施例17> <Example 17>

在實施例1的附光學調整層硬塗薄膜(1B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,製作透明導電性薄膜(17)。 Using an ITO target on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (1B) of Example 1, sputtering and vapor deposition of 21 nm was performed to produce a transparent conductive film (17).

<實施例18> <Example 18>

在實施例2的附光學調整層硬塗薄膜(2B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,製作透明導電性薄膜(18)。 Using an ITO target on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (2B) of Example 2, sputtering and vapor deposition of 21 nm was performed to produce a transparent conductive film (18).

<實施例19> <Example 19>

在實施例3的附光學調整層硬塗薄膜(3B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,製作透明導電性薄膜(19)。 Using an ITO target on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (3B) of Example 3, a 21 nm sputtering vapor deposition was performed to produce a transparent conductive film (19).

<實施例20> <Example 20>

在實施例4的附光學調整層硬塗薄膜(4B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,製作透明導電性薄膜(20)。 Using an ITO target on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (4B) of Example 4, a 21 nm sputtering vapor deposition was performed to produce a transparent conductive film (20).

<實施例21> <Example 21>

在實施例5的附光學調整層硬塗薄膜(5B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,製作透明導電性薄膜(21)。 Using an ITO target on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (5B) of Example 5, sputtering and vapor deposition of 21 nm was performed to produce a transparent conductive film (21).

<實施例22> <Example 22>

在實施例6的附光學調整層硬塗薄膜(6B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,製作透明導電性薄膜(22)。 Using an ITO target on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (6B) of Example 6, sputtering and vapor deposition of 21 nm was performed to produce a transparent conductive film (22).

<實施例23> <Example 23>

在實施例13的附光學調整層硬塗薄膜(13B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,以145℃的烘箱進行1小時的退火(annealing)製作透明導電性薄膜(23)。 An ITO target was used on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (13B) of Example 13, sputtering and vapor deposition of 21nm was carried out, and annealing (annealing) was carried out in an oven at 145°C for 1 hour to produce a transparent conductive性膜(23).

<實施例24> <Example 24>

在實施例14的附光學調整層硬塗薄膜(14B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,以145℃的烘箱進行1小時的退火(annealing)製作透明導電性薄膜 (24)。 An ITO target was used on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (14B) of Example 14, sputtering and vapor deposition of 21nm was carried out, and annealing (annealing) was carried out at 145°C for 1 hour to produce a transparent conductive Sex film (twenty four).

<實施例25> <Example 25>

在實施例15的附光學調整層硬塗薄膜(15B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,以145℃的烘箱進行1小時的退火(annealing)製作透明導電性薄膜(25)。 An ITO target was used on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (15B) of Example 15, sputtering and vapor deposition of 21nm was carried out, and annealing was carried out for 1 hour in an oven at 145°C to produce a transparent conductive性膜(25).

<實施例26> <Example 26>

在實施例16的附光學調整層硬塗薄膜(16B)的光學調整層4側使用ITO靶極,進行21nm的濺鍍蒸鍍,以145℃的烘箱進行1小時的退火(annealing)製作透明導電性薄膜(26)。 An ITO target was used on the optical adjustment layer 4 side of the hard coat film with an optical adjustment layer (16B) of Example 16, sputtering and vapor deposition of 21 nm was performed, and annealing was performed for 1 hour in an oven at 145°C to produce a transparent conductive性膜(26).

<實施例27> <Example 27>

在實施例23的透明導電性薄膜(23)的ITO層側利用銅靶極,進行200nm的濺鍍蒸鍍,製作附金屬層透明導電性薄膜(27)。 On the ITO layer side of the transparent conductive film (23) of Example 23, sputtering and vapor deposition of 200 nm was performed using a copper target to produce a transparent conductive film with a metal layer (27).

<實施例28> <Example 28>

在實施例26的透明導電性薄膜(26)的ITO層側利用銅靶極,進行200nm的濺鍍蒸鍍,製作附金屬層透明導電性薄膜(28)。 On the ITO layer side of the transparent conductive film (26) of Example 26, a copper target was used for sputtering and vapor deposition of 200 nm to produce a transparent conductive film with a metal layer (28).

<附光學調整層硬塗薄膜的評價結果> <Evaluation results of hard coat film with optical adjustment layer>

附光學調整層硬塗薄膜的評價結果示於接下來的表15及表16。 The evaluation results of the hard coat film with an optical adjustment layer are shown in Table 15 and Table 16 below.

