JP3310408B2 - Transparent conductive film - Google Patents

Transparent conductive film

Info

Publication number
JP3310408B2
JP3310408B2 JP21777593A JP21777593A JP3310408B2 JP 3310408 B2 JP3310408 B2 JP 3310408B2 JP 21777593 A JP21777593 A JP 21777593A JP 21777593 A JP21777593 A JP 21777593A JP 3310408 B2 JP3310408 B2 JP 3310408B2
Authority
JP
Japan
Prior art keywords
film
transparent conductive
conductive film
roll
glass transition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP21777593A
Other languages
Japanese (ja)
Other versions
JPH0768690A (en
Inventor
明文 勝村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=16709541&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP3310408(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP21777593A priority Critical patent/JP3310408B2/en
Publication of JPH0768690A publication Critical patent/JPH0768690A/en
Application granted granted Critical
Publication of JP3310408B2 publication Critical patent/JP3310408B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Landscapes

  • Non-Insulated Conductors (AREA)
  • Laminated Bodies (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、フィルム液晶表示素子
や有機分散型エレクトロルミネッセンス素子や透明タッ
チパネル入力装置などに用いられる透明導電性フィルム
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive film used for a film liquid crystal display device, an organic dispersion type electroluminescence device, a transparent touch panel input device and the like.

【0002】[0002]

【従来の技術】従来より、ポリエステルフィルムなどの
表面に、インジウムと錫の酸化物薄膜などを、スパッタ
リングなどの方法により積層した透明導電性フィルム
が、フィルム液晶表示素子や有機分散型エレクトロルミ
ネッセンス素子や透明タッチパネル入力装置の透明電極
基板用材料として使用されている。これらの素子や装置
に透明導電性フィルムを加工する過程において、フィル
ム材料であることの利点が最大に発揮されるのは、ロー
ルプロセスで連続的に加工を行えることである。透明導
電性の機能を発現する薄膜は、通常0.1μm以下の厚
みしかなく、機械的なこすれや打撃に弱いために、取り
扱いには細心の注意が必要であるが、一方、透明導電性
薄膜の形成されている面の反対側の面においても、外観
が重要な用途であることから傷がつかないようにしなけ
ればならない。通常は、この反対面には保護フィルムを
貼り合わせることで、透明導電性フィルムを損傷から防
ぐことが可能であるが、素子や装置に加工するうえでは
高温に加熱される工程を含むことがあり、保護フィルム
には耐熱性の高いものが無いために、ロールプロセスで
の支持ロール表面と接触しないように、エアサポートや
スプロケットホールでのテンター支持などの工夫が考え
られている。しかし、これらの方法は高額な設備投資を
必要としロールプロセスの利点を損なっている。そこ
で、ロールプロセスでの支持ロールに接触しても問題な
い透明導電性フィルムの開発が熱望されている。従来よ
り加工プロセスで120℃以上の加熱工程を加えても熱
による損傷のない透明導電性フィルムを開発されてき
た。これにより、フィルム液晶表示装置では配向膜やシ
ール樹脂の焼成を120℃以上で行うことが可能となり
表示品質や耐久性を向上することができた。また、分散
型エレクトロルミネッセンス素子や透明タッチパネル装
置では銀ペーストなどの印刷焼成を120℃以上で行う
ことが可能になり密着力があがり信頼性に優れた素子や
装置を作成することができた。しかし、フィルムをロー
ルプロセスで連続的に加工するには、透明導電性薄膜の
形成された面の反対側の面の損傷の問題があった。
2. Description of the Related Art Conventionally, a transparent conductive film in which an indium and tin oxide thin film is laminated on a surface of a polyester film or the like by a method such as sputtering has been used for a film liquid crystal display device, an organic dispersion type electroluminescence device, or the like. It is used as a material for a transparent electrode substrate of a transparent touch panel input device. In the process of processing a transparent conductive film into these elements and devices, the greatest advantage of being a film material is that it can be processed continuously by a roll process. Thin films that exhibit a transparent conductive function usually have a thickness of only 0.1 μm or less and are vulnerable to mechanical rubbing and hitting, so careful handling is required. The surface opposite to the surface on which the surface is formed must be protected from scratches because appearance is an important application. Normally, it is possible to prevent the transparent conductive film from being damaged by attaching a protective film to the opposite surface, but it may include a step of heating to a high temperature when processing into an element or device. Since there is no protective film having a high heat resistance, a device such as an air support or a tenter support in a sprocket hole has been considered so as not to come into contact with the support roll surface in the roll process. However, these methods require high capital investment and detract from the advantages of the roll process. Therefore, development of a transparent conductive film having no problem even if it comes into contact with a supporting roll in a roll process is eagerly desired. Conventionally, a transparent conductive film which is not damaged by heat even when a heating step of 120 ° C. or more is added in a processing process has been developed. Thereby, in the film liquid crystal display device, the firing of the alignment film and the sealing resin can be performed at 120 ° C. or higher, and the display quality and durability can be improved. Further, in the case of a dispersion-type electroluminescent element or a transparent touch panel device, printing and baking of silver paste or the like can be performed at 120 ° C. or higher, and an element or device having high adhesion and excellent reliability can be produced. However, when the film is continuously processed by the roll process, there is a problem that the surface opposite to the surface on which the transparent conductive thin film is formed is damaged.