Figure 107106954-A0305-02-0040-17
Figure 107106954-A0305-02-0040-17

Figure 107106954-A0305-02-0041-18
Figure 107106954-A0305-02-0041-18

從表15及表16可以明顯得知,實施例1~16中的附光學調整層硬塗薄膜,在光學調整層4含有平均粒徑比光學調整層4的平均膜厚還大的粒子4a,光學調整層4的特定部分的算術平均粗糙度Ra為0.3nm~10nm,Hz(霧度)低,靜摩擦係數也比1還低,也沒粒子脫落。該附光學調整層硬塗薄膜的辨識性佳,在光學調整層的表面設置透明 導電層時也能得到充足的耐黏結性。 It is obvious from Table 15 and Table 16 that the hard coat films with optical adjustment layers in Examples 1 to 16 contained particles 4a having an average particle diameter larger than the average film thickness of the optical adjustment layer 4 in the optical adjustment layer 4. The arithmetic average roughness Ra of the specific part of the optical adjustment layer 4 is 0.3 nm to 10 nm, the Hz (haze) is low, the static friction coefficient is also lower than 1, and no particles fall off. The hard-coated film with optical adjustment layer has good recognizability, and the surface of the optical adjustment layer is transparent. Adequate adhesion resistance can also be obtained when the conductive layer is used.

又,雖比較例1的附光學調整層硬塗薄膜也有良好的辨識性,但未在光學調整層4添加粒子,靜摩擦係數超過1。因此,光學調整層的表面設置透明導電層時,無法得到充足的耐黏結性。 In addition, although the hard coat film with an optical adjustment layer of Comparative Example 1 also had good visibility, no particles were added to the optical adjustment layer 4, and the static friction coefficient exceeded 1. Therefore, when a transparent conductive layer is provided on the surface of the optical adjustment layer, sufficient adhesion resistance cannot be obtained.

<透明導電性薄膜的評價結果> <Evaluation Results of Transparent Conductive Film>

透明導電性薄膜的評價結果示於接下來的表17及表18。 The evaluation results of the transparent conductive film are shown in Table 17 and Table 18 below.

Figure 107106954-A0305-02-0042-19
Figure 107106954-A0305-02-0042-19

Figure 107106954-A0305-02-0043-20
Figure 107106954-A0305-02-0043-20

在表17及表18中,實施例17~26中的透明導電性薄膜,雖使用實施例1~6及實施例13~16的附光學調整層硬塗薄膜,但Hz(霧度)低,靜摩擦係數低。該透明導電性薄膜的辨識性佳,即便附有透明導電層也有充足的耐黏結性。又,實施例23~26中的透明導電性薄膜,其光學調整層的表面的谷側面積在每661780μm2為200000μm2以下,電阻值也低。 In Table 17 and Table 18, although the transparent conductive films in Examples 17 to 26 used the hard coat films with optical adjustment layers of Examples 1 to 6 and Examples 13 to 16, the Hz (haze) was low. The coefficient of static friction is low. The transparent conductive film has good recognizability, and has sufficient adhesion resistance even with a transparent conductive layer. Further, in Example 26 of the transparent conductive film 23 to the valley area of the side surface of the optical adjustment layer in each 661780μm 2 is 200000μm 2 or less, the resistance value is low.

<附金屬層透明導電性薄膜的評價結果> <Evaluation results of transparent conductive film with metal layer>

附金屬層透明導電性薄膜的評價結果示於接下來的表19。 The evaluation results of the transparent conductive film with a metal layer are shown in Table 19 below.

Figure 107106954-A0305-02-0044-22
Figure 107106954-A0305-02-0044-22

在表19中,實施例27~28的附金屬層透明導電性薄膜,雖使用實施例23及實施例26的透明導電性薄膜,但附加成為電極的金屬層也有充足的耐黏結性。 In Table 19, the transparent conductive films with a metal layer of Examples 27 to 28, although the transparent conductive films of Example 23 and Example 26 were used, the metal layer added as an electrode also had sufficient adhesion resistance.

<評價方法> <Evaluation method> (Hz) (Hz)

利用日本電色工業株式會社(Nippon Denshoku Industries Co.,Ltd.)製「Haze Meter NDH2000(製品名)」,以JIS-K7136的方法測定。 It is measured by the method of JIS-K7136 using "Haze Meter NDH2000 (product name)" manufactured by Nippon Denshoku Industries Co., Ltd..

(辨識性) (Identifiable)

以目視觀察3波長螢光燈的透過光,將幾乎沒看見粒子的情形作為○,雖能目視粒子但無法粒粒分別的情形作為△,能粒粒分明地看見粒子的情形作為×。 By visually observing the transmitted light of a 3-wavelength fluorescent lamp, the case where almost no particles are seen is regarded as ○, the case where the particles can be seen but cannot be separated is regarded as △, and the case where the particles can be clearly seen is regarded as ×.

(耐黏結性) (Adhesion resistance)

利用株式會社島津製作所(Shimadzu Corporation)製「(AUTOGRAPH)AG-IS MS(AG-1kNIS)(製品名)」,在摩擦方向60mm×50mm的面積施加4.4kg重的垂直負重,測定試料的測定面彼此的靜摩擦係數。靜摩擦係數為1以上時作為×,未滿1時作為○。 Using "(AUTOGRAPH) AG-IS MS (AG-1kNIS) (product name)" manufactured by Shimadzu Corporation, a vertical load of 4.4 kg was applied to an area of 60 mm × 50 mm in the rubbing direction to measure the measurement surface of the sample The coefficient of static friction between each other. When the static friction coefficient is 1 or more, it is regarded as ×, and when it is less than 1, it is regarded as ○.

(粒子脫落) (Particle shedding)

利用測試產業株式會社(Tester Sangyo Co.,Ltd.)製「AB-301 COLOR FASTNESS RUBBING TESTER(製品名)」,將法藍絨布(16號雙線法藍絨WKF2254)以500g的負重返復500次磨擦光學調整層的面,之後將表面用株式會社基恩斯(Keyence Corporation)製「(Microscope)VHX- 1000(製品名)」確認粒子4a有無脫落。將粒子4a無脫落者作為○,將粒子4a有脫落者作為×。 Using "AB-301 COLOR FASTNESS RUBBING TESTER (product name)" manufactured by Tester Sangyo Co., Ltd., the French blue flannel (No. 16 double-thread blue fleece WKF2254) was repeated with a load of 500g The surface of the optical adjustment layer was rubbed 500 times, and then the surface was used "(Microscope) VHX- 1000 (product name)" Check whether the particles 4a have fallen off. The particles 4a that did not fall off were regarded as ○, and the particles 4a that had fallen off were regarded as ×.

(硬塗層的平均膜厚) (Average thickness of hard coat layer)

硬塗層3的平均膜厚利用Filmetrics株式會社製「Filmetrics F20膜厚測定系統(製品名)」進行測定。 The average film thickness of the hard coat layer 3 was measured using the "Filmetrics F20 film thickness measurement system (product name)" manufactured by Filmetrics Co., Ltd.

(光學調整層的平均膜厚) (Average film thickness of optical adjustment layer)

光學調整層4的膜厚用以下的順序進行測定。 The film thickness of the optical adjustment layer 4 was measured in the following procedure.

(1)利用株式會社島津製作所(Shimadzu Corporation)製「UV3600(製品名)」,測定波長380~800nm的反射率來得到波形。 (1) Using "UV3600 (product name)" manufactured by Shimadzu Corporation, the reflectance at a wavelength of 380 to 800 nm was measured to obtain a waveform.

(2)以光學模擬軟體,輸入光學調整層4的膜厚以外的層積膜的資訊[構成、透明基材薄膜2的折射率(設為1.52)與厚度、硬塗層3的折射率(設為1.50)與平均膜厚(前述硬塗層3的平均膜厚的測定值)、光學調整層的折射率(實施例13~16設為1.60。其他實施例設為1.62)]。 (2) Using the optical simulation software, input the information of the laminated film other than the thickness of the optical adjustment layer 4 [composition, the refractive index of the transparent base film 2 (set to 1.52) and thickness, and the refractive index of the hard coat layer 3 ( Set to 1.50), the average film thickness (the measured value of the average film thickness of the hard coat layer 3 described above), and the refractive index of the optical adjustment layer (Examples 13 to 16 are set to 1.60. Other examples are set to 1.62)].