【0003】[0003]

【発明が解決しようとする課題】本発明は、加工プロセ
スで120℃以上の加熱工程を加えても熱による損傷も
なく、透明導電性薄膜の形成された面の反対側の面の損
傷もないロールプロセスで連続的に加工できる耐熱性透
明導電性フィルムを提供することにある。
According to the present invention, there is no damage due to heat even if a heating step of 120 ° C. or more is applied in the processing process, and there is no damage to the surface opposite to the surface on which the transparent conductive thin film is formed. An object of the present invention is to provide a heat-resistant transparent conductive film that can be continuously processed by a roll process.

【0004】[0004]

【課題を解決するための手段】本発明は、上記の問題に
対し、ガラス転移温度が120℃以上の第1のプラスチ
ックフィルム2基体に、透明導電性を有する薄膜1を積
層した耐熱性透明導電性フィルムの薄膜が形成された面
と反対側の面に、ガラス転移温度が120℃以上で第1
のプラスチックフィルムとの線膨張係数の差が20pp
m/℃以下である第2のプラスチックフィルム3基体
に、熱分解温度が120℃以上で、かつ粘着力が50g
/cm以下である粘着材層4を設けた保護フィルムを粘
着材層4を介して貼り合わせることで解決したものであ
る。
In order to solve the above-mentioned problems, the present invention provides a heat-resistant transparent conductive film in which a transparent conductive thin film 1 is laminated on a first plastic film 2 having a glass transition temperature of 120 ° C. or higher. On the surface opposite to the surface on which the thin film of the conductive film is formed, the first glass having a glass transition temperature of 120 ° C. or higher
20pp difference in linear expansion coefficient from plastic film
m / ° C. or less, a second plastic film 3 substrate having a thermal decomposition temperature of 120 ° C. or more and an adhesive strength of 50 g
This is solved by bonding a protective film provided with an adhesive layer 4 having a thickness of not more than / cm through the adhesive layer 4.