(3)對光學模擬的光學調整層輸入任意的膜厚而得到的波形、與(1)得到的波形一致時的膜厚值,作為光學調整層的平均膜厚。 (3) The waveform obtained by inputting an arbitrary film thickness to the optical adjustment layer of the optical simulation, and the film thickness value when the waveform obtained in (1) coincides with the waveform obtained in (1) are used as the average film thickness of the optical adjustment layer.

亦即,利用株式會社島津製作所(Shimadzu Corporation)製「UV3600(製品名)」得到干涉波形後,將測定到的干涉波形與模擬得到的計算波形為一致的膜厚值作為光學調整層的平均膜厚。 That is, after the interference waveform is obtained by "UV3600 (product name)" manufactured by Shimadzu Corporation, the measured interference waveform and the calculated waveform obtained by simulation are used as the average film thickness of the optical adjustment layer. thick.

(硬塗層中含有的粒子的平均粒徑) (Average particle size of particles contained in the hard coat layer)

將藉由以國際標準化機構規格ISO 13320為準的依日本工業規格JIS Z8825的雷射繞射‧散射法得到體積基準的粒徑分佈的算術平均值作為粒子的平均粒徑。 The arithmetic average of the volume-based particle size distribution obtained by the laser diffraction and scattering method in accordance with the Japanese Industrial Standards JIS Z8825 in accordance with the ISO 13320 standard of the International Organization for Standardization is regarded as the average particle size of the particles.

(光學調整層中含有的粒子的平均粒徑) (Average particle size of particles contained in the optical adjustment layer)

將藉由以國際標準化機構規格ISO 13320為準的依日本工業規格JIS Z8825的雷射繞射‧散射法得到體積基準的粒徑分佈的算術平均值作為粒子的平均粒徑。 The arithmetic average of the volume-based particle size distribution obtained by the laser diffraction and scattering method in accordance with the Japanese Industrial Standards JIS Z8825 in accordance with the ISO 13320 standard of the International Organization for Standardization is regarded as the average particle size of the particles.

(光學調整層的特定部分的算術平均粗糙度Ra) (Arithmetic average roughness Ra of a specific part of the optical adjustment layer)

利用三菱化學系統株式會社(Mitsubishi Chemical Systems,Inc.)(舊社名:株式會社菱化系統(Ryoka Systems Inc.))製「非接觸表面‧層剖面形狀計測系統VertScan2.0(型式:R5300GL-L-A100-AC)(製品名)」,將以50mm×50mm切取出的樣本置於載台,以10倍透鏡進行表面形狀的測定。之後,觀察測定資料,算出除了由光學調整層4中含有的粒子4a形成的凸部以外的特定部分中50μm×50μm的範圍的算術平均粗糙度Ra。 Using Mitsubishi Chemical Systems, Inc. (former company name: Ryoka Systems Inc.) "Non-contact surface and layer profile measurement system VertScan2.0 (type: R5300GL-L) -A100-AC) (product name)", put a sample cut out with a size of 50mm×50mm on a stage, and measure the surface shape with a 10x lens. After that, the measurement data was observed, and the arithmetic average roughness Ra in the range of 50 μm×50 μm in the specific part other than the convex part formed by the particles 4 a contained in the optical adjustment layer 4 was calculated.

(光學調整層含有粒子的個數N) (The number of particles contained in the optical adjustment layer N)

利用三菱化學系統株式會社(Mitsubishi Chemical Systems,Inc.)(舊社名:株式會社菱化系統(Ryoka Systems Inc.))製「非接觸表面‧層剖面形狀計測系統VertScan2.0(型式:R5300GL-L-A100-AC)(製品名)」,將以50mm×50mm切取出的樣本置於載台,以10倍透鏡進行表面形狀的測定。之後,執行測定資料的粒子解析,計算1mm×1mm中的從光學調整層4的表面到50nm以上的高度存在的粒子個數。 Using Mitsubishi Chemical Systems, Inc. (former company name: Ryoka Systems Co., Ltd.) Inc.)) "Non-contact surface ‧ layer cross-sectional shape measurement system VertScan2.0 (model: R5300GL-L-A100-AC) (product name)", the sample cut out with a size of 50mm×50mm is placed on the stage, and The 10x lens measures the surface shape. After that, particle analysis of the measurement data is performed, and the number of particles existing from the surface of the optical adjustment layer 4 to a height of 50 nm or more in 1 mm×1 mm is calculated.