【0005】ガラス転移温度が120℃以上のプラスチ
ックフィルム2、3としては、ポリカーボネート、ポリ
アリレート、ポリスルホン、ポリエーテルスルホン、ポ
リエーテルイミド、ポリエーテルエーテルケトン等の樹
脂からなるフィルムがあげられる。熱分解温度が120
℃以上で、粘着力が50g/cm以下である粘着材層4
に使用される粘着材には、アクリル系粘着材、シリコー
ン系粘着材、EVA樹脂系粘着材等から選ばれる。粘着
材を第2のプラスチックフィルム3表面に設けるには、
コーティングや押出しラミネートの手法が使われる。第
2のプラスチックフィルム3表面と粘着材層4の密着力
は第1のプラスチックフィルムと粘着材の密着力より十
分大きくなければならない。そのためには、第2のプラ
スチックフィルム表面をコロナ処理したりプライマーコ
ーティングすることが有効である。第1のプラスチック
フィルム表面を密着性が乏しくなるようにすることも有
効である。第1のプラスチックフィルムと粘着材の粘着
力が50g/cm以上になると、剥し難くなり、ロール
プロセスでの自動剥離機構に特別な設計が必要となり生
産性にも支障をきたし、また剥す際に透明導電性フィル
ムを損傷するおそれも出てくるので好ましくない。第2
のプラスチックフィルムの厚さは、コスト的には薄いほ
うが有利であるが、貼り合わせた状態での透明導電性フ
ィルムの補強効果においては厚いほうが有利となる。粘
着材層4の厚さは薄いほうが第2のプラスチックフィル
ムの耐熱性を損ないにくいので好ましい。なお、粘着材
のガラス転移温度は120℃以下であっても、粘着機能
は高温でも損なわれないので差し支えない。
Examples of the plastic films 2 and 3 having a glass transition temperature of 120 ° C. or higher include films made of resins such as polycarbonate, polyarylate, polysulfone, polyethersulfone, polyetherimide, and polyetheretherketone. Thermal decomposition temperature is 120
Pressure-sensitive adhesive layer 4 having an adhesive strength of 50 g / cm or less
Is selected from acrylic adhesives, silicone-based adhesives, EVA resin-based adhesives, and the like. To provide the adhesive on the surface of the second plastic film 3,
Coating and extrusion lamination techniques are used. The adhesion between the surface of the second plastic film 3 and the adhesive layer 4 must be sufficiently larger than the adhesion between the first plastic film and the adhesive. For that purpose, it is effective to perform corona treatment or primer coating on the surface of the second plastic film. It is also effective to make the surface of the first plastic film poor in adhesion. When the adhesive force between the first plastic film and the adhesive material is 50 g / cm or more, it becomes difficult to peel off, and a special design is required for an automatic peeling mechanism in a roll process, which hinders productivity and also causes transparency when peeling. It is not preferable because the conductive film may be damaged. Second
As for the thickness of the plastic film, a thinner film is more advantageous in terms of cost, but a thicker one is more advantageous in the reinforcing effect of the transparent conductive film in a bonded state. It is preferable that the thickness of the adhesive layer 4 is thin because the heat resistance of the second plastic film is not easily damaged. Even if the glass transition temperature of the pressure-sensitive adhesive is 120 ° C. or lower, the pressure-sensitive adhesive function is not impaired even at a high temperature.

【0006】本発明における透明導電性薄膜1として
は、錫を5〜10wt%含んだインジウムの酸化物(I
TO)が最も適しているが、金、銀、パラジウム、ニッ
ケルやカドミウム、アンチモン、亜鉛等の酸化物も選ぶ
ことができる。プラスチックフィルムにこれらの薄膜を
積層する方法としは、真空蒸着法やスパッタリング法、
イオンプレーティング法が選ばれる。透明導電性薄膜を
形成する前に、プラスチックフィルム表面に、密着力向
上のためにアンダーコーティングを施すのも有効であ
る。
As the transparent conductive thin film 1 in the present invention, an oxide of indium containing 5 to 10% by weight of tin (I
TO) is most suitable, but oxides such as gold, silver, palladium, nickel, cadmium, antimony, and zinc can also be selected. As a method of laminating these thin films on a plastic film, a vacuum evaporation method, a sputtering method,
The ion plating method is selected. Before forming the transparent conductive thin film, it is also effective to apply an undercoating to the surface of the plastic film in order to improve the adhesion.

【0007】[0007]

【実施例】【Example】

(実施例1)ロール状のポリエーテルイミドフィルム
(住友ベークライト(株)製スミライトFS−1450、
ガラス転移温度216℃、線膨張係数62ppm/℃、
厚み25μm)にアクリル系粘着材を5μmの厚みにコ
ーティングし、耐熱性保護フィルムを作成した。この耐
熱性保護フィルムを、同じくロール状の、ポリエーテル
スルホンフィルム(住友ベークライト(株)製スミライト
FS−5300、ガラス転移温度223℃、線膨張係数
54ppm/℃、厚み100μm)にアンダーコートを
施しその表面上にITOをスパッタリング法で厚さ0.
03μmに形成した透明導電性フィルムのポリエーテル
スルホンフィルム面に貼り合わせた。この積層フィルム
のロールを、巻出しながら耐熱性保護フィルムを貼って
ある面だけが支持ロール等に接触するように設計された
加熱炉を通し150℃で10分間加熱し、再び巻取っ
た。加熱炉の中および通過後巻取られるまで耐熱性保護
フィルムが剥がれたり、変形したりすることはなかっ
た。
(Example 1) Roll-shaped polyetherimide film (Sumilite FS-1450 manufactured by Sumitomo Bakelite Co., Ltd.)
Glass transition temperature 216 ° C, linear expansion coefficient 62ppm / ° C,
(Thickness: 25 μm) was coated with an acrylic pressure-sensitive adhesive to a thickness of 5 μm to form a heat-resistant protective film. This heat-resistant protective film was undercoated with a roll-shaped polyethersulfone film (Sumilite FS-5300, manufactured by Sumitomo Bakelite Co., Ltd., glass transition temperature: 223 ° C., linear expansion coefficient: 54 ppm / ° C., thickness: 100 μm). ITO is deposited on the surface to a thickness of 0.
The transparent conductive film formed to have a thickness of 03 μm was bonded to the polyethersulfone film surface. The roll of the laminated film was heated at 150 ° C. for 10 minutes through a heating furnace designed so that only the surface on which the heat-resistant protective film was stuck was in contact with the support roll or the like while unwinding, and was wound again. The heat-resistant protective film was not peeled off or deformed in the heating furnace and until it was wound after passing.

【0008】(実施例2)ポリカーボネート樹脂(GE
P製レキサン141、ガラス転移点145℃、線膨張係
数67ppm/℃)を押出製膜法で300μmのフィル
ムに成形し、さらにこの一方の表面上にEVA樹脂(三
井デュポン(株)製 エバフレックス)を押出しラミネー
トして耐熱性保護フィルムを作成し、ロール状に巻取っ
た。この耐熱性保護フィルムを、同じく押し出し製膜し
たロール状の、ポリカーボネートフィルム(ガラス転移
温度145℃、線膨張係数67ppm/℃、厚み300
μm)にアンダーコートを施しその表面上にITOをス
パッタリング法で厚さ0.1μmに形成した透明導電性
フィルムのポリカーボネートフィルム面に貼り合わせ
た。この積層フィルムのロールを、巻出しながら耐熱性
保護フィルムを貼ってある面だけが支持ロール等に接触
するように設計された加熱炉を通し150℃で10分間
加熱し、再び巻取った。加熱炉の中および通過後巻取ら
れるまで耐熱性保護フィルムが剥がれたり、変形したり
することはなかった。
(Example 2) Polycarbonate resin (GE
Pexan 141, glass transition point 145 ° C., linear expansion coefficient 67 ppm / ° C.) are formed into a 300 μm film by an extrusion film forming method, and EVA resin (Evaflex manufactured by DuPont Mitsui) is formed on one surface of the film. Was extruded and laminated to form a heat-resistant protective film, which was wound into a roll. A roll-shaped polycarbonate film (glass transition temperature: 145 ° C., coefficient of linear expansion: 67 ppm / ° C., thickness: 300) also extruded from this heat-resistant protective film.
μm), and an ITO was adhered to the surface of the polycarbonate film of the transparent conductive film formed to a thickness of 0.1 μm on the surface by sputtering. The roll of the laminated film was heated at 150 ° C. for 10 minutes through a heating furnace designed so that only the surface on which the heat-resistant protective film was stuck was in contact with the support roll or the like while unwinding, and was wound again. The heat-resistant protective film was not peeled off or deformed in the heating furnace and until it was wound after passing.