(光學調整層的表面的谷側面積) (The area of the valley side of the surface of the optical adjustment layer)

利用三菱化學系統株式會社(Mitsubishi Chemical Systems,Inc.)(舊社名:株式會社菱化系統(Ryoka Systems Inc.))製「非接觸表面‧層剖面形狀計測系統VertScan2.0(型式:R5300GL-L-A100-AC)(製品名)」,將以50mm×50mm切取出的樣本置於載台,以5倍透鏡進行表面形狀的測定。之後,執行測定資料的定位解析,從粒子4a的未存在部分的光學調整層4的平均高度起算到3nm以上谷側的面積(光學調整層的表面的谷側面積),每661780μm2的值。 Using Mitsubishi Chemical Systems, Inc. (former company name: Ryoka Systems Inc.) "Non-contact surface and layer profile measurement system VertScan2.0 (type: R5300GL-L) -A100-AC) (product name)", place a sample cut out with a size of 50mm×50mm on a stage, and measure the surface shape with a 5x lens. After that, the positioning analysis of the measurement data is performed, from the average height of the optical adjustment layer 4 in the non-existent part of the particle 4a to the valley side area of 3 nm or more (the valley side area of the surface of the optical adjustment layer) per 661780 μm 2 value.

(透明導電性薄膜的電阻值) (Resistance value of transparent conductive film)

利用株式會社三菱化學分析科技(Mitsubishi Chemical Analytech Co.,Ltd.)(舊社名:株式會社三菱分析科技製「Loresta-GP(型式:MCP-T610)(製品名)」進行測定。 The measurement was performed using Mitsubishi Chemical Analytech Co., Ltd. (former company name: "Loresta-GP (model: MCP-T610) (product name)" manufactured by Mitsubishi Analytech Co., Ltd.).

[產業上的利用可能性] [Industrial Utilization Possibility]

以上所示的附光學調整層硬塗薄膜及透明導電性薄膜適用用於電容式觸控面板等。 The above-mentioned hard coat film with optical adjustment layer and transparent conductive film are suitable for capacitive touch panels and the like.

1‧‧‧附光學調整層硬塗薄膜 1‧‧‧Hard-coated film with optical adjustment layer

2‧‧‧透明基材薄膜 2‧‧‧Transparent substrate film

3‧‧‧硬塗層 3‧‧‧Hard coating

3a‧‧‧粒子 3a‧‧‧Particle

4‧‧‧光學調整層 4‧‧‧Optical adjustment layer

4a‧‧‧粒子 4a‧‧‧Particle

4b‧‧‧凸部 4b‧‧‧Protrusion

Claims (10)