【0009】(比較例1)実施例1の加熱を、ポリエー
テルスルホンフィルム面に耐熱性保護フィルムを貼らな
いでおこなった。巻取ったフィルムには支持ロール等で
こすれて発生した傷が無数に観察された。 (比較例2)実施例1の加熱を、ガラス転移温度が80
℃で線膨張係数が12ppm/℃のポリエステルフィル
ムを基体としアクリル系粘着材が塗布されている保護フ
ィルム(サンエー化学工業(株)製 サニテクトE)を耐
熱性保護フィルムの代わりに用いて行ったところ乾燥機
内部でポリエステルフィルムが収縮し透明導電性フィル
ムが変形し、ITO面に傷が生じた。 (比較例3)実施例1の加熱を、ガラス転移温度が−1
25℃で線膨張係数が100ppm/℃のポリエチレン
フィルムを基体としEVA樹脂が共押出し積層されてい
る保護フィルム(サンエー化学工業(株)製 サニテクト
PAC)を耐熱性保護フィルムの代わりに用いて行った
ところ乾燥機を出てからポリエチレンフィルムが収縮し
積層フィルム全体が大きくカールし支持ロールで折れ曲
がり損傷した。
Comparative Example 1 The heating of Example 1 was performed without attaching a heat-resistant protective film to the polyethersulfone film surface. Numerous scratches generated by rubbing with a support roll or the like were observed on the wound film. (Comparative Example 2) The heating of Example 1 was repeated except that the glass transition temperature was 80%.
When a protective film (sanitect E manufactured by San-A Chemical Industry Co., Ltd.) having a polyester film having a linear expansion coefficient of 12 ppm / ° C. at the base and coated with an acrylic adhesive was used instead of the heat-resistant protective film. The polyester film contracted inside the dryer, the transparent conductive film was deformed, and the ITO surface was damaged. (Comparative Example 3) The heating of Example 1 was repeated except that the glass transition temperature was -1.
Using a polyethylene film having a linear expansion coefficient of 100 ppm / ° C. at 25 ° C. as a base, and using a protective film (SANITECT PAC manufactured by San-A Kagaku Kogyo Co., Ltd.) in which an EVA resin is coextruded and laminated instead of the heat-resistant protective film. However, after leaving the dryer, the polyethylene film shrank, and the entire laminated film was greatly curled and bent and damaged by the support roll.

【0010】[0010]

【発明の効果】この発明により、耐熱性の高い透明導電
性フィルムの透明導電性薄膜に、加熱工程を必要とする
加工が、ロール形状のまま連続プロセスで可能となる。
According to the present invention, a process requiring a heating step can be performed on a transparent conductive thin film of a transparent conductive film having high heat resistance by a continuous process in a roll shape.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の1実施例要部断面図である。FIG. 1 is a sectional view of a main part of one embodiment of the present invention.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ガラス転移温度が120℃以上である第
1のプラスチックフィルム基体に、透明導電性を有する
薄膜を積層し、該薄膜が積層されている面の反対面上
に、ガラス転移温度が120℃以上で、且つ第1のプラ
スチックフィルムとの線膨張係数の差が20ppm/℃
以内である第2のプラスチックフィルム基体に、熱分解
温度が120℃以上で、かつ粘着力が50g/cm以下
である粘着材層を設けた保護フィルムを粘着材層を介し
て貼り合わせたことを特徴とする透明導電性フィルム。
1. A thin film having a transparent conductivity is laminated on a first plastic film substrate having a glass transition temperature of 120 ° C. or higher, and a glass transition temperature is formed on a surface opposite to a surface on which the thin film is laminated. 120 ° C. or higher, and the difference in linear expansion coefficient from the first plastic film is 20 ppm / ° C.
And a protective film provided with an adhesive layer having a thermal decomposition temperature of 120 ° C. or higher and an adhesive force of 50 g / cm or lower is bonded to the second plastic film substrate, which is within, through the adhesive layer. Characteristic transparent conductive film.
JP21777593A 1993-09-01 1993-09-01 Transparent conductive film Ceased JP3310408B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21777593A JP3310408B2 (en) 1993-09-01 1993-09-01 Transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21777593A JP3310408B2 (en) 1993-09-01 1993-09-01 Transparent conductive film

Publications (2)

Publication Number Publication Date
JPH0768690A JPH0768690A (en) 1995-03-14
JP3310408B2 true JP3310408B2 (en) 2002-08-05

Family

ID=16709541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21777593A Ceased JP3310408B2 (en) 1993-09-01 1993-09-01 Transparent conductive film

Country Status (1)

Country Link
JP (1) JP3310408B2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040030393A (en) 2000-08-04 2004-04-09 세키스이가가쿠 고교가부시키가이샤 Conductive fine particles, method for plating fine particles, and substrate structural body
JP4151821B2 (en) 2002-01-11 2008-09-17 日東電工株式会社 Surface protective film for transparent conductive film and transparent conductive film
JP3942017B2 (en) 2002-03-25 2007-07-11 富士フイルム株式会社 Light emitting element
JP4342775B2 (en) 2002-07-31 2009-10-14 日東電工株式会社 Surface protective film for transparent conductive film, method for producing the same, and transparent conductive film with surface protective film
JP4777008B2 (en) * 2005-08-04 2011-09-21 日東電工株式会社 Conductive laminated film, electrode plate for touch panel and touch panel
JP5506011B2 (en) * 2007-03-02 2014-05-28 日東電工株式会社 Transparent conductive film with pressure-sensitive adhesive layer and method for producing the same
JP6298321B2 (en) * 2014-02-25 2018-03-20 株式会社カネカ Film with transparent conductive layer
JP6331581B2 (en) * 2014-03-28 2018-05-30 大日本印刷株式会社 Laminate for forming transparent conductive film, transparent conductive film, touch panel, method for selecting second substrate with adhesive layer, method for producing laminate for forming transparent conductive film, and method for producing transparent conductive film
CN109451735B (en) 2017-07-10 2022-05-10 东山薄膜株式会社 Hard coat film with optical adjustment layer for transparent conductive film, and transparent conductive film
CN113242792B (en) 2018-12-12 2023-05-23 大塚化学株式会社 Transparent conductive layer-forming substrate, transparent conductive film, touch panel, and method for producing transparent conductive layer-forming substrate
JP6738448B1 (en) 2019-02-08 2020-08-12 グンゼ株式会社 Transparent conductive film and touch panel
JP7320960B2 (en) * 2019-03-13 2023-08-04 日東電工株式会社 FILM LAMINATE AND METHOD FOR MANUFACTURING PATTERNED CONDUCTIVE FILM
JP7300855B2 (en) * 2019-03-13 2023-06-30 日東電工株式会社 FILM LAMINATE AND METHOD FOR MANUFACTURING PATTERNED CONDUCTIVE FILM
JP7039674B2 (en) * 2020-11-05 2022-03-22 リンテック株式会社 Laminates and protective films

Also Published As

Publication number Publication date
JPH0768690A (en) 1995-03-14

Similar Documents

Publication Publication Date Title
JP3310408B2 (en) Transparent conductive film
KR100308139B1 (en) Transparent touch panel
JP4776754B2 (en) Transparent conductive film with protective film and method of using the same
CA2772110C (en) Thin-sheet glass substrate laminate and method of manufacturing the same
US20100136276A1 (en) Pressure-sensitive adhesive layer-carrying transparent conductive film and method for production thereof
JP4086132B2 (en) Transparent conductive film and touch panel
EP1112674B1 (en) Laminates for encapsulating oled devices
JP4777008B2 (en) Conductive laminated film, electrode plate for touch panel and touch panel
WO2002091161A1 (en) Touch panel and electronic apparatus using the same
JPH11268168A (en) Plastic film with transparent conducting film and protective film
JP2003185833A (en) Protective film for polarizer and polarizing plate using the same
JP2002316378A (en) Transparent conductive laminated body and touch panel using the same
JPH11242562A (en) Low reflective resistor film touch panel and its production and substrate having transparent conductive film
JP2002103504A (en) Transparent conductive film
JP2004213187A (en) Touch panel with icon
JP2020100808A5 (en)
WO2005072949A1 (en) Base material for light reflector and light reflector
JP2000243146A (en) Transparent conductive film and touch panel using same
JP3310409B2 (en) Transparent conductive film
JP2002134272A (en) Electroluminescence element and its producing method
JPH10208555A (en) Plastic film with transparent conductive film
JPH0112663B2 (en)
TW200405978A (en) Touch panel with adhesive layer
JP2003202954A (en) Touch panel and method for manufacturing the same
JPS63102928A (en) Metallic film laminate

Legal Events

Date Code Title Description
RVOP Cancellation by post-grant opposition