一種透明導電性薄膜用的附光學調整層硬塗薄膜,具備:由非晶性聚合物形成的透明基材薄膜、及在該透明基材薄膜的至少一面層積的硬塗層及在該硬塗層上層積的光學調整層,其中,在前述光學調整層,含有在該光學調整層的表面形成凸部的複數粒子,該等粒子的平均粒徑比前述光學調整層的平均膜厚還大,且其平均粒徑r1、與其平均膜厚d1為:50nm≦(r1-d1)≦1900nm的關係;前述光學調整層的表面的,除了由前述粒子形成的凸部以外的特定部分的算術平均粗糙度Ra在0.3nm~20nm的範圍;且前述光學調整層中含有的前述粒子的平均粒徑r1在100nm~2000nm的範圍。 A hard coat film with an optical adjustment layer for a transparent conductive film, comprising: a transparent base film formed of an amorphous polymer, and a hard coat layer laminated on at least one surface of the transparent base film; The optical adjustment layer laminated on the coating layer, wherein the optical adjustment layer contains a plurality of particles forming convex portions on the surface of the optical adjustment layer, and the average particle diameter of the particles is larger than the average film thickness of the optical adjustment layer , And its average particle size r1 and its average film thickness d1 are: 50nm≦(r1-d1)≦1900nm; the arithmetic average of the specific part of the surface of the optical adjustment layer except for the convex part formed by the particles The roughness Ra is in the range of 0.3 nm to 20 nm; and the average particle diameter r1 of the particles contained in the optical adjustment layer is in the range of 100 nm to 2000 nm. 如請求項1所記載的透明導電性薄膜用的附光學調整層硬塗薄膜,其中,含有於前述光學調整層中的前述粒子的平均粒徑r1(nm)、與其粒子的個數N(個/mm2)為:199.03exp(-0.002r1)≦N≦3676.4exp(-0.002r1)的關係。 The hard coat film with an optical adjustment layer for a transparent conductive film as described in claim 1, wherein the average particle diameter r1 (nm) of the particles contained in the optical adjustment layer and the number of particles N (pieces) /mm 2 ) is: 199.03exp(-0.002r1)≦N≦3676.4exp(-0.002r1). 如請求項1或2所記載的透明導電性薄膜用的附光學調 整層硬塗薄膜,其中,前述光學調整層的平均膜厚d1、與含有於該光學調整層中的前述粒子的平均粒徑r1為:(d1/r1)<0.5的關係。 As described in claim 1 or 2 for the transparent conductive film with optical adjustment The whole-layer hard coating film, wherein the average film thickness d1 of the optical adjustment layer and the average particle diameter r1 of the particles contained in the optical adjustment layer have a relationship of (d1/r1)<0.5. 如請求項1或2所記載的透明導電性薄膜用的附光學調整層硬塗薄膜,其中,在前述硬塗層,含有複數粒子,該等粒子的平均粒徑,比前述硬塗層的平均膜厚還小,該等粒子在前述硬塗層的表面不均勻分佈。 The hard coat film with an optical adjustment layer for a transparent conductive film according to claim 1 or 2, wherein the hard coat layer contains a plurality of particles, and the average particle diameter of the particles is higher than that of the hard coat layer. The film thickness is still small, and the particles are unevenly distributed on the surface of the aforementioned hard coat layer. 如請求項4所記載的透明導電性薄膜用的附光學調整層硬塗薄膜,其中,前述硬塗層的平均膜厚d2、與含有於該硬塗層中的粒徑的平均粒徑r2為:(d2/r2)>2的關係。 The hard coat film with an optical adjustment layer for a transparent conductive film according to claim 4, wherein the average film thickness d2 of the hard coat layer and the average particle diameter r2 of the particle diameter contained in the hard coat layer are : The relationship of (d2/r2)>2. 如請求項1或2所記載的透明導電性薄膜用的附光學調整層硬塗薄膜,其中,前述光學調整層的表面的谷側面積在每661780μm2為200000μm2以下。 The optical adjustment layer attached to the transparent conductive film request item 1 or 2 described with hard coat film, wherein the surface area of the valley side of the optical adjustment layer in each 661780μm 2 is 200000μm 2 or less. 如請求項1或2所記載的透明導電性薄膜用的附光學調整層硬塗薄膜,其中,前述硬塗層及前述光學調整層設於前述透明基材薄膜的一面,在該透明基材薄膜的另一面側貼合保護薄膜以形成最外層。 The hard coat film with an optical adjustment layer for a transparent conductive film according to claim 1 or 2, wherein the hard coat layer and the optical adjustment layer are provided on one side of the transparent base film, and the transparent base film A protective film is attached to the other side to form the outermost layer. 如請求項7所記載的透明導電性薄膜用的附光學調整層硬塗薄膜,其中,在前述透明基材薄膜的另一面設置硬塗層,在該硬塗層的表面貼合前述保護薄膜。 The hard coat film with an optical adjustment layer for a transparent conductive film according to claim 7, wherein a hard coat layer is provided on the other surface of the transparent base film, and the protective film is bonded to the surface of the hard coat layer. 如請求項1或2所記載的透明導電性薄膜用的附光學調整層硬塗薄膜,其中,前述硬塗層及前述光學調整層設於前述透明基材薄膜的兩面,在該透明基材薄膜的任一面側貼合保護薄膜以形成最外層。 The hard coat film with an optical adjustment layer for a transparent conductive film according to claim 1 or 2, wherein the hard coat layer and the optical adjustment layer are provided on both sides of the transparent base film, and the transparent base film A protective film is attached to either side of the film to form the outermost layer. 一種透明導電性薄膜,由在如請求項1至9中任一項所記載的附光學調整層硬塗薄膜中的光學調整層的表面,形成透明導電層而形成。 A transparent conductive film formed by forming a transparent conductive layer on the surface of the optical adjustment layer in the hard coat film with an optical adjustment layer as described in any one of claims 1 to 9.
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